WO2020056722A1 - Light source structure, optical projection module, sensing device, and apparatus - Google Patents

Light source structure, optical projection module, sensing device, and apparatus Download PDF

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Publication number
WO2020056722A1
WO2020056722A1 PCT/CN2018/106944 CN2018106944W WO2020056722A1 WO 2020056722 A1 WO2020056722 A1 WO 2020056722A1 CN 2018106944 W CN2018106944 W CN 2018106944W WO 2020056722 A1 WO2020056722 A1 WO 2020056722A1
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WIPO (PCT)
Prior art keywords
light
light emitting
pattern
source structure
emitting
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PCT/CN2018/106944
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French (fr)
Chinese (zh)
Inventor
田浦延
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深圳阜时科技有限公司
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Application filed by 深圳阜时科技有限公司 filed Critical 深圳阜时科技有限公司
Priority to PCT/CN2018/106944 priority Critical patent/WO2020056722A1/en
Priority to CN201890000302.0U priority patent/CN209803547U/en
Publication of WO2020056722A1 publication Critical patent/WO2020056722A1/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings

Definitions

  • the utility model belongs to the field of optical technology, and particularly relates to a light source structure, an optical projection module, a biometric identification device and equipment.
  • An existing three-dimensional (3D) sensing module uses a light source with an irregularly distributed light emitting unit to project an irregularly distributed light spot pattern on the measured target to sense the three-dimensional information of the measured target.
  • 3D sensing it is necessary to compare and analyze the irregular light spot pattern projected on the measured object with the standard irregular light spot pattern projected on the reference plane, and calculate the measured spot where the light spot is located according to the amount of deformation of the corresponding light spot. 3D data of the position of the target.
  • the corresponding method is to divide the irregular light spot pattern into a plurality of search areas according to a preset area and sequentially search and compare. Therefore, the arrangement position of the irregularly distributed light emitting units on the light source is reasonably designed to improve the difference.
  • the uniqueness of the spot distribution in the search area that is, increasing the Hamming distance of the spot distribution in different search areas, has become the key to solving the problem.
  • the light-emitting unit arrangement of the existing light source structure usually needs to increase the light-emitting area area of the light source so that the light-emitting unit has more arrangement possibilities.
  • increasing the area of the light-emitting area of the light source will also increase. Cost, and the large light source structure is not conducive to the miniaturization of the product.
  • the technical problem to be solved by the present utility model is to provide a light source structure, an optical projection module, a biometric identification device and equipment, which can highly integrate flood light and light pattern projection functions, and achieve the beneficial effects of miniaturization and cost reduction.
  • An embodiment of the present invention provides a light source structure for emitting irregularly distributed light spot patterns.
  • the light source structure includes a semiconductor substrate and a plurality of irregularly distributed light emitting units formed on the semiconductor substrate.
  • a patterned light emitting area is defined on the light emitting surface of the semiconductor substrate.
  • the patterned light emitting area is rectangular, and the bottom left corner vertex of the patterned light emitting area is used as the origin.
  • the extension directions of the two right-angled edges that intersect in the lower left corner are the abscissa axis and the ordinate axis, respectively. The position of the light emitting unit is described.
  • the distribution pattern of the light emitting units is selected from a plurality of first light emission obtained by adding or reducing one or more light emitting units or changing a position of the one or more light emitting units in a basic light emitting unit distribution pattern having one hundred light emitting units.
  • the coordinate values of one hundred light-emitting units of the basic light-emitting unit distribution pattern are: P1 (170.55,157.95); P2 (146.25,145.35); P3 (189.45,177.75); P4 (175.95 , 91.35); P5 (202.95, 89.55); P6 (211.95, 193.95); P7 (230.85, 174.15); P8 (125.55, 220.05); P9 (213.75, 40.95); P10 (186.75, 39.15); P11 (10.35, 153.45); P12 (95.85,94.05); P13 (171.45,61.65); P14 (186.75,12.15); P15 (105.75,254.25); P16 (120.15,152.55); P17 (227.25,108.45); P18 (71.55,107.55) ); P19 (343.35, 108.45); P20 (247.05, 68.85); P21 (46.35,
  • the degree of similarity between the first light emitting unit distribution pattern and the basic light emitting unit distribution pattern is equal to or exceeds a preset threshold.
  • the similarity threshold is defined by obtaining a first light-emitting unit pattern after a limited number of graphic transformations that do not change the correlation between the light-emitting units to obtain a first light-emitting unit pattern that is consistent with the orientation of the basic light-emitting unit distribution pattern and has the same size of the light-emitting unit. Two light emitting unit patterns.
  • the similarity value calculated by using the normalized correlation coefficient matching method between the second light emitting unit pattern and the basic light emitting unit distribution pattern is equal to or exceeds a preset threshold of 0.25.
  • the graphic transformation that does not change the correlation between the light-emitting units includes translation, rotation, left-right mirroring, up-down mirroring, and 180-degree flip.
  • the light emitting unit is a vertical cavity surface emitting laser.
  • the light source structure further includes one or more flood light emitting areas, the flood light emitting areas are symmetrically distributed around the pattern light emitting area, and the flood light emitting areas emit light for forming light A light beam of a strong uniformly distributed flood light beam, one or more light emitters are formed in each of the flood light emission areas, and the light emitters and light emitting units in the pattern light emission area are formed on the same semiconductor substrate And can be independently controlled light emission.
  • a single light emitter is formed in each of the flood light emitting regions, and the single light emitter may be a single-hole wide-facet vertical cavity surface emitting laser.
  • a plurality of light emitting bodies are formed in each of the flood light emitting areas, and the plurality of light emitting bodies are uniformly arranged in the flood light emitting area at a preset same interval, and the plurality of light emitting areas
  • the body is a vertical cavity surface emitting laser.
  • the flood light emitting area is a box that surrounds the pattern light emitting area in a circle outside the pattern light emitting area, and a minimum distance between the flood light emitting area and the pattern light emitting area.
  • the size of D satisfies the condition Where H is the distance between the light emitting surface of the light source structure and the first optical element arranged sequentially above the light source structure, and ⁇ is the maximum divergence angle of the light beam emitted from the flood light emitting area and the pattern light emitting area.
  • a flood light emitting part which includes a light emitter and a light guide plate formed on a flood light emitting semiconductor substrate, and the light guide plate includes a light entrance surface and a light exit surface.
  • the flood light-emitting semiconductor substrate is disposed corresponding to the light incident surface of the light guide plate.
  • the luminous body emits a light beam toward the light incident surface of the light guide plate. The light beam emitted by the light emitting body enters the light guide plate from the light incident surface and is uniformly mixed from the light emitting surface.
  • a light beam with uniform light intensity is projected, and the semiconductor substrate formed with a plurality of irregularly distributed light-emitting units is disposed at a middle position on a light exit surface of a light guide plate to emit a light beam cluster having a plurality of irregularly distributed sub-beams.
  • the light emitter is a vertical cavity surface emitting laser.
  • An embodiment of the present invention further provides an optical projection module for projecting a predetermined pattern onto a measured target for sensing.
  • the optical projection module includes a light beam modulation element and the light source structure according to the foregoing embodiment.
  • the light beam modulation element modulates the light beam emitted by the light source structure to form a pattern light beam capable of projecting an irregularly distributed light spot pattern on a measured target object.
  • the beam modulation element includes a collimating lens and / or a beam expanding element and a diffractive optical element.
  • the collimating lens and / or the beam-expanding element and the patterning element are disposed on a light exiting light path of the light source structure.
  • the collimating lens and / or the beam-expanding element adjusts the light beam emitted by the light source structure to substantially keep collimation and meet a preset light output aperture requirement.
  • the patterning element rearranges a light beam cluster having a plurality of irregularly distributed sub-beams emitted from the light source structure to form a patterned beam capable of projecting a larger number of irregularly distributed light spot patterns on the measured object.
  • the light beam modulation element includes a diffusing portion and a patterning portion
  • the diffusing portion is disposed corresponding to a flood light emitting area or a flood light emitting portion of a light source structure, and is configured to convert the flood light emitting area or
  • the light beam emitted by the flood light emitting part diffuses to form a flood light beam with uniform light intensity distribution
  • the patterning part is set corresponding to the pattern light emitting area of the light source structure, and is used to set the light field of the light beam emitted from the pattern light emitting area.
  • the rearrangement is performed to form a pattern light beam capable of projecting irregularly distributed light spot patterns on the measured object.
  • the patterned portion and the diffusion portion of the beam modulation element are formed on the same transparent substrate;
  • the diffusion portion and the patterned portion of the beam modulation element are formed on different transparent substrates respectively.
  • the transparent substrate on which the patterned portion is formed is defined as a patterned substrate, and a region corresponding to the diffusion substrate and the patterned portion remains transparent. Light, and the area corresponding to the diffused portion of the patterned substrate remains transparent.
  • the function of the patterning portion is achieved by forming a specific patterned optical texture at a corresponding position on a transparent substrate, and the patterned optical texture is selected from a diffractive optical texture, an optical microlens array, and a grating. One of them and their combination.
  • the optical projection module further includes a light path guiding element, the light path guiding element is disposed between the light source structure and the beam modulation element and corresponds to a light emitting surface of a first emitting portion of the light source structure.
  • the light path guiding element is configured to guide and irradiate the first light beam emitted from the first emitting portion in a divergent shape to the diffusion portion of the light beam modulation element.
  • An embodiment of the present invention further provides a sensing device for sensing three-dimensional information of a measured object, which includes the optical projection module and the sensing module as described in the above embodiment.
  • the sensing module is configured to sense a preset pattern projected by the optical module on a measured target object and obtain three-dimensional information of the measured target object by analyzing an image of the preset pattern.
  • An embodiment of the present invention further provides a device including the sensing device according to the foregoing embodiment.
  • the device performs a corresponding function according to the three-dimensional information of the detected target object sensed by the sensing device.
  • the light source structure, the optical projection module, the sensing device and the device provided by the embodiments of the present utility model are simulated and screened by a computer to determine that the area between different light emitting unit local areas can be maximized within a small light emitting area.
  • the irrelevance makes the irregularly distributed light spots projected on the measured object more quickly locate the only corresponding light spot on the standard irregularly distributed light spot pattern, thereby improving the efficiency of three-dimensional sensing.
  • FIG. 1 is a top view of a light source structure provided by a first embodiment of the present invention.
  • FIG. 2 is a schematic diagram of coordinate positions of the irregular light-emitting unit described in FIG. 1.
  • FIG 3 is a top view of a light source structure provided by a second embodiment of the present invention.
  • FIG. 4 is a schematic diagram of another structure of the flood light emitting area according to the second embodiment of the present invention.
  • FIG. 5 is a top view of a light source structure provided by a third embodiment of the present invention.
  • FIG. 6 is a cross-sectional view of the light source structure in FIG. 5 taken along line VI-VI.
  • FIG. 7 is a top view of a light source structure provided by a fourth embodiment of the present invention.
  • FIG. 8 is a cross-sectional view of the light source structure in FIG. 7 along the line VIII-VIII.
  • FIG. 9 is a schematic structural diagram of an optical projection module according to a fifth embodiment of the present invention.
  • FIG. 10 is a schematic structural diagram of an optical projection module according to a sixth embodiment of the present invention.
  • FIG. 11 is a schematic structural diagram of an optical projection module according to a seventh embodiment of the present invention.
  • FIG. 12 is a schematic structural diagram of an optical projection module according to an eighth embodiment of the present invention.
  • FIG. 13 is a schematic structural diagram of a sensing device according to a ninth embodiment of the present invention.
  • FIG. 14 is a schematic structural diagram of a device provided by a tenth embodiment of the present invention.
  • the terms “installation”, “connected”, and “connected” should be understood in a broad sense unless otherwise specified or limited. For example, they may be fixed connections or may be connected. Disassembly connection, or integrated connection; it can be mechanical connection, electrical connection or mutual communication; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication between two components or between two components Interaction.
  • Disassembly connection, or integrated connection it can be mechanical connection, electrical connection or mutual communication; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication between two components or between two components Interaction.
  • the first embodiment of the present invention provides a light source structure 1 for emitting a light beam cluster with a plurality of irregularly distributed sub-beams to form a corresponding irregularly distributed light spot on a measured object.
  • Pattern for sensory recognition The light beam may be a light beam having a specific wavelength according to a sensing principle and an application scenario.
  • the light beam is used to realize face recognition, and may be an infrared or near-infrared wavelength light beam with a wavelength range of 750 nanometers (Nanometer, nm) to 1650 nm.
  • the light source structure 1 includes a semiconductor substrate 10 and a plurality of irregularly distributed light emitting units 12 formed on the semiconductor substrate 10.
  • the light emitting unit 12 is formed on the semiconductor substrate 10 by processes such as photolithography, etching, and / or metal organic chemical vapor deposition.
  • a patterned light emitting region 14 is defined on the light emitting surface of the semiconductor substrate 10.
  • the light emitting units 12 are distributed in the pattern light emitting area 14.
  • the distribution positions of the light-emitting units 12 in the pattern light-emitting area 14 satisfy the conditions of limited light-emitting area area, light-emitting unit aperture, and light-emitting unit spacing, so that the light-emitting units 12 at different positions in the pattern light-emitting area 14 have different positions.
  • the correlation is as high as possible to improve the calculation efficiency of searching and locating the irregularly distributed light spots.
  • the position of the light emitting unit 12 in the pattern light emitting area 14 is determined by setting a screening condition and using a computer to screen a plurality of simulated irregularly distributed light emitting unit 12 position pattern templates.
  • the set screening conditions include:
  • the search block is composed of a plurality of repeatedly stitched irregularly-distributed light-emitting unit 12 position patterns from the original location.
  • the distribution pattern of the light-emitting unit 12 searched by moving the preset search range in the figure is unique under the condition that the preset pixel missing rate is satisfied.
  • the preset search range is a range covered by moving the preset distance in the same direction, for example, along the line connecting the center points of the position patterns of the light emitting units 12 adjacent to the irregular distribution.
  • the preset distance is less than or equal to the distance between the central points of the position patterns of the randomly distributed light-emitting unit 12 adjacent to each other.
  • the preset area of the search block may be a pixel unit on a sensor that images the irregularly distributed light spot pattern projected by the irregularly distributed light emitting unit 12, for example, the search block may be The size of 30 pixel units multiplied by 30 pixel units.
  • the search block arbitrarily designated according to a preset area traverses the irregularly distributed light emitting unit 12 position pattern in units of the pixel unit. To obtain a plurality of distribution patterns of the light-emitting units 12 with a predetermined area size.
  • the patterns are compared one by one to get the corresponding Hamming distance.
  • the excluded range is a range covered by a distance that the search block itself moves one light emitting unit 12 in various directions.
  • the Hamming distance is a parameter expressing the degree of similarity between the distribution patterns of the two light-emitting units 12.
  • a position of one light emitting unit 12 is increased by a Hamming distance value, that is, one of the light emitting unit 12 distribution patterns changes the number of light emitting units 12 corresponding to the Hamming distance value.
  • a Hamming distance value that is, one of the light emitting unit 12 distribution patterns changes the number of light emitting units 12 corresponding to the Hamming distance value.
  • Position another distribution pattern of the light-emitting units 12 can be obtained.
  • Each of the candidate positions of the irregularly distributed light-emitting unit 12 positions is compared with the respective minimum Hamming distance obtained after the above search and comparison, and the irregularly-distributed light-emitting unit 12 position pattern corresponding to the maximum value is selected optimally.
  • the distribution density of the light-emitting units 12 selected as described above also needs to satisfy the minimum distance between adjacent light-emitting units 12 that can be produced by the manufacturing process.
  • the value range of the position coordinates of each irregularly distributed light emitting unit 12 in the pattern light emitting area 14 can be determined.
  • the pattern light emitting region 14 is rectangular.
  • the number of the light-emitting units 12 is, for example, one hundred.
  • the lower left vertex of the patterned light emitting region 14 is now the origin O, and the extension directions of the two right-angled sides that intersect at the lower left corner are the abscissa axis X and the ordinate axis Y, respectively, and the length unit is micrometer ( ⁇ m).
  • the range of the coordinate values of the center point of one hundred light-emitting units 12 is as follows: P1 ([165.84,175.26], [153.24,162.66]); P2 ([141.54,150.96], [140.64,150.06]); P3 ([184.74 , 194.16], [173.04,182.46]); P4 ([171.24,180.66], [86.64,96.06]); P5 ([198.24,207.66], [84.84,94.26]); P6 ([207.24,216.66], [ 189.24,198.66]); P7 ([226.14,235.56], [169.44,178.86]); P8 ([120.84,130.26], [215.34,224.76]); P9 ([209.04,218.46], [36.24,45.66]) ; P10 ([182.04,191.46], [34.44,43.86]); P11 ([5.64,15.06
  • the coordinate values of the center points of the one hundred light-emitting units 12 are: P1 (170.55,157.95); P2 (146.25,145.35); P3 (189.45,177.75); P4 (175.95,91.35); P5 (202.95 , 89.55); P6 (211.95, 193.95); P7 (230.85, 174.15); P8 (125.55, 220.05); P9 (213.75, 40.95); P10 (186.75, 39.15); P11 (10.35, 153.45); P12 (95.85, 94.05); P13 (171.45,61.65); P14 (186.75,12.15); P15 (105.75,254.25); P16 (120.15,152.55); P17 (227.25,108.45); P18 (71.55,107.55); P19 (343.35,108.45) ); P20 (247.05, 68.85); P21 (46.35, 119.25); P22 (65) ⁇
  • the light emitting unit 12 may be a semiconductor laser.
  • the light emitting unit 12 is a vertical cavity surface emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL).
  • the arrangement position of the irregular light-emitting units 12 on the light source structure 1 can be maximized within a small light-emitting area within a small light-emitting area after being determined and simulated by a computer according to the above screening principles.
  • the irrelevance makes the irregularly distributed light spots projected on the measured object more quickly locate the only corresponding light spot on the standard irregularly distributed light spot pattern, thereby improving the efficiency of three-dimensional sensing.
  • the one hundred irregularly arranged light-emitting units that determine coordinate positions in the above-mentioned pattern light-emitting area can also be used as a basic light-emitting unit distribution pattern, and added to the pattern light-emitting area. Either reduce one or more light emitting units, or change the position of one or more light emitting units to form a plurality of different first light emitting unit distribution patterns of the light source structure.
  • the similarity is evaluated by adding or reducing one or more light-emitting units or changing the position of one or more light-emitting units in the basic light-emitting unit distribution pattern without changing the light-emitting units for a limited number of times.
  • the second correlation pattern is transformed to obtain a second light-emitting unit pattern with the same orientation of the basic light-emitting unit distribution pattern and the same size of the light-emitting units.
  • the graphic transformation includes, but is not limited to, translation, rotation, left-right mirroring, up-down mirroring, 180-degree flipping, and the like.
  • a similarity calculation is performed on the second light-emitting unit pattern and the basic light-emitting unit distribution pattern by using a normalized correlation coefficient matching method.
  • the similarity between the first pattern and the basic light-emitting unit distribution pattern can be determined.
  • a similarity value of 1 corresponds to the case where the two patterns are completely the same, and a similarity value of 0 corresponds to a case where the two patterns are completely different.
  • the degree of similarity between the corresponding first light emitting unit distribution pattern and the basic light emitting unit distribution pattern may enable a light source structure using the first light emitting unit distribution pattern.
  • the preset threshold of the similarity value is a similarity value of 0.25 calculated by using a normalized correlation coefficient matching method.
  • the second embodiment of the present invention provides a light source structure 2 that is basically the same as the light source structure 1 in the first embodiment.
  • the light source structure 2 further includes one or more general light sources.
  • the flood light emitting regions 21 are symmetrically distributed around the pattern light emitting regions 24.
  • Each of the flood light emitting regions 21 includes one or more light emitting bodies 26.
  • the light emitting body 26 in the flood light emitting area 21 and the light emitting unit 22 in the pattern light emitting area 24 are formed on the same semiconductor substrate 20 and can be independently controlled to emit light.
  • the flood light emitting area 21 is used to emit a flood light beam with uniform light intensity distribution.
  • the flood light beam is projected onto the measured target to sense a flood image of the measured target.
  • the flood light beam may be used to sense whether the measured target is a human face.
  • a single light emitting body 26 may be formed in each of the flood light emitting areas 21.
  • the single light emitter 26 may be a single-hole wide-area VCSEL.
  • the single-hole wide-area VCSEL has only one light-emitting hole, but has a large light-emitting aperture, which is dozens of times that of a general VCSEL.
  • the luminous effect of the single-hole wide-area VCSEL is equivalent to a surface light source with uniform luminous intensity.
  • the shape of the light emitting surface of the single-hole wide-area VCSEL may be a regular shape, such as a rectangle, or may be other irregular shapes.
  • the flood light emitting areas 21 are respectively disposed at the corners of the pattern light emitting area 24.
  • the shape of the flood light emitting area 21 is a right-angled frame strip shape that surrounds the corners of the pattern light emitting area 24 from the outside.
  • the shape of the light emitting surface of the single-hole wide-area VCSEL may also be the shape of the corresponding right-angled frame.
  • a plurality of light emitting bodies may be formed in each of the flood light emitting areas.
  • the plurality of light emitting bodies are uniformly arranged in the flood light emitting area according to a preset same interval.
  • the plurality of light emitters may be a VCSEL.
  • the light beam with uniform light intensity emitted from the flood light emitting area 21 is diffused and mixed by optical elements disposed on the light path of the light source structure 2 to form a flood light beam covering the entire emission angle.
  • the third embodiment of the present invention provides a light source structure 3, which is basically the same as the light source structure 1 in the first embodiment.
  • the difference lies in the flood light emitting area.
  • 31 is a frame-shaped area surrounding the patterned light emitting area 34 around the patterned light emitting area 34.
  • the size of the minimum distance D between the flood light emission area 31 and the pattern light emission area 34 should ensure that the light beam emitted from the pattern light emission area 34 and the light beam emitted from the flood light emission area 32 reach and are arranged above the light source structure 3.
  • the first optical elements 33 arranged in sequence do not meet each other before.
  • the divergence angles of the light beams emitted by the light emitting body 36 in the flood light emitting area 31 and the light emitting unit 32 in the pattern light emitting area 34 cannot be exactly the same, but will Within the divergence angle range. Because the divergence angle of the light beams emitted by the light-emitting body 36 and the light-emitting unit 32 is larger, the distance between the light source structure 3 and the first optical element 33 arranged in order above remains the same in order to satisfy the light emission with flood light. If the light beams emitted from the area 31 do not intersect, it is required that the distance D between the pattern light emitting area 34 and the flood light emitting area 31 is greater.
  • the maximum divergence angle of the light beams emitted from the pattern light emitting area 34 and the flood light emitting area 31 is ⁇ .
  • the distance between the light emitting surface of the light source structure 3 and the first optical element 33 arranged in sequence above it is H, according to the trigonometric function, the minimum distance D between the patterned light emitting area 34 and the flooded light emitting area 31 in the critical case where the light beam emitted from the patterned light emitting area 34 and the beam emitted from the flooded light emitting area 31 just intersect.
  • the pattern light The minimum distance D between the light-emitting area 34 and the flood light-emitting area 31 should satisfy When the above conditions are satisfied, the light beams emitted from the pattern light emitting area 34 and the flood light emitting area 31 do not converge with each other before reaching the first optical element 33 provided above the light source structure 3, so there is no need to
  • the light emitting area 34 or the flood light emitting area 31 is further provided with another element for adjusting the direction of the light beam.
  • the light emitting units 32 are irregularly distributed in the pattern light emitting area 34 of the semiconductor substrate 30.
  • the luminous bodies 36 are uniformly arranged in the flood light emitting area 31 at the same preset interval.
  • a fourth embodiment of the present invention provides a light source structure 4 for emitting a light beam to a measured target for sensing identification.
  • the light beam may be a light beam having a specific wavelength according to a sensing principle and an application scenario.
  • the light beam is used to realize face recognition, and may be an infrared or near-infrared wavelength light beam with a wavelength range of 750 nanometers (Nanometer, nm) to 1650 nm.
  • the light source structure 4 includes a flood light emitting portion 40 and a pattern light emitting portion 42.
  • the light beam emitted by the flood light emitting portion 40 is used to form a flood light beam with uniform light intensity distribution.
  • the flood light beam is projected onto the measured target to identify whether the measured target is a specific object that conforms to a preset characteristic.
  • the flood light beam may be used to identify whether the measured target is a human face.
  • the light beam emitted by the patterned light emitting portion 42 is used to form a patterned light beam capable of projecting a predetermined pattern on the measured object.
  • the preset pattern is used to sense three-dimensional information on a surface of the measured target object.
  • the flood light emitting portion 40 includes a light emitter 400 and a light guide plate 402 formed on a flood light emitting semiconductor substrate 401.
  • the light guide plate 402 includes a light entrance surface 4020 and a light exit surface 4022.
  • the light guide plate 402 has a substantially rectangular parallelepiped shape, and the light incident surface 4020 is perpendicular to the light exit surface 4022.
  • the luminous body 400 is disposed corresponding to the light incident surface 4020 of the light guide plate 402 so that the light beam emitted by the luminous body 400 enters the light guide plate 402 from the light incident surface 4020 and is uniformly mixed. .
  • the pattern light emitting portion 42 is disposed at a middle position of the light emitting surface 4022 of the light guide plate 402.
  • the patterned light emitting section 42 includes a semiconductor substrate 421 as described in the first embodiment, and a plurality of light emitting units 420 formed on the semiconductor substrate 421.
  • the light emitting units 420 are irregularly arranged on the semiconductor substrate 421 according to the same distribution law as in the first embodiment.
  • DOE diffractive Optical Element
  • the light-emitting body 400 and the light-emitting unit 420 may be a semiconductor laser, for example, a VCSEL.
  • the difference is that because the positions of the light-emitting body 400 and the light-emitting unit 420 are different, they need to be formed on different flood light-emitting semiconductor substrates 401 and 421 respectively.
  • the shape of the flood light emitting semiconductor substrate 401 corresponds to the shape of the light incident surface 4020.
  • a fifth embodiment of the present invention provides an optical projection module 5 for projecting a specific light beam onto a target to be detected for recognition.
  • the optical projection module 5 includes a light beam modulation element 51 and the light source structure 1 in the first embodiment.
  • the beam modulation element 51 includes, but is not limited to, a collimating lens 510 and / or a beam expanding element and a patterning element 512.
  • the collimating lens 510 and / or the beam-expanding element and the patterning element 512 are disposed on a light-emitting light path of the light source structure 1.
  • the collimating lens 510 and / or the beam-expanding element adjust the light beam emitted by the light source structure 1 so that it is substantially kept collimated and meets a preset light output aperture requirement.
  • the patterning element 512 rearranges a light beam cluster having a plurality of irregularly distributed sub-beams emitted from the light source structure 1 to form a pattern capable of projecting a larger number of irregularly distributed light spot patterns on the measured target object. beam.
  • the patterning element 512 includes, but is not limited to, a DOE, a microlens array, a grating, and the like.
  • the patterning element 512 is a DOE, and the DOE copies a plurality of beam clusters with a plurality of irregularly distributed sub-beams emitted from the light source structure 1 and expands them within a preset extended angle range. Form a pattern light beam capable of projecting a larger number of irregularly distributed light spot patterns on the measured target.
  • a sixth embodiment of the present invention provides an optical projection module 6 for projecting a specific light beam onto a measured target for sensing and identification.
  • the optical projection module 6 includes a beam modulation element 61 and the light source structure 2 in the second to fourth embodiments.
  • the beam modulation element 61 includes a diffusion portion 610 and a patterning portion 612.
  • the diffusing portion 610 is provided corresponding to the flood light emitting area 21 of the light source structure 1, and is configured to diffuse the light beam emitted by the light emitting body 26 in the flood light emitting area 21 to form a flood light beam with uniform light intensity distribution.
  • the patterning portion 612 is provided corresponding to the patterned light emitting region 24 of the light source structure 1 and is configured to form a light beam emitted from the light emitting unit 22 in the patterned light emitting region 24 into a pattern capable of projecting a predetermined pattern on the measured object.
  • the light beam is used for sensing three-dimensional information of the measured target.
  • the patterned portion 612 corresponds to the patterned light emitting region 24 of the light source structure 1 and is disposed at an intermediate position of the beam modulation element 61.
  • the diffusion portion 610 corresponds to the flood light emitting region 21 of the light source structure 1, and is disposed symmetrically around the periphery of the patterning portion 612.
  • the functions of the patterning portion 612 and the diffusion portion 610 are realized by forming specific optical lines at corresponding positions on the transparent substrate 613.
  • the patterned portion 112 and the diffusion portion 111 of the beam modulation element 110 are disposed on the same transparent substrate 613. That is, a patterned optical pattern 6120 for rearranging a light field is formed at the middle position of the transparent substrate 613 as the patterned portion 612.
  • the transparent substrate 613 forms a diffusing optical pattern 6100 having a light diffusing effect as the diffusing part 610 at a position corresponding to the light emitting structure 21 of the light source structure 1 at the periphery of the patterned optical pattern 6120.
  • a seventh embodiment of the present invention provides an optical projection module 7, which is basically the same as the optical projection module 6 in the sixth embodiment. The difference is that the optical projection module 7 is also Includes a light path guide member 76.
  • the light path guiding element 76 is disposed between the light source structure 1 and the light beam modulation element 71, and at a position corresponding to the light emitting surface of the light emitting area 21 of the light source structure 1.
  • the light path guiding element 76 is configured to guide the light beam emitted from the light emitting body 26 in the diffused light emitting region 21 in a divergent manner and irradiate the diffusion portion 710 on the light beam modulation element 71.
  • the arrangement of the light path guiding element 76 is to avoid that in the technical solution in which the flood light emitting region 21 and the pattern light emitting region 24 of the light source structure 1 are relatively close, a part of the light beam emitted from the flood light emitting region 21 is subjected to beam modulation.
  • the patterned portion 712 of the element 71 forms a diffracted light beam with uneven intensity, thereby affecting the uniformity of the flood light beam.
  • the light path guiding element 76 includes, but is not limited to, a prism, a microlens, and a grating.
  • the setting area of the light path guiding element 76 is consistent with the flood light emitting area 21 of the light source structure 1.
  • an eighth embodiment of the present invention provides an optical projection module 8, which is basically the same as the optical projection module 6 in the sixth embodiment.
  • the difference lies in the diffusion of the beam modulation element 81.
  • the portion 810 and the patterned portion 812 are formed on different transparent substrates, respectively.
  • the transparent substrate on which the patterned portion 812 is formed is defined as a patterned substrate 8123.
  • a patterned optical pattern 8120 for rearranging the light field of the light beam is formed on the patterned substrate 8123 at a position corresponding to the patterned light-emitting region 24 of the light source structure 1.
  • the patterned optical pattern 8120 is formed at a middle position of the patterned substrate 8123.
  • the transparent substrate on which the diffusion portion 810 is formed is defined as a diffusion substrate 8103.
  • a diffusion optical pattern 8100 is formed on the diffusion substrate 8103 at a position corresponding to the flood light emitting region 21 of the light source structure 1 to play a role of light diffusion.
  • the area corresponding to the patterned optical lines 8120 on the diffusion substrate 8103 and the patterned substrate 8123 remains transparent, and the area corresponding to the diffused optical lines 8100 on the patterned substrate 8123 and the diffused substrate 8103 remains transparent, which is defined as a light transmitting area 8102.
  • the light source structure 1 corresponding to the flood light emitting area 21 surrounding the pattern light emitting area 24 is provided, and the diffusion substrate 8103 is located on the periphery of the light transmitting area 8102 with the light source structure 1 flood light emitting area 21.
  • the diffusion optical lines 8100 are formed at corresponding positions.
  • the patterned substrate 8123 and the diffusion substrate 8103 may be stacked on each other, or may be separately disposed at different positions on the optical path along the projection optical path of the optical projection module 8. It can be understood that it is only necessary to ensure that the positions of the corresponding optical lines on the diffusion substrate 8103 and the patterned substrate 8123 are aligned with each other, and there is no special requirement on the arrangement order of the diffusion substrate 8103 and the patterned substrate 8123 along the projection optical path.
  • a ninth embodiment of the present invention provides a sensing device 9 for sensing spatial information of a measured target object.
  • the spatial information includes, but is not limited to, three-dimensional information on the surface of the measured target, position information of the measured target in space, size information of the measured target, and other three-dimensional stereo information related to the measured target.
  • the sensed spatial information of the measured target can be used to identify the measured target or construct a three-dimensional model of the measured target.
  • the sensing device 9 includes the optical projection module 5 and the sensing module 90 provided in the fifth to eighth embodiments.
  • the optical projection module 5 is used for projecting a specific light beam onto a measured target for sensing and identification.
  • the sensing module 90 is configured to sense a specific image projected by the optical projection module 5 on the measured target object and obtain relevant spatial information of the measured target object by analyzing the specific image.
  • the sensing device 9 is a 3D face recognition device that senses three-dimensional information on the surface of the detected target object and recognizes the identity of the detected target object accordingly.
  • the specific light beam includes a flood light beam having a uniform intensity and / or a pattern light beam capable of projecting a predetermined pattern on a measured target object.
  • the sensing module 90 recognizes whether the approaching target object is a face according to an image formed on the target object by the sensed flood light beam.
  • the sensing module 90 analyzes the three-dimensional information on the surface of the measured target according to the shape change of the preset pattern projected by the sensed pattern beam on the measured target, and faces the measured target accordingly. Department identification.
  • a tenth embodiment of the present invention provides a device 100 such as a mobile phone, a notebook computer, a tablet computer, a touch interactive screen, a door, a vehicle, a robot, an automatic numerically controlled machine tool, and the like.
  • the device 100 includes at least one sensing device 9 provided in the ninth embodiment described above.
  • the device 100 is configured to perform a corresponding function according to a sensing result of the sensing device 9.
  • the corresponding functions include, but are not limited to, any of unlocking, paying, launching a preset application, avoiding obstacles, recognizing the user's facial expressions, and using deep learning technology to determine the user's mood and health after identifying the user's identity. Or more.
  • the sensing device 9 is a 3D face recognition device that senses three-dimensional information on the surface of the detected target object and recognizes the identity of the detected target object accordingly.
  • the device 100 is an electronic terminal, such as a mobile phone, a notebook computer, a tablet computer, a touch interactive screen, a door, a vehicle, a security check, an entry-exit device, etc., which are equipped with the 3D face recognition device.
  • the light source structure 1, the optical projection module 5, the sensing device 9, and the device 100 provided by the present invention can be simulated and screened in accordance with the above-mentioned screening principles through a computer to determine the light emitting area.
  • a computer to determine the light emitting area.

Abstract

A light source structure (1), an optical projection module (5) comprising the light source structure (1), a sensing device (9), and an apparatus (100). The light source structure (1) is used to emit irregularly distributed light spot patterns. The light source structure (1) comprises semiconductor substrates (10, 20, 30) and multiple irregularly distributed light emitting units (12, 22, 32) formed on the semiconductor substrates (10, 20, 30). Patterned-light emitting regions (14, 24, 34) are defined on light emitting surfaces of the semiconductor substrates (10, 20, 30). The patterned-light emitting regions (14, 24, 34) are rectangular. A vertex of a lower left corner of each of the patterned-light emitting regions (14, 24, 34) serves as an origin (O), and extension directions of two right-angled sides intersecting in the lower left corner serve as an abscissa axis (X) and an ordinate axis (Y), respectively, wherein the coordinates are in microns. The multiple light emitting units (12, 22, 32) are distributed in the patterned-light emitting regions (14, 24, 34).

Description

一种光源结构、光学投影模组、感测装置及设备Light source structure, optical projection module, sensing device and equipment 技术领域Technical field
本实用新型属于光学技术领域，尤其涉及一种光源结构、光学投影模组、生物识别装置及设备。The utility model belongs to the field of optical technology, and particularly relates to a light source structure, an optical projection module, a biometric identification device and equipment.
背景技术Background technique
现有的三维(Three Dimensional,3D)感测模组采用具有不规则分布的发光单元的光源在被测目标物上投射出不规则分布的光斑图案来感测被测目标物的三维信息。在进行三维感测时，需要将投射到被测目标物上的不规则光斑图案与投射到参考平面上的标准不规则光斑图案进行对比分析，根据对应光斑的变形量推算出光斑所在的被测目标物位置的三维数据。An existing three-dimensional (3D) sensing module uses a light source with an irregularly distributed light emitting unit to project an irregularly distributed light spot pattern on the measured target to sense the three-dimensional information of the measured target. When performing three-dimensional sensing, it is necessary to compare and analyze the irregular light spot pattern projected on the measured object with the standard irregular light spot pattern projected on the reference plane, and calculate the measured spot where the light spot is located according to the amount of deformation of the corresponding light spot. 3D data of the position of the target.
由此，将所述投射在被测目标物上的不规则分布光斑与投射到参考平面上的标准不规则分布光斑一一对应上所花费的时间成为决定感测速度的重要因素。对应的方法是将所述不规则光斑图案按照预设面积划分为多个搜索区域依次进行搜索比对，因此合理地设计光源上所述不规则分布的发光单元的排布位置以提高所述不同搜索区域内光斑分布的唯一性，即提高不同搜索区域内光斑分布的汉明距离，成为解决问题的关键所在。而现有光源结构的发光单元排布为了获得较高的汉明距离通常需要增加光源的发光区域面积以使得发光单元具有更多的排布可能，但增加光源的发光区域面积的同时也会增加成本，同时较大的光源结构也不利于产品的小型化设计。As a result, the time it takes for the one-to-one correspondence between the irregularly distributed light spot projected on the measured target object and the standard irregularly distributed light spot projected on the reference plane to become an important factor determining the sensing speed. The corresponding method is to divide the irregular light spot pattern into a plurality of search areas according to a preset area and sequentially search and compare. Therefore, the arrangement position of the irregularly distributed light emitting units on the light source is reasonably designed to improve the difference. The uniqueness of the spot distribution in the search area, that is, increasing the Hamming distance of the spot distribution in different search areas, has become the key to solving the problem. In order to obtain a high Hamming distance, the light-emitting unit arrangement of the existing light source structure usually needs to increase the light-emitting area area of the light source so that the light-emitting unit has more arrangement possibilities. However, increasing the area of the light-emitting area of the light source will also increase. Cost, and the large light source structure is not conducive to the miniaturization of the product.
发明内容Summary of the Invention
本实用新型所要解决的技术问题在于提供一种光源结构、光学投影模组、生物识别装置及设备，可以高度集成泛光和光图案投射功能，达成小型化及降 低成本的有益效果。The technical problem to be solved by the present utility model is to provide a light source structure, an optical projection module, a biometric identification device and equipment, which can highly integrate flood light and light pattern projection functions, and achieve the beneficial effects of miniaturization and cost reduction.
本实用新型实施方式提供一种光源结构，其用于发出不规则分布的光斑图案。所述光源结构包括半导体基底及形成在所述半导体基底上的多个不规则分布的发光单元。所述半导体基底的发光表面上定义出一图案光发光区域。所述图案光发光区域为矩形，以所述图案光发光区域左下角顶点为原点，相交于左下角的两条直角边延展方向分别为横坐标轴和纵坐标轴，坐标单位为微米建立起来坐标系来描述所述发光单元的位置。所述发光单元的分布图案选自在具有一百个发光单元的基础发光单元分布图案中通过加入或减少一个或多个发光单元或者改变一个或多个发光单元的位置获得的多种第一发光单元分布图案中的一种，所述基础发光单元分布图案的一百个发光单元的坐标值为：P1(170.55,157.95)；P2(146.25,145.35)；P3(189.45,177.75)；P4(175.95,91.35)；P5(202.95,89.55)；P6(211.95,193.95)；P7(230.85,174.15)；P8(125.55,220.05)；P9(213.75,40.95)；P10(186.75,39.15)；P11(10.35,153.45)；P12(95.85,94.05)；P13(171.45,61.65)；P14(186.75,12.15)；P15(105.75,254.25)；P16(120.15,152.55)；P17(227.25,108.45)；P18(71.55,107.55)；P19(343.35,108.45)；P20(247.05,68.85)；P21(46.35,119.25)；P22(65.25,80.55)；P23(201.15,276.75)；P24(254.25,113.85)；P25(108.45,281.25)；P26(192.15,250.65)；P27(27.45,191.25)；P28(40.05,166.95)；P29(22.05,94.95)；P30(22.05,67.95)；P31(71.55,220.05)；P32(262.35,16.65)；P33(49.05,235.35)；P34(227.25,267.75)；P35(112.05,71.55)；P36(5.85,274.95)；P37(139.95,67.05)；P38(35.55,43.65)；P39(25.65,249.75)；P40(76.95,134.55)；P41(4.95,219.15)；P42(280.35,106.65)；P43(327.15,161.55)；P44(93.15,31.95)；P45(52.65,262.35)；P46(275.85,281.25)；P47(8.55,37.35)；P48(60.75,33.75)；P49(42.75,13.05)；P50(87.75,58.95)；P51(175.05,130.05)；P52(199.35,142.65)；P53(156.15,110.25)；P54(169.65,196.65)；P55(142.65,198.45)；P56(133.65,94.05)；P57(114.75,113.85)；P58(220.05,67.95)；P59(131.85,247.05)；P60(158.85,248.85)；P61(335.25,134.55)；P62(249.75,193.95)；P63(174.15,226.35)；P64(158.85,275.85)； P65(239.85,33.75)；P66(225.45,135.45)；P67(118.35,179.55)；P68(274.05,180.45)；P69(2.25,179.55)；P70(98.55,219.15)；P71(299.25,168.75)；P72(280.35,207.45)；P73(144.45,11.25)；P74(91.35,174.15)；P75(237.15,6.75)；P76(153.45,37.35)；P77(318.15,96.75)；P78(305.55,121.05)；P79(323.55,193.05)；P80(323.55,220.05)；P81(274.05,67.95)；P82(83.25,271.35)；P83(296.55,52.65)；P84(118.35,20.25)；P85(233.55,216.45)；P86(339.75,13.05)；P87(205.65,220.95)；P88(310.05,244.35)；P89(319.95,38.25)；P90(268.65,153.45)；P91(340.65,68.85)；P92(65.25,181.35)；P93(18.45,126.45)；P94(252.45,256.05)；P95(292.95,25.65)；P96(69.75,6.75)；P97(337.05,250.65)；P98(284.85,254.25)；P99(302.85,274.95)；P100(257.85,229.05)。所述第一发光单元分布图案与所述基础发光单元分布图案之间的相似程度等于或者超过预设阈值。所述相似程度阈值的定义方式为将所述第一发光单元图案经过有限次数不改变发光单元之间相关性的图形变换后获得与所述基础发光单元分布图案朝向一致且发光单元大小相同的第二发光单元图案。所述第二发光单元图案与所述基础发光单元分布图案运用归一化相关系数匹配法计算得出的相似度数值等于或超过0.25的预设阈值。An embodiment of the present invention provides a light source structure for emitting irregularly distributed light spot patterns. The light source structure includes a semiconductor substrate and a plurality of irregularly distributed light emitting units formed on the semiconductor substrate. A patterned light emitting area is defined on the light emitting surface of the semiconductor substrate. The patterned light emitting area is rectangular, and the bottom left corner vertex of the patterned light emitting area is used as the origin. The extension directions of the two right-angled edges that intersect in the lower left corner are the abscissa axis and the ordinate axis, respectively. The position of the light emitting unit is described. The distribution pattern of the light emitting units is selected from a plurality of first light emission obtained by adding or reducing one or more light emitting units or changing a position of the one or more light emitting units in a basic light emitting unit distribution pattern having one hundred light emitting units. One of the unit distribution patterns, the coordinate values of one hundred light-emitting units of the basic light-emitting unit distribution pattern are: P1 (170.55,157.95); P2 (146.25,145.35); P3 (189.45,177.75); P4 (175.95 , 91.35); P5 (202.95, 89.55); P6 (211.95, 193.95); P7 (230.85, 174.15); P8 (125.55, 220.05); P9 (213.75, 40.95); P10 (186.75, 39.15); P11 (10.35, 153.45); P12 (95.85,94.05); P13 (171.45,61.65); P14 (186.75,12.15); P15 (105.75,254.25); P16 (120.15,152.55); P17 (227.25,108.45); P18 (71.55,107.55) ); P19 (343.35, 108.45); P20 (247.05, 68.85); P21 (46.35, 119.25); P22 (65.25, 80.55); P23 (201.15, 276.75); P24 (254.25, 113.85); P25 (108.45, 281.25) ; P26 (192.15,250.65); P27 (27.45,191.25); P28 (40.05,166.95); P29 (22.05,94.95); P30 (22.05,67.95); P31 (71.55,220.05); P32 (262.35,16.65); P33 (49.05,235.35); P34 (227.25,267.75); P35 (112.05,71.55); P36 (5.85,274.95); P37 (139.95,67.05); P38 (35.55,43.65); P39 (25.65,249.75); P40 (76.95,134.55); P41 (4.95,219.15); P42 (280.35,106.65); P43 (327.15,161.55); P44 (93.15,31.95); P45 (52.65,262.35); P46 (275.85,281.25); P47 (8.55,37.35); P48 ( 60.75,33.75); P49 (42.75,13.05); P50 (87.75,58.95); P51 (175.05,130.05); P52 (199.35,142.65); P53 (156.15,110.25); P54 (169.65,196.65); P55 (142.65) , 198.45); P56 (133.65,94.05); P57 (114.75,113.85); P58 (220.05,67.95); P59 (131.85,247.05); P60 (158.85,248.85); P61 (335.25,134.55); P62 (249.75, 193.95); P63 (174.15,226.35); P64 (158.85,275.85); P65 (239.85,33.75); P66 (225.45,135.45); P67 (118.35,179.55); P68 (274.05,180.45); P69 (2.25,179.55) ); P70 (98.55,219.15); P71 (299.25,168.75); P72 (280.35,207.45); P73 (144.45,11.25); P74 (91.35,174.15); P75 (237.15,6.75); P76 (153.45,37.35) ; P77 (318.15,96.75); P78 (305.55,121.05); P79 (323.55,193.05); P80 (323.55,220.05); P81 (274.05,67.95); P82 (83.25,271.35); P83 (29 6.55,52.65); P84 (118.35,20.25); P85 (233.55,216.45); P86 (339.75,13.05); P87 (205.65,220.95); P88 (310.05,244.35); P89 (319.95,38.25); P90 (268.65) , 153.45); P91 (340.65, 68.85); P92 (65.25, 181.35); P93 (18.45, 126.45); P94 (252.45, 256.05); P95 (292.95, 25.65); P96 (69.75, 6.75); P97 (337.05, 250.65); P98 (284.85,254.25); P99 (302.85,274.95); P100 (257.85,229.05). The degree of similarity between the first light emitting unit distribution pattern and the basic light emitting unit distribution pattern is equal to or exceeds a preset threshold. The similarity threshold is defined by obtaining a first light-emitting unit pattern after a limited number of graphic transformations that do not change the correlation between the light-emitting units to obtain a first light-emitting unit pattern that is consistent with the orientation of the basic light-emitting unit distribution pattern and has the same size of the light-emitting unit. Two light emitting unit patterns. The similarity value calculated by using the normalized correlation coefficient matching method between the second light emitting unit pattern and the basic light emitting unit distribution pattern is equal to or exceeds a preset threshold of 0.25.
在某些实施方式中，所述不改变发光单元之间相关性的图形变换包括平移、旋转、左右镜像、上下镜像及180度翻转。In some embodiments, the graphic transformation that does not change the correlation between the light-emitting units includes translation, rotation, left-right mirroring, up-down mirroring, and 180-degree flip.
在某些实施方式中，所述发光单元为垂直腔面发射激光器。In some embodiments, the light emitting unit is a vertical cavity surface emitting laser.
在某些实施方式中，所述光源结构还包括一个或多个泛光发光区域，所述泛光发光区域对称地围绕所述图案光发光区域分布，所述泛光发光区域发出用于形成光强均匀分布的泛光光束的光束，每一个所述泛光发光区域内形成有一个或多个发光体，所述发光体与所述图案光发光区域内的发光单元形成在同一个半导体基底上并可分别被独立地控制发光。In some embodiments, the light source structure further includes one or more flood light emitting areas, the flood light emitting areas are symmetrically distributed around the pattern light emitting area, and the flood light emitting areas emit light for forming light A light beam of a strong uniformly distributed flood light beam, one or more light emitters are formed in each of the flood light emission areas, and the light emitters and light emitting units in the pattern light emission area are formed on the same semiconductor substrate And can be independently controlled light emission.
在某些实施方式中，每一个所述泛光发光区域内形成有单个发光体，所述单个发光体可以为单孔宽面型垂直腔面发射激光器。In some embodiments, a single light emitter is formed in each of the flood light emitting regions, and the single light emitter may be a single-hole wide-facet vertical cavity surface emitting laser.
在某些实施方式中，每一个所述泛光发光区域内形成有多个发光体，所述 多个发光体按照预设的相同间隔均匀排布在泛光发光区域内，所述多个发光体为垂直腔面发射激光器。In some embodiments, a plurality of light emitting bodies are formed in each of the flood light emitting areas, and the plurality of light emitting bodies are uniformly arranged in the flood light emitting area at a preset same interval, and the plurality of light emitting areas The body is a vertical cavity surface emitting laser.
在某些实施方式中，所述泛光发光区域为在所述图案光发光区域外包围所述图案光发光区域一圈的方框，所述泛光发光区域与图案光发光区域之间最小间距D的大小满足条件
Figure PCTCN2018106944-appb-000001
其中H为光源结构的发光面与设置在光源结构上方顺序排列的第一个光学元件之间的距离，θ为从泛光发光区域和图案光发光区域所发出光束的最大发散角度。 In some embodiments, the flood light emitting area is a box that surrounds the pattern light emitting area in a circle outside the pattern light emitting area, and a minimum distance between the flood light emitting area and the pattern light emitting area. The size of D satisfies the condition
Figure PCTCN2018106944-appb-000001
Where H is the distance between the light emitting surface of the light source structure and the first optical element arranged sequentially above the light source structure, and θ is the maximum divergence angle of the light beam emitted from the flood light emitting area and the pattern light emitting area.
在某些实施方式中，还包括泛光发射部，所述泛光发射部包括形成在泛光发光半导体基底上的发光体及导光板，所述导光板包括入光面及出光面，所述泛光发光半导体基底对应导光板的入光面设置，所述发光体朝向导光板的入光面发出光束，所述发光体发出的光束从入光面射入导光板内均匀混合后从出光面投射出光强均匀的光束，所述形成有多个不规则分布发光单元的半导体基底设置在导光板出光面的中间位置以发出具有多个不规则分布的子光束的光束群集。In some embodiments, it further includes a flood light emitting part, which includes a light emitter and a light guide plate formed on a flood light emitting semiconductor substrate, and the light guide plate includes a light entrance surface and a light exit surface. The flood light-emitting semiconductor substrate is disposed corresponding to the light incident surface of the light guide plate. The luminous body emits a light beam toward the light incident surface of the light guide plate. The light beam emitted by the light emitting body enters the light guide plate from the light incident surface and is uniformly mixed from the light emitting surface. A light beam with uniform light intensity is projected, and the semiconductor substrate formed with a plurality of irregularly distributed light-emitting units is disposed at a middle position on a light exit surface of a light guide plate to emit a light beam cluster having a plurality of irregularly distributed sub-beams.
在某些实施方式中，所述发光体为垂直腔面发射激光器。In some embodiments, the light emitter is a vertical cavity surface emitting laser.
本实用新型实施方式还提供一种光学投影模组，用于投射预设图案至被测目标物上进行感测，其包括光束调制元件及如上述实施方式所述的光源结构。所述光束调制元件对所述光源结构所发出的光束进行调制以形成能够在被测目标物上投射出不规则分布光斑图案的图案光束。An embodiment of the present invention further provides an optical projection module for projecting a predetermined pattern onto a measured target for sensing. The optical projection module includes a light beam modulation element and the light source structure according to the foregoing embodiment. The light beam modulation element modulates the light beam emitted by the light source structure to form a pattern light beam capable of projecting an irregularly distributed light spot pattern on a measured target object.
在某些实施方式中，所述光束调制元件包括准直透镜和/或扩束元件以及衍射光学元件。所述准直透镜和/或扩束元件及图案化元件设置在光源结构的出光光路上。所述准直透镜和/或扩束元件对所述光源结构发出的光束进行调整使其基本保持准直并满足预设的出光孔径要求。所述图案化元件将光源结构发出的具有多个不规则分布的子光束的光束群集进行重新排布以形成能够在被测目标物上投射出数量更多的不规则分布光斑图案的图案光束。In some embodiments, the beam modulation element includes a collimating lens and / or a beam expanding element and a diffractive optical element. The collimating lens and / or the beam-expanding element and the patterning element are disposed on a light exiting light path of the light source structure. The collimating lens and / or the beam-expanding element adjusts the light beam emitted by the light source structure to substantially keep collimation and meet a preset light output aperture requirement. The patterning element rearranges a light beam cluster having a plurality of irregularly distributed sub-beams emitted from the light source structure to form a patterned beam capable of projecting a larger number of irregularly distributed light spot patterns on the measured object.
在某些实施方式中，所述光束调制元件包括扩散部及图案化部，所述扩散 部对应光源结构的泛光发光区域或泛光发射部进行设置，用于将所述泛光发光区域或泛光发射部所发出的光束扩散形成光强均匀分布的泛光光束，所述图案化部对应光源结构的图案光发光区域进行设置，用于将所述图案光发光区域发出的光束的光场进行重新排布形成能够在被测目标物上投射出不规则分布光斑图案的图案光束。In some embodiments, the light beam modulation element includes a diffusing portion and a patterning portion, and the diffusing portion is disposed corresponding to a flood light emitting area or a flood light emitting portion of a light source structure, and is configured to convert the flood light emitting area or The light beam emitted by the flood light emitting part diffuses to form a flood light beam with uniform light intensity distribution, and the patterning part is set corresponding to the pattern light emitting area of the light source structure, and is used to set the light field of the light beam emitted from the pattern light emitting area. The rearrangement is performed to form a pattern light beam capable of projecting irregularly distributed light spot patterns on the measured object.
在某些实施方式中，所述光束调制元件的图案化部及扩散部形成在同一个透明基板上；或In some embodiments, the patterned portion and the diffusion portion of the beam modulation element are formed on the same transparent substrate; or
所述光束调制元件的扩散部和图案化部分别形成在不同的透明基板上，所述形成有图案化部的透明基板定义为图案化基板，所述扩散基板与图案化部对应的区域保持透光，所述图案化基板与扩散部对应的区域保持透光。The diffusion portion and the patterned portion of the beam modulation element are formed on different transparent substrates respectively. The transparent substrate on which the patterned portion is formed is defined as a patterned substrate, and a region corresponding to the diffusion substrate and the patterned portion remains transparent. Light, and the area corresponding to the diffused portion of the patterned substrate remains transparent.
在某些实施方式中，所述图案化部的功能通过在透明基板上的对应位置形成特定的图案化光学纹路来实现，所述图案化光学纹路选自衍射光学纹路、光学微透镜阵列、光栅中的一种及其组合。In some embodiments, the function of the patterning portion is achieved by forming a specific patterned optical texture at a corresponding position on a transparent substrate, and the patterned optical texture is selected from a diffractive optical texture, an optical microlens array, and a grating. One of them and their combination.
在某些实施方式中，所述光学投影模组还包括光路导向元件，所述光路导向元件设置在光源结构与光束调制元件之间并与所述光源结构的第一发射部的出光面对应的位置处，所述光路导向元件用于将第一发射部呈发散状出射的第一光束引导照射到所述光束调制元件的扩散部。In some embodiments, the optical projection module further includes a light path guiding element, the light path guiding element is disposed between the light source structure and the beam modulation element and corresponds to a light emitting surface of a first emitting portion of the light source structure. At the position, the light path guiding element is configured to guide and irradiate the first light beam emitted from the first emitting portion in a divergent shape to the diffusion portion of the light beam modulation element.
本实用新型实施方式还提供一种感测装置，用于感测被测目标物的三维信息，其包括如上述实施方式所述的光学投影模组及感测模组。所述感测模组用于感测所述光学模组在被测目标物上投射的预设图案并通过分析所述预设图案的图像获取被测标的物的三维信息。An embodiment of the present invention further provides a sensing device for sensing three-dimensional information of a measured object, which includes the optical projection module and the sensing module as described in the above embodiment. The sensing module is configured to sense a preset pattern projected by the optical module on a measured target object and obtain three-dimensional information of the measured target object by analyzing an image of the preset pattern.
本实用新型实施方式还提供一种设备，包括如上述实施方式所述的感测装置。所述设备根据所述感测装置所感测到的被测目标物的三维信息来执行相应功能。An embodiment of the present invention further provides a device including the sensing device according to the foregoing embodiment. The device performs a corresponding function according to the three-dimensional information of the detected target object sensed by the sensing device.
本实用新型实施方式所提供的光源结构、光学投影模组、感测装置及设备通过计算机进行模拟和筛选以确定能够在较小的发光区域范围内最大限度地提 高不同发光单元局部区域之间的不相关性，使得投射在被测目标物上的不规则分布光斑能够更快速地定位到标准不规则分布光斑图案上唯一对应的光斑点，从而提高三维感测的效率。The light source structure, the optical projection module, the sensing device and the device provided by the embodiments of the present utility model are simulated and screened by a computer to determine that the area between different light emitting unit local areas can be maximized within a small light emitting area. The irrelevance makes the irregularly distributed light spots projected on the measured object more quickly locate the only corresponding light spot on the standard irregularly distributed light spot pattern, thereby improving the efficiency of three-dimensional sensing.
本实用新型实施方式的附加方面和优点将在下面的描述中部分给出，部分将从下面的描述中变得明显，或通过本实用新型实施方式的实践了解到。Additional aspects and advantages of the embodiments of the present invention will be given in the following description, and part of them will become apparent from the following description, or be learned through the practice of the embodiments of the present invention.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1是本实用新型第一实施方式提供的光源结构的俯视图。FIG. 1 is a top view of a light source structure provided by a first embodiment of the present invention.
图2是图1中所述不规则发光单元的坐标位置示意图。FIG. 2 is a schematic diagram of coordinate positions of the irregular light-emitting unit described in FIG. 1.
图3是本实用新型第二实施方式提供的光源结构的俯视图。3 is a top view of a light source structure provided by a second embodiment of the present invention.
图4是本实用新型第二实施方式中所述泛光发光区域另一种结构的示意图。FIG. 4 is a schematic diagram of another structure of the flood light emitting area according to the second embodiment of the present invention.
图5是本实用新型第三实施方式提供的光源结构的俯视图。FIG. 5 is a top view of a light source structure provided by a third embodiment of the present invention.
图6是图5中的光源结构沿VI-VI线的剖视图。FIG. 6 is a cross-sectional view of the light source structure in FIG. 5 taken along line VI-VI.
图7是本实用新型第四实施方式提供的光源结构的俯视图。FIG. 7 is a top view of a light source structure provided by a fourth embodiment of the present invention.
图8是图7中的光源结构沿VIII-VIII线的剖视图。FIG. 8 is a cross-sectional view of the light source structure in FIG. 7 along the line VIII-VIII.
图9是本实用新型第五实施方式提供的光学投影模组的结构示意图。FIG. 9 is a schematic structural diagram of an optical projection module according to a fifth embodiment of the present invention.
图10是本实用新型第六实施方式提供的光学投影模组的结构示意图。FIG. 10 is a schematic structural diagram of an optical projection module according to a sixth embodiment of the present invention.
图11是本实用新型第七实施方式提供的光学投影模组的结构示意图。FIG. 11 is a schematic structural diagram of an optical projection module according to a seventh embodiment of the present invention.
图12是本实用新型第八实施方式提供的光学投影模组的结构示意图。FIG. 12 is a schematic structural diagram of an optical projection module according to an eighth embodiment of the present invention.
图13是本实用新型第九实施方式提供的感测装置的结构示意图。FIG. 13 is a schematic structural diagram of a sensing device according to a ninth embodiment of the present invention.
图14是本实用新型第十实施方式提供的设备的结构示意图。14 is a schematic structural diagram of a device provided by a tenth embodiment of the present invention.
具体实施方式detailed description
下面详细描述本实用新型的实施方式，所述实施方式的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施方式是示例性的，仅用于解释本实用新 型，而不能理解为对本实用新型的限制。在本实用新型的描述中，需要理解的是，术语“第一”、“第二”仅用于描述，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量或排列顺序。由此，限定有“第一”、“第二”的技术特征可以明示或者隐含地包括一个或者更多个所述技术特征。在本实用新型的描述中，“多个”的含义是两个或两个以上，除非另有明确具体的限定。Hereinafter, embodiments of the present invention will be described in detail. Examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the drawings are exemplary, and are only used to explain the present utility model, and should not be construed as limiting the present utility model. In the description of the present utility model, it should be understood that the terms "first" and "second" are only used for description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or Order. Therefore, the technical features defined as “first” and “second” may explicitly or implicitly include one or more of the technical features. In the description of the present invention, the meaning of "a plurality" is two or more, unless it is specifically and specifically defined otherwise.
在本实用新型的描述中，需要说明的是，除非另有明确的规定或限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体化连接；可以是机械连接，也可以是电连接或相互通信；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件之间的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本实用新型中的具体含义。In the description of the present utility model, it should be noted that the terms "installation", "connected", and "connected" should be understood in a broad sense unless otherwise specified or limited. For example, they may be fixed connections or may be connected. Disassembly connection, or integrated connection; it can be mechanical connection, electrical connection or mutual communication; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication between two components or between two components Interaction. For those of ordinary skill in the art, the specific meanings of the above terms in the present utility model can be understood according to specific situations.
下文的公开提供了许多不同的实施方式或示例用来实现本实用新型的不同结构。为了简化本实用新型的公开，下文仅对特定例子的部件和设定进行描述。当然，它们仅仅为示例，并且目的不在于限制本实用新型。此外，本实用新型可以在不同例子中重复使用参考数字和/或参考字母，这种重复使用是为了简化和清楚地表述本实用新型，其本身不指示所讨论的各种实施方式和/或设定之间的特定关系。此外，本实用新型在下文描述中所提供的各种特定的工艺和材料仅为实现本实用新型技术方案的示例，但是本领域普通技术人员应该意识到本实用新型的技术方案也可以通过下文未描述的其他工艺和/或其他材料来实现。The following disclosure provides many different implementations or examples for implementing different structures of the present invention. To simplify the disclosure of the present invention, only the components and settings of specific examples are described below. Of course, they are merely examples and are not intended to limit the present invention. In addition, the present invention may repeatedly use reference numerals and / or reference letters in different examples. Such reuse is to simplify and clearly describe the present invention, and does not itself indicate the various embodiments and / or devices discussed. Specific relationship between the two. In addition, the various specific processes and materials provided in the following description of the present utility model are merely examples for implementing the technical solution of the present utility model, but those skilled in the art should realize that the technical solution of the present utility model can also be implemented through Other processes and / or other materials described.
进一步地，所描述的特征、结构可以以任何合适的方式结合在一个或更多实施方式中。在下文的描述中，提供许多具体细节以便能够充分理解本实用新型的实施方式。然而，本领域技术人员应意识到，即使没有所述特定细节中的一个或更多，或者采用其它的结构、组元等，也可以实践本实用新型的技术方案。在其它情况下，不详细示出或描述公知结构或者操作以避免模糊本实用新型之重点。Further, the described features and structures may be combined in any suitable manner in one or more embodiments. In the following description, many specific details are provided in order to fully understand the embodiments of the present invention. However, those skilled in the art should realize that the technical solution of the present invention can be practiced even without one or more of the specific details, or other structures, components, and the like. In other instances, well-known structures or operations are not shown or described in detail to avoid obscuring the focus of the present invention.
如图1所示，本实用新型第一实施方式提供了一种光源结构1，用于发射具有多个不规则分布的子光束的光束群集至一被测目标物上形成对应的不规则分布光斑图案以进行感测识别。所述光束根据感测原理及应用场景可以为具有特定波长的光束。在本实施方式中，所述光束用于实现人脸识别，可以为红外或近红外波长光束，波长范围为750纳米(Nanometer,nm)至1650nm。As shown in FIG. 1, the first embodiment of the present invention provides a light source structure 1 for emitting a light beam cluster with a plurality of irregularly distributed sub-beams to form a corresponding irregularly distributed light spot on a measured object. Pattern for sensory recognition. The light beam may be a light beam having a specific wavelength according to a sensing principle and an application scenario. In this embodiment, the light beam is used to realize face recognition, and may be an infrared or near-infrared wavelength light beam with a wavelength range of 750 nanometers (Nanometer, nm) to 1650 nm.
所述光源结构1包括半导体基底10及形成在所述半导体基底10上的多个不规则分布的发光单元12。所述发光单元12通过光刻、蚀刻和/或金属有机化学气相沉积等工艺形成在所述半导体基底10上。所述半导体基底10的发光表面上定义出一图案光发光区域14。所述发光单元12分布在该图案光发光区域14内。所述发光单元12在该图案发光区域14内的分布位置在满足有限的发光区域面积、发光单元孔径、发光单元间距的条件下使得图案光发光区域14内不同位置的发光单元12之间的不相关性尽可能地高，以提高对不规则分布光斑进行搜索定位的计算效率。The light source structure 1 includes a semiconductor substrate 10 and a plurality of irregularly distributed light emitting units 12 formed on the semiconductor substrate 10. The light emitting unit 12 is formed on the semiconductor substrate 10 by processes such as photolithography, etching, and / or metal organic chemical vapor deposition. A patterned light emitting region 14 is defined on the light emitting surface of the semiconductor substrate 10. The light emitting units 12 are distributed in the pattern light emitting area 14. The distribution positions of the light-emitting units 12 in the pattern light-emitting area 14 satisfy the conditions of limited light-emitting area area, light-emitting unit aperture, and light-emitting unit spacing, so that the light-emitting units 12 at different positions in the pattern light-emitting area 14 have different positions. The correlation is as high as possible to improve the calculation efficiency of searching and locating the irregularly distributed light spots.
所述发光单元12在图案光发光区域14内的位置通过设定筛选条件利用计算机对模拟出来的多个不规则分布的发光单元12位置图案模板进行筛选来确定。根据在满足上述预设条件下尽可能提高发光单元12之间不相关性的原则，所设定的筛选条件包括：The position of the light emitting unit 12 in the pattern light emitting area 14 is determined by setting a screening condition and using a computer to screen a plurality of simulated irregularly distributed light emitting unit 12 position pattern templates. According to the principle of maximizing the irrelevance between the light-emitting units 12 under the above-mentioned preset conditions, the set screening conditions include:
1.在所述不规则分布的发光单元12位置图案中按照预设面积任意指定搜索块，该搜索块从原先所在的位置在多个重复拼接的不规则分布发光单元12位置图案所组成的大图中移动预设的搜索范围所搜索到的发光单元12分布图案在满足预设的像素缺失率的条件下都是唯一的。所述预设搜索范围为沿相同方向，比如：沿相邻的不规则分布发光单元12位置图案的中心点的连线，移动预设距离所覆盖的范围。所述预设距离小于或等于相邻的所述不规则分布发光单元12位置图案的中心点之间的距离。所述搜索块的预设面积可以以对所述不规则分布的发光单元12所投射出的不规则分布光斑图案进行成像的感测器上的像素单元为单位，比如：所述搜索块可以为30个像素单位乘以30个像素单位的大 小。1. Arbitrarily designate a search block according to a preset area in the irregularly distributed light-emitting unit 12 position pattern, and the search block is composed of a plurality of repeatedly stitched irregularly-distributed light-emitting unit 12 position patterns from the original location. The distribution pattern of the light-emitting unit 12 searched by moving the preset search range in the figure is unique under the condition that the preset pixel missing rate is satisfied. The preset search range is a range covered by moving the preset distance in the same direction, for example, along the line connecting the center points of the position patterns of the light emitting units 12 adjacent to the irregular distribution. The preset distance is less than or equal to the distance between the central points of the position patterns of the randomly distributed light-emitting unit 12 adjacent to each other. The preset area of the search block may be a pixel unit on a sensor that images the irregularly distributed light spot pattern projected by the irregularly distributed light emitting unit 12, for example, the search block may be The size of 30 pixel units multiplied by 30 pixel units.
2.对于每一个备选的所述不规则分布的发光单元12位置图案，按照预设面积任意指定的所述搜索块以所述像素单元为单位遍历所述不规则分布的发光单元12位置图案来获取多幅预设面积大小的发光单元12分布图案。2. For each candidate of the irregularly distributed light emitting unit 12 position pattern, the search block arbitrarily designated according to a preset area traverses the irregularly distributed light emitting unit 12 position pattern in units of the pixel unit. To obtain a plurality of distribution patterns of the light-emitting units 12 with a predetermined area size.
排除掉所述搜索块本身区域内以及在其周围移动预设的排除范围内获取的发光单元12分布图案，上述获取的其他发光单元12分布图案与所述搜索块本身区域内的发光单元12分布图案一一相比较得出对应的汉明距离。所述排除范围为搜索块本身向各个方向移动一个发光单元12的距离所遍及的范围。所述汉明距离为表达两幅发光单元12分布图案相似程度的参数。所述两幅发光单元12分布图案之间每差异一个发光单元12的位置即增加一个汉明距离值，也就是说其中一幅发光单元12分布图案改变汉明距离值对应个数的发光单元12的位置即可得到另一幅发光单元12分布图案。Exclude the distribution patterns of the light-emitting units 12 obtained in the search block itself region and within a preset exclusion range moved around by it, and the distribution patterns of the other light-emitting units 12 obtained above and the distribution of the light-emitting units 12 in the search block region itself The patterns are compared one by one to get the corresponding Hamming distance. The excluded range is a range covered by a distance that the search block itself moves one light emitting unit 12 in various directions. The Hamming distance is a parameter expressing the degree of similarity between the distribution patterns of the two light-emitting units 12. For each difference between the two light emitting unit 12 distribution patterns, a position of one light emitting unit 12 is increased by a Hamming distance value, that is, one of the light emitting unit 12 distribution patterns changes the number of light emitting units 12 corresponding to the Hamming distance value. Position, another distribution pattern of the light-emitting units 12 can be obtained.
比较每一个备选的所述不规则分布的发光单元12位置图案经过上述搜索和比较后获取的各自的最小汉明距离，择优选择其中的最大值所对应的不规则分布发光单元12位置图案。Each of the candidate positions of the irregularly distributed light-emitting unit 12 positions is compared with the respective minimum Hamming distance obtained after the above search and comparison, and the irregularly-distributed light-emitting unit 12 position pattern corresponding to the maximum value is selected optimally.
3.在满足上述根据最小汉明距离择优选择的条件同时，兼顾择优选择发光单元12分布密度相对高的分布图案，从而可以尽量缩小所耗费的半导体基底10的大小，减少制造成本。3. While satisfying the above-mentioned conditions for optimal selection based on the minimum Hamming distance, and taking into account the optimal selection of a distribution pattern with a relatively high distribution density of the light emitting units 12, the size of the consumed semiconductor substrate 10 can be minimized and the manufacturing cost can be reduced.
4.上述择优选择的发光单元12的分布密度还需要满足制作工艺所能制作出来的相邻发光单元12的最小间距。4. The distribution density of the light-emitting units 12 selected as described above also needs to satisfy the minimum distance between adjacent light-emitting units 12 that can be produced by the manufacturing process.
如图2所示，经过计算机模拟和筛选后可以确定所述每个不规则分布的发光单元12在所述图案光发光区域14内的位置坐标的取值范围。在本实施方式中，所述图案光发光区域14为矩形。所述发光单元12的个数，例如，为一百个。现以所述图案光发光区域14左下顶点为原点O，相交于左下角的两条直角边延展方向分别为横坐标轴X和纵坐标轴Y，长度单位为微米(Micrometer,μm)，所述一百个发光单元12的中心点的坐标值的范围如下： P1([165.84,175.26],[153.24,162.66])；P2([141.54,150.96],[140.64,150.06])；P3([184.74,194.16],[173.04,182.46])；P4([171.24,180.66],[86.64,96.06])；P5([198.24,207.66],[84.84,94.26])；P6([207.24,216.66],[189.24,198.66])；P7([226.14,235.56],[169.44,178.86])；P8([120.84,130.26],[215.34,224.76])；P9([209.04,218.46],[36.24,45.66])；P10([182.04,191.46],[34.44,43.86])；P11([5.64,15.06],[148.74,158.16])；P12([91.14,100.56],[89.34,98.76])；P13([166.74,176.16],[56.94,66.36])；P14([182.04,191.46],[7.44,16.86])；P15([101.04,110.46],[249.54,258.96])；P16([115.44,124.86],[147.84,157.26])；P17([222.54,231.96],[103.74,113.16])；P18([66.84,76.26],[102.84,112.26])；P19([338.64,348.06],[103.74,113.16])；P20([242.34,251.76],[64.14,73.56])；P21([41.64,51.06],[114.54,123.96])；P22([60.54,69.96],[75.84,85.26])；P23([196.44,205.86],[272.04,281.46])；P24([249.54,258.96],[109.14,118.56])；P25([103.74,113.16],[276.54,285.96])；P26([187.44,196.86],[245.94,255.36])；P27([22.74,32.16],[186.54,195.96])；P28([35.34,44.76],[162.24,171.66])；P29([17.34,26.76],[90.24,99.66])；P30([17.34,26.76],[63.24,72.66])；P31([66.84,76.26],[215.34,224.76])；P32([257.64,267.06],[11.94,21.36])；P33([44.34,53.76],[230.64,240.06])；P34([222.54,231.96],[263.04,272.46])；P35([107.34,116.76],[66.84,76.26])；P36([1.14,10.56],[270.24,279.66])；P37([135.24,144.66],[62.34,71.76])；P38([30.84,40.26],[38.94,48.36])；P39([20.94,30.36],[245.04,254.46])；P40([72.24,81.66],[129.84,139.26])；P41([0.24,9.66],[214.44,223.86])；P42([275.64,285.06],[101.94,111.36])；P43([322.44,331.86],[156.84,166.26])；P44([88.44,97.86],[27.24,36.66])；P45([47.94,57.36],[257.64,267.06])；P46([271.14,280.56],[276.54,285.96])；P47([3.84,13.26],[32.64,42.06])；P48([56.04,65.46],[29.04,38.46])；P49([38.04,47.46],[8.34,17.76])；P50([83.04,92.46],[54.24,63.66])；P51([170.34,179.76],[125.34,134.76])；P52([194.64,204.06],[137.94,147.36])； P53([151.44,160.86],[105.54,114.96])；P54([164.94,174.36],[191.94,201.36])；P55([137.94,147.36],[193.74,203.16])；P56([128.94,138.36],[89.34,98.76])；P57([110.04,119.46],[109.14,118.56])；P58([215.34,224.76],[63.24,72.66])；P59([127.14,136.56],[242.34,251.76])；P60([154.14,163.56],[244.14,253.56])；P61([330.54,339.96],[129.84,139.26])；P62([245.04,254.46],[189.24,198.66])；P63([169.44,178.86],[221.64,231.06])；P64([154.14,163.56],[271.14,280.56])；P65([235.14,244.56],[29.04,38.46])；P66([220.74,230.16],[130.74,140.16])；P67([113.64,123.06],[174.84,184.26])；P68([269.34,278.76],[175.74,185.16])；P69([0,6.96],[174.84,184.26])；P70([93.84,103.26],[214.44,223.86])；P71([294.54,303.96],[164.04,173.46])；P72([275.64,285.06],[202.74,212.16])；P73([139.74,149.16],[6.54,15.96])；P74([86.64,96.06],[169.44,178.86])；P75([232.44,241.86],[2.04,11.46])；P76([148.74,158.16],[32.64,42.06])；P77([313.44,322.86],[92.04,101.46])；P78([300.84,310.26],[116.34,125.76])；P79([318.84,328.26],[188.34,197.76])；P80([318.84,328.26],[215.34,224.76])；P81([269.34,278.76],[63.24,72.66])；P82([78.54,87.96],[266.64,276.06])；P83([291.84,301.26],[47.94,57.36])；P84([113.64,123.06],[15.54,24.96])；P85([228.84,238.26],[211.74,221.16])；P86([335.04,344.46],[8.34,17.76])；P87([200.94,210.36],[216.24,225.66])；P88([305.34,314.76],[239.64,249.06])；P89([315.24,324.66],[33.54,42.96])；P90([263.94,273.36],[148.74,158.16])；P91([335.94,345.36],[64.14,73.56])；P92([60.54,69.96],[176.64,186.06])；P93([13.74,23.16],[121.74,131.16])；P94([247.74,257.16],[251.34,260.76])；P95([288.24,297.66],[20.94,30.36])；P96([65.04,74.46],[2.04,11.46])；P97([332.34,341.76],[245.94,255.36])；P98([280.14,289.56],[249.54,258.96])；P99([298.14,307.56],[270.24,279.66])；P100([253.14,262.56],[224.34,233.76])。As shown in FIG. 2, after computer simulation and screening, the value range of the position coordinates of each irregularly distributed light emitting unit 12 in the pattern light emitting area 14 can be determined. In this embodiment, the pattern light emitting region 14 is rectangular. The number of the light-emitting units 12 is, for example, one hundred. The lower left vertex of the patterned light emitting region 14 is now the origin O, and the extension directions of the two right-angled sides that intersect at the lower left corner are the abscissa axis X and the ordinate axis Y, respectively, and the length unit is micrometer (μm). The range of the coordinate values of the center point of one hundred light-emitting units 12 is as follows: P1 ([165.84,175.26], [153.24,162.66]); P2 ([141.54,150.96], [140.64,150.06]); P3 ([184.74 , 194.16], [173.04,182.46]); P4 ([171.24,180.66], [86.64,96.06]); P5 ([198.24,207.66], [84.84,94.26]); P6 ([207.24,216.66], [ 189.24,198.66]); P7 ([226.14,235.56], [169.44,178.86]); P8 ([120.84,130.26], [215.34,224.76]); P9 ([209.04,218.46], [36.24,45.66]) ; P10 ([182.04,191.46], [34.44,43.86]); P11 ([5.64,15.06], [148.74,158.16]); P12 ([91.14,100.56], [89.34,98.76]); P13 ([166.74 , 176.16], [56.94,66.36]); P14 ([182.04,191.46], [7.44,16.86]); P15 ([101.04,110.46], [249.54,258.96]); P16 ([115.44,124.86], [ 147.84,157.26]); P17 ([222.54,231.96], [103.74,113.16]); P18 ([66.84,76.26], [102.84,112.26]); P19 ([338.64,348.06], [103.74,113.16]) ; P20 ([242.34,251.76], [64.14,7 3.56]); P21 ([41.64,51.06], [114.54,123.96]); P22 ([60.54,69.96], [75.84,85.26]); P23 ([196.44,205.86], [272.04,281.46]); P24 ([249.54,258.96], [109.14,118.56]); P25 ([103.74,113.16], [276.54,285.96]); P26 ([187.44,196.86], [245.94,255.36]); P27 ([22.74,32.16] ], [186.54,195.96]); P28 ([35.34,44.76], [162.24,171.66]); P29 ([17.34,26.76], [90.24,99.66]); P30 ([17.34,26.76], [63.24, 72.66]); P31 ([66.84,76.26], [215.34,224.76]); P32 ([257.64,267.06], [11.94,21.36]); P33 ([44.34,53.76], [230.64,240.06]); P34 ([222.54,231.96], [263.04,272.46]); P35 ([107.34,116.76], [66.84,76.26]); P36 ([1.14,10.56], [270.24,279.66]); P37 ([135.24,144.66] ], [62.34,71.76]); P38 ([30.84,40.26], [38.94,48.36]); P39 ([20.94,30.36], [245.04,254.46]); P40 ([72.24,81.66], [129.84, 139.26]); P41 ([0.24,9.66], [214.44,223.86]); P42 ([275.64,285.06], [101.94,111.36]); P43 ([322.44,331.86], [156.84,166.26]); P44 ([88.44,97.86], [27.24,36.66]); P45 ([47.94,57.36], [257.64,267.06]); P46 ([271.14,280.56], [276.54,285.96]); P47 ([3.84,13.26 ], [32.64,42 .06]); P48 ([56.04,65.46], [29.04,38.46]); P49 ([38.04,47.46], [8.34,17.76]); P50 ([83.04,92.46], [54.24,63.66]); P51 ([170.34,179.76], [125.34,134.76]); P52 ([194.64,204.06], [137.94,147.36]); P53 ([151.44,160.86], [105.54,114.96]); P54 ([164.94, 174.36], [191.94,201.36]); P55 ([137.94,147.36], [193.74,203.16]); P56 ([128.94,138.36], [89.34,98.76]); P57 ([110.04,119.46], [109.14 , 118.56]); P58 ([215.34,224.76], [63.24,72.66]); P59 ([127.14,136.56], [242.34,251.76]); P60 ([154.14,163.56], [244.14,253.56]); P61 ([330.54,339.96], [129.84,139.26]); P62 ([245.04,254.46], [189.24,198.66]); P63 ([169.44,178.86], [221.64,231.06]); P64 ([154.14, 163.56], [271.14,280.56]); P65 ([235.14,244.56], [29.04,38.46]); P66 ([220.74,230.16], [130.74,140.16]); P67 ([113.64,123.06], [174.84 , 184.26]); P68 ([269.34,278.76], [175.74,185.16]); P69 ([0,6.96], [174.84,184.26]); P70 ([93.84,103.26], [214.44,223.86]); P71 ([294.54,303.96], [164.04,173.46]); P72 ([275.64,285.06], [202.74,212.16]); P73 ([139.74,149.16], [6.54,15.96]); P74 ([86 .64,96.06], [169.44,178.86]); P75 ([232.44,241.86], [2.04,11.46]); P76 ([148.74,158.16], [32.64,42.06]); P77 ([313.44,322.86] , [92.04,101.46]); P78 ([300.84,310.26], [116.34,125.76]); P79 ([318.84,328.26], [188.34,197.76]); P80 ([318.84,328.26], [215.34,224.76 ]); P81 ([269.34,278.76], [63.24,72.66]); P82 ([78.54,87.96], [266.64,276.06]); P83 ([291.84,301.26], [47.94,57.36]); P84 ( [113.64,123.06], [15.54,24.96]); P85 ([228.84,238.26], [211.74,221.16]); P86 ([335.04,344.46], [8.34,17.76]); P87 ([200.94,210.36] , [216.24,225.66]); P88 ([305.34,314.76], [239.64,249.06]); P89 ([315.24,324.66], [33.54,42.96]); P90 ([263.94,273.36], [148.74,158.16 ]); P91 ([335.94,345.36], [64.14,73.56]); P92 ([60.54,69.96], [176.64,186.06]); P93 ([13.74,23.16], [121.74,131.16]); P94 ( [247.74,257.16], [251.34,260.76]); P95 ([288.24,297.66], [20.94,30.36]); P96 ([65.04,74.46], [2.04,11.46]); P97 ([332.34,341.76] , [245.94,255.36]); P98 ([280.14,289.56], [249.54,258.96]); P99 ([298.14,307.56], [270.24,279.66]); P100 ([253.14,262.56], [224.3 4,233.76]).
优选地，所述一百个发光单元12的中心点的坐标值为：P1(170.55,157.95)；P2(146.25,145.35)；P3(189.45,177.75)；P4(175.95,91.35)；P5(202.95,89.55)； P6(211.95,193.95)；P7(230.85,174.15)；P8(125.55,220.05)；P9(213.75,40.95)；P10(186.75,39.15)；P11(10.35,153.45)；P12(95.85,94.05)；P13(171.45,61.65)；P14(186.75,12.15)；P15(105.75,254.25)；P16(120.15,152.55)；P17(227.25,108.45)；P18(71.55,107.55)；P19(343.35,108.45)；P20(247.05,68.85)；P21(46.35,119.25)；P22(65.25,80.55)；P23(201.15,276.75)；P24(254.25,113.85)；P25(108.45,281.25)；P26(192.15,250.65)；P27(27.45,191.25)；P28(40.05,166.95)；P29(22.05,94.95)；P30(22.05,67.95)；P31(71.55,220.05)；P32(262.35,16.65)；P33(49.05,235.35)；P34(227.25,267.75)；P35(112.05,71.55)；P36(5.85,274.95)；P37(139.95,67.05)；P38(35.55,43.65)；P39(25.65,249.75)；P40(76.95,134.55)；P41(4.95,219.15)；P42(280.35,106.65)；P43(327.15,161.55)；P44(93.15,31.95)；P45(52.65,262.35)；P46(275.85,281.25)；P47(8.55,37.35)；P48(60.75,33.75)；P49(42.75,13.05)；P50(87.75,58.95)；P51(175.05,130.05)；P52(199.35,142.65)；P53(156.15,110.25)；P54(169.65,196.65)；P55(142.65,198.45)；P56(133.65,94.05)；P57(114.75,113.85)；P58(220.05,67.95)；P59(131.85,247.05)；P60(158.85,248.85)；P61(335.25,134.55)；P62(249.75,193.95)；P63(174.15,226.35)；P64(158.85,275.85)；P65(239.85,33.75)；P66(225.45,135.45)；P67(118.35,179.55)；P68(274.05,180.45)；P69(2.25,179.55)；P70(98.55,219.15)；P71(299.25,168.75)；P72(280.35,207.45)；P73(144.45,11.25)；P74(91.35,174.15)；P75(237.15,6.75)；P76(153.45,37.35)；P77(318.15,96.75)；P78(305.55,121.05)；P79(323.55,193.05)；P80(323.55,220.05)；P81(274.05,67.95)；P82(83.25,271.35)；P83(296.55,52.65)；P84(118.35,20.25)；P85(233.55,216.45)；P86(339.75,13.05)；P87(205.65,220.95)；P88(310.05,244.35)；P89(319.95,38.25)；P90(268.65,153.45)；P91(340.65,68.85)；P92(65.25,181.35)；P93(18.45,126.45)；P94(252.45,256.05)；P95(292.95,25.65)；P96(69.75,6.75)；P97(337.05,250.65)；P98(284.85,254.25)；P99(302.85,274.95)；P100(257.85,229.05)。Preferably, the coordinate values of the center points of the one hundred light-emitting units 12 are: P1 (170.55,157.95); P2 (146.25,145.35); P3 (189.45,177.75); P4 (175.95,91.35); P5 (202.95 , 89.55); P6 (211.95, 193.95); P7 (230.85, 174.15); P8 (125.55, 220.05); P9 (213.75, 40.95); P10 (186.75, 39.15); P11 (10.35, 153.45); P12 (95.85, 94.05); P13 (171.45,61.65); P14 (186.75,12.15); P15 (105.75,254.25); P16 (120.15,152.55); P17 (227.25,108.45); P18 (71.55,107.55); P19 (343.35,108.45) ); P20 (247.05, 68.85); P21 (46.35, 119.25); P22 (65.25, 80.55); P23 (201.15, 276.75); P24 (254.25, 113.85); P25 (108.45, 281.25); P26 (192.15, 250.65) ; P27 (27.45,191.25); P28 (40.05,166.95); P29 (22.05,94.95); P30 (22.05,67.95); P31 (71.55,220.05); P32 (262.35,16.65); P33 (49.05,235.35); P34 (227.25,267.75); P35 (112.05,71.55); P36 (5.85,274.95); P37 (139.95,67.05); P38 (35.55,43.65); P39 (25.65,249.75); P40 (76.95,134.55); P41 (4.95,219.15); P42 (280.35,106.65); P43 (327.15,161.55); P44 (93.15,31.95); P45 (52.65,262.35); P46 (275.85,281.25); P47 (8.5 5,37.35); P48 (60.75,33.75); P49 (42.75,13.05); P50 (87.75,58.95); P51 (175.05,130.05); P52 (199.35,142.65); P53 (156.15,110.25); P54 (169.65 , 196.65); P55 (142.65, 198.45); P56 (133.65, 94.05); P57 (114.75, 113.85); P58 (220.05, 67.95); P59 (131.85, 247.05); P60 (158.85, 248.85); P61 (335.25, 134.55); P62 (249.75,193.95); P63 (174.15,226.35); P64 (158.85,275.85); P65 (239.85,33.75); P66 (225.45,135.45); P67 (118.35,179.55); P68 (274.05,180.45) ); P69 (2.25,179.55); P70 (98.55,219.15); P71 (299.25,168.75); P72 (280.35,207.45); P73 (144.45,11.25); P74 (91.35,174.15); P75 (237.15,6.75) ; P76 (153.45,37.35); P77 (318.15,96.75); P78 (305.55,121.05); P79 (323.55,193.05); P80 (323.55,220.05); P81 (274.05,67.95); P82 (83.25,271.35); P83 (296.55,52.65); P84 (118.35,20.25); P85 (233.55,216.45); P86 (339.75,13.05); P87 (205.65,220.95); P88 (310.05,244.35); P89 (319.95,38.25); P90 (268.65,153.45); P91 (340.65,68.85); P92 (65.25,181.35); P93 (18.45,126.45); P94 (252.45,256.05); P95 (292.95,25.65); P96 (69.75 , 6.75); P97 (337.05, 250.65); P98 (284.85, 254.25); P99 (302.85, 274.95); P100 (257.85, 229.05).
所述发光单元12可以为半导体激光器。优选地，在本实施方式中，所述发光单元12为垂直腔面发射激光器(Vertical Cavity Surface Emitting Laser, VCSEL)。The light emitting unit 12 may be a semiconductor laser. Preferably, in this embodiment, the light emitting unit 12 is a vertical cavity surface emitting laser (Vertical Cavity Surface Emitting Laser, VCSEL).
所述光源结构1上的不规则发光单元12的排布位置通过计算机根据上述筛选原则进行模拟和筛选确定后能够在较小的发光区域范围内最大限度地提高不同发光单元12局部区域之间的不相关性，使得投射在被测目标物上的不规则分布光斑能够更快速地定位到标准不规则分布光斑图案上唯一对应的光斑点，从而提高三维感测的效率。The arrangement position of the irregular light-emitting units 12 on the light source structure 1 can be maximized within a small light-emitting area within a small light-emitting area after being determined and simulated by a computer according to the above screening principles. The irrelevance makes the irregularly distributed light spots projected on the measured object more quickly locate the only corresponding light spot on the standard irregularly distributed light spot pattern, thereby improving the efficiency of three-dimensional sensing.
可以理解的是，在其他实施方式中，还可以以上述图案光发光区域内确定坐标位置的一百个不规则排布的发光单元为基础发光单元分布图案，在所述图案光发光区域内加入或减少一个或多个发光单元，或者改变其中一个或多个发光单元的位置形成所述光源结构的多个不同的第一发光单元分布图案。只要上述通过增加或减少发光单元以及改变当前发光单元位置所形成的第一发光单元分布图案与所述基础发光单元分布图案之间的相似程度等于或者超过预设阈值则也可以实现相同的有益效果，也属于本实用新型所要求保护的范围。It can be understood that, in other embodiments, the one hundred irregularly arranged light-emitting units that determine coordinate positions in the above-mentioned pattern light-emitting area can also be used as a basic light-emitting unit distribution pattern, and added to the pattern light-emitting area. Either reduce one or more light emitting units, or change the position of one or more light emitting units to form a plurality of different first light emitting unit distribution patterns of the light source structure. As long as the degree of similarity between the first light-emitting unit distribution pattern formed by adding or reducing light-emitting units and changing the position of the current light-emitting unit and the basic light-emitting unit distribution pattern is equal to or exceeds a preset threshold, the same beneficial effects can also be achieved , Also belongs to the scope of protection claimed by the utility model.
所述相似程度的评估方式为对于上述在基础发光单元分布图案里通过加入或减少一个或多个发光单元或者改变一个或多个发光单元位置获得的第一发光单元图案经过有限次数不改变发光单元之间相关性的图形变换后获得与所述基础发光单元分布图案朝向一致且发光单元大小相同的第二发光单元图案。所述图形变换包括但不限于平移、旋转、左右镜像、上下镜像、180度翻转等。对于所述第二发光单元图案与所述基础发光单元分布图案运用归一化相关系数匹配法进行相似度计算，根据此相似度数值可判断所述第一图案与基础发光单元分布图案的相似程度，相似度数值为1对应着两者图案完全一样的情况，相似度数值为0对应两者图案完全不相同的情况。在本实施方式中，在该相似度数值等于或大于0.25的情况下所对应的第一发光单元分布图案与所述基础发光单元分布图案的相似程度可使得采用第一发光单元分布图案的光源结构获得相同的有益效果，因此所述相似程度的预设阈值为运用归一化相关系数匹配法计算得到的相似度数值0.25。The similarity is evaluated by adding or reducing one or more light-emitting units or changing the position of one or more light-emitting units in the basic light-emitting unit distribution pattern without changing the light-emitting units for a limited number of times. The second correlation pattern is transformed to obtain a second light-emitting unit pattern with the same orientation of the basic light-emitting unit distribution pattern and the same size of the light-emitting units. The graphic transformation includes, but is not limited to, translation, rotation, left-right mirroring, up-down mirroring, 180-degree flipping, and the like. A similarity calculation is performed on the second light-emitting unit pattern and the basic light-emitting unit distribution pattern by using a normalized correlation coefficient matching method. Based on the similarity value, the similarity between the first pattern and the basic light-emitting unit distribution pattern can be determined. , A similarity value of 1 corresponds to the case where the two patterns are completely the same, and a similarity value of 0 corresponds to a case where the two patterns are completely different. In this embodiment, when the similarity value is equal to or greater than 0.25, the degree of similarity between the corresponding first light emitting unit distribution pattern and the basic light emitting unit distribution pattern may enable a light source structure using the first light emitting unit distribution pattern. The same beneficial effect is obtained, so the preset threshold of the similarity value is a similarity value of 0.25 calculated by using a normalized correlation coefficient matching method.
如图3所示，本实用新型第二实施方式提供了一种光源结构2，其与第一实施方式中的光源结构1基本相同，其区别在于所述光源结构2还包括一个或多个泛光发光区域21。所述泛光发光区域21对称地围绕所述图案光发光区域24分布。每一个所述泛光发光区域21包括一个或多个发光体26。所述泛光发光区域21内的发光体26与所述图案光发光区域24内的发光单元22形成在同一个半导体基底20上并可分别被独立地控制发光。所述泛光发光区域21用于发出光强均匀分布的泛光光束。所述泛光光束投射至被测目标物上用于感测被测目标物的泛光图像。例如，所述泛光光束可用于感测所述被测目标物是否为人脸。As shown in FIG. 3, the second embodiment of the present invention provides a light source structure 2 that is basically the same as the light source structure 1 in the first embodiment. The difference is that the light source structure 2 further includes one or more general light sources. Light emitting region 21. The flood light emitting regions 21 are symmetrically distributed around the pattern light emitting regions 24. Each of the flood light emitting regions 21 includes one or more light emitting bodies 26. The light emitting body 26 in the flood light emitting area 21 and the light emitting unit 22 in the pattern light emitting area 24 are formed on the same semiconductor substrate 20 and can be independently controlled to emit light. The flood light emitting area 21 is used to emit a flood light beam with uniform light intensity distribution. The flood light beam is projected onto the measured target to sense a flood image of the measured target. For example, the flood light beam may be used to sense whether the measured target is a human face.
如图4所示，每一个所述泛光发光区域21内可形成有单个发光体26。所述单个发光体26可以为单孔宽面型VCSEL。所述单孔宽面型VCSEL只有一个发光孔，但发光孔径较大，数十倍于一般的VCSEL。所述单孔宽面型VCSEL的发光效果等同于发光强度均匀的面光源。所述单孔宽面型VCSEL的发光面形状可以为规则的形状，例如矩形，也可以为不规则的其他形状。在本实施方式中，所述泛光发光区域21分别对应设置在图案光发光区域24的边角处。所述泛光发光区域21的形状从外侧包围住所述图案光发光区域24边角的直角框条型。所述单孔宽面型VCSEL的发光面形状也可以为对应的所述直角框条形状。As shown in FIG. 4, a single light emitting body 26 may be formed in each of the flood light emitting areas 21. The single light emitter 26 may be a single-hole wide-area VCSEL. The single-hole wide-area VCSEL has only one light-emitting hole, but has a large light-emitting aperture, which is dozens of times that of a general VCSEL. The luminous effect of the single-hole wide-area VCSEL is equivalent to a surface light source with uniform luminous intensity. The shape of the light emitting surface of the single-hole wide-area VCSEL may be a regular shape, such as a rectangle, or may be other irregular shapes. In this embodiment, the flood light emitting areas 21 are respectively disposed at the corners of the pattern light emitting area 24. The shape of the flood light emitting area 21 is a right-angled frame strip shape that surrounds the corners of the pattern light emitting area 24 from the outside. The shape of the light emitting surface of the single-hole wide-area VCSEL may also be the shape of the corresponding right-angled frame.
如图3所示，每一个所述泛光发光区域内可形成有多个发光体。所述多个发光体按照预设的相同间隔均匀排布在泛光发光区域内。所述多个发光体可以为VCSEL。As shown in FIG. 3, a plurality of light emitting bodies may be formed in each of the flood light emitting areas. The plurality of light emitting bodies are uniformly arranged in the flood light emitting area according to a preset same interval. The plurality of light emitters may be a VCSEL.
所述泛光发光区域21所发出的光强均匀的光束经过设置在光源结构2出光光路上的光学元件的扩散混合后形成覆盖整个发射角度的泛光光束。The light beam with uniform light intensity emitted from the flood light emitting area 21 is diffused and mixed by optical elements disposed on the light path of the light source structure 2 to form a flood light beam covering the entire emission angle.
请一并参阅图5和图6所示，本实用新型第三实施方式提供了一种光源结构3，其与第一实施方式中的光源结构1基本相同，其区别在于所述泛光发光区域31为在所述图案光发光区域34外包围所述图案光发光区域34一圈的框形 区域。所述泛光发光区域31与图案光发光区域34之间最小间距D的大小应确保从图案光发光区域34发出去的光束与泛光发光区域32发出去的光束在到达设置在光源结构3上方顺序排列的第一个光学元件33之前相互之间不发生交汇。Please refer to FIG. 5 and FIG. 6 together. The third embodiment of the present invention provides a light source structure 3, which is basically the same as the light source structure 1 in the first embodiment. The difference lies in the flood light emitting area. 31 is a frame-shaped area surrounding the patterned light emitting area 34 around the patterned light emitting area 34. The size of the minimum distance D between the flood light emission area 31 and the pattern light emission area 34 should ensure that the light beam emitted from the pattern light emission area 34 and the light beam emitted from the flood light emission area 32 reach and are arranged above the light source structure 3. The first optical elements 33 arranged in sequence do not meet each other before.
由于制造工艺存在一定程度的误差，所述泛光发光区域31内的发光体36与图案光发光区域34内的发光单元32所发出光束的发散角度无法做到完全一样，但会在预设的发散角度范围内。因所述发光体36与发光单元32所发出光束的发散角度越大，在光源结构3与上方顺序排列的第一个光学元件33的间距保持不变的前提下为了满足所述与泛光发光区域31所发出光束不交汇，则要求图案光发光区域34与泛光发光区域31之间的距离D越大。假设从图案光发光区域34和泛光发光区域31所发出光束的最大发散角度为θ，所述光源结构3的发光面与设置在其上方顺序排列的第一个光学元件33之间的距离为H，根据三角函数关系，在图案光发光区域34所发出光束与泛光发光区域31所发出光束刚好相交的临界情况下所述图案光发光区域34与泛光发光区域31之间的最小间距D满足公式
Figure PCTCN2018106944-appb-000002
所以为了确保从图案光发光区域34发出去的光束与泛光发光区域31发出去的光束在到达设置在光源结构3上方顺序排列的第一个光学元件33之前相互不发生交汇，所述图案光发光区域34与泛光发光区域31之间的最小间距D应满足
Figure PCTCN2018106944-appb-000003
Figure PCTCN2018106944-appb-000004
因满足上述条件时，分别从图案光发光区域34与泛光发光区域31发出的光束在到达设置在光源结构3上方的第一个光学元件33之前相互之间不交汇，所以不需要在图案光发光区域34或泛光发光区域31的出光侧再设置调节光束方向的其他元件。 Due to a certain degree of error in the manufacturing process, the divergence angles of the light beams emitted by the light emitting body 36 in the flood light emitting area 31 and the light emitting unit 32 in the pattern light emitting area 34 cannot be exactly the same, but will Within the divergence angle range. Because the divergence angle of the light beams emitted by the light-emitting body 36 and the light-emitting unit 32 is larger, the distance between the light source structure 3 and the first optical element 33 arranged in order above remains the same in order to satisfy the light emission with flood light. If the light beams emitted from the area 31 do not intersect, it is required that the distance D between the pattern light emitting area 34 and the flood light emitting area 31 is greater. Assume that the maximum divergence angle of the light beams emitted from the pattern light emitting area 34 and the flood light emitting area 31 is θ. The distance between the light emitting surface of the light source structure 3 and the first optical element 33 arranged in sequence above it is H, according to the trigonometric function, the minimum distance D between the patterned light emitting area 34 and the flooded light emitting area 31 in the critical case where the light beam emitted from the patterned light emitting area 34 and the beam emitted from the flooded light emitting area 31 just intersect. Satisfy the formula
Figure PCTCN2018106944-appb-000002
Therefore, in order to ensure that the light beams emitted from the pattern light emitting area 34 and the light beams emitted from the flood light emitting area 31 do not intersect with each other before reaching the first optical element 33 arranged sequentially above the light source structure 3, the pattern light The minimum distance D between the light-emitting area 34 and the flood light-emitting area 31 should satisfy
Figure PCTCN2018106944-appb-000003
Figure PCTCN2018106944-appb-000004
When the above conditions are satisfied, the light beams emitted from the pattern light emitting area 34 and the flood light emitting area 31 do not converge with each other before reaching the first optical element 33 provided above the light source structure 3, so there is no need to The light emitting area 34 or the flood light emitting area 31 is further provided with another element for adjusting the direction of the light beam.
在本实施方式中，所述发光单元32不规则分布在半导体基底30的图案光发光区域34内。所述发光体36按照相同的预设间隔均匀地排布在泛光发光区域31内。In this embodiment, the light emitting units 32 are irregularly distributed in the pattern light emitting area 34 of the semiconductor substrate 30. The luminous bodies 36 are uniformly arranged in the flood light emitting area 31 at the same preset interval.
请一并参阅图7和图8，本实用新型第四实施方式提供了一种光源结构4，用于发射光束至一被测目标物上进行感测识别。所述光束根据感测原理及应用 场景可以为具有特定波长的光束。在本实施方式中，所述光束用于实现人脸识别，可以为红外或近红外波长光束，波长范围为750纳米(Nanometer,nm)至1650nm。Please refer to FIG. 7 and FIG. 8 together. A fourth embodiment of the present invention provides a light source structure 4 for emitting a light beam to a measured target for sensing identification. The light beam may be a light beam having a specific wavelength according to a sensing principle and an application scenario. In this embodiment, the light beam is used to realize face recognition, and may be an infrared or near-infrared wavelength light beam with a wavelength range of 750 nanometers (Nanometer, nm) to 1650 nm.
所述光源结构4包括泛光发射部40及图案光发射部42。所述泛光发射部40所发出的光束用于形成光强均匀分布的泛光光束。所述泛光光束投射至被测目标物上用于识别所述被测目标物是否为符合预设特征的特定对象。比如，所述泛光光束可用于识别所述被测目标物是否为人脸。所述图案光发射部42所发出的光束用于形成能够在被测目标物上投射预设图案的图案光束。所述预设图案用于感测所述被测目标物表面的三维信息。The light source structure 4 includes a flood light emitting portion 40 and a pattern light emitting portion 42. The light beam emitted by the flood light emitting portion 40 is used to form a flood light beam with uniform light intensity distribution. The flood light beam is projected onto the measured target to identify whether the measured target is a specific object that conforms to a preset characteristic. For example, the flood light beam may be used to identify whether the measured target is a human face. The light beam emitted by the patterned light emitting portion 42 is used to form a patterned light beam capable of projecting a predetermined pattern on the measured object. The preset pattern is used to sense three-dimensional information on a surface of the measured target object.
所述泛光发射部40包括形成在泛光发光半导体基底401上的发光体400及导光板402。所述导光板402包括入光面4020及出光面4022。在本实施方式中，所述导光板402大致呈长方体形状，所述入光面4020垂直于出光面4022。所述发光体400对应导光板402的入光面4020设置，以使得所述发光体400所发出的光束从入光面4020射入导光板402内均匀混合后从出光面4022投射出泛光光束。The flood light emitting portion 40 includes a light emitter 400 and a light guide plate 402 formed on a flood light emitting semiconductor substrate 401. The light guide plate 402 includes a light entrance surface 4020 and a light exit surface 4022. In this embodiment, the light guide plate 402 has a substantially rectangular parallelepiped shape, and the light incident surface 4020 is perpendicular to the light exit surface 4022. The luminous body 400 is disposed corresponding to the light incident surface 4020 of the light guide plate 402 so that the light beam emitted by the luminous body 400 enters the light guide plate 402 from the light incident surface 4020 and is uniformly mixed. .
所述图案光发射部42设置在所述导光板402出光面4022的中间位置。所述图案光发射部42包括如第一实施方式中所述的半导体基底421及形成在所述半导体基底421上的多个发光单元420。所述发光单元420按照与第一实施方式中相同的分布规律在所述半导体基底421上不规则排布。所述发光单元420发出的光束与图案化元件，比如：衍射光学元件(Diffractive Optical Element，DOE)，配合在被测目标物上投射不规则分布的光斑图案。The pattern light emitting portion 42 is disposed at a middle position of the light emitting surface 4022 of the light guide plate 402. The patterned light emitting section 42 includes a semiconductor substrate 421 as described in the first embodiment, and a plurality of light emitting units 420 formed on the semiconductor substrate 421. The light emitting units 420 are irregularly arranged on the semiconductor substrate 421 according to the same distribution law as in the first embodiment. The light beam emitted by the light-emitting unit 420 and the patterning element, such as a diffractive optical element (Diffractive Optical Element, DOE), cooperate to project an irregularly distributed light spot pattern on the measured target.
在本实施方式中，所述发光体400和发光单元420可以为半导体激光器，例如：VCSEL。不同的是，因所述发光体400与发光单元420所在的位置不同，需要分别形成在不同的泛光发光半导体基底401和半导体基底421上。所述泛光发光半导体基底401的形状与入光面4020形状相对应。In this embodiment, the light-emitting body 400 and the light-emitting unit 420 may be a semiconductor laser, for example, a VCSEL. The difference is that because the positions of the light-emitting body 400 and the light-emitting unit 420 are different, they need to be formed on different flood light-emitting semiconductor substrates 401 and 421 respectively. The shape of the flood light emitting semiconductor substrate 401 corresponds to the shape of the light incident surface 4020.
如图9所示，本实用新型第五实施方式提供了一种光学投影模组5，用于 投射特定光束至被测目标物上进行感测识别。所述光学投影模组5包括光束调制元件51及上述第一实施方式中的光源结构1。As shown in FIG. 9, a fifth embodiment of the present invention provides an optical projection module 5 for projecting a specific light beam onto a target to be detected for recognition. The optical projection module 5 includes a light beam modulation element 51 and the light source structure 1 in the first embodiment.
所述光束调制元件51包括但不限于准直透镜510和/或扩束元件以及图案化元件512。所述准直透镜510和/或扩束元件及图案化元件512设置在光源结构1的出光光路上。所述准直透镜510和/或扩束元件对所述光源结构1发出的光束进行调整使其基本保持准直并满足预设的出光孔径要求。所述图案化元件512将光源结构1发出的具有多个不规则分布的子光束的光束群集进行重新排布以形成能够在被测目标物上投射出数量更多的不规则分布光斑图案的图案光束。The beam modulation element 51 includes, but is not limited to, a collimating lens 510 and / or a beam expanding element and a patterning element 512. The collimating lens 510 and / or the beam-expanding element and the patterning element 512 are disposed on a light-emitting light path of the light source structure 1. The collimating lens 510 and / or the beam-expanding element adjust the light beam emitted by the light source structure 1 so that it is substantially kept collimated and meets a preset light output aperture requirement. The patterning element 512 rearranges a light beam cluster having a plurality of irregularly distributed sub-beams emitted from the light source structure 1 to form a pattern capable of projecting a larger number of irregularly distributed light spot patterns on the measured target object. beam.
所述图案化元件512包括但不限于DOE、微透镜阵列、光栅等。在本实施方式中，所述图案化元件512为DOE，所述DOE将光源结构1发出的具有多个不规则分布的子光束的光束群集复制多个并在预设的扩展角度范围内展开而形成能够在被测目标物上投射出数量更多的不规则分布光斑图案的图案光束。The patterning element 512 includes, but is not limited to, a DOE, a microlens array, a grating, and the like. In this embodiment, the patterning element 512 is a DOE, and the DOE copies a plurality of beam clusters with a plurality of irregularly distributed sub-beams emitted from the light source structure 1 and expands them within a preset extended angle range. Form a pattern light beam capable of projecting a larger number of irregularly distributed light spot patterns on the measured target.
如图10所示，本实用新型第六实施方式提供了一种光学投影模组6，用于投射特定光束至被测目标物上进行感测识别。所述光学投影模组6包括光束调制元件61及上述第二至第四实施方式中的光源结构2。As shown in FIG. 10, a sixth embodiment of the present invention provides an optical projection module 6 for projecting a specific light beam onto a measured target for sensing and identification. The optical projection module 6 includes a beam modulation element 61 and the light source structure 2 in the second to fourth embodiments.
所述光束调制元件61包括扩散部610及图案化部612。所述扩散部610对应光源结构1的泛光发光区域21设置，用于将泛光发光区域21中所述发光体26发出的光束扩散形成光强均匀分布的泛光光束。所述图案化部612对应光源结构1的图案光发光区域24设置，用于将图案光发光区域24中所述发光单元22发出的光束形成能够在被测目标物上投射出预设图案的图案光束以用于感测被测目标物的三维信息。The beam modulation element 61 includes a diffusion portion 610 and a patterning portion 612. The diffusing portion 610 is provided corresponding to the flood light emitting area 21 of the light source structure 1, and is configured to diffuse the light beam emitted by the light emitting body 26 in the flood light emitting area 21 to form a flood light beam with uniform light intensity distribution. The patterning portion 612 is provided corresponding to the patterned light emitting region 24 of the light source structure 1 and is configured to form a light beam emitted from the light emitting unit 22 in the patterned light emitting region 24 into a pattern capable of projecting a predetermined pattern on the measured object. The light beam is used for sensing three-dimensional information of the measured target.
在本实施方式中，所述图案化部612与光源结构1的图案光发光区域24相对应，设置在光束调制元件61的中间位置。所述扩散部610与光源结构1的泛光发光区域21相对应，对称地围绕所述图案化部612的外围进行设置。In the present embodiment, the patterned portion 612 corresponds to the patterned light emitting region 24 of the light source structure 1 and is disposed at an intermediate position of the beam modulation element 61. The diffusion portion 610 corresponds to the flood light emitting region 21 of the light source structure 1, and is disposed symmetrically around the periphery of the patterning portion 612.
所述图案化部612及扩散部610的功能通过在透明基板613的对应位置形 成特定的光学纹路来实现。在本实施方式中，所述光束调制元件110的图案化部112及扩散部111设置在同一个透明基板613上。即，所述透明基板613的中间位置形成有用于重新排布光场的图案化光学纹路6120作为所述图案化部612。所述透明基板613在所述图案化光学纹路6120的外围与光源结构1泛光发光区域21对应的位置形成具有光扩散作用的扩散光学纹路6100作为所述扩散部610。The functions of the patterning portion 612 and the diffusion portion 610 are realized by forming specific optical lines at corresponding positions on the transparent substrate 613. In this embodiment, the patterned portion 112 and the diffusion portion 111 of the beam modulation element 110 are disposed on the same transparent substrate 613. That is, a patterned optical pattern 6120 for rearranging a light field is formed at the middle position of the transparent substrate 613 as the patterned portion 612. The transparent substrate 613 forms a diffusing optical pattern 6100 having a light diffusing effect as the diffusing part 610 at a position corresponding to the light emitting structure 21 of the light source structure 1 at the periphery of the patterned optical pattern 6120.
如图11所示，本实用新型第七实施方式提供了一种光学投影模组7，其与第六实施方式中的光学投影模组6基本相同，其区别在于所述光学投影模组7还包括光路导向元件76。As shown in FIG. 11, a seventh embodiment of the present invention provides an optical projection module 7, which is basically the same as the optical projection module 6 in the sixth embodiment. The difference is that the optical projection module 7 is also Includes a light path guide member 76.
所述光路导向元件76设置在光源结构1与光束调制元件71之间，并与所述光源结构1泛光发光区域21的出光面对应的位置处。所述光路导向元件76用于将泛光发光区域21内所述发光体26呈发散状出射的光束引导照射到所述光束调制元件71上的扩散部710。所述光路导向元件76的设置是为了避免在光源结构1的泛光发光区域21与图案光发光区域24距离较近的技术方案中，从泛光发光区域21所发出的光束一部分会经过光束调制元件71的图案化部712后会形成强度不均匀的衍射光束，从而影响到泛光光束的均匀性。所述光路导向元件76包括，但不限于，棱镜、微透镜及光栅。所述光路导向元件76的设置区域与光源结构1的泛光发光区域21保持一致。The light path guiding element 76 is disposed between the light source structure 1 and the light beam modulation element 71, and at a position corresponding to the light emitting surface of the light emitting area 21 of the light source structure 1. The light path guiding element 76 is configured to guide the light beam emitted from the light emitting body 26 in the diffused light emitting region 21 in a divergent manner and irradiate the diffusion portion 710 on the light beam modulation element 71. The arrangement of the light path guiding element 76 is to avoid that in the technical solution in which the flood light emitting region 21 and the pattern light emitting region 24 of the light source structure 1 are relatively close, a part of the light beam emitted from the flood light emitting region 21 is subjected to beam modulation. The patterned portion 712 of the element 71 forms a diffracted light beam with uneven intensity, thereby affecting the uniformity of the flood light beam. The light path guiding element 76 includes, but is not limited to, a prism, a microlens, and a grating. The setting area of the light path guiding element 76 is consistent with the flood light emitting area 21 of the light source structure 1.
如图12所示，本实用新型第八实施方式提供了一种光学投影模组8，其与第六实施方式中的光学投影模组6基本相同，其区别在于所述光束调制元件81的扩散部810和图案化部812分别形成在不同的透明基板上。As shown in FIG. 12, an eighth embodiment of the present invention provides an optical projection module 8, which is basically the same as the optical projection module 6 in the sixth embodiment. The difference lies in the diffusion of the beam modulation element 81. The portion 810 and the patterned portion 812 are formed on different transparent substrates, respectively.
所述形成有图案化部812的透明基板定义为图案化基板8123。所述图案化基板8123上与光源结构1的图案化发光区域24相对应的位置处形成有将光束的光场进行重新排布的图案化光学纹路8120。在本实施方式中，对应于所述图案光发光区域24设置在光源结构1中部的情形，所述图案化光学纹路8120形成在图案化基板8123的中间位置。The transparent substrate on which the patterned portion 812 is formed is defined as a patterned substrate 8123. A patterned optical pattern 8120 for rearranging the light field of the light beam is formed on the patterned substrate 8123 at a position corresponding to the patterned light-emitting region 24 of the light source structure 1. In this embodiment, corresponding to the case where the patterned light emitting region 24 is provided in the middle of the light source structure 1, the patterned optical pattern 8120 is formed at a middle position of the patterned substrate 8123.
所述形成有扩散部810的透明基板定义为扩散基板8103。所述扩散基板8103上与光源结构1的泛光发光区域21相对应的位置处形成有起到光扩散作用的扩散光学纹路8100。所述扩散基板8103与图案化基板8123上图案化光学纹路8120对应的区域保持透光，所述图案化基板8123与扩散基板8103上扩散光学纹路8100对应的区域保持透光，定义为透光区域8102。在本实施方式中，对应于所述泛光发光区域21围绕图案光发光区域24设置的光源结构1，所述扩散基板8103在所述透光区域8102的外围与光源结构1泛光发光区域21对应的位置处形成有所述扩散光学纹路8100。The transparent substrate on which the diffusion portion 810 is formed is defined as a diffusion substrate 8103. A diffusion optical pattern 8100 is formed on the diffusion substrate 8103 at a position corresponding to the flood light emitting region 21 of the light source structure 1 to play a role of light diffusion. The area corresponding to the patterned optical lines 8120 on the diffusion substrate 8103 and the patterned substrate 8123 remains transparent, and the area corresponding to the diffused optical lines 8100 on the patterned substrate 8123 and the diffused substrate 8103 remains transparent, which is defined as a light transmitting area 8102. In this embodiment, the light source structure 1 corresponding to the flood light emitting area 21 surrounding the pattern light emitting area 24 is provided, and the diffusion substrate 8103 is located on the periphery of the light transmitting area 8102 with the light source structure 1 flood light emitting area 21. The diffusion optical lines 8100 are formed at corresponding positions.
所述图案化基板8123和扩散基板8103可相互堆叠在一起，也可以沿着所述光学投影模组8的投影光路分别独立设置在光路上的不同位置。可以理解的是，只需要确保所述扩散基板8103及图案化基板8123上对应光学纹路位置相互对准，对于扩散基板8103和图案化基板8123沿所述投影光路的排列顺序不做特别要求。The patterned substrate 8123 and the diffusion substrate 8103 may be stacked on each other, or may be separately disposed at different positions on the optical path along the projection optical path of the optical projection module 8. It can be understood that it is only necessary to ensure that the positions of the corresponding optical lines on the diffusion substrate 8103 and the patterned substrate 8123 are aligned with each other, and there is no special requirement on the arrangement order of the diffusion substrate 8103 and the patterned substrate 8123 along the projection optical path.
如图13所示，本实用新型第九实施方式提供了一种感测装置9，其用于感测被测目标物的空间信息。所述空间信息包括但不限于被测目标物表面的三维信息、被测目标物在空间中的位置信息、被测目标物的尺寸信息等其他与被测目标物相关的三维立体信息。所感测到的被测目标物的空间信息可被用于识别被测目标物或构建被测目标物的三维立体模型。As shown in FIG. 13, a ninth embodiment of the present invention provides a sensing device 9 for sensing spatial information of a measured target object. The spatial information includes, but is not limited to, three-dimensional information on the surface of the measured target, position information of the measured target in space, size information of the measured target, and other three-dimensional stereo information related to the measured target. The sensed spatial information of the measured target can be used to identify the measured target or construct a three-dimensional model of the measured target.
所述感测装置9包括如上述第五至第八实施方式所提供的光学投影模组5及感测模组90。所述光学投影模组5用于投射特定光束至被测目标物上进行感测识别。所述感测模组90用于感测所述光学投影模组5在被测目标物上投射的特定图像并通过分析所述特定图像获取的被测标的物的相关空间信息。The sensing device 9 includes the optical projection module 5 and the sensing module 90 provided in the fifth to eighth embodiments. The optical projection module 5 is used for projecting a specific light beam onto a measured target for sensing and identification. The sensing module 90 is configured to sense a specific image projected by the optical projection module 5 on the measured target object and obtain relevant spatial information of the measured target object by analyzing the specific image.
在本实施方式中，所述感测装置9为感测被测目标物表面的三维信息并据此识别被测目标物身份的3D脸部识别装置。In this embodiment, the sensing device 9 is a 3D face recognition device that senses three-dimensional information on the surface of the detected target object and recognizes the identity of the detected target object accordingly.
所述特定光束包括强度均匀的泛光光束和/或能够在被测目标物上投射出预设图案的图案光束。所述感测模组90根据所感测到的泛光光束在被测目标物 上形成的图像来识别所靠近的被测目标物是否为脸部。所述感测模组90根据所感测到的图案光束在被测目标物上投射出的预设图案的形状变化来分析出被测目标物表面的三维信息并据此对被测目标物进行脸部识别。The specific light beam includes a flood light beam having a uniform intensity and / or a pattern light beam capable of projecting a predetermined pattern on a measured target object. The sensing module 90 recognizes whether the approaching target object is a face according to an image formed on the target object by the sensed flood light beam. The sensing module 90 analyzes the three-dimensional information on the surface of the measured target according to the shape change of the preset pattern projected by the sensed pattern beam on the measured target, and faces the measured target accordingly. Department identification.
如图14所示，本发明第十实施方式提供一种设备100，例如手机、笔记本电脑、平板电脑、触控交互屏、门、交通工具、机器人、自动数控机床等。所述设备100包括至少一个上述第九实施方式所提供的感测装置9。所述设备100用于根据该感测装置9的感测结果来对应执行相应的功能。所述相应功能包括但不限于识别使用者身份后解锁、支付、启动预设的应用程序、避障、识别使用者脸部表情后利用深度学习技术判断使用者的情绪和健康情况中的任意一种或多种。As shown in FIG. 14, a tenth embodiment of the present invention provides a device 100 such as a mobile phone, a notebook computer, a tablet computer, a touch interactive screen, a door, a vehicle, a robot, an automatic numerically controlled machine tool, and the like. The device 100 includes at least one sensing device 9 provided in the ninth embodiment described above. The device 100 is configured to perform a corresponding function according to a sensing result of the sensing device 9. The corresponding functions include, but are not limited to, any of unlocking, paying, launching a preset application, avoiding obstacles, recognizing the user's facial expressions, and using deep learning technology to determine the user's mood and health after identifying the user's identity. Or more.
在本实施方式中，所述感测装置9为感测被测目标物表面的三维信息并据此识别被测目标物身份的3D脸部识别装置。所述设备100为装有所述3D脸部识别装置的手机、笔记本电脑、平板电脑、触控交互屏等电子终端、门、交通工具、安检、出入境等涉及进出权限的设备100。In this embodiment, the sensing device 9 is a 3D face recognition device that senses three-dimensional information on the surface of the detected target object and recognizes the identity of the detected target object accordingly. The device 100 is an electronic terminal, such as a mobile phone, a notebook computer, a tablet computer, a touch interactive screen, a door, a vehicle, a security check, an entry-exit device, etc., which are equipped with the 3D face recognition device.
与现有技术相比，本实用新型所提供的光源结构1、光学投影模组5、感测装置9及设备100通过计算机根据上述筛选原则进行模拟和筛选确定后能够在较小的发光区域范围内最大限度地提高不同发光单元局部区域之间的不相关性，使得投射在被测目标物上的不规则分布光斑能够更快速地定位到标准不规则分布光斑图案上唯一对应的光斑点，从而提高三维感测的效率。Compared with the prior art, the light source structure 1, the optical projection module 5, the sensing device 9, and the device 100 provided by the present invention can be simulated and screened in accordance with the above-mentioned screening principles through a computer to determine the light emitting area. To maximize the irrelevance between local areas of different light-emitting units, so that irregularly distributed light spots projected on the measured target can be positioned more quickly to the only corresponding light spot on the standard irregularly distributed light spot pattern, thereby Improve the efficiency of 3D sensing.
在本说明书的描述中，参考术语“一个实施方式”、“某些实施方式”、“示意性实施方式”、“示例”、“具体示例”、或“一些示例”等的描述意指结合所述实施方式或示例描述的具体特征、结构、材料或者特点包含于本实用新型的至少一个实施方式或示例中。在本说明书中，对上述术语的示意性表述不一定指的是相同的实施方式或示例。而且，描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施方式或示例中以合适的方式结合。In the description of the present specification, descriptions with reference to the terms “one embodiment”, “some embodiments”, “exemplary embodiments”, “examples”, “specific examples”, or “some examples” and the like mean that in combination with Specific features, structures, materials, or characteristics described in the embodiments or examples are included in at least one embodiment or example of the present invention. In this specification, the schematic expressions of the above terms do not necessarily refer to the same implementation or example. Moreover, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more implementations or examples.
以上所述仅为本实用新型的较佳实施方式而已，并不用以限制本实用新型， 凡在本实用新型的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本实用新型的保护范围之内。The above are only the preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, and improvements made within the spirit and principles of the present invention shall be included in the present invention. Within the scope of protection of utility models.

Claims (17)

  1. 一种光源结构，其用于发出不规则分布的光斑图案，所述光源结构包括半导体基底及形成在所述半导体基底上的多个不规则分布的发光单元，所述半导体基底的发光表面上定义出一图案光发光区域，所述图案光发光区域为矩形，以所述图案光发光区域左下角顶点为原点，相交于左下角的两条直角边延展方向分别为横坐标轴和纵坐标轴，坐标单位为微米建立坐标系来描述所述发光单元的位置，所述发光单元的分布图案选自在具有一百个发光单元的基础发光单元分布图案中通过加入或减少一个或多个发光单元或者改变一个或多个发光单元的位置获得的多种第一发光单元分布图案中的一种，所述基础发光单元分布图案的一百个发光单元的坐标值为：P1(170.55,157.95)；P2(146.25,145.35)；P3(189.45,177.75)；P4(175.95,91.35)；P5(202.95,89.55)；P6(211.95,193.95)；P7(230.85,174.15)；P8(125.55,220.05)；P9(213.75,40.95)；P10(186.75,39.15)；P11(10.35,153.45)；P12(95.85,94.05)；P13(171.45,61.65)；P14(186.75,12.15)；P15(105.75,254.25)；P16(120.15,152.55)；P17(227.25,108.45)；P18(71.55,107.55)；P19(343.35,108.45)；P20(247.05,68.85)；P21(46.35,119.25)；P22(65.25,80.55)；P23(201.15,276.75)；P24(254.25,113.85)；P25(108.45,281.25)；P26(192.15,250.65)；P27(27.45,191.25)；P28(40.05,166.95)；P29(22.05,94.95)；P30(22.05,67.95)；P31(71.55,220.05)；P32(262.35,16.65)；P33(49.05,235.35)；P34(227.25,267.75)；P35(112.05,71.55)；P36(5.85,274.95)；P37(139.95,67.05)；P38(35.55,43.65)；P39(25.65,249.75)；P40(76.95,134.55)；P41(4.95,219.15)；P42(280.35,106.65)；P43(327.15,161.55)；P44(93.15,31.95)；P45(52.65,262.35)；P46(275.85,281.25)；P47(8.55,37.35)；P48(60.75,33.75)；P49(42.75,13.05)；P50(87.75,58.95)；P51(175.05,130.05)；P52(199.35,142.65)；P53(156.15,110.25)；P54(169.65,196.65)；P55(142.65,198.45)；P56(133.65,94.05)；P57(114.75,113.85)；P58(220.05,67.95)；P59(131.85,247.05)；P60(158.85,248.85)；P61(335.25,134.55)；P62(249.75,193.95)；P63(174.15,226.35)；P64(158.85,275.85)；P65(239.85,33.75)；P66(225.45,135.45)； P67(118.35,179.55)；P68(274.05,180.45)；P69(2.25,179.55)；P70(98.55,219.15)；P71(299.25,168.75)；P72(280.35,207.45)；P73(144.45,11.25)；P74(91.35,174.15)；P75(237.15,6.75)；P76(153.45,37.35)；P77(318.15,96.75)；P78(305.55,121.05)；P79(323.55,193.05)；P80(323.55,220.05)；P81(274.05,67.95)；P82(83.25,271.35)；P83(296.55,52.65)；P84(118.35,20.25)；P85(233.55,216.45)；P86(339.75,13.05)；P87(205.65,220.95)；P88(310.05,244.35)；P89(319.95,38.25)；P90(268.65,153.45)；P91(340.65,68.85)；P92(65.25,181.35)；P93(18.45,126.45)；P94(252.45,256.05)；P95(292.95,25.65)；P96(69.75,6.75)；P97(337.05,250.65)；P98(284.85,254.25)；P99(302.85,274.95)；P100(257.85,229.05)，所述第一发光单元分布图案与所述基础发光单元分布图案之间的相似程度等于或者超过预设阈值，所述相似程度阈值的定义方式为将所述第一发光单元图案经过有限次数不改变发光单元之间相关性的图形变换后获得与所述基础发光单元分布图案朝向一致且发光单元大小相同的第二发光单元图案，所述第二发光单元图案与所述基础发光单元分布图案运用归一化相关系数匹配法计算得出的相似度数值等于或超过0.25的预设阈值。A light source structure for emitting an irregularly distributed light spot pattern. The light source structure includes a semiconductor substrate and a plurality of irregularly distributed light emitting units formed on the semiconductor substrate. A light emitting surface of the semiconductor substrate is defined. A patterned light emitting area is rectangular, with the bottom left corner vertex of the patterned light emitting area as the origin, and the extending directions of the two right-angle sides that intersect in the lower left corner are the abscissa axis and the ordinate axis, respectively. The coordinate unit is micrometers to establish a coordinate system to describe the position of the light-emitting unit, and the distribution pattern of the light-emitting unit is selected from the basic light-emitting unit distribution pattern having one hundred light-emitting units by adding or reducing one or more light-emitting units or One of a plurality of first light-emitting unit distribution patterns obtained by changing the position of one or more light-emitting units, the coordinate value of one hundred light-emitting units of the basic light-emitting unit distribution pattern is: P1 (170.55,157.95); P2 (146.25,145.35); P3 (189.45,177.75); P4 (175.95,91.35); P5 (202.95,89.55); P6 (211.95,193.95); P7 (230.85,174.15); P8 (1 25.55,220.05); P9 (213.75,40.95); P10 (186.75,39.15); P11 (10.35,153.45); P12 (95.85,94.05); P13 (171.45,61.65); P14 (186.75,12.15); P15 (105.75 , 254.25); P16 (120.15, 152.55); P17 (227.25, 108.45); P18 (71.55, 107.55); P19 (343.35, 108.45); P20 (247.05, 68.85); P21 (46.35, 119.25); P22 (65.25, 80.55); P23 (201.15,276.75); P24 (254.25,113.85); P25 (108.45,281.25); P26 (192.15,250.65); P27 (27.45,191.25); P28 (40.05,166.95); P29 (22.05,94.95 ); P30 (22.05,67.95); P31 (71.55,220.05); P32 (262.35,16.65); P33 (49.05,235.35); P34 (227.25,267.75); P35 (112.05,71.55); P36 (5.85,274.95) ; P37 (139.95, 67.05); P38 (35.55, 43.65); P39 (25.65, 249.75); P40 (76.95, 134.55); P41 (4.95, 219.15); P42 (280.35, 106.65); P43 (327.15, 161.55); P44 (93.15,31.95); P45 (52.65,262.35); P46 (275.85,281.25); P47 (8.55,37.35); P48 (60.75,33.75); P49 (42.75,13.05); P50 (87.75,58.95); P51 (175.05, 130.05); P52 (199.35, 142.65); P53 (156.15, 110.25); P54 (169.65, 196.65); P55 (142.65, 198.45); P56 (133.65, 94.05); P57 (114.75, 113.85); P58 (220.05,67.95); P59 (131.85,247.05); P60 (158.85,248.85); P61 (335.25,134.55); P62 (249.75,193.95); P63 (174.15,226.35); P64 (158.85,275.85); P65 (239.85,33.75); P66 (225.45,135.45); P67 (118.35,179.55); P68 (274.05,180.45); P69 (2.25,179.55); P70 (98.55,219.15); P71 (299.25,168.75); P72 ( 280.35,207.45); P73 (144.45, 11.25); P74 (91.35, 174.15); P75 (237.15, 6.75); P76 (153.45, 37.35); P77 (318.15, 96.75); P78 (305.55, 121.05); P79 (323.55) , 193.05); P80 (323.55, 220.05); P81 (274.05, 67.95); P82 (83.25, 271.35); P83 (296.55, 52.65); P84 (118.35, 20.25); P85 (233.55, 216.45); P86 (339.75, 13.05); P87 (205.65,220.95); P88 (310.05,244.35); P89 (319.95,38.25); P90 (268.65,153.45); P91 (340.65,68.85); P92 (65.25,181.35); P93 (18.45,126.45) ); P94 (252.45, 256.05); P95 (292.95, 25.65); P96 (69.75, 6.75); P97 (337.05, 250.65); P98 (284.85, 254.25); P99 (302.85, 274.95); P100 (257.85, 229.05) , The degree of similarity between the first light-emitting unit distribution pattern and the basic light-emitting unit distribution pattern is equal to or exceeds a predetermined level Threshold, the similarity threshold is defined in such a way that the first light-emitting unit pattern is subjected to a graphic transformation that does not change the correlation between light-emitting units for a limited number of times to obtain the same orientation as the basic light-emitting unit distribution pattern and the same size of the light-emitting unit The second light-emitting unit pattern of the second light-emitting unit pattern and the basic light-emitting unit distribution pattern have a similarity value calculated by using a normalized correlation coefficient matching method that is equal to or exceeds a preset threshold of 0.25.
  2. 如权利要求1所述的光源结构，其特征在于，所述不改变发光单元之间相关性的图形变换包括平移、旋转、左右镜像、上下镜像及180度翻转。The light source structure according to claim 1, wherein the graphic transformation that does not change the correlation between the light-emitting units comprises translation, rotation, left-right mirroring, up-down mirroring, and 180-degree flip.
  3. 如权利要求1所述的光源结构，其特征在于，所述发光单元为垂直腔面发射激光器。The light source structure according to claim 1, wherein the light emitting unit is a vertical cavity surface emitting laser.
  4. 如权利要求1所述的光源结构，其特征在于，所述光源结构还包括一个或多个泛光发光区域，所述泛光发光区域对称地围绕所述图案光发光区域分布，所述泛光发光区域发出用于形成光强均匀分布的泛光光束的光束，每一个所述泛光发光区域内形成有一个或多个发光体，所述发光体与所述图案光发光区域内的发光单元形成在同一个半导体基底上并可分别被独立地控制发光。The light source structure according to claim 1, wherein the light source structure further comprises one or more flood light emitting areas, and the flood light emitting areas are symmetrically distributed around the pattern light emitting area, and the flood light The light emitting area emits a light beam for forming a flood light beam with uniform light intensity distribution, and one or more light emitters are formed in each of the flood light emitting areas, and the light emitter and the light emitting unit in the pattern light emitting area are formed. It is formed on the same semiconductor substrate and can independently control light emission.
  5. 如权利要求4所述的光源结构，其特征在于，每一个所述泛光发光区域内形成有单个发光体，所述单个发光体可以为单孔宽面型垂直腔面发射激光器。The light source structure according to claim 4, wherein a single light emitter is formed in each of the flood light emitting areas, and the single light emitter may be a single-hole wide-face type vertical cavity surface emitting laser.
  6. 如权利要求4所述的光源结构，其特征在于，每一个所述泛光发光区域内形成有多个发光体，所述多个发光体按照预设的相同间隔均匀排布在泛光发光区域内，所述多个发光体为垂直腔面发射激光器。The light source structure according to claim 4, wherein a plurality of light emitters are formed in each of the flood light emitting areas, and the plurality of light emitters are uniformly arranged in the flood light emitting areas at a preset same interval. Here, the plurality of light emitters are vertical cavity surface emitting lasers.
  7. 如权利要求4所述的光源结构，其特征在于，所述泛光发光区域为在所述图案光发光区域外包围所述图案光发光区域一圈的方框，所述泛光发光区域与图案光发光区域之间最小间距D的大小满足条件
    Figure PCTCN2018106944-appb-100001
    其中H为光源结构的发光面与设置在光源结构上方顺序排列的第一个光学元件之间的距离，θ为从泛光发光区域和图案光发光区域所发出光束的最大发散角度。     The light source structure according to claim 4, wherein the flood light emitting area is a box surrounding the pattern light emitting area outside the pattern light emitting area, and the flood light emitting area and the pattern The minimum distance D between the light emitting areas meets the conditions
    Figure PCTCN2018106944-appb-100001
    Where H is the distance between the light emitting surface of the light source structure and the first optical element arranged sequentially above the light source structure, and θ is the maximum divergence angle of the light beam emitted from the flood light emitting area and the pattern light emitting area.
  8. 如权利要求1所述的光源结构，其特征在于，还包括泛光发射部，所述泛光发射部包括形成在泛光发光半导体基底上的发光体及导光板，所述导光板包括入光面及出光面，所述泛光发光半导体基底对应导光板的入光面设置，所述发光体朝向导光板的入光面发出光束，所述发光体发出的光束从入光面射入导光板内均匀混合后从出光面投射出光强均匀的光束，所述形成有多个不规则分布发光单元的半导体基底设置在导光板出光面的中间位置以发出具有多个不规则分布的子光束的光束群集。The light source structure according to claim 1, further comprising a flood light emitting portion, the flood light emitting portion comprising a light emitting body and a light guide plate formed on a flood light emitting semiconductor substrate, and the light guide plate includes light incident light And the light emitting surface, the flood light emitting semiconductor substrate is provided corresponding to the light incident surface of the light guide plate, the light emitter emits a light beam toward the light incident surface of the light guide plate, and the light beam emitted by the light emitter enters the light guide plate from the light incident surface After uniform mixing inside, a light beam with uniform light intensity is projected from the light emitting surface. The semiconductor substrate formed with a plurality of irregularly distributed light emitting units is arranged at the middle position of the light emitting surface of the light guide plate to emit a plurality of irregularly distributed sub-beams. Beam clusters.
  9. 如权利要求8所述的光源结构，其特征在于，所述发光体为垂直腔面发射激光器。The light source structure according to claim 8, wherein the luminous body is a vertical cavity surface emitting laser.
  10. 一种光学投影模组，用于投射预设图案至被测目标物上进行感测，其包括光束调制元件及如权利要求1-9中任意一项所述的光源结构，所述光束调制元件对所述光源结构所发出的光束进行调制以形成能够在被测目标物上投射出不规则分布光斑图案的图案光束。An optical projection module for projecting a preset pattern onto a measured target for sensing, comprising an optical beam modulation element and the light source structure according to any one of claims 1-9, the optical beam modulation element The light beam emitted by the light source structure is modulated to form a pattern light beam capable of projecting an irregularly distributed light spot pattern on the measured target object.
  11. 如权利要求10所述的光学投影模组，其特征在于，所述光束调制元件包括准直透镜和/或扩束元件以及衍射光学元件，所述光源结构如权利要求1-3所述，所述准直透镜和/或扩束元件及图案化元件设置在光源结构的出光光路上，所述准直透镜和/或扩束元件对所述光源结构发出的光束进行调整使其基本保持准直并满足预设的出光孔径要求，所述图案化元件将光源结构发出的具有多 个不规则分布的子光束的光束群集进行重新排布以形成能够在被测目标物上投射出数量更多的不规则分布光斑图案的图案光束。The optical projection module according to claim 10, wherein the beam modulation element comprises a collimating lens and / or a beam expanding element and a diffractive optical element, and the light source structure is as described in claims 1-3. The collimating lens and / or the beam-expanding element and the patterning element are disposed on a light exiting light path of the light source structure, and the collimating lens and / or the beam-expanding element adjust the light beam emitted by the light source structure to substantially maintain collimation. And meet the preset light output aperture requirements, the patterning element rearranges a light beam cluster having a plurality of irregularly distributed sub-beams emitted from the light source structure to form a larger number of projected objects on the measured target Pattern light beam with irregularly distributed spot patterns.
  12. 如权利要求10所述的光学投影模组，其特征在于，所述光源结构如权利要求4-9所述，所述光束调制元件包括扩散部及图案化部，所述扩散部对应光源结构的泛光发光区域或泛光发射部进行设置，用于将所述泛光发光区域或泛光发射部所发出的光束扩散形成光强均匀分布的泛光光束，所述图案化部对应光源结构的图案光发光区域进行设置，用于将所述图案光发光区域发出的光束的光场进行重新排布形成能够在被测目标物上投射出不规则分布光斑图案的图案光束。The optical projection module according to claim 10, wherein the light source structure is as described in claims 4-9, and the beam modulation element includes a diffusion portion and a patterning portion, and the diffusion portion corresponds to the light source structure. The flood light emitting area or the flood light emitting portion is provided for diffusing the light beam emitted by the flood light emitting area or the flood light emitting portion to form a flood light beam with uniform light intensity distribution, and the patterning portion corresponds to the light source structure. The pattern light emitting area is set to re-arrange the light field of the light beam emitted from the pattern light emitting area to form a pattern light beam capable of projecting an irregularly distributed light spot pattern on the measured object.
  13. 如权利要求12所述的光学投影模组，其特征在于，所述光束调制元件的图案化部及扩散部形成在同一个透明基板上；或The optical projection module according to claim 12, wherein the patterned portion and the diffusion portion of the beam modulation element are formed on the same transparent substrate; or
    所述光束调制元件的扩散部和图案化部分别形成在不同的透明基板上，所述形成有图案化部的透明基板定义为图案化基板，所述扩散基板与图案化部对应的区域保持透光，所述图案化基板与扩散部对应的区域保持透光。The diffusion portion and the patterned portion of the beam modulation element are formed on different transparent substrates respectively. The transparent substrate on which the patterned portion is formed is defined as a patterned substrate, and a region corresponding to the diffusion substrate and the patterned portion remains transparent. Light, and the area corresponding to the diffused portion of the patterned substrate remains transparent.
  14. 如权利要求12所述的光学投影模组，其特征在于，所述图案化部的功能通过在透明基板上的对应位置形成特定的图案化光学纹路来实现，所述图案化光学纹路选自衍射光学纹路、光学微透镜阵列、光栅中的一种及其组合。The optical projection module according to claim 12, wherein the function of the patterning portion is achieved by forming a specific patterned optical texture at a corresponding position on a transparent substrate, and the patterned optical texture is selected from diffraction One of an optical texture, an optical microlens array, and a grating, and a combination thereof.
  15. 如权利要求12所述的光学投影模组，其特征在于，所述光学投影模组还包括光路导向元件，所述光路导向元件设置在光源结构与光束调制元件之间并与所述光源结构的第一发射部的出光面对应的位置处，所述光路导向元件用于将第一发射部呈发散状出射的第一光束引导照射到所述光束调制元件的扩散部。The optical projection module according to claim 12, wherein the optical projection module further comprises a light path guide element, the light path guide element is disposed between the light source structure and the light beam modulation element and is in contact with the light source structure. At a position corresponding to the light emitting surface of the first emitting portion, the light path guiding element is configured to guide and irradiate the first light beam emitted from the first emitting portion in a divergent shape to the diffusion portion of the beam modulation element.
  16. 一种感测装置，用于感测被测目标物的三维信息，其包括如权利要求10-15中任意一项所述的光学投影模组及感测模组，所述感测模组用于感测所述光学模组在被测目标物上投射的预设图案并通过分析所述预设图案的图像获取被测标的物的三维信息。A sensing device for sensing three-dimensional information of a measured object, comprising the optical projection module and the sensing module according to any one of claims 10-15, wherein the sensing module is used for Sensing a preset pattern projected by the optical module on the measured target object and acquiring three-dimensional information of the measured target object by analyzing an image of the preset pattern.
  17. 一种设备，包括权利要求16所述的感测装置，所述设备根据所述感测装置所感测到的被测目标物的三维信息来执行相应功能。A device comprising the sensing device according to claim 16, the device performing a corresponding function according to three-dimensional information of a measured target object sensed by the sensing device.
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