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Application filed by Gevaert Photo Prod NvfiledCriticalGevaert Photo Prod Nv
Application grantedgrantedCritical
Publication of AT247883BpublicationCriticalpatent/AT247883B/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Printing Methods
(AREA)
Manufacture Or Reproduction Of Printing Formes
(AREA)
Printing Plates And Materials Therefor
(AREA)
AT636863A1962-08-071963-08-07Lichtempfindliches Material zur Herstellung von Siebdruckschablonen
AT247883B
(de)