AU2001237156A1 - Near infrared sensitive photopolymerizable composition - Google Patents

Near infrared sensitive photopolymerizable composition

Info

Publication number
AU2001237156A1
AU2001237156A1 AU2001237156A AU3715601A AU2001237156A1 AU 2001237156 A1 AU2001237156 A1 AU 2001237156A1 AU 2001237156 A AU2001237156 A AU 2001237156A AU 3715601 A AU3715601 A AU 3715601A AU 2001237156 A1 AU2001237156 A1 AU 2001237156A1
Authority
AU
Australia
Prior art keywords
near infrared
photopolymerizable composition
optical properties
infrared sensitive
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001237156A
Other languages
English (en)
Inventor
Yuri Boiko
Tigran Galstian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universite Laval
Original Assignee
Universite Laval
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universite Laval filed Critical Universite Laval
Publication of AU2001237156A1 publication Critical patent/AU2001237156A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/52Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/54Additives having no specific mesophase characterised by their chemical composition
    • C09K19/542Macromolecular compounds
    • C09K19/544Macromolecular compounds as dispersing or encapsulating medium around the liquid crystal
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001Phase modulating patterns, e.g. refractive index patterns
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1334Constructional arrangements; Manufacturing methods based on polymer dispersed liquid crystals, e.g. microencapsulated liquid crystals
    • G02F1/13345Network or three-dimensional gels
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00Recording materials or recording processes
    • G03H2260/12Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Holo Graphy (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AU2001237156A 2000-02-14 2001-02-14 Near infrared sensitive photopolymerizable composition Abandoned AU2001237156A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CA2298345 2000-02-14
CA002298345A CA2298345A1 (en) 2000-02-14 2000-02-14 Near infrared sensitive photopolymer and holographic photopolymer dispersed liquid crystal materials made therewith
PCT/CA2001/000162 WO2001059031A2 (en) 2000-02-14 2001-02-14 Near infrared sensitive photopolymerizable composition

Publications (1)

Publication Number Publication Date
AU2001237156A1 true AU2001237156A1 (en) 2001-08-20

Family

ID=4165294

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001237156A Abandoned AU2001237156A1 (en) 2000-02-14 2001-02-14 Near infrared sensitive photopolymerizable composition

Country Status (6)

Country Link
EP (1) EP1257613B1 (de)
AT (1) ATE276333T1 (de)
AU (1) AU2001237156A1 (de)
CA (1) CA2298345A1 (de)
DE (1) DE60105557D1 (de)
WO (1) WO2001059031A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020077439A (ko) * 2000-12-14 2002-10-11 코닌클리케 필립스 일렉트로닉스 엔.브이. 액정 디스플레이 라미네이트와 그 제조방법

Also Published As

Publication number Publication date
DE60105557D1 (de) 2004-10-21
CA2298345A1 (en) 2001-08-14
EP1257613A2 (de) 2002-11-20
EP1257613B1 (de) 2004-09-15
ATE276333T1 (de) 2004-10-15
WO2001059031A3 (en) 2001-12-13
WO2001059031A2 (en) 2001-08-16

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