WO2011093166A1 - Method for producing relief printing plate - Google Patents

Method for producing relief printing plate Download PDF

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Publication number
WO2011093166A1
WO2011093166A1 PCT/JP2011/050710 JP2011050710W WO2011093166A1 WO 2011093166 A1 WO2011093166 A1 WO 2011093166A1 JP 2011050710 W JP2011050710 W JP 2011050710W WO 2011093166 A1 WO2011093166 A1 WO 2011093166A1
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WO
WIPO (PCT)
Prior art keywords
printing plate
relief printing
relief
engraving
formula
Prior art date
Application number
PCT/JP2011/050710
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French (fr)
Japanese (ja)
Inventor
圭一 足立
Original Assignee
富士フイルム株式会社
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Filing date
Publication date
Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Publication of WO2011093166A1 publication Critical patent/WO2011093166A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/02Engraving; Heads therefor
    • B41C1/04Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05Heat-generating engraving heads, e.g. laser beam, electron beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/12Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/06Preparing for use and conserving printing surfaces by use of detergents

Definitions

  • the present invention relates to a method for making a relief printing plate.
  • the rinsing liquid used in the conventional method for making a relief printing plate it has been difficult to sufficiently remove the residue on the plate generated during engraving. Furthermore, the relief printing plate may be greatly affected by the rinsing liquid because the relief layer of the relief printing plate absorbs the rinsing liquid and swells.
  • An object of the present invention is to provide a plate making method of a relief printing plate using a rinsing liquid for relief printing plate making, which can easily remove the residue on the plate generated during engraving and has a small influence on the relief printing plate. It is.
  • ⁇ 1> A step of preparing a relief printing plate precursor having a relief-forming layer containing a non-elastomer binder polymer, a plasticizer, and a photothermal conversion agent on a support, and the relief printing plate precursor is exposed by laser exposure.
  • a step of engraving and a step of removing engraving residue generated by engraving with a rinsing liquid for relief printing plate making in this order, and the rinsing liquid for relief printing plate making contains a nonionic surfactant A method for making a relief printing plate characterized by ⁇ 2>
  • the above-mentioned rinsing liquid for making a relief printing plate contains at least one nonionic surfactant selected from the group consisting of compounds represented by the following formulas (1-1) to (1-6):
  • R represents an alkyl group having 6 to 23 carbon atoms
  • n is 3 to 100.
  • n represents an integer of 3 to 30, and in formulas (1-3) and (1-4), m and n each satisfy 3 ⁇ m + n ⁇ 50.
  • X represents a hydrogen atom or a methyl group, and in formula (1-5), n is an integer of 3 to 50
  • l, m and n each independently represents an integer of 2 to 30.
  • ⁇ 3> The method for making a relief printing plate according to ⁇ 1> or ⁇ 2> above, wherein the content of the nonionic surfactant in the rinsing liquid for relief printing plate making is 0.1 to 20% by weight
  • ⁇ 4> The above-mentioned ⁇ 1> to ⁇ 1>, wherein the rinsing liquid for relief printing plate making contains at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents.
  • ⁇ 3> A method for making a relief printing plate according to any one of the above, ⁇ 5> A step of preparing a relief printing plate precursor having a relief-forming layer containing a non-elastomer binder polymer, a plasticizer, and a photothermal conversion agent on a support, and the relief printing plate precursor is exposed by laser exposure.
  • ⁇ 8> The method for making a relief printing plate according to any one of the above ⁇ 1> to ⁇ 7>, wherein the binder polymer is polyvinyl butyral and / or
  • each R 2 independently represents a hydrocarbon group, OR 3 or a halogen atom
  • R 3 represents a hydrogen atom or a hydrocarbon group
  • * (Represents the bonding position with other structures) ⁇ 10>
  • the relief forming layer contains a compound containing a group represented by the following formula (i): * -Si (OR 3 ) (R 2 ) 2 (i) (In formula (i), two R 2 s each independently represent a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * represents a bonding position with another structure.
  • a plate making method of a relief printing plate using a rinsing liquid for making a relief printing plate which can easily remove the residue on the plate generated during engraving and has little influence on the relief printing plate. I was able to.
  • the method for making a relief printing plate of the present invention comprises a step of preparing a relief printing plate precursor for laser engraving having a relief forming layer containing a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent on a support, the laser
  • the relief printing plate making includes the steps of engraving the relief printing plate precursor for engraving by exposure using a laser, and removing the engraving residue generated by engraving with a rinse solution for relief printing plate making in this order.
  • the rinsing liquid for use is a nonionic surfactant and / or at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents (hereinafter also referred to as specific solvents). .).
  • lower limit to upper limit representing a numerical range
  • upper limit to lower limit represents “lower limit or higher and lower limit or higher”. That is, it represents a numerical range including an upper limit and a lower limit.
  • the rinsing liquid for relief printing plate making used in the present invention (hereinafter also referred to as “the rinsing liquid for relief printing plate making of the present invention”, “the rinsing liquid of the present invention”, or simply “the rinsing liquid”), It contains a nonionic surfactant and / or a specific solvent.
  • the rinsing liquid for relief printing plate making preferably contains at least one nonionic surfactant selected from the group consisting of compounds represented by the following formulas (1-1) to (1-6).
  • R represents an alkyl group having 6 to 23 carbon atoms
  • n is 3 to 100.
  • n represents an integer of 3 to 30, and in formulas (1-3) and (1-4), m and n each satisfy 3 ⁇ m + n ⁇ 50.
  • X represents a hydrogen atom or a methyl group, and in formula (1-5), n is an integer of 3 to 50
  • l, m and n each independently represents an integer of 2 to 30.
  • the rinsing liquid for relief printing plate making of the present invention is selected from the group consisting of compounds represented by the above formulas (1-1) to (1-6) as a nonionic surfactant (nonionic surfactant). It is preferable to contain at least one selected from the above.
  • the rinsing liquid for relief printing plate making of the present invention may be used alone or in combination of any one of the compounds represented by the formulas (1-1) to (1-6). May be used in combination.
  • R represents an alkyl group having 6 to 23 carbon atoms, and the carbon number in R is 6 to 20 Preferably, it is 8-18.
  • the alkyl group represented by R may be linear or branched.
  • X represents a hydrogen atom or a methyl group.
  • the plurality of X may be the same or different from each other.
  • n represents the number of repeating ethylene oxide (EO) units.
  • n represents an integer of 3 to 100, preferably an integer of 4 to 30, and more preferably an integer of 4 to 18.
  • n represents an integer of 3 to 30, preferably an integer of 5 to 23, and more preferably an integer of 7 to 18.
  • M and n in the formula (1-3) and the formula (1-4) satisfy 3 ⁇ m + n ⁇ 50 and represent an integer of 0 or more, preferably 4 ⁇ m + n ⁇ 30, and 8 ⁇ It is more preferable to satisfy m + n ⁇ 20.
  • n represents an integer of 3 to 50, preferably an integer of 5 to 50, and more preferably an integer of 10 to 50.
  • l, m, and n each independently represents an integer of 2 to 30, preferably satisfying 10 ⁇ l + m + n ⁇ 45, and more preferably satisfying 10 ⁇ l + m + n ⁇ 40.
  • Specific examples of the compound represented by the formula (1-1) include compounds in which R is C 8 H 17 and n is 4, 7, or 12, R is C 12 H 25 and n is And a compound in which R is C 20 H 41 and n is 15.
  • Specific examples of the compound represented by the formula (1-2) include compounds in which n is 10, 13, or 18.
  • Specific examples of the compound represented by the formula (1-3) include compounds in which R is C 12 H 25 and m + n is 10 or 20.
  • Specific examples of the compound represented by the formula (1-4) include compounds in which R is C 12 H 25 and m + n is 10 or 20.
  • Specific examples of the compound represented by the formula (1-5) include a compound in which R is C 12 H 25 and n is 10, and a compound in which R is C 20 H 41 and n is 15. Can be mentioned.
  • Specific examples of the compound represented by the formula (1-6) include compounds in which l + m + n is 30 or 40.
  • the rinsing liquid for relief printing plate making of the present invention may be used in place of or together with the nonionic surfactant selected from the group consisting of the compounds represented by formulas (1-1) to (1-6): It is also preferable to contain a nonionic surfactant selected from the group consisting of compounds represented by formulas (1-7) to (1-17).
  • m represents an integer of 1 to 50
  • n represents an integer of 0 to 50
  • R represents an alkyl group having 1 to 23 carbon atoms
  • n represents an integer of 1 to 30, and in formula (1-9)
  • R represents an alkyl group having 5 to 50 carbon atoms
  • n represents an integer of 1 to 30, and R in formula (1-10)
  • A represents a hydrogen atom or —COR
  • R represents an alkyl group having 1 to 23 carbon atoms
  • n represents an integer of 1 to 30
  • R represents an alkyl group having 1 to 12 carbon atoms.
  • R represents an alkyl group having 1 to 20 carbon atoms.
  • X represents a hydrogen atom or —COR, and R represents carbon.
  • R represents an alkyl group of several 10 to 50
  • n represents an integer of 3 to 30
  • R represents an alkyl group of 3 to 50 carbon atoms
  • each of l, m, and n represents (20 ⁇ l + m + n ⁇ 80 is satisfied and represents an integer of 0 or more
  • R represents an alkyl group having 1 to 20 carbon atoms.
  • the rinsing liquid for relief printing plate making of the present invention is represented by the compounds represented by the formulas (1-1) to (1-6) and the formulas (1-7) to (1-17). Any one of these compounds may be used alone, or two or more may be used in combination.
  • R represents an alkyl group having 1 to 23 carbon atoms, and the carbon number in R is preferably 4 to 16, and more preferably 8 to 12.
  • R represents an alkyl group having 5 to 50 carbon atoms, and the carbon number in R is preferably 5 to 40, and more preferably 5 to 30.
  • R represents an alkyl group having 1 to 12 carbon atoms, and the number of carbon atoms in R is preferably 1 to 8, and more preferably 1 to 6.
  • R represents an alkyl group having 1 to 23 carbon atoms, and the number of carbon atoms in R is preferably 4 to 16, and more preferably 8 to 12.
  • R represents an alkyl group having 1 to 12 carbon atoms, and the number of carbon atoms in R is preferably 1 to 8, and more preferably 1 to 6.
  • R represents an alkyl group having 1 to 20 carbon atoms, and the carbon number in R is preferably 2 to 12, and preferably 8 to 12. Is more preferable.
  • R represents an alkyl group having 10 to 50 carbon atoms, and the carbon number in R is preferably 12 to 40, and more preferably 12 to 20.
  • R represents an alkyl group having 3 to 50 carbon atoms, and the carbon number in R is preferably 15 to 50, and more preferably 20 to 40.
  • R represents an alkyl group having 1 to 20 carbon atoms, and the number of carbon atoms in R is preferably 3 to 15, and more preferably 3 to 8.
  • the alkyl group represented by R in the above formulas may be linear or branched.
  • A represents a hydrogen atom or —COR.
  • X represents a hydrogen atom or —COR.
  • the plurality of R may be the same as each other. May be different.
  • m represents the number of repeating propylene oxide group (PO group) units
  • n represents the number of repeating EO group units.
  • m represents an integer of 1 to 50
  • n represents an integer of 0 to 50
  • m is preferably an integer of 3 to 30, more preferably an integer of 5 to 20.
  • n is an integer of 0 to 50, more preferably an integer of 5 to 20.
  • formula (1-8) formula (1-9), formula (1-11), formula (1-15), and formula (1-16), l, m, or n represents the number of repeating EO group units.
  • N in the formula (1-8) represents an integer of 1 to 30, preferably an integer of 3 to 20, and more preferably an integer of 5 to 15.
  • N in the formula (1-9) represents an integer of 1 to 30, preferably an integer of 3 to 20, and more preferably an integer of 5 to 15.
  • N in the formula (1-11) represents an integer of 1 to 30, preferably an integer of 3 to 25, and more preferably an integer of 5 to 20.
  • N in the formula (1-15) represents an integer of 3 to 30, preferably an integer of 6 to 20, and more preferably an integer of 8 to 16.
  • l, m, and n each satisfy 20 ⁇ l + m + n ⁇ 80 and represent an integer of 0 or more, preferably 30 ⁇ l + m + n ⁇ 60, and satisfy 40 ⁇ l + m + n ⁇ 50. It is more preferable.
  • Specific examples of the compound represented by the formula (1-7) include compounds in which m is 7 and n is 5.
  • Specific examples of the compound represented by the formula (1-8) include compounds in which R is C 8 H 17 and n is 10.
  • Specific examples of the compound represented by the formula (1-9) include compounds in which R is C 8 H 17 and n is 15.
  • Specific examples of the compound represented by the formula (1-10) include compounds in which R is C 6 H 13 .
  • Specific examples of the compound represented by the formula (1-11) include compounds in which R is C 12 H 25 , A is a hydrogen atom, and n is 12.
  • Specific examples of the compound represented by the formula (1-12) include compounds in which R is C 4 H 9 .
  • Specific examples of the compound represented by the formula (1-13) include compounds in which R is C 12 H 25 .
  • Specific examples of the compound represented by the formula (1-14) include compounds wherein R is C 10 H 21 .
  • Specific examples of the compound represented by the formula (1-15) include a compound in which R is C 12 H 25 and n is 12, and a compound in which R is C 16 H 33 and n is 10. Can be mentioned.
  • Specific examples of the compound represented by the formula (1-16) include compounds in which R is C 20 H 41 and l, m, and n are each 15.
  • Specific examples of the compound represented by the formula (1-17) include compounds in which R is C 8 H 17 .
  • the total content of the nonionic surfactant containing the compounds represented by the formulas (1-1) to (1-17) in the rinsing liquid for relief printing plate making of the present invention is 0.1 to 20% by weight. It is preferably 1 to 15% by weight, more preferably 3 to 12% by weight. When the addition amount is within the above range, good rinsing properties can be obtained.
  • the HLB (Hydrophile-Lipophile Balance) value of the nonionic surfactant contained in the rinsing solution for relief printing plate making of the present invention is preferably 8 to 20, and more preferably 10 to 17.
  • the HLB value is calculated according to the Griffin equation. When the HLB value is within the above range, the surfactant itself has water solubility, and the affinity of the engraving residue with the hydrophobic substance is improved. When the HLB value is 8 or more, the surfactant has sufficient water solubility and is excellent in solubility in water. On the other hand, when the HLB value is 20 or less, the dispersibility of the hydrophobic material of engraving residue is excellent.
  • an anionic surfactant in the rinsing liquid for relief printing plate making of the present invention, can be used in combination with the nonionic surfactant, or an anionic surfactant can be used alone.
  • the anionic surfactant preferably contains a compound selected from the group consisting of compounds represented by the following formulas (2-1) to (2-10).
  • M represents an alkali metal or an alkaline earth metal
  • R represents an alkyl group having 6 to 20 carbon atoms
  • R 1 to R 3 each independently represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
  • at least one of R 1 to R 3 represents an alkyl group having 1 to 8 carbon atoms
  • m and n each independently represents an integer of 1 to 10, In (2-5), n represents an integer of 1 to 10.
  • R represents an alkyl group having 6 to 20 carbon atoms, and the carbon number in R is 8 Is preferably 18 and more preferably 8-16.
  • the alkyl group represented by R may be linear or branched.
  • R 1 to R 3 each independently represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and at least one of R 1 to R 3 has 1 to 8 carbon atoms. Represents an alkyl group. If R 1 ⁇ R 3 in the formula (2-6) represents an alkyl group having 1 to 8 carbon atoms, the number of carbon atoms in R 1 ⁇ R 3 is preferably 2-5, is 3-4 It is more preferable.
  • the alkyl group represented by R 1 to R 3 may be linear or branched.
  • M represents an alkali metal or an alkaline earth metal.
  • alkali metal include Li, Na, and K.
  • alkaline earth metal include Mg and Ca.
  • the compounds represented by formulas (2-1) to (2-10) exist as dimers.
  • M and n in the formula (2-4) represent the number of repeating methylene group units
  • n in the formula (2-5) represents the number of repeating EO group units.
  • M and n in the formula (2-4) each independently represent an integer of 1 to 10, preferably an integer of 1 to 6, and more preferably an integer of 1 to 4.
  • N in the formula (2-5) represents an integer of 1 to 10, preferably an integer of 1 to 6, and more preferably an integer of 2 to 4.
  • Specific examples of the compound represented by the formula (2-1) include compounds in which R is C 12 H 25 and M is Na.
  • Specific examples of the compound represented by the formula (2-2) include compounds in which R is C 12 H 25 and M is Na.
  • Specific examples of the compound represented by the formula (2-3) include compounds in which R is C 8 H 17 and M is Na.
  • Specific examples of the compound represented by the formula (2-4) include compounds in which R is C 11 H 23 , M is Na, and m and n are both 2.
  • Specific examples of the compound represented by the formula (2-5) include compounds in which R is C 8 H 17 , M is Na, and n is 2.
  • Specific examples of the compound represented by the formula (2-6) include compounds in which R 1 is C 4 H 9 , R 2 and R 3 are both hydrogen atoms, M is Na, and R 1 to R 3 are any And C 3 H 7 , a compound in which M is Na, a compound in which R 1 and R 2 are both C 4 H 9 , R 3 is a hydrogen atom, and M is Na.
  • Specific examples of the compound represented by the formula (2-7) include compounds in which R is C 11 H 23 and M is Na.
  • Specific examples of the compound represented by the formula (2-8) include compounds wherein R is C 12 H 25 .
  • Specific examples of the compound represented by the formula (2-9) include compounds in which R is C 12 H 25 and M is Na.
  • Specific examples of the compound represented by the formula (2-10) include compounds in which R is C 12 H 25 and M is Na.
  • the rinsing liquid for relief printing plate making of the present invention may be any one of the anionic surfactants represented by the above formulas (2-1) to (2-10). More than one species may be used in combination.
  • the total content of the anionic surfactant containing the compounds represented by the formulas (2-1) to (2-10) in the rinsing liquid for relief printing plate making of the present invention is 0.1 to 20 wt. %, Preferably 1 to 15% by weight, more preferably 3 to 12% by weight.
  • a cationic surfactant in the rinsing liquid for relief printing plate making of the present invention, can be used in combination with the nonionic surfactant, or a cationic surfactant can be used alone.
  • the anionic surfactant preferably contains a compound selected from the group consisting of compounds represented by the following formulas (3-1) to (3-3).
  • R represents an alkyl group having 6 to 20 carbon atoms
  • a ⁇ represents a counter anion.
  • R represents an alkyl group having 6 to 20 carbon atoms, and the carbon number in R is preferably 8 to 16, and preferably 12 to 16. Is more preferable.
  • the plurality of Rs may be the same or different from each other.
  • the alkyl group represented by R may be linear or branched.
  • a ⁇ in the formulas (3-1) to (3-3) represents a counter anion, for example, a halogen ion. Examples of the halogen ion include Cl ⁇ , Br ⁇ , and I ⁇ .
  • Specific examples of the compound represented by the formula (3-1) include compounds in which R is C 12 H 25 and A ⁇ is Cl ⁇ .
  • Specific examples of the compound represented by the formula (3-2) include compounds in which R is C 12 H 25 and A ⁇ is Cl ⁇ .
  • Specific examples of the compound represented by the formula (3-3) include compounds in which R is C 8 H 17 and A ⁇ is Cl ⁇ .
  • the rinsing liquid for relief printing plate making of the present invention may be any one of the cationic surfactants represented by the above formulas (3-1) to (3-3). More than one species may be used in combination.
  • the total content of the cationic surfactant containing the compounds represented by formulas (3-1) to (3-3) in the rinsing liquid for relief printing plate making of the present invention is 0.1 to 20% by weight. Preferably, it is 1 to 15% by weight, more preferably 3 to 12% by weight.
  • the relief printing plate rinsing liquid of the present invention preferably contains water as a main component.
  • the rinsing liquid for relief printing plate making of the present invention preferably contains at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents. Rinsability can be further improved by using such a solvent in combination with the nonionic surfactant. Moreover, you may use a solvent together with the said anionic surfactant or a cationic surfactant.
  • the rinsing liquid for relief printing plate making of the present invention contains not only the solvent and the nonionic surfactant, the anionic surfactant or the cationic surfactant, but also these surfactants. It may contain the said solvent, without doing. Even when the surfactant is not contained, the rinsing property can be improved by the solvent. Moreover, the said solvent may be used individually by 1 type, or may use 2 or more types together.
  • Preferred examples of the solvent contained in the rinsing liquid for relief printing plate making of the present invention include solvents S-1 to S-45 represented by R1-R2 shown in Table 1 below. Among them, the solvents S-1, S-3, S-9, S-10, S-12, S-17, S-22, S-28, S-29, S-34, S-39, S -41 and S-44 are more preferable. In addition, the solvent shown in following Table 1 can be obtained as a commercial item.
  • the content of the solvent in the rinsing solution for relief printing plate making of the present invention is preferably 1 to 40% by weight, more preferably 5 to 30% by weight, and preferably 10 to 25% by weight. Further preferred.
  • the content in the rinsing liquid for relief printing plate making of the present invention is preferably 1 to 40% by weight, and preferably 3 to 30% by weight. More preferred is 5 to 25% by weight.
  • the pH of the rinsing liquid for relief printing plate making of the present invention is preferably 9 or more, more preferably 9 to 14, still more preferably 9.5 to 13.5, and 10.0 to 13.3 is particularly preferable, and 10.0 to 12.5 is most preferable.
  • the rinsing liquid for relief printing plate making of the present invention preferably contains a basic compound in order to achieve the above pH, and more preferably contains a water-soluble basic compound.
  • a basic compound Although a well-known basic compound can be used, It is preferable that it is an inorganic basic compound, and it is an alkali metal salt compound and an alkaline-earth metal salt compound Is more preferable, and an alkali metal hydroxide is more preferable.
  • Examples of the basic compound include sodium hydroxide, ammonium, potassium, lithium, sodium silicate, potassium, tribasic sodium phosphate, potassium, ammonium, dibasic sodium phosphate, potassium, Examples thereof include inorganic alkali salts such as ammonium, sodium carbonate, potassium, ammonium, sodium hydrogen carbonate, potassium, ammonium, sodium borate, potassium and ammonium.
  • the rinsing liquid for relief printing plate making of the present invention preferably contains an antifoaming agent.
  • an antifoaming agent a general silicon-based self-emulsifying type, emulsifying type, surfactant nonionic HLB (Hydrophile-Lipophile Balance) value of 5 or less can be used. Silicon antifoaming agents are preferred. Among them, an emulsified dispersion type and a solubilized type can be used. Specific examples of antifoaming agents include TSA731 and TSA739 (above, manufactured by Toray Dow Corning Co., Ltd.). The content of the antifoaming agent is preferably 0.001 to 1.0% by weight in the rinsing liquid for relief printing plate making.
  • the rinsing liquid for relief printing plate making of the present invention may contain a preservative, an inorganic acid, and / or a chelating agent, if necessary.
  • a preservative an inorganic acid, and / or a chelating agent, if necessary.
  • the preservative the inorganic acid, and the chelating agent, known ones can be used.
  • the plate making method of the relief printing plate of the present invention comprises a step of preparing a relief printing plate precursor having a relief forming layer containing a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent on a support (hereinafter referred to as “preparation step”). ), A step of engraving the relief printing plate precursor by exposure using a laser (hereinafter also referred to as “engraving step”), and a step of removing engraving residue generated by engraving with a rinse liquid (hereinafter referred to as “engraving step”). (Also referred to as “rinsing process”) in this order.
  • the plate making method of the relief printing plate of the present invention includes a step of preparing a relief printing plate precursor having a relief forming layer (preparation step).
  • a relief printing plate precursor which has a relief forming layer which can be used for the platemaking method of the relief printing plate of this invention It is preferable that it is a relief printing plate precursor for laser engraving.
  • the “relief-forming layer” refers to a layer that can be engraved.
  • a crosslinking agent it refers to a layer that is crosslinked by light or heat.
  • the layer before being crosslinked by light or heat is referred to as an “uncrosslinked relief forming layer”.
  • the “relief printing plate precursor for laser engraving” refers to a relief printing plate precursor that can be engraved.
  • the relief-forming layer having a crosslinkability made of a resin composition is an optical Or the state hardened
  • a “relief printing plate” is produced by laser engraving the printing plate precursor.
  • the preparation step includes (A) a layer formation step of coating the resin composition on a support to form an uncrosslinked relief forming layer, and the uncrosslinked relief forming layer by at least one of light and heat.
  • a layer forming step of obtaining a relief printing plate precursor having a relief forming layer by crosslinking with at least one of irradiation with actinic light and heating, and curing one surface of the uncrosslinked relief forming layer or the crosslinked relief forming layer Preferably, it is a crosslinking step, (A) a layer forming step of coating the resin composition on a support to form an uncrosslinked relief forming layer, and the uncrosslinked relief forming layer is subjected to light and heat.
  • the term “coating” includes not only coating and providing, but also means providing by casting.
  • the relief printing plate precursor that can be used in the present invention preferably has a relief forming layer cured by crosslinking.
  • the preparation step includes a step of crosslinking an uncrosslinked relief forming layer in the relief printing plate precursor by light and / or heat.
  • the light is generally applied to the entire relief forming layer.
  • Examples of light also referred to as “active light” include visible light, ultraviolet light, and electron beam, and ultraviolet light is the most common.
  • the support side of the relief forming layer is the back side, the surface may only be irradiated with light. However, if the support is a transparent film that transmits actinic rays, it is preferable that the back side is further irradiated with light.
  • the irradiation from the surface may be performed while the protective film is provided, or may be performed after the protective film is peeled off. Since polymerization inhibition may occur in the presence of oxygen, actinic rays may be irradiated after the relief forming layer is covered with a vinyl chloride sheet and evacuated.
  • the relief forming layer contains a thermal polymerization initiator (the photopolymerization initiator can also be a thermal polymerization initiator)
  • the relief forming layer is crosslinked by heating the relief printing plate precursor for laser engraving.
  • the heating means include a method of heating the printing plate precursor in a hot air oven or a far infrared oven for a predetermined time, and a method of contacting the heated roll for a predetermined time.
  • thermal crosslinking is preferred from the viewpoint that the relief forming layer can be uniformly cured (crosslinked) from the surface to the inside.
  • the plate making method of the relief printing plate of the present invention comprises a resin composition comprising at least a polymer having a hydroxyl group (—OH) and a compound having a group represented by the formula (I) described later in the preparation step.
  • a relief printing plate precursor having a relief forming layer containing a binder having a group represented by the formula (I) such as an alkoxysilyl group can be easily obtained.
  • the photothermal conversion agent mentioned later is contained in the said resin composition.
  • the resin composition preferably contains a polymerizable compound described later from the viewpoint of improving printing durability.
  • the relief forming layer can be crosslinked by irradiating the relief forming layer with an actinic ray that triggers the photopolymerization initiator.
  • the irradiation with actinic rays is generally performed on the entire surface of the relief forming layer. Visible light, ultraviolet light, or an electron beam is mentioned as actinic light, but ultraviolet light is the most common.
  • the substrate side for immobilizing the relief forming layer such as a support for the relief forming layer, is the back side, the surface may only be irradiated with actinic rays, but the support used is transparent to transmit actinic rays.
  • actinic rays from the back side.
  • the irradiation from the surface may be performed while the protective film is provided, or may be performed after the protective film is peeled off. Since polymerization inhibition may occur in the presence of oxygen, actinic rays may be irradiated after the crosslinkable relief forming layer is covered with a vinyl chloride sheet and evacuated.
  • the crosslinking step is a step of crosslinking by light
  • an apparatus for irradiating actinic rays is relatively expensive, but the printing plate precursor does not become high temperature, so there are almost no restrictions on the raw materials of the printing plate precursor. Absent.
  • the crosslinking step is a step of crosslinking by heat, there is an advantage that an extra expensive apparatus is not required, but since the printing plate precursor becomes high temperature, the thermoplastic polymer that becomes flexible at high temperature is not heated. The raw materials to be used must be carefully selected because they may be deformed.
  • a thermal polymerization initiator may be added during the thermal crosslinking. As the thermal polymerization initiator, it can be used as a commercial thermal polymerization initiator for free radical polymerization.
  • thermal polymerization initiator examples include compounds containing a suitable peroxide, hydroperoxide, or azo group.
  • Representative vulcanizing agents can also be used for crosslinking.
  • Thermal crosslinking can also be performed by adding a heat-curable resin, such as an epoxy resin, as a crosslinking component to the layer.
  • crosslinking by heat is preferable from the viewpoint that the relief forming layer can be uniformly cured (crosslinked) from the surface to the inside.
  • crosslinking the relief forming layer there is an advantage that the relief formed first after laser engraving becomes sharp, and second, the adhesiveness of engraving residue generated during laser engraving is suppressed.
  • uncrosslinked relief-forming layer is laser engraved, unintended portions are likely to melt and deform due to residual heat that has propagated around the laser-irradiated portion, and a sharp relief layer may not be obtained.
  • a material having a low molecular weight tends to be liquid rather than solid, that is, the adhesiveness tends to be strong.
  • the engraving residue generated when engraving the relief forming layer tends to become more tacky as more low-molecular materials are used. Since the polymerizable compound which is a low molecule becomes a polymer by crosslinking, the generated engraving residue tends to be less tacky.
  • the plate making method of the relief printing plate of the present invention includes a step of engraving the relief printing plate precursor by exposure (engraving step).
  • a relief is formed by irradiating a laser beam corresponding to an image to be formed with a specific laser to be described later to form a relief.
  • the relief layer is formed by engraving the crosslinked relief forming layer by irradiating a laser beam corresponding to the image to be formed.
  • a step of controlling the laser head with a computer based on digital data of an image to be formed and performing scanning irradiation on the relief forming layer can be mentioned.
  • the molecules in the relief forming layer undergo molecular vibration and heat is generated.
  • a high-power laser such as a carbon dioxide laser or a YAG laser is used as an infrared laser
  • a large amount of heat is generated in the laser irradiation portion, and molecules in the photosensitive layer are selectively cut by molecular cutting or ionization, that is, Sculpture is made.
  • the exposed region also generates heat due to the photothermal conversion agent in the relief forming layer, the heat generated by the photothermal conversion agent also promotes this removability.
  • the advantage of laser engraving is that the engraving depth can be set arbitrarily, so that the structure can be controlled three-dimensionally.
  • a semiconductor laser can be downsized with high efficiency and low cost in laser oscillation compared to a CO 2 laser. Moreover, since it is small, it is easy to form an array.
  • the control of the beam diameter is performed using an imaging lens and a specific optical fiber.
  • the semiconductor laser with fiber is effective for image formation in the present invention because it can efficiently output laser light by attaching an optical fiber.
  • the beam shape can be controlled by processing the fiber. For example, the beam profile can have a top hat shape, and energy can be stably given to the plate surface. Details of semiconductor lasers are described in “Laser Handbook 2nd Edition” edited by Laser Society, Practical Laser Technology, Electronic Communication Society, etc.
  • a plate making apparatus equipped with a fiber-coupled semiconductor laser that can be suitably used in a method for producing a relief printing plate using a relief printing plate precursor is disclosed in Japanese Patent Application Nos. 2008-15460 and 2008 filed by the present applicant. -58160, which can be used to make relief printing plates.
  • the semiconductor laser used for laser engraving preferably has a wavelength of 700 nm to 1,300 nm, more preferably 800 nm to 1,200 nm, still more preferably 860 nm to 1,200 nm, and 900 nm to 1,100 nm. Those are particularly preferred. Since the band gap of GaAs is 860 nm at room temperature, an AlGaAs-based active layer is generally preferably used in a region less than 860 nm. On the other hand, a semiconductor active layer material of InGaAs type is used at 860 nm or more.
  • a semiconductor laser having an InGaAs-based material in its active layer is more reliable than an AlGaAs-based material, and therefore, 860 nm to 1,200 nm is preferable.
  • a semiconductor laser having an InGaAs-based material in the active layer has a more preferable wavelength of 900 nm to 1,100 nm. It is easy to obtain a higher output and higher reliability in the range.
  • a fiber-coupled semiconductor laser having an active layer of an InGaAs material with a wavelength of 900 nm to 1,100 nm.
  • a relief printing plate precursor having a relief forming layer using a resin composition for laser engraving as described later is used.
  • a semiconductor laser with a specific wavelength as described above and a fiber-attached semiconductor laser.
  • the engraving area can be changed by changing the beam shape of the semiconductor laser with fiber or changing the amount of energy supplied to the laser without changing the beam shape. This also has the advantage that the shape of the can be changed.
  • the engraving residue preferably contains a polymer (compound) having a group represented by the following formula (I). That is, it is preferable that the resin composition for laser engraving forming the relief forming layer and the relief forming layer formed thereby contain a compound having a group represented by the following formula (I).
  • * -M (R 1 ) (R 2 ) n (I) (In the formula (I), R 1 represents OR 3 or a halogen atom, M represents Si, Ti, or Al. When M is Si, n is 2, and when M is Ti, n is 2.
  • M is Al, n is 1, each R 2 independently represents a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * (Represents the bonding position with other structures)
  • M is preferably Si, and is preferably a group represented by the following formula (i). * -Si (OR 3 ) (R 2 ) 2 (i) (In formula (i), two R 2 s each independently represent a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * represents a bonding position with another structure.
  • the plate making method of the relief printing plate of the present invention includes a step of removing engraving residue generated by engraving with a rinsing liquid (rinsing treatment step).
  • a rinsing liquid As the rinsing liquid in the rinsing process, the rinsing liquid for relief printing plate making of the present invention is used.
  • the relief printing plate immediately after engraving has engraving residue on the surface.
  • the engraving residue is removed with the relief printing plate rinsing liquid of the present invention.
  • the amount of the rinsing liquid used is required to cover at least the entire plate with the liquid.
  • the amount used varies depending on the plate, but is preferably 10 mL / m 2 or more, more preferably 50 mL / m 2 or more, and further preferably 70 mL / m 2 or more.
  • the amount of the rinse solution used is particularly preferably 70 to 500 mL / m 2 from the viewpoint of the cost of the treatment solution.
  • the means for rinsing in the rinsing process is not particularly limited, but a method of simply washing with a rinsing liquid, a method of spraying a high-pressure rinsing liquid, a batch type or a conveying type known as a photosensitive resin letterpress developing machine.
  • a method of brushing the engraved surface mainly in the presence of a rinsing liquid may be performed manually, or a plate making apparatus such as a commercially available cleaning apparatus may be used.
  • a rinsing liquid can be charged into the tank in the cleaning device for processing. In this case, the liquid is charged in accordance with the tank capacity and processing is performed.
  • the cleaning device JOW-1824-WF manufactured by JEOL Seiki Co., Ltd. can be used.
  • drying step a step of drying the engraved relief layer.
  • Post-crosslinking step a step of imparting energy to the relief layer after engraving and further crosslinking the relief layer.
  • the plate making method of the relief printing plate of the present invention preferably includes a step of drying the engraved relief forming layer to volatilize the rinse liquid.
  • the plate making method of the relief printing plate of the present invention may further include a step of further crosslinking the relief forming layer, if necessary. By performing the post-crosslinking step, the relief formed by engraving can be further strengthened.
  • the used relief printing plate precursor has a relief forming layer cured by crosslinking.
  • the relief printing plate precursor that can be used in the present invention is not particularly limited as long as it has a relief-forming layer containing a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent on a support, and is a known relief.
  • a printing plate precursor can be used, it is preferably a relief printing plate precursor for laser engraving, more preferably a relief forming layer made of a resin composition for laser engraving.
  • the relief forming layer preferably has a crosslinked structure, and is preferably a layer crosslinked by heat and / or light.
  • the relief forming layer is not particularly limited and a known layer can be used, and it is a layer made of a resin composition for laser engraving described later, or a layer obtained by curing a resin composition for laser engraving described later. Is preferred.
  • the relief forming layer is preferably provided on the support.
  • the relief printing plate precursor for laser engraving may further have an adhesive layer between the support and the relief forming layer, and a slip coat layer and a protective film on the relief forming layer.
  • the relief forming layer can be formed, for example, by using a coating liquid composition and molding it into a sheet or sleeve.
  • a coating liquid composition the resin composition for laser engraving mentioned later can be illustrated preferably.
  • the relief printing plate precursor that can be used in the present invention may have a support.
  • the material used for the support in the relief printing plate precursor is not particularly limited, but materials having high dimensional stability are preferably used.
  • metals such as steel, stainless steel, and aluminum, polyester resins (for example, PET, PBT, PAN) )
  • plastic resins such as polyvinyl chloride, synthetic rubbers such as styrene-butadiene rubber, and plastic resins reinforced with glass fibers (such as epoxy resins and phenol resins).
  • a PET (polyethylene terephthalate) film or a steel substrate is preferably used as the support.
  • the form of the support is determined depending on whether the relief forming layer is a sheet or a sleeve. Also, a laser engraving produced by applying a crosslinkable resin composition for laser engraving and curing it from the back surface (opposite to the surface on which laser engraving is performed, including cylindrical ones) with light or heat. In the relief printing plate precursor for use, since the back side of the cured resin composition for laser engraving functions as a support, the support is not always essential.
  • An adhesive layer may be provided between the relief forming layer and the support for the purpose of enhancing the adhesive force between the two layers.
  • materials that can be used for the adhesive layer include I.I. Those described in the edition of Skeist, “Handbook of Adhesives”, the second edition (1977) can be used.
  • a protective film may be provided on the surface of the relief forming layer.
  • the thickness of the protective film is preferably 25 to 500 ⁇ m, more preferably 50 to 200 ⁇ m.
  • a polyester film such as PET (polyethylene terephthalate) or a polyolefin film such as PE (polyethylene) or PP (polypropylene) can be used.
  • the surface of the film may be matted.
  • a slip coat layer may be provided between both layers.
  • the material used for the slip coat layer is a resin that can be dissolved or dispersed in water, such as polyvinyl alcohol, polyvinyl acetate, partially saponified polyvinyl alcohol, hydroxyalkyl cellulose, alkyl cellulose, polyamide resin, etc. It is preferable that
  • the formation of the relief forming layer in the relief printing plate precursor is not particularly limited.
  • a relief forming layer coating solution composition (containing a resin composition for laser engraving) is prepared, and this relief forming layer is used.
  • the method of melt-extruding on a support after removing a solvent from a coating liquid composition is mentioned.
  • the method of casting the coating liquid composition for relief forming layers on a support body, drying this in oven, and removing a solvent from a coating liquid composition may be sufficient. Thereafter, a protective film may be laminated on the relief forming layer as necessary.
  • Lamination can be performed by pressure-bonding the protective film and the relief forming layer with a heated calendar roll or the like, or by bringing the protective film into close contact with the relief forming layer impregnated with a small amount of solvent on the surface.
  • a protective film When a protective film is used, a method of first laminating a relief forming layer on the protective film and then laminating the support may be employed.
  • an adhesive layer When providing an adhesive layer, it can respond by using the support body which apply
  • the coating composition for the relief forming layer can be produced, for example, by dissolving a binder polymer, a photothermal conversion agent and a plasticizer in an appropriate solvent, and then dissolving a polymerizable compound and a polymerization initiator. Since most of the solvent components need to be removed at the stage of producing the relief printing plate precursor, the solvent is a low-molecular alcohol that easily volatilizes (for example, methanol, ethanol, n-propanol, isopropanol, propylene glycol monomethyl ether). ) And the like, and adjusting the temperature, it is preferable to keep the total amount of the solvent added as small as possible.
  • crosslinking in the case of a relief printing plate precursor for laser engraving, as described above, it refers to a state where the relief forming layer is crosslinked.
  • crosslinking is a concept including a crosslinking reaction for linking polymers, and a relief caused by a polymerization reaction between polymerizable compounds having an ethylenically unsaturated bond or a reaction between a polymer and a polymerizable compound. It is a concept that includes the curing reaction of the formation layer.
  • the thickness of the relief forming layer in the relief printing plate precursor is preferably from 0.05 mm to 10 mm, more preferably from 0.05 mm to 7 mm, particularly preferably from 0.05 mm to 3 mm.
  • the Shore A hardness of the relief layer of the relief printing plate is preferably 50 ° or more and 90 ° or less.
  • the Shore A hardness of the relief forming layer is 50 ° or more, even if the fine halftone dots formed by engraving are subjected to the strong printing pressure of the relief printing press, they do not collapse and can be printed normally.
  • the Shore A hardness of the relief layer is 90 ° or less, it is possible to prevent faint printing in a solid portion even in flexographic printing with a printing pressure of kiss touch.
  • the Shore A hardness in this specification is measured by measuring the amount of deformation (indentation depth) by pressing and deforming an indenter (called a push needle or indenter) on the surface of the object to be measured at 25 ° C. and 50% RH. The value measured with a durometer (spring type rubber hardness meter) for digitization.
  • the relief printing plate produced by the method for making a relief printing plate of the present invention can be printed with oil-based ink or UV ink by a relief printing press, and can also be printed with UV ink by a flexographic printing press. is there.
  • the resin composition for laser engraving (hereinafter also simply referred to as “resin composition”) that can be used in the present invention contains at least a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent.
  • an image forming layer of an image forming material that forms an image by laser engraving a relief forming layer of a printing plate precursor that forms a convex relief by laser engraving, an intaglio, and a stencil , Stamps and the like, but are not limited thereto.
  • the components of the resin composition for laser engraving will be described.
  • the resin composition for laser engraving preferably contains a binder polymer (hereinafter also referred to as “binder”).
  • the rinsing liquid for making a relief printing plate of the present invention is suitable for removing engraving residue generated when a relief forming layer containing a non-elastomeric binder is laser engraved, and is contained in a resin composition for laser engraving.
  • the binder is preferably a non-elastomer. Below, after explaining the binder in general which can apply this invention, the binder preferably used in this invention is demonstrated.
  • the binder is a polymer component contained in the resin composition for laser engraving, and a general polymer compound can be appropriately selected and used alone or in combination of two or more.
  • the binder includes polystyrene resin, polyester resin, polyamide resin, polyurea resin, polyamideimide resin, polyurethane resin, polysulfone resin, polyethersulfone resin, polyimide resin, polycarbonate resin, hydrophilic polymer containing hydroxyethylene units, acrylic resin, acetal.
  • a resin, an epoxy resin, a polycarbonate resin, rubber, a thermoplastic elastomer, or the like can be selected and used.
  • a polymer containing a partial structure that is thermally decomposed by exposure or heating is preferable.
  • Preferred examples of such a polymer include those described in paragraph 0038 of JP2008-163081A.
  • a soft resin or a thermoplastic elastomer is selected. This is described in detail in paragraphs 0039 to 0040 of JP-A-2008-163081.
  • the resin composition for laser engraving is applied to the relief forming layer in the relief printing plate precursor for laser engraving, the ease of preparation of the composition for relief forming layer and the oil-based ink in the obtained relief printing plate It is preferable to use a hydrophilic or alcoholic polymer from the viewpoint of improving the resistance to water.
  • a hydrophilic polymer those described in detail in paragraph 0041 of JP-A-2008-163081 can be used.
  • a polymer having a carbon-carbon unsaturated bond in the molecule is preferably used.
  • examples of the polymer containing a carbon-carbon unsaturated bond in the main chain include SB (polystyrene-polybutadiene), SBS (polystyrene-polybutadiene-polystyrene), SIS (polystyrene-polyisoprene-polystyrene), SEBS. (Polystyrene-polyethylene / polybutylene-polystyrene) and the like.
  • a carbon-carbon unsaturated bond such as an allyl group, an acryloyl group, a methacryloyl group, a styryl group, or a vinyl ether group is introduced into the side chain of the polymer.
  • the method for introducing a carbon-carbon unsaturated bond into a polymer side chain is as follows. (1) A structural unit having a polymerizable group precursor formed by bonding a protective group to a polymerizable group is copolymerized with the polymer to remove the protective group.
  • the binder it is particularly preferable to use a polymer having a hydroxyl group (—OH) (hereinafter also referred to as “specific polymer”).
  • the skeleton of the specific polymer is not particularly limited, but an acrylic resin, an epoxy resin, a hydrophilic polymer containing a hydroxyethylene unit, a polyvinyl acetal resin, a polyester resin, and a polyurethane resin are preferable.
  • an acrylic monomer used for the synthesis of the acrylic resin having a hydroxyl group for example, (meth) acrylic acid esters and crotonic acid esters (meth) acrylamides having a hydroxyl group in the molecule are preferable.
  • Such a monomer examples include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate and the like.
  • a copolymer obtained by polymerizing these and a known (meth) acrylic monomer or vinyl monomer can be preferably used.
  • an epoxy resin having a hydroxy group in the side chain is preferable.
  • an epoxy resin obtained by polymerizing an adduct of bisphenol A and epichlorohydrin as a raw material monomer is preferable.
  • the polyester resin a polyester resin composed of hydroxyl carboxylic acid units such as polylactic acid can be preferably used.
  • polyester resin examples include polyhydroxyalkanoate (PHA), lactic acid-based polymer, polyglycolic acid (PGA), polycaprolactone (PCL), poly (butylene succinic acid), and derivatives or mixtures thereof. Those selected from the group consisting of are preferred.
  • the specific polymer is preferably a polymer having an atom and / or group capable of reacting with the compound (I), and is a polymer having an atom and / or group capable of reacting with the compound (I) and is insoluble in water. More preferably, the binder polymer is soluble in an alcohol having 1 to 4 carbon atoms. Although it does not specifically limit as an atom and / or group which can react with the said compound (I), An ethylenically unsaturated bond, an epoxy group, an amino group, a (meth) acryloyl group, a mercapto group, a hydroxy group is illustrated, These Of these, hydroxy groups are preferred.
  • polyvinyl butyral an acrylic resin having a hydroxyl group in a side chain
  • a film having good engraving sensitivity and good film property while achieving both water-based ink suitability and UV ink suitability
  • Preferred examples include an epoxy resin having a hydroxyl group in the side chain.
  • the specific polymer that can be used in the present invention is a photothermal conversion capable of absorbing light having a wavelength of 700 to 1,300 nm, which will be described later, which is a preferred combined component of the resin composition for laser engraving constituting the relief forming layer in the present invention.
  • a glass transition temperature (Tg) of 20 ° C. or higher is particularly preferable because engraving sensitivity is improved.
  • a polymer having such a glass transition temperature is referred to as a non-elastomer. That is, an elastomer is generally defined academically as a polymer having a glass transition temperature of room temperature or lower (see Science Dictionary, Second Edition, Editor, International Science Promotion Foundation, published by Maruzen Co., Ltd., P154).
  • a non-elastomer refers to a polymer having a glass transition temperature exceeding normal temperature.
  • limiting in the upper limit of the glass transition temperature of a specific polymer it is preferable from a viewpoint of handleability that it is 200 degrees C or less, and it is more preferable that it is 25 degreeC or more and 120 degrees C or less.
  • the specific polymer takes a glass state at room temperature. Therefore, compared to a rubber state, the thermal molecular motion is considerably suppressed. It is in.
  • laser engraving in addition to the heat imparted by the infrared laser during laser irradiation, the heat generated by the function of the photothermal conversion agent used in combination with the desired heat is transferred to a specific polymer around it, which decomposes and dissipates. As a result, the recess is formed by engraving.
  • Polyvinyl acetal and derivatives thereof Polyvinyl acetal is a compound obtained by cyclic acetalization of polyvinyl alcohol (obtained by saponifying polyvinyl acetate). Further, the polyvinyl acetal derivative is obtained by modifying the polyvinyl acetal or adding another copolymer component.
  • the acetal content in the polyvinyl acetal (mole% of vinyl alcohol units to be acetalized with the total number of moles of vinyl acetate monomer as the raw material being 100%) is preferably 30 to 90%, more preferably 50 to 85%, 55 ⁇ 78% is particularly preferred.
  • the vinyl alcohol unit in the polyvinyl acetal is preferably 10 to 70 mol%, more preferably 15 to 50 mol%, particularly preferably 22 to 45 mol%, based on the total number of moles of the vinyl acetate monomer as a raw material.
  • the polyvinyl acetal may have vinyl acetate units as other components, and the content thereof is preferably 0.01 to 20 mol%, more preferably 0.1 to 10 mol%.
  • the polyvinyl acetal derivative may further have other copolymer units. Examples of the polyvinyl acetal include polyvinyl butyral, polyvinyl propylal, polyvinyl ethylal, and polyvinyl methylal.
  • polyvinyl butyral is preferable.
  • Polyvinyl butyral is usually a polymer obtained by converting polyvinyl alcohol into butyral.
  • a polyvinyl butyral derivative may also be used.
  • examples of polyvinyl butyral derivatives include acid-modified PVB in which at least part of the hydroxyl group is modified to an acid group such as a carboxyl group, modified PVB in which part of the hydroxyl group is modified to a (meth) acryloyl group, and at least part of the hydroxyl group is an amino group Modified PVB, modified PVB in which ethylene glycol, propylene glycol, or a multimer thereof is introduced into at least a part of the hydroxyl group.
  • the molecular weight of polyvinyl acetal is preferably 5,000 to 800,000, and more preferably 8,000 to 500,000 as a weight average molecular weight from the viewpoint of maintaining a balance between engraving sensitivity and film property. Further, from the viewpoint of improving the rinsing property of engraving residue, it is particularly preferably 50,000 to 300,000.
  • PVB polyvinyl butyral
  • ESREC B polyvinyl butyral
  • ESREC K polyvinyl acetal
  • KS "series”
  • Denkabutyral manufactured by Denki Kagaku Kogyo Co., Ltd.
  • S Lec B manufactured by Sekisui Chemical Co., Ltd.
  • an acrylic resin obtained by using a known acrylic monomer having a hydroxyl group in the molecule can be used as the specific polymer.
  • a novolak resin that is a resin obtained by condensing phenols and aldehydes under acidic conditions can also be used as the specific polymer.
  • the epoxy resin which has a hydroxyl group in a side chain is also possible.
  • polyvinyl butyral and its derivatives are particularly preferable from the viewpoint of rinsing properties and printing durability when used as a relief forming layer.
  • the hydroxyl group content in the specific polymer in the present invention is preferably 0.1 to 15 mmol / g, more preferably 0.5 to 7 mmol / g in any of the above-described polymers. .
  • Only 1 type of specific binder polymers may be used for a resin composition, and 2 or more types may be used together.
  • the weight average molecular weight (in terms of polystyrene by GPC measurement) of the binder that can be used in the present invention is preferably 5,000 to 1,000,000, more preferably 8,000 to 750,000.
  • the preferred content of the specific polymer in the resin composition that can be used in the present invention is 2 to 95% by weight in the total solid content from the viewpoint of satisfying a good balance of form retention, water resistance and engraving sensitivity of the coating film. It is preferably 5 to 80% by weight, particularly preferably 10 to 60% by weight.
  • a known polymer that is not included in the specific polymer such as a polymer having no hydroxyl group
  • a polymer is also referred to as a combined polymer.
  • the combined polymer constitutes the main component contained in the resin composition for laser engraving together with the specific polymer, and a general polymer compound not included in the specific polymer is appropriately selected, and one or two or more types are used. Can be used in combination.
  • a relief forming plate precursor is used as a printing plate precursor, it is necessary to select it in consideration of various performances such as laser engraving property, ink acceptability, and engraving residue dispersibility.
  • the combined polymer for example, among the polymers described above as the binder, a polymer that does not have a hydroxyl group and is not included in the specific polymer can be used.
  • the weight average molecular weight (in terms of polystyrene by GPC measurement) of the combined polymer in the present invention is preferably from 50,000 to 500,000. If the weight average molecular weight is 50,000 or more, the form retainability as a single resin is excellent, and if it is 500,000 or less, it is easy to dissolve in a solvent such as water, which is convenient for preparing a relief forming layer.
  • the weight average molecular weight of the combined polymer is more preferably 10,000 to 400,000, particularly preferably 15,000 to 300,000.
  • the total content of the polymer (binder polymer) (the total content of the specific polymer and the combined polymer) is preferably 5 to 95% by weight, preferably 15 to 80% by weight, based on the total solid content of the resin composition for laser engraving. Is more preferable, and 20 to 65% by weight is still more preferable.
  • the resin composition for laser engraving is applied to the relief forming layer of a relief printing plate precursor, the resulting relief printing plate can be used as a printing plate by setting the binder polymer content to 5% by weight or more. Insufficient printing durability is obtained, and by making it 95% by weight or less, other components are not deficient, and flexibility sufficient to be used as a printing plate even when a relief printing plate is used as a flexographic printing plate. Obtainable.
  • the resin composition for laser engraving contains a plasticizer.
  • the plasticizer has a function of softening a film formed of the resin composition for laser engraving and needs to be compatible with the polymer.
  • the plasticizer for example, dioctyl phthalate, didodecyl phthalate, tributyl citrate and the like, polyethylene glycols, polypropylene glycol (monool type and diol type), polypropylene glycol (monool type and diol type) and the like are preferably used. .
  • the relief forming layer contains a photothermal conversion agent.
  • the resin composition for laser engraving preferably contains a photothermal conversion agent. It is considered that the photothermal conversion agent promotes thermal decomposition of the cured product of the resin composition for laser engraving by absorbing laser light and generating heat. Therefore, it is preferable to select a photothermal conversion agent that absorbs light having a laser wavelength used for engraving.
  • the relief forming layer in the present invention has a relief layer of 700 nm to 1,300 nm. It is preferable to contain the photothermal conversion agent which can absorb the light of this wavelength.
  • the photothermal conversion agent is at least one photothermal conversion agent selected from pigments and dyes having absorption at 800 nm to 1,200 nm.
  • the photothermal conversion agent is preferably a pigment.
  • the dye commercially available dyes and known ones described in documents such as “Dye Handbook” (edited by the Society for Synthetic Organic Chemistry, published in 1970) can be used. Specific examples include those having a maximum absorption wavelength in the range of 700 nm to 1,300 nm. Azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, diimmonium compounds, quinone imine dyes , Methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complexes.
  • cyanine dyes such as heptamethine cyanine dye, oxonol dyes such as pentamethine oxonol dye, and phthalocyanine dyes are preferably used. Examples thereof include the dyes described in paragraphs 0124 to 0137 of JP-A-2008-63554.
  • pigments examples include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and other polymer-bonded dyes.
  • quinophthalone pigments, dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, and the like can be used.
  • carbon black is preferable.
  • carbon black can be used regardless of the classification according to ASTM or the use (for example, for color, for rubber, for dry battery, etc.).
  • Carbon black includes, for example, furnace black, thermal black, channel black, lamp black, acetylene black and the like.
  • black colorants such as carbon black can be used as color chips or color pastes previously dispersed in nitrocellulose or the like by using a dispersant as necessary in order to facilitate dispersion. Chips and pastes are easily available as commercial products.
  • carbon black having a relatively low specific surface area and relatively low DBP absorption and even finer carbon black having a large specific surface area examples include Printex® U, Printex® A, or Specialschwarz® 4 (from Degussa).
  • the carbon black that can be used in the present invention preferably has a dibutyl phthalate (DBP) oil absorption of less than 150 ml / 100 g.
  • DBP dibutyl phthalate
  • conductive carbon black having a specific surface area of at least 150 m 2 / g is preferable from the viewpoint of improving engraving sensitivity by efficiently transferring heat generated by photothermal conversion to surrounding polymers and the like. .
  • the content of the photothermal conversion agent in the laser forming layer or the resin composition for laser engraving varies greatly depending on the molecular extinction coefficient inherent to the molecule, but is 0% of the total solid weight of the resin composition.
  • the range of 0.01 to 20% by weight is preferable, the range of 0.05 to 10% by weight is more preferable, and the range of 0.1 to 5% by weight is particularly preferable.
  • the resin composition for laser engraving preferably contains a crosslinking agent.
  • the resin composition for the relief forming layer preferably contains a crosslinking agent in order to form the crosslinked structure.
  • the crosslinking agent that can be used in the present invention is not particularly limited as long as it can be polymerized by a chemical reaction caused by light or heat to cure the relief forming layer.
  • a polymerizable compound having an ethylenically unsaturated group (hereinafter also referred to as “polymerizable compound”), a reactive silane compound having a reactive silyl group such as an alkoxysilyl group or a halogenated silyl group, and a reactive titanium compound.
  • a reactive aluminum compound is preferably used, and a reactive silane compound is more preferably used.
  • These compounds may form a crosslinked structure in the relief forming layer by reacting with the binder, or may form a crosslinked structure by reacting with each other, and both of these reactions.
  • a cross-linked structure may be formed.
  • the polymerizable compound that can be used here can be arbitrarily selected from compounds having at least one ethylenically unsaturated group, preferably two or more, and more preferably 2 to 6.
  • the resin composition for laser engraving preferably contains a compound having a group represented by the following formula (I) (hereinafter also referred to as “compound (I)”).
  • compound (I) a compound having a group represented by the following formula (I) (hereinafter also referred to as “compound (I)”).
  • R 1 represents OR 3 or a halogen atom
  • M represents Si, Ti, or Al.
  • R 2 independently represents a hydrocarbon group
  • R 3 represents a hydrogen atom or a hydrocarbon group
  • M represents Si, Ti, or Al. Among these, M is preferably Si or Ti, and more preferably Si.
  • R 1 represents OR 3 or a halogen atom
  • R 3 represents a hydrogen atom or a hydrocarbon group
  • the hydrocarbon group includes an alkyl group having 1 to 30 carbon atoms and a carbon number of 6 to 30 Aryl groups having 2 to 30 carbon atoms, aralkyl having 7 to 37 carbon atoms, and the like.
  • R 3 is preferably a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 20 carbon atoms, preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or 6 to 6 carbon atoms. 10 aryl groups are more preferable, and a methyl group or ethyl group is particularly preferable. That is, R 1 is particularly preferably a methoxy group or an ethoxy group. R 1 is -M (R 2) n O when treated with an alkaline rinse solution - is preferably one that ionized.
  • R 2 represents a hydrocarbon group, OR 3 or a halogen atom.
  • R 3 is as described above, and the preferred range is also the same.
  • R 2 is preferably OR 3 or a halogen atom, and more preferably OR 3 .
  • N is 2 when M is Si.
  • a plurality of R 2 may be the same or different, and is not particularly limited.
  • N is 2 when M is Ti.
  • M is Ti, a plurality of R 2 may be the same or different and are not particularly limited.
  • n represents 1.
  • the compound (I) may be one in which a group represented by the above formula (I) is introduced into the polymer by reaction with a polymer, and has a group represented by the above formula (I) before the reaction, A group represented by the above formula (I) may be introduced into the polymer.
  • M is Si
  • a silane coupling agent is a compound having a group capable of reacting with an inorganic component such as an alkoxysilyl group and a group capable of reacting with an organic component such as a methacryloyl group, and capable of binding the inorganic component and the organic component. is there.
  • Compound (I) has a reactive group such as a vinyl group, an epoxy group, a methacryloyloxy group, an acryloyloxy group, a mercapto group, and an amino group, and reacts with the polymer with the reactive group, whereby the polymer has the formula (I It is also preferred that a group represented by
  • silane coupling agent examples include vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -Glycidoxypropylmethyldiethoxysilane, ⁇ -glycidoxypropyltriethoxysilane, ⁇ -methacryloxypropylmethyldimethoxysilane, ⁇ -methacryloxypropyltrimethoxysilane, ⁇ -methacryloxypropylmethyldiethoxysilane, ⁇ - Methacryloxypropyltriethoxysilane, ⁇ -acryloxypropyltrimethoxysilane, N- ( ⁇ -aminoethyl) - ⁇ -aminopropylmethyldimethoxysilane, N- ( ⁇ -aminoethyl)
  • the compound (I) a compound having a plurality of groups represented by the formula (I) is also preferably used.
  • the group represented by the formula (I) can be introduced into the polymer by reacting a part of the group represented by the formula (I) with the polymer.
  • the R 1 group and optionally the R 2 group of compound (I) reacts with an atom and / or group (eg, hydroxyl group (—OH)) capable of reacting with the compound in the polymer (eg, alcohol exchange). react.
  • the compound (I) when a plurality of groups represented by the formula (I) are bonded to the polymer, the compound (I) also functions as a crosslinking agent and can form a crosslinked structure.
  • Such a compound (I) is preferably a compound having a plurality of groups represented by the formula (I), preferably a compound having 2 to 6 groups represented by the formula (I). More preferred is a compound having 2 to 3 groups represented by the formula (I). Although the compounds shown below are preferred, the present invention is not limited to these compounds.
  • R represents a partial structure selected from the following structures.
  • R and R 1 may be the same or different from each other, and are preferably the same in terms of synthesis suitability.
  • R represents a partial structure shown below.
  • R 1 has the same meaning as described above. When a plurality of R and R 1 are present in the molecule, these may be the same or different from each other, and are preferably the same in terms of synthesis suitability.
  • silica particles, titanium oxide particles, aluminum oxide particles and the like can also be used as the compound (I). These particles can react with a polymer described later to introduce a group represented by the above formula (I) into the polymer.
  • —SiOH is introduced by a reaction between silica particles and a polymer described later.
  • titanium coupling agents include Ajinomoto Fine Techno Co., Ltd. Preneact, Matsumoto Fine Chemical Co., Ltd. Titanium Tetraisopropoxide, Nippon Soda Co., Ltd. Titanium-i-propoxybis (acetylacetonato) titanium.
  • acetoalkoxyaluminum diisopropylate is exemplified.
  • said compound (I) may be used individually by 1 type, and may use 2 or more types together.
  • the content of the compound (I) contained in the resin composition for a relief forming layer is preferably 0.1 to 80% by weight, more preferably 1 to 40% by weight in terms of solid content. Preferably, it is 5 to 30% by weight.
  • the relief forming layer coating liquid preferably contains a polymerizable compound in order to form the crosslinked structure.
  • the polymerizable compound that can be used here can be arbitrarily selected from compounds having at least one ethylenically unsaturated group, preferably two or more, and more preferably 2-6.
  • a compound having only one ethylenically unsaturated group (monofunctional polymerizable compound, monofunctional monomer) from the viewpoint of film properties such as flexibility and brittleness ) May be used.
  • a compound (monofunctional monomer) having one ethylenically unsaturated group in the molecule and a compound (polyfunctional monomer) having two or more ethylenically unsaturated groups in the molecule used as a polymerizable compound explain. Since the relief forming layer is required to have a crosslinked structure in the film, a polyfunctional monomer is preferably used. The molecular weight of these polyfunctional monomers is preferably 200 to 2,000.
  • monofunctional monomers and polyfunctional monomers include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) and esters of polyhydric alcohol compounds, unsaturated carboxylic acids, Examples include amides with polyvalent amine compounds.
  • a compound having a sulfur atom in the molecule is preferably used as the polymerizable compound.
  • numerator from a viewpoint of engraving sensitivity improvement, it has two or more ethylenically unsaturated bonds especially, and connects between two ethylenically unsaturated bonds among them.
  • a polymerizable compound having a carbon-sulfur bond at the site hereinafter also referred to as “sulfur-containing polyfunctional monomer” as appropriate).
  • Examples of the functional group containing a carbon-sulfur bond in the sulfur-containing polyfunctional monomer in the present invention include sulfide, disulfide, sulfoxide, sulfonyl, sulfonamide, thiocarbonyl, thiocarboxylic acid, dithiocarboxylic acid, sulfamic acid, thioamide, and thiocarbamate. , Functional groups containing dithiocarbamate, or thiourea.
  • the number of sulfur atoms contained in the molecule of the sulfur-containing polyfunctional monomer is not particularly limited as long as it is 1 or more, and can be appropriately selected according to the purpose.
  • engraving sensitivity and solubility in a coating solvent are not limited.
  • 1 to 10 is preferable, 1 to 5 is more preferable, and 1 to 2 is still more preferable.
  • the number of ethylenically unsaturated groups contained in the molecule is not particularly limited as long as it is 2 or more, and can be appropriately selected according to the purpose. -10 are preferable, 2-6 are more preferable, and 2-4 are more preferable.
  • the molecular weight of the sulfur-containing polyfunctional monomer in the present invention is preferably 120 to 3,000, more preferably 120 to 1,500, from the viewpoint of the flexibility of the formed film.
  • the sulfur-containing polyfunctional monomer in this invention may be used independently, you may use it as a mixture with the polyfunctional polymerizable compound and monofunctional polymerizable compound which do not have a sulfur atom in a molecule
  • film properties such as brittleness and flexibility can be adjusted by using a polymerizable compound such as a sulfur-containing polyfunctional monomer.
  • the total content of the polymerizable compound including the sulfur-containing polyfunctional monomer in the relief forming layer is preferably 10 to 60% by weight with respect to the nonvolatile component from the viewpoint of flexibility and brittleness of the crosslinked film. A range of 15 to 45% by weight is more preferable.
  • a sulfur-containing polyfunctional monomer and another polymeric compound 5 weight% or more is preferable and, as for the quantity of the sulfur-containing polyfunctional monomer in all the polymeric compounds, 10 weight% or more is more preferable.
  • aprotic organic solvent examples include acetonitrile, tetrahydrofuran, dioxane, toluene, propylene glycol monomethyl ether acetate, methyl ethyl ketone, acetone, methyl isobutyl ketone, ethyl acetate, butyl acetate, ethyl lactate, N, N-dimethylacetamide, N-methylpyrrolidone and dimethyl sulfoxide.
  • protic organic solvent examples include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 1-methoxy-2-propanol, ethylene glycol, diethylene glycol, and 1,3-propanediol.
  • Alcohol exchange reaction catalyst When compound (I) is used in the resin composition, it is preferable to contain an alcohol exchange reaction catalyst in order to promote the reaction between compound (I) and the specific binder polymer.
  • the alcohol exchange reaction catalyst can be applied without limitation as long as it is a commonly used reaction catalyst.
  • an acid or basic catalyst which is a typical alcohol exchange reaction catalyst, and a metal complex catalyst will be sequentially described.
  • an acid or a basic compound is used as it is, or a catalyst dissolved in a solvent such as water or an organic solvent (hereinafter referred to as an acidic catalyst and a basic catalyst, respectively).
  • concentration at the time of dissolving in the solvent is not particularly limited, and may be appropriately selected according to the characteristics of the acid or basic compound used, the desired content of the catalyst, and the like.
  • the type of acidic catalyst or basic catalyst is not particularly limited.
  • examples of the acidic catalyst include hydrogen halides such as hydrochloric acid, nitric acid, sulfuric acid, sulfurous acid, hydrogen sulfide, perchloric acid, hydrogen peroxide, carbonic acid
  • examples of the basic catalyst include carboxylic acids such as formic acid and acetic acid, substituted carboxylic acids obtained by substituting R in the structural formula represented by RCOOH with other elements or substituents, sulfonic acids such as benzenesulfonic acid, and phosphoric acid.
  • ammoniacal bases such as aqueous ammonia and amines such as ethylamine and aniline.
  • methanesulfonic acid, p-toluenesulfonic acid, pyridinium p-toluenesulfonate, phosphoric acid, phosphonic acid, and acetic acid are preferable, and methanesulfonic acid, p-toluenesulfonic acid Phosphoric acid is particularly preferred.
  • the metal complex catalyst used as the alcohol exchange reaction catalyst in the present invention is preferably a metal element selected from the group consisting of Groups 2, 4, 5 and 13 of the periodic table and ⁇ -diketone (acetylacetone is preferred), It is composed of an oxo or hydroxy oxygen compound selected from the group consisting of ketoesters, hydroxycarboxylic acids or esters thereof, amino alcohols, and enolic active hydrogen compounds.
  • group 2 elements such as Mg, Ca, St, and Ba
  • group 4 elements such as Ti and Zr
  • group 5 elements such as V, Nb, and Ta
  • 13 such as Al and Ga.
  • Group elements are preferred and each form a complex with an excellent catalytic effect.
  • complexes obtained from Zr, Al, or Ti are excellent, and ethyl orthotitanate is particularly preferable. These are excellent in stability in aqueous coating solutions and in gelation promoting effect in sol-gel reaction during heating and drying.
  • the resin composition only one alcohol exchange reaction catalyst may be used, or two or more kinds may be used in combination.
  • the content of the alcohol exchange reaction catalyst in the resin composition is preferably 0.01 to 20% by weight, more preferably 0.1 to 10% by weight, based on the polymer having a hydroxyl group.
  • the resin composition for laser engraving preferably contains a polymerization initiator, and more preferably uses a compound having an ethylenically unsaturated group and a polymerization initiator in combination.
  • a well-known thing can be used for a polymerization initiator without a restriction
  • the radical polymerization initiator which is a preferable polymerization initiator is explained in full detail, this invention is not restrict
  • preferred radical polymerization initiators include (a) aromatic ketones, (b) onium salt compounds, (c) organic peroxides, (d) thio compounds, (e) hexaarylbiimidazole compounds, (F) ketoxime ester compound, (g) borate compound, (h) azinium compound, (i) metallocene compound, (j) active ester compound, (k) compound having carbon halogen bond, (l) azo compound, etc. Is mentioned. Specific examples of the above (a) to (l) are given below, but the present invention is not limited to these.
  • an organic peroxide and (l) an azo compound are more preferable.
  • an organic peroxide is particularly preferable.
  • the polymerization initiator can be roughly classified into a photopolymerization initiator and a thermal polymerization initiator.
  • a thermal polymerization initiator is preferably used from the viewpoint of improving the degree of crosslinking.
  • an organic peroxide and (l) an azo compound are preferably used as the thermal polymerization initiator. In particular, the following compounds are preferred.
  • organic peroxide As a radical polymerization initiator that can be used in the present invention, preferred (c) organic peroxide is 3,3′4,4′-tetra (t-butylperoxycarbonyl) benzophenone. 3,3′4,4′-tetra (t-amylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra (t-hexylperoxycarbonyl) benzophenone, 3,3′4,4′- Tetra (t-octylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra (cumylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra (p-isopropylcumylperoxycarbonyl) benzophenone, Peroxide esters such as di-t-butyldiperoxyisophthalate are preferred.
  • (L) Azo-based compound As a radical polymerization initiator that can be used in the present invention, preferred (l) azo-based compounds include 2,2′-azobisisobutyronitrile, 2,2′-azobispropio Nitrile, 1,1′-azobis (cyclohexane-1-carbonitrile), 2,2′-azobis (2-methylbutyronitrile), 2,2′-azobis (2,4-dimethylvaleronitrile), 2, 2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), 4,4′-azobis (4-cyanovaleric acid), dimethyl 2,2′-azobisisobutyrate, 2,2′-azobis (2- Methylpropionamidooxime), 2,2′-azobis [2- (2-imidazolin-2-yl) propane], 2,2′-azobis ⁇ 2-methyl-N- [1,1-bis (hydroxymethyl)] - -Hydroxyethyl] propionamide ⁇ , 2,2
  • the polymerization initiator in the present invention may be used alone or in combination of two or more.
  • the polymerization initiator can be added in a proportion of preferably 0.01 to 10% by weight, more preferably 0.1 to 3% by weight, based on the total solid content of the resin composition for laser engraving.
  • the resin composition for laser engraving and the relief layer of the relief printing plate precursor may contain known additives in addition to those described above.
  • the resin composition for laser engraving is more preferably added with nitrocellulose or a highly thermally conductive substance as an additive for improving engraving sensitivity. Since nitrocellulose is a self-reactive compound, it generates heat during laser engraving and assists in the thermal decomposition of coexisting polymers such as hydrophilic polymers. As a result, it is estimated that the engraving sensitivity is improved.
  • the high thermal conductive material is added for the purpose of assisting heat transfer, and examples of the thermal conductive material include inorganic compounds such as metal particles and organic compounds such as conductive polymers.
  • the metal particles gold fine particles, silver fine particles, and copper fine particles having a particle size of micrometer order to several nanometers order are preferable.
  • the conductive polymer a conjugated polymer is particularly preferable, and specific examples include polyaniline and polythiophene.
  • the sensitivity at the time of photocuring the resin composition for laser engraving can be further improved by using a co-sensitizer.
  • a colorant such as a dye or pigment may be added for the purpose of coloring the resin composition for laser engraving. Thereby, properties such as the visibility of the image portion and the suitability of the image density measuring device can be improved.
  • a known additive such as a filler may be added.
  • Examples 1-1 to 1-25 and Comparative Examples were carried out with the types of surfactants (W agents) and / or solvents listed in Tables 2 to 5, and the addition concentrations and pH.
  • the rinsing liquids for relief printing plate making of 1-1 to 1-5 and Examples 2-1 to 2-27 and Comparative Example 2-1 were prepared. If necessary, the pH of the rinse solution was adjusted to the alkaline side by adding sodium hydroxide.
  • the addition of the antifoaming agent in the formulation examples 1 and 2 mainly suppresses foaming during the preparation of the rinsing liquid such as stirring and filling into the bottle, and brushing during the rinsing process This is to suppress foaming at the time.
  • ⁇ Prescription Example 1> ⁇ Water (main component, the remainder of the ingredients listed below) ⁇ Sodium hydroxide (solid) ⁇ Surfactants and / or solvents listed in Tables 2 to 5 (contents listed in Tables 2 to 5) ⁇ TSA731 (0.07% by weight, antifoaming agent, silicone antifoaming agent manufactured by Toray Dow Corning Co., Ltd.)
  • ⁇ Prescription Example 2> ⁇ Water (main component, the remainder of the ingredients listed below) ⁇ Potassium hydroxide (solid) ⁇ Surfactants and / or solvents listed in Tables 2 to 5 (contents listed in Tables 2 to 5) ⁇ TSA739 (0.15% by weight, antifoaming agent, silicone antifoaming agent manufactured by Toray Dow Corning Co., Ltd.)
  • ⁇ Preparation of relief printing plate precursor 1> 1. Preparation of resin composition for laser engraving In a three-necked flask equipped with a stirring blade and a cooling tube, 50 parts by weight of GOHSENAL T-215 (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., water-soluble PVA) as a specific polymer, as a solvent 47 parts by weight of propylene glycol monomethyl ether acetate was added and heated at 70 ° C. for 120 minutes with stirring to dissolve the polymer.
  • GOHSENAL T-215 manufactured by Nippon Synthetic Chemical Industry Co., Ltd., water-soluble PVA
  • Et represents an ethyl group.
  • Preparation of relief printing plate precursor for laser engraving Place a spacer (frame) of a predetermined thickness on a PET substrate, and gently cast the relief-forming layer coating solution obtained above from the spacer (frame). Then, it was dried in an oven at 90 ° C. for 3 hours to provide a relief forming layer having a thickness of about 1 mm to prepare a relief printing plate precursor 1 for laser engraving.
  • a relief coating plate precursor 2 for laser engraving was prepared.
  • ⁇ Preparation of relief printing plate precursor 4> In a three-necked flask equipped with a stirring blade and a condenser tube, 50 parts by weight of ELASTOSIL (registered trademark: type R300 / 30S, Wacker silicone rubber) and 47 parts by weight of tetrahydrofuran as a solvent are stirred and stirred to dissolve the polymer. I let you. Thereafter, 0.8 parts by weight of carbon black (Show Black N110, manufactured by Cabot Japan Co., Ltd., DBP oil absorption 115 ml / 100 g) was added as a photothermal conversion agent and stirred for 30 minutes. By this operation, a fluid coating solution for a relief forming layer (laser engraving resin composition) was obtained. A relief forming layer coating solution was prepared by the same method as the preparation of the relief printing plate precursor 1 except that the relief forming layer coating solution was used, and a relief printing plate precursor 4 for laser engraving was prepared.
  • ELASTOSIL registered trademark: type R300 / 30S
  • ⁇ Preparation of relief printing plate> The relief forming layer of the obtained relief printing plate precursor for laser engraving was heated at 80 ° C. for 3 hours and further at 100 ° C. for 3 hours to thermally crosslink the relief forming layer.
  • the relief forming layer after crosslinking was engraved with a carbon dioxide laser (CO 2 laser) or a semiconductor laser with a fiber to obtain a relief printing plate.
  • the thickness of the relief layer which the obtained relief printing plate has was about 1 mm.
  • ⁇ Carbon dioxide laser engraving> As a carbon dioxide laser engraving machine, engraving by laser irradiation was performed using a high-quality CO 2 laser marker ML-9100 series (manufactured by Keyence Corporation).
  • a carbon dioxide laser engraving machine is used to raster engrave a 1 cm square solid part under the conditions of output: 12 W, head speed: 200 mm / sec, pitch setting: 2,400 DPI did.
  • ⁇ Semiconductor laser engraving with fiber> A laser recording apparatus equipped with a fiber-coupled semiconductor laser (FC-LD) SDL-6390 (manufactured by JDSU, wavelength 915 nm) was used as a fiber-coupled semiconductor laser engraving machine.
  • FC-LD fiber-coupled semiconductor laser
  • SDL-6390 manufactured by JDSU, wavelength 915 nm
  • Examples 1-1 to 1-25 and Comparative Examples 1-1 to 1- 1 were prepared by using the relief printing plate precursors listed in Tables 2 to 5 engraved with the carbon dioxide laser or the semiconductor laser with fiber. 5 and the rinsing solutions for relief printing plate making of Examples 2-1 to 2-27 and Comparative Example 2-1 were evaluated as follows.
  • ⁇ Rinse evaluation> The rinsing liquid was applied to the engraved relief printing plate at about 200 mL / m 2, and the engraved portion was rubbed 15 times in the vertical and horizontal directions with a toothbrush (manufactured by Lion Corporation, Clinica Habrush Flat). Then, when observed with an optical microscope, the relief layer with no debris was 6, 6 with little remaining, 3 with a little remaining (allowable level), 1 with no debris removed, An intermediate evaluation between 5 and 3 was 4, and an intermediate evaluation between 4, 3 and 1 was 2.
  • the nonionic surfactant, the anionic surfactant, and the nonionic surfactant used as the surfactant contained in the rinse liquid are as follows.
  • the nonionic surfactant has a predetermined alkyl group R and EO chain length (n, m + n, or l + m + n) among the nonionic surfactants represented by the formulas (1-1) to (1-6). Is.
  • the alkyl groups R in these nonionic surfactants are all linear.
  • the anionic surfactant is an anionic surfactant represented by the following formula (2-6-1) and formula (2-11).
  • the alkyl group C 4 H 9 is an isobutyl group
  • C 8 H 17 is linear. belongs to.
  • the cationic surfactant is a cationic surfactant represented by the following formula (3-4).
  • the alkyl group C 12 H 25 in this cationic surfactant is linear.
  • the solvent used in the rinse liquid is any one of the solvents S-1 to S-45.
  • Et represents an ethyl group.

Abstract

Disclosed is a method for producing a relief printing plate, wherein a rinsing liquid for the production of a relief printing plate, which is capable of easily removing dust produced on the printing plate during the engraving and has a small effect on the relief printing plate, is used. Specifically disclosed is a method for producing a relief printing plate, which is characterized by comprising, in the following order: a step of preparing a relief printing original plate that has, on a supporting body, a relief-forming layer containing a non-elastomer binder polymer, a plasticizer and a photothermal converter; a step of engraving the relief printing original plate by exposure to light using a laser; and a step of removing engraving dust with a rinsing liquid for the production of a relief printing plate, said dust being produced by the engraving. The method for producing a relief printing plate is also characterized in that the rinsing liquid for the production of a relief printing plate contains a nonionic surfactant.

Description

レリーフ印刷版の製版方法Making a relief printing plate
 本発明は、レリーフ印刷版の製版方法に関する。 The present invention relates to a method for making a relief printing plate.
 レリーフ印刷版の製版方法として、レリーフ印刷版原版のレリーフ形成層をレーザーにより直接彫刻し製版する、いわゆる「直彫りCTP方式」が多く提案されている(特許文献1等参照。)。かかる製版方法においては、レーザーによる彫刻後、彫刻の際に生じた彫刻カスを洗浄液により除去することが行われている(例えば、特許文献2参照。)。
 彫刻後のカスのリンス性を向上させる技術としては、レリーフ形成層に多孔質無機微粒子を含有させ、該粒子に液状カスを吸着させ、除去性を向上させる技術が提案されている(例えば、特許文献3参照。)。
 また、特許文献4に記載の実施例では、彫刻カスをアルカリ洗浄液で洗浄する態様も開示されている。
As a plate making method of a relief printing plate, many so-called “direct engraving CTP methods” have been proposed in which a relief forming layer of a relief printing plate precursor is directly engraved with a laser to make a plate (see Patent Document 1, etc.). In such a plate making method, engraving debris generated during engraving is removed with a cleaning solution after engraving with a laser (see, for example, Patent Document 2).
As a technique for improving the rinsing property of debris after engraving, a technique has been proposed in which porous inorganic fine particles are contained in a relief forming layer, and liquid debris is adsorbed on the particles to improve removability (for example, patents). Reference 3).
Moreover, in the Example described in Patent Document 4, an aspect in which engraving residue is cleaned with an alkaline cleaning solution is also disclosed.
米国特許第5798202号明細書US Pat. No. 5,798,202 米国特許出願公開第2008/0061036号明細書US Patent Application Publication No. 2008/0061036 特開2004-174758号公報JP 2004-174758 A 国際公開第2009/084682号パンフレットInternational Publication No. 2009/084682 Pamphlet
 しかしながら、従来のレリーフ印刷版の製版方法において用いられているリンス液では、彫刻時に発生する版上のカスを十分に除去することが困難であった。さらには、レリーフ印刷版のレリーフ層がリンス液を吸収して膨潤するなどして、リンス液によりレリーフ印刷版が大きな影響を受けてしまう場合もあった。 However, with the rinsing liquid used in the conventional method for making a relief printing plate, it has been difficult to sufficiently remove the residue on the plate generated during engraving. Furthermore, the relief printing plate may be greatly affected by the rinsing liquid because the relief layer of the relief printing plate absorbs the rinsing liquid and swells.
 本発明の目的は、彫刻時に発生する版上のカスを容易に除去可能であり、レリーフ印刷版への影響が小さいレリーフ印刷版製版用リンス液を用いたレリーフ印刷版の製版方法を提供することである。 An object of the present invention is to provide a plate making method of a relief printing plate using a rinsing liquid for relief printing plate making, which can easily remove the residue on the plate generated during engraving and has a small influence on the relief printing plate. It is.
 本発明の上記課題は、以下の<1>又は<5>に記載の手段により解決された。好ましい実施態様である<2>~<4>及び<6>~<11>とともに以下に記載する。
 <1>非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を含有するレリーフ形成層を支持体上に有するレリーフ印刷版原版を準備する工程、前記レリーフ印刷版原版を、レーザーを用いた露光により彫刻する工程、並びに、彫刻により発生した彫刻カスをレリーフ印刷版製版用リンス液で除去する工程、をこの順で有し、前記レリーフ印刷版製版用リンス液が、ノニオン界面活性剤を含有することを特徴とするレリーフ印刷版の製版方法、
 <2>前記レリーフ印刷版製版用リンス液が、下記式(1-1)~式(1-6)で表される化合物よりなる群から選ばれたノニオン界面活性剤を少なくとも1種含有する上記<1>に記載のレリーフ印刷版の製版方法、
The above-described problems of the present invention have been solved by the means described in <1> or <5> below. It is described below together with <2> to <4> and <6> to <11>, which are preferred embodiments.
<1> A step of preparing a relief printing plate precursor having a relief-forming layer containing a non-elastomer binder polymer, a plasticizer, and a photothermal conversion agent on a support, and the relief printing plate precursor is exposed by laser exposure. A step of engraving and a step of removing engraving residue generated by engraving with a rinsing liquid for relief printing plate making in this order, and the rinsing liquid for relief printing plate making contains a nonionic surfactant A method for making a relief printing plate characterized by
<2> The above-mentioned rinsing liquid for making a relief printing plate contains at least one nonionic surfactant selected from the group consisting of compounds represented by the following formulas (1-1) to (1-6): The plate making method of the relief printing plate as described in <1>,
Figure JPOXMLDOC01-appb-C000002
 (式(1-1)、及び式(1-3)~式(1-5)中、Rは炭素数6~23のアルキル基を表し、式(1-1)中、nは3~100の整数を表し、式(1-2)中、nは3~30の整数を表し、式(1-3)及び式(1-4)中、m及びnはそれぞれ、3≦m+n≦50を満たし、かつ0以上の整数を表し、式(1-5)及び式(1-6)中、Xは水素原子又はメチル基を表し、式(1-5)中、nは3~50の整数を表し、式(1-6)中、l、m、及びnはそれぞれ独立に、2~30の整数を表す。)
Figure JPOXMLDOC01-appb-C000002
(In the formula (1-1) and the formulas (1-3) to (1-5), R represents an alkyl group having 6 to 23 carbon atoms, and in the formula (1-1), n is 3 to 100. In formula (1-2), n represents an integer of 3 to 30, and in formulas (1-3) and (1-4), m and n each satisfy 3 ≦ m + n ≦ 50. And in formulas (1-5) and (1-6), X represents a hydrogen atom or a methyl group, and in formula (1-5), n is an integer of 3 to 50 In formula (1-6), l, m and n each independently represents an integer of 2 to 30.)
 <3>前記レリーフ印刷版製版用リンス液における前記ノニオン界面活性剤の含有量が、0.1~20重量%である上記<1>又は<2>に記載のレリーフ印刷版の製版方法、
 <4>前記レリーフ印刷版製版用リンス液が、アルコール系溶剤、エーテル系溶剤、グリコール系溶剤、及びグリコールエーテル系溶剤よりなる群から選択された少なくとも1種の溶剤を含有する上記<1>~<3>のいずれか1つに記載のレリーフ印刷版の製版方法、
 <5>非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を含有するレリーフ形成層を支持体上に有するレリーフ印刷版原版を準備する工程、前記レリーフ印刷版原版を、レーザーを用いた露光により彫刻する工程、並びに、彫刻により発生した彫刻カスをレリーフ印刷版製版用リンス液で除去する工程、をこの順で有し、前記レリーフ印刷版製版用リンス液が、アルコール系溶剤、エーテル系溶剤、グリコール系溶剤、及びグリコールエーテル系溶剤よりなる群から選択された少なくとも1種の溶剤を含有することを特徴とするレリーフ印刷版の製版方法、
 <6>前記レリーフ印刷版製版用リンス液における前記溶剤の含有量が、1~40重量%である上記<4>又は<5>に記載のレリーフ印刷版の製版方法、
 <7>前記レリーフ印刷版製版用リンス液のpHが9以上である上記<1>~<6>のいずれか1つに記載のレリーフ印刷版の製版方法、
 <8>前記バインダーポリマーが、ポリビニルブチラール及び/又はその誘導体である上記<1>~<7>のいずれか1つに記載のレリーフ印刷版の製版方法、
 <9>前記レリーフ形成層が、下記式(I)で表される基を含む化合物を含有する上記<1>~<8>のいずれか1つに記載のレリーフ印刷版の製版方法、
    *-M(R1)(R2n   (I)
 (式(I)中、R1はOR3又はハロゲン原子を表し、MはSi、Ti又はAlを表し、MがSiであるときnは2であり、MがTiであるときnは2であり、MがAlであるときnは1であり、n個あるR2はそれぞれ独立に炭化水素基、OR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、*は、他の構造との結合位置を表す。)
 <10>前記レリーフ形成層が、下記式(i)で表される基を含む化合物を含有する上記<9>に記載のレリーフ印刷版の製版方法、
    *-Si(OR3)(R22   (i)
 (式(i)中、2個あるR2はそれぞれ独立に炭化水素基、OR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、*は、他の構造との結合位置を表す。)
 <11>前記彫刻する工程が、前記レリーフ印刷版原版を最大波長が700~1,300nmのファイバー付き半導体レーザーを用いて走査露光により露光領域を彫刻する工程である、上記<1>~<10>のいずれか1つに記載のレリーフ印刷版の製版方法。
<3> The method for making a relief printing plate according to <1> or <2> above, wherein the content of the nonionic surfactant in the rinsing liquid for relief printing plate making is 0.1 to 20% by weight,
<4> The above-mentioned <1> to <1>, wherein the rinsing liquid for relief printing plate making contains at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents. <3> A method for making a relief printing plate according to any one of the above,
<5> A step of preparing a relief printing plate precursor having a relief-forming layer containing a non-elastomer binder polymer, a plasticizer, and a photothermal conversion agent on a support, and the relief printing plate precursor is exposed by laser exposure. A step of engraving, and a step of removing engraving residue generated by engraving with a rinsing liquid for relief printing plate making in this order, wherein the rinsing liquid for relief printing plate making comprises an alcohol solvent, an ether solvent, A process for making a relief printing plate comprising a glycol solvent and at least one solvent selected from the group consisting of glycol ether solvents,
<6> The method for making a relief printing plate according to the above <4> or <5>, wherein the content of the solvent in the rinsing liquid for making a relief printing plate is 1 to 40% by weight,
<7> The method for making a relief printing plate according to any one of the above <1> to <6>, wherein the pH of the rinsing liquid for relief printing plate making is 9 or more,
<8> The method for making a relief printing plate according to any one of the above <1> to <7>, wherein the binder polymer is polyvinyl butyral and / or a derivative thereof,
<9> The method for making a relief printing plate according to any one of the above <1> to <8>, wherein the relief forming layer contains a compound containing a group represented by the following formula (I):
* -M (R 1 ) (R 2 ) n (I)
(In the formula (I), R 1 represents OR 3 or a halogen atom, M represents Si, Ti, or Al. When M is Si, n is 2, and when M is Ti, n is 2. And when M is Al, n is 1, each R 2 independently represents a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * (Represents the bonding position with other structures)
<10> The plate making method of a relief printing plate according to <9>, wherein the relief forming layer contains a compound containing a group represented by the following formula (i):
* -Si (OR 3 ) (R 2 ) 2 (i)
(In formula (i), two R 2 s each independently represent a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * represents a bonding position with another structure. Represents.)
<11> The above-mentioned <1> to <10, wherein the engraving step is a step of engraving an exposed area by scanning exposure of the relief printing plate precursor using a fiber-coupled semiconductor laser having a maximum wavelength of 700 to 1,300 nm. The plate making method of the relief printing plate as described in any one of>.
 本発明によれば、彫刻時に発生する版上のカスを容易に除去可能であり、レリーフ印刷版への影響が小さいレリーフ印刷版製版用リンス液を用いたレリーフ印刷版の製版方法を提供することができた。 According to the present invention, there is provided a plate making method of a relief printing plate using a rinsing liquid for making a relief printing plate, which can easily remove the residue on the plate generated during engraving and has little influence on the relief printing plate. I was able to.
 本発明のレリーフ印刷版の製版方法は、非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を含有するレリーフ形成層を支持体上に有するレーザー彫刻用レリーフ印刷版原版を準備する工程、前記レーザー彫刻用レリーフ印刷版原版をレーザーを用いた露光により彫刻する工程、並びに、彫刻により発生した彫刻カスをレリーフ印刷版製版用リンス液で除去する工程、をこの順で有し、前記レリーフ印刷版製版用リンス液が、ノニオン界面活性剤、及び/又は、アルコール系溶剤、エーテル系溶剤、グリコール系溶剤、及びグリコールエーテル系溶剤よりなる群から選択された少なくとも1種の溶剤(以下、特定溶剤ともいう。)を含有することを特徴とする。
 以下、まず本発明のレリーフ印刷版の製版方法において用いられるレリーフ印刷版製版用リンス液について説明する。
 なお、本発明において、数値範囲を表す「下限~上限」の記載は、「下限以上、上限以下」を表し、「上限~下限」の記載は、「上限以下、下限以上」を表す。すなわち、上限及び下限を含む数値範囲を表す。
The method for making a relief printing plate of the present invention comprises a step of preparing a relief printing plate precursor for laser engraving having a relief forming layer containing a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent on a support, the laser The relief printing plate making includes the steps of engraving the relief printing plate precursor for engraving by exposure using a laser, and removing the engraving residue generated by engraving with a rinse solution for relief printing plate making in this order. The rinsing liquid for use is a nonionic surfactant and / or at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents (hereinafter also referred to as specific solvents). .).
Hereinafter, the rinsing liquid for relief printing plate making used in the method for making a relief printing plate of the present invention will be described first.
In the present invention, the description of “lower limit to upper limit” representing a numerical range represents “lower limit or higher and lower limit or lower”, and the description of “upper limit to lower limit” represents “lower limit or higher and lower limit or higher”. That is, it represents a numerical range including an upper limit and a lower limit.
(レリーフ印刷版製版用リンス液)
 本発明において使用されるレリーフ印刷版製版用リンス液(以下、「本発明のレリーフ印刷版製版用リンス液」、「本発明のリンス液」、又は、単に「リンス液」ともいう。)は、ノニオン界面活性剤、及び/又は、特定溶剤を含有することを特徴とする。
 前記レリーフ印刷版製版用リンス液は、下記式(1-1)~式(1-6)で表される化合物よりなる群から選ばれたノニオン界面活性剤を少なくとも1種含有することが好ましい。
(Rinse for relief printing plate making)
The rinsing liquid for relief printing plate making used in the present invention (hereinafter also referred to as “the rinsing liquid for relief printing plate making of the present invention”, “the rinsing liquid of the present invention”, or simply “the rinsing liquid”), It contains a nonionic surfactant and / or a specific solvent.
The rinsing liquid for relief printing plate making preferably contains at least one nonionic surfactant selected from the group consisting of compounds represented by the following formulas (1-1) to (1-6).
Figure JPOXMLDOC01-appb-C000003
(式(1-1)、及び式(1-3)~式(1-5)中、Rは炭素数6~23のアルキル基を表し、式(1-1)中、nは3~100の整数を表し、式(1-2)中、nは3~30の整数を表し、式(1-3)及び式(1-4)中、m及びnはそれぞれ、3≦m+n≦50を満たし、かつ0以上の整数を表し、式(1-5)及び式(1-6)中、Xは水素原子又はメチル基を表し、式(1-5)中、nは3~50の整数を表し、式(1-6)中、l、m、及びnはそれぞれ独立に、2~30の整数を表す。)
Figure JPOXMLDOC01-appb-C000003
(In the formula (1-1) and the formulas (1-3) to (1-5), R represents an alkyl group having 6 to 23 carbon atoms, and in the formula (1-1), n is 3 to 100. In formula (1-2), n represents an integer of 3 to 30, and in formulas (1-3) and (1-4), m and n each satisfy 3 ≦ m + n ≦ 50. And in formulas (1-5) and (1-6), X represents a hydrogen atom or a methyl group, and in formula (1-5), n is an integer of 3 to 50 In formula (1-6), l, m and n each independently represents an integer of 2 to 30.)
<式(1-1)~式(1-6)で表される化合物>
 本発明のレリーフ印刷版製版用リンス液は、ノニオン界面活性剤(非イオン性界面活性剤)として、前記式(1-1)~式(1-6)で表される化合物よりなる群から選ばれた少なくとも1種を含有することが好ましい。
 また、本発明のレリーフ印刷版製版用リンス液は、前記式(1-1)~式(1-6)で表される化合物のうちのいずれか1種単独で使用しても、2種以上を併用してもよい。
<Compounds Represented by Formula (1-1) to Formula (1-6)>
The rinsing liquid for relief printing plate making of the present invention is selected from the group consisting of compounds represented by the above formulas (1-1) to (1-6) as a nonionic surfactant (nonionic surfactant). It is preferable to contain at least one selected from the above.
In addition, the rinsing liquid for relief printing plate making of the present invention may be used alone or in combination of any one of the compounds represented by the formulas (1-1) to (1-6). May be used in combination.
 前記式(1-1)、及び式(1-3)~式(1-5)におけるRは炭素数6~23のアルキル基を表し、R中の炭素数は、6~20であることが好ましく、8~18であることがより好ましい。Rで表されるアルキル基は、直鎖状であっても、分岐を有していてもよい。 In the formula (1-1) and the formulas (1-3) to (1-5), R represents an alkyl group having 6 to 23 carbon atoms, and the carbon number in R is 6 to 20 Preferably, it is 8-18. The alkyl group represented by R may be linear or branched.
 また、前記式(1-5)及び式(1-6)におけるXは、水素原子又はメチル基を表す。なお、分子内に複数のXが存在する式(1-6)の場合、複数存在するXは互いに同じでも異なっていてもよい。 In the formula (1-5) and formula (1-6), X represents a hydrogen atom or a methyl group. In the formula (1-6) in which a plurality of X are present in the molecule, the plurality of X may be the same or different from each other.
 前記式(1-1)~式(1-6)におけるl、m、又はnは、エチレンオキシド基(EO基)単位の繰り返し数を表す。
 前記式(1-1)におけるnは3~100の整数を表し、4~30の整数であることが好ましく、4~18の整数であることがより好ましい。
 前記式(1-2)におけるnは3~30の整数を表し、5~23の整数であることが好ましく、7~18の整数であることがより好ましい。
 前記式(1-3)及び式(1-4)におけるm及びnはそれぞれ、3≦m+n≦50を満たし、かつ0以上の整数を表し、4≦m+n≦30を満たすことが好ましく、8≦m+n≦20を満たすことがより好ましい。
 前記式(1-5)におけるnは3~50の整数を表し、5~50の整数であることが好ましく、10~50の整数であることがより好ましい。
 前記式(1-6)におけるl、m、及びnはそれぞれ独立に、2~30の整数を表し、10≦l+m+n≦45を満たすことが好ましく、10≦l+m+n≦40を満たすことがより好ましい。
In the above formulas (1-1) to (1-6), l, m, or n represents the number of repeating ethylene oxide (EO) units.
In the formula (1-1), n represents an integer of 3 to 100, preferably an integer of 4 to 30, and more preferably an integer of 4 to 18.
In the formula (1-2), n represents an integer of 3 to 30, preferably an integer of 5 to 23, and more preferably an integer of 7 to 18.
M and n in the formula (1-3) and the formula (1-4) satisfy 3 ≦ m + n ≦ 50 and represent an integer of 0 or more, preferably 4 ≦ m + n ≦ 30, and 8 ≦ It is more preferable to satisfy m + n ≦ 20.
In the formula (1-5), n represents an integer of 3 to 50, preferably an integer of 5 to 50, and more preferably an integer of 10 to 50.
In the formula (1-6), l, m, and n each independently represents an integer of 2 to 30, preferably satisfying 10 ≦ l + m + n ≦ 45, and more preferably satisfying 10 ≦ l + m + n ≦ 40.
 前記式(1-1)で表される化合物の具体例としては、RがC817であってnが4、7、又は12である化合物、RがC1225であってnが10、15、又は20である化合物、RがC2041であってnが15である化合物が挙げられる。
 前記式(1-2)で表される化合物の具体例としては、nが10、13、又は18である化合物が挙げられる。
 前記式(1-3)で表される化合物の具体例としては、RがC1225であってm+nが10又は20である化合物が挙げられる。
 前記式(1-4)で表される化合物の具体例としては、RがC1225であってm+nが10又は20である化合物が挙げられる。
 前記式(1-5)で表される化合物の具体例としては、RがC1225であってnが10である化合物、RがC2041であってnが15である化合物が挙げられる。
 前記式(1-6)で表される化合物の具体例としては、l+m+nが30又は40である化合物が挙げられる。
Specific examples of the compound represented by the formula (1-1) include compounds in which R is C 8 H 17 and n is 4, 7, or 12, R is C 12 H 25 and n is And a compound in which R is C 20 H 41 and n is 15.
Specific examples of the compound represented by the formula (1-2) include compounds in which n is 10, 13, or 18.
Specific examples of the compound represented by the formula (1-3) include compounds in which R is C 12 H 25 and m + n is 10 or 20.
Specific examples of the compound represented by the formula (1-4) include compounds in which R is C 12 H 25 and m + n is 10 or 20.
Specific examples of the compound represented by the formula (1-5) include a compound in which R is C 12 H 25 and n is 10, and a compound in which R is C 20 H 41 and n is 15. Can be mentioned.
Specific examples of the compound represented by the formula (1-6) include compounds in which l + m + n is 30 or 40.
<他のノニオン界面活性剤>
 本発明のレリーフ印刷版製版用リンス液は、前記式(1-1)~式(1-6)で表される化合物よりなる群から選ばれたノニオン界面活性剤に代えて又はこれとともに、下記式(1-7)~式(1-17)で表される化合物よりなる群から選ばれたノニオン界面活性剤を含有することも好ましい。
<Other nonionic surfactants>
The rinsing liquid for relief printing plate making of the present invention may be used in place of or together with the nonionic surfactant selected from the group consisting of the compounds represented by formulas (1-1) to (1-6): It is also preferable to contain a nonionic surfactant selected from the group consisting of compounds represented by formulas (1-7) to (1-17).
Figure JPOXMLDOC01-appb-C000004
(式(1-7)中、mは1~50の整数を表し、nは0~50の整数を表し、式(1-8)中、Rは炭素数1~23のアルキル基を表し、nは1~30の整数を表し、式(1-9)中、Rは炭素数5~50のアルキル基を表し、nは1~30の整数を表し、式(1-10)中、Rは炭素数1~12のアルキル基を表し、式(1-11)中、Aは水素原子又は-CORを表し、Rは炭素数1~23のアルキル基を表し、nは1~30の整数を表し、式(1-12)中、Rは炭素数1~12のアルキル基を表す。)
Figure JPOXMLDOC01-appb-C000004
(In Formula (1-7), m represents an integer of 1 to 50, n represents an integer of 0 to 50, and in Formula (1-8), R represents an alkyl group having 1 to 23 carbon atoms; n represents an integer of 1 to 30, and in formula (1-9), R represents an alkyl group having 5 to 50 carbon atoms, n represents an integer of 1 to 30, and R in formula (1-10) Represents an alkyl group having 1 to 12 carbon atoms, and in formula (1-11), A represents a hydrogen atom or —COR, R represents an alkyl group having 1 to 23 carbon atoms, and n represents an integer of 1 to 30 In formula (1-12), R represents an alkyl group having 1 to 12 carbon atoms.)
Figure JPOXMLDOC01-appb-C000005
(式(1-13)及び式(1-14)中、Rは炭素数1~20のアルキル基を表し、式(1-15)中、Xは水素原子又は-CORを表し、Rは炭素数10~50のアルキル基を表し、nは3~30の整数を表し、式(1-16)中、Rは炭素数3~50のアルキル基を表し、l、m、及びnはそれぞれ、20≦l+m+n≦80を満たし、かつ0以上の整数を表し、式(1-17)中、Rは炭素数1~20のアルキル基を表す。)
Figure JPOXMLDOC01-appb-C000005
(In the formulas (1-13) and (1-14), R represents an alkyl group having 1 to 20 carbon atoms. In the formula (1-15), X represents a hydrogen atom or —COR, and R represents carbon. Represents an alkyl group of several 10 to 50, n represents an integer of 3 to 30, and in formula (1-16), R represents an alkyl group of 3 to 50 carbon atoms, and each of l, m, and n represents (20 ≦ l + m + n ≦ 80 is satisfied and represents an integer of 0 or more, and in formula (1-17), R represents an alkyl group having 1 to 20 carbon atoms.)
 本発明のレリーフ印刷版製版用リンス液は、前述した式(1-1)~式(1-6)で表される化合物、及び式(1-7)~式(1-17)で表される化合物のうちのいずれか1種単独で使用しても、2種以上を併用してもよい。 The rinsing liquid for relief printing plate making of the present invention is represented by the compounds represented by the formulas (1-1) to (1-6) and the formulas (1-7) to (1-17). Any one of these compounds may be used alone, or two or more may be used in combination.
 前記式(1-8)におけるRは炭素数1~23のアルキル基を表し、R中の炭素数は、4~16であることが好ましく、8~12であることがより好ましい。
 前記式(1-9)におけるRは炭素数5~50のアルキル基を表し、R中の炭素数は、5~40であることが好ましく、5~30であることがより好ましい。
 前記式(1-10)におけるRは炭素数1~12のアルキル基を表し、R中の炭素数は、1~8であることが好ましく、1~6であることがより好ましい。
 前記式(1-11)におけるRは炭素数1~23のアルキル基を表し、R中の炭素数は、4~16であることが好ましく、8~12であることがより好ましい。
 前記式(1-12)におけるRは炭素数1~12のアルキル基を表し、R中の炭素数は、1~8であることが好ましく、1~6であることがより好ましい。
 前記式(1-13)及び式(1-14)におけるRは炭素数1~20のアルキル基を表し、R中の炭素数は、2~12であることが好ましく、8~12であることがより好ましい。
 前記式(1-15)におけるRは炭素数10~50のアルキル基を表し、R中の炭素数は、12~40であることが好ましく、12~20であることがより好ましい。
 前記式(1-16)におけるRは炭素数3~50のアルキル基を表し、R中の炭素数は、15~50であることが好ましく、20~40であることがより好ましい。
 前記式(1-17)中、Rは炭素数1~20のアルキル基を表し、R中の炭素数は、3~15であることが好ましく、3~8であることがより好ましい。
 なお、上記各式におけるRで表されるアルキル基は、直鎖状であっても、分岐を有していてもよい。
In the formula (1-8), R represents an alkyl group having 1 to 23 carbon atoms, and the carbon number in R is preferably 4 to 16, and more preferably 8 to 12.
In the formula (1-9), R represents an alkyl group having 5 to 50 carbon atoms, and the carbon number in R is preferably 5 to 40, and more preferably 5 to 30.
In the formula (1-10), R represents an alkyl group having 1 to 12 carbon atoms, and the number of carbon atoms in R is preferably 1 to 8, and more preferably 1 to 6.
In the formula (1-11), R represents an alkyl group having 1 to 23 carbon atoms, and the number of carbon atoms in R is preferably 4 to 16, and more preferably 8 to 12.
In the formula (1-12), R represents an alkyl group having 1 to 12 carbon atoms, and the number of carbon atoms in R is preferably 1 to 8, and more preferably 1 to 6.
In the formulas (1-13) and (1-14), R represents an alkyl group having 1 to 20 carbon atoms, and the carbon number in R is preferably 2 to 12, and preferably 8 to 12. Is more preferable.
In the formula (1-15), R represents an alkyl group having 10 to 50 carbon atoms, and the carbon number in R is preferably 12 to 40, and more preferably 12 to 20.
In the formula (1-16), R represents an alkyl group having 3 to 50 carbon atoms, and the carbon number in R is preferably 15 to 50, and more preferably 20 to 40.
In the formula (1-17), R represents an alkyl group having 1 to 20 carbon atoms, and the number of carbon atoms in R is preferably 3 to 15, and more preferably 3 to 8.
In addition, the alkyl group represented by R in the above formulas may be linear or branched.
 前記式(1-11)におけるAは水素原子又は-CORを表す。また、前記式(1-15)におけるXは水素原子又は-CORを表す。なお、分子内に複数のRが存在する式(1-11)においてAが-CORを表す場合、及び式(1-15)においてXが-CORを表す場合、複数存在するRは互いに同じでも異なっていてもよい。 In the formula (1-11), A represents a hydrogen atom or —COR. In the formula (1-15), X represents a hydrogen atom or —COR. In the formula (1-11) in which a plurality of R are present in the molecule, when A represents —COR, and in the formula (1-15), X represents —COR, the plurality of R may be the same as each other. May be different.
 前記式(1-7)におけるmはプロピレンオキシド基(PO基)単位の繰り返し数を表し、nはEO基単位の繰り返し数を表す。
 式(1-7)におけるmは1~50の整数を表し、nは0~50の整数を表し、mは3~30の整数であることが好ましく、5~20の整数であることがより好ましく、nは0~50の整数であることが好ましく、5~20の整数であることがより好ましい。
 前記式(1-8)、式(1-9)、式(1-11)、式(1-15)、及び式(1-16)におけるl、m、又はnはEO基単位の繰り返し数を表す。
 式(1-8)におけるnは1~30の整数を表し、3~20の整数であることが好ましく、5~15の整数であることがより好ましい。
 式(1-9)におけるnは1~30の整数を表し、3~20の整数であることが好ましく、5~15の整数であることがより好ましい。
 式(1-11)におけるnは1~30の整数を表し、3~25の整数であることが好ましく、5~20の整数であることがより好ましい。
 式(1-15)におけるnは3~30の整数を表し、6~20の整数であることが好ましく、8~16の整数であることがより好ましい。
 式(1-16)におけるl、m、及びnはそれぞれ、20≦l+m+n≦80を満たし、かつ0以上の整数を表し、30≦l+m+n≦60を満たすことが好ましく、40≦l+m+n≦50を満たすことがより好ましい。
In the formula (1-7), m represents the number of repeating propylene oxide group (PO group) units, and n represents the number of repeating EO group units.
In the formula (1-7), m represents an integer of 1 to 50, n represents an integer of 0 to 50, and m is preferably an integer of 3 to 30, more preferably an integer of 5 to 20. Preferably, n is an integer of 0 to 50, more preferably an integer of 5 to 20.
In the formula (1-8), formula (1-9), formula (1-11), formula (1-15), and formula (1-16), l, m, or n represents the number of repeating EO group units. Represents.
N in the formula (1-8) represents an integer of 1 to 30, preferably an integer of 3 to 20, and more preferably an integer of 5 to 15.
N in the formula (1-9) represents an integer of 1 to 30, preferably an integer of 3 to 20, and more preferably an integer of 5 to 15.
N in the formula (1-11) represents an integer of 1 to 30, preferably an integer of 3 to 25, and more preferably an integer of 5 to 20.
N in the formula (1-15) represents an integer of 3 to 30, preferably an integer of 6 to 20, and more preferably an integer of 8 to 16.
In the formula (1-16), l, m, and n each satisfy 20 ≦ l + m + n ≦ 80 and represent an integer of 0 or more, preferably 30 ≦ l + m + n ≦ 60, and satisfy 40 ≦ l + m + n ≦ 50. It is more preferable.
 前記式(1-7)で表される化合物の具体例としては、mが7、nが5である化合物が挙げられる。
 前記式(1-8)で表される化合物の具体例としては、RがC817であってnが10である化合物が挙げられる。
 前記式(1-9)で表される化合物の具体例としては、RがC817であってnが15である化合物が挙げられる。
 前記式(1-10)で表される化合物の具体例としては、RがC613である化合物が挙げられる。
 前記式(1-11)で表される化合物の具体例としては、RがC1225、Aが水素原子であってnが12である化合物が挙げられる。
 前記式(1-12)で表される化合物の具体例としては、RがC49である化合物が挙げられる。
 前記式(1-13)で表される化合物の具体例としては、RがC1225である化合物が挙げられる。
 前記式(1-14)で表される化合物の具体例としては、RがC1021である化合物が挙げられる。
 前記式(1-15)で表される化合物の具体例としては、RがC1225であってnが12である化合物、RがC1633であってnが10である化合物が挙げられる。
 前記式(1-16)で表される化合物の具体例としては、RがC2041であってl、m、nがそれぞれ15である化合物が挙げられる。
 前記式(1-17)で表される化合物の具体例としては、RがC817である化合物が挙げられる。
Specific examples of the compound represented by the formula (1-7) include compounds in which m is 7 and n is 5.
Specific examples of the compound represented by the formula (1-8) include compounds in which R is C 8 H 17 and n is 10.
Specific examples of the compound represented by the formula (1-9) include compounds in which R is C 8 H 17 and n is 15.
Specific examples of the compound represented by the formula (1-10) include compounds in which R is C 6 H 13 .
Specific examples of the compound represented by the formula (1-11) include compounds in which R is C 12 H 25 , A is a hydrogen atom, and n is 12.
Specific examples of the compound represented by the formula (1-12) include compounds in which R is C 4 H 9 .
Specific examples of the compound represented by the formula (1-13) include compounds in which R is C 12 H 25 .
Specific examples of the compound represented by the formula (1-14) include compounds wherein R is C 10 H 21 .
Specific examples of the compound represented by the formula (1-15) include a compound in which R is C 12 H 25 and n is 12, and a compound in which R is C 16 H 33 and n is 10. Can be mentioned.
Specific examples of the compound represented by the formula (1-16) include compounds in which R is C 20 H 41 and l, m, and n are each 15.
Specific examples of the compound represented by the formula (1-17) include compounds in which R is C 8 H 17 .
 本発明のレリーフ印刷版製版用リンス液における式(1-1)~式(1-17)で表される化合物を含む、ノニオン界面活性剤の総含有量は、0.1~20重量%であることが好ましく、1~15重量%であることがより好ましく、3~12重量%であることが更に好ましい。添加量が上記範囲内であると、良好なリンス性が得られる。 The total content of the nonionic surfactant containing the compounds represented by the formulas (1-1) to (1-17) in the rinsing liquid for relief printing plate making of the present invention is 0.1 to 20% by weight. It is preferably 1 to 15% by weight, more preferably 3 to 12% by weight. When the addition amount is within the above range, good rinsing properties can be obtained.
 本発明のレリーフ印刷版製版用リンス液に含有されるノニオン界面活性剤のHLB(Hydrophile-Lipophile Balance)値は、8~20であることが好ましく、10~17であることがより好ましい。なお、HLB値は、グリフィンの式に則って計算したものである。HLB値が上記範囲内であると、界面活性剤自身が水溶性を有し、かつ、彫刻カスの疎水性物質との親和性も向上する。HLB値が8以上であると、界面活性剤の水溶性が十分であり、水への溶解性に優れる。一方、HLB値が20以下であると、彫刻カスの疎水性物質の分散性に優れる。 The HLB (Hydrophile-Lipophile Balance) value of the nonionic surfactant contained in the rinsing solution for relief printing plate making of the present invention is preferably 8 to 20, and more preferably 10 to 17. The HLB value is calculated according to the Griffin equation. When the HLB value is within the above range, the surfactant itself has water solubility, and the affinity of the engraving residue with the hydrophobic substance is improved. When the HLB value is 8 or more, the surfactant has sufficient water solubility and is excellent in solubility in water. On the other hand, when the HLB value is 20 or less, the dispersibility of the hydrophobic material of engraving residue is excellent.
<アニオン界面活性剤>
 本発明のレリーフ印刷版製版用リンス液は、前記ノニオン界面活性剤とともにアニオン界面活性剤を併用することができ、また、アニオン界面活性剤を単独で用いることもできる。前記アニオン界面活性剤としては、下記式(2-1)~式(2-10)で表される化合物よりなる群から選ばれた化合物を含有することが好ましい。
<Anionic surfactant>
In the rinsing liquid for relief printing plate making of the present invention, an anionic surfactant can be used in combination with the nonionic surfactant, or an anionic surfactant can be used alone. The anionic surfactant preferably contains a compound selected from the group consisting of compounds represented by the following formulas (2-1) to (2-10).
Figure JPOXMLDOC01-appb-C000006
(式(2-1)~式(2-10)中、Mはアルカリ金属又はアルカリ土類金属を表し、式(2-1)~式(2-5)及び式(2-7)~式(2-10)中、Rは炭素数6~20のアルキル基を表し、式(2-6)中、R1~R3はそれぞれ独立に、水素原子又は炭素数1~8のアルキル基を表し、R1~R3のうちの少なくとも1つは炭素数1~8のアルキル基を表し、式(2-4)中、m及びnはそれぞれ独立に、1~10の整数を表し、式(2-5)中、nは1~10の整数を表す。)
Figure JPOXMLDOC01-appb-C000006
(In the formulas (2-1) to (2-10), M represents an alkali metal or an alkaline earth metal, and the formulas (2-1) to (2-5) and (2-7) to In (2-10), R represents an alkyl group having 6 to 20 carbon atoms, and in formula (2-6), R 1 to R 3 each independently represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. Wherein at least one of R 1 to R 3 represents an alkyl group having 1 to 8 carbon atoms, and in formula (2-4), m and n each independently represents an integer of 1 to 10, In (2-5), n represents an integer of 1 to 10.)
 前記式(2-1)~式(2-5)及び式(2-7)~式(2-10)におけるRは炭素数6~20のアルキル基を表し、R中の炭素数は、8~18であることが好ましく、8~16であることがより好ましい。Rで表されるアルキル基は、直鎖状であっても、分岐を有していてもよい。
 前記式(2-6)におけるR1~R3はそれぞれ独立に、水素原子又は炭素数1~8のアルキル基を表し、R1~R3のうちの少なくとも1つは炭素数1~8のアルキル基を表す。式(2-6)におけるR1~R3が炭素数1~8のアルキル基を表す場合、R1~R3中の炭素数は、2~5であることが好ましく、3~4であることがより好ましい。R1~R3で表されるアルキル基は、直鎖状であっても、分岐を有していてもよい。
In the formulas (2-1) to (2-5) and formulas (2-7) to (2-10), R represents an alkyl group having 6 to 20 carbon atoms, and the carbon number in R is 8 Is preferably 18 and more preferably 8-16. The alkyl group represented by R may be linear or branched.
In the formula (2-6), R 1 to R 3 each independently represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and at least one of R 1 to R 3 has 1 to 8 carbon atoms. Represents an alkyl group. If R 1 ~ R 3 in the formula (2-6) represents an alkyl group having 1 to 8 carbon atoms, the number of carbon atoms in R 1 ~ R 3 is preferably 2-5, is 3-4 It is more preferable. The alkyl group represented by R 1 to R 3 may be linear or branched.
 前記式(2-1)~式(2-10)におけるMはアルカリ金属又はアルカリ土類金属を表す。アルカリ金属としては、例えば、Li、Na、Kが挙げられる。また、アルカリ土類金属としては、例えば、Mg、Caが挙げられる。Mがアルカリ土類金属である場合、式(2-1)~式(2-10)で表される化合物は二量体として存在する。 In the above formulas (2-1) to (2-10), M represents an alkali metal or an alkaline earth metal. Examples of the alkali metal include Li, Na, and K. Examples of the alkaline earth metal include Mg and Ca. When M is an alkaline earth metal, the compounds represented by formulas (2-1) to (2-10) exist as dimers.
 前記式(2-4)におけるm及びnはメチレン基単位の繰り返し数を表し、前記式(2-5)におけるnはEO基単位の繰り返し数を表す。
 式(2-4)におけるm及びnはそれぞれ独立に、1~10の整数を表し、1~6の整数であることが好ましく、1~4の整数であることがより好ましい。
 式(2-5)におけるnは1~10の整数を表し、1~6の整数であることが好ましく、2~4の整数であることがより好ましい。
M and n in the formula (2-4) represent the number of repeating methylene group units, and n in the formula (2-5) represents the number of repeating EO group units.
M and n in the formula (2-4) each independently represent an integer of 1 to 10, preferably an integer of 1 to 6, and more preferably an integer of 1 to 4.
N in the formula (2-5) represents an integer of 1 to 10, preferably an integer of 1 to 6, and more preferably an integer of 2 to 4.
 前記式(2-1)で表される化合物の具体例としては、RがC1225、MがNaである化合物が挙げられる。
 前記式(2-2)で表される化合物の具体例としては、RがC1225、MがNaである化合物が挙げられる。
 前記式(2-3)で表される化合物の具体例としては、RがC817、MがNaである化合物が挙げられる。
 前記式(2-4)で表される化合物の具体例としては、RがC1123、MがNaであってm及びnがともに2である化合物が挙げられる。
 前記式(2-5)で表される化合物の具体例としては、RがC817、MがNaであってnが2である化合物が挙げられる。
 前記式(2-6)で表される化合物の具体例としては、R1がC49、R2及びR3がともに水素原子、MがNaである化合物、R1~R3がいずれもC37、MがNaである化合物、R1及びR2がともにC49、R3が水素原子、MがNaである化合物が挙げられる。
 前記式(2-7)で表される化合物の具体例としては、RがC1123、MがNaである化合物が挙げられる。
 前記式(2-8)で表される化合物の具体例としては、RがC1225である化合物が挙げられる。
 前記式(2-9)で表される化合物の具体例としては、RがC1225、MがNaである化合物が挙げられる。
 前記式(2-10)で表される化合物の具体例としては、RがC1225、MがNaである化合物が挙げられる。
Specific examples of the compound represented by the formula (2-1) include compounds in which R is C 12 H 25 and M is Na.
Specific examples of the compound represented by the formula (2-2) include compounds in which R is C 12 H 25 and M is Na.
Specific examples of the compound represented by the formula (2-3) include compounds in which R is C 8 H 17 and M is Na.
Specific examples of the compound represented by the formula (2-4) include compounds in which R is C 11 H 23 , M is Na, and m and n are both 2.
Specific examples of the compound represented by the formula (2-5) include compounds in which R is C 8 H 17 , M is Na, and n is 2.
Specific examples of the compound represented by the formula (2-6) include compounds in which R 1 is C 4 H 9 , R 2 and R 3 are both hydrogen atoms, M is Na, and R 1 to R 3 are any And C 3 H 7 , a compound in which M is Na, a compound in which R 1 and R 2 are both C 4 H 9 , R 3 is a hydrogen atom, and M is Na.
Specific examples of the compound represented by the formula (2-7) include compounds in which R is C 11 H 23 and M is Na.
Specific examples of the compound represented by the formula (2-8) include compounds wherein R is C 12 H 25 .
Specific examples of the compound represented by the formula (2-9) include compounds in which R is C 12 H 25 and M is Na.
Specific examples of the compound represented by the formula (2-10) include compounds in which R is C 12 H 25 and M is Na.
 本発明のレリーフ印刷版製版用リンス液は、前記式(2-1)~式(2-10)で表されるアニオン界面活性剤のうちのいずれか1種を単独で使用しても、2種以上を併用してもよい。
 また、本発明のレリーフ印刷版製版用リンス液における式(2-1)~式(2-10)で表される化合物を含む、アニオン界面活性剤の総含有量は、0.1~20重量%であることが好ましく、1~15重量%であることがより好ましく、3~12重量%であることが更に好ましい。
The rinsing liquid for relief printing plate making of the present invention may be any one of the anionic surfactants represented by the above formulas (2-1) to (2-10). More than one species may be used in combination.
The total content of the anionic surfactant containing the compounds represented by the formulas (2-1) to (2-10) in the rinsing liquid for relief printing plate making of the present invention is 0.1 to 20 wt. %, Preferably 1 to 15% by weight, more preferably 3 to 12% by weight.
<カチオン界面活性剤>
 本発明のレリーフ印刷版製版用リンス液は、前記ノニオン界面活性剤とともにカチオン界面活性剤を併用することができ、また、カチオン界面活性剤を単独で用いることもできる。前記アニオン界面活性剤としては、下記式(3-1)~式(3-3)で表される化合物よりなる群から選ばれた化合物を含有することが好ましい。
<Cationic surfactant>
In the rinsing liquid for relief printing plate making of the present invention, a cationic surfactant can be used in combination with the nonionic surfactant, or a cationic surfactant can be used alone. The anionic surfactant preferably contains a compound selected from the group consisting of compounds represented by the following formulas (3-1) to (3-3).
Figure JPOXMLDOC01-appb-C000007
(式(3-1)~式(3-3)中、Rは炭素数6~20のアルキル基を表し、A-はカウンターアニオンを表す。)
Figure JPOXMLDOC01-appb-C000007
(In the formulas (3-1) to (3-3), R represents an alkyl group having 6 to 20 carbon atoms, and A represents a counter anion.)
 前記式(3-1)~式(3-3)におけるRは炭素数6~20のアルキル基を表し、R中の炭素数は、8~16であることが好ましく、12~16であることがより好ましい。なお、分子内に複数のRが存在する式(3-2)及び式(3-3)の場合、複数存在するRは互いに同じでも異なっていてもよい。Rで表されるアルキル基は、直鎖状であっても、分岐を有していてもよい。
 前記式(3-1)~式(3-3)におけるA-はカウンターアニオンを表し、例えば、ハロゲンイオンである。ハロゲンイオンとしては、例えば、Cl-、Br-、I-が挙げられる。
In the formulas (3-1) to (3-3), R represents an alkyl group having 6 to 20 carbon atoms, and the carbon number in R is preferably 8 to 16, and preferably 12 to 16. Is more preferable. In the formulas (3-2) and (3-3) in which a plurality of R are present in the molecule, the plurality of Rs may be the same or different from each other. The alkyl group represented by R may be linear or branched.
A in the formulas (3-1) to (3-3) represents a counter anion, for example, a halogen ion. Examples of the halogen ion include Cl , Br , and I .
 前記式(3-1)で表される化合物の具体例としては、RがC1225、A-がCl-である化合物が挙げられる。
 前記式(3-2)で表される化合物の具体例としては、RがC1225、A-がCl-である化合物が挙げられる。
 前記式(3-3)で表される化合物の具体例としては、RがC817、A-がCl-である化合物が挙げられる。
Specific examples of the compound represented by the formula (3-1) include compounds in which R is C 12 H 25 and A is Cl .
Specific examples of the compound represented by the formula (3-2) include compounds in which R is C 12 H 25 and A is Cl .
Specific examples of the compound represented by the formula (3-3) include compounds in which R is C 8 H 17 and A is Cl .
 本発明のレリーフ印刷版製版用リンス液は、前記式(3-1)~式(3-3)で表されるカチオン界面活性剤のうちのいずれか1種を単独で使用しても、2種以上を併用してもよい。
 また、本発明のレリーフ印刷版製版用リンス液における式(3-1)~(3-3)で表される化合物を含む、カチオン界面活性剤の総含有量は、0.1~20重量%であることが好ましく、1~15重量%であることがより好ましく、3~12重量%であることが更に好ましい。
The rinsing liquid for relief printing plate making of the present invention may be any one of the cationic surfactants represented by the above formulas (3-1) to (3-3). More than one species may be used in combination.
The total content of the cationic surfactant containing the compounds represented by formulas (3-1) to (3-3) in the rinsing liquid for relief printing plate making of the present invention is 0.1 to 20% by weight. Preferably, it is 1 to 15% by weight, more preferably 3 to 12% by weight.
 本発明のレリーフ印刷版製版用リンス液は、主成分として水を含有することが好ましい。 The relief printing plate rinsing liquid of the present invention preferably contains water as a main component.
 本発明のレリーフ印刷版製版用リンス液は、アルコール系溶剤、エーテル系溶剤、グリコール系溶剤、及びグリコールエーテル系溶剤よりなる群から選択された少なくとも1種の溶剤を含有することが好ましい。このような溶剤を前記ノニオン界面活性剤とを併用することにより、さらにリンス性を向上することができる。また、溶剤を前記アニオン界面活性剤又はカチオン界面活性剤と併用してもよい。
 なお、本発明のレリーフ印刷版製版用リンス液は、前記溶剤、及び前記ノニオン界面活性剤、前記アニオン界面活性剤又は前記カチオン界面活性剤の両者を含有するのみならず、これら界面活性剤を含有せずに、前記溶剤を含有していてもよい。界面活性剤を含有しない場合においても、前記溶剤によりリンス性を向上することができる。
 また、前記溶剤は1種を単独で使用しても、2種以上を併用してもよい。
The rinsing liquid for relief printing plate making of the present invention preferably contains at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents. Rinsability can be further improved by using such a solvent in combination with the nonionic surfactant. Moreover, you may use a solvent together with the said anionic surfactant or a cationic surfactant.
The rinsing liquid for relief printing plate making of the present invention contains not only the solvent and the nonionic surfactant, the anionic surfactant or the cationic surfactant, but also these surfactants. It may contain the said solvent, without doing. Even when the surfactant is not contained, the rinsing property can be improved by the solvent.
Moreover, the said solvent may be used individually by 1 type, or may use 2 or more types together.
 本発明のレリーフ印刷版製版用リンス液に含有される溶剤としては、下記表1に示すR1-R2で表される溶剤S-1~S-45が好ましく例示できる。これらの中でも、溶剤S-1、S-3、S-9、S-10、S-12、S-17、S-22、S-28、S-29、S-34、S-39、S-41、S-44がより好ましい。なお、下記表1に示す溶剤は、市販品として入手することが可能である。 Preferred examples of the solvent contained in the rinsing liquid for relief printing plate making of the present invention include solvents S-1 to S-45 represented by R1-R2 shown in Table 1 below. Among them, the solvents S-1, S-3, S-9, S-10, S-12, S-17, S-22, S-28, S-29, S-34, S-39, S -41 and S-44 are more preferable. In addition, the solvent shown in following Table 1 can be obtained as a commercial item.
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
 本発明のレリーフ印刷版製版用リンス液における前記溶剤の含有量は、1~40重量%であることが好ましく、5~30重量%であることがより好ましく、10~25重量%であることが更に好ましい。
 なお、前記溶剤と界面活性剤を併用する場合には、本発明のレリーフ印刷版製版用リンス液における含有量は、1~40重量%であることが好ましく、3~30重量%であることがより好ましく、5~25重量%であることが更に好ましい。
The content of the solvent in the rinsing solution for relief printing plate making of the present invention is preferably 1 to 40% by weight, more preferably 5 to 30% by weight, and preferably 10 to 25% by weight. Further preferred.
When the solvent and the surfactant are used in combination, the content in the rinsing liquid for relief printing plate making of the present invention is preferably 1 to 40% by weight, and preferably 3 to 30% by weight. More preferred is 5 to 25% by weight.
 本発明のレリーフ印刷版製版用リンス液のpHは、9以上であることが好ましく、9~14であることがより好ましく、9.5~13.5であることが更に好ましく、10.0~13.3であることが特に好ましく、10.0~12.5であることが最も好ましい。
 本発明のレリーフ印刷版製版用リンス液は、上記のpHとするために塩基性化合物を含有することが好ましく、水溶性の塩基性化合物を含有することがより好ましい。
 塩基性化合物としては、特に制限はなく、公知の塩基性化合物を用いることができるが、無機の塩基性化合物であることが好ましく、アルカリ金属塩化合物、及び、アルカリ土類金属塩化合物であることがより好ましく、アルカリ金属水酸化物であることが更に好ましい。
 塩基性化合物としては、例えば、水酸化ナトリウム、同アンモニウム、同カリウム、同リチウム、ケイ酸ナトリウム、同カリウム、第三リン酸ナトリウム、同カリウム、同アンモニウム、第二リン酸ナトリウム、同カリウム、同アンモニウム、炭酸ナトリウム、同カリウム、同アンモニウム、炭酸水素ナトリウム、同カリウム、同アンモニウム、ほう酸ナトリウム、同カリウム及び同アンモニウム等の無機アルカリ塩が挙げられる。
The pH of the rinsing liquid for relief printing plate making of the present invention is preferably 9 or more, more preferably 9 to 14, still more preferably 9.5 to 13.5, and 10.0 to 13.3 is particularly preferable, and 10.0 to 12.5 is most preferable.
The rinsing liquid for relief printing plate making of the present invention preferably contains a basic compound in order to achieve the above pH, and more preferably contains a water-soluble basic compound.
There is no restriction | limiting in particular as a basic compound, Although a well-known basic compound can be used, It is preferable that it is an inorganic basic compound, and it is an alkali metal salt compound and an alkaline-earth metal salt compound Is more preferable, and an alkali metal hydroxide is more preferable.
Examples of the basic compound include sodium hydroxide, ammonium, potassium, lithium, sodium silicate, potassium, tribasic sodium phosphate, potassium, ammonium, dibasic sodium phosphate, potassium, Examples thereof include inorganic alkali salts such as ammonium, sodium carbonate, potassium, ammonium, sodium hydrogen carbonate, potassium, ammonium, sodium borate, potassium and ammonium.
 本発明のレリーフ印刷版製版用リンス液は、消泡剤を含有することが好ましい。
 消泡剤としては、一般的なシリコン系の自己乳化型タイプ、乳化タイプ、界面活性剤ノニオン系のHLB(Hydrophile-Lipophile Balance)値の5以下等の化合物を使用することができる。シリコン消泡剤が好ましい。その中で乳化分散型及び可溶化型等がいずれも使用できる。
 消泡剤として具体的には、例えば、TSA731、TSA739(以上、東レ・ダウコーニング(株)製)が挙げられる。
 消泡剤の含有量は、レリーフ印刷版製版用リンス液中に、0.001~1.0重量%であることが好ましい。
The rinsing liquid for relief printing plate making of the present invention preferably contains an antifoaming agent.
As the antifoaming agent, a general silicon-based self-emulsifying type, emulsifying type, surfactant nonionic HLB (Hydrophile-Lipophile Balance) value of 5 or less can be used. Silicon antifoaming agents are preferred. Among them, an emulsified dispersion type and a solubilized type can be used.
Specific examples of antifoaming agents include TSA731 and TSA739 (above, manufactured by Toray Dow Corning Co., Ltd.).
The content of the antifoaming agent is preferably 0.001 to 1.0% by weight in the rinsing liquid for relief printing plate making.
 本発明のレリーフ印刷版製版用リンス液は、必要に応じて、防腐剤、無機酸、及び/又は、キレート剤を含有していてもよい。
 防腐剤、無機酸、及び、キレート剤としては、公知のものを用いることができる。
The rinsing liquid for relief printing plate making of the present invention may contain a preservative, an inorganic acid, and / or a chelating agent, if necessary.
As the preservative, the inorganic acid, and the chelating agent, known ones can be used.
(レリーフ印刷版の製版方法)
 本発明のレリーフ印刷版の製版方法は、非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を含有するレリーフ形成層を支持体上に有するレリーフ印刷版原版を準備する工程(以下、「準備工程」ともいう。)、レリーフ印刷版原版をレーザーを用いた露光により彫刻する工程(以下、「彫刻工程」ともいう。)、及び、彫刻により発生した彫刻カスをリンス液で除去する工程(以下、「リンス処理工程」ともいう。)、をこの順で有する。
(Relief printing plate making method)
The plate making method of the relief printing plate of the present invention comprises a step of preparing a relief printing plate precursor having a relief forming layer containing a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent on a support (hereinafter referred to as “preparation step”). ), A step of engraving the relief printing plate precursor by exposure using a laser (hereinafter also referred to as “engraving step”), and a step of removing engraving residue generated by engraving with a rinse liquid (hereinafter referred to as “engraving step”). (Also referred to as “rinsing process”) in this order.
<準備工程>
 本発明のレリーフ印刷版の製版方法は、レリーフ形成層を有するレリーフ印刷版原版を準備する工程(準備工程)を含む。
 本発明のレリーフ印刷版の製版方法に用いることができるレリーフ形成層を有するレリーフ印刷版原版としては、特に制限はないが、レーザー彫刻用レリーフ印刷版原版であることが好ましい。
 本発明において「レリーフ形成層」は、彫刻可能な層をいい、例えば、架橋剤を使用する場合は、光又は熱により架橋された状態の層をいう。また、架橋剤を使用する場合、光又は熱により架橋される前の状態の層は、「未架橋のレリーフ形成層」という。
 本発明において「レーザー彫刻用レリーフ印刷版原版」とは、彫刻可能なレリーフ印刷版原版をいい、例えば、架橋剤を使用する場合は、樹脂組成物からなる架橋性を有するレリーフ形成層が、光又は熱により硬化された状態のものをいう。該印刷版原版をレーザー彫刻することにより「レリーフ印刷版」が作製される。
<Preparation process>
The plate making method of the relief printing plate of the present invention includes a step of preparing a relief printing plate precursor having a relief forming layer (preparation step).
Although there is no restriction | limiting in particular as a relief printing plate precursor which has a relief forming layer which can be used for the platemaking method of the relief printing plate of this invention, It is preferable that it is a relief printing plate precursor for laser engraving.
In the present invention, the “relief-forming layer” refers to a layer that can be engraved. For example, when a crosslinking agent is used, it refers to a layer that is crosslinked by light or heat. When a crosslinking agent is used, the layer before being crosslinked by light or heat is referred to as an “uncrosslinked relief forming layer”.
In the present invention, the “relief printing plate precursor for laser engraving” refers to a relief printing plate precursor that can be engraved. For example, when a cross-linking agent is used, the relief-forming layer having a crosslinkability made of a resin composition is an optical Or the state hardened | cured with the heat. A “relief printing plate” is produced by laser engraving the printing plate precursor.
 前記準備工程は、(A)樹脂組成物を支持体上に塗設して未架橋のレリーフ形成層を形成する層形成工程、及び、前記未架橋のレリーフ形成層を光及び熱の少なくとも一方により架橋しレリーフ形成層を有するレリーフ印刷版原版を得る架橋工程、又は、(B)樹脂組成物を膜状に塗設して未架橋のレリーフ形成層を形成する工程、前記未架橋のレリーフ形成層を活性光線の照射及び加熱の少なくとも一方により架橋しレリーフ形成層を有するレリーフ印刷版原版を得る層形成工程、及び、未架橋のレリーフ形成層若しくは架橋後のレリーフ形成層の1つの面を硬化する架橋工程であることが好ましく、(A)樹脂組成物を支持体上に塗設して未架橋のレリーフ形成層を形成する層形成工程、及び、前記未架橋のレリーフ形成層を光及び熱の少なくとも一方により架橋しレリーフ形成層を有するレリーフ印刷版原版を得る架橋工程であることがより好ましい。
 また、塗設した未架橋のレリーフ形成層は、必要に応じて、乾燥させることが好ましい。なお、本発明において「塗設」とは、塗布して設けることだけでなく、流延して設ける意味も含む。
The preparation step includes (A) a layer formation step of coating the resin composition on a support to form an uncrosslinked relief forming layer, and the uncrosslinked relief forming layer by at least one of light and heat. A cross-linking step of obtaining a relief printing plate precursor having a relief forming layer by crosslinking, or (B) a step of forming a non-cross-linked relief forming layer by coating the resin composition into a film, the uncross-linked relief forming layer A layer forming step of obtaining a relief printing plate precursor having a relief forming layer by crosslinking with at least one of irradiation with actinic light and heating, and curing one surface of the uncrosslinked relief forming layer or the crosslinked relief forming layer Preferably, it is a crosslinking step, (A) a layer forming step of coating the resin composition on a support to form an uncrosslinked relief forming layer, and the uncrosslinked relief forming layer is subjected to light and heat. And more preferably not even a crosslinking step of obtaining a crosslinked relief printing plate precursor having a relief forming layer by one.
Moreover, it is preferable to dry the coated uncrosslinked relief forming layer as needed. In the present invention, the term “coating” includes not only coating and providing, but also means providing by casting.
 本発明に用いることができるレリーフ印刷版原版は、前述のように、架橋により硬化された状態のレリーフ形成層を有することが好ましい。このようなレリーフ形成層を得るためには、前記準備工程として、レリーフ印刷版原版における未架橋のレリーフ形成層を光及び/又は熱により架橋する工程を含むことが好ましい。 As described above, the relief printing plate precursor that can be used in the present invention preferably has a relief forming layer cured by crosslinking. In order to obtain such a relief forming layer, it is preferable that the preparation step includes a step of crosslinking an uncrosslinked relief forming layer in the relief printing plate precursor by light and / or heat.
 光は、レリーフ形成層全面に行うのが一般的である。光(「活性光線」ともいう。)としては可視光、紫外光あるいは電子線が挙げられるが、紫外光が最も一般的である。レリーフ形成層の支持体側を裏面とすれば、表面に光を照射するだけでもよいが、支持体が活性光線を透過する透明なフィルムならば、更に裏面からも光を照射することが好ましい。表面からの照射は、保護フィルムが存在する場合、これを設けたまま行ってもよいし、保護フィルムを剥離した後に行ってもよい。酸素の存在下では重合阻害が生じる恐れがあるので、レリーフ形成層に塩化ビニルシートを被せて真空引きした上で、活性光線の照射を行ってもよい。 The light is generally applied to the entire relief forming layer. Examples of light (also referred to as “active light”) include visible light, ultraviolet light, and electron beam, and ultraviolet light is the most common. If the support side of the relief forming layer is the back side, the surface may only be irradiated with light. However, if the support is a transparent film that transmits actinic rays, it is preferable that the back side is further irradiated with light. When the protective film exists, the irradiation from the surface may be performed while the protective film is provided, or may be performed after the protective film is peeled off. Since polymerization inhibition may occur in the presence of oxygen, actinic rays may be irradiated after the relief forming layer is covered with a vinyl chloride sheet and evacuated.
 レリーフ形成層が熱重合開始剤を含有する場合には(光重合開始剤が熱重合開始剤にもなり得る。)、レーザー彫刻用レリーフ印刷版原版を加熱することで、レリーフ形成層を架橋することができる(熱により架橋する工程)。加熱手段としては、印刷版原版を熱風オーブンや遠赤外オーブン内で所定時間加熱する方法や、加熱したロールに所定時間接する方法が挙げられる。 When the relief forming layer contains a thermal polymerization initiator (the photopolymerization initiator can also be a thermal polymerization initiator), the relief forming layer is crosslinked by heating the relief printing plate precursor for laser engraving. (Step of crosslinking by heat). Examples of the heating means include a method of heating the printing plate precursor in a hot air oven or a far infrared oven for a predetermined time, and a method of contacting the heated roll for a predetermined time.
 レリーフ形成層の架橋方法としは、レリーフ形成層を表面から内部まで均一に硬化(架橋)可能という観点で、熱による架橋の方が好ましい。
 レリーフ形成層を架橋することで、第1にレーザー彫刻後形成されるレリーフがシャープになり、第2にレーザー彫刻の際に発生する彫刻カスの粘着性が抑制されるという利点がある。
As a method for crosslinking the relief forming layer, thermal crosslinking is preferred from the viewpoint that the relief forming layer can be uniformly cured (crosslinked) from the surface to the inside.
By crosslinking the relief forming layer, there is an advantage that the relief formed first after laser engraving becomes sharp, and second, the adhesiveness of engraving residue generated during laser engraving is suppressed.
 また、本発明のレリーフ印刷版の製版方法は、前記準備工程が、水酸基(-OH)を有するポリマー及び後述する式(I)で表される基を有する化合物を少なくとも含む樹脂組成物を支持体上に塗設して未架橋のレリーフ形成層を形成する工程、及び、前記未架橋のレリーフ形成層を光及び/又は熱により架橋しレリーフ形成層を有するレリーフ印刷版原版を得る工程であることが特に好ましい。
 上記工程により、アルコキシシリル基等の式(I)で表される基を有するバインダーを含有するレリーフ形成層を有するレリーフ印刷版原版を容易に得ることができる。
 また、前記未架橋のレリーフ形成層を光により架橋する場合は、前記樹脂組成物には、後述する光熱変換剤を含有していることが好ましい。
 また、前記樹脂組成物には、耐刷性向上の観点から、後述する重合性化合物を含有していることが好ましい。
Further, the plate making method of the relief printing plate of the present invention comprises a resin composition comprising at least a polymer having a hydroxyl group (—OH) and a compound having a group represented by the formula (I) described later in the preparation step. A step of forming an uncrosslinked relief forming layer by coating on the surface, and a step of obtaining a relief printing plate precursor having a relief forming layer by crosslinking the uncrosslinked relief forming layer with light and / or heat. Is particularly preferred.
By the above process, a relief printing plate precursor having a relief forming layer containing a binder having a group represented by the formula (I) such as an alkoxysilyl group can be easily obtained.
Moreover, when the said non-crosslinked relief forming layer is bridge | crosslinked with light, it is preferable that the photothermal conversion agent mentioned later is contained in the said resin composition.
The resin composition preferably contains a polymerizable compound described later from the viewpoint of improving printing durability.
 レリーフ形成層が光重合開始剤を含有する場合には、光重合開始剤のトリガーとなる活性光線をレリーフ形成層に照射することで、レリーフ形成層を架橋することができる。
 活性光線の照射は、レリーフ形成層全面に行うのが一般的である。活性光線としては可視光、紫外光あるいは電子線が挙げられるが、紫外光が最も一般的である。レリーフ形成層の支持体等、レリーフ形成層を固定化するための基材側を裏面とすれば、表面に活性光線を照射するだけでもよいが、用いられる支持体が活性光線を透過する透明なフィルムであれば、さらに裏面からも活性光線を照射することも好ましい。表面からの照射は、保護フィルムが存在する場合、これを設けたまま行ってもよいし、保護フィルムを剥離した後に行ってもよい。酸素の存在下では重合阻害が生じる恐れがあるので、架橋性レリーフ形成層に塩化ビニルシートを被せて真空引きした上で、活性光線の照射を行ってもよい。
When the relief forming layer contains a photopolymerization initiator, the relief forming layer can be crosslinked by irradiating the relief forming layer with an actinic ray that triggers the photopolymerization initiator.
The irradiation with actinic rays is generally performed on the entire surface of the relief forming layer. Visible light, ultraviolet light, or an electron beam is mentioned as actinic light, but ultraviolet light is the most common. If the substrate side for immobilizing the relief forming layer, such as a support for the relief forming layer, is the back side, the surface may only be irradiated with actinic rays, but the support used is transparent to transmit actinic rays. In the case of a film, it is also preferable to irradiate actinic rays from the back side. When the protective film exists, the irradiation from the surface may be performed while the protective film is provided, or may be performed after the protective film is peeled off. Since polymerization inhibition may occur in the presence of oxygen, actinic rays may be irradiated after the crosslinkable relief forming layer is covered with a vinyl chloride sheet and evacuated.
 前記架橋工程が、光により架橋する工程である場合は、活性光線を照射する装置が比較的高価であるものの、印刷版原版が高温になることがないので、印刷版原版の原材料の制約がほとんどない。
 前記架橋工程が、熱により架橋する工程である場合には、特別高価な装置を必要としない利点があるが、印刷版原版が高温になるので、高温で柔軟になる熱可塑性ポリマーは加熱中に変形する可能性がある等、使用する原材料は慎重に選択する必要がある。
 熱架橋の際には、熱重合開始剤を加え得る。熱重合開始剤としては、遊離基重合(free radical polymerization)用の商業的な熱重合開始剤として使用され得る。このような熱重合開始剤としては、例えば、適当な過酸化物、ヒドロペルオキシド又はアゾ基を含む化合物が挙げられる。代表的な加硫剤も架橋用に使用できる。熱架橋性(heat-curable)の樹脂、例えばエポキシ樹脂、を架橋成分として層に加えることにより熱架橋も実施され得る。
When the crosslinking step is a step of crosslinking by light, an apparatus for irradiating actinic rays is relatively expensive, but the printing plate precursor does not become high temperature, so there are almost no restrictions on the raw materials of the printing plate precursor. Absent.
When the crosslinking step is a step of crosslinking by heat, there is an advantage that an extra expensive apparatus is not required, but since the printing plate precursor becomes high temperature, the thermoplastic polymer that becomes flexible at high temperature is not heated. The raw materials to be used must be carefully selected because they may be deformed.
A thermal polymerization initiator may be added during the thermal crosslinking. As the thermal polymerization initiator, it can be used as a commercial thermal polymerization initiator for free radical polymerization. Examples of such a thermal polymerization initiator include compounds containing a suitable peroxide, hydroperoxide, or azo group. Representative vulcanizing agents can also be used for crosslinking. Thermal crosslinking can also be performed by adding a heat-curable resin, such as an epoxy resin, as a crosslinking component to the layer.
 前記架橋工程におけるレリーフ形成層の架橋方法としは、レリーフ形成層を表面から内部まで均一に硬化(架橋)可能という観点で、熱による架橋の方が好ましい。
 レリーフ形成層を架橋することで、第1にレーザー彫刻後形成されるレリーフがシャープになり、第2にレーザー彫刻の際に発生する彫刻カスの粘着性が抑制されるという利点がある。未架橋のレリーフ形成層をレーザー彫刻すると、レーザー照射部の周辺に伝播した余熱により、本来意図していない部分が溶融、変形しやすく、シャープなレリーフ層が得られない場合がある。また、素材の一般的な性質として、低分子なものほど固形ではなく液状になり、すなわち粘着性が強くなる傾向がある。レリーフ形成層を彫刻する際に発生する彫刻カスは、低分子の材料を多く用いるほど粘着性が強くなる傾向がある。低分子である重合性化合物は架橋することで高分子になるため、発生する彫刻カスは粘着性が少なくなる傾向がある。
As a crosslinking method of the relief forming layer in the crosslinking step, crosslinking by heat is preferable from the viewpoint that the relief forming layer can be uniformly cured (crosslinked) from the surface to the inside.
By crosslinking the relief forming layer, there is an advantage that the relief formed first after laser engraving becomes sharp, and second, the adhesiveness of engraving residue generated during laser engraving is suppressed. When an uncrosslinked relief-forming layer is laser engraved, unintended portions are likely to melt and deform due to residual heat that has propagated around the laser-irradiated portion, and a sharp relief layer may not be obtained. In addition, as a general property of a material, a material having a low molecular weight tends to be liquid rather than solid, that is, the adhesiveness tends to be strong. The engraving residue generated when engraving the relief forming layer tends to become more tacky as more low-molecular materials are used. Since the polymerizable compound which is a low molecule becomes a polymer by crosslinking, the generated engraving residue tends to be less tacky.
<彫刻工程>
 本発明のレリーフ印刷版の製版方法は、レリーフ印刷版原版を露光により彫刻する工程(彫刻工程)を含む。
 前記彫刻工程は、後述する特定のレーザーにより、形成したい画像に対応したレーザー光を照射してレリーフを形成し、印刷用のレリーフ層を形成することが好ましい。
 具体的には、架橋されたレリーフ形成層に対して形成したい画像に対応したレーザー光を照射して彫刻を行うことによりレリーフ層を形成する。好ましくは、形成したい画像のデジタルデータを元にコンピューターでレーザーヘッドを制御し、レリーフ形成層に対して走査照射する工程が挙げられる。赤外レーザーが照射されると、レリーフ形成層中の分子が分子振動し、熱が発生する。赤外レーザーとして炭酸ガスレーザーやYAGレーザーのような高出力のレーザーを用いると、レーザー照射部分に大量の熱が発生し、感光層中の分子は分子切断あるいはイオン化されて選択的な除去、すなわち彫刻がなされる。このとき、レリーフ形成層中の光熱変換剤によっても露光領域が発熱するため、この光熱変換剤により発生した熱もまた、この除去性を促進する。
 レーザー彫刻の利点は、彫刻深さを任意に設定できるため、構造を3次元的に制御することができる点である。例えば、微細な網点を印刷する部分は浅くあるいはショルダーをつけて彫刻することで、印圧でレリーフが転倒しないようにすることができ、細かい抜き文字を印刷する溝の部分は深く彫刻することで、溝にインキが埋まりにくくなり、抜き文字つぶれを抑制することが可能となる。
 中でも、光熱変換剤の極大吸収波長に対応した赤外レーザーで彫刻する場合に、前述の光熱変換剤からの発熱が効率よく行われるために、より高感度かつシャープなレリーフ層が得られる。
 彫刻に用いられる赤外レーザーとしては、生産性、コスト等の面から、炭酸ガスレーザー又は半導体レーザーが好ましく用いられ、中でも、以下に詳述するファイバー付き半導体赤外線レーザーが特に好ましく用いられる。
<Engraving process>
The plate making method of the relief printing plate of the present invention includes a step of engraving the relief printing plate precursor by exposure (engraving step).
In the engraving step, it is preferable that a relief is formed by irradiating a laser beam corresponding to an image to be formed with a specific laser to be described later to form a relief.
Specifically, the relief layer is formed by engraving the crosslinked relief forming layer by irradiating a laser beam corresponding to the image to be formed. Preferably, a step of controlling the laser head with a computer based on digital data of an image to be formed and performing scanning irradiation on the relief forming layer can be mentioned. When the infrared laser is irradiated, the molecules in the relief forming layer undergo molecular vibration and heat is generated. When a high-power laser such as a carbon dioxide laser or a YAG laser is used as an infrared laser, a large amount of heat is generated in the laser irradiation portion, and molecules in the photosensitive layer are selectively cut by molecular cutting or ionization, that is, Sculpture is made. At this time, since the exposed region also generates heat due to the photothermal conversion agent in the relief forming layer, the heat generated by the photothermal conversion agent also promotes this removability.
The advantage of laser engraving is that the engraving depth can be set arbitrarily, so that the structure can be controlled three-dimensionally. For example, by engraving with a shallow or shoulder on the part where fine halftone dots are printed, it is possible to prevent the relief from falling down due to printing pressure, and deeply engrave the part of the groove where fine cut characters are printed. Thus, it becomes difficult for the groove to be filled with ink, and it is possible to suppress the crushing of the extracted characters.
In particular, when engraving with an infrared laser corresponding to the maximum absorption wavelength of the photothermal conversion agent, heat generation from the above-described photothermal conversion agent is efficiently performed, so that a more sensitive and sharp relief layer can be obtained.
As an infrared laser used for engraving, a carbon dioxide laser or a semiconductor laser is preferably used from the viewpoint of productivity, cost, etc. Among them, a semiconductor infrared laser with a fiber described in detail below is particularly preferably used.
 一般に、半導体レーザーは、CO2レーザーに比べレーザー発振が高効率かつ安価で小型化が可能である。また、小型であるためアレイ化が容易である。ビーム径の制御は、結像レンズ、特定の光ファイバーを用いて行われる。ファイバー付き半導体レーザーは、さらに光ファイバーを取り付けることで効率よくレーザー光を出力できるため本発明における画像形成には有効である。さらに、ファイバーの処理によりビーム形状を制御できる。例えば、ビームプロファイルはトップハット形状とすることができ安定に版面にエネルギーを与えることができる。半導体レーザーの詳細は、「レーザーハンドブック第2版」レーザー学会編、実用レーザー技術 電子通信学会 等に記載されている。
 また、レリーフ印刷版原版を用いたレリーフ印刷版の製造方法に好適に使用し得るファイバー付き半導体レーザーを備えた製版装置は、本願出願人が提出した特願2008-15460号明細書、特願2008-58160号明細書に詳細に記載され、これをレリーフ印刷版の製版に使用することができる。
In general, a semiconductor laser can be downsized with high efficiency and low cost in laser oscillation compared to a CO 2 laser. Moreover, since it is small, it is easy to form an array. The control of the beam diameter is performed using an imaging lens and a specific optical fiber. The semiconductor laser with fiber is effective for image formation in the present invention because it can efficiently output laser light by attaching an optical fiber. Furthermore, the beam shape can be controlled by processing the fiber. For example, the beam profile can have a top hat shape, and energy can be stably given to the plate surface. Details of semiconductor lasers are described in “Laser Handbook 2nd Edition” edited by Laser Society, Practical Laser Technology, Electronic Communication Society, etc.
Further, a plate making apparatus equipped with a fiber-coupled semiconductor laser that can be suitably used in a method for producing a relief printing plate using a relief printing plate precursor is disclosed in Japanese Patent Application Nos. 2008-15460 and 2008 filed by the present applicant. -58160, which can be used to make relief printing plates.
 レーザー彫刻に用いる半導体レーザーとしては、波長が700nm~1,300nmのものが好ましく、800nm~1,200nmのものがより好ましく、860nm~1,200nmのものが更に好ましく、900nm~1,100nmであるものが特に好ましい。
 GaAsのバンドギャップが室温で860nmであるため、860nm未満の領域では、一般的に、活性層がAlGaAs系のものが好ましく用いられる。一方、860nm以上では半導体活性層材料がInGaAs系のものが用いられる。一般にAlは酸化されやすいためInGaAs系材料を活性層に持つ半導体レーザーの方がAlGaAs系より信頼性が高いため860nm~1,200nmが好ましい。
 さらに実用的な半導体レーザーとしては、活性層材料のみならずクラッド材料の組成なども考慮すると、InGaAs系材料を活性層に持つ半導体レーザーでは、更に好ましい態様としては、波長が900nm~1,100nmの範囲において、より高出力で高信頼なものが得られやすい。従って波長900nm~1,100nmのInGaAs系の材料を活性層に持つファイバー付き半導体レーザーを用いることにより、低コスト、高生産性を達成し易い。
 安価及び高生産であり、かつ、画質の良好なレーザー彫刻レリーフ印刷システムを実現するためには、後述するようなレーザー彫刻用樹脂組成物を用いたレリーフ形成層を備えたレリーフ印刷版原版を用いるとともに、前記の如き特定波長の半導体レーザーであって、かつ、ファイバー付き半導体レーザーを用いることが好ましい。
The semiconductor laser used for laser engraving preferably has a wavelength of 700 nm to 1,300 nm, more preferably 800 nm to 1,200 nm, still more preferably 860 nm to 1,200 nm, and 900 nm to 1,100 nm. Those are particularly preferred.
Since the band gap of GaAs is 860 nm at room temperature, an AlGaAs-based active layer is generally preferably used in a region less than 860 nm. On the other hand, a semiconductor active layer material of InGaAs type is used at 860 nm or more. In general, since Al is easily oxidized, a semiconductor laser having an InGaAs-based material in its active layer is more reliable than an AlGaAs-based material, and therefore, 860 nm to 1,200 nm is preferable.
Furthermore, as a practical semiconductor laser, considering not only the active layer material but also the composition of the clad material, a semiconductor laser having an InGaAs-based material in the active layer has a more preferable wavelength of 900 nm to 1,100 nm. It is easy to obtain a higher output and higher reliability in the range. Therefore, it is easy to achieve low cost and high productivity by using a fiber-coupled semiconductor laser having an active layer of an InGaAs material with a wavelength of 900 nm to 1,100 nm.
In order to realize a laser engraving relief printing system that is inexpensive and highly productive and has good image quality, a relief printing plate precursor having a relief forming layer using a resin composition for laser engraving as described later is used. In addition, it is preferable to use a semiconductor laser with a specific wavelength as described above and a fiber-attached semiconductor laser.
 ファイバー付き半導体レーザーを用いることで、彫刻したい形状の制御において、ファイバー付き半導体レーザーのビーム形状を変化させたり、ビーム形状を変化させずにレーザーに供給するエネルギー量を変化させたりすることで彫刻領域の形状を変化させることが可能となるという利点をも有するものである。 By using a semiconductor laser with a fiber, in the control of the shape to be engraved, the engraving area can be changed by changing the beam shape of the semiconductor laser with fiber or changing the amount of energy supplied to the laser without changing the beam shape. This also has the advantage that the shape of the can be changed.
 本発明のレリーフ印刷版の製版方法は、前記彫刻カスが、下記式(I)で表される基を有するポリマー(化合物)を含有することが好ましい。すなわち、前記レリーフ形成層を形成するレーザー彫刻用樹脂組成物、及びこれにより形成されたレリーフ形成層が、下記式(I)で表される基を有する化合物を含有することが好ましい。
    *-M(R1)(R2n   (I)
 (式(I)中、R1はOR3又はハロゲン原子を表し、MはSi、Ti又はAlを表し、MがSiであるときnは2であり、MがTiであるときnは2であり、MがAlであるときnは1であり、n個あるR2はそれぞれ独立に炭化水素基、OR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、*は、他の構造との結合位置を表す。)
 前記式(I)で表される基は、MがSiであって、下記式(i)で表される基であることが好ましい。
    *-Si(OR3)(R22   (i)
 (式(i)中、2個あるR2はそれぞれ独立に炭化水素基、OR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、*は、他の構造との結合位置を表す。)
 前記式(I)で表される基を有するポリマーにおけるR1~R3、n及びMは、後述する式(I)で表される基を有する化合物におけるR1~R3、n及びMと同義であり、好ましい範囲も同様である。
In the method for making a relief printing plate of the present invention, the engraving residue preferably contains a polymer (compound) having a group represented by the following formula (I). That is, it is preferable that the resin composition for laser engraving forming the relief forming layer and the relief forming layer formed thereby contain a compound having a group represented by the following formula (I).
* -M (R 1 ) (R 2 ) n (I)
(In the formula (I), R 1 represents OR 3 or a halogen atom, M represents Si, Ti, or Al. When M is Si, n is 2, and when M is Ti, n is 2. And when M is Al, n is 1, each R 2 independently represents a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * (Represents the bonding position with other structures)
In the group represented by the formula (I), M is preferably Si, and is preferably a group represented by the following formula (i).
* -Si (OR 3 ) (R 2 ) 2 (i)
(In formula (i), two R 2 s each independently represent a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * represents a bonding position with another structure. Represents.)
R 1 ~ R 3, n and M in the polymer having a group represented by the formula (I), R 1 ~ R 3 in the compound having a group represented by the formula (I) described below, n and the M It is synonymous and the preferable range is also the same.
<リンス処理工程>
 本発明のレリーフ印刷版の製版方法は、彫刻により発生した彫刻カスをリンス液で除去する工程(リンス処理工程)を含む。
 前記リンス処理工程におけるリンス液は、本発明のレリーフ印刷版製版用リンス液を使用する。
 彫刻された直後のレリーフ印刷版は、表面に彫刻カスが付着している。前記リンス処理工程においては、本発明のレリーフ印刷版製版用リンス液により前記彫刻カスの除去を行う。
 リンス液の使用量は、少なくとも版全体が液で覆われる必要がある。使用量は、版によっても異なるが、10mL/m2以上であることが好ましく、50mL/m2以上であることがより好ましく、70mL/m2以上であることが更に好ましい。また、リンス液の使用量は、処理液量のコストの点から、70~500mL/m2であることが特に好ましい。
 前記リンス処理工程におけるリンスを行う手段としては、特に制限はないが、リンス液で単に洗浄する方法、高圧リンス液をスプレー噴射する方法、感光性樹脂凸版の現像機として公知のバッチ式あるいは搬送式のブラシ式洗い出し機で、彫刻表面を主にリンス液の存在下でブラシ擦りする方法などが挙げられる。
 また、リンス作業は、手作業で行ってもよく、市販されている洗浄装置などの製版装置を用いてもよい。洗浄装置で処理する場合には、洗浄装置内のタンクにリンス液を仕込んで処理することができる。この場合、タンク容量に合わせて液を仕込み、処理を行う。洗浄装置としては、日本電子精機(株)のJOW-1824-WFなどを用いることができる。
<Rinsing process>
The plate making method of the relief printing plate of the present invention includes a step of removing engraving residue generated by engraving with a rinsing liquid (rinsing treatment step).
As the rinsing liquid in the rinsing process, the rinsing liquid for relief printing plate making of the present invention is used.
The relief printing plate immediately after engraving has engraving residue on the surface. In the rinsing process, the engraving residue is removed with the relief printing plate rinsing liquid of the present invention.
The amount of the rinsing liquid used is required to cover at least the entire plate with the liquid. The amount used varies depending on the plate, but is preferably 10 mL / m 2 or more, more preferably 50 mL / m 2 or more, and further preferably 70 mL / m 2 or more. The amount of the rinse solution used is particularly preferably 70 to 500 mL / m 2 from the viewpoint of the cost of the treatment solution.
The means for rinsing in the rinsing process is not particularly limited, but a method of simply washing with a rinsing liquid, a method of spraying a high-pressure rinsing liquid, a batch type or a conveying type known as a photosensitive resin letterpress developing machine. And a method of brushing the engraved surface mainly in the presence of a rinsing liquid.
Further, the rinsing operation may be performed manually, or a plate making apparatus such as a commercially available cleaning apparatus may be used. In the case of processing with a cleaning device, a rinsing liquid can be charged into the tank in the cleaning device for processing. In this case, the liquid is charged in accordance with the tank capacity and processing is performed. As the cleaning device, JOW-1824-WF manufactured by JEOL Seiki Co., Ltd. can be used.
 また、本発明のレリーフ印刷版の製版方法では、必要に応じて下記乾燥工程、及び/又は、後架橋工程を含んでもよい。
 乾燥工程:彫刻されたレリーフ層を乾燥する工程。
 後架橋工程:彫刻後のレリーフ層にエネルギーを付与し、レリーフ層を更に架橋する工程。
 本発明のレリーフ印刷版の製版方法は、彫刻されたレリーフ形成層を乾燥してリンス液を揮発させる工程を含むことが好ましい。
 本発明のレリーフ印刷版の製版方法は更に、必要に応じて、レリーフ形成層を更に架橋させる工程を含んでいてもよい。後架橋工程を行うことにより、彫刻によって形成されたレリーフをより強固にすることができる。
 また、後架橋工程を含む場合は、使用したレリーフ印刷版原版が、架橋により硬化された状態のレリーフ形成層を有するものであることが好ましい。
Moreover, in the plate-making method of the relief printing plate of this invention, the following drying process and / or a post-crosslinking process may be included as needed.
Drying step: a step of drying the engraved relief layer.
Post-crosslinking step: a step of imparting energy to the relief layer after engraving and further crosslinking the relief layer.
The plate making method of the relief printing plate of the present invention preferably includes a step of drying the engraved relief forming layer to volatilize the rinse liquid.
The plate making method of the relief printing plate of the present invention may further include a step of further crosslinking the relief forming layer, if necessary. By performing the post-crosslinking step, the relief formed by engraving can be further strengthened.
Moreover, when a post-crosslinking process is included, it is preferable that the used relief printing plate precursor has a relief forming layer cured by crosslinking.
<レリーフ印刷版原版>
 本発明に用いることができるレリーフ印刷版原版は、非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を含有するレリーフ形成層を支持体上に有するものであれば特に制限はなく、公知のレリーフ印刷版原版を用いることができるが、レーザー彫刻用レリーフ印刷版原版であることが好ましく、レーザー彫刻用樹脂組成物からなるレリーフ形成層を有するものであることがより好ましい。また、前記レリーフ形成層は、架橋構造を有することが好ましく、また、熱及び/又は光により架橋させた層であることが好ましい。
 前記レリーフ形成層は、特に制限はなく、公知のものを用いることができるが、後述するレーザー彫刻用樹脂組成物からなる層、又は、後述するレーザー彫刻用樹脂組成物を硬化した層であることが好ましい。また、レリーフ形成層は、支持体上に設けられることが好ましい。
<Relief printing plate precursor>
The relief printing plate precursor that can be used in the present invention is not particularly limited as long as it has a relief-forming layer containing a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent on a support, and is a known relief. Although a printing plate precursor can be used, it is preferably a relief printing plate precursor for laser engraving, more preferably a relief forming layer made of a resin composition for laser engraving. The relief forming layer preferably has a crosslinked structure, and is preferably a layer crosslinked by heat and / or light.
The relief forming layer is not particularly limited and a known layer can be used, and it is a layer made of a resin composition for laser engraving described later, or a layer obtained by curing a resin composition for laser engraving described later. Is preferred. The relief forming layer is preferably provided on the support.
 レーザー彫刻用レリーフ印刷版原版は、必要により更に、支持体とレリーフ形成層との間に接着層を、また、レリーフ形成層上にスリップコート層、保護フィルムを有していてもよい。
 なお、レリーフ形成層は、例えば、塗布液組成物を用い、これをシート状あるいはスリーブ状に成形することで形成することができる。塗布液組成物としては、後述するレーザー彫刻用樹脂組成物が好ましく例示できる。
If necessary, the relief printing plate precursor for laser engraving may further have an adhesive layer between the support and the relief forming layer, and a slip coat layer and a protective film on the relief forming layer.
The relief forming layer can be formed, for example, by using a coating liquid composition and molding it into a sheet or sleeve. As a coating liquid composition, the resin composition for laser engraving mentioned later can be illustrated preferably.
<支持体>
 本発明に用いることができるレリーフ印刷版原版は、支持体を有していてもよい。
 レリーフ印刷版原版における支持体に使用する素材は、特に限定されないが、寸法安定性の高いものが好ましく使用され、例えば、スチール、ステンレス、アルミニウムなどの金属、ポリエステル樹脂(例えば、PET、PBT、PAN)やポリ塩化ビニルなどのプラスチック樹脂、スチレン-ブタジエンゴムなどの合成ゴム、ガラスファイバーで補強されたプラスチック樹脂(エポキシ樹脂やフェノール樹脂など)が挙げられる。支持体としては、PET(ポリエチレンテレフタレート)フィルムやスチール基板が好ましく用いられる。支持体の形態は、レリーフ形成層がシート状であるかスリーブ状であるかによって決定される。
 また、架橋性のレーザー彫刻用樹脂組成物を塗布し、裏面(レーザー彫刻を行う面と反対面であり、円筒状のものも含む。)から光又は熱などで硬化させて作製されたレーザー彫刻用レリーフ印刷版原版においては、硬化したレーザー彫刻用樹脂組成物の裏面側が支持体として機能するため、必ずしも支持体は必須ではない。
<Support>
The relief printing plate precursor that can be used in the present invention may have a support.
The material used for the support in the relief printing plate precursor is not particularly limited, but materials having high dimensional stability are preferably used. For example, metals such as steel, stainless steel, and aluminum, polyester resins (for example, PET, PBT, PAN) ) And plastic resins such as polyvinyl chloride, synthetic rubbers such as styrene-butadiene rubber, and plastic resins reinforced with glass fibers (such as epoxy resins and phenol resins). As the support, a PET (polyethylene terephthalate) film or a steel substrate is preferably used. The form of the support is determined depending on whether the relief forming layer is a sheet or a sleeve.
Also, a laser engraving produced by applying a crosslinkable resin composition for laser engraving and curing it from the back surface (opposite to the surface on which laser engraving is performed, including cylindrical ones) with light or heat. In the relief printing plate precursor for use, since the back side of the cured resin composition for laser engraving functions as a support, the support is not always essential.
<接着層>
 レリーフ形成層と支持体との間には、両層間の接着力を強化する目的で接着層を設けてもよい。接着層に使用することができる材料(接着剤)としては、例えば、I.Skeist編、「Handbook of Adhesives」、第2版(1977)に記載のものを用いることができる。
<Adhesive layer>
An adhesive layer may be provided between the relief forming layer and the support for the purpose of enhancing the adhesive force between the two layers. Examples of materials (adhesives) that can be used for the adhesive layer include I.I. Those described in the edition of Skeist, “Handbook of Adhesives”, the second edition (1977) can be used.
<保護フィルム、スリップコート層>
 レリーフ形成層表面への傷・凹み防止の目的で、レリーフ形成層表面に保護フィルムを設けてもよい。保護フィルムの厚さは、25~500μmが好ましく、50~200μmがより好ましい。保護フィルムは、例えば、PET(ポリエチレンテレフタレート)のようなポリエステル系フィルム、PE(ポリエチレン)やPP(ポリプロピレン)のようなポリオレフィン系フィルムを用いることができる。またフィルムの表面はマット化されていてもよい。レリーフ形成層上に保護フィルムを設ける場合、保護フィルムは剥離可能でなければならない。
<Protective film, slip coat layer>
For the purpose of preventing scratches and dents on the surface of the relief forming layer, a protective film may be provided on the surface of the relief forming layer. The thickness of the protective film is preferably 25 to 500 μm, more preferably 50 to 200 μm. As the protective film, for example, a polyester film such as PET (polyethylene terephthalate) or a polyolefin film such as PE (polyethylene) or PP (polypropylene) can be used. The surface of the film may be matted. When providing a protective film on a relief forming layer, the protective film must be peelable.
 保護フィルムが剥離不可能な場合や、逆にレリーフ形成層に接着しにくい場合には、両層間にスリップコート層を設けてもよい。スリップコート層に使用される材料は、ポリビニルアルコール、ポリ酢酸ビニル、部分鹸化ポリビニルアルコール、ヒドロシキアルキルセルロース、アルキルセルロース、ポリアミド樹脂など、水に溶解又は分散可能で、粘着性の少ない樹脂を主成分とすることが好ましい。 When the protective film is not peelable or, on the contrary, difficult to adhere to the relief forming layer, a slip coat layer may be provided between both layers. The material used for the slip coat layer is a resin that can be dissolved or dispersed in water, such as polyvinyl alcohol, polyvinyl acetate, partially saponified polyvinyl alcohol, hydroxyalkyl cellulose, alkyl cellulose, polyamide resin, etc. It is preferable that
-レリーフ印刷版原版の作製方法-
 次に、レリーフ印刷版原版の作製方法について説明する。
 レリーフ印刷版原版におけるレリーフ形成層の形成は、特に限定されるものではないが、例えば、レリーフ形成層用塗布液組成物(レーザー彫刻用樹脂組成物を含有)を調製し、このレリーフ形成層用塗布液組成物から溶媒を除去した後に、支持体上に溶融押し出しする方法が挙げられる。あるいはレリーフ形成層用塗布液組成物を、支持体上に流延し、これをオーブン中で乾燥して塗布液組成物から溶媒を除去する方法でもよい。
 その後、必要に応じてレリーフ形成層の上に保護フィルムをラミネートしてもよい。ラミネートは、加熱したカレンダーロールなどで保護フィルムとレリーフ形成層を圧着することや、表面に少量の溶媒を含浸させたレリーフ形成層に保護フィルムを密着させることによって行うことができる。
 保護フィルムを用いる場合には、まず保護フィルム上にレリーフ形成層を積層し、次いで支持体をラミネートする方法を採ってもよい。
 接着層を設ける場合は、接着層を塗布した支持体を用いることで対応できる。スリップコート層を設ける場合は、スリップコート層を塗布した保護フィルムを用いることで対応できる。
-Relief printing plate precursor preparation method-
Next, a method for producing a relief printing plate precursor will be described.
The formation of the relief forming layer in the relief printing plate precursor is not particularly limited. For example, a relief forming layer coating solution composition (containing a resin composition for laser engraving) is prepared, and this relief forming layer is used. The method of melt-extruding on a support after removing a solvent from a coating liquid composition is mentioned. Or the method of casting the coating liquid composition for relief forming layers on a support body, drying this in oven, and removing a solvent from a coating liquid composition may be sufficient.
Thereafter, a protective film may be laminated on the relief forming layer as necessary. Lamination can be performed by pressure-bonding the protective film and the relief forming layer with a heated calendar roll or the like, or by bringing the protective film into close contact with the relief forming layer impregnated with a small amount of solvent on the surface.
When a protective film is used, a method of first laminating a relief forming layer on the protective film and then laminating the support may be employed.
When providing an adhesive layer, it can respond by using the support body which apply | coated the adhesive layer. When providing a slip coat layer, it can respond by using the protective film which apply | coated the slip coat layer.
 レリーフ形成層用塗布液組成物は、例えば、バインダーポリマー、光熱変換剤、可塑剤を適当な溶媒に溶解させ、次いで、重合性化合物及び重合開始剤を溶解させることによって製造できる。溶媒成分のほとんどは、レリーフ印刷版原版を製造する段階で除去する必要があるので、溶媒としては揮発しやすい低分子アルコール(例えば、メタノール、エタノール、n-プロパノール、イソプロパノール、プロピレングリコ-ルモノメチルエーテル)等を用い、かつ温度を調整するなどして溶媒の全添加量をできるだけ少なく抑えることが好ましい。 The coating composition for the relief forming layer can be produced, for example, by dissolving a binder polymer, a photothermal conversion agent and a plasticizer in an appropriate solvent, and then dissolving a polymerizable compound and a polymerization initiator. Since most of the solvent components need to be removed at the stage of producing the relief printing plate precursor, the solvent is a low-molecular alcohol that easily volatilizes (for example, methanol, ethanol, n-propanol, isopropanol, propylene glycol monomethyl ether). ) And the like, and adjusting the temperature, it is preferable to keep the total amount of the solvent added as small as possible.
 ここで、本発明において、レーザー彫刻用レリーフ印刷版原版といった場合、前述のように、レリーフ形成層が架橋された状態までを指す。レリーフ形成層を架橋する方法には、レリーフ形成層を活性光線の照射及び/又は加熱により架橋する工程を行うことが好ましい。
 また、ここでいう「架橋」とは、ポリマー同士を連結する架橋反応を含む概念であり、また、エチレン性不飽和結合を有する重合性化合物同士の重合反応やポリマーと重合性化合物の反応によるレリーフ形成層の硬化反応をも含む概念である。
Here, in the present invention, in the case of a relief printing plate precursor for laser engraving, as described above, it refers to a state where the relief forming layer is crosslinked. In the method of crosslinking the relief forming layer, it is preferable to perform a step of crosslinking the relief forming layer by irradiation with active light and / or heating.
The term “crosslinking” as used herein is a concept including a crosslinking reaction for linking polymers, and a relief caused by a polymerization reaction between polymerizable compounds having an ethylenically unsaturated bond or a reaction between a polymer and a polymerizable compound. It is a concept that includes the curing reaction of the formation layer.
 レリーフ印刷版原版におけるレリーフ形成層の厚さは、0.05mm以上10mm以下が好ましく、0.05mm以上7mm以下がより好ましく、0.05mm以上3mm以下が特に好ましい。 The thickness of the relief forming layer in the relief printing plate precursor is preferably from 0.05 mm to 10 mm, more preferably from 0.05 mm to 7 mm, particularly preferably from 0.05 mm to 3 mm.
 また、レリーフ印刷版が有するレリーフ層のショアA硬度は、50°以上90°以下であることが好ましい。
 レリーフ形成層のショアA硬度が50°以上であると、彫刻により形成された微細な網点が凸版印刷機の強い印圧を受けても倒れてつぶれることがなく、正常な印刷ができる。また、レリーフ層のショアA硬度が90°以下であると、印圧がキスタッチのフレキソ印刷でもベタ部での印刷かすれを防止することができる。
 なお、本明細書におけるショアA硬度は、25℃50%RHにおいて、測定対象の表面に圧子(押針又はインデンタと呼ばれる。)を押し込み変形させ、その変形量(押込み深さ)を測定して、数値化するデュロメータ(スプリング式ゴム硬度計)により測定した値である。
The Shore A hardness of the relief layer of the relief printing plate is preferably 50 ° or more and 90 ° or less.
When the Shore A hardness of the relief forming layer is 50 ° or more, even if the fine halftone dots formed by engraving are subjected to the strong printing pressure of the relief printing press, they do not collapse and can be printed normally. In addition, when the Shore A hardness of the relief layer is 90 ° or less, it is possible to prevent faint printing in a solid portion even in flexographic printing with a printing pressure of kiss touch.
In addition, the Shore A hardness in this specification is measured by measuring the amount of deformation (indentation depth) by pressing and deforming an indenter (called a push needle or indenter) on the surface of the object to be measured at 25 ° C. and 50% RH. The value measured with a durometer (spring type rubber hardness meter) for digitization.
