WO2012046442A1 - Liquid crystal display device - Google Patents

Liquid crystal display device Download PDF

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Publication number
WO2012046442A1
WO2012046442A1 PCT/JP2011/005606 JP2011005606W WO2012046442A1 WO 2012046442 A1 WO2012046442 A1 WO 2012046442A1 JP 2011005606 W JP2011005606 W JP 2011005606W WO 2012046442 A1 WO2012046442 A1 WO 2012046442A1
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WO
WIPO (PCT)
Prior art keywords
substrate
liquid crystal
columnar spacer
crystal display
display device
Prior art date
Application number
PCT/JP2011/005606
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French (fr)
Japanese (ja)
Inventor
崇文 水卜
健司 御園
渡辺　典子
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シャープ株式会社
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Publication of WO2012046442A1 publication Critical patent/WO2012046442A1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134336—Matrix

Definitions

  • the present invention relates to a liquid crystal display device having columnar spacers for maintaining the thickness of a liquid crystal layer constant.
  • a liquid crystal display device includes a TFT substrate on which a plurality of thin film transistors (TFTs) are formed, a counter substrate facing the TFT substrate, and a liquid crystal layer provided between the TFT substrate and the counter substrate. is doing.
  • a plurality of columnar spacers are interposed between the TFT substrate and the counter substrate in order to keep the thickness of the liquid crystal layer constant.
  • a TFT substrate 101 has a glass substrate 102 on which the above-described TFT and the like (not shown) are formed.
  • An interlayer insulating film (not shown) that covers the TFT is formed on the glass substrate 102, and a transparent electrode 103 made of ITO (Indium Tin Oxide) or the like is formed on the surface thereof.
  • a plurality of columnar spacers 104 are formed on the surface of the transparent electrode 103.
  • the transparent electrode 103 is covered with an alignment film 105.
  • the counter substrate 107 also has a glass substrate 108, and a transparent electrode 109 such as ITO is formed on the surface of the glass substrate 108.
  • the transparent electrode 109 of the counter substrate 107 is also covered with the alignment film 110. Then, as shown in FIG. 21, the gap between the TFT substrate 101 and the counter substrate 107 (that is, the thickness of the liquid crystal layer) is kept constant by the tips of the columnar spacers 104 coming into contact with the surface of the counter substrate 107. Yes.
  • Patent Document 1 As shown in FIG. 22, for the columnar spacer 104 formed on the TFT substrate 101, the area of the tip 111 of the columnar spacer 104 is indicated at the base end portion 112 of the columnar spacer 104. It is disclosed that the area is smaller than the area of the end face. As a result, the stress applied to the columnar spacers 104 is dispersed on the base end side of the columnar spacers 104 to prevent destruction of the elements and the like.
  • the tip of the columnar spacer is formed in a convex shape, so that stress concentration is more likely to occur.
  • Such a crack in the transparent electrode causes light leakage on the viewer side, leading to deterioration in display quality.
  • the present invention has been made in view of such a point, and an object thereof is to suppress light leakage to the observer side in the vicinity of the columnar spacer.
  • a liquid crystal display device includes a first substrate, a second substrate disposed opposite to the first substrate, and the first substrate and the second substrate.
  • the present invention is intended for a liquid crystal display device including a liquid crystal layer provided and a plurality of columnar spacers formed on the first substrate or the second substrate and defining a thickness of the liquid crystal layer to be constant.
  • a first transparent electrode is formed on the liquid crystal layer side of the first substrate, a second transparent electrode is formed on the liquid crystal layer side of the second substrate, and the first transparent electrode and the first transparent electrode are formed.
  • an opening is formed in a region where the columnar spacer is disposed, and an end of the columnar spacer is disposed inside the opening.
  • At least one of the first transparent electrode and the second transparent electrode is formed with an opening in the arrangement region of the columnar spacers.
  • the edge part of the columnar spacer is arrange
  • the present invention it is possible to suppress the occurrence of cracks in the first transparent electrode or the second transparent electrode, and to suppress light leakage to the observer side in the vicinity of the columnar spacer.
  • FIG. 1 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the first embodiment.
  • FIG. 2 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the first embodiment.
  • FIG. 3 is an enlarged cross-sectional view showing the vicinity of the columnar spacer in the first embodiment.
  • FIG. 4 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the second embodiment.
  • FIG. 5 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the second embodiment.
  • FIG. 6 is an enlarged sectional view showing the vicinity of the columnar spacer in the second embodiment.
  • FIG. 7 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the third embodiment.
  • FIG. 8 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the fourth embodiment.
  • FIG. 9 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the fourth embodiment.
  • FIG. 10 is an enlarged sectional view showing the vicinity of the columnar spacer in the fourth embodiment.
  • FIG. 11 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the fifth embodiment.
  • FIG. 12 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the fifth embodiment.
  • FIG. 13 is an enlarged sectional view showing the vicinity of the columnar spacer in the fifth embodiment.
  • FIG. 14 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the sixth embodiment.
  • FIG. 15 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the sixth embodiment.
  • FIG. 16 is an enlarged sectional view showing the vicinity of the columnar spacer in the sixth embodiment.
  • FIG. 17 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the seventh embodiment.
  • FIG. 18 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the seventh embodiment.
  • FIG. 19 is an enlarged sectional view showing the vicinity of the columnar spacer in the seventh embodiment.
  • FIG. 20 is a cross-sectional view showing a conventional TFT substrate and a counter substrate before being bonded to each other.
  • FIG. 21 is an enlarged cross-sectional view showing a main part structure of a conventional liquid crystal display device.
  • FIG. 22 is an enlarged sectional view showing the vicinity of a conventional columnar spacer.
  • Embodiment 1 of the Invention 1 to 3 show Embodiment 1 of the present invention.
  • FIG. 1 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the first embodiment.
  • FIG. 2 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the first embodiment.
  • FIG. 3 is an enlarged cross-sectional view showing the vicinity of the columnar spacer 20 in the first embodiment.
  • the liquid crystal display device 1 includes a liquid crystal display panel 10 and a backlight unit (not shown) that is an illumination device disposed to face the liquid crystal display panel 10 and is configured to perform at least transmissive display. Yes.
  • the liquid crystal display panel 10 includes a TFT substrate 11 that is a first substrate configured as an active matrix substrate, and a counter substrate 12 that is a second substrate disposed to face the TFT substrate 11. And a liquid crystal layer 13 provided between the TFT substrate 11 and the counter substrate 12.
  • the counter substrate 12 has a transparent plastic substrate 22 as a flexible substrate.
  • a common electrode 15 as a second transparent electrode is formed on the liquid crystal layer 13 side of the counter substrate 12.
  • the common electrode 15 is made of, for example, a transparent conductive film such as ITO, and is formed over substantially the entire display area (not shown).
  • the display area is an area in which an image is displayed, and a plurality of pixels (not shown) arranged in a matrix are formed.
  • An alignment film 16 made of polyimide or the like is formed on the surface of the common electrode 15 on the liquid crystal layer 13 side.
  • the counter substrate 12 is provided with a color filter and a black matrix (light shielding film) (not shown).
  • the TFT substrate 11 has a transparent plastic substrate 21 as a flexible substrate.
  • a TFT (not shown) is formed for each pixel on the liquid crystal layer 13 side of the TFT substrate 11.
  • the TFT is covered with an interlayer insulating film (not shown).
  • a pixel electrode 17 as a first transparent electrode is formed on the surface of the interlayer insulating film on the liquid crystal layer 13 side of the plastic substrate 21.
  • the pixel electrode 17 is made of, for example, a transparent conductive film such as ITO, and is provided for each pixel. In each pixel, the pixel electrode 17 is connected to the TFT.
  • An alignment film 18 made of polyimide or the like is formed on the surface of the pixel electrode 17 on the liquid crystal layer 13 side.
  • a plurality of columnar spacers 20 having the same height are formed on the TFT substrate 11.
  • the columnar spacer 20 is made of a photosensitive resin material and is formed by photolithography.
  • Each columnar spacer 20 is for defining the thickness of the liquid crystal layer 13 to be constant, and is formed to protrude from the surface of the TFT substrate 11 toward the counter substrate 12.
  • the columnar spacer 20 has an end surface area on the TFT substrate 11 side larger than an end surface area on the counter substrate 12 side, and is formed in a trapezoidal cross section.
  • the common electrode 15 has an opening 25 in a region where the columnar spacer 20 is disposed (that is, a region facing the tip of the columnar spacer 20). In other words, a part of the common electrode 15 is removed in a region facing the tip of the columnar spacer 20.
  • the edge part of the columnar spacer 20 is arrange
  • a portion of the alignment film 18 is interposed between the tip of the columnar spacer 20 and the plastic substrate 22 of the counter substrate 12.
  • the liquid crystal display device 1 is manufactured by bonding a TFT substrate 11 and a counter substrate 12 that are manufactured in advance to each other via a liquid crystal layer 13 and a seal member (not shown).
  • the sealing member is drawn on the counter substrate 12 in a rectangular frame shape, and a liquid crystal material is dropped and supplied into the frame of the sealing member.
  • the counter substrate 12 is aligned and attached to the TFT substrate 11.
  • the sealing member is cured by irradiating the sealing member with ultraviolet rays.
  • the sealing member may be drawn not on the counter substrate 12 but on the TFT substrate 11.
  • a TFT (not shown) is formed on the plastic substrate 21 by photolithography.
  • an interlayer insulating film (not shown) covering the TFT, an ITO film as a transparent conductive film material is formed on the surface of the interlayer insulating film.
  • a plurality of pixel electrodes 17 are formed by etching this ITO film.
  • a photosensitive resin film (not shown) is formed on the surface of the pixel electrode 17, and a plurality of columnar spacers 20 are formed by performing photolithography and etching on the photosensitive resin film. Thereafter, the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
  • the common electrode 15 is formed by forming an ITO film on at least the entire display region on the surface of the plastic substrate 22. Next, the common electrode 15 is etched to form a plurality of openings 25 so as to open in a region facing the tip of the columnar spacer 20. Thereafter, the alignment film 16 is formed on the surface of the common electrode 15 to manufacture the counter substrate 12.
  • the TFT substrate 11 and the counter substrate 12 are bonded to each other.
  • the tip of the columnar spacer 20 is inserted into the opening 25 in the common electrode 15.
  • the liquid crystal display device 1 is manufactured.
  • the column spacer 20 supports the counter substrate 12.
  • no stress concentration occurs in the common electrode 15 due to the end of the columnar spacer 20 in the opening 25. That is, the stress applied to the counter substrate 12 from the tip of the columnar spacer 20 is applied to the plastic substrate 22 through the alignment film 16 in the opening 25 as shown in FIG. No stress is applied. Therefore, as a result of suppressing the occurrence of cracks in the common electrode 15, it is possible to suppress light leakage to the observer side in the vicinity of the columnar spacer 20.
  • the pixel electrode 17 is formed at the base end of the columnar spacer 20. Since the generated stress can be dispersed, the occurrence of cracks can be suppressed not only in the common electrode 15 provided with the opening 25 but also in the pixel electrode 17.
  • Embodiment 2 of the Invention >> 4 to 6 show Embodiment 2 of the present invention.
  • FIG. 4 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 of the second embodiment.
  • FIG. 5 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the second embodiment.
  • FIG. 6 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the second embodiment.
  • the same parts as those in FIGS. 1 to 3 are denoted by the same reference numerals, and detailed description thereof will be omitted.
  • the opening 26 is formed not only in the common electrode 15 but also in the pixel electrode 17 in the first embodiment.
  • the pixel electrode 17 in the present embodiment has an opening 26 in a region where the columnar spacer 20 is disposed.
  • the base end of the columnar spacer 20 is formed on the plastic substrate 21 in the opening 26 of the pixel electrode 17.
  • the end of the columnar spacer 20 is disposed in the opening 25 of the common electrode 15 and supports the plastic substrate 22 via the alignment film 16.
  • the TFT substrate 11 in the present embodiment As in the first embodiment, after forming an ITO film on the surface of the interlayer insulating film, by performing photolithography and etching on the ITO film, An opening 26 is formed in the pixel electrode 17. Thereafter, a photosensitive resin film is formed on the pixel electrode 17, and a plurality of columnar spacers 20 are formed in the opening 26 by performing photolithography and etching on the photosensitive resin film. Thereafter, the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
  • the common electrode 15 of the counter substrate 12 is formed with the opening 25 in the region facing the tip of the columnar spacer 20.
  • no stress concentration occurs on the common electrode 15 due to the end of the columnar spacer 20 in the opening 25. That is, the stress applied to the counter substrate 12 from the tip of the columnar spacer 20 is applied to the plastic substrate 22 through the alignment film 16 in the opening 25 as shown in FIG. No stress is applied.
  • the columnar spacer 20 is formed on the plastic substrate 21 so that the base end of the columnar spacer 20 is disposed in the opening 26 formed in the pixel electrode 17, the columnar spacer 20 In a state where the counter substrate 12 is supported, stress concentration on the pixel electrode 17 due to the base end of the columnar spacer 20 can be prevented. As a result, the occurrence of cracks in the common electrode 15 and the pixel electrode 17 can be suppressed, so that light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed.
  • FIG. 7 shows Embodiment 3 of the present invention.
  • FIG. 7 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the third embodiment.
  • the opening 25 is formed in the common electrode 15, whereas in the third embodiment, the opening 26 is formed in the pixel electrode 17 instead of the common electrode 15.
  • the pixel electrode 17 has an opening 26 in a region where the columnar spacer 20 is disposed. As shown in FIG. 7, the base end of the columnar spacer 20 is formed on the plastic substrate 21 in the opening 26 of the pixel electrode 17.
  • the columnar spacer 20 is formed on the plastic substrate 21 so that the base end of the columnar spacer 20 is disposed in the opening 26 formed in the pixel electrode 17.
  • stress concentration on the pixel electrode 17 by the base end of the columnar spacer 20 can be prevented.
  • the occurrence of cracks in the pixel electrode 17 can be suppressed, so that light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed.
  • Embodiment 4 of the Invention >> 8 to 10 show Embodiment 4 of the present invention.
  • FIG. 8 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the fourth embodiment.
  • FIG. 9 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the fourth embodiment.
  • FIG. 10 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the fourth embodiment.
  • a light shielding film 28 is provided in a region corresponding to the columnar spacer 20 in the counter substrate 12 in the third embodiment.
  • the pixel electrode 17 in the present embodiment has an opening 26 in a region where the columnar spacer 20 is disposed.
  • the base end of the columnar spacer 20 is formed on the plastic substrate 21 in the opening 26 of the pixel electrode 17.
  • the tip of the columnar spacer 20 is in contact with the surface of the alignment film 16 in the counter substrate 12.
  • a plurality of light-shielding films 28 are formed on the plastic substrate 22 of the counter substrate 12 so as to face the tips of the plurality of columnar spacers 20, respectively.
  • the light shielding film 28 can be made of, for example, a light-shielding metal material or resin material.
  • a common electrode 15 is formed on the plastic substrate 22 so as to cover the light shielding film 28.
  • An alignment film 16 is formed so as to cover the common electrode 15.
  • the TFT substrate 11 can be manufactured in the same manner as in the second embodiment.
  • the counter substrate 12 is formed with a plurality of shapes that cover the tip of the columnar spacer 20 by forming a light shielding material layer on the surface of the plastic substrate 22 and then performing photolithography and etching on the light shielding material layer.
  • a light shielding film 28 is formed.
  • the common electrode 15 is formed by forming a transparent conductive film such as an ITO film on the plastic substrate 22 so as to cover each light shielding film 28.
  • the alignment film 16 is formed on the surface of the common electrode 15 to manufacture the counter substrate 12.
  • the liquid crystal display device 1 is manufactured by bonding the counter substrate 12 and the TFT substrate 11 together through the liquid crystal layer 13 and a seal member (not shown).
  • the common electrode 15 since the light shielding film 28 is formed in the region facing the tip of the columnar spacer 20, the common electrode 15 receives stress concentration from the tip of the columnar spacer 20 and cracks in the common electrode 15. 10, since light that is about to pass through the cracks to the viewer side can be blocked by the light shielding film 28 as shown in FIG. 10, the viewer side in the vicinity of the columnar spacer 20 also in this embodiment. Light leakage to the can be suppressed.
  • Embodiment 5 of the Invention >> 11 to 13 show Embodiment 5 of the present invention.
  • FIG. 11 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the fifth embodiment.
  • FIG. 12 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the fifth embodiment.
  • FIG. 13 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the fifth embodiment.
  • the light shielding film 29 is formed not only on the counter substrate 12 but also on the TFT substrate 11 in the fourth embodiment.
  • a light shielding film 29 is formed on the plastic substrate 21 of the TFT substrate 11 in the present embodiment in a region where the columnar spacer 20 is formed.
  • the light shielding film 29 can be made of, for example, a metal material or a resin material having a light shielding property.
  • the pixel electrode 17 is formed on the plastic substrate 21 so as to cover the light shielding film 29.
  • An alignment film 18 is formed so as to cover the pixel electrode 17.
  • a region where the columnar spacer 20 is formed by forming a light shielding material layer on the surface of the plastic substrate 21 and then performing photolithography and etching on the light shielding material layer.
  • a plurality of light shielding films 29 are formed.
  • a TFT (not shown) is formed on the plastic substrate 21 by photolithography.
  • an interlayer insulating film (not shown) covering the TFT, an ITO film as a transparent conductive film material is formed on the surface of the interlayer insulating film.
  • a plurality of pixel electrodes 17 are formed by etching this ITO film.
  • a photosensitive resin film (not shown) is formed on the surface of the pixel electrode 17, and a plurality of columnar spacers 20 are formed by performing photolithography and etching on the photosensitive resin film.
  • the base ends of the plurality of columnar spacers 20 thus formed are opposed to the light shielding film 29, respectively.
  • the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
  • the common electrode 15 since the light shielding film 28 is formed in the region facing the tip of the columnar spacer 20, the common electrode 15 receives stress concentration from the tip of the columnar spacer 20, and the common electrode 15 is cracked. Even if this occurs, the light to be transmitted from the crack to the viewer side can be blocked by the light shielding film 28 as shown in FIG. Further, since the light shielding film 29 is formed in the region facing the base end of the columnar spacer 20, even if the pixel electrode 17 receives stress concentration from the base end of the columnar spacer 20 and a crack occurs in the pixel electrode 17, As shown in FIG. 13, the light to be transmitted from the crack to the viewer side can be blocked by the light shielding film 28. Therefore, according to this embodiment, light leakage to the observer side in the vicinity of the columnar spacer 20 can be suppressed.
  • Embodiment 6 of the Invention 14 to 16 show Embodiment 6 of the present invention.
  • FIG. 14 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the sixth embodiment.
  • FIG. 15 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the sixth embodiment.
  • FIG. 16 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the sixth embodiment.
  • the columnar spacer 20 in the present embodiment is formed so that the cross section in the direction parallel to the plastic substrates 21 and 22 gradually increases from the substantially central portion toward both ends.
  • the columnar spacer 20 has a first spacer 20a formed on the TFT substrate 11 and a second spacer 20b formed on the counter substrate 12, as shown in FIGS.
  • the first spacer 20a the area of the front end surface on the counter substrate 12 side is smaller than the area of the base end surface on the TFT substrate 11 side.
  • the second spacer 20b the area of the front end surface on the TFT substrate 11 side is smaller than the area of the base end surface on the counter substrate 12 side.
  • the first spacer 20a and the second spacer 20b are arranged to face each other, and the tip end surfaces are formed in the same size and abut against each other, whereby the columnar spacer 20 is formed as a whole.
  • a TFT (not shown) is formed on the plastic substrate 21 by photolithography.
  • an interlayer insulating film (not shown) covering the TFT, an ITO film as a transparent conductive film material is formed on the surface of the interlayer insulating film.
  • a plurality of pixel electrodes 17 are formed by etching this ITO film.
  • a photosensitive resin film (not shown) is formed on the surface of the pixel electrode 17, and a plurality of first spacers 20a are formed by performing photolithography and etching on the photosensitive resin film. Thereafter, the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
  • the common electrode 15 is formed by forming an ITO film on at least the entire display region on the surface of the plastic substrate 22.
  • a photosensitive resin film (not shown) is formed on the surface of the alignment film 16, and the photosensitive resin film is subjected to photolithography and etching.
  • a plurality of second spacers 20b are formed, and the counter substrate 12 is manufactured.
  • the area of both end surfaces of the columnar spacer 20 (that is, the end surface on the TFT substrate 11 side and the end surface on the counter substrate 12 side) is made larger than the cross section of the central portion of the columnar spacer 20. Therefore, as shown in FIG. 16, the stress applied to the common electrode 15 and the pixel electrode 17 from both ends of the columnar spacer 20 can be dispersed. Therefore, generation of cracks in the common electrode 15 and the pixel electrode 17 can be suppressed, and light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed.
  • Embodiment 7 of the Invention >> 17 to 19 show Embodiment 7 of the present invention.
  • FIG. 17 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the seventh embodiment.
  • FIG. 18 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the seventh embodiment.
  • FIG. 19 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the seventh embodiment.
  • the columnar spacer 20 in the present embodiment is made of a material having the same hardness as the constituent material of the plastic substrates 21 and 22, or a material having a lower hardness than the constituent material of the plastic substrates 21 and 22.
  • the columnar spacer 20 is formed, for example, on the surface of the pixel electrode 17 in the TFT substrate 11, and the tip thereof is in contact with the alignment film 16 of the counter substrate 12.
  • the material of the columnar spacer 20 for example, “Optomer NN series” (a product of JSR Corporation), which is a photosensitive material having a Young's modulus of about 11 GPa, is applied.
  • a plastic substrate obtained by adding about 50% glass cloth to an alicyclic epoxy resin having a rate of about 13 GPa can be applied.
  • plastic substrates 21 and 22 it is also possible to increase the hardness of the plastic substrates 21 and 22 to be the same as or larger than that of the columnar spacer 20 by vacuum-depositing a silicone hard coat such as SiO 2 on the plastic substrate.
  • the stress applied to the common electrode 15 and the pixel electrode 17 from both ends of the columnar spacer 20 spreads in the direction in which the columnar spacer 20 is parallel to the plastic substrates 21 and 22.
  • it can be made smaller by deforming. That is, according to the present embodiment as well, the occurrence of cracks in the common electrode 15 and the pixel electrode 17 due to the stress received from the columnar spacer 20 can be suppressed, so that light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed.
  • the first substrate is an active matrix substrate.
  • the present invention is not limited to this, and other materials such as a passive matrix substrate having a plurality of strip-shaped first transparent electrodes may be used as long as a transparent substrate and columnar spacers are formed. You may comprise by the board
  • both the TFT substrate 11 and the opposing substrate 12 consist of a flexible substrate
  • this invention is not limited to this,
  • at least one of the TFT substrate 11 and the opposing substrate 12 may be a flexible substrate
  • both the TFT substrate 11 and the counter substrate 12 may be configured by a non-flexible substrate such as a glass substrate.
  • the common electrode (second transparent electrode) 15 and the pixel electrode (first transparent electrode) 17 are not limited to ITO, and may be formed of other transparent conductive films such as IZO (Indium Zinc Oxide), for example.
  • IZO Indium Zinc Oxide
  • the columnar spacer 20 is formed on the TFT substrate 11 in each of the above embodiments.
  • the present invention is not limited to this, and the columnar spacer 20 may be formed on the counter substrate 12.
  • the present invention is not limited to Embodiments 1 to 7 described above, and the present invention includes a configuration in which these Embodiments 1 to 7 are appropriately combined.
  • the configuration of the columnar spacer 20 in the sixth and seventh embodiments may be applied as the columnar spacer 20 in the first to fifth embodiments.
  • liquid crystal display device 1 is a liquid crystal display device that performs a transmissive display having a backlight unit. Applicable to.
  • the present invention is useful for a liquid crystal display device having columnar spacers for maintaining the thickness of the liquid crystal layer constant.
  • Liquid crystal display device 11 TFT substrate (first substrate) 12 Counter substrate (second substrate) 13 Liquid crystal layer 15 Common electrode (second transparent electrode) 16 Alignment film 17 Pixel electrode (first transparent electrode) 18 Alignment film 20 Columnar spacer 21, 22 Plastic substrate 25, 26 opening

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
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Abstract

Disclosed is a liquid crystal display device that comprises a plurality of columnar spacers which are formed on a first substrate or a second substrate and define the thickness of a liquid crystal layer to a constant value. A first transparent electrode is formed on the liquid crystal layer side of the first substrate, while a second transparent electrode is formed on the liquid crystal layer side of the second substrate. The first transparent electrode and/or the second transparent electrode is provided with openings in regions where the columnar spacers are arranged, and end portions of the columnar spacers are respectively arranged inside the openings.

Description

液晶表示装置Liquid crystal display
　本発明は、液晶層の厚みを一定に維持するための柱状スペーサを有する液晶表示装置に関するものである。 The present invention relates to a liquid crystal display device having columnar spacers for maintaining the thickness of a liquid crystal layer constant.
　一般に、液晶表示装置は、複数のＴＦＴ（Thin-Film Transistor：薄膜トランジスタ）が形成されたＴＦＴ基板と、これに対向する対向基板と、ＴＦＴ基板及び対向基板の間に設けられた液晶層とを有している。ＴＦＴ基板及び対向基板の間には、液晶層の厚みを一定に維持するために複数の柱状スペーサが介在されている。 In general, a liquid crystal display device includes a TFT substrate on which a plurality of thin film transistors (TFTs) are formed, a counter substrate facing the TFT substrate, and a liquid crystal layer provided between the TFT substrate and the counter substrate. is doing. A plurality of columnar spacers are interposed between the TFT substrate and the counter substrate in order to keep the thickness of the liquid crystal layer constant.
　図２０に示すように、ＴＦＴ基板１０１は、上記ＴＦＴ等（図示省略）が形成されたガラス基板１０２を有している。ガラス基板１０２上には、ＴＦＴを覆う層間絶縁膜（図示省略）が形成され、その表面にＩＴＯ（Indium Tin Oxide）等からなる透明電極１０３が形成されている。透明電極１０３の表面には、柱状スペーサ１０４が複数形成されている。透明電極１０３は配向膜１０５によって覆われている。 As shown in FIG. 20, a TFT substrate 101 has a glass substrate 102 on which the above-described TFT and the like (not shown) are formed. An interlayer insulating film (not shown) that covers the TFT is formed on the glass substrate 102, and a transparent electrode 103 made of ITO (Indium Tin Oxide) or the like is formed on the surface thereof. A plurality of columnar spacers 104 are formed on the surface of the transparent electrode 103. The transparent electrode 103 is covered with an alignment film 105.
　また、対向基板１０７もガラス基板１０８を有し、そのガラス基板１０８の表面にはＩＴＯ等の透明電極１０９が形成されている。この対向基板１０７の透明電極１０９も配向膜１１０によって覆われている。そして、図２１に示すように、各柱状スペーサ１０４の先端が対向基板１０７の表面に当接することにより、ＴＦＴ基板１０１と対向基板１０７との間隙（すなわち液晶層の厚み）が一定に維持されている。 The counter substrate 107 also has a glass substrate 108, and a transparent electrode 109 such as ITO is formed on the surface of the glass substrate 108. The transparent electrode 109 of the counter substrate 107 is also covered with the alignment film 110. Then, as shown in FIG. 21, the gap between the TFT substrate 101 and the counter substrate 107 (that is, the thickness of the liquid crystal layer) is kept constant by the tips of the columnar spacers 104 coming into contact with the surface of the counter substrate 107. Yes.
　ここで、ＴＦＴ基板の柱状スペーサと対向基板とが接触した状態で、当該柱状スペーサの端部近傍に応力が集中すると、ＴＦＴ基板に形成されている素子等が破壊される虞がある。これに対し、特許文献１には、図２２に示すように、ＴＦＴ基板１０１に形成された柱状スペーサ１０４について、その柱状スペーサ１０４の先端１１１の面積を、当該柱状スペーサ１０４の基端部１１２における端面の面積よりも小さくすることが開示されている。そのことにより、柱状スペーサ１０４に加わる応力を当該柱状スペーサ１０４の基端側で分散させて、上記素子等の破壊を防止しようとしている。 Here, if stress concentrates in the vicinity of the end of the columnar spacer in a state where the columnar spacer of the TFT substrate and the counter substrate are in contact with each other, there is a possibility that an element or the like formed on the TFT substrate is destroyed. On the other hand, in Patent Document 1, as shown in FIG. 22, for the columnar spacer 104 formed on the TFT substrate 101, the area of the tip 111 of the columnar spacer 104 is indicated at the base end portion 112 of the columnar spacer 104. It is disclosed that the area is smaller than the area of the end face. As a result, the stress applied to the columnar spacers 104 is dispersed on the base end side of the columnar spacers 104 to prevent destruction of the elements and the like.
特開２０００－１７１８０５号公報JP 2000-171805 A
　しかし、図２２に示すように、上記特許文献１の液晶表示装置では、柱状スペーサ１０４の先端１１１の面積が小さいために、柱状スペーサ１０４の先端１１１に接触している対向基板１０７の表面に応力が集中してしまう。その結果、対向基板１０７の透明電極１０９にクラック等が発生する虞がある。 However, as shown in FIG. 22, in the liquid crystal display device of Patent Document 1, since the area of the tip 111 of the columnar spacer 104 is small, stress is applied to the surface of the counter substrate 107 that is in contact with the tip 111 of the columnar spacer 104. Will concentrate. As a result, cracks or the like may occur in the transparent electrode 109 of the counter substrate 107.
　また、フォトリソグラフィによって柱状スペーサを形成した場合には、その柱状スペーサの先端が凸面状に形成されるため、より応力集中が生じ易くなる。 Further, when the columnar spacer is formed by photolithography, the tip of the columnar spacer is formed in a convex shape, so that stress concentration is more likely to occur.
　このような透明電極のクラックは、観察者側に光漏れが生じて表示品位の低下を招くこととなる。 Such a crack in the transparent electrode causes light leakage on the viewer side, leading to deterioration in display quality.
　本発明は、斯かる点に鑑みてなされたものであり、その目的とするところは、柱状スペーサの近傍において観察者側への光漏れを抑制することにある。 The present invention has been made in view of such a point, and an object thereof is to suppress light leakage to the observer side in the vicinity of the columnar spacer.
　上記の目的を達成するために、本発明に係る液晶表示装置は、第１基板と、上記第１基板に対向して配置された第２基板と、上記第１基板及び第２基板の間に設けられた液晶層と、上記第１基板又は第２基板に形成され、上記液晶層の厚みを一定に規定する複数の柱状スペーサとを備えた液晶表示装置を対象としている。 In order to achieve the above object, a liquid crystal display device according to the present invention includes a first substrate, a second substrate disposed opposite to the first substrate, and the first substrate and the second substrate. The present invention is intended for a liquid crystal display device including a liquid crystal layer provided and a plurality of columnar spacers formed on the first substrate or the second substrate and defining a thickness of the liquid crystal layer to be constant.
　そして、上記第１基板の上記液晶層側には、第１透明電極が形成され、上記第２基板の上記液晶層側には、第２透明電極が形成され、上記第１透明電極及び上記第２透明電極の少なくとも一方には、上記柱状スペーサが配置される領域において開口部が形成され、上記開口部の内側には、上記柱状スペーサの端部が配置されている。 A first transparent electrode is formed on the liquid crystal layer side of the first substrate, a second transparent electrode is formed on the liquid crystal layer side of the second substrate, and the first transparent electrode and the first transparent electrode are formed. In at least one of the two transparent electrodes, an opening is formed in a region where the columnar spacer is disposed, and an end of the columnar spacer is disposed inside the opening.
　上記液晶表示装置は、第１透明電極及び第２透明電極の少なくとも一方が、柱状スペーサの配置領域において開口部が形成されている。そして、その開口部の内側に柱状スペーサの端部が配置されているため、柱状スペーサが第１基板又は第２基板を支持した状態で、その第１透明電極又は第２透明電極には、上記開口部内の柱状スペーサの端部による応力集中が生じない。したがって、第１透明電極又は第２透明電極におけるクラックの発生が抑制されるため、柱状スペーサの近傍における観察者側への光漏れを抑制することができる。 In the liquid crystal display device, at least one of the first transparent electrode and the second transparent electrode is formed with an opening in the arrangement region of the columnar spacers. And since the edge part of the columnar spacer is arrange | positioned inside the opening part, in the state which the columnar spacer supported the 1st board | substrate or the 2nd board | substrate, in the said 1st transparent electrode or a 2nd transparent electrode, Stress concentration due to the end of the columnar spacer in the opening does not occur. Therefore, since generation | occurrence | production of the crack in a 1st transparent electrode or a 2nd transparent electrode is suppressed, the light leak to the observer side in the vicinity of a columnar spacer can be suppressed.
　本発明によれば、第１透明電極又は第２透明電極におけるクラックの発生を抑制して、柱状スペーサの近傍における観察者側への光漏れを抑制することができる。 According to the present invention, it is possible to suppress the occurrence of cracks in the first transparent electrode or the second transparent electrode, and to suppress light leakage to the observer side in the vicinity of the columnar spacer.
