AU2005202825B2 - Tissue resurfacing - Google Patents

Description

AUSTRALIA

Patents Act 1990 COMPLETE SPECIFICATION STANDARD PATENT Applicant: Rhytec Limited Invention Title: TISSUE RESURFACING The following statement is a full description of this invention, including the best method of performing it known to us: WO 01/62169 PCT/GBO 1/00767 ;Z TISSUE RESURFACING 00 This invention relates to tissue resurfacing, -for example, skin resurfacing, or the t~t~ resurfacing or removal of tissue located within, the alimentary canal, respiratory 00 5 tracts, blood vessels, uterus or urethra.

Human skin has two principal layers: the epidermis, which is the outer layer and typically has a thickness of around 120iI in the region of the face, and the dermis which is typically 20-30 times thicker than the epidermis, and contains hair follicles, sebaceous glands, nerve endings and fine blood capillaries. By volume the dermis is made up predominantly of the protein collagen.

A common aim of many cosmetic surgical procedures is to improve the appearance of a patient's skin. For example, a desirable clinical effect in the field of cosmetic surgery is to provide an improvement in the texture of ageing skin and to give it a more youthiful appearance. These effects can be achieved by the removal of a part or all of the epidermis, and on occa sions part of the dermis, causing the growth of a new epidermis having the desired properties. Additionally skin frequently contains scar tissue, the appearance of which is considered by some people to be detrimental to their attractiveness. The skin structure which gives rise to scar tissue is typically formed in the dermis. By removing the epidermis in a selected region and resculpting the scar tissue in the dermis it is possible to improve the appearance of certain types of scars, such as for example scars left by acne. The process of removing epidermal and possibly dermal tissue is known as skin resurfacing or dermabrasion.

One known technique for achieving skin resurfacing includes the mechanical removal of tissue by means of an abrasive wheel, for example. Another technique is known as a chemical peel, and involves the application of a corrosive chemical to the surface of the epidermis, to remove epidermal, and possibly dermal skin cells. Yet a further technique is laser resurfacing of the skin. Lasers are used to deliver a controlled amount of energy to the epidermis. This energy is absorbed by the epidermis causing necrosis of WO 01/62169 PCT/GB01/00767 2 epidermal cells. Necrosis can occur either as a result of the energy absorption causing Sthe temperature of the water in the cells to increase to a level at which the cells die, or 00 alternatively, depending upon the frequency of the laser light employed, the energy may be absorbed by molecules within the cells of the epidermis in a manner which results in their dissociation. This molecular dissociation kills the cells, and as a side effect also 00 gives rise to an increase in temperature of the skin.

Typically during laser resurfacing a laser beam is directed at a given treatment area of skin for a short period of time (typically less than one millisecond). This can be achieved either by pulsing the laser or by moving the laser continuously and sufficiently quickly that the beam is only incident upon a given area of skin for a predetermined period of time. A number of passes be may made over the skin surface, and dead skin debris is usually wiped from the skin between passes. Lasers currently employed for dermabrasion include a CO 2 laser, and an Erbium-YAG laser. The mechanisms by which energy is absorbed by the tissue causing it to die, and the resultant clinical effects obtained, such as the depth of tissue necrosis and the magnitude of the thermal margin the region surrounding the treated area that undergoes tissue modification as a result of absorbing heat) vary from one laser type to another. Essentially, however, the varying treatments provided by these lasers may be considered as a single type of treatment method in which a laser is used to impart energy to kill some or part of the epidermis (and depending upon the objective of the treatment, possibly part of the dermis), with the objective of creating growth of a new epidermis having an improved appearance, and also possibly the stimulation of new collagen growth in the dermis.

Other prior art references of background interest to the present invention include US3,699,967 (Anderson), US3,903,891 (Brayshaw), US4,040,426 (Morrison), US5,669,904, W095/0759, W095/26686 and W098/3 5618.

The present invention provides an alternative to known skin resurfacing techniques, apparatus and methods of operating such apparatus.

SUBSTITUTE SHEET (RULE 26) S5-2002 GBO1 007( 3 According to a first aspect of the present invention, a tissue resurfacing system comprises: a surgical instrument having first and second electrodes separated from each.

other, and, associated with the electrodes, a gas conduit for conveying gas to the 00 electrodes thereby to allow gas to pass between the electrodes, the gas conduit terminating in a plasma exit nozzle; and a radio frequency power generator coupled to the V) ~instrument electrodes and arranged to deliver r-adio frequency power to the electrodes in single or series of'treatment pulses for creating a plasma between the electrodes from gas fed through the conduit, the pulses having durations in the range of fromi 2ms' to l Ooms.

The application of an electric field to the gas in order to crate the plasma may take place at any suitable frequency, including the application of standard electrosurgical frequencies in the region of 5OOkI-z or the use of microwave frequencies in the region of 2450MHz, the latter having the advantage that voltages suitable for obtaining the plasma are more easily obtained in a complet structure. The plasma may be initiated or "struck" at one frequency, whereupon optimum power transfer into the plasma may then take place at a different frequency.

In one embodiment a radio frequency oscillating voltage is applied to the electrode in ,order to create a correspondingly oscillating electric field, and the power transferred to the plasma is controlled by monitoring the power reflected from the electrodes; (this providing an indication of the fraction of the power output from the power output device whiuh has been transferred into the plasima), and adjusting the -frequency of the oscillating voltage from the generator accordingly. As the frequency of the oscillating output from the generator approaches the resonant frequency of the assembly containing the electrodes (which is affected by the presence of the plasma), the power transferred to the plasma increases, and vice ver.a.

Preferably, in this embodiment, a dipole electric field is applied to tho gas between a pair of electrodes on the instrument which are connected to opposing output terminals of the power output device.

in an alternative aspect of the invention a DC electric field is applied, and power is.

delivered into the plasma from the DC field.

EO-D

0 8. 08, 22922 AMENDED SHEET 0 WO 01/62169 WO 0162169PCT/GBOI/00767 4 ;Z The gas employed is preferably non-toxic, and more preferably readily biocompatible to 00 enable its natural secretion or expulsion from the body of the patient. Carbon dioxide is one preferred gas;, since the human body automatically removes carbon dioxide from the bloodstream during respiration. Additionally, a plasma created from carbon dioxide 00 is hotter (albeit more difficult to create) than a plasma from, for example argon, and carbon dioxide is readily available in most operating theatres. Nitrogen or even air may tt~ also be used.

According to another aspect of the invention, a gas plasma tissue resurfacing instrument comprises: an elongate gas conduit extending from a gas inlet to an outlet nozzle and having a heat resistant dielectric wall; a first electrode located inside the conduit; a second electrode located on or adjacent an outer surface of the dielectric wall in registry with the first electrode; and an electrically conductive electric field focussing element located inside the conduit and between the first and second electrodes.

Some preferred features are set out in the accompanying dependent claims. The system described hereinafter has the benefit of being able to produce rapid treatment. at the tissue surface while m iniiig unwanted effects, e.g. thermal effects, at a greater than required depth.

A further aspect of the present invention provides a method of skin resurfacing at least the epidermis of a patient using a surgical system comprising an instrument having an electrode connected. to a power output device, the method comprising the steps of: operating the power output device to create an electric field in the region of the electrode; directing a flow of gas through the electric field, and generating, by virtue of the interaction of the electric field with the gas, a plasma; controlling power transferred into the plasma from the electric field; directing the plasma onto the tissue for a predetermined period of time, and vaporising at least a part of the epidermis as a result of the heat delivered to the epidermis from the plasma.

SUBSTITUTE SHEET (RULE 26) PCT/GBOI/00767 WO 01/62169 The invention also provides, according to a further aspect, a tissue resurfacing system comprising: a plasma treatment instrument having a gas conduit terminating in a plasma exit nozzle, and an electrode associated with the conduit, and a radio frequency power 00 c-i generator coupled to the instrument electrode and arranged to deliver radio frequency power to the electrode in a single or series of treatment pulses each comprising a burst of radio frequency oscillations, the generator including a controller which operates to 00 control the width of the treatment pulses to a predetermined width. The controller is N- preferably arranged to adjust the treatment pulse width by generating corresponding control pulses which are fed to a radio frequency power stage of the generator to alter N- 10 the level. of the power stage output from a substantially quiescent level to a predetermined, preferably constant, output power level for time periods each equal to a demanded pulse width, whereby a gas plasma is produced for such time periods. The time periods and/or the power level may be adjusted by the controller to yield metered treatment pulses for the instrument each having a predetermined total energy content.

It is possible, within the scope of the invention, for the radio frequency power output to be modulated (100% modulation or less) within each treatment pulse.

Treatment pulse widths of from 2ms to lO0ms are contemplated, and are preferably within the-range of from 3ms to S0ms or, more preferably, from 4ms to 3Oms. In the case where they are delivered in seriesj'the treatment pulses may have a repetition rate of 0.5Hz to 10OHz or 15Hz, preferably I1Hz to 6Hz.

From an instrument aspect, the invention also provides a gas plasma tissue resurfacing instrument comprising an elongate gas conduit extending from a gas inlet to a plasma exit nozzle, at least a pair of mutually adjacent electrodes for striking a plasma from gas within the conduit, and, between the electrodes, a solid dielectric wall formed from a material having a relative dielectric constant greater than unity (preferably of the order of 5 or higher). Advantageously the conduit is formed at least in part as a dielectric tube of such material, the electrode comprising an inner electrode inside the tube and a coaxial outer electrode surrounding the tube.

WO 01/62169 PCT/GB01/00767 6 ,Other aspects of the invention include the follow.

00 A method of operating a surgical system is provided comprising a power output device which generates an output signal at an output terminal, a controller capable of receiving In. 5 input signals from a user and controlling the power output device accordingly, an 00 instrument having at least one electrode connected to the generator output terminal via a feed structure, a supply of gas and a further feed structure for conveying the gas from tt the supply to the instrument, the method comprising the steps of: receiving input signals from a user, and operating the controller to determine from the user input signals a manner in which the power output device is to be controlled; operating the power output device to supply a voltage to the at least one electrode, thereby to create an electric field in the region of the electrode; passing gas through the electric field, and creating by virtue of the intensity of the electric field a plasma from the gas; and controlling, in accordance with the user input signals to the controller, the power output device to control the power delivered into the plasma. The controller may operate to control the power output device to deliver a predetermined level of energy into the plasma, and the controller may further control the rate of flow of gas through the electric field.

The gas preferably comprises molecules having at least two atoms.

There is also provided a surgical system for use in tissue resurfacing comprising: a user interface which receives input signals from a user relating to desired performance of the system; a power output device which generates a voltage output signal at an output terminal; a gas supply; an instrument having an electrode connected to the output terminal of the power output device thereby to enable the generation of an electric field in the region of the electrode when the power output device is operated to produce an output voltage at the output terminal, the instrument additionally being connected to the gas supply and further comprising a conduit for passing gas from the supply through the electric field in the region of the electrode to create a plasma; and a controller which is connected to the user interface and the power output device, the controller being adapted to receive and process signals from the user interface and to control, on the SUBSTITUTE SHEET (RULE 26) WO 01/62169 PCT/GBOi1/00767 s 7 Sbasis of the user interface signals, the delivery of power from the power output device Sinto the plasma. The controller may be additionally adapted to control the time period over which power is delivered into the plasma.

00 User interface signals from the user interface to the controller may relate to a total N amount of energy to be delivered into the plasma. The system may further comprise a N gas flow regulator connected to the controller, the controller being additionally adapted c-I to control to a rate of flow of gas-from the supply. The controller may receive feedback Ssignals indicative of power delivered to the plasma.

The power output device may include a tunable oscillator, and the controller being connected to the oscillator to tune the oscillator on the basis of feedback signals indicative of power attenuated within the instrument. Typically, the output frequency of the oscillator lies within the band of 2400-2500MHz.

A method is provided for operating a surgical system comprising a power output device which produces an oscillating electrical output signal across a pair of output terminals, an instrument having a pair of electrodes each of which is connected to one of the output terminals of the power output device, a controller which receives input signals from a user interface and controls the power output device accordingly, and a supply of gas connected to the instrument, wherein the method comprises the steps of: operating the power output device to apply an oscillating voltage across the electrodes of the instrument, thereby to create an electric field in the region of the electrodes; passing gas through the electric field and striking a plasma between the electrodes of the instrument; and operating the controller to control the power delivered into the plasma from the power output device.

A surgical system is provided comprising: a power output device which generates a radio frequency oscillating output signal across a pair of output terminals; an instrument having a first pair of electrodes connected to respective output terminals of the power output device and which are part of a first resonant assembly which is resonant at a predetermined frequency, and a second pair of electrodes connected to respective output WO 01/62169 PCT/GB01/00767 8 Sterminals of the power output device and which are part of a second resonant assembly ;Z which is also resonant at the predetermined frequency; a gas supply which supplies gas OC to the oscillating electric field between the first pair of electrodes and to the oscillating electric field between the second pair of electrodes; wherein the first resonant assembly V) 5 is resonant at the predetermined frequency prior to formation of a plasma from the gas, 0 and the second resonant assembly is resonant at the predetermined frequency Ssubsequent to the generation of a plasma. In such a system the first pair of electrodes I may comprise an inner electrode and an outer electrode extending substantially coaxially with, and around the inner electrode, and the second pair of electrodes may comprise a further inner electrode and said outer electrode. The system may operate such that, during resonance of the first resonant structure, a potential difference is created between the inner electrode and the further inner electrode, and a plasma is initially struck between the inner electrode and the further inner electrode as a result of the potential difference.

A further aspect of the invention includes a surgical system comprising: a power output device which generates a radio frequency oscillating output signal across a pair- of output terminals; an instrument having a pair of electrodes connected to respective output terminals of the power output device via a feed structure, to create an oscillating electric field between the electrodes; a gas supply and a conduit from the gas supply to the electric field, to enable gas passing through the electric field to be converted into a plasma and to pass out of an aperture in the instrument; wherein the instrument comprises a voltage transformation assembly providing step up of the voltage output from the power output device, and supplying the stepped-up voltage across the electrodes thereby to intensify the electric field between the electrodes. In such a system the voltage transformation assembly may comprise a structure within the instrument having a resonant frequency within the radio frequency oscillating output bandwidth. The resonant structure may comprise at least one length of transmission line having an electrical length equal to one quarter of a wavelength of the oscillating output signal of the power output device.

SUBSTITUTE SHEET (RULE 26) WO 001/62 169 PCT/GB01/00767 Another aspect of the invention provides a surgical instrument comprising: a pair of electrodes; a connector connectible to a feed structure, thereby to enable a signal from a generator to be conveyed to the electrodes; at least a first section oftransmission line 00 Ni electrically connected to the electrodes and to the feed structure, the section of transmission line having an electrical length substantially equal to one quarter of a N- wavelength of an electromagnetic wave having a frequency in the range 2400 M4I-z to 00 CI 2500 MHz. This instrument may fur-ther comprising a second section of transmission c-I line electrically connected to the conector and to the first section of transmission line, 0 the further section of transmission line having an electrical length substantially equal to cI 10 the length of the first section of transmission line, wherein the -characteristic impedances of the first and second sections of transmission line are different, the first and second sections of transmission line forming an impedance matching assembly between a relatively low characteristic impedance of a feed structure which is connectable to the instrument via the connector and a relatively high impedance electrical loadl provided by a plasma formed between the electrodes.

There is also provided a surgical instrument comprising: a pair of electrodes separated from each other; a connector for connecting an electrical signal from a feed structure to the electrodes thereby to enable the creation of an electric field between the electrodes; a gas inlet port; a gas conduit for conveying gas from the inlet port to the electrodes thereby to allow gas to pass between the electrodes to enable the creation of a plasma between the electrodes when an electric field is applied between them; and an aperture in the instrument through which plasma may be expelled under pressure of gas passing along the gas conduit. In such an instrument, gas pressure within the conduit may force plasma out of the aperture in a first direction, and the electrodes may be spaced apart at least in the first direction.

Yet a further aspect includes a surgical instrument comprising: a connector having a pair of electrical terminals; first pair of electrodes provided by an inner electrode and an outer electrode extending coaxiafly around the inner electrode; a second pair of electrodes provided by a further inner electrode and said outer electrode, the first and second pairs of electrodes being electrically connectable via the connector to a WO 01/62169 PCT/GB01/00767 s N- generator to enable creation of an electric field between the inner and outer electrodes Sand the further inner and outer electrodes respectively; a gas inlet port, and a conduit for ;Z conveying gas from the inlet port through the electric field thereby to enable the C formation of a plasma from the gas; the first pair of electrodes forming at least a part of a first resonant assembly, and the second pair of electrodes forming at least a part of a C second resonant assembly, the first and second resonant assemblies being resonant at a 00 different frequencies prior to the formation of a plasma, thereby to enable, prior to the formation of a plasma, the creation of an electric field between the inner and further inner electrodes which may be used to strike a plasma.

c There is also provided a method of operating a surgical instrument having first and second pairs of electrodes, the electrodes of each pair being connected to different output terminals of a power output device which generates an oscillating electrical output signal, the method comprising the steps of: operating the power output device to apply an oscillating electrical signal to the first and second pairs of electrodes; causing resonance of resonant assembly of which the first pair of electrodes form at least a part; creating, by virtue of the resonance, a potential difference and thus an electric field between an electrode of the first pair of electrodes and an electrode of the second pair of electrodes; passing a gas through the electric field and, by virtue of interaction between the electric field and the gas, forming a plasma. The electrodes between which the electric field is created may both be connected to the same output terminal of the power output device. Generally, the formation of a plasma results in a change of electrical characteristics of the second pair of electrodes such that they are at least a part of a further resonant assembly which is resonant at the frequency of the oscillating electrical output signal, the method then further comprising the step, subsequent to the formation of a plasma, of causing resonance of the further resonant assembly to create an electric field of sufficient intensity between the second pair of electrodes to maintain the plasma, and delivering power into the plasma from the oscillating output signal.

Yet another aspect of the invention is a method of operating a surgical instrument having first and second pairs of electrodes, the electrodes of each pair being connected to different output terminals of a power output device which generates an oscillating WO 01/62169 PCT/GB01/00767 electrical output signal, the method comprising the steps of: operating the power output n ~device. to apply an oscillating electrical signal to the first pair of electrodes; applying the 00 oscillating electrical output signal to the first pair of electrodes; causing resonance of a first resonant assembly of which the first pair of electrodes forms a part, and creating an k 5 electric field during resonance of the first resonant assembly; passing gas through the 00 electric field, and forming, by virtue of interaction between the electric field and the gas, a plasma; subsequent to the formation of a plasma, applying the 'oscillating electrical output signal to the second pair of electrodes and causing resonance of a second resonant assembly of which the second pair of electrodes form* a part, and maintaining the plasma by delivering into the plasma via the second pair of electrodes, power from the oscillating output signal. The oscillating output-signal may remain substantially constant. The first and second pairs of electrodes may be distinct, or they may have an electrode common to both. The electric field is preferably formed between the first pair of electrodes, but may be formed between an electrode of the first pair of electrodes and an electrode of the second pair of electrodes, in which case the electric field may be formed between two electrodes, both of which are connected to the same output terminal of the power output device.

As a result the preferred method, the plasma causes necrosis of living epidermal cells and vaporisation of dead epidermal cells, and where required, produces effects in the dermis.

Embodiments of the invention will now be described, by way of example and with reference to the accompanying drawings, in which: Figure 1 is a schematic drawing illustrating the principle underlying a surgical system for skin resurfacing according to the present invention; Figure 2 is a longitudinal cross-section of a surgical instrument for use in a system in accordance with the present invention; Figure 3 is a detail of Figure 2; SUBSTITUTE SHEET (RULE 26) WO 01/62169 PCT/GB01/00767 12 Figure 4 is a schematic illustration of a generator used in conjunction with the instrument of Figs. 2 and 3; 00 Figure 5 is a graph showing reflected power as a function of operating frequency; 00 Figure 6 is a cross-section showing a modification of part of the instrument shown in Figure 3; Figure 7 is a schematic drawing of an alternative generator including a magnetron; Figure 8 is a more detailed block diagram of a generator including a magnetron; Figure 9 is a circuit diagram of an inverter unit of the generator of Figure 8; Figure 10 is a graph illustrating the switch-on characteristics of the magnetron in the generator of Figure 8; Figure 11 is a block diagram of an outer power control loop of the generator of Figure 8; Figure 12 is a block diagram of intermediate and inner power control loops of the generator of Figure 8; Figure 13 is a cross section of a UHF isolator forming part of the generator of Figure 8; Figure 14 is a section through an embodiment of instrument suitable for use with the generator of Figure 7; Figure 15 is a graph of reflected power versus frequency for the instrument of Figure 14 when employed with the generator of Figure 7; WO 01/62169 PCT/GB01/00767 S13 t c N Figure 16 is a section through a further embodiment of instrument; 00o Figure 17 is a graph of reflected power versus frequency in the instrument of Figure 16; V 5 Figure 18 is a schematic illustration of a further embodiment of instrument.

00 C, Figure 19 is a cut-away perspective view of another alternative instrument; and Figure 20 is a longitudinal cross-section of part of the instrument of Figure 19.

Referring to Figure 1, the principle of operation of embodiments of the invention will now be described. A surgical system comprises a generator 4 which includes a power output 6, typically in the form of an oscillator and an amplifier, or a thermionic power device, and a user interface 8 and a controller 10. The generator produces an output which is coupled via a feed structure including a cable 12 to an electrode 14 of an instrument 16. The system further includes a supply 18 of gas, which is supplied to the instrument by means of a pipe 20. The gas is preferably a gas that enables relatively high energy to be delivered to the tissue per unit energy delivered into the gas at the instrument. Preferably the gas should include a diatomic gas (or gas having more than two atoms), for example, nitrogen, carbon dioxide or air. In use, the generator operates to establish an electric field in the region of the tip 22 of the electrode. Gas from the supply 18 is passed through the electric field. If the field is sufficiently strong, it will have the effect of accelerating free electrons sufficiently to cause collisions with the gas molecules, the result of which is either the dissociation of one or more electrons from the gas molecules to create gaseous ions, or the excitation of electrons in the gas molecules to higher energy states, or dissociation of molecules into constituent atoms, or the excitation of vibrational states in the gaseous molecules. The result in macroscopic terms is the creation of a plasma 24 which is hot. Energy is released from the plasma by way of recombination of electrons and ions to form neutrally charged atoms or molecules and the relaxation to lower energy states from higher energy states.

Such energy release includes the emission of electromagnetic radiation, for example, as light, with a spectrum that is characteristic of the gas used. The temperature of the SUBSTITUTE SHEET (RULE 26) WO 01/62169 14PCT/GBO1/00767 plasma depends upon the nature of the gas and the amount of power delivered to the gas from the electric field the amount of energy transferred to a given quantity of gas).

00 c-I in the preferred embodiment, a low-temperature plasma is formed in nitrogen. This is also known in the art as a Lewis-Rayleigh Afterglow and energy storage by the plasma is dominated by vibrational states of the gaseous molecule and elevated states of 00 c-i electrons still bound to molecules (known as 'Metastable states' because of their relatively long lifetime before decay to a lower energy states occurs).

N- 10 In this condition the plasma will readily react, that is, give energy up due to collision, with other molecules. The plasma emits a characteristic yellow/orange light-with a principle wavelength of about 580 nm.

The relatively long-lived states of the plasma is an advantage in that the plasma still contains useful amounts of energy by the time it reaches the tissue to be treated.

The resulting plasma is directed out of an open end of the instrument and towards the tissue of a patient, to cause modification or partial or total removal thereof.

Upon impact, the nitrogen plasma penetrates a short distance into the tissue and rapidly decays into a low energy state to reach equilibrium with its surroundings. Energy is transferred through collisions (thus heating the tissue) and emission of electromagnetic energy with a spectrum typically extending from 250 (yellow light) to 2500 nm (infr-ared light). The electromagnetic energy is absorbed by the tissue with consequent heating.

Where the system is employed for the purpose of skin resurfacing, there are a variety of skin resurfacing effects which may be achieved by the application of a, plasma to the sin, and different effects are achieved by delivering different amounts of energy to, the 3 0 skin for different periods of time. The system operates by generating a plasma in short pulses. The various combinations of these parameters result in different skin resurfacing effects. For example, applying relatively high power in extremely short pulses over WO 01/62169 PCT/GB01/00767 an extremely short period of time) will result in the virtual instantaneous vaporisation of an uppermost layer of the epidermis dissociation into tiny fragments, which in -n this situation are usually airborne). The high power delivery results in the vaporisation 00 C1 of the tissue, while the short time period over which energy is delivered prevents deeper penetration of thermally induced tissue damage. To deliver high power levels to the tissue, a high temperature plasma is required, and this can be obtained by delivering 00 c-i energy at a high level into a given quantity of gas high energy over a short period N- of time, or high power) from the electric field. It should be noted that the temperature of the plasma decreases with increasing distance from the electrode tip, which means cI 10 that the stand-off distance of the instrument from the surface of the skin will affect the temperature of the plasma incident upon the skin and, therefore, the energy delivered to the skin over a given time period. This is a relatively superficial skin resurfacing treatment, but has the advantage of extremely short healing times.

A deeper effect, caused by thermal modification and eventual removal of a greater thickness of tissue, may be obtained by delivering lower levels of power to the skin but for longer periods of time. A lower power level and, thus, a lower rate of en ergy delivery avoids substantially instantaneous vaporisation of tissue, but the longer period over which power is delivered results in a greater net energy delivery to the tissue and deeper thermal effects in the tissue. The resultant btistering of the skin and subsequent tissue necrosis occur over a substantially longer period of time than in the case of a superficial treatment. The most deeply penetrative skin resurfacing, which may involve an stepwise process whereby several "passes" are made over the tissue so that a given area of skin is exposed to the plasma on two or more occasions, can penetrate sufficiently deeply to cause the denaturing of collagen in the dermnis. This has applicability in the removal or remodelling of scar tissue (such as that caused by acne, for example), and reduction of wrinkles. Depilation of the skin surface may also be achieved.

The system and methods of the present invention may also be used to debride wounds or ulcers, or in the treatment of a variety of cutaneous or dermatological disorders.

including: malignant tumnours (whether primarily or secondarily involving the skin); WO 01/62169 PCT/GB01/00767 to 16 port wine stains; telangiectasia; granulomas; adenomas; haemangioma; pigmented Slesions; nevi; hyperplastic, proliferative and inflammatory fibrous papules; rhinophyma; _n seborrhoeic heratoses; lymphocytoma; angiofibromata; warts; neurofibromas; 00 CN condylomata; keliod or hypertrophic scar tissue.

C The system and methods of the present invention also have applicability to numerous 00 Sother disorders, and in this regard the ability to vary the depth of tissue effect in a very N controlled manner is particularly advantageous. For example, in a superficial mode of O treatment, tissue surfaces of the body other than skin may be treated, including the C- 10 linings of the oropharynx, respiratory and gastroimtestinal tracts in which it is desirable to remove surface lesions, such as leudoplakia (a superficial pre-cancerous lesion often found in the oropharynx), while minimising damage to underlying structures. In addition, the peritoneal surface of organs and structures within the abdomen may be a site for abnormal implantation of endometrial tissue derived from the uterus. These are often constituted by superficial plaques which may also be treated using the invention set in a superficial mode of treatment. If such lesions involve deeper layers of tissue then these may be treated my multiple applications using the invention or the depth of tissue effect may be adjusted using the control features included within the invention and which are further described herein.

By employing a system or. method in accordance with the invention with a setting designed to achieve a deeper effect, tissue structures deep to the surface layer may be treated or modified. Such modification may include the contraction of collagen containing tissue often found in tissue layers deep to the surface layer. The depth control of the system allows vital structures to be treated without, for instance, causing perforation of the structure. Such structures may include parts of the intestine where it is desirable to reduce their volume, such as in gastroplexy (reducing the volume of the stomach), or in instances where the intestine includes abnormal out-pouchings or diverticular. Such structures may also include blood vessels which have become abnormally distended by an aneurysm or varicosisties, common sites being the aortic artery, the vessels of the brain or in the superficial veins of the leg. Apart from these vital structures, musculo-skeletal structures may also be modified where they have WO 01/62169 17PCT/GBO1/00767 become stretched or lax. A hiatus hernia occurs -when a portion of the stomach passes through the crura of the diaphragm which could, for example, be modified using the, _n instrument -such that the aperture for the stomach to pass through is narrowed to a point 00 CI at which this does not occur by contracting the crura. Hernias in other areas of the body may be similarly treated including by modifying collagen-containing structures c-i surrounding the weakness through which the herniation occurs. Such hernias include, 00 NI but are not limited to inguinal and other abdominal hernias.

Various embodiments of system for tissue resurfacing will now be described in further S 10 detail. Referring to Figures 2 and 3, a skin resurfacing instrument 16 has an outer shaft with has a connector 26 at its proximal end, by means of which the instrument may be connected to the output terminals of a generator (described in more detail with reference to Figure usually via a flexible cable, as shown in Figure 1. The instrument also receives a supply of nitrogen at inlet port 32, which is fed initially along an annular conduit 34 formed between shaft 30 and a length of coaxial feed cable and subsequently, via apertures 36 along a flurther sections of annular conduit 38A and 38B. The sections 38A, 38B of annular conduit are formed between a conductive sleeve 50, which is connected to the outer conductor 44 of the coaxial feed cable, and conductive elements 52 and 54 respectively which are connected to the inner conductor 42 of the coaxial feed cable 40. At the distal end of the annular conduit 38B the gas is converted into a plasma under the influence of an oscillating high intensity electric field E between an inner needle-like electrode 60 provided by the distal end of the conductive element 54, and an outer second electrode 70 provided by a part of the sleeve 50 which is adjacent and coextensive with the needle electrode 60. The resultant plasma 72 passes out of an aperture 80 formed in a ceramic disc 82 in the distal end of the instrument largely under the influence of the pressure from the nitrogen supply; the insulating nature of the disc 82 serving to reduce or avoid preferential arcing between the electrodes 60 and The inner electrode 60 is connected to one of the generator output terminals via the conductive elements 52, 54 and the inner conductor 42 of the coaxial feedstructure, and the outer electrode 70 is connected to the other generator output terminal via the PCT/GBO1/00767 WIA MHl/t) i 18 conductive sleeve 50 and the outer conductor 44 of the coaxial feed structure (Waveguides may also be used as the feed structure.) The intensity of the electric field -n between them therefore, oscillates at the output frequency of the generator, which in N this embodiment is in the region of 2450 MHz. In order to generate a plasma from the nitrogen gas, a high intensity electric field is required. In this regard the relatively N pointed configuration of the needle electrode 60 assists in the creation of such a field, because charge accumulates in the region of the tip, which has the effect of increasing the field intensity in that region. However, the creation of a high intensity electric field Srequires a large potential difference between the inner and outer electrodes 60, 70 and, S 10 generally speaking, the magnitude of the potential difference required to create such a field increases with increasing separation of the electrodes. The electric field intensity required to strike a plasma from nitrogen (and thus create a plasma) is in the region of 3 MNewtons per Coulomb of charge, which translated into a uniform potential difference, equates roughly to a potential difference of 3kV between conductors separated by a distance of 1 mm. In the instrument illustrated in Figure 2, the separation between the inner and outer electrodes 60, 70 is approximately 3mm, so that were the field uniform the voltage required to achieve the requisite field intensity would be approximately 10kV. However the geometry of the electrode 60 is such as to concentrate charge in regions of conductor which have a small curvature thereby intensifying the electric field regions adjacent such conductors and reducing the magnitude of potential difference which must be supplied to the electrodes in order to create a field of the required strength. Nonetheless, in practice it is not necessarily desirable to supply a potential difference of sufficient magnitude to the electrodes directly from the generator, because the insulator of the feed structure used to connect the generator output to the electrodes 60, 70 may be subject to breakdown.

In the embodiment described above with reference to Figures 1 to 3, the output voltage of the generator is preferably of the order of 100V. In order to obtain a high enough voltage across the electrodes 60, 70 to strike a plasma, therefore, it is necessary to provide a step-up, or upward transformation of the supply voltage from the generator.

One way of achieving this is to create a resonant structure which incorporates the electrodes 60, 70. If an output signal from the generator is supplied to the resonant WOO01/62169 19 PCT/GBO1/00767 structure (and, therefore, the electrodes) at a frequency which is equal to or similar to it's resonant frequency, the resulting _resonance provides voltage multiplication of the -n generator output signal across the electrodes 60, 70 the magnitude of which is 00 CI determined by the geometry of the structure, the materials used within the structure (e.g.

the dielectric materials), and the impedance of a load. In this instrument the resonant ci structure is provided by a combination of two impedance matching structures 92, 94 the 00 NI function and operation of which will be described in more detail subsequently.

The use of a resonant structure is one way of providing a sufficiently high voltage- N 10 across the electrodes 60, 70 to strike a plasma. For the instrument to be effective, however, it is necessary for the generator to deliver a predetermined and controllable level of power to the plasma, since this affects the extent to which the nitrogen is converted into plasma, which in turn affects the energy which may be delivered to the tissue in the form of heat. In addition it is desirable to have efficient transmission of power from the generator to the load provided by the plasma. As mentioned above, the output frequency of the generator in the present example is in the ultra high frequency (UHF band of frequencies, and lies in the region of 2450 MHz, this being a frequency whose use is permitted for surgical purposes by ISM legislation. At frequencies of this magnitude is appropriate to consider the transmission of electrical signals in the context of such a surgical system as the transmission of electromagnetic waves, and the feed structures for their efficient propagation of taking the form of coaxial or waveguide transmission lines.

In the instrument of Figure 2, the coaxial cable 40 provides the transmission line feed structure from the generator 4 to the instrument 16. The inner and outer conductors 42, 44 of the coaxial feed structure 40 are spaced from each other by an annular dielectric 46. To provide efficient transmission of power from the output of the generator using a transmission line, the internal impedance of the generator is desirably equal to the characteristic impedance of the transmission line. In the present example the internal impedance of the generator is 50n, and the characteristic impedance of the coaxial cable 40 is also 50n. The load provided to the generator prior to-striking plasma is of the order of 5K0C2. Owing to this large difference in impedance between the generator PCT/GB01/00767 WOl 01/62169 PTGO/06 20 impedance and feed structure on the one hand, and the load on the other, delivering power to the load directly from the feed structure will result in substantial losses of power power output from the generator which is not delivered to the load) due to 00 reflections of the electromagnetic waves at the interface between the feed structure and the load. Thus, it is not preferable simply to connect the inner and outer conductors 42, 44 of the coaxial cable 40 to the electrodes 60, 70 because of the resultant losses. To 00i mitigate against such losses it is necessary to match the relatively low characteristic N- impedance of the cable 40 and the relatively high load impedance, and in the present embodiment this is achieved by connecting the load to the feed structure (whose N- 10 characteristic impedance is equal to that of the generator imapedance) via an impedance transformer provided by two sections 92, 94 of transmission line having different characteristic impedances to provide a transition between the low characteristic impedance of the coaxial feed structure and the high impedance load. The matching structure 92 has an inner conductor provided by the conductive element 52, which has a relatively large diameter, and is spaced from an outer conductor provided by the conductive sleeve 50 by means of two dielectric spacers 56. As can be seen from Figure 2, the spacing between the inner and outer conductors 52, 50 is relatively small, as a result of which the matching structure 92 has a relatively low characteristic impedance (in the region of 892 in this embodiment). The matching structure 94 has an inner conductor provided by the conductive element 54, and an outer conductor provided by the sleeve 50. The inner conductor provided by the conductive element 54 has a significantly smaller diameter than conductive element 52, and the relatively large gap between the inner and outer conductors 50, 54 results in a relatively high characteristic impedance (8Mf) of the matching structure 94.

Electrically, and when operational, the instrument may be thought of as four sections of different impedances connected in series: the impedance ZF of the feed structure provided by the coaxial cable 40, the impedance of the transition structure provided by the two series connected matching structures 92, 94 of transmission line, having impedances Z 92 and Z94respectively, and the impedance ZL of the load provided by the plasma which forms in the region of the needle electrode 60. Where each of the sections 92, 94 of the matching structure has an electrical length equal to one. quarter PCT/GBO 1/00 767 117n n 1114151 AQ wavelength at 245 Wiz, the following relationship between impedances applies when the impedance of the load and the feed structure are matched: 00 CIZJ ZF Z9/ Z 9 2 c-i The impedance.ZL of the load provided to the generator by the-plasma is in the region of 00 c-i 5kI; the characteristic impedance Z4 of the coaxial cable 40 is 50fl, meaning that the NI ratio Z 9 2 42 100 and so Z 9 4/ Z92= 10. Practical values have been found to be for Z 94 the impedance -of the matching structure section 94, and 8CI for Z 92 the N- 10 impedance of matching structure section 92.

The requirement that each of the matching structures 92, 94 are one quarter wavelength long i's an inherent part of the matching process. Its significance lies in that at each of the interfaces between different characteristic impedances there will be reflections of the electromagnetic waves. By making the sections 92, 94 one quarter wavelength long, the reflections at e.g. the interface between the coaxial feed structure 40 and the section 92 will be in anti phase with the reflections at the interface between the section 92 and the section 94, and so will destructively interfere; the same applies to the reflections at the interfaces between the sections 92 and 94 on the one hand and the reflections at the interface between section 94 and the load on the other. The destructive interference has the effect of minimisWingf power losses due to reflected waves at interfaces betwveen differing impedances, provided that the net reflections of the electromagnetic waves having nominal phase angle of 0 radians are of equal intensity to the net reflections having a nominal phase angle of 7r radians (a condition which is satisfied by selecting appropriate impedance values for the different sectons 92, 94).

Referring now to Figure 4, an embodiment of generator used in conjunction with the embodiment of instrument described above comprises a power supply unit 100, which receives an alternating current mains input and produces a constant DC voltage across a pair of output terminals 102, which are connected to a fixed gain solid state power amplifier 104. The power amplifier 104 receives an input signal from a tunable WO 01/62169 PCT/GBO1/00767 22 N ~oscillator 106 via a variable attenuator 108. The power amplifier .104, tunable oscillator 106, and variable attenuator 108 may be thought of as an AC power output OCn device. Control of the frequency of oscillation of the oscillator, and the attenuator 108 is performed by means of voltage outputs and Vi. from a controller 110 (the operation of which will subsequently be described in more detail) in depe ndence upon CIfeedback signals, and input signals from a user interface 112. The output of the 00 amplifier 104 passes through a circulator 114, and then sequentially through output and N return directional couplers 116,118 which in conjunction with detectors 120,122 provide an indication of the power output P 0 ,A by the generator and the power reflected N 10 Pref back into the generator respectively. Power reflected back into the generator passes through the circulator 114 which directs the reflected power into an attenuating resistor 124, whose impedance is chosen so that it provides a good match with the feed structure 40 50 f2). The attenuating resistor has the function of dissipating the reflected power, and does this by converting-the reflected power into heat.

The controller 110 receives input signals 'use, P. PRe, Gnw 0 from the user interface, the output and reflected power detectors 120;122 and a gas flow regulator 130, respectively, the latter controlling the rate of delivery of nitrogen. Each of the input signals passes through an analogue to digital converter 132 and into a microprocessor 134. The microprocessor 134 operates, via a digital to analogue converter 136 to control the value of three output control parameters: Vt. which controls the tuning output frequency of the oscillator 106; Vg., which controls the extent of attenuation within the variable attenuator 108 and therefore effectively the gain of the amplifier 104; and G 50 the rate of flow of gas through the instrument, with the aim of optimising the performance of the system. This optimisation includes tuning the output of the oscillator 106 to the most efficient frequency of operation, i.e. the frequency at which most power is transferred into the plasma. The oscillator 106 may generate output signals throughout the ISM bandwidth of 2400-25001V.E-z To achieve optimisation of,, the operating frequency, upon switch-on of the system, the microprocessor 134 adjusts the Vgi,, output to cause the attenuator to reduce the generator output power to an extremely low level, and sweeps the frequency adjusting voltage, output Vt. from its lowest to its highest level, causing the oscillator to sweep corres pondingly through its WO 01/62169 PCT/GBO1/00767 23 N lONflz output bandwidth. Values of reflected power P,,f are recorded by the microprocessor 134 throughout the bandwidth of the oscillator, and Figure 5 illustrates 00 atypical relationship between output frequency of the generator and reflected power P It can be seen from Figure 5 that the lowest level of reflected power occurs at a frequency which corresponds to the resonant frequency of the resonant structure C~I within the instrument 16. Having determined from an initial low power frequency 00 sweep the value of the most efficient frequency at which power may be delivered to the C1 electrode, the microprocessor then tunes the oscillator output frequency to the frequency fre. In a modification, the controller is operable via a demand signal from the user interface (the demand signal being by a user via the user interface) to perform an initial frequency sweep prior to connection of the instrument 16 to the generator. This enables the controller to map the feed structure between the power output device. and the instrument to take account of the effect of any mismatches between discrete sections of the feed structure etc., which have an effect upon the attenuation of power at various frequencies. This frequency mapping may then be used by the controller 110 to ensure that it takes account only of variations in the attenuation of power with frequency which are not endemically present as a result of components of the generator and/or feed structure between the generator and the instrument.

The operational power output of the power output device is set in accordance with the input signal to the controller 110 from the user interface 112, and which represents a level of demanded power set in the user interface 112 by an operator. The various possible control modes of the generator depend upon the user interface 112, and more particularly the options which the user interface is programmed to give to a user. For example, as mentioned above, there are a number of parameters which may be adusted to achieve different tissue effects, such as power level, gas flow rate, the length of the time period (the treatment pulse width) for which the instrument is operational to generate plasma over a particular region of the skin, and the stand-off distance between the aperture at the distal end of the instrument 16 and the tissue. The user interface 112 offers the user a number of alternative control modes each of which will allow the user to control the system in accordance with differing demand criteria. For example, a preferred mode of operation is one which mimics -the operational control of laser WO 01/62169 PCT/GB01/00767 24 N resurfacing apparatus, since this has the advantage of being readily understood by those currently practising in the field of skin resurfacing. In the laser resurfacing mode of 00 operation, theuser interface invites a user to select a level of energy delivery per surface CI area (known in the art as "fluence") per pulse of the instrument. When operating in this mode, the microprocessor sets Vpi so that the power output device has a pre-set Ni constant output power, typically in the region of 160W, and the input signal I.,e from 00 Ni the user is converted into a demanded time period represented by the pulse width, NI calculated from the required energy per treatment pulse -and the constant level of output power. However, the voltage signal Vg~i is also used to switch the generator output on CI 10 and off in accordance with input signals from the user interface. Thus, for example, when the user presses a button on the handle of the instrument (not shown), a signal sent by the user interface 112 to the microprocessor 134, which then operates to produce a pulse of predetermined width 20ms) by altering Vi, from its quiescent setting, at which the attenuator output 108 is such that there is virtually no signal for the amplifier 104 to amplify, and the generator output is negligible, to a value corresponding to the pre-set constant output power for a period of time equal to the demanded pulse width. This will have the effect of altering the amplifier output from its quiescent level to the pre-set constant output power level for a time period equal to the demanded pulse width, and ultimately of creating a plasma for such a time period.

By altering the pulse width according to user input, pulses of selected energies can be delivered, typically, in the range of from 6ms to 2Oms. These pulses can be delivered on a "one-shot" basis or as a continuous train of pulses at a predetermined pulse frequency.

The surface area over which the energy is delivered will typically be a function of the geometry of the instrument, and this may be entered into the user interface in a number of ways. In one embodiment the user interface stores surface area data for each different geometry of instrument that may be used with the generator, and the instrument in operation is either identified manually by the user in response to a prompt by the user interface 112, or is identified automatically by virtue of an identification artefact on the instrument which is detectable by the controller (which may require a_ connection between the controller and the instrument). Additionally the surface area 117n ni Ica PflT/GRO1 Iflfl 767 will also be a function of the stand-off distance of the instrument aperture 82 from the ;Z tissue, since the greater the stand-off the cooler the plasma will be by the time it reaches 00 the surface, and also, depending on the instrument geometry, the instrumtent may produce a divergent beam. ]Instruments may be operated with a fixed stand-off distance, for example by virtue of a- spacer connected to the distal. end of the instrument, N in which case the surface area data held within the user interface will automatically take account of the stand-off distance. Alternatively the instruments may be operated with a N variable stand-off distance, in which case the stand-off distance must be measured, and fed back to the controller to enable it to be taken into account in the surface area calculation.

A further parameter which can affect the energy per unit area is the gas flow rate, and in one preferred embodiment the controller preferably contains a look-up table 140 of flow rate Gn,, against generator output power for a variety of constant output power levels, and the flow rate for a given output power level is adjusted accordingly. In a further modification the gas flow rate may be adjusted dynamically to take account of variations in stand-off distance, for example, and is preferably switched off between pulses.

As described above, for optimum ease of use in the resurfacing mode, the power output device will ideally deliver a constant output power over the entire duration of an output, since this facilitates easy control of the total energy output in a given pulse. With a constant power output, the controller is able to control the total energy delivered per pulse simply switching the power output device on (by the means of the signal V) for a predetermined period of time, calculated on the basis of the output power level. It may, however, in practice be the case that the power output varies to a significant extent with regard to the accuracy to within which it is required to determine- to the total energy delivered per output pulse. In this case the microprocessor is programmed to monitor the output power by integrating (from detector 120) with respect to time, and switching the power output device off by altering Vpm to return the variable attenuator 108 to its quiescent setting.

WO 01/62169 PCT/GBOI/00767 26 CI A further complication in the control of the operation of the system arises in that the ;Z creation of a plasma-at aperture 80 amounts in simplistic electrical terms to extending 0C) the length of the needle electrode 60, since the plasma is made up of ionised molecules, N and is therefore conductive. This has the effect of lowering the resonant frequency of the resonant structure, so that the optimum generator output at which power may be N delivered to the instrument for the purpose of striking a plasma is different to the 00 optimum frequency at which power may be delivered into an existent plasma. To deal N with this difficulty, the microprocessor 134 is programmed continuously to tune the oscillator output during operation of the system. In one preferred mode the technique of "dither" is employed, whereby the microprocessor 134 causes the oscillator output momentarily to generate outputs at frequencies 4Mh below and above the current output frequency, and then samples, via the reflected power detector 122 the attenuation of power at those frequencies. In the-event that more power is attenuated at one of those frequencies than at the current frequency of operation, the microprocessor re-tunes the oscillator output to that frequency at which greater power attenuation occurred, and then repeats the process. In a further preferred mode of operation, the microprocessor 134 records the magnitude of the shift in resonant frequency when a plasma is struck, and in subsequent pulses, shifts the frequency of the oscillator 106 correspondingly when the system goes out of tune when a plasma is struck), whereupon -the technique of dither is then employed. This has the advantage of p roviding a more rapid re-tuning of the system once a plasma is first struck.

As mentioned above, in the embodiment shown in Figure 4, the amplifier 104 is typically set to produce around 160W of output power. However, not all of this is delivered into the plasma. Typically power is also lost through radiation from the end of the instrument in the form of electromagnetic waves, from reflection at connections between cables, and in the form of dielectric and conductive losses the attenuation of power within the dielectrics which form part of the transmission line). In the instrument design of Figs. 2 and 3 it is possible to take advantage of dielectric loss by virtue of feeding the gas through the annular conduits 38AB of the sections 92, 94 of the impedance matching structure; in this way, dielectric power losses into the gas serve to heat up the gas, making it more susceptible to conversion into a plasma.

I

WO 01/62169 PCT/GB01/00767 27 a Referring now to Figure 6, in a modification of the instrument 14 shown in Figures 2 c' and 3, an end cap 84, made of conducting material, is added to the distal end of the 00 instrument 14. The end cap is electrically connected to the sleeve 50 and is, therefore, part of the electrode 70. The provision of the end cap 84 has several beneficial effects.

C Firstly, since the electric field preferentially extends from conductor to conductor, and the end cap 84 effectively brings the electrode 70 closer to the tip of the needle C, electrode 60, it is believed that its geometry serves to increase the intensity of the electric field in the region through which the plasma passes as it is expelled from the l 10 instrument, thereby accelerating ions within the plasma. Secondly, the physical effect of the end cap 84 on the plasma is that of directing the plasma in a more controlled manner. Thirdly the outer sheath currents on the instrument the current travelling up the outside of the instrument back towards the generator) are reduced significantly with the end cap 84, since the electrode 60, even when electrically extended by a plasma, extends to a lesser extent beyond the end of the instrument, and so losses of this nature are reduced.

In an alternative, and simpler embodiment of system operating at an output frequency in the range of 2450MHz, a power output device capable of delivering significantly more power than a solid state amplifier may be employed. With increased available power from the power output device, the required voltage step-up is lower and so the role played by resonant structures (for example) decreases.

Accordingly, and referring now to Figure 7, an alternative generator has a high voltage rectified AC supply 200 connected to a thermionic radio frequency power device, in this case to a magnetron 204. The magnetron 204 contains a filament heater (not shown) attached to the magnetron cathode 204C which acts to release electrons from the cathode 204C, and which is controlled by a filament power supply 206; the greater the power supplied to the filament heater, the hotter the cathode 204C becomes and therefore the greater the number of electrons supplied to the interior of the magnetron.

The magnetron may have a permanent magnet to create a magnetic field in the cavity surrounding the cathode, but in this embodiment it has an electromagnet with a number WO 01/62169 PCT/GB01/00767 28 N of coils (not shown) which are supplied with current from an electromagnet power Ssupply 208. The magnetron anode 204A has a series of resonant chambers 210 c' arranged in a circular array around the cathode 204C and its associated annular cavity.

C

Free electrons from the cathode 204C are accelerated radially toward the anode 204A under the influence of the electric field created at the cathode 204C by the high voltage N supply 200. The magnetic field from the electromagnet (not shown) accelerates the electrons in a direction perpendicular to that of the electric field, as a result of which the electrons execute a curved path from the cathode 204C towards the anode 204A where they give up their energy to one of the resonant chambers 210. Power is taken from the resonant chambers 210 by a suitable coupling structure to the output terminal The operation of magnetron power output devices is well understood per se and will not be described further herein. As with the generator of Figure 4, a circulator (not shown in Figure 7) and directional couplers may be provided.

The magnetron-type power output device is capable of generating substantially more power than the solid state power output device of Figure 4, but is more difficult to control. In. general terms, the output power of the magnetron increases: as the number of electrons passing from the cathode to the anode increases; with increased supply voltage to the cathode (within a relatively narrow voltage band); and with increased magnetic field within the magnetron. The high voltage supply 200, the filament supply 206 and the electromagnetic supply 208 are, therefore, all controlled from.the controller in accordance with input settings from the user interface, as in the case of the solid state amplifier power output device. Since the magnetron is more difficult to control, it is less straightforward to obtain a uniform power output over the entire duration of a treatment pulse (pulse of output power). In one method of control, therefore, the controller operates by integrating the output power with respect to time and turning the high voltage supply 200 off (thus shutting the magnetron off) when the required level of energy has been delivered, as described above. Alternatively, the output of the cathode supply may be monitored and controlled to provide control of output power by controlling the current supplied, the cathode/anode current being proportional to output power.

WO 01/62169 PCT/GB01/00767 29 N- A further alternative generator for use in a system in accordance with the invention, and employing a magnetron as the power output device, will now be described with -n reference to Figure 8. As in the embodiment of Figure 7, power for the magnetron 204 00 CI is supplied in two ways, firstly as a high DC voltage 200P for the cathode and as a filament supply 206P for the cathode heater. These power inputs are both derived, in N- this. embodiment, from a power supply unit 210 having a mains voltage input 211. A 00 CI first output from the unit 210 is an intermediate level DC output 210OP in the region of NI 200 to 400V DC (specifically 350V DC in this case) which is fed to a DC converter in the form of a inverter unit 200 which multiplies the intermediate voltage to a level in C .10 excess of 2kV DC, in this case in the region of 4kV.

The filament supply 206 is also powered from the power supply unit 210. Both the high voltage supply represented by the invert er unit 200 and the filament supply 206 are coupled to a CPU controller 110 for controlling the power output of the magnetron 204 in a manner which will be described hereinafter.

A user interface 112 is coupled to the controller 110 for the purpose of setting the power output mode, amongst other functions., The magnetron 204 operates in the UHF band, typically at 2.475 Gllz, producing an output on output line 204L which feeds a feed transition stage 213 converting the waveguide magnetron output to a coaxial S0On feeder, low frequency AC isolation also being provided by this stage. Thereafter, circulator 114 provides a constant 50n2 load impedance for the output of the feed transition stage 213. Apart from a first port coupled to the transition stage 213, the circulator 114 has a second port 1 14A coupled to a UHF isolation stage 214 and hence to the output terminal 216 of the generator. A third port 1 14B of the circulator 114 passes power reflected back from the generator output 216 via port 114A to a resistive reflected power dump 124. Forward and reflected power sensing connections 116 and 118 are, in this embodiment, associated with the first and third circulator ports 114A and 1 14B respectively, to provide sensing signals for the controller 110.

PCT/GR01 /00767 InWU UL(LiyPTGO/06 The controller 110 also applies via line 218 a control signal for opening and closing a ;Z gas supply valve 220 so that nitrogen gas is supplied from source 130 to a gas supply 0C) outlet 222. A surgical instrument (not shown in Figure 8) connected to the generator N has a low-loss coaxial feeder cable for connection to UHF output 216 and a supply pipe for connection to the gas supply outlet 222.

00 it is important that the effect produced on tissue is both controllable and consistent, which means that the energy delivered to the skin should be controllable and consistent during treatment. For treatment of skin or other surface tissue it is possible for apparatus in accordance with the invention to allow a controlled amount of energy to be delivered to a small region at a time, typically a circular region with a diameter of about 6mim. As mentioned above, to avoid unwanted thermal affects to a depth greater than required, it is preferred that relatively high powered plasma delivery is used, but pulsed for rapid treatment to a limited depth. Once a small region is treated, typically with a single burst of radio frequency energy less than lO0ms in duration (a single "treatment pulse"), the user can move the instrument to the next treatmnent region before applying energy again. Alternatively, plural pulses can be delivered at a predeterm3ined rate.

Predictability and consistency of affect can be achieved if the energy delivered to the tissue per pulse is controlled and consistent for a given control setting at the user interface. For this reason, the preferred generator produces a known power output and switches the radio frequency power on and off accurately. Generally, the treatment pulses are much shorter than 1lOOms, e.g. less than 30Oms duration, and can be as short as 2ms. When repeated, the repetition rate is typically in the range of from 0. 5 or 1 to or The prime application for magnetron devices is for dielectric heating. Power control occurs by averaging over time and, commonly, the device is operated in a discontinuous mode at mains frequency (50 or 60Hz). A mains drive switching circuit is applied to the primary winding of the step-up transformer, the secondary winding of which is applied to the magnetron anode and cathode terminals. Commonly, in addition, the filament power supply is taken from an auxiliary secondary winding of the step-up transformer. This brings the penalty that the transient responses of the heater and WO 01/62169 PCT/GBOI/00767 31 anode-cathode loads are different; the heater may have a warm-up time Of ten to thirty seconds whereas the anode-cathode response is less tfln lWAS, bringing unpredictable OC) power output levels after a significant break. Due to the discontinuous power feed at mains frequency, the peak power delivery may be three to six times the average Power delivery, depending on the current smoothing elements in the powei supply. It will be NI appreciated from the points made above that such operation of a magnetron is 00 CI inappropriate for tissue resurfacing. The power supply unit of the preferred generator in N accordance with the present invention provides a continuous power feed for the radio frequency power device the magnetron in this case) which i's interrupted only by the applications of the treatment pulses. In practice, the treatment pulses are injected into a power supply stage which has a continuous DC supply of, at least 200Y.

The UHF circulator coupled to the magnetron output adds to stability by providing a constant inpedance load.

In the generator illustrated in Figure 8, the desired controllability and consistency of effect is achieved, firstly, by use of an independent filament supply. The controller 110 is operated to energise the magnetron heater which is then allowed to reach a steady state before actuation of the high voltage supply to the magnetron cathode.

Secondly, the high voltage power supply chain avoids reliance on heavy filtering and forms part of a magnetron current control loop having a much faster response than control circuits using large shunt filter capacitances. In particular, the power supply chain includes, as explained above with reference to Figure 8, an inverter unit providing a continuous controllable current source applied at high voltage to the magnetron anode and cathode terminals. For maximum efficiency, the current source is provided by a switched mode power supply operating in a continuous current mode. A series current-smoothing inductance in the inverter supply is fed from a buck regulator device.

Referring to Figure 9, which is a simplified circuit diagram, the buck regulator comprises a MOSFET 230, the current-smoothing inductor 232 (here in the region of 5O0juH), and a diode 234. The buck regulator, as shown, is connected between the 350V DC rail of the PSU output 210P (see Figure 8) and a bridge arrangement of four switching MOSFETs 236 to 239, forming an inverter stage. These transistors 236 to WO 01/62169 PCT/GBO1/00767 32 N- 239 are connected in an H-bridge and are operated in anti phase with slightly greater than 50% ON times to ensure -a continuous supply current to the primary windinig 240P -n of the step-up transformer 240. A bridge rectifier 242 coupled across the secondary 00 c-I winding 240F and a relatively small smoothing capacitor 244, having a value less thani or equal to 22QLLS yields the required high voltage supply 200P for the magnetron.

00 N- By pulsing the buck transistor 230 as a switching device at a frequency significantly c-I greater than the repetition frequency of the treatment pulses, which is typically between 1 and 10Hz or 15Hz, and owing to the effect of the inductor 232, continuous current cI 10 delivery at a power level in excess of 1kW can be provided for the magnetron within each treatment pulse. The current level is controlled by adjusting the mark-to-space ratio of the drive pulses applied to the gate of the buck transistor 230. The same gate terminal is used, in this case, in combination with a shut-down of the drive pulses to the inverter stage transistors, to de-activate the magnetron between treatment pulses.

It will be appreciated by the skilled man in the art that single components referred to in this description, e.g. single transistors, inductors and capacitors, may be replaced by multiple such components, according to power handling requirements, and so on.

other equivalent structures can also be used.

The pulse frequency of the buck transistor drive pulses is preferably greater than 16kHz for inaudability (as well as for control loop response and minimum current ripple) and is preferably between 40kHz and 150kHz. Advantageously, the inverter transistors 236 to 239 are pulsed within the same frequency ranges, preferably at half the frequency of the buck transistor consistency between successive half cycles applied to the step-up transformer 240.

Transformer 240 is preferably ferrite cored, and has a turns ratio of 2:15.

As will be seen from Figure 10, which shows the output voltage on output 200P and the power output of the magnetron at the commencement of a treatment pulse, start-up can be achieved in a relatively* short time, typically less than 300,us, depending on the vale WO 01/62169 PCT/GB01/00767 33 2 of the capacitor 244. Switch-off time is generally considerably shorter. This yields the advantage that the treatment pulse length and, as a result, the energy delivered per c' treatment pulse (typically 2 to 6 joules) is virtually unaffected by limitations in the Cq power supply for the magnetron. High efficiency (typically 80%) can be achieved for the conversion from a supply voltage of hundreds of volts (on supply rails 228 and 229) to the high voltage output 200P (see Figure 9).

00 N, Consistent control of the magnetron power output level, with rapid response to Schanging load conditions, can now be achieved using feedback control of the 10 mark-to-space ration of the drive pulses to the buck transistor 230. Since the power output from the magnetron is principally dependent on the anode to cathode current, the power supply control servos are current-based. These include a control loop generating an error voltage from a gain-multiplied difference between measured anode to cathode current and a preset output-power-dependent current demand. The voltage error is compensated for the storage inductor current and the gain multiplied difference determines the mark-to-space ratio of the driving pulses supplied to the buck transistor 230, as shown in the control loop diagrams of Figures 11 and 12.

A current-based servo action is also preferred to allow compensation for magnetron ageing resulting in increasing anode-to-cathode impedance. Accordingly, the required power delivery levels are maintained up to magnetron failure.

Referring to Figures 8 and 11, variations in magnetron output power with respect to anode/cathode current, e.g. due to magnetron ageing, are compensated in the controller 110 for by comparing a forward power sample 250 (obtained on line 116 in Figure 8) with a power reference signal 252 in comparator 254. The comparator output is used as a reference signal 256 for setting the magnetron anode current, this reference signal 256 being applied to elements of the controller 110 setting the duty cycle of the drive pulses to the buck transistor 230 (Figure represented generally as the "magnetron principal power supply" block 258 in Figure 11.

PCT/GBOI/00767 Referring to Figure 12, that Principal Power supply block 258 has outer and inner control loops 260 and 262. The anode current reference signal 256 is compared in 00n comparator 264 with an actual measurement 266 of the current delivered to the magnetron anode to produce an error voltage This error voltage is passed through a gain stage 268 in the controller 110 and yields a pulse width modulation

(PWM)

CI reference signal at an input 270 to a fur-ther comparator 272, where it is compared with 00 CI a representation 274 of the actual current in the primary winding of the step-up CI transformer (see Figure This produces a modified (PWM) control signal on line 276 which is fed to the gate of the buck transistor 230 seen in Figure 9, thereby regulating the transformer primary current through operation of the buck stage 278.

The inner loop 262 has a very rapid response, and controls the transformer primary current within each cycle of the 40kHz drive pulse waveform fed to the gate terminal 276 of the buck transistor 230. The outer loop 260 operates with a longer time constant during each treatment pulse to control the level of the magnetron anode/cathode current.

It will be seen that the combined effect of the three control loops appearing in Figures 11I and 12 is consistent and accurate control of anode current and output power over a full range of time periods, i.e. short term and long term output power regulation is achieved.

The actual power setting applied to the UHF demand input 252 of the outermost control loop, as shown in Figure 11, depends on user selection for the required severity of treatment. Depth of effect can be controlled by adjusting the duration of the treatment pulses, 6 to 2Oms being a typical range.

The control connection between the controller 110 and the high voltage power supply appears in Figure 8 as a control and feedback channel 280.

It is also possible to control heater of current by a demand/feedback line 282, e.g. to obtain the preferred steady state heater temperature.

WO 01/62169 PCT/GB01/00767 N In the case of the magnetron having an electromagnet, variation of the magnetic field Sstrength applied to the magnetron cavity provides another control variable (as shown in Figure e.g. should lower continuous power levels be requires.

00 Return loss monitored by line 116 in Figure 8 is a measure of how much- energy the load reflects back to the generator. At perfect match of the generator to the load, the return loss is infinite, while an open circuit or.short circuit load produces a zero return N, loss. The controller may therefore employ a return loss sensing output on line 116 as a 0 means of determining load match, and in particular as a means of identifying an N 10 instrument or cable fault. Detection of such a fault may be used to shut down the output power device, in the case of the magnetron 204.

The UHF isolation stage 214 shown in Figure 8 is illustrated in more detail in Figure 13. As a particular aspect of the invention, this isolation stage, which is applicable generally to electrosurgical including tissue resurfacing) devices operating at frequencies in the UHF range and upwards, has a waveguide section 286 and, within the waveguide section, spaced-apart ohmically separate launcher and collector probes 288, 290 for connection to the radio frequency power device (in this case the magnetron) and an output, specifically the output connector 216 shown in Figure 8 in the present case. In the present example, the waveguide section is cylindrical and has end caps 292 on each end. DC isolation is provided by forming the waveguide section 286 in two interfitting portions 286A, 286B, one portion fitting within and being overlapped by the other portion with an insulating dielectric layer 294 between the two portions in the region of the overlap. Suitable connectors, here coaxial connectors 296 are mounted in the wall of the waveguide section for feeding radio frequency energy to and from the probe 288, 290.

As an alternative, the waveguide may be rectangular in cross section or may have another regular cross section.

