ATE83083T1 - VACUUM APPLIED PHOTORESISTS FROM ANIONICALLY POLYMERIZABLE MONOMERS. - Google Patents

VACUUM APPLIED PHOTORESISTS FROM ANIONICALLY POLYMERIZABLE MONOMERS.

Info

Publication number
ATE83083T1
ATE83083T1 AT87301125T AT87301125T ATE83083T1 AT E83083 T1 ATE83083 T1 AT E83083T1 AT 87301125 T AT87301125 T AT 87301125T AT 87301125 T AT87301125 T AT 87301125T AT E83083 T1 ATE83083 T1 AT E83083T1
Authority
AT
Austria
Prior art keywords
polymerizable monomers
vacuum applied
anionically polymerizable
photoresists
applied photoresists
Prior art date
Application number
AT87301125T
Other languages
German (de)
Inventor
John G Woods
John M Rooney
Original Assignee
Loctite Ireland Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/828,107 external-priority patent/US4675273A/en
Priority claimed from US06/828,109 external-priority patent/US4675270A/en
Application filed by Loctite Ireland Ltd filed Critical Loctite Ireland Ltd
Priority claimed from EP87301125A external-priority patent/EP0233747B1/en
Application granted granted Critical
Publication of ATE83083T1 publication Critical patent/ATE83083T1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
AT87301125T 1986-02-10 1987-02-10 VACUUM APPLIED PHOTORESISTS FROM ANIONICALLY POLYMERIZABLE MONOMERS. ATE83083T1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US06/828,107 US4675273A (en) 1986-02-10 1986-02-10 Resists formed by vapor deposition of anionically polymerizable monomer
US06/828,109 US4675270A (en) 1986-02-10 1986-02-10 Imaging method for vapor deposited photoresists of anionically polymerizable monomer
EP87301125A EP0233747B1 (en) 1986-02-10 1987-02-10 Vapor deposited photoresists of anionically polymerizable monomers

Publications (1)

Publication Number Publication Date
ATE83083T1 true ATE83083T1 (en) 1992-12-15

Family

ID=27230314

Family Applications (1)

Application Number Title Priority Date Filing Date
AT87301125T ATE83083T1 (en) 1986-02-10 1987-02-10 VACUUM APPLIED PHOTORESISTS FROM ANIONICALLY POLYMERIZABLE MONOMERS.

Country Status (1)

Country Link
AT (1) ATE83083T1 (en)

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties