ATE514122T1 - Lithiumsalz von polyacetylen als strahlungsempfindliche filamente und herstellung und verwendung dafür - Google Patents
Lithiumsalz von polyacetylen als strahlungsempfindliche filamente und herstellung und verwendung dafürInfo
- Publication number
- ATE514122T1 ATE514122T1 AT04719225T AT04719225T ATE514122T1 AT E514122 T1 ATE514122 T1 AT E514122T1 AT 04719225 T AT04719225 T AT 04719225T AT 04719225 T AT04719225 T AT 04719225T AT E514122 T1 ATE514122 T1 AT E514122T1
- Authority
- AT
- Austria
- Prior art keywords
- lithium salt
- polyacetylene
- filaments
- production
- radiation sensitive
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 title abstract 2
- 229910003002 lithium salt Inorganic materials 0.000 title abstract 2
- 159000000002 lithium salts Chemical class 0.000 title abstract 2
- 229920001197 polyacetylene Polymers 0.000 title abstract 2
- 150000007942 carboxylates Chemical class 0.000 abstract 1
- 150000001735 carboxylic acids Chemical class 0.000 abstract 1
- 238000001514 detection method Methods 0.000 abstract 1
- 238000003384 imaging method Methods 0.000 abstract 1
- 238000013507 mapping Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Measurement Of Radiation (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US45955903P | 2003-04-01 | 2003-04-01 | |
| US10/789,007 US20040197700A1 (en) | 2003-04-01 | 2004-02-27 | Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| PCT/US2004/007273 WO2004095065A2 (en) | 2003-04-01 | 2004-03-10 | Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE514122T1 true ATE514122T1 (de) | 2011-07-15 |
Family
ID=33313390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04719225T ATE514122T1 (de) | 2003-04-01 | 2004-03-10 | Lithiumsalz von polyacetylen als strahlungsempfindliche filamente und herstellung und verwendung dafür |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20040197700A1 (de) |
| EP (1) | EP1614002B1 (de) |
| JP (1) | JP4580922B2 (de) |
| AT (1) | ATE514122T1 (de) |
| AU (1) | AU2004232140B2 (de) |
| CA (1) | CA2520790C (de) |
| WO (1) | WO2004095065A2 (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7482601B2 (en) * | 2005-07-22 | 2009-01-27 | Isp Investments Inc. | Radiation sensitive film including a measuring scale |
| US7798414B2 (en) * | 2006-07-21 | 2010-09-21 | Isp Investments Inc. | Human and scanner readable radiation exposure indicator with reactive barcode |
| FR3024553A1 (fr) * | 2014-07-29 | 2016-02-05 | Areva Nc | Formulations de gels pour la detection et la localisation d'une contamination radioactive en surface de substrats solides et procede de detection, de localisation et de decontamination utilisant ces gels. |
| BR112022000934A2 (pt) * | 2019-07-18 | 2022-07-05 | Isp Investments Llc | Etiqueta autoadesiva flexível compreendendo um indicador sensível à radiação para uma seringa |
| US20260055280A1 (en) * | 2021-10-11 | 2026-02-26 | Isp Investments Llc | Radiation sensitive compositions comprising a combination of metals or metalloid compounds |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3501303A (en) * | 1966-06-06 | 1970-03-17 | Battelle Development Corp | Photosensitive crystalline polyacetylenic system and method of exposure |
| US3501308A (en) | 1966-07-01 | 1970-03-17 | Battelle Development Corp | Photosensitive crystalline polyacetylenic sensitized with a pi-acid |
| US3844791A (en) | 1971-06-14 | 1974-10-29 | Eastman Kodak Co | Photosensitive material comprising polyacetylenic amine salts |
| US3772028A (en) | 1972-02-02 | 1973-11-13 | Eastman Kodak Co | Sensitized photosensitive compounds and elements |
| US3954816A (en) | 1972-12-14 | 1976-05-04 | Eastman Kodak Company | Photosensitive material comprising polyacetylenic amine salts |
| US4066676A (en) | 1974-02-06 | 1978-01-03 | Eastman Kodak Company | Photosensitive material comprising polyacetylenic amine salts |
| US4581315A (en) | 1979-06-25 | 1986-04-08 | University Patents, Inc. | Photoresistive compositions |
| JPS60229944A (ja) * | 1984-04-27 | 1985-11-15 | Agency Of Ind Science & Technol | 有機導電性材料の製造方法 |
| US4921531A (en) * | 1984-10-19 | 1990-05-01 | Martin Marietta Corporation | Process for forming fine ceramic powders |
| US4734355A (en) * | 1985-09-09 | 1988-03-29 | Gaf Corporation | Sensitivity of processless recording media |
| US5232820A (en) * | 1991-03-18 | 1993-08-03 | Isp Investments Inc. | Process of directly imaging a thermosensitive polyacetylene salt dyes |
| US5731112A (en) * | 1996-05-23 | 1998-03-24 | Isp Investments Inc. | Processless diacetylenic salt films capable of developing a black image |
| US6017390A (en) * | 1996-07-24 | 2000-01-25 | The Regents Of The University Of California | Growth of oriented crystals at polymerized membranes |
| JP2005502051A (ja) * | 2001-08-28 | 2005-01-20 | アイエスピー インヴェストメンツ インコーポレイテッド | 安定したラジオクロミック線量計測フィルム及びその製造方法 |
| WO2004077097A2 (en) * | 2003-02-27 | 2004-09-10 | Jp Laboratories Inc. | Self-indicating radiation alert dosimeter |
-
2004
- 2004-02-27 US US10/789,007 patent/US20040197700A1/en not_active Abandoned
- 2004-03-10 AU AU2004232140A patent/AU2004232140B2/en not_active Expired
- 2004-03-10 JP JP2006507027A patent/JP4580922B2/ja not_active Expired - Lifetime
- 2004-03-10 AT AT04719225T patent/ATE514122T1/de not_active IP Right Cessation
- 2004-03-10 WO PCT/US2004/007273 patent/WO2004095065A2/en not_active Ceased
- 2004-03-10 EP EP04719225A patent/EP1614002B1/de not_active Expired - Lifetime
- 2004-03-10 CA CA2520790A patent/CA2520790C/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20040197700A1 (en) | 2004-10-07 |
| WO2004095065A2 (en) | 2004-11-04 |
| AU2004232140B2 (en) | 2009-03-05 |
| WO2004095065A3 (en) | 2005-07-28 |
| EP1614002B1 (de) | 2011-06-22 |
| JP4580922B2 (ja) | 2010-11-17 |
| JP2007524718A (ja) | 2007-08-30 |
| CA2520790C (en) | 2012-05-15 |
| EP1614002A4 (de) | 2007-10-03 |
| CA2520790A1 (en) | 2004-11-04 |
| EP1614002A2 (de) | 2006-01-11 |
| AU2004232140A1 (en) | 2004-11-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |