AU2001263231A1 - Supercritical fluid cleaning process for precision surfaces - Google Patents

Supercritical fluid cleaning process for precision surfaces

Info

Publication number
AU2001263231A1
AU2001263231A1 AU2001263231A AU6323101A AU2001263231A1 AU 2001263231 A1 AU2001263231 A1 AU 2001263231A1 AU 2001263231 A AU2001263231 A AU 2001263231A AU 6323101 A AU6323101 A AU 6323101A AU 2001263231 A1 AU2001263231 A1 AU 2001263231A1
Authority
AU
Australia
Prior art keywords
cleaning process
supercritical fluid
fluid cleaning
precision surfaces
precision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001263231A
Inventor
James Boyd
Mohan Chandra
Michael Costantini
Rick Heathwaite
Ijaz Jafri
Heiko Moritz
David Mount
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SC Fluids Inc
Original Assignee
SC Fluids Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/632,770 external-priority patent/US6508259B1/en
Priority claimed from US09/665,932 external-priority patent/US6334266B1/en
Priority claimed from US09/837,507 external-priority patent/US6612317B2/en
Application filed by SC Fluids Inc filed Critical SC Fluids Inc
Publication of AU2001263231A1 publication Critical patent/AU2001263231A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/008—Processes carried out under supercritical conditions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
AU2001263231A 2000-05-18 2001-05-18 Supercritical fluid cleaning process for precision surfaces Abandoned AU2001263231A1 (en)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
US20533500P 2000-05-18 2000-05-18
US60205335 2000-05-18
US09632770 2000-08-04
US09/632,770 US6508259B1 (en) 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal through loading
US09665932 2000-09-20
US09/665,932 US6334266B1 (en) 1999-09-20 2000-09-20 Supercritical fluid drying system and method of use
US26791601P 2001-02-09 2001-02-09
US60267916 2001-02-09
US09/837,507 US6612317B2 (en) 2000-04-18 2001-04-18 Supercritical fluid delivery and recovery system for semiconductor wafer processing
US09837507 2001-04-18
PCT/US2001/015999 WO2001087505A1 (en) 2000-05-18 2001-05-18 Supercritical fluid cleaning process for precision surfaces

Publications (1)

Publication Number Publication Date
AU2001263231A1 true AU2001263231A1 (en) 2001-11-26

Family

ID=27539517

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001263231A Abandoned AU2001263231A1 (en) 2000-05-18 2001-05-18 Supercritical fluid cleaning process for precision surfaces

Country Status (3)

Country Link
JP (1) JP2004510321A (en)
AU (1) AU2001263231A1 (en)
WO (1) WO2001087505A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1446127A (en) * 2000-08-04 2003-10-01 S·C·流体公司 Inverted pressure vessel with shielded closure mechanism
US7507297B2 (en) 2002-05-20 2009-03-24 Panasonic Corporation Cleaning method and cleaning apparatus
US6846380B2 (en) 2002-06-13 2005-01-25 The Boc Group, Inc. Substrate processing apparatus and related systems and methods
US7267727B2 (en) 2002-09-24 2007-09-11 Air Products And Chemicals, Inc. Processing of semiconductor components with dense processing fluids and ultrasonic energy
US6880560B2 (en) 2002-11-18 2005-04-19 Techsonic Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
DE102004029077B4 (en) * 2003-06-26 2010-07-22 Samsung Electronics Co., Ltd., Suwon Apparatus and method for removing a photoresist from a substrate
US20050006310A1 (en) * 2003-07-10 2005-01-13 Rajat Agrawal Purification and recovery of fluids in processing applications
US20050022850A1 (en) * 2003-07-29 2005-02-03 Supercritical Systems, Inc. Regulation of flow of processing chemistry only into a processing chamber
US20050029492A1 (en) 2003-08-05 2005-02-10 Hoshang Subawalla Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols
US7195676B2 (en) 2004-07-13 2007-03-27 Air Products And Chemicals, Inc. Method for removal of flux and other residue in dense fluid systems
CN101208415B (en) * 2005-04-29 2012-04-04 密执安大学评议会 Metal working lubricant formulations based on supercritical carbon dioxide
DE102005034634B3 (en) 2005-07-25 2007-03-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and tool for cleaning cavities
CN114247685B (en) * 2021-12-17 2022-12-20 张家港声芯电子科技有限公司 Chip cleaning device and cleaning method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3968885A (en) * 1973-06-29 1976-07-13 International Business Machines Corporation Method and apparatus for handling workpieces
US4355937A (en) * 1980-12-24 1982-10-26 International Business Machines Corporation Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing apparatus
US4827867A (en) * 1985-11-28 1989-05-09 Daikin Industries, Ltd. Resist developing apparatus
US5013366A (en) * 1988-12-07 1991-05-07 Hughes Aircraft Company Cleaning process using phase shifting of dense phase gases
US5169408A (en) * 1990-01-26 1992-12-08 Fsi International, Inc. Apparatus for wafer processing with in situ rinse
US5306350A (en) * 1990-12-21 1994-04-26 Union Carbide Chemicals & Plastics Technology Corporation Methods for cleaning apparatus using compressed fluids
JPH0613361A (en) * 1992-06-26 1994-01-21 Tokyo Electron Ltd Processing apparatus
US5368171A (en) * 1992-07-20 1994-11-29 Jackson; David P. Dense fluid microwave centrifuge
US6092538A (en) * 1996-09-25 2000-07-25 Shuzurifuresher Kaihatsukyodokumiai Method for using high density compressed liquefied gases in cleaning applications
US6090217A (en) * 1998-12-09 2000-07-18 Kittle; Paul A. Surface treatment of semiconductor substrates

Also Published As

Publication number Publication date
JP2004510321A (en) 2004-04-02
WO2001087505A1 (en) 2001-11-22

Similar Documents

Publication Publication Date Title
AU2001286653A1 (en) Manufacturing orthopedic parts using supercritical fluid processing
AU2002216661A1 (en) Method for cleaning etcher parts
AU2001238339A1 (en) Dispenser for fluid materials
AUPR692201A0 (en) Online fluid contaminant detector
AU2001275351A1 (en) System for cleaning the interior of pipes
AU2002221710A1 (en) Atomizer for liquids
HUP0303574A3 (en) Abrasive, clear, aqueous et liquid gel-composition for cleaning hard surfaces and method for cleaning hard surfaces
AU2001263231A1 (en) Supercritical fluid cleaning process for precision surfaces
AU2001277074A1 (en) Process for cleaning ceramic articles
AU2001261756A1 (en) Precision fluid gradient formation
AU2001254579A1 (en) Method for the designing of tools
AU2001261972A1 (en) Cleaning formulation for optical surfaces
AU2001269100A1 (en) Filter part for fluid pipes
AU2001287668A1 (en) Method for the sterilisation of objects
AU2001228744A1 (en) Device and method for the precision cleaning of objects
AU2001247406A1 (en) Dense fluid spray cleaning process and apparatus
AU2001240792A1 (en) Clean out tool
AU2002365851A1 (en) Hand tool for cleaning
AU2001262504A1 (en) Fluid dispensing apparatus
AU2001216856A1 (en) Abrasive component for cleaning delicate surfaces, especially teeth
AU2001233961A1 (en) Bore cleaning
AUPQ888700A0 (en) Fluid distribution apparatus
AU2001225156A1 (en) Device for cleaning surfaces
AU2001244100A1 (en) Method for the optical analysis of a fluid
AU2001284083A1 (en) Process for the hydroformylation of alkenes