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Application filed by Hpo Assets LlcfiledCriticalHpo Assets Llc
Publication of AR094805A1publicationCriticalpatent/AR094805A1/en
Se proveen métodos para la preparación de capas con topografías con patrones nanométricos y micrométricos por medio de la acción láser o la impresión de chorro de tinta sobre una primera superficie. Estas topografías tienen una periodicidad de 5 nm a 500 mm en una primera dirección en el plano de la primera superficie. Estas capas pueden usarse como capas de alineación con patrón anisotrópico en dispositivos electroópticos, y generar un orden orientacional de por lo menos 0,30.Methods are provided for the preparation of layers with topographies with nanometric and micrometric patterns by means of laser action or inkjet printing on a first surface. These topographies have a periodicity of 5 nm to 500 mm in a first direction in the plane of the first surface. These layers can be used as alignment layers with anisotropic pattern in electro-optical devices, and generate an orientation order of at least 0.30.
ARP140100488A2013-02-152014-02-14
LAYERS OF LIQUID GLASS ALIGNMENT AND MANUFACTURING METHOD
AR094805A1
(en)
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