WO2016122059A1

WO2016122059A1 - Glass structure having high hardness and fingerprint-resistant layer, and coating method therefor

Info

Publication number: WO2016122059A1
Application number: PCT/KR2015/006984
Authority: WO
Inventors: 김영수
Original assignee: 주식회사 맥스젠테크놀로지
Priority date: 2015-01-26
Filing date: 2015-07-07
Publication date: 2016-08-04
Also published as: KR101630450B1

Abstract

Provided are a glass structure having high hardness and a fingerprint-resistant layer, and a coating method therefor, in which a high hardness layer and a fingerprint-resistant layer are solidly bound, the high hardness layer having higher hardness compared to a conventional layer. The structure and the method comprises: a base layer in which an alumina layer, a lower silica layer, a silicon carbide layer and a zirconium layer are laminated in order on a non-tempered glass or tempered glass; an upper silica layer positioned on the base layer; and a fingerprint-resistant layer positioned on the upper silica layer, wherein the base layer and the upper silica layer form a high hardness layer, and the base layer, the upper silica layer and the fingerprint-resistant layer are formed by deposition.

Description

High hardness glass structure with anti-fingerprint layer and coating method therefor

The present invention relates to a high hardness glass structure and a coating method having an anti-fingerprint layer, and more particularly to a coating method for a glass structure and a glass structure having a high hardness and anti-fingerprint layer to be implemented in a touch screen panel.

Conventional glass structures use non-tempered glass, chemically tempered glass or ordinary tempered glass. Chemical tempered glass is a glass tempered in a high temperature KNO ₃ tempered liquid of about 400 to about 600 degrees for 2 to 12 hours. In addition, general tempered glass hardens the surface by quenching the glass at a high temperature of about 400 to 600 degrees. Such glass structures are widely applied to touch screen panels of mobile devices such as mobile phones, smart phones, tablets, and terminals of information processors such as ATMs, kiosks, monitors, and TVs. In addition, the glass structure has been applied to display surfaces such as LCD, PDP, OLED, QHD, including a touch screen panel. The surface of the glass structure of the touch screen panel is coated with an anti-fingerprint material to prevent scratches or fingerprints from forming. As such, the glass structure applied to the touch screen panel is required to have high strength and anti-fingerprint.

On the other hand, the anti-fingerprint layer of the conventional glass structure may be coated with a fluorine resin or a silicone resin by a wet or dry method on the surface of the glass. Specifically, by a dry deposition method, a fingerprint layer is formed by coating a deposition layer made of silica (SiO ₂ ) and a fluorine resin or a silicone resin on the deposition layer. However, coating the anti-fingerprint layer on the glass has an anti-fingerprint function as well as a slip function, thereby improving scratch resistance somewhat. Nevertheless, scratches occur on the display surface having the anti-fingerprint layer or to which tempered glass is applied, and are easily broken by an impact. Accordingly, unreinforced glass or tempered glass having stronger scratch resistance properties is required. However, conventional non-reinforced glass and tempered glass is low in hardness, there is a limit to preventing scratches.

1 is a flow chart showing a method of manufacturing a non-tempered glass or tempered glass with a conventional fingerprint layer. At this time, non-tempered glass or tempered glass is collectively called glass.

According to FIG. 1, first, a glass-mounted jig is charged into an evaporator (S1). Prior to charging the evaporator, foreign matter such as dust adhering to the surface of the glass is removed. Thereafter, vacuum deposition forms a silica layer (SiO ₂ layer) on the surface of the glass (S2). For vacuum deposition, deposition conditions, such as chamber location, deposition thickness, and the like, are preset and supplement the chemicals required for the chamber. Subsequently, the anti-fingerprint layer is formed on the silica layer by vacuum deposition (S3).

In the vacuum deposition, an electron beam deposition method is generally used. Specifically, after silica (SiO ₂ ) is deposited on the glass, an anti-fingerprint layer is formed on the deposition surface by ECC (Easy Cleaning Coating). However, if there is no silica layer in the glass structure, the bonding strength between the glass and the anti-fingerprint layer is not strong and durability is poor. If the bonding force is low, the hardness decreases, and a sharp material may cause scratches on the surface of the glass structure.

The problem to be solved by the present invention is a strong bond between the high hardness layer and the fingerprint layer, the hardness of the high hardness layer is relatively high compared to the conventional non-reinforced glass or tempered glass or silica layer, fingerprints to prevent the occurrence of scratches It is to provide a high hardness glass structure having a protective layer and a coating method for the same.

The high hardness glass structure having an anti-fingerprint layer for solving the problems of the present invention includes an unreinforced glass or tempered glass and a base layer in which an alumina layer, a lower silica layer, a silicon carbide layer, and a zirconium layer are sequentially positioned on the glass. do. In addition, it comprises a top silica layer located on the base layer and the anti-fingerprint layer located on the top silica layer.

In the structure of the present invention, the thickness of the base layer is preferably 100 kPa to 1,000 kPa, and preferably 350 kPa to 650 kPa. The silicon carbide layer and the zirconium layer may be repeatedly formed. In addition, zirconium carbide may be formed at an interface between the silicon carbide layer and the zirconium layer. The thickness ratio of the alumina layer, the lower silica layer, the silicon carbide layer and the zirconium layer is preferably 40 to 60:10 to 30:10 to 25:10 to 25. The upper silica layer may have a thickness of 50 kPa to 200 kPa.

The method of manufacturing a high hardness glass structure having an anti-fingerprint layer for solving other problems of the present invention first removes foreign substances on the glass surface. Thereafter, a base layer on which the alumina layer, the lower silica layer, the silicon carbide layer, and the zirconium layer are sequentially deposited is deposited on the surface of the glass from which the foreign matter is removed. A top silica layer is deposited on the base layer. Depositing an anti-fingerprint layer on the upper silica layer.

In the coating method of the present invention, the foreign matter can be removed by the ion gun. The base layer and the upper silica layer may be deposited by an electron beam method. The anti-fingerprint layer may be deposited with a coating material including a fluorine series or a silicon series.

According to the high hardness glass structure having the anti-fingerprint layer of the present invention and a coating method thereof, by applying the silica layer as the high hardness layer on the base layer including the silicon carbide layer and the zirconium layer, the bonding strength of the high hardness layer and the anti-fingerprint layer is increased. It is solid and the hardness of the high hardness layer is relatively high. In addition, by increasing the hardness, it is possible to prevent the occurrence of scratches by sharp materials.

1 is a flowchart illustrating a method of manufacturing a tempered glass including a conventional anti-fingerprint layer.

2 is a cross-sectional view showing a high hardness glass structure having an anti-fingerprint layer according to the present invention.

3 is a flow chart for explaining a method of manufacturing a high hardness glass structure having an anti-fingerprint layer according to the present invention.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. The embodiments described below may be modified in various other forms, and the scope of the present invention is not limited to the embodiments described below. The embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art. In addition, in the drawings, the thicknesses of films (layers, patterns) and regions may be exaggerated for clarity. Also, if a film (layer, pattern) is mentioned as being in the 'top', 'top', 'bottom', 'one side' of another film (layer, pattern), it is formed directly on the other film (layer, pattern) Or other films (layers, patterns) may be interposed therebetween.

Embodiment of the present invention by applying a high hardness layer laminated a silica layer on a base layer including a silicon carbide layer and a zirconium layer, the bonding strength of the high hardness layer and the fingerprint layer is firm, the hardness of the high hardness layer is relatively High hardness glass structures and coating methods are presented. To this end, the structure of the base layer and the high hardness layer will be described in detail. In addition, the hardness of the glass structure in which the fingerprint layer is formed on the high hardness layer will be described in detail. Glass in the embodiment of the present invention includes unreinforced glass and tempered glass. Tempered glass is divided into chemical tempered glass and general tempered glass.

The high hardness glass structure of the present invention may be applied to windows and window protection films attached to a touch screen or a display. For example, the present invention may be applied to a display window, a touch surface of a touch screen panel, a window of a touch screen panel, a display for protection, or a window of a touch screen. In addition, it can be applied to a table, a dining table, a blackboard, a glass wall, a building structure, a decoration, and the like with a touch screen or a display. In addition, the glass structure of the high hardness of the present invention can be used in a touch screen or a vehicle glass with a display, household appliances glass and the like. Furthermore, the glass structure of the present invention may serve as a protective film attached to the window on the touch screen.

2 is a cross-sectional view showing a high hardness glass structure having an anti-fingerprint layer according to an embodiment of the present invention. However, a cross-sectional view of a strict meaning is not represented, and there may be elements that may not appear on the cross-section for convenience of description.

Referring to FIG. 2, in the glass structure of the present invention, a high hardness layer 40 and an anti-fingerprint layer 50 composed of a base layer 20 and an upper silica layer 30 are sequentially stacked on a transparent glass 10. will be. The base layer 20 increases adhesion to the glass 10, improves abrasion resistance, and maintains high hardness. The base layer 20 consists of an alumina layer 21, a lower silica layer 22, a silicon carbide layer 23, and a zirconium layer 24. The alumina layer 21 enhances the adhesion with the glass 10 and maintains high hardness. Alumina is a high hardness material with a Mohs hardness of nine. The lower silica layer 22 serves as a crosslinking agent for adhesion between the alumina layer 21 and the silicon carbide layer 23.

The silicon carbide layer 23 has a very high hardness of Mohs hardness of 9 to 9.5, has good abrasion resistance and low thermal expansion rate, thereby increasing the bonding force with the lower silica layer 22 and stabilizing the deposition of the zirconium layer 24. Zirconium carbide (ZrC) is formed at the interface between the silicon carbide layer 23 and the zirconium layer 24. Zirconium carbide (ZrC) is made by covalent bonding of zirconium and carbon (C), has a Mohs hardness of 8-9. Zirconium carbide (ZrC) improves the interfacial stability of the silicon carbide layer 23 and the zirconium layer 24 on both sides. In other words, zirconium carbide increases the bonding force between the silicon carbide layer 23 and the zirconium layer 24 and stabilizes the deposited zirconium layer 24.

In an embodiment of the present invention, the thickness ratio of the alumina layer 21, the lower silica layer 22, the silicon carbide layer 23, and the zirconium layer 24 is 40 to 60:10 to 30:10 to 25:10. It is good to be -25. Such a thickness ratio is an optimal value considering the function of each layer and the wear resistance of the high hardness layer 40. The thickness of the base layer 20 constituting the high hardness layer 40 is preferably 100 kPa to 1,000 kPa, more preferably 350 kPa to 650 kPa. If the thickness of the base layer 20 is less than 100 kPa, the effect of increasing the hardness is difficult to implement. If the thickness of the base layer 20 is greater than 1,000 mm, the distance from the surface of the glass structure is too far, the touch may not be properly recognized. In addition, if the thickness becomes too thick, when the glass structure is bent, the structure of the base layer 20 may be broken.

Meanwhile, the silicon carbide layer 23 and the zirconium layer 24 according to the embodiment of the present invention may be repeatedly formed. That is, the wear resistance of the glass structure can be further improved by repeating the silicon carbide layer 23 and the zirconium layer 24. In particular, by the production of zirconium carbide, a multilayer silicon carbide layer 23 and a zirconium layer 24 having stable interfaces can be obtained. The number of repeating layers can be set in consideration of the use and environment in which the glass structure of the present invention is used.

The upper silica layer 30 is a layer for improving the bonding strength between the base layer 20 and the anti-fingerprint layer 50, and to increase the hardness of the glass structure of the present invention. 50 kPa to 200 kPa of the upper silica layer 30 is preferable. If the thickness of the upper silica layer 30 is less than 50Å, it is difficult to implement the effect of increasing the hardness and improve the adhesion. If the thickness of the upper silica layer 30 is larger than 200 mm 3, the thickness of the glass structure becomes too large. If the thickness is too large, it may cause an error in the operation of the touch panel. The anti-fingerprint layer 50 has anti-fingerprint and antifouling properties, and mainly consists of fluorine or silicon. The anti-fingerprint layer 50 helps slip and scratch prevention. The thickness of the anti-fingerprint layer 50 is preferably 100 to 200 kPa.

3 is a flowchart illustrating a method of manufacturing a high hardness glass structure having an anti-fingerprint layer according to an embodiment of the present invention. In this case, the structure of the glass structure will be referred to FIG. 2.

According to FIG. 3, in order to manufacture the glass structure of the present invention, first, foreign substances adhering to the surface of the glass 10 are removed (S10). That is, the glass 10 is placed on a jig to fix the glass 10. In the state where the glass 10 is fixed, a foreign substance or moisture adhering to the surface of the glass 10 is sufficiently removed using, for example, an ion gun. In addition, the ion gun activates the surface of the glass 10 so that the deposition in the deposition step described later is performed well. The ion beam generated by the ion gun refers to a flow of ions that make a gas in a neutral state mixed with a positive charge and a negative charge, and extracts it by creating an external environment such as a potential difference or a pressure difference. At this time, the energy of the ion gun is set so that the surface etching of the glass 10 does not occur to an undesired degree.

Subsequently, the base layer 20 is deposited on the glass 10 using an electron beam method or a plasma method (S20). Specifically, when the glass 10 and the deposition material are mounted inside the vacuum chamber, and the vacuum evaporator is operated under the deposition conditions including the deposition thickness, the deposition source is vaporized while the electron beam strikes alumina, which is the deposition source. At this time, in the vaporized deposition source, the alumina layer 21, the lower silica layer 22, the silicon carbide layer 23, and the zirconium layer 24 are sequentially formed. Next, the upper silica layer 30 is deposited on the base layer 20 (S30). In this way, the high hardness layer 40 is formed in the glass 10.

Thereafter, the anti-fingerprint layer 50 is formed on the high hardness layer 40 by using a coating material containing fluorine-based or silicon-based (S40). The anti-fingerprint layer 50 uses a water repellent principle that the water contact angle is about 110 to 116 °. This is to use a principle similar to antifouling processing so that fingerprints and contaminants, etc. are less burying the surface of the glass structure of the present invention. When the anti-fingerprint deposition as in the embodiment of the present invention, the anti-fingerprint effect is significantly improved compared to the conventional anti-fingerprint coating or super water-repellent coating. By the above process, the high hardness glass structure having the anti-fingerprint layer 50 is inspected for reliability and appearance, such as a contact angle measurement test. The glass structure that passed the inspection is attached to the protective film through a laminating process on the surface of the fingerprint layer (S50).

High hardness glass structure having an anti-fingerprint layer according to an embodiment of the present invention is a high hardness layer 40 composed of a base layer 20 and the upper silica layer 30 between the glass 10 and the anti-fingerprint layer 50. Deposit. This improves the durability, reliability and corrosion resistance of the anti-fingerprint layer 20 by a series of processes called deposition. In addition, since both the high hardness layer 40 and the anti-fingerprint layer 50 are formed by vapor deposition, the process can be simplified. Thereby, the yield in production of the glass structure of this invention can be improved.

Hereinafter, the characteristics of the high hardness glass structure having an anti-fingerprint layer according to an embodiment of the present invention will be described. However, the following examples are intended to illustrate the invention and are not limited thereto.

Table 1 represents the hardness measurement results according to the thickness of the base layer according to the conventional and embodiments of the present invention. At this time, the high hardness layer of the present invention was formed by vacuum deposition at a deposition temperature of 150 ℃. Comparative Example 1 was a chemically strengthened glass structure without a conventional high hardness layer, Comparative Example 2 was a chemically strengthened glass structure formed with a conventional anti-fingerprint layer and a silica layer, the embodiment has an anti-fingerprint layer and a high hardness layer of the present invention It was a chemically strengthened glass structure. Hardness was processed by carbon steel (SM45C) into a pencil shape, and confirmed by scratching the glass structure by the same method as the pencil hardness measurement method. The glass sample is a chemically toughened glass from Corning, USA. Here, (circle) is a state without a scratch at all, and x represents the state in which a scratch exists.

Table 1

division	Coating thickness	Carbon steel measuring hardness
division	Coating thickness	200 g	300 g	400 g	500 g	600 g	700 g	800 g	900 g	1000 g
Comparative Example 1	0	○	×	×	×	×	×	×	×	×
Comparative Example 2	300	○	○	×	×	×	×	×	×	×
Example	200	○	○	○	○	○	×	×	×	×
	300	○	○	○	○	○	×	×	×	×
	400	○	○	○	○	○	○	○	○	○
	500	○	○	○	○	○	○	○	○	○
	600	○	○	○	○	○	○	○	○	○
	700	○	○	○	○	○	○	○	○	×
	800	○	○	○	○	○	○	○	×	×
	900	○	○	○	○	○	××	×	×	×

According to Table 1, in the comparative example 1 which does not have a high hardness layer, a scratch generate | occur | produced when carbon hardness measured hardness is larger than 200g. Comparative Example 2 with the anti-fingerprint layer and the silica layer showed scratches when the hardness of the carbon steel was greater than 300 g. Conventional Comparative Example 1 and Comparative Example 2 showed a numerical value of the carbon steel measurement hardness is lower than the embodiment of the present invention. That is, the embodiment of the present invention having a deposition thickness of 200 kPa to 900 kPa has a higher hardness than the conventional glass structure. In the embodiment of the present invention, when the deposition thickness was 200 kPa and 300 kPa, the scratch occurred when the carbon steel measurement hardness was larger than 600 g. When the deposition thickness was 400 kPa to 600 kPa, no scratch occurred even when the carbon steel measurement hardness was 1,000 g. That is, it was found that the deposition thickness has the highest hardness at 350 kPa to 650 kPa.

At the deposition thicknesses of 700 kPa and 800 kPa, no scratch was observed even though the carbon steels measured hardness were 900 g and 800 g, respectively. The deposition thickness of 900 Å was similar to that of 200 Å and 300 Å. Although the deposition thickness by the Example of this invention deviated from 350 kPa-650 kPa, it had hardness higher than the comparative examples 1 and 2 of the conventional. Accordingly, even if the deposition thickness of the embodiment of the present invention is 100 kPa to 1,000 kPa, since it has a higher hardness than the conventional one, it can be used as a glass structure. More preferably, it was a glass structure with optimum hardness when it was 350 kPa-650 kPa.

The glass structure according to the embodiment of the present invention increases adhesion to glass with an alumina layer, improves abrasion resistance with a silicon carbide layer and a zirconium layer, and enhances bonding strength with an anti-fingerprint layer with a silica layer. Accordingly, the bonding force between the high hardness layer and the fingerprint prevention layer is robust. In addition, by applying a zirconium layer, it is possible to increase the hardness of the non-tempered glass or tempered glass compared with the conventional. In addition, the manufacturing process is simple because it is produced continuously by vapor deposition.

As mentioned above, although the present invention has been described in detail with reference to preferred embodiments, the present invention is not limited to the above embodiments, and various modifications may be made by those skilled in the art within the scope of the technical idea of the present invention. It is possible.

Explanation of the sign

10; Glass 20; Basement

21; Alumina layer 22; Bottom silica layer

23; Silicon carbide layer 24; Zirconium Layer

30; Upper silica layer 40; Hard Hardness Layer

50; Fingerprint protection layer

Claims

Unreinforced glass or tempered glass;

A base layer in which an alumina layer, a lower silica layer, a silicon carbide layer, and a zirconium layer are sequentially disposed on the unreinforced glass or tempered glass;

An upper silica layer on the base layer; And

High hardness glass structure comprising a fingerprint layer, characterized in that it comprises an anti-fingerprint layer positioned on the upper silica layer.
The glass structure of claim 1, wherein the base layer has a thickness of 100 kPa to 1,000 kPa.
The glass structure of claim 1, wherein the base layer has a thickness of 350 kPa to 650 kPa.
The glass structure of claim 1, wherein the silicon carbide layer and the zirconium layer are repeatedly formed.
The glass structure of claim 1, wherein zirconium carbide is formed at an interface between the silicon carbide layer and the zirconium layer.
The anti-fingerprint layer of claim 1, wherein the thickness ratio of the alumina layer, the lower silica layer, the silicon carbide layer, and the zirconium layer is 40 to 60:10 to 30:10 to 25:10 to 25. High hardness glass structure containing.
The glass structure of claim 1, wherein the upper silica layer has a thickness of 50 kPa to 200 kPa.
Removing foreign matter on the surface of the unreinforced glass or the tempered glass;

Depositing a base layer in which an alumina layer, a lower silica layer, a silicon carbide layer, and a zirconium layer are sequentially stacked on the surface of the glass from which the foreign matter is removed;

Depositing a top silica layer on the base layer; And

Coating method for a high hardness glass structure comprising an anti-fingerprint layer comprising the step of depositing an anti-fingerprint layer on the upper silica layer.
10. The method of claim 8, wherein the foreign matter is removed by an ion gun.
The method of claim 8, wherein the base layer and the upper silica layer are deposited by an electron beam method.
The method of claim 8, wherein the base layer and the upper silica layer are deposited by an electron beam method.