AU2046097A - Photosensitive resin composition and coating comprising said composition - Google Patents
Photosensitive resin composition and coating comprising said compositionInfo
- Publication number
- AU2046097A AU2046097A AU20460/97A AU2046097A AU2046097A AU 2046097 A AU2046097 A AU 2046097A AU 20460/97 A AU20460/97 A AU 20460/97A AU 2046097 A AU2046097 A AU 2046097A AU 2046097 A AU2046097 A AU 2046097A
- Authority
- AU
- Australia
- Prior art keywords
- composition
- coating
- photosensitive resin
- resin composition
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1002627 | 1996-03-15 | ||
NL1002627A NL1002627C2 (en) | 1996-03-15 | 1996-03-15 | Photosensitive resin composition and this composition comprising lacquer. |
PCT/NL1997/000125 WO1997034198A1 (en) | 1996-03-15 | 1997-03-12 | Photosensitive resin composition and coating comprising said composition |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2046097A true AU2046097A (en) | 1997-10-01 |
Family
ID=19762507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU20460/97A Abandoned AU2046097A (en) | 1996-03-15 | 1997-03-12 | Photosensitive resin composition and coating comprising said composition |
Country Status (4)
Country | Link |
---|---|
AU (1) | AU2046097A (en) |
ID (1) | ID19647A (en) |
NL (1) | NL1002627C2 (en) |
WO (1) | WO1997034198A1 (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3481738A (en) * | 1966-09-21 | 1969-12-02 | Ball Brothers Co Inc | Presensitized photoengraving plate and method of making same |
JPS5637244B2 (en) * | 1973-02-13 | 1981-08-29 | ||
US4272620A (en) * | 1978-08-09 | 1981-06-09 | Agency Of Industrial Science And Technology | Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof |
US4564580A (en) * | 1983-06-30 | 1986-01-14 | Kogyo Gijutsuin | Photosensitive resin composition |
US5053315A (en) * | 1990-07-17 | 1991-10-01 | Eastman Kodak Company | Radiation-sensitive composition containing an unsaturated polyester and use thereof in lithographic printing plates |
US5045432A (en) * | 1990-07-17 | 1991-09-03 | Eastman Kodak Company | Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates |
JPH05127372A (en) * | 1991-11-01 | 1993-05-25 | Nippon Paint Co Ltd | Lithographic printing photosensitive resin and resin composition |
-
1996
- 1996-03-15 NL NL1002627A patent/NL1002627C2/en not_active IP Right Cessation
-
1997
- 1997-03-12 WO PCT/NL1997/000125 patent/WO1997034198A1/en active Application Filing
- 1997-03-12 AU AU20460/97A patent/AU2046097A/en not_active Abandoned
- 1997-03-14 ID IDP970837A patent/ID19647A/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO1997034198A1 (en) | 1997-09-18 |
ID19647A (en) | 1998-07-23 |
NL1002627C2 (en) | 1997-09-17 |
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