WO2013055150A3 - Photosensitive resin composition for color filter and color filter manufactured by using same - Google Patents

Photosensitive resin composition for color filter and color filter manufactured by using same Download PDF

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Publication number
WO2013055150A3
WO2013055150A3 PCT/KR2012/008316 KR2012008316W WO2013055150A3 WO 2013055150 A3 WO2013055150 A3 WO 2013055150A3 KR 2012008316 W KR2012008316 W KR 2012008316W WO 2013055150 A3 WO2013055150 A3 WO 2013055150A3
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
resin composition
photosensitive resin
same
manufactured
Prior art date
Application number
PCT/KR2012/008316
Other languages
French (fr)
Korean (ko)
Other versions
WO2013055150A2 (en
Inventor
김길래
김경아
박정환
김병욱
Original Assignee
주식회사 동진쎄미켐
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 동진쎄미켐 filed Critical 주식회사 동진쎄미켐
Priority to CN201280050041.0A priority Critical patent/CN103890658B/en
Publication of WO2013055150A2 publication Critical patent/WO2013055150A2/en
Publication of WO2013055150A3 publication Critical patent/WO2013055150A3/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)

Abstract

The present invention relates to a photosensitive resin composition for a color filter and the color filter manufactured by using the same. A photosensitive resin composition for a color filter according to the present invention has, together with a pigment, a dye which has a specific spectral characteristic, and thus, the color filter manufactured by using said photosensitive resin composition enables a penetration ratio, brightness, contrast, and color purity to be superior, and also shows an improved heat-resistant characteristic.
PCT/KR2012/008316 2011-10-13 2012-10-12 Photosensitive resin composition for color filter and color filter manufactured by using same WO2013055150A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201280050041.0A CN103890658B (en) 2011-10-13 2012-10-12 Photosensitive resin composition for color filter and color filter made by using the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0104644 2011-10-13
KR1020110104644A KR101952252B1 (en) 2011-10-13 2011-10-13 Photosensitive resin composition for color filter and color filter prepared by using the same

Publications (2)

Publication Number Publication Date
WO2013055150A2 WO2013055150A2 (en) 2013-04-18
WO2013055150A3 true WO2013055150A3 (en) 2013-07-04

Family

ID=48082676

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/008316 WO2013055150A2 (en) 2011-10-13 2012-10-12 Photosensitive resin composition for color filter and color filter manufactured by using same

Country Status (4)

Country Link
KR (1) KR101952252B1 (en)
CN (1) CN103890658B (en)
TW (1) TW201321802A (en)
WO (1) WO2013055150A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140076320A (en) 2012-12-12 2014-06-20 제일모직주식회사 Photosensitive resin composition and black spacer using the same
KR20150083384A (en) 2014-01-09 2015-07-17 제일모직주식회사 Photosensitive resin composition and color filter using the same
KR101750462B1 (en) 2014-05-12 2017-06-23 제일모직 주식회사 Novel compound, novel mixture, photosensitive resin composition, and color fliter
KR101819656B1 (en) 2014-05-13 2018-01-17 제일모직 주식회사 Photosensitive resin composition and color filter using the same
KR20170010969A (en) * 2015-07-20 2017-02-02 이리도스 주식회사 A colorant compound, and a colorant material comprising the same
KR102300331B1 (en) * 2017-03-31 2021-09-09 동우 화인켐 주식회사 Blue photosensitive resin composition, color filter and image display device produced using the same
CN110007561B (en) * 2018-01-04 2022-07-19 东友精细化工有限公司 Green photosensitive resin composition, color filter and image display device
KR102400637B1 (en) * 2019-11-04 2022-05-23 주식회사 케이디파인켐 Colorants for Heat Transfer Fluids and Compositions Comprising the Same
KR20210073277A (en) * 2019-12-10 2021-06-18 극동제연공업 주식회사 Colorants for Heat Transfer Fluids and Compositions Comprising the Same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08302224A (en) * 1995-04-28 1996-11-19 Yamamoto Chem Inc Phthalocyanine compound, its intermediate, method for producing the phthalocyanine compound, color filter using the phthalocyanine compound and oil ink composition
JP2002121412A (en) * 2000-10-17 2002-04-23 Nippon Shokubai Co Ltd Copper phthalocyanin modified pigment and method of producing the same
JP2003161821A (en) * 2000-12-22 2003-06-06 Mitsubishi Chemicals Corp Composition for color filter, and the color filter
JP2004157455A (en) * 2002-11-08 2004-06-03 Fuji Photo Film Co Ltd Dye-containing hardening composition, color filter and its manufacturing method
JP2006058700A (en) * 2004-08-20 2006-03-02 Fuji Photo Film Co Ltd Colored curable composition, color filter and method for producing same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08302224A (en) * 1995-04-28 1996-11-19 Yamamoto Chem Inc Phthalocyanine compound, its intermediate, method for producing the phthalocyanine compound, color filter using the phthalocyanine compound and oil ink composition
JP2002121412A (en) * 2000-10-17 2002-04-23 Nippon Shokubai Co Ltd Copper phthalocyanin modified pigment and method of producing the same
JP2003161821A (en) * 2000-12-22 2003-06-06 Mitsubishi Chemicals Corp Composition for color filter, and the color filter
JP2004157455A (en) * 2002-11-08 2004-06-03 Fuji Photo Film Co Ltd Dye-containing hardening composition, color filter and its manufacturing method
JP2006058700A (en) * 2004-08-20 2006-03-02 Fuji Photo Film Co Ltd Colored curable composition, color filter and method for producing same

Also Published As

Publication number Publication date
CN103890658A (en) 2014-06-25
KR20130039949A (en) 2013-04-23
WO2013055150A2 (en) 2013-04-18
KR101952252B1 (en) 2019-02-26
CN103890658B (en) 2017-12-05
TW201321802A (en) 2013-06-01

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