ATE54678T1 - APPARATUS AND METHOD FOR COATING IN A VACUUM CHAMBER BY ARC VAPOR DEPOSITION. - Google Patents

APPARATUS AND METHOD FOR COATING IN A VACUUM CHAMBER BY ARC VAPOR DEPOSITION.

Info

Publication number
ATE54678T1
ATE54678T1 AT86906177T AT86906177T ATE54678T1 AT E54678 T1 ATE54678 T1 AT E54678T1 AT 86906177 T AT86906177 T AT 86906177T AT 86906177 T AT86906177 T AT 86906177T AT E54678 T1 ATE54678 T1 AT E54678T1
Authority
AT
Austria
Prior art keywords
coating
vapor deposition
vacuum chamber
arc vapor
arc
Prior art date
Application number
AT86906177T
Other languages
German (de)
Inventor
Jiinjen Albert Sue
Harden Henry Troue
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Priority claimed from PCT/US1986/002030 external-priority patent/WO1987002072A1/en
Application granted granted Critical
Publication of ATE54678T1 publication Critical patent/ATE54678T1/en

Links

AT86906177T 1985-09-30 1986-09-30 APPARATUS AND METHOD FOR COATING IN A VACUUM CHAMBER BY ARC VAPOR DEPOSITION. ATE54678T1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US78146085A 1985-09-30 1985-09-30
US90651486A 1986-09-12 1986-09-12
PCT/US1986/002030 WO1987002072A1 (en) 1985-09-30 1986-09-30 Apparatus and process for arc vapor depositing a coating in an evacuated chamber
EP86906177A EP0238643B1 (en) 1985-09-30 1986-09-30 Apparatus and process for arc vapor depositing a coating in an evacuated chamber

Publications (1)

Publication Number Publication Date
ATE54678T1 true ATE54678T1 (en) 1990-08-15

Family

ID=27229903

Family Applications (1)

Application Number Title Priority Date Filing Date
AT86906177T ATE54678T1 (en) 1985-09-30 1986-09-30 APPARATUS AND METHOD FOR COATING IN A VACUUM CHAMBER BY ARC VAPOR DEPOSITION.

Country Status (1)

Country Link
AT (1) ATE54678T1 (en)

Similar Documents

Publication Publication Date Title
DE3587964D1 (en) Method and device for chemical vapor deposition using a magnetron-enhanced plasma.
DE3678686D1 (en) METHOD AND DEVICE FOR COATING SUBSTRATES BY PLASMA DISCHARGE.
DE3674639D1 (en) METHOD FOR PLASMA SPRAY COATING WITH A MULTIPLE SPRAY GUN AND DEVICE THEREFOR.
EP0318395A3 (en) An apparatus for metal organic chemical vapor deposition and a method using the same
GB2138630B (en) Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems
DE3854541T2 (en) Method and device for treating a material by plasma.
DE59104022D1 (en) Method and device for coating substrates by means of a magnetron cathode.
DE69032824D1 (en) Laser vapor deposition process
DE3777394D1 (en) METHOD FOR CONTROLLING A VACUUM CLEANER OR A CENTRAL VACUUM CLEANER.
DE3062678D1 (en) A method for processing substrate materials by means of treating plasma
DE3851191T2 (en) Process for coating a substrate.
DE69017744D1 (en) Apparatus and method for processing a semiconductor device using a microwave-generated plasma.
DE3671580D1 (en) METHOD FOR PRODUCING A MULTILAYER CERAMIC SUBSTRATE.
DE3673785D1 (en) METHOD FOR TREATING A GAS MIXTURE BY ADSORPTION.
DE3667895D1 (en) DEVICE FOR GENERATING A SUBSTANTIALLY HOMOGENEOUS PLASMA.
DE3577997D1 (en) METHOD AND DEVICE FOR COVERING THROUGH VACUUM COATING.
ATA23486A (en) COMPOSITE FROM POLYVINGLIDE FLUORIDE AND AETHYLENE CARBON OXIDE COPOLYMER, METHOD FOR COATING A SUBSTRATE THEREOF AND METHOD FOR PRODUCING A COMPOSITE THEREOF
DE69229195D1 (en) Process for reactive ion etching
DE3484059D1 (en) METHOD AND DEVICE FOR COATING A SUBSTRATE.
EP0233610A3 (en) Method and apparatus for vapor deposition
DE3672819D1 (en) DEVICE AND METHOD FOR COATING IN A VACUUM CHAMBER THROUGH ARC EVAPORATION.
DE3763362D1 (en) METHOD AND DEVICE FOR VACUUM EVAPORATING A COMPONENT MIXTURE.
DE3674142D1 (en) METHOD FOR TREATING A GAS.
EP0301604A3 (en) Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus
IL66878A (en) Method and apparatus for the vapor deposition of material upon a substrate