WO2021187456A1 - Method for producing surface-modified tetrafluoroethylene-based polymer, method for producing modified powder, liquid composition, method for producing modified molded article, and modified molded article - Google Patents
Method for producing surface-modified tetrafluoroethylene-based polymer, method for producing modified powder, liquid composition, method for producing modified molded article, and modified molded article Download PDFInfo
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- WO2021187456A1 WO2021187456A1 PCT/JP2021/010519 JP2021010519W WO2021187456A1 WO 2021187456 A1 WO2021187456 A1 WO 2021187456A1 JP 2021010519 W JP2021010519 W JP 2021010519W WO 2021187456 A1 WO2021187456 A1 WO 2021187456A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/28—Treatment by wave energy or particle radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
- C08J3/03—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in aqueous media
- C08J3/05—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in aqueous media from solid polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/12—Powdering or granulating
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08L27/18—Homopolymers or copolymers or tetrafluoroethene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08J2327/18—Homopolymers or copolymers of tetrafluoroethylene
Definitions
- the present invention relates to a method for producing a surface-modified tetrafluoroethylene polymer, a method for producing a modified powder, a liquid composition, a method for producing a modified molded product, and a modified molded product.
- the tetrafluoroethylene polymer has excellent physical properties such as releasability, electrical insulation, water and oil repellency, chemical resistance, weather resistance, and heat resistance, and the liquid composition in which the powder is dispersed can be molded in various ways. It is useful as a material that can easily form an object (Patent Document 1).
- Patent Document 1 the tetrafluoroethylene-based polymer has extremely low polarity and has poor interaction with other compounds such as a liquid dispersion medium, so that the dispersibility of the powder is still insufficient. Therefore, in order to improve the dispersibility of the powder and adjust the liquid physical characteristics of the liquid composition, an adjusting agent such as a surfactant or a thickener is often added to the liquid composition.
- the tetrafluoroethylene polymer film has excellent physical properties such as electrical insulation, water and oil repellency, chemical resistance, and heat resistance, and is useful as a printed circuit board material (Patent Document 2).
- Patent Document 2 the film of the tetrafluoroethylene polymer is not yet sufficiently adhesive. Therefore, it has been studied to modify the surface of the film for the purpose of improving the surface physical properties such as adhesiveness.
- Patent Document 3 describes a method of introducing a peroxide functional group onto the surface of a film by plasma-treating a polytetrafluoroethylene film in an atmosphere near atmospheric pressure containing a rare gas.
- the tetrafluoroethylene polymer is a low-polarity polymer having excellent insulation resistance and dielectric breakdown, and the surface of the molded product is difficult to be easily modified. Further, the behavior when the tetrafluoroethylene polymer is subjected to plasma treatment is not fully known, and the effect may be difficult to stabilize and the effect may not be sustained.
- Patent Document 3 a polytetrafluoroethylene film is plasma-treated to introduce a peroxide functional group on the surface, further immersed in water to introduce a hydroxyl group on the surface, and a silane coupling agent is further acted on.
- the film is surface-modified.
- the present inventors have investigated a plasma treatment method that highly modifies the surface of a tetrafluoroethylene polymer powder.
- a plasma treatment method that highly modifies the surface of a tetrafluoroethylene polymer powder.
- the surface is modified, and the surface physical properties such as the wettability of the powder and the surface physical properties are prepared without impairing the physical properties.
- the dispersibility of the liquid composition is improved.
- the present inventors highly modify the surface of the tetrafluoroethylene-based polymer molded product, which does not require the combination as described in Patent Document 3.
- the possible plasma processing conditions were examined. As a result, it was found that when such a molded product is treated under predetermined plasma treatment conditions, a stable layer is formed. Further, it has been found that the formation of such a layer improves the wettability of the molded product and improves the surface physical properties such as adhesiveness without impairing the physical properties of the tetrafluoroethylene polymer of the entire molded product.
- An object of the present invention is to provide a method for highly modifying a tetrafluoroethylene polymer to improve its physical properties.
- An object of the present invention is to provide a method for highly surface-modifying a tetrafluoroethylene polymer powder to improve its surface physical characteristics, and a liquid composition prepared from the method and having excellent liquid physical characteristics such as dispersibility. do.
- An object of the present invention is to provide a method for highly surface-modifying a molded product of a tetrafluoroethylene-based polymer to improve the surface physical characteristics thereof, and a molded product of a highly surface-modified tetrafluoroethylene-based polymer. do.
- the present invention has the following aspects.
- ⁇ 1> A method for producing a modified tetrafluoroethylene polymer, wherein the tetrafluoroethylene polymer is plasma-treated in an atmosphere near atmospheric pressure to obtain a surface-modified tetrafluoroethylene polymer.
- ⁇ 2> A method for producing a modified powder, in which a tetrafluoroethylene polymer powder is plasma-treated in an atmosphere near atmospheric pressure to modify the surface of the powder.
- the powder is plasma-treated in an atmosphere near atmospheric pressure containing a reducing gas having a hydrogen atom to obtain a powder formed by introducing a hydrogen atom into the tetrafluoroethylene polymer.
- ⁇ 4> The production method of ⁇ 2> or ⁇ 3>, wherein the plasma treatment is performed in an atmosphere in which air is shielded.
- ⁇ 5> The production method of ⁇ 2> to ⁇ 4>, wherein the powder is plasma-treated in advance in an atmosphere containing a rare gas before the plasma treatment is performed.
- ⁇ 6> The production method of ⁇ 2> to ⁇ 5> above, wherein the atmosphere contains at least one gas of a reducing gas having a hydrogen atom, a vinyl compound and a vinylidene compound.
- ⁇ 7> The production method of ⁇ 2> to ⁇ 6>, wherein the atmosphere further contains a rare gas.
- ⁇ 8> The production method of ⁇ 2> to ⁇ 7> above, wherein the pressure near the atmospheric pressure is 0.08 to 0.12 MPa.
- ⁇ 9> The production method of ⁇ 2> to ⁇ 8> above, wherein the average particle size of the powder is 50 ⁇ m or less.
- ⁇ 10> The production method of ⁇ 2> to ⁇ 9> above, wherein the tetrafluoroethylene polymer is a tetrafluoroethylene polymer having a fluorine content of 70 to 76% by mass.
- ⁇ 11> The method for producing ⁇ 2> to ⁇ 10> above, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
- ⁇ 12> A liquid composition containing the modified powder obtained by any of the production methods ⁇ 2> to ⁇ 11> and a liquid dispersion medium in which the modified powder is dispersed.
- ⁇ 13> The liquid composition of ⁇ 12> above, wherein the modified powder has an average particle size of 50 ⁇ m or less.
- ⁇ 14> The liquid composition of ⁇ 12> or ⁇ 13>, wherein the tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer having a fluorine content of 70 to 76% by mass.
- ⁇ 15> The liquid composition of ⁇ 12> to ⁇ 14> above, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
- ⁇ 16> The tetrafluoroethylene polymer in which the surface layer of a molded product having at least a part of the surface layer containing a tetrafluoroethylene polymer is plasma-treated in an atmosphere near atmospheric pressure containing a reducing gas having a hydrogen atom.
- ⁇ 17> The manufacturing method of ⁇ 16>, wherein the plasma treatment is performed in an atmosphere in which air is shielded.
- ⁇ 18> The production method according to ⁇ 16> or ⁇ 17>, wherein the surface layer is plasma-treated in advance in an atmosphere that does not contain a reducing gas before the plasma treatment is performed.
- ⁇ 19> The production method of ⁇ 16> to ⁇ 18> above, wherein the reducing gas is hydrogen gas, ammonia gas, or hydrocarbon gas.
- the atmosphere of the plasma treatment further contains nitrogen gas or a rare gas.
- the pressure near the atmospheric pressure is 0.08 to 0.12 MPa.
- the molded product having at least a part of the surface layer containing the tetrafluoroethylene polymer is a film of the tetrafluoroethylene polymer or a laminate having a base material layer and a layer of the tetrafluoroethylene polymer.
- ⁇ 23> The method for producing ⁇ 16> to ⁇ 22>, wherein the tetrafluoroethylene polymer has a fluorine content of 70 to 76% by mass.
- ⁇ 24> The method for producing ⁇ 16> to ⁇ 23> above, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
- a modified layer formed by introducing hydrogen atoms into a tetrafluoroethylene polymer is provided on at least a part of the surface, and the modified layer has a depth from the surface measured by X-ray photoelectron spectroscopy.
- the maximum height of the peak at 284 eV to 286 eV in the region up to 1 nm is 0.2 times or more the maximum height of the peak at 289 eV to 295 eV in the region, and the content of fluorine atoms in the region is high.
- ⁇ 28> The molded product of ⁇ 25> to ⁇ 27>, wherein the modified layer has a thickness of less than 1000 nm.
- ⁇ 29> The molded product of ⁇ 25> to ⁇ 27> above, wherein the molded product is a film of a tetrafluoroethylene-based polymer or a laminate having a base material layer and a layer of a tetrafluoroethylene-based polymer.
- a highly modified tetrafluoroethylene polymer can be produced.
- a modified powder of a tetrafluoroethylene-based polymer having excellent wettability and dispersibility can be produced without impairing the physical properties of the tetrafluoroethylene-based polymer, and then a liquid having excellent liquid physical properties can be easily produced.
- the composition can be produced. From such a liquid composition, a molded product (layered molded product, single film, etc.) having the physical characteristics of a tetrafluoroethylene polymer and having excellent adhesiveness can be easily produced.
- a molded product of a tetrafluoroethylene polymer having a stable modified layer on at least a part of the surface which is formed by efficiently introducing hydrogen atoms into the tetrafluoroethylene polymer.
- a tetrafluoroethylene-based polymer molded product having the physical properties of the tetrafluoroethylene-based polymer as a whole and having improved surface physical properties such as adhesiveness can be obtained.
- the "tetrafluoroethylene-based polymer” is a polymer containing a unit (hereinafter, also referred to as "TFE unit”) based on tetrafluoroethylene (hereinafter, also referred to as "TFE”).
- TFE unit a unit based on tetrafluoroethylene
- glass transition point (Tg) of a polymer is a value measured by analyzing a polymer by a dynamic viscoelasticity measurement (DMA) method.
- DMA dynamic viscoelasticity measurement
- the “polymer melting temperature (melting point)” is the temperature corresponding to the maximum value of the melting peak measured by the differential scanning calorimetry (DSC) method.
- DSC differential scanning calorimetry
- (Meta) acrylate” is a general term for acrylate and methacrylate.
- “D50” is the average particle size of the powder, which is the volume-based cumulative 50% diameter of the powder obtained by the laser diffraction / scattering method. That is, the particle size distribution of the powder is measured by the laser diffraction / scattering method, the cumulative curve is obtained with the total volume of the powder population as 100%, and the particle size is the point at which the cumulative volume is 50% on the cumulative curve.
- “D90” is the cumulative volume particle size of the powder, which is the volume-based cumulative 90% diameter of the powder obtained in the same manner.
- the "monomer-based unit” means an atomic group based on the monomer formed by polymerization of the monomer.
- the unit may be a unit directly formed by a polymerization reaction, or may be a unit in which a part of the unit is converted into another structure by processing a polymer.
- the unit based on the monomer a is also simply referred to as “monomer a unit”.
- the production method of the present invention (hereinafter, also referred to as “this method") is modified by subjecting a tetrafluoroethylene polymer (hereinafter, also referred to as "F polymer”) to plasma treatment in an atmosphere near atmospheric pressure. It is a method for producing a modified F polymer, which obtains a quality F polymer.
- F polymer tetrafluoroethylene polymer
- the F polymer is a powder (hereinafter, also referred to as raw powder), and the raw powder is plasma-treated in an atmosphere near atmospheric pressure.
- a method for producing a modified powder which modifies the surface of the powder.
- the modified powder preferably has a modified layer formed by modifying the F polymer on the surface, and the modified layer is a modified layer formed by introducing a hydrogen atom into the F polymer, or F. It is more preferable that the modified layer is formed by introducing a polymer of a vinyl compound or a vinylidene compound into the polymer.
- the modified layer formed by introducing hydrogen atoms into the F polymer is located at 284 eV to 286 eV in the region from the surface to a depth of 1 nm as measured by X-ray photoelectron spectroscopy (hereinafter, also referred to as “ESCA”).
- the maximum height of the peak (hereinafter, also referred to as “peak H”) is 0.2 times the maximum height of the peak (hereinafter, also referred to as “peak F”) in the region from 289 eV to 295 eV. It is preferably more than that, and more preferably 1 times or more.
- QuanteraII (manufactured by ULVAC-PHI) is used for surface measurement by ESCA.
- a monochromatic AlK ⁇ ray is used as the X-ray source at 100 W, and a neutralizing gun using an ion gun and a barium oxide emitter is used to prevent charging of the sample surface, while the photoelectron detection area is 100 ⁇ m ⁇ , the photoelectron detection angle is 45 degrees, and the pass.
- the energy is 55 eV.
- the content ratio of fluorine atoms can be calculated from various peak intensities (N1s, O1s, C1s and F1s orbitals) detected by measurement. Further, the depth from the surface can be determined based on the sputtering rate of the SiO 2 sputtering film using C60 ions as the sputtering ions.
- Peak H and peak F are, in this order, a photoelectron peak (C1s) based on the 1s orbital of a carbon atom and a photoelectron peak (F1s) based on the 1s orbital of a fluorine atom.
- the peak H is a carbon atom and a hydrogen atom.
- the peak and peak F derived from the single bond (CH bond) of the above can be regarded as the peak derived from the single bond (CF bond) of a carbon atom and a fluorine atom.
- a photoelectron peak (O1s) based on the 1s orbital of an oxygen atom and a photoelectron peak (N1s) based on the 1s orbital of a nitrogen atom (hereinafter, also referred to as "other peaks”). (Note) is possible.
- the content ratio [atm%] of fluorine atoms in the region is preferably 55% or less, and more preferably 40% or less.
- the content ratio of fluorine atoms is a value calculated by the following procedure. In the range including the photoelectron peak of C1s, the photoelectron peak of O1s, the photoelectron peak of N1s and the photoelectron peak of F1s in ESCA, the background is subtracted and each element (carbon atom, oxygen atom, nitrogen atom and fluorine atom) is subtracted. ) Peak intensity is calculated.
- the correction value of the peak intensity obtained by dividing the peak intensity by the relative sensitivity coefficient peculiar to the element is obtained for each of the above four elements, and the ratio of the peak intensity (correction value) of the fluorine atom to the total of the correction values is "fluorine atom". Content ratio of ".
- the maximum height of the peak H of the surface of the raw powder is preferably less than 0.2 times, more preferably 0.1 times or less of the maximum height of the peak F.
- the surface of the raw powder preferably has a fluorine atom content of more than 55%, more preferably 60% or more.
- the plasma treatment in Method 1 is performed in the vicinity of atmospheric pressure, in other words, in an atmosphere with high gas density, it is considered that the gas contained in the atmosphere is partially converted into plasma. Further, it is considered that the gas contained in the atmosphere not only becomes plasma by itself, but also forms electrically neutral radicals and the like, and also serves as a denaturing component of the polymer. That is, in the plasma treatment in the present method 1, since the plasma treatment proceeds in such a state, it is considered that the F polymer is easily denatured efficiently.
- the gas contains a reducing gas having a hydrogen atom
- hydrogen radicals act on the CF bonds of the F polymer activated by plasma to modify the polymer.
- the atomic radius of the hydrogen atom and the atomic radius of the fluorine atom are about the same, and it is considered that this action is more likely to be enhanced.
- the present method 1 it is considered that non-fluorine atoms or molecules are efficiently introduced into the F polymer contained on the surface of the raw powder. Further, since the cutting of the F polymer on the surface of the raw powder by plasma is suppressed and the molecular weight reduction thereof is suppressed, the surface state of the modified F polymer is likely to be stable. According to this method 1, it is considered that a powder having the physical characteristics and excellent surface physical characteristics of the F polymer was obtained by such an action mechanism, and then a liquid composition having excellent dispersibility could be easily prepared.
- the fluorine content of the F polymer is preferably 70 to 76% by mass.
- the F polymer having a high fluorine content is excellent in physical properties (electrical properties, etc.) of the F polymer, but has a particularly low polarity, so that the surface physical properties (wetting property, etc.) of the raw powder are poor. According to this method, even in such a raw powder, a modified powder having improved surface physical properties can be obtained without impairing the physical properties of the entire F polymer.
- the melting temperature of the F polymer is preferably 180 ° C. or higher, preferably 200 to 325 ° C., and more preferably 280 to 320 ° C.
- the glass transition point of the F polymer is preferably 30 to 150 ° C, more preferably 75 to 125 ° C.
- F-polymers include polytetrafluoroethylene (PTFE), polymers (PFA) containing TFE units and units based on perfluoro (alkyl vinyl ether) (PAVE) (PAVE units), or copolymers containing units based on TFE and hexafluoropropylene (PFA).
- PTFE polytetrafluoroethylene
- PFA polymers
- PAVE perfluoro (alkyl vinyl ether)
- PFA copolymers containing units based on TFE and hexafluoropropylene
- FEP is preferred, and PFA or FEP is particularly preferred.
- These polymers may further contain units based on other com
- CF 2 CFOCF 3
- CF 2 CFOCF 2 CF 3
- CF 2 CFOCF 2 CF 3
- PPVE CFOCF 2 CF 2 CF 3
- the F polymer preferably has an atomic group containing an oxygen atom. According to this method, it is easy to obtain a modified molded product having further improved surface physical properties without impairing the physical properties of the F polymer based on the atomic group.
- the atomic group may be contained in the monomer unit in the F polymer, or may be contained in the terminal group of the main chain of the polymer. Examples of the latter aspect include an F polymer having the atomic group as a terminal group derived from a polymerization initiator, a chain transfer agent, or the like.
- the atomic group containing an oxygen atom is preferably a hydroxyl group-containing group or a carbonyl group-containing group, and a carbonyl group-containing group is particularly preferable.
- the hydroxyl group-containing group is preferably an alcoholic hydroxyl group-containing group, more preferably -CF 2 CH 2 OH or -C (CF 3 ) 2 OH.
- the carbonyl group-containing group is a group containing a carbonyl group (> C (O)), a carboxyl group, an alkoxycarbonyl group, an amide group, an isocyanate group, a carbamate group (-OC (O) NH 2 ), and an acid anhydride residue.
- a group (-C (O) OC (O)-), an imide residue (-C (O) NHC (O)-etc.) or a carbonate group (-OC (O) O-) is preferred, and an acid anhydride residue. Is particularly preferable.
- the number of carbonyl group-containing groups in the F polymer is preferably 10 to 5000, more preferably 100 to 3000, and more preferably 800, per 1 ⁇ 10 6 carbon atoms in the main chain. From 1500 pieces is more preferable.
- the number of carbonyl group-containing groups in the F polymer can be quantified by the method described in International Publication No. 2020/145133.
- Preferable embodiments of the F polymer include a polymer (1) containing TFE units and PAVE units and having atomic groups containing oxygen atoms, or TFE units and PAVE units, and 2 PAVE units for all monomer units.
- Examples thereof include the polymer (2) containing 0.0 to 5.0 mol% and having no atomic group containing oxygen atoms. Since these polymers form microspherulites in the molded product, the formation of the modified layer according to the first method is more likely to proceed.
- the polymer (1) is preferably a polymer containing a TFE unit, a PAVE unit, and a monomer unit having a hydroxyl group-containing group or a carbonyl group-containing group.
- the polymer (1) has 90 to 99 mol% of TFE units, 0.5 to 9.97 mol% of PAVE units, and 0.01 to 3 mol% of units based on the monomer, respectively, based on all the units. It is preferable to include it.
- the monomer is preferably itaconic anhydride, citraconic anhydride or 5-norbornene-2,3-dicarboxylic acid anhydride (also known as hymic anhydride; hereinafter, also referred to as “NAH”). Specific examples of the polymer (1) include the polymers described in WO 2018/16644.
- the polymer (2) consists of only TFE units and PAVE units, and contains 95.0 to 98.0 mol% of TFE units and 2.0 to 5.0 mol% of PAVE units with respect to all monomer units. Is preferable.
- the content of PAVE units in the polymer (2) is preferably 2.1 mol% or more, more preferably 2.2 mol% or more, based on all the monomer units.
- the fact that the polymer (2) does not have an atomic group containing an oxygen atom means that the atomic group containing an oxygen atom contained in the polymer has a ratio of 1 ⁇ 10 6 carbon atoms constituting the polymer main chain. It means that the number is less than 500.
- the number of atomic groups containing oxygen atoms is preferably 100 or less, more preferably less than 50.
- the lower limit of the number of atomic groups containing oxygen atoms is usually zero.
- the polymer (2) may be produced by using a polymerization initiator, a chain transfer agent, or the like that does not generate an atomic group containing an oxygen atom as a terminal group of the polymer chain, and is an F polymer having an atomic group containing an oxygen atom. May be produced by fluorination treatment. Examples of the fluorination treatment method include a method using fluorine gas (see JP-A-2019-194314, etc.).
- the raw powder is preferably composed of an F polymer.
- the content of the F polymer in the raw powder is preferably 80% by mass or more, and more preferably 100% by mass.
- Other components that can be contained in the raw powder include heat-resistant resins such as aromatic polyester, polyamide-imide, thermoplastic polyimide, polyphenylene ether, and polyphenylene oxide.
- the D50 of the raw powder is preferably 50 ⁇ m or less, more preferably 20 ⁇ m or less, and further preferably 8 ⁇ m or less.
- the D50 of the raw powder is preferably 0.1 ⁇ m or more, more preferably 0.3 ⁇ m or more, and even more preferably 1 ⁇ m or more.
- the D90 of the raw powder is preferably less than 100 ⁇ m, more preferably 90 ⁇ m or less. If the raw powders D50 and D90 are in such a range, the surface area thereof becomes large, and the modification of the raw powder is more likely to proceed.
- the plasma treatment in this method 1 is performed in an atmosphere near atmospheric pressure.
- the pressure near atmospheric pressure is 0.1 ⁇ 0.02 MPa, and the pressure is 0.08 to 0.12 MPa from the viewpoint of controlling the generation of plasma in the atmosphere and enhancing the action of hydrogen-reduced species. From the viewpoint of shielding the outside air and suppressing the mixing of components that inhibit the plasma treatment, it is more preferably atmospheric pressure (0.101325 MPa) or more and 0.12 MPa or less.
- the plasma treatment in Method 1 is preferably carried out in an atmosphere containing a reducing gas having a hydrogen atom, a gas containing any one of a vinyl compound and a vinylidene compound.
- a reducing gas having a hydrogen atom hydrogen gas, ammonia gas or hydrocarbon gas is preferable, hydrogen gas, ammonia gas, methane gas or ethylene gas is more preferable, and the viewpoint of the ability to act as a hydrogen reducing species in the above-mentioned action mechanism Therefore, hydrogen gas or ammonia gas is more preferable, and hydrogen gas is most preferable.
- Two or more types of reducing gas may be used in combination.
- the vinyl compound is preferably acrylic acid or acrylate. Two or more kinds of vinyl compounds may be used in combination.
- the vinyl compound is preferably methacrylic acid or methacrylate. Two or more kinds of vinylidene compounds may be used in combination.
- the atmosphere in the plasma treatment may consist of only one of the above gases, or may further contain other gases, and from the viewpoint of controlling the generation of plasma, a reducing gas and further other gases. And are preferably included.
- the other gas is preferably a water vapor, a nitrogen gas or a rare gas, more preferably a rare gas, further preferably a helium gas, an argon gas or a neon gas, and an argon gas from the above viewpoint. Is the most preferable.
- the concentration of the reducing gas having a hydrogen atom in the atmosphere in the plasma treatment or the gas containing any one of the vinyl compound and the vinylidene compound is preferably more than 99% by volume, preferably 99.5% by volume or more. Is more preferable, and 99.9% by volume or more is further preferable.
- the upper limit of the concentration of the gas is 100% by volume.
- the atmosphere contains the gas and the noble gas, the total concentration of the gas and the noble gas may be within the range. If the gas concentration in the atmosphere is within such a range, the above-mentioned mechanism of action is likely to be enhanced.
- Such an atmosphere can be formed by using a high-purity gas or a method of shielding air from the atmosphere in the plasma treatment described later.
- the gas composition of the atmosphere preferably contains reducing gas in an amount of 0.1% by volume or more, and more preferably more than 1% by volume.
- the gas composition of the atmosphere preferably contains 100% by volume or less of the reducing gas, and more preferably less than 50% by volume.
- Preferable specific examples of the gas composition of the atmosphere include a gas composition containing 75 to 99.5% by volume and 0.5 to 25% by volume of a rare gas and a hydrogen gas in this order, and a rare gas and an ammonia gas. In order, a gas composition containing 75 to 99% by volume and 1 to 25% by volume can be mentioned. Moreover, it is preferable that oxygen gas is not contained in these gas compositions.
- the plasma treatment in Method 1 is preferably carried out in a gas atmosphere containing a reducing gas having a hydrogen atom, or in a gas atmosphere containing the vinyl compound or vinylidene compound.
- a modified powder formed by introducing hydrogen atoms on the surface of the modified powder was obtained, and in the latter case, a polyvinyl compound chain or a polyvinylidene compound chain was introduced on the surface of the modified powder.
- Quality powder is obtained.
- the vinyl compound or vinylidene compound include acrylic acid, methacrylic acid, methyl acrylate, and methyl methacrylate, and acrylic acid is preferable. In this case, it is easy to introduce the (meth) acrylic chain and the (meth) acrylate chain densely on the surface of the raw powder.
- the content concentration (volume basis) of the vinyl compound or vinylidene compound in the gas atmosphere is preferably 1200 to 1400 ppm.
- the gas atmosphere in this case preferably contains another gas from the viewpoint of controlling the generation of plasma.
- a preferred embodiment of the other gas is similar to that of the other gas in the above-mentioned atmosphere containing a reducing gas having a hydrogen atom.
- the plasma treatment in this method 1 is preferably performed in an atmosphere in which air (particularly oxygen gas) is shielded from the viewpoint of suppressing the mixing of components that inhibit the plasma treatment, and in an atmosphere in which the air is completely shielded. It is more preferable to do so.
- the method of shielding air include a method of increasing the atmospheric pressure in plasma processing to atmospheric pressure or higher, and a method of installing an obstacle wall in the plasma processing device to suppress air mixing.
- a method of arranging the raw powder and causing plasma discharge in a plasma chamber filled with a raw material gas such as a reducing gas so as to have atmospheric conditions, or an electrode facing the raw powder A method of plasma discharge while supplying the raw material gas so as to satisfy the atmospheric conditions can be mentioned.
- the voltage during plasma discharge is preferably 5 to 20 kV.
- the frequency of the power supply during plasma discharge is preferably 50 Hz to 100 MHz.
- the discharge power density with respect to the electrode area during plasma discharge is preferably 1 to 400 W ⁇ min / cm 2.
- the discharge time during plasma discharge is preferably 0.1 seconds to 300 minutes with respect to the target raw powder.
- the temperature at the time of plasma discharge is preferably 0 to 300 ° C, more preferably 10 to 50 ° C.
- a hydrogen atom or either a polyvinyl compound chain or a polyvinylidene compound chain is more easily introduced into the F polymer existing on the surface of the raw powder containing the F polymer on the surface, and the entire F polymer is easily introduced. It is easy to obtain a modified powder with highly improved surface physical properties such as wettability without impairing the physical properties of hydrogen.
- a more selective and dense modified layer can be easily formed.
- the modified powder obtained by this method 1 has improved surface physical properties such as wettability, and has high dispersibility in a liquid dispersion medium.
- the sedimentation rate of the modified powder is preferably 60% or less, more preferably 50% or less, still more preferably 40% or less.
- the liquid dispersion medium may be water or a non-aqueous dispersion medium.
- the non-aqueous dispersion medium one or more liquid compounds selected from the group consisting of amides, ketones and esters are preferable, and N-methyl-2-pyrrolidone, ⁇ -butyrolactone, cyclohexanone or cyclopentanone are more preferable.
- the present composition a liquid composition (hereinafter, also referred to as “the present composition”) containing the modified powder obtained by the present method 1 and the liquid composition and in which the modified powder is dispersed.
- the content of the modified powder in the present composition is preferably 1 to 60% by mass, more preferably 10 to 50% by mass.
- the content of the liquid dispersion medium is preferably 40 to 99% by mass, more preferably 50 to 90% by mass.
- the composition may further contain an inorganic filler or another resin (polymer) different from the F polymer. Since the modified powder has excellent wettability and dispersibility, the composition tends to have excellent dispersion stability even in such a case. In particular, even if PTFE is contained as another resin, it is easy to prepare a liquid composition having a high degree of dispersibility. Such a liquid composition is preferably prepared by mixing a modified powder and an aqueous dispersion containing a PTFE powder.
- the viscosity of this composition is more preferably 50 to 1000 mPa ⁇ s, more preferably 75 to 500 mPa ⁇ s.
- the present composition is excellent in coatability.
- the thixotropy of the present composition is preferably 1.0 to 2.2. In this case, the composition is excellent in coatability and homogeneity.
- the thixotropy is calculated by dividing the viscosity of the present composition measured under the condition of a rotation speed of 30 rpm by the viscosity of the present composition measured under the condition of a rotation speed of 60 rpm.
- This composition has excellent dispersion stability, and can form a molded product having excellent crack resistance and strong adhesiveness to a substrate without impairing the physical characteristics of the F polymer.
- this composition is applied to the surface of a base material and heated to form a polymer layer containing an F polymer (hereinafter, also referred to as “F layer (1)”), the base material layer and the F layer can be formed. It is possible to manufacture a laminate having.
- the F layer (1) may be formed on at least one side of the surface of the base material, and the F layer (1) may be formed on only one side of the base material, and the F layer (1) may be formed on both sides of the base material.
- the F layer (1) may be formed.
- the surface of the base material may be surface-treated with a silane coupling agent or the like.
- the spray method, roll coating method, spin coating method, gravure coating method, micro gravure coating method, gravure offset method, knife coating method, kiss coating method, bar coating method, die coating method, fountain Mayer bar method The application method of the slot die coating method can be used.
- the F layer (1) is preferably formed by firing a polymer by heating after removing the dispersion medium by heating, and the base material is heated to a temperature (100 to 300 ° C.) at which the dispersion medium volatilizes, and further bases are formed. It is particularly preferable to heat the material in a temperature range (300 to 400 ° C.) at which the polymer is fired. That is, the F layer (1) preferably contains a fired product of PTFE and PFA.
- the thickness of the F layer (1) is preferably 0.1 ⁇ m or more, and more preferably 1 ⁇ m or more. The upper limit of the thickness is 100 ⁇ m. In this range, the F layer having excellent crack resistance can be easily formed.
- the peel strength between the F layer (1) and the base material layer is preferably 3 N / cm or more, more preferably 10 N / cm or more, and even more preferably 15 N / cm or more.
- the peel strength is preferably 100 N / cm or less.
- Examples of the material of the base material include copper, aluminum, iron, glass, resin, silicon, and ceramics.
- Examples of the shape of the base material include a flat shape, a curved surface shape, and an uneven shape, and further, any of a foil shape, a plate shape, a film shape, and a fibrous shape may be used.
- Specific examples of the laminate include a metal foil, a metal-clad laminate having an F layer (1) on at least one surface of the metal foil, a polyimide film, and an F layer (1) on both surfaces of the polyimide film.
- a multilayer film having the above can be mentioned.
- These laminates are excellent in various physical properties such as electrical characteristics, and are suitable as a printed circuit board material or the like. Specifically, such a laminate can be used for manufacturing a flexible printed circuit board or a rigid printed circuit board.
- an impregnated woven fabric in which the F polymer is impregnated in the woven fabric can be obtained.
- the impregnated woven fabric can also be said to be a coated woven fabric in which the woven fabric is coated with the F layer (1).
- the woven fabric is preferably a glass fiber woven fabric, a carbon fiber woven fabric, an aramid fiber woven fabric or a metal fiber woven fabric, and more preferably a glass fiber woven fabric or a carbon fiber woven fabric.
- the woven fabric may be treated with a silane coupling agent from the viewpoint of enhancing the adhesiveness with the F layer (1).
- the total content of the F polymer in the main woven fabric is preferably 30 to 80% by mass.
- Examples of the method of impregnating the woven fabric with the present composition include a method of immersing the woven fabric in the present composition and a method of applying the present composition to the woven fabric.
- the polymer When the woven fabric is dried, the polymer may be fired.
- the method of firing the polymer include a method of passing the woven fabric through a ventilation drying oven in an atmosphere of 300 to 400 ° C. The drying of the woven fabric and the firing of the polymer may be carried out in one step.
- the impregnated woven fabric is excellent in characteristics such as high adhesion (adhesiveness) between the F layer (1) and the woven fabric, high surface smoothness, and little distortion.
- thermocompression bonding the main woven fabric and the metal foil By thermocompression bonding the main woven fabric and the metal foil, a metal-clad laminate having high peel strength and resistance to warping can be obtained, which can be suitably used as a printed circuit board material.
- the woven fabric impregnated with the present composition is placed on the surface of the base material, heated and dried to form an impregnated woven fabric layer containing the F polymer and the woven fabric, and the base material and the impregnated woven fabric are formed.
- a laminated body in which the cloth layers are laminated in this order may be produced.
- the mode is also not particularly limited, and if a woven fabric impregnated with the present dispersion is applied to a part or all of the inner wall surface of a member such as a tank, a pipe, or a container and the member is heated while rotating, the member can be formed.
- An impregnated woven fabric layer can be formed on a part or all of the inner wall surface of the cloth. This manufacturing method is also useful as a lining method for the inner wall surface of members such as tanks, pipes, and containers.
- the composition has excellent dispersion stability and can be efficiently impregnated into a porous or fibrous material.
- porous or fibrous materials include materials other than the above-mentioned woven fabrics, specifically, plate-like, columnar or fibrous materials. These materials may be pretreated with a curable resin, a silane coupling agent, or the like, or may be further filled with an inorganic filler or the like. In addition, these materials may be twisted to form threads, cables, and wires. At the time of twisting, an interposition layer made of another polymer such as polyethylene may be arranged.
- An embodiment in which such a material is impregnated with the present composition to produce a molded product includes an embodiment in which the curable resin or a fibrous material on which the cured product is supported is impregnated with the present composition.
- the fibrous material examples include high-strength and low-elongation fibers such as carbon fiber, aramid fiber, and silicon carbide fiber.
- a thermosetting resin such as an epoxy resin, an unsaturated polyester resin, or a polyurethane resin is preferable.
- Specific examples of such an embodiment include a composite cable formed by impregnating a cable in which carbon fibers supported by a thermosetting resin are twisted with the present composition, and further heating the cable to fire an F polymer.
- Such a composite cable is useful as a cable for large structures, ground anchors, oil drilling, cranes, cableways, elevators, agriculture, forestry and fisheries, and slinging cables.
- the surface layer of a molded product (hereinafter, also referred to as an original molded product) having at least a part of the surface layer containing the F polymer is used.
- the maximum height of the peak H of the modified layer in this method 2 is preferably 0.2 times or more, more preferably 1 time or more, with respect to the maximum height of the peak F.
- the peak H and the peak F are the same as described above.
- the fluorine atom content ratio [atm%] in the region is preferably 55% or less, more preferably 40% or less.
- the content ratio of fluorine atoms and the procedure are the same as described above.
- the maximum height of the peak H of the surface of the original molded product is preferably less than 0.2 times, more preferably 0.1 times or less of the maximum height of the peak F. .. Further, the surface of the original molded product preferably has a fluorine atom content of more than 55%, more preferably 60% or more.
- At least one modified layer which is a molded product containing an F polymer and has excellent surface physical properties (wetability, etc.) without impairing the F polymer physical properties (electrical properties, etc.) as a whole.
- a modified molded product having a portion is obtained. Its mechanism of action is not always clear, but it is thought to be as follows. Since the plasma treatment in this method 2 is performed in the vicinity of atmospheric pressure, in other words, in an atmosphere with a high gas density, it is considered that the gas contained in the atmosphere is partially converted into plasma. Further, the reducing gas having a hydrogen atom contained in the atmosphere is considered not only to be a plasma itself but also to be an electrically neutral hydrogen radical.
- the plasma treatment in this method 2 it is considered that plasma and hydrogen radicals are present. Since the plasma treatment proceeds in such a state, it is considered that hydrogen radicals act on the CF bonds of the F polymer activated by the plasma to form a modified layer.
- the atomic radius of the hydrogen atom and the atomic radius of the fluorine atom are about the same, and it is considered that this action is more likely to be enhanced and the modified layer is efficiently formed.
- a modified layer in which hydrogen atoms are efficiently introduced into the F polymer contained in the surface of the molded product is formed. Further, it is considered that the cleavage of the F polymer by plasma is suppressed by the action of hydrogen radicals and the reduction in molecular weight thereof is suppressed, so that a highly stable modified layer is formed.
- a modified layer formed by introducing hydrogen atoms into the F polymer is formed on the surface of the molded product containing the F polymer on the surface layer by such an action mechanism, and the physical properties of the F polymer of the entire molded product are formed. It is considered that a modified molded product, which is a molded product of an F polymer, having both a surface physical property and a surface physical property can be obtained.
- the thickness of the modified layer in the modified molded product is preferably less than 1000 nm, more preferably 500 nm or less, and particularly preferably 100 nm or less.
- the thickness of the modified layer is preferably 1 nm or more.
- the thickness of the modified layer is the length in the direction perpendicular to the plane when the modified layer has a planar spread, and the shortest length when there is no planar spread. Is.
- the original molded product in this method 2 is a molded product containing an F polymer on the surface layer.
- the surface layer of the molded product is a region in the range of at least approximately 1000 nm from the surface of the molded product in the thickness direction of the molded product, and the molded product to which this method 2 is applied is a molded product containing an F polymer in the surface layer.
- the thickness of the molded product is the length in the direction perpendicular to the plane when the molded product has a planar spread, and the shortest length when there is no planar spread.
- the original molded product may contain the F polymer as a whole, or may contain the F polymer only in the surface layer. Further, in the latter case, the F polymer may be contained in the entire surface layer, or the F polymer may be contained in a part of the surface layer surface.
- the surface shape of the original molded product may be smooth or uneven.
- the original molded product is preferably a molded product having a layer containing an F polymer on the surface layer, and preferably a sheet-shaped molded product having a layer portion containing the F polymer on the surface layer.
- the thickness of the layer containing the F polymer in the surface layer is preferably 1 ⁇ m or more, more preferably 5 ⁇ m or more, and particularly preferably 10 ⁇ m or more.
- the thickness of the layer containing the F polymer is preferably 1 mm or less. If the surface layer having such a thickness of the original molded product has a layer portion containing the F polymer, it is easy to obtain a modified molded product having the physical characteristics and the surface physical characteristics of the F polymer of the entire molded product by this method.
- the original molded product has an F polymer film or a layer containing a base material layer and an F polymer (hereinafter, also referred to as “F layer (2)”), and has an F layer (2) on the surface. Is preferable. In the case of an F polymer film or a laminate having an F layer (2) on both sides, this method may be applied to both sides, and this method may be applied to only one side.
- the F polymer film preferably contains the F polymer as a main component, and preferably contains the F polymer in an amount of more than 50% by mass and 100% by mass or less.
- F polymer film Other components that can be contained in the F polymer film include heat-resistant resins such as epoxy resin, maleimide resin, urethane resin, polyimide resin, polyamideimide resin, polyphenylene ether resin, polyphenylene oxide resin, and liquid crystal polyester resin, and nitride filler. , Silica fillers, mica fillers, clay fillers, inorganic fillers such as talc fillers, carbon fillers such as carbon fibers, and polymers.
- resins such as epoxy resin, maleimide resin, urethane resin, polyimide resin, polyamideimide resin, polyphenylene ether resin, polyphenylene oxide resin, and liquid crystal polyester resin, and nitride filler.
- Silica fillers Silica fillers, mica fillers, clay fillers, inorganic fillers such as talc fillers, carbon fillers such as carbon fibers, and polymers.
- the base material layer in the laminate is preferably a resin substrate layer or a metal substrate layer.
- the metal substrate layer include metal foil, and examples of the material thereof include copper, nickel, aluminum, titanium, and alloys thereof.
- the resin substrate include a resin film, and the materials thereof include polyimide, polyarylate, polysulfone, polyallyl sulfone, polyamide, polyetheramide, polyphenylene sulfide, polyallyl ether ketone, polyamideimide, liquid polyester, and liquid crystal. Polyester amide can be mentioned. Further, as an embodiment of the resin substrate, a prepreg which is a precursor of the fiber reinforced resin substrate can also be mentioned.
- Preferable embodiments of the laminate include a metal-clad laminate having a metal foil and an F layer (2) formed on at least one surface thereof, and a resin film and an F layer (2) formed on at least one surface thereof. ), And examples thereof.
- the metal foil in the metal-clad laminate is preferably a copper foil.
- Such a metal-clad laminate is particularly useful as a printed circuit board material.
- the resin film in the multilayer film is preferably a polyimide film. Such a multilayer film is useful as an electric wire coating material and a printed circuit board material.
- the plasma treatment in this method 2 is performed in an atmosphere containing a reducing gas having a hydrogen atom.
- a reducing gas having a hydrogen atom hydrogen gas, ammonia gas or hydrocarbon gas is preferable, hydrogen gas, ammonia gas, methane gas or ethylene gas is more preferable, and the viewpoint of the ability to act as a hydrogen reducing species in the above-mentioned action mechanism Therefore, hydrogen gas or ammonia gas is more preferable, and hydrogen gas is most preferable.
- the reducing gas one type may be used alone, or two or more types may be used in combination.
- the atmosphere in the plasma treatment may consist of only the reducing gas or may contain other gases, and may include the reducing gas and further other gases from the viewpoint of controlling the generation of plasma.
- the other gas is preferably a water vapor, a nitrogen gas or a rare gas, more preferably a rare gas, further preferably a helium gas, an argon gas or a neon gas, and an argon gas from the above viewpoint. Is the most preferable.
- the concentration of the reducing gas in the atmosphere in the plasma treatment is preferably more than 99% by volume, preferably 99.5% by volume. It is more preferably 99.9% by volume or more, and further preferably 99.9% by volume or more.
- the upper limit of the concentration of the gas is 100% by volume. If the gas concentration in the atmosphere is within such a range, the above-mentioned mechanism of action is likely to be enhanced.
- Such an atmosphere can be formed by using a high-purity gas or a method of shielding air from the atmosphere in the plasma treatment described later.
- the gas composition of the atmosphere preferably contains reducing gas in an amount of 0.1% by volume or more, and more preferably more than 1% by volume.
- the gas composition of the atmosphere preferably contains 100% by volume or less of the reducing gas, and more preferably less than 50% by volume.
- Preferable specific examples of the gas composition of the atmosphere include a gas composition containing 75 to 99.5% by volume and 0.5 to 25% by volume of a rare gas and a hydrogen gas in this order, and a rare gas and an ammonia gas. In order, a gas composition containing 75 to 99% by volume and 1 to 25% by volume can be mentioned. Moreover, it is preferable that oxygen gas is not contained in these gas compositions.
- the plasma treatment in this method 2 is performed in an atmosphere near atmospheric pressure.
- the pressure near atmospheric pressure is 0.1 ⁇ 0.02 MPa, and the pressure is 0.08 to 0.12 MPa from the viewpoint of controlling the generation of plasma in the atmosphere and enhancing the action of hydrogen-reduced species. From the viewpoint of shielding the outside air and suppressing the mixing of components that inhibit the plasma treatment, it is more preferably atmospheric pressure (0.101325 MPa) or more and 0.12 MPa or less.
- the plasma treatment in this method 2 is preferably performed in an atmosphere in which air, particularly oxygen gas, is shielded from the viewpoint of suppressing contamination of components that inhibit the plasma treatment, and is performed in an atmosphere in which air is completely shielded. Is more preferable.
- the method of shielding air include a method of increasing the atmospheric pressure in plasma processing to atmospheric pressure or higher, and a method of installing an obstacle wall in the plasma processing device to suppress air mixing.
- a method of arranging the original molded product and plasma discharge in a plasma chamber filled with a raw material gas such as a reducing gas so as to have atmospheric conditions or a method of facing the original molded product.
- An example is a method in which the gas is placed between the electrodes and plasma is discharged while supplying the raw material gas so as to satisfy the atmospheric conditions.
- the voltage during plasma discharge is preferably 5 to 20 kV.
- the frequency of the power supply during plasma discharge is preferably 50 Hz to 100 MHz.
- the discharge power density with respect to the electrode area during plasma discharge is preferably 1 to 400 W ⁇ min / cm 2.
- the discharge time during plasma discharge is preferably 0.1 seconds to 300 minutes with respect to the target original molded product.
- the temperature at the time of plasma discharge is preferably 0 to 300 ° C, more preferably 10 to 50 ° C.
- hydrogen atoms are more likely to be introduced into the F polymer existing on the surface of the molded product containing the F polymer on the surface layer, and the surface physical properties such as wettability are not impaired without impairing the physical properties of the entire F polymer. It is easy to obtain a modified molded product with a high degree of improvement. In particular, when the temperature in the plasma discharge is within the above range, a more selective and dense modified layer can be easily formed.
- the surface of the original molded product may be plasma-treated in advance in an atmosphere that does not contain a reducing gas before the original molded product is plasma-treated. If the surface of the original molded product is appropriately roughened by such treatment, the contact surface between the surface of the molded product and the plasma in the plasma treatment of this method becomes large, and a modified layer in which hydrogen atoms are introduced to a higher degree is formed.
- Cheap Such an atmosphere preferably contains a noble gas.
- the F layer (2) of the original molded product may be subjected to this method 2 to form a modified layer, and then laminated. Adhesion strength with other substrates can be increased.
- a liquid composition containing F polymer powder is applied to a long base material and heated to form an F layer (2) to prepare an original molded product, and this method 2 is applied to the F layer (2).
- a long composite base material can be easily obtained by laminating with another long base material by a roll-to-roll process.
- the original molded product is a long roll-shaped laminate
- the original molded product is unwound from the roll, and the raw material gas is supplied so as to satisfy the atmospheric conditions while passing the original molded product between the electrodes facing each other.
- a modified molded product having a modified layer formed can be obtained.
- the obtained modified molded product may be sent as it is to a laminating step with another base material, or may be wound up in a roll shape and then unwound again and sent to a laminating step with another base material. good.
- the discharge device for discharging the plasma into the laminating device so that the original molded product can be plasma-treated before the laminating process.
- the modified molded product of the present invention (hereinafter, also referred to as “this molded product”) has a modified layer formed by introducing a hydrogen atom into an F polymer on at least a part of the surface of the modified molded product. Is a layer in which the maximum height of the H peak is 0.2 times or more the maximum height of the F peak, and the content ratio of fluorine atoms in the region is 55% or less. It is a thing.
- the present molded product is preferably produced by the present method 2.
- the mode of the F polymer in the present molded product is the same as that in the present method 1, including the preferred mode.
- the aspect of the modified layer in the present molded product and the aspect of the state or shape of the surface in the present molded product are the same as those in the present method 2, including the preferred embodiment.
- a preferred embodiment of the molded product includes a film having a modified layer on at least one surface of the F polymer film, a metal foil, and an F layer (2) formed on at least one surface thereof. It has a metal-clad laminate having a modified layer on the surface of the F layer (2), a resin film, and an F layer (2) formed on at least one surface thereof, and a modified layer is provided on the surface of the F layer.
- a multilayer film having a structure can be mentioned.
- the modified layer may be provided on both surfaces. ..
- the aspects of the F polymer film, the metal leaf, the resin film, and the F layer (2) in these embodiments are the same as those in the present method 1 including the preferred embodiments.
- This molded product is a molded product having the physical characteristics of the F polymer of the entire molded product and the surface physical characteristics derived from high polarity, and is particularly useful as an electric wire coating material and a printed circuit board material.
- the dielectric constant of the F polymer film having the modified layer or the F layer (2) is preferably 2.0 to 3.5, and more preferably 2.0 to 3.0.
- the dielectric constant is measured using a split post dielectric resonator (SPDR) at a frequency of 10 GHz in an environment of 23 ° C. ⁇ 2 ° C. and a relative humidity of 50 ⁇ 5%.
- SPDR split post dielectric resonator
- the dielectric constant of the molded product is preferably 2.0 to 3.5, more preferably 2.0 to 3.0.
- the water contact angle of the outermost surface (modified layer) of the molded product is preferably 100 ° or less, more preferably 90 ° or less.
- the water contact angle of the outermost surface (modified layer) of the molded product is preferably 10 ° or more, more preferably 30 ° or more.
- the water contact angle is a value measured by the intravenous drip method described in JIS R 3257: 1999.
- the surface of the molded product having the modified layer can be further laminated with another base material and adhered.
- the peel strength at the interface between the molded product and another base material to be laminated is preferably 8 N / cm or more, and more preferably 10 N / cm or more.
- Examples of the method for laminating and adhering the present molded product to other base materials include a method using a hot press.
- the temperature of the hot press is preferably not more than the melting point of the F polymer, more preferably 300 ° C. or less, still more preferably 240 ° C. or less.
- the temperature of the hot press is preferably 120 ° C. or higher, more preferably 160 ° C. or higher. Since this molded product has a modified layer having excellent physical properties such as wettability on its surface, it can be laminated and adhered to other base materials at a lower temperature.
- Examples of other substrates include prepregs, glass substrates, and ceramic substrates, in addition to the metal and resin substrates described above.
- the structure of the laminate of this molded product and other base material is as follows: metal substrate / main molded product having modified layers on both sides / other base material layer / main molded product having modified layers on both sides / metal substrate , Metal substrate layer / other substrate layer / present molded product having modified layers on both sides / other substrate layer / metal substrate layer and the like. Each layer may further contain a glass cloth or filler.
- Such laminates are useful as antenna parts, printed substrates, aircraft parts, automobile parts, sports equipment, food industry supplies, paints, cosmetics, etc.
- wire coating materials aircraft wires, etc.
- Electrical insulation tape insulation tape for oil drilling, materials for printed substrates, separation membranes (precision filtration membranes, ultrafiltration membranes, reverse osmosis membranes, ion exchange membranes, dialysis membranes, gas separation membranes, etc.), electrode binders (lithium II)
- separation membranes precision filtration membranes, ultrafiltration membranes, reverse osmosis membranes, ion exchange membranes, dialysis membranes, gas separation membranes, etc.
- electrode binders lithium II
- the present invention is not limited to the configuration of the above-described embodiment.
- the present method, the present methods 1 and 2 may additionally have any other step in the configuration of the above embodiment, or may be replaced with any step that produces the same action.
- the present molded product may be added with any other configuration or may be replaced with an arbitrary configuration exhibiting the same function.
- Example 1 Production example of modified powder and liquid composition
- F powder 1 Powder composed of polymer 1 (melting point: 300 ° C., fluorine content: 71% by mass) containing 97.9 mol% of TFE units, 2.0 mol% of PPVE units and 0.1 mol% of NAH units. (Average particle size: 2.6 ⁇ m).
- the F powder 1 corresponds to the resin powder (A) described in paragraph number 0154 of the pamphlet of International Publication No. 2018/016644.
- F powder 2 Powder consisting of polymer 2 (melting point: 300 ° C., fluorine content: 71% by mass) containing 98.7 mol% of TFE units and 1.3 mol% of PPVE units (average particle size: 4.3 ⁇ m) .
- the polymer 1 has a main chain number 1 ⁇ 10 1000 to six per carbon carbonyl group-containing group, polymers 2 to 40 Yes main chain carbon atoms 1 ⁇ 10 6 cells per a carbonyl group-containing group.
- Example 1-1 Production example of modified powder 1 and liquid composition 1 A stage in which a dielectric is sandwiched between a pair of counter electrodes and a mechanism capable of generating plasma by a dielectric barrier discharge is provided to hold the powder. F powder 1 was uniformly installed in the plasma chamber provided with the above. A mixed gas containing 95% by volume of Ar gas and 5% by volume of hydrogen gas is flowed through the chamber to shield the outside air, and the total concentration of Ar gas and hydrogen gas in the chamber during plasma treatment is increased to 99.9% by volume or more. The pressure in the chamber was maintained at 0.1 MPa, and the temperature in the chamber was maintained at 25 ° C. The processing frequency was 13 kHz and the applied voltage was 9 kV.
- Plasma discharge was performed in the chamber, and F powder 1 was plasma-treated for 1 minute to obtain modified powder 1.
- 67 parts by mass of distilled water was added to 33 parts by mass of the modified powder 1, and the mixture was stirred for 60 minutes to contain the modified powder 1 and water, and the modified powder 1 containing no surfactant was dispersed.
- the liquid composition 1 was obtained.
- Example 1-2 Evaluation example With respect to 33 parts by mass of F powder 1, 1 part by mass of a nonionic fluorine-based surfactant (Futergent 250 manufactured by Neos) and 66 parts by mass of distilled water are formed. The mixed solution was added and stirred for 60 minutes to obtain a liquid composition C1 in which the powder 1 was dispersed.
- the liquid composition C1 corresponds to the dispersion liquid (C-1) described in paragraph No. 0156 of the International Publication No. 2018/016644 pamphlet.
- both liquid compositions showed the same dispersibility.
- Example 1-3 Production example of modified powder 2 and liquid composition 2
- the modified powder 2 is obtained in the same manner as in Example 1-1 except that the F powder 1 is changed to the F powder 2, and the liquid composition is obtained. I got the thing 2.
- Example 1-4 Production example of modified powder 3 and liquid composition 3
- F powder 1 is changed to F powder 2 with Ar gas in a chamber during plasma treatment without particularly shielding the outside air in plasma discharge.
- the modified powder 3 was obtained in the same manner as in Example 1-1 except that the total concentration of hydrogen gas was less than 99.9% and the oxygen gas was more than 1% by volume, and the liquid composition 3 was obtained. ..
- Example 1-5 Evaluation Example A liquid composition C2 was prepared in the same manner as in Example 1-2 except that F powder 1 was changed to F powder 2.
- the adhesiveness of the molded product was evaluated by the following procedure. Each liquid composition is applied to a copper foil by a die coating method, passed through a drying oven at 120 ° C. for 5 minutes to form a dry film on the surface of the copper foil, and further passed through a far-infrared ray furnace at 380 ° C. for 10 minutes. , The polymer was fired to prepare a laminate in which a polymer layer (thickness 10 ⁇ m) was formed on the surface of the copper foil.
- a rectangular test piece having a length of 100 mm and a width of 10 mm was cut out from this laminated body, and the copper foil was peeled from the polymer layer from one end in the length direction of the test piece to a position of 50 mm.
- the test piece is peeled 90 degrees at a tensile speed of 50 mm / min using a tensile tester (manufactured by Orientec) with the position 50 mm from one end in the length direction as the center, and the measurement distance is from 10 mm to 30 mm.
- the peel strength (N / cm) of the laminated body was evaluated by measuring the average load of.
- the peel strength of the laminate formed from the liquid composition 2 is 8 N / cm
- the peel strength of the laminate formed from the liquid composition 3 is 4 N / cm
- the peel strength of the laminate formed from the liquid composition C2 is 4 N / cm.
- the peel strength of was less than 3 N / cm.
- Example 2 Production example of modified film The following raw materials were used.
- Film 1 Film of F polymer 1 (thickness: 25 ⁇ m).
- Film 2 A film (thickness: 25 ⁇ m) of Polymer 3 (melting point: 305 ° C., fluorine content: 71% by mass) containing 98.2 mol% of TFE units and 1.8 mol% of PPVE units.
- the peak H of the film measured by ESCA the peak at 284 eV to 286 eV in the region from the surface of the film to the depth of 10 nm
- the maximum height of the peak H is high. Is well less than 0.2 times the maximum height of peak F (peaks at 289 eV to 295 eV in the region from the surface of the film to a depth of 10 nm), and the fluorine atom content is 60%. there were.
- QuanteraII (manufactured by ULVAC-PHI) was used for the surface measurement by ESCA.
- a monochromatic AlK ⁇ ray is used as the X-ray source at 100 W, and a neutralizing gun using an ion gun and a barium oxide emitter is used to prevent charging of the sample surface, while the photoelectron detection area is 100 ⁇ m ⁇ , the photoelectron detection angle is 45 degrees, and the pass.
- the energy was 55 eV.
- the content ratio of fluorine atoms was calculated from various peak intensities (N1s, O1s, C1s and F1s orbitals) detected by measurement. The depth from the surface was determined based on the sputtering rate of the SiO 2 sputtering film using C60 ions as the sputtering ions.
- Example 2-1 Production example of modified film 1
- the film 1 is installed in a plasma chamber equipped with a mechanism capable of generating plasma by a dielectric barrier discharge by sandwiching a dielectric in each of a pair of counter electrodes. ..
- a mixed gas containing 95% by volume of Ar gas and 5% by volume of hydrogen gas was flowed through the chamber to shield the outside air, and the pressure inside the chamber was maintained at 0.1 MPa and the temperature inside the chamber was maintained at 25 ° C.
- the processing frequency was 13 kHz
- the applied voltage was 9 kV
- plasma discharge was performed in the chamber
- the film 1 was plasma-treated for 2 minutes.
- the maximum height of the peak H is 2.5 times the maximum height of the maximum height of the peak F, and the content ratio of fluorine atoms in the region is It was 30%.
- the profile is the same as that of the film 1, and the modified film 1 has a polymer 1 on the surface. It was confirmed that the film had a modified layer formed by introducing hydrogen atoms.
- Example 2-2 Production example of modified film 2 Example 1 except that the gas sealed in the chamber is changed to a mixed gas containing 94% by volume of Ar gas, 5% by volume of ammonia gas, and 1% by volume of water vapor.
- the film 1 was subjected to plasma treatment in the same manner as in the above.
- the maximum height of the peak H is 0.2 times the maximum height of the maximum height of the peak F, and the modified film 2 has a polymer on the surface. It was confirmed that the film had a modified layer formed by introducing a hydrogen atom into 1.
- Example 2-3 Production example of modified film 3
- the film 2 was plasma-treated in the same manner as in Example 1 except that the film 1 was made into a film 2.
- the maximum height of the peak H is three times the maximum height of the maximum height of the peak F, and the content ratio of fluorine atoms in the region is 25. %, And it was confirmed that the modified film 3 is a film having a modified layer formed by introducing hydrogen atoms into the polymer 2 on the surface.
- Example 2-4 Production example of modified film 4 (comparative example) The film 1 was plasma-treated in the same manner as in Example 1 except that the gas sealed in the chamber was only Ar gas. The surface condition of the obtained film (modified film 4) measured by ESCA was almost the same as that of film 1.
- Example 2-5 Production example of modified film 5 (comparative example)
- the film 1 was plasma-treated in the same manner as in Example 1 except that the conditions were vacuum.
- the surface condition of the obtained film (modified film 5) measured by ESCA was almost the same as that of film 1.
- Example 2-6 Evaluation example of modified film
- the modified film 1 and the solid copper foil are placed facing each other and heat-pressed (temperature: 340 ° C., pressing force: 15 kN / m) to obtain the modified film.
- An adhesive laminate of 1 and copper foil was obtained.
- a rectangular test piece having a length of 100 mm and a width of 10 mm was cut out from this adhesive laminate and allowed to stand at 25 ° C. for 3 months.
- the copper foil layer was peeled from the modified film 1 layer from one end in the length direction of the test piece to a position of 50 mm.
- the test piece When peeling, the test piece is peeled 90 degrees at a tensile speed of 50 mm / min using a tensile tester (manufactured by Orientec) with the position 50 mm from one end in the length direction as the center, and the measurement distance is 10 mm to 30 mm. The average load up to was measured and used as the peel strength (N / cm). For each film, an adhesive laminate was prepared in the same manner, and the peel strength thereof was evaluated. The results are summarized in Table 1.
- the modified powder prepared by this method is difficult to settle, and even if no surfactant is added, the dispersibility in water is equivalent to that when the surfactant is added. You can see that it shows.
- the molded product formed from the liquid composition containing the modified powder prepared by this method has higher adhesion to the base material than the molded product formed from the liquid composition containing the original powder. It can be seen that it shows high adhesiveness.
- the modified powder by this method is highly surface-modified, and the composition containing the modified powder has liquid physical properties such as dispersibility without adding a surfactant. It can be seen that the liquid composition is excellent and a molded product having high substrate adhesiveness can be formed.
- the liquid composition containing the modified powder according to this method is a liquid composition having excellent liquid physical characteristics such as dispersibility, and can be efficiently impregnated into a porous or fibrous material.
- the modified films 1 to 3 which are the modified molded products prepared by this method and the copper foil are adhered, the films 1 or 2 which are the original molded products and the copper foil are adhered to each other. Since it is higher than the peel strength, it can be seen that the adhesion strength is improved. Further, the peel strength between the modified films 1 to 3 produced by this method and the copper foil is higher than the peel strength between the modified films 4 and 5 produced by this method and the copper foil. From the above, it can be seen that the modified molded product according to this method is highly surface-modified. Therefore, it is considered that the laminate of the modified molded product and other base materials according to this method is useful as antenna parts, printed circuit boards, aircraft parts, automobile parts, sports equipment, food industry supplies, paints, cosmetics, etc. Be done.
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Abstract
Description
しかし、テトラフルオロエチレン系ポリマーは、極性が極めて低く、他の化合物、例えば液状分散媒等との相互作用に乏しいため、そのパウダーの分散性は未だ充分ではない。そのため、かかる液状組成物には、パウダーの分散性を向上させ、液状組成物の液物性を調整するために、界面活性剤、増粘剤等の調整剤が添加される場合が多い。 The tetrafluoroethylene polymer has excellent physical properties such as releasability, electrical insulation, water and oil repellency, chemical resistance, weather resistance, and heat resistance, and the liquid composition in which the powder is dispersed can be molded in various ways. It is useful as a material that can easily form an object (Patent Document 1).
However, the tetrafluoroethylene-based polymer has extremely low polarity and has poor interaction with other compounds such as a liquid dispersion medium, so that the dispersibility of the powder is still insufficient. Therefore, in order to improve the dispersibility of the powder and adjust the liquid physical characteristics of the liquid composition, an adjusting agent such as a surfactant or a thickener is often added to the liquid composition.
その結果、テトラフルオロエチレン系ポリマーのパウダーの表面を、所定のプラズマ処理条件で処理すると、その表面が改質され、その物性を損なうことなく、パウダーの濡れ性等の表面物性と、それから調製される液状組成物の分散性とが向上する点を見い出した。 The present inventors have investigated a plasma treatment method that highly modifies the surface of a tetrafluoroethylene polymer powder.
As a result, when the surface of the tetrafluoroethylene polymer powder is treated under predetermined plasma treatment conditions, the surface is modified, and the surface physical properties such as the wettability of the powder and the surface physical properties are prepared without impairing the physical properties. We have found that the dispersibility of the liquid composition is improved.
本発明は、テトラフルオロエチレン系ポリマーのパウダーを高度に表面改質し、その表面物性を向上させる方法と、それから調製される、分散性等の液物性に優れた液状組成物の提供を目的とする。
本発明は、テトラフルオロエチレン系ポリマーの成形物を高度に表面改質し、その表面物性を向上させる方法と、高度に表面改質されたテトラフルオロエチレン系ポリマーの成形物との提供を目的とする。 An object of the present invention is to provide a method for highly modifying a tetrafluoroethylene polymer to improve its physical properties.
An object of the present invention is to provide a method for highly surface-modifying a tetrafluoroethylene polymer powder to improve its surface physical characteristics, and a liquid composition prepared from the method and having excellent liquid physical characteristics such as dispersibility. do.
An object of the present invention is to provide a method for highly surface-modifying a molded product of a tetrafluoroethylene-based polymer to improve the surface physical characteristics thereof, and a molded product of a highly surface-modified tetrafluoroethylene-based polymer. do.
<1> テトラフルオロエチレン系ポリマーを、大気圧近傍の雰囲気下にてプラズマ処理して、表面改質されたテトラフルオロエチレン系ポリマーを得る、改質されたテトラフルオロエチレン系ポリマーの製造方法。
<2> テトラフルオロエチレン系ポリマーのパウダーを、大気圧近傍の雰囲気下にてプラズマ処理し、前記パウダーの表面を改質する、改質パウダーの製造方法。
<3>前記パウダーを、水素原子を有する還元性ガスを含む大気圧近傍の雰囲気下にてプラズマ処理し、前記テトラフルオロエチレン系ポリマーに水素原子が導入されて形成されたパウダーを得る、上記<2>の製造方法。
<4> 前記プラズマ処理を、空気を遮蔽した雰囲気下にて行う、上記<2>または<3>の製造方法。
<5> 前記プラズマ処理を行う前に、予め、前記パウダーを、希ガスを含む雰囲気下にてプラズマ処理する、上記<2>から<4>の製造方法。
<6> 前記雰囲気が、水素原子を有する還元性ガス、ビニル化合物およびビニリデン化合物の少なくとも1種のガスを含む、上記<2>から<5>の製造方法。
<7> 前記雰囲気が、さらに希ガスを含む、上記<2>から<6>の製造方法。
<8> 前記大気圧近傍の圧力が、0.08から0.12MPaである、上記<2>から<7>の製造方法。
<9> 前記パウダーの平均粒子径が、50μm以下である、上記<2>から<8>の製造方法。
<10> 前記テトラフルオロエチレン系ポリマーが、フッ素含有量が70から76質量%であるテトラフルオロエチレン系ポリマーである、上記<2>から<9>の製造方法。
<11> 前記テトラフルオロエチレン系ポリマーが、酸素原子を含む原子団を有する、上記<2>から<10>の製造方法。
<12> 上記<2>から<11>のいずれかの製造方法で得られた改質パウダーと、液状分散媒とを含み、前記改質パウダーが分散している液状組成物。
<13> 前記改質パウダーの平均粒子径が、50μm以下である、上記<12>の液状組成物。
<14> 前記テトラフルオロエチレン系ポリマーが、フッ素含有量が70から76質量%であるテトラフルオロエチレン系ポリマーである、<12>または<13>の液状組成物。
<15> 前記テトラフルオロエチレン系ポリマーが、酸素原子を含む原子団を有する、上記<12>から<14>の液状組成物。
<16> テトラフルオロエチレン系ポリマーを含む表層を少なくとも一部有する成形物の前記表層を、水素原子を有する還元性ガスを含む大気圧近傍の雰囲気下にてプラズマ処理する、前記テトラフルオロエチレン系ポリマーに水素原子が導入されて形成された改質層を表面の少なくとも一部に有する成形物の製造方法。
<17> 前記プラズマ処理を、空気を遮蔽した雰囲気下にて行う、上記<16>の製造方法。
<18> 前記プラズマ処理を行う前に、予め、前記表層を、還元性ガスを含まない雰囲気下にてプラズマ処理する、上記<16>または<17>の製造方法。
<19> 前記還元性ガスが、水素ガス、アンモニアガス又は炭化水素ガスである、上記<16>から<18>の製造方法。
<20> 前記プラズマ処理の雰囲気が、さらに窒素ガス又は希ガスを含む、上記<16>から<19>の製造方法。
<21> 前記大気圧近傍の圧力が、0.08から0.12MPaである、上記<16>から<20>の製造方法。
<22> 前記テトラフルオロエチレン系ポリマーを含む表層を少なくとも一部有する成形物が、テトラフルオロエチレン系ポリマーのフィルム、又は、基材層とテトラフルオロエチレン系ポリマーの層とを有する積層体である、上記<16>から<21>の製造方法。
<23> 前記テトラフルオロエチレン系ポリマーのフッ素含有量が、70から76質量%である、上記<16>から<22>の製造方法。
<24> 前記テトラフルオロエチレン系ポリマーが、酸素原子を含む原子団を有する、上記<16>から<23>の製造方法。
<25> テトラフルオロエチレン系ポリマーに水素原子が導入されて形成された改質層を表面の少なくとも一部に有し、前記改質層は、X線光電子分光法によって測定される表面から深さ1nmまでの領域における284eVから286eVにあるピークの最大高さが、前記領域における289eVから295eVにあるピークの最大高さに対して0.2倍以上であり、かつ、前記領域におけるフッ素原子の含有割合が55%以下である、テトラフルオロエチレン系ポリマーを含む成形物。
<26> 前記テトラフルオロエチレン系ポリマーのフッ素含有量が、70から76質量%である、上記<25>の成形物。
<27> 前記テトラフルオロエチレン系ポリマーが、酸素原子を含む原子団を有する、上記<25>または<26>の成形物。
<28> 前記改質層の厚みが1000nm未満である上記<25>から<27>の成形物。
<29>
前記成形物が、テトラフルオロエチレン系ポリマーのフィルム、又は、基材層とテトラフルオロエチレン系ポリマーの層とを有する積層体である、上記<25>から<27>の成形物。 The present invention has the following aspects.
<1> A method for producing a modified tetrafluoroethylene polymer, wherein the tetrafluoroethylene polymer is plasma-treated in an atmosphere near atmospheric pressure to obtain a surface-modified tetrafluoroethylene polymer.
<2> A method for producing a modified powder, in which a tetrafluoroethylene polymer powder is plasma-treated in an atmosphere near atmospheric pressure to modify the surface of the powder.
<3> The powder is plasma-treated in an atmosphere near atmospheric pressure containing a reducing gas having a hydrogen atom to obtain a powder formed by introducing a hydrogen atom into the tetrafluoroethylene polymer. 2> Manufacturing method.
<4> The production method of <2> or <3>, wherein the plasma treatment is performed in an atmosphere in which air is shielded.
<5> The production method of <2> to <4>, wherein the powder is plasma-treated in advance in an atmosphere containing a rare gas before the plasma treatment is performed.
<6> The production method of <2> to <5> above, wherein the atmosphere contains at least one gas of a reducing gas having a hydrogen atom, a vinyl compound and a vinylidene compound.
<7> The production method of <2> to <6>, wherein the atmosphere further contains a rare gas.
<8> The production method of <2> to <7> above, wherein the pressure near the atmospheric pressure is 0.08 to 0.12 MPa.
<9> The production method of <2> to <8> above, wherein the average particle size of the powder is 50 μm or less.
<10> The production method of <2> to <9> above, wherein the tetrafluoroethylene polymer is a tetrafluoroethylene polymer having a fluorine content of 70 to 76% by mass.
<11> The method for producing <2> to <10> above, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
<12> A liquid composition containing the modified powder obtained by any of the production methods <2> to <11> and a liquid dispersion medium in which the modified powder is dispersed.
<13> The liquid composition of <12> above, wherein the modified powder has an average particle size of 50 μm or less.
<14> The liquid composition of <12> or <13>, wherein the tetrafluoroethylene-based polymer is a tetrafluoroethylene-based polymer having a fluorine content of 70 to 76% by mass.
<15> The liquid composition of <12> to <14> above, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
<16> The tetrafluoroethylene polymer in which the surface layer of a molded product having at least a part of the surface layer containing a tetrafluoroethylene polymer is plasma-treated in an atmosphere near atmospheric pressure containing a reducing gas having a hydrogen atom. A method for producing a molded product having a modified layer formed by introducing a hydrogen atom into at least a part of the surface.
<17> The manufacturing method of <16>, wherein the plasma treatment is performed in an atmosphere in which air is shielded.
<18> The production method according to <16> or <17>, wherein the surface layer is plasma-treated in advance in an atmosphere that does not contain a reducing gas before the plasma treatment is performed.
<19> The production method of <16> to <18> above, wherein the reducing gas is hydrogen gas, ammonia gas, or hydrocarbon gas.
<20> The production method of <16> to <19> above, wherein the atmosphere of the plasma treatment further contains nitrogen gas or a rare gas.
<21> The production method of <16> to <20> above, wherein the pressure near the atmospheric pressure is 0.08 to 0.12 MPa.
<22> The molded product having at least a part of the surface layer containing the tetrafluoroethylene polymer is a film of the tetrafluoroethylene polymer or a laminate having a base material layer and a layer of the tetrafluoroethylene polymer. The manufacturing method of <16> to <21> above.
<23> The method for producing <16> to <22>, wherein the tetrafluoroethylene polymer has a fluorine content of 70 to 76% by mass.
<24> The method for producing <16> to <23> above, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
<25> A modified layer formed by introducing hydrogen atoms into a tetrafluoroethylene polymer is provided on at least a part of the surface, and the modified layer has a depth from the surface measured by X-ray photoelectron spectroscopy. The maximum height of the peak at 284 eV to 286 eV in the region up to 1 nm is 0.2 times or more the maximum height of the peak at 289 eV to 295 eV in the region, and the content of fluorine atoms in the region is high. A molded product containing a tetrafluoroethylene-based polymer having a proportion of 55% or less.
<26> The molded product of <25>, wherein the tetrafluoroethylene polymer has a fluorine content of 70 to 76% by mass.
<27> The molded product of <25> or <26>, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
<28> The molded product of <25> to <27>, wherein the modified layer has a thickness of less than 1000 nm.
<29>
The molded product of <25> to <27> above, wherein the molded product is a film of a tetrafluoroethylene-based polymer or a laminate having a base material layer and a layer of a tetrafluoroethylene-based polymer.
本発明によれば、テトラフルオロエチレン系ポリマーの物性を損なわずに、濡れ性と分散性とに優れた、テトラフルオロエチレン系ポリマーの改質パウダーを製造でき、それから容易に液物性に優れた液状組成物を製造できる。かかる液状組成物からは、テトラフルオロエチレン系ポリマーの物性を備え、接着性にも優れた成形物(層状成形物、単独フィルム等)を容易に製造できる。
本発明によれば、テトラフルオロエチレン系ポリマーに効率よく水素原子が導入されて形成された、安定した改質層を表面の少なくとも一部に有するテトラフルオロエチレン系ポリマーの成形物を製造できる。また、成形物全体のテトラフルオロエチレン系ポリマーの物性を備え、接着性等の表面物性が向上した、テトラフルオロエチレン系ポリマーの成形物が得られる。 According to the present invention, a highly modified tetrafluoroethylene polymer can be produced.
According to the present invention, a modified powder of a tetrafluoroethylene-based polymer having excellent wettability and dispersibility can be produced without impairing the physical properties of the tetrafluoroethylene-based polymer, and then a liquid having excellent liquid physical properties can be easily produced. The composition can be produced. From such a liquid composition, a molded product (layered molded product, single film, etc.) having the physical characteristics of a tetrafluoroethylene polymer and having excellent adhesiveness can be easily produced.
According to the present invention, it is possible to produce a molded product of a tetrafluoroethylene polymer having a stable modified layer on at least a part of the surface, which is formed by efficiently introducing hydrogen atoms into the tetrafluoroethylene polymer. Further, a tetrafluoroethylene-based polymer molded product having the physical properties of the tetrafluoroethylene-based polymer as a whole and having improved surface physical properties such as adhesiveness can be obtained.
「テトラフルオロエチレン系ポリマー」とは、テトラフルオロエチレン(以下、「TFE」とも記す。)に基づく単位(以下、「TFE単位」とも記す。)を含有するポリマーである。
「ポリマーのガラス転移点(Tg)」とは、動的粘弾性測定(DMA)法でポリマーを分析して測定される値である。
「ポリマーの溶融温度(融点)」は、示差走査熱量測定(DSC)法で測定した融解ピークの最大値に対応する温度である。
「(メタ)アクリレート」とはアクリレートとメタクリレートの総称である。
「D50」は、パウダーの平均粒子径であり、レーザー回折・散乱法によって求められるパウダーの体積基準累積50%径である。すなわち、レーザー回折・散乱法によってパウダーの粒度分布を測定し、パウダーの集団の全体積を100%として累積カーブを求め、その累積カーブ上で累積体積が50%となる点の粒子径である。
「D90」は、パウダーの累積体積粒径であり、同様にして求められるパウダーの体積基準累積90%径である。
「モノマーに基づく単位」とは、モノマーの重合により形成された前記モノマーに基づく原子団を意味する。単位は、重合反応によって直接形成された単位であってもよく、ポリマーを処理することによって前記単位の一部が別の構造に変換された単位であってもよい。以下、モノマーaに基づく単位を、単に「モノマーa単位」とも記す。 The following terms have the following meanings.
The "tetrafluoroethylene-based polymer" is a polymer containing a unit (hereinafter, also referred to as "TFE unit") based on tetrafluoroethylene (hereinafter, also referred to as "TFE").
The "glass transition point (Tg) of a polymer" is a value measured by analyzing a polymer by a dynamic viscoelasticity measurement (DMA) method.
The “polymer melting temperature (melting point)” is the temperature corresponding to the maximum value of the melting peak measured by the differential scanning calorimetry (DSC) method.
"(Meta) acrylate" is a general term for acrylate and methacrylate.
“D50” is the average particle size of the powder, which is the volume-based cumulative 50% diameter of the powder obtained by the laser diffraction / scattering method. That is, the particle size distribution of the powder is measured by the laser diffraction / scattering method, the cumulative curve is obtained with the total volume of the powder population as 100%, and the particle size is the point at which the cumulative volume is 50% on the cumulative curve.
“D90” is the cumulative volume particle size of the powder, which is the volume-based cumulative 90% diameter of the powder obtained in the same manner.
The "monomer-based unit" means an atomic group based on the monomer formed by polymerization of the monomer. The unit may be a unit directly formed by a polymerization reaction, or may be a unit in which a part of the unit is converted into another structure by processing a polymer. Hereinafter, the unit based on the monomer a is also simply referred to as “monomer a unit”.
なお、前記領域においては、ピークHおよびピークF以外にも、酸素原子の1s軌道に基づく光電子ピーク(O1s)や窒素原子の1s軌道に基づく光電子ピーク(N1s)(以下、「他のピーク」とも記す。)があり得る。 Peak H and peak F are, in this order, a photoelectron peak (C1s) based on the 1s orbital of a carbon atom and a photoelectron peak (F1s) based on the 1s orbital of a fluorine atom. In other words, the peak H is a carbon atom and a hydrogen atom. The peak and peak F derived from the single bond (CH bond) of the above can be regarded as the peak derived from the single bond (CF bond) of a carbon atom and a fluorine atom.
In the above region, in addition to peak H and peak F, a photoelectron peak (O1s) based on the 1s orbital of an oxygen atom and a photoelectron peak (N1s) based on the 1s orbital of a nitrogen atom (hereinafter, also referred to as "other peaks"). (Note) is possible.
フッ素原子の含有割合は、以下の手順によって、算出される値である。
ESCAにおける、C1sの光電子ピーク、O1sの光電子ピーク、N1sの光電子ピークおよびF1sの光電子ピークを含む範囲において、バックグランドを差し引き、それぞれの元素(炭素原子、酸素原子、窒素原子およびフッ素原子の4元素)のピーク強度を算出する。
ピーク強度をその元素に固有な相対感度係数で割ったピーク強度の補正値を、上記4元素のそれぞれで求め、補正値の総和に占めるフッ素原子のピーク強度(補正値)の割合を「フッ素原子の含有割合」とした。 The content ratio [atm%] of fluorine atoms in the region is preferably 55% or less, and more preferably 40% or less.
The content ratio of fluorine atoms is a value calculated by the following procedure.
In the range including the photoelectron peak of C1s, the photoelectron peak of O1s, the photoelectron peak of N1s and the photoelectron peak of F1s in ESCA, the background is subtracted and each element (carbon atom, oxygen atom, nitrogen atom and fluorine atom) is subtracted. ) Peak intensity is calculated.
The correction value of the peak intensity obtained by dividing the peak intensity by the relative sensitivity coefficient peculiar to the element is obtained for each of the above four elements, and the ratio of the peak intensity (correction value) of the fluorine atom to the total of the correction values is "fluorine atom". Content ratio of ".
また、原パウダーの表面は、フッ素原子の含有割合が55%超であるのが好ましく、60%以上であるのがより好ましい。
本法1によれば、全体としてFポリマーの物性(電気物性等)を損なわずに、表面物性(濡れ性等)と分散安定性を向上した、改質パウダーが得られる。その作用機構は必ずしも明確ではないが、以下の様に考えられる。 The maximum height of the peak H of the surface of the raw powder is preferably less than 0.2 times, more preferably 0.1 times or less of the maximum height of the peak F.
Further, the surface of the raw powder preferably has a fluorine atom content of more than 55%, more preferably 60% or more.
According to this method 1, a modified powder having improved surface physical properties (wetting property, etc.) and dispersion stability can be obtained without impairing the physical properties (electrical physical properties, etc.) of the F polymer as a whole. Its mechanism of action is not always clear, but it is thought to be as follows.
つまり、本法1におけるプラズマ処理においては、かかる状態にてプラズマ処理が進行するため、Fポリマーが効率よく変性されやすいと考えられる。 Since the plasma treatment in Method 1 is performed in the vicinity of atmospheric pressure, in other words, in an atmosphere with high gas density, it is considered that the gas contained in the atmosphere is partially converted into plasma. Further, it is considered that the gas contained in the atmosphere not only becomes plasma by itself, but also forms electrically neutral radicals and the like, and also serves as a denaturing component of the polymer.
That is, in the plasma treatment in the present method 1, since the plasma treatment proceeds in such a state, it is considered that the F polymer is easily denatured efficiently.
かかる作用機構により、本法1によれば、Fポリマーの物性と優れた表面物性と具備したパウダーが得られ、それから容易に、分散性に優れた液状組成物を調製できたと考えられる。 As a result, according to the present method 1, it is considered that non-fluorine atoms or molecules are efficiently introduced into the F polymer contained on the surface of the raw powder. Further, since the cutting of the F polymer on the surface of the raw powder by plasma is suppressed and the molecular weight reduction thereof is suppressed, the surface state of the modified F polymer is likely to be stable.
According to this method 1, it is considered that a powder having the physical characteristics and excellent surface physical characteristics of the F polymer was obtained by such an action mechanism, and then a liquid composition having excellent dispersibility could be easily prepared.
Fポリマーは、酸素原子を含む原子団を有するのが好ましい。本法によれば、かかる原子団に基づくFポリマーの物性を損なわずに、その表面物性がさらに向上した改質成形物が得られやすい。 As the PAVE, CF 2 = CFOCF 3 , CF 2 = CFOCF 2 CF 3 or CF 2 = CFOCF 2 CF 2 CF 3 (PPVE) is preferable, and PPVE is more preferable.
The F polymer preferably has an atomic group containing an oxygen atom. According to this method, it is easy to obtain a modified molded product having further improved surface physical properties without impairing the physical properties of the F polymer based on the atomic group.
酸素原子を含む原子団は、水酸基含有基またはカルボニル基含有基が好ましく、カルボニル基含有基が特に好ましい。 The atomic group may be contained in the monomer unit in the F polymer, or may be contained in the terminal group of the main chain of the polymer. Examples of the latter aspect include an F polymer having the atomic group as a terminal group derived from a polymerization initiator, a chain transfer agent, or the like.
The atomic group containing an oxygen atom is preferably a hydroxyl group-containing group or a carbonyl group-containing group, and a carbonyl group-containing group is particularly preferable.
カルボニル基含有基は、カルボニル基(>C(O))を含む基であり、カルボキシル基、アルコキシカルボニル基、アミド基、イソシアネート基、カルバメート基(-OC(O)NH2)、酸無水物残基(-C(O)OC(O)-)、イミド残基(-C(O)NHC(O)-等)またはカーボネート基(-OC(O)O-)が好ましく、酸無水物残基が特に好ましい。 The hydroxyl group-containing group is preferably an alcoholic hydroxyl group-containing group, more preferably -CF 2 CH 2 OH or -C (CF 3 ) 2 OH.
The carbonyl group-containing group is a group containing a carbonyl group (> C (O)), a carboxyl group, an alkoxycarbonyl group, an amide group, an isocyanate group, a carbamate group (-OC (O) NH 2 ), and an acid anhydride residue. A group (-C (O) OC (O)-), an imide residue (-C (O) NHC (O)-etc.) or a carbonate group (-OC (O) O-) is preferred, and an acid anhydride residue. Is particularly preferable.
また、前記モノマーは、無水イタコン酸、無水シトラコン酸または5-ノルボルネン-2,3-ジカルボン酸無水物(別称:無水ハイミック酸;以下、「NAH」とも記す。)が好ましい。
ポリマー(1)の具体例としては、国際公開第2018/16644号に記載されるポリマーが挙げられる。 The polymer (1) is preferably a polymer containing a TFE unit, a PAVE unit, and a monomer unit having a hydroxyl group-containing group or a carbonyl group-containing group. The polymer (1) has 90 to 99 mol% of TFE units, 0.5 to 9.97 mol% of PAVE units, and 0.01 to 3 mol% of units based on the monomer, respectively, based on all the units. It is preferable to include it.
Further, the monomer is preferably itaconic anhydride, citraconic anhydride or 5-norbornene-2,3-dicarboxylic acid anhydride (also known as hymic anhydride; hereinafter, also referred to as “NAH”).
Specific examples of the polymer (1) include the polymers described in WO 2018/16644.
ポリマー(2)におけるPAVE単位の含有量は、全モノマー単位に対して、2.1モル%以上が好ましく、2.2モル%以上がより好ましい。
なお、ポリマー(2)が酸素原子を含む原子団を有さないとは、ポリマー主鎖を構成する炭素原子数の1×106個あたりに対して、ポリマーが有する酸素原子を含む原子団の数が、500個未満であることを意味する。酸素原子を含む原子団の数は、100個以下が好ましく、50個未満がより好ましい。酸素原子を含む原子団の数の下限は、通常、0個である。 The polymer (2) consists of only TFE units and PAVE units, and contains 95.0 to 98.0 mol% of TFE units and 2.0 to 5.0 mol% of PAVE units with respect to all monomer units. Is preferable.
The content of PAVE units in the polymer (2) is preferably 2.1 mol% or more, more preferably 2.2 mol% or more, based on all the monomer units.
The fact that the polymer (2) does not have an atomic group containing an oxygen atom means that the atomic group containing an oxygen atom contained in the polymer has a ratio of 1 × 10 6 carbon atoms constituting the polymer main chain. It means that the number is less than 500. The number of atomic groups containing oxygen atoms is preferably 100 or less, more preferably less than 50. The lower limit of the number of atomic groups containing oxygen atoms is usually zero.
原パウダーに含まれ得る他の成分としては、芳香族ポリエステル、ポリアミドイミド、熱可塑性ポリイミド、ポリフェニレンエーテル、ポリフェニレンオキシド等の耐熱性樹脂が挙げられる。 原パウダーのD50は、50μm以下であるのが好ましく、20μm以下であるのがより好ましく、8μm以下であるのがさらに好ましい。原パウダーのD50は、0.1μm以上が好ましく、0.3μm以上がより好ましく、1μm以上がさらに好ましい。また、原パウダーのD90は、100μm未満であるのが好ましく、90μm以下であるのがより好ましい。原パウダーのD50およびD90が、かかる範囲にあれば、その表面積が大きくなり、原パウダーの改質が一層進行しやすい。 The raw powder is preferably composed of an F polymer. The content of the F polymer in the raw powder is preferably 80% by mass or more, and more preferably 100% by mass.
Other components that can be contained in the raw powder include heat-resistant resins such as aromatic polyester, polyamide-imide, thermoplastic polyimide, polyphenylene ether, and polyphenylene oxide. The D50 of the raw powder is preferably 50 μm or less, more preferably 20 μm or less, and further preferably 8 μm or less. The D50 of the raw powder is preferably 0.1 μm or more, more preferably 0.3 μm or more, and even more preferably 1 μm or more. The D90 of the raw powder is preferably less than 100 μm, more preferably 90 μm or less. If the raw powders D50 and D90 are in such a range, the surface area thereof becomes large, and the modification of the raw powder is more likely to proceed.
雰囲気におけるガス濃度がかかる範囲にあれば、上述した作用機構が亢進しやすい。かかる雰囲気は、高純度ガスの使用や、後述するプラズマ処理における雰囲気から空気を遮蔽する方法によって形成できる。 The concentration of the reducing gas having a hydrogen atom in the atmosphere in the plasma treatment or the gas containing any one of the vinyl compound and the vinylidene compound is preferably more than 99% by volume, preferably 99.5% by volume or more. Is more preferable, and 99.9% by volume or more is further preferable. The upper limit of the concentration of the gas is 100% by volume. When the atmosphere contains the gas and the noble gas, the total concentration of the gas and the noble gas may be within the range.
If the gas concentration in the atmosphere is within such a range, the above-mentioned mechanism of action is likely to be enhanced. Such an atmosphere can be formed by using a high-purity gas or a method of shielding air from the atmosphere in the plasma treatment described later.
ビニル化合物またはビニリデン化合物としては、アクリル酸、メタクリル酸、メチルアクリレート、メチルメタクリレートが挙げられ、アクリル酸が好ましい。この場合、原パウダーの表面に、密に(メタ)アクリル鎖および(メタ)アクリレート鎖を導入しやすい。 The plasma treatment in Method 1 is preferably carried out in a gas atmosphere containing a reducing gas having a hydrogen atom, or in a gas atmosphere containing the vinyl compound or vinylidene compound. In the former case, a modified powder formed by introducing hydrogen atoms on the surface of the modified powder was obtained, and in the latter case, a polyvinyl compound chain or a polyvinylidene compound chain was introduced on the surface of the modified powder. Quality powder is obtained.
Examples of the vinyl compound or vinylidene compound include acrylic acid, methacrylic acid, methyl acrylate, and methyl methacrylate, and acrylic acid is preferable. In this case, it is easy to introduce the (meth) acrylic chain and the (meth) acrylate chain densely on the surface of the raw powder.
また、この場合のガス雰囲気は、プラズマの発生をコントロールする観点から、さらに他のガスを含むのが好ましい。他のガスの好適な態様は、上述した、水素原子を有する還元性ガスを含む雰囲気における、他のガスのそれと同様である。
なお、ビニル化合物またはビニリデン化合物が液状および固体状である場合には、加熱してガス状として使用するか、バブリングしてガスを生成させてもよい。 In this case, the content concentration (volume basis) of the vinyl compound or vinylidene compound in the gas atmosphere is preferably 1200 to 1400 ppm.
Further, the gas atmosphere in this case preferably contains another gas from the viewpoint of controlling the generation of plasma. A preferred embodiment of the other gas is similar to that of the other gas in the above-mentioned atmosphere containing a reducing gas having a hydrogen atom.
When the vinyl compound or vinylidene compound is in a liquid or solid state, it may be heated and used as a gas, or bubbling may be performed to generate a gas.
空気を遮蔽する方法としては、プラズマ処理における雰囲気圧力を大気圧以上にする方法、プラズマ処理装置に障害壁を設置して空気の混入を抑制する方法が挙げられる。 The plasma treatment in this method 1 is preferably performed in an atmosphere in which air (particularly oxygen gas) is shielded from the viewpoint of suppressing the mixing of components that inhibit the plasma treatment, and in an atmosphere in which the air is completely shielded. It is more preferable to do so.
Examples of the method of shielding air include a method of increasing the atmospheric pressure in plasma processing to atmospheric pressure or higher, and a method of installing an obstacle wall in the plasma processing device to suppress air mixing.
プラズマ放電の際の電圧は、5から20kVであるのが好ましい。プラズマ放電の際の電源の周波数は、50Hzから100MHzであるのが好ましい。プラズマ放電の際の電極面積に対する放電電力密度は、1から400W・min/cm2であるのが好ましい。上記放電の条件でプラズマ放電を行うと、改質成形物が接着性に優れやすい。プラズマ放電の際の放電時間は、対象とする原パウダーに対して、0.1秒から300分であるのが好ましい。 As the method of plasma treatment in this method 1, a method of arranging the raw powder and causing plasma discharge in a plasma chamber filled with a raw material gas such as a reducing gas so as to have atmospheric conditions, or an electrode facing the raw powder. A method of plasma discharge while supplying the raw material gas so as to satisfy the atmospheric conditions can be mentioned.
The voltage during plasma discharge is preferably 5 to 20 kV. The frequency of the power supply during plasma discharge is preferably 50 Hz to 100 MHz. The discharge power density with respect to the electrode area during plasma discharge is preferably 1 to 400 W · min / cm 2. When plasma discharge is performed under the above discharge conditions, the modified molded product tends to have excellent adhesiveness. The discharge time during plasma discharge is preferably 0.1 seconds to 300 minutes with respect to the target raw powder.
かかる条件によりプラズマ放電を行えば、表面にFポリマーを含む原パウダーの表面に存在するFポリマーに水素原子、またはポリビニル化合物鎖またはポリビニリデン化合物鎖のいずれかが一層導入されやすく、全体のFポリマーの物性を損なわずに、濡れ性等の表面物性を高度に向上させた、改質パウダーが得られやすい。
特に、プラズマ放電における温度が上記範囲にあれば、より選択的かつ緻密な改質層を形成しやすい。 The temperature at the time of plasma discharge is preferably 0 to 300 ° C, more preferably 10 to 50 ° C.
When plasma discharge is performed under such conditions, a hydrogen atom or either a polyvinyl compound chain or a polyvinylidene compound chain is more easily introduced into the F polymer existing on the surface of the raw powder containing the F polymer on the surface, and the entire F polymer is easily introduced. It is easy to obtain a modified powder with highly improved surface physical properties such as wettability without impairing the physical properties of hydrogen.
In particular, when the temperature in the plasma discharge is within the above range, a more selective and dense modified layer can be easily formed.
改質パウダーの沈降率は、60%以下が好ましく、50%以下がより好ましく、40%以下がさらに好ましい。なお、沈降率とは、対象とする液状分散媒に改質パウダーが分散し、改質パウダーを5質量%含む分散液の1.3μLを、1.5μLマイクロチューブ(型番:1-7521-01、アズワン社製)に測り入れ、遠心分離機にて13000rpmで5分間遠心分離させた際に、下記式にて算出される値である。なお、沈降成分が生じていない場合は、沈降率は0%とする。
沈降率[%]=(沈降成分の高さ/分散液全体の高さ)×100 The modified powder obtained by this method 1 has improved surface physical properties such as wettability, and has high dispersibility in a liquid dispersion medium.
The sedimentation rate of the modified powder is preferably 60% or less, more preferably 50% or less, still more preferably 40% or less. The sedimentation rate is a 1.5 μL microtube (model number: 1-7521-01) in which 1.3 μL of a dispersion liquid containing 5% by mass of the modified powder is dispersed in the target liquid dispersion medium. , As One Co., Ltd.), and when centrifuged at 13000 rpm for 5 minutes with a centrifuge, it is a value calculated by the following formula. If no sedimentation component is generated, the sedimentation rate is 0%.
Sedimentation rate [%] = (height of sedimentation component / height of the entire dispersion) × 100
なおピークH及びピークFは前記と同じである。 The maximum height of the peak H of the modified layer in this method 2 is preferably 0.2 times or more, more preferably 1 time or more, with respect to the maximum height of the peak F.
The peak H and the peak F are the same as described above.
フッ素原子の含有割合および手順は前記と同じである。 The fluorine atom content ratio [atm%] in the region is preferably 55% or less, more preferably 40% or less.
The content ratio of fluorine atoms and the procedure are the same as described above.
また、原成形物の表面は、フッ素原子の含有割合が55%超であるのが好ましく、60%以上であるのがより好ましい。 The maximum height of the peak H of the surface of the original molded product is preferably less than 0.2 times, more preferably 0.1 times or less of the maximum height of the peak F. ..
Further, the surface of the original molded product preferably has a fluorine atom content of more than 55%, more preferably 60% or more.
本法2におけるプラズマ処理は、大気圧近傍、換言すれば、ガス密度の高い雰囲気下にて行われるため、雰囲気に含まれるガスは部分的にプラズマ化すると考えられる。また、雰囲気に含まれる水素原子を有する還元性ガスは、それ自体がプラズマとなるだけでなく、電気的に中性な水素ラジカルともなると考えられる。 According to this method 2, at least one modified layer which is a molded product containing an F polymer and has excellent surface physical properties (wetability, etc.) without impairing the F polymer physical properties (electrical properties, etc.) as a whole. A modified molded product having a portion is obtained. Its mechanism of action is not always clear, but it is thought to be as follows.
Since the plasma treatment in this method 2 is performed in the vicinity of atmospheric pressure, in other words, in an atmosphere with a high gas density, it is considered that the gas contained in the atmosphere is partially converted into plasma. Further, the reducing gas having a hydrogen atom contained in the atmosphere is considered not only to be a plasma itself but also to be an electrically neutral hydrogen radical.
かかる作用機構により、本法2によれば、表層にFポリマーを含む成形物の表面にFポリマーに水素原子が導入されて形成された改質層を形成し、成形物全体のFポリマーの物性と表面物性とを具備した、Fポリマーの成形物である改質成形物が得られると考えられる。 As a result, according to the present method 2, it is considered that a modified layer in which hydrogen atoms are efficiently introduced into the F polymer contained in the surface of the molded product is formed. Further, it is considered that the cleavage of the F polymer by plasma is suppressed by the action of hydrogen radicals and the reduction in molecular weight thereof is suppressed, so that a highly stable modified layer is formed.
According to this method 2, a modified layer formed by introducing hydrogen atoms into the F polymer is formed on the surface of the molded product containing the F polymer on the surface layer by such an action mechanism, and the physical properties of the F polymer of the entire molded product are formed. It is considered that a modified molded product, which is a molded product of an F polymer, having both a surface physical property and a surface physical property can be obtained.
原成形物は、全体にFポリマーが含まれていてもよく、表層のみにFポリマーが含まれていてもよい。また、後者の場合、表層の全体にFポリマーが含まれていてもよく、表層面の一部にFポリマーが含まれていてもよい。
原成形物の表面形状は、平滑状であってもよく、凹凸状であってもよい。 The original molded product in this method 2 is a molded product containing an F polymer on the surface layer. The surface layer of the molded product is a region in the range of at least approximately 1000 nm from the surface of the molded product in the thickness direction of the molded product, and the molded product to which this method 2 is applied is a molded product containing an F polymer in the surface layer. It is a thing. Similar to the above, the thickness of the molded product is the length in the direction perpendicular to the plane when the molded product has a planar spread, and the shortest length when there is no planar spread. Is.
The original molded product may contain the F polymer as a whole, or may contain the F polymer only in the surface layer. Further, in the latter case, the F polymer may be contained in the entire surface layer, or the F polymer may be contained in a part of the surface layer surface.
The surface shape of the original molded product may be smooth or uneven.
表層にFポリマーを含む層の厚さは、1μm以上が好ましく、5μm以上がより好ましく、10μm以上が特に好ましい。Fポリマーを含む層の厚さは、1mm以下が好ましい。原成形物がかかる厚さの表層にFポリマーを含む層部分を有すれば、本法により、成形物全体のFポリマーの物性と表面物性とを具備した、改質成形物が得られやすい。 The original molded product is preferably a molded product having a layer containing an F polymer on the surface layer, and preferably a sheet-shaped molded product having a layer portion containing the F polymer on the surface layer.
The thickness of the layer containing the F polymer in the surface layer is preferably 1 μm or more, more preferably 5 μm or more, and particularly preferably 10 μm or more. The thickness of the layer containing the F polymer is preferably 1 mm or less. If the surface layer having such a thickness of the original molded product has a layer portion containing the F polymer, it is easy to obtain a modified molded product having the physical characteristics and the surface physical characteristics of the F polymer of the entire molded product by this method.
Fポリマーのフィルムは、Fポリマーを主成分とするのが好ましく、Fポリマーを50質量%超100質量%以下含むのが好ましい。 The original molded product has an F polymer film or a layer containing a base material layer and an F polymer (hereinafter, also referred to as “F layer (2)”), and has an F layer (2) on the surface. Is preferable. In the case of an F polymer film or a laminate having an F layer (2) on both sides, this method may be applied to both sides, and this method may be applied to only one side.
The F polymer film preferably contains the F polymer as a main component, and preferably contains the F polymer in an amount of more than 50% by mass and 100% by mass or less.
金属基板層の態様としては金属箔が挙げられ、その材質としては銅、ニッケル、アルミニウム、チタン、それらの合金が挙げられる。
樹脂基板の態様としては樹脂フィルムが挙げられ、その材質としてはポリイミド、ポリアリレート、ポリスルホン、ポリアリルスルホン、ポリアミド、ポリエーテルアミド、ポリフェニレンスルフィド、ポリアリルエーテルケトン、ポリアミドイミド、液晶性ポリエステル、液晶性ポリエステルアミドが挙げられる。また、樹脂基板の態様としては、繊維強化樹脂基板の前駆体であるプリプレグも挙げられる。 The base material layer in the laminate is preferably a resin substrate layer or a metal substrate layer.
Examples of the metal substrate layer include metal foil, and examples of the material thereof include copper, nickel, aluminum, titanium, and alloys thereof.
Examples of the resin substrate include a resin film, and the materials thereof include polyimide, polyarylate, polysulfone, polyallyl sulfone, polyamide, polyetheramide, polyphenylene sulfide, polyallyl ether ketone, polyamideimide, liquid polyester, and liquid crystal. Polyester amide can be mentioned. Further, as an embodiment of the resin substrate, a prepreg which is a precursor of the fiber reinforced resin substrate can also be mentioned.
金属張積層体における金属箔は、銅箔であるのが好ましい。かかる金属張積層体は、プリント基板材料として特に有用である。多層フィルムにおける樹脂フィルムは、ポリイミドフィルムであるのが好ましい。かかる多層フィルムは、電線被覆材料、プリント基板材料として有用である。 Preferable embodiments of the laminate include a metal-clad laminate having a metal foil and an F layer (2) formed on at least one surface thereof, and a resin film and an F layer (2) formed on at least one surface thereof. ), And examples thereof.
The metal foil in the metal-clad laminate is preferably a copper foil. Such a metal-clad laminate is particularly useful as a printed circuit board material. The resin film in the multilayer film is preferably a polyimide film. Such a multilayer film is useful as an electric wire coating material and a printed circuit board material.
水素原子を有する還元性ガスとしては、水素ガス、アンモニアガス又は炭化水素ガスが好ましく、水素ガス、アンモニアガス、メタンガス又はエチレンガスがより好ましく、上述した作用機構における水素還元種としての作用能の観点から、水素ガス又はアンモニアガスがさらに好ましく、水素ガスが最も好ましい。還元性ガスは、1種を単独で用いてもよく、2種以上を併用してもよい。 The plasma treatment in this method 2 is performed in an atmosphere containing a reducing gas having a hydrogen atom.
As the reducing gas having a hydrogen atom, hydrogen gas, ammonia gas or hydrocarbon gas is preferable, hydrogen gas, ammonia gas, methane gas or ethylene gas is more preferable, and the viewpoint of the ability to act as a hydrogen reducing species in the above-mentioned action mechanism Therefore, hydrogen gas or ammonia gas is more preferable, and hydrogen gas is most preferable. As the reducing gas, one type may be used alone, or two or more types may be used in combination.
空気を遮蔽する方法としては、プラズマ処理における雰囲気圧力を大気圧以上にする方法、プラズマ処理装置に障害壁を設置して空気の混入を抑制する方法が挙げられる。 The plasma treatment in this method 2 is preferably performed in an atmosphere in which air, particularly oxygen gas, is shielded from the viewpoint of suppressing contamination of components that inhibit the plasma treatment, and is performed in an atmosphere in which air is completely shielded. Is more preferable.
Examples of the method of shielding air include a method of increasing the atmospheric pressure in plasma processing to atmospheric pressure or higher, and a method of installing an obstacle wall in the plasma processing device to suppress air mixing.
プラズマ放電の際の電圧は、5から20kVであるのが好ましい。プラズマ放電の際の電源の周波数は、50Hzから100MHzであるのが好ましい。プラズマ放電の際の電極面積に対する放電電力密度は、1から400W・min/cm2であるのが好ましい。上記放電の条件でプラズマ放電を行うと、改質成形物が接着性に優れやすい。
プラズマ放電の際の放電時間は、対象とする原成形物に対して、0.1秒から300分であるのが好ましい。 As the method of plasma treatment in this method 2, a method of arranging the original molded product and plasma discharge in a plasma chamber filled with a raw material gas such as a reducing gas so as to have atmospheric conditions, or a method of facing the original molded product. An example is a method in which the gas is placed between the electrodes and plasma is discharged while supplying the raw material gas so as to satisfy the atmospheric conditions.
The voltage during plasma discharge is preferably 5 to 20 kV. The frequency of the power supply during plasma discharge is preferably 50 Hz to 100 MHz. The discharge power density with respect to the electrode area during plasma discharge is preferably 1 to 400 W · min / cm 2. When plasma discharge is performed under the above discharge conditions, the modified molded product tends to have excellent adhesiveness.
The discharge time during plasma discharge is preferably 0.1 seconds to 300 minutes with respect to the target original molded product.
かかる条件によりプラズマ放電を行えば、表層にFポリマーを含む成形物の表面に存在するFポリマーに水素原子が一層導入されやすく、全体のFポリマーの物性を損なわずに、濡れ性等の表面物性を高度に向上させた、改質成形物が得られやすい。
特に、プラズマ放電における温度が上記範囲にあれば、より選択的かつ緻密な改質層を形成しやすい。 The temperature at the time of plasma discharge is preferably 0 to 300 ° C, more preferably 10 to 50 ° C.
When plasma discharge is performed under such conditions, hydrogen atoms are more likely to be introduced into the F polymer existing on the surface of the molded product containing the F polymer on the surface layer, and the surface physical properties such as wettability are not impaired without impairing the physical properties of the entire F polymer. It is easy to obtain a modified molded product with a high degree of improvement.
In particular, when the temperature in the plasma discharge is within the above range, a more selective and dense modified layer can be easily formed.
これらの態様における、Fポリマーのフィルム、金属箔、樹脂フィルムおよびF層(2)の態様は、好適な態様も含めて本法1における態様と同様である。 The mode of the F polymer in the present molded product is the same as that in the present method 1, including the preferred mode. The aspect of the modified layer in the present molded product and the aspect of the state or shape of the surface in the present molded product are the same as those in the present method 2, including the preferred embodiment. A preferred embodiment of the molded product includes a film having a modified layer on at least one surface of the F polymer film, a metal foil, and an F layer (2) formed on at least one surface thereof. It has a metal-clad laminate having a modified layer on the surface of the F layer (2), a resin film, and an F layer (2) formed on at least one surface thereof, and a modified layer is provided on the surface of the F layer. A multilayer film having a structure can be mentioned. When the F layer is formed on both sides of the metal-clad laminate, or when the F layer (2) is formed on both sides of the multilayer film, the modified layer may be provided on both surfaces. ..
The aspects of the F polymer film, the metal leaf, the resin film, and the F layer (2) in these embodiments are the same as those in the present method 1 including the preferred embodiments.
例えば、改質層を有する、FポリマーのフィルムまたはF層(2)の誘電率は、2.0から3.5であるのが好ましく、2.0から3.0であるのがより好ましい。なお、誘電率は、23℃±2℃、相対湿度50±5%の環境下、周波数10GHzにて、スプリットポスト誘電体共振器(SPDR)を用いて測定される。本成形物が多層フィルムである場合、本成形物の誘電率は、2.0から3.5であるのが好ましく、2.0から3.0であるのがより好ましい。本成形物の最外面(改質層)の水接触角は、100°以下が好ましく、90°以下がより好ましい。また、本成形物の最外面(改質層)の水接触角は、10°以上が好ましく、30°以上がより好ましい。なお、水接触角は、JIS R 3257:1999に記載の静滴法で測定した値である。 This molded product is a molded product having the physical characteristics of the F polymer of the entire molded product and the surface physical characteristics derived from high polarity, and is particularly useful as an electric wire coating material and a printed circuit board material.
For example, the dielectric constant of the F polymer film having the modified layer or the F layer (2) is preferably 2.0 to 3.5, and more preferably 2.0 to 3.0. The dielectric constant is measured using a split post dielectric resonator (SPDR) at a frequency of 10 GHz in an environment of 23 ° C. ± 2 ° C. and a relative humidity of 50 ± 5%. When the molded product is a multilayer film, the dielectric constant of the molded product is preferably 2.0 to 3.5, more preferably 2.0 to 3.0. The water contact angle of the outermost surface (modified layer) of the molded product is preferably 100 ° or less, more preferably 90 ° or less. The water contact angle of the outermost surface (modified layer) of the molded product is preferably 10 ° or more, more preferably 30 ° or more. The water contact angle is a value measured by the intravenous drip method described in JIS R 3257: 1999.
他の基材としては、上述した金属基板および樹脂基板に加えて、プリプレグ、ガラス基板、セラミックス基板が挙げられる。 Examples of the method for laminating and adhering the present molded product to other base materials include a method using a hot press. The temperature of the hot press is preferably not more than the melting point of the F polymer, more preferably 300 ° C. or less, still more preferably 240 ° C. or less. The temperature of the hot press is preferably 120 ° C. or higher, more preferably 160 ° C. or higher. Since this molded product has a modified layer having excellent physical properties such as wettability on its surface, it can be laminated and adhered to other base materials at a lower temperature.
Examples of other substrates include prepregs, glass substrates, and ceramic substrates, in addition to the metal and resin substrates described above.
かかる積層体は、アンテナ部品、プリント基板、航空機用部品、自動車用部品、スポーツ用具、食品工業用品、塗料、化粧品等として有用であり、具体的には、電線被覆材(航空機用電線等)、電気絶縁性テープ、石油掘削用絶縁テープ、プリント基板用材料、分離膜(精密濾過膜、限外濾過膜、逆浸透膜、イオン交換膜、透析膜、気体分離膜等)、電極バインダー(リチウム二次電池用、燃料電池用等)、コピーロール、家具、自動車ダッシュボート、家電製品等のカバー、摺動部材(荷重軸受、すべり軸、バルブ、ベアリング、歯車、カム、ベルトコンベア、食品搬送用ベルト等)、工具(シャベル、やすり、きり、のこぎり等)、ボイラー、ホッパー、パイプ、オーブン、焼き型、シュート、ダイス、便器、コンテナ被覆材として有用である。 The structure of the laminate of this molded product and other base material is as follows: metal substrate / main molded product having modified layers on both sides / other base material layer / main molded product having modified layers on both sides / metal substrate , Metal substrate layer / other substrate layer / present molded product having modified layers on both sides / other substrate layer / metal substrate layer and the like. Each layer may further contain a glass cloth or filler.
Such laminates are useful as antenna parts, printed substrates, aircraft parts, automobile parts, sports equipment, food industry supplies, paints, cosmetics, etc. Specifically, wire coating materials (aircraft wires, etc.), Electrical insulation tape, insulation tape for oil drilling, materials for printed substrates, separation membranes (precision filtration membranes, ultrafiltration membranes, reverse osmosis membranes, ion exchange membranes, dialysis membranes, gas separation membranes, etc.), electrode binders (lithium II) For next batteries, fuel cells, etc.), copy rolls, furniture, automobile dashboards, covers for home appliances, sliding members (load bearings, sliding shafts, valves, bearings, gears, cams, belt conveyors, food transport belts, etc.) Etc.), tools (shovels, shavings, cuttings, saws, etc.), boilers, hoppers, pipes, ovens, baking molds, chutes, dies, toilet bowls, container covering materials.
例えば、本法、本法1および2は、上記実施形態の構成において、他の任意の工程を追加で有してもよいし、同様の作用を生じる任意の工程と置換されていてよい。また本成形物は上記実施形態の構成において、他の任意の構成を追加してもよいし、同様の機能を発揮する任意の構成と置換されていてよい。 Although the present method, the present methods 1 and 2, and the present molded product have been described above, the present invention is not limited to the configuration of the above-described embodiment.
For example, the present method, the present methods 1 and 2, may additionally have any other step in the configuration of the above embodiment, or may be replaced with any step that produces the same action. Further, in the configuration of the above-described embodiment, the present molded product may be added with any other configuration or may be replaced with an arbitrary configuration exhibiting the same function.
[例1]改質パウダーおよび液状組成物の製造例
以下の原材料を使用した。
Fパウダー1:TFE単位を97.9モル%、PPVE単位を2.0モル%およびNAH単位を0.1モル%含むポリマー1(融点:300℃、フッ素含有量:71質量%)からなるパウダー(平均粒子径:2.6μm)。なお、Fパウダー1は、国際公開2018/016644号パンフレットの段落番号0154に記載される樹脂パウダー(A)に相当する。
Fパウダー2:TFE単位を98.7モル%およびPPVE単位を1.3モル%含むポリマー2(融点:300℃、フッ素含有量:71質量%)からなるパウダー(平均粒子径:4.3μm)。
なお、ポリマー1はカルボニル基含有基を主鎖炭素数1×106個あたり1000個有し、ポリマー2はカルボニル基含有基を主鎖炭素数1×106個あたり40個有する。 Hereinafter, the present invention will be described in detail by way of examples, but the present invention is not limited thereto.
[Example 1] Production example of modified powder and liquid composition The following raw materials were used.
F powder 1: Powder composed of polymer 1 (melting point: 300 ° C., fluorine content: 71% by mass) containing 97.9 mol% of TFE units, 2.0 mol% of PPVE units and 0.1 mol% of NAH units. (Average particle size: 2.6 μm). The F powder 1 corresponds to the resin powder (A) described in paragraph number 0154 of the pamphlet of International Publication No. 2018/016644.
F powder 2: Powder consisting of polymer 2 (melting point: 300 ° C., fluorine content: 71% by mass) containing 98.7 mol% of TFE units and 1.3 mol% of PPVE units (average particle size: 4.3 μm) ..
Incidentally, the polymer 1 has a main chain number 1 × 10 1000 to six per carbon carbonyl group-containing group, polymers 2 to 40 Yes main chain carbon atoms 1 × 10 6 cells per a carbonyl group-containing group.
1対の対向電極のそれぞれに誘電体を挟み込み、誘電体バリア放電によるプラズマ生成が可能な機構を備え、パウダーを保持するステージを備えたプラズマチャンバー内に、Fパウダー1を一様に設置した。チャンバーにArガスの95体積%と水素ガスの5体積%を含む混合ガスを流し、外気を遮蔽し、プラズマ処理中のチャンバー内のArガスと水素ガスの合計濃度を99.9体積%以上に、チャンバー内の圧力を0.1MPaに、チャンバー内の温度を25℃に、保持した。処理周波数を13kHz、印可電圧を9kVとして、チャンバー内にてプラズマ放電させて、Fパウダー1を1分間、プラズマ処理して、改質パウダー1を得た。
改質パウダー1の33質量部に対し、蒸留水の67質量部を添加し、60分間、撹拌して改質パウダー1と水とを含み、界面活性剤を含まない、改質パウダー1が分散している液状組成物1を得た。 [Example 1-1] Production example of modified powder 1 and liquid composition 1 A stage in which a dielectric is sandwiched between a pair of counter electrodes and a mechanism capable of generating plasma by a dielectric barrier discharge is provided to hold the powder. F powder 1 was uniformly installed in the plasma chamber provided with the above. A mixed gas containing 95% by volume of Ar gas and 5% by volume of hydrogen gas is flowed through the chamber to shield the outside air, and the total concentration of Ar gas and hydrogen gas in the chamber during plasma treatment is increased to 99.9% by volume or more. The pressure in the chamber was maintained at 0.1 MPa, and the temperature in the chamber was maintained at 25 ° C. The processing frequency was 13 kHz and the applied voltage was 9 kV. Plasma discharge was performed in the chamber, and F powder 1 was plasma-treated for 1 minute to obtain modified powder 1.
67 parts by mass of distilled water was added to 33 parts by mass of the modified powder 1, and the mixture was stirred for 60 minutes to contain the modified powder 1 and water, and the modified powder 1 containing no surfactant was dispersed. The liquid composition 1 was obtained.
Fパウダー1の33質量部に対して、ノニオン性のフッ素系界面活性剤(ネオス社製、フタージェント250)を1質量部と蒸留水の66質量部とからなる混合液を添加し、60分間、撹拌して、パウダー1が分散している液状組成物C1を得た。なお、この液状組成物C1は、国際公開2018/016644号パンフレットの段落番号0156に記載される分散液(C-1)に相当する。 液状組成物1と液状組成物C1に関して、国際公開2018/016644号パンフレットの実施例に記載される「分散性」を評価した結果、両者の液状組成物は同等の分散性を示した。 [Example 1-2] Evaluation example With respect to 33 parts by mass of F powder 1, 1 part by mass of a nonionic fluorine-based surfactant (Futergent 250 manufactured by Neos) and 66 parts by mass of distilled water are formed. The mixed solution was added and stirred for 60 minutes to obtain a liquid composition C1 in which the powder 1 was dispersed. The liquid composition C1 corresponds to the dispersion liquid (C-1) described in paragraph No. 0156 of the International Publication No. 2018/016644 pamphlet. As a result of evaluating the "dispersibility" described in Examples of the International Publication No. 2018/016644 pamphlet with respect to the liquid composition 1 and the liquid composition C1, both liquid compositions showed the same dispersibility.
Fパウダー1をFパウダー2に変更する以外は、例1-1と同様にして、改質パウダー2を得て、液状組成物2を得た。
[例1-4]改質パウダー3および液状組成物3の製造例
Fパウダー1をFパウダー2に変更し、プラズマ放電において外気を特に遮蔽せずに、プラズマ処理中のチャンバー内のArガスと水素ガスの合計濃度を99.9%未満、酸素ガスを1体積%超としてプラズマ放電する以外は、例1-1と同様にして、改質パウダー3を得て、液状組成物3を得た。 [Example 1-3] Production example of modified powder 2 and liquid composition 2 The modified powder 2 is obtained in the same manner as in Example 1-1 except that the F powder 1 is changed to the F powder 2, and the liquid composition is obtained. I got the thing 2.
[Example 1-4] Production example of modified powder 3 and liquid composition 3 F powder 1 is changed to F powder 2 with Ar gas in a chamber during plasma treatment without particularly shielding the outside air in plasma discharge. The modified powder 3 was obtained in the same manner as in Example 1-1 except that the total concentration of hydrogen gas was less than 99.9% and the oxygen gas was more than 1% by volume, and the liquid composition 3 was obtained. ..
Fパウダー1をFパウダー2に変更する以外は、例1-2と同様にして、液状組成物C2を調製した。
液状組成物2、3及びC2のそれぞれに関して、以下の手順により、その成形物の接着性を評価した。
各液状組成物を銅箔にダイコート法により塗工し、120℃にて5分間乾燥炉に通し、銅箔表面に乾燥被膜を形成させ、さらに、380℃にて10分間遠赤外線炉に通して、ポリマーを焼成して、銅箔の表面にポリマー層(厚さ10μm)が形成された積層体を調製した。この積層体から、長さ100mm、幅10mmの矩形状の試験片を切り出し、試験片の長さ方向の一端から50mmの位置までポリマー層から銅箔を剥離させた。
剥離に際して、試験片の長さ方向の一端から50mmの位置を中央にして、引張り試験機(オリエンテック社製)を用いて、引張り速度50mm/分で90度剥離し、測定距離10mmから30mmまでの平均荷重を測定して、積層体の剥離強度(N/cm)を評価した。
液状組成物2から形成された積層体の剥離強度は8N/cmであり、液状組成物3から形成された積層体の剥離強度は4N/cmであり、液状組成物C2から形成された積層体の剥離強度は3N/cm未満であった。 [Example 1-5] Evaluation Example A liquid composition C2 was prepared in the same manner as in Example 1-2 except that F powder 1 was changed to F powder 2.
