AT252318B - Halbleitervorrichtung mit einem Halbleiterkörper, in dem mindestens eine Flächentransistorstruktur vorgesehen ist - Google Patents

Halbleitervorrichtung mit einem Halbleiterkörper, in dem mindestens eine Flächentransistorstruktur vorgesehen ist

Info

Publication number
AT252318B
AT252318B AT654962A AT654962A AT252318B AT 252318 B AT252318 B AT 252318B AT 654962 A AT654962 A AT 654962A AT 654962 A AT654962 A AT 654962A AT 252318 B AT252318 B AT 252318B
Authority
AT
Austria
Prior art keywords
transistor structure
semiconductor device
semiconductor
flat transistor
semiconductor body
Prior art date
Application number
AT654962A
Other languages
German (de)
English (en)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of AT252318B publication Critical patent/AT252318B/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0744Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common without components of the field effect type
    • H01L27/075Bipolar transistors in combination with diodes, or capacitors, or resistors, e.g. lateral bipolar transistor, and vertical bipolar transistor and resistor
    • H01L27/0755Vertical bipolar transistor in combination with diodes, or capacitors, or resistors
    • H01L27/0772Vertical bipolar transistor in combination with resistors only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0744Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common without components of the field effect type
    • H01L27/075Bipolar transistors in combination with diodes, or capacitors, or resistors, e.g. lateral bipolar transistor, and vertical bipolar transistor and resistor
    • H01L27/0755Vertical bipolar transistor in combination with diodes, or capacitors, or resistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/032Diffusion length

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
AT654962A 1961-08-17 1962-08-14 Halbleitervorrichtung mit einem Halbleiterkörper, in dem mindestens eine Flächentransistorstruktur vorgesehen ist AT252318B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL268355 1961-08-17

Publications (1)

Publication Number Publication Date
AT252318B true AT252318B (de) 1967-02-10

Family

ID=19753238

Family Applications (1)

Application Number Title Priority Date Filing Date
AT654962A AT252318B (de) 1961-08-17 1962-08-14 Halbleitervorrichtung mit einem Halbleiterkörper, in dem mindestens eine Flächentransistorstruktur vorgesehen ist

Country Status (10)

Country Link
US (1) US3250968A (US07922777-20110412-C00004.png)
AT (1) AT252318B (US07922777-20110412-C00004.png)
BE (1) BE621467A (US07922777-20110412-C00004.png)
CH (1) CH422996A (US07922777-20110412-C00004.png)
DE (1) DE1464286C3 (US07922777-20110412-C00004.png)
DK (1) DK111628C (US07922777-20110412-C00004.png)
ES (1) ES280027A1 (US07922777-20110412-C00004.png)
FI (1) FI41676B (US07922777-20110412-C00004.png)
GB (1) GB1017777A (US07922777-20110412-C00004.png)
NL (2) NL268355A (US07922777-20110412-C00004.png)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3416049A (en) * 1963-05-17 1968-12-10 Sylvania Electric Prod Integrated bias resistors for micro-logic circuitry
US3418545A (en) * 1965-08-23 1968-12-24 Jearld L. Hutson Photosensitive devices having large area light absorbing junctions
US5140399A (en) * 1987-04-30 1992-08-18 Sony Corporation Heterojunction bipolar transistor and the manufacturing method thereof
JP2581071B2 (ja) * 1987-04-30 1997-02-12 ソニー株式会社 ヘテロ接合型バイポーラトランジスタ及びその製造方法並びにそれを用いたメモリセル

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2666814A (en) * 1949-04-27 1954-01-19 Bell Telephone Labor Inc Semiconductor translating device
BE519804A (US07922777-20110412-C00004.png) * 1952-05-09
DE960655C (de) * 1952-10-10 1957-03-28 Siemens Ag Kristalltriode oder -polyode
US3108210A (en) * 1953-03-11 1963-10-22 Rca Corp Multi-electrode semiconductor devices
US2816228A (en) * 1953-05-21 1957-12-10 Rca Corp Semiconductor phase shift oscillator and device
US2787564A (en) * 1954-10-28 1957-04-02 Bell Telephone Labor Inc Forming semiconductive devices by ionic bombardment
NL207910A (US07922777-20110412-C00004.png) * 1955-06-20
US3062690A (en) * 1955-08-05 1962-11-06 Hoffman Electronics Corp Semi-conductor device and method of making the same
US3111611A (en) * 1957-09-24 1963-11-19 Ibm Graded energy gap semiconductor devices
NL106425C (US07922777-20110412-C00004.png) * 1958-01-14
US3015762A (en) * 1959-03-23 1962-01-02 Shockley William Semiconductor devices
US3029366A (en) * 1959-04-22 1962-04-10 Sprague Electric Co Multiple semiconductor assembly
US3115581A (en) * 1959-05-06 1963-12-24 Texas Instruments Inc Miniature semiconductor integrated circuit
NL260481A (US07922777-20110412-C00004.png) * 1960-02-08
US3100276A (en) * 1960-04-18 1963-08-06 Owen L Meyer Semiconductor solid circuits
US3070762A (en) * 1960-05-02 1962-12-25 Texas Instruments Inc Voltage tuned resistance-capacitance filter, consisting of integrated semiconductor elements usable in phase shift oscillator

Also Published As

Publication number Publication date
DE1464286B2 (de) 1973-05-30
DE1464286C3 (de) 1973-12-13
US3250968A (en) 1966-05-10
ES280027A1 (es) 1962-12-01
NL268355A (US07922777-20110412-C00004.png)
CH422996A (de) 1966-10-31
BE621467A (US07922777-20110412-C00004.png)
DE1464286A1 (de) 1969-04-03
GB1017777A (en) 1966-01-19
FI41676B (US07922777-20110412-C00004.png) 1969-09-30
DK111628B (US07922777-20110412-C00004.png) 1968-09-23
DK111628C (da) 1968-09-23
NL130500C (US07922777-20110412-C00004.png)

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