ATE252761T1 - System zur datensicherung auf einem datenträger - Google Patents

System zur datensicherung auf einem datenträger

Info

Publication number
ATE252761T1
ATE252761T1 AT01910216T AT01910216T ATE252761T1 AT E252761 T1 ATE252761 T1 AT E252761T1 AT 01910216 T AT01910216 T AT 01910216T AT 01910216 T AT01910216 T AT 01910216T AT E252761 T1 ATE252761 T1 AT E252761T1
Authority
AT
Austria
Prior art keywords
code
data
processor
sim
access
Prior art date
Application number
AT01910216T
Other languages
English (en)
Inventor
Claus Dorenbeck
Essen Robert Joannes Van
Original Assignee
Tele Atlas N V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tele Atlas N V filed Critical Tele Atlas N V
Application granted granted Critical
Publication of ATE252761T1 publication Critical patent/ATE252761T1/de

Links

Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R1/00—Details of transducers, loudspeakers or microphones
    • H04R1/005—Details of transducers, loudspeakers or microphones using digitally weighted transducing elements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Mobile Radio Communication Systems (AREA)
  • Cash Registers Or Receiving Machines (AREA)
  • Communication Control (AREA)
  • Circuits Of Receivers In General (AREA)
AT01910216T 2000-02-03 2001-02-05 System zur datensicherung auf einem datenträger ATE252761T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1014274A NL1014274C2 (nl) 2000-02-03 2000-02-03 Stelsel voor het beveiligen van op een datadrager aanwezige data.
PCT/NL2001/000086 WO2001057469A2 (en) 2000-02-03 2001-02-05 System for securing data on a data carrier

Publications (1)

Publication Number Publication Date
ATE252761T1 true ATE252761T1 (de) 2003-11-15

Family

ID=19770737

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01910216T ATE252761T1 (de) 2000-02-03 2001-02-05 System zur datensicherung auf einem datenträger

Country Status (7)

Country Link
US (1) US6883052B2 (de)
EP (1) EP1254454B1 (de)
AT (1) ATE252761T1 (de)
AU (1) AU2001237796A1 (de)
DE (1) DE60101045T2 (de)
NL (1) NL1014274C2 (de)
WO (1) WO2001057469A2 (de)

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US7825038B2 (en) * 2006-05-30 2010-11-02 Applied Materials, Inc. Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen
US20070277734A1 (en) * 2006-05-30 2007-12-06 Applied Materials, Inc. Process chamber for dielectric gapfill
US7498273B2 (en) * 2006-05-30 2009-03-03 Applied Materials, Inc. Formation of high quality dielectric films of silicon dioxide for STI: usage of different siloxane-based precursors for harp II—remote plasma enhanced deposition processes
US8232176B2 (en) * 2006-06-22 2012-07-31 Applied Materials, Inc. Dielectric deposition and etch back processes for bottom up gapfill
US7886355B2 (en) * 2006-06-30 2011-02-08 Motorola Mobility, Inc. Subsidy lock enabled handset device with asymmetric verification unlocking control and method thereof
US20080003980A1 (en) * 2006-06-30 2008-01-03 Motorola, Inc. Subsidy-controlled handset device via a sim card using asymmetric verification and method thereof
US20080051069A1 (en) * 2006-08-25 2008-02-28 Research In Motion Limited Method and system for managing trial service subscriptions for a mobile communications device
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US7745352B2 (en) * 2007-08-27 2010-06-29 Applied Materials, Inc. Curing methods for silicon dioxide thin films deposited from alkoxysilane precursor with harp II process
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US7943531B2 (en) * 2007-10-22 2011-05-17 Applied Materials, Inc. Methods for forming a silicon oxide layer over a substrate
US7867923B2 (en) * 2007-10-22 2011-01-11 Applied Materials, Inc. High quality silicon oxide films by remote plasma CVD from disilane precursors
US7541297B2 (en) * 2007-10-22 2009-06-02 Applied Materials, Inc. Method and system for improving dielectric film quality for void free gap fill
US7964040B2 (en) * 2007-11-08 2011-06-21 Applied Materials, Inc. Multi-port pumping system for substrate processing chambers
US20090120368A1 (en) * 2007-11-08 2009-05-14 Applied Materials, Inc. Rotating temperature controlled substrate pedestal for film uniformity
US20090120584A1 (en) * 2007-11-08 2009-05-14 Applied Materials, Inc. Counter-balanced substrate support
US8153348B2 (en) * 2008-02-20 2012-04-10 Applied Materials, Inc. Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch
US20090248237A1 (en) * 2008-03-31 2009-10-01 Koepf Gerhard A Methods and systems for user configurable embedded telematics service architecture
US20090277587A1 (en) * 2008-05-09 2009-11-12 Applied Materials, Inc. Flowable dielectric equipment and processes
US8357435B2 (en) * 2008-05-09 2013-01-22 Applied Materials, Inc. Flowable dielectric equipment and processes
US20100081293A1 (en) * 2008-10-01 2010-04-01 Applied Materials, Inc. Methods for forming silicon nitride based film or silicon carbon based film
CN102207910A (zh) * 2010-03-29 2011-10-05 联想(北京)有限公司 一种只读存储器、数据安全保护系统、方法及计算机
US20160225652A1 (en) 2015-02-03 2016-08-04 Applied Materials, Inc. Low temperature chuck for plasma processing systems
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Also Published As

Publication number Publication date
US6883052B2 (en) 2005-04-19
WO2001057469A2 (en) 2001-08-09
WO2001057469A3 (en) 2002-02-14
DE60101045D1 (de) 2003-11-27
US20030162527A1 (en) 2003-08-28
EP1254454B1 (de) 2003-10-22
DE60101045T2 (de) 2004-07-08
NL1014274C2 (nl) 2001-08-16
EP1254454A2 (de) 2002-11-06
AU2001237796A1 (en) 2001-08-14

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