AU2003278808A1 - Sensor system and methods used to detect material wear and surface deterioration - Google Patents
Sensor system and methods used to detect material wear and surface deteriorationInfo
- Publication number
- AU2003278808A1 AU2003278808A1 AU2003278808A AU2003278808A AU2003278808A1 AU 2003278808 A1 AU2003278808 A1 AU 2003278808A1 AU 2003278808 A AU2003278808 A AU 2003278808A AU 2003278808 A AU2003278808 A AU 2003278808A AU 2003278808 A1 AU2003278808 A1 AU 2003278808A1
- Authority
- AU
- Australia
- Prior art keywords
- sensor system
- methods used
- material wear
- surface deterioration
- detect material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3476—Testing and control
- H01J37/3479—Detecting exhaustion of target material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US41054002P | 2002-09-12 | 2002-09-12 | |
US60/410,540 | 2002-09-12 | ||
PCT/US2003/028832 WO2004024979A1 (en) | 2002-09-12 | 2003-09-12 | Sensor system and methods used to detect material wear and surface deterioration |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003278808A1 true AU2003278808A1 (en) | 2004-04-30 |
Family
ID=31994153
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003278808A Abandoned AU2003278808A1 (en) | 2002-09-12 | 2003-09-12 | Sensor system and methods used to detect material wear and surface deterioration |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2003278808A1 (en) |
TW (1) | TW200419139A (en) |
WO (1) | WO2004024979A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7566384B2 (en) | 2005-07-22 | 2009-07-28 | Praxair Technology, Inc. | System and apparatus for real-time monitoring and control of sputter target erosion |
US8702919B2 (en) | 2007-08-13 | 2014-04-22 | Honeywell International Inc. | Target designs and related methods for coupled target assemblies, methods of production and uses thereof |
US11244815B2 (en) | 2017-04-20 | 2022-02-08 | Honeywell International Inc. | Profiled sputtering target and method of making the same |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4500409A (en) * | 1983-07-19 | 1985-02-19 | Varian Associates, Inc. | Magnetron sputter coating source for both magnetic and non magnetic target materials |
DE3630737C1 (en) * | 1986-09-10 | 1987-11-05 | Philips & Du Pont Optical | Cathode sputtering device with a device for measuring a critical target removal |
CH669609A5 (en) * | 1986-12-23 | 1989-03-31 | Balzers Hochvakuum | |
EP0417221A1 (en) * | 1989-03-15 | 1991-03-20 | Balzers Aktiengesellschaft | Process for detecting the attainment of a predetermined depth in target body erosion and target body therefor |
JP2953940B2 (en) * | 1994-02-14 | 1999-09-27 | 日本電気株式会社 | Sputtering apparatus and method for measuring sputter surface of target |
JPH07292472A (en) * | 1994-04-21 | 1995-11-07 | Sharp Corp | Method for detecting amount of target to be reduced in sputtering device and its device |
-
2003
- 2003-09-12 WO PCT/US2003/028832 patent/WO2004024979A1/en not_active Application Discontinuation
- 2003-09-12 TW TW92125247A patent/TW200419139A/en unknown
- 2003-09-12 AU AU2003278808A patent/AU2003278808A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2004024979B1 (en) | 2004-05-27 |
WO2004024979A1 (en) | 2004-03-25 |
TW200419139A (en) | 2004-10-01 |
WO2004024979A9 (en) | 2004-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |