ATE552612T1 - METHOD AND SYSTEM FOR PROCESSING A SUBSTRATE WITH A DYNAMIC LIQUID MENISCUS - Google Patents

METHOD AND SYSTEM FOR PROCESSING A SUBSTRATE WITH A DYNAMIC LIQUID MENISCUS

Info

Publication number
ATE552612T1
ATE552612T1 AT03799316T AT03799316T ATE552612T1 AT E552612 T1 ATE552612 T1 AT E552612T1 AT 03799316 T AT03799316 T AT 03799316T AT 03799316 T AT03799316 T AT 03799316T AT E552612 T1 ATE552612 T1 AT E552612T1
Authority
AT
Austria
Prior art keywords
substrate
processing
liquid meniscus
dynamic liquid
dynamic
Prior art date
Application number
AT03799316T
Other languages
German (de)
Inventor
Carl Woods
James Garcia
Larios John De
Michael Ravkin
Fred Redeker
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/261,839 external-priority patent/US7234477B2/en
Priority claimed from US10/330,843 external-priority patent/US7198055B2/en
Priority claimed from US10/404,692 external-priority patent/US6988327B2/en
Priority claimed from US10/603,427 external-priority patent/US7000622B2/en
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE552612T1 publication Critical patent/ATE552612T1/en

Links

AT03799316T 2002-09-30 2003-09-29 METHOD AND SYSTEM FOR PROCESSING A SUBSTRATE WITH A DYNAMIC LIQUID MENISCUS ATE552612T1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US10/261,839 US7234477B2 (en) 2000-06-30 2002-09-30 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
US10/330,843 US7198055B2 (en) 2002-09-30 2002-12-24 Meniscus, vacuum, IPA vapor, drying manifold
US10/330,897 US7240679B2 (en) 2002-09-30 2002-12-24 System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold
US10/404,692 US6988327B2 (en) 2002-09-30 2003-03-31 Methods and systems for processing a substrate using a dynamic liquid meniscus
US10/603,427 US7000622B2 (en) 2002-09-30 2003-06-24 Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscus
PCT/US2003/030718 WO2004032160A2 (en) 2002-09-30 2003-09-29 Methods and systems for processing a substrate using a dynamic liquid meniscus

Publications (1)

Publication Number Publication Date
ATE552612T1 true ATE552612T1 (en) 2012-04-15

Family

ID=44718507

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03799316T ATE552612T1 (en) 2002-09-30 2003-09-29 METHOD AND SYSTEM FOR PROCESSING A SUBSTRATE WITH A DYNAMIC LIQUID MENISCUS

Country Status (2)

Country Link
AT (1) ATE552612T1 (en)
IL (3) IL209735A0 (en)

Also Published As

Publication number Publication date
IL209736A (en) 2011-12-29
IL209737A (en) 2011-12-29
IL209735A0 (en) 2011-02-28
IL209736A0 (en) 2011-02-28
IL209737A0 (en) 2011-02-28

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