AU1557392A - Methods for photolithography and development analysis - Google Patents

Methods for photolithography and development analysis

Info

Publication number
AU1557392A
AU1557392A AU15573/92A AU1557392A AU1557392A AU 1557392 A AU1557392 A AU 1557392A AU 15573/92 A AU15573/92 A AU 15573/92A AU 1557392 A AU1557392 A AU 1557392A AU 1557392 A AU1557392 A AU 1557392A
Authority
AU
Australia
Prior art keywords
photolithography
methods
development analysis
analysis
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU15573/92A
Inventor
David Carl Debruin
Samuel Patrick Valeriano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Site Services Inc
Original Assignee
Site Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Site Services Inc filed Critical Site Services Inc
Publication of AU1557392A publication Critical patent/AU1557392A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AU15573/92A 1991-03-04 1992-03-04 Methods for photolithography and development analysis Abandoned AU1557392A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66413991A 1991-03-04 1991-03-04
US664139 1991-03-04

Publications (1)

Publication Number Publication Date
AU1557392A true AU1557392A (en) 1992-10-06

Family

ID=24664710

Family Applications (1)

Application Number Title Priority Date Filing Date
AU15573/92A Abandoned AU1557392A (en) 1991-03-04 1992-03-04 Methods for photolithography and development analysis

Country Status (2)

Country Link
AU (1) AU1557392A (en)
WO (1) WO1992015924A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3432639B2 (en) * 1995-06-23 2003-08-04 三菱電機株式会社 How to create a mask pattern
DE10123470B4 (en) * 2001-05-15 2010-08-19 Carl Zeiss Jena Gmbh Method and arrangement for non-contact determination of product properties

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2076237A5 (en) * 1970-01-07 1971-10-15 Thomson Csf
US4647172A (en) * 1985-05-17 1987-03-03 Gca Corporation Resist development method
US4851311A (en) * 1987-12-17 1989-07-25 Texas Instruments Incorporated Process for determining photoresist develop time by optical transmission

Also Published As

Publication number Publication date
WO1992015924A1 (en) 1992-09-17

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AU1557392A (en) Methods for photolithography and development analysis