AU2002221937A1 - Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase - Google Patents

Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase

Info

Publication number
AU2002221937A1
AU2002221937A1 AU2002221937A AU2193702A AU2002221937A1 AU 2002221937 A1 AU2002221937 A1 AU 2002221937A1 AU 2002221937 A AU2002221937 A AU 2002221937A AU 2193702 A AU2193702 A AU 2193702A AU 2002221937 A1 AU2002221937 A1 AU 2002221937A1
Authority
AU
Australia
Prior art keywords
supplying
starting material
gaseous phase
material entering
cvd reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002221937A
Inventor
Johannes Lindner
Marcus Schumacher
Gerd Strauch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aixtron SE
Original Assignee
Aixtron SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron SE filed Critical Aixtron SE
Publication of AU2002221937A1 publication Critical patent/AU2002221937A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45572—Cooled nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45576—Coaxial inlets for each gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers
AU2002221937A 2000-11-20 2001-10-27 Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase Abandoned AU2002221937A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10057491 2000-11-20
DE10057491A DE10057491A1 (en) 2000-11-20 2000-11-20 Process for introducing a liquid starting material brought into gas form into a chemical vapour deposition (CVD) reactor comprises forming an aerosol, vaporizing the heat supply and removing the heat of vaporization
PCT/EP2001/014302 WO2002040739A1 (en) 2000-11-20 2001-10-27 Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase

Publications (1)

Publication Number Publication Date
AU2002221937A1 true AU2002221937A1 (en) 2002-05-27

Family

ID=7663950

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002221937A Abandoned AU2002221937A1 (en) 2000-11-20 2001-10-27 Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase

Country Status (8)

Country Link
US (1) US20040013800A1 (en)
EP (1) EP1364076B1 (en)
JP (1) JP2004514063A (en)
KR (1) KR100892810B1 (en)
AU (1) AU2002221937A1 (en)
DE (2) DE10057491A1 (en)
TW (1) TW583335B (en)
WO (1) WO2002040739A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060079201A (en) * 2003-09-17 2006-07-05 아익스트론 아게 Method and device for depositing layers using non-continuous injection
DE102004021578A1 (en) 2003-09-17 2005-04-21 Aixtron Ag Method and apparatus for depositing mono- or multi-component layers and layer sequences using non-continuous injection of liquid and dissolved starting substances via a multi-channel injection unit
WO2006005637A1 (en) * 2004-07-15 2006-01-19 Aixtron Ag Method for the deposition of layers containing silicon and germanium
JP4607474B2 (en) * 2004-02-12 2011-01-05 東京エレクトロン株式会社 Deposition equipment
DE102004015174A1 (en) 2004-03-27 2005-10-13 Aixtron Ag Process for separating in particular metal oxides by means of non-continuous precursor injection
US7622005B2 (en) 2004-05-26 2009-11-24 Applied Materials, Inc. Uniformity control for low flow process and chamber to chamber matching
US7572337B2 (en) 2004-05-26 2009-08-11 Applied Materials, Inc. Blocker plate bypass to distribute gases in a chemical vapor deposition system
DE102004056170A1 (en) * 2004-08-06 2006-03-16 Aixtron Ag Apparatus and method for high throughput chemical vapor deposition
JP4299286B2 (en) 2005-10-06 2009-07-22 東京エレクトロン株式会社 Vaporization apparatus, film forming apparatus, and vaporization method
DE102006026576A1 (en) * 2006-06-06 2008-01-10 Aixtron Ag Apparatus and method for evaporating a powdery organic starting material
DE102006027932A1 (en) 2006-06-14 2007-12-20 Aixtron Ag Method for the deposition of layers in a process chamber used in the production of electronic components comprises using a first starting material containing two beta-diketones and a diene coordinated with a ruthenium atom
DE102011051260A1 (en) 2011-06-22 2012-12-27 Aixtron Se Method and device for depositing OLEDs
EP2788704B1 (en) 2011-12-09 2019-03-06 Applied Materials, Inc. Heat exchanger for cooling a heating tube and method thereof
TWI473903B (en) 2013-02-23 2015-02-21 Hermes Epitek Corp Gas Injector and Cover Plate Assembly for Semiconductor Equipment
US11459654B2 (en) * 2020-11-19 2022-10-04 Eugenus, Inc. Liquid precursor injection for thin film deposition

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US548926A (en) * 1895-10-29 Wheel-tire
US2874000A (en) * 1957-03-13 1959-02-17 Bosch Arma Corp Fuel injection nozzles
US3069099A (en) * 1960-04-05 1962-12-18 George C Graham Fuel injection nozzle and spray device
US3444886A (en) * 1966-05-16 1969-05-20 Caterpillar Tractor Co Fuel injection valve
US4350301A (en) * 1980-06-25 1982-09-21 The Bendix Corporation Flow controlled pressure regulating device
US4846217A (en) * 1986-02-27 1989-07-11 Massachusetts Institute Of Technology Injection valve
US4875658A (en) * 1986-10-08 1989-10-24 Mitsubishi Jidosha Kogyo Kabushiki Kaisha Electromagnetic valve
US4836453A (en) * 1988-02-22 1989-06-06 Outboard Marine Corporation Fuel injector with continuous air flow
DE3914636A1 (en) * 1989-05-03 1990-11-08 Bosch Gmbh Robert DEVICE FOR COMBINED BLOWING OUT OF FUEL AND AIR FOR FUEL INJECTION SYSTEMS FROM INTERNAL COMBUSTION ENGINES
JPH06291040A (en) * 1992-03-03 1994-10-18 Rintetsuku:Kk Method and apparatus for vaporizing and supplying liquid
FR2707671B1 (en) * 1993-07-12 1995-09-15 Centre Nat Rech Scient Method and device for introducing precursors into a chemical vapor deposition chamber.
US5451260A (en) * 1994-04-15 1995-09-19 Cornell Research Foundation, Inc. Method and apparatus for CVD using liquid delivery system with an ultrasonic nozzle
US6244575B1 (en) * 1996-10-02 2001-06-12 Micron Technology, Inc. Method and apparatus for vaporizing liquid precursors and system for using same
US5835678A (en) * 1996-10-03 1998-11-10 Emcore Corporation Liquid vaporizer system and method
US5887117A (en) * 1997-01-02 1999-03-23 Sharp Kabushiki Kaisha Flash evaporator
JPH1112741A (en) * 1997-06-24 1999-01-19 Nissin Electric Co Ltd Vaporization device of liquid raw material
US6045864A (en) * 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6261374B1 (en) * 1998-09-29 2001-07-17 Applied Materials, Inc. Clog resistant gas delivery system
US6176930B1 (en) * 1999-03-04 2001-01-23 Applied Materials, Inc. Apparatus and method for controlling a flow of process material to a deposition chamber
JP3823591B2 (en) * 1999-03-25 2006-09-20 三菱電機株式会社 Vaporizing apparatus for CVD raw material and CVD apparatus using the same
JP2000345345A (en) * 1999-06-04 2000-12-12 Mitsubishi Electric Corp Cvd device and vaporizer for cvd device

Also Published As

Publication number Publication date
EP1364076B1 (en) 2007-03-28
JP2004514063A (en) 2004-05-13
DE50112275D1 (en) 2007-05-10
US20040013800A1 (en) 2004-01-22
KR20020084095A (en) 2002-11-04
DE10057491A1 (en) 2002-05-23
KR100892810B1 (en) 2009-04-10
WO2002040739A1 (en) 2002-05-23
EP1364076A1 (en) 2003-11-26
TW583335B (en) 2004-04-11

Similar Documents

Publication Publication Date Title
AU2002221937A1 (en) Device and method for supplying a cvd reactor with a liquid starting material entering into a gaseous phase
AU5842598A (en) Method for introducing gas into a liquid
AUPQ535500A0 (en) Apparatus for injecting gas into a vessel
AU2001227797A1 (en) Method and system for interacting with a display
AU2001295471A1 (en) Method for the continuous production of mixtures of substances and reaction mixtures and a device for carrying out said method
AU2002214429A1 (en) Device for producing beer and a unit for after fermentation
AU2001232904A1 (en) A method and apparatus for operating coriolis flowmeters at cryogenic temperatures
AU1770200A (en) Method and device for introducing a gas into a liquid
AU6195999A (en) Dispensing device and method for filling a gas tank with a working gas, notably natural gas
AU2001239624A1 (en) A portable communication apparatus having a liquid crystal display and a method for the operation thereof
EG22006A (en) Process for producing pressurized methane rich liquid from a methane - rich gas
AU2002210492A1 (en) Fuel cell device and method for operating a fuel cell device
AU2002218183A1 (en) Method for detecting the limit state of a material, and device therefor
AU2002308419A1 (en) Method for mixing a liquid/liquid and/or gaseous media into a solution
SG85708A1 (en) Method and device for filling a distribition line with corrosive gas
AU2001272090A1 (en) Device and method for filling a container with liquid gas
AUPP707598A0 (en) Ejector for entraining a gas into a liquid
AU3763799A (en) Apparatus and method for filling dispensers with a premixed liquid chemical
AU2000244283A1 (en) A device and a method for carbonating and dispensing liquids
AU4357999A (en) Device for introducing gas into a liquid
HK1025297A1 (en) Device for protecting a large-volume receptacle and method for the production thereof
AU2002220778A1 (en) Device for multiple-zone injection of gas in a reactor
AU2002210358A1 (en) Nozzle device and method for operating a nozzle device
AU2002210673A1 (en) Device for producing, using and partly recycling a hydrogen and oxygen gas mixture from water
GB9930093D0 (en) Liquid crystal device,method of manufacturing a liquid crystal device and method of operating a liquid crystal device