WO2011142333A1

WO2011142333A1 - Capacitive input device

Info

Publication number: WO2011142333A1
Application number: PCT/JP2011/060703
Authority: WO
Inventors: 幸治塚本; 厚志松田; 潔小林
Original assignee: アルプス電気株式会社
Priority date: 2010-05-13
Filing date: 2011-05-10
Publication date: 2011-11-17
Also published as: JP5390019B2; CN102893244B; CN102893244A; JPWO2011142333A1; KR20130018781A; KR101451493B1

Abstract

Disclosed is a capacitive input device which can easily and appropriately improve the uniformity of sensor sensitivity in a whole operation panel by regulating the electrode surface of first electrode units and second electrode units on the basis of the distance between an operation surface and a sensor unit. The capacitive input device comprises: a sensor unit in which a plurality of lower electrode patterns and a plurality of upper electrode patterns are arranged so as to leave gaps therebetween in the height direction; and a surface member which is arranged so as to face the sensor unit in the height direction, and which has an operation surface on the surface thereof. In each lower electrode pattern, a plurality of first electrode sections are contiguously provided via thin connection sections. In each upper electrode pattern, a plurality of second electrode sections are contiguously provided via thin connection sections. The first electrode sections and second electrode sections are arranged so as no to overlap in planar view. The operation surface is formed having a curved surface. The electrode surfaces of the first electrode sections and the second electrode sections are formed so as to be larger as the distance between the operation surface and the sensor unit is larger.

Description

Capacitive input device

The present invention relates to an electrostatic capacitance type input device capable of detecting an input coordinate position, and more particularly to an input device in which an operation surface is formed in a curved surface shape.

FIG. 8 is a partial longitudinal sectional view schematically showing a conventional capacitance type input device, and FIG. 9 is a partial plan view of a lower electrode pattern and an upper electrode pattern provided in a sensor portion of the conventional input device. .

As shown in FIG. 8, the capacitive input device 1 includes a sensor unit 5 in which a plurality of lower electrode patterns 6 and a plurality of upper electrode patterns 7 shown in FIG. And a surface member 4 having an operation surface 4a on the surface.

As shown in FIG. 8, the surface member 4 is provided on the upper surface side of the sensor unit 5, and the surface member 4 and the sensor unit 5 are joined via an adhesive layer 8.

In the form shown in FIG. 8, for example, the operation surface 4a of the surface member 4 is formed as a convex curved surface. On the other hand, the sensor unit 5 is formed in a planar shape (flat plate shape). Therefore, the distance L1 in the height direction (Z) between the finger F and the sensor unit 5 when the finger F is brought into contact with the operation surface 4a varies depending on the contact position of the finger F on the operation surface 4a. Yes. The finger F shown in FIG. 8 is in contact with the operation surface 4a at the position where the distance L1 is the largest.

As shown in FIG. 9, a plurality of lower electrode patterns 6 and upper electrode patterns 7 are provided. As shown in FIG. 9, the plurality of lower electrode patterns 6 are arranged at intervals in the Y direction. Each lower electrode pattern 6 has a plurality of first electrode portions 6a connected in series in the X direction via connecting portions 6b thinner than the first electrode portions 6a. The electrode areas of the first electrode portions 6a are all the same size.

Further, as shown in FIG. 9, the plurality of upper electrode patterns 7 are arranged at intervals in the X direction. Each upper electrode pattern 7 has a plurality of second electrode portions 7a connected in the Y direction via connecting portions 7b thinner than the second electrode portions 7a. The electrode areas of the second electrode portions 7a are all the same size.

As shown in FIG. 9, the first electrode portions 6a and the second electrode portions 7a are arranged so as not to overlap each other.

In the input device 1 shown in FIG. 8, each lower electrode pattern 6 and each upper electrode pattern 7 are detection electrodes. When the finger F is brought into contact with the operation surface 4a, the second of the finger F and the first electrode portion 6a of the lower electrode pattern 6 close to the finger F and the second of the upper electrode pattern 7 close to the finger F and the finger F is obtained. An electrostatic capacitance is generated between the electrode portion 7a. Then, the contact position of the finger F is detected from the lower electrode pattern 6 and the upper electrode pattern 7 in which the electrical characteristics change based on the capacitance change between when the finger F is brought into contact with the operation surface 4a and when it is not brought into contact. Can do.

However, as shown in FIG. 8, when the finger F is brought into contact with the curved operation surface 4a, the distance L1 between the finger F and the sensor unit 5 varies depending on the contact position of the finger F on the operation surface 4a. Since the electrode areas of the

electrode portions

6a and 7a are the same size, the capacitance change that occurs when the finger F is brought into contact with the operation surface 4a varies depending on the contact position of the finger F, and uniform sensor sensitivity is obtained. There was a problem that could not be.

In order to suppress the above-described variation in sensor sensitivity, a configuration in which the sensor unit 5 is also formed in a curved shape following the curved shape of the operation surface 4a of the surface member 4 as shown in FIG. Accordingly, it was considered that the sensor sensitivity on the entire operation surface 4a can be easily equalized as compared with the conventional structure shown in FIG.

