ATA522681A - Freitragende maske - Google Patents

Freitragende maske

Info

Publication number
ATA522681A
ATA522681A AT522681A AT522681A ATA522681A AT A522681 A ATA522681 A AT A522681A AT 522681 A AT522681 A AT 522681A AT 522681 A AT522681 A AT 522681A AT A522681 A ATA522681 A AT A522681A
Authority
AT
Austria
Prior art keywords
supporting mask
mask
supporting
Prior art date
Application number
AT522681A
Other languages
English (en)
Other versions
AT383438B (de
Original Assignee
Rudolf Sacher Ges M B H
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rudolf Sacher Ges M B H filed Critical Rudolf Sacher Ges M B H
Priority to AT522681A priority Critical patent/AT383438B/de
Publication of ATA522681A publication Critical patent/ATA522681A/de
Application granted granted Critical
Publication of AT383438B publication Critical patent/AT383438B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
AT522681A 1981-12-04 1981-12-04 Freitragende maske AT383438B (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT522681A AT383438B (de) 1981-12-04 1981-12-04 Freitragende maske

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT522681A AT383438B (de) 1981-12-04 1981-12-04 Freitragende maske

Publications (2)

Publication Number Publication Date
ATA522681A true ATA522681A (de) 1986-11-15
AT383438B AT383438B (de) 1987-07-10

Family

ID=3573383

Family Applications (1)

Application Number Title Priority Date Filing Date
AT522681A AT383438B (de) 1981-12-04 1981-12-04 Freitragende maske

Country Status (1)

Country Link
AT (1) AT383438B (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATA331185A (de) * 1985-11-13 1994-05-15 Ims Ionen Mikrofab Syst Verfahren zum stabilisieren von masken
ATA331085A (de) * 1985-11-13 1994-05-15 Ims Ionen Mikrofab Syst Teilchen- oder strahlenbelastbare maske und verfahren zur herstellung derselben

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2416186C3 (de) * 1974-04-03 1978-12-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Maske zur Strukturierung dünner Schichten
DE2512086C3 (de) * 1975-03-19 1978-11-30 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung freitragender, dünner Metallstrukturen
DE2643811C2 (de) * 1975-10-28 1981-10-15 Hughes Aircraft Co., Culver City, Calif. Lithographie-Maske mit einer für Strahlung durchlässigen Membran und Verfahren zu ihrer Herstellung

Also Published As

Publication number Publication date
AT383438B (de) 1987-07-10

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee