WO2021019823A1

WO2021019823A1 - Transparent electrode member, electrostatic capacitance-type sensor, and input/output device

Info

Publication number: WO2021019823A1
Application number: PCT/JP2020/010987
Authority: WO
Inventors: 知行山井; 高橋　亨
Original assignee: アルプスアルパイン株式会社
Priority date: 2019-07-30
Filing date: 2020-03-13
Publication date: 2021-02-04
Also published as: JP2022133487A

Abstract

A transparent electrode member according to one aspect of the present invention is provided with: an insulative base material having translucent property; a plurality of transparent electrodes that have a translucent property and are disposed on a first surface which is one surface of the base material; and an insulating layer formed between the transparent electrodes. Each of the transparent electrodes is provided with a dispersion layer including a matrix formed from an insulating material and conductive nanowires dispersed in the matrix. The transparent electrode has a conductive region comprising a conductive part and has an optical adjustment region having an optical adjustment part. The conductive part has an electric conductivity higher than that of the optical adjustment part. The dispersion density of the conductive nanowires in the dispersion layer is lower in the optical adjustment part than in the conductive part. The optical adjustment region has a plurality of partial regions disposed at positions corresponding to grid points of grids along the in-plane of the transparent electrode. In a rectangular area formed by defining the corners thereof with four adjacent grid points, among the plurality of grid points, the two diagonal lines of the rectangular area are different in length, and thus, invisibility of the pattern of the transparent electrode can be improved and generation of moire can be suppressed.

Description

Transparent electrode member, capacitive sensor and input / output device

The present invention relates to a transparent electrode member, a capacitance type sensor, and an input / output device.

The capacitance type sensor is provided with a transparent electrode member having a transparent electrode in order to detect the position of the portion in contact with the operating body without deteriorating the visibility of the image displayed on the screen. As the transparent electrode member, a metal oxide-based material such as indium tin oxide (ITO) is generally used.

In recent years, there has been an increasing demand for increasing the flexibility (increasing bending resistance) of a capacitive sensor for the purpose of enhancing the design of a device (for example, a smartphone) equipped with a capacitive sensor. .. In order to meet such demands, a transparent electrode member having a configuration in which conductive nanowires such as silver nanowires are dispersed in a matrix resin has been proposed instead of the conventionally used metal oxide-based material.

In a transparent electrode member having such a configuration, when a patterned portion provided with a transparent electrode and a non-patterned portion (insulating portion) not provided with a transparent electrode are present, the patterned portion and the non-patterned portion are visually visible. Is classified as. Then, when the difference between the reflectance of the patterned portion and the reflectance of the non-patterned portion becomes large, the difference between the patterned portion and the non-patterned portion becomes visually clear. Then, there is a problem that the visibility of the appearance as a display element for displaying an image is lowered.

From the viewpoint of overcoming the problem of deterioration of visibility of appearance, that is, improving the invisibility of the transparent electrode member, Patent Document 1 states that silver nanowires are embedded in an overcoat layer on the surface of a translucent base material. In the translucent conductive member on which the conductive layer is formed, the conductive layer is divided into a conductive region and a non-conductive region having a surface resistance higher than that of the conductive region. At least a part of the silver nanowires embedded in the overcoat layer is iodide, and in the non-conductive region, silver iodide is not exposed from the surface of the overcoat layer, or the non-conductive region The amount of silver iodide exposed on the surface of the overcoat layer in the above is less than the amount of silver nanowires exposed on the surface of the overcoat layer in the conductive region. Members are listed.

Patent Document 2 describes a substrate sheet and a plurality of conductive nanofibers formed on the substrate sheet, which are conductive through the conductive nanofibers and have a size that cannot be visually recognized. A conductive pattern layer having minute pinholes and an insulating pattern layer formed on the substrate sheet where the conductive pattern layer is not formed, containing the conductive nanofibers, and insulated from the conductive pattern layer. The provided conductive nanofiber sheet is disclosed. The insulating pattern layer in the conductive nanofiber sheet described in Patent Document 2 has narrow grooves having a width that cannot be visually recognized, and the narrow grooves are insulated from the conductive pattern layer and a plurality of narrow grooves. It is formed like an island.

Patent Document 3 includes a base material having a surface, transparent conductive portions and transparent insulating portions arranged alternately in a plane on the surface, and the transparent insulating portion is a transparent conductive layer composed of a plurality of island portions. There is a description about a transparent conductive element in which the average boundary line length of the transparent conductive portion and the transparent insulating portion is 20 mm / mm ² or less.

In Patent Document 4, a floating electrode is formed between the conductive nanowire electrodes via an insulating groove, and insulating portions having few conductive nanowires are arranged discretely and in a grid pattern in the conductive nanowire electrode and the floating electrode. Capacitive touch sensors are described. The transparent electrode is provided with a conductive region and an optical adjustment region, and while maintaining the conductivity of the transparent electrode, the reflectance is reduced and the invisibility of the transparent electrode is enhanced.

In Patent Document 5, a floating electrode is formed between the conductive nanowire electrodes via an insulating groove, and the outer shape of the electrode and the outer shape of the floating electrode are formed in a zigzag shape to suppress the occurrence of moire on the pixels of the display device. The electrostatic touch sensor to be used is described.

Patent Document 6 provides an electrostatic touch sensor that prevents the occurrence of moire on the pixels of a display device by randomly providing a plurality of openings in a transparent electrode pattern portion and a plurality of island portions in an adjacent transparent insulating pattern portion. be written.

On the other hand, in a display device to which a capacitive touch sensor is applied,

Patent Documents

7 and 8 describe that the pixels of R (red), G (green), and B (blue) are arranged in a pentile arrangement. There is. In the pentile array, pixels of different colors are alternately arranged in the X direction and the Y direction.

International release WO2015 / 09805 JP-A-2010-157400 Japanese Unexamined Patent Publication No. 2013-152578 International release WO2018 / 101209 JP-A-2017-215965 Japanese Unexamined Patent Publication No. 2012-181816 Japanese Unexamined Patent Publication No. 2019-0964428 JP-A-2019-114526

For transparent electrode members that use conductive nanowires as transparent electrodes, it is important to obtain sufficient invisibility of the pattern. Further, when a capacitive touch sensor using such a transparent electrode member as a transparent electrode is arranged on a display device, moire occurs due to the relationship between the pixel arrangement of the display device and the structure related to the transparent electrode. May be done.

An object of the present invention is to provide a transparent electrode member, a capacitance type sensor, and an input / output device capable of improving the invisibility of a transparent electrode pattern and suppressing the occurrence of moire.

One aspect of the present invention is between a translucent and insulating base material, a plurality of transparent electrodes arranged on a first surface which is one surface of the base material, and having translucency, and a plurality of transparent electrodes. A transparent electrode member including an insulating layer formed on the above, wherein the transparent electrode includes a dispersion layer including a matrix made of an insulating material and conductive nanowires dispersed in the matrix, and the transparent electrode is conductive. It has a conductive region composed of parts and an optical adjustment region having an optical adjustment portion. The conductive portion has higher conductivity than the optical adjustment portion, and the optical adjustment portion has a dispersion density of conductive nanowires in the dispersion layer. Lower than the conductive part, the optical adjustment region has a plurality of partial regions arranged at positions that serve as lattice points of the lattice along the in-plane of the transparent electrode, and four lattices of the plurality of lattice points adjacent to each other. In a rectangular region composed of points as corners, the lengths of the two diagonal lines of the rectangular region are different from each other.

According to such a configuration, the vertical and horizontal pitches in the plurality of partial regions are different from each other, and the occurrence of moire can be suppressed in relation to the arrangement of the structures overlapping the plurality of partial regions.

In the above transparent electrode member, of the two diagonal lines in the rectangular region, the longer one is the first diagonal line, the shorter one is the second diagonal line, the length of the first diagonal line is L1, and the length of the second diagonal line is L2. In this case, L1 / L2 is preferably 1.2 or more and 2.7 or less. As a result, when the arrangement of the structure overlapping the plurality of partial regions is in the positive direction, the difference between the arrangement of the plurality of partial regions and the arrangement of the structures can be made to the extent that the occurrence of moire can be reliably suppressed. it can.

In the above transparent electrode member, the shape of the transparent electrode is preferably a substantially rectangular shape that is not similar to the rectangular region.

In the above transparent electrode member, it is preferable that the insulating layer is provided in a linear shape connecting a plurality of lattice points without overlapping the partial region. As a result, the arrangement of the plurality of partial regions and the extending direction of the insulating layer match the direction of the arrangement of the lattice points, and it becomes difficult to visually distinguish the plurality of partial regions from the insulating layer. , Invisibility can be improved.

In the above transparent electrode member, the insulating layer arranged along the transparent electrode extends along a portion extending along the direction of the lattice line of the lattice and a non-lattice direction different from the direction of the lattice line. May have a portion. As a result, the insulating layer arranged along the transparent electrode can extend in a zigzag pattern, and the invisibility of the insulating layer arranged along the transparent electrode can be enhanced.

In the above transparent electrode member, the transparent electrodes are arranged side by side along the first direction on the substrate, and a plurality of first transparent electrodes electrically connected to each other and a second direction different from the first direction. The two first transparent electrodes, which are arranged side by side along the line and have a plurality of second transparent electrodes electrically connected to each other, and which are adjacent to each other in the first direction, are located between the two first transparent electrodes. The two second transparent electrodes that are located and electrically connected to each other by the first transparent wiring consisting of the conductive region and adjacent to each other in the second direction are electrically connected by the second transparent wiring, and the first transparent wiring and the second transparent electrode are electrically connected to each other. The transparent wiring may have a portion that overlaps with the insulating material.

In the above-mentioned transparent electrode member, the transparent electrodes are arranged side by side on the base material along the first direction of the base material, and are sandwiched between a plurality of first transparent electrodes electrically connected to each other and the base material. A second surface located on the opposite side of the first surface has a plurality of second transparent electrodes arranged side by side along a second direction different from the first direction and electrically connected to each other. The two first transparent electrodes adjacent to each other in the first direction are electrically connected to each other by the first transparent wiring located between the two first transparent electrodes and composed of a conductive region, and the two second transparent electrodes adjacent to each other in the second direction. The two transparent electrodes are electrically connected by the second transparent wiring, and may have a portion where the first transparent wiring and the second transparent wiring overlap when viewed from the normal direction of the first surface.

In the above transparent electrode member, the outer shape of the first transparent electrode and the outer shape of the second transparent electrode are both rectangular, and the two diagonal lines of the rectangle formed by the outer shape of the first transparent electrode and the outer shape of the second transparent electrode are rectangular. It may be provided so as to be aligned on two diagonals of the region.

In the above transparent electrode member, the two diagonal lines of the rectangle formed by the outer shape of the first transparent electrode and the outer shape of the second transparent electrode may have the same length.

In the above transparent electrode member, the two diagonal lines of the rectangle formed by the outer shape of the first transparent electrode and the outer shape of the second transparent electrode may be orthogonal to each other.

In the above transparent electrode member, when viewed from the normal direction of the first surface, a material common to the transparent electrode is surrounded by an insulating layer between the second transparent electrodes arranged adjacent to the first transparent electrode. It has a configured dummy region, and the dummy region may have a plurality of partial regions.

In the above transparent electrode member, the boundary line between the dummy region and the insulating layer may have a portion extending along the arrangement direction of the plurality of partial regions of the dummy region.

In the above transparent electrode member, the insulating layer arranged along the dummy region extends along a portion extending along the direction of the lattice line of the lattice and a non-lattice direction different from the direction of the lattice line. May have a portion. As a result, the insulating layer arranged along the dummy region can extend in a zigzag manner, and the invisibility of the insulating layer arranged along the dummy region can be enhanced.

One aspect of the present invention is a capacitance type sensor including the above-mentioned transparent electrode member and a detection unit for detecting a change in capacitance occurring between an operating body such as an operator's finger and the transparent electrode. is there. In such a capacitance type sensor, the transparency of the transparent electrode is high, and the occurrence of moire is suppressed in relation to the arrangement of the structure overlapping the plurality of partial regions. Therefore, the user can pass through the capacitance type sensor. It is possible to improve the visibility of the image observed in the image, and it is also possible to improve the display uniformity.

One aspect of the present invention is an input / output device including the above-mentioned capacitance type sensor and a display device overlapping the capacitance type sensor. In such an input / output device, the transparency of the transparent electrode is high, and the occurrence of moire is suppressed in relation to the arrangement of the pixels of the display device that overlaps with a plurality of partial regions. It is possible to improve the visibility of the image observed in the image, and it is also possible to improve the display uniformity.

In the above input / output device, a plurality of pixels of the display device are arranged in a pentile, and the ratio of the length of the major axis to the length of the minor axis in the diagonal of the rectangle formed by the unit cell of the pentile arrangement is the length in the diagonal of the rectangular region. It is preferably different from the ratio of the shaft length to the minor shaft length. As a result, when the arrangement of a plurality of pixels of the display device is a pentile arrangement, it is possible to suppress the occurrence of moire when the capacitive sensors are stacked and improve the visibility of the image more stably. Become.

According to the present invention, it is possible to provide a transparent electrode member, a capacitance type sensor, and an input / output device capable of improving the invisibility of the transparent electrode pattern and suppressing the occurrence of moire.

It is a top view which conceptually shows the structure of the transparent electrode member which concerns on one Embodiment of this invention. It is a cross-sectional view of V1-V1 of FIG. It is a partial cross-sectional view which conceptually shows an example of the concrete structure of the transparent electrode of the transparent electrode member which concerns on one Embodiment of this invention. It is a partial cross-sectional view which conceptually shows another example of the concrete structure of the transparent electrode of the transparent electrode member which concerns on one Embodiment of this invention. It is a top view which shows the capacitance type sensor which concerns on this embodiment. It is an enlarged plan view of the region A1 shown in FIG. It is sectional drawing of the cut surface C1-C1 shown in FIG. It is sectional drawing of the cut surface C2-C2 shown in FIG. It is a top view which illustrates the transparent electrode member which concerns on one Embodiment of this invention. It is an enlarged plan view which shows a part of the detection area of the transparent electrode member of this embodiment. (A) and (b) are plan views illustrating the rectangular region of the transparent electrode member of this embodiment. It is a top view which exemplifies the pixel arrangement of a display device. It is a top view which illustrates the transparent electrode member which concerns on a comparative example (the 1). (A) and (b) are plan views illustrating the rectangular region of the transparent electrode member according to Comparative Example (No. 1). It is a top view which illustrates the transparent electrode member which concerns on a comparative example (the 2). (A) and (b) are plan views illustrating the rectangular region of the transparent electrode member according to Comparative Example (Part 2). It is a figure explaining the structure of the capacitance type sensor which concerns on other embodiment of this invention. It is a figure explaining the structure of the capacitance type sensor which concerns on another embodiment of this invention. It is a figure explaining the structure of the input / output device which concerns on another embodiment of this invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In each drawing, similar components are designated by the same reference numerals and detailed description thereof will be omitted as appropriate.

FIG. 1 is a plan view conceptually showing the structure of the transparent electrode member according to the embodiment of the present invention. FIG. 2 is a sectional view taken along line V1-V1 of FIG. FIG. 3 is a partial cross-sectional view conceptually showing an example of a specific structure of the transparent electrode of the transparent electrode member according to the embodiment of the present invention. FIG. 4 is a partial cross-sectional view conceptually showing another specific example of the specific structure of the transparent electrode of the transparent electrode member according to the embodiment of the present invention.

As shown in FIGS. 1 and 2, the transparent electrode member 100 according to the embodiment of the present invention includes a translucent insulating base material 101. As used herein, the terms "transparent" and "translucent" refer to a state in which the visible light transmittance is 50% or more (preferably 80% or more). Further, the haze value is preferably 6% or less. As used herein, the terms "light-shielding" and "light-shielding property" refer to a state in which the visible light transmittance is less than 50% (preferably less than 20%). The base material 101 is formed of a film-like transparent base material such as polyethylene terephthalate (PET) or cyclic polyolefin (COP, COC), a glass base material, or the like.

The transparent electrode member 100 includes a transparent electrode 110 having translucency and an insulating layer 102 arranged on the first surface S1 which is one surface of the base material 101.

The insulating layer 102 is arranged in the insulating region IR located at least a part around the region where the transparent electrode 110 is arranged when viewed from the normal direction of the first surface S1.

As shown in FIGS. 3 and 4, the transparent electrode 110 includes a dispersion layer DL including a matrix MX made of an insulating material and conductive nanowires NW dispersed in the matrix MX. Specific examples of the insulating material constituting the matrix MX include polyester resin, acrylic resin, polyurethane resin and the like. As the conductive nanowire NW, at least one selected from the group consisting of gold nanowires, silver nanowires, and copper nanowires is used. The dispersibility of the conductive nanowires NW is ensured by the matrix MX. By contacting the plurality of conductive nanowires NW with each other at least in part, the in-plane conductivity of the transparent electrode 110 is maintained.

As shown in FIGS. 1 and 2, the transparent electrode 110 has a region (conductive region) CR composed of a conductive portion 111 and a region (optical) having an optical adjusting portion 112 when viewed from the normal direction of the first surface S1. Adjustment area) AR and. The conductive portion 111 has higher conductivity than the optical adjusting portion 112, and the optical adjusting portion 112 has a lower dispersion density of the conductive nanowires NW in the dispersion layer DL than the conductive portion 111.

In such a structure, in the dispersion layer DL included in the transparent electrode 110, the conductive nanowires NW are dispersed and connected to each other in the matrix MX, so that the conductive nanowires NW are dispersed in the matrix MX and connected to each other, so that the conductive nanowires NW are compared with other transparent conductive materials, particularly oxide-based conductive materials. , High conductivity can be achieved. On the other hand, since the conductive nanowire NW itself does not have translucency, the reflectance of the transparent electrode 110 tends to be high due to the high dispersion density of the conductive nanowire NW in the dispersion layer DL. That is, in the transparent electrode 110 provided with the dispersion layer DL, the dispersion density of the conductive nanowire NW affects both the conductivity and the reflectance, so that there is a trade-off between increasing the conductivity and decreasing the reflectance. There is a relationship of. Therefore, the transparent electrode 110 is configured to have a conductive region CR having a relatively high conductivity and an optical adjustment region AR having a relatively low reflectance, while maintaining the conductivity of the transparent electrode 110. It is realized that the reflectance is reduced and the invisibility of the transparent electrode 110 is increased.

Further, as compared with the case where the transparent electrode has a through hole as described in Patent Document 2 and Patent Document 3, the optical adjustment region AR does not significantly change the optical characteristics (for example, the refractive index) other than the reflectance. The reflectance of the can be made lower than the reflectance of the conductive region CR. Therefore, for example, when there is an image that is visually recognized through the transparent electrode member 100, the display uniformity of the image can be improved. Further, if the configuration of the optical adjustment region AR is appropriately controlled, it is possible to increase the conductivity of the optical adjustment region AR as compared with the through hole provided in the transparent electrode 110. In this case, it is possible to increase the conductivity of the transparent electrode 110 as a whole, and it is also possible to increase the area ratio of the optical adjustment region AR in the transparent electrode 110. Therefore, by providing the optical adjustment region AR, it is possible to increase the conductivity and the invisibility of the transparent electrode 110 at a higher level than when the through hole is provided.

Here, the reflectance of the insulating region IR is preferably lower than the reflectance of the conductive region CR. In this case, by having the optical adjustment region AR, the difference in reflectance between the transparent electrode 110 in which the overall reflectance is lowered and the insulating region IR is smaller than in the case where the optical adjustment region 112 is not provided. Therefore, the boundary between the transparent electrode 110 and the insulating region IR becomes difficult to see, and the invisibility of the transparent electrode 110 can be enhanced.

Further, it is preferable that the insulating layer 102 arranged in the insulating region IR contains the matrix MX which is one of the components of the dispersion layer DL. In this case, due to the common inclusion of the matrix MX, the optical characteristics (for example, the refractive index) other than the reflectance of the optical adjustment unit 112 and the optical characteristics of the insulating layer 102 are approximated. Therefore, for example, when there is an image that is visually recognized through the transparent electrode member 100, the display uniformity of the image is likely to be improved, and the invisibility of the transparent electrode 110 can be improved more stably.

In the transparent electrode member 100, the dispersion density of the conductive nanowires NW may be reduced to the extent that the dispersion layer DL of the optical adjustment unit 112 exhibits insulating properties. FIG. 3 is a specific example of such a configuration (first configuration), in which the conductive nanowire NW is substantially not present in the dispersion layer DL of the optical adjustment unit 112, and the dispersion layer DL is composed of the matrix MX. In this case, since the conductive nanowire NW, which is a member for increasing the reflectance, is substantially not present, the reflectance of the optical adjusting unit 112 is particularly low. Here, as shown in FIG. 3, the insulating layer 102 arranged in the insulating region IR of the transparent electrode member 100 is composed of the matrix MX, similarly to the dispersion layer DL of the optical adjusting unit 112. In this case, the transparent electrode member 100 has a structure in which the members arranged in the low reflectance region (insulation region IR and optical adjustment region AR) located around the conductive region CR are made of a common material (matrix MX). It becomes. When such a configuration is provided, the reflectance of the entire transparent electrode 110 is particularly low, and the invisibility of the transparent electrode 110 is more stably improved.

Note that FIG. 3 shows a case where the insulating layer 102 and the optical adjusting unit 112 are composed of the matrix MX without substantially the conductive nanowire NW, but the present invention is not limited to this. For both the insulating layer 102 and the optical adjusting unit 112, if the conductivity of this portion is appropriately lowered to become non-conductive and the insulating function can be exhibited, the conductive nanowire NW or a substance based on the conductive nanowire NW can be used. It may still be dispersed in the matrix MX. The same applies to the structure of the insulating layer 102 shown in FIG. 4 described below.

In the transparent electrode member 100, the optical adjustment unit 112 may have higher conductivity than the insulating layer 102. FIG. 4 is a specific example of such a configuration (second configuration), in which the dispersion layer DL of the optical adjustment unit 112 is a conductive nanowire NW on the side distal to the base material 101 (the side facing the user). The dispersion density is low, and the dispersion density of the conductive nanowires NW is high on the side proximal to the base material 101 (the side facing the base material 101). Of the conductive nanowires NW dispersed in the dispersion layer DL, the exposed conductive nanowire NW is most easily visible, and when the dispersion layer DL of the optical adjustment unit 112 has the structure shown in FIG. The visibility of the optical adjustment unit 112 can be appropriately reduced. Moreover, the conductive nanowires NW located on the side proximal to the base material 101 can secure a certain degree of conductivity, although it is lower than the dispersion layer DL of the conductive portion 111. Therefore, when the dispersion layer DL of the optical adjustment unit 112 has the structure shown in FIG. 4, the conductivity of the entire transparent electrode 110 can be increased. Further, in this case, the difference between the dispersion density of the conductive nanowire NW in the dispersion layer DL of the optical adjustment unit 112 and the dispersion density of the conductive nanowire NW in the dispersion layer DL of the conductive unit 111 is relatively small, so that the transparent electrode In 110, the pattern formed by the optical adjusting unit 112 and the conductive unit 111 becomes difficult to see.

Note that FIG. 4 shows a case where the optical adjustment unit 112 changes the dispersion density of the conductive nanowires NW along the normal direction of the first surface S1, but is not limited to this. For both the insulating layer 102 and the optical adjusting unit 112, if the conductivity of this portion is appropriately lowered to become non-conductive and the insulating function can be exhibited, the conductive nanowire NW or a substance based on the conductive nanowire NW can be used. It may still be dispersed in the matrix MX.

As shown in FIG. 1, in the transparent electrode member 100, the optical adjustment region AR is located in the conductive region CR. In the case of such a configuration, the optical adjustment region AR does not have a portion that directly contacts the insulation region IR. Therefore, the conductive region CR makes it possible to appropriately form a conductive path in the transparent electrode 110, and it is possible to suppress a decrease in the conductivity of the transparent electrode 110. If the optical adjustment region AR has a portion that is in direct contact with the insulating region IR, the conductive path formed in the transparent electrode 110 may meander, and in this case, the conductivity of the transparent electrode 110 is lowered. It ends up. Further, as will be described later, invisibility may be reduced by having a portion where the optical adjustment region AR is connected to the insulation region IR.

In the transparent electrode member 100, the area ratio (adjustment rate) of the optical adjustment region AR may be preferably 10% or more and 40% or less. In the optical adjusting unit 112, the conductivity tends to be relatively lowered as a trade-off with lowering the reflectance. In the transparent electrode member 100 according to the embodiment of the present invention, the adjustment rate may be preferably 10% or more from the viewpoint of stably reducing the reflectance of the transparent electrode 110, and may be 15% or more. It may be more preferable. On the other hand, even if the adjustment rate is increased to about 40% to improve the invisibility of the transparent electrode 110, the conductivity required for the transparent electrode 110 may be secured, and the adjustment rate should be 35% or less. May be preferable from the viewpoint of increasing conductivity while ensuring excellent invisibility.

In the transparent electrode 110 according to the embodiment of the present invention, the optical adjustment region AR has a plurality of partial regions discretely located in the conductive region CR. When the optical adjustment region AR and the conductive region CR, which have relatively different translucency, form a large pattern with each other, there is a concern that the visibility of the pattern may be improved depending on the pattern shape. .. Further, since the optical adjusting unit 112 is a region having relatively low conductivity, if it is collectively located in the transparent electrode 110, a conductive path meandering in the transparent electrode 110 may be formed. In this case, the conductivity of the transparent electrode 110 is reduced. Therefore, as described above, by arranging the partial regions (that is, the optical adjustment region AR) composed of the optical adjustment portion 112 having relatively low conductivity discretely in the conductive region CR, it is visually recognized in the transparent electrode 110. It is suppressed that an easy pattern is formed and the conductivity is substantially lowered. Further, as will be described later, when a plurality of transparent electrodes 110 are arranged via the insulating region IR, the reflectance of the insulating region IR located between the plurality of transparent electrodes 110 is the conductive portion 111 of the transparent electrode 110. The visibility of the insulating region IR may be improved due to the difference from the reflectance of. Even in such a case, since the optical adjustment region AR is discretely arranged in the conductive region CR of the transparent electrode 110, the transparent electrode 110 is in a state where at least a part is surrounded by the insulating region IR. Invisibility can be improved.

It may be preferable that the partial regions constituting the optical adjustment region AR are separated from each other by 30 μm or more. Since this separation distance sd is the width of the conductive region CR located between the discretely arranged optical adjustment portions 112, it is the width of each conductive path in the transparent electrode 110. Therefore, when the separation distance sd is 30 μm or more, the decrease in conductivity of the transparent electrode 110 is stably suppressed.

When the optical adjustment region AR is arranged discretely, the shape of each of the plurality of partial regions (optical adjustment region AR) is a circle, and the diameter of the circle may be 10 μm or more and 100 μm or less. From the viewpoint of more stably improving the invisibility of the transparent electrode 110, it is preferable that the shape of the plurality of partial regions (optical adjustment region AR) is uniform within the transparent electrode 110. When the shape of this partial region (optical adjustment region AR) is a circle and the diameter thereof is within the above range, the distance between the plurality of partial regions (optical adjustment region AR) while setting the adjustment ratio to 40% or less. It can be easily realized that the distance is 30 μm or more.

The shape of each of the above-mentioned plurality of partial regions (optical adjustment region AR) may be a quadrangle instead of a circle. In this case, the length of the longest diagonal line among the diagonal lines of the quadrangle is preferably 10 μm or more and 100 μm or less for the same reason as the above-mentioned reason for the diameter of the circle.

As shown in FIG. 1, when a plurality of partial regions (optical adjustment region AR) are arranged over the entire transparent electrode 110, the reflectance of the transparent electrode 110 as a whole is unlikely to vary. Invisibility is easily improved, which is preferable.

FIG. 5 is a plan view showing a capacitance type sensor according to the present embodiment. FIG. 6 is an enlarged plan view of the region A1 shown in FIG. FIG. 7 is a cross-sectional view of the cut surfaces C1-C1 shown in FIG. FIG. 8 is a cross-sectional view of the cut surfaces C2-C2 shown in FIG. Since the transparent electrode is transparent, it cannot be visually recognized originally, but FIGS. 5 and 6 show the outer shape of the transparent electrode for easy understanding.

As shown in FIGS. 5 to 8, the capacitance type sensor 1 according to the present embodiment constitutes the base material 2, the first transparent electrode 4, the second transparent electrode 5, and the second transparent wiring. It includes a bridge wiring unit 10, a panel 3, a detection unit, and a control unit (neither of which is shown). The panel 3 is provided on the side opposite to the base material 2 when viewed from the bridge wiring portion 10. An optical transparent adhesive layer (OCA; Optical Clear Adhesive) 30 is provided between the base material 2 and the panel 3. An insulating portion 20 made of an insulating material is provided between the base material 2 and the bridge wiring portion 10. As shown in FIG. 7, in the portion where the bridge wiring portion 10 is provided, the optical transparent adhesive layer 30 is provided between the bridge wiring portion 10 and the panel 3.

The base material 2 has translucency and is formed of a film-like transparent base material such as polyethylene terephthalate (PET), a glass base material, or the like. A first transparent electrode 4 and a second transparent electrode 5 are provided on the first surface S1 which is one main surface of the base material 2. The details will be described later. As shown in FIG. 7, the panel 3 is provided on the side opposite to the base material 2 when viewed from the bridge wiring portion 10, and has translucency. An operating body such as an operator's finger is brought into contact with or close to the panel 3 side to operate the transparent electrode member. The material of the panel 3 is not particularly limited, but a glass base material or a plastic base material is preferably applied as the material of the panel 3. The panel 3 is bonded to the base material 2 via an optically transparent adhesive layer 30 provided between the base material 2 and the panel 3. The optical transparent adhesive layer 30 is made of an acrylic adhesive, a double-sided adhesive tape, or the like.

As shown in FIG. 5, the capacitance type sensor 1 does not detect the detection region 11 when viewed from the direction along the normal of the surface on the panel 3 side (Z1-Z2 direction: see FIGS. 7 and 8). It consists of an area 25. The detection area 11 is an area that can be operated by an operating body such as a finger, and the non-detection area 25 is a frame-shaped area located on the outer peripheral side of the detection area 11. The non-detection region 25 is shielded by a decorative layer (not shown), and the light (external light is exemplified) from the surface on the panel 3 side to the surface on the base material 2 side in the capacitance type sensor 1 and the base material 2 Light from the side surface to the surface on the panel 3 side (light from the backlight of the display device used in combination with the capacitive sensor 1 is exemplified) is less likely to pass through the non-detection region 25. ing.

As shown in FIG. 5, the capacitance type sensor 1 has a configuration in which the first electrode connecting body 8 and the second electrode connecting body 12 are provided on one main surface (first surface S1) of the base material 2. The transparent electrode member 400 is provided. The first electrode connector 8 is arranged in the detection region 11 and has a plurality of first transparent electrodes 4. As shown in FIGS. 7 and 8, the plurality of first transparent electrodes 4 are formed on the first surface S1 of the base material 2 located on the Z1 side of the main surfaces whose normals are the directions along the Z1-Z2 directions. It is provided. Each first transparent electrode 4 is connected in the Y1-Y2 direction (first direction) via an elongated connecting portion 7. Then, the first electrode connecting body 8 having a plurality of first transparent electrodes 4 connected in the Y1-Y2 direction is arranged at intervals in the X1-X2 direction. The connecting portion 7 constitutes the first transparent wiring and is integrally formed with the first transparent electrode 4. The connecting portion 7 electrically connects two adjacent first transparent electrodes 4 to each other. An insulating region IR (insulating layer 21) is provided around the first electrode connecting body 8 and the second electrode connecting body 12.

The first transparent electrode 4 and the connecting portion 7 have translucency and are formed of a material containing conductive nanowires. By using a material containing conductive nanowires, it is possible to achieve high translucency and low electrical resistance of the first transparent electrode 4. Further, by using a material containing conductive nanowires, the deformation performance of the capacitance type sensor 1 can be improved.

As shown in FIGS. 6 and 8, the first transparent electrode 4 has a plurality of first optical adjustment regions 41. The structure of the plurality of first optical adjustment regions 41 is equal to the above-mentioned optical adjustment region AR. The plurality of first optical adjustment regions 41 are arranged apart from each other in the first transparent electrode 4, but are not provided in the non-adjustment region NR located around the connecting portion 7 in the first transparent electrode 4. , Is not provided in the connecting portion 7 connected to the first transparent electrode 4. The distance (first distance) D1 between the plurality of adjacent first optical adjustment regions 41 is constant and is 30 μm or more. In the example shown in FIG. 6, the shape of the first optical adjustment region 41 is a circle. The diameter D11 of the circle of the first optical adjustment region 41 is 10 μm or more and 100 μm or less.

The second electrode connector 12 is arranged in the detection region 11 and has a plurality of second transparent electrodes 5. As shown in FIGS. 7 and 8, the plurality of second transparent electrodes 5 are provided on the first surface S1 of the base material 2. As described above, the second transparent electrode 5 is provided on the same surface as the first transparent electrode 4 (first surface S1 of the base material 2). Each second transparent electrode 5 is connected in the X1-X2 direction (second direction) via an elongated bridge wiring portion 10. Then, as shown in FIG. 5, the second electrode connecting bodies 12 having the plurality of second transparent electrodes 5 connected in the X1-X2 direction are arranged at intervals in the Y1-Y2 direction. The bridge wiring portion 10 is formed as a separate body from the second transparent electrode 5. The X1-X2 direction intersects the Y1-Y2 direction. For example, the X1-X2 direction intersects the Y1-Y2 direction perpendicularly.

The second transparent electrode 5 has translucency and is formed of a material containing conductive nanowires. The conductive nanowires are as described above with respect to the material of the first transparent electrode 4.

As shown in FIGS. 6 and 7, the second transparent electrode 5 has a plurality of second optical adjustment regions 51. The structure of the plurality of second optical adjustment regions 51 is equal to the above-mentioned optical adjustment region AR. The plurality of second optical adjustment regions 51 are arranged apart from each other in the second transparent electrode 5, but are not provided in the region overlapping the bridge wiring portion 10 and the non-adjustment region NR. The distance (second distance) D2 between the plurality of adjacent second optical adjustment regions 51 is constant and is 30 μm or more. In the example shown in FIG. 6, the shape of the second optical adjustment region 51 is a circle. The diameter D12 of the circle of the second optical adjustment region 51 is 10 μm or more and 100 μm or less.

The bridge wiring portion 10 is formed of a material containing an oxide-based material having translucency and conductivity. Oxide-based materials having translucency and conductivity include ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), GZO (Gallium-doped Zinc Oxide), AZO (Aluminum-doped Zinc Oxide) and FTO (Fluorine). -At least one selected from the group consisting of doped Tin Oxide) is used.

Alternatively, the bridge wiring portion 10 may have a first layer containing an oxide-based material such as ITO, and a second layer made of a transparent metal having a lower resistance than the first layer. Further, the bridge wiring portion 10 may further have a third layer containing an oxide-based material such as ITO. When the bridge wiring portion 10 has a laminated structure of the first layer and the second layer, or a laminated structure of the first layer, the second layer, and the third layer, the bridge wiring portion 10 and the first transparent electrode 4 It is desirable to have etching selectivity between the and the second transparent electrode 5.

As shown in FIGS. 6 to 8, an insulating portion 20 is provided on the surface of the connecting portion 7 that connects the first transparent electrodes 4 to each other. As shown in FIG. 7, the insulating portion 20 fills the space between the connecting portion 7 and the second transparent electrode 5, and slightly rides on the surface of the second transparent electrode 5. As the insulating portion 20, for example, a novolak resin (resist) is used.

As shown in FIGS. 7 and 8, the bridge wiring portion 10 is provided from the surface 20a of the insulating portion 20 to the surface of each second transparent electrode 5 located on both sides of the insulating portion 20 in the X1-X2 direction. The bridge wiring unit 10 electrically connects two adjacent second transparent electrodes 5 to each other.

As shown in FIGS. 7 and 8, a bridge wiring portion 10 for connecting between the second transparent electrodes 5 is provided on the surface of the insulating portion 20 provided on the surface of the connecting portion 7. In this way, the insulating portion 20 is interposed between the connecting portion 7 and the bridge wiring portion 10, and the first transparent electrode 4 and the second transparent electrode 5 are electrically insulated from each other. In the present embodiment, since the first transparent electrode 4 and the second transparent electrode 5 are provided on the same surface (first surface S1 of the base material 2), the capacitance type sensor 1 can be made thinner.

As shown in FIG. 6, the first transparent electrode 4 and the second transparent electrode 5 are arranged side by side on the first surface S1 of the base material 2 in an adjacent state. The first transparent electrode 4 and the second transparent electrode 5 correspond to the transparent electrode 110 in FIG. An insulating layer 21 is provided between the first transparent electrode 4 and the second transparent electrode 5. The insulating layer 21 corresponds to the insulating region IR in FIGS. 1 and 5. As a result, the first transparent electrode 4 and the second transparent electrode 5 are electrically insulated from each other. The width D3 of the insulating layer 21 is, for example, about 10 μm or more and 20 μm or less.

The connecting portion 7 shown in FIGS. 6 to 8 is integrally formed with the first transparent electrode 4 and extends in the Y1-Y2 direction. Further, the bridge wiring portion 10 shown in FIGS. 6 to 8 is formed on the surface 20a of the insulating portion 20 covering the connecting portion 7 as a separate body from the second transparent electrode 5, and extends in the X1-X2 direction. However, the arrangement form of the connecting portion 7 and the bridge wiring portion 10 is not limited to this. For example, the connecting portion 7 may be integrally formed with the second transparent electrode 5 and extend in the X1-X2 direction. In this case, the connecting portion 7 electrically connects two adjacent second transparent electrodes 5 to each other. The bridge wiring portion 10 may be formed on the surface 20a of the insulating portion 20 covering the connecting portion 7 as a separate body from the first transparent electrode 4, and may extend in the Y1-Y2 direction. In this case, the bridge wiring unit 10 electrically connects two adjacent first transparent electrodes 4 to each other. In the description of the capacitance type sensor 1 according to the present embodiment, the bridge wiring portion 10 is formed on the surface 20a of the insulating portion 20 covering the connecting portion 7 as a separate body from the second transparent electrode 5, and is formed in the X1-X2 direction. Take the case where it extends to.

As shown in FIG. 5, in the non-detection region 25, a plurality of wiring portions 6 drawn out from each first electrode connecting body 8 and each second electrode connecting body 12 are formed. Each of the first electrode connecting body 8 and the second electrode connecting body 12 is electrically connected to the wiring portion 6 via the connecting wiring 16. Each wiring unit 6 is connected to an external connection unit 27 that is electrically connected to a flexible printed circuit board (not shown). That is, each wiring portion 6 electrically connects the first electrode connecting body 8 and the second electrode connecting body 12 and the external connecting portion 27. The external connection portion 27 is electrically connected to a flexible printed substrate (not shown) via a material having a metal such as a conductive paste, Cu, Cu alloy, CuNi alloy, Ni, Ag, or Au.

Then, in the printed wiring board (not shown) connected to the flexible printed circuit board, the capacitance generated between the operating body and the transparent electrodes (mainly the first transparent electrode 4 and the second transparent electrode 5) is generated. It is equipped with a detection unit (not shown) that detects changes in the above and a control unit that calculates the position of the operating body based on the signal from the detection unit. Although detailed description will not be given, integrated circuits are used in the detection unit and the control unit.

Each wiring portion 6 is formed of a material having a metal such as Cu, Cu alloy, CuNi alloy, Ni, Ag, and Au. The connection wiring 16 is formed of a transparent conductive material such as ITO or metal nanowires, and extends from the detection region 11 to the non-detection region 25. The wiring portion 6 is laminated on the connection wiring 16 in the non-detection region 25 and is electrically connected to the connection wiring 16. Further, the dispersion layer DL having the same metal nanowires as the first transparent electrode 4 and the second transparent electrode 5 (specific example is silver nanowires) extends continuously to the non-detection region 25 to form the connection wiring 16. However, the non-detection region 25 may have a laminated wiring structure in which the connection wiring 16 and the metal layer constituting the wiring portion 6 are laminated. The connection wiring 16 made of the dispersion layer DL having the metal nanowires may further extend to form at least a part of the wiring portion 6. In this case, the wiring portion 6 may have a laminated structure of the dispersed layer DL and the metal-based material.

The wiring portion 6 is provided in a portion located in the non-detection region 25 on the first surface S1 of the base material 2. The external connection portion 27 is also provided in a portion located in the non-detection region 25 on the first surface S1 of the base material 2, similarly to the wiring portion 6.

In FIG. 5, the wiring portion 6 and the external connection portion 27 are displayed so as to be visually recognized for easy understanding, but in reality, the portion located in the non-detection region 25 has a light-shielding property. A decorative layer (not shown) is provided. Therefore, when the capacitance type sensor 1 is viewed from the surface on the panel 3 side, the wiring portion 6 and the external connection portion 27 are hidden by the decorative layer and are not visible. The material constituting the decorative layer is arbitrary as long as it has a light-shielding property. The decorative layer may have an insulating property.

In the capacitance type sensor 1 according to the present embodiment, when a finger is brought into contact with the surface 3a of the panel 3, for example, as an example of the operating body shown in FIG. 7, between the finger and the first transparent electrode 4 close to the finger, And a capacitance is generated between the finger and the second transparent electrode 5 close to the finger. The capacitance type sensor 1 can detect the change in capacitance at this time by the detection unit, and can calculate the contact position of the finger by the control unit based on the change in capacitance. That is, the capacitance type sensor 1 detects the X coordinate of the position of the finger based on the change in capacitance between the finger and the first electrode connector 8, and between the finger and the second electrode connector 12. The Y coordinate of the finger position is detected based on the change in capacitance of (self-capacitance detection type).

Alternatively, the capacitance type sensor 1 may be a mutual capacitance detection type. That is, the capacitance type sensor 1 applies a driving voltage to a row of one of the electrodes of the first electrode connecting body 8 and the second electrode connecting body 12 (for example, the first electrode connecting body 8), and applies a driving voltage to the first electrode. The change in capacitance between the connector 8 and the second electrode of the second electrode connector 12 (for example, the second electrode connector 12) and the finger may be detected. In this case, the capacitance type sensor 1 detects the X coordinate of the position of the finger depending on which change in capacitance is detected when a voltage is applied to the first electrode connector 8, and whichever The Y coordinate of the finger position is detected depending on whether the capacitance of the second electrode connector 12 has changed.

Here, in the capacitance type sensor according to the prior art, the difference between the reflectance of the transparent electrode having the conductive portion including the conductive nanowire and the reflectance of the insulating portion including the gap between the adjacent transparent electrodes is As the size increases, the difference between the conductive portion and the insulating portion becomes visually apparent. Then, the transparent electrode becomes easily visible as a pattern. When the capacitance type sensor is provided with an antireflection layer or an antireflection layer, the difference between the reflectance of the conductive portion and the reflectance of the insulating portion can be suppressed, while the antireflection layer and the reflection reduction can be suppressed. It is necessary to add equipment for forming layers, and the manufacturing process of the capacitance type sensor is increased.

On the other hand, in the capacitance type sensor 1 according to the present embodiment, the first transparent electrode 4 has a plurality of first optical adjustment regions 41 arranged apart from each other. Further, the second transparent electrode 5 has a plurality of second optical adjustment regions 51 arranged apart from each other. Therefore, among the first transparent electrode 4 and the second transparent electrode 5, a plurality of conductive region CRs including conductive nanowires, a plurality of first optical adjustment regions 41, and a plurality of second optical adjustment regions 51 are formed. Region (optical adjustment region AR) and. Therefore, in the first transparent electrode 4 and the second transparent electrode 5, there are a plurality of boundaries (internal boundaries) between the conductive region CR and the optical adjustment region AR. On the other hand, there is a boundary (external boundary) between the first transparent electrode 4 and the insulating layer 21 and a boundary (external boundary) between the second transparent electrode and the insulating layer 21. Since the non-adjustable region NR described above is composed of the conductive region CR, the non-adjustable region NR does not have an internal region (boundary between the conductive region CR and the optical adjustment region AR) and is an external region (first transparent region). Only the boundary between the electrode 4 or the second transparent electrode 5 and the insulating layer 21) is present.

In this way, in the plan view of the capacitance type sensor 1, both the internal boundary and the external boundary are visually recognized, so that it is suppressed that only the external boundary is emphasized, and the first transparent electrode 4 and the second transparent electrode are suppressed. 5 becomes difficult to be visually recognized as a pattern. Thereby, the invisibility of the pattern of the first transparent electrode 4 and the second transparent electrode 5 can be improved.

Further, the first optical adjustment region 41 is provided in a region other than the non-adjustable region NR of the first transparent electrode 4, and the second optical adjustment region 51 is provided in a region other than the non-adjustable region NR of the second transparent electrode 5. Has been done. According to this, it is possible to prevent the electric resistance of the first transparent electrode 4 and the second transparent electrode 5 from becoming excessively low due to the provision of the first optical adjustment region 41 and the second optical adjustment region 51. Further, it is possible to prevent the first optical adjustment region 41 and the second optical adjustment region 51 from being concentrated so that the first transparent electrode 4 and the second transparent electrode 5 are easily recognized as a pattern.

Further, the first distance between the plurality of adjacent first optical adjustment regions 41 is constant, and the second distance between the plurality of adjacent second optical adjustment regions 51 is constant. That is, the plurality of first optical adjustment regions 41 are uniformly provided in regions other than the non-adjustment region NR of the first transparent electrode 4.

Further, the conductive nanowires contained in the materials of the first transparent electrode 4 and the second transparent electrode 5 are at least one selected from the group consisting of gold nanowires, silver nanowires, and copper nanowires. According to this, the first transparent electrode 4 having the first optical adjustment region 41 is compared with the case where an oxide-based material such as ITO is used as the material of the first transparent electrode 4 and the second transparent electrode 5. And the electrical resistance of the second transparent electrode 5 having the second optical adjustment region 51 can be lowered.

FIG. 9 is a plan view illustrating a transparent electrode member according to an embodiment of the present invention. FIG. 9 is an enlarged plan view of a region corresponding to the region A1 shown in FIG. In FIG. 9, regarding the two first transparent electrodes arranged in the Y1-Y2 direction, the first transparent electrode on the Y1 side in the Y1-Y2 direction is the first transparent electrode 4B1, and the first transparent electrode on the Y2 direction in the Y1-Y2 direction is the first transparent electrode. It is shown as a transparent electrode 4B2.
FIG. 10 is an enlarged plan view showing a part of the detection region of the transparent electrode member of the present embodiment. FIG. 10 is an enlarged plan view of a region corresponding to the region A3 shown in FIG.

The first transparent electrodes 4B1 and 4B2 of this example have a plurality of substantially circular first optical adjustment regions 41B, and the second transparent electrodes 5B1 and 5B2 have a plurality of substantially circular second optical adjustment regions 51B. It is common to the example shown in FIG. 6 in that the insulating layer 21 is provided between the transparent electrodes 4B1 and 4B2 and the second transparent electrodes 5B1 and 5B2. The insulating portion 20 and the bridge wiring portion 10 are not shown for convenience of explanation.

The connecting portion 7 is located between the first transparent electrode 4B1 and the first transparent electrode 4B2 in the Y1-Y2 direction (first direction), and electrically connects the first transparent electrode 4B1 and the first transparent electrode 4B2. It is a transparent wiring (first transparent wiring) to be connected. Specifically, as shown in FIG. 9, the first transparent electrode 4B1 is located on the Y1 side of the connecting portion 7 in the Y1-Y2 direction (first direction), and the connecting portion 7 is located in the Y1-Y2 direction (first direction). Direction) The first transparent electrode 4B2 is located on the Y2 side.

When viewed from the Z1-Z2 direction (normal direction of the first surface S1), the first transparent electrode 4B1 and the connecting portion 7 are continuous bodies that are in contact with each other at the first boundary line DL1, and are connected to the first transparent electrode 4B2. Reference numeral 7 is a continuum tangent at the second boundary line DL2. Although not shown, when viewed from the Z1-Z2 direction (normal direction of the first surface S1), the first transparent electrode 4B1 is continuously in contact with the Y1-Y2 direction (first direction) Y1 side by the second boundary line DL2. A connecting portion 7 is further provided as a body. Further, when viewed from the Z1-Z2 direction (normal direction of the first surface S1), the first transparent electrode 4B2 is in contact with the Y1-Y2 direction (first direction) Y2 side by the first boundary line DL1 as a continuum. A connecting portion 7 is further provided. In this way, the plurality of first transparent electrodes 4B1 and 4B2 are electrically connected by the plurality of connecting portions 7, and the first electrode connecting body 8 extending in the Y1-Y2 direction (first direction) is formed.

The adjacent first transparent electrodes 4B1 and 4B2 and the second transparent electrodes 5B1 and 5B2 were electrically insulated from both the first transparent electrodes 4B1 and 4B2 and the second transparent electrodes 5B1 and 5B2 by the insulating layer 21. A dummy region IF is provided surrounded by the insulating layer 21. The dummy region IF has the same structure as the conductive region CR of the first transparent electrodes 4B1, 4B2 and the second transparent electrodes 5B1, 5B2, that is, the dummy conductive region having a structure in which the conductive nanowires are dispersed in the insulating material as a matrix. Has CR1. By providing such a dummy region IF, it is possible to change the separation distance between the first transparent electrodes 4B1 and 4B2 and the second transparent electrodes 5B1 and 5B2 in the XY plane while suppressing the influence on invisibility. it can. By changing the separation distance between these electrodes, the capacitance between the electrodes can be adjusted.

In the dummy region IF, a plurality of substantially circular dummy optical adjustment regions AR1 are formed in a plan view, similarly to the first optical adjustment region 41B and the second optical adjustment region 51B, from the viewpoint of reducing the visibility of the dummy region IF. , Are arranged discretely in the dummy conductive region CR1. The dummy optical adjustment region AR1 is formed by the same method as the first optical adjustment region 41B and the second optical adjustment region 51B (a method of removing conductive nanowires from an insulating material that becomes a matrix at least on the surface portion). , The structure is common to the first optical adjustment region 41B and the second optical adjustment region 51B.

When viewed from the Z1-Z2 direction (normal direction of the first surface S1), the optical adjustment area AR (first optical adjustment area 41B and second optical adjustment area 51B) and the dummy optical adjustment area AR1 are the first surface S1. It has a plurality of partial region PRs arranged at positions that serve as lattice points LP of the lattice LT along the plane of. That is, when a virtual grid LT is set along the in-plane of the first plane S1, the partial region PR is arranged on the grid point LP of the grid LT. From the viewpoint of ensuring the invisibility of each partial region PR, the circle-equivalent diameter φ0 of the partial region PR is preferably 100 μm or less.

11 (a) and 11 (b) are plan views illustrating the rectangular region of the transparent electrode member of the present embodiment. FIG. 11B shows one rectangular area of FIG. 11A.
As shown in FIG. 11A, the rectangular region RA is a rectangular region composed of four grid point LPs adjacent to each other as corners among a plurality of grid point LPs in the plane of the first surface S1. Say.

As shown in FIG. 11B, in the present embodiment, in a rectangular region RA having four grid point LPs adjacent to each other as corners among a plurality of grid point LPs, two diagonal lines of the rectangular region RA are formed. The lengths L1 and L2 of are provided so as to be different from each other. That is, the internal angles of the rectangular region RA are not right angles. For example, the rectangular region RA is a rhombus whose internal angles are not right angles. The shape of the rectangular region RA may be other than a rhombus as long as the lengths L1 and L2 of the two diagonal lines are different. In order to form such a rectangular region RA, the direction of the grid line LL of the grid LT shown in FIG. 10 is other than 45 degrees with respect to the X1-X2 direction. For example, the direction of the grid line LL is about 30 degrees ± 10 degrees with respect to the X1-X2 directions.

As shown in FIG. 5, in relation to the shape of the transparent electrode, in the present embodiment, the shapes of the first transparent electrode 4 and the second transparent electrode 5 are substantially rectangular, which are not similar to the rectangular region RA. That is, the outer shape of the first transparent electrode 4 and the outer shape of the second transparent electrode 5 are both rectangular (substantially rectangular), and there are two rectangular shapes formed by the outer shape of the first transparent electrode 4 and the outer shape of the second transparent electrode 5. The diagonals are aligned with the two diagonals of the rectangular region RA. Specifically, regarding the outer shape of the transparent electrodes (first transparent electrode 4 and second transparent electrode 5) and the rectangular region RA, one of the two diagonal lines is along the X1-X2 direction, and the two diagonal lines are The other is along the Y1-Y2 direction. Further, as shown in FIG. 5, the two diagonal lines of the rectangle formed by the outer shape of the first transparent electrode 4 and the outer shape of the second transparent electrode 5 are orthogonal to each other, and as shown in FIG. 11B, the rectangular region RA. The two diagonals are also orthogonal to each other. However, although the lengths of the two diagonal lines of the rectangle formed by the outer shape of the first transparent electrode 4 and the outer shape of the second transparent electrode 5 are equal to each other, the lengths of the two diagonal lines of the rectangular region RA are different from each other.

In this way, by providing the lengths L1 and L2 of the two diagonal lines of the rectangular region RA so as to be different from each other, the vertical and horizontal (X1-X2 direction and Y1-Y2 direction respectively) pitches in the plurality of partial region PRs can be set. Since they are different from each other, the occurrence of moire can be suppressed in relation to the arrangement of the structures overlapping with the plurality of partial region PRs. For example, in the arrangement of pixels of a display device such as a liquid crystal display device or an organic EL display device, the vertical and horizontal pitches are often the same. When the transparent electrode member 100 of this example is placed on such a display device, a virtual grid angle having the positions of a plurality of pixels as grid points and a virtual grid angle having the positions of a plurality of partial regions PR as grid points The angle of the grid does not match, and the occurrence of moire can be suppressed. This point will be described in detail later with reference to FIG.

Here, of the two diagonal lines of the rectangular region RA, the longer one is the first diagonal line DiL1, the shorter one is the second diagonal line DiL2, the length of the first diagonal line DiL1 is L1, and the length of the second diagonal line DiL2 is L2. If so, L1 / L2 is preferably 1.2 or more and 2.7 or less. When L1 / L2 is smaller than 1.2, the rectangular region RA approaches a square, so that the moire suppressing effect is weakened. On the other hand, when L1 / L2 exceeds 2.7, the difference between the pitch in the X1-X2 direction and the pitch in the Y1-Y2 direction of the optical adjustment region AR arranged at the grid point LP becomes too large, and the invisibility is reduced. It becomes easy to invite.

Further, the insulating layer 21 arranged in the insulating region IR (the insulating layer 21 located between the adjacent first transparent electrodes 4B1 and 4B2 and the second transparent electrodes 5B1 and 5B2, and the adjacent first transparent electrodes 4B1 and 4B2). The insulating layer 21 located between the dummy region IF and the insulating layer 21 located between the adjacent second transparent electrodes 5B1 and 5B2 and the dummy region IF) are in the Z1-Z2 direction (normal to the first surface S1). When viewed from the direction), it does not overlap with the partial region PR, and is provided in a linear shape connecting a plurality of lattice points LP. That is, the insulating layer 21 (insulating region IR) is provided so as to pass (connect) a plurality of lattice point LPs. That is, the boundary line between the dummy region IF and the insulating layer 21 has a portion extending along the arrangement direction of the plurality of partial region PRs of the dummy region IF.

In the example shown in FIG. 10, the insulating layer 21 arranged along the transparent electrodes (each of the first transparent electrode 4 and the second transparent electrode 5) is the grid line LL of the grid LT in the plane of the first surface S1. It has a portion extending along the direction and a portion extending along a non-grid direction which is an in-plane direction of the first surface S1 but different from the direction of the grid line LL. Specifically, the insulating layer 21 arranged along the transparent electrode includes a portion extending along the direction extending from the lower left side to the upper right side in FIG. 10 among the directions of the two grid lines LL, and two. It has a portion extending along the vertical direction in FIG. 10 which is neither the direction of the grid line LL. As shown in FIG. 11B, this vertical direction is a direction along one of the diagonal lines of the rectangular region RA, and specifically, a relatively short second of the two diagonal lines of the rectangular region RA. The direction is along the two diagonal lines DiL2. That is, in FIG. 10, the non-grid direction is the direction along the second diagonal line DiL2.

The non-grid direction may be any direction other than the direction along the direction of the grid line LL, but it may be a direction along the diagonal line of the rectangular region RA, such as the direction along the second diagonal line DiL2 described above. preferable. When the transparent electrode member 100 is viewed from the Z1-Z2 direction (the normal direction of the first surface S1), the plurality of partial region PRs in the transparent electrode appear to be arranged side by side in the direction of the grid line LL, and are rectangular. It also appears to be aligned in the direction along the diagonal line of the region RA (first diagonal line DiL1, second diagonal line DiL2). Therefore, when the non-lattice direction is the direction along the diagonal line of the rectangular region RA, the portion of the insulating layer 21 arranged along the non-lattice direction becomes difficult to see. Comparing the two diagonal lines of the rectangular region RA, the length of the insulating layer 21 arranged along the non-lattice direction is larger than the length of the insulating layer 21 arranged along the non-lattice direction when the non-lattice direction is along the relatively long first diagonal line DiL1. When the lattice direction is along the second diagonal line DiL2, which is relatively short, the length of the insulating layer 21 arranged along the non-lattice direction is shorter. Therefore, it is preferable that the non-lattice direction is a direction along the second diagonal line DiL2 from the viewpoint of increasing invisibility.

As shown in FIG. 5, the outer shape of the transparent electrodes (first transparent electrode 4, second transparent electrode 5) is substantially rectangular (specifically, a square), and each side of this rectangle is in the X1-X2 direction. It extends along a direction tilted 45 degrees. On the other hand, the direction of the grid line LL is along a direction inclined by 30 degrees with respect to the X1-X2 direction, as shown in FIG. Therefore, if the insulating layer 21 arranged along the transparent electrode extends only in the direction along the direction of the grid line LL, the extending direction of the rectangular side forming the outer shape of the transparent electrode is in the X1-X2 direction. It is not easy to achieve the direction tilted by 45 degrees with respect to the invisibility of the transparent electrode while maintaining it appropriately. Therefore, by setting the insulating layer 21 so that the insulating layer 21 arranged along the transparent electrode has a portion arranged along the non-lattice direction, the entire insulating layer 21 arranged along the transparent electrode is set. Direction can be different from the direction along the direction of the grid line LL.

As shown in FIG. 11B, in the rectangular region RA, the vertical diagonal line (second diagonal line DiL2) corresponding to the Y1-Y2 direction is the horizontal diagonal line (first diagonal line) corresponding to the X1-X2 direction. Since it is shorter than DiL1), the insulating layer 21 arranged along the transparent electrode is arranged along the transparent electrode by having a portion along this direction with the direction along the second diagonal line DiL2 as the non-lattice direction. The overall extending direction of the insulating layer 21 can be set to be more inclined than the direction of the grid line LL with respect to the X1-X2 direction (horizontal direction).

The insulating layer 21 arranged along the transparent electrode preferably has a plurality of portions extending along the non-lattice direction. In the insulating layer 21, the portion extending along the non-grid direction is relatively more visible than the portion extending along the direction of the grid line LL. This is because the arrangement of the plurality of partial regions PR located around the insulating layer 21 is along the direction of the grid line LL. Therefore, the insulating layer 21 is dispersed in the portion extending along the grid line LL rather than having a long portion extending along the non-lattice direction. It is preferable from the viewpoint of reducing the visibility of the extending portion. At this time, from the viewpoint of more stably reducing the visibility of the portion extending along the non-lattice direction in the insulating layer 21, the length of the portion extending along the non-lattice direction is inside the rectangular region RA. In the fit range, that is, in the example shown in FIG. 10, it is preferable that it is equal to the length L2 of the second diagonal line DiL2 of the rectangular region RA.

Further, when the portion extending along the non-grid direction is dispersedly located in the insulating layer 21 arranged along the transparent electrode, the insulating layer 21 extends along the direction of the grid line LL. It is preferable to have an alternating arrangement portion in which the portion and the portion extending along the non-lattice direction are alternately arranged. The insulating layer 21 having the alternately arranged portions has a zigzag shape as shown in FIG. 10, and can be set so as to extend in a direction different from the direction of the grid line LL as a whole. By doing so, it is appropriate to make the invisibility of the transparent electrode into a square composed of sides extending along a direction inclined by 45 degrees with respect to the X1-X2 direction. It is easily realized while maintaining.

In this way, the insulating layer arranged along the transparent electrode is arranged along the transparent electrode by having not only a portion extending along the lattice direction but also a portion extending along the non-lattice direction. The overall extending direction of the insulating layer to be formed can be set in a direction different from the lattice direction while appropriately maintaining invisibility. Therefore, even if there is a deviation between the direction along the outer shape of the transparent electrodes (the first transparent electrode 4 and the second transparent electrode 5) and the direction of the grid line LL, the insulating layer 21 is formed in a linear shape connecting the grid points LP. It becomes possible to do. Specifically, as shown in FIG. 11B, the direction of the grid line LL is a direction inclined by 30 degrees with respect to the lateral direction (X1-X2 direction in FIG. 5), and as shown in FIG. The direction along the outer shape of the transparent electrodes (first transparent electrode 4 and second transparent electrode 5) is a direction inclined by 45 degrees with respect to the X1-X2 direction. The insulating layer 21 may have a curved portion between two passing lattice points when viewed from the Z1-Z2 direction (the normal direction of the first surface S1).

Further, similarly to the insulating layer 21 arranged along the transparent electrodes (each of the first transparent electrode 4 and the second transparent electrode 5) as described above, the insulating layer 21 arranged along the dummy region IF is A portion extending along the direction of the grid line LL of the grid LT in the plane of the first plane S1 and a non-grid direction which is the in-plane direction of the first plane S1 but different from the direction of the grid line LL. It has an extending part. As a result, the overall extending direction of the insulating layer arranged along the dummy region IF can be set in a direction different from the lattice direction while appropriately maintaining invisibility. Specifically, as shown in FIG. 11B, the direction of the grid line LL is a direction inclined by 30 degrees with respect to the lateral direction (X1-X2 direction in FIG. 5), and as shown in FIG. The direction along the outer shape of the dummy region IF is a direction inclined by 45 degrees with respect to the X1-X2 direction, and as shown in FIG. 10, the non-lattice direction is the vertical direction (Y1-Y2 direction). Similar to the insulating layer 21 arranged along the transparent electrode, the insulating layer 21 arranged along the dummy region IF preferably has a plurality of portions extending along the non-lattice direction, and the insulating layer 21 is arranged in the non-lattice direction. It is more preferable that the portions extending along the grid line LL are dispersed and arranged in the portion extending along the direction of the grid line LL, and the portion extending along the direction of the grid line LL and the portion extending along the non-grid line direction. It is particularly preferable to have alternating arrangement portions in which the extending portions are alternately arranged. The non-lattice direction is preferably a direction along the diagonal line of the rectangular region RA, and more preferably along the direction of the second diagonal line DiL2 of the rectangular region RA. In a more preferable case, the length of the portion of the insulating layer 21 along the non-grid direction extending from the portion extending along the direction of the grid line LL is equal to the length L2 of the second diagonal line DiL2. Is preferable.

FIG. 12 is a plan view illustrating the pixel arrangement of the display device.
The display device 800 is arranged with pixels of a plurality of colors for performing color display. For example, the red pixel 800R, the green pixel 800G, and the blue pixel 800B are arranged in a predetermined layout. FIG. 12 shows an example of a pentile array as a pixel array. In an example of the pentile arrangement, the red pixel 800R and the blue pixel 800B are arranged in a staggered pattern, and four green pixels 800G are arranged around each of the red pixel 800R and the blue pixel 800B. ing. The direction of arrangement of each pixel is 45 degrees with respect to the vertical and horizontal directions.

In such a display device 800, assuming that the length of the major axis on the diagonal line of the rectangle formed by the unit cell of the pentile arrangement is LP1 and the length of the minor axis is LP2, the length of the major axis is LP1 and the length of the minor axis is LP2. The ratio to (LP1 / LP2) is 1. When the transparent electrode member according to the present embodiment is superimposed on the display device 800, L1 / L2, which is the ratio of the length L1 of the first diagonal line DiL1 to the second diagonal line DiL2 in the rectangular region RA, is different from LP1 / LP2. It's different. From the viewpoint of stably suppressing the occurrence of moire, the absolute value of the difference between L1 / L2 and LP1 / LP2 (| L1 / L2-LP1 / LP2 |) may be in the range of 0.19 to 1.75. It may be preferable.

As a result, the direction of the arrangement of the plurality of

pixels

800R, 800G and 800B of the display device 800 (the direction of the lattice line LLP) and the direction of the arrangement of the plurality of partial region PRs of the transparent electrode member (the direction of the lattice line LL) are changed. It will not match. Therefore, it is possible to suppress the occurrence of moire when the transparent electrode member (capacitance type sensor using the transparent electrode member) according to the present embodiment is superposed on the pentile array display device 800, and to improve the visibility of the image. Become.

13 to 16 are plan views illustrating the transparent electrode member according to the comparative example.
FIG. 13 is a plan view showing a part of the detection region of the transparent electrode member according to the comparative example (No. 1). FIG. 13 is an enlarged plan view of a region corresponding to the region A1 shown in FIG.
14 (a) and 14 (b) are plan views illustrating the rectangular region of the transparent electrode member according to the comparative example (No. 1).

In the transparent electrode member 100A according to the comparative example (No. 1), the direction of the grid line LLa of the grid LT in which the plurality of partial region PRs are arranged is 45 degrees with respect to each of the X1-X2 direction and the Y1-Y2 direction. It has become. That is, since the rectangular region RAa of the transparent electrode member 100A has the same length of the two diagonal lines, it becomes a square inclined by 45 degrees with respect to the vertical and horizontal directions.

When the transparent electrode member 100A according to the comparative example (No. 1) is superposed on the display device 800 having a pentile arrangement shown in FIG. 12, the directions (lattice) of the arrangement of the plurality of

pixels

800R, 800G and 800B of the display device 800. The direction of the line LLp) matches the direction of the arrangement of the plurality of partial regions PR of the transparent electrode member 100A (the direction of the lattice line LLa), and the possibility of generating moire increases. The rectangular region RA shown in FIG. 11 has a shape in which the rectangular region RAa is extended in the horizontal direction and contracted in the vertical direction. Therefore, the area of the rectangular region RA and the area of the rectangular region RAa are equal, and the area ratio of the partial region PR in the rectangular region RA is equal to the area ratio of the partial region PR in the rectangular region RAa.

FIG. 15 is a plan view showing a part of the detection region of the transparent electrode member according to the comparative example (No. 2). FIG. 15 is an enlarged plan view of a region corresponding to the region A1 shown in FIG.
16 (a) and 16 (b) are plan views illustrating the rectangular region of the transparent electrode member according to the comparative example (No. 2).

In the transparent electrode member 100B according to the comparative example (No. 2), the direction of the grid line LLb of the grid LT in which the plurality of partial region PRs are arranged is from 45 degrees with respect to each of the X1-X2 direction and the Y1-Y2 direction. It is slightly inclined. In the illustrated example, it is tilted from 45 degrees to 10 degrees. The rectangular region RAb of the transparent electrode member 100B is similar to the transparent electrode member 100A according to the comparative example (No. 1) in that the lengths of the two diagonal lines are equal and square, but the whole is 10 more than the rectangular region RAa. It differs in that it is tilted.

When the transparent electrode member 100B according to the comparative example (No. 2) is superposed on the display device 800 having the pentile arrangement shown in FIG. 12, the directions of the arrangement of the plurality of

pixels

800R, 800G and 800B of the display device 800 (lattice). The direction of the line LLp) and the direction of the arrangement of the plurality of partial regions PR of the transparent electrode member 100A (the direction of the lattice line LLb) do not match, and the occurrence of moire can be suppressed. However, as shown in FIG. 15, when the insulating layer 21 is connected to a plurality of lattice point LPs and is attempted to extend in a linear shape inclined at 45 degrees with respect to the X1-X2 direction, the lines are adjacent to the lattice points LP. The line is slightly inclined with respect to the line connecting the above (lattice line LLb). When the insulating layer 21 is arranged on such a line and the partial region PR is arranged on the grid point LP, the insulating layer 21 and the partial region PR overlap or become particularly close to each other, and the reflectance is locally lowered. , Invisibility is significantly reduced. Therefore, in the transparent electrode member 100B, there is a region where the partial region PR cannot be arranged. As a result, as shown in FIG. 9, the reflectance around the region where the partial region PR could not be arranged on the grid point LP becomes locally high, and the invisibility is inferior to that of the transparent electrode member 100. ..

That is, in the rectangular area RAa of the comparative example (No. 1), moire occurs in relation to the pixel arrangement (pentile arrangement) of the display device 800, so it is necessary to make some changes to the rectangular area RAa. Become. When the long axis and the short axis of the rectangle are different from each other as in the rectangular region RA of this example, moire can be eliminated, and the transparent electrodes (first transparent electrode 4 and second transparent electrode) without impairing invisibility are not impaired. The insulating layer 21 can be arranged along the outer shape of 5). Specifically, alternating arrangement portions are provided at the boundary between the transparent electrode and the insulating layer 21, and the boundary line has a zigzag shape. When the dummy region IF is provided, alternating arrangement portions may be provided at the boundary between the dummy region IF and the insulating layer 21 so that the boundary line has a zigzag shape. On the other hand, if the rectangle is rotated in comparison with the rectangular region RAa as in the rectangular region RAb of Comparative Example (Part 2), moire can be eliminated, but it is difficult to arrange the insulating layer 21 so as not to impair invisibility. It becomes.

FIG. 17 is a diagram illustrating a configuration of a capacitance type sensor according to another embodiment of the present invention. As shown in FIG. 17, the transparent electrode member 500 included in the capacitive sensor 1A according to the embodiment of the present invention is a first surface which is one of the two main surfaces of the sheet-shaped base material 2. A first electrode connecting body 8 having a plurality of first transparent electrodes 4 is provided on S1, and a second electrode connecting body having a plurality of second transparent electrodes 5 on a second surface S2, which is one of the other two main surfaces. A body 12 is provided. The plurality of second transparent electrodes are arranged side by side in the second direction (specifically, the X1-X2 direction) different from the first direction (Y1-Y2 direction) of the in-plane directions of the second surface S2. , Are electrically connected to each other.

