ATE545858T1 - X-RAY APPARATUS - Google Patents

X-RAY APPARATUS

Info

Publication number
ATE545858T1
ATE545858T1 AT07291646T AT07291646T ATE545858T1 AT E545858 T1 ATE545858 T1 AT E545858T1 AT 07291646 T AT07291646 T AT 07291646T AT 07291646 T AT07291646 T AT 07291646T AT E545858 T1 ATE545858 T1 AT E545858T1
Authority
AT
Austria
Prior art keywords
designed
optical element
focal spot
ray
focus
Prior art date
Application number
AT07291646T
Other languages
German (de)
Inventor
Blandine Lantz
Peter Hoghoj
Original Assignee
Xenocs S A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xenocs S A filed Critical Xenocs S A
Application granted granted Critical
Publication of ATE545858T1 publication Critical patent/ATE545858T1/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal

Abstract

The invention refers to an X-ray beam device for X-ray analytical applications, comprising an X-ray source designed such as to emit a divergent beam of X-rays; and an optical assembly designed such as to focus said beam onto a focal spot, wherein said optical assembly comprises a first reflecting optical element, a monochromator device and a second reflecting optical element sequentially arranged between said source and said focal spot, wherein said first optical element is designed such as to collimate said beam in two dimensions towards said monochromator device, and wherein said second optical element is designed such as to focus the beam coming from said monochromator device in two dimensions onto said focal spot.
AT07291646T 2007-12-31 2007-12-31 X-RAY APPARATUS ATE545858T1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07291646A EP2075569B1 (en) 2007-12-31 2007-12-31 X-ray beam device

Publications (1)

Publication Number Publication Date
ATE545858T1 true ATE545858T1 (en) 2012-03-15

Family

ID=39493934

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07291646T ATE545858T1 (en) 2007-12-31 2007-12-31 X-RAY APPARATUS

Country Status (4)

Country Link
US (1) US8422633B2 (en)
EP (1) EP2075569B1 (en)
AT (1) ATE545858T1 (en)
WO (1) WO2009083605A1 (en)

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US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US9269468B2 (en) * 2012-04-30 2016-02-23 Jordan Valley Semiconductors Ltd. X-ray beam conditioning
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US9449781B2 (en) 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
EP3152554B1 (en) * 2014-06-06 2019-07-24 Sigray Inc. X-ray absorption measurement system
JP6069609B2 (en) * 2015-03-26 2017-02-01 株式会社リガク Double-curved X-ray condensing element and its constituent, double-curved X-ray spectroscopic element and method for producing the constituent
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10151713B2 (en) 2015-05-21 2018-12-11 Industrial Technology Research Institute X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
JP6322172B2 (en) * 2015-09-11 2018-05-09 株式会社リガク X-ray small angle optical system
JP6632852B2 (en) * 2015-10-06 2020-01-22 浜松ホトニクス株式会社 X-ray imaging apparatus and X-ray imaging method
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
CN106556461B (en) * 2016-12-08 2018-04-06 中国科学院光电技术研究所 A kind of optical spectrum imaging device based on adaptive optics
JP6937380B2 (en) 2017-03-22 2021-09-22 シグレイ、インコーポレイテッド Methods for performing X-ray spectroscopy and X-ray absorption spectroscopy systems
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
JP2019191169A (en) 2018-04-23 2019-10-31 ブルカー ジェイヴィ イスラエル リミテッドＢｒｕｋｅｒ Ｊｖ Ｉｓｒａｅｌ Ｌｔｄ． X-ray source optical system for small-angle x-ray scatterometry
EP3612821B1 (en) * 2018-05-15 2021-07-07 Xenocs SAS Method and apparatus for x-ray scattering material analysis
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
KR20210065084A (en) 2018-07-05 2021-06-03 브루커 테크놀로지스 리미티드 Small-angle X-ray scattering measurement
JP7117452B2 (en) 2018-07-26 2022-08-12 シグレイ、インコーポレイテッド High brightness reflection type X-ray source
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
DE112019004433T5 (en) 2018-09-04 2021-05-20 Sigray, Inc. SYSTEM AND PROCEDURE FOR X-RAY FLUORESCENCE WITH FILTERING
CN112823280A (en) 2018-09-07 2021-05-18 斯格瑞公司 System and method for depth-selectable X-ray analysis
WO2020260336A1 (en) * 2019-06-24 2020-12-30 Sms Group Gmbh Controlling the process parameters by means of radiographic online determination of material properties when producing metallic strips and sheets
WO2021162947A1 (en) 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles
CN112649453B (en) * 2020-12-09 2021-11-12 北京大学 Method for measuring four-dimensional electron energy loss spectrum of sample to be measured
US11781999B2 (en) 2021-09-05 2023-10-10 Bruker Technologies Ltd. Spot-size control in reflection-based and scatterometry-based X-ray metrology systems

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US3032656A (en) * 1957-08-15 1962-05-01 Licentia Gmbh X-ray refracting optical element
WO1995005725A1 (en) * 1993-08-16 1995-02-23 Commonwealth Scientific And Industrial Research Organisation Improved x-ray optics, especially for phase contrast imaging
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
JP3741411B2 (en) * 1999-10-01 2006-02-01 株式会社リガク X-ray focusing apparatus and X-ray apparatus
US6704390B2 (en) * 2000-05-29 2004-03-09 Vladimir Kogan X-ray analysis apparatus provided with a multilayer mirror and an exit collimator
US20020027972A1 (en) * 2000-08-07 2002-03-07 Joy Marshall K. Microfocus-polycapillary optic x-ray system for x-ray analysis
US6625251B2 (en) * 2000-09-22 2003-09-23 Ntt Advanced Technology Corporation Laser plasma x-ray generation apparatus
CN1332399C (en) * 2002-06-19 2007-08-15 谢诺思公司 Optical unit for X-ray application
FR2850171B1 (en) * 2003-01-21 2005-04-08 Xenocs OPTICAL DEVICE FOR X-RAY APPLICATIONS

Also Published As

Publication number Publication date
WO2009083605A1 (en) 2009-07-09
EP2075569A1 (en) 2009-07-01
US20100272239A1 (en) 2010-10-28
US8422633B2 (en) 2013-04-16
EP2075569B1 (en) 2012-02-15

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