For each of the liquid compositions 2, 3 and C2, the adhesiveness of the molded product was evaluated by the following procedure.
Each liquid composition is applied to a copper foil by a die coating method, passed through a drying oven at 120 ° C. for 5 minutes to form a dry film on the surface of the copper foil, and further passed through a far-infrared ray furnace at 380 ° C. for 10 minutes. , The polymer was fired to prepare a laminate in which a polymer layer (thickness 10 μm) was formed on the surface of the copper foil. A rectangular test piece having a length of 100 mm and a width of 10 mm was cut out from this laminated body, and the copper foil was peeled from the polymer layer from one end in the length direction of the test piece to a position of 50 mm.
When peeling, the test piece is peeled 90 degrees at a tensile speed of 50 mm / min using a tensile tester (manufactured by Orientec) with the position 50 mm from one end in the length direction as the center, and the measurement distance is from 10 mm to 30 mm. The peel strength (N / cm) of the laminated body was evaluated by measuring the average load of.
The peel strength of the laminate formed from the liquid composition 2 is 8 N / cm, the peel strength of the laminate formed from the liquid composition 3 is 4 N / cm, and the peel strength of the laminate formed from the liquid composition C2 is 4 N / cm. The peel strength of was less than 3 N / cm.
以下の原材料を使用した。
フィルム1:Fポリマー1のフィルム(厚さ:25μm)。
フィルム2:TFE単位を98.2モル%およびPPVE単位を1.8モル%含むポリマー3(融点:305℃、フッ素含有量:71質量%)のフィルム(厚さ:25μm)。
なお、フィルム1およびフィルム2のそれぞれにおいて、ESCAによって測定されるフィルムのピークH(フィルムの表面から深さ10nmまでの領域における284eVから286eVにあるピーク)は微弱であり、ピークHの最大高さはピークF(フィルムの表面から深さ10nmまでの領域における289eVから295eVにあるピーク)の最大高さに対して0.2倍未満より充分に小さく、また、フッ素原子の含有割合は60%であった。 [Example 2] Production example of modified film The following raw materials were used.
Film 1: Film of F polymer 1 (thickness: 25 μm).
Film 2: A film (thickness: 25 μm) of Polymer 3 (melting point: 305 ° C., fluorine content: 71% by mass) containing 98.2 mol% of TFE units and 1.8 mol% of PPVE units.
In each of the film 1 and the film 2, the peak H of the film measured by ESCA (the peak at 284 eV to 286 eV in the region from the surface of the film to the depth of 10 nm) is weak, and the maximum height of the peak H is high. Is well less than 0.2 times the maximum height of peak F (peaks at 289 eV to 295 eV in the region from the surface of the film to a depth of 10 nm), and the fluorine atom content is 60%. there were.
1対の対向電極のそれぞれに誘電体を挟み込み、誘電体バリア放電によるプラズマ生成が可能な機構を備えたプラズマチャンバー内に、フィルム1を設置した。チャンバーにArガスの95体積%と水素ガスの5体積%を含む混合ガスを流し、外気を遮蔽し、チャンバー内の圧力を0.1MPaに、チャンバー内の温度を25℃に、保持した。処理周波数を13kHz、印可電圧を9kVとして、チャンバー内にてプラズマ放電させて、フィルム1を2分間、プラズマ処理した。 [Example 2-1] Production example of modified film 1 The film 1 is installed in a plasma chamber equipped with a mechanism capable of generating plasma by a dielectric barrier discharge by sandwiching a dielectric in each of a pair of counter electrodes. .. A mixed gas containing 95% by volume of Ar gas and 5% by volume of hydrogen gas was flowed through the chamber to shield the outside air, and the pressure inside the chamber was maintained at 0.1 MPa and the temperature inside the chamber was maintained at 25 ° C. The processing frequency was 13 kHz, the applied voltage was 9 kV, plasma discharge was performed in the chamber, and the film 1 was plasma-treated for 2 minutes.
チャンバーに封入するガスをArガスの94体積%とアンモニアガスの5体積%と水蒸気の1体積%とを含む混合ガスに変更する以外は例1と同様にして、フィルム1をプラズマ処理した。
得られたフィルム(改質フィルム2)の表面において、ピークHの最大高さは、ピークFの最大高さの最大高さに対して0.2倍であり、改質フィルム2は表面にポリマー1に水素原子が導入されて形成された改質層を有するフィルムであることを確認した。 [Example 2-2] Production example of modified film 2 Example 1 except that the gas sealed in the chamber is changed to a mixed gas containing 94% by volume of Ar gas, 5% by volume of ammonia gas, and 1% by volume of water vapor. The film 1 was subjected to plasma treatment in the same manner as in the above.
On the surface of the obtained film (modified film 2), the maximum height of the peak H is 0.2 times the maximum height of the maximum height of the peak F, and the modified film 2 has a polymer on the surface. It was confirmed that the film had a modified layer formed by introducing a hydrogen atom into 1.
フィルム1をフィルム2にする以外は例1と同様にして、フィルム2をプラズマ処理した。
得られたフィルム(改質フィルム3)の表面において、ピークHの最大高さは、ピークFの最大高さの最大高さに対して3倍であり、前記領域におけるフッ素原子の含有割合は25%であり、改質フィルム3は、表面にポリマー2に水素原子が導入されて形成された改質層を有するフィルムであることを確認した。 [Example 2-3] Production example of modified film 3 The film 2 was plasma-treated in the same manner as in Example 1 except that the film 1 was made into a film 2.
On the surface of the obtained film (modified film 3), the maximum height of the peak H is three times the maximum height of the maximum height of the peak F, and the content ratio of fluorine atoms in the region is 25. %, And it was confirmed that the modified film 3 is a film having a modified layer formed by introducing hydrogen atoms into the polymer 2 on the surface.
チャンバーに封入するガスをArガスのみにする以外は例1と同様にして、フィルム1をプラズマ処理した。
ESCAによって測定した、得られたフィルム(改質フィルム4)の表面状態は、フィルム1と、ほぼ同等であった。 [Example 2-4] Production example of modified film 4 (comparative example)
The film 1 was plasma-treated in the same manner as in Example 1 except that the gas sealed in the chamber was only Ar gas.
The surface condition of the obtained film (modified film 4) measured by ESCA was almost the same as that of film 1.
真空条件とする以外は、例1と同様にして、フィルム1をプラズマ処理した。
ESCAによって測定した、得られたフィルム(改質フィルム5)の表面状態は、フィルム1と、ほぼ同等であった。 [Example 2-5] Production example of modified film 5 (comparative example)
The film 1 was plasma-treated in the same manner as in Example 1 except that the conditions were vacuum.
The surface condition of the obtained film (modified film 5) measured by ESCA was almost the same as that of film 1.
改質フィルム1と無垢の銅箔とを対向して配置し、熱プレス(温度:340℃、加圧力:15kN/m)して、改質フィルム1と銅箔の接着積層体を得た。この接着積層体から、長さ100mm、幅10mmの矩形状の試験片を切り出し、3カ月間、25℃にて静置した。次に、試験片の長さ方向の一端から50mmの位置まで改質フィルム1層から銅箔層を剥離した。剥離に際しては、試験片の長さ方向の一端から50mmの位置を中央にして、引張り試験機(オリエンテック社製)を用いて、引張り速度50mm/分で90度剥離し、測定距離10mmから30mmまでの平均荷重を測定して、剥離強度(N/cm)とした。
それぞれのフィルムに関しても、同様に接着積層体を作成し、その剥離強度を評価した。結果をまとめて、表1に示す。 [Example 2-6] Evaluation example of modified film The modified film 1 and the solid copper foil are placed facing each other and heat-pressed (temperature: 340 ° C., pressing force: 15 kN / m) to obtain the modified film. An adhesive laminate of 1 and copper foil was obtained. A rectangular test piece having a length of 100 mm and a width of 10 mm was cut out from this adhesive laminate and allowed to stand at 25 ° C. for 3 months. Next, the copper foil layer was peeled from the modified film 1 layer from one end in the length direction of the test piece to a position of 50 mm. When peeling, the test piece is peeled 90 degrees at a tensile speed of 50 mm / min using a tensile tester (manufactured by Orientec) with the position 50 mm from one end in the length direction as the center, and the measurement distance is 10 mm to 30 mm. The average load up to was measured and used as the peel strength (N / cm).
For each film, an adhesive laminate was prepared in the same manner, and the peel strength thereof was evaluated. The results are summarized in Table 1.
以上のことから本法による改質パウダーは高度に表面改質されていることが分かり、該改質パウダーを含む本組成物は界面活性剤を添加しなくても、分散性等の液物性に優れた液状組成物となり、基材接着性の高い成形物を形成できることが分かる。
本法による改質パウダーを含む液状組成物は分散性等の液物性に優れた液状組成物であり、多孔質または繊維状の材料中に、効率的に含浸できる。 As is clear from the above results, the modified powder prepared by this method is difficult to settle, and even if no surfactant is added, the dispersibility in water is equivalent to that when the surfactant is added. You can see that it shows. Further, the molded product formed from the liquid composition containing the modified powder prepared by this method has higher adhesion to the base material than the molded product formed from the liquid composition containing the original powder. It can be seen that it shows high adhesiveness.
From the above, it can be seen that the modified powder by this method is highly surface-modified, and the composition containing the modified powder has liquid physical properties such as dispersibility without adding a surfactant. It can be seen that the liquid composition is excellent and a molded product having high substrate adhesiveness can be formed.
The liquid composition containing the modified powder according to this method is a liquid composition having excellent liquid physical characteristics such as dispersibility, and can be efficiently impregnated into a porous or fibrous material.
したがって本法による改質成形物と他の基材との積層体は、アンテナ部品、プリント基板、航空機用部品、自動車用部品、スポーツ用具、食品工業用品、塗料、化粧品等として有用であると考えられる。
Further, as is clear from the above results, when the modified films 1 to 3 which are the modified molded products prepared by this method and the copper foil are adhered, the films 1 or 2 which are the original molded products and the copper foil are adhered to each other. Since it is higher than the peel strength, it can be seen that the adhesion strength is improved. Further, the peel strength between the modified films 1 to 3 produced by this method and the copper foil is higher than the peel strength between the modified films 4 and 5 produced by this method and the copper foil. From the above, it can be seen that the modified molded product according to this method is highly surface-modified.
Therefore, it is considered that the laminate of the modified molded product and other base materials according to this method is useful as antenna parts, printed circuit boards, aircraft parts, automobile parts, sports equipment, food industry supplies, paints, cosmetics, etc. Be done.
Claims (15)
- テトラフルオロエチレン系ポリマーを、大気圧近傍の雰囲気下にてプラズマ処理して、改質されたテトラフルオロエチレン系ポリマーを得る、改質されたテトラフルオロエチレン系ポリマーの製造方法。 A method for producing a modified tetrafluoroethylene polymer, which comprises plasma-treating a tetrafluoroethylene polymer in an atmosphere near atmospheric pressure to obtain a modified tetrafluoroethylene polymer.
- テトラフルオロエチレン系ポリマーのパウダーを、大気圧近傍の雰囲気下にてプラズマ処理し、前記パウダーの表面を改質する、改質パウダーの製造方法。 A method for producing a modified powder, in which a tetrafluoroethylene polymer powder is plasma-treated in an atmosphere near atmospheric pressure to modify the surface of the powder.
- 前記パウダーを、水素原子を有する還元性ガスを含む大気圧近傍の雰囲気下にてプラズマ処理し、前記テトラフルオロエチレン系ポリマーに水素原子が導入されて形成されたパウダーを得る、請求項2に記載の製造方法。 The second aspect of the present invention, wherein the powder is plasma-treated in an atmosphere near atmospheric pressure containing a reducing gas having a hydrogen atom to obtain a powder formed by introducing a hydrogen atom into the tetrafluoroethylene polymer. Manufacturing method.
- 前記プラズマ処理を、空気を遮蔽した雰囲気下にて行う、請求項2または3のいずれか1項に記載の製造方法。 The manufacturing method according to any one of claims 2 or 3, wherein the plasma treatment is performed in an atmosphere in which air is shielded.
- 前記プラズマ処理を行う前に、予め、前記パウダーを、希ガスを含む雰囲気下にてプラズマ処理する、請求項2から4のいずれか1項に記載の製造方法。 The production method according to any one of claims 2 to 4, wherein the powder is plasma-treated in advance in an atmosphere containing a rare gas before the plasma treatment is performed.
- 前記雰囲気が、水素原子を有する還元性ガス、ビニル化合物およびビニリデン化合物の少なくとも1種のガスを含む、請求項2から5のいずれか1項に記載の製造方法。 The production method according to any one of claims 2 to 5, wherein the atmosphere contains at least one gas of a reducing gas having a hydrogen atom, a vinyl compound and a vinylidene compound.
- 前記テトラフルオロエチレン系ポリマーが、フッ素含有量が70から76質量%であるテトラフルオロエチレン系ポリマーである、請求項2から6のいずれか1項に記載の製造方法。 The production method according to any one of claims 2 to 6, wherein the tetrafluoroethylene polymer is a tetrafluoroethylene polymer having a fluorine content of 70 to 76% by mass.
- 前記テトラフルオロエチレン系ポリマーが、酸素原子を含む原子団を有する、請求項2から7のいずれか1項に記載の製造方法。 The production method according to any one of claims 2 to 7, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
- 請求項2から8のいずれかの1項に記載の製造方法で得られた改質パウダーと、液状分散媒とを含み、前記改質パウダーが分散している液状組成物。 A liquid composition containing the modified powder obtained by the production method according to any one of claims 2 to 8 and a liquid dispersion medium, in which the modified powder is dispersed.
- テトラフルオロエチレン系ポリマーを含む表層を少なくとも一部有する成形物の前記表層を、水素原子を有する還元性ガスを含む大気圧近傍の雰囲気下にてプラズマ処理する、前記テトラフルオロエチレン系ポリマーに水素原子が導入されて形成された改質層を表面の少なくとも一部に有する改質成形物の製造方法。 The surface layer of a molded product having at least a part of the surface layer containing a tetrafluoroethylene-based polymer is plasma-treated in an atmosphere near atmospheric pressure containing a reducing gas having a hydrogen atom. The tetrafluoroethylene-based polymer has a hydrogen atom. A method for producing a modified molded product having a modified layer formed by introducing a hydrogen atom on at least a part of the surface.
- 前記プラズマ処理を、空気を遮蔽した雰囲気下にて行う、請求項10に記載の製造方法。 The manufacturing method according to claim 10, wherein the plasma treatment is performed in an atmosphere in which air is shielded.
- 前記プラズマ処理を行う前に、予め、前記表層を、還元性ガスを含まない雰囲気下にてプラズマ処理する、請求項10または11に記載の製造方法。 The production method according to claim 10 or 11, wherein the surface layer is plasma-treated in advance in an atmosphere that does not contain a reducing gas before the plasma treatment is performed.
- 前記還元性ガスが、水素ガス、アンモニアガス又は炭化水素ガスである、請求項12に記載の製造方法。 The production method according to claim 12, wherein the reducing gas is hydrogen gas, ammonia gas, or hydrocarbon gas.
- 前記テトラフルオロエチレン系ポリマーが、酸素原子を含む原子団を有する、請求項10から13のいずれか1項に記載の製造方法。 The production method according to any one of claims 10 to 13, wherein the tetrafluoroethylene polymer has an atomic group containing an oxygen atom.
- テトラフルオロエチレン系ポリマーに水素原子が導入されて形成された改質層を表面の少なくとも一部に有し、前記改質層は、X線光電子分光法によって測定される表面から深さ1nmまでの領域における284eVから286eVにあるピークの最大高さが、前記領域における289eVから295eVにあるピークの最大高さに対して0.2倍以上であり、かつ、前記領域におけるフッ素原子の含有割合が55%以下である、テトラフルオロエチレン系ポリマーを含む改質成形物。
It has a modified layer formed by introducing hydrogen atoms into a tetrafluoroethylene polymer on at least a part of the surface, and the modified layer has a depth of 1 nm from the surface measured by X-ray photoelectron spectroscopy. The maximum height of the peak at 284 eV to 286 eV in the region is 0.2 times or more the maximum height of the peak at 289 eV to 295 eV in the region, and the content ratio of fluorine atoms in the region is 55. % Or less, a modified molded product containing a tetrafluoroethylene-based polymer.
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JPH11302387A (en) * | 1998-04-17 | 1999-11-02 | Nitto Denko Corp | Surface modification |
JP2002020514A (en) * | 2000-07-10 | 2002-01-23 | Sekisui Chem Co Ltd | Method for modifying surface of fluororesin |
JP2004323593A (en) * | 2003-04-22 | 2004-11-18 | Toyota Industries Corp | Fluororesin powder and modification method therefor |
JP2016504480A (en) * | 2013-01-28 | 2016-02-12 | コリア ベーシック サイエンス インスティテュート | Method for hydrophilic modification of PTFE surface |
US20160319092A1 (en) * | 2015-04-30 | 2016-11-03 | Vito Nv (Vlaamse Instelling Voor Technologisch Onderzoek Nv) | Plasma assisted hydrophilicity enhancement of polymer materials |
WO2020004339A1 (en) * | 2018-06-27 | 2020-01-02 | Agc株式会社 | Powder dispersion liquid, laminate, film, and impregnated woven fabric |
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