AU1955395A - Tantalum compounds - Google Patents

Tantalum compounds

Info

Publication number
AU1955395A
AU1955395A AU19553/95A AU1955395A AU1955395A AU 1955395 A AU1955395 A AU 1955395A AU 19553/95 A AU19553/95 A AU 19553/95A AU 1955395 A AU1955395 A AU 1955395A AU 1955395 A AU1955395 A AU 1955395A
Authority
AU
Australia
Prior art keywords
tantalum compounds
tantalum
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU19553/95A
Inventor
Simon Robert Drake
Timothy John Leedham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SIMONE ROBERT DRAKE
Original Assignee
SIMONE ROBERT DRAKE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB9406060A external-priority patent/GB9406060D0/en
Priority claimed from GB9423750A external-priority patent/GB9423750D0/en
Application filed by SIMONE ROBERT DRAKE filed Critical SIMONE ROBERT DRAKE
Publication of AU1955395A publication Critical patent/AU1955395A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/005—Compounds of elements of Group 5 of the Periodic System without metal-carbon linkages
AU19553/95A 1994-03-26 1995-03-23 Tantalum compounds Abandoned AU1955395A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
GB9406060A GB9406060D0 (en) 1994-03-26 1994-03-26 Volatile tantalum compounds
GB9406060 1994-03-26
GB9423750 1994-11-24
GB9423750A GB9423750D0 (en) 1994-11-24 1994-11-24 Tantalum compounds
PCT/GB1995/000644 WO1995026355A1 (en) 1994-03-26 1995-03-23 Tantalum compounds

Publications (1)

Publication Number Publication Date
AU1955395A true AU1955395A (en) 1995-10-17

Family

ID=26304592

Family Applications (1)

Application Number Title Priority Date Filing Date
AU19553/95A Abandoned AU1955395A (en) 1994-03-26 1995-03-23 Tantalum compounds

Country Status (2)

Country Link
AU (1) AU1955395A (en)
WO (1) WO1995026355A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9809207D0 (en) 1998-04-29 1998-07-01 Bp Chem Int Ltd Novel catalysts for olefin polymerisation
US20020009861A1 (en) * 1998-06-12 2002-01-24 Pravin K. Narwankar Method and apparatus for the formation of dielectric layers
EP1133499B1 (en) 1998-11-26 2003-02-12 Siemens Aktiengesellschaft Complex compound of an element of sub-group iv or v
US7112485B2 (en) 2002-08-28 2006-09-26 Micron Technology, Inc. Systems and methods for forming zirconium and/or hafnium-containing layers
US6784049B2 (en) 2002-08-28 2004-08-31 Micron Technology, Inc. Method for forming refractory metal oxide layers with tetramethyldisiloxane
US7041609B2 (en) 2002-08-28 2006-05-09 Micron Technology, Inc. Systems and methods for forming metal oxides using alcohols
US7030042B2 (en) 2002-08-28 2006-04-18 Micron Technology, Inc. Systems and methods for forming tantalum oxide layers and tantalum precursor compounds
WO2006049059A1 (en) 2004-11-02 2006-05-11 Adeka Corporation Metal compound, thin film-forming material, and method for producing thin film
JP5832428B2 (en) * 2010-05-24 2015-12-16 昭和電工株式会社 Organic tantalum complex compound and method for producing the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58203443A (en) * 1982-05-24 1983-11-26 Hitachi Ltd Composition used for correcting of white spot defect of photomask
US4525468A (en) * 1982-09-30 1985-06-25 E. I. Du Pont De Nemours And Company Olefin polymerization catalyst

Also Published As

Publication number Publication date
WO1995026355A1 (en) 1995-10-05

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