図１は、本実施形態１の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 1 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the first embodiment. 図２は、本実施形態１における互いに貼り合わされる前のＴＦＴ基板及び対向基板を示す断面図である。FIG. 2 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the first embodiment. 図３は、本実施形態１における柱状スペーサの近傍を拡大して示す断面図である。FIG. 3 is an enlarged cross-sectional view showing the vicinity of the columnar spacer in the first embodiment. 図４は、本実施形態２の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 4 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the second embodiment. 図５は、本実施形態２における互いに貼り合わされる前のＴＦＴ基板及び対向基板を示す断面図である。FIG. 5 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the second embodiment. 図６は、本実施形態２における柱状スペーサの近傍を拡大して示す断面図である。FIG. 6 is an enlarged sectional view showing the vicinity of the columnar spacer in the second embodiment. 図７は、本実施形態３の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 7 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the third embodiment. 図８は、本実施形態４の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 8 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the fourth embodiment. 図９は、本実施形態４における互いに貼り合わされる前のＴＦＴ基板及び対向基板を示す断面図である。FIG. 9 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the fourth embodiment. 図１０は、本実施形態４における柱状スペーサの近傍を拡大して示す断面図である。FIG. 10 is an enlarged sectional view showing the vicinity of the columnar spacer in the fourth embodiment. 図１１は、本実施形態５の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 11 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the fifth embodiment. 図１２は、本実施形態５における互いに貼り合わされる前のＴＦＴ基板及び対向基板を示す断面図である。FIG. 12 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the fifth embodiment. 図１３は、本実施形態５における柱状スペーサの近傍を拡大して示す断面図である。FIG. 13 is an enlarged sectional view showing the vicinity of the columnar spacer in the fifth embodiment. 図１４は、本実施形態６の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 14 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the sixth embodiment. 図１５は、本実施形態６における互いに貼り合わされる前のＴＦＴ基板及び対向基板を示す断面図である。FIG. 15 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the sixth embodiment. 図１６は、本実施形態６における柱状スペーサの近傍を拡大して示す断面図である。FIG. 16 is an enlarged sectional view showing the vicinity of the columnar spacer in the sixth embodiment. 図１７は、本実施形態７の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 17 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device according to the seventh embodiment. 図１８は、本実施形態７における互いに貼り合わされる前のＴＦＴ基板及び対向基板を示す断面図である。FIG. 18 is a cross-sectional view showing the TFT substrate and the counter substrate before being bonded to each other in the seventh embodiment. 図１９は、本実施形態７における柱状スペーサの近傍を拡大して示す断面図である。FIG. 19 is an enlarged sectional view showing the vicinity of the columnar spacer in the seventh embodiment. 図２０は、従来の互いに貼り合わされる前のＴＦＴ基板及び対向基板を示す断面図である。FIG. 20 is a cross-sectional view showing a conventional TFT substrate and a counter substrate before being bonded to each other. 図２１は、従来の液晶表示装置の要部構造を拡大して示す断面図である。FIG. 21 is an enlarged cross-sectional view showing a main part structure of a conventional liquid crystal display device. 図２２は、従来の柱状スペーサの近傍を拡大して示す断面図である。FIG. 22 is an enlarged sectional view showing the vicinity of a conventional columnar spacer.
　以下、本発明の実施形態を図面に基づいて詳細に説明する。尚、本発明は、以下の実施形態に限定されるものではない。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The present invention is not limited to the following embodiment.
　《発明の実施形態１》
　図１～図３は、本発明の実施形態１を示している。 Embodiment 1 of the Invention
1 to 3 show Embodiment 1 of the present invention.
　図１は、本実施形態１の液晶表示装置１の要部構造を拡大して示す断面図である。図２は、本実施形態１における互いに貼り合わされる前のＴＦＴ基板１１及び対向基板１２を示す断面図である。図３は、本実施形態１における柱状スペーサ２０の近傍を拡大して示す断面図である。 FIG. 1 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the first embodiment. FIG. 2 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the first embodiment. FIG. 3 is an enlarged cross-sectional view showing the vicinity of the columnar spacer 20 in the first embodiment.
　液晶表示装置１は、液晶表示パネル１０と、この液晶表示パネル１０に対向して配置された照明装置であるバックライトユニット（不図示）とを有し、少なくとも透過表示を行うように構成されている。 The liquid crystal display device 1 includes a liquid crystal display panel 10 and a backlight unit (not shown) that is an illumination device disposed to face the liquid crystal display panel 10 and is configured to perform at least transmissive display. Yes.
　液晶表示パネル１０は、図１に示すように、アクティブマトリクス基板に構成された第１基板であるＴＦＴ基板１１と、このＴＦＴ基板１１に対向して配置された第２基板である対向基板１２と、ＴＦＴ基板１１及び対向基板１２の間に設けられた液晶層１３とを有している。 As shown in FIG. 1, the liquid crystal display panel 10 includes a TFT substrate 11 that is a first substrate configured as an active matrix substrate, and a counter substrate 12 that is a second substrate disposed to face the TFT substrate 11. And a liquid crystal layer 13 provided between the TFT substrate 11 and the counter substrate 12.
　対向基板１２は、フレキシブル基板としての透明なプラスチック基板２２を有している。対向基板１２の液晶層１３側には、第２透明電極としての共通電極１５が形成されている。共通電極１５は、例えばＩＴＯ等の透明導電膜によって構成され、少なくとも表示領域（不図示）の略全体に亘って形成されている。表示領域は、画像が表示される領域であって、マトリクス状に配置された複数の画素（図示省略）が形成されている。 The counter substrate 12 has a transparent plastic substrate 22 as a flexible substrate. A common electrode 15 as a second transparent electrode is formed on the liquid crystal layer 13 side of the counter substrate 12. The common electrode 15 is made of, for example, a transparent conductive film such as ITO, and is formed over substantially the entire display area (not shown). The display area is an area in which an image is displayed, and a plurality of pixels (not shown) arranged in a matrix are formed.
　共通電極１５の液晶層１３側表面には、ポリイミド等からなる配向膜１６が形成されている。また、対向基板１２には、それぞれ図示省略のカラーフィルタ及びブラックマトリクス（遮光膜）が形成されている。 An alignment film 16 made of polyimide or the like is formed on the surface of the common electrode 15 on the liquid crystal layer 13 side. The counter substrate 12 is provided with a color filter and a black matrix (light shielding film) (not shown).
　ＴＦＴ基板１１は、フレキシブル基板としての透明なプラスチック基板２１を有している。ＴＦＴ基板１１の液晶層１３側には、各画素毎にＴＦＴ（図示省略）が形成されている。ＴＦＴは層間絶縁膜（図示省略）によって覆われている。 The TFT substrate 11 has a transparent plastic substrate 21 as a flexible substrate. A TFT (not shown) is formed for each pixel on the liquid crystal layer 13 side of the TFT substrate 11. The TFT is covered with an interlayer insulating film (not shown).
　そして、プラスチック基板２１の液晶層１３側には、第１透明電極としての画素電極１７が上記層間絶縁膜の表面に形成されている。画素電極１７は、例えばＩＴＯ等の透明導電膜によって構成され、各画素毎にそれぞれ設けられている。各画素において、画素電極１７はＴＦＴにそれぞれ接続されている。また、画素電極１７の液晶層１３側表面には、ポリイミド等からなる配向膜１８が形成されている。 A pixel electrode 17 as a first transparent electrode is formed on the surface of the interlayer insulating film on the liquid crystal layer 13 side of the plastic substrate 21. The pixel electrode 17 is made of, for example, a transparent conductive film such as ITO, and is provided for each pixel. In each pixel, the pixel electrode 17 is connected to the TFT. An alignment film 18 made of polyimide or the like is formed on the surface of the pixel electrode 17 on the liquid crystal layer 13 side.
　ＴＦＴ基板１１には、図２に示すように、互いに同じ高さを有する複数の柱状スペーサ２０が形成されている。柱状スペーサ２０は感光性樹脂材料によって構成され、フォトリソグラフィによって形成されている。各柱状スペーサ２０は、液晶層１３の厚みを一定に規定するためのものであり、ＴＦＴ基板１１の表面から対向基板１２側に突出して形成されている。また、図３に示すように、柱状スペーサ２０は、ＴＦＴ基板１１側の端面の面積が、対向基板１２側の端面の面積よりも大きくなっており、断面台形状に形成されている。 As shown in FIG. 2, a plurality of columnar spacers 20 having the same height are formed on the TFT substrate 11. The columnar spacer 20 is made of a photosensitive resin material and is formed by photolithography. Each columnar spacer 20 is for defining the thickness of the liquid crystal layer 13 to be constant, and is formed to protrude from the surface of the TFT substrate 11 toward the counter substrate 12. Further, as shown in FIG. 3, the columnar spacer 20 has an end surface area on the TFT substrate 11 side larger than an end surface area on the counter substrate 12 side, and is formed in a trapezoidal cross section.
　共通電極１５には、柱状スペーサ２０が配置される領域（つまり、柱状スペーサ２０の先端に対向する領域）において、開口部２５が形成されている。言い換えれば、共通電極１５の一部は、柱状スペーサ２０の先端に対向する領域において除去されている。 The common electrode 15 has an opening 25 in a region where the columnar spacer 20 is disposed (that is, a region facing the tip of the columnar spacer 20). In other words, a part of the common electrode 15 is removed in a region facing the tip of the columnar spacer 20.
　そして、図３に示すように、開口部２５の内側には、柱状スペーサ２０の端部が配置されている。尚、柱状スペーサ２０の先端と対向基板１２のプラスチック基板２２との間には、配向膜１８の一部が介在されている。 And as shown in FIG. 3, the edge part of the columnar spacer 20 is arrange | positioned inside the opening part 25. As shown in FIG. A portion of the alignment film 18 is interposed between the tip of the columnar spacer 20 and the plastic substrate 22 of the counter substrate 12.
　　－製造方法－
　次に、上記液晶表示装置１の製造方法について説明する。 -Production method-
Next, a method for manufacturing the liquid crystal display device 1 will be described.
　液晶表示装置１は、それぞれ予め製造したＴＦＴ基板１１と対向基板１２とを液晶層１３及びシール部材（図示省略）を介して貼り合わせることによって製造する。 The liquid crystal display device 1 is manufactured by bonding a TFT substrate 11 and a counter substrate 12 that are manufactured in advance to each other via a liquid crystal layer 13 and a seal member (not shown).
　例えば対向基板１２に上記シール部材を矩形枠状に描画し、そのシール部材の枠内に液晶材料を滴下して供給する。次に、対向基板１２をＴＦＴ基板１１に位置合わせして貼り付ける。その後、シール部材に紫外線を照射して当該シール部材を硬化させる。そうして、液晶表示装置１を製造する。尚、シール部材を描画するのは、対向基板１２でなく、ＴＦＴ基板１１であってもよい。 For example, the sealing member is drawn on the counter substrate 12 in a rectangular frame shape, and a liquid crystal material is dropped and supplied into the frame of the sealing member. Next, the counter substrate 12 is aligned and attached to the TFT substrate 11. Thereafter, the sealing member is cured by irradiating the sealing member with ultraviolet rays. Thus, the liquid crystal display device 1 is manufactured. The sealing member may be drawn not on the counter substrate 12 but on the TFT substrate 11.
　ＴＦＴ基板１１を製造する場合には、プラスチック基板２１上にＴＦＴ（不図示）をフォトリソグラフィによって形成する。次に、ＴＦＴを覆う層間絶縁膜（不図示）を形成した後に、その層間絶縁膜の表面に透明導電膜材料としてのＩＴＯ膜を形成する。そして、このＩＴＯ膜をエッチングすることにより、複数の画素電極１７を形成する。 When the TFT substrate 11 is manufactured, a TFT (not shown) is formed on the plastic substrate 21 by photolithography. Next, after forming an interlayer insulating film (not shown) covering the TFT, an ITO film as a transparent conductive film material is formed on the surface of the interlayer insulating film. Then, a plurality of pixel electrodes 17 are formed by etching this ITO film.
　次に、画素電極１７の表面に感光性樹脂膜（不図示）を形成し、この感光性樹脂膜をフォトリソグラフィ及びエッチングを行うことにより、複数の柱状スペーサ２０を形成する。その後、配向膜１８を画素電極１７の表面に形成し、ＴＦＴ基板１１を製造する。 Next, a photosensitive resin film (not shown) is formed on the surface of the pixel electrode 17, and a plurality of columnar spacers 20 are formed by performing photolithography and etching on the photosensitive resin film. Thereafter, the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
　一方、対向基板１２を製造する場合には、プラスチック基板２２の表面における少なくとも表示領域の全体にＩＴＯ膜を形成することによって、共通電極１５を形成する。次に、共通電極１５にエッチングを行い、柱状スペーサ２０の先端に対向する領域で開口するように複数の開口部２５を形成する。その後、共通電極１５の表面に配向膜１６を形成し、対向基板１２を製造する。 On the other hand, when the counter substrate 12 is manufactured, the common electrode 15 is formed by forming an ITO film on at least the entire display region on the surface of the plastic substrate 22. Next, the common electrode 15 is etched to form a plurality of openings 25 so as to open in a region facing the tip of the columnar spacer 20. Thereafter, the alignment film 16 is formed on the surface of the common electrode 15 to manufacture the counter substrate 12.
　その後、上記ＴＦＴ基板１１及び対向基板１２を互いに貼り合わせる。このとき、柱状スペーサ２０の先端が、共通電極１５における開口部２５内に挿入される。こうして、液晶表示装置１を製造する。 Thereafter, the TFT substrate 11 and the counter substrate 12 are bonded to each other. At this time, the tip of the columnar spacer 20 is inserted into the opening 25 in the common electrode 15. Thus, the liquid crystal display device 1 is manufactured.
　　－実施形態１の効果－
　したがって、この実施形態１によると、対向基板１２の共通電極１５には、柱状スペーサ２０の先端に対向する領域において開口部２５が形成されているため、柱状スペーサ２０が対向基板１２を支持した状態で、その共通電極１５には、開口部２５内の柱状スペーサ２０の端部によって応力集中が生じない。すなわち、柱状スペーサ２０の先端から対向基板１２に加えられる応力は、図３に示すように、開口部２５内の配向膜１６を介してプラスチック基板２２へ加えられるため、共通電極１５には直接に応力が加わらない。したがって、共通電極１５におけるクラックの発生を抑制できる結果、柱状スペーサ２０の近傍における観察者側への光漏れを抑制することができる。 -Effect of Embodiment 1-
Therefore, according to the first embodiment, since the opening 25 is formed in the common electrode 15 of the counter substrate 12 in the region facing the tip of the column spacer 20, the column spacer 20 supports the counter substrate 12. Thus, no stress concentration occurs in the common electrode 15 due to the end of the columnar spacer 20 in the opening 25. That is, the stress applied to the counter substrate 12 from the tip of the columnar spacer 20 is applied to the plastic substrate 22 through the alignment film 16 in the opening 25 as shown in FIG. No stress is applied. Therefore, as a result of suppressing the occurrence of cracks in the common electrode 15, it is possible to suppress light leakage to the observer side in the vicinity of the columnar spacer 20.
　さらに、図３に示すように、柱状スペーサ２０におけるＴＦＴ基板１１側の先端面の面積を、対向基板１２側の基端面の面積よりも大きくしたので、柱状スペーサ２０の基端において画素電極１７に発生する応力を分散させることができるため、上記開口部２５を設けた共通電極１５だけでなく画素電極１７においてもクラックの発生を抑制することができる。 Further, as shown in FIG. 3, since the area of the front end surface on the TFT substrate 11 side in the columnar spacer 20 is made larger than the area of the base end surface on the counter substrate 12 side, the pixel electrode 17 is formed at the base end of the columnar spacer 20. Since the generated stress can be dispersed, the occurrence of cracks can be suppressed not only in the common electrode 15 provided with the opening 25 but also in the pixel electrode 17.
　《発明の実施形態２》
　図４～図６は、本発明の実施形態２を示している。 << Embodiment 2 of the Invention >>
4 to 6 show Embodiment 2 of the present invention.
　図４は、本実施形態２の液晶表示装置１の要部構造を拡大して示す断面図である。図５は、本実施形態２における互いに貼り合わされる前のＴＦＴ基板１１及び対向基板１２を示す断面図である。図６は、本実施形態２における柱状スペーサ２０の近傍を拡大して示す断面図である。尚、以降の各実施形態では、図１～図３と同じ部分については同じ符号を付して、その詳細な説明を省略する。 FIG. 4 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 of the second embodiment. FIG. 5 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the second embodiment. FIG. 6 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the second embodiment. In the following embodiments, the same parts as those in FIGS. 1 to 3 are denoted by the same reference numerals, and detailed description thereof will be omitted.
　本実施形態２は、上記実施形態１において、共通電極１５だけでなく、さらに画素電極１７にも開口部２６を形成したものである。 In the second embodiment, the opening 26 is formed not only in the common electrode 15 but also in the pixel electrode 17 in the first embodiment.
　すなわち、図５に示すように、本実施形態における画素電極１７には、柱状スペーサ２０が配置される領域に開口部２６が形成されている。そして、図４に示すように、柱状スペーサ２０の基端は、画素電極１７の開口部２６内においてプラスチック基板２１に形成されている。一方、柱状スペーサ２０の先端は、共通電極１５の開口部２５内に配置され、配向膜１６を介してプラスチック基板２２を支持している。 That is, as shown in FIG. 5, the pixel electrode 17 in the present embodiment has an opening 26 in a region where the columnar spacer 20 is disposed. As shown in FIG. 4, the base end of the columnar spacer 20 is formed on the plastic substrate 21 in the opening 26 of the pixel electrode 17. On the other hand, the end of the columnar spacer 20 is disposed in the opening 25 of the common electrode 15 and supports the plastic substrate 22 via the alignment film 16.
　本実施形態におけるＴＦＴ基板１１を製造する場合には、上記実施形態１と同様に、層間絶縁膜の表面にＩＴＯ膜を形成した後に、当該ＩＴＯ膜に対してフォトリソグラフィ及びエッチングを行うことにより、画素電極１７に開口部２６を形成する。その後、画素電極１７上に感光性樹脂膜を形成し、この感光性樹脂膜をフォトリソグラフィ及びエッチングを行うことにより、複数の柱状スペーサ２０を開口部２６内に形成する。その後、配向膜１８を画素電極１７の表面に形成し、ＴＦＴ基板１１を製造する。 When manufacturing the TFT substrate 11 in the present embodiment, as in the first embodiment, after forming an ITO film on the surface of the interlayer insulating film, by performing photolithography and etching on the ITO film, An opening 26 is formed in the pixel electrode 17. Thereafter, a photosensitive resin film is formed on the pixel electrode 17, and a plurality of columnar spacers 20 are formed in the opening 26 by performing photolithography and etching on the photosensitive resin film. Thereafter, the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
　したがって、本実施形態２によれば、上記実施形態１と同様に、対向基板１２の共通電極１５には、柱状スペーサ２０の先端に対向する領域において開口部２５が形成されているため、柱状スペーサ２０が対向基板１２を支持した状態で、その共通電極１５には、開口部２５内の柱状スペーサ２０の端部によって応力集中が生じない。すなわち、柱状スペーサ２０の先端から対向基板１２に加えられる応力は、図６に示すように、開口部２５内の配向膜１６を介してプラスチック基板２２へ加えられるため、共通電極１５には直接に応力が加わらない。 Therefore, according to the second embodiment, as in the first embodiment, the common electrode 15 of the counter substrate 12 is formed with the opening 25 in the region facing the tip of the columnar spacer 20. In the state where 20 supports the counter substrate 12, no stress concentration occurs on the common electrode 15 due to the end of the columnar spacer 20 in the opening 25. That is, the stress applied to the counter substrate 12 from the tip of the columnar spacer 20 is applied to the plastic substrate 22 through the alignment film 16 in the opening 25 as shown in FIG. No stress is applied.
　さらに、図６に示すように、画素電極１７に形成した開口部２６内に柱状スペーサ２０の基端が配置されるように、当該柱状スペーサ２０をプラスチック基板２１に形成したので、柱状スペーサ２０が対向基板１２を支持した状態で、柱状スペーサ２０の基端による画素電極１７への応力集中を防止できる。そのことにより、共通電極１５及び画素電極１７におけるクラックの発生を抑制できる結果、柱状スペーサ２０の近傍における観察者側への光漏れを抑制することができる。 Furthermore, as shown in FIG. 6, since the columnar spacer 20 is formed on the plastic substrate 21 so that the base end of the columnar spacer 20 is disposed in the opening 26 formed in the pixel electrode 17, the columnar spacer 20 In a state where the counter substrate 12 is supported, stress concentration on the pixel electrode 17 due to the base end of the columnar spacer 20 can be prevented. As a result, the occurrence of cracks in the common electrode 15 and the pixel electrode 17 can be suppressed, so that light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed.
　《発明の実施形態３》
　図７は、本発明の実施形態３を示している。 << Embodiment 3 of the Invention >>
FIG. 7 shows Embodiment 3 of the present invention.
　図７は、本実施形態３の液晶表示装置１の要部構造を拡大して示す断面図である。 FIG. 7 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the third embodiment.
　上記実施形態１では、共通電極１５に開口部２５を形成したのに対し、本実施形態３は、共通電極１５の代わりに画素電極１７に開口部２６を形成したものである。 In the first embodiment, the opening 25 is formed in the common electrode 15, whereas in the third embodiment, the opening 26 is formed in the pixel electrode 17 instead of the common electrode 15.
　すなわち、図７に示すように、共通電極１５には開口部が形成されておらず、柱状スペーサ２０の先端が当接している。一方、画素電極１７には、柱状スペーサ２０が配置される領域に開口部２６が形成されている。そして、図７に示すように、柱状スペーサ２０の基端は、画素電極１７の開口部２６内においてプラスチック基板２１に形成されている。 That is, as shown in FIG. 7, no opening is formed in the common electrode 15, and the tip of the columnar spacer 20 is in contact. On the other hand, the pixel electrode 17 has an opening 26 in a region where the columnar spacer 20 is disposed. As shown in FIG. 7, the base end of the columnar spacer 20 is formed on the plastic substrate 21 in the opening 26 of the pixel electrode 17.
　したがって、本実施形態３によれば、画素電極１７に形成した開口部２６内に柱状スペーサ２０の基端が配置されるように、当該柱状スペーサ２０をプラスチック基板２１に形成したので、柱状スペーサ２０が対向基板１２を支持した状態で、柱状スペーサ２０の基端による画素電極１７への応力集中を防止できる。そのことにより、画素電極１７におけるクラックの発生を抑制できる結果、柱状スペーサ２０の近傍における観察者側への光漏れを抑制することができる。 Therefore, according to the third embodiment, the columnar spacer 20 is formed on the plastic substrate 21 so that the base end of the columnar spacer 20 is disposed in the opening 26 formed in the pixel electrode 17. In the state where the counter substrate 12 is supported, stress concentration on the pixel electrode 17 by the base end of the columnar spacer 20 can be prevented. As a result, the occurrence of cracks in the pixel electrode 17 can be suppressed, so that light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed.
　《発明の実施形態４》
　図８～図１０は、本発明の実施形態４を示している。 << Embodiment 4 of the Invention >>
8 to 10 show Embodiment 4 of the present invention.
　図８は、本実施形態４の液晶表示装置１の要部構造を拡大して示す断面図である。図９は、本実施形態４における互いに貼り合わされる前のＴＦＴ基板１１及び対向基板１２を示す断面図である。図１０は、本実施形態４における柱状スペーサ２０の近傍を拡大して示す断面図である。 FIG. 8 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the fourth embodiment. FIG. 9 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the fourth embodiment. FIG. 10 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the fourth embodiment.
　本実施形態４は、上記実施形態３において、対向基板１２における柱状スペーサ２０に対応する領域に遮光膜２８を設けるようにしたものである。 In the fourth embodiment, a light shielding film 28 is provided in a region corresponding to the columnar spacer 20 in the counter substrate 12 in the third embodiment.
