AU2001291197A1 - Integrated phase separator for ultra high vacuum system - Google Patents
Integrated phase separator for ultra high vacuum systemInfo
- Publication number
- AU2001291197A1 AU2001291197A1 AU2001291197A AU9119701A AU2001291197A1 AU 2001291197 A1 AU2001291197 A1 AU 2001291197A1 AU 2001291197 A AU2001291197 A AU 2001291197A AU 9119701 A AU9119701 A AU 9119701A AU 2001291197 A1 AU2001291197 A1 AU 2001291197A1
- Authority
- AU
- Australia
- Prior art keywords
- cryogenic
- phase separator
- liquid nitrogen
- shroud
- panel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 12
- 229910052757 nitrogen Inorganic materials 0.000 abstract 6
- 239000007788 liquid Substances 0.000 abstract 4
- 230000004888 barrier function Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 238000001451 molecular beam epitaxy Methods 0.000 abstract 1
- 238000005086 pumping Methods 0.000 abstract 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
Abstract
An integrated phase separator for use in an ultra high vacuum system, for example, a molecular beam epitaxy system, is described. The vacuum chamber has a cryogenic panel disposed therein. The cryogenic panel includes a cryogenic shroud region and a phase separator region. Liquid nitrogen is introduced into the cryogenic panel via an inlet line. As the liquid nitrogen warms and vaporizes, nitrogen vapor rises within the shroud. The phase separator region within the cryogenic panel provides a near atmospheric pressure vapor barrier over the liquid nitrogen so that the nitrogen vapor may escape smoothly through the outlet of the panel, without forming gas bursts. Also, the phase separator region is vacuum jacketed to prevent cryogenic shroud surface temperature changes due to variations in liquid nitrogen levels, thereby increasing the cryogenic shroud's pumping stability.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/668,772 | 2000-09-22 | ||
US09/668,772 US6367267B1 (en) | 2000-09-22 | 2000-09-22 | Integrated phase separator for ultra high vacuum system |
PCT/US2001/029685 WO2002024983A2 (en) | 2000-09-22 | 2001-09-21 | Integrated phase separator for ultra high vacuum system |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001291197A1 true AU2001291197A1 (en) | 2002-04-02 |
Family
ID=24683667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001291197A Abandoned AU2001291197A1 (en) | 2000-09-22 | 2001-09-21 | Integrated phase separator for ultra high vacuum system |
Country Status (7)
Country | Link |
---|---|
US (1) | US6367267B1 (en) |
EP (1) | EP1330561B1 (en) |
JP (1) | JP2004533910A (en) |
AT (1) | ATE282100T1 (en) |
AU (1) | AU2001291197A1 (en) |
DE (1) | DE60107108T2 (en) |
WO (1) | WO2002024983A2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6718775B2 (en) * | 2002-07-30 | 2004-04-13 | Applied Epi, Inc. | Dual chamber cooling system with cryogenic and non-cryogenic chambers for ultra high vacuum system |
EP2066415A2 (en) * | 2006-09-25 | 2009-06-10 | Veeco Instruments Inc. | Thermally isolated cryopanel for vacuum deposition sytems |
EP3755827A4 (en) * | 2018-02-21 | 2021-11-24 | Anyon Systems Inc. | Apparatus and method for molecular beam epitaxy |
CN113117606B (en) * | 2021-05-28 | 2022-07-15 | 中国科学技术大学 | Beam source control device for precisely adjusting direction and position of beam source in vacuum beam source cavity |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE657551A (en) * | 1964-01-16 | |||
US3371499A (en) * | 1966-11-02 | 1968-03-05 | Union Carbide Corp | Cryosorption vacuum pumping system |
SU515884A1 (en) * | 1974-04-30 | 1976-05-30 | Ленинградский Ордена Ленина Политехнический Институт Им. М.И. Калинина | Cryogenic ultrahigh vacuum pump |
US4510760A (en) * | 1984-03-02 | 1985-04-16 | Messer Griesheim Industries, Inc. | Compact integrated gas phase separator and subcooler and process |
US4873833A (en) * | 1988-11-23 | 1989-10-17 | American Telephone Telegraph Company, At&T Bell Laboratories | Apparatus comprising a high-vacuum chamber |
US5041719A (en) * | 1990-06-01 | 1991-08-20 | General Electric Company | Two-zone electrical furnace for molecular beam epitaxial apparatus |
JPH0558777A (en) * | 1991-08-27 | 1993-03-09 | Canon Inc | Thin film forming device |
JPH0897147A (en) * | 1994-09-29 | 1996-04-12 | Mitsubishi Electric Corp | Epitaxial crystal growth device |
US5788776A (en) * | 1996-12-02 | 1998-08-04 | Chorus Corporation | Molecular beam epitaxy isolation tube system |
JP3630562B2 (en) * | 1998-07-23 | 2005-03-16 | シャープ株式会社 | Molecular beam epitaxy equipment |
-
2000
- 2000-09-22 US US09/668,772 patent/US6367267B1/en not_active Expired - Lifetime
-
2001
- 2001-09-21 JP JP2002529572A patent/JP2004533910A/en active Pending
- 2001-09-21 EP EP01971298A patent/EP1330561B1/en not_active Expired - Lifetime
- 2001-09-21 WO PCT/US2001/029685 patent/WO2002024983A2/en active IP Right Grant
- 2001-09-21 DE DE60107108T patent/DE60107108T2/en not_active Expired - Lifetime
- 2001-09-21 AU AU2001291197A patent/AU2001291197A1/en not_active Abandoned
- 2001-09-21 AT AT01971298T patent/ATE282100T1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2002024983A3 (en) | 2002-06-20 |
EP1330561A2 (en) | 2003-07-30 |
WO2002024983A9 (en) | 2003-03-27 |
ATE282100T1 (en) | 2004-11-15 |
DE60107108T2 (en) | 2005-11-10 |
DE60107108D1 (en) | 2004-12-16 |
WO2002024983A2 (en) | 2002-03-28 |
US6367267B1 (en) | 2002-04-09 |
JP2004533910A (en) | 2004-11-11 |
EP1330561B1 (en) | 2004-11-10 |
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