AU2320000A - Surface treating method - Google Patents

Surface treating method

Info

Publication number
AU2320000A
AU2320000A AU23200/00A AU2320000A AU2320000A AU 2320000 A AU2320000 A AU 2320000A AU 23200/00 A AU23200/00 A AU 23200/00A AU 2320000 A AU2320000 A AU 2320000A AU 2320000 A AU2320000 A AU 2320000A
Authority
AU
Australia
Prior art keywords
surface treating
treating method
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU23200/00A
Inventor
Osamu Kurashina
Yoshiaki Mori
Katsuhiro Takahashi
Shoji Tsutsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of AU2320000A publication Critical patent/AU2320000A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AU23200/00A 1999-01-29 2000-01-27 Surface treating method Abandoned AU2320000A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2161499 1999-01-29
JP11/21614 1999-01-29
PCT/JP2000/000438 WO2000044961A1 (en) 1999-01-29 2000-01-27 Surface treating method

Publications (1)

Publication Number Publication Date
AU2320000A true AU2320000A (en) 2000-08-18

Family

ID=12059932

Family Applications (1)

Application Number Title Priority Date Filing Date
AU23200/00A Abandoned AU2320000A (en) 1999-01-29 2000-01-27 Surface treating method

Country Status (2)

Country Link
AU (1) AU2320000A (en)
WO (1) WO2000044961A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4939864B2 (en) * 2006-07-25 2012-05-30 東京エレクトロン株式会社 Gas supply apparatus, gas supply method, thin film forming apparatus cleaning method, thin film forming method, and thin film forming apparatus
JP2022163526A (en) * 2021-04-14 2022-10-26 東京エレクトロン株式会社 Substrate processing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0751757B2 (en) * 1986-02-18 1995-06-05 旭化成工業株式会社 Dry etching method
JPH03140471A (en) * 1989-10-25 1991-06-14 Fujitsu Ltd Production equipment of semiconductor device
JP3772936B2 (en) * 1997-05-20 2006-05-10 セイコーエプソン株式会社 Surface treatment method

Also Published As

Publication number Publication date
WO2000044961A1 (en) 2000-08-03

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase