AU2959000A - Arf laser with low pulse energy and high rep rate - Google Patents

Arf laser with low pulse energy and high rep rate

Info

Publication number
AU2959000A
AU2959000A AU29590/00A AU2959000A AU2959000A AU 2959000 A AU2959000 A AU 2959000A AU 29590/00 A AU29590/00 A AU 29590/00A AU 2959000 A AU2959000 A AU 2959000A AU 2959000 A AU2959000 A AU 2959000A
Authority
AU
Australia
Prior art keywords
pulse energy
low pulse
arf laser
rep rate
high rep
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU29590/00A
Inventor
Herve A. Besaucele
Alexander I. Ershov
Vladimir B. Fleurov
Thomas Hofmann
Jean-Marc Hueber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/217,340 external-priority patent/US6137821A/en
Priority claimed from US09/451,750 external-priority patent/US6553049B1/en
Application filed by Cymer Inc filed Critical Cymer Inc
Priority claimed from PCT/US1999/029682 external-priority patent/WO2000038286A1/en
Publication of AU2959000A publication Critical patent/AU2959000A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
AU29590/00A 1998-12-21 1999-12-13 Arf laser with low pulse energy and high rep rate Abandoned AU2959000A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09217340 1998-12-21
US09/217,340 US6137821A (en) 1997-06-04 1998-12-21 Durable etalon based output coupler
US09451750 1999-11-30
US09/451,750 US6553049B1 (en) 1998-03-11 1999-11-30 ArF laser with low pulse energy and high rep rate
PCT/US1999/029682 WO2000038286A1 (en) 1998-12-15 1999-12-13 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE

Publications (1)

Publication Number Publication Date
AU2959000A true AU2959000A (en) 2000-07-12

Family

ID=26911852

Family Applications (1)

Application Number Title Priority Date Filing Date
AU29590/00A Abandoned AU2959000A (en) 1998-12-21 1999-12-13 Arf laser with low pulse energy and high rep rate

Country Status (1)

Country Link
AU (1) AU2959000A (en)

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AU2959000A (en) Arf laser with low pulse energy and high rep rate

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase