AU2002220036A1 - Method and system for improving stability of photomasks - Google Patents

Method and system for improving stability of photomasks

Info

Publication number
AU2002220036A1
AU2002220036A1 AU2002220036A AU2003602A AU2002220036A1 AU 2002220036 A1 AU2002220036 A1 AU 2002220036A1 AU 2002220036 A AU2002220036 A AU 2002220036A AU 2003602 A AU2003602 A AU 2003602A AU 2002220036 A1 AU2002220036 A1 AU 2002220036A1
Authority
AU
Australia
Prior art keywords
photomasks
improving stability
stability
improving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002220036A
Inventor
Harry J. Levinson
Fan Piao
Christopher A. Spence
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of AU2002220036A1 publication Critical patent/AU2002220036A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2002220036A 2000-12-20 2001-10-30 Method and system for improving stability of photomasks Abandoned AU2002220036A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/742,970 US6627355B2 (en) 1999-07-20 2000-12-20 Method of and system for improving stability of photomasks
US09/742,970 2000-12-20
PCT/US2001/045342 WO2002050612A2 (en) 2000-12-20 2001-10-30 Method and system for improving stability of photomasks

Publications (1)

Publication Number Publication Date
AU2002220036A1 true AU2002220036A1 (en) 2002-07-01

Family

ID=24986978

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002220036A Abandoned AU2002220036A1 (en) 2000-12-20 2001-10-30 Method and system for improving stability of photomasks

Country Status (4)

Country Link
US (1) US6627355B2 (en)
AU (1) AU2002220036A1 (en)
TW (1) TWI242798B (en)
WO (1) WO2002050612A2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6627356B2 (en) * 2000-03-24 2003-09-30 Kabushiki Kaisha Toshiba Photomask used in manufacturing of semiconductor device, photomask blank, and method of applying light exposure to semiconductor wafer by using said photomask
US20030090636A1 (en) * 2001-10-26 2003-05-15 Corning, Inc. Anti-reflective coating on a photomask
US7994450B2 (en) * 2002-01-07 2011-08-09 International Business Machines Corporation Debris minimization and improved spatial resolution in pulsed laser ablation of materials
US6864410B2 (en) * 2002-09-27 2005-03-08 The J.C. Robinson Seed Co. Inbred corn line N10018
US20040063001A1 (en) * 2002-09-30 2004-04-01 Wu Wei E. Method of making an integrated circuit using a photomask having a dual antireflective coating
JP4328572B2 (en) * 2003-07-10 2009-09-09 キヤノン株式会社 Projection exposure apparatus, reticle used in projection exposure apparatus, projection exposure method, and semiconductor device manufacturing method
US7455937B2 (en) * 2004-12-03 2008-11-25 Micron Technology, Inc. Reticles and methods of forming reticles
US8233248B1 (en) 2009-09-16 2012-07-31 Western Digital (Fremont), Llc Method and system for providing a magnetic recording transducer using a line hard mask
US8871102B2 (en) 2011-05-25 2014-10-28 Western Digital (Fremont), Llc Method and system for fabricating a narrow line structure in a magnetic recording head
US8703397B1 (en) 2012-03-29 2014-04-22 Western Digital (Fremont), Llc Method for providing side shields for a magnetic recording transducer
US9034564B1 (en) 2013-07-26 2015-05-19 Western Digital (Fremont), Llc Reader fabrication method employing developable bottom anti-reflective coating
US9001467B1 (en) 2014-03-05 2015-04-07 Western Digital (Fremont), Llc Method for fabricating side shields in a magnetic writer
JP7126836B2 (en) * 2017-03-28 2022-08-29 Hoya株式会社 PHASE SHIFT MASK BLANK, METHOD FOR MANUFACTURING PHASE SHIFT MASK USING SAME, AND PATTERN TRANSFER METHOD
US20210333717A1 (en) * 2020-04-23 2021-10-28 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet mask and method of manufacturing the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4431708A (en) 1979-12-19 1984-02-14 The United States Of America As Represented By The United States Department Of Energy Annealed CVD molybdenum thin film surface
JPH0797216B2 (en) 1986-10-29 1995-10-18 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション Mask manufacturing method
US5279911A (en) 1990-07-23 1994-01-18 Mitsubishi Denki Kabushiki Kaisha Photomask
JP2771907B2 (en) 1991-05-24 1998-07-02 三菱電機株式会社 Photomask and method of manufacturing the same
US5326426A (en) 1991-11-14 1994-07-05 Tam Andrew C Undercut membrane mask for high energy photon patterning
US5308741A (en) 1992-07-31 1994-05-03 Motorola, Inc. Lithographic method using double exposure techniques, mask position shifting and light phase shifting
US5414580A (en) 1994-05-13 1995-05-09 International Business Machines Corporation Magnetic storage system using thin film magnetic recording heads using phase-shifting mask
US5879866A (en) 1994-12-19 1999-03-09 International Business Machines Corporation Image recording process with improved image tolerances using embedded AR coatings
US5858580A (en) 1997-09-17 1999-01-12 Numerical Technologies, Inc. Phase shifting circuit manufacture method and apparatus
US5780161A (en) 1996-11-06 1998-07-14 Taiwan Semiconductor Manufacturing Company Ltd. Non-absorbing anti-reflective coated (ARC) reticle using thin dielectric films and method of forming the reticle
US6406818B1 (en) * 1999-03-31 2002-06-18 Photronics, Inc. Method of manufacturing photomasks by plasma etching with resist stripped
US6444372B1 (en) 1999-10-25 2002-09-03 Svg Lithography Systems, Inc. Non absorbing reticle and method of making same

Also Published As

Publication number Publication date
US20020132171A1 (en) 2002-09-19
TWI242798B (en) 2005-11-01
WO2002050612A3 (en) 2002-10-17
WO2002050612A2 (en) 2002-06-27
US6627355B2 (en) 2003-09-30

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