ATE175179T1 - Metallisierte keramische körper und verfahren zu deren herstellung - Google Patents

Metallisierte keramische körper und verfahren zu deren herstellung

Info

Publication number
ATE175179T1
ATE175179T1 AT90400458T AT90400458T ATE175179T1 AT E175179 T1 ATE175179 T1 AT E175179T1 AT 90400458 T AT90400458 T AT 90400458T AT 90400458 T AT90400458 T AT 90400458T AT E175179 T1 ATE175179 T1 AT E175179T1
Authority
AT
Austria
Prior art keywords
ceramic body
layer
production
metallized ceramic
substrate
Prior art date
Application number
AT90400458T
Other languages
English (en)
Inventor
Pierre Jalby
Frederic Rotman
Pierre Claverie
Juichi Arai
Maso Kimura
Jean-Marie Friedt
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Application granted granted Critical
Publication of ATE175179T1 publication Critical patent/ATE175179T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/5133—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of one or more of the refractory metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
AT90400458T 1990-02-20 1990-02-20 Metallisierte keramische körper und verfahren zu deren herstellung ATE175179T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP90400458A EP0443277B1 (de) 1990-02-20 1990-02-20 Metallisierte keramische Körper und Verfahren zu deren Herstellung

Publications (1)

Publication Number Publication Date
ATE175179T1 true ATE175179T1 (de) 1999-01-15

Family

ID=8205684

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90400458T ATE175179T1 (de) 1990-02-20 1990-02-20 Metallisierte keramische körper und verfahren zu deren herstellung

Country Status (7)

Country Link
EP (1) EP0443277B1 (de)
JP (1) JPH04218674A (de)
KR (1) KR910015718A (de)
AT (1) ATE175179T1 (de)
CA (1) CA2036541A1 (de)
DE (1) DE69032867T2 (de)
ES (1) ES2127183T3 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118702507B (zh) * 2024-08-14 2024-12-20 湖南省新化县鑫星电子陶瓷有限责任公司 一种氧化铝陶瓷基片的表面金属化工艺

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2344642A1 (fr) * 1976-03-16 1977-10-14 Thomson Csf Procede de realisation de depots metalliques sur des supports en nitrure de bore
US4629635A (en) * 1984-03-16 1986-12-16 Genus, Inc. Process for depositing a low resistivity tungsten silicon composite film on a substrate
US4766006A (en) * 1986-05-15 1988-08-23 Varian Associates, Inc. Low pressure chemical vapor deposition of metal silicide
US4756927A (en) * 1986-05-29 1988-07-12 Massachusetts Institute Of Technology Method and apparatus for refractory metal deposition
EP0305143B1 (de) * 1987-08-24 1993-12-08 Fujitsu Limited Verfahren zur selektiven Ausbildung einer Leiterschicht

Also Published As

Publication number Publication date
KR910015718A (ko) 1991-09-30
JPH04218674A (ja) 1992-08-10
ES2127183T3 (es) 1999-04-16
DE69032867T2 (de) 1999-06-17
EP0443277B1 (de) 1998-12-30
DE69032867D1 (de) 1999-02-11
CA2036541A1 (en) 1991-08-21
EP0443277A1 (de) 1991-08-28

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