However, as shown in FIG. 10, it is very difficult to form the curved sensor portion 5 appropriately and stably. A sensor formed in a planar form as shown in FIG. 8 depending on the case or the curvature of the 3D shape in which the operation surface 4a of the surface member 4 is formed in a curved surface shape in both directions orthogonal to each other in the plane. The portion 5 cannot be bent neatly (without wrinkles) into a curved shape. Or even if it uses the base material shape | molded by the curved surface from the beginning, it is difficult to pattern-form an electrode pattern by the predetermined width on the surface of the base material.

Therefore, as shown in FIG. 10, in the form in which the sensor unit 5 is curved as well as the surface member 4, an input device having a uniform sensor sensitivity could not be manufactured easily and stably.

JP 2003-91360 A JP 2008-47026 A JP 2004-252676 A JP 2010-20443 A JP 2008-97283 A

The structure of the input device described in Patent Documents 1 to 3 is the conventional structure shown in FIG. Note that the input devices described in Patent Documents 2 and 3 constitute a resistance-type input device instead of an electrostatic capacitance type ([0002] column of Patent Document 2 and [0003] column of Patent Document 3).

In the input devices described in

Patent Documents

4 and 5, there is no description of any structure for improving the uniformity of sensor sensitivity when the operation surface of the surface member is a curved surface.

Therefore, the present invention is for solving the above conventional problems, and in particular, by adjusting the electrode area of each first electrode part and each second electrode part based on the distance from the operation surface to the sensor part, It is an object of the present invention to provide a capacitance type input device in which uniformity of sensor sensitivity over the entire operation surface is improved easily and appropriately.

The input device in the present invention is
A plurality of lower electrode patterns formed with a space in the first direction out of a first direction and a second direction intersecting in a plane, and formed with a space in the second direction. A plurality of upper electrode patterns spaced apart in the height direction, and a surface member disposed opposite to the sensor portion in the height direction and having an operation surface on the surface. Configured,
Each of the lower electrode patterns has a plurality of first electrode portions connected in series in the second direction via a connecting portion that is thinner than the first electrode portion,
Each upper electrode pattern has a plurality of second electrode portions connected in series in the first direction via a connecting portion that is thinner than the second electrode portion,
The first electrode part and the second electrode part are arranged so as not to overlap in plan view,
The operation surface is curved so that a distance in a height direction between the operation body and the sensor unit when the operation body is brought into contact with the operation surface varies depending on a contact position of the operation body on the operation surface. Formed with
Each electrode area of the first electrode portion and the second electrode portion is formed so as to increase as the distance between the operation surface and the sensor portion increases.

When an operation body such as a finger is brought into contact with the operation surface, capacitance is generated between the operation body and the electrode portion of each electrode pattern close to the operation body. In the present invention, the distance between the operating body and each electrode pattern varies depending on the contact position on the operating surface of the operating body, but as the distance between the operating surface and the sensor unit increases as in the present invention, the electrode area increases. By making it larger, it is possible to suppress variation in capacitance change when the operating body is brought into contact with a different location on the operation surface, and to improve the uniformity of sensor sensitivity across the entire operation surface easily and appropriately. Is possible. In the present invention, the sensor portion can be formed in a planar shape (flat plate shape) by adjusting the electrode area of each electrode pattern as described above, so the sensor portion is formed in a curved surface shape as shown in FIG. As compared with the case, the sensor unit can be formed easily and appropriately. Therefore, it is possible to easily and stably manufacture an input device having excellent uniformity of sensor sensitivity over the entire operation surface.

In the present invention, the ratio of the electrode area in each first electrode part and the ratio of the electrode area in each second electrode part are preferably proportional to the ratio of the distance between each electrode part and the operation surface. . Thereby, uniform sensor sensitivity can be obtained more effectively.

In the present invention, the operation surface of the surface member can be preferably applied to a form in which a convex curved surface or a concave curved surface is formed toward at least one of the first direction and the second direction.

According to the input device of the present invention, it is possible to improve the uniformity of sensor sensitivity over the entire operation surface as compared with the conventional case.

FIG. 2 is an exploded perspective view of a capacitance type input device (touch panel) 10 according to the present embodiment; It is a figure for demonstrating the surface member in this embodiment, a lower electrode pattern, and an upper electrode pattern, (a) is a partial top view of a surface member, and a surface member is taken along an AA line and a BB line. (B) is a partial plan view of the lower electrode pattern, (c) is a partial plan view of the upper electrode pattern, (d) is a lower electrode pattern of (b) and (c). A partial plan view in a state where the upper electrode pattern is overlaid, 2A and 2B are diagrams for explaining a surface member, a lower electrode pattern, and an upper electrode pattern in another embodiment different from FIG. 2 (a) is a partial plan view and partial sectional view, and (b) to (d) are partial plan views. ), FIGS. 2A and 2B are diagrams for explaining the surface member, the lower electrode pattern, and the upper electrode pattern in an embodiment different from FIGS. 2 and 3 (a) is a partial plan view and partial sectional view, and FIGS. Partial plan view), FIGS. 2A to 2D are views for explaining a surface member, a lower electrode pattern, and an upper electrode pattern in an embodiment different from FIGS. 2 to 4 (a) is a partial plan view and partial sectional view, and FIGS. Partial plan view), FIG. 1 is a partial longitudinal sectional view when the input device of the present embodiment shown in FIG. 1 is cut along the X1-X2 direction; The fragmentary longitudinal cross-section of the input device of this embodiment using the surface member different from FIG. 6, A partial longitudinal sectional view schematically showing a conventional capacitance type input device, A partial plan view of a lower electrode pattern and an upper electrode pattern provided in a sensor unit of a conventional input device, FIG. 9 is a partial longitudinal sectional view schematically showing a conventional capacitance type input device having a different form from FIG. 8.

