AU2003228977A8 - Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitry - Google Patents
Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitryInfo
- Publication number
- AU2003228977A8 AU2003228977A8 AU2003228977A AU2003228977A AU2003228977A8 AU 2003228977 A8 AU2003228977 A8 AU 2003228977A8 AU 2003228977 A AU2003228977 A AU 2003228977A AU 2003228977 A AU2003228977 A AU 2003228977A AU 2003228977 A8 AU2003228977 A8 AU 2003228977A8
- Authority
- AU
- Australia
- Prior art keywords
- forming
- dimensional structures
- semiconductor based
- based circuitry
- structures integral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00126—Static structures not provided for in groups B81C1/00031 - B81C1/00119
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00222—Integrating an electronic processing unit with a micromechanical structure
- B81C1/00246—Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/003—3D structures, e.g. superposed patterned layers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76885—By forming conductive members before deposition of protective insulating material, e.g. pillars, studs
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
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- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
- B81C2201/019—Bonding or gluing multiple substrate layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/05—Temporary protection of devices or parts of the devices during manufacturing
- B81C2201/053—Depositing a protective layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/07—Integrating an electronic processing unit with a micromechanical structure
- B81C2203/0707—Monolithic integration, i.e. the electronic processing unit is formed on or in the same substrate as the micromechanical structure
- B81C2203/0735—Post-CMOS, i.e. forming the micromechanical structure after the CMOS circuit
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- H—ELECTRICITY
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Electrochemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US37918302P | 2002-05-07 | 2002-05-07 | |
US60/379,183 | 2002-05-07 | ||
PCT/US2003/014664 WO2003095712A2 (en) | 2002-05-07 | 2003-05-07 | Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitry |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2003228977A8 true AU2003228977A8 (en) | 2003-11-11 |
AU2003228977A1 AU2003228977A1 (en) | 2003-11-11 |
Family
ID=29420501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003228977A Abandoned AU2003228977A1 (en) | 2002-05-07 | 2003-05-07 | Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitry |
Country Status (3)
Country | Link |
---|---|
US (2) | US20040065554A1 (en) |
AU (1) | AU2003228977A1 (en) |
WO (1) | WO2003095712A2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW522238B (en) * | 2001-10-18 | 2003-03-01 | Chipmos Technologies Inc | Method for manufacturing probes of a probe card |
EP1576206A2 (en) * | 2002-05-07 | 2005-09-21 | Microfabrica Inc. | Method of and apparatus for forming three-dimensional structures |
US20050202180A1 (en) * | 2003-12-31 | 2005-09-15 | Microfabrica Inc. | Electrochemical fabrication methods for producing multilayer structures including the use of diamond machining in the planarization of deposits of material |
US20070238265A1 (en) * | 2005-04-05 | 2007-10-11 | Keiichi Kurashina | Plating apparatus and plating method |
KR100870820B1 (en) | 2005-12-29 | 2008-11-27 | 매그나칩 반도체 유한회사 | Image sensor and method for manufacturing the same |
CH704572B1 (en) * | 2007-12-31 | 2012-09-14 | Nivarox Sa | A method of manufacturing a metal microstructure and microstructure obtained using this method. |
EP2803083A4 (en) * | 2012-01-10 | 2014-12-31 | Hzo Inc | Masks for use in applying protective coatings to electronic assemblies, masked electronic assemblies and associated methods |
WO2013192222A2 (en) | 2012-06-18 | 2013-12-27 | Hzo, Inc. | Systems and methods for applying protective coatings to internal surfaces of fully assembled electronic devices |
US10449568B2 (en) | 2013-01-08 | 2019-10-22 | Hzo, Inc. | Masking substrates for application of protective coatings |
US9894776B2 (en) | 2013-01-08 | 2018-02-13 | Hzo, Inc. | System for refurbishing or remanufacturing an electronic device |
WO2014110039A2 (en) | 2013-01-08 | 2014-07-17 | Hzo, Inc. | Removal of selected portions of protective coatings from substrates |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5829128A (en) * | 1993-11-16 | 1998-11-03 | Formfactor, Inc. | Method of mounting resilient contact structures to semiconductor devices |
US5011580A (en) * | 1989-10-24 | 1991-04-30 | Microelectronics And Computer Technology Corporation | Method of reworking an electrical multilayer interconnect |
US5190637A (en) * | 1992-04-24 | 1993-03-02 | Wisconsin Alumni Research Foundation | Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers |
US5378583A (en) * | 1992-12-22 | 1995-01-03 | Wisconsin Alumni Research Foundation | Formation of microstructures using a preformed photoresist sheet |
US6064213A (en) * | 1993-11-16 | 2000-05-16 | Formfactor, Inc. | Wafer-level burn-in and test |
US6023103A (en) * | 1994-11-15 | 2000-02-08 | Formfactor, Inc. | Chip-scale carrier for semiconductor devices including mounted spring contacts |
US5685491A (en) * | 1995-01-11 | 1997-11-11 | Amtx, Inc. | Electroformed multilayer spray director and a process for the preparation thereof |
US5718618A (en) * | 1996-02-09 | 1998-02-17 | Wisconsin Alumni Research Foundation | Lapping and polishing method and apparatus for planarizing photoresist and metal microstructure layers |
US5994152A (en) * | 1996-02-21 | 1999-11-30 | Formfactor, Inc. | Fabricating interconnects and tips using sacrificial substrates |
US5866281A (en) * | 1996-11-27 | 1999-02-02 | Wisconsin Alumni Research Foundation | Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts |
US5801100A (en) * | 1997-03-07 | 1998-09-01 | Industrial Technology Research Institute | Electroless copper plating method for forming integrated circuit structures |
JP3269827B2 (en) * | 1997-04-04 | 2002-04-02 | ユニバーシティ・オブ・サザン・カリフォルニア | Articles, methods and apparatus for electrochemical manufacturing |
US6008102A (en) * | 1998-04-09 | 1999-12-28 | Motorola, Inc. | Method of forming a three-dimensional integrated inductor |
US6255126B1 (en) * | 1998-12-02 | 2001-07-03 | Formfactor, Inc. | Lithographic contact elements |
EP1173893A4 (en) * | 1999-01-15 | 2007-08-01 | Univ California | Polycrystalline silicon germanium films for forming micro-electromechanical systems |
US6569701B2 (en) * | 2001-10-25 | 2003-05-27 | Rockwell Automation Technologies, Inc. | Method for fabricating an isolated microelectromechanical system device |
TWI227285B (en) * | 2001-10-15 | 2005-02-01 | Univ Southern California | Methods of and apparatus for producing a three-dimensional structure |
US7160429B2 (en) * | 2002-05-07 | 2007-01-09 | Microfabrica Inc. | Electrochemically fabricated hermetically sealed microstructures and methods of and apparatus for producing such structures |
US7259640B2 (en) * | 2001-12-03 | 2007-08-21 | Microfabrica | Miniature RF and microwave components and methods for fabricating such components |
US20030221968A1 (en) * | 2002-03-13 | 2003-12-04 | Memgen Corporation | Electrochemical fabrication method and apparatus for producing three-dimensional structures having improved surface finish |
CN100567581C (en) * | 2002-05-07 | 2009-12-09 | 微制造公司 | The multistep release method of electrochemically fabricated structures |
US20040065550A1 (en) * | 2002-05-07 | 2004-04-08 | University Of Southern California | Electrochemical fabrication methods with enhanced post deposition processing |
AU2003229023A1 (en) * | 2002-05-07 | 2003-11-11 | University Of Southern California | Conformable contact masking methods and apparatus utilizing in situ cathodic activation of a substrate |
AU2003228975A1 (en) * | 2002-05-07 | 2003-11-11 | Memgen Corporation | Methods of and apparatus for molding structures |
CN100582318C (en) * | 2002-05-07 | 2010-01-20 | 南加州大学 | Methods and apparatus for monitoring deposition quality during conformable contact mask plating operations |
EP1576206A2 (en) * | 2002-05-07 | 2005-09-21 | Microfabrica Inc. | Method of and apparatus for forming three-dimensional structures |
WO2003095710A2 (en) * | 2002-05-07 | 2003-11-20 | Memgen Corporation | Methods of and apparatus for electrochemically fabricating structures |
WO2003095711A2 (en) * | 2002-05-07 | 2003-11-20 | Memgen Corporation | Electrochemically fabricated structures having dielectric or active bases |
-
2003
- 2003-05-07 US US10/434,292 patent/US20040065554A1/en not_active Abandoned
- 2003-05-07 AU AU2003228977A patent/AU2003228977A1/en not_active Abandoned
- 2003-05-07 WO PCT/US2003/014664 patent/WO2003095712A2/en not_active Application Discontinuation
-
2007
- 2007-02-28 US US11/680,596 patent/US20070221505A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2003095712A2 (en) | 2003-11-20 |
WO2003095712A3 (en) | 2005-08-18 |
AU2003228977A1 (en) | 2003-11-11 |
US20070221505A1 (en) | 2007-09-27 |
US20040065554A1 (en) | 2004-04-08 |
Similar Documents
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Free format text: IN VOL 18, NO 2, PAGE(S) 606 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAME UNIVERSITY OF SOUTHERN CALIFORNIA , APPLICATION NO. 2003228977 , UNDER INID (43) CORRECT THE PUBLICATION DATE TO READ 24.11.2003 |