WO2015016510A1

WO2015016510A1 - Touch sensing electrode

Info

Publication number: WO2015016510A1
Application number: PCT/KR2014/006470
Authority: WO
Inventors: 송병훈; 이재성; 최병진; 하경수; 김상수
Original assignee: 동우화인켐 주식회사
Priority date: 2013-08-01
Filing date: 2014-07-17
Publication date: 2015-02-05

Abstract

The present invention relates to a touch sensing electrode and, more specifically, to a touch sensing electrode capable of minimizing the visibility of a pattern according to a reflexibility difference for each location by comprising: a sensing pattern having a first pattern formed in a first direction and a second pattern formed in a second direction; a metal bridge electrode for electrically connecting spaced unit patterns of the second pattern; and a light-blocking insulator interposed between the sensing pattern and the metal bridge electrode and formed at a visible side with respect to the metal bridge electrode.

Description

Touch sensing electrode

The present invention relates to a touch sensing electrode.

In general, the touch screen panel is a screen panel equipped with a special input device to receive the position when touched by hand. The touch screen panel receives input data directly from the screen so that when a person's hand or an object touches a character or a specific location displayed on the screen without using a keyboard, the touch screen panel can identify the location and perform specific processing by the stored software. It is made possible by being laminated | stacked in multiple layers.

In FIG. 1, an image display device (mobile phone) including a touch screen panel is illustrated. In this touch screen panel, a display portion refers to a portion where an image is displayed, and a non-display portion refers to an edge portion where an image is not displayed. Position detection lines, driving circuits, and the like are formed in the non-display portion, and a light blocking layer is formed so that these wirings are not viewed by the user.

In order to recognize the touched portion without degrading the visibility of the display unit image, it is necessary to use a transparent touch sensing electrode, and typically, a sensing pattern formed in a predetermined pattern is used.

The sensing pattern may be generally formed of a first pattern and a second pattern. The first pattern and the second pattern are disposed in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object contacts the cover window substrate, a change in capacitance according to the contact position is transmitted to the driving circuit side via the first pattern, the second pattern, and the position detection line. Then, the contact position is grasped by the change of the capacitance by the X and Y input processing circuit and the like converted into an electrical signal.

In this regard, the first pattern and the second pattern are formed on the same substrate, and each pattern must be electrically connected to sense a touched point. However, since the second pattern is connected to each other but the first pattern has a separate structure in an island form, a separate metal bridge electrode is required to electrically connect the first sensing pattern.

Due to the difference in reflectance between the metal bridge electrode and the sensing pattern, the pattern may be visually recognized.

On the other hand, when the metal bridge electrode is formed of a very narrow width of the metal can improve the visibility and can be formed together with the metal wiring and position detection line to simplify the process, but the high precision to form a narrow width There is a problem in that it requires processing equipment and takes time for elaborate pattern formation.

Japanese Patent Application Laid-Open No. 2008-98169 proposes a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.

[Preceding technical literature]

[Patent Documents]

(Patent Document 1) Japanese Laid-Open Patent No. 2008-98169

An object of the present invention is to provide a touch sensing electrode with low visibility according to the difference in reflectance for each position.

In addition, an object of the present invention is to provide a touch sensing electrode that can be produced in high yield even with a low-precision installation.

Another object of the present invention is to provide a method of manufacturing the touch sensing electrode.

In addition, an object of the present invention is to provide a touch screen panel having the touch sensing electrode.

1. a sensing pattern having a first pattern formed in a first direction and a second pattern formed in a second direction; A metal bridge electrode electrically connecting the spaced unit patterns of the second pattern; And a light blocking insulator interposed between the sensing pattern and the metal bridge electrode and formed at a viewer side with respect to the metal bridge electrode.

2. In the above 1, the sensing pattern is indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), PEDOT (poly ( 3,4-ethylenedioxythiophene)), carbon nanotubes (CNT), graphene (grapheme) and formed of at least one selected from the group consisting of a metal wire, the touch sensing electrode.

3. In the above 1, wherein the metal bridge electrode is formed of molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium or two or more of these alloys, touch sensing electrode.

4. In the above 1, the width of the unit metal bridge electrode is 2 to 30㎛, touch sensing electrode.

5. In the above 1, wherein the light blocking insulator is formed of a coloring ink, touch sensing electrode.

6. In the above 5, wherein the coloring ink includes a colorant, an alkali-soluble resin binder, a polyfunctional monomer, a photopolymerization initiator, a surfactant and a solvent, the touch sensing electrode.

7. In the above 1, wherein the light blocking insulator is 70% or less transmittance, the touch sensing electrode.

8. In the above 1, the area of the unit light blocking insulator is 55% or less than the area of the unit metal bridge electrode, the touch sensing electrode.

9. The touch sensing electrode according to the above 1, wherein the unit light blocking insulator is 5 µm wider than the unit metal bridge electrode and shorter than 10 µm in length.

10. The touch sensing electrode of 1 above, wherein the unit light blocking insulator has a long side of 70 μm or less and a short side of 20 μm or less.

11. The touch sensing electrode of 1 above, wherein the metal bridge electrode and the light blocking insulator have a long axis thereof at a predetermined angle with the second direction.

12. The touch sensing electrode of 11 above, wherein the predetermined angle is -45 ° to 45 °.

13. The touch sensing electrode of 1 above, formed on one surface of the cover window substrate or the display panel of the touch screen panel.

14. The touch screen panel including the touch sensing electrode of any one of the above 1 to 13.

15. An image display device including the above touch screen panel.

16. Forming a sensing pattern on the cover window substrate with a first pattern formed by connecting the unit pattern to the joint in a first direction and a second pattern formed in the second direction with the unit pattern spaced apart from the joint ; Forming a light blocking insulator on the joint of the unit pattern of the first pattern; Forming a light blocking layer on a non-display portion of the substrate; Forming a metal bridge electrode connecting the spaced unit patterns of the second pattern on the light blocking insulator; And forming a position detection line on the light blocking layer, the position detection line being extended to contact the sensing pattern.

17. The method according to the above 16, wherein the light blocking insulator and the light blocking layer are simultaneously formed in one process.

18. The method according to the above 16, wherein the metal bridge electrode and the position detection line are formed simultaneously in one process, manufacturing method of the touch sensing electrode.

19. forming a metal bridge electrode on one surface of the display panel; Forming a position detection line on a non-display portion of the panel; Forming a light blocking insulator on the metal bridge electrode; Forming a light blocking layer on the position detection line; And a first pattern and a unit pattern in which a joint of a unit pattern extends in a first direction so that the joint of the unit pattern is positioned on the light blocking insulator and whose end is in contact with the position detecting line are spaced apart from the joint to contact the metal bridge electrode. And forming a second pattern formed in a second direction, the end of the second pattern being in contact with the position detecting line.

20. The method according to the above 19, wherein the metal bridge electrode and the position detection line are formed simultaneously in one process, manufacturing method of the touch sensing electrode.

21. The method according to the above 19, wherein the light blocking layer is formed so as not to extend to the sensing pattern, manufacturing method of the touch sensing electrode.

22. The method according to the above 19, wherein the light blocking insulator and the light blocking layer are simultaneously formed in one process.

The present invention can minimize the visibility of the pattern according to the difference in reflectance for each position.

The present invention can be produced in high yield even with low-precision equipment.

In the manufacturing method of the touch sensing electrode of the present invention, since the light blocking insulator and the non-display part light blocking layer are formed of the same material, the light blocking insulator and the light blocking layer can be formed in one step without additional equipment and processes, thereby significantly increasing the process yield. It can be improved.

1 is a perspective view of an image display apparatus (mobile phone) including a touch screen panel.

2 is a schematic perspective view of a touch sensing electrode according to an embodiment of the present invention.

3 is a schematic perspective view of a touch sensing electrode according to an embodiment of the present invention.

4 is a cross-sectional view taken along line AA ′ of the touch sensing electrode according to the exemplary embodiment of the present invention.

5 is a cross-sectional view taken along line AA ′ of the touch sensing electrode according to the exemplary embodiment of the present invention.

6 is a cross-sectional view taken along line AA ′ of the touch sensing electrode according to the exemplary embodiment of the present invention.

7 illustrates a position for reflectance measurement in a plan view of a touch sensing electrode according to an embodiment of the present invention.

The present invention provides a sensing pattern having a first pattern formed in a first direction and a second pattern formed in a second direction; A metal bridge electrode electrically connecting the spaced unit patterns of the second pattern; And a light blocking insulator interposed between the sensing pattern and the metal bridge electrode and formed on the viewing side with respect to the metal bridge electrode, thereby minimizing visibility of the pattern according to the difference in reflectance for each position. will be.

Hereinafter, the present invention will be described in detail.

The touch sensing electrode of the present invention includes a sensing pattern having a first pattern formed in a first direction and a second pattern formed in a second direction; A metal bridge electrode electrically connecting the spaced unit patterns of the second pattern; And a light blocking insulator interposed between the sensing pattern and the metal bridge electrode and formed at a viewer side with respect to the metal bridge electrode.

2 to 5 schematically show the front or the cross section of the touch sensing electrode according to the embodiment of the present invention. Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings.

Detection pattern

The sensing pattern may include a first pattern 10 formed in a first direction and a second pattern 20 formed in a second direction.

The first pattern 10 and the second pattern 20 are disposed in different directions. For example, the first direction may be an X-axis direction, and the second direction may be a Y-axis direction vertically intersecting with the second direction, but is not limited thereto.

The first pattern 10 and the second pattern 20 provide information about the X coordinate and the Y coordinate of the touched point. Specifically, when a human hand or an object contacts the cover window substrate, a change in capacitance according to the contact position is transmitted to the driving circuit via the first pattern 10, the second pattern 20, and the position detection line. do. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.

In this regard, the first pattern 10 and the second pattern 20 are formed on the same layer, and the respective patterns must be electrically connected to detect a touched point. However, the first pattern 10 is a unit pattern is connected to each other through the joint portion, but the second pattern 20 has a structure in which the unit patterns are separated from each other in the form of island (island) to electrically connect the second pattern 20 In order to be connected, a separate metal bridge electrode 30 is required. The metal bridge electrode 30 will be described later.

The thickness of the sensing pattern is not particularly limited, and may be, for example, 20 to 200 nm. If the thickness of the sensing pattern is less than 20 nm, the electrical resistance may be increased, and thus the touch sensitivity may be lowered. If the thickness of the sensing pattern is greater than 200 nm, the reflectance may be increased, thereby causing a problem of visibility.

The sensing pattern may be applied without limitation to the transparent electrode material known in the art. For example, indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), PEDOT (poly (3,4-ethylenedioxythiophene)) , Carbon nanotubes (CNT), graphene (grapheme), metal wires and the like, these may be used alone or in combination of two or more. Preferably indium tin oxide (ITO) may be used. The metal used for a metal wire is not specifically limited, For example, silver (Ag), gold, aluminum, copper, iron, nickel, titanium, telenium, chromium, etc. are mentioned. These can be used individually or in mixture of 2 or more types.

Metal bridge electrode

The metal bridge electrode 30 electrically connects the unit patterns spaced apart from the second pattern 20.

In this case, since the metal bridge electrode 30 must be electrically blocked from the first pattern 10 of the sensing pattern, an insulator is formed for this purpose. This will be described later.

The metal bridge electrode 30 according to the present invention is formed of a metal material, preferably the same material as the position detection line 60 to be described later. In such a case, the metal bridge electrodes 30 may be formed together when the position detection line 60 is formed, thereby simplifying the process.

The metal is not particularly limited as long as it has excellent electrical conductivity and low resistance, and examples thereof include molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium, and alloys of two or more thereof. , Preferably an alloy of silver, palladium and copper.

The size of the unit metal bridge electrode 30 is not particularly limited, and for example, the long side may be 2 to 30 μm, preferably 2 to 20 μm, but is not limited thereto. When the long side of the bridge is 2 to 30 mu m, the visibility of the pattern may be reduced and may have an appropriate electrical resistance.

The metal bridge electrode 30 may be formed in a second direction so as to connect the unit patterns spaced apart from the second pattern 20, but the present invention is not limited thereto, and a long axis of the metal bridge electrode may have a predetermined angle with the second direction on a plane. Can be formed. For example, it may be formed to have an angle of -45 ° to 45 ° with respect to the second direction.

When the touch sensing electrode of the present invention is applied to an image display device, the pixel portion is positioned above or below the touch sensing electrode. The metal bridge electrode 30 has the same transmittance as that of the unit bridge electrode due to its low transmittance due to the characteristics of the metal material. In the case where the unit pixels of the pixel portion are arranged in the unit bridge electrode, the unit bridge electrode may cover the entire unit pixel. However, when formed at an angle of −45 ° to 45 ° with respect to the second direction, the problem of covering the unit pixel may be minimized.

Light blocking insulator

An insulator is formed between the sensing pattern and the metal bridge electrode 30 to prevent electrical connection of the sensing pattern and the metal bridge electrode 30. It is usually formed in a layer structure, and when applied to the touch screen panel, it is formed of a transparent insulating material to realize excellent transmittance of the touch screen panel.

However, the insulator 40 of the present invention is formed of a material that blocks light.

In the case where the metal bridge electrode 30 is formed of a metal, the metal may be visually recognized because the reflectance is much higher than that of a conventional sensing electrode material, so that the unit metal bridge electrode 30 should be formed in a narrow width to reduce visibility. It requires a production facility of the island, there is a problem that takes a long time for the formation of a sophisticated pattern.

However, the touch sensing electrode of the present invention includes the light-blocking insulator 40 formed on the viewing side with respect to the metal bridge electrode 30, thereby lowering the visibility of the metal bridge electrode 30 and making the metal wider. Even if the bridge electrode 30 is formed, the metal bridge electrode 30 can be prevented from being visually recognized.

Unlike the conventional insulator, the light blocking insulator 40 according to the present invention blocks light, and thus is not formed in a layer structure, but is formed only in a local region between the sensing pattern and the metal bridge electrode 30.

FIG. 2 is a perspective view of an embodiment of a touch sensing electrode having a lower surface at the viewing side, and FIGS. 4 and 5 are vertical cross-sectional views. As such, when the lower surface is at the viewing side, the light blocking insulator 40 may include the metal bridge electrode 30. 3), and when the upper surface is the viewing side as shown in FIGS. 3 and 6, the upper surface of the metal bridge electrode 30 is formed.

The light blocking insulator 40 may be applied without limitation as long as the light blocking insulator 40 has excellent insulating property while blocking light. For example, it can be prepared with a coloring ink.

The coloring ink may include colorants, alkali-soluble resin binders, polyfunctional monomers, photopolymerization initiators, surfactants, solvents, other additives, and the like commonly used in the art.

The ratio of the area of the light blocking insulator 40 and the metal bridge electrode 30 is within a range in which the light is blocked to reduce the visibility of the metal bridge electrode 30 and the transmission decrease when applied to the touch screen panel is minimized. If it is not particularly limited, for example, the area of the unit light blocking insulator may be 55% or less of the area of the unit metal bridge electrode 30. In addition, when the unit light blocking insulator is applied to the touch screen panel, it is preferable that the unit light blocking insulator is smaller than the area of the unit sub pixel of the lower display in view of suppressing light transmittance deterioration. For example, the area of the unit light blocking insulator may be 10 to 50% of the unit subpixel area. If the area is less than 10%, a high-precision equipment for forming a fine pattern may be required, and process efficiency may be reduced. If the area is more than 50%, the light blocking insulator may be viewed or the transmittance of the touch sensing electrode may be reduced.

The size of the light blocking insulator 40 is not particularly limited within the range satisfying the area ratio. For example, the long side of the unit light blocking insulator may be 70 μm or less, and the short side may be 20 μm or less. When the long side of the unit light blocking insulator exceeds 70 μm or the short side exceeds 20 μm, the light transmittance may decrease and the light blocking insulator may be visually recognized. In view of minimizing light transmittance reduction while suppressing visibility of the metal bridge electrode 30, the long side may be 20 to 50 μm and the short side may be 10 to 16 μm.

The size of the light blocking insulator 40 is not particularly limited within the range satisfying the area ratio, but in view of suppressing visibility of the metal bridge electrode 30, the width of the unit light blocking insulator 40 is unit metal bridge electrode 30. Preferably greater than For example, the width may be 5 μm or more wider than the width of the unit metal bridge electrode 30. Preferably, the metal bridge electrode 30 may be 10 to 20 μm wider in view of minimizing the visibility of the metal bridge electrode 30 and then reducing the permeability when applied to the touch screen panel. In such aspects, the length of the unit light blocking insulator 40 may be 10 μm or more shorter than the length of the unit metal bridge electrode 30, and preferably 20 to 40 μm shorter.

The transmittance of the light blocking insulator 40 is not particularly limited, and may be appropriately selected so as to minimize light transmission, thereby reducing the visibility of the metal bridge electrode 30 and minimizing the decrease in the transmission when applied to the touch screen panel. For example, it may be 70% or less, and preferably 20 to 60%.

As described above, when the metal bridge electrode 30 is formed at an angle of -45 ° to 45 °, the light blocking insulator 40 is also formed at the same angle.

Position detection line and light blocking layer

As shown in FIG. 1, the touch screen panel has a non-display portion, which is an edge portion where an image is not displayed, and a non-display portion is provided with a position detection line for transmitting a touch signal sensed by a sensing pattern to a driving circuit. The light blocking layer is formed so that these wirings are not visually recognized by the user.

Therefore, the touch sensing electrode of the present invention may further include a position detection line 60 and a light blocking layer 50 in the non-display portion.

The light blocking layer 50 may be positioned on the second pattern 20 as illustrated in FIG. 4, on the substrate 1 as illustrated in FIG. 5 when the bottom surface is the viewer side, or the position detection may be performed. It may also be located on line 60. In terms of being able to be formed simultaneously with the light blocking insulator 40, the light blocking insulator 40 may be positioned on the second pattern 20 or on the substrate 1.

In the case where the upper surface is the viewer side, as illustrated in FIG. 6, the position on the position detecting line 60 is preferable in that the metal bridge electrode 30 and the position detecting line 60 can be simultaneously formed. It is not limited.

The light blocking layer 50 may be made of a composition for forming a light blocking layer known in the art, or may be formed of a material within the range exemplified as the material for forming the light blocking insulator 40 described above. Preferably, the light blocking insulator 40 may be formed of the same material.

The position detection line 60 is formed to contact the first pattern 10 or the second pattern 20 on the same line line. For example, when the lower surface is the viewer side, as shown in FIG. 4, the first pattern 10 or the second pattern 20 may be contacted through a contact hole (not shown) formed in a portion of the light blocking layer 50. As shown in FIG. 5, the light blocking layer 50 may be contacted by extending to the end of the first pattern 10 or the second pattern 20, and in view of preventing the position detection line 60 from being visually recognized. The first pattern 10 or the second pattern 20 may be in contact with each other through the contact hole.

The position detection line 60 may be made of metal within the range exemplified as the material of the metal bridge electrode 30 described above, and preferably, may be formed of the same material as the metal bridge electrode 30.

Board

The touch sensing electrode of the present invention is formed on the substrate 1.

The substrate 1 may be any material commonly used in the art without limitation, for example, glass, polyethersulphone (PES), polyacrylate (PAR, polyacrylate), polyether imide (PEI, polyetherimide, polyethylene naphthalate (PEN, polyethyelenen napthalate), polyethylene terephthalate (PET, polyethyelene terepthalate), polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate ( PC, polycarbonate), cellulose tri acetate (TAC), cellulose acetate propionate (CAP), and the like.

The substrate 1 may be a cover window substrate or a display panel forming an outermost surface of the touch screen panel.

The touch sensing electrode of the present invention may further include a transparent dielectric layer as necessary.

The transparent dielectric layer may be formed between the substrate 1 and the sensing pattern when the substrate 1 is a cover window substrate and between the cover window substrate and the sensing pattern when the substrate 1 is a display panel.

The transparent dielectric layer improves the optical uniformity of the touch screen panel by reducing the difference in optical characteristics due to positional structural differences according to the sensing pattern structure.

The transparent dielectric layer may be formed of SiO ₂ , an organic insulating film, or the like. The formation method may be a vacuum deposition method, a sputtering method, a coating method, and the like, and may be easily manufactured in the form of a thin film through the above method.

In the present invention, if necessary, the transparent dielectric layer may be formed of a plurality of layers. In this case, each layer may be formed of different materials, and may have different refractive indices and thicknesses.

Passivation layer

The present invention may further include a passivation layer covering the sensing pattern as necessary in order to prevent the sensing pattern and the metal bridge electrode 30 from being contaminated by an external environment (moisture, air, etc.).

The passivation layer may be formed in a required pattern using a metal oxide such as silicon oxide, a transparent photosensitive resin composition containing an acrylic resin, a thermosetting resin composition, or the like.

The passivation layer according to the present invention may have a suitable thickness, for example 2,000 nm or less. Thus, for example, it may be 0 to 2,000 nm. Within this range, it is possible to further improve the reflectance reduction effect of the touch sensing electrode according to the present invention.

The passivation layer may be provided with a contact hole for connecting the sensing pattern and the driving circuit.

Adhesive layer

When the substrate 1 below the touch sensing electrode of the present invention is a cover window substrate, the touch sensing electrode is bonded to the display panel through an adhesive layer.

In addition, when the substrate 1 is one surface of the display panel, the touch sensing electrode is bonded to the cover window substrate through an adhesive layer.

The adhesive layer may be formed by coating and curing the transparent curable resin composition (OCR), or may be formed by compressing an already cured film (OCA).

In addition, the present invention provides a method of manufacturing the touch sensing electrode.

Hereinafter, a method of manufacturing a touch sensing electrode according to an embodiment of the present invention will be described.

First, a first pattern 10 formed by connecting a unit pattern to a joint part in a first direction on a cover window substrate and a second pattern 20 formed in a second direction by being separated from the joint part based on the joint part Form a sensing pattern.

The first pattern 10 and the second pattern 20 are formed on the same layer, the first pattern 10 is a unit pattern is connected to each other through the joint portion, the second pattern 20 is a unit pattern is island ( islands are formed separately from each other.

The sensing pattern may be appropriately selected and formed within the aforementioned materials and thickness ranges.

The sensing pattern may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition.

In addition, the sensing pattern may be formed by a printing process. In this printing process, various printing methods such as gravure off set, reverse off set, inkjet printing, screen printing, and gravure printing may be used. In particular, when the sensing pattern is formed by a printing process, the sensing pattern may be formed of a printable paste material. For example, it may be formed of carbon nanotubes (CNTs), conductive polymers, and silver nano wire inks.

In addition to the above method, it may be formed by photolithography.

Next, a light blocking insulator 40 is formed on the joint of the unit pattern of the first pattern 10.

The light blocking insulator 40 may be appropriately selected and formed within the above-described material, size, area ratio, and transmittance range.

The light blocking layer 50 is formed on the non-display portion of the substrate. In the manufacturing method of the present invention, the light blocking insulation 40 and the light blocking layer 50 are formed of the same material. Accordingly, it is possible to simultaneously form the same equipment in the same process without requiring separate equipment and processes for forming the light blocking insulator 40 and the light blocking layer 50. This significantly improves the process yield.

The light blocking layer 50 may be formed to have a contact hole (not shown) so that the position detection line 60 to be described later may be connected to the first pattern 10 or the second pattern 20 through this.

The contact hole may be formed by forming a hole after the light blocking layer 50 is formed (hole method), and the light blocking layer 50 may be formed by the first pattern 10 or the second pattern 20. It may be formed in such a manner as to form except for the portion to be connected (island manner).

Subsequently, a metal bridge electrode 30 connecting the spaced unit patterns of the second pattern 20 is formed on the light blocking insulator 40.

The metal bridge electrode 30 may also be appropriately selected and formed within the aforementioned material and size ranges.

A position detection line 60 is formed on the light blocking layer 50 to extend in contact with the sensing pattern.

The position detection line 60 is formed to contact the first pattern 10 or the second pattern 20 on the same line. For example, the first hole 10 may contact the first pattern 10 or the second pattern 20 through a contact hole formed in a portion of the light blocking layer 50, and may be connected to the end of the first pattern 10 or the second pattern 20. It can also be contacted by extending.

The position detecting line 60 is preferably formed of the same material as the metal bridge electrode 30 in that it can be simultaneously formed in the same process with the same equipment.

The method of forming the light blocking insulator 40, the light blocking layer 50, the metal bridge electrode 30, and the position detection line 60 is not particularly limited, and may be formed by a method selected from the methods exemplified as the sensing pattern forming method. Can be.

In addition, according to another embodiment of the method of manufacturing the touch sensing electrode of the present invention, first, the metal bridge electrode 30 is formed on one surface of the display panel.

Then, the position detection line 60 is formed in the non-display portion of the panel.

The metal bridge electrode 30 may be appropriately selected and formed within the above-described material and size range, and the position detection line 60 may be formed of the same material as the metal bridge electrode 30 in the process using the same equipment. It is preferable in that it can form at the same time.

Thereafter, a light blocking insulator 40 is formed on the metal bridge electrode 30.

Then, the light blocking layer 50 is formed on the position detection line 60.

The light blocking insulator 40 may be appropriately selected within the above-described material, size, area ratio, and transmittance range, and the light blocking layer 50 may be formed of the same material. Accordingly, it is possible to simultaneously form the same equipment in the same process without requiring separate equipment and processes for forming the light blocking insulator 40 and the light blocking layer 50. This significantly improves the process yield.

Next, the first pattern 10 and the unit pattern in which the joint of the unit pattern extends in the first direction so as to be positioned on the light blocking insulator 40 and the ends thereof contact the position detection line 60 are connected to the joint. The second pattern 20 is formed in the second direction to be spaced apart from each other so as to contact the metal bridge electrode 30 and the end thereof is in contact with the position detection line 60.

The first pattern 10 is formed to extend in the first direction so that the joint of the unit pattern is positioned on the light blocking insulator 40, and must be electrically blocked from the metal bridge electrode 30. It is formed so as not to contact with 30).

Since the position detection line 60 transmits the touch signal sensed by the first pattern 10 and the second pattern 20, the end of each of the first pattern 10 and the second pattern 20 has a position detection line. It is formed to contact 60.

The first and

second patterns

10 and 20, the light blocking insulator 40, the light blocking layer 50, the metal bridge electrode 30 and the position detecting line 60 are also selected by the method selected within the scope of the above-described method. Can be prepared.

In addition, the present invention provides a touch screen panel including the touch sensing electrode.

The touch screen panel of the present invention further includes a configuration commonly used in the art, in addition to the touch sensing electrode.

In addition, the present invention provides an image display device including the touch screen panel.

Hereinafter, preferred examples are provided to aid the understanding of the present invention, but these examples are merely illustrative of the present invention and are not intended to limit the scope of the appended claims, which are within the scope and spirit of the present invention. It is apparent to those skilled in the art that various changes and modifications can be made to the present invention, and such modifications and changes belong to the appended claims.

실시예 및 비교예Examples and Comparative Examples

The touch sensing electrodes having the structures shown in FIGS. 3 and 6 were manufactured using the following materials, and the reflectances of the respective positions shown in FIG. 7 were measured and shown in Table 1 below.

The reflectance means the average of the reflectance at 400nm ~ 700nm.

Examples 1 to 4 and Comparative Examples 1 and 2 were glass (refractive index: 1.51, extinction coefficient: 0), Examples 5 and 6, and Comparative Examples 3 and 4 used polycarbonate films as substrates.

The first and second patterns include ITO (refractive index: 1.8, extinction coefficient: 0),

Examples 1 to 3 and Comparative Example 1 used molybdenum as metal bridge electrodes, and Examples 4 and 5 and Comparative Examples 2 and 3 used alloys of 98 wt% silver, 1 wt% palladium and 1 wt% copper. It was. Example 6 and Comparative Example 4 used copper.

The light-blocking insulator is 110 parts by weight of carbon black as a colorant in the case of Example 1, a copolymer of benzyl (meth) acrylate / (meth) acrylic acid (acid value 110 KOHmg / g, molar ratio 70/30, Mw = an alkali-soluble resin binder). 30,000) 29 parts by weight, and 70 parts by weight of a polymer having an allylglycidyl ether added to the copolymer of benzyl (meth) acrylate / (meth) acrylic acid (acid value 80 KOH mg / g, Mw = 22,000), a functional monomer 50 parts by weight of rhodentaerythritol hexaacrylate, 20 parts by weight of 2-benzyl-2- (dimethylamino) -1- (4-morpholinophenyl) butyl-1-one as a photopolymerization initiator, 2,2'- 10 parts by weight of bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole, 5 parts by weight of 4,4-bis (diethylamino) benzophenone, and mer 5 parts by weight of captobenzothiazole, 9 parts by weight of a polyester-based dispersant as a dispersant, 0.53 part by weight of 3-methacryloxypropyltrimethoxysilane as an adhesion promoter, and imparting ink repellency 1 part by weight of a leveling agent or a silicone-based fluoro ringye surfactant, a solvent and mixed with propylene glycol monomethyl ether acetate 440 parts by weight of ethoxy ethyl propionate 290 parts by weight. The mixture was then formed into colored inks prepared by stirring for 5 hours. In Example 2, carbon black was formed into a coloring ink including 80 parts by weight, and in Examples 3 to 6, 60 parts by weight.

In Comparative Examples 1 to 4, an insulator was formed of an acrylic insulating material (refractive index: 1.51 and extinction coefficient: 0).

Table 1

Referring to Table 1, the touch sensing electrodes of Examples 1 to 6 have a significant effect of reducing the reflectance by the light blocking insulator when the reflectances at

positions

1 and 3, 2 and 4, 3 and 5 are compared with the comparative examples, respectively. You can see big. Thereby, the effect of the visibility reduction of the metal bridge electrode was very excellent.

However, the touch sensing electrodes of Comparative Examples 1 to 4 significantly differed in reflectance at

positions

1 and 3, 2 and 4, 3 and 5, so that the metal bridge electrodes were recognized.

[Description of the code]

1: substrate 10: first pattern

20: second pattern 30: metal bridge electrode

40: light blocking insulator 50: light blocking layer

60: position detection line

Claims

A sensing pattern having a first pattern formed in a first direction and a second pattern formed in a second direction;

A metal bridge electrode electrically connecting the spaced unit patterns of the second pattern; And

A light blocking insulator interposed between the sensing pattern and the metal bridge electrode and formed at the viewer side based on the metal bridge electrode.

Touch sensing electrode comprising a.
The method of claim 1, wherein the sensing pattern is indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), PEDOT (poly (3, 4-ethylenedioxythiophene)), carbon nanotubes (CNT), graphene (grapheme) and formed of at least one selected from the group consisting of a metal wire, the touch sensing electrode.
The touch sensing electrode of claim 1, wherein the metal bridge electrode is formed of molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium, or an alloy of two or more thereof.
The touch sensing electrode of claim 1, wherein a width of the unit metal bridge electrode is 2 to 30 μm.
The touch sensing electrode of claim 1, wherein the light blocking insulator is formed of a coloring ink.
The touch sensitive electrode of claim 5, wherein the coloring ink comprises a colorant, an alkali-soluble resin binder, a polyfunctional monomer, a photopolymerization initiator, a surfactant, and a solvent.
The touch sensing electrode of claim 1, wherein the light blocking insulator has a transmittance of 70% or less.
The touch sensing electrode of claim 1, wherein an area of the unit light blocking insulator is 55% or less of an area of the unit metal bridge electrode.
The touch sensing electrode of claim 1, wherein the unit light blocking insulator is at least 5 μm wider and at least 10 μm shorter in length than the unit metal bridge electrode.
The touch sensing electrode of claim 1, wherein the unit light blocking insulator has a long side of 70 μm or less and a short side of 20 μm or less.
The touch sensing electrode of claim 1, wherein the metal bridge electrode and the light blocking insulator have a long axis at an angle with the second direction.
The touch sensitive electrode of claim 11, wherein the predetermined angle is between −45 ° and 45 °.
The touch sensing electrode of claim 1, wherein the touch sensing electrode is formed on one surface of the cover window substrate or the display panel of the touch screen panel.
A touch screen panel comprising the touch sensing electrode of claim 1.
An image display device comprising the touch screen panel of claim 14.
Forming a sensing pattern including a first pattern formed by connecting a unit pattern to a joint part in a first direction on the cover window substrate and a second pattern formed in a second direction by a unit pattern spaced apart from the joint part;

Forming a light blocking insulator on the joint of the unit pattern of the first pattern;

Forming a light blocking layer on a non-display portion of the substrate;

Forming a metal bridge electrode connecting the spaced unit patterns of the second pattern on the light blocking insulator; And

And forming a position detection line on the light blocking layer, the position detection line being extended to contact the sensing pattern.
The method of claim 16, wherein the light blocking insulator and the light blocking layer are simultaneously formed in one process.
The method of claim 16, wherein the metal bridge electrode and the position detection line are simultaneously formed in one process.
Forming a metal bridge electrode on one surface of the display panel;

Forming a position detection line on a non-display portion of the panel;

Forming a light blocking insulator on the metal bridge electrode;

Forming a light blocking layer on the position detection line; And

The first pattern and the unit pattern of which the joint of the unit pattern extends in the first direction to be positioned on the light blocking insulator and whose ends are in contact with the position detection line are separated from the joint to contact the metal bridge electrode. And forming a second pattern formed in two directions and having a distal end thereof in contact with the position detecting line.
The method of claim 19, wherein the metal bridge electrode and the position detection line are simultaneously formed in one process.
The method of claim 19, wherein the light blocking layer is formed so as not to extend to the sensing pattern.
The method of manufacturing a touch sensing electrode according to claim 19, wherein the light blocking insulator and the light blocking layer are simultaneously formed in one process.