　すなわち、図９に示すように、本実施形態における画素電極１７には、柱状スペーサ２０が配置される領域に開口部２６が形成されている。そして、図８に示すように、柱状スペーサ２０の基端は、画素電極１７の開口部２６内においてプラスチック基板２１に形成されている。一方、柱状スペーサ２０の先端は、対向基板１２における配向膜１６の表面に当接している。 That is, as shown in FIG. 9, the pixel electrode 17 in the present embodiment has an opening 26 in a region where the columnar spacer 20 is disposed. As shown in FIG. 8, the base end of the columnar spacer 20 is formed on the plastic substrate 21 in the opening 26 of the pixel electrode 17. On the other hand, the tip of the columnar spacer 20 is in contact with the surface of the alignment film 16 in the counter substrate 12.
　対向基板１２のプラスチック基板２２には、複数の柱状スペーサ２０の先端にそれぞれ対向するように複数の遮光膜２８が形成されている。遮光膜２８は、例えば遮光性を有する金属材料や樹脂材料によって構成することが可能である。プラスチック基板２２には、遮光膜２８を覆うように共通電極１５が形成されている。そして、その共通電極１５を覆うように配向膜１６が形成されている。 A plurality of light-shielding films 28 are formed on the plastic substrate 22 of the counter substrate 12 so as to face the tips of the plurality of columnar spacers 20, respectively. The light shielding film 28 can be made of, for example, a light-shielding metal material or resin material. A common electrode 15 is formed on the plastic substrate 22 so as to cover the light shielding film 28. An alignment film 16 is formed so as to cover the common electrode 15.
　本実施形態の液晶表示装置を製造する場合、ＴＦＴ基板１１については、上記実施形態２と同様に製造することができる。一方、対向基板１２については、プラスチック基板２２の表面に遮光材料層を形成した後に、この遮光材料層にフォトリソグラフィ及びエッチングを行うことにより、柱状スペーサ２０の先端を覆うような形状を有する複数の遮光膜２８を形成する。その後、各遮光膜２８を覆うように、プラスチック基板２２に例えばＩＴＯ膜等の透明導電膜を形成することにより、共通電極１５を形成する。次に、共通電極１５の表面に配向膜１６を形成し、対向基板１２を製造する。 When manufacturing the liquid crystal display device of the present embodiment, the TFT substrate 11 can be manufactured in the same manner as in the second embodiment. On the other hand, the counter substrate 12 is formed with a plurality of shapes that cover the tip of the columnar spacer 20 by forming a light shielding material layer on the surface of the plastic substrate 22 and then performing photolithography and etching on the light shielding material layer. A light shielding film 28 is formed. Thereafter, the common electrode 15 is formed by forming a transparent conductive film such as an ITO film on the plastic substrate 22 so as to cover each light shielding film 28. Next, the alignment film 16 is formed on the surface of the common electrode 15 to manufacture the counter substrate 12.
　そうして、上記対向基板１２とＴＦＴ基板１１とを液晶層１３及びシール部材（不図示）を介して貼り合わせることにより、液晶表示装置１を製造する。 Thus, the liquid crystal display device 1 is manufactured by bonding the counter substrate 12 and the TFT substrate 11 together through the liquid crystal layer 13 and a seal member (not shown).
　したがって、本実施形態４によれば、柱状スペーサ２０の先端に対向する領域に遮光膜２８を形成したので、共通電極１５が柱状スペーサ２０の先端から応力集中を受けて、当該共通電極１５にクラックが生じたとしても、図１０に示すように、そのクラックから観察者側に透過しようとする光を遮光膜２８によって遮ることができるため、本実施形態によっても柱状スペーサ２０の近傍における観察者側への光漏れを抑制することができる。 Therefore, according to the fourth embodiment, since the light shielding film 28 is formed in the region facing the tip of the columnar spacer 20, the common electrode 15 receives stress concentration from the tip of the columnar spacer 20 and cracks in the common electrode 15. 10, since light that is about to pass through the cracks to the viewer side can be blocked by the light shielding film 28 as shown in FIG. 10, the viewer side in the vicinity of the columnar spacer 20 also in this embodiment. Light leakage to the can be suppressed.
　《発明の実施形態５》
　図１１～図１３は、本発明の実施形態５を示している。 << Embodiment 5 of the Invention >>
11 to 13 show Embodiment 5 of the present invention.
　図１１は、本実施形態５の液晶表示装置１の要部構造を拡大して示す断面図である。図１２は、本実施形態５における互いに貼り合わされる前のＴＦＴ基板１１及び対向基板１２を示す断面図である。図１３は、本実施形態５における柱状スペーサ２０の近傍を拡大して示す断面図である。 FIG. 11 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the fifth embodiment. FIG. 12 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the fifth embodiment. FIG. 13 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the fifth embodiment.
　本実施形態５は、上記実施形態４において、対向基板１２だけでなくＴＦＴ基板１１にも遮光膜２９を形成するようにしたものである。 In the fifth embodiment, the light shielding film 29 is formed not only on the counter substrate 12 but also on the TFT substrate 11 in the fourth embodiment.
　すなわち、図１２に示すように、本実施形態におけるＴＦＴ基板１１のプラスチック基板２１には、柱状スペーサ２０が形成される領域に遮光膜２９が形成されている。遮光膜２９は、上記実施形態４と同様に、例えば遮光性を有する金属材料や樹脂材料によって構成することが可能である。プラスチック基板２１には、遮光膜２９を覆うように画素電極１７が形成されている。そして、その画素電極１７を覆うように配向膜１８が形成されている。 That is, as shown in FIG. 12, a light shielding film 29 is formed on the plastic substrate 21 of the TFT substrate 11 in the present embodiment in a region where the columnar spacer 20 is formed. As in the fourth embodiment, the light shielding film 29 can be made of, for example, a metal material or a resin material having a light shielding property. The pixel electrode 17 is formed on the plastic substrate 21 so as to cover the light shielding film 29. An alignment film 18 is formed so as to cover the pixel electrode 17.
　本実施形態におけるＴＦＴ基板１１を製造する場合には、プラスチック基板２１の表面に遮光材料層を形成した後に、この遮光材料層にフォトリソグラフィ及びエッチングを行うことにより、柱状スペーサ２０が形成される領域に複数の遮光膜２９を形成する。さらに、プラスチック基板２１上にＴＦＴ（不図示）をフォトリソグラフィによって形成する。次に、ＴＦＴを覆う層間絶縁膜（不図示）を形成した後に、その層間絶縁膜の表面に透明導電膜材料としてのＩＴＯ膜を形成する。そして、このＩＴＯ膜をエッチングすることにより、複数の画素電極１７を形成する。 In the case of manufacturing the TFT substrate 11 in the present embodiment, a region where the columnar spacer 20 is formed by forming a light shielding material layer on the surface of the plastic substrate 21 and then performing photolithography and etching on the light shielding material layer. A plurality of light shielding films 29 are formed. Further, a TFT (not shown) is formed on the plastic substrate 21 by photolithography. Next, after forming an interlayer insulating film (not shown) covering the TFT, an ITO film as a transparent conductive film material is formed on the surface of the interlayer insulating film. Then, a plurality of pixel electrodes 17 are formed by etching this ITO film.
　次に、画素電極１７の表面に感光性樹脂膜（不図示）を形成し、この感光性樹脂膜をフォトリソグラフィ及びエッチングを行うことにより、複数の柱状スペーサ２０を形成する。こうして形成された複数の柱状スペーサ２０の基端は、上記遮光膜２９にそれぞれ対向している。その後、配向膜１８を画素電極１７の表面に形成し、ＴＦＴ基板１１を製造する。 Next, a photosensitive resin film (not shown) is formed on the surface of the pixel electrode 17, and a plurality of columnar spacers 20 are formed by performing photolithography and etching on the photosensitive resin film. The base ends of the plurality of columnar spacers 20 thus formed are opposed to the light shielding film 29, respectively. Thereafter, the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
　したがって、本実施形態５によれば、柱状スペーサ２０の先端に対向する領域に遮光膜２８を形成したので、共通電極１５が柱状スペーサ２０の先端から応力集中を受けて、当該共通電極１５にクラックが生じたとしても、図１３に示すように、そのクラックから観察者側に透過しようとする光を遮光膜２８によって遮ることができる。さらに、柱状スペーサ２０の基端に対向する領域に遮光膜２９を形成したので、画素電極１７が柱状スペーサ２０の基端から応力集中を受けて、当該画素電極１７にクラックが生じたとしても、図１３に示すように、そのクラックから観察者側に透過しようとする光を遮光膜２８によって遮ることができる。そのため、本実施形態によっても柱状スペーサ２０の近傍における観察者側への光漏れを抑制することができる。 Therefore, according to the fifth embodiment, since the light shielding film 28 is formed in the region facing the tip of the columnar spacer 20, the common electrode 15 receives stress concentration from the tip of the columnar spacer 20, and the common electrode 15 is cracked. Even if this occurs, the light to be transmitted from the crack to the viewer side can be blocked by the light shielding film 28 as shown in FIG. Further, since the light shielding film 29 is formed in the region facing the base end of the columnar spacer 20, even if the pixel electrode 17 receives stress concentration from the base end of the columnar spacer 20 and a crack occurs in the pixel electrode 17, As shown in FIG. 13, the light to be transmitted from the crack to the viewer side can be blocked by the light shielding film 28. Therefore, according to this embodiment, light leakage to the observer side in the vicinity of the columnar spacer 20 can be suppressed.
　《発明の実施形態６》
　図１４～図１６は、本発明の実施形態６を示している。 Embodiment 6 of the Invention
14 to 16 show Embodiment 6 of the present invention.
　図１４、本実施形態６の液晶表示装置１の要部構造を拡大して示す断面図である。図１５は、本実施形態６における互いに貼り合わされる前のＴＦＴ基板１１及び対向基板１２を示す断面図である。図１６は、本実施形態６における柱状スペーサ２０の近傍を拡大して示す断面図である。 FIG. 14 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the sixth embodiment. FIG. 15 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the sixth embodiment. FIG. 16 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the sixth embodiment.
　本実施形態における柱状スペーサ２０は、その略中央部分から両端側へ向かって、プラスチック基板２１，２２に平行な方向の断面が、徐々に大きくなるように形成されている。 The columnar spacer 20 in the present embodiment is formed so that the cross section in the direction parallel to the plastic substrates 21 and 22 gradually increases from the substantially central portion toward both ends.
　すなわち、柱状スペーサ２０は、図１４及び図１５に示すように、ＴＦＴ基板１１に形成された第１スペーサ２０ａと、対向基板１２に形成された第２スペーサ２０ｂとを有している。第１スペーサ２０ａは、対向基板１２側の先端面の面積が、ＴＦＴ基板１１側の基端面の面積よりも小さくなっている。一方、第２スペーサ２０ｂは、ＴＦＴ基板１１側の先端面の面積が、対向基板１２側の基端面の面積よりも小さくなっている。 That is, the columnar spacer 20 has a first spacer 20a formed on the TFT substrate 11 and a second spacer 20b formed on the counter substrate 12, as shown in FIGS. In the first spacer 20a, the area of the front end surface on the counter substrate 12 side is smaller than the area of the base end surface on the TFT substrate 11 side. On the other hand, in the second spacer 20b, the area of the front end surface on the TFT substrate 11 side is smaller than the area of the base end surface on the counter substrate 12 side.
　第１スペーサ２０ａと第２スペーサ２０ｂとは、それぞれ互いに対向して配置され、各先端面同士が同じ大きさに形成されると共に互いに当接することによって、全体として柱状スペーサ２０が形成されている。 The first spacer 20a and the second spacer 20b are arranged to face each other, and the tip end surfaces are formed in the same size and abut against each other, whereby the columnar spacer 20 is formed as a whole.
　本実施形態におけるＴＦＴ基板１１を製造する場合には、プラスチック基板２１上にＴＦＴ（不図示）をフォトリソグラフィによって形成する。次に、ＴＦＴを覆う層間絶縁膜（不図示）を形成した後に、その層間絶縁膜の表面に透明導電膜材料としてのＩＴＯ膜を形成する。そして、このＩＴＯ膜をエッチングすることにより、複数の画素電極１７を形成する。 When manufacturing the TFT substrate 11 in the present embodiment, a TFT (not shown) is formed on the plastic substrate 21 by photolithography. Next, after forming an interlayer insulating film (not shown) covering the TFT, an ITO film as a transparent conductive film material is formed on the surface of the interlayer insulating film. Then, a plurality of pixel electrodes 17 are formed by etching this ITO film.
　次に、画素電極１７の表面に感光性樹脂膜（不図示）を形成し、この感光性樹脂膜をフォトリソグラフィ及びエッチングを行うことにより、複数の第１スペーサ２０ａを形成する。その後、配向膜１８を画素電極１７の表面に形成し、ＴＦＴ基板１１を製造する。 Next, a photosensitive resin film (not shown) is formed on the surface of the pixel electrode 17, and a plurality of first spacers 20a are formed by performing photolithography and etching on the photosensitive resin film. Thereafter, the alignment film 18 is formed on the surface of the pixel electrode 17 to manufacture the TFT substrate 11.
　一方、対向基板１２を製造する場合には、プラスチック基板２２の表面における少なくとも表示領域の全体にＩＴＯ膜を形成することによって、共通電極１５を形成する。次に、例えば、共通電極１５の表面に配向膜１６を形成した後に、その配向膜１６の表面に感光性樹脂膜（不図示）を形成し、この感光性樹脂膜をフォトリソグラフィ及びエッチングを行うことにより、複数の第２スペーサ２０ｂを形成し、対向基板１２を製造する。 On the other hand, when the counter substrate 12 is manufactured, the common electrode 15 is formed by forming an ITO film on at least the entire display region on the surface of the plastic substrate 22. Next, for example, after the alignment film 16 is formed on the surface of the common electrode 15, a photosensitive resin film (not shown) is formed on the surface of the alignment film 16, and the photosensitive resin film is subjected to photolithography and etching. Thus, a plurality of second spacers 20b are formed, and the counter substrate 12 is manufactured.
　したがって、本実施形態６によれば、柱状スペーサ２０の両端面（すなわち、ＴＦＴ基板１１側の端面及び対向基板１２側の端面）の面積を、当該柱状スペーサ２０の中央部分の断面よりも大きくしたので、図１６に示すように、柱状スペーサ２０の両端から共通電極１５及び画素電極１７へそれぞれ加わる応力を分散させることができる。そのため、共通電極１５及び画素電極１７におけるクラックの発生を抑制して、柱状スペーサ２０の近傍における観察者側への光漏れを抑制することができる。 Therefore, according to the sixth embodiment, the area of both end surfaces of the columnar spacer 20 (that is, the end surface on the TFT substrate 11 side and the end surface on the counter substrate 12 side) is made larger than the cross section of the central portion of the columnar spacer 20. Therefore, as shown in FIG. 16, the stress applied to the common electrode 15 and the pixel electrode 17 from both ends of the columnar spacer 20 can be dispersed. Therefore, generation of cracks in the common electrode 15 and the pixel electrode 17 can be suppressed, and light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed.
　《発明の実施形態７》
　図１７～図１９は、本発明の実施形態７を示している。 << Embodiment 7 of the Invention >>
17 to 19 show Embodiment 7 of the present invention.
　図１７は、本実施形態７の液晶表示装置１の要部構造を拡大して示す断面図である。図１８は、本実施形態７における互いに貼り合わされる前のＴＦＴ基板１１及び対向基板１２を示す断面図である。図１９は、本実施形態７における柱状スペーサ２０の近傍を拡大して示す断面図である。 FIG. 17 is an enlarged cross-sectional view showing the main structure of the liquid crystal display device 1 according to the seventh embodiment. FIG. 18 is a cross-sectional view showing the TFT substrate 11 and the counter substrate 12 before being bonded to each other in the seventh embodiment. FIG. 19 is an enlarged sectional view showing the vicinity of the columnar spacer 20 in the seventh embodiment.
　本実施形態における柱状スペーサ２０は、プラスチック基板２１，２２の構成材料と同じ硬度である材料か、又はプラスチック基板２１，２２の構成材料よりも低い硬度である材料によって構成されている。 The columnar spacer 20 in the present embodiment is made of a material having the same hardness as the constituent material of the plastic substrates 21 and 22, or a material having a lower hardness than the constituent material of the plastic substrates 21 and 22.
　柱状スペーサ２０は、図１７に示すように、例えばＴＦＴ基板１１における画素電極１７の表面に形成され、その先端が対向基板１２の配向膜１６に当接している。柱状スペーサ２０の材料には、例えばヤング率が約１１ＧＰａ程度の感光性材料である「オプトマーＮＮシリーズ」（ＪＳＲ株式会社の製品）を適用すると共に、プラスチック基板２１，２２の材料には、例えばヤング率が約１３ＧＰａ程度である脂環式エポキシ樹脂にガラスクロスを５０％程度添加したプラスチック基板を適用することができる。 As shown in FIG. 17, the columnar spacer 20 is formed, for example, on the surface of the pixel electrode 17 in the TFT substrate 11, and the tip thereof is in contact with the alignment film 16 of the counter substrate 12. As the material of the columnar spacer 20, for example, “Optomer NN series” (a product of JSR Corporation), which is a photosensitive material having a Young's modulus of about 11 GPa, is applied. A plastic substrate obtained by adding about 50% glass cloth to an alicyclic epoxy resin having a rate of about 13 GPa can be applied.
　尚、プラスチック基板に例えばＳｉＯ２等のシリコーン系のハードコートを真空蒸着することによって、プラスチック基板２１，２２の硬度を、柱状スペーサ２０と同じに又は大きくすることも可能である。 It is also possible to increase the hardness of the plastic substrates 21 and 22 to be the same as or larger than that of the columnar spacer 20 by vacuum-depositing a silicone hard coat such as SiO 2 on the plastic substrate.
　したがって、本実施形態７によれば、図１９に示すように、柱状スペーサ２０の両端から共通電極１５及び画素電極１７に加わる応力を、柱状スペーサ２０がプラスチック基板２１，２２と平行な方向に広がるように変形することにより小さくすることができる。すなわち、本実施形態によっても、柱状スペーサ２０から受ける応力による共通電極１５及び画素電極１７のクラックの発生を抑制できるため、柱状スペーサ２０の近傍における観察者側への光漏れを抑制することができる。 Therefore, according to the seventh embodiment, as shown in FIG. 19, the stress applied to the common electrode 15 and the pixel electrode 17 from both ends of the columnar spacer 20 spreads in the direction in which the columnar spacer 20 is parallel to the plastic substrates 21 and 22. Thus, it can be made smaller by deforming. That is, according to the present embodiment as well, the occurrence of cracks in the common electrode 15 and the pixel electrode 17 due to the stress received from the columnar spacer 20 can be suppressed, so that light leakage to the viewer side in the vicinity of the columnar spacer 20 can be suppressed. .
　《その他の実施形態》
　上記各実施形態では、第１基板をＴＦＴ基板１１とする一方、第２基板を対向基板１２とした例について説明したが、これとは逆に、第１基板を対向基板１２とする一方、第２基板をＴＦＴ基板１１としてもよい。 << Other Embodiments >>
In each of the above-described embodiments, the example in which the first substrate is the TFT substrate 11 and the second substrate is the counter substrate 12 has been described. On the contrary, the first substrate is the counter substrate 12, Two substrates may be used as the TFT substrate 11.
　また、第１基板はアクティブマトリクス基板としたが、本発明はこれに限らず、透明基板及び柱状スペーサが形成されていれば、例えば帯形状の第１透明電極を複数有するパッシブマトリクス基板等の他の基板によって構成してもよい。 The first substrate is an active matrix substrate. However, the present invention is not limited to this, and other materials such as a passive matrix substrate having a plurality of strip-shaped first transparent electrodes may be used as long as a transparent substrate and columnar spacers are formed. You may comprise by the board | substrate of.
　また、ＴＦＴ基板１１及び対向基板１２の双方がフレキシブル基板からなる例について説明したが、本発明はこれに限らず、例えばＴＦＴ基板１１及び対向基板１２の少なくとも一方がフレキシブル基板であってもよく、また、ＴＦＴ基板１１及び対向基板１２の双方がガラス基板等の非フレキシブル基板によって構成されていてもよい。 Moreover, although the example which both the TFT substrate 11 and the opposing substrate 12 consist of a flexible substrate was demonstrated, this invention is not limited to this, For example, at least one of the TFT substrate 11 and the opposing substrate 12 may be a flexible substrate, Moreover, both the TFT substrate 11 and the counter substrate 12 may be configured by a non-flexible substrate such as a glass substrate.
　また、共通電極（第２透明電極）１５及び画素電極（第１透明電極）１７は、ＩＴＯに限らず、例えばＩＺＯ（Indium Zinc Oxide）等の他の透明導電膜によって構成してもよい。 Further, the common electrode (second transparent electrode) 15 and the pixel electrode (first transparent electrode) 17 are not limited to ITO, and may be formed of other transparent conductive films such as IZO (Indium Zinc Oxide), for example.
　また、上記各実施形態では、柱状スペーサ２０をＴＦＴ基板１１に形成した例について説明したが、本発明はこれに限らず、柱状スペーサ２０を対向基板１２に形成するようにしてもよい。 In each of the above embodiments, the example in which the columnar spacer 20 is formed on the TFT substrate 11 has been described. However, the present invention is not limited to this, and the columnar spacer 20 may be formed on the counter substrate 12.
　また、本発明は上記実施形態１～７に限定されるものでなく、本発明には、これらの実施形態１～７を適宜組み合わせた構成が含まれる。 Further, the present invention is not limited to Embodiments 1 to 7 described above, and the present invention includes a configuration in which these Embodiments 1 to 7 are appropriately combined.
　例えば、実施形態６及び７における柱状スペーサ２０の構成を、実施形態１～５の柱状スペーサ２０として適用するようにしてもよい。 For example, the configuration of the columnar spacer 20 in the sixth and seventh embodiments may be applied as the columnar spacer 20 in the first to fifth embodiments.
　また、上記実施形態１では液晶表示装置１がバックライトユニットを有する透過表示を行う液晶表示装置である場合について説明したが、本発明はこれに限らず、反射表示を行う液晶表示装置についても同様に適用できる。 In the first embodiment, the case where the liquid crystal display device 1 is a liquid crystal display device that performs a transmissive display having a backlight unit has been described. Applicable to.
　以上説明したように、本発明は、液晶層の厚みを一定に維持するための柱状スペーサを有する液晶表示装置について有用である。 As described above, the present invention is useful for a liquid crystal display device having columnar spacers for maintaining the thickness of the liquid crystal layer constant.
　　　　　　１　　　液晶表示装置 
　　　　　１１　　　ＴＦＴ基板（第１基板） 
　　　　　１２　　　対向基板（第２基板）
　　　　　１３　　　液晶層 
　　　　　１５　　　共通電極（第２透明電極） 
　　　　　１６　　　配向膜 
　　　　　１７　　　画素電極（第１透明電極）
　　　　　１８　　　配向膜 
　　　　　２０　　　柱状スペーサ 
　　　　　２１，２２　　　プラスチック基板 
　　　　　２５，２６　　　開口部 　　 1 Liquid crystal display device
11 TFT substrate (first substrate)
12 Counter substrate (second substrate)
13 Liquid crystal layer
15 Common electrode (second transparent electrode)
16 Alignment film
17 Pixel electrode (first transparent electrode)
18 Alignment film
20 Columnar spacer
21, 22 Plastic substrate
25, 26 opening

Claims (7)

  1. 　第１基板と、
    　上記第１基板に対向して配置された第２基板と、
    　上記第１基板及び第２基板の間に設けられた液晶層と、
    　上記第１基板又は第２基板に形成され、上記液晶層の厚みを一定に規定する複数の柱状スペーサとを備えた液晶表示装置であって、
    　上記第１基板の上記液晶層側には、第１透明電極が形成され、
    　上記第２基板の上記液晶層側には、第２透明電極が形成され、
    　上記第１透明電極及び上記第２透明電極の少なくとも一方には、上記柱状スペーサが配置される領域において開口部が形成され、
    　上記開口部の内側には、上記柱状スペーサの端部が配置されている
    ことを特徴とする液晶表示装置。     A first substrate;
    A second substrate disposed opposite the first substrate;
    A liquid crystal layer provided between the first substrate and the second substrate;
    A liquid crystal display device comprising a plurality of columnar spacers formed on the first substrate or the second substrate and defining a thickness of the liquid crystal layer constant,
    A first transparent electrode is formed on the liquid crystal layer side of the first substrate,
    A second transparent electrode is formed on the liquid crystal layer side of the second substrate,
    In at least one of the first transparent electrode and the second transparent electrode, an opening is formed in a region where the columnar spacer is disposed,
    The liquid crystal display device, wherein an end of the columnar spacer is disposed inside the opening.
  2. 　請求項１に記載された液晶表示装置において、
    　上記開口部は、上記第１透明電極に形成され、
    　上記第２基板には、上記複数の柱状スペーサにそれぞれ対向するように複数の遮光膜が形成されている
    ことを特徴とする液晶表示装置。     The liquid crystal display device according to claim 1,
    The opening is formed in the first transparent electrode,
    A liquid crystal display device, wherein a plurality of light shielding films are formed on the second substrate so as to face the plurality of columnar spacers, respectively.
  3. 　請求項１に記載された液晶表示装置において、
    　上記柱状スペーサは、上記第１基板に形成され、
    　上記開口部は、上記第２透明電極に形成されている
    ことを特徴とする液晶表示装置。     The liquid crystal display device according to claim 1,
    The columnar spacer is formed on the first substrate,
    The liquid crystal display device, wherein the opening is formed in the second transparent electrode.
  4. 　請求項３に記載された液晶表示装置において、
    　上記柱状スペーサは、上記第１基板側の端面の面積が、上記第２基板側の端面の面積よりも大きい
    ことを特徴とする液晶表示装置。     The liquid crystal display device according to claim 3,
    The columnar spacer is characterized in that an area of an end face on the first substrate side is larger than an area of an end face on the second substrate side.
  5. 　請求項３に記載された液晶表示装置において、
    　上記開口部は、さらに上記第１透明電極にも形成されている
    ことを特徴とする液晶表示装置。     The liquid crystal display device according to claim 3,
    The liquid crystal display device, wherein the opening is further formed in the first transparent electrode.
  6. 　請求項１乃至５の何れか１つに記載された液晶表示装置において、
    　上記第１基板は、アクティブマトリクス基板である
    ことを特徴とする液晶表示装置。     The liquid crystal display device according to any one of claims 1 to 5,
    The liquid crystal display device, wherein the first substrate is an active matrix substrate.
  7. 　請求項１乃至６の何れか１つに記載された液晶表示装置において、
    　上記第１基板及び第２基板の少なくとも一方は、フレキシブル基板によって構成されている
    ことを特徴とする液晶表示装置。     The liquid crystal display device according to claim 1,
    A liquid crystal display device, wherein at least one of the first substrate and the second substrate is formed of a flexible substrate.
PCT/JP2011/005606 2010-10-08 2011-10-04 Liquid crystal display device WO2012046442A1 (en)

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Cited By (1)

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Publication number Priority date Publication date Assignee Title
CN114280852A (en) * 2021-12-31 2022-04-05 惠科股份有限公司 Display panel and display device

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JP2003302640A (en) * 2002-04-09 2003-10-24 Rohm Co Ltd Liquid crystal panel
JP2006338011A (en) * 2005-06-01 2006-12-14 Samsung Electronics Co Ltd Liquid crystal display panel and method for manufacturing the same
JP2007233059A (en) * 2006-03-01 2007-09-13 Epson Imaging Devices Corp Liquid crystal display device and method for manufacturing the same
JP2009122644A (en) * 2007-10-23 2009-06-04 Toshiba Matsushita Display Technology Co Ltd Liquid crystal display panel

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JP2003302640A (en) * 2002-04-09 2003-10-24 Rohm Co Ltd Liquid crystal panel
JP2006338011A (en) * 2005-06-01 2006-12-14 Samsung Electronics Co Ltd Liquid crystal display panel and method for manufacturing the same
JP2007233059A (en) * 2006-03-01 2007-09-13 Epson Imaging Devices Corp Liquid crystal display device and method for manufacturing the same
JP2009122644A (en) * 2007-10-23 2009-06-04 Toshiba Matsushita Display Technology Co Ltd Liquid crystal display panel

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114280852A (en) * 2021-12-31 2022-04-05 惠科股份有限公司 Display panel and display device

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