AU2002367905A1 - Method of annealing electrically conductive zinc oxide films - Google Patents

Method of annealing electrically conductive zinc oxide films

Info

Publication number
AU2002367905A1
AU2002367905A1 AU2002367905A AU2002367905A AU2002367905A1 AU 2002367905 A1 AU2002367905 A1 AU 2002367905A1 AU 2002367905 A AU2002367905 A AU 2002367905A AU 2002367905 A AU2002367905 A AU 2002367905A AU 2002367905 A1 AU2002367905 A1 AU 2002367905A1
Authority
AU
Australia
Prior art keywords
electrically conductive
zinc oxide
oxide films
conductive zinc
annealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002367905A
Other versions
AU2002367905A8 (en
Inventor
Andrew T. Hunt
Eric J. Mcentyre
Matthew Scott Vinson
Zhiyong Zhao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Microcoating Technologies Inc
Original Assignee
Microcoating Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Microcoating Technologies Inc filed Critical Microcoating Technologies Inc
Publication of AU2002367905A1 publication Critical patent/AU2002367905A1/en
Publication of AU2002367905A8 publication Critical patent/AU2002367905A8/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
AU2002367905A 2001-08-15 2002-08-12 Method of annealing electrically conductive zinc oxide films Abandoned AU2002367905A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31253301P 2001-08-15 2001-08-15
US60/312,533 2001-08-15
PCT/US2002/025350 WO2004006293A2 (en) 2001-08-15 2002-08-12 Method of annealing electrically conductive zinc oxide films

Publications (2)

Publication Number Publication Date
AU2002367905A1 true AU2002367905A1 (en) 2004-01-23
AU2002367905A8 AU2002367905A8 (en) 2004-01-23

Family

ID=30115392

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002367905A Abandoned AU2002367905A1 (en) 2001-08-15 2002-08-12 Method of annealing electrically conductive zinc oxide films

Country Status (2)

Country Link
AU (1) AU2002367905A1 (en)
WO (1) WO2004006293A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100870837B1 (en) * 2008-03-04 2008-11-28 한국철강 주식회사 Moisture removal method of thin film zinc oxide
US8525019B2 (en) 2010-07-01 2013-09-03 Primestar Solar, Inc. Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07320908A (en) * 1994-05-19 1995-12-08 Tdk Corp Zinc oxide base varistor and manufacturing method thereof
US5821567A (en) * 1995-12-13 1998-10-13 Oki Electric Industry Co., Ltd. High-resolution light-sensing and light-emitting diode array
US6169357B1 (en) * 1997-07-28 2001-01-02 Advanced Vision Technologies, Inc. Electron field-emission display cell device having opening depth defined by etch stop

Also Published As

Publication number Publication date
AU2002367905A8 (en) 2004-01-23
WO2004006293A2 (en) 2004-01-15
WO2004006293A3 (en) 2004-04-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase