AU1597366A - Improved sputtering methods and apparatus - Google Patents
Improved sputtering methods and apparatusInfo
- Publication number
- AU1597366A AU1597366A AU15973/66A AU1597366A AU1597366A AU 1597366 A AU1597366 A AU 1597366A AU 15973/66 A AU15973/66 A AU 15973/66A AU 1597366 A AU1597366 A AU 1597366A AU 1597366 A AU1597366 A AU 1597366A
- Authority
- AU
- Australia
- Prior art keywords
- sputtering methods
- improved sputtering
- improved
- methods
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU15973/66A AU1597366A (en) | 1967-12-28 | 1967-12-28 | Improved sputtering methods and apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU15973/66A AU1597366A (en) | 1967-12-28 | 1967-12-28 | Improved sputtering methods and apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
AU1597366A true AU1597366A (en) | 1969-07-03 |
Family
ID=3705924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU15973/66A Expired AU1597366A (en) | 1967-12-28 | 1967-12-28 | Improved sputtering methods and apparatus |
Country Status (1)
Country | Link |
---|---|
AU (1) | AU1597366A (en) |
-
1967
- 1967-12-28 AU AU15973/66A patent/AU1597366A/en not_active Expired
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