AU2001266831A1 - Plasma focus light source with tandem ellipsoidal mirror units - Google Patents

Plasma focus light source with tandem ellipsoidal mirror units

Info

Publication number
AU2001266831A1
AU2001266831A1 AU2001266831A AU6683101A AU2001266831A1 AU 2001266831 A1 AU2001266831 A1 AU 2001266831A1 AU 2001266831 A AU2001266831 A AU 2001266831A AU 6683101 A AU6683101 A AU 6683101A AU 2001266831 A1 AU2001266831 A1 AU 2001266831A1
Authority
AU
Australia
Prior art keywords
light source
focus light
ellipsoidal mirror
mirror units
plasma focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001266831A
Inventor
Igor V Fomenkov
Stephan T. Melnychuk
Richard M. Ness
William N Partlo
John E. Rauch
Richard L Sandstrom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/690,084 external-priority patent/US6566667B1/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of AU2001266831A1 publication Critical patent/AU2001266831A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/06—Longitudinal pinch devices
AU2001266831A 2000-06-09 2001-06-07 Plasma focus light source with tandem ellipsoidal mirror units Abandoned AU2001266831A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US59096200A 2000-06-09 2000-06-09
US09590962 2000-06-09
US09/690,084 US6566667B1 (en) 1997-05-12 2000-10-16 Plasma focus light source with improved pulse power system
US09690084 2000-10-16
US09/875,721 US6566668B2 (en) 1997-05-12 2001-06-06 Plasma focus light source with tandem ellipsoidal mirror units
US09875721 2001-06-06
PCT/US2001/018758 WO2001099143A1 (en) 2000-06-09 2001-06-07 Plasma focus light source with tandem ellipsoidal mirror units

Publications (1)

Publication Number Publication Date
AU2001266831A1 true AU2001266831A1 (en) 2002-01-02

Family

ID=27416592

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001266831A Abandoned AU2001266831A1 (en) 2000-06-09 2001-06-07 Plasma focus light source with tandem ellipsoidal mirror units

Country Status (3)

Country Link
US (1) US6566668B2 (en)
AU (1) AU2001266831A1 (en)
WO (1) WO2001099143A1 (en)

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US6815700B2 (en) * 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US7346093B2 (en) * 2000-11-17 2008-03-18 Cymer, Inc. DUV light source optical element improvements
US6839372B2 (en) * 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7465946B2 (en) * 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7405416B2 (en) 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7378673B2 (en) * 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
JP2005505945A (en) * 2001-10-12 2005-02-24 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ Lithographic apparatus and device manufacturing method
JP4298336B2 (en) * 2002-04-26 2009-07-15 キヤノン株式会社 Exposure apparatus, light source apparatus, and device manufacturing method
DE10219173A1 (en) * 2002-04-30 2003-11-20 Philips Intellectual Property Process for the generation of extreme ultraviolet radiation
FR2841684B1 (en) * 2002-06-28 2004-09-24 Centre Nat Rech Scient RADIATION SOURCE, ESPECIALLY ULTRAVIOLET WITH DISCHARGES
SG129259A1 (en) * 2002-10-03 2007-02-26 Asml Netherlands Bv Radiation source lithographic apparatus, and device manufacturing method
US7002168B2 (en) * 2002-10-15 2006-02-21 Cymer, Inc. Dense plasma focus radiation source
US6809327B2 (en) * 2002-10-29 2004-10-26 Intel Corporation EUV source box
US6809328B2 (en) * 2002-12-20 2004-10-26 Intel Corporation Protective coatings for radiation source components
US6787788B2 (en) * 2003-01-21 2004-09-07 Melissa Shell Electrode insulator materials for use in extreme ultraviolet electric discharge sources
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7034308B2 (en) * 2003-06-27 2006-04-25 Asml Netherlands B.V. Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby
US7446329B2 (en) * 2003-08-07 2008-11-04 Intel Corporation Erosion resistance of EUV source electrodes
US20060146906A1 (en) * 2004-02-18 2006-07-06 Cymer, Inc. LLP EUV drive laser
US7193228B2 (en) 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7196342B2 (en) * 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US8075732B2 (en) * 2004-11-01 2011-12-13 Cymer, Inc. EUV collector debris management
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7105837B2 (en) 2004-05-13 2006-09-12 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and radiation system
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US7307375B2 (en) 2004-07-09 2007-12-11 Energetiq Technology Inc. Inductively-driven plasma light source
US7183717B2 (en) * 2004-07-09 2007-02-27 Energetiq Technology Inc. Inductively-driven light source for microscopy
US7948185B2 (en) 2004-07-09 2011-05-24 Energetiq Technology Inc. Inductively-driven plasma light source
US7199384B2 (en) * 2004-07-09 2007-04-03 Energetiq Technology Inc. Inductively-driven light source for lithography
WO2006017119A2 (en) * 2004-07-09 2006-02-16 Energetiq Technology Inc. Inductively-driven plasma light source
US7307263B2 (en) * 2004-07-14 2007-12-11 Asml Netherlands B.V. Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7355191B2 (en) * 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7277158B2 (en) 2004-12-02 2007-10-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
US7482609B2 (en) * 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
DE102005020521B4 (en) * 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Method and device for suppressing debris in the generation of short-wave radiation based on a plasma
US7365349B2 (en) * 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) * 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
US7397056B2 (en) * 2005-07-06 2008-07-08 Asml Netherlands B.V. Lithographic apparatus, contaminant trap, and device manufacturing method
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
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US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
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US7468521B2 (en) 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7307237B2 (en) * 2005-12-29 2007-12-11 Honeywell International, Inc. Hand-held laser welding wand nozzle assembly including laser and feeder extension tips
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US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
EP2083328B1 (en) * 2008-01-28 2013-06-19 Media Lario s.r.l. Grazing incidence collector for laser produced plasma sources
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US8330131B2 (en) * 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
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US8686381B2 (en) * 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US9983482B2 (en) 2013-03-27 2018-05-29 Asml Netherlands B.V. Radiation collector, radiation source and lithographic apparatus
US9585236B2 (en) 2013-05-03 2017-02-28 Media Lario Srl Sn vapor EUV LLP source system for EUV lithography
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Also Published As

Publication number Publication date
US6566668B2 (en) 2003-05-20
WO2001099143A1 (en) 2001-12-27
US20020014599A1 (en) 2002-02-07

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