Each probe 288, 290 is an E-field probe positioned inside the waveguide cavity as an extension of its respective coaxial connector inner conductor, the outer conductor being WO 01/62169 PCT/GB01/00767 36 electrically continuous with the waveguide wall. In the present embodiment, operable Sin the region of 2.45GHz, the diameter of the waveguide section is in the region of 00 to 100mm, specifically 86mm in the present case. These and other dimensions may be N scaled according to the operating frequency.

N, The length of the interior cavity of the waveguide section between the probe 288, 290 is C, preferably a multiple of g/2 where 4 is the guide wavelength within the cavity. The N distance between each probe and its nearest end cap is in the region of an odd multiple 0of 2/4 (in the present case 32mm), and the axial extent of the overlap between the two N 10 waveguide portions 286A, 286B should be at least W/4. A typical low loss, high voltage breakdown material for the dielectric layer 294 is polyimide tape.

It will be appreciated that the isolation stage provides a degree of bandpass filtering in that the diameter of the waveguide section imposes a lower frequency limit below which standing waves cannot be supported, while high-pass filtering is provided by increasing losses with frequency. Additional bandpass filtering characteristics are provided by the relative spacings of the probe and the end caps. Note that the preferred length of the waveguide section between the end caps 292 is about 12. Additional filter structures may be introduced into the waveguide section to provide preferential attenuation of unwanted signals.

The isolation stage forms an isolation barrier at DC and at AC frequencies much lower than the operating frequency of the generator and can, typically, withstand a voltage of DC applied between the two waveguide portions 286A, 286B.

At low frequencies, the isolation stage represents a series capacitor with a value less than 1/zF, preventing thermionic current or single fault currents which may cause unwanted nerve stimulation. Lower values of capacitance can obtained by reducing the degree of overlap between the waveguide section portions 286A, 286B, or by increasing the clearance between them where they overlap.

WO 01/62169 PCT/GBO1/00767 37 c-i Significant reductions in size of the isolation -stage can be achieved by filling the interior cavity with a dielectric material having a relative dielectric constant greater than -n unity.

00 As an alternative to the E-field probes 288, 290 illustrated in Figure 13, waves may be launched and collected using H-field elements in the form of loops oriented to excite a 00 magnetic field.

Referring now to Figure 14, an instrument for use with a generator having a magnietron Nl 10 power output device comprises, as with the instrument of Figures 2, 3 and 6, an outer shaft 30, connector 26, coaxial feed cable 40. A transitional impedance matching structure includes a low impedance section 92 and a high impedance section 94, and provides a match between the power output device of the generator and the load provided by the plasma, which is created in an electric field between a central disc electrode 160 and an outer electrode 70 provided by a section of the conductive sleeve adjacent the disc electrode 160. Gas passes from the inlet port 32 and along the'annular conduits 3 8A, B formed between the inner and outer conductors of the sections. 92, 94 of matching structure through the electric field between the electrodes 160, 70 and is converted into a plasma under the influence of the elec tric field. A tubular quartz insert 180 is situated against the inside of the sleeve 50, and therefore between the electrodes 160, 70. Quartz is a low loss dielectric material, and the insert has the effect of intensifying the electric field between the electrodes, effectively bringing them closer together, while simultaneously preventing preferential arcing between them, thereby producing a more uniform beam of plasma. In this embodiment, the inner electrode 160 is a disc, and is mounted directly onto the inner conductor 54 of the high impedance matching section, the latter having a length which in electrical terms is one quarter of a wavelength of the generator output. The disc electrode 160, because of its relatively small length, is, when considered in combination with the electrode effectively a discrete or "lumped"' capacitor, which, in conjunction with the inherent distributed inductance of the inner conductor 54 forms a series resonant electrical assembly. The shape of the disc electrode 160 also serves to spread the plasma output beam, thereby increasing the "footprint' of the beam on tissue, this can be desirable in WO 01/62169 PCT/GB01/00767 s ~38 C, skin resurfacing since it means that a given area of tissue can be treated with fewer a "hits" from the instrument. The voltage step-up which occurs in this resonant structure F is lower in the instrument of this embodiment thani with the instrument of Figures 2, 3 and 6, and so the step-up of the generator output voltage at the electrodes 160, 70 as a result of resonance within the resonant assembly is correspondingly lower. One reason for this is that a magnetron power output device produces a significantly higher level of power and at a higher voltage (typically 300Vrms), and therefore it is not necessary to N provide such a high step-up transformation, hence the lower Q of the resonant assembly.

N Tuning of the output frequency of the magnetron power output device is difficult.

Nonetheless, the resonant frequency of the instrument undergoes a shift once a plasma has been struck as a result of a lowering of the load impedance (due to the higher conductivity of plasma than air), so the problem of optimum power delivery for plasma ignition on the one hand and plasma maintenance on the other still applies. Referring to Figure 15, the reflected power dissipated within the instrument prior to plasma ignition with varying frequency is illustrated by the line 300. It can be seen that the resonance within the instrument occurs at a frequency fm,, represented graphically by a sharp peak, representative of a relatively high quality factor Q for the voltage multiplication, or upward transformation that occurs within the instrument at resonance. The reflected power versus frequency characteristic curve for the instrument once a plasma has been struck is illustrated by the line 310, and it can be seen that the resonant frequency of the instrument once a plasma has been created fpj is lower than that prior to ignition, and that the characteristic curve has a much flatter peak, representative of lower quality factor Q. Since the magnetron power output device is relatively powerful, one preferred mode of operation involves selecting a resonant frequency of the instrument such that the output frequency of the magnetron power output device is operable both to benefit from resonance within the instrument to strike a plasma, and also to maintain a plasma.

Referring again to Figure 15 the magnetron power output device has an output frequency fLt which lies between the resonant frequencies f, and fpi. The frequency fut is shifted from the resonant frequency as far as possible in the direction of the WO 01/62169 PCT/GB01/00767 39 N resonant frequency fpl in an attempt to optimise the delivery of power into the plasma, while still ensuring that sufficient resonance occurs within the instrument at fut to strike a plasma. This compromise in the output frequency of the magnetron power output 00 C1 device is possible as a result of the relatively large power output available, meaning that significantly less resonance'is required within the instrument, either in order to strike a' N- plasma or subsequently to maintain a plasma, than would be the case with lower power 00 Ci output devices.

0 In a further embodiment, the instrument is constructed so that it incorporates two N- 10 resonant assemblies: one which is resonant prior to the ignition of a plasma and the other which is resonant subsequent to ignition, wherein both of the resonant assemblies have similar or substantially -the same resonant frequency. With an instrument of this type it is then possible to optimise power delivery for ignition and maintenance of a plasma at a single frequency. Referring now to Figure 16, an instrument 16 has a connector 26 at its distal end, a coaxial feed structure 40 extending from the connector 26 to a bipolar electrode structure comprising a rod-like inner electrode 260 and- an outer electrode 70 provided by a section of outer conductive sleeve 50 lying adjacent the rod electrode 260, A conductive end cap 84 defines an aperture 80 through which plasma passes, and helps to intensify the electric field through which the plasma passes, thereby enhancing the ease of power delivery into the plasma. The characteristic impedance of the section of transmission line formed by the electrode structure 260, is chosen to provide matching between the power output device and the load provided by the plasma. As will be explained subsequently, it is believed that the plasma load in this embodiment has a lower impedance than in previous embodiments, which therefore makes matching easier. In addition the instrument comprises an auxiliary or strike electrode 260S. The strike electrode 260S comprises two elements: a predominantly inductive element, provided in this example by a length of wire 272 connected at its proximal end to the proximal end of rod electrode, and a predominantly capacitive element in series with the inductive element, which is provided in this example by a ring 274 of conductive material connected to the distal end of the wire 272, and which extends substantially coaxially with the rod electrode 260, but is spaced therefrom.

PCT/GBOI/00767 WO 0i162169 PTGO/06 Referring now to Figure 17, the structure of the strike electrode 260S is such that the inductance in the form of -the wire 272 and the capacitance in the form of the ring 274 00n forms a resonant assembly whichis resonant at the output frequency of the generator f,,ut, and the characteristic variation of reflected power with input frequency for the strike electrode 260S is illustrated by the line 320. By contrast, the transmission line N1 formed by the electrode structure 260, 70 (whose characteristic variation of reflected 00 power with input frequency is illustrated by the line 330), has, prior to the ignition of a N ~plasma, a resonant frequency fr. that is significantly higher than the generator output frequency to an extent that little or no resonance will occur at that frequency. However, the electrode structure 260, 70 is configured such that, once a plasma has been formed (which can be thought of as a length of conductor extending from the rod electrode 260 out of the aperture 80), it is a resonant structure at the output frequency of the generator, albeit a resonance at a lower Q. Thus, prior to the formation of a plasma, the strike electrode 260S is a resonant assembly which provides voltage multiplication (also known as step-up transformation) of the generator output signal, whereas subsequent to the formation of a plasma the electrode structure 260, 70 is a resonant assembly which will provide voltage multiplication. The electrode structure 260S, 70 may be thought of as having a length, in electrical terms, and once a plasma has been created (and therefore including the extra length of conductor provided by the plasma) which is equal to a quarter wavelength, and so provides a good match of the generator output.

When the generator output signal passes out of the coaxial feed structure 40 the signal initially excites the strike electrode 260S into resonance since this is resonant at the output frequency of the generator, but does not excite the electrode structure 260, since this is not resonant at the output frequency of the generator until a plasma has been created. The effect of a resonance (and therefore voltage multiplication) in the strike electrode 260S which does not occur in the electrode structure -260, 70 is that there is a potential difference between the strike electrode 260S and the rod electrode 260. If this potential difference is sufficiently large to create an electric field of the required intensity between the strike electrode 260S and the rod electrode 260 (bearing in mind that, because of the relatively small distance between the. electrodes 260S and 260, a relatively low potential difference will be required), a plasma is created between WO 01/62169 PCT/GBOI/00767 41 the electrodes., Once the plasma has been created, the plasma will affects the electrical characteristics of the electrode structure such that it is resonant at the generator output frequency (or frequencies similar thereto), although this resonance will be not be as 00 NI pronounced because the Q of the resonant assembly when a plasma has been created is lower than the Q of the strike electrode 260S._ 00 It is not essential that the strike electrode 260S and an "ignited" electrode structure 260, N 70 the electrode structure 260, 70 with a created plasma) have identical resonant frequencies in order to benefit from this dual electrode ignition technique, merely that N1 10 they are each capable of interacting with the generator output to strike and then maintain a plasma without having to retune the generator output. Preferably, however, the resonant frequencies should be the same to within the output frequency bandwidth of the generator. For example, if the generator produced an output of 2450N4Hzz and at this frequency this output had an inherent bandwidth of 2MHz, so that, in effect, at this selected frequency the generator output signal is in the frequency range 2449-2451Mz, the two resonant frequencies should both lie in this range for optimum effect.