FIG. 1 is an exploded perspective view of a capacitance-type input device (touch panel) 10 according to the present embodiment, and FIG. 2 is a diagram for explaining a surface member, a lower electrode pattern, and an upper electrode pattern in the present embodiment. (A) is a partial plan view of the surface member, and a partial cross-sectional view when the surface member is cut along the lines AA and BB. (B) is a partial plan view of the lower electrode pattern. (c) is a partial plan view of the upper electrode pattern, and (d) is a partial plan view of the state in which the lower electrode pattern of (b) and the upper electrode pattern of (c) are overlapped. 3 to 5 show an embodiment different from that shown in FIG. 6 is a partial longitudinal sectional view of the input device of this embodiment shown in FIG. 1 cut along the X1-X2 direction, and FIG. 7 is a portion of the input device of this embodiment using a surface member different from FIG. It is a longitudinal cross-sectional view.

As shown in FIG. 1, the input device 10 includes a lower substrate 22 having a plurality of lower electrode patterns formed on the surface of the base material, an adhesive layer 30, and an upper portion having a plurality of upper electrode patterns formed on the surface of the base material. The substrate 21, the adhesive layer 31, and the surface member 20 having the operation surface 20a on the surface are laminated in this order.

Each lower electrode pattern and each upper electrode pattern are formed in a region facing the operation surface 20a in the height direction, and each electrode pattern is a wiring portion at the outer peripheral portion 12 of each

substrate

21, 22 from the region facing the operation surface 20a. It is connected to the.

And the lower connection part 17 and the upper connection part 15 are formed in the front-end | tip of each wiring part. As shown in FIG. 1, a flexible printed circuit board 23 is provided in the input device 10 of the present embodiment. As shown in FIG. 1, for example, the tip of the flexible printed circuit board 23 (the connection side with the connection parts 15 and 17) is separated into a central part 23 a and both

side end parts

23 b and 23 b. A plurality of first connection portions (not shown) are formed in the central portion 23a of the flexible printed circuit board 23, and the central portion 23a is overlaid on the upper connection portion 15 so that each first connection portion and each upper connection portion is overlapped. 15 is electrically connected. Further, a plurality of second connection portions (not shown) are formed on both side end portions 23b of the flexible printed circuit board 23, and both

side end portions

23b, 23b are overlapped on the lower connection portion 17 of the input device 10, Each 2nd connection part and each lower connection part 17 are electrically connected.

In the flexible printed circuit board 23, each first connection part and each second connection part are electrically connected to a connector 35 installed on the surface of the flexible printed circuit board 23 via a wiring pattern (not shown).

1 and 2A, the surface of the surface member 20 is an operation surface 20a by an operation body such as a finger F or a pen. In this embodiment, the decorative layer 24 is provided on the outer peripheral portion of the operation surface 20 a and on the lower surface of the surface member 20. The operation surface 20a is a light-transmitting region, and the outer peripheral portion of the operation surface 20a on which the decoration layer 24 is formed is a non-light-transmitting region.

FIG. 6 is a partial longitudinal sectional view when the input device 1 shown in FIG. 1 is cut in the height direction along the X1-X2 direction.

As shown in FIG. 6, the lower substrate 22 includes a planar lower base material 32 and a plurality of lower electrode patterns 14 formed on the surface of the lower base material 32. The upper substrate 21 includes a planar upper base material 33 and a plurality of upper electrode patterns 13 formed on the surface of the upper base material 33. The plurality of lower electrode patterns 14 and the plurality of upper electrode patterns 13 intersect in plan view.

Both the lower electrode pattern 14 and the upper electrode pattern 13 constitute a detection electrode.
As shown in FIG. 6, the lower substrate 22 and the upper substrate 21 are bonded via an adhesive layer 30. The lower substrate 22, the adhesive layer 30 and the upper substrate 21 constitute a sensor unit 25. The configuration of the sensor unit 25 is not limited to the structure shown in FIG. The structure etc. which formed the lower electrode pattern 14 and the upper electrode pattern 13 in the upper and lower surfaces of a planar base material may be sufficient. Unlike FIG. 6, the lower substrate 22 and the upper substrate 21 may be bonded with the upper electrode pattern 13 facing the adhesive layer 30 side.

The

electrode patterns

13 and 14 are both formed on the surface of the substrate by sputtering or vapor deposition with a transparent conductive material such as ITO (IndiumInTin に Oxide). The

base materials

32 and 33 are formed of a film-like transparent base material such as polyethylene terephthalate (PET) or a glass base material. In the present embodiment, the lower substrate 22 and the upper substrate 21 are formed in a planar shape and are not formed into a three-dimensional shape as shown in FIG. 10, so that the

base materials

32 and 33 include not only a soft film but also a planar glass or the like. Can be used.

As shown in FIG. 6, the surface member 20 is bonded to the upper surface side of the sensor unit 25 via the adhesive layer 31. The adhesive layers 30 and 31 are an acrylic adhesive, a double-sided adhesive tape, or the like. The surface member 20 is not particularly limited in material, but is formed of glass, plastic or the like. The surface member 20 shown in FIG. 6 is formed such that the operation surface 20a has a convex curved surface shape. The surface shape of the surface member 20 shown in FIG. 1 is shown in FIG. 3A in order to make it easy to see that it is a curved surface in a perspective view.

FIG. 2 shows the shapes of the surface member 20, the lower electrode pattern, and the upper electrode pattern in the first embodiment.

FIG. 2A shows a partial plan view of the surface member 20 and a cross section taken along line AA and BB passing through the center O of the surface member 20. A part of the adhesive layer 31 under the surface member 20 as well as the surface member 20 is shown in the AA line cross section and the BB line cross section.

As shown in FIG. 2A, the operation surface (surface) 20a of the surface member 20 is formed with a convex curved surface in the Y1-Y2 direction (first direction) and the X1-X2 direction (second direction). The The operation surface 20a in this embodiment has a 3D shape in which the center O protrudes most upward and is gradually curved downward as the distance from the center O increases.

FIG. 2B is a partial plan view of the lower electrode pattern 14. As shown in FIG. 2B, a plurality of lower electrode patterns 14a to 14d are formed. Here, in FIGS. 2 to 5, since it is necessary to individually explain each lower electrode pattern and upper electrode pattern, each lower electrode pattern and each upper electrode pattern is denoted by “

reference numerals

14 a, 14 b... 13b, ... ".

As shown in FIG. 2B, the lower electrode patterns 14a to 14d are arranged with a space in the Y1-Y2 direction and are formed to extend in the X1-X2 direction, respectively.

Each of the lower electrode patterns 14a to 14d has a configuration in which a plurality of first electrode portions 40a to 40p are connected in the X1-X2 direction via a connecting portion 41 that is narrower than the first electrode portions 40a to 40p. The shape of the first electrode portions 40a to 40p is not limited to the approximately rhombus shape shown in FIG. 2B, but an approximately rhombus shape may be used to make it difficult to see the electrode shape from the operation surface 20a. The same applies to the second electrode section described later.

In FIG. 2B, the connecting portion 41 is shown only at one location of each of the lower electrode patterns 14a to 14d. FIG. 2B also shows the center O of the operation surface 20a of the surface member 20 in plan view. In the embodiment shown in FIG. 2B, the

lower electrode patterns

14a and 14b and the

lower electrode patterns

14c and 14d are formed point-symmetrically with respect to the center O. That is, the lower electrode pattern 14a and the lower electrode pattern 14d are formed in the same shape, and the lower electrode pattern 14b and the lower electrode pattern 14c are formed in the same shape.

The pattern shapes of the lower electrode patterns 14a to 14d will be described in more detail.
The

first electrode portions

40f, 40g, 40j, and 40k that are equidistant from the center O of the

lower electrode patterns

14b and 14c are each formed with the largest electrode area. The remaining

first electrode portions

40e, 40h, 40i, 40l of the

lower electrode patterns

14b, 14c are formed with an electrode area smaller than the

first electrode portions

40f, 40g, 40j, 40k.

In the

lower electrode patterns

14a and 14d, the

first electrode portions

40b, 40c, 40n, and 40o that are equidistant from the center O are more distant from the center O than the

first electrode portions

40e, 40h, 40i, and 40l. The electrode areas of the

first electrode portions

40b, 40c, 40n, and 40o are smaller than those of the

first electrode portions

40e, 40h, 40i, and 40l. The remaining

first electrode portions

40a, 40d, 40m, and 40p of the

lower electrode patterns

14a and 14d are located farthest from the center O among all the first electrode portions shown in FIG. The electrode area of one

electrode part

40a, 40d, 40m, 40p is formed the smallest.

FIG. 2C is a partial plan view of the upper electrode pattern 13. As shown in FIG. 2C, a plurality of upper electrode patterns 13a to 13c are formed. As shown in FIG. 2C, each of the upper electrode patterns 13a to 13c is arranged with an interval in the X1-X2 direction, and is formed to extend in the Y1-Y2 direction.

Each of the upper electrode patterns 13a to 13c has a configuration in which a plurality of second electrode portions 42a to 42o are connected in the X1-X2 direction via a connecting portion 43 that is narrower than the second electrode portions 42a to 42o. In FIG. 2C, the connecting portion 43 is shown only at one location of each of the upper electrode patterns 13a to 13d.

FIG. 2C also shows the center O of the operation surface 20a of the surface member 20 in plan view. In the embodiment shown in FIG. 2C, the upper electrode pattern 13a and the upper electrode pattern 13c are formed symmetrically with respect to the center O and have the same shape.

The pattern shapes of the upper electrode patterns 13a to 13c will be described in more detail.
The second electrode portion 42h located at the center O of the upper electrode pattern 13b is formed with the largest electrode area. The electrode areas of the second electrode portions 42g and 42i constituting the upper electrode pattern 13b are smaller than the second electrode portion 42h, but are formed larger than the

second electrode portions

42f and 42j, and the

second electrode portions

42f and 42j are smaller. It is formed.

In the

upper electrode patterns

13a and 13c, the

second electrode portions

42c and 42m close to the center O are formed larger, but are formed smaller than the second electrode portion 42h. The electrode areas of the

second electrode portions

42b, 42d, 42l and 42n constituting the

upper electrode patterns

13a and 13c are smaller than the

second electrode portions

42c and 42m, but larger than the

second electrode portions

42a, 42e, 42k and 42o. The

second electrode portions

42a, 42e, 42k, 42o are formed to be the smallest. The

second electrode portions

42a, 42e, 42k, 42o are formed smaller than the

second electrode portions

42f, 42j.

FIG. 2D is a partial plan view in which the plurality of lower electrode patterns 14a to 14d shown in FIG. 2B and the plurality of upper electrode patterns 13a to 13c shown in FIG. . As shown in FIG. 6, an adhesive layer 30 and a base material 33 are interposed between the lower electrode patterns 14a to 14d and the upper electrode patterns 13a to 13c, and the lower electrode patterns 14a to 14d and the upper electrode patterns 13a to 13c are interposed. There is a predetermined gap in the height direction between 13c.

As shown in FIG. 2D, the first electrode portions 40a to 40p constituting the lower electrode patterns 14a to 14d and the second electrode portions 42a to 42o constituting the upper electrode patterns 13a to 13c are in plan view. Are arranged so that they do not overlap.

At the center O of the operation surface 20a of the surface member 20, the distance in the height direction from the sensor unit 25 shown in FIG. 6 is the largest. Here, the distance between the operation surface 20a and the sensor unit 25 refers to the distance L3 between the operation surface 20a and each first electrode unit and the distance L2 between the operation surface 20a and each second electrode unit. . FIG. 6 is a cross-sectional view cut at the center position of the second electrode portion. The portion visible as the upper electrode pattern 13 is “second electrode portion 42” (in FIG. 2, reference numerals 42a to 42o are attached). Here, it is denoted by reference numeral 42 for convenience. As can be seen from FIG. 2D, when the second electrode portion 42 is cut along the center in the X1-X2 direction, the lower electrode pattern 14 does not appear on the cut surface, but in FIG. Is a lower electrode pattern 14 having a first electrode portion 40 (here also denoted by reference numeral 40 for convenience) existing on the rear side or the near side which cannot be seen. In FIG. 6, a distance L <b> 3 with the first electrode part 40 close to the finger F and a distance L <b> 2 with the second electrode part 42 are shown.

As shown in FIG. 6, when the finger F is brought into contact with the operation surface 20a, capacitances C2 and C3 are generated between the finger F and the

electrode portions

40 and 42 of the

electrode patterns

13 and 14 close to the finger F. . As described above, the capacitance changes between when the finger F is brought into contact with the operation surface 20a and when the finger F is not brought into contact therewith. For example, a pulse voltage is sequentially applied to each lower electrode pattern 13 that is a detection electrode, and at this time, the electrical characteristics (eg, time constant) of each lower electrode pattern 13 are compared before and after touching the finger F. For example, it can be seen that the finger F exists near the upper part of the lower electrode pattern 14 where the change is observed. Similarly, in each upper electrode pattern 13, the contact position of the finger F is calculated from the detection results of the lower electrode patterns 14 and the upper electrode patterns 13 that are detection electrodes by detecting a change in electrical characteristics based on the capacitance change. Is possible.

In the present embodiment, the distances L2 and L3 between the finger F and each electrode pattern differ depending on the contact position of the finger F on the operation surface 20a, but the size of the capacitance is inversely proportional to the distance and the area. Since it is proportional, when the finger F is brought into contact with a different position on the operation surface 20a by increasing the electrode area as the distances L2 and L3 between the operation surface 20a and the sensor unit 25 are larger as in this embodiment. The variation of the capacitance change can be suppressed as compared with the conventional case, and the uniformity of the sensor sensitivity over the entire operation surface 20a can be improved.

In this embodiment, since the sensor unit 25 having a planar shape (flat plate shape) can be used, the input device 10 in which the operation surface 20a is formed in a curved shape can be appropriately and easily manufactured as compared with the conventional case. It is possible to effectively improve the uniformity of sensor sensitivity throughout 20a.

Here, the first electrode portions 40a to 40p of the lower electrode patterns 14a to 14d shown in FIG. 2B, and the second electrode portions 42a to 42o of the upper electrode patterns 13a to 13c shown in FIG. It is not necessary to adjust the electrode area between. For example, as shown in FIG. 6, the distance L3 is larger than the distance L2. However, it is not necessary to make the first electrode portion at the distance L3 larger than the electrode portion at the distance L2. In the present embodiment, each lower electrode pattern and each upper electrode pattern are detection electrodes, and each of the lower electrode pattern and each upper electrode pattern is separately provided in the X1-X2 direction or the Y1-Y2 direction of the finger F. Therefore, it is not necessary to adjust the electrode area between each lower electrode pattern and each upper electrode pattern, and the first electrode portions 40a to 40p or the second electrode portions 42a to 42o The electrode area may be adjusted with respect to the distances L2 and L3, respectively. The same applies to the embodiments in FIGS. However, the first electrode portion and the second electrode portion which are adjacent to each other in plan view are formed so as to have substantially the same size, so that the first electrode portion and the second electrode portion having different sizes can be arranged on the XY plane. This is preferable because it can be arranged appropriately and it is difficult to see through the shape of each electrode portion from the operation surface 20a.

FIG. 3 shows the shapes of the surface member 20, the lower electrode pattern, and the upper electrode pattern in the second embodiment.

FIG. 3A shows a partial plan view of the surface member 20 and a cross section taken along line AA and BB passing through the center O of the surface member 20. A part of the adhesive layer 31 under the surface member 20 as well as the surface member 20 is shown in the AA line cross section and the BB line cross section.

As shown in FIG. 3 (a), the operation surface (surface) 20a of the surface member 20 is formed as a convex curved surface in the X1-X2 direction and linearly formed in the Y1-Y2 direction. In this embodiment, the line in the Y1-Y2 direction passing through the center O of the operation surface 20a protrudes most upward, and gradually moves downward as it moves away from the line in the Y1-Y2 direction passing through the center O in the X1-X2 direction. It is formed in a curved shape.

FIG. 3B is a partial plan view of the lower electrode pattern 14. All the lower electrode patterns 14e to 14h shown in FIG. 3B are formed in the same shape. The electrode areas of the

first electrode portions

44b, 44c, 44f, 44g, 44j, 44k, 44n, and 44o that are close to the line in the Y1-Y2 direction passing through the center O of the operation surface 20a are Y1-passing through the center O of the operation surface 20a. It is formed larger than the

first electrode portions

44a, 44d, 44e, 44h, 44i, 44l, 44m, and 44p far from the line in the Y2 direction.

FIG. 3C is a partial plan view of the upper electrode pattern 13. As shown in FIG. 3C, a plurality of upper electrode patterns 13d to 13f are formed. As shown in FIG. 3C, each of the upper electrode patterns 13d to 13f is arranged with an interval in the X1-X2 direction and is formed to extend in the Y1-Y2 direction. In plan view, the electrode area of the

second electrode portions

45f, 45g, 45h, 45i, and 45j of the upper electrode pattern 13f located on the line in the Y1-Y2 direction passing through the center O of the operation surface 20a is the center of the operation surface 20a. It is formed larger than the

second electrode portions

45a, 45b, 45c, 45d, 45e, 45k, 45l, 45m, 45n, and 45o of the

upper electrode patterns

13d and 13f separated from the line in the Y1-Y2 direction passing through O.

FIG. 3D is a partial plan view in which the plurality of lower electrode patterns 14e to 14h shown in FIG. 3B and the plurality of upper electrode patterns 13d to 13f shown in FIG. . As shown in FIG. 3D, the first electrode portions 44a to 44p and the second electrode portions 45a to 45o are arranged so as not to overlap each other in plan view.

Then, as shown in FIGS. 3B and 3C, by forming the electrode patterns 14e to 14h and 13d to 13f, the electrode area of each electrode portion can be set between the operation surface 20a and the sensor portion 25. The distance can be increased as the distances L2 and L3 in the height direction (Z) are increased.

FIG. 4 shows the shapes of the surface member 20, the lower electrode pattern, and the upper electrode pattern in the third embodiment.

FIG. 4 (a) shows a partial plan view of the surface member 20, and a cross section taken along the line AA and a line BB passing through the center O of the operation surface 20a of the surface member 20. FIG. A part of the adhesive layer 31 under the surface member 20 as well as the surface member 20 is shown in the AA line cross section and the BB line cross section.

As shown in FIG. 4A, the operation surface (surface) 20a of the surface member 20 is formed as a concave curved surface in the Y1-Y2 direction (first direction) and the X1-X2 direction (second direction). The In this embodiment, the center O of the operation surface 20a is recessed most downward, and is formed in a 3D shape that gradually curves upward as the distance from the center O increases.

FIG. 4B is a partial plan view of the lower electrode pattern 14. As shown in FIG. 4B, a plurality of lower electrode patterns 14i to 14l are formed. As shown in FIG. 4B, the lower electrode patterns 14i to 14l are arranged with an interval in the Y1-Y2 direction and are formed to extend in the X1-X2 direction, respectively.

Each of the lower electrode patterns 14i to 14l has a configuration in which a plurality of first electrode portions 46a to 46p are connected in the X1-X2 direction via a connecting portion 41 that is narrower than the first electrode portions 46a to 46p. In FIG. 4B, the connecting portion 41 is shown only at one location of each of the lower electrode patterns 14i to 14l. FIG. 4B also shows the center O of the operation surface 20a of the surface member 20 in plan view. In the embodiment shown in FIG. 4B, the lower electrode patterns 14i and 14j and the lower electrode patterns 14k and 14l are formed point-symmetrically with respect to the center O. That is, the lower electrode pattern 14i and the lower electrode pattern 141 are formed in the same shape, and the lower electrode pattern 14j and the lower electrode pattern 14k are formed in the same shape.

The pattern shapes of the lower electrode patterns 14i to 14l will be described in more detail.
The

first electrode portions

46f, 46g, 46j, and 46k that are equidistant from the center O of the lower electrode patterns 14j and 14k are all formed with the smallest electrode area. The remaining

first electrode portions

46e, 46h, 46i, 46l of the lower electrode patterns 14j, 14k are formed with a larger electrode area than the

first electrode portions

46f, 46g, 46j, 46k.

In the lower electrode patterns 14i and 14l, the

first electrode portions

46b, 46c, 46n, and 46o that are equidistant from the center O are formed with a smaller electrode area than the

first electrode portions

46a, 46d, 46m, and 46p. .

FIG. 4C is a partial plan view of the upper electrode pattern 13. As shown in FIG. 4C, a plurality of upper electrode patterns 13h to 13j are formed. As shown in FIG. 4C, each of the upper electrode patterns 13h to 13j is arranged with an interval in the X1-X2 direction and is formed to extend in the Y1-Y2 direction.

Each of the upper electrode patterns 13h to 13j has a configuration in which a plurality of second electrode portions 47a to 47o are connected in the X1-X2 direction via a connecting portion 43 that is narrower than the second electrode portions 47a to 47o. In FIG. 4C, the connecting portion 43 is shown only at one location of each of the upper electrode patterns 13h to 13j.

FIG. 4C also shows the center O of the operation surface 20a of the surface member 20 in plan view. In the embodiment shown in FIG. 4C, the upper electrode pattern 13h and the upper electrode pattern 13j are formed symmetrically with respect to the center O and have the same shape.

The pattern shapes of the upper electrode patterns 13h to 13j will be described in more detail.
The second electrode portion 47h located at the center O of the upper electrode pattern 13i is formed with the smallest electrode area. The electrode areas of the other

second electrode portions

47g and 47i constituting the upper electrode pattern 13i are larger than the second electrode portion 47h, but smaller than the second electrode portions 47f and 47j, and the second electrode portions 47f and 47j are formed. Formed larger.

In the upper electrode patterns 13h and 13j, the

second electrode portions

47c and 47m close to the center O are formed smaller, but larger than the second electrode portion 47h. The electrode areas of the remaining

second electrode portions

42b, 42d, 42l, and 42n constituting the upper electrode patterns 13h and 13j are larger than the

second electrode portions

42c and 42m, but smaller than the

second electrode portions

47a, 47e, 47k, and 47o. The

second electrode portions

47a, 47e, 47k, and 47o are formed to be the largest.

FIG. 4D is a partial plan view in which the plurality of lower electrode patterns 14i to 141 shown in FIG. 4B and the plurality of upper electrode patterns 13h to 13j shown in FIG. .

As shown in FIG. 4D, the first electrode portions 46a to 46p constituting the lower electrode patterns 14i to 14l and the second electrode portions 47a to 47o constituting the upper electrode patterns 13h to 13j are in plan view. Are arranged so that they do not overlap. Then, as shown in FIGS. 4B and 4C, by forming the electrode patterns 14i to 14l and 13h to 13j, the electrode areas of the electrode portions 46a to 46p and 47a to 47o The larger the distance in the height direction (Z) between 20a and the sensor unit 25, the larger the distance.

FIG. 5 shows the shapes of the surface member 20, the lower electrode pattern, and the upper electrode pattern in the fourth embodiment.

FIG. 5A shows a partial plan view of the surface member 20 and a cross section taken along line AA and BB passing through the center O of the surface member 20. A part of the adhesive layer 31 under the surface member 20 as well as the surface member 20 is shown in the AA line cross section and the BB line cross section.

As shown in FIG. 5A, the operation surface (surface) 20a of the surface member 20 is formed as a concave curved surface in the X1-X2 direction and linearly formed in the Y1-Y2 direction. In this embodiment, the line in the Y1-Y2 direction passing through the center O of the operation surface 20a is recessed most downward, and gradually increases upward from the line in the Y1-Y2 direction passing through the center O in the X1-X2 direction. It is formed in a curved shape.