 本発明のレリーフ印刷版の製版方法で製造されたレリーフ印刷版は、凸版用印刷機による油性インキやUVインキでの印刷が可能であり、また、フレキソ印刷機によるUVインキでの印刷も可能である。 The relief printing plate produced by the method for making a relief printing plate of the present invention can be printed with oil-based ink or UV ink by a relief printing press, and can also be printed with UV ink by a flexographic printing press. is there.
<レーザー彫刻用樹脂組成物>
 本発明に用いることができるレーザー彫刻用樹脂組成物(以下、単に「樹脂組成物」ともいう。)は、非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を少なくとも含有する。
<Resin engraving resin composition>
The resin composition for laser engraving (hereinafter also simply referred to as “resin composition”) that can be used in the present invention contains at least a non-elastomeric binder polymer, a plasticizer, and a photothermal conversion agent.
 前記樹脂組成物の適用態様として、具体的には、レーザー彫刻により画像形成を行う画像形成材料の画像形成層、凸状のレリーフ形成をレーザー彫刻により行う印刷版原版のレリーフ形成層、凹版、孔版、スタンプ等が挙げられるが、これらに限定されるものではない。
 以下、レーザー彫刻用樹脂組成物の構成要素について説明する。
As an application mode of the resin composition, specifically, an image forming layer of an image forming material that forms an image by laser engraving, a relief forming layer of a printing plate precursor that forms a convex relief by laser engraving, an intaglio, and a stencil , Stamps and the like, but are not limited thereto.
Hereinafter, the components of the resin composition for laser engraving will be described.
〔バインダーポリマー〕
 前記レーザー彫刻用樹脂組成物は、バインダーポリマー(以下、「バインダー」ともいう。)を含有することが好ましい。
 本発明のレリーフ印刷版製版用リンス液は、非エラストマーのバインダーを含有するレリーフ形成層をレーザー彫刻した際に発生する彫刻カスを除去するのに好適であり、レーザー彫刻用樹脂組成物に含有されるバインダーは、非エラストマーであることが好ましい。以下では、本発明を適用し得るバインダー一般について説明した後、本発明において好ましく用いられるバインダーについて説明する。
 バインダーは、レーザー彫刻用樹脂組成物に含有される高分子成分であり、一般的な高分子化合物を適宜選択し、1種又は2種以上を併用して用いることができる。特に、レーザー彫刻用樹脂組成物を印刷版原版に用いる際は、レーザー彫刻性、インキ受与性、彫刻カス分散性などの種々の性能を考慮して選択することが必要である。
 バインダーとしては、ポリスチレン樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリウレア樹脂、ポリアミドイミド樹脂、ポリウレタン樹脂、ポリスルホン樹脂、ポリエーテルスルホン樹脂、ポリイミド樹脂、ポリカーボネート樹脂、ヒドロキシエチレン単位を含む親水性ポリマー、アクリル樹脂、アセタール樹脂、エポキシ樹脂、ポリカーボネート樹脂、ゴム、熱可塑性エラストマーなどから選択して用いることができる。
[Binder polymer]
The resin composition for laser engraving preferably contains a binder polymer (hereinafter also referred to as “binder”).
The rinsing liquid for making a relief printing plate of the present invention is suitable for removing engraving residue generated when a relief forming layer containing a non-elastomeric binder is laser engraved, and is contained in a resin composition for laser engraving. The binder is preferably a non-elastomer. Below, after explaining the binder in general which can apply this invention, the binder preferably used in this invention is demonstrated.
The binder is a polymer component contained in the resin composition for laser engraving, and a general polymer compound can be appropriately selected and used alone or in combination of two or more. In particular, when a resin composition for laser engraving is used for a printing plate precursor, it is necessary to select it in consideration of various performances such as laser engraving property, ink acceptability, and engraving residue dispersibility.
The binder includes polystyrene resin, polyester resin, polyamide resin, polyurea resin, polyamideimide resin, polyurethane resin, polysulfone resin, polyethersulfone resin, polyimide resin, polycarbonate resin, hydrophilic polymer containing hydroxyethylene units, acrylic resin, acetal. A resin, an epoxy resin, a polycarbonate resin, rubber, a thermoplastic elastomer, or the like can be selected and used.
 例えば、レーザー彫刻感度の観点からは、露光あるいは加熱により熱分解する部分構造を含むポリマーが好ましい。このようなポリマーは、特開2008-163081号公報の段落0038に記載されているものが好ましく挙げられる。また、例えば、柔軟で可撓性を有する膜形成が目的とされる場合には、軟質樹脂や熱可塑性エラストマーが選択される。特開2008-163081号公報の段落0039~0040に詳述されている。さらに、レーザー彫刻用樹脂組成物を、レーザー彫刻用レリーフ印刷版原版におけるレリーフ形成層に適用する場合であれば、レリーフ形成層用組成物の調製の容易性、得られたレリーフ印刷版における油性インクに対する耐性向上の観点から、親水性又は親アルコール性ポリマーを使用することが好ましい。親水性ポリマーとしては、特開2008-163081号公報の段落0041に詳述されているものを使用することができる。 For example, from the viewpoint of laser engraving sensitivity, a polymer containing a partial structure that is thermally decomposed by exposure or heating is preferable. Preferred examples of such a polymer include those described in paragraph 0038 of JP2008-163081A. For example, when the purpose is to form a soft and flexible film, a soft resin or a thermoplastic elastomer is selected. This is described in detail in paragraphs 0039 to 0040 of JP-A-2008-163081. Furthermore, if the resin composition for laser engraving is applied to the relief forming layer in the relief printing plate precursor for laser engraving, the ease of preparation of the composition for relief forming layer and the oil-based ink in the obtained relief printing plate It is preferable to use a hydrophilic or alcoholic polymer from the viewpoint of improving the resistance to water. As the hydrophilic polymer, those described in detail in paragraph 0041 of JP-A-2008-163081 can be used.
 加えて、加熱や露光により硬化させ、強度を向上させる目的に使用する場合には、分子内に炭素-炭素不飽和結合をもつポリマーが好ましく用いられる。
 このようなバインダーとして、主鎖に炭素-炭素不飽和結合を含むポリマーとしては、例えば、SB(ポリスチレン-ポリブタジエン)、SBS(ポリスチレン-ポリブタジエン-ポリスチレン)、SIS(ポリスチレン-ポリイソプレン-ポリスチレン)、SEBS(ポリスチレン-ポリエチレン/ポリブチレン-ポリスチレン)等が挙げられる。
 側鎖に炭素-炭素不飽和結合をもつポリマーとしては、前記ポリマーの骨格に、アリル基、アクリロイル基、メタクリロイル基、スチリル基、ビニルエーテル基のような炭素-炭素不飽和結合を側鎖に導入することで得られる。ポリマー側鎖に炭素-炭素不飽和結合を導入する方法は、(1)重合性基に保護基を結合させてなる重合性基前駆体を有する構造単位をポリマーに共重合させ、保護基を脱離させて重合性基とする方法、(2)水酸基、アミノ基、エポキシ基、カルボキシル基などの反応性基を複数有する高分子化合物を作製し、これらの反応性基と反応する基及び炭素-炭素不飽和結合を有する化合物を高分子反応させて導入する方法など、公知の方法をとることができる。これらの方法によれば、高分子化合物中への不飽和結合、重合性基の導入量を制御することができる。
In addition, when used for the purpose of curing by heating or exposure and improving the strength, a polymer having a carbon-carbon unsaturated bond in the molecule is preferably used.
As such a binder, examples of the polymer containing a carbon-carbon unsaturated bond in the main chain include SB (polystyrene-polybutadiene), SBS (polystyrene-polybutadiene-polystyrene), SIS (polystyrene-polyisoprene-polystyrene), SEBS. (Polystyrene-polyethylene / polybutylene-polystyrene) and the like.
As a polymer having a carbon-carbon unsaturated bond in the side chain, a carbon-carbon unsaturated bond such as an allyl group, an acryloyl group, a methacryloyl group, a styryl group, or a vinyl ether group is introduced into the side chain of the polymer. Can be obtained. The method for introducing a carbon-carbon unsaturated bond into a polymer side chain is as follows. (1) A structural unit having a polymerizable group precursor formed by bonding a protective group to a polymerizable group is copolymerized with the polymer to remove the protective group. (2) preparing a polymer compound having a plurality of reactive groups such as hydroxyl group, amino group, epoxy group and carboxyl group, and reacting with these reactive groups and carbon- A known method such as a method of introducing a compound having a carbon unsaturated bond by polymer reaction can be employed. According to these methods, the amount of unsaturated bonds and polymerizable groups introduced into the polymer compound can be controlled.
 バインダーとしては、水酸基(-OH)を有するポリマー(以下、「特定ポリマー」ともいう。)を用いることが特に好ましい。特定ポリマーの骨格としては、特に限定されないが、アクリル樹脂、エポキシ樹脂、ヒドロキシエチレン単位を含む親水性ポリマー、ポリビニルアセタール樹脂、ポリエステル樹脂、ポリウレタン樹脂が好ましい。
 水酸基を有するアクリル樹脂の合成に用いられるアクリル単量体としては、例えば(メタ)アクリル酸エステル類、クロトン酸エステル類(メタ)アクリルアミド類であって分子内にヒドロキシル基を有するものが好ましい。この様な単量体の具体例としては例えば、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート等が挙げられる。これらと公知の(メタ)アクリル系モノマーやビニル系モノマーとを重合させた共重合体を好ましく用いることができる。
 特定ポリマーとして、ヒドロキシ基を側鎖に有するエポキシ樹脂を用いることも可能である。好ましい具体例としては、ビスフェノールAとエピクロヒドリンとの付加物を原料モノマーとして重合して得られるエポキシ樹脂が好ましい。
 ポリエステル樹脂としては、ポリ乳酸などのヒドロキシルカルボン酸ユニットからなるポリエステル樹脂を好ましく用いることができる。このようなポリエステル樹脂としては、具体的には、ポリヒドロキシアルカノエート(PHA)、乳酸系ポリマー、ポリグリコール酸(PGA)、ポリカプロラクトン(PCL)、ポリ(ブチレンコハク酸)、これらの誘導体又は混合物よりなる群から選択されるものが好ましい。
As the binder, it is particularly preferable to use a polymer having a hydroxyl group (—OH) (hereinafter also referred to as “specific polymer”). The skeleton of the specific polymer is not particularly limited, but an acrylic resin, an epoxy resin, a hydrophilic polymer containing a hydroxyethylene unit, a polyvinyl acetal resin, a polyester resin, and a polyurethane resin are preferable.
As the acrylic monomer used for the synthesis of the acrylic resin having a hydroxyl group, for example, (meth) acrylic acid esters and crotonic acid esters (meth) acrylamides having a hydroxyl group in the molecule are preferable. Specific examples of such a monomer include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate and the like. A copolymer obtained by polymerizing these and a known (meth) acrylic monomer or vinyl monomer can be preferably used.
It is also possible to use an epoxy resin having a hydroxy group in the side chain as the specific polymer. As a preferable specific example, an epoxy resin obtained by polymerizing an adduct of bisphenol A and epichlorohydrin as a raw material monomer is preferable.
As the polyester resin, a polyester resin composed of hydroxyl carboxylic acid units such as polylactic acid can be preferably used. Specific examples of the polyester resin include polyhydroxyalkanoate (PHA), lactic acid-based polymer, polyglycolic acid (PGA), polycaprolactone (PCL), poly (butylene succinic acid), and derivatives or mixtures thereof. Those selected from the group consisting of are preferred.
 特定ポリマーとしては、前記化合物(I)と反応し得る原子及び/又は基を有するポリマーであることが好ましく、前記化合物(I)と反応し得る原子及び/又は基を有するポリマーであり、水不溶、かつ、炭素数1~4のアルコールに可溶のバインダーポリマーであることがより好ましい。
 前記化合物(I)と反応し得る原子及び/又は基としては特に限定されないが、エチレン性不飽和結合、エポキシ基、アミノ基、(メタ)アクリロイル基、メルカプト基、ヒドロキシ基が例示され、これらの中でも、ヒドロキシ基が好ましく例示される。
The specific polymer is preferably a polymer having an atom and / or group capable of reacting with the compound (I), and is a polymer having an atom and / or group capable of reacting with the compound (I) and is insoluble in water. More preferably, the binder polymer is soluble in an alcohol having 1 to 4 carbon atoms.
Although it does not specifically limit as an atom and / or group which can react with the said compound (I), An ethylenically unsaturated bond, an epoxy group, an amino group, a (meth) acryloyl group, a mercapto group, a hydroxy group is illustrated, These Of these, hydroxy groups are preferred.
 本発明における特定ポリマーとして、水性インキ適性とUVインキ適性を両立しつつ、かつ彫刻感度が高く皮膜性も良好であるという観点で、ポリビニルブチラール(PVB)、側鎖にヒドロキシル基を有するアクリル樹脂及び側鎖にヒドロキシル基を有するエポキシ樹脂等が好ましく例示される。 As a specific polymer in the present invention, polyvinyl butyral (PVB), an acrylic resin having a hydroxyl group in a side chain, and a film having good engraving sensitivity and good film property while achieving both water-based ink suitability and UV ink suitability Preferred examples include an epoxy resin having a hydroxyl group in the side chain.
 本発明に用いることができる特定ポリマーは、本発明においてレリーフ形成層を構成するレーザー彫刻用樹脂組成物の好ましい併用成分である、後述する700~1,300nmの波長の光を吸収可能な光熱変換剤と組み合わせた場合に、ガラス転移温度(Tg)が20℃以上のものとすることで、彫刻感度が向上するため、特に好ましい。このようなガラス転移温度を有するポリマーを、以下、非エラストマーと称する。すなわち、エラストマーとは、一般的に、ガラス転移温度が常温以下のポリマーであるとして学術的に定義されている(科学大辞典 第2版、編者 国際科学振興財団、発行 丸善株式会社、P154参照)。従って、非エラストマーとはガラス転移温度が常温を超える温度であるポリマーを指す。特定ポリマーのガラス転移温度の上限には制限はないが、200℃以下であることが取り扱い性の観点から好ましく、25℃以上120℃以下であることがより好ましい。 The specific polymer that can be used in the present invention is a photothermal conversion capable of absorbing light having a wavelength of 700 to 1,300 nm, which will be described later, which is a preferred combined component of the resin composition for laser engraving constituting the relief forming layer in the present invention. When combined with an agent, a glass transition temperature (Tg) of 20 ° C. or higher is particularly preferable because engraving sensitivity is improved. Hereinafter, a polymer having such a glass transition temperature is referred to as a non-elastomer. That is, an elastomer is generally defined academically as a polymer having a glass transition temperature of room temperature or lower (see Science Dictionary, Second Edition, Editor, International Science Promotion Foundation, published by Maruzen Co., Ltd., P154). . Therefore, a non-elastomer refers to a polymer having a glass transition temperature exceeding normal temperature. Although there is no restriction | limiting in the upper limit of the glass transition temperature of a specific polymer, it is preferable from a viewpoint of handleability that it is 200 degrees C or less, and it is more preferable that it is 25 degreeC or more and 120 degrees C or less.
 ガラス転移温度が室温(20℃)以上のポリマーを用いる場合、特定ポリマーは常温ではガラス状態をとるが、このためゴム状態をとる場合に比較して、熱的な分子運動はかなり抑制された状態にある。レーザー彫刻においては、レーザー照射時に、赤外線レーザーが付与する熱に加え、所望により併用される光熱変換剤の機能により発生した熱が、周囲に存在する特定ポリマーに伝達され、これが熱分解、消散して、結果的に彫刻されて凹部が形成される。
 特定ポリマーを用いた場合、特定ポリマーの熱的な分子運動が抑制された状態の中に光熱変換剤が存在すると特定ポリマーへの熱伝達と熱分解が効果的に起こるものと考えられ、このような効果によって彫刻感度がさらに増大したものと推定される。
When a polymer having a glass transition temperature of room temperature (20 ° C.) or higher is used, the specific polymer takes a glass state at room temperature. Therefore, compared to a rubber state, the thermal molecular motion is considerably suppressed. It is in. In laser engraving, in addition to the heat imparted by the infrared laser during laser irradiation, the heat generated by the function of the photothermal conversion agent used in combination with the desired heat is transferred to a specific polymer around it, which decomposes and dissipates. As a result, the recess is formed by engraving.
When a specific polymer is used, if a photothermal conversion agent is present in a state where thermal molecular motion of the specific polymer is suppressed, heat transfer to the specific polymer and thermal decomposition are considered to occur effectively. It is presumed that the engraving sensitivity is further increased due to various effects.
 本発明において好ましく用いられる非エラストマーであるポリマーの具体例を、以下に例示する。 Specific examples of polymers that are non-elastomers preferably used in the present invention are illustrated below.
(1)ポリビニルアセタール及びその誘導体
 ポリビニルアセタールは、ポリビニルアルコール(ポリ酢酸ビニルを鹸化して得られる。)を環状アセタール化することにより得られる化合物である。また、ポリビニルアセタール誘導体は、前記ポリビニルアセタールを変性させたり、他の共重合成分を加えたものである。
 ポリビニルアセタール中のアセタール含量(原料の酢酸ビニルモノマーの総モル数を100%とし、アセタール化されるビニルアルコール単位のモル%)は、30~90%が好ましく、50~85%がより好ましく、55~78%が特に好ましい。
 ポリビニルアセタール中のビニルアルコール単位としては、原料の酢酸ビニルモノマーの総モル数に対して、10~70モル%が好ましく、15~50モル%がより好ましく、22~45モル%が特に好ましい。
 また、ポリビニルアセタールは、その他の成分として、酢酸ビニル単位を有していてもよく、その含量としては0.01~20モル%が好ましく、0.1~10モル%が更に好ましい。ポリビニルアセタール誘導体は、さらに、その他の共重合単位を有していてもよい。
 ポリビニルアセタールとしては、ポリビニルブチラール、ポリビニルプロピラール、ポリビニルエチラール、ポリビニルメチラールなどが挙げられる。中でも、ポリビニルブチラール(PVB)が好ましい。
 ポリビニルブチラールは、通常、ポリビニルアルコールをブチラール化して得られるポリマーである。また、ポリビニルブチラール誘導体を用いてもよい。
 ポリビニルブチラール誘導体の例として、水酸基の少なくとも一部をカルボキシル基等の酸基に変性した酸変性PVB、水酸基の一部を(メタ)アクリロイル基に変性した変性PVB、水酸基の少なくとも一部をアミノ基に変性した変性PVB、水酸基の少なくとも一部にエチレングリコールやプロピレングリコール及びこれらの複量体を導入した変性PVB等が挙げられる。
 ポリビニルアセタールの分子量としては、彫刻感度と皮膜性のバランスを保つ観点で、重量平均分子量として5,000~800,000であることが好ましく、より好ましくは8,000~500,000である。さらに、彫刻カスのリンス性向上の観点からは、50,000~300,000であることが特に好ましい。
(1) Polyvinyl acetal and derivatives thereof Polyvinyl acetal is a compound obtained by cyclic acetalization of polyvinyl alcohol (obtained by saponifying polyvinyl acetate). Further, the polyvinyl acetal derivative is obtained by modifying the polyvinyl acetal or adding another copolymer component.
The acetal content in the polyvinyl acetal (mole% of vinyl alcohol units to be acetalized with the total number of moles of vinyl acetate monomer as the raw material being 100%) is preferably 30 to 90%, more preferably 50 to 85%, 55 ˜78% is particularly preferred.
The vinyl alcohol unit in the polyvinyl acetal is preferably 10 to 70 mol%, more preferably 15 to 50 mol%, particularly preferably 22 to 45 mol%, based on the total number of moles of the vinyl acetate monomer as a raw material.
Further, the polyvinyl acetal may have vinyl acetate units as other components, and the content thereof is preferably 0.01 to 20 mol%, more preferably 0.1 to 10 mol%. The polyvinyl acetal derivative may further have other copolymer units.
Examples of the polyvinyl acetal include polyvinyl butyral, polyvinyl propylal, polyvinyl ethylal, and polyvinyl methylal. Among these, polyvinyl butyral (PVB) is preferable.
Polyvinyl butyral is usually a polymer obtained by converting polyvinyl alcohol into butyral. A polyvinyl butyral derivative may also be used.
Examples of polyvinyl butyral derivatives include acid-modified PVB in which at least part of the hydroxyl group is modified to an acid group such as a carboxyl group, modified PVB in which part of the hydroxyl group is modified to a (meth) acryloyl group, and at least part of the hydroxyl group is an amino group Modified PVB, modified PVB in which ethylene glycol, propylene glycol, or a multimer thereof is introduced into at least a part of the hydroxyl group.
The molecular weight of polyvinyl acetal is preferably 5,000 to 800,000, and more preferably 8,000 to 500,000 as a weight average molecular weight from the viewpoint of maintaining a balance between engraving sensitivity and film property. Further, from the viewpoint of improving the rinsing property of engraving residue, it is particularly preferably 50,000 to 300,000.
 以下、ポリビニルアセタールの特に好ましい例として、ポリビニルブチラール(PVB)及びその誘導体を挙げて説明するが、これに限定されない。
 PVBとしては、市販品としても入手可能であり、その好ましい具体例としては、アルコール溶解性(特にエタノール溶解性)の観点で、積水化学工業(株)製の「エスレックB」シリーズ、「エスレックK(KS)」シリーズ、電気化学工業(株)製の「デンカブチラール」が好ましい。更に好ましくは、アルコール溶解性(特にエタノール)の観点で積水化学工業(株)製の「エスレックB」シリーズと電気化学工業(株)製の「デンカブチラール」であり、特に好ましくは積水化学工業(株)製の「エスレックB」シリーズでは、「BL-1」、「BL-1H」、「BL-2」、「BL-5」、「BL-S」、「BX-L」、「BM-S」、「BH-S」、電気化学工業(株)製の「デンカブチラール」では「#3000-1」、「#3000-2」、「#3000-4」、「#4000-2」、「#6000-C」、「#6000-EP」、「#6000-CS」、「#6000-AS」である。
 PVBを特定ポリマーとして用いてレリーフ形成層を製膜する際には、溶媒に溶かした溶液をキャストし乾燥させる方法が、膜の表面の平滑性の観点で好ましい。
Hereinafter, although polyvinyl butyral (PVB) and its derivative (s) are mentioned and demonstrated as a particularly preferable example of polyvinyl acetal, it is not limited to this.
As PVB, it can also be obtained as a commercial product, and preferred specific examples thereof include “ESREC B” series and “ESREC K” manufactured by Sekisui Chemical Co., Ltd. from the viewpoint of alcohol solubility (particularly ethanol solubility). (KS) "series," Denkabutyral "manufactured by Denki Kagaku Kogyo Co., Ltd. are preferred. More preferably, from the viewpoint of alcohol solubility (especially ethanol), “S Lec B” series manufactured by Sekisui Chemical Co., Ltd. and “Denka Butyral” manufactured by Denki Kagaku Kogyo Co., Ltd. are particularly preferable. In the “ESREC B” series manufactured by the same company, “BL-1”, “BL-1H”, “BL-2”, “BL-5”, “BL-S”, “BX-L”, “BM-” "# 3000-1", "# 3000-2", "# 3000-4", "# 4000-2", "S", "BH-S", and "Denkabutyral" manufactured by Denki Kagaku Kogyo Co., Ltd. “# 6000-C”, “# 6000-EP”, “# 6000-CS”, “# 6000-AS”.
When forming a relief forming layer using PVB as a specific polymer, a method of casting and drying a solution dissolved in a solvent is preferable from the viewpoint of the smoothness of the surface of the membrane.
 上記ポリビニルアセタール及びその誘導体のほか、特定ポリマーとしては、公知のアクリル単量体を用いて得るアクリル樹脂であって、分子内にヒドロキシル基を有するものを用いることもできる。また、特定ポリマーとして、フェノール類とアルデヒド類を酸性条件下で縮合させた樹脂であるノボラック樹脂を用いることもできる。また、特定ポリマーとして、ヒドロキシル基を側鎖に有するエポキシ樹脂を用いることも可能である。 In addition to the polyvinyl acetal and its derivatives, as the specific polymer, an acrylic resin obtained by using a known acrylic monomer having a hydroxyl group in the molecule can be used. In addition, a novolak resin that is a resin obtained by condensing phenols and aldehydes under acidic conditions can also be used as the specific polymer. Moreover, it is also possible to use the epoxy resin which has a hydroxyl group in a side chain as a specific polymer.
 特定ポリマーの中でも、レリーフ形成層としたときのリンス性及び耐刷性の観点でポリビニルブチラール及びその誘導体が特に好ましい。
 本発明における特定ポリマーに含まれるヒドロキシル基の含有量は、前記いずれの態様のポリマーにおいても、0.1~15mmol/gであることが好ましく、0.5~7mmol/gであることがより好ましい。
 樹脂組成物には特定バインダーポリマーを1種のみ用いてもよく、2種以上を併用してもよい。
 本発明に用いることができるバインダーの重量平均分子量(GPC測定によるポリスチレン換算)は5,000~1,000,000であることが好ましく、8,000~750,000であることが更に好ましく、10,000~500,000であることが最も好ましい。
 本発明に用いることができる樹脂組成物における特定ポリマーの好ましい含有量は、塗膜の形態保持性と耐水性と彫刻感度をバランスよく満足する観点で、全固形分中、2~95重量%であることが好ましく、より好ましくは5~80重量%、特に好ましくは10~60重量%である。
Among the specific polymers, polyvinyl butyral and its derivatives are particularly preferable from the viewpoint of rinsing properties and printing durability when used as a relief forming layer.
The hydroxyl group content in the specific polymer in the present invention is preferably 0.1 to 15 mmol / g, more preferably 0.5 to 7 mmol / g in any of the above-described polymers. .
Only 1 type of specific binder polymers may be used for a resin composition, and 2 or more types may be used together.
The weight average molecular weight (in terms of polystyrene by GPC measurement) of the binder that can be used in the present invention is preferably 5,000 to 1,000,000, more preferably 8,000 to 750,000. Most preferably, it is from 1,000,000 to 500,000.
The preferred content of the specific polymer in the resin composition that can be used in the present invention is 2 to 95% by weight in the total solid content from the viewpoint of satisfying a good balance of form retention, water resistance and engraving sensitivity of the coating film. It is preferably 5 to 80% by weight, particularly preferably 10 to 60% by weight.
〔併用ポリマー〕
 レーザー彫刻用樹脂組成物には、上記特定ポリマーに加え、ヒドロキシル基を有しないポリマーなど特定ポリマーに包含されない公知のポリマーを併用することができる。以下、このようなポリマーを併用ポリマーともいう。
 併用ポリマーは、前記特定ポリマーとともに、レーザー彫刻用樹脂組成物に含有される主成分を構成するものであり、特定ポリマーに包含されない一般的な高分子化合物を適宜選択し、1種又は2種以上を併用して用いることができる。特に、レリーフ形成版原版を印刷版原版に用いる際は、レーザー彫刻性、インキ受与性、彫刻カス分散性などの種々の性能を考慮して選択することが必要である。
 併用ポリマーとしては、例えば、バインダーとして前述したポリマーのうち、ヒドロキシル基を有さず特定ポリマーに包含されないポリマーなどから選択して用いることができる。
[Combination polymer]
In the resin composition for laser engraving, in addition to the specific polymer, a known polymer that is not included in the specific polymer, such as a polymer having no hydroxyl group, can be used in combination. Hereinafter, such a polymer is also referred to as a combined polymer.
The combined polymer constitutes the main component contained in the resin composition for laser engraving together with the specific polymer, and a general polymer compound not included in the specific polymer is appropriately selected, and one or two or more types are used. Can be used in combination. In particular, when a relief forming plate precursor is used as a printing plate precursor, it is necessary to select it in consideration of various performances such as laser engraving property, ink acceptability, and engraving residue dispersibility.
As the combined polymer, for example, among the polymers described above as the binder, a polymer that does not have a hydroxyl group and is not included in the specific polymer can be used.
 本発明における併用ポリマーの重量平均分子量(GPC測定によるポリスチレン換算)は、0.5万~50万が好ましい。重量平均分子量が0.5万以上であれば、単体樹脂としての形態保持性に優れ、50万以下であれば、水など溶媒に溶解しやすくレリーフ形成層を調製するのに好都合である。併用ポリマーの重量平均分子量は、より好ましくは1万~40万、特に好ましくは1.5万~30万である。 The weight average molecular weight (in terms of polystyrene by GPC measurement) of the combined polymer in the present invention is preferably from 50,000 to 500,000. If the weight average molecular weight is 50,000 or more, the form retainability as a single resin is excellent, and if it is 500,000 or less, it is easy to dissolve in a solvent such as water, which is convenient for preparing a relief forming layer. The weight average molecular weight of the combined polymer is more preferably 10,000 to 400,000, particularly preferably 15,000 to 300,000.
 ポリマー(バインダーポリマー)の総含有量(特定ポリマーと併用ポリマーとの合計含有量)は、レーザー彫刻用樹脂組成物の固形分全重量に対し、5~95重量%が好ましく、15~80重量%がより好ましく、20~65重量%が更に好ましい。
 例えば、レーザー彫刻用樹脂組成物をレリーフ印刷版原版のレリーフ形成層に適用した場合、バインダーポリマーの含有量を5重量%以上とすることで、得られたレリーフ印刷版を印刷版として使用するに足る耐刷性が得られ、また、95重量%以下とすることで、他成分が不足することがなく、レリーフ印刷版をフレキソ印刷版とした際においても印刷版として使用するに足る柔軟性を得ることができる。
The total content of the polymer (binder polymer) (the total content of the specific polymer and the combined polymer) is preferably 5 to 95% by weight, preferably 15 to 80% by weight, based on the total solid content of the resin composition for laser engraving. Is more preferable, and 20 to 65% by weight is still more preferable.
For example, when the resin composition for laser engraving is applied to the relief forming layer of a relief printing plate precursor, the resulting relief printing plate can be used as a printing plate by setting the binder polymer content to 5% by weight or more. Insufficient printing durability is obtained, and by making it 95% by weight or less, other components are not deficient, and flexibility sufficient to be used as a printing plate even when a relief printing plate is used as a flexographic printing plate. Obtainable.
〔可塑剤〕
 レーザー彫刻用樹脂組成物は、可塑剤を含有する。
 可塑剤は、レーザー彫刻用樹脂組成物により形成された膜を柔軟化する作用を有するものであり、ポリマーに対して相溶性のよいものである必要がある。
 可塑剤としては、例えば、ジオクチルフタレート、ジドデシルフタレート、クエン酸トリブチル等や、ポリエチレングリコール類、ポリプロピレングリコール(モノオール型やジオール型)、ポリプロピレングリコール(モノオール型やジオール型)などが好ましく用いられる。
[Plasticizer]
The resin composition for laser engraving contains a plasticizer.
The plasticizer has a function of softening a film formed of the resin composition for laser engraving and needs to be compatible with the polymer.
As the plasticizer, for example, dioctyl phthalate, didodecyl phthalate, tributyl citrate and the like, polyethylene glycols, polypropylene glycol (monool type and diol type), polypropylene glycol (monool type and diol type) and the like are preferably used. .
〔光熱変換剤〕
 前記レリーフ形成層は、光熱変換剤を含有する。
 また、前記レーザー彫刻用樹脂組成物は、光熱変換剤を含有することが好ましい。
 光熱変換剤は、レーザーの光を吸収し発熱することで、レーザー彫刻用樹脂組成物の硬化物の熱分解を促進すると考えられる。ゆえに、彫刻に用いるレーザー波長の光を吸収する光熱変換剤を選択することが好ましい。
[Photothermal conversion agent]
The relief forming layer contains a photothermal conversion agent.
The resin composition for laser engraving preferably contains a photothermal conversion agent.
It is considered that the photothermal conversion agent promotes thermal decomposition of the cured product of the resin composition for laser engraving by absorbing laser light and generating heat. Therefore, it is preferable to select a photothermal conversion agent that absorbs light having a laser wavelength used for engraving.
 波長700nm~1,300nmの赤外線を発するレーザー(YAGレーザー、半導体レーザー、ファイバーレーザー、面発光レーザー等)を光源としてレーザー彫刻に用いる場合には、本発明におけるレリーフ形成層は、700nm~1,300nmの波長の光を吸収可能な光熱変換剤を含有することが好ましい。
 本発明における光熱変換剤としては、種々の染料及び/又は顔料が用いられる。
 前記光熱変換剤は、800nm~1,200nmに吸収を有する顔料及び染料から選択される1種以上の光熱変換剤であることがより好ましい。
 また、前記光熱変換剤は、顔料であることが好ましい。
When a laser (YAG laser, semiconductor laser, fiber laser, surface emitting laser, etc.) emitting an infrared ray having a wavelength of 700 nm to 1,300 nm is used as a light source for laser engraving, the relief forming layer in the present invention has a relief layer of 700 nm to 1,300 nm. It is preferable to contain the photothermal conversion agent which can absorb the light of this wavelength.
Various dyes and / or pigments are used as the photothermal conversion agent in the present invention.
More preferably, the photothermal conversion agent is at least one photothermal conversion agent selected from pigments and dyes having absorption at 800 nm to 1,200 nm.
The photothermal conversion agent is preferably a pigment.
 光熱変換剤のうち、染料としては、市販の染料及び例えば「染料便覧」(有機合成化学協会編集、昭和45年刊)等の文献に記載されている公知のものが利用できる。具体的には、700nm~1,300nmに極大吸収波長を有するものが挙げられ、アゾ染料、金属錯塩アゾ染料、ピラゾロンアゾ染料、ナフトキノン染料、アントラキノン染料、フタロシアニン染料、カルボニウム染料、ジインモニウム化合物、キノンイミン染料、メチン染料、シアニン染料、スクワリリウム色素、ピリリウム塩、金属チオレート錯体等の染料が挙げられる。特に、ヘプタメチンシアニン色素等のシアニン系色素、ペンタメチンオキソノール色素等のオキソノール系色素、フタロシアニン系色素が好ましく用いられる。例えば、特開2008-63554号公報の段落0124~0137に記載の染料を挙げることができる。 Among the photothermal conversion agents, as the dye, commercially available dyes and known ones described in documents such as “Dye Handbook” (edited by the Society for Synthetic Organic Chemistry, published in 1970) can be used. Specific examples include those having a maximum absorption wavelength in the range of 700 nm to 1,300 nm. Azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, diimmonium compounds, quinone imine dyes , Methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, and metal thiolate complexes. In particular, cyanine dyes such as heptamethine cyanine dye, oxonol dyes such as pentamethine oxonol dye, and phthalocyanine dyes are preferably used. Examples thereof include the dyes described in paragraphs 0124 to 0137 of JP-A-2008-63554.
 本発明において使用される光熱変換剤のうち、顔料としては、市販の顔料及びカラーインデックス(C.I.)便覧、「最新顔料便覧」(日本顔料技術協会編、1977年刊)、「最新顔料応用技術」(CMC出版、1986年刊)、「印刷インキ技術」CMC出版、1984年刊)に記載されている顔料が利用できる。 Among the photothermal conversion agents used in the present invention, commercially available pigments and color index (CI) manuals, “latest pigment manuals” (edited by the Japan Pigment Technical Association, published in 1977), “latest pigment application” The pigments described in “Technology” (CMC Publishing, 1986) and “Printing Ink Technology” CMC Publishing, 1984) can be used.
 顔料の種類としては、黒色顔料、黄色顔料、オレンジ色顔料、褐色顔料、赤色顔料、紫色顔料、青色顔料、緑色顔料、蛍光顔料、金属粉顔料、その他、ポリマー結合色素が挙げられる。具体的には、不溶性アゾ顔料、アゾレーキ顔料、縮合アゾ顔料、キレートアゾ顔料、フタロシアニン系顔料、アントラキノン系顔料、ペリレン及びペリノン系顔料、チオインジゴ系顔料、キナクリドン系顔料、ジオキサジン系顔料、イソインドリノン系顔料、キノフタロン系顔料、染付けレーキ顔料、アジン顔料、ニトロソ顔料、ニトロ顔料、天然顔料、蛍光顔料、無機顔料、カーボンブラック等が使用できる。これらの顔料のうち好ましいものはカーボンブラックである。 Examples of pigments include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and other polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments In addition, quinophthalone pigments, dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, and the like can be used. Among these pigments, carbon black is preferable.
 カーボンブラックは、組成物中における分散性などが安定である限り、ASTMによる分類のほか、用途(例えば、カラー用、ゴム用、乾電池用など)の如何に拘らずいずれも使用可能である。カーボンブラックには、例えば、ファーネスブラック、サーマルブラック、チャンネルブラック、ランプブラック、アセチレンブラックなどが含まれる。なお、カーボンブラックなどの黒色着色剤は、分散を容易にするため、必要に応じて分散剤を用い、予めニトロセルロースやなどに分散させたカラーチップやカラーペーストとして使用することができ、このようなチップやペーストは市販品として容易に入手できる。 As long as the dispersibility in the composition is stable, carbon black can be used regardless of the classification according to ASTM or the use (for example, for color, for rubber, for dry battery, etc.). Carbon black includes, for example, furnace black, thermal black, channel black, lamp black, acetylene black and the like. In addition, black colorants such as carbon black can be used as color chips or color pastes previously dispersed in nitrocellulose or the like by using a dispersant as necessary in order to facilitate dispersion. Chips and pastes are easily available as commercial products.
 本発明においては、比較的低い比表面積及び比較的低いDBP吸収を有するカーボンブラックや比表面積の大きい微細化されたカーボンブラックまでを使用することも可能である。好適なカーボンブラックの例は、Printex(登録商標)U、Printex(登録商標)A、又はSpezialschwarz(登録商標)4(Degussaより)を含む。 In the present invention, it is also possible to use carbon black having a relatively low specific surface area and relatively low DBP absorption and even finer carbon black having a large specific surface area. Examples of suitable carbon blacks include Printex® U, Printex® A, or Specialschwarz® 4 (from Degussa).
 本発明に用いることができるカーボンブラックとしては、ジブチルフタレート(DBP)吸油量が、150ml/100g未満であることが好ましい。
 また、カーボンブラックとしては、光熱変換により発生した熱を周囲のポリマー等に効率よく伝えることで彫刻感度が向上するという観点で、比表面積が少なくとも150m2/gである、伝導性カーボンブラックが好ましい。
The carbon black that can be used in the present invention preferably has a dibutyl phthalate (DBP) oil absorption of less than 150 ml / 100 g.
In addition, as the carbon black, conductive carbon black having a specific surface area of at least 150 m 2 / g is preferable from the viewpoint of improving engraving sensitivity by efficiently transferring heat generated by photothermal conversion to surrounding polymers and the like. .
 前記レーザー形成層、又は、前記レーザー彫刻用樹脂組成物中おける光熱変換剤の含有量は、その分子固有の分子吸光係数の大きさにより大きく異なるが、該樹脂組成物の固形分全重量の0.01~20重量%の範囲が好ましく、0.05~10重量%の範囲がより好ましく、0.1~5重量%の範囲が特に好ましい。 The content of the photothermal conversion agent in the laser forming layer or the resin composition for laser engraving varies greatly depending on the molecular extinction coefficient inherent to the molecule, but is 0% of the total solid weight of the resin composition. The range of 0.01 to 20% by weight is preferable, the range of 0.05 to 10% by weight is more preferable, and the range of 0.1 to 5% by weight is particularly preferable.
〔架橋剤〕
 前記レーザー彫刻用樹脂組成物は、架橋剤を含有することが好ましい。
 本発明においては、レリーフ形成層中に架橋構造を形成する観点から、これを形成するために、レリーフ形成層用樹脂組成物は、架橋剤を含有することが好ましい。
 本発明に用いることができる架橋剤は、光や熱に起因した化学反応により高分子化してレリーフ形成層を硬化可能であるものであれば特に限定されず用いることができる。特に、エチレン性不飽和基を有する重合性化合物(以下、「重合性化合物」ともいう。)、アルコキシシリル基やハロゲン化シリル基等の反応性シリル基を有する反応性シラン化合物、反応性チタン化合物、反応性アルミニウム化合物等が好ましく用いられ、反応性シラン化合物がより好ましく用いられる。これらの化合物は、前記バインダーと反応することによりレリーフ形成層中に架橋構造を形成してもよく、又は、これらの化合物同士で反応することにより架橋構造を形成してもよく、これら両方の反応により架橋構造を形成してもよい。
 ここで用いることができる重合性化合物としては、エチレン性不飽和基を少なくとも1個、好ましくは2個以上、より好ましくは2~6個有する化合物の中から任意に選択することができる。
[Crosslinking agent]
The resin composition for laser engraving preferably contains a crosslinking agent.
In the present invention, from the viewpoint of forming a crosslinked structure in the relief forming layer, the resin composition for the relief forming layer preferably contains a crosslinking agent in order to form the crosslinked structure.
The crosslinking agent that can be used in the present invention is not particularly limited as long as it can be polymerized by a chemical reaction caused by light or heat to cure the relief forming layer. In particular, a polymerizable compound having an ethylenically unsaturated group (hereinafter also referred to as “polymerizable compound”), a reactive silane compound having a reactive silyl group such as an alkoxysilyl group or a halogenated silyl group, and a reactive titanium compound. A reactive aluminum compound is preferably used, and a reactive silane compound is more preferably used. These compounds may form a crosslinked structure in the relief forming layer by reacting with the binder, or may form a crosslinked structure by reacting with each other, and both of these reactions. A cross-linked structure may be formed.
The polymerizable compound that can be used here can be arbitrarily selected from compounds having at least one ethylenically unsaturated group, preferably two or more, and more preferably 2 to 6.
 前記レーザー彫刻用樹脂組成物は、下記式(I)で表される基を有する化合物(以下、「化合物(I)」ともいう。)を含有することが好ましい。
    *-M(R1)(R2n   (I)
 (式(I)中、R1はOR3又はハロゲン原子を表し、MはSi、Ti又はAlを表し、MがSiであるときnは2であり、MがTiであるときnは2であり、MがAlであるときnは1であり、n個あるR2はそれぞれ独立に炭化水素基、OR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、*は、他の構造との結合位置を表す。)
The resin composition for laser engraving preferably contains a compound having a group represented by the following formula (I) (hereinafter also referred to as “compound (I)”).
* -M (R 1 ) (R 2 ) n (I)
(In the formula (I), R 1 represents OR 3 or a halogen atom, M represents Si, Ti, or Al. When M is Si, n is 2, and when M is Ti, n is 2. And when M is Al, n is 1, each R 2 independently represents a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * (Represents the bonding position with other structures)
 式(I)中、MはSi、Ti又はAlを表す。これらの中でもMはSi又はTiであることが好ましく、Siであることが更に好ましい。
 式(I)中、R1はOR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、該炭化水素基としては、炭素数1~30のアルキル基、炭素数6~30のアリール基、炭素数2~30のアルケニル基、炭素数7~37のアラルキル等が例示される。これらの中でもR3としては、水素原子、炭素数1~12のアルキル基、炭素数6~20のアリール基であることが好ましく、水素原子、炭素数1~5のアルキル基、炭素数6~10のアリール基であることが更に好ましく、メチル基又はエチル基であることが特に好ましい。すなわち、R1はメトキシ基又はエトキシ基であることが特に好ましい。
 R1はアルカリ性のリンス液で処理した時に-M(R2n-にイオン化するものであることが好ましい。
In formula (I), M represents Si, Ti, or Al. Among these, M is preferably Si or Ti, and more preferably Si.
In the formula (I), R 1 represents OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and the hydrocarbon group includes an alkyl group having 1 to 30 carbon atoms and a carbon number of 6 to 30 Aryl groups having 2 to 30 carbon atoms, aralkyl having 7 to 37 carbon atoms, and the like. Among these, R 3 is preferably a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 20 carbon atoms, preferably a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or 6 to 6 carbon atoms. 10 aryl groups are more preferable, and a methyl group or ethyl group is particularly preferable. That is, R 1 is particularly preferably a methoxy group or an ethoxy group.
R 1 is -M (R 2) n O when treated with an alkaline rinse solution - is preferably one that ionized.
 式(I)中、R2は炭化水素基、OR3又はハロゲン原子を表す。R3は上述した通りであり、好ましい範囲も同様である。
 R2としては、OR3又はハロゲン原子であることが好ましく、OR3であることがより好ましい。
In the formula (I), R 2 represents a hydrocarbon group, OR 3 or a halogen atom. R 3 is as described above, and the preferred range is also the same.
R 2 is preferably OR 3 or a halogen atom, and more preferably OR 3 .
 MがSiであるとき、nは2である。MがSiであるとき、複数存在するR2は、それぞれ同一でも異なっていてもよく、特に限定されない。
 また、MがTiであるとき、nは2である。MがTiであるとき、複数存在するR2は、それぞれ同一でも異なっていてもよく、特に限定されない。
 MがAlであるとき、nは1を表す。
N is 2 when M is Si. When M is Si, a plurality of R 2 may be the same or different, and is not particularly limited.
N is 2 when M is Ti. When M is Ti, a plurality of R 2 may be the same or different and are not particularly limited.
When M is Al, n represents 1.
 なお、前記化合物(I)は、ポリマーとの反応により上記式(I)で表される基をポリマーに導入するものでもよく、反応前から上記式(I)で表される基を有し、ポリマーに上記式(I)で表される基を導入するものでもよい。 In addition, the compound (I) may be one in which a group represented by the above formula (I) is introduced into the polymer by reaction with a polymer, and has a group represented by the above formula (I) before the reaction, A group represented by the above formula (I) may be introduced into the polymer.
 前記化合物(I)としては、特にMがSiである態様が好ましい。
 MがSiであるとき、式(I)で表される基を有する化合物(化合物(I))として、シランカップリング剤を使用することも可能である。なお、シランカップリング剤とは、アルコキシシリル基などの無機成分と反応可能な基と、メタクリロイル基などの有機成分と反応可能な基を有し、無機成分と有機成分とを結合可能な化合物である。なお、チタンカップリング剤、アルミネート系カップリング剤も同様である。
 化合物(I)がビニル基、エポキシ基、メタクリロイルオキシ基、アクリロイルオキシ基、メルカプト基、アミノ基等の反応性基を有し、該反応性基でポリマーと反応し、これによりポリマーに式(I)で表される基が導入されることも好ましい。
As the compound (I), an embodiment in which M is Si is particularly preferable.
When M is Si, it is also possible to use a silane coupling agent as the compound having the group represented by the formula (I) (compound (I)). The silane coupling agent is a compound having a group capable of reacting with an inorganic component such as an alkoxysilyl group and a group capable of reacting with an organic component such as a methacryloyl group, and capable of binding the inorganic component and the organic component. is there. The same applies to titanium coupling agents and aluminate coupling agents.
Compound (I) has a reactive group such as a vinyl group, an epoxy group, a methacryloyloxy group, an acryloyloxy group, a mercapto group, and an amino group, and reacts with the polymer with the reactive group, whereby the polymer has the formula (I It is also preferred that a group represented by
 上記シランカップリング剤としては、例えば、ビニルトリクロロシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、γ-メタクリロキシプロピルメチルジメトキシシラン、γ-メタクリロキシプロピルトリメトキシシラン、γ-メタクリロキシプロピルメチルジエトキシシラン、γ-メタクリロキシプロピルトリエトキシシラン、γ-アクリロキシプロピルトリメトキシシラン、N-(β-アミノエチル)-γ-アミノプロピルメチルジメトキシシラン、N-(β-アミノエチル)-γ-アミノプロピルトリメトキシシラン、N-(β-アミノエチル)-γ-アミノプロピルトリエトキシシラン、γ-アミノプロピルトリメトキシシラン、γ-アミノプロピルトリエトキシシラン、N-フェニル-γ-アミノプロピルトリメトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-クロロプロピルトリメトキシシラン、γ-ウレイドプロピルトリエトキシシラン等を挙げることができる。
 前記化合物(I)としては、式(I)で表される基を複数有する化合物も好ましく用いられる。このような場合、式(I)で表される基の一部とポリマーとが反応することで、ポリマーに式(I)で表される基を導入することができる。例えば、化合物(I)のR1基、及び、場合によりR2基が、ポリマー中の該化合物と反応し得る原子及び/又は基(例えば、水酸基(-OH))と反応(例えば、アルコール交換反応)する。また、式(I)で表される基の複数がポリマーと結合することにより、化合物(I)は架橋剤としても機能し、架橋構造を形成することができる。
 このような化合物(I)としては、式(I)で表される基を複数有する化合物であることが好ましく、2~6個の式(I)で表される基を有する化合物であることがより好ましく、2~3個の式(I)で表される基を有する化合物であることが特に好ましい。
 以下に示す化合物が好ましいものとして挙げられるが、本発明はこれらの化合物に制限されるものではない。
Examples of the silane coupling agent include vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ -Glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ- Methacryloxypropyltriethoxysilane, γ-acryloxypropyltrimethoxysilane, N- (β-aminoethyl) -γ-aminopropylmethyldimethoxysilane, N- (β-aminoethyl) -γ-aminopropyltrimeth Sisilane, N- (β-aminoethyl) -γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-mercapto Examples thereof include propyltrimethoxysilane, γ-chloropropyltrimethoxysilane, and γ-ureidopropyltriethoxysilane.
As the compound (I), a compound having a plurality of groups represented by the formula (I) is also preferably used. In such a case, the group represented by the formula (I) can be introduced into the polymer by reacting a part of the group represented by the formula (I) with the polymer. For example, the R 1 group and optionally the R 2 group of compound (I) reacts with an atom and / or group (eg, hydroxyl group (—OH)) capable of reacting with the compound in the polymer (eg, alcohol exchange). react. In addition, when a plurality of groups represented by the formula (I) are bonded to the polymer, the compound (I) also functions as a crosslinking agent and can form a crosslinked structure.
Such a compound (I) is preferably a compound having a plurality of groups represented by the formula (I), preferably a compound having 2 to 6 groups represented by the formula (I). More preferred is a compound having 2 to 3 groups represented by the formula (I).
Although the compounds shown below are preferred, the present invention is not limited to these compounds.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 前記各式中、Rは以下の構造から選択される部分構造を表す。分子内に複数のR及びR1が存在する場合、これらは互いに同じでも異なっていてもよく、合成適性上は、同一であることが好ましい。 In the above formulas, R represents a partial structure selected from the following structures. When a plurality of R and R 1 are present in the molecule, these may be the same or different from each other, and are preferably the same in terms of synthesis suitability.
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 前記各式中、Rは以下に示す部分構造を表す。R1は前記したものと同義である。分子内に複数のR及びR1が存在する場合、これらは互いに同じでも異なっていてもよく、合成適性上は、同一であることが好ましい。 In the above formulas, R represents a partial structure shown below. R 1 has the same meaning as described above. When a plurality of R and R 1 are present in the molecule, these may be the same or different from each other, and are preferably the same in terms of synthesis suitability.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 また、本発明において、上記の化合物(I)として、シリカ粒子、酸化チタン粒子、酸化アルミニウム粒子等を使用することもできる。これらの粒子は、後述するポリマーと反応して、ポリマーに、上記式(I)で表される基を導入することができる。例えば、シリカ粒子と、後述するポリマーとが反応することにより、-SiOHが導入される。
 その他、チタンカップリング剤としては、味の素ファインテクノ(株)製プレンアクト、マツモトファインケミカル(株)製チタンテトライソプロポキシド、日本曹達(株)製チタニウム-i-プロポキシビス(アセチルアセトナト)チタンが例示され、アルミネート系カップリング剤としては、アセトアルコキシアルミニウムジイソプロピレートが例示される。
In the present invention, silica particles, titanium oxide particles, aluminum oxide particles and the like can also be used as the compound (I). These particles can react with a polymer described later to introduce a group represented by the above formula (I) into the polymer. For example, —SiOH is introduced by a reaction between silica particles and a polymer described later.
Other examples of titanium coupling agents include Ajinomoto Fine Techno Co., Ltd. Preneact, Matsumoto Fine Chemical Co., Ltd. Titanium Tetraisopropoxide, Nippon Soda Co., Ltd. Titanium-i-propoxybis (acetylacetonato) titanium. As the aluminate coupling agent, acetoalkoxyaluminum diisopropylate is exemplified.
 本発明において、上記の化合物(I)は1種単独で使用してもよく、2種以上を併用してもよい。
 本発明において、レリーフ形成層用樹脂組成物に含まれる化合物(I)の含有量は、固形分換算で0.1~80重量%であることが好ましく、1~40重量%であることがより好ましく、5~30重量%であることが更に好ましい。
In this invention, said compound (I) may be used individually by 1 type, and may use 2 or more types together.
In the present invention, the content of the compound (I) contained in the resin composition for a relief forming layer is preferably 0.1 to 80% by weight, more preferably 1 to 40% by weight in terms of solid content. Preferably, it is 5 to 30% by weight.
 本発明においては、レリーフ形成層中に架橋構造を形成する観点から、これを形成するために、レリーフ形成層用塗布液には、重合性化合物を含有することが好ましい。
 ここで用い得る重合性化合物は、エチレン性不飽和基を少なくとも1個、好ましくは2個以上、より好ましくは2~6個有する化合物の中から任意に選択することができる。
 また、本発明においては、架橋構造を形成する目的以外に、柔軟性や脆性等の膜物性の観点などから、エチレン性不飽和基を1つのみ有する化合物(単官能重合性化合物、単官能モノマー)を用いてもよい。
In the present invention, from the viewpoint of forming a crosslinked structure in the relief forming layer, the relief forming layer coating liquid preferably contains a polymerizable compound in order to form the crosslinked structure.
The polymerizable compound that can be used here can be arbitrarily selected from compounds having at least one ethylenically unsaturated group, preferably two or more, and more preferably 2-6.
In addition, in the present invention, in addition to the purpose of forming a crosslinked structure, a compound having only one ethylenically unsaturated group (monofunctional polymerizable compound, monofunctional monomer) from the viewpoint of film properties such as flexibility and brittleness ) May be used.
〔重合性化合物〕
 以下、重合性化合物として用いられる、エチレン性不飽和基を分子内に1つ有する化合物(単官能モノマー)、及び、エチレン性不飽和基を分子内に2個以上有する化合物(多官能モノマー)について説明する。
 レリーフ形成層は、膜中に架橋構造を有することが必要であることから、多官能モノマーが好ましく使用される。これらの多官能モノマーの分子量は、200~2,000であることが好ましい。
 単官能モノマー及び多官能モノマーとしては、不飽和カルボン酸(例えば、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、イソクロトン酸、マレイン酸等)と多価アルコール化合物とのエステル、不飽和カルボン酸と多価アミン化合物とのアミド等が挙げられる。
[Polymerizable compound]
Hereinafter, a compound (monofunctional monomer) having one ethylenically unsaturated group in the molecule and a compound (polyfunctional monomer) having two or more ethylenically unsaturated groups in the molecule used as a polymerizable compound explain.
Since the relief forming layer is required to have a crosslinked structure in the film, a polyfunctional monomer is preferably used. The molecular weight of these polyfunctional monomers is preferably 200 to 2,000.
Examples of monofunctional monomers and polyfunctional monomers include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) and esters of polyhydric alcohol compounds, unsaturated carboxylic acids, Examples include amides with polyvalent amine compounds.
 本発明においては、重合性化合物として、彫刻感度向上の観点から、分子内に硫黄原子を有する化合物を用いることが好ましい。
 このように分子内に硫黄原子を有する重合性化合物としては、彫刻感度向上の観点から、特に、2つ以上のエチレン性不飽和結合を有し、そのうち2つのエチレン性不飽和結合間を連結する部位に炭素-硫黄結合を有する重合性化合物(以下、適宜、「含硫黄多官能モノマー」ともいう。)を用いることが好ましい。
In the present invention, from the viewpoint of improving engraving sensitivity, a compound having a sulfur atom in the molecule is preferably used as the polymerizable compound.
Thus, as a polymeric compound which has a sulfur atom in a molecule | numerator, from a viewpoint of engraving sensitivity improvement, it has two or more ethylenically unsaturated bonds especially, and connects between two ethylenically unsaturated bonds among them. It is preferable to use a polymerizable compound having a carbon-sulfur bond at the site (hereinafter also referred to as “sulfur-containing polyfunctional monomer” as appropriate).
 本発明における含硫黄多官能モノマー中の炭素-硫黄結合を含んだ官能基としては、スルフィド、ジスルフィド、スルホキシド、スルホニル、スルホンアミド、チオカルボニル、チオカルボン酸、ジチオカルボン酸、スルファミン酸、チオアミド、チオカルバメート、ジチオカルバメート、又はチオ尿素を含む官能基が挙げられる。
 また、含硫黄多官能モノマーにおける2つのエチレン性不飽和結合間を連結する炭素-硫黄結合を含有する連結基としては、-C-S-、-C-S-S-、-NH(C=S)O-、-NH(C=O)S-、-NH(C=S)S-、及び、-C-SO2-よりなる群から選択される少なくとも1つのユニットであることが好ましい。
Examples of the functional group containing a carbon-sulfur bond in the sulfur-containing polyfunctional monomer in the present invention include sulfide, disulfide, sulfoxide, sulfonyl, sulfonamide, thiocarbonyl, thiocarboxylic acid, dithiocarboxylic acid, sulfamic acid, thioamide, and thiocarbamate. , Functional groups containing dithiocarbamate, or thiourea.
In addition, examples of the linking group containing a carbon-sulfur bond that connects two ethylenically unsaturated bonds in the sulfur-containing polyfunctional monomer include —C—S—, —C—S—S—, —NH (C = It is preferably at least one unit selected from the group consisting of S) O—, —NH (C═O) S—, —NH (C═S) S—, and —C—SO 2 —.
 また、含硫黄多官能モノマーの分子内に含まれる硫黄原子の数は1つ以上であれば特に制限はなく、目的に応じて、適宜選択することができるが、彫刻感度と塗布溶媒に対する溶解性のバランスの観点から、1個~10個が好ましく、1個~5個がより好ましく、1個~2個が更に好ましい。
 一方、分子内に含まれるエチレン性不飽和基の数は2つ以上であれば特に制限はなく、目的に応じて、適宜選択することができるが、架橋膜の柔軟性の観点で、2個~10個が好ましく、2個~6個がより好ましく、2個~4個が更に好ましい。
Further, the number of sulfur atoms contained in the molecule of the sulfur-containing polyfunctional monomer is not particularly limited as long as it is 1 or more, and can be appropriately selected according to the purpose. However, engraving sensitivity and solubility in a coating solvent are not limited. From the viewpoint of the balance, 1 to 10 is preferable, 1 to 5 is more preferable, and 1 to 2 is still more preferable.
On the other hand, the number of ethylenically unsaturated groups contained in the molecule is not particularly limited as long as it is 2 or more, and can be appropriately selected according to the purpose. -10 are preferable, 2-6 are more preferable, and 2-4 are more preferable.
 本発明における含硫黄多官能モノマーの分子量としては、形成される膜の柔軟性の観点から、120~3,000であることが好ましく、120~1,500であることがより好ましい。
 また、本発明における含硫黄多官能モノマーは単独で用いてもよいが、分子内に硫黄原子を持たない多官能重合性化合物や単官能重合性化合物との混合物として用いてもよい。
 彫刻感度の観点からは、含硫黄多官能モノマー単独で用いる、又は、含硫黄多官能モノマーと単官能モノマーとの混合物として用いる態様が好ましく、含硫黄多官能モノマーと単官能モノマーとの混合物として用いる態様がより好ましい。
The molecular weight of the sulfur-containing polyfunctional monomer in the present invention is preferably 120 to 3,000, more preferably 120 to 1,500, from the viewpoint of the flexibility of the formed film.
Moreover, although the sulfur-containing polyfunctional monomer in this invention may be used independently, you may use it as a mixture with the polyfunctional polymerizable compound and monofunctional polymerizable compound which do not have a sulfur atom in a molecule | numerator.
From the viewpoint of engraving sensitivity, it is preferable to use the sulfur-containing polyfunctional monomer alone or as a mixture of the sulfur-containing polyfunctional monomer and the monofunctional monomer, and use it as a mixture of the sulfur-containing polyfunctional monomer and the monofunctional monomer. An embodiment is more preferred.
 レリーフ形成層においては、含硫黄多官能モノマーをはじめとする重合性化合物を用いることにより、膜物性、例えば、脆性、柔軟性などを調整することもできる。
 また、レリーフ形成層中の含硫黄多官能モノマーをはじめとする重合性化合物の総含有量は、架橋膜の柔軟性や脆性の観点から、不揮発性成分に対して、10~60重量%が好ましく、15~45重量%の範囲がより好ましい。
 なお、含硫黄多官能モノマーと他の重合性化合物とを併用する場合、全重合性化合物中の含硫黄多官能モノマーの量は、5重量%以上が好ましく、10重量%以上がより好ましい。
In the relief forming layer, film properties such as brittleness and flexibility can be adjusted by using a polymerizable compound such as a sulfur-containing polyfunctional monomer.
Further, the total content of the polymerizable compound including the sulfur-containing polyfunctional monomer in the relief forming layer is preferably 10 to 60% by weight with respect to the nonvolatile component from the viewpoint of flexibility and brittleness of the crosslinked film. A range of 15 to 45% by weight is more preferable.
In addition, when using together a sulfur-containing polyfunctional monomer and another polymeric compound, 5 weight% or more is preferable and, as for the quantity of the sulfur-containing polyfunctional monomer in all the polymeric compounds, 10 weight% or more is more preferable.
〔溶媒〕
 本発明において、樹脂組成物を調製する際に用いる溶媒は、化合物(I)と特定ポリマーとの反応を速やかに進行させる観点で、主として非プロトン性の有機溶媒を用いることが好ましい。より具体的には、非プロトン性の有機溶媒/プロトン性有機溶媒=100/0~50/50(重量比)で用いることが好ましい。より好ましくは100/0~70/30、特に好ましくは100/0~90/10である。
 非プロトン性の有機溶媒の好ましい具体例は、アセトニトリル、テトラヒドロフラン、ジオキサン、トルエン、プロピレングリコールモノメチルエーテルアセテート、メチルエチルケトン、アセトン、メチルイソブチルケトン、酢酸エチル、酢酸ブチル、乳酸エチル、N,N-ジメチルアセトアミド、N-メチルピロリドン、ジメチルスルホキシドである。
 プロトン性有機溶媒の好ましい具体例は、メタノール、エタノール、1-プロパノール、2-プロパノール、1-ブタノール、1-メトキシ-2-プロパノール、エチレングリコール、ジエチレングリコール、1,3-プロパンジオールである。
〔solvent〕
In the present invention, the solvent used for preparing the resin composition is preferably mainly an aprotic organic solvent from the viewpoint of promptly proceeding the reaction between the compound (I) and the specific polymer. More specifically, it is preferable to use aprotic organic solvent / protic organic solvent = 100/0 to 50/50 (weight ratio). More preferably, it is 100/0 to 70/30, and particularly preferably 100/0 to 90/10.
Preferred specific examples of the aprotic organic solvent include acetonitrile, tetrahydrofuran, dioxane, toluene, propylene glycol monomethyl ether acetate, methyl ethyl ketone, acetone, methyl isobutyl ketone, ethyl acetate, butyl acetate, ethyl lactate, N, N-dimethylacetamide, N-methylpyrrolidone and dimethyl sulfoxide.
Preferred specific examples of the protic organic solvent are methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 1-methoxy-2-propanol, ethylene glycol, diethylene glycol, and 1,3-propanediol.
〔アルコール交換反応触媒〕
 樹脂組成物に化合物(I)を使用する場合、化合物(I)と特定バインダーポリマーとの反応を促進するため、アルコール交換反応触媒を含有することが好ましい。
 アルコール交換反応触媒は、一般に用いられる反応触媒であれば、限定なく適用できる。
 以下、代表的なアルコール交換反応触媒である酸あるいは塩基性触媒、及び、金属錯体触媒について順次説明する。
[Alcohol exchange reaction catalyst]
When compound (I) is used in the resin composition, it is preferable to contain an alcohol exchange reaction catalyst in order to promote the reaction between compound (I) and the specific binder polymer.
The alcohol exchange reaction catalyst can be applied without limitation as long as it is a commonly used reaction catalyst.
Hereinafter, an acid or basic catalyst, which is a typical alcohol exchange reaction catalyst, and a metal complex catalyst will be sequentially described.
-酸あるいは塩基性触媒-
 触媒としては、酸あるいは塩基性化合物をそのまま用いるか、あるいは水又は有機溶媒などの溶媒に溶解させた状態のもの(以下、それぞれ酸性触媒、塩基性触媒と称する。)を用いる。溶媒に溶解させる際の濃度については特に限定はなく、用いる酸、あるいは塩基性化合物の特性、触媒の所望の含有量などに応じて適宜選択すればよい。
 酸性触媒あるいは塩基性触媒の種類は特に限定されないが、具体的には、酸性触媒としては、塩酸などのハロゲン化水素、硝酸、硫酸、亜硫酸、硫化水素、過塩素酸、過酸化水素、炭酸、蟻酸や酢酸などのカルボン酸、そのRCOOHで表される構造式のRを他元素又は置換基によって置換した置換カルボン酸、ベンゼンスルホン酸などのスルホン酸、リン酸などが挙げられ、塩基性触媒としては、アンモニア水などのアンモニア性塩基、エチルアミンやアニリンなどのアミン類などが挙げられる。層中でのアルコール交換反応を速やかに進行させる観点で、メタンスルホン酸、p-トルエンスルホン酸、ピリジニウム p-トルエンスルホネート、リン酸、ホスホン酸、酢酸が好ましく、メタンスルホン酸、p-トルエンスルホン酸、リン酸が特に好ましい。
-Acid or basic catalyst-
As the catalyst, an acid or a basic compound is used as it is, or a catalyst dissolved in a solvent such as water or an organic solvent (hereinafter referred to as an acidic catalyst and a basic catalyst, respectively). The concentration at the time of dissolving in the solvent is not particularly limited, and may be appropriately selected according to the characteristics of the acid or basic compound used, the desired content of the catalyst, and the like.
The type of acidic catalyst or basic catalyst is not particularly limited. Specifically, examples of the acidic catalyst include hydrogen halides such as hydrochloric acid, nitric acid, sulfuric acid, sulfurous acid, hydrogen sulfide, perchloric acid, hydrogen peroxide, carbonic acid, Examples of the basic catalyst include carboxylic acids such as formic acid and acetic acid, substituted carboxylic acids obtained by substituting R in the structural formula represented by RCOOH with other elements or substituents, sulfonic acids such as benzenesulfonic acid, and phosphoric acid. Include ammoniacal bases such as aqueous ammonia and amines such as ethylamine and aniline. From the viewpoint of promptly promoting the alcohol exchange reaction in the layer, methanesulfonic acid, p-toluenesulfonic acid, pyridinium p-toluenesulfonate, phosphoric acid, phosphonic acid, and acetic acid are preferable, and methanesulfonic acid, p-toluenesulfonic acid Phosphoric acid is particularly preferred.
-金属錯体触媒-
 本発明においてアルコール交換反応触媒として用いられる金属錯体触媒は、好ましくは、周期律表の2、4、5及び13族よりなる群から選ばれる金属元素とβ-ジケトン(アセチルアセトンなどが好ましい。)、ケトエステル、ヒドロキシカルボン酸又はそのエステル、アミノアルコール、及び、エノール性活性水素化合物よりなる群から選ばれるオキソ又はヒドロキシ酸素化合物から構成されるものである。
 さらに、構成金属元素の中では、Mg,Ca,St,Baなどの2族元素、Ti,Zrなどの4族元素、並びに、V,Nb及びTaなどの5族元素、Al,Gaなどの13族元素が好ましく、それぞれ触媒効果の優れた錯体を形成する。その中でも、Zr、Al又はTiから得られる錯体が優れており、好ましく、特にオルトチタン酸エチルなどが好ましく例示できる。
 これらは水系塗布液での安定性、及び、加熱乾燥時のゾルゲル反応でのゲル化促進効果に優れているが、中でも、エチルアセトアセテートアルミニウムジイソプロピレート、アルミニウムトリス(エチルアセトアセテート)、ジ(アセチルアセトナト)チタニウム錯塩、ジルコニウムトリス(エチルアセトアセテート)が特に好ましい。
-Metal complex catalyst-
The metal complex catalyst used as the alcohol exchange reaction catalyst in the present invention is preferably a metal element selected from the group consisting of Groups 2, 4, 5 and 13 of the periodic table and β-diketone (acetylacetone is preferred), It is composed of an oxo or hydroxy oxygen compound selected from the group consisting of ketoesters, hydroxycarboxylic acids or esters thereof, amino alcohols, and enolic active hydrogen compounds.
Furthermore, among the constituent metal elements, group 2 elements such as Mg, Ca, St, and Ba, group 4 elements such as Ti and Zr, group 5 elements such as V, Nb, and Ta, and 13 such as Al and Ga. Group elements are preferred and each form a complex with an excellent catalytic effect. Among them, complexes obtained from Zr, Al, or Ti are excellent, and ethyl orthotitanate is particularly preferable.
These are excellent in stability in aqueous coating solutions and in gelation promoting effect in sol-gel reaction during heating and drying. Among them, ethyl acetoacetate aluminum diisopropylate, aluminum tris (ethyl acetoacetate), di ( Particularly preferred are acetylacetonato) titanium complex and zirconium tris (ethylacetoacetate).
 樹脂組成物には、アルコール交換反応触媒を1種のみ用いてもよく、2種以上併用してもよい。樹脂組成物におけるアルコール交換反応触媒の含有量は、水酸基を有するポリマーに対して、0.01~20重量%であることが好ましく、0.1~10重量%であることがより好ましい。 In the resin composition, only one alcohol exchange reaction catalyst may be used, or two or more kinds may be used in combination. The content of the alcohol exchange reaction catalyst in the resin composition is preferably 0.01 to 20% by weight, more preferably 0.1 to 10% by weight, based on the polymer having a hydroxyl group.
〔重合開始剤〕
 レーザー彫刻用樹脂組成物は、重合開始剤を含有することが好ましく、エチレン性不飽和基を有する化合物と重合開始剤とを併用することがより好ましい。
 重合開始剤は、公知のものを制限なく使用することができる。以下、好ましい重合開始剤であるラジカル重合開始剤について詳述するが、本発明はこれらの記述により制限を受けるものではない。
(Polymerization initiator)
The resin composition for laser engraving preferably contains a polymerization initiator, and more preferably uses a compound having an ethylenically unsaturated group and a polymerization initiator in combination.
A well-known thing can be used for a polymerization initiator without a restriction | limiting. Hereinafter, although the radical polymerization initiator which is a preferable polymerization initiator is explained in full detail, this invention is not restrict | limited by these description.
 本発明において、好ましいラジカル重合開始剤としては、(a)芳香族ケトン類、(b)オニウム塩化合物、(c)有機過酸化物、(d)チオ化合物、(e)ヘキサアリールビイミダゾール化合物、(f)ケトオキシムエステル化合物、(g)ボレート化合物、(h)アジニウム化合物、(i)メタロセン化合物、(j)活性エステル化合物、(k)炭素ハロゲン結合を有する化合物、(l)アゾ系化合物等が挙げられる。以下に、上記(a)~(l)の具体例を挙げるが、本発明はこれらに限定されるものではない。 In the present invention, preferred radical polymerization initiators include (a) aromatic ketones, (b) onium salt compounds, (c) organic peroxides, (d) thio compounds, (e) hexaarylbiimidazole compounds, (F) ketoxime ester compound, (g) borate compound, (h) azinium compound, (i) metallocene compound, (j) active ester compound, (k) compound having carbon halogen bond, (l) azo compound, etc. Is mentioned. Specific examples of the above (a) to (l) are given below, but the present invention is not limited to these.
 本発明においては、彫刻感度と、レリーフ印刷版原版のレリーフ形成層に適用した際にはレリーフエッジ形状を良好とするといった観点から、(c)有機過酸化物及び(l)アゾ系化合物がより好ましく、(c)有機過酸化物が特に好ましい。 In the present invention, from the viewpoint of engraving sensitivity and a good relief edge shape when applied to a relief forming layer of a relief printing plate precursor, (c) an organic peroxide and (l) an azo compound are more Preferably, (c) an organic peroxide is particularly preferable.
 前記(a)芳香族ケトン類、(b)オニウム塩化合物、(d)チオ化合物、(e)ヘキサアリールビイミダゾール化合物、(f)ケトオキシムエステル化合物、(g)ボレート化合物、(h)アジニウム化合物、(i)メタロセン化合物、(j)活性エステル化合物、及び(k)炭素ハロゲン結合を有する化合物としては、特開2008-63554号公報の段落0074~0118に挙げられている化合物を好ましく用いることができる。 (A) aromatic ketones, (b) onium salt compounds, (d) thio compounds, (e) hexaarylbiimidazole compounds, (f) ketoxime ester compounds, (g) borate compounds, (h) azinium compounds As compounds (i) metallocene compounds, (j) active ester compounds, and (k) compounds having a carbon halogen bond, the compounds listed in paragraphs 0074 to 0118 of JP-A-2008-63554 are preferably used. it can.
 また、重合開始剤としては、光重合開始剤と熱重合開始剤とに大別することができる。本発明では、架橋度を向上させる観点から、熱重合開始剤が好ましく用いられる。熱重合開始剤としては、(c)有機過酸化物及び(l)アゾ系化合物が好ましく用いられる。特に、以下に示す化合物が好ましい。 Also, the polymerization initiator can be roughly classified into a photopolymerization initiator and a thermal polymerization initiator. In the present invention, a thermal polymerization initiator is preferably used from the viewpoint of improving the degree of crosslinking. As the thermal polymerization initiator, (c) an organic peroxide and (l) an azo compound are preferably used. In particular, the following compounds are preferred.
(c)有機過酸化物
 本発明に用いることができるラジカル重合開始剤として、好ましい(c)有機過酸化物としては、3,3’4,4’-テトラ(t-ブチルパーオキシカルボニル)ベンゾフェノン、3,3’4,4’-テトラ(t-アミルパーオキシカルボニル)ベンゾフェノン、3,3’4,4’-テトラ(t-ヘキシルパーオキシカルボニル)ベンゾフェノン、3,3’4,4’-テトラ(t-オクチルパーオキシカルボニル)ベンゾフェノン、3,3’4,4’-テトラ(クミルパーオキシカルボニル)ベンゾフェノン、3,3’4,4’-テトラ(p-イソプロピルクミルパーオキシカルボニル)ベンゾフェノン、ジ-t-ブチルジパーオキシイソフタレートなどの過酸化エステル系が好ましい。
(C) Organic peroxide As a radical polymerization initiator that can be used in the present invention, preferred (c) organic peroxide is 3,3′4,4′-tetra (t-butylperoxycarbonyl) benzophenone. 3,3′4,4′-tetra (t-amylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra (t-hexylperoxycarbonyl) benzophenone, 3,3′4,4′- Tetra (t-octylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra (cumylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra (p-isopropylcumylperoxycarbonyl) benzophenone, Peroxide esters such as di-t-butyldiperoxyisophthalate are preferred.
(l)アゾ系化合物
 本発明に用いることができるラジカル重合開始剤として、好ましい(l)アゾ系化合物としては、2,2’-アゾビスイソブチロニトリル、2,2’-アゾビスプロピオニトリル、1,1’-アゾビス(シクロヘキサン-1-カルボニトリル)、2,2’-アゾビス(2-メチルブチロニトリル)、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、2,2’-アゾビス(4-メトキシ-2,4-ジメチルバレロニトリル)、4,4’-アゾビス(4-シアノ吉草酸)、2,2’-アゾビスイソ酪酸ジメチル、2,2’-アゾビス(2-メチルプロピオンアミドオキシム)、2,2’-アゾビス[2-(2-イミダゾリン-2-イル)プロパン]、2,2’-アゾビス{2-メチル-N-[1,1-ビス(ヒドロキシメチル)-2-ヒドロキシエチル]プロピオンアミド}、2,2’-アゾビス[2-メチル-N-(2-ヒドロキシエチル)プロピオンアミド]、2,2’-アゾビス(N-ブチル-2-メチルプロピオンアミド)、2,2’-アゾビス(N-シクロヘキシル-2-メチルプロピオンアミド)、2,2’-アゾビス[N-(2-プロペニル)-2-メチルプロピオンアミド]、2,2’-アゾビス(2,4,4-トリメチルペンタン)等を挙げることができる。
(L) Azo-based compound As a radical polymerization initiator that can be used in the present invention, preferred (l) azo-based compounds include 2,2′-azobisisobutyronitrile, 2,2′-azobispropio Nitrile, 1,1′-azobis (cyclohexane-1-carbonitrile), 2,2′-azobis (2-methylbutyronitrile), 2,2′-azobis (2,4-dimethylvaleronitrile), 2, 2′-azobis (4-methoxy-2,4-dimethylvaleronitrile), 4,4′-azobis (4-cyanovaleric acid), dimethyl 2,2′-azobisisobutyrate, 2,2′-azobis (2- Methylpropionamidooxime), 2,2′-azobis [2- (2-imidazolin-2-yl) propane], 2,2′-azobis {2-methyl-N- [1,1-bis (hydroxymethyl)] - -Hydroxyethyl] propionamide}, 2,2′-azobis [2-methyl-N- (2-hydroxyethyl) propionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2 , 2′-azobis (N-cyclohexyl-2-methylpropionamide), 2,2′-azobis [N- (2-propenyl) -2-methylpropionamide], 2,2′-azobis (2,4,4) 4-trimethylpentane) and the like.
 本発明における重合開始剤は、1種を単独で用いてもよいし、2種以上を併用することも可能である。
 重合開始剤は、レーザー彫刻用樹脂組成物の全固形分に対し、好ましくは0.01~10重量%、より好ましくは0.1~3重量%の割合で添加することができる。
The polymerization initiator in the present invention may be used alone or in combination of two or more.
The polymerization initiator can be added in a proportion of preferably 0.01 to 10% by weight, more preferably 0.1 to 3% by weight, based on the total solid content of the resin composition for laser engraving.
<その他の添加剤>
 前記レーザー彫刻用樹脂組成物、及び、前記レリーフ印刷版原版のレリーフ層は、前述したもの以外に、公知の添加剤を含有していてもよい。
 レーザー彫刻用樹脂組成物は、彫刻感度向上のための添加剤として、ニトロセルロースや高熱伝導性物質、を加えることがより好ましい。ニトロセルロースは自己反応性化合物であるため、レーザー彫刻時、自身が発熱し、共存する親水性ポリマー等のポリマーの熱分解をアシストする。その結果、彫刻感度が向上すると推定される。高熱伝導性物質は、熱伝達を補助する目的で添加され、熱伝導性物質としては、金属粒子等の無機化合物、導電性ポリマー等の有機化合物が挙げられる。金属粒子としては、粒径がマイクロメートルオーダーから数ナノメートルオーダーの、金微粒子、銀微粒子、銅微粒子が好ましい。導電性ポリマーとしては、特に共役ポリマーが好ましく、具体的には、ポリアニリン、ポリチオフェンが挙げられる。
 また、共増感剤を用いることで、レーザー彫刻用樹脂組成物を光硬化させる際の感度を更に向上させることができる。
 さらに、組成物の製造中あるいは保存中において重合性化合物の不要な熱重合を阻止するために少量の熱重合禁止剤を添加することが好ましい。
 レーザー彫刻用樹脂組成物の着色を目的として染料若しくは顔料等の着色剤を添加してもよい。これにより、画像部の視認性や、画像濃度測定機適性といった性質を向上させることができる。
 さらに、レーザー彫刻用樹脂組成物の硬化皮膜の物性を改良するために充填剤等の公知の添加剤を加えてもよい。
<Other additives>
The resin composition for laser engraving and the relief layer of the relief printing plate precursor may contain known additives in addition to those described above.
The resin composition for laser engraving is more preferably added with nitrocellulose or a highly thermally conductive substance as an additive for improving engraving sensitivity. Since nitrocellulose is a self-reactive compound, it generates heat during laser engraving and assists in the thermal decomposition of coexisting polymers such as hydrophilic polymers. As a result, it is estimated that the engraving sensitivity is improved. The high thermal conductive material is added for the purpose of assisting heat transfer, and examples of the thermal conductive material include inorganic compounds such as metal particles and organic compounds such as conductive polymers. As the metal particles, gold fine particles, silver fine particles, and copper fine particles having a particle size of micrometer order to several nanometers order are preferable. As the conductive polymer, a conjugated polymer is particularly preferable, and specific examples include polyaniline and polythiophene.
Moreover, the sensitivity at the time of photocuring the resin composition for laser engraving can be further improved by using a co-sensitizer.
Furthermore, it is preferable to add a small amount of a thermal polymerization inhibitor in order to prevent unnecessary thermal polymerization of the polymerizable compound during the production or storage of the composition.
A colorant such as a dye or pigment may be added for the purpose of coloring the resin composition for laser engraving. Thereby, properties such as the visibility of the image portion and the suitability of the image density measuring device can be improved.
Furthermore, in order to improve the physical properties of the cured film of the resin composition for laser engraving, a known additive such as a filler may be added.
 以下、実施例により本発明をさらに詳細に説明するが、本発明は以下の実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to the following examples.
(実施例1-1~1-25及び比較例1-1~1-5、並びに、実施例2-1~2-27及び比較例2-1:レリーフ印刷版製版用リンス液の作製)
 以下の処方例1~3により、表2~5に記載の界面活性剤(W剤)及び/又は溶剤の種類、添加濃度、及び、pHで、実施例1-1~1-25及び比較例1-1~1-5、並びに、実施例2-1~2-27及び比較例2-1のレリーフ印刷版製版用リンス液をそれぞれ作製した。
 なお、必要に応じて、リンス液のpHのアルカリ性側への調整は水酸化ナトリウムの添加により行った。
 また、処方例1及び2において消泡剤を添加しているのは、主に撹拌時やボトルへの充填時等のリンス液作製時における泡立ちを抑制し、また、リンス処理時におけるブラシ擦りの際の泡立ちを抑制するためである。
(Examples 1-1 to 1-25 and Comparative Examples 1-1 to 1-5, and Examples 2-1 to 2-27 and Comparative Example 2-1: Preparation of Rinse Solution for Relief Printing Plate Making)
According to the following Formulation Examples 1 to 3, Examples 1-1 to 1-25 and Comparative Examples were carried out with the types of surfactants (W agents) and / or solvents listed in Tables 2 to 5, and the addition concentrations and pH. The rinsing liquids for relief printing plate making of 1-1 to 1-5 and Examples 2-1 to 2-27 and Comparative Example 2-1 were prepared.
If necessary, the pH of the rinse solution was adjusted to the alkaline side by adding sodium hydroxide.
In addition, the addition of the antifoaming agent in the formulation examples 1 and 2 mainly suppresses foaming during the preparation of the rinsing liquid such as stirring and filling into the bottle, and brushing during the rinsing process This is to suppress foaming at the time.
<処方例1>
 ・水(主成分、下記記載の成分の残余)
 ・水酸化ナトリウム(固形)
 ・表2~5に記載の界面活性剤及び/又は溶剤(表2~5に記載の含有量)
 ・TSA731(0.07重量%、消泡剤、東レ・ダウコーニング(株)製シリコーン消泡剤)
<Prescription Example 1>
・ Water (main component, the remainder of the ingredients listed below)
・ Sodium hydroxide (solid)
・ Surfactants and / or solvents listed in Tables 2 to 5 (contents listed in Tables 2 to 5)
・ TSA731 (0.07% by weight, antifoaming agent, silicone antifoaming agent manufactured by Toray Dow Corning Co., Ltd.)
<処方例2>
 ・水(主成分、下記記載の成分の残余)
 ・水酸化カリウム(固形)
 ・表2~5に記載の界面活性剤及び/又は溶剤(表2~5に記載の含有量)
 ・TSA739(0.15重量%、消泡剤、東レ・ダウコーニング(株)製シリコーン消泡剤)
<Prescription Example 2>
・ Water (main component, the remainder of the ingredients listed below)
・ Potassium hydroxide (solid)
・ Surfactants and / or solvents listed in Tables 2 to 5 (contents listed in Tables 2 to 5)
・ TSA739 (0.15% by weight, antifoaming agent, silicone antifoaming agent manufactured by Toray Dow Corning Co., Ltd.)
<処方例3>
 ・水(主成分、下記記載の成分の残余)
 ・水酸化ナトリウム(固形)
 ・表2~5に記載の界面活性剤及び/又は溶剤(表2~5に記載の含有量)
<Prescription Example 3>
・ Water (main component, the remainder of the ingredients listed below)
・ Sodium hydroxide (solid)
・ Surfactants and / or solvents listed in Tables 2 to 5 (contents listed in Tables 2 to 5)
<レリーフ印刷版原版1の作製>
 1.レーザー彫刻用樹脂組成物の調製
 撹拌羽及び冷却管をつけた3つ口フラスコ中に、特定ポリマーとしてゴーセナールT-215(日本合成化学工業(株)製、水溶性PVA)50重量部、溶媒としてプロピレングリコールモノメチルエーテルアセテート47重量部を入れ、撹拌しながら70℃で120分間加熱しポリマーを溶解させた。その後、溶液を40℃にし、さらに可塑剤としてクエン酸トリブチルを15重量部、重合性化合物(単官能体)としてブレンマーLMA(日油(株)製)8重量部、重合開始剤としてパーブチルZ(日油(株)製)を1.6重量部、光熱変換剤としてカーボンブラック(ショウブラック N110、キャボットジャパン(株)製、DBP吸油量115ml/100g)を1重量部、を添加して30分間撹拌した。その後、(A)化合物(I)(SC-1)〔以下に、構造を示す。商品名、KBE-846として信越化学工業(株)より入手可能〕を15重量部、及び、触媒としてリン酸0.4重量部を添加し、40℃で10分間撹拌した。この操作により、流動性のあるレリーフ形成層用塗布液(レーザー彫刻用樹脂組成物)を得た。
<Preparation of relief printing plate precursor 1>
1. Preparation of resin composition for laser engraving In a three-necked flask equipped with a stirring blade and a cooling tube, 50 parts by weight of GOHSENAL T-215 (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., water-soluble PVA) as a specific polymer, as a solvent 47 parts by weight of propylene glycol monomethyl ether acetate was added and heated at 70 ° C. for 120 minutes with stirring to dissolve the polymer. Thereafter, the solution was brought to 40 ° C., 15 parts by weight of tributyl citrate as a plasticizer, 8 parts by weight of Bremer LMA (manufactured by NOF Corporation) as a polymerizable compound (monofunctional), and perbutyl Z ( 1.6 parts by weight of NOF Co., Ltd.) and 1 part by weight of carbon black (Show Black N110, Cabot Japan Co., Ltd., DBP oil absorption 115 ml / 100 g) as a photothermal conversion agent were added for 30 minutes. Stir. Thereafter, (A) Compound (I) (SC-1) [The structure is shown below. 15 parts by weight of a trade name, KBE-846 available from Shin-Etsu Chemical Co., Ltd.) and 0.4 parts by weight of phosphoric acid as a catalyst were added and stirred at 40 ° C. for 10 minutes. By this operation, a fluid coating solution for a relief forming layer (laser engraving resin composition) was obtained.
Figure JPOXMLDOC01-appb-C000013
 なお、Etはエチル基を表す。
Figure JPOXMLDOC01-appb-C000013
Et represents an ethyl group.
2.レーザー彫刻用レリーフ印刷版原版の作製
 PET基板上に所定厚のスペーサー(枠)を設置し、上記より得られたレリーフ形成層用塗布液をスペーサー(枠)から流出しない程度に静かに流延し、90℃のオーブン中で3時間乾燥させて、厚さが約1mmのレリーフ形成層を設け、レーザー彫刻用レリーフ印刷版原版1を作製した。
2. Preparation of relief printing plate precursor for laser engraving Place a spacer (frame) of a predetermined thickness on a PET substrate, and gently cast the relief-forming layer coating solution obtained above from the spacer (frame). Then, it was dried in an oven at 90 ° C. for 3 hours to provide a relief forming layer having a thickness of about 1 mm to prepare a relief printing plate precursor 1 for laser engraving.
<レリーフ印刷版原版2の作製>
 ゴーセナールT-215をデンカブチラール#3000-2(電気化学工業(株)製、ポリビニルブチラール、Mw=9万)に代えた以外は、レリーフ印刷版原版1の作製と同様の方法により、レリーフ形成層用塗布液を作製し、レーザー彫刻用レリーフ印刷版原版2を作製した。
<Preparation of relief printing plate precursor 2>
A relief forming layer was prepared in the same manner as in the production of the relief printing plate precursor 1 except that GOHSENAL T-215 was replaced with DENKA Butyral # 3000-2 (manufactured by Denki Kagaku Kogyo Co., Ltd., polyvinyl butyral, Mw = 90,000). A relief coating plate precursor 2 for laser engraving was prepared.
<レリーフ印刷版原版3の作製>
 SC-1及びリン酸を使用しなかった以外は、レリーフ印刷版原版2の作製と同様の方法により、レリーフ形成層用塗布液を作製し、レーザー彫刻用レリーフ印刷版原版3を作製した。
<Preparation of relief printing plate precursor 3>
Except that SC-1 and phosphoric acid were not used, a relief forming layer coating solution was prepared in the same manner as the preparation of the relief printing plate precursor 2 to prepare a relief printing plate precursor 3 for laser engraving.
<レリーフ印刷版原版4の作製>
 撹拌羽及び冷却管をつけた3つ口フラスコ中に、ELASTOSIL(登録商標:タイプR300/30S、Wacker社製シリコーンゴム)50重量部、溶媒としてテトラヒドロフラン47重量部を入れ、撹拌し、ポリマーを溶解させた。その後、光熱変換剤としてカーボンブラック(ショウブラックN110、キャボットジャパン(株)製、DBP吸油量115ml/100g)0.8重量部を添加して30分間撹拌した。この操作により、流動性のあるレリーフ形成層用塗布液(レーザー彫刻用樹脂組成物)を得た。
 上記レリーフ形成層用塗布液を使用した以外は、レリーフ印刷版原版1の作製と同様の方法により、レリーフ形成層用塗布液を作製し、レーザー彫刻用レリーフ印刷版原版4を作製した。
<Preparation of relief printing plate precursor 4>
In a three-necked flask equipped with a stirring blade and a condenser tube, 50 parts by weight of ELASTOSIL (registered trademark: type R300 / 30S, Wacker silicone rubber) and 47 parts by weight of tetrahydrofuran as a solvent are stirred and stirred to dissolve the polymer. I let you. Thereafter, 0.8 parts by weight of carbon black (Show Black N110, manufactured by Cabot Japan Co., Ltd., DBP oil absorption 115 ml / 100 g) was added as a photothermal conversion agent and stirred for 30 minutes. By this operation, a fluid coating solution for a relief forming layer (laser engraving resin composition) was obtained.
A relief forming layer coating solution was prepared by the same method as the preparation of the relief printing plate precursor 1 except that the relief forming layer coating solution was used, and a relief printing plate precursor 4 for laser engraving was prepared.
<レリーフ印刷版の作製>
 得られたレーザー彫刻用レリーフ印刷版原版のレリーフ形成層を80℃で3時間、さらに100℃で3時間加熱してレリーフ形成層を熱架橋した。
 架橋後のレリーフ形成層に対し、炭酸ガスレーザー(CO2レーザー)又はファイバー付き半導体レーザーにより彫刻し、レリーフ印刷版を得た。なお、得られたレリーフ印刷版が有するレリーフ層の厚さは約1mmであった。
<炭酸ガスレーザー彫刻>
 炭酸ガスレーザー彫刻機として、レーザー照射による彫刻を、高品位CO2レーザーマーカML-9100シリーズ((株)キーエンス製)を用いた。レーザー彫刻用印刷版原版1から保護フィルムを剥離後、炭酸ガスレーザー彫刻機で、出力:12W、ヘッド速度:200mm/秒、ピッチ設定:2,400DPIの条件で、1cm四方のベタ部分をラスター彫刻した。
<ファイバー付き半導体レーザー彫刻>
 ファイバー付き半導体レーザー彫刻機として、最大出力8.0Wのファイバー付き半導体レーザー(FC-LD)SDL-6390(JDSU社製、波長915nm)を装備したレーザー記録装置を用いた。半導体レーザー彫刻機でレーザー出力:7.5W、ヘッド速度:409mm/秒、ピッチ設定:2,400DPIの条件で、1cm四方のベタ部分をラスター彫刻した。
<Preparation of relief printing plate>
The relief forming layer of the obtained relief printing plate precursor for laser engraving was heated at 80 ° C. for 3 hours and further at 100 ° C. for 3 hours to thermally crosslink the relief forming layer.
The relief forming layer after crosslinking was engraved with a carbon dioxide laser (CO 2 laser) or a semiconductor laser with a fiber to obtain a relief printing plate. In addition, the thickness of the relief layer which the obtained relief printing plate has was about 1 mm.
<Carbon dioxide laser engraving>
As a carbon dioxide laser engraving machine, engraving by laser irradiation was performed using a high-quality CO 2 laser marker ML-9100 series (manufactured by Keyence Corporation). After peeling off the protective film from the printing plate precursor 1 for laser engraving, a carbon dioxide laser engraving machine is used to raster engrave a 1 cm square solid part under the conditions of output: 12 W, head speed: 200 mm / sec, pitch setting: 2,400 DPI did.
<Semiconductor laser engraving with fiber>
A laser recording apparatus equipped with a fiber-coupled semiconductor laser (FC-LD) SDL-6390 (manufactured by JDSU, wavelength 915 nm) was used as a fiber-coupled semiconductor laser engraving machine. A 1 cm square solid part was raster engraved with a semiconductor laser engraving machine under conditions of laser output: 7.5 W, head speed: 409 mm / second, pitch setting: 2,400 DPI.
(評価)
 表2~5に記載のレリーフ印刷版原版を、前記炭酸ガスレーザー又はファイバー付き半導体レーザーにより彫刻したレリーフ印刷版を使用し、実施例1-1~1-25及び比較例1-1~1-5、並びに、実施例2-1~2-27及び比較例2-1のレリーフ印刷版製版用リンス液について、以下の評価を行った。
(Evaluation)
Examples 1-1 to 1-25 and Comparative Examples 1-1 to 1- 1 were prepared by using the relief printing plate precursors listed in Tables 2 to 5 engraved with the carbon dioxide laser or the semiconductor laser with fiber. 5 and the rinsing solutions for relief printing plate making of Examples 2-1 to 2-27 and Comparative Example 2-1 were evaluated as follows.
<リンス性評価>
 彫刻したレリーフ印刷版にリンス液を約200mL/m2かけ、彫刻部を歯ブラシ(ライオン(株)製、クリニカハブラシ フラット)で縦方向及び横方向に各15回こすった。その後、光学顕微鏡で観察し、レリーフ層のカスがないものを6、ほとんどないものを5、少し残存しているものを3(許容レベル)、カスが除去できていないものを1とし、また、5と3との中間の評価を4、3と1との中間の評価を2とした。
<Rinse evaluation>
The rinsing liquid was applied to the engraved relief printing plate at about 200 mL / m 2, and the engraved portion was rubbed 15 times in the vertical and horizontal directions with a toothbrush (manufactured by Lion Corporation, Clinica Habrush Flat). Then, when observed with an optical microscope, the relief layer with no debris was 6, 6 with little remaining, 3 with a little remaining (allowable level), 1 with no debris removed, An intermediate evaluation between 5 and 3 was 4, and an intermediate evaluation between 4, 3 and 1 was 2.
<レリーフ印刷版(感材)への影響評価>
 彫刻していないレリーフ印刷版をリンス液中に浸漬させ、その重量変化を測定した。
 重量変化が非常に小さいものは3、重量変化が小さく実用上許容できるものは2、重量変化が大きく実用上許容できないものは1とした。
<Evaluation of impact on relief printing plate (sensitive material)>
The relief printing plate which was not engraved was immersed in the rinse liquid, and the weight change was measured.
The weight change was very small, 3; the weight change was small and practically acceptable; 2; the weight change was large and practically unacceptable.
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000017
 なお、表2~5においてリンス液に含有される界面活性剤として使用したノニオン界面活性剤、アニオン界面活性剤、及びノニオン界面活性剤は次の通りである。
 ノニオン界面活性剤は、前記式(1-1)~式(1-6)で表されるノニオン界面活性剤のうち、所定のアルキル基R及びEO鎖長(n、m+n、又はl+m+n)を有するものである。これらノニオン界面活性剤におけるアルキル基Rはいずれも直鎖状のものである。
 また、アニオン界面活性剤は、以下に示す式(2-6-1)及び式(2-11)で表されるアニオン界面活性剤である。式(2-6-1)で表されるアニオン界面活性剤におけるアルキル基C49はイソブチル基、式(2-11)で表されるアニオン界面活性剤におけるC817は直鎖状のものである。
 また、カチオン界面活性剤は、以下に示す式(3-4)で表されるカチオン界面活性剤である。このカチオン界面活性剤におけるアルキル基C1225は直鎖状のものである。
In Tables 2 to 5, the nonionic surfactant, the anionic surfactant, and the nonionic surfactant used as the surfactant contained in the rinse liquid are as follows.
The nonionic surfactant has a predetermined alkyl group R and EO chain length (n, m + n, or l + m + n) among the nonionic surfactants represented by the formulas (1-1) to (1-6). Is. The alkyl groups R in these nonionic surfactants are all linear.
The anionic surfactant is an anionic surfactant represented by the following formula (2-6-1) and formula (2-11). In the anionic surfactant represented by the formula (2-6-1), the alkyl group C 4 H 9 is an isobutyl group, and in the anionic surfactant represented by the formula (2-11), C 8 H 17 is linear. belongs to.
The cationic surfactant is a cationic surfactant represented by the following formula (3-4). The alkyl group C 12 H 25 in this cationic surfactant is linear.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 また、表4及び5においてリンス液に含有される溶剤として使用したものは、前記溶剤S-1~S-45のうちのいずれかである。 In Tables 4 and 5, the solvent used in the rinse liquid is any one of the solvents S-1 to S-45.
 上記のほか、表2~5における略記、表2~5で使用したバインダー、及び、化合物(I)は、以下に示す通りである。
 PVA:ゴーセナールT-215(日本合成化学工業(株)製、水溶性PVA)
 PVB:ポリビニルブチラール(Mw=9.0万、電気化学工業(株)製デンカブチラール #3000-2)
 ゴム:ELASTOSIL(登録商標:タイプR300/30S、Wacker社製、シリコーンゴム)
 化合物(I):下記SC-1
In addition to the above, the abbreviations in Tables 2 to 5, the binders used in Tables 2 to 5, and the compound (I) are as shown below.
PVA: GOHSENAL T-215 (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., water-soluble PVA)
PVB: polyvinyl butyral (Mw = 90,000, Denka Butyral # 3000-2 manufactured by Denki Kagaku Kogyo Co., Ltd.)
Rubber: ELASTOSIL (registered trademark: type R300 / 30S, manufactured by Wacker, silicone rubber)
Compound (I): SC-1 below
Figure JPOXMLDOC01-appb-C000019
 なお、Etはエチル基を表す。
Figure JPOXMLDOC01-appb-C000019
Et represents an ethyl group.

Claims (11)

  1.  非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を含有するレリーフ形成層を支持体上に有するレリーフ印刷版原版を準備する工程、
     前記レリーフ印刷版原版を、レーザーを用いた露光により彫刻する工程、並びに、
     彫刻により発生した彫刻カスをレリーフ印刷版製版用リンス液で除去する工程、をこの順で有し、
     前記レリーフ印刷版製版用リンス液が、ノニオン界面活性剤を含有することを特徴とする
     レリーフ印刷版の製版方法。
    Preparing a relief printing plate precursor having a relief-forming layer containing a non-elastomer binder polymer, a plasticizer, and a photothermal conversion agent on a support;
    Engraving the relief printing plate precursor by exposure using a laser; and
    A step of removing engraving residue generated by engraving with a rinsing liquid for relief printing plate making in this order,
    The method for making a relief printing plate, wherein the rinsing liquid for making a relief printing plate contains a nonionic surfactant.
  2.  前記レリーフ印刷版製版用リンス液が、下記式(1-1)~式(1-6)で表される化合物よりなる群から選ばれたノニオン界面活性剤を少なくとも1種含有する請求項1に記載のレリーフ印刷版の製版方法。
    Figure JPOXMLDOC01-appb-C000001
     (式(1-1)、及び式(1-3)~式(1-5)中、Rは炭素数6~23のアルキル基を表し、式(1-1)中、nは3~100の整数を表し、式(1-2)中、nは3~30の整数を表し、式(1-3)及び式(1-4)中、m及びnはそれぞれ、3≦m+n≦50を満たし、かつ0以上の整数を表し、式(1-5)及び式(1-6)中、Xは水素原子又はメチル基を表し、式(1-5)中、nは3~50の整数を表し、式(1-6)中、l、m、及びnはそれぞれ独立に、2~30の整数を表す。)
    The rinsing liquid for relief printing plate making contains at least one nonionic surfactant selected from the group consisting of compounds represented by the following formulas (1-1) to (1-6): A method for making a relief printing plate as described.
    Figure JPOXMLDOC01-appb-C000001
    (In the formula (1-1) and the formulas (1-3) to (1-5), R represents an alkyl group having 6 to 23 carbon atoms, and in the formula (1-1), n is 3 to 100. In formula (1-2), n represents an integer of 3 to 30, and in formulas (1-3) and (1-4), m and n each satisfy 3 ≦ m + n ≦ 50. And in formulas (1-5) and (1-6), X represents a hydrogen atom or a methyl group, and in formula (1-5), n is an integer of 3 to 50 In formula (1-6), l, m and n each independently represents an integer of 2 to 30.)
  3.  前記レリーフ印刷版製版用リンス液における前記ノニオン界面活性剤の含有量が、0.1~20重量%である請求項1又は2に記載のレリーフ印刷版の製版方法。 3. The method for making a relief printing plate according to claim 1, wherein the content of the nonionic surfactant in the rinsing liquid for relief printing plate making is 0.1 to 20% by weight.
  4.  前記レリーフ印刷版製版用リンス液が、アルコール系溶剤、エーテル系溶剤、グリコール系溶剤、及びグリコールエーテル系溶剤よりなる群から選択された少なくとも1種の溶剤を含有する請求項1~3のいずれか1項に記載のレリーフ印刷版の製版方法。 4. The relief printing plate making rinse solution contains at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents. 2. A method for making a relief printing plate according to item 1.
  5.  非エラストマーのバインダーポリマー、可塑剤、及び光熱変換剤を含有するレリーフ形成層を支持体上に有するレリーフ印刷版原版を準備する工程、
     前記レリーフ印刷版原版を、レーザーを用いた露光により彫刻する工程、並びに、
     彫刻により発生した彫刻カスをレリーフ印刷版製版用リンス液で除去する工程、をこの順で有し、
     前記レリーフ印刷版製版用リンス液が、アルコール系溶剤、エーテル系溶剤、グリコール系溶剤、及びグリコールエーテル系溶剤よりなる群から選択された少なくとも1種の溶剤を含有することを特徴とする
     レリーフ印刷版の製版方法。
    Preparing a relief printing plate precursor having a relief-forming layer containing a non-elastomer binder polymer, a plasticizer, and a photothermal conversion agent on a support;
    Engraving the relief printing plate precursor by exposure using a laser; and
    A step of removing engraving residue generated by engraving with a rinsing liquid for relief printing plate making in this order,
    The relief printing plate rinsing solution contains at least one solvent selected from the group consisting of alcohol solvents, ether solvents, glycol solvents, and glycol ether solvents. Plate making method.
  6.  前記レリーフ印刷版製版用リンス液における前記溶剤の含有量が、1~40重量%である請求項4又は5に記載のレリーフ印刷版の製版方法。 The method for making a relief printing plate according to claim 4 or 5, wherein the content of the solvent in the rinsing liquid for relief printing plate making is 1 to 40% by weight.
  7.  前記レリーフ印刷版製版用リンス液のpHが9以上である請求項1~6のいずれか1項に記載のレリーフ印刷版の製版方法。 The relief printing plate making method according to any one of claims 1 to 6, wherein the pH of the rinsing solution for relief printing plate making is 9 or more.
  8.  前記バインダーポリマーが、ポリビニルブチラール及び/又はその誘導体である請求項1~7のいずれか1項に記載のレリーフ印刷版の製版方法。 The method for making a relief printing plate according to any one of claims 1 to 7, wherein the binder polymer is polyvinyl butyral and / or a derivative thereof.
  9.  前記レリーフ形成層が、下記式(I)で表される基を含む化合物を含有する請求項1~8のいずれか1項に記載のレリーフ印刷版の製版方法。
        *-M(R1)(R2n   (I)
     (式(I)中、R1はOR3又はハロゲン原子を表し、MはSi、Ti又はAlを表し、MがSiであるときnは2であり、MがTiであるときnは2であり、MがAlであるときnは1であり、n個あるR2はそれぞれ独立に炭化水素基、OR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、*は、他の構造との結合位置を表す。)
    The plate making method of a relief printing plate according to any one of claims 1 to 8, wherein the relief forming layer contains a compound containing a group represented by the following formula (I).
    * -M (R 1 ) (R 2 ) n (I)
    (In the formula (I), R 1 represents OR 3 or a halogen atom, M represents Si, Ti, or Al. When M is Si, n is 2, and when M is Ti, n is 2. And when M is Al, n is 1, each R 2 independently represents a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * (Represents the bonding position with other structures)
  10.  前記レリーフ形成層が、下記式(i)で表される基を含む化合物を含有する請求項9に記載のレリーフ印刷版の製版方法。
        *-Si(OR3)(R22   (i)
     (式(i)中、2個あるR2はそれぞれ独立に炭化水素基、OR3又はハロゲン原子を表し、R3は水素原子又は炭化水素基を表し、*は、他の構造との結合位置を表す。)
    The plate-making method of the relief printing plate of Claim 9 in which the said relief forming layer contains the compound containing group represented by following formula (i).
    * -Si (OR 3 ) (R 2 ) 2 (i)
    (In formula (i), two R 2 s each independently represent a hydrocarbon group, OR 3 or a halogen atom, R 3 represents a hydrogen atom or a hydrocarbon group, and * represents a bonding position with another structure. Represents.)
  11.  前記彫刻する工程が、前記レリーフ印刷版原版を最大波長が700~1,300nmのファイバー付き半導体レーザーを用いて走査露光により露光領域を彫刻する工程である、請求項1~10のいずれか1項に記載のレリーフ印刷版の製版方法。 11. The engraving step is a step of engraving an exposure area by scanning exposure of the relief printing plate precursor using a fiber-coupled semiconductor laser having a maximum wavelength of 700 to 1,300 nm. A process for making a relief printing plate as described in 1.
PCT/JP2011/050710 2010-01-27 2011-01-18 Method for producing relief printing plate WO2011093166A1 (en)

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