AU2002218653A1 - Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy - Google Patents

Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy

Info

Publication number
AU2002218653A1
AU2002218653A1 AU2002218653A AU1865302A AU2002218653A1 AU 2002218653 A1 AU2002218653 A1 AU 2002218653A1 AU 2002218653 A AU2002218653 A AU 2002218653A AU 1865302 A AU1865302 A AU 1865302A AU 2002218653 A1 AU2002218653 A1 AU 2002218653A1
Authority
AU
Australia
Prior art keywords
wafer
specular reflection
measuring temperatures
reflection spectroscopy
spectroscopy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002218653A
Inventor
Shane R. Johnson
Wayne L. Johnson
Yong-Hang Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2002218653A1 publication Critical patent/AU2002218653A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
    • G01K11/12—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance
    • G01K11/125—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance using changes in reflectance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AU2002218653A 2000-10-13 2001-10-12 Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy Abandoned AU2002218653A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23992200P 2000-10-13 2000-10-13
US60239922 2000-10-13
PCT/US2001/027767 WO2002033369A1 (en) 2000-10-13 2001-10-12 Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy

Publications (1)

Publication Number Publication Date
AU2002218653A1 true AU2002218653A1 (en) 2002-04-29

Family

ID=22904327

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002218653A Abandoned AU2002218653A1 (en) 2000-10-13 2001-10-12 Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy

Country Status (4)

Country Link
US (1) US7234862B2 (en)
AU (1) AU2002218653A1 (en)
TW (1) TW523850B (en)
WO (1) WO2002033369A1 (en)

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KR101939406B1 (en) * 2010-05-03 2019-01-16 오로라 솔라 테크놀로지스 (캐나다) 인크. Non-contact measurement of the dopant content of semiconductor layers
US20120244290A1 (en) 2011-03-24 2012-09-27 United Technologies Corporation Deposition Substrate Temperature and Monitoring
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DE102018128983B4 (en) 2017-11-30 2023-11-02 Laytec Ag Method for determining temperature and associated spectral reflection measuring system
EP3495790A1 (en) * 2017-12-05 2019-06-12 Laser Systems & Solutions of Europe Apparatus and method for measuring the surface temperature of a substrate
JP7236985B2 (en) * 2019-11-15 2023-03-10 東京エレクトロン株式会社 Temperature measurement system, temperature measurement method, and substrate processing apparatus
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Also Published As

Publication number Publication date
TW523850B (en) 2003-03-11
US20040061057A1 (en) 2004-04-01
WO2002033369A1 (en) 2002-04-25
US7234862B2 (en) 2007-06-26

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