FIG. 5B is a partial plan view of the lower electrode pattern 14. The lower electrode patterns 14m to 14p shown in FIG. 5B are all formed in the same shape. The electrode areas of the

first electrode portions

48b, 48c, 48f, 48g, 48j, 48k, 48n, and 48o close to the line in the Y1-Y2 direction passing through the center O of the operation surface 20a are Y1-passing through the center O of the operation surface 20a. It is formed smaller than the

first electrode portions

48a, 48d, 48e, 48h, 48i, 48l, 48m, 48p far from the line in the Y2 direction.

FIG. 5C is a partial plan view of the upper electrode pattern 13. As shown in FIG. 5C, a plurality of upper electrode patterns 13k to 13m are formed. As shown in FIG. 5C, each of the upper electrode patterns 13k to 13m is arranged with an interval in the X1-X2 direction and is formed to extend in the Y1-Y2 direction. The electrode areas of the

second electrode portions

49f, 49g, 49h, 49i, and 49j of the upper electrode pattern 13l located on the line in the Y1-Y2 direction passing through the center O of the operation surface 20a are Y1-passed through the center O of the operation surface 20a. It is formed smaller than the electrode area of the

second electrode portions

49a, 49b, 49c, 49d, 49e, 49k, 49l, 49m, 49n, 49o of the

upper electrode patterns

13k, 13m separated from the line in the Y2 direction.

FIG. 5D is a partial plan view in which the plurality of lower electrode patterns 14n to 14p shown in FIG. 5B and the plurality of upper electrode patterns 13k to 13m shown in FIG. . As shown in FIG. 5D, the first electrode portions 48a to 48p and the second electrode portions 49a to 49o are arranged so as not to overlap each other in plan view. In FIG. 5D, the electrode areas of the first electrode portions 48a to 48p of the lower electrode patterns 14m to 14p and the second electrode portions 49a to 49o of the upper electrode patterns 13k to 13m are as follows. The distance between the operation surface 20a and the sensor unit 25 in the height direction (Z) increases as the distance increases.

As shown in FIGS. 2 to 5, even if the operation surface 20a is formed as a convex curved surface or a concave curved surface, each lower electrode increases as the distance in the height direction between the operation surface 20a and the sensor unit 25 increases. The electrode area of each first electrode portion of the pattern 13 and the electrode area of each second electrode portion of each upper electrode pattern are respectively increased, and thereby the sensor sensitivity in the entire operation surface 20a is compared with the conventional case. It can be made uniform.

In the present embodiment, the ratio of the electrode area in each first electrode part and the ratio of the electrode area in each second electrode part are each proportional to the ratio of the distance between each electrode part and the operation surface. It is preferable to adjust the electrode area of the part. The magnitude of the capacitance is inversely proportional to the distance and proportional to the area. Therefore, for example, if the distance is doubled, the uniformity of sensor sensitivity in the entire operation surface 20a can be more effectively improved by adjusting the area of each electrode so that the area is doubled.

In the embodiment shown in FIG. 6, the surface member 20 is formed not only on the operation surface 20a but also on the back surface 20b facing the operation surface 20a in a curved shape following the shape of the operation surface 20a, as shown in FIG. Further, the back surface 20b may be formed as a flat surface.

C2, C3 Capacitance F Finger L2, L3 Distance 10

Input device

13, 13a-13m

Upper electrode pattern

14, 14a-14p Lower electrode pattern 20 Surface member

20a Operation surface

20b Back surface 21 Upper substrate 22 Lower substrate 25

Sensor unit

40, 40a-40p, 44a-44p, 46a-46p, 48a-48p First electrode portion 41, 43 Connecting

portion

42, 42a-42o, 45a-45o, 47a-47o, 49a-49o Second electrode portion

Claims

A plurality of lower electrode patterns formed with a space in the first direction out of a first direction and a second direction intersecting in a plane, and formed with a space in the second direction. A plurality of upper electrode patterns spaced apart in the height direction, and a surface member disposed opposite to the sensor portion in the height direction and having an operation surface on the surface. Configured,
Each of the lower electrode patterns has a plurality of first electrode portions connected in series in the second direction via a connecting portion that is thinner than the first electrode portion,
Each upper electrode pattern includes a plurality of second electrode portions that are connected in the first direction via a connecting portion that is thinner than the second electrode portion,
The first electrode part and the second electrode part are arranged so as not to overlap in plan view,
The operation surface is curved so that a distance in a height direction between the operation body and the sensor unit when the operation body is brought into contact with the operation surface varies depending on a contact position of the operation body on the operation surface. Formed with
The capacitance type input device, wherein each electrode area of the first electrode part and the second electrode part is formed to be larger as a distance between the operation surface and the sensor part is larger.
The ratio of the electrode area in each 1st electrode part and the ratio of the electrode area in each 2nd electrode part are respectively proportional to the ratio of the distance between each electrode part and the said operation surface. Capacitive input device.
The capacitance type according to claim 1 or 2, wherein the operation surface of the surface member is formed in a convex curved surface shape or a concave curved surface shape toward at least one of the first direction and the second direction. Input device.