AU2002239654A1 - Improved system for measuring periodic structures - Google Patents

Improved system for measuring periodic structures

Info

Publication number
AU2002239654A1
AU2002239654A1 AU2002239654A AU3965402A AU2002239654A1 AU 2002239654 A1 AU2002239654 A1 AU 2002239654A1 AU 2002239654 A AU2002239654 A AU 2002239654A AU 3965402 A AU3965402 A AU 3965402A AU 2002239654 A1 AU2002239654 A1 AU 2002239654A1
Authority
AU
Australia
Prior art keywords
improved system
periodic structures
measuring periodic
measuring
structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002239654A
Inventor
Kenneth P. Gross
Mehrdad Nikoonahad
Rodney Smedt
Guoheng Zhao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of AU2002239654A1 publication Critical patent/AU2002239654A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
AU2002239654A 2000-12-20 2001-12-18 Improved system for measuring periodic structures Abandoned AU2002239654A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/742,029 US6721052B2 (en) 2000-12-20 2000-12-20 Systems for measuring periodic structures
US09/742,029 2000-12-20
PCT/US2001/049259 WO2002050509A2 (en) 2000-12-20 2001-12-18 Improved system for measuring periodic structures

Publications (1)

Publication Number Publication Date
AU2002239654A1 true AU2002239654A1 (en) 2002-07-01

Family

ID=24983210

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002239654A Abandoned AU2002239654A1 (en) 2000-12-20 2001-12-18 Improved system for measuring periodic structures

Country Status (3)

Country Link
US (4) US6721052B2 (en)
AU (1) AU2002239654A1 (en)
WO (1) WO2002050509A2 (en)

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US6713753B1 (en) 2001-07-03 2004-03-30 Nanometrics Incorporated Combination of normal and oblique incidence polarimetry for the characterization of gratings
US6785638B2 (en) * 2001-08-06 2004-08-31 Timbre Technologies, Inc. Method and system of dynamic learning through a regression-based library generation process
US7061615B1 (en) 2001-09-20 2006-06-13 Nanometrics Incorporated Spectroscopically measured overlay target
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US6949462B1 (en) 2002-04-04 2005-09-27 Nanometrics Incorporated Measuring an alignment target with multiple polarization states
US6982793B1 (en) 2002-04-04 2006-01-03 Nanometrics Incorporated Method and apparatus for using an alignment target with designed in offset
US6992764B1 (en) 2002-09-30 2006-01-31 Nanometrics Incorporated Measuring an alignment target with a single polarization state
US6867862B2 (en) * 2002-11-20 2005-03-15 Mehrdad Nikoonahad System and method for characterizing three-dimensional structures
US8564780B2 (en) 2003-01-16 2013-10-22 Jordan Valley Semiconductors Ltd. Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces
US7126131B2 (en) 2003-01-16 2006-10-24 Metrosol, Inc. Broad band referencing reflectometer
US20080246951A1 (en) * 2007-04-09 2008-10-09 Phillip Walsh Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work-pieces
JP3892843B2 (en) * 2003-11-04 2007-03-14 株式会社東芝 Dimension measuring method, dimension measuring apparatus and measuring mark
IL162199A (en) * 2004-05-27 2008-04-13 Nova Measuring Instr Ltd Optical measurements of articles with periodic patterns
US7505133B1 (en) * 2004-06-22 2009-03-17 Sci Instruments, Inc. Optical metrology systems and methods
US8319966B2 (en) * 2004-06-22 2012-11-27 Emad Zawaideh Optical metrology systems and methods
US7804059B2 (en) * 2004-08-11 2010-09-28 Jordan Valley Semiconductors Ltd. Method and apparatus for accurate calibration of VUV reflectometer
US7067807B2 (en) * 2004-09-08 2006-06-27 Applied Materials, Israel, Ltd. Charged particle beam column and method of its operation
US20070091325A1 (en) * 2005-01-07 2007-04-26 Mehrdad Nikoonahad Multi-channel optical metrology
US20070002336A1 (en) * 2005-06-30 2007-01-04 Asml Netherlands B.V. Metrology apparatus, lithographic apparatus, process apparatus, metrology method and device manufacturing method
DE102006037257B4 (en) * 2006-02-01 2017-06-01 Siemens Healthcare Gmbh Method and measuring arrangement for the non-destructive analysis of an examination object with X-radiation
US8139232B2 (en) 2006-07-27 2012-03-20 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
US20080129986A1 (en) * 2006-11-30 2008-06-05 Phillip Walsh Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations
US7633689B2 (en) 2007-07-18 2009-12-15 Asml Holding N.V. Catadioptric optical system for scatterometry
US8699027B2 (en) 2007-07-27 2014-04-15 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
US20090219537A1 (en) * 2008-02-28 2009-09-03 Phillip Walsh Method and apparatus for using multiple relative reflectance measurements to determine properties of a sample using vacuum ultra violet wavelengths
US8223334B1 (en) 2008-09-26 2012-07-17 J.A. Woollam Co., Inc. Method of improving ellipsometric and the like data
US8153987B2 (en) 2009-05-22 2012-04-10 Jordan Valley Semiconductors Ltd. Automated calibration methodology for VUV metrology system
US8441639B2 (en) * 2009-09-03 2013-05-14 Kla-Tencor Corp. Metrology systems and methods
WO2012024509A1 (en) * 2010-08-20 2012-02-23 First Solar, Inc. Position-sensitive metrology system
US8867041B2 (en) 2011-01-18 2014-10-21 Jordan Valley Semiconductor Ltd Optical vacuum ultra-violet wavelength nanoimprint metrology
EP2668477B1 (en) 2011-01-28 2020-09-09 Onto Innovation Inc. A method and a sensor adjustment mechanism for position sensitive detection
US8565379B2 (en) 2011-03-14 2013-10-22 Jordan Valley Semiconductors Ltd. Combining X-ray and VUV analysis of thin film layers
US10801975B2 (en) * 2012-05-08 2020-10-13 Kla-Tencor Corporation Metrology tool with combined X-ray and optical scatterometers
WO2013188602A1 (en) * 2012-06-13 2013-12-19 Kla-Tencor Corporation Optical surface scanning systems and methods
US9091650B2 (en) * 2012-11-27 2015-07-28 Kla-Tencor Corporation Apodization for pupil imaging scatterometry
US9658150B2 (en) * 2015-01-12 2017-05-23 Kla-Tencor Corporation System and method for semiconductor wafer inspection and metrology
US10451412B2 (en) 2016-04-22 2019-10-22 Kla-Tencor Corporation Apparatus and methods for detecting overlay errors using scatterometry
US20220290974A1 (en) * 2021-03-11 2022-09-15 Applied Materials Israel Ltd. Optical metrology models for in-line film thickness measurements

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US6713753B1 (en) 2001-07-03 2004-03-30 Nanometrics Incorporated Combination of normal and oblique incidence polarimetry for the characterization of gratings
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Also Published As

Publication number Publication date
US7433037B2 (en) 2008-10-07
WO2002050509A2 (en) 2002-06-27
US6721052B2 (en) 2004-04-13
US20050099627A1 (en) 2005-05-12
WO2002050509A3 (en) 2002-12-12
US20060290931A1 (en) 2006-12-28
US20040141177A1 (en) 2004-07-22
US20020105646A1 (en) 2002-08-08

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