AU2000243673A1 - Wafer stage with magnetic bearings - Google Patents

Wafer stage with magnetic bearings

Info

Publication number
AU2000243673A1
AU2000243673A1 AU2000243673A AU4367300A AU2000243673A1 AU 2000243673 A1 AU2000243673 A1 AU 2000243673A1 AU 2000243673 A AU2000243673 A AU 2000243673A AU 4367300 A AU4367300 A AU 4367300A AU 2000243673 A1 AU2000243673 A1 AU 2000243673A1
Authority
AU
Australia
Prior art keywords
wafer stage
magnetic bearings
bearings
magnetic
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2000243673A
Inventor
Akimitsu Ebihara
Andrew J. Hazelton
W. Thomas Novak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2000243673A1 publication Critical patent/AU2000243673A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
AU2000243673A 2000-04-21 2000-04-21 Wafer stage with magnetic bearings Abandoned AU2000243673A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2000/010831 WO2001081171A1 (en) 2000-04-21 2000-04-21 Wafer stage with magnetic bearings

Publications (1)

Publication Number Publication Date
AU2000243673A1 true AU2000243673A1 (en) 2001-11-07

Family

ID=21741305

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2000243673A Abandoned AU2000243673A1 (en) 2000-04-21 2000-04-21 Wafer stage with magnetic bearings

Country Status (2)

Country Link
AU (1) AU2000243673A1 (en)
WO (1) WO2001081171A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6437463B1 (en) 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
US6906334B2 (en) * 2000-12-19 2005-06-14 Nikon Corporation Curved I-core
EP1418017A3 (en) * 2002-08-29 2008-12-24 Canon Kabushiki Kaisha Positioning apparatus, charged particle beam exposure apparatus, and semiconductor device manufacturing method
US6870600B2 (en) 2003-01-13 2005-03-22 Nikon Corporation Vibration-attenuation devices and methods using pressurized bellows exhibiting substantially zero lateral stiffness

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU71614A1 (en) * 1975-01-10 1976-11-11
US5780943A (en) * 1996-04-04 1998-07-14 Nikon Corporation Exposure apparatus and method
US5991005A (en) * 1996-04-11 1999-11-23 Nikon Corporation Stage apparatus and exposure apparatus having the same
JPH1089403A (en) * 1996-09-10 1998-04-07 Nikon Corp Vibration control device

Also Published As

Publication number Publication date
WO2001081171A1 (en) 2001-11-01

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