FIG. 18 is a diagram illustrating a configuration of a capacitance type sensor according to another embodiment of the present invention. As shown in FIG. 18, in the capacitance type sensor 1B according to the embodiment of the present invention, two transparent electrode members (transparent electrode member 400a and transparent electrode member 400b) are in the normal direction of the first surface S1. A laminated transparent electrode member 600 laminated in the (Z1-Z2 direction) is provided. The first transparent electrode 4 of the transparent electrode member 400a and the first transparent electrode of the transparent electrode member 400b so that the first directions of the two transparent electrode members (transparent electrode member 400a and the transparent electrode member 400b) are different from each other. 4 and are arranged. Specifically, in the transparent electrode member 400a on the Z1 side in the Z1-Z2 direction, the first transparent electrodes 4 are arranged so as to line up in the Y1-Y2 direction, and the transparent electrodes on the Z2 side in the Z1-Z2 direction are relatively arranged. In the member 400b, the first transparent electrodes 4 are arranged so as to be arranged in the X1-X2 directions.

FIG. 19 is a diagram illustrating a configuration of an input / output device according to another embodiment of the present invention. As shown in FIG. 19, the input / output device 1000 according to the embodiment of the present invention has a display that overlaps the above-mentioned

capacitance type sensors

1, 1A or 1B and the

capacitance type sensors

1, 1A or 1B. The device 800 is provided. In FIG. 19, the

capacitive sensors

1, 1A or 1B are conceptually shown. An example of the input / output device 1000 is a touch panel display. As the display device 800 of the input / output device 1000, it is preferable to use one having pixels of the pentile array shown in FIG. This makes it possible to suppress the occurrence of moire when the

capacitive sensors

1, 1A or 1B are stacked, and improve the visibility of the image. Explaining the capacitance type sensor 1 as a specific example, L1 / L2 (= length of the first diagonal line DiL1 / second diagonal line DiL12) relating to the two diagonal lines of the rectangular region RA in the transparent electrode 110 of the capacitance type sensor 1 Is different from LP1 / LP2 (long axis length LP1 / minor axis length LP2) with respect to the two diagonal lines of the rectangle formed by the unit cell of the pentile arrangement of the display device 800. That is, | L1 / L2-LP1 / LP2 |> 0. From the viewpoint of stably suppressing the generation of moire, it may be preferable that | L1 / L2-LP1 / LP2 | is 0.19 or more and 1.75 or less. The two diagonal lines of the rectangular area RA are orthogonal to each other, the two diagonal lines of the rectangle formed by the unit cell of the pentile arrangement are also orthogonal to each other, and one of the two diagonal lines of the rectangular area RA is a rectangle formed by the unit cell of the pentile arrangement. It is located along one of the two diagonal lines of. Therefore, the other of the two diagonals of the rectangular region RA is located along the other of the two diagonals of the rectangle formed by the unit cell of the Pentile array.

Although the present embodiment has been described above, the present invention is not limited to these examples. For example, those skilled in the art appropriately adding, deleting, or changing the design of each of the above-described embodiments, or combining the features of the constituent examples of each embodiment as appropriate are also gist of the present invention. As long as it is provided, it is included in the scope of the present invention.

100, 100A, 100B, 400, 500, 400a, 400b Transparent electrode member 600 Laminated transparent electrode member 800

Display device

800R, 800G, 800B Pixel 1000 Input / output device 101 Base material A1, A3 area S1 1st surface S2 2nd surface 110 Transparent electrode 102 Insulation layer IR Insulation area IF Dummy area MX matrix NW Conductive nanowire DL Dispersion layer 111 Conductive part CR Conductive area CR1 Dummy conductive area 112 Optical adjustment part AR Optical adjustment area AR1 Dummy optical adjustment area sd Separation distance NR

No adjustment area

1,1A, 1B Capacitive sensor 2 Base material 3 Panel 3a surface 4,4B1,4B2 1st transparent electrode 5,5B1,5B2 2nd transparent electrode 6 Wiring part 7 Connecting part (1st transparent wiring)
8 1st electrode connector 10 Bridge wiring part (2nd transparent wiring)
11 Detection area 12 Second electrode connector 16 Connection wiring 20 Insulation part 20a Surface 21 Insulation layer 25 Non-detection area 27 External connection part 30 Optical transparent

adhesive layer

41, 41B First

optical adjustment area

51, 51B Second optical adjustment area DL1 1st boundary line DL2 2nd boundary line LT lattice LP lattice point LL, LLa, LLb, LLp lattice line PR partial area φ0 partial area PR circle conversion diameter RA, RAa, RAb rectangular area DiL1 longer diagonal line (1st diagonal line) )
DiL2 Shorter diagonal (2nd diagonal)
L1 Length of the first diagonal line DiL1 L2 Length of the second diagonal line DiL2 LP1 Length of the major axis LP2 Length of the minor axis

Claims

With a translucent and insulating base material,
A plurality of transparent electrodes arranged on the first surface, which is one surface of the base material, and having translucency,
An insulating layer formed between the plurality of transparent electrodes and
It is a transparent electrode member provided with
The transparent electrode includes a dispersion layer including a matrix made of an insulating material and conductive nanowires dispersed in the matrix.
The transparent electrode has a conductive region made of a conductive portion and an optical adjustment region having an optical adjustment portion.
The conductive portion has higher conductivity than the optical adjustment portion,
In the optical adjusting section, the dispersion density of the conductive nanowires in the dispersion layer is lower than that of the conductive section.
The optical adjustment region has a plurality of partial regions arranged at positions that serve as lattice points of a grid along the in-plane of the transparent electrode.
A transparent electrode member characterized in that, in a rectangular region formed by four grid points adjacent to each other among a plurality of the grid points, the lengths of the two diagonal lines of the rectangular region are different from each other.
When the longer one of the two diagonal lines of the rectangular region is the first diagonal line and the shorter one is the second diagonal line, the length of the first diagonal line is L1 and the length of the second diagonal line is L2.
The transparent electrode member according to claim 1, wherein L1 / L2 is 1.2 or more and 2.7 or less.
The transparent electrode member according to claim 1 or 2, wherein the shape of the transparent electrode is a substantially rectangular shape that is not similar to the rectangular region.
The transparent electrode member according to any one of claims 1 to 3, wherein the insulating layer does not overlap with the partial region and is provided in a linear shape connecting a plurality of the lattice points.
The insulating layer arranged along the transparent electrode includes a portion extending along the direction of the lattice line of the lattice and a portion extending along a non-lattice direction different from the direction of the lattice line. The transparent electrode member according to any one of claims 1 to 4.
The transparent electrode
A plurality of first transparent electrodes arranged side by side along the first direction on the substrate and electrically connected to each other.
It has a plurality of second transparent electrodes arranged side by side along a second direction different from the first direction and electrically connected to each other.
The two first transparent electrodes adjacent to each other in the first direction are electrically connected to each other by a first transparent wiring located between the two first transparent electrodes and composed of the conductive region.
The two second transparent electrodes adjacent to each other in the second direction are electrically connected by a second transparent wiring.
The transparent electrode member according to any one of claims 1 to 5, wherein the first transparent wiring and the second transparent wiring have a portion that overlaps with each other via an insulating material.
The transparent electrode
A plurality of first transparent electrodes arranged side by side along the first direction on the substrate and electrically connected to each other.
A plurality of second surfaces arranged side by side along a second direction different from the first direction and electrically connected to each other on a second surface located on the side opposite to the first surface with the base material interposed therebetween. With 2 transparent electrodes,
The two first transparent electrodes adjacent to each other in the first direction are electrically connected to each other by a first transparent wiring located between the two first transparent electrodes and composed of the conductive region.
The two second transparent electrodes adjacent to each other in the second direction are electrically connected by the second transparent wiring, and when viewed from the normal direction of the first surface, the first transparent wiring and the second transparent wiring The transparent electrode member according to any one of claims 1 to 5, wherein the transparent electrode member has an overlapping portion.
The outer shape of the first transparent electrode and the outer shape of the second transparent electrode are both rectangular.
The transparent electrode member according to claim 6 or 7, wherein the outer shape of the first transparent electrode and the two diagonal lines of the rectangle formed by the outer shape of the second transparent electrode are aligned with the two diagonal lines of the rectangular region. ..
The transparent electrode member according to claim 8, wherein the outer shape of the first transparent electrode and the two diagonal lines of the rectangle formed by the outer shape of the second transparent electrode have the same length.
The transparent electrode member according to claim 8 or 9, wherein the outer shape of the first transparent electrode and the two diagonal lines of the rectangle formed by the outer shape of the second transparent electrode are orthogonal to each other.
When viewed from the normal direction of the first surface, it is surrounded by the insulating layer and is made of a material common to the transparent electrode between the second transparent electrodes arranged adjacent to the first transparent electrode. Has a dummy area
The transparent electrode member according to any one of claims 6 to 10, wherein the dummy region has the plurality of partial regions.
The transparent electrode member according to claim 11, wherein the boundary line between the dummy region and the insulating layer has a portion extending along the arrangement direction of the plurality of partial regions of the dummy region.
The insulating layer arranged along the dummy region includes a portion extending along the direction of the lattice line of the lattice and a portion extending along a non-lattice direction different from the direction of the lattice line. 11. The transparent electrode member according to claim 12.
The transparent electrode member according to any one of claims 1 to 13.
A capacitance type sensor including a detection unit that detects a change in capacitance that occurs between an operating body such as an operator's finger and a transparent electrode.
The capacitive sensor according to claim 14,
An input / output device including a display device that overlaps the capacitance type sensor.
A plurality of pixels of the display device are arranged in a pentile.
The ratio of the length of the major axis to the length of the minor axis in the diagonal of the rectangle formed by the unit cell of the pentile arrangement is different from the ratio of the length of the major axis to the length of the minor axis in the diagonal of the rectangular region. The input / output device according to claim 15.