AU1262799A - Exposure method and exposure device - Google Patents

Exposure method and exposure device

Info

Publication number
AU1262799A
AU1262799A AU12627/99A AU1262799A AU1262799A AU 1262799 A AU1262799 A AU 1262799A AU 12627/99 A AU12627/99 A AU 12627/99A AU 1262799 A AU1262799 A AU 1262799A AU 1262799 A AU1262799 A AU 1262799A
Authority
AU
Australia
Prior art keywords
exposure
exposure device
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU12627/99A
Inventor
Kosuke Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1262799A publication Critical patent/AU1262799A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU12627/99A 1997-12-05 1998-11-30 Exposure method and exposure device Abandoned AU1262799A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-335460 1997-12-05
JP33546097 1997-12-05
PCT/JP1998/005376 WO1999030356A1 (en) 1997-12-05 1998-11-30 Exposure method and exposure device

Publications (1)

Publication Number Publication Date
AU1262799A true AU1262799A (en) 1999-06-28

Family

ID=18288814

Family Applications (1)

Application Number Title Priority Date Filing Date
AU12627/99A Abandoned AU1262799A (en) 1997-12-05 1998-11-30 Exposure method and exposure device

Country Status (3)

Country Link
JP (1) JP4433609B2 (en)
AU (1) AU1262799A (en)
WO (1) WO1999030356A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3631094B2 (en) 2000-03-30 2005-03-23 キヤノン株式会社 Projection exposure apparatus and device manufacturing method
JP5017147B2 (en) * 2008-03-06 2012-09-05 東京エレクトロン株式会社 Substrate processing method, program, computer storage medium, and substrate processing system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02157844A (en) * 1988-12-12 1990-06-18 Nikon Corp Exposure condition measuring mask and method and device for measuring exposure condition using the same mask
JPH07111953B2 (en) * 1988-12-13 1995-11-29 富士通株式会社 Photolithography pattern dimension management method
JPH0472711A (en) * 1990-07-13 1992-03-06 Fujitsu Ltd Exposure condition setting method and device
JP3278896B2 (en) * 1992-03-31 2002-04-30 キヤノン株式会社 Illumination apparatus and projection exposure apparatus using the same

Also Published As

Publication number Publication date
WO1999030356A1 (en) 1999-06-17
JP4433609B2 (en) 2010-03-17

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase