WO2013008675A1 - Touch panel and display device with touch panel - Google Patents

Touch panel and display device with touch panel Download PDF

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Publication number
WO2013008675A1
WO2013008675A1 PCT/JP2012/066948 JP2012066948W WO2013008675A1 WO 2013008675 A1 WO2013008675 A1 WO 2013008675A1 JP 2012066948 W JP2012066948 W JP 2012066948W WO 2013008675 A1 WO2013008675 A1 WO 2013008675A1
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WO
WIPO (PCT)
Prior art keywords
layer
touch panel
inorganic
transparent electrode
light shielding
Prior art date
Application number
PCT/JP2012/066948
Other languages
French (fr)
Japanese (ja)
Inventor
安弘 横井
聖 中原
Original Assignee
シャープ株式会社
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Publication date
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Publication of WO2013008675A1 publication Critical patent/WO2013008675A1/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Definitions

  • the present invention relates to a touch panel and a display device with a touch panel, and more particularly to a cover integrated touch panel and a display device with a touch panel.
  • a touch panel capable of detecting a position touched by a pen or a finger on the operation surface, that is, a touch position is known.
  • Japanese Patent Application Laid-Open No. 2009-301767 discloses an overcoat layer having a film thickness of 2 to 3 ⁇ m, a film thickness of 10 to 20 nm on the one surface of a transparent substrate having a light-shielding layer having a film thickness of 0.5 to 1.5 ⁇ m on one surface.
  • a touch panel in which transparent electrode layers (transparent conductive films) are sequentially laminated is disclosed.
  • the adhesion between the overcoat layer and the transparent electrode layer is not sufficient.
  • An object of the present invention is to obtain a configuration of a touch panel that is free from bubbles and foreign matter and has excellent adhesion of a transparent electrode layer in a cover-integrated touch panel.
  • the touch panel disclosed below includes a cover member disposed on the viewer side and a plurality of layers stacked using the cover member as a substrate.
  • the plurality of layers include a transparent electrode layer made of an inorganic material, and the transparent electrode layer is in contact with the inorganic material in the direction of the viewer.
  • the cover-integrated touch panel it is possible to obtain a configuration of a touch panel that is free from bubbles and foreign matter and has excellent adhesion of the transparent electrode layer.
  • FIG. 1 is a cross-sectional view schematically illustrating a schematic configuration of a touch panel according to a first embodiment of the present invention and a display device with a touch panel including the touch panel.
  • FIG. 2A is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment.
  • FIG. 2B is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment.
  • FIG. 2C is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment.
  • FIG. 2D is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment.
  • FIG. 2E is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment.
  • FIG. 1 is a cross-sectional view schematically illustrating a schematic configuration of a touch panel according to a first embodiment of the present invention and a display device with a touch panel including the touch panel.
  • FIG. 2A is a diagram illustrating one of manufacturing processes of the touch panel according to the first
  • FIG. 3 is a cross-sectional view schematically showing a schematic configuration of a touch panel according to a comparative example and a display device with a touch panel including the touch panel.
  • FIG. 4 is a plan view schematically showing a schematic configuration of a touch panel according to a modified example of the first embodiment.
  • FIG. 5 is a sectional view taken along line VV in FIG.
  • FIG. 6A is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment.
  • FIG. 6B is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment.
  • FIG. 6C is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment.
  • FIG. 6A is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment.
  • FIG. 6B is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment.
  • FIG. 6C is
  • FIG. 6D is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment.
  • FIG. 6E is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment.
  • FIG. 7 is sectional drawing which shows typically schematic structure of the touchscreen concerning the 2nd Embodiment of this invention, and a display apparatus with a touchscreen provided with this touchscreen.
  • FIG. 8 is sectional drawing which shows typically schematic structure of the touchscreen concerning the 3rd Embodiment of this invention, and a display apparatus with a touchscreen provided with this touchscreen.
  • FIG. 9 is sectional drawing which shows typically schematic structure of the touchscreen concerning the 4th Embodiment of this invention, and a display apparatus with a touchscreen provided with this touchscreen.
  • a touch panel includes a cover member disposed on an observer side and a plurality of layers stacked using the cover member as a substrate.
  • the plurality of layers include a transparent electrode layer made of an inorganic material.
  • the transparent electrode layer is in contact with the inorganic material in the direction of the observer (first configuration).
  • a plurality of layers forming the touch panel are stacked using the cover member as a substrate. Thereby, there is no process of bonding the touch panel and the cover, which are produced as separate bodies. Therefore, it is possible to eliminate the mixing of bubbles and foreign matters resulting from this process.
  • the transparent electrode layer is formed in contact with the inorganic material, a structure with high adhesion of the transparent electrode layer can be obtained.
  • the inorganic material in contact with the transparent electrode layer can be the cover member (second configuration).
  • the transparent electrode layer is formed directly on the cover member. Therefore, the number of layers forming the touch panel is reduced, and a configuration with high transmittance can be obtained.
  • the plurality of layers may include an inorganic layer made of an insulating inorganic material and covering one surface of the cover member.
  • the inorganic material in contact with the transparent electrode layer can be the inorganic layer (third configuration).
  • the adhesiveness of the transparent electrode layer can be enhanced by covering with an inorganic layer made of an inorganic material regardless of the material of the cover member.
  • the plurality of layers include an organic layer made of an insulating organic material that covers one surface of the cover member, and an inorganic material made of an insulating inorganic material that covers the organic layer. Layer may be included.
  • the inorganic material in contact with the transparent electrode layer can be the inorganic layer (fourth configuration).
  • the above configuration has an organic layer.
  • the organic layer is easy to form a relatively flat layer. Then, an inorganic layer is formed in contact with the organic layer. Therefore, the transparent electrode layer can be produced on a flat plane.
  • the plurality of layers include a wiring layer electrically connected to the transparent electrode layer, and a light shielding layer provided closer to the viewer than the wiring layer. Further, it may be included (fifth configuration).
  • the plurality of layers cover the wiring layer electrically connected to the transparent electrode layer, a light shielding layer provided closer to the viewer than the wiring layer, and the light shielding layer.
  • An inorganic layer made of an insulating inorganic material may be further included.
  • the wiring layer can be formed in contact with the inorganic layer (sixth configuration).
  • the light shielding layer is covered with the insulating inorganic layer.
  • the wiring layer is formed in contact with this inorganic layer.
  • this inorganic layer prevents the wiring layer from being short-circuited when the light shielding layer is made of a conductive material. Furthermore, this inorganic layer protects the light shielding layer from the process in forming the transparent electrode layer and the wiring layer.
  • the plurality of layers may further include a wiring layer electrically connected to the transparent electrode layer and a light shielding layer provided closer to the viewer than the wiring layer.
  • the light shielding layer is covered with the inorganic layer, and the wiring layer can be formed in contact with the inorganic layer (seventh configuration).
  • a display device with a touch panel includes a display device capable of displaying an image and the touch panel having any one of the first to seventh configurations.
  • FIG. 1 is sectional drawing which shows typically schematic structure of the touchscreen 10 concerning the 1st Embodiment of this invention, and the display apparatus 1 with a touchscreen provided with the touchscreen 10.
  • the display device with a touch panel 1 includes a touch panel 10 and a display device 90 capable of displaying an image.
  • the display device 90 is, for example, a liquid crystal display.
  • the touch panel 10 includes a transparent substrate 11, a light shielding layer 12, an inorganic layer 13, a transparent electrode layer 14, wiring 15, a protective film 16, and an FPC (Flexible Printed Circuit: flexible printed circuit board) 17.
  • FPC Flexible Printed Circuit: flexible printed circuit board
  • the transparent substrate 11 is disposed on the opposite side of the display device 90, that is, on the viewer side.
  • the transparent substrate 11 also serves as a cover when the touch panel 10 is used.
  • the transparent substrate 11 can be made of an insulating material that is excellent in translucency. In the present embodiment, alkali glass is used as the transparent substrate 11.
  • the light shielding layer 12 is formed in a frame shape, for example, on the periphery of the surface of the transparent substrate 11 on the display device 90 side.
  • a metal such as aluminum, molybdenum, silver, copper, or chromium, an alloy, an oxide thereof, or a stacked layer thereof can be used.
  • the light shielding layer 12 preferably has a multilayer structure in which a material having low reflectance and a material having high light shielding properties are stacked. Further, as the light shielding layer 12, an organic layer such as a resin containing black ink or the like can be used.
  • An inorganic layer 13 made of an insulating inorganic material is formed so as to cover the light shielding layer 12.
  • the inorganic layer 13 for example, a layer made of silicon nitride, silicon oxide, or the like can be used.
  • the thickness of the inorganic layer 13 is not limited to this, but is, for example, 0.3 to 0.6 ⁇ m.
  • the transparent electrode layer 14 is directly formed on the transparent substrate 11 in this embodiment.
  • the transparent electrode layer 14 can be a film made of ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide).
  • the transparent electrode layer 14 forms a capacitance between the finger or the input device that is in contact with the transparent substrate 11.
  • the touch panel 10 calculates the position of the finger or the input device from the change in capacitance. That is, the touch panel 10 according to the present embodiment is a capacitive touch panel.
  • the wiring 15 is formed in partial contact with the transparent electrode layer 14.
  • the wiring 15 preferably has a low electric resistance, and a metal such as aluminum, molybdenum, titanium, tantalum, copper, silver, or gold, an alloy, or a laminate of these can be used.
  • the wiring 15 is formed at a position overlapping the light shielding layer 12 with the inorganic layer 13 interposed therebetween. Thereby, the wiring 15 is not visually recognized from the observer side.
  • a protective film 16 is formed so as to cover the transparent substrate 11, the inorganic layer 13, the transparent electrode layer 14, and the wiring 15.
  • an acrylic or siloxane transparent resin can be used as the protective film 16.
  • a part of the wiring 15 is exposed without being covered with the protective film 16, and forms a terminal portion 15a.
  • the terminal portion 15a is connected to the FPC 17 by, for example, crimping.
  • the FPC 17 is connected to an external drive circuit (not shown). Note that the external drive circuit may be provided on the transparent substrate 11 or the FPC 17.
  • the light shielding layer 12 is formed on the peripheral edge of one surface of the transparent substrate 11 (FIG. 2A).
  • the light shielding layer 12 can be formed by depositing a metal such as chromium by sputtering using the central portion of the transparent substrate 11 as a mask. Further, an organic layer containing black ink or the like may be formed by a printing method or the like instead of metal as the light shielding layer 12.
  • an inorganic layer 13 is formed so as to cover the light shielding layer 12 (FIG. 2B).
  • the inorganic layer 13 can be formed by a CVD (Chemical Vapor Deposition) method or the like using the central portion of the transparent substrate 11 as a mask.
  • the transparent electrode layer 14 is formed by sputtering or CVD (FIG. 2C).
  • a metal mask or the like may be disposed on the inorganic layer 13 so that the transparent electrode layer 14 is not formed, or the transparent electrode layer 14 may be formed and then removed by etching.
  • a conductive film to be the wiring 15 is formed by sputtering or CVD. Then, a resist pattern covering a predetermined region is produced by photolithography. Using this as a mask, the conductive film is etched to form the wiring 15 (FIG. 2D).
  • the protective film 16 is formed by a spin coating method while masking a portion to be the terminal portion 15a. Then, the FPC 17 is connected to the terminal portion 15a by, for example, crimping (FIG. 2E).
  • FIG. 3 is a cross-sectional view schematically showing a schematic configuration of a touch panel 80 according to a comparative example and a display device 8 with a touch panel provided with the touch panel 80.
  • the display device 8 includes a touch panel 80 and a display device 90 that can display an image.
  • the touch panel 80 includes a main body portion 81 and a cover portion 82.
  • the main body 81 includes a transparent substrate 811, a transparent electrode layer 812, wiring 813, a protective film 814, and an FPC 815.
  • the transparent substrate 811 is disposed on the display device 90 side.
  • a transparent electrode layer 812 and wiring 813 are formed on the surface of the transparent substrate 811 opposite to the display device 90.
  • a protective film 814 is formed so as to cover these.
  • a part of the wiring 813 is exposed without being covered with the protective film 814, and forms a terminal portion 813a.
  • the terminal portion 813a is connected to the FPC 815, and the FPC 815 is connected to a drive circuit (not shown).
  • the cover unit 82 includes a transparent substrate 821, a light shielding layer 822, and a protective film 823.
  • the transparent substrate 821 is disposed closer to the observer than the main body portion 81.
  • the light shielding layer 822 is formed in a frame shape, for example, on the periphery of the surface opposite to the viewer side of the transparent substrate 821.
  • the light shielding layer 822 is provided at a position corresponding to the wiring 813 and the terminal portion 814 of the main body portion 81. Thereby, the wiring 813 and the terminal part 814 are not visually recognized from the observer side.
  • a protective film 823 is formed to cover the transparent substrate 821 and the light shielding layer 822.
  • the transparent electrode layer 812, the wiring 813, the protective films 814, 823, and the light shielding layer 822 are the same as those exemplified as the transparent electrode layer 14, the wiring 15, the protective film 16, and the light shielding layer 12, respectively.
  • the transparent substrates 811 and 821 may be an inorganic material or an organic material.
  • the transparent substrates 811 and 821 may be made of different materials.
  • the touch panel 80 is manufactured by bonding the main body portion 81 and the cover portion 82 together. At this time, bubbles and foreign matters may be mixed in, which has been a cause of yield reduction.
  • the touch panel 10 according to the first embodiment of the present invention, there is no step of bonding the touch panel and the cover manufactured separately as described above. Therefore, it is possible to eliminate the mixing of bubbles and foreign matters resulting from this process.
  • acrylic glass is used as the transparent substrate 11.
  • the transparent electrode layer 14 is directly formed on the transparent substrate 11. Since the transparent electrode layer 14 is an inorganic material, a structure with high adhesion can be obtained by forming it on acrylic glass, which is an inorganic material.
  • the light shielding layer 12 is covered with the inorganic layer 13.
  • the wiring 15 is formed in contact with the inorganic layer 13.
  • the wiring 15 is made of an inorganic material as described above, and has high adhesion with the inorganic layer 13. Thereby, the adhesion of the wiring 15 can be improved regardless of the material of the light shielding layer 12.
  • the light shielding layer 12 can be protected from the step of forming the transparent electrode layer 14 and the wiring 15 by the inorganic layer 13, for example, a step of sputtering of a metal material, removal of a developer in photolithography, or etching. it can. Furthermore, when the light shielding layer 12 is a conductor, it is possible to prevent the wiring 15 from coming into direct contact with the light shielding layer 12 and short-circuiting.
  • the transparent electrode layer 14 is described as a single layer.
  • the transparent electrode layer 14 may have a multilayer structure with an interlayer insulating film interposed therebetween.
  • the touch panel 20 according to a modification of the present embodiment will be described with reference to FIG.
  • the description is abbreviate
  • FIG. 4 is a plan view schematically showing a schematic configuration of the touch panel 20.
  • the transparent electrode layer 14 includes a plurality of first direction electrodes 141 extending in the left-right direction in FIG. 4 and a plurality of second direction electrodes 142 extending in the up-down direction. Each electrode is connected to the wiring 15 at least at one end point thereof.
  • the plurality of wirings 15 are collected at one place to form a terminal portion 15a.
  • the wiring 15 and the terminal portion 15 a are covered with the light shielding layer 12. Thereby, the wiring 15 and the terminal part 15a are not visually recognized from the observer side.
  • the first direction electrode 141 includes a plurality of island-shaped electrode portions 141a and a bridge portion 141b that connects them to each other.
  • FIG. 5 is a sectional view taken along line VV in FIG. As shown in FIG. 5, the island-shaped electrode portion 141a and the bridge portion 141b are formed in different layers with an interlayer insulating film 143 interposed therebetween. The island-shaped electrode portion 141a and the bridge portion 141b are electrically connected through the contact hole 143a. Accordingly, the first direction electrode 141 is disposed so as to straddle the second direction electrode 142, and the first direction electrode 141 and the second direction electrode 142 are not in contact with each other.
  • a wiring 15 is formed on the inorganic layer 13.
  • the wiring 15 is partially in contact with the interlayer insulating film 143 of the transparent electrode layer 14, and is electrically connected to the island-shaped electrode portion 141a of the first direction electrode 141 through the contact hole 143b.
  • the wiring 15 is also electrically connected to the second direction electrode 142 through another contact hole.
  • the light shielding layer 12 and the inorganic layer 13 are formed on the transparent substrate 11 in the same manner as the touch panel 10 (FIG. 6A).
  • a conductive film to be the island-shaped electrode portion 141a of the first direction electrode 141 and the second direction electrode 142 is formed by sputtering or CVD. Then, a resist pattern covering a predetermined region is produced by photolithography. Using this as a mask, the conductive film is etched to form the island-shaped electrode portion 141a and the second direction electrode 142 of the first direction electrode 141 (FIG. 6B). In this step, a metal mask or the like may be disposed on the inorganic layer 13 so that the conductive film is not formed, or the conductive film may be formed and then removed by etching.
  • an interlayer insulating film 143 is formed by a CVD method. Then, a resist pattern that covers the regions other than the regions where the contact holes 143a and 143b are to be formed is produced by photolithography. Using this as a mask, the interlayer insulating film 143 is etched to form contact holes 143a and 143b (FIG. 6C). Note that an interlayer insulating film 143 may or may not be formed on the inorganic layer 13. Alternatively, a metal mask or the like may be disposed so that the interlayer insulating film 143 is not formed, or the interlayer insulating film 143 may be formed and then removed by etching.
  • a conductive film to be the bridge portion 141b of the first direction electrode 141 is formed by sputtering or CVD. Then, a resist pattern covering a predetermined region is produced by photolithography. Using this as a mask, the conductive film is etched to produce the bridge portion 141b of the first direction electrode 141. Similarly, the wiring 15 is produced (FIG. 6D).
  • the conductive film to be the bridge portion 141 b of the first direction electrode 141 may be formed of the same material as the wiring 15 and manufactured simultaneously with the wiring 15.
  • the protective film 16 is formed by a spin coating method while masking the portion to be the terminal portion 15a (FIG. 6E).
  • the transparent electrode layer 14 can take various configurations.
  • the island-shaped electrode portion 141a of the first direction electrode 141 and the second direction electrode 142 are arranged in the same layer, but they may be arranged in different layers.
  • the first direction electrode 141 and the second direction electrode 142 can take various shapes.
  • the touch panel 10 may be a surface capacitive method.
  • the transparent electrode layer 14 may be formed uniformly on the transparent substrate 11.
  • FIG. 7 is sectional drawing which shows typically schematic structure of the touchscreen 30 concerning the 2nd Embodiment of this invention, and the display apparatus 3 with a touchscreen provided with the touchscreen 30.
  • the display device 3 with a touch panel includes a touch panel 30 and a display device 90 capable of displaying an image.
  • the touch panel 30 includes a transparent substrate 11, a light shielding layer 32, a transparent electrode layer 14, a wiring 15, a protective film 16, and an FPC 17. That is, the touch panel 30 is different from the touch panel 10 in that the configuration of the light shielding layer 32 is different and the inorganic layer 13 is not provided.
  • the light shielding layer 32 is made of an insulating inorganic material. Therefore, even if the wiring 15 is formed directly on the light shielding layer 32, it is possible to improve the adhesion without causing a short circuit.
  • the step of forming the inorganic layer can be omitted.
  • FIG. 8 is sectional drawing which shows typically schematic structure of the touchscreen 40 concerning the 3rd Embodiment of this invention, and the display apparatus 4 with a touchscreen provided with the touchscreen 40.
  • the display device 4 with a touch panel includes a touch panel 40 and a display device 90 capable of displaying an image.
  • the touch panel 40 includes a transparent substrate 41, a light shielding layer 12, an inorganic layer 43, a transparent electrode layer 14, wirings 15, a protective film 16, and an FPC 17. That is, the touch panel 40 differs from the touch panel 10 in the configuration of the transparent substrate and the inorganic layer.
  • the transparent substrate 41 may use either an organic material or an inorganic material.
  • the transparent substrate 41 is, for example, a plastic film such as an acrylic resin.
  • an inorganic layer 43 made of an insulating inorganic material is covered with the light shielding layer 12 and the transparent substrate 41 to form an inorganic layer 43 made of an insulating inorganic material.
  • the inorganic layer 43 similarly to the inorganic layer 13, a layer made of silicon nitride, silicon oxide, or the like can be used.
  • the thickness of the inorganic layer 43 is not limited to this, but is, for example, 0.3 to 0.6 ⁇ m.
  • the transparent electrode layer 14 is formed on the inorganic layer 43.
  • the transparent electrode layer 14 is made of an inorganic material such as ITO or IZO and has good adhesion to the inorganic layer 43. Therefore, the adhesion of the transparent electrode layer 14 can be enhanced regardless of the material of the transparent substrate 41.
  • the wiring 15 is also formed in the inorganic layer 43. Therefore, the adhesion of the wiring 15 can be improved regardless of the material of the light shielding layer 12.
  • the inorganic layer 43 covers at least one surface of the transparent substrate 41 (the surface on which the light shielding layer 12 is formed).
  • the inorganic layer 43 is preferably configured to cover two or more transparent substrates 41 (up to six surfaces including side surfaces). This is because the surface of the transparent substrate 41 is protected by being covered with the inorganic layer 43, and the transparent substrate 41 can be prevented from being damaged.
  • FIG. 9 is sectional drawing which shows typically schematic structure of the touchscreen 50 concerning the 4th Embodiment of this invention, and the display apparatus 5 with a touchscreen provided with the touchscreen 50.
  • the display device 5 with a touch panel includes a touch panel 50 and a display device 90 capable of displaying an image.
  • the touch panel 50 includes a transparent substrate 41, a light shielding layer 12, an inorganic layer 53, a transparent electrode layer 14, wirings 15, a protective film 16, an FPC 17, and an organic layer 58. That is, the touch panel 50 is further provided with an organic layer 58 in addition to the configuration of the inorganic layer as compared with the touch panel 40.
  • an organic layer 58 made of an insulating organic material is formed on the entire surface of the transparent substrate 41 on which the light shielding layer 12 is formed, covering the light shielding layer 12 and the transparent substrate 41.
  • the organic layer 58 is formed by, for example, forming an acrylic or siloxane transparent resin into a film using a spin coater or a slit coater. Note that it is preferable to use a material having good adhesion to both the organic material and the inorganic material as the organic layer 58.
  • an inorganic layer 53 made of an insulating inorganic material is formed on the organic layer 58.
  • a film made of silicon nitride, silicon oxide, or the like can be used similarly to the inorganic layer 13.
  • the thickness of the inorganic layer 53 is not limited to this, but is, for example, 0.3 to 0.6 ⁇ m.
  • the transparent electrode layer 14 is formed on the inorganic layer 53.
  • the transparent electrode layer 14 is made of an inorganic material such as ITO or IZO and has good adhesion to the inorganic layer 53. Therefore, the adhesion of the transparent electrode layer 14 can be enhanced regardless of the material of the transparent substrate 41.
  • the wiring 15 is also formed in the inorganic layer 53. Therefore, the adhesion of the wiring 15 can be improved regardless of the material of the light shielding layer 12.
  • the organic layer 58 is formed by a spin coater or a slit coater, the surface of the organic layer 58 becomes flat regardless of the step formed by the light shielding layer 12 on the transparent substrate 41. Therefore, the inorganic layer 53 formed on the organic layer 58 is also flat.
  • the step formed by the light shielding layer 12 on the transparent substrate 41 is flattened by the organic layer 58. Therefore, touch panel patterns such as the transparent electrode layer 14 and the wiring 15 can be produced on a flat plane.
  • the present invention can be industrially used as a cover-integrated touch panel and a display device with a touch panel.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

In order to obtain a touch panel configuration for a cover-integrated touch panel that is not contaminated with air bubbles or foreign substances, and which has excellent adhesiveness of a transparent electrode layer, a touch panel (10) is provided with a cover member (11) that is positioned on the side of a viewer, and a plurality of layers that are laminated with the cover member (11) as a substrate. The plurality of layers includes a transparent electrode layer (14) comprising an inorganic material. The transparent electrode layer (14) is in contact with an inorganic material in the direction of the viewer.

Description

タッチパネルおよびタッチパネル付き表示装置Touch panel and display device with touch panel
　本発明は、タッチパネルおよびタッチパネル付き表示装置に関し、より詳しくは、カバー一体型のタッチパネルおよびタッチパネル付き表示装置に関する。 The present invention relates to a touch panel and a display device with a touch panel, and more particularly to a cover integrated touch panel and a display device with a touch panel.
　操作面上でペンや指等がタッチした位置、すなわちタッチ位置を検出可能なタッチパネルが知られている。 A touch panel capable of detecting a position touched by a pen or a finger on the operation surface, that is, a touch position is known.
　近年、薄型化および透過率向上を目的として、カバーとタッチパネルとを貼り合せてカバー一体型のタッチパネルとする構成が用いられている。この構成において、カバーとタッチパネルとを貼り合せる際に、気泡や異物が混入することがあり、歩留まり低下の要因となっている。 Recently, for the purpose of reducing the thickness and improving the transmittance, a structure in which a cover and a touch panel are bonded to form a cover-integrated touch panel is used. In this configuration, when the cover and the touch panel are bonded together, bubbles and foreign matter may be mixed in, which causes a decrease in yield.
　特開２００９－３０１７６７号公報には、片面に膜厚０．５～１．５μｍの遮光層を備えた透明基板の前記片面に、膜厚２～３μｍのオーバーコート層、膜厚１０～２０ｎｍの透明電極層（透明導電膜）を順に積層したタッチパネルが開示されている。 Japanese Patent Application Laid-Open No. 2009-301767 discloses an overcoat layer having a film thickness of 2 to 3 μm, a film thickness of 10 to 20 nm on the one surface of a transparent substrate having a light-shielding layer having a film thickness of 0.5 to 1.5 μm on one surface. A touch panel in which transparent electrode layers (transparent conductive films) are sequentially laminated is disclosed.
　しかしながら、上記の文献に記載された構成では、有機材料からなるオーバーコート層の上に透明電極層を設けるため、オーバーコート層と透明電極層との密着性が十分ではなかった。 However, in the configuration described in the above document, since the transparent electrode layer is provided on the overcoat layer made of an organic material, the adhesion between the overcoat layer and the transparent electrode layer is not sufficient.
　本発明の目的は、カバー一体型タッチパネルにおいて、気泡や異物の混入がなく、かつ、透明電極層の密着性に優れた、タッチパネルの構成を得ることである。 An object of the present invention is to obtain a configuration of a touch panel that is free from bubbles and foreign matter and has excellent adhesion of a transparent electrode layer in a cover-integrated touch panel.
　以下に開示するタッチパネルは、観察者側に配置されるカバー部材と、前記カバー部材を基板として積層された複数の層とを備える。前記複数の層は、無機材料からなる透明電極層を含み、前記透明電極層は、観察者側の方向において無機材料と接している。 The touch panel disclosed below includes a cover member disposed on the viewer side and a plurality of layers stacked using the cover member as a substrate. The plurality of layers include a transparent electrode layer made of an inorganic material, and the transparent electrode layer is in contact with the inorganic material in the direction of the viewer.
　本発明によれば、カバー一体型タッチパネルにおいて、気泡や異物の混入がなく、かつ、透明電極層の密着性に優れた、タッチパネルの構成が得られる。 According to the present invention, in the cover-integrated touch panel, it is possible to obtain a configuration of a touch panel that is free from bubbles and foreign matter and has excellent adhesion of the transparent electrode layer.
図１は、本発明の第１の実施形態にかかるタッチパネル、および該タッチパネルを備えたタッチパネル付き表示装置の概略構成を模式的に示す断面図である。FIG. 1 is a cross-sectional view schematically illustrating a schematic configuration of a touch panel according to a first embodiment of the present invention and a display device with a touch panel including the touch panel. 図２Ａは、第１の実施形態にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 2A is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment. 図２Ｂは、第１の実施形態にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 2B is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment. 図２Ｃは、第１の実施形態にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 2C is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment. 図２Ｄは、第１の実施形態にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 2D is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment. 図２Ｅは、第１の実施形態にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 2E is a diagram illustrating one of manufacturing processes of the touch panel according to the first embodiment. 図３は、比較例にかかるタッチパネル、および該タッチパネルを備えたタッチパネル付き表示装置の概略構成を模式的に示す断面図である。FIG. 3 is a cross-sectional view schematically showing a schematic configuration of a touch panel according to a comparative example and a display device with a touch panel including the touch panel. 図４は、第１の実施形態の変形例にかかるタッチパネルの、概略構成を模式的に示す平面図である。FIG. 4 is a plan view schematically showing a schematic configuration of a touch panel according to a modified example of the first embodiment. 図５は、図４におけるＶ－Ｖ線に沿った断面図である。FIG. 5 is a sectional view taken along line VV in FIG. 図６Ａは、第１の実施形態の変形例にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 6A is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment. 図６Ｂは、第１の実施形態の変形例にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 6B is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment. 図６Ｃは、第１の実施形態の変形例にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 6C is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment. 図６Ｄは、第１の実施形態の変形例にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 6D is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment. 図６Ｅは、第１の実施形態の変形例にかかるタッチパネルの、製造工程の一つを示す図である。FIG. 6E is a diagram illustrating one of manufacturing processes of the touch panel according to the modified example of the first embodiment. 図７は、本発明の第２の実施形態にかかるタッチパネル、および該タッチパネルを備えたタッチパネル付き表示装置の概略構成を模式的に示す断面図である。FIG. 7: is sectional drawing which shows typically schematic structure of the touchscreen concerning the 2nd Embodiment of this invention, and a display apparatus with a touchscreen provided with this touchscreen. 図８は、本発明の第３の実施形態にかかるタッチパネル、および該タッチパネルを備えたタッチパネル付き表示装置の概略構成を模式的に示す断面図である。FIG. 8: is sectional drawing which shows typically schematic structure of the touchscreen concerning the 3rd Embodiment of this invention, and a display apparatus with a touchscreen provided with this touchscreen. 図９は、本発明の第４の実施形態にかかるタッチパネル、および該タッチパネルを備えたタッチパネル付き表示装置の概略構成を模式的に示す断面図である。FIG. 9: is sectional drawing which shows typically schematic structure of the touchscreen concerning the 4th Embodiment of this invention, and a display apparatus with a touchscreen provided with this touchscreen.
　本発明の一実施形態にかかるタッチパネルは、観察者側に配置されるカバー部材と、前記カバー部材を基板として積層された複数の層とを備える。前記複数の層は、無機材料からなる透明電極層を含む。前記透明電極層は、観察者側の方向において無機材料と接している（第１の構成）。 A touch panel according to an embodiment of the present invention includes a cover member disposed on an observer side and a plurality of layers stacked using the cover member as a substrate. The plurality of layers include a transparent electrode layer made of an inorganic material. The transparent electrode layer is in contact with the inorganic material in the direction of the observer (first configuration).
　この構成によれば、カバー部材を基板として、タッチパネルを形成する複数の層が積層される。これにより、それぞれ別体として作製されたタッチパネルとカバーとを貼り合せる工程が存在しない。そのため、この工程に起因する気泡や異物の混入を排除できる。 According to this configuration, a plurality of layers forming the touch panel are stacked using the cover member as a substrate. Thereby, there is no process of bonding the touch panel and the cover, which are produced as separate bodies. Therefore, it is possible to eliminate the mixing of bubbles and foreign matters resulting from this process.
　さらに、透明電極層が無機材料に接して形成されることにより、透明電極層の密着性が高い構成が得られる。 Furthermore, since the transparent electrode layer is formed in contact with the inorganic material, a structure with high adhesion of the transparent electrode layer can be obtained.
　前記第１の構成において、前記透明電極層と接している無機材料は、前記カバー部材とすることができる（第２の構成）。 In the first configuration, the inorganic material in contact with the transparent electrode layer can be the cover member (second configuration).
　この構成によれば、透明電極層はカバー部材に直接形成される。これにより、タッチパネルを形成する層の数が少なくなり、透過率の高い構成が得られる。 According to this configuration, the transparent electrode layer is formed directly on the cover member. Thereby, the number of layers forming the touch panel is reduced, and a configuration with high transmittance can be obtained.
　前記第１の構成において、前記複数の層は、前記カバー部材の一方の面を被覆した、絶縁性の無機材料からなる無機層を含んでも良い。そして、前記透明電極層と接している無機材料は、前記無機層とすることができる（第３の構成）。 In the first configuration, the plurality of layers may include an inorganic layer made of an insulating inorganic material and covering one surface of the cover member. The inorganic material in contact with the transparent electrode layer can be the inorganic layer (third configuration).
　上記の構成によれば、カバー部材の材質に依らず、無機材料からなる無機層で被覆することにより、透明電極層の密着性を高めることができる。 According to the above configuration, the adhesiveness of the transparent electrode layer can be enhanced by covering with an inorganic layer made of an inorganic material regardless of the material of the cover member.
　前記第１の構成において、前記複数の層は、前記カバー部材の一方の面を被覆した、絶縁性の有機材料からなる有機層と、前記有機層を被覆した、絶縁性の無機材料からなる無機層とを含んでも良い。そして、前記透明電極層と接している無機材料は、前記無機層とすることができる（第４の構成）。 In the first configuration, the plurality of layers include an organic layer made of an insulating organic material that covers one surface of the cover member, and an inorganic material made of an insulating inorganic material that covers the organic layer. Layer may be included. The inorganic material in contact with the transparent electrode layer can be the inorganic layer (fourth configuration).
　上記の構成は、有機層を有する。有機層は、比較的に平坦な層を形成し易い。そして、有機層に接して無機層を形成する。そのため、透明電極層を、平坦な平面上に作製することができる。 The above configuration has an organic layer. The organic layer is easy to form a relatively flat layer. Then, an inorganic layer is formed in contact with the organic layer. Therefore, the transparent electrode layer can be produced on a flat plane.
　前記第１～第４のいずれかの構成において、前記複数の層は、前記透明電極層と電気的に接続された配線層と、前記配線層よりも観察者側に設けられた遮光層とをさらに含んでも良い（第５の構成）。 In any one of the first to fourth configurations, the plurality of layers include a wiring layer electrically connected to the transparent electrode layer, and a light shielding layer provided closer to the viewer than the wiring layer. Further, it may be included (fifth configuration).
　前記第２の構成において、前記複数の層は、前記透明電極層と電気的に接続された配線層と、前記配線層よりも観察者側に設けられた遮光層と、前記遮光層を被覆する絶縁性の無機材料からなる無機層とをさらに含んでも良い。さらに、前記配線層は、前記無機層と接して形成することができる（第６の構成）。 In the second configuration, the plurality of layers cover the wiring layer electrically connected to the transparent electrode layer, a light shielding layer provided closer to the viewer than the wiring layer, and the light shielding layer. An inorganic layer made of an insulating inorganic material may be further included. Furthermore, the wiring layer can be formed in contact with the inorganic layer (sixth configuration).
　上記の構成によれば、遮光層は、絶縁性の無機層で被覆されている。配線層は、この無機層と接して形成される。この無機層により、遮光層の材質によらず、配線層の密着性を高めることができる。また、この無機層により、遮光層が導電材料である場合に、配線層が短絡することが防止される。さらに、この無機層は、透明電極層および配線層を形成する際のプロセスから、遮光層を保護する。 According to the above configuration, the light shielding layer is covered with the insulating inorganic layer. The wiring layer is formed in contact with this inorganic layer. By this inorganic layer, the adhesion of the wiring layer can be enhanced regardless of the material of the light shielding layer. Further, this inorganic layer prevents the wiring layer from being short-circuited when the light shielding layer is made of a conductive material. Furthermore, this inorganic layer protects the light shielding layer from the process in forming the transparent electrode layer and the wiring layer.
　前記第３の構成において、前記複数の層は、前記透明電極層と電気的に接続された配線層と、前記配線層よりも観察者側に設けられた遮光層とをさらに含んでも良い。そして、前記遮光層は、前記無機層で被覆されており、前記配線層は、前記無機層と接して形成することができる（第７の構成）。 In the third configuration, the plurality of layers may further include a wiring layer electrically connected to the transparent electrode layer and a light shielding layer provided closer to the viewer than the wiring layer. The light shielding layer is covered with the inorganic layer, and the wiring layer can be formed in contact with the inorganic layer (seventh configuration).
　本発明の一実施形態にかかるタッチパネル付き表示装置は、画像を表示可能な表示装置と、前記第１～第７のいずれかの構成のタッチパネルとを備える。 A display device with a touch panel according to an embodiment of the present invention includes a display device capable of displaying an image and the touch panel having any one of the first to seventh configurations.
［実施の形態］
　以下、図面を参照し、本発明の実施の形態を詳しく説明する。図中同一または相当部分には同一符号を付してその説明は繰り返さない。なお、説明を分かりやすくするために、以下で参照する図面においては、構成が簡略化または模式化して示されたり、一部の構成部材が省略されたりしている。また、各図に示された構成部材間の寸法比は、必ずしも実際の寸法比を示すものではない。 [Embodiment]
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference numerals and description thereof will not be repeated. In addition, in order to make the explanation easy to understand, in the drawings referred to below, the configuration is shown in a simplified or schematic manner, or some components are omitted. Further, the dimensional ratio between the constituent members shown in each drawing does not necessarily indicate an actual dimensional ratio.
　[第１の実施形態]
　図１は、本発明の第１の実施形態にかかるタッチパネル１０、およびタッチパネル１０を備えたタッチパネル付き表示装置１の概略構成を模式的に示す断面図である。タッチパネル付き表示装置１は、タッチパネル１０と、画像を表示可能な表示装置９０とを備えている。表示装置９０は、例えば、液晶ディスプレイである。 [First embodiment]
FIG. 1: is sectional drawing which shows typically schematic structure of the touchscreen 10 concerning the 1st Embodiment of this invention, and the display apparatus 1 with a touchscreen provided with the touchscreen 10. As shown in FIG. The display device with a touch panel 1 includes a touch panel 10 and a display device 90 capable of displaying an image. The display device 90 is, for example, a liquid crystal display.
　タッチパネル１０は、透明基板１１、遮光層１２、無機層１３、透明電極層１４、配線１５、保護膜１６、およびＦＰＣ（Ｆｌｅｘｉｂｌｅ　Ｐｒｉｎｔｅｄ　Ｃｉｒｃｕｉｔ：フレキシブルプリント基板）１７を備えている。 The touch panel 10 includes a transparent substrate 11, a light shielding layer 12, an inorganic layer 13, a transparent electrode layer 14, wiring 15, a protective film 16, and an FPC (Flexible Printed Circuit: flexible printed circuit board) 17.
　透明基板１１は、表示装置９０と反対側、すなわち、観察者側に配置される。透明基板１１は、タッチパネル１０の使用時のカバーとしての役割を兼ねている。透明基板１１は、透光性に優れ、絶縁性のある材料を用いることができる。本実施形態では、透明基板１１としてアルカリガラスを用いる。 The transparent substrate 11 is disposed on the opposite side of the display device 90, that is, on the viewer side. The transparent substrate 11 also serves as a cover when the touch panel 10 is used. The transparent substrate 11 can be made of an insulating material that is excellent in translucency. In the present embodiment, alkali glass is used as the transparent substrate 11.
　遮光層１２は、透明基板１１の表示装置９０側の面の、例えば周縁部に額縁状に形成されている。遮光層１２として、アルミニウム、モリブデン、銀、銅、クロム等の金属、合金、もしくはこれらの酸化物、またはこれらを積層させたものを用いることができる。遮光層１２は、反射率の低い材料と、遮光性の高い材料とを積層させた多層構造とすることが好ましい。また、遮光層１２として、黒色インク等を含有させた樹脂などの有機層を用いることもできる。 The light shielding layer 12 is formed in a frame shape, for example, on the periphery of the surface of the transparent substrate 11 on the display device 90 side. As the light shielding layer 12, a metal such as aluminum, molybdenum, silver, copper, or chromium, an alloy, an oxide thereof, or a stacked layer thereof can be used. The light shielding layer 12 preferably has a multilayer structure in which a material having low reflectance and a material having high light shielding properties are stacked. Further, as the light shielding layer 12, an organic layer such as a resin containing black ink or the like can be used.
　遮光層１２を被覆して、絶縁性の無機材料からなる無機層１３が形成されている。無機層１３は、例えば、窒化珪素または酸化珪素等からなる層を用いることができる。無機層１３の厚みは、これに限定されないが、例えば０．３～０．６μｍである。 An inorganic layer 13 made of an insulating inorganic material is formed so as to cover the light shielding layer 12. As the inorganic layer 13, for example, a layer made of silicon nitride, silicon oxide, or the like can be used. The thickness of the inorganic layer 13 is not limited to this, but is, for example, 0.3 to 0.6 μm.
　透明電極層１４は、本実施形態では、透明基板１１に直接形成されている。透明電極層１４は、ＩＴＯ（Ｉｎｄｉｕｍ　Ｔｉｎ　Ｏｘｉｄｅ：インジウム錫酸化物）またはＩＺＯ（Ｉｎｄｉｕｍ　Ｚｉｎｃ　Ｏｘｉｄｅ：インジウム亜鉛酸化物）等からなる膜を用いることができる。 The transparent electrode layer 14 is directly formed on the transparent substrate 11 in this embodiment. The transparent electrode layer 14 can be a film made of ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide).
　透明電極層１４は、透明基板１１に接触した手指または入力装置との間に静電容量を形成する。タッチパネル１０は、この静電容量の変化から、手指または入力装置の位置を算出する。すなわち、本実施形態にかかるタッチパネル１０は、静電容量型のタッチパネルである。 The transparent electrode layer 14 forms a capacitance between the finger or the input device that is in contact with the transparent substrate 11. The touch panel 10 calculates the position of the finger or the input device from the change in capacitance. That is, the touch panel 10 according to the present embodiment is a capacitive touch panel.
　透明電極層１４と一部接触して、配線１５が形成されている。配線１５は、電気抵抗の低いものが好ましく、アルミニウム、モリブデン、チタン、タンタル、銅、銀、金等の金属、合金、またはこれらを積層させたものを用いることができる。配線１５は、無機層１３を間に挟んで遮光層１２と重なる位置に形成されている。これにより、配線１５が観察者側から視認されない。 The wiring 15 is formed in partial contact with the transparent electrode layer 14. The wiring 15 preferably has a low electric resistance, and a metal such as aluminum, molybdenum, titanium, tantalum, copper, silver, or gold, an alloy, or a laminate of these can be used. The wiring 15 is formed at a position overlapping the light shielding layer 12 with the inorganic layer 13 interposed therebetween. Thereby, the wiring 15 is not visually recognized from the observer side.
　透明基板１１、無機層１３、透明電極層１４、および配線１５を被覆して、保護膜１６が形成されている。保護膜１６としては、例えばアクリル系またはシロキサン系の透明樹脂を用いることができる。 A protective film 16 is formed so as to cover the transparent substrate 11, the inorganic layer 13, the transparent electrode layer 14, and the wiring 15. As the protective film 16, for example, an acrylic or siloxane transparent resin can be used.
　配線１５の一部は、保護膜１６で覆われることなく露出しており、端子部１５ａを形成している。端子部１５ａはＦＰＣ１７と、例えば圧着によって接続されている。そして、ＦＰＣ１７は図示しない外部駆動回路と接続されている。なお、外部駆動回路は、透明基板１１上や、ＦＰＣ１７上に設けられていても良い。 A part of the wiring 15 is exposed without being covered with the protective film 16, and forms a terminal portion 15a. The terminal portion 15a is connected to the FPC 17 by, for example, crimping. The FPC 17 is connected to an external drive circuit (not shown). Note that the external drive circuit may be provided on the transparent substrate 11 or the FPC 17.
　［第１の実施形態にかかるタッチパネルの製造方法］
　以下、図２Ａ～図２Ｅを参照して、タッチパネル１０の製造方法について説明する。 [Method for Manufacturing Touch Panel According to First Embodiment]
Hereinafter, a method for manufacturing the touch panel 10 will be described with reference to FIGS. 2A to 2E.
　まず、透明基板１１の一方の面の周縁部に、遮光層１２を形成する（図２Ａ）。遮光層１２は、クロム等の金属を、透明基板１１の中央部分をマスクして、スパッタリングによって成膜して形成することができる。また、遮光層１２として金属に替えて、黒色インク等を含有させた有機層を、印刷法等により形成しても良い。 First, the light shielding layer 12 is formed on the peripheral edge of one surface of the transparent substrate 11 (FIG. 2A). The light shielding layer 12 can be formed by depositing a metal such as chromium by sputtering using the central portion of the transparent substrate 11 as a mask. Further, an organic layer containing black ink or the like may be formed by a printing method or the like instead of metal as the light shielding layer 12.
　次に、遮光層１２を被覆するように、無機層１３を形成する（図２Ｂ）。無機層１３は、透明基板１１の中央部分をマスクして、ＣＶＤ（Ｃｈｅｍｉｃａｌ　Ｖａｐｏｒ　Ｄｅｐｏｓｉｔｉｏｎ：化学気相成長）法等によって形成できる。 Next, an inorganic layer 13 is formed so as to cover the light shielding layer 12 (FIG. 2B). The inorganic layer 13 can be formed by a CVD (Chemical Vapor Deposition) method or the like using the central portion of the transparent substrate 11 as a mask.
　次に、スパッタリングまたはＣＶＤ法により、透明電極層１４を形成する（図２Ｃ）。なお、この工程において、無機層１３にメタルマスク等を配置して透明電極層１４を形成しないようにしても良いし、一旦透明電極層１４を形成した後でエッチングによって取り除いても良い。 Next, the transparent electrode layer 14 is formed by sputtering or CVD (FIG. 2C). In this step, a metal mask or the like may be disposed on the inorganic layer 13 so that the transparent electrode layer 14 is not formed, or the transparent electrode layer 14 may be formed and then removed by etching.
　次に、スパッタリングまたはＣＶＤ法により、配線１５となる導電膜を形成する。そして、フォトリソグラフィ法により、所定の領域を覆うレジストパターンを作製する。これをマスクとして前記導電膜をエッチングし、配線１５を作製する（図２Ｄ）。 Next, a conductive film to be the wiring 15 is formed by sputtering or CVD. Then, a resist pattern covering a predetermined region is produced by photolithography. Using this as a mask, the conductive film is etched to form the wiring 15 (FIG. 2D).
　最後に、端子部１５ａとなる箇所をマスクして、スピンコート法により保護膜１６を形成する。そして、端子部１５ａにＦＰＣ１７を、例えば圧着によって接続する（図２Ｅ）。 Finally, the protective film 16 is formed by a spin coating method while masking a portion to be the terminal portion 15a. Then, the FPC 17 is connected to the terminal portion 15a by, for example, crimping (FIG. 2E).
　以上、本実施形態にかかるタッチパネル１０の構成および製造方法について説明した。ここで本実施形態の効果を説明するため、図３を用いて、仮想的な比較例にかかるタッチパネル８０の構成について説明する。 The configuration and manufacturing method of the touch panel 10 according to the present embodiment have been described above. Here, in order to explain the effect of the present embodiment, the configuration of the touch panel 80 according to a virtual comparative example will be described with reference to FIG.
　図３は、比較例にかかるタッチパネル８０、および該タッチパネル８０を備えたタッチパネル付き表示装置８の概略構成を模式的に示す断面図である。表示装置８は、タッチパネル８０と、画像を表示可能な表示装置９０とを備えている。 FIG. 3 is a cross-sectional view schematically showing a schematic configuration of a touch panel 80 according to a comparative example and a display device 8 with a touch panel provided with the touch panel 80. The display device 8 includes a touch panel 80 and a display device 90 that can display an image.
　タッチパネル８０は、本体部８１と、カバー部８２とを備える。 The touch panel 80 includes a main body portion 81 and a cover portion 82.
　本体部８１は、透明基板８１１、透明電極層８１２、配線８１３、保護膜８１４、およびＦＰＣ８１５を備えている。透明基板８１１は、表示装置９０側に配置されている。そして、透明電極層８１２および配線８１３が、透明基板８１１の表示装置９０と反対側の面に形成されている。これらを被覆して、保護膜８１４が形成されている。ここで、配線８１３の一部は、保護膜８１４に覆われずに露出しており、端子部８１３ａを形成している。そして、端子部８１３ａはＦＰＣ８１５と接続され、ＦＰＣ８１５は図示しない駆動回路に接続される。 The main body 81 includes a transparent substrate 811, a transparent electrode layer 812, wiring 813, a protective film 814, and an FPC 815. The transparent substrate 811 is disposed on the display device 90 side. A transparent electrode layer 812 and wiring 813 are formed on the surface of the transparent substrate 811 opposite to the display device 90. A protective film 814 is formed so as to cover these. Here, a part of the wiring 813 is exposed without being covered with the protective film 814, and forms a terminal portion 813a. The terminal portion 813a is connected to the FPC 815, and the FPC 815 is connected to a drive circuit (not shown).
　カバー部８２は、透明基板８２１、遮光層８２２、および保護膜８２３を備えている。透明基板８２１は、本体部８１よりも観察者側に配置されている。遮光層８２２は、透明基板８２１の観察者側と反対の面の、例えば周縁部に額縁状に形成されている。遮光層８２２は、本体部８１の配線８１３および端子部８１４に対応する位置に設けられている。これにより、配線８１３および端子部８１４が観察者側から視認されない。そして、透明基板８２１および遮光層８２２を被覆して、保護膜８２３が形成されている。 The cover unit 82 includes a transparent substrate 821, a light shielding layer 822, and a protective film 823. The transparent substrate 821 is disposed closer to the observer than the main body portion 81. The light shielding layer 822 is formed in a frame shape, for example, on the periphery of the surface opposite to the viewer side of the transparent substrate 821. The light shielding layer 822 is provided at a position corresponding to the wiring 813 and the terminal portion 814 of the main body portion 81. Thereby, the wiring 813 and the terminal part 814 are not visually recognized from the observer side. A protective film 823 is formed to cover the transparent substrate 821 and the light shielding layer 822.
　なお、透明電極層８１２、配線８１３、保護膜８１４，８２３および遮光層８２２については、それぞれ、透明電極層１４、配線１５、保護膜１６および遮光層１２として例示したものと同様のものが用いられる。透明基板８１１および８２１は、無機材料でも良く、有機材料でも良い。透明基板８１１と８２１とが互いに異なる材料であっても良い。 The transparent electrode layer 812, the wiring 813, the protective films 814, 823, and the light shielding layer 822 are the same as those exemplified as the transparent electrode layer 14, the wiring 15, the protective film 16, and the light shielding layer 12, respectively. . The transparent substrates 811 and 821 may be an inorganic material or an organic material. The transparent substrates 811 and 821 may be made of different materials.
　タッチパネル８０は、本体部８１とカバー部８２とを張り合わせて製造される。この際、気泡や異物が混入することがあり、歩留まり低下の要因となっていた。 The touch panel 80 is manufactured by bonding the main body portion 81 and the cover portion 82 together. At this time, bubbles and foreign matters may be mixed in, which has been a cause of yield reduction.
　これに対して、本発明の第１の実施形態にかかるタッチパネル１０の構成によれば、このように別体として作製されたタッチパネルとカバーとを貼り合せる工程が存在しない。そのため、この工程に起因する気泡や異物の混入を排除できる。 On the other hand, according to the configuration of the touch panel 10 according to the first embodiment of the present invention, there is no step of bonding the touch panel and the cover manufactured separately as described above. Therefore, it is possible to eliminate the mixing of bubbles and foreign matters resulting from this process.
　また、本実施形態では、透明基板１１としてアクリルガラスを用いる。そして、透明電極層１４は、透明基板１１に直接形成されている。透明電極層１４は無機材料であるため、無機材料であるアクリルガラスに形成することによって、密着性の高い構成が得られる。 In this embodiment, acrylic glass is used as the transparent substrate 11. The transparent electrode layer 14 is directly formed on the transparent substrate 11. Since the transparent electrode layer 14 is an inorganic material, a structure with high adhesion can be obtained by forming it on acrylic glass, which is an inorganic material.
　また、２枚の透明基板８１１，８２１を使用し、かつ本体部８１とカバー部８２との間で接着層を設ける必要がある比較例の構成と比較して、本実施形態では、光透過度を高くすることができる。特開２００９－３０１７６７号公報の構成と比較しても、オーバーコート層がない分、光透過度を高くすることができる。 In this embodiment, compared with the configuration of the comparative example in which two transparent substrates 811 and 821 are used and an adhesive layer needs to be provided between the main body portion 81 and the cover portion 82, Can be high. Compared with the configuration of Japanese Patent Laid-Open No. 2009-301767, the light transmittance can be increased by the absence of the overcoat layer.
　また、本実施形態では、遮光層１２を無機層１３で被覆している。配線１５は、無機層１３に接して形成されている。配線１５は、上述したように無機材料からなり、無機層１３との密着性が高い。これにより、遮光層１２の材質によらず、配線１５の密着を良くできる。 In this embodiment, the light shielding layer 12 is covered with the inorganic layer 13. The wiring 15 is formed in contact with the inorganic layer 13. The wiring 15 is made of an inorganic material as described above, and has high adhesion with the inorganic layer 13. Thereby, the adhesion of the wiring 15 can be improved regardless of the material of the light shielding layer 12.
　また、無機層１３により、透明電極層１４や配線１５を形成する際の工程、例えば金属材料のスパッタリングや、フォトリソグラフィにおける現像液の除去、あるいはエッチングといった工程から、遮光層１２を保護することができる。さらに、遮光層１２が導電体である場合に、配線１５が遮光層１２と直接接触して短絡するのを防止できる。 Further, the light shielding layer 12 can be protected from the step of forming the transparent electrode layer 14 and the wiring 15 by the inorganic layer 13, for example, a step of sputtering of a metal material, removal of a developer in photolithography, or etching. it can. Furthermore, when the light shielding layer 12 is a conductor, it is possible to prevent the wiring 15 from coming into direct contact with the light shielding layer 12 and short-circuiting.
　［第１の実施形態の変形例］
　上記の第１の実施形態では、透明電極層１４を一つの層として説明したが、透明電極層１４は、層間絶縁膜を挟んだ多層構造としても良い。以下、図４を用いて、本実施形態の変形例にかかるタッチパネル２０について説明する。なお、タッチパネル１０と同じ構成については同一の符号を用いてその説明は省略する。 [Modification of First Embodiment]
In the first embodiment, the transparent electrode layer 14 is described as a single layer. However, the transparent electrode layer 14 may have a multilayer structure with an interlayer insulating film interposed therebetween. Hereinafter, the touch panel 20 according to a modification of the present embodiment will be described with reference to FIG. In addition, about the same structure as the touch panel 10, the description is abbreviate | omitted using the same code | symbol.
　図４は、タッチパネル２０の、概略構成を模式的に示す平面図である。図４に示すように、透明電極層１４は、図４における左右方向に延在した複数の第１方向電極１４１と、上下方向に延在した複数の第２方向電極１４２とからなる。それぞれの電極は、少なくともその一方の端点において、配線１５と接続している。複数の配線１５は一箇所に集められて、端子部１５ａを形成している。なお、図４でハッチングを付して模式的に示すように、配線１５および端子部１５ａは、遮光層１２により覆われている。これにより、配線１５および端子部１５ａは、観測者側から視認されない。 FIG. 4 is a plan view schematically showing a schematic configuration of the touch panel 20. As shown in FIG. 4, the transparent electrode layer 14 includes a plurality of first direction electrodes 141 extending in the left-right direction in FIG. 4 and a plurality of second direction electrodes 142 extending in the up-down direction. Each electrode is connected to the wiring 15 at least at one end point thereof. The plurality of wirings 15 are collected at one place to form a terminal portion 15a. In addition, as shown schematically with hatching in FIG. 4, the wiring 15 and the terminal portion 15 a are covered with the light shielding layer 12. Thereby, the wiring 15 and the terminal part 15a are not visually recognized from the observer side.
　第１方向電極１４１は、複数の島状電極部１４１ａと、それらを互いに接続するブリッジ部１４１ｂとからなる。図５は、図４におけるＶ－Ｖ線に沿った断面図である。図５に示すように、島状電極部１４１ａとブリッジ部１４１ｂとは、層間絶縁膜１４３を間に挟んで異なる層に形成されている。島状電極部１４１ａとブリッジ部１４１ｂとは、コンタクトホール１４３ａを通じで電気的に接続されている。これにより、第１方向電極１４１が、第２方向電極１４２を跨ぐように配置され、第１方向電極１４１と第２方向電極１４２とは、互いに接触しない。 The first direction electrode 141 includes a plurality of island-shaped electrode portions 141a and a bridge portion 141b that connects them to each other. FIG. 5 is a sectional view taken along line VV in FIG. As shown in FIG. 5, the island-shaped electrode portion 141a and the bridge portion 141b are formed in different layers with an interlayer insulating film 143 interposed therebetween. The island-shaped electrode portion 141a and the bridge portion 141b are electrically connected through the contact hole 143a. Accordingly, the first direction electrode 141 is disposed so as to straddle the second direction electrode 142, and the first direction electrode 141 and the second direction electrode 142 are not in contact with each other.
　無機層１３に配線１５が形成されている。配線１５は、透明電極層１４の層間絶縁膜１４３と一部接しており、コンタクトホール１４３ｂを介して第１方向電極１４１の島状電極部１４１ａと電気的に接続している。また、図５の断面には表れていないが、配線１５は他のコンタクトホールを介して第２方向電極１４２とも電気的に接続している。 A wiring 15 is formed on the inorganic layer 13. The wiring 15 is partially in contact with the interlayer insulating film 143 of the transparent electrode layer 14, and is electrically connected to the island-shaped electrode portion 141a of the first direction electrode 141 through the contact hole 143b. Although not shown in the cross section of FIG. 5, the wiring 15 is also electrically connected to the second direction electrode 142 through another contact hole.
　［第１の実施形態の変形例にかかるタッチパネル２０の製造方法］
　以下、図６Ａ～図６Ｅを参照して、タッチパネル２０の製造方法について説明する。 [Manufacturing Method of Touch Panel 20 According to Modification of First Embodiment]
Hereinafter, a method of manufacturing the touch panel 20 will be described with reference to FIGS. 6A to 6E.
　タッチパネル１０と同様にして、透明基板１１に遮光層１２および無機層１３を形成する（図６Ａ）。 The light shielding layer 12 and the inorganic layer 13 are formed on the transparent substrate 11 in the same manner as the touch panel 10 (FIG. 6A).
　次に、スパッタリングまたはＣＶＤ法により、第１方向電極１４１の島状電極部１４１ａおよび第２方向電極１４２となる導電膜を形成する。そして、フォトリソグラフィ法により、所定の領域を覆うレジストパターンを作製する。これをマスクとして導電膜をエッチングし、第１方向電極１４１の島状電極部１４１ａおよび第２方向電極１４２を作製する（図６Ｂ）。なお、この工程において、無機層１３にはメタルマスク等を配置して導電膜を形成しないようにしても良いし、一旦導電膜を形成した後でエッチングによって取り除いても良い。 Next, a conductive film to be the island-shaped electrode portion 141a of the first direction electrode 141 and the second direction electrode 142 is formed by sputtering or CVD. Then, a resist pattern covering a predetermined region is produced by photolithography. Using this as a mask, the conductive film is etched to form the island-shaped electrode portion 141a and the second direction electrode 142 of the first direction electrode 141 (FIG. 6B). In this step, a metal mask or the like may be disposed on the inorganic layer 13 so that the conductive film is not formed, or the conductive film may be formed and then removed by etching.
　次に、ＣＶＤ法によって層間絶縁膜１４３を形成する。そして、フォトリソグラフィ法により、コンタクトホール１４３ａ，１４３ｂを形成する予定の領域以外を覆うレジストパターンを作製する。これをマスクとして層間絶縁膜１４３をエッチングし、コンタクトホール１４３ａ，１４３ｂを形成する（図６Ｃ）。なお、無機層１３には、層間絶縁膜１４３を形成しても良いし、形成しなくても良い。また、メタルマスク等を配置して層間絶縁膜１４３を形成しないようにしても良いし、一旦層間絶縁膜１４３を形成した後にエッチングによって取り除いても良い。 Next, an interlayer insulating film 143 is formed by a CVD method. Then, a resist pattern that covers the regions other than the regions where the contact holes 143a and 143b are to be formed is produced by photolithography. Using this as a mask, the interlayer insulating film 143 is etched to form contact holes 143a and 143b (FIG. 6C). Note that an interlayer insulating film 143 may or may not be formed on the inorganic layer 13. Alternatively, a metal mask or the like may be disposed so that the interlayer insulating film 143 is not formed, or the interlayer insulating film 143 may be formed and then removed by etching.
　次に、スパッタリングまたはＣＶＤ法により、第１方向電極１４１のブリッジ部１４１ｂとなる導電膜を形成する。そして、フォトリソグラフィ法により、所定の領域を覆うレジストパターンを作製する。これをマスクとして導電膜をエッチングし、第１方向電極１４１のブリッジ部１４１ｂを作製する。同様にして、配線１５を作製する（図６Ｄ）。 Next, a conductive film to be the bridge portion 141b of the first direction electrode 141 is formed by sputtering or CVD. Then, a resist pattern covering a predetermined region is produced by photolithography. Using this as a mask, the conductive film is etched to produce the bridge portion 141b of the first direction electrode 141. Similarly, the wiring 15 is produced (FIG. 6D).
　なお、第１方向電極１４１のブリッジ部１４１ｂとなる導電膜としては、ＩＴＯ等の透明導電性材料を用いることが、表示側から視認されにくいという点で好ましい。一方、第１方向電極１４１のブリッジ部１４１ｂとなる導電膜を、配線１５と同じ材料で形成し、配線１５と同時に作製しても良い。 Note that it is preferable to use a transparent conductive material such as ITO as the conductive film that becomes the bridge portion 141b of the first direction electrode 141 because it is difficult to be seen from the display side. On the other hand, the conductive film to be the bridge portion 141 b of the first direction electrode 141 may be formed of the same material as the wiring 15 and manufactured simultaneously with the wiring 15.
　最後に、端子部１５ａとなる箇所をマスクして、スピンコート法により保護膜１６を形成する（図６Ｅ）。 Finally, the protective film 16 is formed by a spin coating method while masking the portion to be the terminal portion 15a (FIG. 6E).
　以上、タッチパネル２０の構成および製造方法について説明したが、上記の構成はあくまで例示である。特に、透明電極層１４は、種々の構成を取り得る。例えば、図５に示した例では、第１方向電極１４１の島状電極部１４１ａと第２方向電極１４２とが同じ層に配置されていたが、それぞれ異なる層に配置しても良い。また、第１方向電極１４１および第２方向電極１４２は、様々な形状を取り得る。 Although the configuration and manufacturing method of the touch panel 20 have been described above, the above configuration is merely an example. In particular, the transparent electrode layer 14 can take various configurations. For example, in the example shown in FIG. 5, the island-shaped electrode portion 141a of the first direction electrode 141 and the second direction electrode 142 are arranged in the same layer, but they may be arranged in different layers. Further, the first direction electrode 141 and the second direction electrode 142 can take various shapes.
　また、図４および図５では、投影型静電容量方式の場合を例示しているが、タッチパネル１０は、表面型静電容量方式であっても良い。この場合、透明電極層１４は、透明基板１１に均一に成膜されていれば良い。 4 and 5 exemplify the case of the projected capacitive method, the touch panel 10 may be a surface capacitive method. In this case, the transparent electrode layer 14 may be formed uniformly on the transparent substrate 11.
　［第２の実施形態]
　図７は、本発明の第２の実施形態にかかるタッチパネル３０、およびタッチパネル３０を備えたタッチパネル付き表示装置３の概略構成を模式的に示す断面図である。タッチパネル付き表示装置３は、タッチパネル３０と、画像を表示可能な表示装置９０とを備えている。 [Second Embodiment]
FIG. 7: is sectional drawing which shows typically schematic structure of the touchscreen 30 concerning the 2nd Embodiment of this invention, and the display apparatus 3 with a touchscreen provided with the touchscreen 30. As shown in FIG. The display device 3 with a touch panel includes a touch panel 30 and a display device 90 capable of displaying an image.
　タッチパネル３０は、透明基板１１、遮光層３２、透明電極層１４、配線１５、保護膜１６、およびＦＰＣ１７を備えている。すなわち、タッチパネル３０は、タッチパネル１０と比較して、遮光層３２の構成が異なり、さらに、無機層１３が設けられていない点で異なっている。 The touch panel 30 includes a transparent substrate 11, a light shielding layer 32, a transparent electrode layer 14, a wiring 15, a protective film 16, and an FPC 17. That is, the touch panel 30 is different from the touch panel 10 in that the configuration of the light shielding layer 32 is different and the inorganic layer 13 is not provided.
　本実施形態では、遮光層３２は、絶縁性の無機材料により構成されている。これにより、遮光層３２に直接、配線１５を形成しても、短絡せず、かつ密着を良くできる。 In the present embodiment, the light shielding layer 32 is made of an insulating inorganic material. Thereby, even if the wiring 15 is formed directly on the light shielding layer 32, it is possible to improve the adhesion without causing a short circuit.
　本実施形態によれば、無機層を形成する工程を省略することができる。 According to this embodiment, the step of forming the inorganic layer can be omitted.
　［第３の実施形態]
　図８は、本発明の第３の実施形態にかかるタッチパネル４０、およびタッチパネル４０を備えたタッチパネル付き表示装置４の概略構成を模式的に示す断面図である。タッチパネル付き表示装置４は、タッチパネル４０と、画像を表示可能な表示装置９０とを備えている。 [Third Embodiment]
FIG. 8: is sectional drawing which shows typically schematic structure of the touchscreen 40 concerning the 3rd Embodiment of this invention, and the display apparatus 4 with a touchscreen provided with the touchscreen 40. As shown in FIG. The display device 4 with a touch panel includes a touch panel 40 and a display device 90 capable of displaying an image.
　タッチパネル４０は、透明基板４１、遮光層１２、無機層４３、透明電極層１４、配線１５、保護膜１６、およびＦＰＣ１７を備えている。すなわち、タッチパネル４０は、タッチパネル１０と比較して、透明基板および無機層の構成が異なる。 The touch panel 40 includes a transparent substrate 41, a light shielding layer 12, an inorganic layer 43, a transparent electrode layer 14, wirings 15, a protective film 16, and an FPC 17. That is, the touch panel 40 differs from the touch panel 10 in the configuration of the transparent substrate and the inorganic layer.
　タッチパネル１０では、透明基板１１として無機材料であるアルカリガラスを用いた。本実施形態にかかるタッチパネル４０では、透明基板４１は、有機材料および無機材料のいずれを用いても良い。透明基板４１が有機材料である場合、透明基板４１は例えば、アクリル樹脂等のプラスチックフィルムである。 In the touch panel 10, alkali glass which is an inorganic material is used as the transparent substrate 11. In the touch panel 40 according to the present embodiment, the transparent substrate 41 may use either an organic material or an inorganic material. When the transparent substrate 41 is an organic material, the transparent substrate 41 is, for example, a plastic film such as an acrylic resin.
　そして、透明基板４１の少なくとも遮光層１２が形成されている方の面の全面に、遮光層１２および透明基板４１を被覆して、絶縁性の無機材料からなる無機層４３が形成されている。無機層４３は、無機層１３と同様に、窒化珪素または酸化珪素等からなる層を用いることができる。無機層４３の厚みは、これに限定されないが、例えば０．３～０．６μｍである。 Then, at least the entire surface of the transparent substrate 41 on which the light shielding layer 12 is formed is covered with the light shielding layer 12 and the transparent substrate 41 to form an inorganic layer 43 made of an insulating inorganic material. As the inorganic layer 43, similarly to the inorganic layer 13, a layer made of silicon nitride, silicon oxide, or the like can be used. The thickness of the inorganic layer 43 is not limited to this, but is, for example, 0.3 to 0.6 μm.
　透明電極層１４は、無機層４３に形成されている。透明電極層１４はＩＴＯやＩＺＯ等の無機材料から形成されており、無機層４３との密着性が良い。したがって、透明基板４１の材質によらず、透明電極層１４の密着性を高めることができる。また、配線１５も無機層４３に形成されている。そのため、遮光層１２の材質によらず、配線１５の密着性を良くできる。 The transparent electrode layer 14 is formed on the inorganic layer 43. The transparent electrode layer 14 is made of an inorganic material such as ITO or IZO and has good adhesion to the inorganic layer 43. Therefore, the adhesion of the transparent electrode layer 14 can be enhanced regardless of the material of the transparent substrate 41. The wiring 15 is also formed in the inorganic layer 43. Therefore, the adhesion of the wiring 15 can be improved regardless of the material of the light shielding layer 12.
　なお、本実施形態では、無機層４３が、透明基板４１の少なくとも片面（遮光層１２が形成された面）を覆う構成とした。無機層４３は、透明基板４１を２面以上（側面を含めて最大６面）を覆う構成とすることが好ましい。無機層４３によって被覆することで透明基板４１の表面が保護され、透明基板４１に傷が付くことを防止できるからである。 In the present embodiment, the inorganic layer 43 covers at least one surface of the transparent substrate 41 (the surface on which the light shielding layer 12 is formed). The inorganic layer 43 is preferably configured to cover two or more transparent substrates 41 (up to six surfaces including side surfaces). This is because the surface of the transparent substrate 41 is protected by being covered with the inorganic layer 43, and the transparent substrate 41 can be prevented from being damaged.
　［第４の実施形態]
　図９は、本発明の第４の実施形態にかかるタッチパネル５０、およびタッチパネル５０を備えたタッチパネル付き表示装置５の概略構成を模式的に示す断面図である。タッチパネル付き表示装置５は、タッチパネル５０と、画像を表示可能な表示装置９０とを備えている。 [Fourth Embodiment]
FIG. 9: is sectional drawing which shows typically schematic structure of the touchscreen 50 concerning the 4th Embodiment of this invention, and the display apparatus 5 with a touchscreen provided with the touchscreen 50. As shown in FIG. The display device 5 with a touch panel includes a touch panel 50 and a display device 90 capable of displaying an image.
　タッチパネル５０は、透明基板４１、遮光層１２、無機層５３、透明電極層１４、配線１５、保護膜１６、ＦＰＣ１７、および有機層５８を備えている。すなわち、タッチパネル５０は、タッチパネル４０と比較して、無機層の構成が異なっていることに加え、有機層５８をさらに備えている。 The touch panel 50 includes a transparent substrate 41, a light shielding layer 12, an inorganic layer 53, a transparent electrode layer 14, wirings 15, a protective film 16, an FPC 17, and an organic layer 58. That is, the touch panel 50 is further provided with an organic layer 58 in addition to the configuration of the inorganic layer as compared with the touch panel 40.
　本実施形態では、透明基板４１の遮光層１２が形成された方の面の全面に、遮光層１２および透明基板４１を被覆して、絶縁性の有機材料からなる有機層５８が形成されている。有機層５８は、例えば、アクリル系、シロキサン系の透明樹脂を、スピンコータまたはスリットコータによって成膜して形成される。なお、有機層５８として、有機材料および無機材料の双方と密着性の良い材料を用いることが好ましい。 In the present embodiment, an organic layer 58 made of an insulating organic material is formed on the entire surface of the transparent substrate 41 on which the light shielding layer 12 is formed, covering the light shielding layer 12 and the transparent substrate 41. . The organic layer 58 is formed by, for example, forming an acrylic or siloxane transparent resin into a film using a spin coater or a slit coater. Note that it is preferable to use a material having good adhesion to both the organic material and the inorganic material as the organic layer 58.
　そして、この有機層５８に、絶縁性の無機材料からなる無機層５３が形成されている。無機層５３は、無機層１３と同様に、窒化珪素または酸化珪素等からなる膜を用いることができる。無機層５３の厚みは、これに限定されないが、例えば０．３～０．６μｍである。 Further, an inorganic layer 53 made of an insulating inorganic material is formed on the organic layer 58. As the inorganic layer 53, a film made of silicon nitride, silicon oxide, or the like can be used similarly to the inorganic layer 13. The thickness of the inorganic layer 53 is not limited to this, but is, for example, 0.3 to 0.6 μm.
　透明電極層１４は、無機層５３に形成されている。透明電極層１４はＩＴＯやＩＺＯ等の無機材料から形成されており、無機層５３との密着性が良い。したがって、透明基板４１の材質によらず、透明電極層１４の密着性を高めることができる。また、配線１５も無機層５３に形成されている。そのため、遮光層１２の材質によらず、配線１５の密着性を良くできる。 The transparent electrode layer 14 is formed on the inorganic layer 53. The transparent electrode layer 14 is made of an inorganic material such as ITO or IZO and has good adhesion to the inorganic layer 53. Therefore, the adhesion of the transparent electrode layer 14 can be enhanced regardless of the material of the transparent substrate 41. The wiring 15 is also formed in the inorganic layer 53. Therefore, the adhesion of the wiring 15 can be improved regardless of the material of the light shielding layer 12.
　また、有機層５８が、スピンコータまたはスリットコータによって成膜されることにより、有機層５８の表面は、透明基板４１上で遮光層１２によって形成された段差にかかわらず、平坦となる。したがって、有機層５８に形成される無機層５３も、平坦となる。 Further, when the organic layer 58 is formed by a spin coater or a slit coater, the surface of the organic layer 58 becomes flat regardless of the step formed by the light shielding layer 12 on the transparent substrate 41. Therefore, the inorganic layer 53 formed on the organic layer 58 is also flat.
　本実施形態によれば、有機層５８により、透明基板４１上で遮光層１２によって形成された段差が平坦化される。そのため、透明電極層１４および配線１５といったタッチパネルパターンを、平坦な平面上に作製することができる。 According to this embodiment, the step formed by the light shielding layer 12 on the transparent substrate 41 is flattened by the organic layer 58. Therefore, touch panel patterns such as the transparent electrode layer 14 and the wiring 15 can be produced on a flat plane.
　［その他の実施形態］
　以上、本発明についての実施形態を説明したが、本発明は上述の各実施形態のみに限定されず、発明の範囲内で種々の変更が可能である。また、上述した各実施形態は、適宜組み合わせて実施が可能である。 [Other Embodiments]
As mentioned above, although embodiment about this invention was described, this invention is not limited only to each above-mentioned embodiment, A various change is possible within the scope of the invention. Moreover, each embodiment mentioned above can be implemented in combination as appropriate.
　本発明は、カバー一体型のタッチパネルおよびタッチパネル付き表示装置として産業上の利用が可能である。 The present invention can be industrially used as a cover-integrated touch panel and a display device with a touch panel.

Claims (8)

  1. 　観察者側に配置されるカバー部材と、
    　前記カバー部材を基板として積層された複数の層とを備え、
    　前記複数の層は、無機材料からなる透明電極層を含み、
    　前記透明電極層は、観察者側の方向において無機材料と接している、タッチパネル。     A cover member arranged on the observer side;
    A plurality of layers laminated using the cover member as a substrate,
    The plurality of layers include a transparent electrode layer made of an inorganic material,
    The said transparent electrode layer is a touch panel which is in contact with the inorganic material in the direction of an observer side.
  2. 　前記透明電極層と接している無機材料は、前記カバー部材である、請求項１に記載のタッチパネル。 The touch panel according to claim 1, wherein the inorganic material in contact with the transparent electrode layer is the cover member.
  3. 　前記複数の層は、前記カバー部材の一方の面を被覆した、絶縁性の無機材料からなる無機層を含み、
    　前記透明電極層と接している無機材料は、前記無機層である、請求項１に記載のタッチパネル。     The plurality of layers include an inorganic layer made of an insulating inorganic material that covers one surface of the cover member,
    The touch panel according to claim 1, wherein the inorganic material in contact with the transparent electrode layer is the inorganic layer.
  4. 　前記複数の層は、前記カバー部材の一方の面を被覆した、絶縁性の有機材料からなる有機層と、前記有機層を被覆した、絶縁性の無機材料からなる無機層とを含み、
    　前記透明電極層と接している無機材料は、前記無機層である、請求項１に記載のタッチパネル。     The plurality of layers include an organic layer made of an insulating organic material that covers one surface of the cover member, and an inorganic layer made of an insulating inorganic material that covers the organic layer,
    The touch panel according to claim 1, wherein the inorganic material in contact with the transparent electrode layer is the inorganic layer.
  5. 　前記複数の層は、前記透明電極層と電気的に接続された配線層と、前記配線層よりも観察者側に設けられた遮光層とをさらに含む、請求項１～４のいずれか一項に記載のタッチパネル。 The plurality of layers further includes a wiring layer electrically connected to the transparent electrode layer, and a light shielding layer provided closer to the viewer than the wiring layer. Touch panel as described in 1.
  6. 　前記複数の層は、前記透明電極層と電気的に接続された配線層と、前記配線層よりも観察者側に設けられた遮光層と、前記遮光層を被覆する絶縁性の無機材料からなる無機層とをさらに含み、
    　前記配線層は、前記無機層と接して形成されている、請求項２に記載のタッチパネル。     The plurality of layers are made of a wiring layer electrically connected to the transparent electrode layer, a light shielding layer provided closer to the viewer than the wiring layer, and an insulating inorganic material that covers the light shielding layer. An inorganic layer,
    The touch panel according to claim 2, wherein the wiring layer is formed in contact with the inorganic layer.
  7. 　前記複数の層は、前記透明電極層と電気的に接続された配線層と、前記配線層よりも観察者側に設けられた遮光層とをさらに含み、
    　前記遮光層は、前記無機層で被覆されており、
    　前記配線層は、前記無機層と接して形成されている、請求項３に記載のタッチパネル。     The plurality of layers further includes a wiring layer electrically connected to the transparent electrode layer, and a light shielding layer provided closer to the viewer than the wiring layer,
    The light shielding layer is covered with the inorganic layer,
    The touch panel according to claim 3, wherein the wiring layer is formed in contact with the inorganic layer.
  8. 　画像を表示可能な表示装置と、
    　請求項１～７のいずれか一項に記載のタッチパネルとを備える、タッチパネル付き表示装置。     A display device capable of displaying images;
    A display device with a touch panel, comprising the touch panel according to any one of claims 1 to 7.
PCT/JP2012/066948 2011-07-14 2012-07-03 Touch panel and display device with touch panel WO2013008675A1 (en)

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JP2015011568A (en) * 2013-06-28 2015-01-19 大日本印刷株式会社 Touch detection module, display device with touch function, and touch panel sensor
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JP2014224937A (en) * 2013-05-17 2014-12-04 大日本印刷株式会社 Front face protective plate for display device with wiring line and method for manufacturing the protective plate, and display device
EP2813926A3 (en) * 2013-06-14 2015-03-25 Wintek Corporation Decoration cover plate
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