Referring now to Figure 18, in a further embodiment which provides independent ignition of the plasma, an instrument includes a plasma ignition assembly 470S and an electrode structure 470 which are separately wired (and mutually isolated) to a circulator 414 within the instrument. Output signals from the generator pass initially into the circulator 414. The circulator passes the output signals preferentially into the output channel providing the best match to the generator. As with the previous embodiment, prior to ignition of a plasma, the match into the electrode structure 470 is poor, whereas the ignition assembly is configured to provide a good match prior to ignition, and so the generator output is passed by the circulator into the ignition assembly 470 S. Since it is wired independently, the ignition assembly 470 may be provided by any suitable spark or arc generator which is capable of producing a spark or arc with power levels available from the generator. For example, the ignition assembly can include a rectifying circuit and a DC spark generator, a resonant assembly to provide voltage multiplication as in the embodiment of Figure 16 or any other suitable WOO01/62169 42PCT/GBO1/00767 spark or arc generator. Once ignition of the plasma has occurred, the resultant change in the electrical characteristics of the electrode structure. cause matching of the _n generator output into the electrode structure, and so the circulator then acts to divert the 00 generator output into the electrode structure to enable delivery of power into the plasma.

00 NI i the majority of embodiments of the surgical system described above an oscillating N- electric field is created between two electrodes, both of which are substantially electrically isolated from the patient (inevitably there will be an extremely low level of CI 10 radiation output from the instrument in the direction of the patient, and possibly some barely detectable stray coupling with the patient), whose presence is irrelevant to the formation of a plasma. A plasma is struck between the electrodes (by the acceleration of free electrons between the electrodes) and the plasma is expelled from an aperture in the instrument, primarily under the influence of the pressure of gas supplied to the instrument. As a result, the presence of a patients skin has no effect on the formation of a plasma (whereas in the prior art a plasma is struck between an electrode within an instrument and the patient's skin) and the patient does not form a significant conductive pathway for any electrosurgical currents.

I a particularly preferred instrument best suited to operation with a high output power generator such as the above-described generator embodiments having a magnetron as the output power device, a dual matching structure such as those included in the instrument embodiments described above with reference to Figures 2 and 14, is not required. Referring to Figures 19 and 20, this preferred instrument comprises a continuous conductive sleeve 50 having its proximal end portion fixed within and electrically connected to the outer screen of a standard (N-type) coaxial connector, and an inner needle electrode 54 mounted in an extension 42 of the connector inner conductor. Fitted inside the distal end portion 70 of the sleeve outer conductor 50 is a heat resistant dielectric tube 180 made of a low loss dielectric material such as quartz.

As shown in Figures 19 and 20, this tube extends beyond the distal end of the sleeve and, in addition, extends by a distance of at least a quarter wavelength (the operating wavelength inside the distal portion 70. Mounted inside the quartz tube where it is WO 01/62169 PCTIGBOI/00767 43 within the distal end portion 70 of the sleeve 50 is a conductive focusing element 480 which may be regarded as a parasitic antenna element for creating electric field sleeve c-i Adjacent the connector 26, the sleeve 50 has a gas inlet 32 and provides an annular gas 00 ci conduit 389 extending around the inner conductor extension 42, the needle electrode 3 8, NI and distally to the end of the quartz tube 180, the latter forming the instrument nozzle 180N. A sealing ring 482 prevents escape of gas from within the conduit 38 into the (1 10 connector 26.

When connected to a coaxial feeder from a generator such as that described above with reference to Figure 8, the proximal portion of the instrument, -comprising the connector 26 and the connector inner conductor extension 42, constitutes a transmission line having a characteristic impedance which, in this case, is 50fl. A PTFE sleeve 26S within the connector forms part of the 50CI structure.

The needle electrode 54 is made of heat resistant conductor such as tungsten and has a diameter such that, in combination with the outer sleeve 50, it forms a transmission line section of higher characteristic impedance than that of the connector 26, typically in the region of 90 to l20il. By arranging for the length of the needle electrode, i.e. the distance from the connector inner conductor extension 42 to its tip 54T (see Figure to be in the region of it can be made to act as an impedance transformation element raising the voltage at the tip 54T to a level. significantly higher than that seen on the 50CI section (inner conductor extension 42). Accordingly, an intense B-field is created between the tip 54T of the inner electrode 'needle and the adjacent outer conductor dista end portion 70, This, in itself, given sufficient input power, can be enough to create a gas plasma extending downstream from the tip 54T and through the nozzle 1 80N. However, more reliable striking of the plasma is achieved due to the presence of the focusing element 480.

WO 01/62169 PCT/GBO1/00767 44 This focussing element 480 is a resonant element dimensione d to have a resonant frequency when in-situ in the quartz tube, in the region of the operating frequency of 00n the instrument and its associated generator. IAs will be seen from the drawings, particularly by referring to Figure 20, the resonant element 480 has three portions, i.e.

first and second folded patch elements 480C,. folded into irregular rings dimensioned to C1 ngage the inside of the quartz tube 180, and an interconnectin intermediat nrOw 00 NI strip 480L. These components are all formed from a single piece of conductive NI material, here spring stainless steel, the resilience of which causes the element to bear against tube 180.

N it will be appreciated that the rings 480C, in electrical terms, are predominately capacitive, whilst the connecting strip 480L is predominately inductive. The length of the component approaches V4. These properties give it a resonant frequency in the region of the operating frequency and a tendency to concentrate the E-field in the region of its end portions 480C.

In an. alternative embodiment (not shown) the focussing element may be a helix of circular or polygonal cross section made from, e.g. a springy material such as tungsten.

Other structures may be used.

The focussing element is positioned so that it partly overlaps the needle electrode 54 in the axial direction of -the instrument and, preferably has one of the regions where it induces high voltage in registry with the electrode tip 54T.

It will be understood by those skilled in the art that at resonance the voltage standing wave on the focussing element 480 is of greatest magnitude in the capacitive regions 480C. The irregular, folded, polygonal shape of the capacitive sections 480C results in substantially point contact between the focussing element and the inner surface of the quartz tube 180. This property, together with the E-field concentrating effect of the resonator element structure and the presence close by of the high dielectric constant material of the inserted tube 180, all serve to maximnise the filed. intensity, thereby to ensure striking of a plasma in gas flowing through the assembly.

WO 01/62169 PCT/GBO1/00767 in practice, arcing produced by the focussing element 480 acts as an initiator for plasma 00 formation in the region surrounding the electrode tip 54T. Once a plasma has formed at N the tip 54T it propagates along the tube, mainly due to the flow of gas towards the nozzle 1 80N. Once this has happened, the instrument presents an impedance match for c-I the generator, and power is transferred to the gas with good efficiency.

00 One advantage of the focus-sing element is that its resonant frequency is not especially critical, thereby simplifying manufacture.

cI As mentioned above, the use of UHF signals is not essential to the operation of the present invention, and the invention may be embodied at any frequency from DC signals upwards. However, the use of 131W signals has an advantage in that components whose length is one quarter wavelength long may be incorporated within compact surgical instruments to provide voltage transformation or matching. In addition several instruments have been illustrated which have resonant assemblies for the purpose of step-up voltage transformation, but this is not essential, and upward voltage transformation can be performed within an instrument without making use of resonance.

If the instruments disclosed herein are intended for clinical use, it is possible to sterilise them and this may be performed in a number of ways which are known in the art, such as the use of gamma radiation, for example, or by passing a gas such as ethylene oxide through the instrument (which will ensure that the conduit for the gas is sterilised). The sterilised instruments will then be wrapped in a suitable sterile package which prevents the ingress of contagion therein.

The various modifications disclosed herein are not limited to their association with the embodiments in connection with which they were first described, and may be applicable to all embodiments disclosed herein.

WO 01/62169 PCT/GB01/00767 46 Whilst the particular arrangement of the following claims has been prepared with a Sview to presenting essential and preferred features of the invention in a logical and c' concise way, for the purposes of Article 123 EPC we hereby specifically include as part 00 N of the content of this application as originally filed all possible combinations of the individual features contained in the claims or the preceding description.

00 t rsl

Claims (12)

1. 2. A system according to claim 1, characterised in that the radio frequency power device comprises a magnetron forming part of the generator.
2. 3. A system according to any preceding claim, characterised in that the waveguide section (286) is cylindrical.
3. 4. A system according to claim 1 or claim 2, characterised in that the waveguide section (286) has a rectangular or other regular cross-section. A system according to claim 3 or claim 4, characterised in that the waveguide section (286) has end caps (292) on each end.
4. 6. A system according to any preceding claim, characterised in that the waveguide section (286) comprises two interfitting portions (286A, 286B), one portion fitting within and being overlapped by the other portion, the waveguide section further comprising an insulating dielectric layer (294) between the said two portions in the region of the overlap.
5. 7. A system according to any preceding claim, characterised in that the probes (288, 290) are E-field probes.
6. 8. A system according to any of claims 1 to 6, characterised in that the probes are H-field elements in the form of loops. 46S
7. 9. A system according to any preceding claim, characterised in that the waveguide 0 section has a wall in which are mounted first and second coaxial connectors (296), and in OO cK, that each of the probes (288, 290) is positioned inside the waveguide as an extension of an inner conductor of a respective one of the coaxial connectors (296), the outer C conductor being electrically continuous with the wall. 00 C 10. A system according to any preceding claim, characterised by being operable at a Sfrequency in the region of 2.45GHz.
8. 11. A system according to claim 10, characterised in that the waveguide section is cylindrical and has a diameter in the range of from 70 to 100mm.
9. 12. A system according to any preceding claim, characterised in that the waveguide section (286) has an interior cavity the length of which is nkg/2 where n is an integer and ,g is the guide wavelength within the cavity.
10. 13. A system according to any of claims 3, 4 and 5, characterised in that the distance between each probe (288, 290) and its nearest end cap (292) is in the region of an odd multiple of Xg/4, where Xg is the guide wavelength within an interior cavity of the waveguide section.
11. 14. A system according to claim 6, characterised in that the axial extent of the overlap between the said waveguide portions (286A, 286B) is at least ,g/ 4 where ,g is the guide wavelength within an interior cavity of the waveguide section. A system according to any of claims 3, 4, 5 and 13, characterised in that the length of the waveguide section (286) between the end caps (292) is about Ag, where Ag is the guide wavelength within an interior cavity of the waveguide section.
12. 16. A radio frequency generator forming part of an electrosurgical or tissue Sresurfacing system, characterised in that the generator includes an isolation stage for operation at frequencies in or above the UHF range, the isolation stage comprising a waveguide section (286) and, within the waveguide section, spaced-apart ohmically separate launcher and collector probes (288, 290) connected respectively to a radio C frequency power device and an output of the generator. 00 C1 17. A generator according to claim 16, characterised in that the waveguide section 0(286) comprises two interfitting portions (286A, 286B), one portion fitting within and C1 being overlapped by the other portion, the waveguide section further comprising an insulating dielectric layer (294) between the said two portions in the region of the overlap.