AU2003227490A1 - Detergent composition for alkali development apparatus - Google Patents

Detergent composition for alkali development apparatus

Info

Publication number
AU2003227490A1
AU2003227490A1 AU2003227490A AU2003227490A AU2003227490A1 AU 2003227490 A1 AU2003227490 A1 AU 2003227490A1 AU 2003227490 A AU2003227490 A AU 2003227490A AU 2003227490 A AU2003227490 A AU 2003227490A AU 2003227490 A1 AU2003227490 A1 AU 2003227490A1
Authority
AU
Australia
Prior art keywords
detergent composition
alkali development
development apparatus
alkali
detergent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003227490A
Inventor
Hirotsugu Kitamura
Hiromitsu Kobayashi
Hirohisa Nitoh
Masaaki Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Denka Kogyo KK filed Critical Asahi Denka Kogyo KK
Publication of AU2003227490A1 publication Critical patent/AU2003227490A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/263—Ethers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AU2003227490A 2003-04-11 2003-04-11 Detergent composition for alkali development apparatus Abandoned AU2003227490A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2003/004658 WO2004092320A1 (en) 2003-04-11 2003-04-11 Detergent composition for alkali development apparatus

Publications (1)

Publication Number Publication Date
AU2003227490A1 true AU2003227490A1 (en) 2004-11-04

Family

ID=33193206

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003227490A Abandoned AU2003227490A1 (en) 2003-04-11 2003-04-11 Detergent composition for alkali development apparatus

Country Status (3)

Country Link
CN (1) CN1296470C (en)
AU (1) AU2003227490A1 (en)
WO (1) WO2004092320A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106694497B (en) * 2015-07-13 2019-02-05 东莞市斯坦得电子材料有限公司 A kind of cleaning process for dry film/solder mask developing trough

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5960460A (en) * 1982-09-29 1984-04-06 Mitsubishi Paper Mills Ltd Electrophotographic clearing liquid
JPH03107950A (en) * 1989-09-22 1991-05-08 Konica Corp Automatic developing machine for photosensitive lithographic printing plate
JPH03185100A (en) * 1989-12-14 1991-08-13 Asahi Chem Ind Co Ltd Cleaning solution for developing device of photosensitive resin printing plate material
JP3051611B2 (en) * 1993-08-20 2000-06-12 日本表面化学株式会社 Cleaning solution and cleaning method for alkaline developing device
JP3233279B2 (en) * 1998-10-06 2001-11-26 日本アイ・ビー・エム株式会社 Cleaning composition and cleaning method
JP2001117241A (en) * 1999-10-21 2001-04-27 Daicel Chem Ind Ltd Rinsing solution for lithography
JP2001164292A (en) * 1999-12-09 2001-06-19 Nippon Hyomen Kagaku Kk Cleaning liquid for alkali developing device
JP2001269632A (en) * 2000-03-27 2001-10-02 Nomura Micro Sci Co Ltd Cleaning method and cleaning device

Also Published As

Publication number Publication date
WO2004092320A1 (en) 2004-10-28
CN1742077A (en) 2006-03-01
CN1296470C (en) 2007-01-24

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase