AU2002240098A1 - Method of controlling the thickness of layers of photoresist - Google Patents
Method of controlling the thickness of layers of photoresistInfo
- Publication number
- AU2002240098A1 AU2002240098A1 AU2002240098A AU2002240098A AU2002240098A1 AU 2002240098 A1 AU2002240098 A1 AU 2002240098A1 AU 2002240098 A AU2002240098 A AU 2002240098A AU 2002240098 A AU2002240098 A AU 2002240098A AU 2002240098 A1 AU2002240098 A1 AU 2002240098A1
- Authority
- AU
- Australia
- Prior art keywords
- photoresist
- layers
- thickness
- controlling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US79199701A | 2001-02-23 | 2001-02-23 | |
US09/791,997 | 2001-02-23 | ||
PCT/US2002/002268 WO2002071152A2 (en) | 2001-02-23 | 2002-01-25 | Method of controlling the thickness of layers of photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002240098A1 true AU2002240098A1 (en) | 2002-09-19 |
Family
ID=25155481
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002240098A Abandoned AU2002240098A1 (en) | 2001-02-23 | 2002-01-25 | Method of controlling the thickness of layers of photoresist |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2002240098A1 (en) |
WO (1) | WO2002071152A2 (en) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3516195B2 (en) * | 1996-05-28 | 2004-04-05 | 東京エレクトロン株式会社 | Method and apparatus for forming coating film |
TW383414B (en) * | 1997-03-05 | 2000-03-01 | Tokyo Electron Ltd | Photoresist agent processing method and photoresist agent processing system and evaluation method and processing apparatus for photoresist agent film |
JP3641162B2 (en) * | 1998-04-20 | 2005-04-20 | 東京エレクトロン株式会社 | Coating film forming apparatus and method, and pattern forming method |
US6221787B1 (en) * | 1998-04-20 | 2001-04-24 | Tokyo Electron Limited | Apparatus and method of forming resist film |
JPH11340134A (en) * | 1998-05-22 | 1999-12-10 | Dainippon Screen Mfg Co Ltd | Substrate processing device |
-
2002
- 2002-01-25 WO PCT/US2002/002268 patent/WO2002071152A2/en not_active Application Discontinuation
- 2002-01-25 AU AU2002240098A patent/AU2002240098A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2002071152A3 (en) | 2002-12-27 |
WO2002071152A2 (en) | 2002-09-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |