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Application filed by Misomex AbfiledCriticalMisomex Ab
Priority to AT1148570ApriorityCriticalpatent/AT320683B/de
Application grantedgrantedCritical
Publication of AT320683BpublicationCriticalpatent/AT320683B/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/20—Exposure; Apparatus therefor
G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
AT1148570A1970-12-211970-12-21Verfahren und Vorrichtung zum Herstellen von Endlosmusterabbildungen
AT320683B
(de)