AU2248601A - Technique and process for the imaging and formation of various devices and surfaces - Google Patents

Technique and process for the imaging and formation of various devices and surfaces

Info

Publication number
AU2248601A
AU2248601A AU22486/01A AU2248601A AU2248601A AU 2248601 A AU2248601 A AU 2248601A AU 22486/01 A AU22486/01 A AU 22486/01A AU 2248601 A AU2248601 A AU 2248601A AU 2248601 A AU2248601 A AU 2248601A
Authority
AU
Australia
Prior art keywords
imaging
formation
technique
various devices
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU22486/01A
Inventor
Spyridon Zafiratos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU2248601A publication Critical patent/AU2248601A/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/02—Multiple-type SPM, i.e. involving more than one SPM techniques
    • G01Q60/04—STM [Scanning Tunnelling Microscopy] combined with AFM [Atomic Force Microscopy]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/10—STM [Scanning Tunnelling Microscopy] or apparatus therefor, e.g. STM probes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00—Applications, other than SPM, of scanning-probe techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31735—Direct-write microstructures
    • H01J2237/31738—Direct-write microstructures using STM
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31747—Etching microareas using STM
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
    • Y10S977/856—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure including etching/cutting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
    • Y10S977/857—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure including coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
    • Y10S977/858—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure including positioning/mounting nanostructure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/855—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure
    • Y10S977/859—Manufacture, treatment, or detection of nanostructure with scanning probe for manufacture of nanostructure including substrate treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/874—Probe tip array
AU22486/01A 1999-10-27 2000-10-27 Technique and process for the imaging and formation of various devices and surfaces Abandoned AU2248601A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09427441 1999-10-27
US09/427,441 US6262426B1 (en) 1999-10-27 1999-10-27 Technique and process for the imaging and formation of various devices and surfaces
PCT/US2000/030211 WO2001031656A1 (en) 1999-10-27 2000-10-27 Technique and process for the imaging and formation of various devices and surfaces

Publications (1)

Publication Number Publication Date
AU2248601A true AU2248601A (en) 2001-05-08

Family

ID=23694886

Family Applications (1)

Application Number Title Priority Date Filing Date
AU22486/01A Abandoned AU2248601A (en) 1999-10-27 2000-10-27 Technique and process for the imaging and formation of various devices and surfaces

Country Status (3)

Country Link
US (1) US6262426B1 (en)
AU (1) AU2248601A (en)
WO (1) WO2001031656A1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6635311B1 (en) * 1999-01-07 2003-10-21 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or products thereby
US6827979B2 (en) 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
JP2001319992A (en) * 2000-02-28 2001-11-16 Shinko Electric Ind Co Ltd Wiring board, semiconductor device, and their manufacturing methods
US6447663B1 (en) * 2000-08-01 2002-09-10 Ut-Battelle, Llc Programmable nanometer-scale electrolytic metal deposition and depletion
US7060510B2 (en) * 2000-08-15 2006-06-13 The Trustees Of The University Of Pennsylvania Electronic and optoelectronic devices and methods for preparing same
US6982174B2 (en) 2000-08-15 2006-01-03 The Trustees Of The University Of Pennsylvania Directed assembly of nanometer-scale molecular devices
US6524870B2 (en) * 2001-04-24 2003-02-25 Pell, Iii Edwin A. Method and apparatus for improving resolution of objects in a semiconductor wafer
US6538461B2 (en) * 2001-05-01 2003-03-25 Sun Microsystems, Inc. System and method for testing integrated passive components in a printed circuit board
JP4022391B2 (en) * 2001-12-10 2007-12-19 株式会社ルネサステクノロジ Probe drawing apparatus and method, and insulation characteristic evaluation apparatus
US7108992B2 (en) * 2002-11-27 2006-09-19 St. Jude Children's Research Hospital ATM kinase compositions and methods
DE10330239B4 (en) * 2003-07-03 2005-08-11 Forschungszentrum Jülich GmbH Molekülpositioniereinrichtung
KR100868887B1 (en) 2004-01-12 2008-11-17 더 리전트 오브 더 유니버시티 오브 캘리포니아 Nanoscale electric lithography
US20090138995A1 (en) * 2005-06-16 2009-05-28 Kelly Thomas F Atom probe component treatments
US20100051815A1 (en) * 2008-08-29 2010-03-04 Kwangyeol Lee Heat-radiating pattern
EP2335103A1 (en) 2008-09-12 2011-06-22 David Erickson Optical force based biomolecular analysis in slot waveguides
US9255339B2 (en) * 2011-09-19 2016-02-09 Fei Company Localized, in-vacuum modification of small structures
RU2699031C2 (en) * 2017-09-14 2019-09-03 федеральное государственное бюджетное образовательное учреждение высшего образования "Ижевский государственный технический университет имени М.Т. Калашникова" Method of recording latent image

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4968390A (en) * 1988-11-03 1990-11-06 Board Of Regents, The University Of Texas System High resolution deposition and etching in polymer films
US4896044A (en) 1989-02-17 1990-01-23 Purdue Research Foundation Scanning tunneling microscope nanoetching method
JPH0373934A (en) 1989-08-15 1991-03-28 Fujitsu Ltd Optical amplifier
US5021672A (en) * 1989-12-22 1991-06-04 E. I. Du Pont De Nemours And Company Etching of nanoscale structures
US5150242A (en) 1990-08-17 1992-09-22 Fellows William G Integrated optical computing elements for processing and encryption functions employing non-linear organic polymers having photovoltaic and piezoelectric interfaces
US5047649A (en) 1990-10-09 1991-09-10 International Business Machines Corporation Method and apparatus for writing or etching narrow linewidth patterns on insulating materials
US5159473A (en) 1991-02-27 1992-10-27 University Of North Carolina Apparatus and method for programmable optical interconnections
US5510614A (en) 1993-01-21 1996-04-23 Hitachi, Ltd. Solid surface observation method and apparatus therefor, and electronic apparatus formed of the solid surface observation apparatus and method of forming the electronic apparatus
US5360764A (en) 1993-02-16 1994-11-01 The United States Of America, As Represented By The Secretary Of Commerce Method of fabricating laser controlled nanolithography
US5504338A (en) * 1993-06-30 1996-04-02 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method using low-voltage and/or low-current scanning probe lithography
US5478698A (en) 1993-08-12 1995-12-26 Lsi Logic Corporation Direct-write afocal electron-beam semiconductor lithography
US5705047A (en) 1994-04-29 1998-01-06 National Science Council Method for manufacturing porous blue light emitting diode
US5502781A (en) 1995-01-25 1996-03-26 At&T Corp. Integrated optical devices utilizing magnetostrictively, electrostrictively or photostrictively induced stress
US5660706A (en) 1996-07-30 1997-08-26 Sematech, Inc. Electric field initiated electroless metal deposition

Also Published As

Publication number Publication date
US6262426B1 (en) 2001-07-17
WO2001031656A1 (en) 2001-05-03
WO2001031656A9 (en) 2002-07-04

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase