WO2010137302A1 - Nitrogen-containing heteroaryl derivatives and fungicides for agricultural and horticultural use - Google Patents

Nitrogen-containing heteroaryl derivatives and fungicides for agricultural and horticultural use Download PDF

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WO2010137302A1
WO2010137302A1 PCT/JP2010/003500 JP2010003500W WO2010137302A1 WO 2010137302 A1 WO2010137302 A1 WO 2010137302A1 JP 2010003500 W JP2010003500 W JP 2010003500W WO 2010137302 A1 WO2010137302 A1 WO 2010137302A1
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French (fr)
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古川裕紀
清水一彌
▲桑▼原頼人
荻野智和
大沢陽子
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日本曹達株式会社
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62Oxygen or sulfur atoms
    • C07D213/63One oxygen atom
    • C07D213/64One oxygen atom attached in position 2 or 6
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N47/00Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid
    • A01N47/08Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having one or more single bonds to nitrogen atoms
    • A01N47/10Carbamic acid derivatives, i.e. containing the group —O—CO—N<; Thio analogues thereof
    • A01N47/24Carbamic acid derivatives, i.e. containing the group —O—CO—N<; Thio analogues thereof containing the groups, or; Thio analogues thereof
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N47/00Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid
    • A01N47/08Biocides, pest repellants or attractants, or plant growth regulators containing organic compounds containing a carbon atom not being member of a ring and having no bond to a carbon or hydrogen atom, e.g. derivatives of carbonic acid the carbon atom having one or more single bonds to nitrogen atoms
    • A01N47/28Ureas or thioureas containing the groups >N—CO—N< or >N—CS—N<
    • A01N47/34Ureas or thioureas containing the groups >N—CO—N< or >N—CS—N< containing the groups, e.g. biuret; Thio analogues thereof; Urea-aldehyde condensation products
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62Oxygen or sulfur atoms
    • C07D213/63One oxygen atom
    • C07D213/68One oxygen atom attached in position 4
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/04Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond

Definitions

  • the present invention relates to a novel nitrogen-containing heteroaryl derivative, a salt thereof, or an N-oxide, and an agricultural and horticultural fungicide containing at least one of these compounds as an active ingredient.
  • Patent Document 1 discloses a carbamate derivative represented by the formula (A) and an agricultural and horticultural fungicide containing it as an active ingredient.
  • X ′′ is a halogen atom, a C1-C6 alkyl group, etc.
  • n is an integer from 0 to 4
  • R a1 is a C1-C6 alkyl group
  • R a2 is a hydrogen atom, C1 ⁇ a C6 alkyl group, a R a3 hydrogen atom or C1-C6 alkyl group
  • G is an oxygen atom, a sulfur atom, etc.
  • Y "is hydrogen, C1-C10 alkyl group, C2-C10 alkenyl group Q ′′ is a hydrogen atom, a C1-C6 haloalkyl group, a phenyl group, etc.
  • Patent Document 2 discloses an iminooxymethylpyridine compound represented by the formula (B) and an agricultural and horticultural fungicide containing the compound as an active ingredient.
  • X ′ is an oxygen atom or a bond
  • Y ′ and Z ′ are each independently one or two selected from the group consisting of a phenyl group, an oxygen atom, a sulfur atom and a nitrogen atom.
  • Patent Document 3 discloses an oxyamine derivative represented by the formula (C) and an agricultural and horticultural fungicide containing it as an active ingredient.
  • R c1 represents a hydrogen atom, a C1-6 alkyl group, a C1-6 alkylcarbonyl group, or a C1-6 alkylsulfonyl group.
  • R c2 is a C1-6 alkyl group or a C1-6 alkoxy group.
  • R c3 is a halogen atom, a C1-6 alkyl group, or a C1-6 alkoxy group.
  • a c is a branched also be C1 ⁇ 6 alkylene group or a bond.
  • Q c is a phenyl group which may be substituted with G, a group represented by the formula (p1), or a group represented by the formula (p2).
  • m is an integer of 0-4.
  • R c4 is a hydrogen atom, a C1-6 alkyl group, a C2-6 alkenyl group, or SiR c5 R c6 R c7, where R c5 -R c7 are each independently C1-6 alkyl
  • R c8 is a hydrogen atom, a C1-6 alkyl group, a C1-6 haloalkyl group, or a phenyl group optionally substituted with G.
  • Y is a hydrogen atom, C1-6 alkyl A C3-6 cycloalkyl group, a C3-6 cycloalkyl-C1-6 alkyl group, a C2-6 alkenyl group, a C2-6 alkynyl group, or a phenyl C1-6 alkyl group optionally substituted by G.
  • G represents a halogen atom, a C1-6 alkyl group, a C1-6 alkoxy group, a C1-6 haloalkyl group, or a C1-6 haloalkoxy group, and these Gs may be the same or different and may be substituted by 2 to 5 .
  • Patent Document 4 discloses an aryl heterocyclic derivative represented by the formula (D) and an agricultural and horticultural fungicide containing it as an active ingredient.
  • R d1 is a C1-6 alkyl group
  • R d2 is a halogen atom, etc.
  • m is an integer of 0-4
  • T is a formula (p3), a formula (p4), a formula (p5)
  • R d3 , R d4 , R d5 and R d6 are hydrogen atoms and the like, n is an integer of 1 to 4
  • Q d is a formula (p6), a formula (p7), a formula It is a group represented by (p8), formula (p9), and formula (p10).
  • R d7 represents a C5-12 alkyl group, etc.
  • R d8 , R d9 , R d10 and R d11 represent A hydrogen atom
  • X is an oxygen atom or a sulfur atom
  • k is 0 or an integer of 1 to 3)
  • Patent Document 5 discloses a phenoxyamine derivative represented by the formula (E) and an agricultural and horticultural fungicide containing it as an active ingredient.
  • R e1 and R e2 are each independently a hydrogen atom, etc .; V is NR e3, etc .; R e3 is a hydrogen atom, etc .; R e4 is a C1-6 alkoxy group, etc. Yes; W is an oxygen atom or the like; Q e2 is an oxygen atom or the like; Y is a phenyl group which is substituted with a C1-5 haloalkoxy group or the like, and may be further substituted with a halogen atom or the like.
  • JP 2001-106666 A JP 2007-137852 A Japanese Patent Laid-Open No. 2004-166863 WO2005 / 051932 WO2008 / 124092
  • the present invention has been made in view of such circumstances, a novel nitrogen-containing heteroaryl derivative that can be produced industrially advantageously, can be used safely and safely for agricultural and horticultural use, and its An object of the present invention is to provide a fungicide for agriculture and horticulture containing a salt or N-oxide and at least one of these compounds as an active ingredient.
  • the present invention is a nitrogen-containing heteroaryl derivative represented by the formula (1), a salt thereof, or an N-oxide.
  • R 1 is an unsubstituted or substituted C1-6 alkyl group.
  • R 2 is a hydrogen atom, C1 ⁇ 6 alkyl group having an unsubstituted or substituted group of the formula: COR 21 (wherein, R 21 has a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, A substituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
  • R 22 is, C1 ⁇ 6 alkyl group having an unsubstituted or substituted group, C2 ⁇ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or location Group having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 An aryl group, or an unsubstituted or substituted heteroaryl group.
  • CON (R 21 ) 2 wherein R 21 has the same meaning as described above; R 21 May be the same or different.
  • a 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
  • R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalky
  • a 2 is an oxygen atom
  • Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above, and R 21 may be the same or different).
  • a group represented by the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, or a halogen atom) It is a group represented by.
  • J is an oxygen atom or a sulfur atom.
  • X C1 ⁇ 6 alkyl group having an unsubstituted or substituted group of the formula: OR 23 (wherein, R 23 represents a hydrogen atom, C1 ⁇ 6 alkyl having unsubstituted or substituted Group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted A C4-8 cycloalkenyl group having a group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, a formula: COR 21 , a formula: CO 2 R 22 , or a formula : CON (R 21 ) 2 (in the formula, R 21 and R 22 have the same meanings as described above.
  • R 21 may be the same or different.
  • Formula: SR 23 Formula: N (R 23) 2 ( . Wherein, R 23 is .R 23 is the same meaning as above, which may be the same or different) a group represented by a cyano group, a nitro group or a halogen atom, is there.
  • n represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
  • B 1 to B 4 are each independently a nitrogen atom or a carbon atom. However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
  • D is any group represented by the formulas (2) to (6).
  • Q 1 represents an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted group. Having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 aryl group An unsubstituted or substituted heteroaryl group, an unsubstituted or substituted aralkyl group, an unsubstituted or substituted heteroaralkyl group, or a trisubstituted silyl group.
  • R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl.
  • R 8 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted group Or a substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6 ⁇ 10 aryl group, or unsubstituted or substituted heteroaryl group.
  • R 8 may further be bonded to a carbon atom on Q 1 or a nitrogen atom.
  • Q 41 is a C6-10 aryl group or a heteroaryl group.
  • Q 2 is represented by formula: OR 23 , formula: SR 23 , formula: N (R 23 ) 2 , formula: COR 21 , formula: CO 2 R 22 , formula: CON (R 21 ) 2 , Formula: SO 2 R 22 (wherein R 21 , R 22 , and R 23 have the same meaning as described above.
  • R 21 may be the same or different.
  • R 23 may be the same or different.
  • m1 represents the number of Q 1 and is an integer of 0 to 7.
  • m2 represents the number of Q 2 and is an integer of 0 to 7. However, the sum of m1 and m2 is 7 or less.
  • Q 1 may be the same or different.
  • Q 2 may be the same or different.
  • Q 1 , Q 2 , or Q 1 and Q 2 that are adjacently substituted on Q 41 may be bonded to each other to form a 5- to 8-membered ring.
  • the second aspect of the present invention is a nitrogen-containing heteroaryl derivative represented by the formula (7), a salt thereof, or an N-oxide.
  • R 1 , R 2 , A 1 , A 2 , J, X, n, and D have the same meaning as in the formula (1).
  • the third aspect of the present invention is a nitrogen-containing heteroaryl derivative represented by the formula (8), a salt thereof, or an N-oxide.
  • R 1 , R 2 , A 1 , A 2 , J, X, n, R 7 , and Q 1 have the same meaning as in formula (1).
  • the present invention is an agricultural and horticultural fungicide containing, as an active ingredient, at least one of the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide. That is, it is an agricultural and horticultural fungicide containing at least one of the nitrogen-containing heteroaryl derivative represented by the formula (1), a salt thereof, or N-oxide as an active ingredient. Preferably, it is an agricultural and horticultural fungicide containing as an active ingredient at least one of a nitrogen-containing heteroaryl derivative represented by the formula (7), a salt thereof, or an N-oxide. More preferred is an agricultural and horticultural fungicide containing as an active ingredient at least one of a nitrogen-containing heteroaryl derivative represented by the formula (8), a salt thereof, or an N-oxide.
  • the fifth aspect of the present invention is a production intermediate used for the production of the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide. That is, it is a nitrogen-containing heteroaryl derivative represented by the formula (9).
  • R 1 is an unsubstituted or substituted C1-6 alkyl group.
  • R 2 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, a formula: COR 21 (wherein R 21 has a hydrogen atom, an unsubstituted or substituted group) C1-6 alkyl group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, A substituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
  • R 22 is, C1 ⁇ 6 alkyl group having an unsubstituted or substituted group, C2 ⁇ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or location Group having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 An aryl group, or an unsubstituted or substituted heteroaryl group.
  • CON (R 21 ) 2 wherein R 21 has the same meaning as described above; R 21 May be the same or different.
  • a 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
  • R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalky
  • a 2 is an oxygen atom
  • Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above, and R 21 may be the same or different).
  • a group represented by the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, or a halogen atom) It is a group represented by.
  • J is an oxygen atom or a sulfur atom.
  • X is C1 ⁇ 6 alkyl group having an unsubstituted or substituted group of the formula: OR 23 (wherein, R 23 represents a hydrogen atom, C1 ⁇ 6 alkyl having unsubstituted or substituted Group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted A C4-8 cycloalkenyl group having a group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, a formula: COR 21 , a formula: CO 2 R 22 , or a formula : CON (R 21 ) 2 (in the formula, R 21 and R 22 have the same meanings as described above.
  • R 21 may be the same or different.
  • Formula: SR 23 Formula: N (R 23) 2 ( . Wherein, R 23 is .R 23 is the same meaning as above, which may be the same or different) a group represented by a cyano group, a nitro group or a halogen atom, is there.
  • n represents the number of X and is an integer of 0 to 3. When n is 2 or more, Xs may be the same or different.
  • B 1 to B 4 are each independently a nitrogen atom or a carbon atom. However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
  • R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2 An -6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or It is an unsubstituted or substituted heteroaryl group.
  • a preferred production intermediate is a nitrogen-containing heteroaryl derivative represented by the formula (10), a salt thereof, or N-oxide.
  • R 1 , R 2 , A 1 , A 2 , J, X, n, and R 7 have the same meaning as in formula (9).
  • the sixth aspect of the present invention is a production intermediate used for the production of the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide. That is, it is a nitrogen-containing heteroaryl derivative represented by the formula (11).
  • R 1 is an unsubstituted or substituted C1-6 alkyl group.
  • R 2 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, a formula: COR 21 (wherein R 21 has a hydrogen atom, an unsubstituted or substituted group) C1-6 alkyl group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, A substituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
  • R 22 is, C1 ⁇ 6 alkyl group having an unsubstituted or substituted group, C2 ⁇ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or A substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6 ⁇ Or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 has the same meaning as described above). 21 may be the same or different.)
  • a 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
  • R 3 is a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cyclo
  • a 2 is an oxygen atom
  • Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above, and R 21 may be the same or different).
  • a group represented by the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, or a halogen atom) It is a group represented by.
  • J is an oxygen atom or a sulfur atom.
  • X is C1 ⁇ 6 alkyl group having an unsubstituted or substituted group of the formula: OR 23 (wherein, R 23 represents a hydrogen atom, C1 ⁇ 6 alkyl having unsubstituted or substituted Group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted A C4-8 cycloalkenyl group having a group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, a formula: COR 21 , a formula: CO 2 R 22 , or a formula : CON (R 21 ) 2 (in the formula, R 21 and R 22 have the same meanings as described above.
  • R 21 may be the same or different.
  • Formula: SR 23 Formula: N (R 23) 2 ( . Wherein, R 23 is .R 23 is as defined above, which may be the same or different) a group represented by a cyano group, a nitro group or a halogen atom, It is.
  • n represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
  • B 1 to B 4 are each independently a nitrogen atom or a carbon atom. However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
  • R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2 An -6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or It is an unsubstituted or substituted heteroaryl group.
  • each R 9 is independently a hydrogen atom or a group represented by the formula: COR 21 (wherein R 21 has the same meaning as described above). R 9 may be the same or different. R 9 may be together.
  • a preferred production intermediate is a nitrogen-containing heteroaryl derivative represented by the formula (12), a salt thereof, or N-oxide.
  • R 1 , R 2 , A 1 , A 2 , J, X, n, R 7 , and R 9 have the same meaning as in formula (11).
  • the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide is a novel compound, and can be produced industrially advantageously, and is useful as an active ingredient in agricultural and horticultural fungicides that can be used safely and reliably. is there.
  • the agricultural and horticultural fungicide of the present invention is an agent that has an excellent control effect, does not cause phytotoxicity or contamination on the plant body, and has little toxicity to human fish and environmental impact.
  • Nitrogen-containing heteroaryl derivative of the present invention is a compound represented by the formula (1).
  • the number of substituents may be one, or two or more. Two or more substituents may be the same or different.
  • a group serving as a mother nucleus is a C1-6 alkyl group, and any of these hydrogen atoms is substituted with a group having a different structure ("substituent") It is.
  • a C1-6 alkyl group is a saturated aliphatic hydrocarbon group having 1-6 carbon atoms.
  • the C1-6 alkyl group may be linear or branched. Specifically, methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, i-propyl group, i-butyl group, s-butyl group, t-butyl group, Examples include isopentyl group, neopentyl group, 2-methylbutyl group, 2,2-dimethylpropyl group, isohexyl group and the like.
  • a halogen-substituted C1-6 alkyl group is a C1-6 alkyl group substituted with 1-13 halogen atoms.
  • the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
  • fluoromethyl group chloromethyl group, bromomethyl group, difluoromethyl group, dichloromethyl group, dibromomethyl group, trifluoromethyl group, trichloromethyl group, tribromomethyl group, 2,2,2-trifluoro Ethyl group, 2,2,2-trichloroethyl group, pentafluoroethyl group, 4-fluorobutyl group, 4-chlorobutyl group, 3,3,3-trifluoropropyl group, 2,2,2-trifluoro-1 -Trifluoromethylethyl group, perfluorohexyl group, perchlorohexyl group, 2,4,6-trichlorohexyl group and the like can be mentioned.
  • a C2-6 alkenyl group is an aliphatic hydrocarbon group having from 2 to 6 carbon atoms and having at least one carbon-carbon double bond.
  • the C2-6 alkenyl group may be a straight chain or a branched chain.
  • a C2-6 alkynyl group is an aliphatic hydrocarbon group having from 2 to 6 carbon atoms and having at least one carbon-carbon triple bond.
  • the C2-6 alkynyl group may be linear or branched. Specifically, ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group, 4-pentynyl group 1-hexynyl group, 1-methyl-2-propynyl group, 2-methyl-3-butynyl group, 1-methyl-2-butynyl group, 2-methyl-3-pentynyl group, 1,1-dimethyl-2- A butynyl group etc. can be mentioned.
  • a C3-8 cycloalkyl group is a saturated alicyclic hydrocarbon group having 3-8 carbon atoms. Specific examples include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
  • a C4-8 cycloalkenyl group is an alicyclic hydrocarbon group having 4-8 carbon atoms and having at least one carbon-carbon double bond. Specific examples include 1-cyclobutenyl group, 1-cyclopentenyl group, 3-cyclopentenyl group, 1-cyclohexenyl group, 3-cyclohexenyl group, 3-cycloheptenyl group, 4-cyclooctenyl group and the like.
  • a C6-10 aryl group is an aromatic hydrocarbon group having 6-10 carbon atoms.
  • the C6-10 aryl group may have one ring or two or more rings.
  • the remaining ring may be a saturated alicyclic ring, an unsaturated alicyclic ring, or an aromatic ring.
  • Specific examples include a phenyl group, a naphthyl group, an azulenyl group, an indenyl group, an indanyl group, and the like.
  • 1,2,3,4-tetrahydro-naphthalen-1-yl group 1,2,3,4-tetrahydro-naphthalen-2-yl group, 5,6,7,8-tetrahydro-naphthalene-1- And tetralinyl groups such as an yl group and a 5,6,7,8-tetrahydro-naphthalen-2-yl group.
  • the heteroaryl group is a 5- to 10-membered aryl group containing 1 to 4 heteroatoms selected from a nitrogen atom, an oxygen atom and a sulfur atom in addition to carbon atoms as atoms constituting the ring. In this case, it may be a single ring or a polycyclic ring condensed. Specific examples of the heteroaryl group include the following groups.
  • 5-membered heteroaryl group pyrrolyl group such as pyrrol-1-yl group, pyrrol-2-yl group and pyrrol-3-yl group; Furyl groups such as a furan-2-yl group and a furan-3-yl group; Thienyl groups such as a thiophen-2-yl group and a thiophen-3-yl group; Imidazolyl groups such as imidazol-1-yl group, imidazol-2-yl group, imidazol-4-yl group, imidazol-5-yl group; Pyrazolyl groups such as a pyrazol-1-yl group, a pyrazol-3-yl group, a pyrazol-4-yl group, a pyrazol-5-yl group; An oxazolyl group such as an oxazol-2-yl group, an oxazol-4-yl group, an oxazol-5-yl group; Isoxazo
  • pyridyl groups such as a 6-membered heteroaryl group pyridin-2-yl group, pyridin-3-yl group and pyridin-4-yl group; Pyrazinyl groups such as a pyrazin-2-yl group and a pyrazin-3-yl group; Pyrimidyl groups such as a pyrimidin-2-yl group, a pyrimidin-4-yl group, and a pyrimidin-5-yl group; Pyridazinyl groups such as a pyridazin-3-yl group and a pyridazin-4-yl group; A triazinyl group;
  • Examples of the group represented by the formula: COR 31 include formyl group, acetyl group, propionyl group, n-propylcarbonyl group, n-butylcarbonyl group, pentanoyl group, valeryl group, i-propylcarbonyl group, i-butyl.
  • Alkylcarbonyl groups such as carbonyl group, pivaloyl group and isovaleryl group; alkenylcarbonyl groups such as acryloyl group and methacryloyl group; alkynylcarbonyl groups such as propioyl group; arylcarbonyl groups such as benzoyl group and naphthylcarbonyl group; pyridin-2-yl Examples thereof include heteroarylcarbonyl groups such as carbonyl group and thienylcarbonyl group; benzylcarbonyl group, phenethylcarbonyl group, pyridin-2-ylmethylcarbonyl group and the like.
  • Examples of the group represented by the formula: CO 2 R 31 include a carboxyl group, a methoxycarbonyl group, an ethoxycarbonyl group, an n-propoxycarbonyl group, an i-propoxycarbonyl group, an n-butoxycarbonyl group, and an i-butoxycarbonyl group.
  • T-butoxycarbonyl group n-pentyloxycarbonyl group, n-hexyloxycarbonyl group, vinyloxycarbonyl group, cyclopropylmethyloxycarbonyl group, 2-cyclopentylethyloxycarbonyl group, phenoxycarbonyl group, pyridyloxycarbonyl group, Examples thereof include a benzyloxycarbonyl group and a 2-pyridylmethyloxycarbonyl group.
  • Examples of the group represented by the formula: CON (R 31 ) 2 include a mono C1-6 alkylcarbamoyl group such as a carbamoyl group, a methylcarbamoyl group, and an ethylcarbamoyl group; a vinylcarbamoyl group, a 1-propenylcarbamoyl group, 1- Mono-C2-6 alkenylcarbamoyl groups such as hexenylcarbamoyl group; mono-C2-6 alkynylcarbamoyl groups such as ethynylcarbamoyl group, propynylcarbamoyl group, propargylcarbamoyl group; mono- such as cyclopropylcarbamoyl group, cyclobutylcarbamoyl group, cyclohexylcarbamoyl group C3-8 cycloalkylcarbamoyl group; mono C4
  • Examples of the group represented by the formula: SO 2 R 31 include a methanesulfonyl group, an ethanesulfonyl group, a benzenesulfonyl group, and the like.
  • OR 32 examples include a hydroxyl group; a methoxy group, an ethoxy group, an n-propoxy group, an n-butoxy group, an n-pentyloxy group, an n-hexyloxy group, an i-propoxy group, i -Butoxy, s-butoxy, t-butoxy, 1-ethylpropoxy, isohexyloxy, 4-methylpentoxy, 3-methylpentoxy, 2-methylpentoxy, 1-methylpent Toxi group, 3,3-dimethylbutoxy group, 2,2-dimethylbutoxy group, 1,1-dimethylbutoxy group, 1,2-dimethylbutoxy group, 1,3-dimethylbutoxy group, 2,3-dimethylbutoxy group A C1-6 alkoxy group such as 1-ethylbutoxy group, 2-ethylbutoxy group; vinyloxy group, 1-propenyloxy group, 2-propenyloxy group, 1-butyl Nyloxy group, 2-but
  • the group represented by SR 32 for example, mercapto group; methylsulfanyl group, ethylsulfanyl group, C1 ⁇ 6 alkylsulfanyl group such as n- hexylsulfanyl group; vinyl sulfanyl group, 1-propenyl Nils Alpha group, 1 A C2-6 alkenylsulfanyl group such as a hexenylsulfanyl group; a C2-6 alkynylsulfanyl group such as an ethynylsulfanyl group, a propynylsulfanyl group, a propargylsulfanyl group; 8 cycloalkylsulfanyl groups; C4-8 cycloalkenylsulfanyl groups such as cyclobut-2-enylsulfanyl groups and cyclohex-2-enylsulfanyl groups; phenylsulfanyl groups
  • carboxysulfanyl groups carbamoylsulfanyl groups, methylcarbamoylsulfanyl groups, ethylcarbamoylsulfanyl groups, dimethylcarbamoylsulfanyl groups, diethylcarbamoylsulfanyl groups, phenylcarbamoylsulfanyl groups, etc. monosubstituted carbamoylsulfanyl groups or disubstituted carbamoylsulfanyl groups Can be mentioned.
  • N (R 32 ) 2 examples include mono C1-6 alkylamino groups such as methylamino group, ethylmethyl group, n-hexylamino group; vinylamino group, 1-propenylamino group Mono-C2-6 alkenylamino groups such as 1-hexenylamino group; mono-C2-6 alkynylamino groups such as ethynylamino group, propynylamino group, propargylamino group; cyclopropylamino group, cyclobutylamino group, cyclohexylamino group Mono C3-8 cycloalkylamino groups such as: mono C4-8 cycloalkenylamino groups such as cyclobut-2-enylamino group, cyclohex-2-enylamino group; mono C6-10 such as phenylamino group, 1-naphthylamino group, etc.
  • C1-7 acylamino group C1-7 carboxyamino group such as methoxycarbonylamino group, ethoxycarbonylamino group, t-butoxycarbonylamino group, vinyloxycarbonylamino group, phenoxycarbonylamino group, pyridyloxycarbonylamino group; carbamoylamino Group, methylcarbamoylamino group, ethylcarbamoylamino group, dimethylcarbamoylamino group, diethylcarbamoylamino group, phenylcarbamoylamino group, monosubstituted carbamoylamino group or disubstituted Moiruamino group or the like;
  • Dimethylamino group diethylmethyl group, methyl-vinyl-amino group, methyl-ethynyl-amino group, methyl-cyclopropyl-amino group, methyl-cyclobut-2-enyl-amino group, methyl-phenyl-amino group, methyl- Examples include pyridin-2-yl-amino group, methyl-acetyl-amino group, methyl-methoxycarbonyl-amino group; methylideneamino group, ethylideneamino group, and the like.
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
  • R 1 in the formula (1) is an unsubstituted or substituted C1-6 alkyl group.
  • the “C1-6 alkyl group” serving as a mother nucleus is as described above (hereinafter the same for R 2 to R 8 , R 21 to R 23 , X, and Q 1 ).
  • Suitable groups that can be a substituent of the C1-6 alkyl group include a halogen atom, a group represented by the formula: OR 32 , a C6-10 aryl group, and a heteroaryl group.
  • Examples of the C1-6 alkyl group having a substituent include a fluoromethyl group, a chloromethyl group, a bromomethyl group, a difluoromethyl group, a dichloromethyl group, a dibromomethyl group, a trifluoromethyl group, a trichloromethyl group, and a tribromomethyl group.
  • R 1 is preferably an unsubstituted C1-6 alkyl group.
  • R 2 in formula (1) is a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, a group represented by formula: COR 21 , a group represented by formula: CO 2 R 22 , or A group represented by the formula: CON (R 21 ) 2 .
  • Suitable groups that can be a substituent of the C1-6 alkyl group include a halogen atom, a group represented by the formula: COR 31 , a group represented by the formula: OR 32 , a C6-10 aryl group, and a heteroaryl group. Can be mentioned.
  • Examples of the C1-6 alkyl group having a substituent include a methoxymethyl group, an ethoxymethyl group, a methoxyethyl group, an ethoxyethyl group, a methoxy n-propyl group, an ethoxymethyl group, an ethoxyethyl group, an n-propoxymethyl group, a C1-6 alkoxy C1-6 alkyl group such as i-propoxyethyl group, s-butoxymethyl group, t-butoxyethyl group, 1,2-dimethoxyethyl group, 2,2-dimethoxyethyl group; formyloxymethyl group, And C1-7 acyloxy C1-6 alkyl groups such as an acetoxymethyl group, 2-acetoxyethyl group, propionyloxymethyl group, propionyloxyethyl group, and the like.
  • R 21 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group Is a heteroaryl group having
  • An unsubstituted or substituted C2-6 alkenyl group has a “C2-6 alkenyl group” as a mother nucleus.
  • the “C2-6 alkenyl group” serving as a mother nucleus is as described above (hereinafter the same in R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
  • a suitable group that can be a substituent of the C2-6 alkenyl group is a halogen atom.
  • Examples of the C2-6 alkenyl group having a substituent include, for example, 3-chloro-2-propenyl group, 4-chloro-2-butenyl group, 4,4-dichloro-3-butenyl group, 4,4-difluoro-3 -Butenyl group, 3,3-dichloro-2-propenyl group, 2,3-dichloro-2-propenyl group, 3,3-difluoro-2-propenyl group, 2,4,6-trichloro-2-hexenyl group, etc.
  • a C2-6 haloalkenyl group a C2-6 haloalkenyl group.
  • An unsubstituted or substituted C2-6 alkynyl group has a “C2-6 alkynyl group” as a mother nucleus.
  • the “C2-6 alkynyl group” serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
  • a suitable group that can be a substituent of the C2-6 alkynyl group is a halogen atom.
  • Examples of the C2-6 alkynyl group having a substituent include a 3-chloro-1-propynyl group, a 3-chloro-1-butynyl group, a 3-bromo-1-butynyl group, a 3-bromo-2-propynyl group, Halo such as 3-iodo-2-propynyl group, 3-bromo-1-hexynyl group, 5,5-dichloro-2-methyl-3-pentynyl group, 4-chloro-1,1-dimethyl-2-butynyl group, etc.
  • An alkynyl group etc. can be mentioned.
  • An unsubstituted or substituted C3-8 cycloalkyl group has a “C3-8 cycloalkyl group” as a mother nucleus.
  • the “C3-8 cycloalkyl group” serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
  • An unsubstituted or substituted C4-8 cycloalkenyl group has a “C4-8 cycloalkenyl group” as a mother nucleus.
  • the “C4-8 cycloalkenyl group” serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
  • An unsubstituted or substituted C6-10 aryl group has a “C6-10 aryl group” as a mother nucleus.
  • the C6-10 aryl group serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 41 ).
  • An unsubstituted or substituted heteroaryl group has a “heteroaryl group” as a mother nucleus.
  • the heteroaryl group serving as a mother nucleus is as described above (hereinafter the same in R 3 , R 7 , R 8 , R 22 , R 23 , and Q 41 ).
  • Examples of the group represented by the formula: COR 21 include formyl group, acetyl group, propionyl group, n-propylcarbonyl group, n-butylcarbonyl group, pentanoyl group, valeryl group, i-propylcarbonyl group, i-butyl.
  • Alkylcarbonyl groups such as carbonyl group, pivaloyl group and isovaleryl group; alkenylcarbonyl groups such as acryloyl group and methacryloyl group; alkynylcarbonyl groups such as propioloyl group; arylcarbonyl groups such as benzoyl group and naphthylcarbonyl group; 2-pyridylcarbonyl group A heteroarylcarbonyl group such as thienylcarbonyl group; benzylcarbonyl group, phenethylcarbonyl group, 2-pyridylmethylcarbonyl group; monofluoroacetyl group, monochloroacetyl group, monobromoacetyl group, difluoro Cetyl group, dichloroacetyl group, dibromoacetyl group, trifluoroacetyl group, trichloroacetyl group, tribromoacetyl group, 3,3,3-trifluoropro
  • R 22 is an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, unsubstituted or A substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted hetero An aryl group.
  • Examples of the group represented by the formula: CO 2 R 22 include methoxycarbonyl group, ethoxycarbonyl group, n-propoxycarbonyl group, i-propoxycarbonyl group, n-butoxycarbonyl group, i-butoxycarbonyl group, t- Butoxycarbonyl group, n-pentyloxycarbonyl group, n-hexyloxycarbonyl group, vinyloxycarbonyl group, cyclopropylmethyloxycarbonyl group, 2-cyclopentylethyloxycarbonyl group, phenoxycarbonyl group, pyridyloxycarbonyl group, benzyloxycarbonyl And 2-pyridylmethyloxycarbonyl group.
  • R 21 has the same meaning as described above. Note that two R 21 may be the same or different.
  • Examples of the group represented by the formula: CON (R 21 ) 2 include mono-C1-6 alkylcarbamoyl groups such as carbamoyl group, methylcarbamoyl group, ethylcarbamoyl group; vinylcarbamoyl group, 1-propenylcarbamoyl group, 1- Mono-C2-6 alkenylcarbamoyl groups such as hexenylcarbamoyl group; mono-C2-6 alkynylcarbamoyl groups such as ethynylcarbamoyl group, propynylcarbamoyl group, propargylcarbamoyl group; mono- such as cyclopropylcarbamoyl group, cyclobutylcarbamoyl group, cyclohexylcarbamoyl group C3-8 cycloalkylcarbamoyl group; mono C4-8 cycloalkenylcarbam
  • R 2 is preferably a hydrogen atom.
  • a 1 in the formula (1) is an oxygen atom, a sulfur atom, or a group represented by the formula: NR 3 .
  • R 3 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group Is a heteroaryl group having Of these, A 1 is preferably an oxygen atom.
  • a 2 in the formula (1) is an oxygen atom, a group represented by the formula: NR 4 , or a group represented by the formula: CR 5 R 6 .
  • R 4 represents a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, a group represented by the formula: COR 21 , a group represented by the formula: CO 2 R 22 , or a formula: CON ( R 21 ) is a group represented by 2 .
  • R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, or a halogen atom. Of these, A 2 is preferably an oxygen atom.
  • [J] J in Formula (1) is an oxygen atom or a sulfur atom.
  • [X] X in formula (1) is an unsubstituted or substituted C1-6 alkyl group, formula: a group represented by OR 23 , formula: a group represented by SR 23 , formula: N (R 23 ) 2 is a group represented by 2 , a cyano group, a nitro group, or a halogen atom.
  • the subscript n of X represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
  • R 23 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group A heteroaryl group having the formula: COR 21 , Formula: CO 2 R 22 , or Formula: CON (R 21 ) 2 .
  • OR 23 examples include methoxy, ethoxy, n-propoxy, n-butoxy, n-pentyloxy, n-hexyloxy, i-propoxy, and i-butoxy.
  • a carbamoylsulfanyl group a mono-carbamoylsulfanyl group such as a carbamoylsulfanyl group, a methylcarbamoylsulfanyl group, an ethylcarbamoylsulfanyl group, a dimethylcarbamoylsulfanyl group, a diethylcarbamoylsulfanyl group, or a phenylcarbamoylsulfanyl group; it can.
  • N (R 23 ) 2 examples include mono C1-6 alkylamino groups such as a methylamino group, an ethylmethyl group, and an n-hexylamino group; a vinylamino group, a 1-propenylamino group Mono-C2-6 alkenylamino groups such as 1-hexenylamino group; mono-C2-6 alkynylamino groups such as ethynylamino group, propynylamino group, propargylamino group; cyclopropylamino group, cyclobutylamino group, cyclohexylamino group Mono C3-8 cycloalkylamino groups such as: mono C4-8 cycloalkenylamino groups such as cyclobut-2-enylamino group, cyclohex-2-enylamino group; mono C6-10 such as phenylamino group, 1-naphthyla
  • C1-7 acylamino group C1-7 carboxyamino group such as methoxycarbonylamino group, ethoxycarbonylamino group, t-butoxycarbonylamino group, vinyloxycarbonylamino group, phenoxycarbonylamino group, pyridyloxycarbonylamino group; carbamoylamino Group, methylcarbamoylamino group, ethylcarbamoylamino group, dimethylcarbamoylamino group, diethylcarbamoylamino group, phenylcarbamoylamino group, monosubstituted carbamoylamino group or disubstituted Moiruamino group or the like;
  • Dimethylamino group diethylmethyl group, methyl-vinyl-amino group, methyl-ethynyl-amino group, methyl-cyclopropyl-amino group, methyl-cyclobut-2-enyl-amino group, methyl-phenyl-amino group, methyl- Disubstituted amino groups such as pyridin-2-yl-amino group, methyl-acetyl-amino group, methyl-methoxycarbonyl-amino group; amino groups in which nitrogen atoms such as methylideneamino group and ethylideneamino group are bonded to the same carbon atom Etc.
  • X is preferably an unsubstituted or substituted C1-6 alkyl group or a halogen atom.
  • a suitable group that can be a substituent is a halogen atom.
  • B 1 to B 4 are each independently a nitrogen atom or a carbon atom. However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
  • B 1 to B 4 are not all nitrogen atoms.
  • structures of the formulas (A-1) to (A-6) structures below the double and X is omitted). Things can be mentioned.
  • the structure represented by the formula (A-1) is a structure in which B 1 , B 2 , B 3 , and B 4 are each composed of a nitrogen atom, a carbon atom, a carbon atom, and a carbon atom.
  • the structure represented by the formula (A-4) is a structure in which B 1 , B 2 , B 3 , and B 4 are each composed of a carbon atom, a carbon atom, a nitrogen atom, and a carbon atom.
  • the structure represented by the formula (A-5) is a structure in which B 1 , B 2 , B 3 , and B 4 are each composed of a carbon atom, a carbon atom, a carbon atom, and a nitrogen atom. Of these structures, the structure of the formula (A-1) is preferable.
  • [D] D is any group represented by the formulas (2) to (6).
  • the carbon nitrogen double bond in the formula (2) represents any of geometric isomers (E / Z isomers) or a mixture thereof.
  • Each of the two carbon nitrogen double bonds in the formula (3) represents one of geometric isomers (E / Z isomer) or a mixture thereof.
  • the carbon nitrogen double bond in the formula (6) represents any of geometric isomers (E / Z isomers) or a mixture thereof.
  • Q 1 represents an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted group. Having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 aryl group An unsubstituted or substituted heteroaryl group, an unsubstituted or substituted aralkyl group, an unsubstituted or substituted heteroaralkyl group, or a trisubstituted silyl group. Examples of the tri-substituted silyl group include trimethylsilyl group, triethylsilyl group, tricyclopropylsilyl group, t-butyldimethylsilyl group and the like.
  • Preferred Q 1 in the formula (2) is an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted aralkyl group, or an unsubstituted or substituted heteroaralkyl group.
  • a C6-10 aryl group is an aromatic hydrocarbon group having 6-10 carbon atoms.
  • the C6-10 aryl group may have one ring or two or more rings.
  • the remaining ring may be a saturated alicyclic ring, an unsaturated alicyclic ring, or an aromatic ring.
  • Specific examples include a phenyl group, a naphthyl group, an azulenyl group, an indenyl group, an indanyl group, and the like.
  • 1,2,3,4-tetrahydro-naphthalen-1-yl group 1,2,3,4-tetrahydro-naphthalen-2-yl group, 5,6,7,8-tetrahydro-naphthalene-1- And tetralinyl groups such as an yl group and a 5,6,7,8-tetrahydro-naphthalen-2-yl group.
  • An aralkyl group is a C1-6 alkyl group substituted with a C6-10 aryl group. Specific examples include a benzyl group, a phenethyl group, a 1-naphthylmethyl group, and a 2-naphthylmethyl group.
  • the heteroaryl group is a 5- to 10-membered aryl group containing 1 to 4 heteroatoms selected from a nitrogen atom, an oxygen atom and a sulfur atom in addition to carbon atoms as atoms constituting the ring. In this case, it may be a single ring or a polycyclic ring condensed. Specific examples of the heteroaryl group include the following groups.
  • 5-membered heteroaryl group pyrrolyl group such as pyrrol-1-yl group, pyrrol-2-yl group and pyrrol-3-yl group; Furyl groups such as a furan-2-yl group and a furan-3-yl group; Thienyl groups such as a thiophen-2-yl group and a thiophen-3-yl group; Imidazolyl groups such as imidazol-1-yl group, imidazol-2-yl group, imidazol-4-yl group, imidazol-5-yl group; Pyrazolyl groups such as a pyrazol-1-yl group, a pyrazol-3-yl group, a pyrazol-4-yl group, a pyrazol-5-yl group; An oxazolyl group such as an oxazol-2-yl group, an oxazol-4-yl group, an oxazol-5-yl group; Isoxazo
  • pyridyl groups such as a 6-membered heteroaryl group pyridin-2-yl group, pyridin-3-yl group and pyridin-4-yl group; Pyrazinyl groups such as a pyrazin-2-yl group and a pyrazin-3-yl group; Pyrimidyl groups such as a pyrimidin-2-yl group, a pyrimidin-4-yl group, and a pyrimidin-5-yl group; Pyridazinyl groups such as a pyridazin-3-yl group and a pyridazin-4-yl group; A triazinyl group;
  • the heteroaralkyl group is a C1-6 alkyl group substituted with a heteroaryl group.
  • the C1-6 alkyl group substituted with a heteroaryl group is a C1-6 alkyl group substituted with a 5-membered nitrogen-containing heteroaryl group, or a C1-6 substituted with a 6-membered nitrogen-containing heteroaryl group.
  • Alkyl groups are preferred. Specifically, pyridyl C1-6 alkyl groups such as pyridin-2-ylmethyl group, pyridin-3-ylmethyl group, pyridin-4-ylmethyl group; pyrazol-1-ylmethyl group, pyrazol-3-ylmethyl group, pyrazole- And a pyrazolyl C1-6 alkyl group of a 4-ylmethyl group.
  • a suitable group that can be a substituent of the aralkyl group or heteroaralkyl group is a C1-6 alkyl group, a halogen-substituted C1-6 alkyl group, or a halogen atom.
  • Preferred Q 1 in the formula (3) is an unsubstituted or substituted C6-10 aryl group or an unsubstituted or substituted heteroaryl group. Specific examples include an unsubstituted or substituted phenyl group, an unsubstituted or substituted pyridyl group, and the like.
  • a preferred group that can be a substituent of the aryl group or heteroaryl group is a halogen atom.
  • Preferred Q 1 in the formula (4) is an unsubstituted or substituted C1-6 alkyl group.
  • Preferred Q 1 in formula (5) is an aralkyl group which is unsubstituted or has a substituent (particularly preferably a C6-10 aryl-substituted C1-6 alkyl group which is unsubstituted or has a substituent) or an unsubstituted or substituted A heteroaralkyl group having a group (particularly preferably, an unsubstituted or substituted heteroaryl-substituted C1-6 alkyl group). Specific examples include an unsubstituted or substituted benzyl group, an unsubstituted or substituted pyridylmethyl group, and the like.
  • a preferred group that can be a substituent of the aralkyl group or heteroaralkyl group is a C1-6 alkyl group, a halogen-substituted C1-6 alkyl group, or a halogen atom.
  • R 7 in formula (2), formula (3), and formula (6) is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl Group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or A C6-10 aryl group having a substituent, or an unsubstituted or substituted heteroaryl group.
  • Preferred R 7 is a C1-6 alkyl group.
  • each R 8 independently represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted.
  • R 8 may further be bonded to a carbon atom on Q 1 or a nitrogen atom.
  • Preferred R 8 is a C1-6 alkyl group.
  • Q 41 is a C6-10 aryl group or heteroaryl group.
  • Q 1 and / or Q 2 may be substituted as shown in Formula (5).
  • Preferred Q 41 is a phenyl group or a 5-membered heteroaryl group.
  • a preferred 5-membered heteroaryl group is a 5-membered nitrogen-containing heteroaryl group.
  • pyrazolyl groups such as pyrazol-1-yl group, pyrazol-3-yl group, pyrazol-4-yl group; thiazol-2-yl group, thiazol-4-yl group, thiazol-5-yl group And the like.
  • Q 2 in the formula (5) is a group represented by the formula: OR 23 , a group represented by the formula: SR 23 , a group represented by the formula: N (R 23 ) 2 , a formula: COR 21
  • Group represented by the formula: CO 2 R 22 group represented by the formula: CON (R 21 ) 2
  • group represented by the formula: SO 2 R 22 cyano group, nitro group, or halogen Is an atom.
  • Examples of the group represented by the formula: SO 2 R 22 include a methanesulfonyl group, an ethanesulfonyl group, and a benzenesulfonyl group.
  • m1 represents the number of Q 1 and is an integer from 0 to 7.
  • m2 represents the number of Q 2, is any integer of 0-7. However, the sum of m1 and m2 is 7 or less.
  • Q 1 each other may be the same or different.
  • Q 2 to each other may be the same or different.
  • Q 1 , Q 2 , or Q 1 and Q 2 that are adjacently substituted on Q 41 may be bonded to each other to form a 5- to 8-membered ring.
  • the 5- to 8-membered ring include an aliphatic hydrocarbon ring and an unsaturated heterocyclic ring.
  • Examples of the aliphatic hydrocarbon ring include a cycloalkene ring, and examples of the cycloalkene ring include a cyclopentene ring, a cyclohexene ring, a cycloheptene ring, and a cyclooctene ring.
  • Examples of the unsaturated heterocycle include a dihydro-2H-pyran ring, a dihydro-2H-thiopyran ring, and a tetrahydropyridine ring.
  • the nitrogen-containing heteroaryl derivative of the present invention is preferably a compound represented by the formula (7). More preferably, it is a compound represented by Formula (8).
  • the present invention includes a salt of nitrogen-containing heteroaryl derivative represented by the formula (1) and N-oxide.
  • Nitrogen-containing heteroaryl derivatives, salts of nitrogen-containing heteroaryl derivatives and N-oxides are sometimes collectively referred to as “the present compound”.
  • the salt is not particularly limited as long as it is an agricultural and horticulturally acceptable salt. Examples thereof include salts of inorganic acids such as hydrochloric acid and sulfuric acid; salts of organic acids such as acetic acid and lactic acid.
  • Examples of N-oxides include compounds in which any nitrogen in the partial structures represented by the above formulas (A-1) to (A-6) is oxidized.
  • R 1 , R 2 , R 7 , A 1 , A 2 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above.
  • the amount of compound (B-1) to be used is generally 0.5 to 2 mol, preferably 0.7 to 1.5 mol, per 1 mol of compound (B-2). Although this reaction can be performed in the absence of a catalyst, it is preferably performed in the presence of an acid catalyst or a base catalyst, and more preferably in the presence of an acid catalyst.
  • the acid catalyst examples include trifluoroacetic acid, benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, methanesulfonic acid, pyridinium p-toluenesulfonate, hydrochloric acid, sulfuric acid, and the like.
  • the base catalyst examples include pyridine, triethylamine, potassium hydroxide and the like.
  • the amount of the catalyst to be used is generally 0.0001-1 mol per 1 mol of compound (B-2).
  • a dehydrating agent such as anhydrous sodium sulfate or molecular sieve may be added to the reaction system.
  • This reaction can be carried out in a solvent.
  • the solvent is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane
  • Solvent Halogenated hydrocarbon solvent such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane
  • Amide solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone
  • nitrile solvents such as acetonitrile and benzonitrile
  • alcohol solvents such as methanol, ethanol and n-propanol
  • mixed solvents composed of two or more of these solvents
  • the reaction temperature is a temperature range from room temperature to the boiling point of the solvent used.
  • the reaction time is usually several minutes to several tens of hours depending on the reaction scale.
  • Compound (B-2) can be produced according to a conventionally known method for producing an oxyamine compound. For example, as shown below, the compound represented by the formula (B-2-1) is reacted with carbon tetrabromide and triphenylphosphine to obtain the compound represented by the formula (B-2-2). . This is reacted with Nt-butoxycarbonylhydroxylamine in the presence of a base to give an oxyamine compound represented by the formula (B-2-3) (hereinafter referred to as “compound (B-2-3)”). There are things.) Compound (B-2) can be obtained by reacting this with an acid.
  • compound (B-1: (A 2 ⁇ O)) is, for example, It can be produced by reaction.
  • R 1 , R 2 , R 7 , A 1 , J, X, n, and B 1 to B 4 have the same meanings as described above.
  • E 6 is a fluorine atom or a chlorine atom.
  • a dihalogeno compound represented by the formula (C-1) (hereinafter sometimes referred to as “compound (C-1)”) is added to the compound represented by the formula (C-2) in the presence of a base (
  • compound (C-2) the hydroxycarbamic acid compound represented by formula (C-3) (hereinafter referred to as “compound (C-3)”).
  • compound (C-3) the hydroxycarbamic acid compound represented by formula (C-3)
  • compound (C-3) hereinafter referred to as “compound (C-3)”.
  • the target compound (B-1: (A 2 ⁇ O)) can be obtained.
  • the amount of compound (C-2) used for the reaction with compound (C-1) is usually 0.8 to 5 mol, preferably 1 to 3 mol, relative to 1 mol of compound (C-1). .
  • Examples of the base used for the reaction between the compound (C-1) and the compound (C-2) include metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide and calcium hydroxide; sodium methoxy Metal alkoxides such as sodium ethoxide, potassium methoxide, potassium ethoxide, potassium t-butoxide; metal hydrides such as sodium hydride, potassium hydride, calcium hydride; triethylamine, diisopropylethylamine, pyridine, 1,8 And organic bases such as diazabicyclo [5.4.0] undec-7-ene (DBU) and 1,4-diazabicyclo [2.2.2] octane.
  • the amount of the base used for the reaction between the compound (C-1) and the compound (C-2) is usually 1 to 20 mol with respect to 1 mol of the compound (C-1).
  • the reaction of compound (C-1) and compound (C-2) can be carried out in an organic solvent.
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • n-pentane n- Aliphatic hydrocarbon solvents such as hexane and n-heptane
  • amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide and N-methylpyrrolidone
  • nitrile solvents such as acetonitrile and benzonitrile
  • the amount of the organic solvent to be used is not particularly limited, but is usually
  • Examples of the compound (C-4) used for the reaction with the compound (C-3) include N, N-dimethylacetamide, N, N-dimethylpropionamide and the like.
  • the amount of compound (C-4) to be used is generally 0.8 to 5 mol, preferably 1 to 3 mol, per 1 mol of compound (C-3).
  • Examples of the base used in the reaction between the compound (C-3) and the compound (C-4) include organolithium compounds such as n-butyllithium, sec-butyllithium, t-butyllithium, and lithium diisopropylamide; sodium metal, metal Examples thereof include alkali metals such as potassium; metal hydrides such as sodium hydride, potassium hydride and calcium hydride;
  • the amount of the base used for the reaction between the compound (C-3) and the compound (C-4) is usually 1 to 20 mol with respect to 1 mol of the compound (C-3).
  • the reaction of compound (C-3) and compound (C-4) can be carried out in an organic solvent.
  • the solvent used is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent; and the like.
  • R 1 is a t-butyl group
  • R 2 is a hydrogen atom
  • a 1 and J are oxygen atoms
  • compound (B -1-1: (A 2 ⁇ O)) can be obtained by converting R 1 by the method shown below.
  • the following formula shows a reaction in which a t-butyl group is converted to another group R 1 ′ .
  • R 1 ′ is R 1 excluding the t-butyl group.
  • an acid is allowed to act on the compound, whereby a compound represented by the formula (B-1-4: (A 2 ⁇ O)) (hereinafter referred to as “compound (B-1-4: (A 2 ⁇ O))”) Can be obtained.)
  • Examples of the base used for the reaction of the compound (B-1-1: (A 2 ⁇ O)) and the ester compound (B-1-2) include lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, Metal hydroxide such as calcium hydroxide; metal alkoxide such as sodium methoxide, sodium ethoxide, potassium methoxide, potassium ethoxide, potassium t-butoxide; metal hydrogen such as sodium hydride, potassium hydride, calcium hydride
  • Organic bases such as triethylamine, diisopropylethylamine, pyridine, 1,8-diazabicyclo [5.4.0] undec-7-ene (DBU), 1,4-diazabicyclo [2.2.2] octane; be able to.
  • the amount of the base to be used is generally 1 to 20 mol per 1 mol of compound (B-1-1: (A 2 ⁇ O)).
  • the reaction of the compound (B-1-1: (A 2 ⁇ O)) and the ester compound (B-1-2) is performed in an organic solvent.
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane
  • sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • Aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbon solvents such as n-pentane, n-hexane and n-heptane
  • Amide solvents such as N-methylpyrrolidone
  • the amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the compound (B-1-1: (A 2 ⁇ O)).
  • the reaction proceeds smoothly in a temperature range from ⁇ 20 ° C. to the boiling point of the solvent used.
  • the reaction time depends on the reaction scale, it is usually from several minutes to several tens of hours.
  • Examples of the acid used in the reaction for converting the compound (B-1-3: (A 2 ⁇ O)) into the compound (B-1-4: (A 2 ⁇ O)) include inorganic substances such as hydrochloric acid, sulfuric acid, and nitric acid.
  • Examples of the acid include acetic acid, trifluoroacetic acid, methanesulfonic acid, and p-toluenesulfonic acid.
  • the amount of the acid to be used is generally 1 to 20 mol per 1 mol of compound (B-1-3: (A 2 ⁇ O)).
  • This reaction is performed in an organic solvent.
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • Examples of the solvent that can be used in the reaction of the compound (B-1-1: (A 2 ⁇ O)) and the ester compound (B-1-2) are the same as those listed.
  • the reaction for converting the compound (B-1-3: (A 2 ⁇ O)) to the compound (B-1-4: (A 2 ⁇ O)) is performed at a temperature range from ⁇ 20 ° C. to the boiling point of the solvent used. Proceed smoothly. Although the reaction time depends on the reaction scale, it is usually from several minutes to several tens of hours.
  • D in Formula (1) is Formula (3) a)
  • the compound represented by formula (B-6) (hereinafter sometimes referred to as “compound (B-6)”) is: For example, it can be produced by reacting a hydrazine compound represented by formula (B-5) (hereinafter sometimes referred to as “compound (B-5)”) with compound (B-1). it can.
  • the amount of compound (B-1) to be used is generally 0.5 to 2 mol, preferably 0.7 to 1.5 mol, per 1 mol of compound (B-5).
  • R 1 , R 2 , R 7 , R 8 , A 1 , A 2 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above.
  • the reaction between the compound (B-1) and the compound (B-5) is preferably performed in the presence of an acid catalyst or a base catalyst, and more preferably performed in the presence of an acid catalyst.
  • the acid catalyst used include benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, methanesulfonic acid, pyridinium p-toluenesulfonate, hydrochloric acid, sulfuric acid and the like.
  • the base catalyst include pyridine, triethylamine, potassium hydroxide and the like.
  • the amount of the catalyst to be used is generally 0.0001-1 mol per 1 mol of compound (B-5).
  • a dehydrating agent such as anhydrous sodium sulfate may be added to the reaction system.
  • This reaction can be carried out in a solvent.
  • the solvent used is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane
  • Solvent Halogenated hydrocarbon solvent such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane
  • Amide solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone
  • nitrile solvents such as acetonitrile and benzonitrile
  • alcohol solvents such as methanol, ethanol and n-propanol
  • the amount of the solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (B-5).
  • the reaction temperature is a temperature range from room temperature to the boiling point of the solvent used.
  • the reaction time is usually several minutes to several tens of hours.
  • Compound (B-5) is obtained, for example, by reacting a ketone compound represented by formula (B-5-1) with hydrazine (or hydrazine monohydrate) as shown below. be able to.
  • R 1 , R 2 , A 1 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above.
  • E 6 is a fluorine atom or a chlorine atom.
  • Compound (D-1) includes, for example, compound (C-1) and an acetylene compound represented by formula (D-1-1) (hereinafter referred to as “acetylene compound (D-1)” as shown below. -1) ").) Can be obtained.
  • the amount of the acetylene compound (D-1-1) to be used is generally 1 to 2 mol per 1 mol of the compound (C-1).
  • E 6 represents a fluorine atom or a chlorine atom.
  • This reaction is a coupling reaction called the Sonogashira reaction.
  • a Pd complex is usually used for this reaction.
  • the Pd complex include palladium (II) acetate, dichlorobis (triphenylphosphine) palladium (II), tetrakis (triphenylphosphine) palladium (0), tris (dibenzylideneacetone) dipalladium (0), and the like.
  • the amount of the Pd complex to be used is generally 0.01-0.5 mol per 1 mol of compound (C-1).
  • copper halide is further used as a catalyst.
  • the copper halide include monovalent copper halides such as cuprous fluoride, cuprous chloride, cuprous bromide, cuprous iodide, cupric chloride, cupric bromide, Examples thereof include divalent copper halides such as cupric iodide.
  • the amount of copper halide to be used is generally 0.1-1 mol per 1 mol of compound (C-1).
  • a base is further used.
  • the base include sodium hydroxide, potassium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, potassium hydrogen carbonate, sodium hydrogen carbonate, cesium carbonate, potassium phosphate and other inorganic bases, or triethylamine, pyridine, Examples include amines such as piperidine.
  • the amount of the base to be used is generally 1 to 10 mol per 1 mol of compound (C-1).
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvents
  • Amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone
  • Nitrile solvents such as acetonitrile and benzonitrile
  • the amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (C-1).
  • the reaction temperature should be a temperature sufficient to complete the coupling reaction, and is usually room temperature to 100 ° C.
  • the reaction time is usually several minutes to several tens of hours.
  • the reaction is preferably carried out in an inert gas atmosphere.
  • R 1 , R 2 , A 1 , J, X, n, B 1 to B 4 , Q 41 , Q 1 , m 1, Q 2 , and m 2 have the same meanings as described above.
  • E 6 represents , Fluorine atom or chlorine atom.
  • the compound (E-1) is obtained by adding a boronic acid compound represented by the formula (E-1-1) to the compound (C-1) (hereinafter referred to as “boronic acid compound (E -1-1) ”.
  • the amount of the boronic acid compound (E-1-1) used is usually 1 with respect to 1 mol of the compound (C-1). ⁇ 2 moles.
  • E 6 is a fluorine atom or a chlorine atom.
  • the reaction between the compound (C-1) and the boronic acid compound (E-1-1) is a coupling reaction called the Suzuki-Miyaura reaction.
  • a Pd catalyst is used for this reaction.
  • the Pd catalyst used in the reaction include tetrakis (triphenylphosphine) palladium (0), bis (triphenylphosphine) palladium dichloride (II), “1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris ( Pd catalysts such as dibenzylideneacetone) dipalladium (0), palladium (II) acetate, palladium chloride, palladium carbon and the like can be mentioned.
  • the amount of the Pd catalyst to be used is generally 0.01-0.5 mol per 1 mol of compound (C-1).
  • a base is further used.
  • the base include hydrated or non-aqueous bases such as sodium carbonate, potassium carbonate, sodium hydroxide and cesium fluoride.
  • the amount of the base to be used is generally 1 to 10 mol per 1 mol of compound (C-1).
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvents
  • Amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone
  • Nitrile solvents such as acetonitrile and benzonitrile
  • the amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (C-1).
  • the reaction temperature should be a temperature that is sufficient to complete the coupling reaction, and is room temperature to 150 ° C.
  • the reaction time is usually several minutes to several tens of hours.
  • the reaction is preferably carried out in an inert gas atmosphere.
  • R 1 , R 2 , R 7 , R 8 , A 1 , A 2 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above.
  • the amount of compound (B-14) to be used is generally 0.5 to 2 mol, preferably 0.7 to 1.5 mol, per 1 mol of compound (F-1). Although this reaction can be performed in the absence of a catalyst, it is preferably performed in the presence of an acid catalyst or a base catalyst, and more preferably in the presence of an acid catalyst.
  • the acid catalyst examples include trifluoroacetic acid, benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, methanesulfonic acid, pyridinium p-toluenesulfonate, hydrochloric acid, sulfuric acid, and the like.
  • the base catalyst examples include pyridine, triethylamine, potassium hydroxide and the like.
  • the amount of the catalyst to be used is generally 0.0001-1 mol per 1 mol of compound (F-1).
  • a dehydrating agent such as anhydrous sodium sulfate or molecular sieve may be added to the reaction system.
  • This reaction can be carried out in a solvent.
  • the solvent is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane
  • Solvent Halogenated hydrocarbon solvent such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane
  • Amide solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone
  • nitrile solvents such as acetonitrile and benzonitrile
  • alcohol solvents such as methanol, ethanol and n-propanol
  • mixed solvents composed of two or more of these solvents
  • the reaction temperature is a temperature range from room temperature to the boiling point of the solvent used.
  • the reaction time is usually several minutes to several tens of hours depending on the reaction scale.
  • compound (B-14: (A 2 ⁇ O)) is, for example, It can be produced by reaction.
  • R 1 , R 2 , R 7 , A 1 , J, X, n, and B 1 to B 4 have the same meaning as above.
  • E 7 is a chlorine atom or a bromine atom.
  • the compound (B-1: (A 2 ⁇ O)) is reduced to a hydroxyl group using a known hydride reducing agent, and then halogenated using a halogenating agent.
  • a compound represented by the formula (B-14-1: (A 2 ⁇ O)) (hereinafter sometimes referred to as “compound (B-14-1: (A 2 ⁇ O))”) can be obtained. it can.
  • Examples of the hydride reducing agent used in the reduction reaction include sodium borohydride, sodium cyanoborohydride, lithium triethylborohydride, lithium tri (sec-butyl) borohydride, potassium tri (sec-butyl) borohydride, hydrogen Examples thereof include lithium borohydride, zinc borohydride, sodium acetoxyborohydride, lithium aluminum hydride, sodium bis (2-methoxyethoxy) aluminum hydride, and the like.
  • the amount of the hydride reducing agent used for the reduction reaction is usually 0.25 to 2 mol per 1 mol of the compound (B-1: (A 2 ⁇ O)).
  • the reduction reaction can be performed in an organic solvent.
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent
  • a mixed solvent composed of two or more of these solvents and the like.
  • the amount of the organic solvent used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the raw material.
  • the reduction reaction proceeds smoothly in the temperature range from ⁇ 20 ° C. to the boiling point of the solvent used.
  • halogenating agent used in the halogenation reaction examples include oxalyl halide, thionyl halide, a mixed reagent of carbon tetrabromide and triphenylphosphine;
  • the amount of the halogenating agent used in the halogenation reaction is usually 0.8 to 5 mol, preferably 1 to 3 mol, relative to 1 mol of the raw material.
  • the halogenation reaction can be performed in an organic solvent.
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent
  • the amount of the organic solvent used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the raw material.
  • the halogenation reaction proceeds smoothly in a temperature range from room temperature to the boiling point of the solvent used.
  • Examples of the base used in the reaction include alkali metals such as metal sodium and metal potassium; metal hydrides such as sodium hydride, potassium hydride and calcium hydride;
  • the amount of N-hydroxyphthalimide to be used is usually 1 to 5 mol with respect to 1 mol of the compound (B-14-1: (A 2 ⁇ O)).
  • the amount of the base used is usually 1 to 20 mol with respect to 1 mol of the compound (B-14-1: (A 2 ⁇ O)).
  • the reaction of the compound (B-14-1: (A 2 ⁇ O)) and N-hydroxyphthalimide can be carried out in an organic solvent.
  • the solvent used is not particularly limited as long as it is inert to the reaction.
  • halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane
  • sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • Aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbon solvents such as n-pentane, n-hexane and n-heptane
  • Amide solvents such as N-methylpyrrolidone
  • the amount of hydrazine to be used is usually 1 to 10 mol per 1 mol of compound (B-14-2: (A 2 ⁇ O)).
  • the deprotection reaction of compound (B-14-2: (A 2 ⁇ O)) is carried out in an organic solvent.
  • the organic solvent to be used is not particularly limited as long as it is inert to the reaction.
  • halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane
  • sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide
  • ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran
  • Aromatic hydrocarbon solvents such as toluene, benzene and xylene
  • aliphatic hydrocarbon solvents such as n-pentane, n-hexane and n-heptane
  • Amide solvents such as N-methylpyrrolidone
  • the amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the compound (B-14-2: (A 2 ⁇ O)).
  • the reaction proceeds smoothly in a temperature range from ⁇ 20 ° C. to the boiling point of the solvent used.
  • the reaction time depends on the reaction scale, it is usually from several minutes to several tens of hours.
  • the nitrogen-containing heteroaryl derivative of the present invention obtained by the above production method can be further converted into a salt.
  • the salt is not particularly limited as long as it is an agricultural and horticulturally acceptable salt.
  • salts of inorganic acids such as hydrochloric acid and sulfuric acid
  • salts of organic acids such as acetic acid and lactic acid
  • These salts can be produced by a conventionally known method using an acid corresponding to the compound of the present invention.
  • the desired product can be isolated by purifying by a conventional post-treatment operation and, if desired, known and conventional purification means such as distillation, recrystallization, column chromatography and the like.
  • known and conventional purification means such as distillation, recrystallization, column chromatography and the like.
  • the structure of the target product can be identified and confirmed by known analytical means such as IR spectrum, NMR spectrum, mass spectrum, and elemental analysis.
  • geometric isomers based on carbon-nitrogen double bonds may exist, and all of these isomers are included in the present invention.
  • the nitrogen-containing heteroaryl derivative represented by the formula (9) is a compound represented by the above formula (1), wherein D represents a compound represented by the formula (2) or the formula (3).
  • R 1 , R 2 , A 1 , A 2 , J, X, n, and R 7 have the same meaning as described above.
  • the production intermediate is preferably a compound represented by the formula (10).
  • the nitrogen-containing heteroaryl derivative represented by the formula (11) is a compound represented by the above formula (1), wherein D is a production intermediate useful for the production of the compound represented by the formula (6) It is.
  • R 1 , R 2 , A 1 , A 2 , J, X, n, and R 7 have the same meaning as described above.
  • R 9 are each independently hydrogen atom or the formula,: COR 21 (wherein, R 21 is as defined above.) Is a group represented by.
  • R 9 may be the same or different.
  • R 9 may be together. Examples of R 9 include formyl group, acetyl group, methoxycarbonyl group and the like. Examples of R 9 taken together include a phthaloyl group.
  • the production intermediate is preferably a compound represented by the formula (12).
  • the agricultural and horticultural fungicide of the present invention contains at least one of a nitrogen-containing heteroaryl derivative represented by the above formula (1), a salt thereof, or an N-oxide thereof as an active ingredient. It is an agricultural and horticultural fungicide (hereinafter sometimes referred to as “the present invention fungicide”).
  • the fungicide of the present invention is used for a wide variety of fungi, for example, bacteria belonging to algae (Oomycetes), Ascomycetes, Deuteromycetes, and basidiomycetes. Excellent sterilizing power.
  • the disinfectant of the present invention can be used by seed treatment, foliage application, soil application, water application, etc., for the control of various diseases that occur during cultivation of agricultural and horticultural crops including flowers, turf, and grass.
  • Sugar beet brown spot (Cercospora beticola) Black root disease (Aphanomyces cochlloides) Root rot (Thanatephorus cucumeris) Leaf rot (Thanatephorus cucumeris) Peanut Brown Spot (Mycosphaerella arachidis) Black astringency (Mycosphaerella berkeleyi) Cucumber powdery mildew (Sphaerotheca fuliginea) Downy mildew (Pseudoperonospora cubensis) Vine Blight (Mycosphaerella melonis) Vine split disease (Fusarium oxysporum) Sclerotinia sclerotiorum Gray mold (Botrytis cinerea) Anthracnose (Colletotrichum orbiculare) Black star disease (Cladosporium cucumerinum) Brown spot disease (Corynespora cassicola) Seedling blight (Pythium debaryanam, Rhizo
  • Tomato gray mold (Botrytis cinerea) Leaf mold (Cladosporium fulvum) Plague (Phytophthora infestans) Eggplant gray mold (Botrytis cinerea) Black blight (Corynespora melongenae) Powdery mildew (Erysiphe cichoracearum) Susmolder disease (Mycovellosiella nattrassii) Strawberry Gray mold disease (Botrytis cinerea) Powdery mildew (Sohaerotheca humuli) Anthracnose (Colletotrichum acutatum, Colletotrichum fragariae) Plague (Phytophthora cactorum) Onion Gray rot (Botrytis allii) Gray mold (Botrytis cinerea) Botrytis squamosa Downy mildew (Peronospora destructor) Cabbage root-knot disease (Plasmodiophora brassicae) Soft rot (Erwini
  • Apple powdery mildew (Podosphaera leucotricha) Black star disease (Venturia inaequalis) Monilinia mali Sunspot disease (Mycosphaerella pomi) Rot (Valsa mali) Spotted leaf fall (Alternaria mali) Red Star Disease (Gymnosporangium yamadae) Ring-shaped disease (Botryosphaeria berengeriana) Anthracnose (Glomerella cingulata, Colletotrichum acutatum) Brown spot disease (Diplocarpon mali) Soot spot disease (Zygophiala jamaicensis) Soot spot (Gloeodes pomigena) Oyster powdery mildew (Phyllactinia kakicola) Anthracnose (Gloeosporium kaki) Spotted leaf disease (Cercospora kaki) Peach (Assassin Disease) (Monilinia fructicola) Black star disease (C
  • this fungicide has an excellent bactericidal effect against various resistant bacteria.
  • resistant bacteria include, for example, gray mold fungus (Botrytis cinerea), sugar beet brown fungus (Cercospora beticola), apple black rot (Venturia inaequalis), Examples include Venturia nashicola; Botrytis cinerea which is resistant to dicarboximide fungicides such as vinclozolin, procymidone and iprodione.
  • More preferable diseases to which the fungicide of the present invention is applied include sugar beet brown spot, wheat powdery mildew, rice blast, apple scab, cucumber gray mold, peanut brown etc. it can.
  • the fungicide of the present invention is a highly safe drug with little phytotoxicity, low toxicity to fish and warm-blooded animals.
  • the fungicide of the present invention When actually applying the fungicide of the present invention, it can be used without particularly adding other components to the compound of the present invention, and forms that can be taken by general agricultural chemicals, that is, wettable powder, granules, powders, It can also be used in the form of an emulsion, aqueous solvent, suspension, granule wettable powder or the like.
  • Additives and carriers used in formulation into solid dosage forms include vegetable powders such as soybean flour and wheat flour, mineral fine powders such as diatomaceous earth, apatite, gypsum, talc, bentonite, pyrophyllite and clay And organic and inorganic compounds such as sodium benzoate, urea, and sodium sulfate.
  • Solvents used in formulating liquid dosage forms include kerosene, xylene and petroleum-based aromatic hydrocarbons, cyclohexane, cyclohexanone, dimethylformamide, dimethyl sulfoxide, alcohol, acetone, trichloroethylene, methyl isobutyl ketone, mineral oil , Vegetable oil, water and the like.
  • a surfactant can be added as necessary.
  • the surfactant that can be added is not particularly limited.
  • alkyl phenyl ether added with polyoxyethylene alkyl ether added with polyoxyethylene, higher fatty acid ester added with polyoxyethylene, sorbitan higher fatty acid ester added with polyoxyethylene, tristyryl added with polyoxyethylene
  • Nonionic surfactants such as phenyl ether, sulfates of alkylphenyl ethers added with polyoxyethylene, alkylbenzene sulfonates, sulfates of higher alcohols, alkylnaphthalene sulfonates, polycarboxylates, lignin sulfones Acid salt, formaldehyde condensate of alkyl naphthalene sulfonate, isobutylene-maleic anhydride copolymer, and the like.
  • the wettable powder, emulsion, flowable powder, aqueous solvent, and granular wettable powder thus obtained are diluted with water to a predetermined concentration to obtain a solution, suspension or emulsion.
  • Granules can be sprayed on plants as they are.
  • the amount of the active ingredient in the fungicide of the present invention is usually preferably 0.01 to 90% by weight, more preferably 0.05 to 85% by weight, based on the entire composition (formulation).
  • the application amount of the fungicide of the present invention varies depending on weather conditions, formulation form, application time, application method, application place, disease to be controlled, target crop, etc., but is usually 1 to 1000 g in terms of the amount of active ingredient compound per hectare. It is preferably 10 to 100 g.
  • the applied concentration is 1 to 1000 ppm, preferably 10 to 250 ppm.
  • one or two or more of various fungicides, insecticides, acaricides and the like can be mixed with the fungicides of the present invention.
  • fungicides insecticides / acaricides, nematicides, soil pesticides and plant growth regulators that can be used in combination with the compounds of the present invention are shown below.
  • Fungicide 1) benzimidazole series: benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate methyl, etc .; 2) Dicarboximide type: Clozolinate, iprodione, procymidone, vinclozolin and the like; 3) DMI-bactericidal system: imazalyl, oxpoconazole, pefazoate, prochloraz, triflumizole, triphorin, pyrifenox, phenarimol, nuarimol, azaconazole, viteltanol, bromuconazole, cyproconazole, difenoconazole, diniconazole, epoxy Conazole, fenbuconazole, fluquinconazole, flusilazole, flutriaol, hexaconazole, imibenconazole, ipconazole, metconazole, microbutanyl, penconazole, propi
  • Insecticides, acaricides, nematicides, soil insecticides 1) Organic (thio) phosphates: acephate, azamethiphos, azinephosmethyl, chlorpyrifos, chlorpyrifosmethyl, chlorfenvinphos, diazinon, dichlorvos, dicrotophos, dimethoate, disulfotone, ethion, EPN, phenamiphos, fenitrothion, fenthion, isoxathione, metathione, metaxamide, , Methidathion, methylparathion, mevinphos, monocrotophos, oxydemetonmethyl, paraoxon, parathion, phentoate, hosalon, phosmet, phosphamidone, folate, oxime, pirimiphosmethyl, propenophos, prothiophos, sulfophos, tetrachlorbinphos, terbufos
  • Plant growth regulator Abscisic acid, indole butyric acid, uniconazole, etiquelozate, etephone, cloxiphonac, chlormecote, chlorella extract, calcium peroxide, cyanamide, dichlorprop, gibberellin, daminozide, decyl alcohol, trinexapac ethyl, mepicoat chloride, pack Lobutrazole, paraffin wax, piperonyl butoxide, pyraflufenethyl, flurprimidol, prohydrojasmon, prohexadione calcium salt, benzylaminopurine, pendimethalin, forchlorphenuron, potassium maleate hydrazide, 1-naphthyl Acetamide, 4-CPA, MCPB, choline, oxyquinoline sulfate, ethiclozeate, butorualine, 1-methylcyclopropene, abiglycine hydrochloride.
  • Example 3 a) Preparation of 4-chloro-2- (3,3-dimethyl-1-butynyl) -5-methylpyridine 1.05 g of 2-bromo-4-chloro-5-methylpyridine was dissolved in 30 ml of ethyl acetate. To this was added 0.79 g of 3,3-dimethyl-1-butyne, 2.43 g of triethylamine, 0.05 g of copper iodide, and 0.17 g of dichlorobistriphenylphosphine palladium, and the mixture was stirred at 50 ° C. for 2 hours under a nitrogen atmosphere. did. The resulting liquid was filtered through Celite, and then the solvent was distilled off under reduced pressure.
  • Example 4 Production of methyl N- [2- (3,3-dimethyl-1-butynyl) -5-methylpyridin-4-yloxy] carbamate (Compound No. 3-a-1) 0.64 g of t-butyl N- [2- (3,3-dimethyl-1-butynyl) -5-methylpyridin-4-yloxy) carbamate was dissolved in 20 ml of methylene chloride. To this, 0.42 g of triethylamine was added under ice cooling, and then 0.30 g of methyl chloroformate was added dropwise. It stirred for 1 hour after completion
  • Example 5 a) Preparation of 4-chloro-5-methyl-2- (3-trifluoromethoxyphenyl) pyridine 0.61 g of 2-bromo-4-chloro-5-methylpyridine and 3-trifluoromethoxyphenylboronic acid 13 g was dissolved in 20 ml of dimethylformamide. 4 ml of water, 1.12 g of potassium carbonate, and 0.11 g of Pd (dppf) Cl 2 .CH 2 Cl 2 were added thereto, and the mixture was stirred at 60 ° C. for 2 hours under a nitrogen atmosphere. Ethyl acetate was added thereto, and then washed with an aqueous ammonium chloride solution.
  • Example 7 a) Preparation of 4-chloro-5-methylpyridine-2-carbonitrile 1.50 g of 2-bromo-4-chloro-5-methylpyridine was dissolved in 20 ml of DMF. To this, 0.43 g of zinc cyanide and 0.43 g of tetrakistriphenylphosphine palladium were added and stirred at 80 ° C. for 1 hour. Water was added thereto, followed by extraction with ethyl acetate. The obtained organic layer was dried over magnesium sulfate, filtered, and then the solvent was distilled off under reduced pressure.
  • Example 9 Preparation of methyl N- ⁇ 2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy ⁇ -N-acetoxymethylcarbamate (Compound No. 4-a- 19) 0.36 g of methyl N- ⁇ 2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy ⁇ carbamate was dissolved in 15 ml of acetonitrile. To this, 1.22 g of potassium carbonate and 0.20 g of bromomethyl acetate were added and stirred at room temperature for 2 hours.
  • Example 11 Preparation of methyl N- ⁇ 2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridin-4-yloxy ⁇ carbamate (Compound No. 4-a-26 ) 0.24 g of t-butyl N- ⁇ 2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridin-4-yloxy ⁇ carbamate is added to 20 ml of methylene chloride. Dissolved. To this, 0.11 g of triethylamine was added under ice cooling, and then 0.07 g of methyl chloroformate was added dropwise.
  • Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure. 100 ml of methylene chloride was added to the resulting residue, and 15 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of dropping, the mixture was stirred at room temperature for 2 hours. The resulting liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and then extracted with methylene chloride. Magnesium sulfate was added to the resulting methylene chloride layer, dried and filtered, and then the solvent was distilled off under reduced pressure.
  • Examples of compounds Other examples of the nitrogen-containing heteroaryl derivative of the present invention obtained by a method similar to the above production method are shown in Tables 1 to 10 including the compounds obtained in the above Examples. Further, production intermediates are shown in Tables 11 to 14. In the table, Me is a methyl group, Et is an ethyl group, i Pr is an isopropyl group, t Bu is a tertiary butyl group, Ac is an acetyl group, Ph is a phenyl group, and c Pr is cyclopropyl.
  • Table 1 is a compound represented by formula (1-a)
  • Table 2 is a compound represented by formula (1-b)
  • Table 3 is a compound represented by formula (2-a)
  • Table 4 Table is a compound represented by Formula (2-b)
  • Table 5 is a compound represented by Formula (3-a)
  • Table 6 is a compound represented by Formula (3-b)
  • Table 7 is The compounds represented by formula (4-a) and Table 8 show the compounds represented by formula (4-b), respectively.
  • Table 9 shows the compound represented by the formula (5-a)
  • Table 10 shows the compound represented by the formula (5-b).
  • Table 11 shows production intermediates represented by formula (6-a)
  • Table 12 shows production intermediates represented by formula (6-b).
  • Table 13 shows the production intermediate represented by the formula (7-a)
  • Table 14 shows the production intermediate represented by the formula (7-b).
  • Formulation Example 1 wettable powder Compound of the present invention 40 parts Clay 48 parts Dioctylsulfosuccinate sodium salt 4 parts Lignin sulfonic acid sodium salt 8 parts The above is uniformly mixed and finely pulverized, and a wettable powder with 40% active ingredient. Get.
  • Emulsion Compound of the present invention 10 parts Solvesso 200 53 parts Cyclohexanone 26 parts Calcium dodecylbenzenesulfonate 1 part Polyoxyethylene alkylallyl ether 10 parts The above components are mixed and dissolved to obtain an emulsion containing 10% active ingredient.
  • Formulation Example 3 Powder The present compound 10 parts Clay 90 parts The above is uniformly mixed and finely pulverized to obtain a powder of 10% active ingredient.
  • Formulation Example 4 Granules Compound of the present invention 5 parts Clay 73 parts Bentonite 20 parts Dioctylsulfosuccinate sodium salt 1 part Potassium phosphate 1 part After pulverizing and mixing well, adding water and kneading well, granulation drying As a result, granules containing 5% of the active ingredient are obtained.
  • Formulation Example 5 Suspension Compound of the present invention 10 parts Polyoxyethylene alkyl allyl ether 4 parts Polycarboxylic acid sodium salt 2 parts Glycerin 10 parts Xanthan gum 0.2 parts Water 73.8 parts The above is mixed and the particle size is 3 microns or less The suspension is wet-pulverized until a suspension of 10% active ingredient is obtained.
  • Granule wettable powder Compound of the present invention 40 parts Clay 36 parts Potassium chloride 10 parts Alkylbenzenesulfonic acid sodium salt 1 part Lignin sulfonic acid sodium salt 8 parts Formaldehyde condensate of alkylbenzenesulfonic acid sodium salt 5 parts After finely pulverizing, add an appropriate amount of water and knead to make clay. The clay-like product is granulated and then dried to obtain a granule wettable powder containing 40% of the active ingredient.
  • Test examples of the fungicide of the present invention obtained as described above are shown below.
  • (Test Example 1) Apple black spot disease control test An emulsion of the compound of the present invention was sprayed at a concentration of 100 ppm of the active ingredient on apple seedlings (variety “Kokumitsu”, 3-4 leaf stage) cultivated in an unglazed pot. After natural drying at room temperature, conidia of Venturia inaequalis were inoculated, and the light and darkness was repeated every 12 hours, and kept in a room of high humidity at 20 ° C. for 2 weeks. The lesion appearance state on the leaf was compared with no treatment, and the control effect was obtained.
  • the nitrogen-containing heteroaryl derivative of the present invention is a novel compound, which can be produced industrially advantageously, has an effect, and can be used safely and safely. It turns out that it is useful.

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Abstract

Disclosed are nitrogen-containing heteroaryl derivatives represented by formula (1), salts and N-oxides thereof, and fungicides for agricultural and horticultural use which contain at least one of these compounds as the active ingredient. In formula (1), R1 represents an optionally substituted C1-6 alkyl group; R2 represents a hydrogen atom or a group such as an optionally substituted C1-6 alkyl group; A1 and A2 represent an oxygen atom or the like; J represents an oxygen atom or the like; X represents an optionally substituted C1-6 alkyl group, a halogen atom or the like; n, which stands for the number of X's, represents an integer of 0 to 3, provided that when n is 2 or greater, X's may be either the same or different; B1 to B4 independently represent a nitrogen atom or a carbon atom, provided that all of B1 to B3 are not nitrogen atoms at the same time and all of B1 to B4 are not carbon atoms at the same time; and D represents a group represented by formula (2), formula (3) or the like [in formulae (2) and (3), Q1 represents an optionally substituted C6-10 aryl group or the like; and R7 and R8 represent a hydrogen atom, an optionally substituted C1-6 alkyl group or the like].

Description

含窒素ヘテロアリール誘導体および農園芸用殺菌剤Nitrogen-containing heteroaryl derivatives and agricultural and horticultural fungicides
 本発明は、新規な含窒素ヘテロアリール誘導体、その塩、またはN-オキサイド、並びにこれらの化合物の少なくとも1種を有効成分として含有する農園芸用殺菌剤に関する。
 本願は、2009年5月27日に、日本に出願された特願2009-127375号に基づき優先権を主張し、その内容をここに援用する。
The present invention relates to a novel nitrogen-containing heteroaryl derivative, a salt thereof, or an N-oxide, and an agricultural and horticultural fungicide containing at least one of these compounds as an active ingredient.
This application claims priority based on Japanese Patent Application No. 2009-127375 filed in Japan on May 27, 2009, the contents of which are incorporated herein by reference.
 農園芸作物の病害等に対して、多数の農園芸用殺菌剤が提案されている。
 例えば、特許文献1には、式(A)で表されるカーバメート誘導体、およびそれを有効成分として含有する農園芸用殺菌剤が開示されている。
Many agricultural and horticultural fungicides have been proposed for diseases and the like of agricultural and horticultural crops.
For example, Patent Document 1 discloses a carbamate derivative represented by the formula (A) and an agricultural and horticultural fungicide containing it as an active ingredient.
Figure JPOXMLDOC01-appb-C000001

(式(A)中、X”はハロゲン原子、C1~C6アルキル基等であり、nは0から4の整数であり、Ra1はC1~C6アルキル基であり、Ra2は水素原子、C1~C6アルキル基等であり、Ra3水素原子またはC1~C6アルキル基であり、Gは酸素原子、硫黄原子等であり、Y”は水素原子、C1~C10アルキル基、C2~C10アルケニル基等であり、Q”は水素原子、C1~C6ハロアルキル基、フェニル基等である。)
Figure JPOXMLDOC01-appb-C000001

(In the formula (A), X ″ is a halogen atom, a C1-C6 alkyl group, etc., n is an integer from 0 to 4, R a1 is a C1-C6 alkyl group, R a2 is a hydrogen atom, C1 ~ a C6 alkyl group, a R a3 hydrogen atom or C1-C6 alkyl group, G is an oxygen atom, a sulfur atom, etc., Y "is hydrogen, C1-C10 alkyl group, C2-C10 alkenyl group Q ″ is a hydrogen atom, a C1-C6 haloalkyl group, a phenyl group, etc.)
 特許文献2には、式(B)で表されるイミノオキシメチルピリジン化合物、およびそれを有効成分として含有する農園芸用殺菌剤が開示されている。 Patent Document 2 discloses an iminooxymethylpyridine compound represented by the formula (B) and an agricultural and horticultural fungicide containing the compound as an active ingredient.
Figure JPOXMLDOC01-appb-C000002

(式(B)中、X’は酸素原子あるいは結合であり、Y’およびZ’は、それぞれ独立にフェニル基、または酸素原子、硫黄原子および窒素原子からなる群から選ばれた1個または2個以上の原子を含有する複素環である。)
Figure JPOXMLDOC01-appb-C000002

(In the formula (B), X ′ is an oxygen atom or a bond, and Y ′ and Z ′ are each independently one or two selected from the group consisting of a phenyl group, an oxygen atom, a sulfur atom and a nitrogen atom. A heterocycle containing more than one atom.)
 特許文献3には、式(C)で表されるオキシアミン誘導体、およびそれを有効成分として含有する農園芸用殺菌剤が開示されている。 Patent Document 3 discloses an oxyamine derivative represented by the formula (C) and an agricultural and horticultural fungicide containing it as an active ingredient.
Figure JPOXMLDOC01-appb-C000003

[式(C)中、Rc1は水素原子、C1~6アルキル基、C1~6アルキルカルボニル基、またはC1~6アルキルスルホニル基である。Rc2はC1~6アルキル基、またはC1~6アルコキシ基である。Rc3はハロゲン原子、C1~6アルキル基、またはC1~6アルコキシ基である。Acは分岐してもよいC1~6アルキレン基、または結合である。Qcは、Gで置換されてもよいフェニル基、式(p1)で表わされる基、または式(p2)で表わされる基である。mは0~4の整数である。
Figure JPOXMLDOC01-appb-C000003

[In the formula (C), R c1 represents a hydrogen atom, a C1-6 alkyl group, a C1-6 alkylcarbonyl group, or a C1-6 alkylsulfonyl group. R c2 is a C1-6 alkyl group or a C1-6 alkoxy group. R c3 is a halogen atom, a C1-6 alkyl group, or a C1-6 alkoxy group. A c is a branched also be C1 ~ 6 alkylene group or a bond. Q c is a phenyl group which may be substituted with G, a group represented by the formula (p1), or a group represented by the formula (p2). m is an integer of 0-4.
Figure JPOXMLDOC01-appb-C000004

(式(p1)中、Rc4は水素原子、C1~6アルキル基、C2~6アルケニル基、またはSiRc5c6c7である。Rc5~Rc7はそれぞれ独立して、C1~6アルキル基である。式(p2)中、Rc8は水素原子、C1~6アルキル基、C1~6ハロアルキル基、またはGで置換されてもよいフェニル基である。Yは水素原子、C1~6アルキル基、C3~6シクロアルキル基、C3~6シクロアルキル-C1~6アルキル基、C2~6アルケニル基、C2~6アルキニル基、またはGで置換されてもよいフェニルC1~6アルキル基である。
 Gはハロゲン原子、C1~6アルキル基、C1~6アルコキシ基、C1~6ハロアルキル基、C1~6ハロアルコキシ基を表わし、これらGは同一または相異なって2個から5個置換してもよい。]
Figure JPOXMLDOC01-appb-C000004

(In the formula (p1), R c4 is a hydrogen atom, a C1-6 alkyl group, a C2-6 alkenyl group, or SiR c5 R c6 R c7, where R c5 -R c7 are each independently C1-6 alkyl In formula (p2), R c8 is a hydrogen atom, a C1-6 alkyl group, a C1-6 haloalkyl group, or a phenyl group optionally substituted with G. Y is a hydrogen atom, C1-6 alkyl A C3-6 cycloalkyl group, a C3-6 cycloalkyl-C1-6 alkyl group, a C2-6 alkenyl group, a C2-6 alkynyl group, or a phenyl C1-6 alkyl group optionally substituted by G.
G represents a halogen atom, a C1-6 alkyl group, a C1-6 alkoxy group, a C1-6 haloalkyl group, or a C1-6 haloalkoxy group, and these Gs may be the same or different and may be substituted by 2 to 5 . ]
 特許文献4には、式(D)で表されるアリール複素環誘導体、およびそれを有効成分として含有する農園芸用殺菌剤が開示されている。 Patent Document 4 discloses an aryl heterocyclic derivative represented by the formula (D) and an agricultural and horticultural fungicide containing it as an active ingredient.
Figure JPOXMLDOC01-appb-C000005

[式中、Rd1はC1~6アルキル基等を、Rd2はハロゲン原子等を、mは0~4の整数であり、Tは式(p3)、式(p4)、式(p5)で表される基であり、
Figure JPOXMLDOC01-appb-C000005

[Wherein R d1 is a C1-6 alkyl group, R d2 is a halogen atom, etc., m is an integer of 0-4, and T is a formula (p3), a formula (p4), a formula (p5) A group represented by
Figure JPOXMLDOC01-appb-C000006

(式中、Rd3、Rd4、Rd5、Rd6は水素原子等であり、nは、1~4の整数である。)、Qdは、式(p6)、式(p7)、式(p8)、式(p9)、式(p10)で表される基である。
Figure JPOXMLDOC01-appb-C000006

(Wherein R d3 , R d4 , R d5 and R d6 are hydrogen atoms and the like, n is an integer of 1 to 4), Q d is a formula (p6), a formula (p7), a formula It is a group represented by (p8), formula (p9), and formula (p10).
Figure JPOXMLDOC01-appb-C000007

(式(p6)、式(p7)、式(p8)、式(p9)および式(p10)中、Rd7はC5~12アルキル基等を、Rd8、Rd9、Rd10、Rd11は水素原子等を、Xは酸素原子または硫黄原子を、kは0または1~3の整数である。)]
Figure JPOXMLDOC01-appb-C000007

(In formula (p6), formula (p7), formula (p8), formula (p9) and formula (p10), R d7 represents a C5-12 alkyl group, etc., R d8 , R d9 , R d10 and R d11 represent A hydrogen atom, X is an oxygen atom or a sulfur atom, k is 0 or an integer of 1 to 3)]
 また、特許文献5には式(E)で表されるフェノキシアミン誘導体、およびそれを有効成分として含有する農園芸用殺菌剤が開示されている。 Patent Document 5 discloses a phenoxyamine derivative represented by the formula (E) and an agricultural and horticultural fungicide containing it as an active ingredient.
Figure JPOXMLDOC01-appb-C000008

(式(E)中、Re1およびRe2はそれぞれ独立して水素原子等であり;VはNRe3等であり;Re3は水素原子等であり;Re4はC1~6アルコキシ基等であり;Wは酸素原子等であり;Qe2は酸素原子等であり;YはC1~5ハロアルコキシ基等で置換され、さらにハロゲン原子等で置換されていてもよいフェニル基等である。)
Figure JPOXMLDOC01-appb-C000008

(In formula (E), R e1 and R e2 are each independently a hydrogen atom, etc .; V is NR e3, etc .; R e3 is a hydrogen atom, etc .; R e4 is a C1-6 alkoxy group, etc. Yes; W is an oxygen atom or the like; Q e2 is an oxygen atom or the like; Y is a phenyl group which is substituted with a C1-5 haloalkoxy group or the like, and may be further substituted with a halogen atom or the like.
 ところが、従来の農園芸用殺菌剤は、既存の病原菌に対する効力が不十分であったり、既存の病原菌に対する効果があっても薬剤耐性を持った新たな病原菌に全く効果が無かったり、また植物体に薬害や汚染を生じさせたり、あるいは人畜魚類に対する毒性や環境への影響があったりなどして、十分に満足できるものは多くなかった。 However, conventional agricultural and horticultural fungicides have insufficient efficacy against existing pathogens, have no effect on new pathogens with drug resistance even if effective against existing pathogens, and plant bodies However, there were not many things that were satisfactory enough, such as causing phytotoxicity and pollution, or toxic to human livestock and environmental effects.
特開2001-106666号公報JP 2001-106666 A 特開2007-137852号公報JP 2007-137852 A 特開2004-168683号公報Japanese Patent Laid-Open No. 2004-166863 WO2005/051932WO2005 / 051932 WO2008/124092WO2008 / 124092
 本発明は、このような実情に鑑みてなされたものであり、工業的に有利に製造でき、効果が確実で安全に使用できる農園芸用殺菌剤となりうる、新規な含窒素ヘテロアリール誘導体、その塩、またはN-オキサイド、並びにこれらの化合物の少なくとも1種を有効成分として含有する農園芸用殺菌剤を提供することを課題とする。 The present invention has been made in view of such circumstances, a novel nitrogen-containing heteroaryl derivative that can be produced industrially advantageously, can be used safely and safely for agricultural and horticultural use, and its An object of the present invention is to provide a fungicide for agriculture and horticulture containing a salt or N-oxide and at least one of these compounds as an active ingredient.
 本発明者らは上記課題を解決すべく鋭意検討した結果、新規な含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドを見出した。そして、この新規化合物が農園芸用殺菌剤の活性成分となり得ることを見出した。本発明はこれらの知見に基づいてさらに検討し完成するに至ったものである。 As a result of intensive studies to solve the above problems, the present inventors have found a novel nitrogen-containing heteroaryl derivative, its salt, or N-oxide. And it discovered that this novel compound could become an active ingredient of agricultural and horticultural fungicides. The present invention has been further studied and completed based on these findings.
 本発明は第1に、式(1)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドである。 First, the present invention is a nitrogen-containing heteroaryl derivative represented by the formula (1), a salt thereof, or an N-oxide.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 式(1)中、R1は、無置換の若しくは置換基を有するC1~6アルキル基である。
 式(1)中、R2は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21(式中、R21は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、 式:CO222(式中、R22は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、または 式:CON(R212(式中、R21は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。
In the formula (1), R 1 is an unsubstituted or substituted C1-6 alkyl group.
In formula (1), R 2 is a hydrogen atom, C1 ~ 6 alkyl group having an unsubstituted or substituted group of the formula: COR 21 (wherein, R 21 has a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, A substituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group. formula: CO 2 R 22 (wherein, R 22 is, C1 ~ 6 alkyl group having an unsubstituted or substituted group, C2 ~ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or location Group having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 An aryl group, or an unsubstituted or substituted heteroaryl group.) Or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 has the same meaning as described above; R 21 May be the same or different.
 式(1)中、A1は、酸素原子、硫黄原子、または 式:NR3(式中、R3は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基である。 In the formula (1), A 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
 式(1)中、A2は、酸素原子、 式:NR4(式中、R4は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、または 式:CR56(式中、R5およびR6は、それぞれ独立して、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、またはハロゲン原子である。)で表される基である。 In Formula (1), A 2 is an oxygen atom, Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above, and R 21 may be the same or different). Or a group represented by the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, or a halogen atom) It is a group represented by.
 式(1)中、Jは、酸素原子、または硫黄原子である。 In formula (1), J is an oxygen atom or a sulfur atom.
 式(1)中、Xは、無置換の若しくは置換基を有するC1~6アルキル基、 式:OR23(式中、R23は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、 式:SR23、 式:N(R232(式中、R23は前記と同じ意味である。R23は同一または異なっていてもよい。)で表される基、 シアノ基、ニトロ基、またはハロゲン原子である。
 式(1)中、nは、Xの数を表し、0~3のいずれかの整数である。nが2以上のとき、Xは同一または異なっていてもよい。
In formula (1), X, C1 ~ 6 alkyl group having an unsubstituted or substituted group of the formula: OR 23 (wherein, R 23 represents a hydrogen atom, C1 ~ 6 alkyl having unsubstituted or substituted Group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted A C4-8 cycloalkenyl group having a group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, a formula: COR 21 , a formula: CO 2 R 22 , or a formula : CON (R 21 ) 2 (in the formula, R 21 and R 22 have the same meanings as described above. R 21 may be the same or different.) Formula: SR 23 Formula: N (R 23) 2 ( . Wherein, R 23 is .R 23 is the same meaning as above, which may be the same or different) a group represented by a cyano group, a nitro group or a halogen atom, is there.
In the formula (1), n represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
 式(1)中、B1~B4は、それぞれ独立して、窒素原子、または炭素原子である。
 ただし、B1~B3は、全てが窒素原子であることはなく、B1~B4は、全てが炭素原子であることはない。
In formula (1), B 1 to B 4 are each independently a nitrogen atom or a carbon atom.
However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
 式(1)中、Dは、式(2)~式(6)で表されるいずれかの基である。
Figure JPOXMLDOC01-appb-C000010
In the formula (1), D is any group represented by the formulas (2) to (6).
Figure JPOXMLDOC01-appb-C000010
 式(2)~式(6)中、Q1は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、無置換の若しくは置換基を有するアラルキル基、無置換の若しくは置換基を有するヘテロアラルキル基、またはトリ置換シリル基である。 In the formulas (2) to (6), Q 1 represents an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted group. Having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 aryl group An unsubstituted or substituted heteroaryl group, an unsubstituted or substituted aralkyl group, an unsubstituted or substituted heteroaralkyl group, or a trisubstituted silyl group.
 式(2)、式(3)、および式(6)中、R7は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。 In formula (2), formula (3), and formula (6), R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl. Group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or A C6-10 aryl group having a substituent, or an unsubstituted or substituted heteroaryl group.
 式(3)、および式(6)中、R8は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。Rは、さらに、Q上の炭素原子、または窒素原子と結合してもよい。 In formulas (3) and (6), R 8 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted group Or a substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6 ˜10 aryl group, or unsubstituted or substituted heteroaryl group. R 8 may further be bonded to a carbon atom on Q 1 or a nitrogen atom.
 式(5)中、Q41は、C6~10アリール基、またはヘテロアリール基である。 In the formula (5), Q 41 is a C6-10 aryl group or a heteroaryl group.
 式(5)中、Q2は、 式:OR23、 式:SR23、 式:N(R232、 式:COR21、 式:CO222、 式:CON(R212、 式:SO222(式中、R21、R22、およびR23は、前記と同じ意味である。R21は同一または異なっていてもよい。R23は同一または異なっていてもよい。)で表される基、シアノ基、ニトロ基、またはハロゲン原子である。 In formula (5), Q 2 is represented by formula: OR 23 , formula: SR 23 , formula: N (R 23 ) 2 , formula: COR 21 , formula: CO 2 R 22 , formula: CON (R 21 ) 2 , Formula: SO 2 R 22 (wherein R 21 , R 22 , and R 23 have the same meaning as described above. R 21 may be the same or different. R 23 may be the same or different. ) Group, a cyano group, a nitro group, or a halogen atom.
 式(5)中、m1はQ1の数を表し、0~7のいずれかの整数である。
 式(5)中、m2はQ2の数を表し、0~7のいずれかの整数である。
 但し、m1とm2の和は7以下 である。
 m1が2以上であるとき、Q1は同一または異なっていてもよい。m2が2以上であるとき、Q2は同一または異なっていてもよい。さらにQ41上で隣り合って置換するQ1同士、Q2同士、またはQ1とQ2同士は互いに結合して5~8員環を形成してもよい。
In formula (5), m1 represents the number of Q 1 and is an integer of 0 to 7.
In the formula (5), m2 represents the number of Q 2 and is an integer of 0 to 7.
However, the sum of m1 and m2 is 7 or less.
When m1 is 2 or more, Q 1 may be the same or different. When m2 is 2 or more, Q 2 may be the same or different. Further, Q 1 , Q 2 , or Q 1 and Q 2 that are adjacently substituted on Q 41 may be bonded to each other to form a 5- to 8-membered ring.
 本発明は第2に、式(7)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドである。
Figure JPOXMLDOC01-appb-C000011
The second aspect of the present invention is a nitrogen-containing heteroaryl derivative represented by the formula (7), a salt thereof, or an N-oxide.
Figure JPOXMLDOC01-appb-C000011
 式(7)中、R1、R2、A1、A2、J、X、n、およびDは、前記式(1)と同様の意味である。 In the formula (7), R 1 , R 2 , A 1 , A 2 , J, X, n, and D have the same meaning as in the formula (1).
 本発明は第3に、式(8)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドである。
Figure JPOXMLDOC01-appb-C000012
The third aspect of the present invention is a nitrogen-containing heteroaryl derivative represented by the formula (8), a salt thereof, or an N-oxide.
Figure JPOXMLDOC01-appb-C000012
 式(8)中、R1、R2、A1、A2、J、X、n、R、およびQは、前記式(1)と同じ意味である。 In formula (8), R 1 , R 2 , A 1 , A 2 , J, X, n, R 7 , and Q 1 have the same meaning as in formula (1).
 本発明は第4に、本発明の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの少なくとも1種を有効成分として含有する農園芸用殺菌剤である。すなわち、式(1)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの少なくとも1種を有効成分として含有する農園芸用殺菌剤である。好ましくは、式(7)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの少なくとも1種を有効成分として含有する農園芸用殺菌剤である。さらに好ましくは、式(8)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの少なくとも1種を有効成分として含有する農園芸用殺菌剤である。 Fourthly, the present invention is an agricultural and horticultural fungicide containing, as an active ingredient, at least one of the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide. That is, it is an agricultural and horticultural fungicide containing at least one of the nitrogen-containing heteroaryl derivative represented by the formula (1), a salt thereof, or N-oxide as an active ingredient. Preferably, it is an agricultural and horticultural fungicide containing as an active ingredient at least one of a nitrogen-containing heteroaryl derivative represented by the formula (7), a salt thereof, or an N-oxide. More preferred is an agricultural and horticultural fungicide containing as an active ingredient at least one of a nitrogen-containing heteroaryl derivative represented by the formula (8), a salt thereof, or an N-oxide.
 本発明は第5に、本発明の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの製造に用いる製造中間体である。すなわち、式(9)で表される含窒素ヘテロアリール誘導体である。
Figure JPOXMLDOC01-appb-C000013
The fifth aspect of the present invention is a production intermediate used for the production of the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide. That is, it is a nitrogen-containing heteroaryl derivative represented by the formula (9).
Figure JPOXMLDOC01-appb-C000013
 式(9)中、R1は、無置換の若しくは置換基を有するC1~6アルキル基である。
 式(9)中、R2は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21(式中、R21は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、 式:CO222(式中、R22は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、または 式:CON(R212(式中、R21は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。
In the formula (9), R 1 is an unsubstituted or substituted C1-6 alkyl group.
In the formula (9), R 2 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, a formula: COR 21 (wherein R 21 has a hydrogen atom, an unsubstituted or substituted group) C1-6 alkyl group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, A substituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group. formula: CO 2 R 22 (wherein, R 22 is, C1 ~ 6 alkyl group having an unsubstituted or substituted group, C2 ~ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or location Group having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 An aryl group, or an unsubstituted or substituted heteroaryl group.) Or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 has the same meaning as described above; R 21 May be the same or different.
 式(9)中、A1は、酸素原子、硫黄原子、または 式:NR3(式中、R3は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基である。 In the formula (9), A 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
 式(9)中、A2は、酸素原子、 式:NR4(式中、R4は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、または 式:CR56(式中、R5およびR6は、それぞれ独立して、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、またはハロゲン原子である。)で表される基である。 In Formula (9), A 2 is an oxygen atom, Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above, and R 21 may be the same or different). Or a group represented by the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, or a halogen atom) It is a group represented by.
 式(9)中、Jは、酸素原子、または硫黄原子である。 In formula (9), J is an oxygen atom or a sulfur atom.
 式(9)中、Xは、無置換の若しくは置換基を有するC1~6アルキル基、 式:OR23(式中、R23は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、 式:SR23、 式:N(R232(式中、R23は前記と同じ意味である。R23は同一または異なっていてもよい。)で表される基、 シアノ基、ニトロ基、またはハロゲン原子である。
 式(9)中、nは、Xの数を表し、0~3のいずれかの整数である。nが2以上のとき、Xは同一または異なっていてもよい。
Wherein (9), X is C1 ~ 6 alkyl group having an unsubstituted or substituted group of the formula: OR 23 (wherein, R 23 represents a hydrogen atom, C1 ~ 6 alkyl having unsubstituted or substituted Group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted A C4-8 cycloalkenyl group having a group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, a formula: COR 21 , a formula: CO 2 R 22 , or a formula : CON (R 21 ) 2 (in the formula, R 21 and R 22 have the same meanings as described above. R 21 may be the same or different.) Formula: SR 23 Formula: N (R 23) 2 ( . Wherein, R 23 is .R 23 is the same meaning as above, which may be the same or different) a group represented by a cyano group, a nitro group or a halogen atom, is there.
In the formula (9), n represents the number of X and is an integer of 0 to 3. When n is 2 or more, Xs may be the same or different.
 式(9)中、B1~B4は、それぞれ独立して、窒素原子、または炭素原子である。
 ただし、B1~B3は、全てが窒素原子であることはなく、B1~B4は、全てが炭素原子であることはない。
In formula (9), B 1 to B 4 are each independently a nitrogen atom or a carbon atom.
However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
 式(9)中、R7は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。 In the formula (9), R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2 An -6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or It is an unsubstituted or substituted heteroaryl group.
 好ましい製造中間体は、式(10)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドである。
Figure JPOXMLDOC01-appb-C000014
A preferred production intermediate is a nitrogen-containing heteroaryl derivative represented by the formula (10), a salt thereof, or N-oxide.
Figure JPOXMLDOC01-appb-C000014
 式(10)中、R1、R2、A1、A2、J、X、n、およびRは、前記式(9)と同じ意味である。 In formula (10), R 1 , R 2 , A 1 , A 2 , J, X, n, and R 7 have the same meaning as in formula (9).
 本発明は第6に、本発明の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの製造に用いる製造中間体である。すなわち、式(11)で表される含窒素ヘテロアリール誘導体である。
Figure JPOXMLDOC01-appb-C000015
The sixth aspect of the present invention is a production intermediate used for the production of the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide. That is, it is a nitrogen-containing heteroaryl derivative represented by the formula (11).
Figure JPOXMLDOC01-appb-C000015
 式(11)中、R1は、無置換の若しくは置換基を有するC1~6アルキル基である。
 式(11)中、R2は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21(式中、R21は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、 式:CO222(式中、R22は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、または 式:CON(R212(式中、R21は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。
In the formula (11), R 1 is an unsubstituted or substituted C1-6 alkyl group.
In the formula (11), R 2 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, a formula: COR 21 (wherein R 21 has a hydrogen atom, an unsubstituted or substituted group) C1-6 alkyl group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, A substituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group. formula: CO 2 R 22 (wherein, R 22 is, C1 ~ 6 alkyl group having an unsubstituted or substituted group, C2 ~ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or A substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6 ~ Or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 has the same meaning as described above). 21 may be the same or different.)
 式(11)中、A1は、酸素原子、硫黄原子、または 式:NR3(式中、R3は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基である。 In the formula (11), A 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, an unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group.
 式(11)中、A2は、酸素原子、 式:NR4(式中、R4は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、または 式:CR56(式中、R5およびR6は、それぞれ独立して、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、またはハロゲン原子である。)で表される基である。 In Formula (11), A 2 is an oxygen atom, Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above, and R 21 may be the same or different). Or a group represented by the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, or a halogen atom) It is a group represented by.
 式(11)中、Jは、酸素原子、または硫黄原子である。 In formula (11), J is an oxygen atom or a sulfur atom.
 式(11)中、Xは、無置換の若しくは置換基を有するC1~6アルキル基、 式:OR23(式中、R23は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、 式:SR23、 式:N(R232(式中、R23は前記と同じ意味である。R23は同一または異なっていてもよい。)で表される基、 シアノ基、ニトロ基、またはハロゲン原子である。
 式(11)中、nは、Xの数を表し、0~3のいずれかの整数である。nが2以上のとき、Xは同一または異なっていてもよい。
Wherein (11), X is C1 ~ 6 alkyl group having an unsubstituted or substituted group of the formula: OR 23 (wherein, R 23 represents a hydrogen atom, C1 ~ 6 alkyl having unsubstituted or substituted Group, unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted A C4-8 cycloalkenyl group having a group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, a formula: COR 21 , a formula: CO 2 R 22 , or a formula : CON (R 21 ) 2 (in the formula, R 21 and R 22 have the same meanings as described above. R 21 may be the same or different.) Formula: SR 23 Formula: N (R 23) 2 ( . Wherein, R 23 is .R 23 is as defined above, which may be the same or different) a group represented by a cyano group, a nitro group or a halogen atom, It is.
In the formula (11), n represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
 式(11)中、B1~B4は、それぞれ独立して、窒素原子、または炭素原子である。
 ただし、B1~B3は、全てが窒素原子であることはなく、B1~B4は、全てが炭素原子であることはない。
In formula (11), B 1 to B 4 are each independently a nitrogen atom or a carbon atom.
However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
 式(11)中、R7は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。 In the formula (11), R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2 An -6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or It is an unsubstituted or substituted heteroaryl group.
 式(11)中、Rは、それぞれ独立して、水素原子、または 式:COR21(式中、R21は前記と同じ意味である。)で表される基である。Rは同一または異なっていてもよい。Rは一緒になってもよい。 In formula (11), each R 9 is independently a hydrogen atom or a group represented by the formula: COR 21 (wherein R 21 has the same meaning as described above). R 9 may be the same or different. R 9 may be together.
 好ましい製造中間体は、式(12)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドである。
Figure JPOXMLDOC01-appb-C000016
A preferred production intermediate is a nitrogen-containing heteroaryl derivative represented by the formula (12), a salt thereof, or N-oxide.
Figure JPOXMLDOC01-appb-C000016
 式(12)中、R1、R2、A1、A2、J、X、n、R、およびRは、前記式(11)と同じ意味である。 In formula (12), R 1 , R 2 , A 1 , A 2 , J, X, n, R 7 , and R 9 have the same meaning as in formula (11).
 本発明の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドは、新規化合物であり、工業的に有利に製造でき、効果が確実で安全に使用できる農園芸用殺菌剤の活性成分として有用である。
 本発明の農園芸用殺菌剤は優れた防除効果を有し、植物体に薬害や汚染を生じることがなく、人畜魚類に対する毒性や環境への影響が少ない薬剤である。
The nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide is a novel compound, and can be produced industrially advantageously, and is useful as an active ingredient in agricultural and horticultural fungicides that can be used safely and reliably. is there.
The agricultural and horticultural fungicide of the present invention is an agent that has an excellent control effect, does not cause phytotoxicity or contamination on the plant body, and has little toxicity to human fish and environmental impact.
 以下、本発明を詳細に説明する。
1)含窒素ヘテロアリール誘導体
 本発明の含窒素ヘテロアリール誘導体は、式(1)で表される化合物である。
Hereinafter, the present invention will be described in detail.
1) Nitrogen-containing heteroaryl derivative The nitrogen-containing heteroaryl derivative of the present invention is a compound represented by the formula (1).
〔置換基〕
 まず、「無置換の」および「置換基を有する」の意味を説明する。
 「無置換の」の用語は、該基が母核となる基のみであることを意味する。なお、「置換基を有する」との記載がなく母核となる基の名称のみで記載しているときは、別段の断りがない限り「無置換の」意味である。
 一方、「置換基を有する」の用語は、母核となる基のいずれかの水素原子が、母核と異なる構造の基で置換されていることを意味する。従って、「置換基」は、母核となる基に置換された他の基である。置換基は1つであってもよいし、2つ以上であってもよい。2つ以上の置換基は同一であってもよいし、異なるものであってもよい。例えば、置換基を有するC1~6アルキル基は、母核となる基がC1~6アルキル基で、これのいずれかの水素原子が異なる構造の基(「置換基」)で置換されているものである。
[Substituent]
First, the meanings of “unsubstituted” and “having a substituent” will be described.
The term “unsubstituted” means that the group is only the parent group. In addition, when there is no description of “having a substituent” and only the name of the group serving as a mother nucleus is described, it means “unsubstituted” unless otherwise specified.
On the other hand, the term “having a substituent” means that any hydrogen atom of a group serving as a mother nucleus is substituted with a group having a structure different from that of the mother nucleus. Therefore, the “substituent” is another group substituted with a group serving as a mother nucleus. The number of substituents may be one, or two or more. Two or more substituents may be the same or different. For example, in a C1-6 alkyl group having a substituent, a group serving as a mother nucleus is a C1-6 alkyl group, and any of these hydrogen atoms is substituted with a group having a different structure ("substituent") It is.
 「置換基」となり得る基としては、
C1~6アルキル基、ハロゲン置換C1~6アルキル基;
C2~6アルケニル基、C2~6アルキニル基、C3~8シクロアルキル基、C4~8シクロアルケニル基、C6~10アリール基、ヘテロアリール基;
式:COR31、 式:CO231、 式:CON(R312、 式:SO231(式中、R31は、それぞれ独立に、水素原子、C1~6アルキル基、C2~6アルケニル基、C2~6アルキニル基、C3~8シクロアルキル基、C4~8シクロアルケニル基、C6~10アリール基、またはヘテロアリール基である。)で表される基;
式:OR32、 式:SR32、 式:N(R322(式中、R32は、それぞれ独立に、水素原子、C1~6アルキル基、C2~6アルケニル基、C2~6アルキニル基、C3~8シクロアルキル基、C4~8シクロアルケニル基、C6~10アリール基、ヘテロアリール基、 式:COR31で表される基、 式:CO231で表される基、または 式:CON(R312で表される基である。)で表される基;
オキソ基、チオ基、 式:=NR33(式中、R33は、水素原子、C1~6アルキル基、C2~6アルケニル基、C2~6アルキニル基、C3~8シクロアルキル基、C4~8シクロアルケニル基、C6~10アリール基、ヘテロアリール基、または 式:OR32で表される基である。)で表される基;
シアノ基、ニトロ基、ハロゲン原子を挙げることができる。
As a group that can be a “substituent”,
A C1-6 alkyl group, a halogen-substituted C1-6 alkyl group;
A C2-6 alkenyl group, a C2-6 alkynyl group, a C3-8 cycloalkyl group, a C4-8 cycloalkenyl group, a C6-10 aryl group, a heteroaryl group;
Formula: COR 31, wherein: CO 2 R 31, wherein: CON (R 31) 2, wherein: SO 2 R 31 (wherein, R 31 each independently represent a hydrogen atom, C1 ~ 6 alkyl group, C2 ~ A 6 alkenyl group, a C2-6 alkynyl group, a C3-8 cycloalkyl group, a C4-8 cycloalkenyl group, a C6-10 aryl group, or a heteroaryl group);
Formula: OR 32 , Formula: SR 32 , Formula: N (R 32 ) 2 (wherein R 32 independently represents a hydrogen atom, a C1-6 alkyl group, a C2-6 alkenyl group, a C2-6 alkynyl group) , A C3-8 cycloalkyl group, a C4-8 cycloalkenyl group, a C6-10 aryl group, a heteroaryl group, a group represented by the formula: COR 31 , a group represented by the formula: CO 2 R 31 , or a formula: A group represented by CON (R 31 ) 2 );
Oxo group, thio group, formula: = NR 33 (wherein R 33 is a hydrogen atom, a C1-6 alkyl group, a C2-6 alkenyl group, a C2-6 alkynyl group, a C3-8 cycloalkyl group, a C4-8) A cycloalkenyl group, a C6-10 aryl group, a heteroaryl group, or a group represented by the formula: OR 32 ;
A cyano group, a nitro group, and a halogen atom can be mentioned.
 C1~6アルキル基は、1~6個の炭素原子を有する飽和脂肪族炭化水素基である。C1~6アルキル基は、直鎖であってもよいし、分岐鎖であってもよい。
 具体的にはメチル基、エチル基、n-プロピル基、n-ブチル基、n-ペンチル基、n-ヘキシル基、i-プロピル基、i-ブチル基、s-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、2-メチルブチル基、2,2-ジメチルプロピル基、イソヘキシル基等を挙げることができる。
A C1-6 alkyl group is a saturated aliphatic hydrocarbon group having 1-6 carbon atoms. The C1-6 alkyl group may be linear or branched.
Specifically, methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, i-propyl group, i-butyl group, s-butyl group, t-butyl group, Examples include isopentyl group, neopentyl group, 2-methylbutyl group, 2,2-dimethylpropyl group, isohexyl group and the like.
 ハロゲン置換C1~6アルキル基は、1~13個のハロゲン原子で置換されたC1~6アルキル基である。ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子を挙げることができる。
 具体的には、フルオロメチル基、クロロメチル基、ブロモメチル基、ジフルオロメチル基、ジクロロメチル基、ジブロモメチル基、トリフルオロメチル基、トリクロロメチル基、トリブロモメチル基、2,2,2-トルフルオロエチル基、2,2,2-トリクロロエチル基、ペンタフルオロエチル基、4-フルオロブチル基、4-クロロブチル基、3,3,3-トリフルオロプロピル基、2,2,2-トリフルオロ-1-トリフルオロメチルエチル基、パーフルオロヘキシル基、パークロロヘキシル基、2,4,6-トリクロロヘキシル基等を挙げることができる。
A halogen-substituted C1-6 alkyl group is a C1-6 alkyl group substituted with 1-13 halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
Specifically, fluoromethyl group, chloromethyl group, bromomethyl group, difluoromethyl group, dichloromethyl group, dibromomethyl group, trifluoromethyl group, trichloromethyl group, tribromomethyl group, 2,2,2-trifluoro Ethyl group, 2,2,2-trichloroethyl group, pentafluoroethyl group, 4-fluorobutyl group, 4-chlorobutyl group, 3,3,3-trifluoropropyl group, 2,2,2-trifluoro-1 -Trifluoromethylethyl group, perfluorohexyl group, perchlorohexyl group, 2,4,6-trichlorohexyl group and the like can be mentioned.
 C2~6アルケニル基は、2~6個の炭素原子を有し且つ炭素-炭素二重結合を少なくとも1つ有する脂肪族炭化水素基である。C2~6アルケニル基は、直鎖であってもよいし、分岐鎖であってもよい。
 具体的には、ビニル基、1-プロペニル基、アリル基、1-ブテニル基、2-ブテニル基、3-ブテニル基、1-ペンテニル基、2-ペンテニル基、3-ペンテニル基、4-ペンテニル基、1-ヘキセニル基、2-ヘキセニル基、3-ヘキセニル基、4-ヘキセニル基、5-ヘキセニル基、1-メチル-2-プロペニル基、2-メチル-2-プロペニル基、1-メチル-2-ブテニル基、2-メチル-2-ブテニル基等を挙げることができる。
A C2-6 alkenyl group is an aliphatic hydrocarbon group having from 2 to 6 carbon atoms and having at least one carbon-carbon double bond. The C2-6 alkenyl group may be a straight chain or a branched chain.
Specifically, vinyl group, 1-propenyl group, allyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 1-pentenyl group, 2-pentenyl group, 3-pentenyl group, 4-pentenyl group 1-hexenyl group, 2-hexenyl group, 3-hexenyl group, 4-hexenyl group, 5-hexenyl group, 1-methyl-2-propenyl group, 2-methyl-2-propenyl group, 1-methyl-2- Examples thereof include a butenyl group and a 2-methyl-2-butenyl group.
 C2~6アルキニル基は、2~6個の炭素原子を有し且つ炭素-炭素三重結合を少なくとも1つ有する脂肪族炭化水素基である。C2~6アルキニル基は、直鎖であってもよいし、分岐鎖であってもよい。
 具体的には、エチニル基、1-プロピニル基、プロパルギル基、1-ブチニル基、2-ブチニル基、3-ブチニル基、1-ペンチニル基、2-ペンチニル基、3-ペンチニル基、4-ペンチニル基、1-ヘキシニル基、1-メチル-2-プロピニル基、2-メチル-3-ブチニル基、1-メチル-2-ブチニル基、2-メチル-3-ペンチニル基、1,1-ジメチル-2-ブチニル基などを挙げることができる。
A C2-6 alkynyl group is an aliphatic hydrocarbon group having from 2 to 6 carbon atoms and having at least one carbon-carbon triple bond. The C2-6 alkynyl group may be linear or branched.
Specifically, ethynyl group, 1-propynyl group, propargyl group, 1-butynyl group, 2-butynyl group, 3-butynyl group, 1-pentynyl group, 2-pentynyl group, 3-pentynyl group, 4-pentynyl group 1-hexynyl group, 1-methyl-2-propynyl group, 2-methyl-3-butynyl group, 1-methyl-2-butynyl group, 2-methyl-3-pentynyl group, 1,1-dimethyl-2- A butynyl group etc. can be mentioned.
 C3~8シクロアルキル基は、3~8個の炭素原子を有する飽和脂環族炭化水素基である。
 具体的には、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等を挙げることができる。
A C3-8 cycloalkyl group is a saturated alicyclic hydrocarbon group having 3-8 carbon atoms.
Specific examples include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
 C4~8シクロアルケニル基は、4~8個の炭素原子を有し且つ炭素-炭素二重結合を少なくとも1つ有する脂環族炭化水素基である。
 具体的には、1-シクロブテニル基、1-シクロペンテニル基、3-シクロペンテニル基、1-シクロヘキセニル基、3-シクロヘキセニル基、3-シクロヘプテニル基、4-シクロオクテニル基等を挙げることができる。
A C4-8 cycloalkenyl group is an alicyclic hydrocarbon group having 4-8 carbon atoms and having at least one carbon-carbon double bond.
Specific examples include 1-cyclobutenyl group, 1-cyclopentenyl group, 3-cyclopentenyl group, 1-cyclohexenyl group, 3-cyclohexenyl group, 3-cycloheptenyl group, 4-cyclooctenyl group and the like.
 C6~10アリール基は、6~10個の炭素原子を有する芳香族炭化水素基である。C6~10アリール基中の環は1つであってもよいし、2つ以上あってもよい。また環を2つ以上有するアリール基は、少なくとも1つの環が芳香環であれば、残りの環が飽和脂環、不飽和脂環または芳香環のいずれであってもよい。
 具体的には、フェニル基、ナフチル基、アズレニル基、インデニル基、インダニル基等を挙げることができる。さらに、1,2,3,4-テトラヒドロ-ナフタレン-1-イル基、1,2,3,4-テトラヒドロ-ナフタレン-2-イル基、5,6,7,8-テトラヒドロ-ナフタレン-1-イル基、5,6,7,8-テトラヒドロ-ナフタレン-2-イル基等のテトラリニル基を挙げることができる。
A C6-10 aryl group is an aromatic hydrocarbon group having 6-10 carbon atoms. The C6-10 aryl group may have one ring or two or more rings. In the aryl group having two or more rings, as long as at least one ring is an aromatic ring, the remaining ring may be a saturated alicyclic ring, an unsaturated alicyclic ring, or an aromatic ring.
Specific examples include a phenyl group, a naphthyl group, an azulenyl group, an indenyl group, an indanyl group, and the like. In addition, 1,2,3,4-tetrahydro-naphthalen-1-yl group, 1,2,3,4-tetrahydro-naphthalen-2-yl group, 5,6,7,8-tetrahydro-naphthalene-1- And tetralinyl groups such as an yl group and a 5,6,7,8-tetrahydro-naphthalen-2-yl group.
 ヘテロアリール基は、環を構成する原子として炭素原子以外に窒素原子、酸素原子及び硫黄原子から選ばれる1~4個の複素原子を含む5~10員のアリール基である。この場合、単環、または環同士が縮合した多環であってもよい。
 ヘテロアリール基としては、具体的には以下の基を挙げることができる。
(1)5員環のヘテロアリール基
ピロ-ル-1-イル基、ピロ-ル-2-イル基、ピロ-ル-3-イル基等のピロリル基;
フラン-2-イル基、フラン-3-イル基等のフリル基;
チオフェン-2-イル基、チオフェン-3-イル基等のチエニル基;
イミダゾール-1-イル基、イミダゾール-2-イル基、イミダゾール-4-イル基、イミダゾール-5-イル基等のイミダゾリル基;
ピラゾール-1-イル基、ピラゾール-3-イル基、ピラゾール-4-イル基、ピラゾール-5-イル基等のピラゾリル基;
オキサゾール-2-イル基、オキサゾール-4-イル基、オキサゾール-5-イル基等のオキサゾリル基;
イソオキサゾール-3-イル基、イソオキサゾール-4-イル基、イソオキサゾール-5-イル基等のイソオキサゾリル基;
チアゾール-2-イル基、チアゾール-4-イル基、チアゾール-5-イル基等のチアゾリル基;
イソチアゾール-3-イル基、イソチアゾール-4-イル基、イソチアゾール-5-イル基等のイソチアゾリル基;
1,2,3-トリアゾール-1-イル基、1,2,3-トリアゾール-4-イル基、1,2,3-トリアゾール-5-イル基、1,2,4-トリアゾール-1-イル基、1,2,4-トリアゾール-3-イル基、1,2,4-トリアゾール-5-イル基等のトリアゾリル基;
1,2,4-オキサジアゾール-3-イル基、1,2,4-オキサジアゾール-5-イル基、1,3,4-オキサジアゾール-2-イル基等のオキサジアゾリル基;
1,2,4-チアジアゾール-3-イル基、1,2,4-チアジアゾール-5-イル基、1,3,4-チアジアゾール-2-イル基等のチアジアゾリル基;
テトラゾール-1-イル基、テトラゾール-2-イル基等のテトラゾリル基;
The heteroaryl group is a 5- to 10-membered aryl group containing 1 to 4 heteroatoms selected from a nitrogen atom, an oxygen atom and a sulfur atom in addition to carbon atoms as atoms constituting the ring. In this case, it may be a single ring or a polycyclic ring condensed.
Specific examples of the heteroaryl group include the following groups.
(1) 5-membered heteroaryl group pyrrolyl group such as pyrrol-1-yl group, pyrrol-2-yl group and pyrrol-3-yl group;
Furyl groups such as a furan-2-yl group and a furan-3-yl group;
Thienyl groups such as a thiophen-2-yl group and a thiophen-3-yl group;
Imidazolyl groups such as imidazol-1-yl group, imidazol-2-yl group, imidazol-4-yl group, imidazol-5-yl group;
Pyrazolyl groups such as a pyrazol-1-yl group, a pyrazol-3-yl group, a pyrazol-4-yl group, a pyrazol-5-yl group;
An oxazolyl group such as an oxazol-2-yl group, an oxazol-4-yl group, an oxazol-5-yl group;
Isoxazolyl groups such as isoxazol-3-yl group, isoxazol-4-yl group and isoxazol-5-yl group;
Thiazolyl groups such as thiazol-2-yl group, thiazol-4-yl group, thiazol-5-yl group;
Isothiazolyl groups such as isothiazol-3-yl group, isothiazol-4-yl group, isothiazol-5-yl group;
1,2,3-triazol-1-yl group, 1,2,3-triazol-4-yl group, 1,2,3-triazol-5-yl group, 1,2,4-triazol-1-yl A triazolyl group such as a group, 1,2,4-triazol-3-yl group, 1,2,4-triazol-5-yl group;
Oxadiazolyl groups such as 1,2,4-oxadiazol-3-yl group, 1,2,4-oxadiazol-5-yl group, 1,3,4-oxadiazol-2-yl group;
Thiadiazolyl groups such as 1,2,4-thiadiazol-3-yl group, 1,2,4-thiadiazol-5-yl group, 1,3,4-thiadiazol-2-yl group;
Tetrazolyl groups such as a tetrazol-1-yl group and a tetrazol-2-yl group;
(2)6員環のヘテロアリール基
ピリジン-2-イル基、ピリジン-3-イル基、ピリジン-4-イル基等のピリジル基;
ピラジン-2-イル基、ピラジン-3-イル基等のピラジニル基;
ピリミジン-2-イル基、ピリミジン-4-イル基、ピリミジン-5-イル基等のピリミジル基;
ピリダジン-3-イル基、ピリダジン-4-イル基等のピリダジニル基;
トリアジニル基;
(2) pyridyl groups such as a 6-membered heteroaryl group pyridin-2-yl group, pyridin-3-yl group and pyridin-4-yl group;
Pyrazinyl groups such as a pyrazin-2-yl group and a pyrazin-3-yl group;
Pyrimidyl groups such as a pyrimidin-2-yl group, a pyrimidin-4-yl group, and a pyrimidin-5-yl group;
Pyridazinyl groups such as a pyridazin-3-yl group and a pyridazin-4-yl group;
A triazinyl group;
(3)縮合環のヘテロアリール基
インドール-1-イル基、インドール-2-イル基、インドール-3-イル基、インドール-4-イル基、インドール-5-イル基、インドール-6-イル基、インドール-7-イル基;
ベンゾフラン-2-イル基、ベンゾフラン-3-イル基、ベンゾフラン-4-イル基、ベンゾフラン-5-イル基、ベンゾフラン-6-イル基、ベンゾフラン-7-イル基;
ベンゾチオフェン-2-イル基、ベンゾチオフェン-3-イル基、ベンゾチオフェン-4-イル基、ベンゾチオフェン-5-イル基、ベンゾチオフェン-6-イル基、ベンゾチオフェン-7-イル基;
ベンゾイミダゾール-1-イル基、ベンゾイミダゾール-2-イル基、ベンゾイミダゾール-4-イル基、ベンゾイミダゾール-5-イル基、ベンゾオキサゾール-2-イル基、ベンゾオキサゾール-4-イル基、ベンゾオキサゾール-5-イル基、ベンゾチアゾール-2-イル基、ベンゾチアゾール-4-イル基、ベンゾチアゾール-5-イル基;
キノリン-2-イル基、キノリン-3-イル基、キノリン-4-イル基、キノリン-5-イル基、キノリン-6-イル基、キノリン-7-イル基、キノリン-8-イル基;
(3) Heteroaryl group of fused ring indol-1-yl group, indol-2-yl group, indol-3-yl group, indol-4-yl group, indol-5-yl group, indol-6-yl group Indol-7-yl group;
Benzofuran-2-yl group, benzofuran-3-yl group, benzofuran-4-yl group, benzofuran-5-yl group, benzofuran-6-yl group, benzofuran-7-yl group;
Benzothiophen-2-yl group, benzothiophen-3-yl group, benzothiophen-4-yl group, benzothiophen-5-yl group, benzothiophen-6-yl group, benzothiophen-7-yl group;
Benzimidazol-1-yl group, benzimidazol-2-yl group, benzimidazol-4-yl group, benzimidazol-5-yl group, benzooxazol-2-yl group, benzooxazol-4-yl group, benzoxazole -5-yl group, benzothiazol-2-yl group, benzothiazol-4-yl group, benzothiazol-5-yl group;
Quinolin-2-yl group, quinolin-3-yl group, quinolin-4-yl group, quinolin-5-yl group, quinolin-6-yl group, quinolin-7-yl group, quinolin-8-yl group;
(4)オキソ基を有するヘテロアリール基
2-オキソ-2H-ピラン-3-イル基、2-オキソ-2H-ピラン-4-イル基、6-オキソ-6H-ピラン-3-イル基、6-オキソ-6H-ピラン-2-イル基、2-オキソ-2H-ピリジン-1-イル基、1-アルキル-2-オキソ-1,2-ジヒドロ-ピリジン-3-イル基、1-アルキル-2-オキソ-1,2-ジヒドロ-ピリジン-4-イル基、1-アルキル-6-オキソ-1,6-ジヒドロ-ピリジン-3-イル基、1-アルキル-6-オキソ-1,6-ジヒドロ-ピリジン-2-イル基、クロメン-2-イル基、クロメン-3-イル基、クロメン-4-イル基、クロメン-5-イル基、クロメン-6-イル基、クロメン-7-イル基、クロメン-8-イル基。
(4) Heteroaryl group having an oxo group 2-oxo-2H-pyran-3-yl group, 2-oxo-2H-pyran-4-yl group, 6-oxo-6H-pyran-3-yl group, 6 -Oxo-6H-pyran-2-yl group, 2-oxo-2H-pyridin-1-yl group, 1-alkyl-2-oxo-1,2-dihydro-pyridin-3-yl group, 1-alkyl- 2-oxo-1,2-dihydro-pyridin-4-yl group, 1-alkyl-6-oxo-1,6-dihydro-pyridin-3-yl group, 1-alkyl-6-oxo-1,6- Dihydro-pyridin-2-yl, chromen-2-yl, chromen-3-yl, chromen-4-yl, chromen-5-yl, chromen-6-yl, chromen-7-yl A chromen-8-yl group.
 式:COR31で表される基としては、例えば、ホルミル基、アセチル基、プロピオニル基、n-プロピルカルボニル基、n-ブチルカルボニル基、ペンタノイル基、バレリル基、i-プロピルカルボニル基、i-ブチルカルボニル基、ピバロイル基、イソバレリル基等のアルキルカルボニル基;アクリロイル基、メタクリロイル基等のアルケニルカルボニル基;プロピオロイル基等のアルキニルカルボニル基;ベンゾイル基、ナフチルカルボニル基等のアリールカルボニル基;ピリジン-2-イルカルボニル基、チエニルカルボニル基等のヘテロアリールカルボニル基;ベンジルカルボニル基、フェネチルカルボニル基、ピリジン-2-イルメチルカルボニル基等を挙げることができる。 Examples of the group represented by the formula: COR 31 include formyl group, acetyl group, propionyl group, n-propylcarbonyl group, n-butylcarbonyl group, pentanoyl group, valeryl group, i-propylcarbonyl group, i-butyl. Alkylcarbonyl groups such as carbonyl group, pivaloyl group and isovaleryl group; alkenylcarbonyl groups such as acryloyl group and methacryloyl group; alkynylcarbonyl groups such as propioyl group; arylcarbonyl groups such as benzoyl group and naphthylcarbonyl group; pyridin-2-yl Examples thereof include heteroarylcarbonyl groups such as carbonyl group and thienylcarbonyl group; benzylcarbonyl group, phenethylcarbonyl group, pyridin-2-ylmethylcarbonyl group and the like.
 式:CO231で表される基としては、例えば、カルボキシル基、メトキシカルボニル基、エトキシカルボニル基、n-プロポキシカルボニル基、i-プロポキシカルボニル基、n-ブトキシカルボニル基、i-ブトキシカルボニル基、t-ブトキシカルボニル基、n-ペンチルオキシカルボニル基、n-ヘキシルオキシカルボニル基、ビニルオキシカルボニル基、シクロプロピルメチルオキシカルボニル基、2-シクロペンチルエチルオキシカルボニル基、フェノキシカルボニル基、ピリジルオキシカルボニル基、ベンジルオキシカルボニル基、2-ピリジルメチルオキシカルボニル基等を挙げることができる。 Examples of the group represented by the formula: CO 2 R 31 include a carboxyl group, a methoxycarbonyl group, an ethoxycarbonyl group, an n-propoxycarbonyl group, an i-propoxycarbonyl group, an n-butoxycarbonyl group, and an i-butoxycarbonyl group. T-butoxycarbonyl group, n-pentyloxycarbonyl group, n-hexyloxycarbonyl group, vinyloxycarbonyl group, cyclopropylmethyloxycarbonyl group, 2-cyclopentylethyloxycarbonyl group, phenoxycarbonyl group, pyridyloxycarbonyl group, Examples thereof include a benzyloxycarbonyl group and a 2-pyridylmethyloxycarbonyl group.
 式:CON(R312で表される基としては、例えば、カルバモイル基、メチルカルバモイル基、エチルカルバモイル基等のモノC1~6アルキルカルバモイル基; ビニルカルバモイル基、1-プロペニルカルバモイル基、1-ヘキセニルカルバモイル基等のモノC2~6アルケニルカルバモイル基; エチニルカルバモイル基、プロピニルカルバモイル基、プロパルギルカルバモイル基等のモノC2~6アルキニルカルバモイル基; シクロプロピルカルバモイル基、シクロブチルカルバモイル基、シクロヘキシルカルバモイル基等のモノC3~8シクロアルキルカルバモイル基;シクロブト-2-エニルカルバモイル基、シクロヘキサ-2-エニルカルバモイル基等のモノC4~8シクロアルケニルカルバモイル基; フェニルカルバモイル基、1-ナフチルカルバモイル基等のモノC6~10アリールカルバモイル基; ピリジン-2-イルカルバモイル基、ピリジン-3-イルカルバモイル基、ピリジン-4-イルカルバモイル基、ピラジン-2-イルカルバモイル基、ピリミジン-2-イルカルバモイル基等のヘテロアリールカルバモイル基; ジメチルカルバモイル基、ジエチルカルバモイル基等、メチル-フェニル-カルバモイル基等のジ置換カルバモイル基を挙げることができる。 Examples of the group represented by the formula: CON (R 31 ) 2 include a mono C1-6 alkylcarbamoyl group such as a carbamoyl group, a methylcarbamoyl group, and an ethylcarbamoyl group; a vinylcarbamoyl group, a 1-propenylcarbamoyl group, 1- Mono-C2-6 alkenylcarbamoyl groups such as hexenylcarbamoyl group; mono-C2-6 alkynylcarbamoyl groups such as ethynylcarbamoyl group, propynylcarbamoyl group, propargylcarbamoyl group; mono- such as cyclopropylcarbamoyl group, cyclobutylcarbamoyl group, cyclohexylcarbamoyl group C3-8 cycloalkylcarbamoyl group; mono C4-8 cycloalkenylcarbamoyl group such as cyclobut-2-enylcarbamoyl group, cyclohex-2-enylcarbamoyl group; phenylcarbamoyl Groups, mono C6-10 arylcarbamoyl groups such as 1-naphthylcarbamoyl group; pyridin-2-ylcarbamoyl group, pyridin-3-ylcarbamoyl group, pyridin-4-ylcarbamoyl group, pyrazin-2-ylcarbamoyl group, pyrimidine A heteroarylcarbamoyl group such as a -2-ylcarbamoyl group; and a disubstituted carbamoyl group such as a dimethylcarbamoyl group, a diethylcarbamoyl group, and a methyl-phenyl-carbamoyl group.
 式:SO231で表される基としては、例えば、メタンスルホニル基、エタンスルホニル基、ベンゼンスルホニル基等を挙げることができる。 Examples of the group represented by the formula: SO 2 R 31 include a methanesulfonyl group, an ethanesulfonyl group, a benzenesulfonyl group, and the like.
 式:OR32で表される基としては、例えば、水酸基; メトキシ基、エトキシ基、n-プロポキシ基、n-ブトキシ基、n-ペンチルオキシ基、n-ヘキシルオキシ基、i-プロポキシ基、i-ブトキシ基、s-ブトキシ基、t-ブトキシ基、1-エチルプロポキシ基、イソヘキシルオキシ基、4-メチルペントキシ基、3-メチルペントキシ基、2-メチルペントキシ基、1-メチルペントキシ基、3,3-ジメチルブトキシ基、2,2-ジメチルブトキシ基、1,1-ジメチルブトキシ基、1,2-ジメチルブトキシ基、1,3-ジメチルブトキシ基、2,3-ジメチルブトキシ基、1-エチルブトキシ基、2-エチルブトキシ基等のC1~6アルコキシ基; ビニルオキシ基、1-プロペニルオキシ基、2-プロペニルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、3-ブテニルオキシ基、1-ペンテニルオキシ基、2-ペンテニルオキシ基、3-ペンテニルオキシ基、4-ペンテニルオキシ基、1-ヘキセニルオキシ基、2-ヘキセニルオキシ基、3-ヘキセニルオキシ基、4-ヘキセニルオキシ基、5-ヘキセニルオキシ基、1-メチル-2-プロペニルオキシ基、2-メチル-2-プロペニルオキシ基、1-メチル-2-ブテニルオキシ基、2-メチル-2-ブテニルオキシ基等のC2~6アルケニルオキシ基; エチニルオキシ基、プロピニルオキシ基、プロパルギルオキシ基、1-ブチニルオキシ基、2-ブチニルオキシ基、3-ブチニルオキシ基、1-ペンチニルオキシ基、2-ペンチニルオキシ基、3-ペンチニルオキシ基、4-ペンチニルオキシ基、1-ヘキシニルオキシ基、1-メチル-2-プロピニルオキシ基、2-メチル-3-ブチニルオキシ基、1-メチル-2-ブチニルオキシ基、2-メチル-3-ペンチニルオキシ基、1,1-ジメチル-2-ブチニルオキシ基等のC2~6アルキニルオキシ基; シクロプロピルオキシ基、シクロブチルオキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基等のC3~8シクロアルコキシ基; シクロブト-2-エニルオキシ基、シクロヘキサ-2-エニルオキシ基等のC4~8シクロアルケニルオキシ基; フェニルオキシ基、1-ナフチルオキシ基、2-ナフチルオキシ基等のC6~10アリールオキシ基; ピリジン-2-イルオキシ基、ピリジン-3-イルオキシ基、ピリジン-4-イルオキシ基、ピラジン-2-イルオキシ基、ピリミジン-2-イルオキシ基等のヘテロアリールオキシ基; ホルミルオキシ基、アセチルオキシ基、プロピオニルオキシ基、n-プロピルカルボニルオキシ基、i-プロピルカルボニルオキシ基、n-ブチルカルボニルオキシ基、i-ブチルカルボニルオキシ基、ペンタノイルオキシ基、ピバロイルオキシ基、ベンゾイルオキシ基、2-ピリジルカルボニルオキシ基等のC1~7アシルオキシ基; メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、n-プロポキシカルボニルオキシ基、n-ブトキシカルボニルオキシ基、t-ブトキシカルボニルオキシ基、ビニルオキシカルボニルオキシ基、フェノキシカルボニルオキシ基、ピリジルオキシカルボニルオキシ基等のC1~7カルボキシオキシ基; カルバモイルオキシ基、メチルカルバモイルオキシ基、エチルカルバモイルオキシ基、ジメチルカルバモイルオキシ基、ジエチルカルバモイルオキシ基、フェニルカルバモイルオキシ基等のモノ置換カルバモイルオキシ基またはジ置換カルバモイルオキシ基等を挙げることができる。 Examples of the group represented by the formula: OR 32 include a hydroxyl group; a methoxy group, an ethoxy group, an n-propoxy group, an n-butoxy group, an n-pentyloxy group, an n-hexyloxy group, an i-propoxy group, i -Butoxy, s-butoxy, t-butoxy, 1-ethylpropoxy, isohexyloxy, 4-methylpentoxy, 3-methylpentoxy, 2-methylpentoxy, 1-methylpent Toxi group, 3,3-dimethylbutoxy group, 2,2-dimethylbutoxy group, 1,1-dimethylbutoxy group, 1,2-dimethylbutoxy group, 1,3-dimethylbutoxy group, 2,3-dimethylbutoxy group A C1-6 alkoxy group such as 1-ethylbutoxy group, 2-ethylbutoxy group; vinyloxy group, 1-propenyloxy group, 2-propenyloxy group, 1-butyl Nyloxy group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group, 3-pentenyloxy group, 4-pentenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3 -Hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group, 1-methyl-2-propenyloxy group, 2-methyl-2-propenyloxy group, 1-methyl-2-butenyloxy group, 2-methyl- C2-6 alkenyloxy groups such as 2-butenyloxy group; ethynyloxy group, propynyloxy group, propargyloxy group, 1-butynyloxy group, 2-butynyloxy group, 3-butynyloxy group, 1-pentynyloxy group, 2-pentynyl group Nyloxy group, 3-pentynyloxy group, 4-pentynyloxy group 1-hexynyloxy group, 1-methyl-2-propynyloxy group, 2-methyl-3-butynyloxy group, 1-methyl-2-butynyloxy group, 2-methyl-3-pentynyloxy group, 1,1-dimethyl- C2-6 alkynyloxy groups such as 2-butynyloxy group; C3-8 cycloalkoxy groups such as cyclopropyloxy group, cyclobutyloxy group, cyclopentyloxy group, cyclohexyloxy group; cyclobut-2-enyloxy group, cyclohex-2- A C4-8 cycloalkenyloxy group such as an enyloxy group; a C6-10 aryloxy group such as a phenyloxy group, 1-naphthyloxy group, 2-naphthyloxy group; pyridine-2-yloxy group, pyridine-3-yloxy group, Pyridin-4-yloxy group, pyrazin-2-yloxy group Heteroaryloxy groups such as pyrimidin-2-yloxy group; formyloxy group, acetyloxy group, propionyloxy group, n-propylcarbonyloxy group, i-propylcarbonyloxy group, n-butylcarbonyloxy group, i-butylcarbonyl C1-7 acyloxy groups such as oxy group, pentanoyloxy group, pivaloyloxy group, benzoyloxy group, 2-pyridylcarbonyloxy group; methoxycarbonyloxy group, ethoxycarbonyloxy group, n-propoxycarbonyloxy group, n-butoxycarbonyl C1-7 carboxyoxy groups such as oxy group, t-butoxycarbonyloxy group, vinyloxycarbonyloxy group, phenoxycarbonyloxy group, pyridyloxycarbonyloxy group; carbamoyloxy group, methyl Examples thereof include a mono-substituted carbamoyloxy group such as a rucarbamoyloxy group, an ethylcarbamoyloxy group, a dimethylcarbamoyloxy group, a diethylcarbamoyloxy group, and a phenylcarbamoyloxy group, or a disubstituted carbamoyloxy group.
 式:SR32で表される基としては、例えば、メルカプト基; メチルスルファニル基、エチルスルファニル基、n-ヘキシルスルファニル基等のC1~6アルキルスルファニル基; ビニルスルファニル基、1-プロペニルスルファニル基、1-ヘキセニルスルファニル基等のC2~6アルケニルスルファニル基; エチニルスルファニル基、プロピニルスルファニル基、プロパルギルスルファニル基等のC2~6アルキニルスルファニル基; シクロプロピルスルファニル基、シクロブチルスルファニル基、シクロヘキシルスルファニル基等のC3~8シクロアルキルスルファニル基; シクロブト-2-エニルスルファニル基、シクロヘキサ-2-エニルスルファニル基等のC4~8シクロアルケニルスルファニル基; フェニルスルファニル基、1-ナフチルスルファニル基、2-ナフチルスルファニル基等のC6~10アリールスルファニル基; ピリジン-2-イルスルファニル基、ピリジン-3-イルスルファニル基、ピリジン-4-イルスルファニル基、ピラジン-2-イルスルファニル基、ピリミジン-2-イルスルファニル基等のヘテロアリールスルファニル基; ホルミルスルファニル基、アセチルスルファニル基、ベンゾイルスルファニル基、2-ピリジルカルボニルスルファニル基等のC1~7アシルスルファニル基; メトキシカルボニルスルファニル基、エトキシカルボニルスルファニル基、t-ブトキシカルボニルスルファニル基、ビニルオキシカルボニルスルファニル基、フェノキシカルボニルスルファニル基、ピリジルオキシカルボニルスルファニル基等のC1~7カルボキシスルファニル基; カルバモイルスルファニル基、メチルカルバモイルスルファニル基、エチルカルバモイルスルファニル基、ジメチルカルバモイルスルファニル基、ジエチルカルバモイルスルファニル基、フェニルカルバモイルスルファニル基等のモノ置換カルバモイルスルファニル基またはジ置換カルバモイルスルファニル基等を挙げることができる。 Formula: The group represented by SR 32, for example, mercapto group; methylsulfanyl group, ethylsulfanyl group, C1 ~ 6 alkylsulfanyl group such as n- hexylsulfanyl group; vinyl sulfanyl group, 1-propenyl Nils Alpha group, 1 A C2-6 alkenylsulfanyl group such as a hexenylsulfanyl group; a C2-6 alkynylsulfanyl group such as an ethynylsulfanyl group, a propynylsulfanyl group, a propargylsulfanyl group; 8 cycloalkylsulfanyl groups; C4-8 cycloalkenylsulfanyl groups such as cyclobut-2-enylsulfanyl groups and cyclohex-2-enylsulfanyl groups; phenylsulfanyl groups C6-10 arylsulfanyl groups such as 1-naphthylsulfanyl group, 2-naphthylsulfanyl group; pyridin-2-ylsulfanyl group, pyridin-3-ylsulfanyl group, pyridin-4-ylsulfanyl group, pyrazin-2-ylsulfanyl Groups, heteroarylsulfanyl groups such as pyrimidin-2-ylsulfanyl group; C1-7 acylsulfanyl groups such as formylsulfanyl group, acetylsulfanyl group, benzoylsulfanyl group, 2-pyridylcarbonylsulfanyl group; methoxycarbonylsulfanyl group, ethoxycarbonyl Such as sulfanyl group, t-butoxycarbonylsulfanyl group, vinyloxycarbonylsulfanyl group, phenoxycarbonylsulfanyl group, pyridyloxycarbonylsulfanyl group, etc. 1-7 carboxysulfanyl groups; carbamoylsulfanyl groups, methylcarbamoylsulfanyl groups, ethylcarbamoylsulfanyl groups, dimethylcarbamoylsulfanyl groups, diethylcarbamoylsulfanyl groups, phenylcarbamoylsulfanyl groups, etc. monosubstituted carbamoylsulfanyl groups or disubstituted carbamoylsulfanyl groups Can be mentioned.
 式:N(R322で表される基としては、例えば、メチルアミノ基、エチルメチル基、n-ヘキシルアミノ基等のモノC1~6アルキルアミノ基; ビニルアミノ基、1-プロペニルアミノ基、1-ヘキセニルアミノ基等のモノC2~6アルケニルアミノ基; エチニルアミノ基、プロピニルアミノ基、プロパルギルアミノ基等のモノC2~6アルキニルアミノ基; シクロプロピルアミノ基、シクロブチルアミノ基、シクロヘキシルアミノ基等のモノC3~8シクロアルキルアミノ基; シクロブト-2-エニルアミノ基、シクロヘキサ-2-エニルアミノ基等のモノC4~8シクロアルケニルアミノ基; フェニルアミノ基、1-ナフチルアミノ基等のモノC6~10アリールアミノ基; ピリジン-2-イルアミノ基、ピリジン-3-イルアミノ基、ピリジン-4-イルアミノ基、ピラジン-2-イルアミノ基、ピリミジン-2-イルアミノ基等のヘテロアリールアミノ基; ホルミルスルアミノ基、アセチルアミノ基、ベンゾイルアミノ基、2-ピリジルカルボニルアミノ基等のC1~7アシルアミノ基; メトキシカルボニルアミノ基、エトキシカルボニルアミノ基、t-ブトキシカルボニルアミノ基、ビニルオキシカルボニルアミノ基、フェノキシカルボニルアミノ基、ピリジルオキシカルボニルアミノ基等のC1~7カルボキシアミノ基; カルバモイルアミノ基、メチルカルバモイルアミノ基、エチルカルバモイルアミノ基、ジメチルカルバモイルアミノ基、ジエチルカルバモイルアミノ基、フェニルカルバモイルアミノ基等のモノ置換カルバモイルアミノ基またはジ置換カルバモイルアミノ基等; Examples of the group represented by the formula: N (R 32 ) 2 include mono C1-6 alkylamino groups such as methylamino group, ethylmethyl group, n-hexylamino group; vinylamino group, 1-propenylamino group Mono-C2-6 alkenylamino groups such as 1-hexenylamino group; mono-C2-6 alkynylamino groups such as ethynylamino group, propynylamino group, propargylamino group; cyclopropylamino group, cyclobutylamino group, cyclohexylamino group Mono C3-8 cycloalkylamino groups such as: mono C4-8 cycloalkenylamino groups such as cyclobut-2-enylamino group, cyclohex-2-enylamino group; mono C6-10 such as phenylamino group, 1-naphthylamino group, etc. Arylamino group; pyridin-2-ylamino group, pyridin-3-ylamino Groups, heteroarylamino groups such as pyridin-4-ylamino group, pyrazin-2-ylamino group, pyrimidin-2-ylamino group; formylsulfamino group, acetylamino group, benzoylamino group, 2-pyridylcarbonylamino group, etc. C1-7 acylamino group; C1-7 carboxyamino group such as methoxycarbonylamino group, ethoxycarbonylamino group, t-butoxycarbonylamino group, vinyloxycarbonylamino group, phenoxycarbonylamino group, pyridyloxycarbonylamino group; carbamoylamino Group, methylcarbamoylamino group, ethylcarbamoylamino group, dimethylcarbamoylamino group, diethylcarbamoylamino group, phenylcarbamoylamino group, monosubstituted carbamoylamino group or disubstituted Moiruamino group or the like;
 ジメチルアミノ基、ジエチルメチル基、メチル-ビニル-アミノ基、メチル-エチニル-アミノ基、メチル-シクロプロピル-アミノ基、メチル-シクロブト-2-エニル-アミノ基、メチル-フェニル-アミノ基、メチル-ピリジン-2-イル-アミノ基、メチル-アセチル-アミノ基、メチル-メトキシカルボニル-アミノ基;メチリデンアミノ基、エチリデンアミノ基等を挙げることができる。 Dimethylamino group, diethylmethyl group, methyl-vinyl-amino group, methyl-ethynyl-amino group, methyl-cyclopropyl-amino group, methyl-cyclobut-2-enyl-amino group, methyl-phenyl-amino group, methyl- Examples include pyridin-2-yl-amino group, methyl-acetyl-amino group, methyl-methoxycarbonyl-amino group; methylideneamino group, ethylideneamino group, and the like.
 式:=NR33で表される基としては、例えば、メチルイミノ基、エチルイミノ基等のC1~6アルキルイミノ基; ビニルイミノ基、1-プロペニルイミノ基等のC2~6アルケニルイミノ基; エチニルイミノ基等のC2~6アルキニルイミノ基; シクロプロピルイミノ基、シクロブチルイミノ基等のC3~8シクロアルキルイミノ基; シクロブト-2-エニルイミノ基等のC4~8シクロアルケニルイミノ基; フェニルイミノ基、1-ナフチルイミノ基等のC6~10アリールイミノ基; ピリジン-2-イルイミノ基、ピリジン-3-イルイミノ基、ピリジン-4-イルイミノ基、ピラジン-2-イルイミノ基、ピリミジン-2-イルイミノ基等のヘテロアリールイミノ基; ヒドロキシイミノ基; メトキシイミノ基、エトキシイミノ基等のC1~6アルコキシイミノ基; フェノキシイミノ基等のC6~10アリールイミノ基; ピリジン-2-イルオキシイミノ基等のヘテロアリールイミノ基; アセチルオキシイミノ基、ベンゾイルオキシイミノ基等のC1~7アシルオキシイミノ基; メトキシカルボニルオキシイミノ基、エトキシカルボニルオキシイミノ基、t-ブトキシカルボニルオキシイミノ基等のC1~7カルボキシオキシイミノ基等を挙げることができる。 Examples of the group represented by the formula: = NR 33 include C1-6 alkylimino groups such as methylimino group and ethylimino group; C2-6 alkenylimino groups such as vinylimino group and 1-propenylimino group; ethynylimino group and the like A C2-6 alkynylimino group, a cyclopropylimino group, a C3-8 cycloalkylimino group such as a cyclobutylimino group, a C4-8 cycloalkenylimino group such as a cyclobut-2-enylimino group, a phenylimino group, a 1-naphthylimino group C6-10 arylimino groups such as pyridine groups; heteroarylimino groups such as pyridine-2-ylimino group, pyridine-3-ylimino group, pyridine-4-ylimino group, pyrazine-2-ylimino group, pyrimidine-2-ylimino group ; Hydroxyimino group; methoxyimino group, ethoxyimino group C1-6 alkoxyimino groups such as: C6-10 arylimino groups such as phenoxyimino groups; heteroarylimino groups such as pyridin-2-yloxyimino groups; C1-7 acyloxy groups such as acetyloxyimino groups and benzoyloxyimino groups Imino groups; C1-7 carboxyoxyimino groups such as methoxycarbonyloxyimino group, ethoxycarbonyloxyimino group, t-butoxycarbonyloxyimino group, and the like.
 ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等を挙げることができる。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
〔R1
 式(1)中のR1は、無置換の若しくは置換基を有するC1~6アルキル基である。母核となる「C1~6アルキル基」は上述のとおりである(以下、R~R、R21~R23、X、およびQにおいて同じ)。
 C1~6アルキル基の置換基となり得る好適な基としては、ハロゲン原子、式:OR32で表される基、C6~10アリール基、およびヘテロアリール基を挙げることができる。
[R 1 ]
R 1 in the formula (1) is an unsubstituted or substituted C1-6 alkyl group. The “C1-6 alkyl group” serving as a mother nucleus is as described above (hereinafter the same for R 2 to R 8 , R 21 to R 23 , X, and Q 1 ).
Suitable groups that can be a substituent of the C1-6 alkyl group include a halogen atom, a group represented by the formula: OR 32 , a C6-10 aryl group, and a heteroaryl group.
 置換基を有するC1~6アルキル基としては、例えば、フルオロメチル基、クロロメチル基、ブロモメチル基、ジフルオロメチル基、ジクロロメチル基、ジブロモメチル基、トリフルオロメチル基、トリクロロメチル基、トリブロモメチル基、2,2,2-トルフルオロエチル基、2,2,2-トリクロロエチル基、ペンタフルオロエチル基、4-フルオロブチル基、4-クロロブチル基、3,3,3-トリフルオロプロピル基、2,2,2-トリフルオロ-1-トリフルオロメチルエチル基、パーフルオロヘキシル基、パークロロヘキシル基、2,4,6-トリクロロヘキシル基等のハロゲン置換C1~6アルキル基; ヒドロキシメチル基、ヒドロキシエチル基、ヒドロキシプロピル基等のヒドロキシC1~6アルキル基; メトキシメチル基、エトキシメチル基、メトキシエチル基、エトキシエチル基、メトキシn-プロピル基、エトキシメチル基、エトキシエチル基、n-プロポキシメチル基、i-プロポキシエチル基、s-ブトキシメチル基、t-ブトキシエチル基、1,2-ジメトキシエチル基、2,2-ジメトキシエチル基等のC1~6アルコキシC1~6アルキル基; ホルミルオキシメチル基、アセトキシメチル基、2-アセトキシエチル基、プロピオニルオキシメチル基、プロピオニルオキシエチル基等のアシルオキシC1~6アルキル基; ベンジル基、フェネチル基、1-ナフチルメチル基、2-ナフチルメチル基等のアラルキル基; フラン-2-イルメチル基、フラン-2-イルエチル基、フラン-2-イルプロピル基、フラン-3-イルメチル基、チオフェン-2-イルメチル基、チオフェン-2-イルエチル基、チオフェン-3-イルメチル基、ピリジン-2-イルメチル基、ピリジン-2-イルエチル基、ピリジン-2-イルプロピル基、ピリジン-3-イルメチル基、ピリジン-4-イルメチル基、ピラジン-2-イルメチル基、ピラジン-2-イルエチル基、ピリミジン-2-イルメチル基、ピリミジン-2-イルエチル基、ピリミジン-4-イルメチル基、ピリミジン-5-イルメチル基等のヘテロアラルキル基;などを挙げることができる。 Examples of the C1-6 alkyl group having a substituent include a fluoromethyl group, a chloromethyl group, a bromomethyl group, a difluoromethyl group, a dichloromethyl group, a dibromomethyl group, a trifluoromethyl group, a trichloromethyl group, and a tribromomethyl group. 2,2,2-trifluoroethyl group, 2,2,2-trichloroethyl group, pentafluoroethyl group, 4-fluorobutyl group, 4-chlorobutyl group, 3,3,3-trifluoropropyl group, 2 , 2,2-trifluoro-1-trifluoromethylethyl group, perfluorohexyl group, perchlorohexyl group, 2,4,6-trichlorohexyl group and other halogen-substituted C1-6 alkyl groups; hydroxymethyl group, hydroxy Hydroxy C1-6 alkyl groups such as ethyl and hydroxypropyl; methoxy Til, ethoxymethyl, methoxyethyl, ethoxyethyl, methoxy n-propyl, ethoxymethyl, ethoxyethyl, n-propoxymethyl, i-propoxyethyl, s-butoxymethyl, t-butoxy C1-6 alkoxy C1-6 alkyl groups such as ethyl group, 1,2-dimethoxyethyl group, 2,2-dimethoxyethyl group; formyloxymethyl group, acetoxymethyl group, 2-acetoxyethyl group, propionyloxymethyl group, Acyloxy C1-6 alkyl groups such as propionyloxyethyl group; aralkyl groups such as benzyl group, phenethyl group, 1-naphthylmethyl group, 2-naphthylmethyl group; furan-2-ylmethyl group, furan-2-ylethyl group, furan -2-ylpropyl group, furan-3-ylmethyl group Thiophen-2-ylmethyl group, thiophen-2-ylethyl group, thiophen-3-ylmethyl group, pyridin-2-ylmethyl group, pyridin-2-ylethyl group, pyridin-2-ylpropyl group, pyridin-3-ylmethyl group, Such as pyridin-4-ylmethyl group, pyrazin-2-ylmethyl group, pyrazin-2-ylethyl group, pyrimidin-2-ylmethyl group, pyrimidin-2-ylethyl group, pyrimidin-4-ylmethyl group, pyrimidin-5-ylmethyl group, etc. A heteroaralkyl group; and the like.
 これらのうち、Rは無置換のC1~6アルキル基であることが好ましい。 Of these, R 1 is preferably an unsubstituted C1-6 alkyl group.
〔R2
 式(1)中のR2は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、式:COR21で表される基、式:CO222で表される基、または式:CON(R212で表される基である。
 C1~6アルキル基の置換基となり得る好適な基としては、ハロゲン原子、式:COR31で表される基、式:OR32で表される基、C6~10アリール基、およびヘテロアリール基を挙げることができる。
 置換基を有するC1~6アルキル基としては、例えば、メトキシメチル基、エトキシメチル基、メトキシエチル基、エトキシエチル基、メトキシn-プロピル基、エトキシメチル基、エトキシエチル基、n-プロポキシメチル基、i-プロポキシエチル基、s-ブトキシメチル基、t-ブトキシエチル基、1,2-ジメトキシエチル基、2,2-ジメトキシエチル基等のC1~6アルコキシC1~6アルキル基;ホルミルオキシメチル基、アセトキシメチル基、2-アセトキシエチル基、プロピオニルオキシメチル基、プロピオニルオキシエチル基等のC1~7アシルオキシC1~6アルキル基;などを挙げることができる。
[R 2 ]
R 2 in formula (1) is a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, a group represented by formula: COR 21 , a group represented by formula: CO 2 R 22 , or A group represented by the formula: CON (R 21 ) 2 .
Suitable groups that can be a substituent of the C1-6 alkyl group include a halogen atom, a group represented by the formula: COR 31 , a group represented by the formula: OR 32 , a C6-10 aryl group, and a heteroaryl group. Can be mentioned.
Examples of the C1-6 alkyl group having a substituent include a methoxymethyl group, an ethoxymethyl group, a methoxyethyl group, an ethoxyethyl group, a methoxy n-propyl group, an ethoxymethyl group, an ethoxyethyl group, an n-propoxymethyl group, a C1-6 alkoxy C1-6 alkyl group such as i-propoxyethyl group, s-butoxymethyl group, t-butoxyethyl group, 1,2-dimethoxyethyl group, 2,2-dimethoxyethyl group; formyloxymethyl group, And C1-7 acyloxy C1-6 alkyl groups such as an acetoxymethyl group, 2-acetoxyethyl group, propionyloxymethyl group, propionyloxyethyl group, and the like.
 R21は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。 R 21 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group Is a heteroaryl group having
 無置換の若しくは置換基を有するC2~6アルケニル基は、母核として「C2~6アルケニル基」を有するものである。母核となる「C2~6アルケニル基」は上述のとおりである(以下、R、R、R、R22、R23、およびQにおいて同じ)。
 C2~6アルケニル基の置換基となり得る好適な基は、ハロゲン原子である。
 置換基を有するC2~6アルケニル基としては、例えば、3-クロロ-2-プロペニル基、4-クロロ-2-ブテニル基、4,4-ジクロロ-3-ブテニル基、4,4-ジフルオロ-3-ブテニル基、3,3-ジクロロ-2-プロペニル基、2,3-ジクロロ-2-プロペニル基、3,3-ジフルオロ-2-プロペニル基、2,4,6-トリクロロ-2-ヘキセニル基等のC2~6ハロアルケニル基などを挙げることができる。
An unsubstituted or substituted C2-6 alkenyl group has a “C2-6 alkenyl group” as a mother nucleus. The “C2-6 alkenyl group” serving as a mother nucleus is as described above (hereinafter the same in R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
A suitable group that can be a substituent of the C2-6 alkenyl group is a halogen atom.
Examples of the C2-6 alkenyl group having a substituent include, for example, 3-chloro-2-propenyl group, 4-chloro-2-butenyl group, 4,4-dichloro-3-butenyl group, 4,4-difluoro-3 -Butenyl group, 3,3-dichloro-2-propenyl group, 2,3-dichloro-2-propenyl group, 3,3-difluoro-2-propenyl group, 2,4,6-trichloro-2-hexenyl group, etc. And a C2-6 haloalkenyl group.
 無置換の若しくは置換基を有するC2~6アルキニル基は、母核として「C2~6アルキニル基」を有するものである。母核となる「C2~6アルキニル基」は上述のとおりである(以下、R、R、R、R22、R23、およびQにおいて同じ)。
 C2~6アルキニル基の置換基となり得る好適な基は、ハロゲン原子である。
 置換基を有するC2~6アルキニル基としては、例えば、3-クロロ-1-プロピニル基、3-クロロ-1-ブチニル基、3-ブロモ-1-ブチニル基、3-ブロモ-2-プロピニル基、3-ヨード-2-プロピニル基、3-ブロモ-1-ヘキシニル基、5、5-ジクロロ-2-メチル-3-ペンチニル基、4-クロロ-1,1-ジメチル-2-ブチニル基等のハロアルキニル基などを挙げることができる。
An unsubstituted or substituted C2-6 alkynyl group has a “C2-6 alkynyl group” as a mother nucleus. The “C2-6 alkynyl group” serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
A suitable group that can be a substituent of the C2-6 alkynyl group is a halogen atom.
Examples of the C2-6 alkynyl group having a substituent include a 3-chloro-1-propynyl group, a 3-chloro-1-butynyl group, a 3-bromo-1-butynyl group, a 3-bromo-2-propynyl group, Halo such as 3-iodo-2-propynyl group, 3-bromo-1-hexynyl group, 5,5-dichloro-2-methyl-3-pentynyl group, 4-chloro-1,1-dimethyl-2-butynyl group, etc. An alkynyl group etc. can be mentioned.
 無置換の若しくは置換基を有するC3~8シクロアルキル基は、母核として「C3~8シクロアルキル基」を有するものである。母核となる「C3~8シクロアルキル基」は、上述のとおりである(以下、R、R、R、R22、R23、およびQにおいて同じ)。 An unsubstituted or substituted C3-8 cycloalkyl group has a “C3-8 cycloalkyl group” as a mother nucleus. The “C3-8 cycloalkyl group” serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
 無置換の若しくは置換基を有するC4~8シクロアルケニル基は、母核として「C4~8シクロアルケニル基」を有するものである。母核となる「C4~8シクロアルケニル基」は、上述のとおりである(以下、R、R、R、R22、R23、およびQにおいて同じ)。 An unsubstituted or substituted C4-8 cycloalkenyl group has a “C4-8 cycloalkenyl group” as a mother nucleus. The “C4-8 cycloalkenyl group” serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 1 ).
 無置換の若しくは置換基を有するC6~10アリール基は、母核として「C6~10アリール基」を有するものである。母核となるC6~10アリール基は、上述のとおりである(以下、R、R、R、R22、R23、およびQ41において同じ)。 An unsubstituted or substituted C6-10 aryl group has a “C6-10 aryl group” as a mother nucleus. The C6-10 aryl group serving as a mother nucleus is as described above (hereinafter the same for R 3 , R 7 , R 8 , R 22 , R 23 , and Q 41 ).
 無置換の若しくは置換基を有するヘテロアリール基は、母核として「ヘテロアリール基」を有するものである。母核となるヘテロアリール基は、上述のとおりである(以下、R、R、R、R22、R23、およびQ41において同じ)。 An unsubstituted or substituted heteroaryl group has a “heteroaryl group” as a mother nucleus. The heteroaryl group serving as a mother nucleus is as described above (hereinafter the same in R 3 , R 7 , R 8 , R 22 , R 23 , and Q 41 ).
 式:COR21で表される基としては、例えば、ホルミル基、アセチル基、プロピオニル基、n-プロピルカルボニル基、n-ブチルカルボニル基、ペンタノイル基、バレリル基、i-プロピルカルボニル基、i-ブチルカルボニル基、ピバロイル基、イソバレリル基等のアルキルカルボニル基;アクリロイル基、メタクリロイル基等のアルケニルカルボニル基; プロピオロイル基等のアルキニルカルボニル基; ベンゾイル基、ナフチルカルボニル基等のアリールカルボニル基; 2-ピリジルカルボニル基、チエニルカルボニル基等のヘテロアリールカルボニル基; ベンジルカルボニル基、フェネチルカルボニル基、2-ピリジルメチルカルボニル基; モノフルオロアセチル基、モノクロロアセチル基、モノブロモアセチル基、ジフルオロアセチル基、ジクロロアセチル基、ジブロモアセチル基、トリフルオロアセチル基、トリクロロアセチル基、トリブロモアセチル基、3,3,3-トリフルオロプロピオニル基、3,3,3-トリクロロプロピオニル基、2,2,3,3,3-ペンタフルオロプロピオニル基等のハロアシル基などを挙げることができる。 Examples of the group represented by the formula: COR 21 include formyl group, acetyl group, propionyl group, n-propylcarbonyl group, n-butylcarbonyl group, pentanoyl group, valeryl group, i-propylcarbonyl group, i-butyl. Alkylcarbonyl groups such as carbonyl group, pivaloyl group and isovaleryl group; alkenylcarbonyl groups such as acryloyl group and methacryloyl group; alkynylcarbonyl groups such as propioloyl group; arylcarbonyl groups such as benzoyl group and naphthylcarbonyl group; 2-pyridylcarbonyl group A heteroarylcarbonyl group such as thienylcarbonyl group; benzylcarbonyl group, phenethylcarbonyl group, 2-pyridylmethylcarbonyl group; monofluoroacetyl group, monochloroacetyl group, monobromoacetyl group, difluoro Cetyl group, dichloroacetyl group, dibromoacetyl group, trifluoroacetyl group, trichloroacetyl group, tribromoacetyl group, 3,3,3-trifluoropropionyl group, 3,3,3-trichloropropionyl group, 2,2, And haloacyl groups such as 3,3,3-pentafluoropropionyl group.
 R22は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。 R 22 is an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, unsubstituted or A substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted hetero An aryl group.
 式:CO222で表される基としては、例えば、メトキシカルボニル基、エトキシカルボニル基、n-プロポキシカルボニル基、i-プロポキシカルボニル基、n-ブトキシカルボニル基、i-ブトキシカルボニル基、t-ブトキシカルボニル基、n-ペンチルオキシカルボニル基、n-ヘキシルオキシカルボニル基、ビニルオキシカルボニル基、シクロプロピルメチルオキシカルボニル基、2-シクロペンチルエチルオキシカルボニル基、フェノキシカルボニル基、ピリジルオキシカルボニル基、ベンジルオキシカルボニル基、2-ピリジルメチルオキシカルボニル基などを挙げることができる。 Examples of the group represented by the formula: CO 2 R 22 include methoxycarbonyl group, ethoxycarbonyl group, n-propoxycarbonyl group, i-propoxycarbonyl group, n-butoxycarbonyl group, i-butoxycarbonyl group, t- Butoxycarbonyl group, n-pentyloxycarbonyl group, n-hexyloxycarbonyl group, vinyloxycarbonyl group, cyclopropylmethyloxycarbonyl group, 2-cyclopentylethyloxycarbonyl group, phenoxycarbonyl group, pyridyloxycarbonyl group, benzyloxycarbonyl And 2-pyridylmethyloxycarbonyl group.
 式:CON(R212中のR21は、前記と同じ意味である。なお、2つのR21は同一であってよいし、異なっていてもよい。 In the formula: CON (R 21 ) 2 , R 21 has the same meaning as described above. Note that two R 21 may be the same or different.
 式:CON(R212で表される基としては、例えば、カルバモイル基、メチルカルバモイル基、エチルカルバモイル基等のモノC1~6アルキルカルバモイル基; ビニルカルバモイル基、1-プロペニルカルバモイル基、1-ヘキセニルカルバモイル基等のモノC2~6アルケニルカルバモイル基; エチニルカルバモイル基、プロピニルカルバモイル基、プロパルギルカルバモイル基等のモノC2~6アルキニルカルバモイル基; シクロプロピルカルバモイル基、シクロブチルカルバモイル基、シクロヘキシルカルバモイル基等のモノC3~8シクロアルキルカルバモイル基;シクロブト-2-エニルカルバモイル基、シクロヘキサ-2-エニルカルバモイル基等のモノC4~8シクロアルケニルカルバモイル基; フェニルカルバモイル基、1-ナフチルカルバモイル基等のモノC6~10アリールカルバモイル基; ピリジン-2-イルカルバモイル基、ピリジン-3-イルカルバモイル基、ピリジン-4-イルカルバモイル基、ピラジン-2-イルカルバモイル基、ピリミジン-2-イルカルバモイル基等のヘテロアリールカルバモイル基; ジメチルカルバモイル基、ジエチルカルバモイル基等、メチル-フェニル-カルバモイル基等のジ置換カルバモイル基を挙げることができる。 Examples of the group represented by the formula: CON (R 21 ) 2 include mono-C1-6 alkylcarbamoyl groups such as carbamoyl group, methylcarbamoyl group, ethylcarbamoyl group; vinylcarbamoyl group, 1-propenylcarbamoyl group, 1- Mono-C2-6 alkenylcarbamoyl groups such as hexenylcarbamoyl group; mono-C2-6 alkynylcarbamoyl groups such as ethynylcarbamoyl group, propynylcarbamoyl group, propargylcarbamoyl group; mono- such as cyclopropylcarbamoyl group, cyclobutylcarbamoyl group, cyclohexylcarbamoyl group C3-8 cycloalkylcarbamoyl group; mono C4-8 cycloalkenylcarbamoyl group such as cyclobut-2-enylcarbamoyl group, cyclohex-2-enylcarbamoyl group; phenylcarbamoyl Groups, mono C6-10 arylcarbamoyl groups such as 1-naphthylcarbamoyl group; pyridin-2-ylcarbamoyl group, pyridin-3-ylcarbamoyl group, pyridin-4-ylcarbamoyl group, pyrazin-2-ylcarbamoyl group, pyrimidine A heteroarylcarbamoyl group such as a -2-ylcarbamoyl group; and a disubstituted carbamoyl group such as a dimethylcarbamoyl group, a diethylcarbamoyl group, and a methyl-phenyl-carbamoyl group.
 これらのうち、R2は水素原子であることが好ましい。 Of these, R 2 is preferably a hydrogen atom.
〔A1
 式(1)中のA1は、酸素原子、硫黄原子、または式:NR3で表される基である。
 R3は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。
 これらのうち、A1は酸素原子であることが好ましい。
[A 1 ]
A 1 in the formula (1) is an oxygen atom, a sulfur atom, or a group represented by the formula: NR 3 .
R 3 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group Is a heteroaryl group having
Of these, A 1 is preferably an oxygen atom.
〔A
 式(1)中のA2は、酸素原子、式:NR4で表される基、または式:CR56で表される基である。なお、R4は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、式:COR21で表される基、式:CO222で表される基、または式:CON(R212で表される基である。R5およびR6は、それぞれ独立に、水素原子、無置換の若しくは置換基を有するC1~6アルキル基またはハロゲン原子である。
 これらのうち、A2は、酸素原子であることが好ましい。
[A 2]
A 2 in the formula (1) is an oxygen atom, a group represented by the formula: NR 4 , or a group represented by the formula: CR 5 R 6 . R 4 represents a hydrogen atom, an unsubstituted or substituted C 1-6 alkyl group, a group represented by the formula: COR 21 , a group represented by the formula: CO 2 R 22 , or a formula: CON ( R 21 ) is a group represented by 2 . R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, or a halogen atom.
Of these, A 2 is preferably an oxygen atom.
〔J〕
 式(1)中のJは、酸素原子、または硫黄原子である。
[J]
J in Formula (1) is an oxygen atom or a sulfur atom.
〔X〕
 式(1)中のXは、無置換の若しくは置換基を有するC1~6アルキル基、式:OR23で表される基、式:SR23で表される基、式:N(R232で表される基、シアノ基、ニトロ基、またはハロゲン原子である。
 Xの下付きnはXの数を表し、0~3のいずれかの整数である。nが2以上のとき、X同士は同一でも異なっていてもよい。
[X]
X in formula (1) is an unsubstituted or substituted C1-6 alkyl group, formula: a group represented by OR 23 , formula: a group represented by SR 23 , formula: N (R 23 ) 2 is a group represented by 2 , a cyano group, a nitro group, or a halogen atom.
The subscript n of X represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
 R23は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基、式:COR21、式:CO222、または式:CON(R212である。 R 23 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group A heteroaryl group having the formula: COR 21 , Formula: CO 2 R 22 , or Formula: CON (R 21 ) 2 .
 式:OR23で表される基としては、例えば、メトキシ基、エトキシ基、n-プロポキシ基、n-ブトキシ基、n-ペンチルオキシ基、n-ヘキシルオキシ基、i-プロポキシ基、i-ブトキシ基、s-ブトキシ基、t-ブトキシ基、1-エチルプロポキシ基、イソヘキシルオキシ基、4-メチルペントキシ基、3-メチルペントキシ基、2-メチルペントキシ基、1-メチルペントキシ基、3,3-ジメチルブトキシ基、2,2-ジメチルブトキシ基、1,1-ジメチルブトキシ基、1,2-ジメチルブトキシ基、1,3-ジメチルブトキシ基、2,3-ジメチルブトキシ基、1-エチルブトキシ基、2-エチルブトキシ基等のC1~6アルコキシ基; ビニルオキシ基、1-プロペニルオキシ基、2-プロペニルオキシ基、1-ブテニルオキシ基、2-ブテニルオキシ基、3-ブテニルオキシ基、1-ペンテニルオキシ基、2-ペンテニルオキシ基、3-ペンテニルオキシ基、4-ペンテニルオキシ基、1-ヘキセニルオキシ基、2-ヘキセニルオキシ基、3-ヘキセニルオキシ基、4-ヘキセニルオキシ基、5-ヘキセニルオキシ基、1-メチル-2-プロペニルオキシ基、2-メチル-2-プロペニルオキシ基、1-メチル-2-ブテニルオキシ基、2-メチル-2-ブテニルオキシ基等のC2~6アルケニルオキシ基; エチニルオキシ基、プロピニルオキシ基、プロパルギルオキシ基、1-ブチニルオキシ基、2-ブチニルオキシ基、3-ブチニルオキシ基、1-ペンチニルオキシ基、2-ペンチニルオキシ基、3-ペンチニルオキシ基、4-ペンチニルオキシ基、1-ヘキシニルオキシ基、1-メチル-2-プロピニルオキシ基、2-メチル-3-ブチニルオキシ基、1-メチル-2-ブチニルオキシ基、2-メチル-3-ペンチニルオキシ基、1,1-ジメチル-2-ブチニルオキシ基等のC2~6アルキニルオキシ基; シクロプロピルオキシ基、シクロブチルオキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基等のC3~8シクロアルコキシ基; シクロブト-2-エニルオキシ基、シクロヘキサ-2-エニルオキシ基等のC4~8シクロアルケニルオキシ基; フェニルオキシ基、1-ナフチルオキシ基、2-ナフチルオキシ基等のC6~10アリールオキシ基; ピリジン-2-イルオキシ基、ピリジン-3-イルオキシ基、ピリジン-4-イルオキシ基、ピラジン-2-イルオキシ基、ピリミジン-2-イルオキシ基等のヘテロアリールオキシ基; ホルミルオキシ基、アセチルオキシ基、プロピオニルオキシ基、n-プロピルカルボニルオキシ基、i-プロピルカルボニルオキシ基、n-ブチルカルボニルオキシ基、i-ブチルカルボニルオキシ基、ペンタノイルオキシ基、ピバロイルオキシ基、ベンゾイルオキシ基、2-ピリジルカルボニルオキシ基等のC1~7アシルオキシ基; メトキシカルボニルオキシ基、エトキシカルボニルオキシ基、n-プロポキシカルボニルオキシ基、n-ブトキシカルボニルオキシ基、t-ブトキシカルボニルオキシ基、ビニルオキシカルボニルオキシ基、フェノキシカルボニルオキシ基、ピリジルオキシカルボニルオキシ基等のC1~7カルボキシオキシ基; カルバモイルオキシ基、メチルカルバモイルオキシ基、エチルカルバモイルオキシ基、ジメチルカルバモイルオキシ基、ジエチルカルバモイルオキシ基、フェニルカルバモイルオキシ基等のモノ置換カルバモイルオキシ基またはジ置換カルバモイルオキシ基等; クロロメトキシ基、ジクロロメトキシ基、トリクロロメトキシ基、トリフルオロメトキシ基、1-フルオロエトキシ基、1,1-ジフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、ペンタフルオロエトキシ基等を挙げることができる。 Examples of the group represented by the formula: OR 23 include methoxy, ethoxy, n-propoxy, n-butoxy, n-pentyloxy, n-hexyloxy, i-propoxy, and i-butoxy. Group, s-butoxy group, t-butoxy group, 1-ethylpropoxy group, isohexyloxy group, 4-methylpentoxy group, 3-methylpentoxy group, 2-methylpentoxy group, 1-methylpentoxy group 3,3-dimethylbutoxy group, 2,2-dimethylbutoxy group, 1,1-dimethylbutoxy group, 1,2-dimethylbutoxy group, 1,3-dimethylbutoxy group, 2,3-dimethylbutoxy group, 1 -C1-6 alkoxy groups such as ethylbutoxy group, 2-ethylbutoxy group; vinyloxy group, 1-propenyloxy group, 2-propenyloxy group, 1-butenyloxy Si group, 2-butenyloxy group, 3-butenyloxy group, 1-pentenyloxy group, 2-pentenyloxy group, 3-pentenyloxy group, 4-pentenyloxy group, 1-hexenyloxy group, 2-hexenyloxy group, 3 -Hexenyloxy group, 4-hexenyloxy group, 5-hexenyloxy group, 1-methyl-2-propenyloxy group, 2-methyl-2-propenyloxy group, 1-methyl-2-butenyloxy group, 2-methyl- C2-6 alkenyloxy groups such as 2-butenyloxy group; ethynyloxy group, propynyloxy group, propargyloxy group, 1-butynyloxy group, 2-butynyloxy group, 3-butynyloxy group, 1-pentynyloxy group, 2-pentynyl group Nyloxy, 3-pentynyloxy, 4-pentynyloxy, 1-hex Sinyloxy, 1-methyl-2-propynyloxy, 2-methyl-3-butynyloxy, 1-methyl-2-butynyloxy, 2-methyl-3-pentynyloxy, 1,1-dimethyl-2- C2-6 alkynyloxy group such as butynyloxy group; C3-8 cycloalkoxy group such as cyclopropyloxy group, cyclobutyloxy group, cyclopentyloxy group, cyclohexyloxy group; cyclobut-2-enyloxy group, cyclohex-2-enyloxy group A C4-8 cycloalkenyloxy group such as phenyloxy group, 1-naphthyloxy group, 2-naphthyloxy group, and the like; pyridin-2-yloxy group, pyridin-3-yloxy group, pyridine- 4-yloxy group, pyrazin-2-yloxy group, pyrimid Heteroaryloxy groups such as N-2-yloxy group; formyloxy group, acetyloxy group, propionyloxy group, n-propylcarbonyloxy group, i-propylcarbonyloxy group, n-butylcarbonyloxy group, i-butylcarbonyl C1-7 acyloxy groups such as oxy group, pentanoyloxy group, pivaloyloxy group, benzoyloxy group, 2-pyridylcarbonyloxy group; methoxycarbonyloxy group, ethoxycarbonyloxy group, n-propoxycarbonyloxy group, n-butoxycarbonyl C1-7 carboxyoxy group such as oxy group, t-butoxycarbonyloxy group, vinyloxycarbonyloxy group, phenoxycarbonyloxy group, pyridyloxycarbonyloxy group; carbamoyloxy group, methylcarba Mono-substituted carbamoyloxy group such as yloxy group, ethylcarbamoyloxy group, dimethylcarbamoyloxy group, diethylcarbamoyloxy group, phenylcarbamoyloxy group or disubstituted carbamoyloxy group; chloromethoxy group, dichloromethoxy group, trichloromethoxy group, tri Examples thereof include a fluoromethoxy group, a 1-fluoroethoxy group, a 1,1-difluoroethoxy group, a 2,2,2-trifluoroethoxy group, and a pentafluoroethoxy group.
 式:SR23で表される基としては、例えば、メチルスルファニル基、エチルスルファニル基、n-ヘキシルスルファニル基等のC1~6アルキルスルファニル基; ビニルスルファニル基、1-プロペニルスルファニル基、1-ヘキセニルスルファニル基等のC2~6アルケニルスルファニル基; エチニルスルファニル基、プロピニルスルファニル基、プロパルギルスルファニル基等のC2~6アルキニルスルファニル基; シクロプロピルスルファニル基、シクロブチルスルファニル基、シクロヘキシルスルファニル基等のC3~8シクロアルキルスルファニル基; シクロブト-2-エニルスルファニル基、シクロヘキサ-2-エニルスルファニル基等のC4~8シクロアルケニルスルファニル基; フェニルスルファニル基、1-ナフチルスルファニル基、2-ナフチルスルファニル基等のC6~10アリールスルファニル基; ピリジン-2-イルスルファニル基、ピリジン-3-イルスルファニル基、ピリジン-4-イルスルファニル基、ピラジン-2-イルスルファニル基、ピリミジン-2-イルスルファニル基等のヘテロアリールスルファニル基; ホルミルスルファニル基、アセチルスルファニル基、ベンゾイルスルファニル基、2-ピリジルカルボニルスルファニル基等のC1~7アシルスルファニル基; メトキシカルボニルスルファニル基、エトキシカルボニルスルファニル基、t-ブトキシカルボニルスルファニル基、ビニルオキシカルボニルスルファニル基、フェノキシカルボニルスルファニル基、ピリジルオキシカルボニルスルファニル基等のC1~7カルボキシスルファニル基; カルバモイルスルファニル基、メチルカルバモイルスルファニル基、エチルカルバモイルスルファニル基、ジメチルカルバモイルスルファニル基、ジエチルカルバモイルスルファニル基、フェニルカルバモイルスルファニル基等のモノ置換カルバモイルスルファニル基またはジ置換カルバモイルスルファニル基等を挙げることができる。 Formula: The group represented by SR 23, for example, methylsulfanyl group, ethylsulfanyl group, C1 ~ 6 alkylsulfanyl group such as n- hexylsulfanyl group; vinyl sulfanyl group, 1-propenyl Nils Alpha group, 1-hexenyl sulfanyl C2-6 alkenylsulfanyl groups such as ethynylsulfanyl groups, C2-6 alkynylsulfanyl groups such as ethynylsulfanyl group, propynylsulfanyl group, propargylsulfanyl group; C3-8 cycloalkyl such as cyclopropylsulfanyl group, cyclobutylsulfanyl group, cyclohexylsulfanyl group Sulfanyl group; C4-8 cycloalkenylsulfanyl group such as cyclobut-2-enylsulfanyl group, cyclohex-2-enylsulfanyl group; phenylsulfanyl group, 1-naphthyl C6-10 arylsulfanyl group such as sulfanyl group, 2-naphthylsulfanyl group; pyridin-2-ylsulfanyl group, pyridin-3-ylsulfanyl group, pyridin-4-ylsulfanyl group, pyrazin-2-ylsulfanyl group, pyrimidine A heteroarylsulfanyl group such as -2-ylsulfanyl group; a C1-7 acylsulfanyl group such as formylsulfanyl group, acetylsulfanyl group, benzoylsulfanyl group, 2-pyridylcarbonylsulfanyl group; methoxycarbonylsulfanyl group, ethoxycarbonylsulfanyl group, C1-7 carboxy such as t-butoxycarbonylsulfanyl group, vinyloxycarbonylsulfanyl group, phenoxycarbonylsulfanyl group, pyridyloxycarbonylsulfanyl group, etc. A carbamoylsulfanyl group; a mono-carbamoylsulfanyl group such as a carbamoylsulfanyl group, a methylcarbamoylsulfanyl group, an ethylcarbamoylsulfanyl group, a dimethylcarbamoylsulfanyl group, a diethylcarbamoylsulfanyl group, or a phenylcarbamoylsulfanyl group; it can.
 式:N(R232で表される基としては、例えば、メチルアミノ基、エチルメチル基、n-ヘキシルアミノ基等のモノC1~6アルキルアミノ基; ビニルアミノ基、1-プロペニルアミノ基、1-ヘキセニルアミノ基等のモノC2~6アルケニルアミノ基; エチニルアミノ基、プロピニルアミノ基、プロパルギルアミノ基等のモノC2~6アルキニルアミノ基; シクロプロピルアミノ基、シクロブチルアミノ基、シクロヘキシルアミノ基等のモノC3~8シクロアルキルアミノ基; シクロブト-2-エニルアミノ基、シクロヘキサ-2-エニルアミノ基等のモノC4~8シクロアルケニルアミノ基; フェニルアミノ基、1-ナフチルアミノ基等のモノC6~10アリールアミノ基; ピリジン-2-イルアミノ基、ピリジン-3-イルアミノ基、ピリジン-4-イルアミノ基、ピラジン-2-イルアミノ基、ピリミジン-2-イルアミノ基等のヘテロアリールアミノ基; ホルミルスルアミノ基、アセチルアミノ基、ベンゾイルアミノ基、2-ピリジルカルボニルアミノ基等のC1~7アシルアミノ基; メトキシカルボニルアミノ基、エトキシカルボニルアミノ基、t-ブトキシカルボニルアミノ基、ビニルオキシカルボニルアミノ基、フェノキシカルボニルアミノ基、ピリジルオキシカルボニルアミノ基等のC1~7カルボキシアミノ基; カルバモイルアミノ基、メチルカルバモイルアミノ基、エチルカルバモイルアミノ基、ジメチルカルバモイルアミノ基、ジエチルカルバモイルアミノ基、フェニルカルバモイルアミノ基等のモノ置換カルバモイルアミノ基またはジ置換カルバモイルアミノ基等; Examples of the group represented by the formula: N (R 23 ) 2 include mono C1-6 alkylamino groups such as a methylamino group, an ethylmethyl group, and an n-hexylamino group; a vinylamino group, a 1-propenylamino group Mono-C2-6 alkenylamino groups such as 1-hexenylamino group; mono-C2-6 alkynylamino groups such as ethynylamino group, propynylamino group, propargylamino group; cyclopropylamino group, cyclobutylamino group, cyclohexylamino group Mono C3-8 cycloalkylamino groups such as: mono C4-8 cycloalkenylamino groups such as cyclobut-2-enylamino group, cyclohex-2-enylamino group; mono C6-10 such as phenylamino group, 1-naphthylamino group, etc. Arylamino group; pyridin-2-ylamino group, pyridin-3-ylamino Groups, heteroarylamino groups such as pyridin-4-ylamino group, pyrazin-2-ylamino group, pyrimidin-2-ylamino group; formylsulfamino group, acetylamino group, benzoylamino group, 2-pyridylcarbonylamino group, etc. C1-7 acylamino group; C1-7 carboxyamino group such as methoxycarbonylamino group, ethoxycarbonylamino group, t-butoxycarbonylamino group, vinyloxycarbonylamino group, phenoxycarbonylamino group, pyridyloxycarbonylamino group; carbamoylamino Group, methylcarbamoylamino group, ethylcarbamoylamino group, dimethylcarbamoylamino group, diethylcarbamoylamino group, phenylcarbamoylamino group, monosubstituted carbamoylamino group or disubstituted Moiruamino group or the like;
 ジメチルアミノ基、ジエチルメチル基、メチル-ビニル-アミノ基、メチル-エチニル-アミノ基、メチル-シクロプロピル-アミノ基、メチル-シクロブト-2-エニル-アミノ基、メチル-フェニル-アミノ基、メチル-ピリジン-2-イル-アミノ基、メチル-アセチル-アミノ基、メチル-メトキシカルボニル-アミノ基等のジ置換アミノ基;メチリデンアミノ基、エチリデンアミノ基等の窒素原子が同一の炭素原子と結合したアミノ基等を挙げることができる。 Dimethylamino group, diethylmethyl group, methyl-vinyl-amino group, methyl-ethynyl-amino group, methyl-cyclopropyl-amino group, methyl-cyclobut-2-enyl-amino group, methyl-phenyl-amino group, methyl- Disubstituted amino groups such as pyridin-2-yl-amino group, methyl-acetyl-amino group, methyl-methoxycarbonyl-amino group; amino groups in which nitrogen atoms such as methylideneamino group and ethylideneamino group are bonded to the same carbon atom Etc.
 これらのうち、Xは、無置換の若しくは置換基を有するC1~6アルキル基、またはハロゲン原子であることが好ましい。置換基となり得る好適な基は、ハロゲン原子である。 Of these, X is preferably an unsubstituted or substituted C1-6 alkyl group or a halogen atom. A suitable group that can be a substituent is a halogen atom.
〔B1~B4
 B1~B4は、それぞれ独立して、窒素原子、または炭素原子である。ただし、B1~B3は、全てが窒素原子であることはなく、B1~B4は、全てが炭素原子であることはない。B1~B4の組合せ態様としては、例えば、式(A-1)~式(A-6)で表される構造(二重より下の構造およびXは表記を省略している。)のものを挙げることができる。
 式(A-1)で表される構造は、B、B、B、およびBが、それぞれ、窒素原子、炭素原子、炭素原子、および炭素原子からなる構造である。その他にも、式(A-4)で表される構造は、B、B、B、およびBが、それぞれ、炭素原子、炭素原子、窒素原子、および炭素原子からなる構造であり、式(A-5)で表される構造は、B、B、B、およびBが、それぞれ、炭素原子、炭素原子、炭素原子、および窒素原子からなる構造である。これらの構造のうち、式(A-1)の構造であることが好ましい。
[B 1 to B 4 ]
B 1 to B 4 are each independently a nitrogen atom or a carbon atom. However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms. As a combination mode of B 1 to B 4 , for example, structures of the formulas (A-1) to (A-6) (structures below the double and X is omitted). Things can be mentioned.
The structure represented by the formula (A-1) is a structure in which B 1 , B 2 , B 3 , and B 4 are each composed of a nitrogen atom, a carbon atom, a carbon atom, and a carbon atom. In addition, the structure represented by the formula (A-4) is a structure in which B 1 , B 2 , B 3 , and B 4 are each composed of a carbon atom, a carbon atom, a nitrogen atom, and a carbon atom. The structure represented by the formula (A-5) is a structure in which B 1 , B 2 , B 3 , and B 4 are each composed of a carbon atom, a carbon atom, a carbon atom, and a nitrogen atom. Of these structures, the structure of the formula (A-1) is preferable.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
〔D〕
 Dは、式(2)~式(6)で表されるいずれかの基である。
Figure JPOXMLDOC01-appb-C000018
[D]
D is any group represented by the formulas (2) to (6).
Figure JPOXMLDOC01-appb-C000018
 式(2)中の炭素窒素二重結合は、幾何異性体(E/Z異性体)のいずれかまたはそれらの混合物を表す。
 式(3)中の2つある炭素窒素二重結合は、それぞれが幾何異性体(E/Z異性体)のいずれかまたはそれらの混合物を表す。
 式(6)中の炭素窒素二重結合は、幾何異性体(E/Z異性体)のいずれかまたはそれらの混合物を表す。
The carbon nitrogen double bond in the formula (2) represents any of geometric isomers (E / Z isomers) or a mixture thereof.
Each of the two carbon nitrogen double bonds in the formula (3) represents one of geometric isomers (E / Z isomer) or a mixture thereof.
The carbon nitrogen double bond in the formula (6) represents any of geometric isomers (E / Z isomers) or a mixture thereof.
 式(2)~式(6)中、Q1は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、無置換の若しくは置換基を有するアラルキル基、無置換の若しくは置換基を有するヘテロアラルキル基、またはトリ置換シリル基である。
 なお、トリ置換シリル基としては、トリメチルシリル基、トリエチルシリル基、トリシクロプロピルシリル基、t-ブチルジメチルシリル基等を挙げることができる。
In the formulas (2) to (6), Q 1 represents an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted group. Having C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or substituted C6-10 aryl group An unsubstituted or substituted heteroaryl group, an unsubstituted or substituted aralkyl group, an unsubstituted or substituted heteroaralkyl group, or a trisubstituted silyl group.
Examples of the tri-substituted silyl group include trimethylsilyl group, triethylsilyl group, tricyclopropylsilyl group, t-butyldimethylsilyl group and the like.
 式(2)中の好ましいQ1は、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するアラルキル基、または無置換の若しくは置換基を有するヘテロアラルキル基である。 Preferred Q 1 in the formula (2) is an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted aralkyl group, or an unsubstituted or substituted heteroaralkyl group. .
 C6~10アリール基は、6~10個の炭素原子を有する芳香族炭化水素基である。C6~10アリール基中の環は1つであってもよいし、2つ以上あってもよい。また環を2つ以上有するアリール基は、少なくとも1つの環が芳香環であれば、残りの環が飽和脂環、不飽和脂環または芳香環のいずれであってもよい。
 具体的には、フェニル基、ナフチル基、アズレニル基、インデニル基、インダニル基等を挙げることができる。さらに、1,2,3,4-テトラヒドロ-ナフタレン-1-イル基、1,2,3,4-テトラヒドロ-ナフタレン-2-イル基、5,6,7,8-テトラヒドロ-ナフタレン-1-イル基、5,6,7,8-テトラヒドロ-ナフタレン-2-イル基等のテトラリニル基を挙げることができる。
A C6-10 aryl group is an aromatic hydrocarbon group having 6-10 carbon atoms. The C6-10 aryl group may have one ring or two or more rings. In the aryl group having two or more rings, as long as at least one ring is an aromatic ring, the remaining ring may be a saturated alicyclic ring, an unsaturated alicyclic ring, or an aromatic ring.
Specific examples include a phenyl group, a naphthyl group, an azulenyl group, an indenyl group, an indanyl group, and the like. In addition, 1,2,3,4-tetrahydro-naphthalen-1-yl group, 1,2,3,4-tetrahydro-naphthalen-2-yl group, 5,6,7,8-tetrahydro-naphthalene-1- And tetralinyl groups such as an yl group and a 5,6,7,8-tetrahydro-naphthalen-2-yl group.
 アラルキル基は、C6~10アリール基で置換されたC1~6アルキル基である。
 具体的には、ベンジル基、フェネチル基、1-ナフチルメチル基、2-ナフチルメチル基等を挙げることができる。
An aralkyl group is a C1-6 alkyl group substituted with a C6-10 aryl group.
Specific examples include a benzyl group, a phenethyl group, a 1-naphthylmethyl group, and a 2-naphthylmethyl group.
 ヘテロアリール基は、環を構成する原子として炭素原子以外に窒素原子、酸素原子及び硫黄原子から選ばれる1~4個の複素原子を含む5~10員のアリール基である。この場合、単環、または環同士が縮合した多環であってもよい。
 ヘテロアリール基としては、具体的には以下の基を挙げることができる。
(1)5員環のヘテロアリール基
ピロ-ル-1-イル基、ピロ-ル-2-イル基、ピロ-ル-3-イル基等のピロリル基;
フラン-2-イル基、フラン-3-イル基等のフリル基;
チオフェン-2-イル基、チオフェン-3-イル基等のチエニル基;
イミダゾール-1-イル基、イミダゾール-2-イル基、イミダゾール-4-イル基、イミダゾール-5-イル基等のイミダゾリル基;
ピラゾール-1-イル基、ピラゾール-3-イル基、ピラゾール-4-イル基、ピラゾール-5-イル基等のピラゾリル基;
オキサゾール-2-イル基、オキサゾール-4-イル基、オキサゾール-5-イル基等のオキサゾリル基;
イソオキサゾール-3-イル基、イソオキサゾール-4-イル基、イソオキサゾール-5-イル基等のイソオキサゾリル基;
チアゾール-2-イル基、チアゾール-4-イル基、チアゾール-5-イル基等のチアゾリル基;
イソチアゾール-3-イル基、イソチアゾール-4-イル基、イソチアゾール-5-イル基等のイソチアゾリル基;
1,2,3-トリアゾール-1-イル基、1,2,3-トリアゾール-4-イル基、1,2,3-トリアゾール-5-イル基、1,2,4-トリアゾール-1-イル基、1,2,4-トリアゾール-3-イル基、1,2,4-トリアゾール-5-イル基等のトリアゾリル基;
1,2,4-オキサジアゾール-3-イル基、1,2,4-オキサジアゾール-5-イル基、1,3,4-オキサジアゾール-2-イル基等のオキサジアゾリル基;
1,2,4-チアジアゾール-3-イル基、1,2,4-チアジアゾール-5-イル基、1,3,4-チアジアゾール-2-イル基等のチアジアゾリル基;
テトラゾール-1-イル基、テトラゾール-2-イル基等のテトラゾリル基;
The heteroaryl group is a 5- to 10-membered aryl group containing 1 to 4 heteroatoms selected from a nitrogen atom, an oxygen atom and a sulfur atom in addition to carbon atoms as atoms constituting the ring. In this case, it may be a single ring or a polycyclic ring condensed.
Specific examples of the heteroaryl group include the following groups.
(1) 5-membered heteroaryl group pyrrolyl group such as pyrrol-1-yl group, pyrrol-2-yl group and pyrrol-3-yl group;
Furyl groups such as a furan-2-yl group and a furan-3-yl group;
Thienyl groups such as a thiophen-2-yl group and a thiophen-3-yl group;
Imidazolyl groups such as imidazol-1-yl group, imidazol-2-yl group, imidazol-4-yl group, imidazol-5-yl group;
Pyrazolyl groups such as a pyrazol-1-yl group, a pyrazol-3-yl group, a pyrazol-4-yl group, a pyrazol-5-yl group;
An oxazolyl group such as an oxazol-2-yl group, an oxazol-4-yl group, an oxazol-5-yl group;
Isoxazolyl groups such as isoxazol-3-yl group, isoxazol-4-yl group and isoxazol-5-yl group;
Thiazolyl groups such as thiazol-2-yl group, thiazol-4-yl group, thiazol-5-yl group;
Isothiazolyl groups such as isothiazol-3-yl group, isothiazol-4-yl group, isothiazol-5-yl group;
1,2,3-triazol-1-yl group, 1,2,3-triazol-4-yl group, 1,2,3-triazol-5-yl group, 1,2,4-triazol-1-yl A triazolyl group such as a group, 1,2,4-triazol-3-yl group, 1,2,4-triazol-5-yl group;
Oxadiazolyl groups such as 1,2,4-oxadiazol-3-yl group, 1,2,4-oxadiazol-5-yl group, 1,3,4-oxadiazol-2-yl group;
Thiadiazolyl groups such as 1,2,4-thiadiazol-3-yl group, 1,2,4-thiadiazol-5-yl group, 1,3,4-thiadiazol-2-yl group;
Tetrazolyl groups such as a tetrazol-1-yl group and a tetrazol-2-yl group;
(2)6員環のヘテロアリール基
ピリジン-2-イル基、ピリジン-3-イル基、ピリジン-4-イル基等のピリジル基;
ピラジン-2-イル基、ピラジン-3-イル基等のピラジニル基;
ピリミジン-2-イル基、ピリミジン-4-イル基、ピリミジン-5-イル基等のピリミジル基;
ピリダジン-3-イル基、ピリダジン-4-イル基等のピリダジニル基;
トリアジニル基;
(2) pyridyl groups such as a 6-membered heteroaryl group pyridin-2-yl group, pyridin-3-yl group and pyridin-4-yl group;
Pyrazinyl groups such as a pyrazin-2-yl group and a pyrazin-3-yl group;
Pyrimidyl groups such as a pyrimidin-2-yl group, a pyrimidin-4-yl group, and a pyrimidin-5-yl group;
Pyridazinyl groups such as a pyridazin-3-yl group and a pyridazin-4-yl group;
A triazinyl group;
(3)縮合環のヘテロアリール基
インドール-1-イル基、インドール-2-イル基、インドール-3-イル基、インドール-4-イル基、インドール-5-イル基、インドール-6-イル基、インドール-7-イル基;
ベンゾフラン-2-イル基、ベンゾフラン-3-イル基、ベンゾフラン-4-イル基、ベンゾフラン-5-イル基、ベンゾフラン-6-イル基、ベンゾフラン-7-イル基;
ベンゾチオフェン-2-イル基、ベンゾチオフェン-3-イル基、ベンゾチオフェン-4-イル基、ベンゾチオフェン-5-イル基、ベンゾチオフェン-6-イル基、ベンゾチオフェン-7-イル基;
ベンゾイミダゾール-1-イル基、ベンゾイミダゾール-2-イル基、ベンゾイミダゾール-4-イル基、ベンゾイミダゾール-5-イル基、ベンゾオキサゾール-2-イル基、ベンゾオキサゾール-4-イル基、ベンゾオキサゾール-5-イル基、ベンゾチアゾール-2-イル基、ベンゾチアゾール-4-イル基、ベンゾチアゾール-5-イル基;
キノリン-2-イル基、キノリン-3-イル基、キノリン-4-イル基、キノリン-5-イル基、キノリン-6-イル基、キノリン-7-イル基、キノリン-8-イル基;
(3) Heteroaryl group of fused ring indol-1-yl group, indol-2-yl group, indol-3-yl group, indol-4-yl group, indol-5-yl group, indol-6-yl group Indol-7-yl group;
Benzofuran-2-yl group, benzofuran-3-yl group, benzofuran-4-yl group, benzofuran-5-yl group, benzofuran-6-yl group, benzofuran-7-yl group;
Benzothiophen-2-yl group, benzothiophen-3-yl group, benzothiophen-4-yl group, benzothiophen-5-yl group, benzothiophen-6-yl group, benzothiophen-7-yl group;
Benzimidazol-1-yl group, benzimidazol-2-yl group, benzimidazol-4-yl group, benzimidazol-5-yl group, benzooxazol-2-yl group, benzooxazol-4-yl group, benzoxazole -5-yl group, benzothiazol-2-yl group, benzothiazol-4-yl group, benzothiazol-5-yl group;
Quinolin-2-yl group, quinolin-3-yl group, quinolin-4-yl group, quinolin-5-yl group, quinolin-6-yl group, quinolin-7-yl group, quinolin-8-yl group;
(4)オキソ基を有するヘテロアリール基
2-オキソ-2H-ピラン-3-イル基、2-オキソ-2H-ピラン-4-イル基、6-オキソ-6H-ピラン-3-イル基、6-オキソ-6H-ピラン-2-イル基、2-オキソ-2H-ピリジン-1-イル基、1-アルキル-2-オキソ-1,2-ジヒドロ-ピリジン-3-イル基、1-アルキル-2-オキソ-1,2-ジヒドロ-ピリジン-4-イル基、1-アルキル-6-オキソ-1,6-ジヒドロ-ピリジン-3-イル基、1-アルキル-6-オキソ-1,6-ジヒドロ-ピリジン-2-イル基、クロメン-2-イル基、クロメン-3-イル基、クロメン-4-イル基、クロメン-5-イル基、クロメン-6-イル基、クロメン-7-イル基、クロメン-8-イル基。
(4) Heteroaryl group having an oxo group 2-oxo-2H-pyran-3-yl group, 2-oxo-2H-pyran-4-yl group, 6-oxo-6H-pyran-3-yl group, 6 -Oxo-6H-pyran-2-yl group, 2-oxo-2H-pyridin-1-yl group, 1-alkyl-2-oxo-1,2-dihydro-pyridin-3-yl group, 1-alkyl- 2-oxo-1,2-dihydro-pyridin-4-yl group, 1-alkyl-6-oxo-1,6-dihydro-pyridin-3-yl group, 1-alkyl-6-oxo-1,6- Dihydro-pyridin-2-yl, chromen-2-yl, chromen-3-yl, chromen-4-yl, chromen-5-yl, chromen-6-yl, chromen-7-yl A chromen-8-yl group.
 ヘテロアラルキル基は、ヘテロアリール基で置換されたC1~6アルキル基である。 The heteroaralkyl group is a C1-6 alkyl group substituted with a heteroaryl group.
 ヘテロアリール基で置換されたC1~6アルキル基は、5員環の含窒素ヘテロアリール基で置換されたC1~6アルキル基、または6員環の含窒素ヘテロアリール基で置換されたC1~6アルキル基が好ましい。
 具体的には、ピリジン-2-イルメチル基、ピリジン-3-イルメチル基、ピリジン-4-イルメチル基等のピリジルC1~6アルキル基;ピラゾール-1-イルメチル基、ピラゾール-3-イルメチル基、ピラゾール-4-イルメチル基のピラゾリルC1~6アルキル基;等を挙げることができる。
The C1-6 alkyl group substituted with a heteroaryl group is a C1-6 alkyl group substituted with a 5-membered nitrogen-containing heteroaryl group, or a C1-6 substituted with a 6-membered nitrogen-containing heteroaryl group. Alkyl groups are preferred.
Specifically, pyridyl C1-6 alkyl groups such as pyridin-2-ylmethyl group, pyridin-3-ylmethyl group, pyridin-4-ylmethyl group; pyrazol-1-ylmethyl group, pyrazol-3-ylmethyl group, pyrazole- And a pyrazolyl C1-6 alkyl group of a 4-ylmethyl group.
 当該アラルキル基またはヘテロアラルキル基の置換基となり得る好適な基は、C1~6アルキル基、ハロゲン置換C1~6アルキル基、またはハロゲン原子である。 A suitable group that can be a substituent of the aralkyl group or heteroaralkyl group is a C1-6 alkyl group, a halogen-substituted C1-6 alkyl group, or a halogen atom.
 式(3)中の好ましいQ1は、無置換の若しくは置換基を有するC6~10アリール基または無置換の若しくは置換基を有するヘテロアリール基である。具体的には、無置換の若しくは置換基を有するフェニル基、無置換の若しくは置換基を有するピリジル基等を挙げることができる。当該アリール基またはヘテロアリール基の置換基となり得る好ましい基は、ハロゲン原子である。 Preferred Q 1 in the formula (3) is an unsubstituted or substituted C6-10 aryl group or an unsubstituted or substituted heteroaryl group. Specific examples include an unsubstituted or substituted phenyl group, an unsubstituted or substituted pyridyl group, and the like. A preferred group that can be a substituent of the aryl group or heteroaryl group is a halogen atom.
 式(4)中の好ましいQ1は、無置換の若しくは置換基を有するC1~6アルキル基である。 Preferred Q 1 in the formula (4) is an unsubstituted or substituted C1-6 alkyl group.
 式(5)中の好ましいQ1は、無置換の若しくは置換基を有するアラルキル基(特に好ましくは無置換の若しくは置換基を有するC6~10アリール置換C1~6アルキル基)または無置換の若しくは置換基を有するヘテロアラルキル基(特に好ましくは無置換の若しくは置換基を有するヘテロアリール置換C1~6アルキル基)である。具体的には、無置換の若しくは置換基を有するベンジル基、無置換の若しくは置換基を有するピリジルメチル基等を挙げることができる。当該アラルキル基またはヘテロアラルキル基の置換基となり得る好ましい基は、C1~6アルキル基、ハロゲン置換C1~6アルキル基、またはハロゲン原子である。 Preferred Q 1 in formula (5) is an aralkyl group which is unsubstituted or has a substituent (particularly preferably a C6-10 aryl-substituted C1-6 alkyl group which is unsubstituted or has a substituent) or an unsubstituted or substituted A heteroaralkyl group having a group (particularly preferably, an unsubstituted or substituted heteroaryl-substituted C1-6 alkyl group). Specific examples include an unsubstituted or substituted benzyl group, an unsubstituted or substituted pyridylmethyl group, and the like. A preferred group that can be a substituent of the aralkyl group or heteroaralkyl group is a C1-6 alkyl group, a halogen-substituted C1-6 alkyl group, or a halogen atom.
 式(2)、式(3)、および式(6)中のR7は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。好ましいR7は、C1~6アルキル基である。 R 7 in formula (2), formula (3), and formula (6) is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl Group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or A C6-10 aryl group having a substituent, or an unsubstituted or substituted heteroaryl group. Preferred R 7 is a C1-6 alkyl group.
 式(3)中、R8は、それぞれ独立に、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。Rは、さらに、Q上の炭素原子、または窒素原子と結合してもよい。好ましいR8は、C1~6アルキル基である。 In formula (3), each R 8 independently represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, unsubstituted or substituted. A C2-6 alkynyl group having a group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 An aryl group, or an unsubstituted or substituted heteroaryl group. R 8 may further be bonded to a carbon atom on Q 1 or a nitrogen atom. Preferred R 8 is a C1-6 alkyl group.
 式(5)中、Q41は、C6~10アリール基またはヘテロアリール基である。
 当該アリール基またはヘテロアリール基は式(5)に示すように、Q1および/またはQ2が置換されていてもよい。好ましいQ41は、フェニル基または5員環のヘテロアリール基である。
 好ましい5員環のヘテロアリール基は、5員環の含窒素ヘテロアリール基である。
 具体的には、ピラゾール-1-イル基、ピラゾール-3-イル基、ピラゾール-4-イル基等のピラゾリル基;チアゾール-2-イル基、チアゾール-4-イル基、チアゾール-5-イル基等のチアゾリル基;等を挙げることができる。
In formula (5), Q 41 is a C6-10 aryl group or heteroaryl group.
In the aryl group or heteroaryl group, Q 1 and / or Q 2 may be substituted as shown in Formula (5). Preferred Q 41 is a phenyl group or a 5-membered heteroaryl group.
A preferred 5-membered heteroaryl group is a 5-membered nitrogen-containing heteroaryl group.
Specifically, pyrazolyl groups such as pyrazol-1-yl group, pyrazol-3-yl group, pyrazol-4-yl group; thiazol-2-yl group, thiazol-4-yl group, thiazol-5-yl group And the like.
 式(5)中のQ2は、式:OR23で表される基、式:SR23で表される基、式:N(R232で表される基、式:COR21で表される基、式:CO222で表される基、式:CON(R212で表される基、式:SO222で表される基、シアノ基、ニトロ基、またはハロゲン原子である。
 式:SO222で表される基としては、例えば、メタンスルホニル基、エタンスルホニル基、ベンゼンスルホニル基等を挙げることができる。
Q 2 in the formula (5) is a group represented by the formula: OR 23 , a group represented by the formula: SR 23 , a group represented by the formula: N (R 23 ) 2 , a formula: COR 21 Group represented by the formula: CO 2 R 22 , group represented by the formula: CON (R 21 ) 2 , group represented by the formula: SO 2 R 22 , cyano group, nitro group, or halogen Is an atom.
Examples of the group represented by the formula: SO 2 R 22 include a methanesulfonyl group, an ethanesulfonyl group, and a benzenesulfonyl group.
 m1はQ1の数を表し、0~7のいずれかの整数である。m2はQ2の数を表し、0~7のいずれかの整数である。但し、m1とm2の和は7以下である。
 m1が2以上であるとき、Q1同士は同一でも異なっていてもよい。m2が2以上であるとき、Q2同士は同一でも異なっていてもよい。さらにQ41上で隣り合って置換するQ1同士、Q2同士、またはQ1とQ2同士は互いに結合して5~8員環を形成してもよい。
 5~8員環としては、脂肪族炭化水素環または不飽和ヘテロ環を挙げることができる。
 脂肪族炭化水素環としては、シクロアルケン環があり、シクロアルケン環としてシクロペンテン環、シクロヘキセン環、シクロヘプテン環、シクロオクテン環等を挙げることができる。
 不飽和ヘテロ環としては、ジヒドロ-2H-ピラン環、ジヒドロ-2H-チオピラン環、テトラヒドロピリジン環等を挙げることができる。
m1 represents the number of Q 1 and is an integer from 0 to 7. m2 represents the number of Q 2, is any integer of 0-7. However, the sum of m1 and m2 is 7 or less.
When m1 is 2 or more, Q 1 each other may be the same or different. When m2 is 2 or more, Q 2 to each other may be the same or different. Further, Q 1 , Q 2 , or Q 1 and Q 2 that are adjacently substituted on Q 41 may be bonded to each other to form a 5- to 8-membered ring.
Examples of the 5- to 8-membered ring include an aliphatic hydrocarbon ring and an unsaturated heterocyclic ring.
Examples of the aliphatic hydrocarbon ring include a cycloalkene ring, and examples of the cycloalkene ring include a cyclopentene ring, a cyclohexene ring, a cycloheptene ring, and a cyclooctene ring.
Examples of the unsaturated heterocycle include a dihydro-2H-pyran ring, a dihydro-2H-thiopyran ring, and a tetrahydropyridine ring.
 本発明の含窒素ヘテロアリール誘導体は、好ましくは、式(7)で表される化合物である。さらに好ましくは、式(8)で表される化合物である。 The nitrogen-containing heteroaryl derivative of the present invention is preferably a compound represented by the formula (7). More preferably, it is a compound represented by Formula (8).
2)含窒素ヘテロアリール誘導体の塩、またはN-オキサイド
 本発明は、式(1)で表される含窒素ヘテロアリール誘導体の塩、およびN-オキサイドを包含する。なお、含窒素ヘテロアリール誘導体、含窒素ヘテロアリール誘導体の塩およびN-オキサイドを総称して「本発明化合物」ということがある。
 塩としては、農園芸学的に許容される塩であれば、特に制限されない。例えば、塩酸、硫酸等の無機酸の塩;酢酸、乳酸等の有機酸の塩等を挙げることができる。
 N-オキサイドとしては、上記の式(A-1)~(A-6)で表された部分構造中のいずれかの窒素が酸化された化合物を挙げることができる。
2) Salt of nitrogen-containing heteroaryl derivative or N-oxide The present invention includes a salt of nitrogen-containing heteroaryl derivative represented by the formula (1) and N-oxide. Nitrogen-containing heteroaryl derivatives, salts of nitrogen-containing heteroaryl derivatives and N-oxides are sometimes collectively referred to as “the present compound”.
The salt is not particularly limited as long as it is an agricultural and horticulturally acceptable salt. Examples thereof include salts of inorganic acids such as hydrochloric acid and sulfuric acid; salts of organic acids such as acetic acid and lactic acid.
Examples of N-oxides include compounds in which any nitrogen in the partial structures represented by the above formulas (A-1) to (A-6) is oxidized.
3)製造方法
 次に、本発明化合物の製造方法について説明する。
(I)式(1)中のDが式(2)である場合
 a)式(B-3)で表される化合物(以下、「化合物(B-3)」ということがある。)は、例えば、式(B-2)で表されるオキシアミン化合物(以下、「化合物(B-2)」ということがある。)と、式(B-1)で表されるケトン化合物(以下、「化合物(B-1)」ということがある。)とを反応させることによって、製造することができる。
3) Manufacturing method Next, the manufacturing method of this invention compound is demonstrated.
(I) When D in Formula (1) is Formula (2) a) The compound represented by formula (B-3) (hereinafter sometimes referred to as “compound (B-3)”) is: For example, an oxyamine compound represented by the formula (B-2) (hereinafter sometimes referred to as “compound (B-2)”) and a ketone compound represented by the formula (B-1) (hereinafter referred to as “compound”). (B-1) ”) may be reacted.
Figure JPOXMLDOC01-appb-C000019

(式中、R1、R2、R7、A1、A2、J、X、n、B1~B4、およびQ1は前記と同じ意味である。)
Figure JPOXMLDOC01-appb-C000019

(In the formula, R 1 , R 2 , R 7 , A 1 , A 2 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above.)
 化合物(B-1)の使用量は、化合物(B-2)1モルに対して、通常0.5~2モル、好ましくは0.7~1.5モルである。
 この反応は触媒の不存在下で行うこともできるが、酸触媒または塩基触媒の存在下に行うことが好ましく、酸触媒の存在下に行うことがより好ましい。
The amount of compound (B-1) to be used is generally 0.5 to 2 mol, preferably 0.7 to 1.5 mol, per 1 mol of compound (B-2).
Although this reaction can be performed in the absence of a catalyst, it is preferably performed in the presence of an acid catalyst or a base catalyst, and more preferably in the presence of an acid catalyst.
 酸触媒としては、トリフルオロ酢酸、ベンゼンスルホン酸、p-トルエンスルホン酸、p-トルエンスルホン酸1水和物、メタンスルホン酸、ピリジニウムp-トルエンスルホネート、塩酸、硫酸等を挙げることができる。
 塩基触媒としては、ピリジン、トリエチルアミン、水酸化カリウム等を挙げることができる。
 触媒の使用量は、化合物(B-2)1モルに対して、通常0.0001~1モルである。
 また、該反応系に、無水硫酸ナトリウム、モレキュラーシーブ等の脱水剤を添加してもよい。
Examples of the acid catalyst include trifluoroacetic acid, benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, methanesulfonic acid, pyridinium p-toluenesulfonate, hydrochloric acid, sulfuric acid, and the like.
Examples of the base catalyst include pyridine, triethylamine, potassium hydroxide and the like.
The amount of the catalyst to be used is generally 0.0001-1 mol per 1 mol of compound (B-2).
Further, a dehydrating agent such as anhydrous sodium sulfate or molecular sieve may be added to the reaction system.
 この反応は溶媒中で行うことができる。溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;ジクロロメタン、クロロホルム、四塩化炭素、1,2-ジクロロエタン等のハロゲン化炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;メタノール、エタノール、n-プロパノール等のアルコール系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 溶媒の使用量は、特に限定されないが、化合物(B-2)1gに対して、通常、1~100mlである。
This reaction can be carried out in a solvent. The solvent is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent: Halogenated hydrocarbon solvent such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane; Amide solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone; Examples thereof include nitrile solvents such as acetonitrile and benzonitrile; alcohol solvents such as methanol, ethanol and n-propanol; and mixed solvents composed of two or more of these solvents.
The amount of the solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (B-2).
 反応温度は、室温から用いる溶媒の沸点までの温度範囲である。反応時間は、反応規模にもよるが、通常、数分間~数十時間である。 The reaction temperature is a temperature range from room temperature to the boiling point of the solvent used. The reaction time is usually several minutes to several tens of hours depending on the reaction scale.
 b)化合物(B-2)は、従来公知のオキシアミン化合物の製造方法に準じて製造することができる。例えば、下記に示すように、式(B-2-1)で表される化合物に、四臭化炭素およびトリフェニルホスフィンを反応させて式(B-2-2)で表される化合物を得る。これに、塩基の存在下、N-t-ブトキシカルボニルヒドロキシルアミンを反応させることによって、式(B-2-3)で表されるオキシアミン化合物(以下、「化合物(B-2-3)」ということがある。)を得る。これに酸を作用させることによって、化合物(B-2)を得ることできる。 B) Compound (B-2) can be produced according to a conventionally known method for producing an oxyamine compound. For example, as shown below, the compound represented by the formula (B-2-1) is reacted with carbon tetrabromide and triphenylphosphine to obtain the compound represented by the formula (B-2-2). . This is reacted with Nt-butoxycarbonylhydroxylamine in the presence of a base to give an oxyamine compound represented by the formula (B-2-3) (hereinafter referred to as “compound (B-2-3)”). There are things.) Compound (B-2) can be obtained by reacting this with an acid.
Figure JPOXMLDOC01-appb-C000020

(式中、Q1は前記と同じ意味である。)
Figure JPOXMLDOC01-appb-C000020

(In the formula, Q 1 has the same meaning as described above.)
 また、化合物(B-1)と化合物(B-2-3)とを混合した後、トリフルオロ酢酸などの酸を添加して、同一反応系内で、化合物(B-2-3)から化合物(B-2)への変換と、生成した化合物(B-2)と化合物(B-1)とから化合物(B-3)への合成を行うようにしてもよい。 Further, after mixing the compound (B-1) and the compound (B-2-3), an acid such as trifluoroacetic acid is added, and the compound (B-2-3) to the compound are added in the same reaction system. Conversion to (B-2) and synthesis of compound (B-3) from compound (B-2) and compound (B-1) produced may be performed.
 c)化合物(B-1)のうち、A2がOである化合物(以下、「化合物(B-1:(A2=O))」ということがある。)は、例えば、下記のような反応によって製造することができる。 c) Among the compounds (B-1), a compound in which A 2 is O (hereinafter sometimes referred to as “compound (B-1: (A 2 ═O))”) is, for example, It can be produced by reaction.
Figure JPOXMLDOC01-appb-C000021

(式中、R1、R2、R7、A1、J、X、n、およびB1~B4は前記と同じ意味である。E6は、フッ素原子または塩素原子である。)
Figure JPOXMLDOC01-appb-C000021

(In the formula, R 1 , R 2 , R 7 , A 1 , J, X, n, and B 1 to B 4 have the same meanings as described above. E 6 is a fluorine atom or a chlorine atom.)
 先ず、式(C-1)で表されるジハロゲノ化合物(以下、「化合物(C-1)」ということがある。)に、塩基の存在下、式(C-2)で表される化合物(以下、「化合物(C-2)」ということがある。)を反応させることによって、式(C-3)で表されるヒドロキシカルバミン酸化合物(以下、「化合物(C-3)」ということがある。)を得る。次いで、化合物(C-3)に、塩基の存在下、式(C-4)で表されるアミド化合物(以下、「化合物(C-4)」ということがある。)を反応させることによって、目的とする化合物(B-1:(A2=O))を得ることができる。
 化合物(C-1)との反応に使用する化合物(C-2)の量は、化合物(C-1)1モルに対して、通常0.8~5モル、好ましくは1~3モルである。
First, a dihalogeno compound represented by the formula (C-1) (hereinafter sometimes referred to as “compound (C-1)”) is added to the compound represented by the formula (C-2) in the presence of a base ( Hereinafter, by reacting with “compound (C-2)”), the hydroxycarbamic acid compound represented by formula (C-3) (hereinafter referred to as “compound (C-3)”). There is.) Next, by reacting the compound (C-3) with an amide compound represented by the formula (C-4) (hereinafter sometimes referred to as “compound (C-4)”) in the presence of a base, The target compound (B-1: (A 2 ═O)) can be obtained.
The amount of compound (C-2) used for the reaction with compound (C-1) is usually 0.8 to 5 mol, preferably 1 to 3 mol, relative to 1 mol of compound (C-1). .
 化合物(C-1)と化合物(C-2)との反応に用いる塩基としては、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、水酸化カルシウム等の金属水酸化物;ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、カリウムエトキシド、カリウムt-ブトキシド等の金属アルコキシド;水素化ナトリウム、水素化カリウム、水素化カルシウム等の金属水素化物;トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、1,8-ジアザビシクロ[5.4.0]ウンデセ-7-エン(DBU)、1,4-ジアザビシクロ[2.2.2]オクタン等の有機塩基;を挙げることができる。化合物(C-1)と化合物(C-2)との反応に用いる塩基の量は、化合物(C-1)1モルに対して、通常1~20モルである。 Examples of the base used for the reaction between the compound (C-1) and the compound (C-2) include metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide and calcium hydroxide; sodium methoxy Metal alkoxides such as sodium ethoxide, potassium methoxide, potassium ethoxide, potassium t-butoxide; metal hydrides such as sodium hydride, potassium hydride, calcium hydride; triethylamine, diisopropylethylamine, pyridine, 1,8 And organic bases such as diazabicyclo [5.4.0] undec-7-ene (DBU) and 1,4-diazabicyclo [2.2.2] octane. The amount of the base used for the reaction between the compound (C-1) and the compound (C-2) is usually 1 to 20 mol with respect to 1 mol of the compound (C-1).
 化合物(C-1)と化合物(C-2)との反応は、有機溶媒中で行うことができる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジメチルスルホキシド、ジエチルスルホキシド等の含硫黄系溶媒;ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、化合物(C-1)1gに対して、通常、1~100mlである。
 化合物(C-1)と化合物(C-2)との反応は、0℃から用いる溶媒の沸点までの温度範囲で円滑に進行する。
The reaction of compound (C-1) and compound (C-2) can be carried out in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. For example, sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide; ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; n-pentane, n- Aliphatic hydrocarbon solvents such as hexane and n-heptane; amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide and N-methylpyrrolidone; nitrile solvents such as acetonitrile and benzonitrile; And a mixed solvent composed of two or more of these;
The amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (C-1).
The reaction between the compound (C-1) and the compound (C-2) proceeds smoothly in a temperature range from 0 ° C. to the boiling point of the solvent used.
 化合物(C-3)との反応に用いられる化合物(C-4)としては、N,N-ジメチルアセタミド、N,N-ジメチルプロピオンアミド等を挙げることができる。
 化合物(C-4)の使用量は、化合物(C-3)1モルに対して、通常0.8~5モル、好ましくは1~3モルである。
Examples of the compound (C-4) used for the reaction with the compound (C-3) include N, N-dimethylacetamide, N, N-dimethylpropionamide and the like.
The amount of compound (C-4) to be used is generally 0.8 to 5 mol, preferably 1 to 3 mol, per 1 mol of compound (C-3).
 化合物(C-3)と化合物(C-4)との反応に用いる塩基としては、n-ブチルリチウム、sec-ブチルリチウム、t-ブチルリチウム、リチウムジイソプロピルアミド等の有機リチウム化合物;金属ナトリウム、金属カリウム等のアルカリ金属;水素化ナトリウム、水素化カリウム、水素化カルシウム等の金属水素化物;等を挙げることができる。
 化合物(C-3)と化合物(C-4)との反応に用いる塩基の量は、化合物(C-3)1モルに対して、通常1~20モルである。
Examples of the base used in the reaction between the compound (C-3) and the compound (C-4) include organolithium compounds such as n-butyllithium, sec-butyllithium, t-butyllithium, and lithium diisopropylamide; sodium metal, metal Examples thereof include alkali metals such as potassium; metal hydrides such as sodium hydride, potassium hydride and calcium hydride;
The amount of the base used for the reaction between the compound (C-3) and the compound (C-4) is usually 1 to 20 mol with respect to 1 mol of the compound (C-3).
 化合物(C-3)と化合物(C-4)との反応は、有機溶媒中で行うことができる。用いる溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;等を挙げることができる。
 化合物(C-3)と化合物(C-4)との反応は、-100℃から用いる溶媒の沸点までの温度範囲で円滑に進行する。
The reaction of compound (C-3) and compound (C-4) can be carried out in an organic solvent. The solvent used is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent; and the like.
The reaction between the compound (C-3) and the compound (C-4) proceeds smoothly in a temperature range from −100 ° C. to the boiling point of the solvent used.
 d)化合物(B-1:(A2=O))のうち、R1がt-ブチル基で、R2が水素原子で、A1およびJが酸素原子である化合物(以下「化合物(B-1-1:(A2=O))」ということがある。)は、下記に示すような方法で、R1を変換することによって、得ることができる。下記の式ではt-ブチル基から他の基R1’に変換される反応を示している。 d) Among the compounds (B-1: (A 2 ═O)), R 1 is a t-butyl group, R 2 is a hydrogen atom, and A 1 and J are oxygen atoms (hereinafter referred to as “compound (B -1-1: (A 2 ═O)) ”) can be obtained by converting R 1 by the method shown below. The following formula shows a reaction in which a t-butyl group is converted to another group R 1 ′ .
Figure JPOXMLDOC01-appb-C000022

(式中、R1、R7、X、n、およびB1~B4は前記と同じ意味である。R1’は、t-ブチル基を除くR1である。)
Figure JPOXMLDOC01-appb-C000022

(Wherein R 1 , R 7 , X, n, and B 1 to B 4 have the same meaning as described above. R 1 ′ is R 1 excluding the t-butyl group.)
 先ず、化合物(B-1-1:(A2=O))に、塩基の存在下、式(B-1-2)で表されるハロゲノギ酸エステル化合物(以下、「エステル化合物(B-1-2)」ということがある。)を反応させて、式(B-1-3:(A2=O))で表される化合物(以下、「化合物(B-1-3:(A2=O))」ということがある。)を得る。次いで、これに酸を作用させることにより、式(B-1-4:(A2=O))で表される化合物(以下、「化合物(B-1-4:(A2=O))」ということがある。)を得ることができる。 First, a compound (B-1-1: (A 2 ═O)) is added to a halogenoformate compound represented by the formula (B-1-2) in the presence of a base (hereinafter referred to as “ester compound (B-1)”. -2) ”) and a compound represented by the formula (B-1-3: (A 2 ═O)) (hereinafter“ compound (B-1-3: (A 2) = O)) ". Next, an acid is allowed to act on the compound, whereby a compound represented by the formula (B-1-4: (A 2 ═O)) (hereinafter referred to as “compound (B-1-4: (A 2 ═O))”) Can be obtained.)
 化合物(B-1-1:(A2=O))とエステル化合物(B-1-2)との反応に用いる塩基としては、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化マグネシウム、水酸化カルシウム等の金属水酸化物;ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、カリウムエトキシド、カリウムt-ブトキシド等の金属アルコキシド;水素化ナトリウム、水素化カリウム、水素化カルシウム等の金属水素化物;トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、1,8-ジアザビシクロ[5.4.0]ウンデセ-7-エン(DBU)、1,4-ジアザビシクロ[2.2.2]オクタン等の有機塩基;を挙げることができる。
 塩基の使用量は、化合物(B-1-1:(A2=O))1モルに対して、通常1~20モルである。
Examples of the base used for the reaction of the compound (B-1-1: (A 2 ═O)) and the ester compound (B-1-2) include lithium hydroxide, sodium hydroxide, potassium hydroxide, magnesium hydroxide, Metal hydroxide such as calcium hydroxide; metal alkoxide such as sodium methoxide, sodium ethoxide, potassium methoxide, potassium ethoxide, potassium t-butoxide; metal hydrogen such as sodium hydride, potassium hydride, calcium hydride Organic bases such as triethylamine, diisopropylethylamine, pyridine, 1,8-diazabicyclo [5.4.0] undec-7-ene (DBU), 1,4-diazabicyclo [2.2.2] octane; be able to.
The amount of the base to be used is generally 1 to 20 mol per 1 mol of compound (B-1-1: (A 2 ═O)).
 化合物(B-1-1:(A2=O))とエステル化合物(B-1-2)との反応は、有機溶媒中で行われる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。例えば、塩化メチレン、クロロホルム、四塩化炭素、1,2-ジクロロエタンなどのハロゲン化炭化水素;ジメチルスルホキシド、ジエチルスルホキシド等の含硫黄系溶媒;ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、化合物(B-1-1:(A2=O))1gに対して、通常、1~100mlである。
 当該反応は、-20℃から用いる溶媒の沸点までの温度範囲で円滑に進行する。反応時間は、反応規模にもよるが、通常、数分間から数十時間である。
The reaction of the compound (B-1-1: (A 2 ═O)) and the ester compound (B-1-2) is performed in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. For example, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane; sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide; ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran Aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbon solvents such as n-pentane, n-hexane and n-heptane; N, N-dimethylformamide, N, N-dimethylacetamide Amide solvents such as N-methylpyrrolidone; nitrile solvents such as acetonitrile and benzonitrile; and mixed solvents composed of two or more of these solvents.
The amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the compound (B-1-1: (A 2 ═O)).
The reaction proceeds smoothly in a temperature range from −20 ° C. to the boiling point of the solvent used. Although the reaction time depends on the reaction scale, it is usually from several minutes to several tens of hours.
 化合物(B-1-3:(A2=O))から化合物(B-1-4:(A2=O))にするための反応に用いる酸としては、塩酸、硫酸、硝酸などの無機酸;酢酸、トリフルオロ酢酸、メタンスルホン酸、p-トルエンスルホン酸などを挙げることができる。
 酸の使用量は、化合物(B-1-3:(A2=O))1モルに対して、通常1~20モルである。
 この反応は、有機溶媒中で行われる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。前記化合物(B-1-1:(A2=O))とエステル化合物(B-1-2)との反応に用いることができる溶媒として列記したものと同様のものを挙げることができる。
 化合物(B-1-3:(A2=O))から化合物(B-1-4:(A2=O))にするための反応は、-20℃から用いる溶媒の沸点までの温度範囲で円滑に進行する。反応時間は、反応規模にもよるが、通常、数分間から数十時間である。
Examples of the acid used in the reaction for converting the compound (B-1-3: (A 2 ═O)) into the compound (B-1-4: (A 2 ═O)) include inorganic substances such as hydrochloric acid, sulfuric acid, and nitric acid. Examples of the acid include acetic acid, trifluoroacetic acid, methanesulfonic acid, and p-toluenesulfonic acid.
The amount of the acid to be used is generally 1 to 20 mol per 1 mol of compound (B-1-3: (A 2 ═O)).
This reaction is performed in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. Examples of the solvent that can be used in the reaction of the compound (B-1-1: (A 2 ═O)) and the ester compound (B-1-2) are the same as those listed.
The reaction for converting the compound (B-1-3: (A 2 ═O)) to the compound (B-1-4: (A 2 ═O)) is performed at a temperature range from −20 ° C. to the boiling point of the solvent used. Proceed smoothly. Although the reaction time depends on the reaction scale, it is usually from several minutes to several tens of hours.
(II)式(1)中のDが式(3)である場合
 a)式(B-6)で表される化合物(以下、「化合物(B-6)」ということがある。)は、例えば、式(B-5)で表されるヒドラジン化合物(以下、「化合物(B-5)」ということがある。)と、化合物(B-1)とを反応させることによって、製造することができる。
 化合物(B-1)の使用量は、化合物(B-5)1モルに対して、通常0.5~2モル、好ましくは0.7~1.5モルである。
(II) When D in Formula (1) is Formula (3) a) The compound represented by formula (B-6) (hereinafter sometimes referred to as “compound (B-6)”) is: For example, it can be produced by reacting a hydrazine compound represented by formula (B-5) (hereinafter sometimes referred to as “compound (B-5)”) with compound (B-1). it can.
The amount of compound (B-1) to be used is generally 0.5 to 2 mol, preferably 0.7 to 1.5 mol, per 1 mol of compound (B-5).
Figure JPOXMLDOC01-appb-C000023
(式中、R1、R2、R、R8、A1、A2、J、X、n、B1~B4、およびQ1は前記と同じ意味である。)
Figure JPOXMLDOC01-appb-C000023
(In the formula, R 1 , R 2 , R 7 , R 8 , A 1 , A 2 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above.)
 化合物(B-1)と化合物(B-5)との反応は、酸触媒または塩基触媒の存在下に行うことが好ましく、酸触媒の存在下に行うことがより好ましい。
 用いる酸触媒としては、ベンゼンスルホン酸、p-トルエンスルホン酸、p-トルエンスルホン酸1水和物、メタンスルホン酸、ピリジニウムp-トルエンスルホネート、塩酸、硫酸などを挙げることができる。
 塩基触媒としては、ピリジン、トリエチルアミン、水酸化カリウムなどを挙げることができる。
 触媒の使用量は、化合物(B-5)1モルに対して、通常0.0001~1モルである。
 また、反応系に無水硫酸ナトリウムなどの脱水剤を添加してもよい。
The reaction between the compound (B-1) and the compound (B-5) is preferably performed in the presence of an acid catalyst or a base catalyst, and more preferably performed in the presence of an acid catalyst.
Examples of the acid catalyst used include benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, methanesulfonic acid, pyridinium p-toluenesulfonate, hydrochloric acid, sulfuric acid and the like.
Examples of the base catalyst include pyridine, triethylamine, potassium hydroxide and the like.
The amount of the catalyst to be used is generally 0.0001-1 mol per 1 mol of compound (B-5).
Further, a dehydrating agent such as anhydrous sodium sulfate may be added to the reaction system.
 この反応は溶媒の中で行うことができる。用いる溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフランなどのエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタンなどの脂肪族炭化水素系溶媒;ジクロロメタン、クロロホルム、四塩化炭素、1,2-ジクロロエタン等のハロゲン化炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドンなどのアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;メタノール、エタノール、n-プロパノールなどのアルコール系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 溶媒の使用量は、特に限定されないが、化合物(B-5)1gに対して、通常、1~100mlである。
 反応温度は、室温から用いる溶媒の沸点までの温度範囲である。反応時間は、通常数分間から数十時間である。
This reaction can be carried out in a solvent. The solvent used is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent: Halogenated hydrocarbon solvent such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane; Amide solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone; Examples thereof include nitrile solvents such as acetonitrile and benzonitrile; alcohol solvents such as methanol, ethanol and n-propanol; and mixed solvents composed of two or more of these.
The amount of the solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (B-5).
The reaction temperature is a temperature range from room temperature to the boiling point of the solvent used. The reaction time is usually several minutes to several tens of hours.
 b)化合物(B-5)は、例えば、下記に示すように、式(B-5-1)で表されるケトン化合物に、ヒドラジン(またはヒドラジン一水和物)を反応させることによって、得ることができる。 b) Compound (B-5) is obtained, for example, by reacting a ketone compound represented by formula (B-5-1) with hydrazine (or hydrazine monohydrate) as shown below. be able to.
Figure JPOXMLDOC01-appb-C000024

(式中、R8、およびQ1は前記と同じ意味である。)
Figure JPOXMLDOC01-appb-C000024

(Wherein R 8 and Q 1 have the same meaning as described above.)
(III)式(1)中のDが式(4)であり、A2がOである場合
 a)式(B-9:(A=O))で表される化合物(以下、「化合物(B-9:(A2=O))」ということがある。)は、例えば、式(D-1)で表されるハロゲノ化合物(以下、「化合物(D-1)」ということがある。)に、塩基の存在下、化合物(C-2)を反応させることによって、製造することができる。
(III) When D in Formula (1) is Formula (4) and A 2 is O a) Compound represented by Formula (B-9: (A 2 ═O)) (hereinafter referred to as “compound”) (B-9: (A 2 ═O)) ”is sometimes referred to as a halogeno compound represented by the formula (D-1) (hereinafter, referred to as“ compound (D-1) ”). To the compound (C-2) in the presence of a base.
Figure JPOXMLDOC01-appb-C000025

(式中、R1、R2、A1、J、X、n、B1~B4、およびQ1は前記と同じ意味である。E6は、フッ素原子または塩素原子である。)
Figure JPOXMLDOC01-appb-C000025

(In the formula, R 1 , R 2 , A 1 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above. E 6 is a fluorine atom or a chlorine atom.)
 化合物(D-1)と化合物(C-2)とを反応させる方法は、上記の化合物(C-1)と化合物(C-2)とを反応させる方法と同様の方法を用いることができる。 As a method of reacting compound (D-1) and compound (C-2), the same method as the method of reacting compound (C-1) and compound (C-2) can be used.
 b)化合物(D-1)は、例えば、下記に示すように、化合物(C-1)と、式(D-1-1)で表されるアセチレン化合物(以下、「アセチレン化合物(D-1-1)」ということがある。)とを反応させることによって、得ることができる。
 アセチレン化合物(D-1-1)の使用量は、化合物(C-1)1モルに対して、通常1~2モルである。
b) Compound (D-1) includes, for example, compound (C-1) and an acetylene compound represented by formula (D-1-1) (hereinafter referred to as “acetylene compound (D-1)” as shown below. -1) ").) Can be obtained.
The amount of the acetylene compound (D-1-1) to be used is generally 1 to 2 mol per 1 mol of the compound (C-1).
Figure JPOXMLDOC01-appb-C000026

(式中、X、n、B1~B4、およびQ1は前記と同じ意味である。E6は、フッ素原子または塩素原子である。)
Figure JPOXMLDOC01-appb-C000026

(In the formula, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above. E 6 represents a fluorine atom or a chlorine atom.)
 この反応は、園頭反応と呼ばれるカップリング反応である。この反応には、通常、Pd錯体が用いられる。
 Pd錯体としては、酢酸パラジウム(II)、ジクロロビス(トリフェニルホスフィン)パラジウム(II)、テトラキス(トリフェニルホスフィン)パラジウム(0)またはトリス(ジベンジリデンアセトン)ジパラジウム(0)等を挙げることができる。
 Pd錯体の使用量は、化合物(C-1)1モルに対して、通常0.01~0.5モルである。
This reaction is a coupling reaction called the Sonogashira reaction. A Pd complex is usually used for this reaction.
Examples of the Pd complex include palladium (II) acetate, dichlorobis (triphenylphosphine) palladium (II), tetrakis (triphenylphosphine) palladium (0), tris (dibenzylideneacetone) dipalladium (0), and the like. .
The amount of the Pd complex to be used is generally 0.01-0.5 mol per 1 mol of compound (C-1).
 該反応には、さらに、ハロゲン化銅が触媒として用いられる。ハロゲン化銅としては、フッ化第1銅、塩化第1銅、臭化第1銅、ヨウ化第1銅のような1価のハロゲン化銅や、塩化第2銅、臭化第2銅、ヨウ化第2銅のような2価のハロゲン化銅等を挙げることができる。
 ハロゲン化銅の使用量は、化合物(C-1)1モルに対して、通常0.1~1モルである。
In the reaction, copper halide is further used as a catalyst. Examples of the copper halide include monovalent copper halides such as cuprous fluoride, cuprous chloride, cuprous bromide, cuprous iodide, cupric chloride, cupric bromide, Examples thereof include divalent copper halides such as cupric iodide.
The amount of copper halide to be used is generally 0.1-1 mol per 1 mol of compound (C-1).
 該反応には、さらに、塩基が用いられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化カルシウム、水酸化バリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素カリウム、炭酸水素ナトリウム、炭酸セシウム、リン酸カリウム等の無機塩基、またはトリエチルアミン、ピリジン、ピペリジン等のアミン類を挙げることができる。
 塩基の使用量は、化合物(C-1)1モルに対して、通常1~10モルである。
In the reaction, a base is further used. Examples of the base include sodium hydroxide, potassium hydroxide, calcium hydroxide, barium hydroxide, sodium carbonate, potassium carbonate, potassium hydrogen carbonate, sodium hydrogen carbonate, cesium carbonate, potassium phosphate and other inorganic bases, or triethylamine, pyridine, Examples include amines such as piperidine.
The amount of the base to be used is generally 1 to 10 mol per 1 mol of compound (C-1).
 この反応は、有機溶媒中で行うことができる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、化合物(C-1)1gに対して、通常、1~100mlである。
This reaction can be carried out in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvents; Amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone; Nitrile solvents such as acetonitrile and benzonitrile; and mixed solvents composed of two or more of these; etc. Can be mentioned.
The amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (C-1).
 反応温度はカップリング反応を完結させるのに足りる温度とすべきであり、通常、室温~100℃である。反応時間は、通常、数分間から数十時間である。反応は好ましくは不活性ガス雰囲気下で行う。 The reaction temperature should be a temperature sufficient to complete the coupling reaction, and is usually room temperature to 100 ° C. The reaction time is usually several minutes to several tens of hours. The reaction is preferably carried out in an inert gas atmosphere.
(IV)式(1)中のDが式(5)であり、A2がOである場合
 a)式(B-12:(A=O))で表される化合物(以下、「化合物(B-12:(A2=O))」ということがある。)は、例えば、式(E-1)で表されるハロゲノ化合物(以下、「化合物(E-1)」ということがある。)に、塩基の存在下、化合物(C-2)を反応させることによって、製造することができる。
 化合物(E-1)と化合物(C-2)とを反応させる方法は、上記の化合物(C-1)と化合物(C-2)とを反応させる方法と同様の方法を用いることができる。
(IV) When D in Formula (1) is Formula (5) and A 2 is O a) Compound represented by Formula (B-12: (A 2 ═O)) (hereinafter “compound” (B-12: (A 2 ═O)) ”is sometimes referred to as a halogeno compound represented by the formula (E-1) (hereinafter referred to as“ compound (E-1) ”). To the compound (C-2) in the presence of a base.
As a method of reacting compound (E-1) and compound (C-2), the same method as the method of reacting compound (C-1) and compound (C-2) can be used.
Figure JPOXMLDOC01-appb-C000027

(式中、R1、R2、A1、J、X、n、B1~B4、Q41、Q1、m1、Q2、およびm2は、前記と同じ意味である。E6は、フッ素原子または塩素原子である。)
Figure JPOXMLDOC01-appb-C000027

(Wherein R 1 , R 2 , A 1 , J, X, n, B 1 to B 4 , Q 41 , Q 1 , m 1, Q 2 , and m 2 have the same meanings as described above. E 6 represents , Fluorine atom or chlorine atom.)
 b)化合物(E-1)は、例えば、下記に示すように、化合物(C-1)に、式(E-1-1)で表されるボロン酸化合物(以下、「ボロン酸化合物(E-1-1)ということがある。」を反応させることにより得ることができる。ボロン酸化合物(E-1-1)の使用量は、化合物(C-1)1モルに対して、通常1~2モルである。 b) For example, as shown below, the compound (E-1) is obtained by adding a boronic acid compound represented by the formula (E-1-1) to the compound (C-1) (hereinafter referred to as “boronic acid compound (E -1-1) ”. The amount of the boronic acid compound (E-1-1) used is usually 1 with respect to 1 mol of the compound (C-1). ~ 2 moles.
Figure JPOXMLDOC01-appb-C000028

(式中、X、n、B1~B4、Q41、Q1、m1、Q2、およびm2は、前記と同じ意味である。
6は、フッ素原子または塩素原子である。)
Figure JPOXMLDOC01-appb-C000028

(Wherein, X, n, B 1 to B 4 , Q 41 , Q 1 , m 1, Q 2 , and m 2 have the same meaning as described above.
E 6 is a fluorine atom or a chlorine atom. )
 化合物(C-1)とボロン酸化合物(E-1-1)との反応は、鈴木-宮浦反応と呼ばれるカップリング反応である。この反応にはPd触媒が用いられる。
 反応に用いるPd触媒としては、テトラキス(トリフェニルホスフィン)パラジウム(0)、ビス(トリフェニルホスフィン)パラジウムジクロライド(II)、「1,1’-ビス(ジフェニルホスフィノ)フェロセン]パラジウムジクロライド、トリス(ジベンジリデンアセトン)ジパラジウム(0)、酢酸パラジウム(II)、塩化パラジウム、パラジウム炭素等のPd触媒を挙げることができる。
 Pd触媒の使用量は、化合物(C-1)1モルに対して、通常0.01~0.5モルである。
The reaction between the compound (C-1) and the boronic acid compound (E-1-1) is a coupling reaction called the Suzuki-Miyaura reaction. A Pd catalyst is used for this reaction.
Examples of the Pd catalyst used in the reaction include tetrakis (triphenylphosphine) palladium (0), bis (triphenylphosphine) palladium dichloride (II), “1,1′-bis (diphenylphosphino) ferrocene] palladium dichloride, tris ( Pd catalysts such as dibenzylideneacetone) dipalladium (0), palladium (II) acetate, palladium chloride, palladium carbon and the like can be mentioned.
The amount of the Pd catalyst to be used is generally 0.01-0.5 mol per 1 mol of compound (C-1).
 この反応には、さらに、塩基が用いられる。塩基としては、炭酸ナトリウム、炭酸カリウム、水酸化ナトリウム、フッ化セシウム等の水和もしくは非水の塩基を挙げることができる。
 塩基の使用量は、化合物(C-1)1モルに対して、通常1~10モルである。
In this reaction, a base is further used. Examples of the base include hydrated or non-aqueous bases such as sodium carbonate, potassium carbonate, sodium hydroxide and cesium fluoride.
The amount of the base to be used is generally 1 to 10 mol per 1 mol of compound (C-1).
 この反応は、有機溶媒中で行うことができる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、化合物(C-1)1gに対して、通常、1~100mlである。
This reaction can be carried out in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvents; Amide solvents such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone; Nitrile solvents such as acetonitrile and benzonitrile; and mixed solvents composed of two or more of these; etc. Can be mentioned.
The amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (C-1).
 反応温度はカップリング反応を完結させるのに足りる温度とすべきであり、室温~150℃である。反応時間は、通常数分間から数十時間である。反応は好ましくは不活性ガス雰囲気下で行う。 The reaction temperature should be a temperature that is sufficient to complete the coupling reaction, and is room temperature to 150 ° C. The reaction time is usually several minutes to several tens of hours. The reaction is preferably carried out in an inert gas atmosphere.
(V)式(1)中のDが式(6)である場合
 a)式(B-13)で表される化合物(以下、「化合物(B-13)」ということがある。)は、例えば、式(B-14)で表されるオキシアミン化合物(以下、「化合物(B-14)」ということがある。)と、式(F-1)で表されるケトン化合物(以下、「化合物(F-1)」ということがある。)とを反応させることによって、製造することができる。
(V) When D in Formula (1) is Formula (6) a) The compound represented by formula (B-13) (hereinafter sometimes referred to as “compound (B-13)”) is: For example, an oxyamine compound represented by formula (B-14) (hereinafter sometimes referred to as “compound (B-14)”) and a ketone compound represented by formula (F-1) (hereinafter referred to as “compound”). (F-1) ”) may be reacted.
Figure JPOXMLDOC01-appb-C000029

(式中、R1、R2、R7、R、A1、A2、J、X、n、B1~B4、およびQ1は前記と同じ意味である。)
Figure JPOXMLDOC01-appb-C000029

(In the formula, R 1 , R 2 , R 7 , R 8 , A 1 , A 2 , J, X, n, B 1 to B 4 , and Q 1 have the same meanings as described above.)
 化合物(B-14)の使用量は、化合物(F-1)1モルに対して、通常0.5~2モル、好ましくは0.7~1.5モルである。
 この反応は触媒の不存在下で行うこともできるが、酸触媒または塩基触媒の存在下に行うことが好ましく、酸触媒の存在下に行うことがより好ましい。
The amount of compound (B-14) to be used is generally 0.5 to 2 mol, preferably 0.7 to 1.5 mol, per 1 mol of compound (F-1).
Although this reaction can be performed in the absence of a catalyst, it is preferably performed in the presence of an acid catalyst or a base catalyst, and more preferably in the presence of an acid catalyst.
 酸触媒としては、トリフルオロ酢酸、ベンゼンスルホン酸、p-トルエンスルホン酸、p-トルエンスルホン酸1水和物、メタンスルホン酸、ピリジニウムp-トルエンスルホネート、塩酸、硫酸等を挙げることができる。
 塩基触媒としては、ピリジン、トリエチルアミン、水酸化カリウム等を挙げることができる。
 触媒の使用量は、化合物(F-1)1モルに対して、通常0.0001~1モルである。
 また、該反応系に、無水硫酸ナトリウム、モレキュラーシーブ等の脱水剤を添加してもよい。
Examples of the acid catalyst include trifluoroacetic acid, benzenesulfonic acid, p-toluenesulfonic acid, p-toluenesulfonic acid monohydrate, methanesulfonic acid, pyridinium p-toluenesulfonate, hydrochloric acid, sulfuric acid, and the like.
Examples of the base catalyst include pyridine, triethylamine, potassium hydroxide and the like.
The amount of the catalyst to be used is generally 0.0001-1 mol per 1 mol of compound (F-1).
Further, a dehydrating agent such as anhydrous sodium sulfate or molecular sieve may be added to the reaction system.
 この反応は溶媒中で行うことができる。溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;ジクロロメタン、クロロホルム、四塩化炭素、1,2-ジクロロエタン等のハロゲン化炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;メタノール、エタノール、n-プロパノール等のアルコール系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 溶媒の使用量は、特に限定されないが、化合物(B-14)1gに対して、通常、1~100mlである。
This reaction can be carried out in a solvent. The solvent is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent: Halogenated hydrocarbon solvent such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane; Amide solvent such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone; Examples thereof include nitrile solvents such as acetonitrile and benzonitrile; alcohol solvents such as methanol, ethanol and n-propanol; and mixed solvents composed of two or more of these solvents.
The amount of the solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of compound (B-14).
 反応温度は、室温から用いる溶媒の沸点までの温度範囲である。反応時間は、反応規模にもよるが、通常、数分間~数十時間である。 The reaction temperature is a temperature range from room temperature to the boiling point of the solvent used. The reaction time is usually several minutes to several tens of hours depending on the reaction scale.
 b)化合物(B-14)のうち、A2がOである化合物(以下、「化合物(B-14:(A2=O))」ということがある。)は、例えば、下記のような反応によって製造することができる。 b) Among compounds (B-14), a compound in which A 2 is O (hereinafter sometimes referred to as “compound (B-14: (A 2 ═O))”) is, for example, It can be produced by reaction.
Figure JPOXMLDOC01-appb-C000030

(式中、R1、R2、R7、A1、J、X、n、およびB1~B4は前記と同じ意味である。E7は、塩素原子、または臭素原子である。)
Figure JPOXMLDOC01-appb-C000030

(In the formula, R 1 , R 2 , R 7 , A 1 , J, X, n, and B 1 to B 4 have the same meaning as above. E 7 is a chlorine atom or a bromine atom.)
 先ず、化合物(B-1:(A=O))に、公知のヒドリド還元剤を用いて、カルボニル基を、水酸基に還元し、その後、ハロゲン化剤を用いて、ハロゲン化することで、式(B-14-1:(A2=O))で表される化合物(以下、「化合物(B-14-1:(A2=O))」ということがある。)を得ることができる。 First, the compound (B-1: (A 2 ═O)) is reduced to a hydroxyl group using a known hydride reducing agent, and then halogenated using a halogenating agent. A compound represented by the formula (B-14-1: (A 2 ═O)) (hereinafter sometimes referred to as “compound (B-14-1: (A 2 ═O))”) can be obtained. it can.
 還元反応に用いるヒドリド還元剤としては、水素化ホウ素ナトリウム、シアノ水素化ホウ素ナトリウム、水素化トリエチルホウ素リチウム、水素化トリ(sec-ブチル)ホウ素リチウム、水素化トリ(sec-ブチル)ホウ素カリウム、水素化ホウ素リチウム、水素化ホウ素亜鉛、アセトキシ水素化ホウ素ナトリウム、水素化アルミニウムリチウム、水素化ビス(2-メトキシエトキシ)アルミニウムナトリウム等を挙げることができる。
 還元反応に用いるヒドリド還元剤の量は、化合物(B-1:(A=O))1モルに対して、通常0.25~2モルである。
Examples of the hydride reducing agent used in the reduction reaction include sodium borohydride, sodium cyanoborohydride, lithium triethylborohydride, lithium tri (sec-butyl) borohydride, potassium tri (sec-butyl) borohydride, hydrogen Examples thereof include lithium borohydride, zinc borohydride, sodium acetoxyborohydride, lithium aluminum hydride, sodium bis (2-methoxyethoxy) aluminum hydride, and the like.
The amount of the hydride reducing agent used for the reduction reaction is usually 0.25 to 2 mol per 1 mol of the compound (B-1: (A 2 ═O)).
 還元反応は、有機溶媒中で行うことができる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、原料1gに対して、通常、1~100mlである。
 還元反応は、-20℃から用いる溶媒の沸点までの温度範囲で円滑に進行する。
The reduction reaction can be performed in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent; and a mixed solvent composed of two or more of these solvents; and the like.
The amount of the organic solvent used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the raw material.
The reduction reaction proceeds smoothly in the temperature range from −20 ° C. to the boiling point of the solvent used.
 ハロゲン化反応に用いるハロゲン化剤は、オキザリルハライド、チオニルハライド、四臭化炭素とトリフェニルホスフィンの混合試薬;等を挙げることができる。
 ハロゲン化反応に用いるハロゲン化剤の量は、原料1モルに対して、通常0.8~5モル、好ましくは1~3モルである。
Examples of the halogenating agent used in the halogenation reaction include oxalyl halide, thionyl halide, a mixed reagent of carbon tetrabromide and triphenylphosphine;
The amount of the halogenating agent used in the halogenation reaction is usually 0.8 to 5 mol, preferably 1 to 3 mol, relative to 1 mol of the raw material.
 ハロゲン化反応は、有機溶媒中で行うことができる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。例えば、ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、原料1gに対して、通常、1~100mlである。ハロゲン化反応は、室温から用いる溶媒の沸点までの温度範囲で円滑に進行する。
The halogenation reaction can be performed in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. For example, ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran; aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbons such as n-pentane, n-hexane and n-heptane Solvent; and a mixed solvent composed of two or more of these solvents; and the like.
The amount of the organic solvent used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the raw material. The halogenation reaction proceeds smoothly in a temperature range from room temperature to the boiling point of the solvent used.
 c)次に、化合物(B-14-1:(A2=O))に、塩基存在下、N-ヒドロキシフタルイミドを、反応させて、式(B-14-2:(A2=O))で表される化合物(以下、「化合物(B-14-2:(A2=O))」ということがある。)を得ることができる。 c) Next, the compound (B-14-1: (A 2 ═O)) is reacted with N-hydroxyphthalimide in the presence of a base to obtain a compound of formula (B-14-2: (A 2 ═O)). ) (Hereinafter sometimes referred to as “compound (B-14-2: (A 2 ═O))”).
 反応に用いる塩基としては、金属ナトリウム、金属カリウム等のアルカリ金属;水素化ナトリウム、水素化カリウム、水素化カルシウム等の金属水素化物;等を挙げることができる。
 用いるN-ヒドロキシフタルイミドの量は、化合物(B-14-1:(A2=O))1モルに対して、通常1~5モルである。用いる塩基の量は、化合物(B-14-1:(A2=O))1モルに対して、通常1~20モルである。
Examples of the base used in the reaction include alkali metals such as metal sodium and metal potassium; metal hydrides such as sodium hydride, potassium hydride and calcium hydride;
The amount of N-hydroxyphthalimide to be used is usually 1 to 5 mol with respect to 1 mol of the compound (B-14-1: (A 2 ═O)). The amount of the base used is usually 1 to 20 mol with respect to 1 mol of the compound (B-14-1: (A 2 ═O)).
 化合物(B-14-1:(A2=O))と、N-ヒドロキシフタルイミドとの反応は、有機溶媒中で行うことができる。用いる溶媒は、反応に不活性なものであれば特に制限されない。例えば、塩化メチレン、クロロホルム、四塩化炭素、1,2-ジクロロエタンなどのハロゲン化炭化水素;ジメチルスルホキシド、ジエチルスルホキシド等の含硫黄系溶媒;ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、原料1gに対して、通常、1~100mlである。反応は、-20℃から用いる溶媒の沸点までの温度範囲で円滑に進行する。
The reaction of the compound (B-14-1: (A 2 ═O)) and N-hydroxyphthalimide can be carried out in an organic solvent. The solvent used is not particularly limited as long as it is inert to the reaction. For example, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane; sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide; ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran Aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbon solvents such as n-pentane, n-hexane and n-heptane; N, N-dimethylformamide, N, N-dimethylacetamide Amide solvents such as N-methylpyrrolidone; nitrile solvents such as acetonitrile and benzonitrile; and mixed solvents composed of two or more of these solvents.
The amount of the organic solvent used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the raw material. The reaction proceeds smoothly in a temperature range from −20 ° C. to the boiling point of the solvent used.
 d)次に、化合物(B-14-2:(A2=O))から、フタロイル基を脱保護することで、目的とする化合物(B-14:(A2=O))を得ることができる。脱保護は、公知の方法により行う。例えば、ヒドラジン類を添加する方法が挙げられる。 d) Next, the target compound (B-14: (A 2 = O)) is obtained by deprotecting the phthaloyl group from the compound (B-14-2: (A 2 = O)). Can do. Deprotection is performed by a known method. For example, the method of adding hydrazines is mentioned.
 用いるヒドラジン類の使用量は、化合物(B-14-2:(A2=O))1モルに対して、通常1~10モルである。 The amount of hydrazine to be used is usually 1 to 10 mol per 1 mol of compound (B-14-2: (A 2 ═O)).
 化合物(B-14-2:(A2=O))の脱保護反応は、有機溶媒中で行われる。用いる有機溶媒は、反応に不活性なものであれば特に制限されない。例えば、塩化メチレン、クロロホルム、四塩化炭素、1,2-ジクロロエタンなどのハロゲン化炭化水素;ジメチルスルホキシド、ジエチルスルホキシド等の含硫黄系溶媒;ジオキサン、1,2-ジメトキシエタン、テトラヒドロフラン等のエーテル系溶媒;トルエン、ベンゼン、キシレン等の芳香族炭化水素系溶媒;n-ペンタン、n-ヘキサン、n-ヘプタン等の脂肪族炭化水素系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセタミド、N-メチルピロリドン等のアミド系溶媒;アセトニトリル、ベンゾニトリル等のニトリル系溶媒;およびこれらの二種以上からなる混合溶媒;等を挙げることができる。
 有機溶媒の使用量は、特に限定されないが、化合物(B-14-2:(A2=O))1gに対して、通常、1~100mlである。
 当該反応は、-20℃から用いる溶媒の沸点までの温度範囲で円滑に進行する。反応時間は、反応規模にもよるが、通常、数分間から数十時間である。
The deprotection reaction of compound (B-14-2: (A 2 ═O)) is carried out in an organic solvent. The organic solvent to be used is not particularly limited as long as it is inert to the reaction. For example, halogenated hydrocarbons such as methylene chloride, chloroform, carbon tetrachloride and 1,2-dichloroethane; sulfur-containing solvents such as dimethyl sulfoxide and diethyl sulfoxide; ether solvents such as dioxane, 1,2-dimethoxyethane and tetrahydrofuran Aromatic hydrocarbon solvents such as toluene, benzene and xylene; aliphatic hydrocarbon solvents such as n-pentane, n-hexane and n-heptane; N, N-dimethylformamide, N, N-dimethylacetamide Amide solvents such as N-methylpyrrolidone; nitrile solvents such as acetonitrile and benzonitrile; and mixed solvents composed of two or more of these solvents.
The amount of the organic solvent to be used is not particularly limited, but is usually 1 to 100 ml with respect to 1 g of the compound (B-14-2: (A 2 ═O)).
The reaction proceeds smoothly in a temperature range from −20 ° C. to the boiling point of the solvent used. Although the reaction time depends on the reaction scale, it is usually from several minutes to several tens of hours.
 上記の製造方法で得られた本発明の含窒素ヘテロアリール誘導体はさらに、塩とすることもできる。塩としては、農園芸学的に許容される塩であれば、特に制限されない。例えば、塩酸、硫酸等の無機酸の塩;酢酸、乳酸等の有機酸の塩;等を挙げることができる。
 これらの塩は、本発明化合物と対応する酸を使用して、従来公知の方法により製造することができる。
The nitrogen-containing heteroaryl derivative of the present invention obtained by the above production method can be further converted into a salt. The salt is not particularly limited as long as it is an agricultural and horticulturally acceptable salt. For example, salts of inorganic acids such as hydrochloric acid and sulfuric acid; salts of organic acids such as acetic acid and lactic acid;
These salts can be produced by a conventionally known method using an acid corresponding to the compound of the present invention.
 いずれの反応においても、反応終了後は、通常の後処理操作、および所望により蒸留、再結晶、カラムクロマトグラフィー等の公知慣用の精製手段により精製して、目的物を単離することができる。
 目的物の構造は、IRスペクトル、NMRスペクトル、マススペクトル、元素分析等の公知の分析手段により、同定、確認することができる。
In any reaction, after completion of the reaction, the desired product can be isolated by purifying by a conventional post-treatment operation and, if desired, known and conventional purification means such as distillation, recrystallization, column chromatography and the like.
The structure of the target product can be identified and confirmed by known analytical means such as IR spectrum, NMR spectrum, mass spectrum, and elemental analysis.
 本発明の含窒素ヘテロアリール誘導体には、炭素-窒素二重結合に基づく幾何異性体(シス-トランス異性体)が存在し得るが、これらの異性体はすべて本発明に含まれる。 In the nitrogen-containing heteroaryl derivative of the present invention, geometric isomers based on carbon-nitrogen double bonds (cis-trans isomers) may exist, and all of these isomers are included in the present invention.
4)製造中間体
 次に、本発明の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの製造に用いる製造中間体について説明する。
 式(9)で表される含窒素ヘテロアリール誘導体は、前記の式(1)で表される化合物であって、Dが、式(2)または式(3)で表される化合物の製造に有用な製造中間体である。式(9)中の、R1、R2、A1、A2、J、X、n、およびRは、前記と同じ意味である。製造中間体は、好ましくは、式(10)で表される化合物である。
4) Production Intermediate Next, the production intermediate used for producing the nitrogen-containing heteroaryl derivative of the present invention, a salt thereof, or N-oxide will be described.
The nitrogen-containing heteroaryl derivative represented by the formula (9) is a compound represented by the above formula (1), wherein D represents a compound represented by the formula (2) or the formula (3). Useful production intermediate. In the formula (9), R 1 , R 2 , A 1 , A 2 , J, X, n, and R 7 have the same meaning as described above. The production intermediate is preferably a compound represented by the formula (10).
 式(11)で表される含窒素ヘテロアリール誘導体は、前記の式(1)で表される化合物であって、Dが、式(6)で表される化合物の製造に有用な製造中間体である。式(11)中の、R1、R2、A1、A2、J、X、n、およびRは、前記と同じ意味である。
 Rは、それぞれ独立して、水素原子、または 式:COR21(式中、R21は前記と同じ意味である。)で表される基である。Rは同一または異なっていてもよい。Rは一緒になってもよい。
 Rとしては、ホルミル基、アセチル基、メトキシカルボニル基等を挙げることができる。
 一緒になったRとしては、フタロイル基を挙げることができる。
 製造中間体は、好ましくは、式(12)で表される化合物である。
The nitrogen-containing heteroaryl derivative represented by the formula (11) is a compound represented by the above formula (1), wherein D is a production intermediate useful for the production of the compound represented by the formula (6) It is. In the formula (11), R 1 , R 2 , A 1 , A 2 , J, X, n, and R 7 have the same meaning as described above.
R 9 are each independently hydrogen atom or the formula,: COR 21 (wherein, R 21 is as defined above.) Is a group represented by. R 9 may be the same or different. R 9 may be together.
Examples of R 9 include formyl group, acetyl group, methoxycarbonyl group and the like.
Examples of R 9 taken together include a phthaloyl group.
The production intermediate is preferably a compound represented by the formula (12).
5)農園芸用殺菌剤
 本発明の農園芸用殺菌剤は、上記式(1)で表される含窒素ヘテロアリール誘導体、その塩、またはそのN-オキサイドの少なくとも1種を有効成分として含有する農園芸用殺菌剤(以下、「本発明殺菌剤」ということがある。)である。
5) Agricultural and horticultural fungicide The agricultural and horticultural fungicide of the present invention contains at least one of a nitrogen-containing heteroaryl derivative represented by the above formula (1), a salt thereof, or an N-oxide thereof as an active ingredient. It is an agricultural and horticultural fungicide (hereinafter sometimes referred to as “the present invention fungicide”).
 本発明殺菌剤は、広範囲の種類の糸状菌、例えば、藻菌類(Oomycetes)、子のう(嚢)菌類(Ascomycetes)、不完全菌類(Deuteromycetes)、担子菌類(Basidiomycetes)に属する菌に対して優れた殺菌力を有する。
 本発明殺菌剤は、花卉、芝、牧草を含む農園芸作物の栽培に際し発生する種々の病害の防除に、種子処理、茎葉散布、土壌施用または水面施用等により使用することができる。
The fungicide of the present invention is used for a wide variety of fungi, for example, bacteria belonging to algae (Oomycetes), Ascomycetes, Deuteromycetes, and basidiomycetes. Excellent sterilizing power.
The disinfectant of the present invention can be used by seed treatment, foliage application, soil application, water application, etc., for the control of various diseases that occur during cultivation of agricultural and horticultural crops including flowers, turf, and grass.
 例えば、
テンサイ  褐斑病(Cercospora beticola)
      黒根病(Aphanomyces cochlloides)
      根腐病(Thanatephorus cucumeris)
      葉腐病(Thanatephorus cucumeris)
ラッカセイ 褐斑病(Mycosphaerella arachidis)
      黒渋病(Mycosphaerella berkeleyi)
キュウリ  うどんこ病(Sphaerotheca fuliginea)
      べと病(Pseudoperonospora cubensis)
      つる枯病(Mycosphaerella melonis)
      つる割病(Fusarium oxysporum)
      菌核病(Sclerotinia sclerotiorum)
      灰色かび病(Botrytis cinerea)
      炭そ病(Colletotrichum orbiculare)
      黒星病(Cladosporium cucumerinum)
      褐斑病(Corynespora cassicola)
      苗立枯病(Pythium debaryanam、Rhizoctonia solani Kuhn)
      斑点細菌病(Pseudomonas syringae pv。Lecrymans)
トマト   灰色かび病(Botrytis cinerea)
      葉かび病(Cladosporium fulvum)
疫病(Phytophthora infestans)
ナス    灰色かび病(Botrytis cinerea)
      黒枯病(Corynespora melongenae)
      うどんこ病(Erysiphe cichoracearum)
      すすかび病(Mycovellosiella nattrassii)
イチゴ   灰色かび病(Botrytis cinerea)
      うどんこ病(Sohaerotheca humuli)
      炭そ病(Colletotrichum acutatum、Colletotrichum fragariae)
疫病(Phytophthora cactorum)
タマネギ  灰色腐敗病(Botrytis allii)
      灰色かび病(Botrytis cinerea)
      白斑葉枯病(Botrytis squamosa)
      べと病(Peronospora destructor)
キャベツ  根こぶ病(Plasmodiophora brassicae)
      軟腐病(Erwinia carotovora)
べと病(Peronospora parasitica)
インゲン  菌核病(Sclerotinia sclerotiorum)
      灰色かび病(Botrytis cinerea)
For example,
Sugar beet brown spot (Cercospora beticola)
Black root disease (Aphanomyces cochlloides)
Root rot (Thanatephorus cucumeris)
Leaf rot (Thanatephorus cucumeris)
Peanut Brown Spot (Mycosphaerella arachidis)
Black astringency (Mycosphaerella berkeleyi)
Cucumber powdery mildew (Sphaerotheca fuliginea)
Downy mildew (Pseudoperonospora cubensis)
Vine Blight (Mycosphaerella melonis)
Vine split disease (Fusarium oxysporum)
Sclerotinia sclerotiorum
Gray mold (Botrytis cinerea)
Anthracnose (Colletotrichum orbiculare)
Black star disease (Cladosporium cucumerinum)
Brown spot disease (Corynespora cassicola)
Seedling blight (Pythium debaryanam, Rhizoctonia solani Kuhn)
Spotted bacterial disease (Pseudomonas syringae pv. Lecrymans)
Tomato gray mold (Botrytis cinerea)
Leaf mold (Cladosporium fulvum)
Plague (Phytophthora infestans)
Eggplant gray mold (Botrytis cinerea)
Black blight (Corynespora melongenae)
Powdery mildew (Erysiphe cichoracearum)
Susmolder disease (Mycovellosiella nattrassii)
Strawberry Gray mold disease (Botrytis cinerea)
Powdery mildew (Sohaerotheca humuli)
Anthracnose (Colletotrichum acutatum, Colletotrichum fragariae)
Plague (Phytophthora cactorum)
Onion Gray rot (Botrytis allii)
Gray mold (Botrytis cinerea)
Botrytis squamosa
Downy mildew (Peronospora destructor)
Cabbage root-knot disease (Plasmodiophora brassicae)
Soft rot (Erwinia carotovora)
Downy mildew (Peronospora parasitica)
Kidney sclerotia (Sclerotinia sclerotiorum)
Gray mold (Botrytis cinerea)
りんご   うどんこ病(Podosphaera leucotricha)
      黒星病(Venturia inaequalis)
      モニリア病(Monilinia mali)
      黒点病(Mycosphaerella pomi)
      腐らん病(Valsa mali)
      斑点落葉病(Alternaria mali)
      赤星病(Gymnosporangium yamadae)
      輪紋病(Botryosphaeria berengeriana)
      炭そ病(Glomerella cingulata、Colletotrichum acutatum)
      褐斑病(Diplocarpon mali)
      すす点病(Zygophiala jamaicensis)
      すす斑病(Gloeodes pomigena)
カキ    うどんこ病(Phyllactinia kakicola)
      炭そ病(Gloeosporium kaki)
      角斑落葉病(Cercospora kaki)
モモ    灰星病(Monilinia fructicola)
      黒星病(Cladosporium carpophilum)
      ホモプシス腐敗病(Phomopsis sp.)
オウトウ  灰星病(Monilinia fructicola)
ブドウ   灰色かび病(Botrytis cinerea)
      うどんこ病(Uncinula necator)
      晩腐病(Glomerella cingulata、Colletotrichum acutatum)
      べと病(Plasmopara viticola)
      黒とう病(Elsinoe ampelina)
      褐斑病(Pseudocercospora vitis)
      黒腐病(Guignardia bidwellii)
ナシ    黒星病(Venturia nashicola)
      赤星病(Gymnosporangium asiaticum)
      黒斑病(Alternaria kikuchiana)
      輪紋病(Botryosphaeria berengeriana)
      うどんこ病(Phyllactinia mali)
チャ    輪斑病(Pestalotia theae)
      炭そ病(Colletotrichum theae-sinensis)
カンキツ  そうか病(Elsinoe fawcetti)
      青かび病(Penicillium italicum)
      緑かび病(Penicillium digitatum)
      灰色かび病(Botrytis cinerea)
      黒点病(Diaporthe citri)
      かいよう病(Xanthomonas campestris pv.Citri)
Apple powdery mildew (Podosphaera leucotricha)
Black star disease (Venturia inaequalis)
Monilinia mali
Sunspot disease (Mycosphaerella pomi)
Rot (Valsa mali)
Spotted leaf fall (Alternaria mali)
Red Star Disease (Gymnosporangium yamadae)
Ring-shaped disease (Botryosphaeria berengeriana)
Anthracnose (Glomerella cingulata, Colletotrichum acutatum)
Brown spot disease (Diplocarpon mali)
Soot spot disease (Zygophiala jamaicensis)
Soot spot (Gloeodes pomigena)
Oyster powdery mildew (Phyllactinia kakicola)
Anthracnose (Gloeosporium kaki)
Spotted leaf disease (Cercospora kaki)
Peach (Assassin Disease) (Monilinia fructicola)
Black star disease (Cladosporium carpophilum)
Homopsis spoilage (Phomopsis sp.)
Sweet cherry blight (Monilinia fructicola)
Grapes Gray mold (Botrytis cinerea)
Powdery mildew (Uncinula necator)
Late rot (Glomerella cingulata, Colletotrichum acutatum)
Downy mildew (Plasmopara viticola)
Black depression (Elsinoe ampelina)
Brown spot disease (Pseudocercospora vitis)
Black rot (Guignardia bidwellii)
Pear black star disease (Venturia nashicola)
Red Star Disease (Gymnosporangium asiaticum)
Black spot disease (Alternaria kikuchiana)
Ring-shaped disease (Botryosphaeria berengeriana)
Powdery mildew (Phyllactinia mali)
Tea ring spot disease (Pestalotia theae)
Anthracnose (Colletotrichum theae-sinensis)
Citrus common scab (Elsinoe fawcetti)
Blue mold (Penicillium italicum)
Green mold (Penicillium digitatum)
Gray mold (Botrytis cinerea)
Black spot disease (Diaporthe citri)
Sickness (Xanthomonas campestris pv.Citri)
コムギ   うどんこ病(Erysiphe graminis f.sp.Tritici)
      赤かび病(Gibberella zeae)
      赤さび病(Puccinia recondita)
      褐色雪腐病(Pythium iwayamai)
      紅色雪腐病(Monographella nivalis)
      眼紋病(Pseudocercosporella herpotrichoides)
      葉枯病(Septoria tritici)
      ふ枯病(Leptosphaeria nodorum)
      雪腐小粒菌核病(Typhula incarnata)
      雪腐大粒菌核病(Myriosclerotinia borealis)
      立枯病(Gaeumanomyces graminis)
オオムギ  斑葉病(Pyrenophora graminea)
      雲形病(Rhynchosporium secalis)
      裸黒穂病(Ustilago tritici、U.nuda)
イネ    いもち病(Pyricularia oryzae)
      紋枯病(Rhizoctonia solani)
      馬鹿苗病(Gibberella fujikuroi)
      ごま葉枯病(Cochliobolus niyabeanus)
      苗立枯病(Pythium graminicolum)
      白葉枯病(Xanthomonas oryzae)
      苗立枯細菌病(Burkholderia plantarii)
      褐条病(Acidovorax avenae)
      もみ枯細菌病(Burkholderia glumae)
タバコ   菌核病(Sclerotinia sclerotiorum)
      うどんこ病(Erysiphe cichoracearum)
チューリップ灰色かび病(Botrytis cinerea)
ベントグラス雪腐大粒菌核病(Sclerotinia borealis)
      赤焼病(Pythium aphanidermatum)
オーチャードグラス うどんこ病(Erysiphe graminis)
ダイズ   紫斑病(Cercospora kikuchii)
      べと病(Peronospora Manshurica)
      茎疫病(Phytophthora sojae)
ジャガイモ・トマト疫病(Phytophthora infestans)
等の防除に使用することができる。
Wheat powdery mildew (Erysiphe graminis f.sp.Tritici)
Red mold (Gibberella zeae)
Red rust (Puccinia recondita)
Brown snow rot (Pythium iwayamai)
Red snow rot (Monographella nivalis)
Eye disease (Pseudocercosporella herpotrichoides)
Leaf blight (Septoria tritici)
Dry blight (Leptosphaeria nodorum)
Snowy rot granule nuclear disease (Typhula incarnata)
Myriosclerotinia borealis
Blight disease (Gaeumanomyces graminis)
Barley Leafy spot disease (Pyrenophora graminea)
Cloud shape disease (Rhynchosporium secalis)
Bare Scab (Ustilago tritici, U.nuda)
Rice blast (Pyricularia oryzae)
Rhizoctonia solani
Idiot Seedling (Gibberella fujikuroi)
Sesame leaf blight (Cochliobolus niyabeanus)
Seedling blight (Pythium graminicolum)
White leaf blight (Xanthomonas oryzae)
Burkholderia plantarii
Brown stripe disease (Acidovorax avenae)
Burkholderia glumae
Tobacco sclerotia (Sclerotinia sclerotiorum)
Powdery mildew (Erysiphe cichoracearum)
Tulip gray mold (Botrytis cinerea)
Bentgrass Snow Rot Large Bacterial Nuclear Disease (Sclerotinia borealis)
Red fire (Pythium aphanidermatum)
Orchardgrass powdery mildew (Erysiphe graminis)
Soybean Purpura (Cercospora kikuchii)
Downy mildew (Peronospora Manshurica)
Phytophthora sojae
Potato and tomato plague (Phytophthora infestans)
It can be used for the control of etc.
 また、本発明殺菌剤は、各種耐性菌に対しても優れた殺菌効果を有する。
 かかる耐性菌としては、例えば、チオファネートメチル、ベノミル、カルベンダジム等のベンズイミダゾール系殺菌剤に耐性を示す灰色かび病菌(Botrytis cinerea)、テンサイ褐斑病菌(Cercospora beticola)、リンゴ黒星病菌(Venturia inaequalis)、ナシ黒星病菌(Venturia nashicola);ビンクロゾリン、プロシミドン、イプロジオン等のジカルボキシイミド系殺菌剤に耐性を示す灰色かび病菌(Botrytis cinerea)などが挙げられる。
Moreover, this fungicide has an excellent bactericidal effect against various resistant bacteria.
Such resistant bacteria include, for example, gray mold fungus (Botrytis cinerea), sugar beet brown fungus (Cercospora beticola), apple black rot (Venturia inaequalis), Examples include Venturia nashicola; Botrytis cinerea which is resistant to dicarboximide fungicides such as vinclozolin, procymidone and iprodione.
 本発明殺菌剤の適用がより好ましい病害としては、テンサイの褐斑病、コムギのうどんこ病、イネのいもち病、リンゴ黒星病、キュウリの灰色かび病、ラッカセイの褐斑病等を挙げることができる。 More preferable diseases to which the fungicide of the present invention is applied include sugar beet brown spot, wheat powdery mildew, rice blast, apple scab, cucumber gray mold, peanut brown etc. it can.
 本発明殺菌剤は薬害が少なく、魚類や温血動物への毒性が低く、安全性の高い薬剤である。 The fungicide of the present invention is a highly safe drug with little phytotoxicity, low toxicity to fish and warm-blooded animals.
 本発明殺菌剤を実際に施用する際には、本発明化合物に他成分を特に加えることなく使用することができ、また一般の農薬のとり得る形態、即ち、水和剤、粒剤、粉剤、乳剤、水溶剤、懸濁剤、顆粒水和剤等に製剤化して使用することもできる。 When actually applying the fungicide of the present invention, it can be used without particularly adding other components to the compound of the present invention, and forms that can be taken by general agricultural chemicals, that is, wettable powder, granules, powders, It can also be used in the form of an emulsion, aqueous solvent, suspension, granule wettable powder or the like.
 固体の剤型への製剤化において使用される添加剤および担体としては、大豆粉、小麦粉等の植物性粉末、珪藻土、燐灰石、石こう、タルク、ベントナイト、パイロフィライト、クレー等の鉱物性微粉末、安息香酸ソーダ、尿素、芒硝等の有機および無機化合物などを挙げることができる。 Additives and carriers used in formulation into solid dosage forms include vegetable powders such as soybean flour and wheat flour, mineral fine powders such as diatomaceous earth, apatite, gypsum, talc, bentonite, pyrophyllite and clay And organic and inorganic compounds such as sodium benzoate, urea, and sodium sulfate.
 液体の剤型への製剤化において使用される溶剤としては、ケロシン、キシレンおよび石油系の芳香族炭化水素、シクロヘキサン、シクロヘキサノン、ジメチルホルムアミド、ジメチルスルホキシド、アルコール、アセトン、トリクロロエチレン、メチルイソブチルケトン、鉱物油、植物油、水等などを挙げることができる。 Solvents used in formulating liquid dosage forms include kerosene, xylene and petroleum-based aromatic hydrocarbons, cyclohexane, cyclohexanone, dimethylformamide, dimethyl sulfoxide, alcohol, acetone, trichloroethylene, methyl isobutyl ketone, mineral oil , Vegetable oil, water and the like.
 製剤において均一かつ安定な形態をとるために、必要に応じ界面活性剤を添加することができる。添加することができる界面活性剤は特に制限されない。例えば、ポリオキシエチレンが付加したアルキルフェニルエーテル、ポリオキシエチレンが付加したアルキルエーテル、ポリオキシエチレンが付加した高級脂肪酸エステル、ポリオキシエチレンが付加したソルビタン高級脂肪酸エステル、ポリオキシエチレンが付加したトリスチリルフェニルエーテル等の非イオン性界面活性剤、ポリオキシエチレンが付加したアルキルフェニルエーテルの硫酸エステル塩、アルキルベンゼンスルホン酸塩、高級アルコールの硫酸エステル塩、アルキルナフタレンスルホン酸塩、ポリカルボン酸塩、リグニンスルホン酸塩、アルキルナフタレンスルホン酸塩のホルムアルデヒド縮合物、イソブチレン-無水マレイン酸共重合体等を挙げることができる。 In order to take a uniform and stable form in the preparation, a surfactant can be added as necessary. The surfactant that can be added is not particularly limited. For example, alkyl phenyl ether added with polyoxyethylene, alkyl ether added with polyoxyethylene, higher fatty acid ester added with polyoxyethylene, sorbitan higher fatty acid ester added with polyoxyethylene, tristyryl added with polyoxyethylene Nonionic surfactants such as phenyl ether, sulfates of alkylphenyl ethers added with polyoxyethylene, alkylbenzene sulfonates, sulfates of higher alcohols, alkylnaphthalene sulfonates, polycarboxylates, lignin sulfones Acid salt, formaldehyde condensate of alkyl naphthalene sulfonate, isobutylene-maleic anhydride copolymer, and the like.
 このようにして得られた水和剤、乳剤、フロアブル剤、水溶剤、顆粒水和剤は水で所定の濃度に希釈して、溶解液、懸濁液あるいは乳濁液にして、また粉剤・粒剤はそのままで、植物に散布することができる。 The wettable powder, emulsion, flowable powder, aqueous solvent, and granular wettable powder thus obtained are diluted with water to a predetermined concentration to obtain a solution, suspension or emulsion. Granules can be sprayed on plants as they are.
 本発明殺菌剤中における有効成分の量は、通常、組成物(製剤)全体に対して、好ましくは0.01~90重量%、より好ましくは0.05~85重量%である。 The amount of the active ingredient in the fungicide of the present invention is usually preferably 0.01 to 90% by weight, more preferably 0.05 to 85% by weight, based on the entire composition (formulation).
 本発明殺菌剤の施用量は、気象条件、製剤形態、施用時期、施用方法、施用場所、防除対象病害、対象作物等により異なるが、1ヘクタール当たりの有効成分化合物量にして、通常1~1000g、好ましくは10~100gである。
 水和剤、乳剤、懸濁剤、水溶剤、顆粒水和剤等を水で希釈して施用する場合、その施用濃度は1~1000ppm、好ましくは10~250ppmである。
The application amount of the fungicide of the present invention varies depending on weather conditions, formulation form, application time, application method, application place, disease to be controlled, target crop, etc., but is usually 1 to 1000 g in terms of the amount of active ingredient compound per hectare. It is preferably 10 to 100 g.
When a wettable powder, emulsion, suspension, aqueous solvent, granular wettable powder or the like is diluted with water and applied, the applied concentration is 1 to 1000 ppm, preferably 10 to 250 ppm.
 本発明殺菌剤には、本発明化合物のほかに、各種の殺菌剤や殺虫・殺ダニ剤等の1種または2種以上を混合することもできる。 In addition to the compounds of the present invention, one or two or more of various fungicides, insecticides, acaricides and the like can be mixed with the fungicides of the present invention.
 本発明化合物と混合して使用できる殺菌剤、殺虫・殺ダニ剤、殺線虫剤、殺土壌害虫剤、植物生長調節剤の代表例を以下に示す。 Representative examples of fungicides, insecticides / acaricides, nematicides, soil pesticides and plant growth regulators that can be used in combination with the compounds of the present invention are shown below.
殺菌剤:
1)ベンゾイミダゾール系:ベノミル、カルベンダジム、フベリダゾール、チアベンダゾール、チオファネート メチル等;
2)ジカルボキシイミド系:クロゾリネート、イプロジオン、プロシミドン、ビンクロゾリン等;
3)DMI-殺菌剤系:イマザリル、オキスポコナゾール、ペフラゾエート、プロクロラズ、トリフルミゾール、トリホリン、ピリフェノックス、フェナリモル、ヌアリモル、アザコナゾール、ビテルタノール、ブロムコナゾール、シプロコナゾール、ジフェノコナゾール、ジニコナゾール、エポキシコナゾール、フェンブコナゾール、フルキンコナゾール、フルシラゾール、フルトリアホル、ヘキサコナゾール、イミベンコナゾール、イプコナゾール、メトコナゾール、ミクロブタニル、ペンコナゾール、プロピコナゾール、プロチオコナゾール、シメコナゾール、テブコナゾール、テトラコナゾール、トリアジメホン、トリアジメノール、トリチコナゾール、エタコナゾール、ファーコナゾールシス等;
4)フェニルアミド系:ベナラキシル、フララキシル、メタラキシル、メタラキシル-M、オキサジキシル、オフラセ等;
5)アミン系:アルジモルフ、ドデモルフ、フェンプロピモルフ、トリデモルフ、フェンプロピジン、ピペラリン、スピロキサミン等;
6)ホスホロチオレート系:EDDP、イプロベンホス、ピラゾホス等;
7)ジチオラン系:イソプロチオラン等;
8)カルボキサミド:ベノダニル、ボスカリド、カルボキシン、フェンフラン、フルトラニル、フラメトピル、メプロニル、オキシカルボキシン、ペンチオピラド、チフルザミド等;
9)ヒドロキシ-(2-アミノ) ピリミジン系:ブピリメート、ジメチリモル、エチリモル等;
10)AP殺菌剤 (アニリノピリミジン)系:シプロジニル、メパニピリム、ピリメタニル等;
11)N-フェニルカーバメート系:ジエトフェンカルブ等;
12)QoI-殺菌剤 (Qo阻害剤)系:アゾキシストロビン、ピコキシストロビン、ピラクロストロビン、クレソキシム-メチル、トリフロキシストロビン、ジモキシストロビン、メトミノストロビン、オリザストロビン、ファモキサドン、フルオキサストロビン、フェンアミドン、メトミノフェン等;
13)PP殺菌剤 (フェニルピロール)系:フェンピコニル、フルジオキソニル等;
14)キノリン系:キノキシフェン等;
15)AH殺菌剤 (芳香族炭化水素)系:ビフェニル、クロロネブ、ジクロラン、キントゼン、テクナゼン、トルクトフォス-メチル等;
16)MBI-R系:フサライド、ピロキロン、トリシクラゾール等;
17)MBI-D系:カルプロパミド、ジクロシメット、フェノキサニル等;
18)SBI剤:フェンヘキサミド、ピリブチカルブ、タービナフィン等;
19)フェニルウレア:ペンシクロン等;
20)QiI-殺菌剤 (Qi阻害剤):シアゾファミド等;
21)ベンズアミド系:ゾキサミド等;
22)エノピランウロン系:ブラストサイジン、ミルディオマイシン等;
23)へキソピラノシル系:カスガマイシン等;
24)グルコピラノシル系:ストレプトマイシン、バリダマイシン等;
25)シアノアセトアミド系:シモキサニル等;
26)カーバメート系:イドカルブ、プロパモカルブ、プロチオカルブ、ポリカーバメート等;
27)脱共役剤:ビナパクリル、ジノカップ、フェリムゾン、フルアジナム等;
28)有機スズ化合物:酢酸トリフェニルスズ、塩化トリフェニルスズ、水酸化トリフェニルスズ等;
29)リン酸エステル:亜リン酸、トルクロホスメチル、ホセチル等;
30)フタルアミド酸系:テクロフタラム等;
31)ベンゾトリアジン系:トリアゾキシド等;
32)ベンゼンスルフォナミド系:フルスルファミド等;
33)ピリダジノン:ジクロメジン等;
34)CAA 殺菌剤 (カルボン酸アミド)系:ジメトモルフ、フルモルフ、ベンチアバリカルブ、イプロバリカルブ、マンジプロパミド等;
35)テトラサイクリン:オキシテトラサイクリン等;
36)チオカーバメート系:メタスルホカルブ等;
37)その他の化合物:エトリジアゾール、ポリオキシン、オキソリニック酸、ヒドロキシイソキサゾール、オクチノリン、シルチオファム、ジフルメトリム、アシベンゾラルSメチル、プロベナゾール、チアジニル、エタボキサム、シフルフェナミド、プロキナジド、メトラフェノン、フルオピコリド、水酸化第二銅、有機銅、硫黄、ファーバム、マンゼブ、マンネブ、メチラム、プロピネブ、チウラム、ジネブ、ジラム、キャプタン、カプタホール、フォルペット、クロロタロニル、ジクロフルアニド、トリルフルアニド、ドジン、グアザチン、イミノクタジン酢酸塩、イミノクタジンドデシルベンゼンスルホン酸塩、アニラジン、ジチアノン、クロロピクリン、ダゾメット、メタムナトリウム塩、キノメチオネート、シプロフラム、シルチオファム、アグロバクテリウム、フルオルイミド)等;
Fungicide:
1) benzimidazole series: benomyl, carbendazim, fuberidazole, thiabendazole, thiophanate methyl, etc .;
2) Dicarboximide type: Clozolinate, iprodione, procymidone, vinclozolin and the like;
3) DMI-bactericidal system: imazalyl, oxpoconazole, pefazoate, prochloraz, triflumizole, triphorin, pyrifenox, phenarimol, nuarimol, azaconazole, viteltanol, bromuconazole, cyproconazole, difenoconazole, diniconazole, epoxy Conazole, fenbuconazole, fluquinconazole, flusilazole, flutriaol, hexaconazole, imibenconazole, ipconazole, metconazole, microbutanyl, penconazole, propiconazole, prothioconazole, cimeconazole, tebuconazole, tetraconazole, triazimephone, tri Azimenol, triticonazole, etaconazole, farconazole cis and the like;
4) Phenylamide series: Benalaxyl, furaxyl, metalaxyl, metalaxyl-M, oxadixyl, oflase, etc .;
5) Amine-based: aldimorph, dodemorph, fenpropimorph, tridemorph, fenpropidine, piperalin, spiroxamine, etc .;
6) Phosphorothiolate system: EDDP, iprobenphos, pyrazophos, etc .;
7) Dithiolane type: isoprothiolane and the like;
8) Carboxamide: benodanyl, boscalid, carboxin, fenfuran, flutolanil, furamethopyl, mepronil, oxycarboxin, pentiopyrad, tifluzamide, etc .;
9) Hydroxy- (2-amino) pyrimidine series: bupyrimeto, dimethylolmol, ethylimol, etc .;
10) AP fungicide (anilinopyrimidine) type: cyprodinil, mepanipyrim, pyrimethanil, etc .;
11) N-phenyl carbamate type: dietofencarb and the like;
12) QoI-bactericidal (Qo inhibitor) system: azoxystrobin, picoxystrobin, pyraclostrobin, cresoxime-methyl, trifloxystrobin, dimoxystrobin, metminostrobin, orizastrobin, famoxadone , Fluoxastrobin, phenamidon, metminophen, etc .;
13) PP fungicide (phenylpyrrole) type: fenpiconyl, fludioxonil, etc .;
14) Quinoline series: quinoxyphene, etc .;
15) AH fungicide (aromatic hydrocarbon) series: biphenyl, chloronebu, dichlorane, kintozen, technazen, tortofos-methyl, etc .;
16) MBI-R series: fusaride, pyrokilone, tricyclazole, etc .;
17) MBI-D system: carpropamide, diclocimet, phenoxanyl, etc .;
18) SBI agent: Fenhexamide, Pyributicarb, Turbinafine, etc .;
19) Phenylurea: pencyclon, etc .;
20) QiI-bactericide (Qi inhibitor): cyazofamide and the like;
21) benzamide type: zoxamide and the like;
22) Enopyranuron series: blastcidin, mildiomycin, etc .;
23) Hexopyranosyl system: Kasugamycin and the like;
24) Glucopyranosyl: streptomycin, validamycin and the like;
25) Cyanoacetamide series: Simoxanyl and the like;
26) Carbamate series: idcarb, propamocarb, prothiocarb, polycarbamate, etc .;
27) Uncouplers: Vinapacryl, Zinocup, Ferimzone, Fluazinam, etc .;
28) Organotin compounds: triphenyltin acetate, triphenyltin chloride, triphenyltin hydroxide, etc .;
29) Phosphate ester: phosphorous acid, tolcrofosmethyl, fosetyl and the like;
30) Phthalamic acid type: Teclophthalam, etc .;
31) Benzotriazine series: triazoxide and the like;
32) Benzenesulfonamide series: fullsulfamide and the like;
33) Pyridazinone: Dichromedin and the like;
34) CAA disinfectant (carboxylic amide) type: dimethomorph, fulmorph, benchavaricarb, iprovaricarb, mandipropamide, etc .;
35) Tetracycline: oxytetracycline and the like;
36) Thiocarbamate type: metasulfocarb, etc.
37) Other compounds: etridiazole, polyoxin, oxolinic acid, hydroxyisoxazole, octinoline, silthiofam, diflumetrim, acibenzoral S methyl, probenazole, thiazinyl, ethaboxam, cyflufenamide, proquinazide, metolaphenone, fluopicolide, cupric hydroxide, organic copper , Sulfur, Farbum, Manzeb, Mannebu, Methylum, Propineb, Thiuram, Dinebu, Diram, Captan, Captahol, Folpet, Chlorothalonil, Diclofluuride, Tolylfluanid, Dodine, Guazatine, Iminocazine Acetate, Iminocazine Dodecylbenzenesulfonate , Anilazine, dithianone, chloropicrin, dazomet, metham sodium salt, quinomethionate, ciprofram, Chiofamu, Agrobacterium, Furuoruimido) and the like;
殺虫・殺ダニ剤、殺線虫剤、殺土壌害虫剤:
1)有機(チオ)ホスフェート系:アセフェート、アザメチホス、アジンホスメチル、クロルピリホス、クロルピリホスメチル、クロルフェンビンホス、ダイアジノン、ジクロルボス、ジクロトホス、ジメトエート、ジスルホトン、エチオン、EPN、フェナミホス、フェニトロチオン、フェンチオン、イソキサチオン、マラソン、メタミドホス、メチダチオン、メチルパラチオン、メビンホス、モノクロトホス、オキシデメトンメチル、パラオキソン、パラチオン、フェントエート、ホサロン、ホスメット、ホスファミドン、ホレート、ホキシム、ピリミホスメチル、プロフェノホス、プロチオホス、スルプロホス、テトラクロルビンホス、テルブホス、トリアゾホス、トリクロルホン、ホスチアゼート、ホスホカルブ、カズサホス、ジスルホトン、デメトン-S -メチル、BRP、CYAP、エトプロホス、キナルホス、ジメチルビンホス、バミドチオン、ピラクロホス;
2)カルバメート系:アラニカルブ、アルジカルブ、ベンダイオカルブ、ベンフラカルブ、カルバリル、カルボフラン、カルボスルファン、フェノキシカルブ、フェノチオカルブ、メチオカルブ、メソミル、オキサミル、ピリミカルブ、プロポキスル、チオジカルブ、トリアザメート、エチオフェンカルブ、フェノブカルブ、MIPC、MPMC、MTMC、ピリダフェンチオン、フラチオカルブ、XMC;
3)ピレトロイド系:アレスリン、ビフェントリン、シフルトリン、シハロトリン、シフェノトリン、シペルメトリン、アルファシペルメトリン、ベータシペルメトリン、ゼータシペルメトリン、デルタメトリン、エスフェンバレレート、エトフェンプロックス、フェンプロパトリン、フェンバレレート、イミプロトリン、ラムダシハロトリン、ペルメトリン、プラレトリン、ピレトリンIおよびII、レスメトリン、シラフルオフェン、タウフルバリネート、テフルトリン、テトラメトリン、トラロメトリン、トランスフルトリン、プロフルトリン、ジメフルトリン、アクリナトリン、シクロプロトリン、ハルフェンプロックス、フルシトリネート;
4)成長調節物質:
a)キチン合成阻害剤:クロルフルアズロン、ジフルベンズロン、フルシクロクスロン、フルフェノクスロン、ヘキサフルムロン、ルフェヌロン、ノバルロン、テフルベンズロン、トリフルムロン;
ビストリフルロン、ノビフルムロン、ブプロフェジン、ジオフェノラン、ヘキシチアゾクス、エトキサゾール、クロフェンタジン;
b)エクジソンアンタゴニスト:ハロフェノジド、メトキシフェノジド、テブフェノジド、アザジラクチン;
クロマフェノジド;
c)幼若ホルモン様物質: ピリプロキシフェン、メトプレン、フェノキシカルブ;
d)脂質生合成阻害剤:スピロジクロフェン、スピロメシフェン、スピロテトラマト;
5)ニコチン受容体アゴニスト/アンタゴニスト化合物:アセタミプリド、クロチアニジン、ジノテフラン、イミダクロプリド、ニテンピラム、チアクロプリド、チアメトキサム;
6)GABAアンタゴニスト化合物:アセトプロール、エンドスルファン、エチピロール、フィプロニル、バニリプロール、ピラフルプロール、ピリプロール;
7)大環状ラクトン殺虫剤:アバメクチン、エマメクチン、ミルベメクチン、レピメクチン、スピノサド;
イベルメクチン;
8)METI I化合物:フェナザキン、ピリダベン、テブフェンピラド、トルフェンピラド、フルフェネリム;
9)METI IIおよびIII化合物:アセキノシル、フルアシプリム、ヒドラメチルノン;
10)脱共役剤化合物:クロルフェナピル;
11)酸化的リン酸化阻害剤化合物:シヘキサチン、ジアフェンチウロン、フェンブタチンオキシド、プロパルギット;
12)脱皮かく乱化合物:シロマジン;
13)混合機能オキシダーゼ阻害剤化合物:ピペロニルブトキシド;
14)ナトリウムチャネル遮断剤化合物:インドキサカルブ、メタフルミゾン;
15)微生物農薬:BT剤、昆虫病原ウイルス剤、昆虫病原糸状菌剤、線虫病原糸状菌剤;
16)その他のもの:ベンクロチアズ、ビフェナゼート、カルタップ、フロニカミド、ピリダリル、ピメトロジン、硫黄、チオシクラム、フルベンジアミド、シエノピラフェン、フルピラゾホス、シフルメトフェン、アミドフルメット、ベンスルタップ、ジコホル、テトラジホン、フェンピロキシメート、アミトラズ、クロルジメホルム、トリアザメイト、ピメトロジン、ピリミジフェン、1,3-ジクロロプロペン、クロフェンテジン、フルアクリピリム、ロテノン、DCIP、フェニソブロモレート、ベンゾメート、メタアルデヒド、クロラントラニリプロールスピネトラム、ピリフルキナゾン;
Insecticides, acaricides, nematicides, soil insecticides:
1) Organic (thio) phosphates: acephate, azamethiphos, azinephosmethyl, chlorpyrifos, chlorpyrifosmethyl, chlorfenvinphos, diazinon, dichlorvos, dicrotophos, dimethoate, disulfotone, ethion, EPN, phenamiphos, fenitrothion, fenthion, isoxathione, metathione, metaxamide, , Methidathion, methylparathion, mevinphos, monocrotophos, oxydemetonmethyl, paraoxon, parathion, phentoate, hosalon, phosmet, phosphamidone, folate, oxime, pirimiphosmethyl, propenophos, prothiophos, sulfophos, tetrachlorbinphos, terbufos, triazophos, trichlorphone, Phosphiazate, Phosphocarb, Kazusafos, Dis Photon, demeton -S - methyl, BRP, CYAP, ethoprophos, quinalphos, dimethyl bottle phosphite, vamidothion, pyraclofos;
2) Carbamate series: alanic carb, aldicarb, bendiocarb, benfuracarb, carbaryl, carbofuran, carbosulfan, phenoxycarb, phenothiocarb, methiocarb, mesomil, oxamyl, pirimicarb, propoxyl, thiodicarb, triazamate, etiofencarb, MPC, MPC MTMC, pyridafenthione, furthiocarb, XMC;
3) Pyrethroid: Allethrin, bifenthrin, cyfluthrin, cyhalothrin, cyphenothrin, cypermethrin, alpha cypermethrin, beta cypermethrin, zetacypermethrin, deltamethrin, esfenvalerate, etofenprox, fenpropatoline, fenvalerate, imiprotorin, Lambda cihalothrin, permethrin, praretrin, pyrethrin I and II, resmethrin, silafluophene, taufluvalinate, tefluthrin, tetramethrin, tralomethrin, transfluthrin, profluthrin, dimeflutrin, acrinathrin, cycloprotorin, halfenprox, flucitrinate;
4) Growth regulator:
a) Chitin synthesis inhibitors: chlorfluazuron, diflubenzuron, flucycloxuron, flufenoxuron, hexaflumuron, lufenuron, nobarulone, teflubenzuron, triflumuron;
Bistrifluron, nobiflumuron, buprofezin, diophenolane, hexythiazox, etoxazole, clofentadine;
b) ecdysone antagonists: halofenozide, methoxyphenozide, tebufenozide, azadirachtin;
Chromafenozide;
c) Juvenile hormone-like substances: pyriproxyfen, metoprene, phenoxycarb;
d) Lipid biosynthesis inhibitors: spirodiclofen, spiromesifen, spirotetramat;
5) Nicotine receptor agonist / antagonist compounds: acetamiprid, clothianidin, dinotefuran, imidacloprid, nitenpyram, thiacloprid, thiamethoxam;
6) GABA antagonist compounds: acetoprole, endosulfan, ethipyrrole, fipronil, vaniliprole, pyrafluprolol, pyriprol;
7) Macrocyclic lactone insecticides: abamectin, emamectin, milbemectin, lepimectin, spinosad;
Ivermectin;
8) METI I compounds: phenazaquin, pyridaben, tebufenpyrad, tolfenpyrad, flufenerim;
9) METI II and III compounds: acequinosyl, fluacyprim, hydramethylnon;
10) Uncoupler compound: chlorfenapyr;
11) Oxidative phosphorylation inhibitor compounds: cyhexatin, diafenthiuron, phenbutatin oxide, propargite;
12) Molting compound: cyromazine;
13) Mixed function oxidase inhibitor compound: piperonyl butoxide;
14) Sodium channel blocker compounds: indoxacarb, metaflumizone;
15) Microbial pesticides: BT agents, entomopathogenic virus agents, entomopathogenic fungi agents, nematode pathogenic fungi agents;
16) Others: Benclothiaz, Bifenazate, Cartap, Flonicamid, Pyridalyl, Pymetrozine, Sulfur, Thiocyclam, Flubendiamide, Sienopyrafen, Flupirazophos, Cyflumethofene, Amidoflumet, Bensultap, Dicophor, Tetradiphone, Fenpyroximate, Amitraz, Chlordimetform, Triza Pyrimidifen, 1,3-dichloropropene, clofentezin, fluacrylpyrim, rotenone, DCIP, phenisobromolate, benzomate, metaldehyde, chlorantraniliprole spinetoram, pyrifluquinazone;
植物生長調節剤:
アブシジン酸、インドール酪酸、ウニコナゾール、エチクロゼート、エテホン、クロキシホナック、クロルメコート、クロレラ抽出液、過酸化カルシウム、シアナミド、ジクロルプロップ、ジベレリン、ダミノジッド、デシルアルコール、トリネキサパックエチル、メピコートクロリド、パクロブトラゾール、パラフィンワックス、ピペロニルブトキシド、ピラフルフェンエチル、フルルプリミドール、プロヒドロジャスモン、プロヘキサジオンカルシウム塩、ベンジルアミノプリン、ペンディメタリン、ホルクロルフェニュロン、マレイン酸ヒドラジドカリウム、1-ナフチルアセトアミド、4-CPA、MCPB、コリン、硫酸オキシキノリン、エチクロゼート、ブトルアリン、1-メチルシクロプロペン、アビグリシン塩酸塩。
Plant growth regulator:
Abscisic acid, indole butyric acid, uniconazole, etiquelozate, etephone, cloxiphonac, chlormecote, chlorella extract, calcium peroxide, cyanamide, dichlorprop, gibberellin, daminozide, decyl alcohol, trinexapac ethyl, mepicoat chloride, pack Lobutrazole, paraffin wax, piperonyl butoxide, pyraflufenethyl, flurprimidol, prohydrojasmon, prohexadione calcium salt, benzylaminopurine, pendimethalin, forchlorphenuron, potassium maleate hydrazide, 1-naphthyl Acetamide, 4-CPA, MCPB, choline, oxyquinoline sulfate, ethiclozeate, butorualine, 1-methylcyclopropene, abiglycine hydrochloride.
 次に、実施例を挙げて本発明を更に詳細に説明するが、本発明は以下の実施例により何ら限定されることはない。 Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples.
(実施例1)
 a)2-アセチル-4-クロロ-5-メチルピリジンの製造
 窒素雰囲気下、2-ブロモ-4-クロロ-5-メチルピリジン6.00gをトルエン100mlに溶解させ、-78℃にてn-ブチルリチウム(2.69mol/L)13mlを滴下した。滴下終了後、20分間撹拌して熟成させた。これに、ジメチルアセトアミド3.81gを加え、-78℃にて1時間撹拌した。これに、-78℃にて塩化アンモニウム水溶液を加え、次いで酢酸エチルで抽出した。得られた有機層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=5:1)にて精製し、目的とする2-アセチル-4-クロロ-5-メチルピリジン2.59g(収率53%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.49(s,1H),8.01(s,1H),2.70(s,3H),2.44(s,1H)
Example 1
a) Preparation of 2-acetyl-4-chloro-5-methylpyridine Under nitrogen atmosphere, 6.00 g of 2-bromo-4-chloro-5-methylpyridine was dissolved in 100 ml of toluene, and n-butyl was added at -78 ° C. 13 ml of lithium (2.69 mol / L) was added dropwise. After completion of dropping, the mixture was aged by stirring for 20 minutes. To this was added 3.81 g of dimethylacetamide, and the mixture was stirred at −78 ° C. for 1 hour. To this, an aqueous ammonium chloride solution was added at −78 ° C., followed by extraction with ethyl acetate. Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 5: 1) to give 2.59 g of the desired 2-acetyl-4-chloro-5-methylpyridine (yield 53%). )
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.49 (s, 1H), 8.01 (s, 1H), 2.70 (s, 3H), 2.44 (s, 1H)
 b)N-(2-アセチル-5-メチルピリジン-4-イルオキシ)カルバミン酸t-ブチルの製造(化合物番号6-a-2)
 2-アセチル-4-クロロ-5-メチルピリジン3.85g、およびN-Boc-ヒドロキシルアミン4.54gをジメチルスルホキシド50mlに溶解させた溶液に、水酸化カリウム4.50gを加え、室温で1時間撹拌した。該溶液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を水で3回洗浄した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=7:3)にて精製し、目的とするN-(2-アセチル-5-メチルピリジン-4-イルオキシ)カルバミン酸t-ブチル4.37g(収率72%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.34(s,1H),7.89(s,1H),7.70(bs,1H),2.69(s,3H),2.30(s,3H),1.51(s,9H)
b) Preparation of t-butyl N- (2-acetyl-5-methylpyridin-4-yloxy) carbamate (Compound No. 6-a-2)
To a solution obtained by dissolving 3.85 g of 2-acetyl-4-chloro-5-methylpyridine and 4.54 g of N-Boc-hydroxylamine in 50 ml of dimethyl sulfoxide, 4.50 g of potassium hydroxide was added, and the mixture was stirred at room temperature for 1 hour. Stir. The solution was poured into ice water and then extracted with ethyl acetate. The obtained organic layer was washed with water three times. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 7: 3), and the target N- (2-acetyl-5-methylpyridin-4-yloxy) carbamic acid t- 4.37 g (72% yield) of butyl was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.34 (s, 1H), 7.89 (s, 1H), 7.70 (bs, 1H), 2.69 (s, 3H) , 2.30 (s, 3H), 1.51 (s, 9H)
 c)N-(2-アセチル-5-メチルピリジン-4-イルオキシ)カルバミン酸メチルの製造(化合物番号6-a-1)
 N-(2-アセチル-5-メチルピリジン-4-イルオキシ)カルバミン酸t-ブチル4.37gを塩化メチレン50mlに溶解させた。これに、氷冷下でトリエチルアミン3.32gを加え、次いでクロロギ酸メチル1.86gを滴下した。滴下終了後、1時間撹拌した。これに塩化アンモニウム水溶液を加えて塩化メチレン層を分離した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。
 得られた残渣に塩化メチレン30mlを加え、氷冷下でトリフルオロ酢酸10mlを滴下し、滴下終了後、室温にて5時間撹拌した。得られた液を飽和炭酸水素ナトリウム水溶液に注ぎ、これに塩化メチレンを加えて抽出した。得られた塩化メチレン層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた結晶をヘキサンで洗浄し、目的とするN-(2-アセチル-5-メチルピリジン-4-イルオキシ)カルバミン酸メチル3.45g(収率94%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.35(s,1H),8.07(s,1H),7.88(bs,1H),3.84(s,3H),2.69(s,3H),2.29(s,3H)
c) Preparation of methyl N- (2-acetyl-5-methylpyridin-4-yloxy) carbamate (Compound No. 6-a-1)
4.37 g of t-butyl N- (2-acetyl-5-methylpyridin-4-yloxy) carbamate was dissolved in 50 ml of methylene chloride. To this, 3.32 g of triethylamine was added under ice cooling, and then 1.86 g of methyl chloroformate was added dropwise. It stirred for 1 hour after completion | finish of dripping. To this was added an aqueous ammonium chloride solution to separate the methylene chloride layer. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure.
To the obtained residue, 30 ml of methylene chloride was added, and 10 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of the addition, the mixture was stirred at room temperature for 5 hours. The obtained liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and methylene chloride was added thereto for extraction. Magnesium sulfate was added to the resulting methylene chloride layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained crystals were washed with hexane to obtain 3.45 g (yield 94%) of the target methyl N- (2-acetyl-5-methylpyridin-4-yloxy) carbamate.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.35 (s, 1H), 8.07 (s, 1H), 7.88 (bs, 1H), 3.84 (s, 3H) , 2.69 (s, 3H), 2.29 (s, 3H)
 d)N-{5-メチル-2-[1-(2-トリフルオロメチルベンジルオキシイミノ)エチル]ピリジン-4-イルオキシ}カルバミン酸メチルの製造(化合物番号1-a-10)
 N-(2-アセチル-5-メチルピリジン-4-イルオキシ)カルバミン酸メチル0.25gをメタノール15mlに溶解させた。これに、O-(2-トリフルオロメチルベンジル)ヒドロキシルアミン塩酸塩0.30gを加え、2時間還流した。これに、酢酸エチルを加え、次いで飽和炭酸水素ナトリウム水溶液で洗浄した。有機層を硫酸マグネシウムにて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=2:1)にて精製し、目的とするN-{5-メチル-2-[1-(2-トリフルオロメチルベンジルオキシイミノ)エチル]ピリジン-4-イルオキシ}カルバミン酸メチル0.37g(収率84%、融点:110~111℃)を得た。
d) Preparation of methyl N- {5-methyl-2- [1- (2-trifluoromethylbenzyloxyimino) ethyl] pyridin-4-yloxy} carbamate (Compound No. 1-a-10)
0.25 g of methyl N- (2-acetyl-5-methylpyridin-4-yloxy) carbamate was dissolved in 15 ml of methanol. To this, 0.30 g of O- (2-trifluoromethylbenzyl) hydroxylamine hydrochloride was added and refluxed for 2 hours. To this was added ethyl acetate and then washed with saturated aqueous sodium bicarbonate. The organic layer was dried over magnesium sulfate, filtered, and then the solvent was removed under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 2: 1) to obtain the target N- {5-methyl-2- [1- (2-trifluoromethylbenzyloxy). 0.37 g of methyl (imino) ethyl] pyridin-4-yloxy} carbamate (yield 84%, melting point: 110-111 ° C.) was obtained.
(実施例2)
 N-[2-(1-{[1-(6-クロロピリジン-2-イル)エチリデン]ヒドラゾノ}エチル)-5-メチルピリジン-4-イルオキシ]カルバミン酸メチルの製造(化合物番号2-b-7)
 N-(2-アセチル-5-メチルピリジン-4-イルオキシ)カルバミン酸メチル0.35gをTHF10mlに溶解させた。この溶液に[1-(6-クロロピリジン-2-イル)エチリデン]ヒドラジン0.29gを加え、24時間還流した。得られた液から溶媒を減圧留去した。得られた残渣をNHゲルカラムクロマトグラフィー(展開溶媒;ベンゼン:酢酸エチル=3:1)にて精製し、目的とするN-[2-(1-{[1-(6-クロロピリジン-2-イル)エチリデン]ヒドラゾノ}エチル)-5-メチルピリジン-4-イルオキシ]カルバミン酸メチル0.35g(収率59%、融点172~174℃)を得た。
(Example 2)
Preparation of methyl N- [2- (1-{[1- (6-chloropyridin-2-yl) ethylidene] hydrazono} ethyl) -5-methylpyridin-4-yloxy] carbamate (Compound No. 2-b- 7)
0.35 g of methyl N- (2-acetyl-5-methylpyridin-4-yloxy) carbamate was dissolved in 10 ml of THF. To this solution was added 0.29 g of [1- (6-chloropyridin-2-yl) ethylidene] hydrazine, and the mixture was refluxed for 24 hours. The solvent was distilled off from the resulting liquid under reduced pressure. The obtained residue was purified by NH gel column chromatography (developing solvent; benzene: ethyl acetate = 3: 1), and the desired N- [2- (1-{[1- (6-chloropyridine-2] There was obtained 0.35 g (yield 59%, melting point 172 ° -174 ° C.) of -yl) ethylidene] hydrazono} ethyl) -5-methylpyridin-4-yloxy] carbamate.
(実施例3)
 a)4-クロロ-2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジンの製造
 2-ブロモ-4-クロロ-5-メチルピリジン1.05gを酢酸エチル30mlに溶解させた。これに3,3-ジメチル-1-ブチン0.79g、トリエチルアミン2.43g、ヨウ化銅0.05g、およびジクロロビストリフェニルホスフィンパラジウム0.17gを加え、窒素雰囲気下、50℃にて2時間撹拌した。得られた液をセライト濾過し、次いで溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=9:1)にて精製し、目的とする4-クロロ-2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジン1.04g(収率98%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.35(s,1H),7.37(s,1H),2.34(s,3H),1.37(s,9H)
(Example 3)
a) Preparation of 4-chloro-2- (3,3-dimethyl-1-butynyl) -5-methylpyridine 1.05 g of 2-bromo-4-chloro-5-methylpyridine was dissolved in 30 ml of ethyl acetate. To this was added 0.79 g of 3,3-dimethyl-1-butyne, 2.43 g of triethylamine, 0.05 g of copper iodide, and 0.17 g of dichlorobistriphenylphosphine palladium, and the mixture was stirred at 50 ° C. for 2 hours under a nitrogen atmosphere. did. The resulting liquid was filtered through Celite, and then the solvent was distilled off under reduced pressure. The residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 9: 1) to obtain the desired 4-chloro-2- (3,3-dimethyl-1-butynyl) -5-methylpyridine 1 0.04 g (98% yield) was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.35 (s, 1H), 7.37 (s, 1H), 2.34 (s, 3H), 1.37 (s, 9H)
 b)N-[2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジン-4-イルオキシ]カルバミン酸t-ブチルの製造(化合物番号3-a-20)
 4-クロロ-2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジン0.85g、およびN-Boc-ヒドロキシルアミン2.60gをジメチルスルホキシド20mlに溶解させた溶液に、水酸化カリウム2.60gを加え、50℃にて15時間撹拌した。得られた溶液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を水で3回洗浄した。硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=2:1)にて精製し、目的とするN-[2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジン-4-イルオキシ)カルバミン酸t-ブチル0.81g(収率65%、融点166~167℃)を得た。
b) Preparation of t-butyl N- [2- (3,3-dimethyl-1-butynyl) -5-methylpyridin-4-yloxy] carbamate (Compound No. 3-a-20)
To a solution of 0.85 g of 4-chloro-2- (3,3-dimethyl-1-butynyl) -5-methylpyridine and 2.60 g of N-Boc-hydroxylamine in 20 ml of dimethyl sulfoxide, potassium hydroxide was added. 2.60 g was added and stirred at 50 ° C. for 15 hours. The resulting solution was poured into ice water and then extracted with ethyl acetate. The obtained organic layer was washed with water three times. Magnesium sulfate was added and dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 2: 1) to obtain the target N- [2- (3,3-dimethyl-1-butynyl) -5-methyl. 0.81 g (yield 65%, melting point 166-167 ° C.) of t-butyl pyridine-4-yloxy) carbamate was obtained.
(実施例4)
 N-[2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジン-4-イルオキシ]カルバミン酸メチルの製造(化合物番号3-a-1)
 N-[2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジン-4-イルオキシ)カルバミン酸t-ブチル0.64gを塩化メチレン20mlに溶解させた。これに、氷冷下で、トリエチルアミン0.42gを加え、次いでクロロギ酸メチル0.30gを滴下した。滴下終了後、1時間撹拌した。塩化アンモニウム水溶液を加え、塩化メチレン層を分離した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。
 得られた残渣に塩化メチレン12mlを加え、氷冷下で、トリフルオロ酢酸4mlを滴下した。滴下終了後、室温にて5時間撹拌した。得られた液を飽和炭酸水素ナトリウム水溶液に注ぎ、これに塩化メチレンを加えて抽出した。得られた塩化メチレン層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=2:1)にて精製し、目的とするN-[2-(3,3-ジメチル-1-ブチニル)-5-メチルピリジン-4-イルオキシ]カルバミン酸メチル0.37g(収率67%、融点120~121℃)を得た。
Example 4
Production of methyl N- [2- (3,3-dimethyl-1-butynyl) -5-methylpyridin-4-yloxy] carbamate (Compound No. 3-a-1)
0.64 g of t-butyl N- [2- (3,3-dimethyl-1-butynyl) -5-methylpyridin-4-yloxy) carbamate was dissolved in 20 ml of methylene chloride. To this, 0.42 g of triethylamine was added under ice cooling, and then 0.30 g of methyl chloroformate was added dropwise. It stirred for 1 hour after completion | finish of dripping. Aqueous ammonium chloride was added and the methylene chloride layer was separated. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure.
To the obtained residue, 12 ml of methylene chloride was added, and 4 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of dropping, the mixture was stirred at room temperature for 5 hours. The obtained liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and methylene chloride was added thereto for extraction. Magnesium sulfate was added to the resulting methylene chloride layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 2: 1) to obtain the target N- [2- (3,3-dimethyl-1-butynyl) -5-methyl. 0.37 g of methyl pyridin-4-yloxy] carbamate (yield 67%, melting point 120-121 ° C.) was obtained.
(実施例5)
 a)4-クロロ-5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジンの製造
 2-ブロモ-4-クロロ-5-メチルピリジン0.61g、および3-トリフルオロメトキシフェニルボロン酸1.13gをジメチルホルムアミド20mlに溶解させた。これに、水4ml、炭酸カリウム1.12g、およびPd(dppf)Cl2・CH2Cl20.11gを加え、窒素雰囲気下、60℃にて2時間撹拌した。これに酢酸エチルを加え、次いで塩化アンモニウム水溶液で洗浄した。得られた有機層を硫酸マグネシウムにて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=20:1~10:1)にて精製し、目的とする4-クロロ-5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジン0.51g(収率60%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.51(s,1H),7.89~7.84(m,2H),7.70(s,1H),7.48(t,1H),7.29~7.24(m,1H),2.41(s,3H)
(Example 5)
a) Preparation of 4-chloro-5-methyl-2- (3-trifluoromethoxyphenyl) pyridine 0.61 g of 2-bromo-4-chloro-5-methylpyridine and 3-trifluoromethoxyphenylboronic acid 13 g was dissolved in 20 ml of dimethylformamide. 4 ml of water, 1.12 g of potassium carbonate, and 0.11 g of Pd (dppf) Cl 2 .CH 2 Cl 2 were added thereto, and the mixture was stirred at 60 ° C. for 2 hours under a nitrogen atmosphere. Ethyl acetate was added thereto, and then washed with an aqueous ammonium chloride solution. The obtained organic layer was dried over magnesium sulfate, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 20: 1 to 10: 1) to obtain the desired 4-chloro-5-methyl-2- (3-trifluoromethoxy). 0.51 g (60% yield) of phenyl) pyridine was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.51 (s, 1H), 7.89 to 7.84 (m, 2H), 7.70 (s, 1H), 7.48 ( t, 1H), 7.29-7.24 (m, 1H), 2.41 (s, 3H)
 b)N-[5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジン-4-イルオキシ]カルバミン酸t-ブチルの製造(化合物番号4-a-13)
 4-クロロ-5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジン0.51g、およびN-Boc-ヒドロキシルアミン1.44gをジメチルスルホキシド20mlに溶解させた溶液に、水酸化カリウム1.42gを加え、40℃にて15時間撹拌した。得られた液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を水で3回洗浄した。硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=3:1)にて精製し、目的とするN-[5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジン-4-イルオキシ]カルバミン酸t-ブチル0.60g(収率65%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.36(s,1H),7.87~7.82(m,2H),7.62(s,1H),7.53(s,1H),7.46(t,3H),7.26~7.24(m,1H),2.27(s,3H),1.53(s,9H)
b) Preparation of t-butyl N- [5-methyl-2- (3-trifluoromethoxyphenyl) pyridin-4-yloxy] carbamate (Compound No. 4-a-13)
To a solution of 0.51 g of 4-chloro-5-methyl-2- (3-trifluoromethoxyphenyl) pyridine and 1.44 g of N-Boc-hydroxylamine in 20 ml of dimethyl sulfoxide, 1.42 g of potassium hydroxide was added. And stirred at 40 ° C. for 15 hours. The resulting liquid was poured into ice water and then extracted with ethyl acetate. The obtained organic layer was washed with water three times. Magnesium sulfate was added and dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 3: 1) to obtain the target N- [5-methyl-2- (3-trifluoromethoxyphenyl) pyridine-4. There was obtained 0.60 g (yield: 65%) of t-butyl carbamate.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.36 (s, 1H), 7.87 to 7.82 (m, 2H), 7.62 (s, 1H), 7.53 ( s, 1H), 7.46 (t, 3H), 7.26-7.24 (m, 1H), 2.27 (s, 3H), 1.53 (s, 9H)
(実施例6)
 N-[5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジン-4-イルオキシ]カルバミン酸メチルの製造(化合物番号4-a-4)
 N-[5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジン-4-イルオキシ]カルバミン酸t-ブチル0.50gを塩化メチレン20mlに溶解させた。これに、氷冷下でトリエチルアミン0.26gを加え、次いでクロロギ酸メチル0.16gを滴下した。滴下終了後、1時間撹拌した。塩化アンモニウム水溶液を加えて塩化メチレン層を分離した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。
 得られた残渣に塩化メチレン12mlを加え、氷冷下、トリフルオロ酢酸4mlを滴下した。滴下終了後、室温にて5時間撹拌した。得られた液を飽和炭酸水素ナトリウム水溶液に注ぎ、次いで塩化メチレンを加えて抽出した。得られた塩化メチレン層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=2:1)にて精製し、目的とするN-[5-メチル-2-(3-トリフルオロメトキシフェニル)ピリジン-4-イルオキシ]カルバミン酸メチル0.35g(収率78%、融点130~132℃)を得た。
(Example 6)
Production of methyl N- [5-methyl-2- (3-trifluoromethoxyphenyl) pyridin-4-yloxy] carbamate (Compound No. 4-a-4)
0.50 g of t-butyl N- [5-methyl-2- (3-trifluoromethoxyphenyl) pyridin-4-yloxy] carbamate was dissolved in 20 ml of methylene chloride. To this, 0.26 g of triethylamine was added under ice cooling, and then 0.16 g of methyl chloroformate was added dropwise. It stirred for 1 hour after completion | finish of dripping. An aqueous ammonium chloride solution was added to separate the methylene chloride layer. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure.
To the obtained residue, 12 ml of methylene chloride was added, and 4 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of dropping, the mixture was stirred at room temperature for 5 hours. The resulting liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and then extracted with methylene chloride. Magnesium sulfate was added to the resulting methylene chloride layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 2: 1) to obtain the desired N- [5-methyl-2- (3-trifluoromethoxyphenyl) pyridine-4. There was obtained 0.35 g (yield 78%, melting point 130 to 132 ° C.) of methyl -yloxy] carbamate.
(実施例7)
 a)4-クロロ-5-メチルピリジン-2-カルボニトリルの製造
 2-ブロモ-4-クロロ-5-メチルピリジン1.50gをDMF20mlに溶解させた。これに、シアン化亜鉛0.43g、およびテトラキストリフェニルホスフィンパラジウム0.43gを加え、80℃で1時間撹拌した。これに水を加え、次いで酢酸エチルにて抽出した。得られた有機層を硫酸マグネシウムにて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=9:1)にて精製し、目的とする4-クロロ-5-メチルピリジン-2-カルボニトリル0.68g(収率61%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.54(s,1H),7.68(s,1H),2.46(s,3H)
(Example 7)
a) Preparation of 4-chloro-5-methylpyridine-2-carbonitrile 1.50 g of 2-bromo-4-chloro-5-methylpyridine was dissolved in 20 ml of DMF. To this, 0.43 g of zinc cyanide and 0.43 g of tetrakistriphenylphosphine palladium were added and stirred at 80 ° C. for 1 hour. Water was added thereto, followed by extraction with ethyl acetate. The obtained organic layer was dried over magnesium sulfate, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 9: 1) to obtain 0.68 g of the desired 4-chloro-5-methylpyridine-2-carbonitrile (yield 61 %).
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.54 (s, 1H), 7.68 (s, 1H), 2.46 (s, 3H)
 b)4-クロロ-5-メチルピリジン-2-チオカルボキサミドの製造
 水硫化ナトリウム0.94gにDMF15ml、および塩化マグネシウム六水和物1.20gを加え、室温で30分間撹拌した。これに4-クロロ-5-メチルピリジン-2-カルボニトリル0.68gを加え、室温にて3時間撹拌した。得られた液を塩化アンモニウム水溶液に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を塩化アンモニウム水溶液で3回洗浄した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた結晶をヘキサンで洗浄し、目的とする4-クロロ-5-メチルピリジン-2-チオカルボキサミド0.83g(収率72%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 9.38(bs,1H),8.67(s,1H),8.33(s,1H),7.70(bs,1H),2.43(s,3H)
b) Production of 4-chloro-5-methylpyridine-2-thiocarboxamide 15 ml of DMF and 1.20 g of magnesium chloride hexahydrate were added to 0.94 g of sodium hydrosulfide, and the mixture was stirred at room temperature for 30 minutes. To this was added 0.68 g of 4-chloro-5-methylpyridine-2-carbonitrile, and the mixture was stirred at room temperature for 3 hours. The resulting liquid was poured into an aqueous ammonium chloride solution and then extracted with ethyl acetate. The obtained organic layer was washed with an aqueous ammonium chloride solution three times. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained crystals were washed with hexane to obtain 0.83 g (yield: 72%) of the desired 4-chloro-5-methylpyridine-2-thiocarboxamide.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 9.38 (bs, 1H), 8.67 (s, 1H), 8.33 (s, 1H), 7.70 (bs, 1H) , 2.43 (s, 3H)
 c)4-クロロ-2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジンの製造
 4-クロロ-5-メチルピリジン-2-チオカルボキサミド0.83gをエタノール30mlに溶解させた。これに、1-ブロモ-3-(2-クロロ-6-フルオロフェニル)-2-プロパノン1.41gを加え、6時間還流した。これに飽和炭酸水素ナトリウム水溶液を加え、次いで酢酸エチルにて抽出した。得られた有機層を硫酸マグネシウムにて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=9:1)にて精製し、目的とする4-クロロ-2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン1.32g(収率84%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.38(s,1H),8.17(s,1H),7.28~7.17(m,2H),7.08~7.01(m,1H),6.82(s,1H),4.37(s,2H),2.39(s,3H)
c) Preparation of 4-chloro-2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridine 0.83 g of 4-chloro-5-methylpyridine-2-thiocarboxamide Was dissolved in 30 ml of ethanol. To this, 1.41 g of 1-bromo-3- (2-chloro-6-fluorophenyl) -2-propanone was added and refluxed for 6 hours. A saturated aqueous sodium hydrogen carbonate solution was added thereto, and the mixture was extracted with ethyl acetate. The obtained organic layer was dried over magnesium sulfate, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 9: 1) to obtain the desired 4-chloro-2- [4- (2-chloro-6-fluorobenzyl) thiazole. -2-yl] -5-methylpyridine (1.32 g, yield 84%) was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.38 (s, 1H), 8.17 (s, 1H), 7.28-7.17 (m, 2H), 7.08- 7.01 (m, 1H), 6.82 (s, 1H), 4.37 (s, 2H), 2.39 (s, 3H)
 d)N-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸t-ブチルの製造(化合物番号4-a-23)
 4-クロロ-2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン1.32g、およびN-Boc-ヒドロキシルアミン1.48gをジメチルスルホキシド30mlに溶解させた溶液に、水酸化カリウム1.47gを加え、40℃にて15時間撹拌した。得られた溶液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を水で3回洗浄した。硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた結晶をヘキサンで洗浄し、目的とするN-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸t-ブチル0.93g(収率55%、融点140~143℃)を得た。
d) Preparation of t-butyl N- {2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy} carbamate (Compound No. 4-a- 23)
Dissolve 1.32 g of 4-chloro-2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridine and 1.48 g of N-Boc-hydroxylamine in 30 ml of dimethyl sulfoxide To the solution was added 1.47 g of potassium hydroxide, and the mixture was stirred at 40 ° C. for 15 hours. The resulting solution was poured into ice water and then extracted with ethyl acetate. The obtained organic layer was washed with water three times. Magnesium sulfate was added and dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained crystals were washed with hexane, and the desired N- {2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy} carbamic acid t 0.93 g of butyl (yield 55%, melting point 140-143 ° C.) was obtained.
(実施例8)
 N-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸メチルの製造(化合物番号4-a-16)
 N-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸t-ブチル0.80gを塩化メチレン20mlに溶解させた。これに、氷冷下でトリエチルアミン0.36gを加え、次いでクロロギ酸メチル0.22gを滴下した。滴下終了後、1時間撹拌した。これに塩化アンモニウム水溶液を加えて塩化メチレン層を分離した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。
 得られた残渣に塩化メチレン9mlを加え、氷冷下、トリフルオロ酢酸3mlを滴下した。滴下終了後、室温にて5時間撹拌した。得られた液を飽和炭酸水素ナトリウム水溶液に注ぎ、これに塩化メチレンを加えて抽出した。得られた塩化メチレン層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=2:1)にて精製し、目的とするN-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸メチル0.68g(収率93%、融点175~177℃)を得た。
(Example 8)
Production of methyl N- {2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy} carbamate (Compound No. 4-a-16)
0.80 g of t-butyl N- {2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy} carbamate was dissolved in 20 ml of methylene chloride. . To this, 0.36 g of triethylamine was added under ice cooling, and then 0.22 g of methyl chloroformate was added dropwise. It stirred for 1 hour after completion | finish of dripping. To this was added an aqueous ammonium chloride solution to separate the methylene chloride layer. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure.
To the obtained residue, 9 ml of methylene chloride was added, and 3 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of dropping, the mixture was stirred at room temperature for 5 hours. The obtained liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and methylene chloride was added thereto for extraction. Magnesium sulfate was added to the resulting methylene chloride layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 2: 1), and the target N- {2- [4- (2-chloro-6-fluorobenzyl) thiazole- 0.68 g of methyl 2-yl] -5-methylpyridin-4-yloxy} carbamate (yield 93%, melting point 175 to 177 ° C.) was obtained.
(実施例9)
 N-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}-N-アセトキシメチルカルバミン酸メチルの製造(化合物番号4-a-19)
 N-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸メチル0.36gをアセトニトリル15mlに溶解させた。これに、炭酸カリウム1.22g、および酢酸ブロモメチル0.20gを加え、室温にて2時間撹拌した。得られた溶液を濾過し、溶媒を減圧留去した。残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ベンゼン:酢酸エチル=20:1)にて精製し、目的とするN-{2-[4-(2-クロロ-6-フルオロベンジル)チアゾール-2-イル]-5-メチルピリジン-4-イルオキシ}-N-アセトキシメチルカルバミン酸メチル0.32g(収率76%、融点104~106℃)を得た。
Example 9
Preparation of methyl N- {2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy} -N-acetoxymethylcarbamate (Compound No. 4-a- 19)
0.36 g of methyl N- {2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl] -5-methylpyridin-4-yloxy} carbamate was dissolved in 15 ml of acetonitrile. To this, 1.22 g of potassium carbonate and 0.20 g of bromomethyl acetate were added and stirred at room temperature for 2 hours. The resulting solution was filtered and the solvent was distilled off under reduced pressure. The residue was purified by silica gel column chromatography (developing solvent; benzene: ethyl acetate = 20: 1), and the desired N- {2- [4- (2-chloro-6-fluorobenzyl) thiazol-2-yl ] 0.32 g of methyl 5-5-pyridin-4-yloxy} -N-acetoxymethylcarbamate (yield 76%, melting point 104-106 ° C.) was obtained.
(実施例10)
 a)4-クロロ-5-メチル-2-(1H-ピラゾール-3-イル)ピリジンの製造
 2-アセチル-4-クロロ-5-メチルピリジン2.49gにジメチルホルムアミドジメチルアセタール8mlを加え、18時間加熱還流した。次いで、これを減圧濃縮した。得られた粗生成物をメタノール20mlに溶解させた。これに、抱水ヒドラジン0.74gを加え、50℃にて6時間撹拌した。これに飽和塩化アンモニウム水溶液を加え、次いで酢酸エチルにて抽出した。有機層を硫酸マグネシウムにて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた結晶をヘキサンにて洗浄し、目的とする4-クロロ-5-メチル-2-(1H-ピラゾール-3-イル)ピリジン2.56g(収率90%、融点98~101℃)を得た。
(Example 10)
a) Preparation of 4-chloro-5-methyl-2- (1H-pyrazol-3-yl) pyridine 8 ml of dimethylformamide dimethyl acetal was added to 2.49 g of 2-acetyl-4-chloro-5-methylpyridine for 18 hours. Heated to reflux. This was then concentrated under reduced pressure. The obtained crude product was dissolved in 20 ml of methanol. To this, 0.74 g of hydrazine hydrate was added and stirred at 50 ° C. for 6 hours. To this was added a saturated aqueous ammonium chloride solution, followed by extraction with ethyl acetate. The organic layer was dried over magnesium sulfate, filtered, and then the solvent was removed under reduced pressure. The obtained crystals were washed with hexane, and 2.56 g of the desired 4-chloro-5-methyl-2- (1H-pyrazol-3-yl) pyridine was obtained (yield 90%, melting point 98-101 ° C.). Obtained.
 b)4-クロロ-2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジンの製造
 4-クロロ-5-メチル-2-(1H-ピラゾール-3-イル)ピリジン0.70gをDMF20mlに溶解させた。これに、氷冷下、水素化ナトリウム0.19g、および2-クロロ-6-フルオロベンジルクロライド0.77gを加え、室温にて3時間撹拌した。得られた液に飽和塩化アンモニウム水溶液を加え、次いで酢酸エチルにて抽出した。得られた有機層を飽和食塩水で3回洗浄した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた結晶をヘキサンで洗浄し、目的とする4-クロロ-2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジン0.97g(収率80%、融点118~120℃)を得た。
b) Preparation of 4-chloro-2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridine 4-chloro-5-methyl-2- (1H- Pyrazol-3-yl) pyridine (0.70 g) was dissolved in 20 ml of DMF. Under ice cooling, 0.19 g of sodium hydride and 0.77 g of 2-chloro-6-fluorobenzyl chloride were added thereto, and the mixture was stirred at room temperature for 3 hours. A saturated aqueous ammonium chloride solution was added to the obtained liquid, and then extracted with ethyl acetate. The obtained organic layer was washed 3 times with saturated brine. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained crystals were washed with hexane, and 0.97 g of the desired 4-chloro-2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridine ( Yield 80%, melting point 118-120 ° C.).
 c)N-{2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸t-ブチルの製造(化合物番号4-a-33)
 4-クロロ-2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジン0.78g、およびN-Boc-ヒドロキシルアミン3.20gをジメチルスルホキシド30mlに溶解させた溶液に、水酸化カリウム3.20gを加え、50℃にて15時間撹拌した。室温に戻した後、該溶液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を水で3回洗浄した。硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=3:1)にて精製し、目的とするN-{2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸t-ブチル0.24g(収率24%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.41(s,1H),8.40(s,1H),7.88(s,1H),7.48(d,1H),7.31~7.25(m,2H),7.15(dd,1H),6.75(d,1H),5.60(s,2H),2.35(s,3H),1.50(s,9H)
c) Preparation of t-butyl N- {2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridin-4-yloxy} carbamate (Compound No. 4) -A-33)
4-Chloro-2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridine (0.78 g) and N-Boc-hydroxylamine (3.20 g) were added to dimethyl sulfoxide. To the solution dissolved in 30 ml, 3.20 g of potassium hydroxide was added and stirred at 50 ° C. for 15 hours. After returning to room temperature, the solution was poured into ice water and then extracted with ethyl acetate. The obtained organic layer was washed with water three times. Magnesium sulfate was added and dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 3: 1), and the desired N- {2- [1- (2-chloro-6-fluorobenzyl) -1H -Pyrazol-3-yl] -5-methylpyridin-4-yloxy} carbamate t-butyl 0.24 g (yield 24%) was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.41 (s, 1H), 8.40 (s, 1H), 7.88 (s, 1H), 7.48 (d, 1H) , 7.31-7.25 (m, 2H), 7.15 (dd, 1H), 6.75 (d, 1H), 5.60 (s, 2H), 2.35 (s, 3H), 1.50 (s, 9H)
(実施例11)
 N-{2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸メチルの製造(化合物番号4-a-26)
 N-{2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸t-ブチル0.24gを塩化メチレン20mlに溶解させた。これに、氷冷下でトリエチルアミン0.11gを加え、次いでクロロギ酸メチル0.07gを滴下した。滴下終了後、1時間撹拌した。これに塩化アンモニウム水溶液を加えて塩化メチレン層を分離した。これに硫酸マグネシウムを加え乾燥させ、ろ過し、次いで溶媒を減圧留去した。
 得られた残渣に塩化メチレン9mlを加え、氷冷下、トリフルオロ酢酸3mlを滴下した。滴下終了後、室温にて5時間撹拌した。得られた液を飽和炭酸水素ナトリウム水溶液に注ぎ、次いで塩化メチレンを加えて抽出した。得られた塩化メチレン層に硫酸マグネシウムを加え乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた結晶をヘキサンで洗浄し、目的とするN-{2-[1-(2-クロロ-6-フルオロベンジル)-1H-ピラゾール-3-イル]-5-メチルピリジン-4-イルオキシ}カルバミン酸メチル0.22g(収率100%、融点152~155℃)を得た。
Example 11
Preparation of methyl N- {2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridin-4-yloxy} carbamate (Compound No. 4-a-26 )
0.24 g of t-butyl N- {2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridin-4-yloxy} carbamate is added to 20 ml of methylene chloride. Dissolved. To this, 0.11 g of triethylamine was added under ice cooling, and then 0.07 g of methyl chloroformate was added dropwise. It stirred for 1 hour after completion | finish of dripping. To this was added an aqueous ammonium chloride solution to separate the methylene chloride layer. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure.
To the obtained residue, 9 ml of methylene chloride was added, and 3 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of dropping, the mixture was stirred at room temperature for 5 hours. The resulting liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and then extracted with methylene chloride. Magnesium sulfate was added to the resulting methylene chloride layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained crystals were washed with hexane, and the desired N- {2- [1- (2-chloro-6-fluorobenzyl) -1H-pyrazol-3-yl] -5-methylpyridin-4-yloxy} 0.22 g of methyl carbamate (yield 100%, melting point 152-155 ° C.) was obtained.
(実施例12)
 a)6-アセチル-2-ブロモ-3-メチルピリジンの製造
 窒素雰囲気下、2-ブロモ-6-シアノ-3-メチルピリジン1.26gをTHF 100mlに溶解させた。これに-78℃にてヨウ化メチルマグネシウム(3.0mol/L)4.5mlを滴下した。滴下終了後、0℃にて3時間撹拌した。反応終了後、0℃にて塩化アンモニウム水溶液を加え、次いで酢酸エチルで抽出した。得られた有機層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=1:1)にて精製し、目的とする6-アセチル-2-ブロモ-3-メチルピリジン0.88g(収率64%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 7.90(d,1H),7.64(d,1H),2.69(s,3H),2.47(s,3H)
(Example 12)
a) Preparation of 6-acetyl-2-bromo-3-methylpyridine 1.26 g of 2-bromo-6-cyano-3-methylpyridine was dissolved in 100 ml of THF under a nitrogen atmosphere. To this, 4.5 ml of methylmagnesium iodide (3.0 mol / L) was added dropwise at -78 ° C. After completion of dropping, the mixture was stirred at 0 ° C. for 3 hours. After completion of the reaction, an aqueous ammonium chloride solution was added at 0 ° C., followed by extraction with ethyl acetate. Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 1: 1) to obtain 0.88 g of the desired 6-acetyl-2-bromo-3-methylpyridine (yield 64%). )
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 7.90 (d, 1H), 7.64 (d, 1H), 2.69 (s, 3H), 2.47 (s, 3H)
 b)N-(6-アセチル-3-メチルピリジン-2-イルオキシ)カルバミン酸t-ブチルの製造(化合物番号6-b-8)
 水酸化カリウム1.48g(26.3mmol)のジメチルスルホキシド(20ml)溶液に、6-アセチル-2-ブロモ-3-メチルピリジン1.88g、およびN-Boc-ヒドロキシルアミン1.52gを加え、室温で24時間撹拌した。得られた溶液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を水で3回洗浄した。硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=2:1)にて精製し、目的とするN-(6-アセチル-3-メチルピリジン-2-イルオキシ)カルバミン酸t-ブチル0.75g(収率36%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.20(s,1H),7.71(d,1H),7.61(d,1H),2.64(s,3H),2.38(s,3H),1.48(s,9H)
b) Production of t-butyl N- (6-acetyl-3-methylpyridin-2-yloxy) carbamate (Compound No. 6-b-8)
To a solution of 1.48 g (26.3 mmol) of potassium hydroxide in dimethyl sulfoxide (20 ml) was added 1.88 g of 6-acetyl-2-bromo-3-methylpyridine and 1.52 g of N-Boc-hydroxylamine. For 24 hours. The resulting solution was poured into ice water and then extracted with ethyl acetate. The obtained organic layer was washed with water three times. Magnesium sulfate was added and dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 2: 1), and the target N- (6-acetyl-3-methylpyridin-2-yloxy) carbamic acid t- 0.75 g (36% yield) of butyl was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.20 (s, 1H), 7.71 (d, 1H), 7.61 (d, 1H), 2.64 (s, 3H) , 2.38 (s, 3H), 1.48 (s, 9H)
 c)N-(6-アセチル-3-メチルピリジン-2-イルオキシ)カルバミン酸メチルの製造(化合物番号6-b-7)
 N-(6-アセチル-3-メチルピリジン-2-イルオキシ)カルバミン酸t-ブチル0.75gを塩化メチレン10mlに溶解させた。これに、氷冷下トリエチルアミン0.67mlを加え、次いでクロロギ酸メチル0.32mlを滴下した。滴下終了後、室温にて24時間撹拌した。得られた溶液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。
 得られた残渣に塩化メチレン10mlを加え、氷冷下、トリフルオロ酢酸3.3mlを滴下した。滴下終了後、0℃にて4時間撹拌した。得られた液に酢酸エチルおよび水酸化ナトリウム水溶液(4mol/l)を加えpHを約10に調整した。次いで酢酸エチルで抽出した。得られた有機層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=1:1)にて精製し、目的とするN-(6-アセチル-3-メチルピリジン-2-イルオキシ)カルバミン酸メチル0.44g(収率61%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.33(bs,1H),7.71(d,1H),7.62(d,1H),3.83(s,3H),2.61(s,3H),2.38(s,3H)
c) Preparation of methyl N- (6-acetyl-3-methylpyridin-2-yloxy) carbamate (Compound No. 6-b-7)
0.75 g of t-butyl N- (6-acetyl-3-methylpyridin-2-yloxy) carbamate was dissolved in 10 ml of methylene chloride. To this, 0.67 ml of triethylamine was added under ice cooling, and then 0.32 ml of methyl chloroformate was added dropwise. After completion of dropping, the mixture was stirred at room temperature for 24 hours. The resulting solution was poured into ice water and then extracted with ethyl acetate. Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure.
To the obtained residue, 10 ml of methylene chloride was added, and 3.3 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of dropping, the mixture was stirred at 0 ° C. for 4 hours. Ethyl acetate and aqueous sodium hydroxide solution (4 mol / l) were added to the resulting liquid to adjust the pH to about 10. It was then extracted with ethyl acetate. Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 1: 1) to obtain the target methyl N- (6-acetyl-3-methylpyridin-2-yloxy) carbamate. Obtained .44 g (61% yield).
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.33 (bs, 1H), 7.71 (d, 1H), 7.62 (d, 1H), 3.83 (s, 3H) 2.61 (s, 3H), 2.38 (s, 3H)
 d)N-[6-(1-{[1-(6-ブロモピリジン-2-イル)エチリデン]ヒドラゾノ}エチル)-3-メチルピリジン-2-イルオキシ]カルバミン酸メチルの製造(化合物番号2-b-18)
 2-アセチル-6-ブロモピリジン0.40gをメタノール10mlに溶解させた。この溶液に抱水ヒドラジン0.15mlを加え50℃にて攪拌した。これに室温にて水を加え、次いで酢酸エチルにて抽出した。得られた有機層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣を1,4-ジオキサン10mlに溶解させた。この溶液にN-(6-アセチル-3-メチルピリジン-2-イルオキシ)カルバミン酸メチル0.22g、過剰量の無水硫酸ナトリウムおよび触媒量のp-トルエンスルホン酸一水和物を加え、50℃にて10分間攪拌した。得られた液を飽和炭酸水素ナトリウム水溶液に注ぎ、次いで酢酸エチルを加えて抽出した。得られた有機層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をNHゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=3:1)にて精製し、目的とするN-[6-(1-{[1-(6-ブロモピリジン-2-イル)エチリデン]ヒドラゾノ}エチル)-3-メチルピリジン-2-イルオキシ]カルバミン酸メチル0.12g(収率32%、融点136-140℃)を得た。
d) Preparation of methyl N- [6- (1-{[1- (6-bromopyridin-2-yl) ethylidene] hydrazono} ethyl) -3-methylpyridin-2-yloxy] carbamate (Compound No. 2- b-18)
0.40 g of 2-acetyl-6-bromopyridine was dissolved in 10 ml of methanol. To this solution, 0.15 ml of hydrazine hydrate was added and stirred at 50 ° C. Water was added thereto at room temperature, followed by extraction with ethyl acetate. Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was dissolved in 10 ml of 1,4-dioxane. To this solution, 0.22 g of methyl N- (6-acetyl-3-methylpyridin-2-yloxy) carbamate, an excess amount of anhydrous sodium sulfate and a catalytic amount of p-toluenesulfonic acid monohydrate were added, and the mixture was stirred at 50 ° C. For 10 minutes. The obtained liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and then extracted by adding ethyl acetate. Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by NH gel column chromatography (developing solvent; hexane: ethyl acetate = 3: 1), and the desired N- [6- (1-{[1- (6-bromopyridine-2] -Il) ethylidene] hydrazono} ethyl) -3-methylpyridin-2-yloxy] carbamate 0.12 g (yield 32%, melting point 136-140 ° C.).
(実施例13)
 a)N-(4-アセチルピリジン-2-イルオキシ)カルバミン酸t-ブチルの製造(化合物番号6-b-2)
 水酸化カリウム5.41g(96.4mmol)のジメチルスルホキシド(80ml)溶液に、4-アセチル-2-クロロピリジン5.00g、およびN-Boc-ヒドロキシルアミン5.57gを加え、室温で24時間撹拌した。得られた溶液を飽和塩化アンモニウム水溶液に注ぎ、次いで酢酸エチルで抽出した。得られた有機層を水で3回洗浄した。これに硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ヘキサン:酢酸エチル=1:1)にて精製し、目的とするN-(4-アセチルピリジン-2-イルオキシ)カルバミン酸t-ブチル5.92g(収率73%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.33(d,1H),8.25(bs,1H),7.46(dd,1H),7.41~7.40(m,1H),2.61(s,3H),1.49(s,9H)
(Example 13)
a) Preparation of t-butyl N- (4-acetylpyridin-2-yloxy) carbamate (Compound No. 6-b-2)
To a solution of 5.41 g (96.4 mmol) of potassium hydroxide in dimethyl sulfoxide (80 ml) was added 5.00 g of 4-acetyl-2-chloropyridine and 5.57 g of N-Boc-hydroxylamine, and the mixture was stirred at room temperature for 24 hours. did. The resulting solution was poured into a saturated aqueous ammonium chloride solution and then extracted with ethyl acetate. The obtained organic layer was washed with water three times. Magnesium sulfate was added to this, dried, filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; hexane: ethyl acetate = 1: 1) to obtain 5.92 g of the target t-butyl N- (4-acetylpyridin-2-yloxy) carbamate. (Yield 73%) was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.33 (d, 1H), 8.25 (bs, 1H), 7.46 (dd, 1H), 7.41-7.40 ( m, 1H), 2.61 (s, 3H), 1.49 (s, 9H)
 b)N-(4-アセチルピリジン-2-イルオキシ)カルバミン酸メチルの製造(化合物番号6-b-1)
 N-(4-アセチルピリジン-2-イルオキシ)カルバミン酸t-ブチル5.92gを塩化メチレン100mlに溶解させた。これに氷冷下でトリエチルアミン5.0mlを加え、次いでクロロギ酸メチル2.4mlを滴下した。滴下終了後、0℃にて3時間撹拌した。得られた溶液を氷水に注ぎ、次いで酢酸エチルで抽出した。得られた有機層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。
 得られた残渣に塩化メチレン100mlを加え、氷冷下でトリフルオロ酢酸15mlを滴下した。滴下終了後、室温にて2時間撹拌した。得られた液を飽和炭酸水素ナトリウム水溶液に注ぎ、次いで塩化メチレンを加えて抽出した。得られた塩化メチレン層に硫酸マグネシウムを加えて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ベンゼン:酢酸エチル=5:1)にて精製し、目的とするN-(4-アセチルピリジン-2-イルオキシ)カルバミン酸メチル2.19g(収率44%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.44(bs,1H),8.33(d,1H),7.48(d,1H),7.42(bs,1H),3.82(s,3H),2.62(s,3H)
b) Production of methyl N- (4-acetylpyridin-2-yloxy) carbamate (Compound No. 6-b-1)
5.92 g of t-butyl N- (4-acetylpyridin-2-yloxy) carbamate was dissolved in 100 ml of methylene chloride. To this was added 5.0 ml of triethylamine under ice cooling, and then 2.4 ml of methyl chloroformate was added dropwise. After completion of dropping, the mixture was stirred at 0 ° C. for 3 hours. The resulting solution was poured into ice water and then extracted with ethyl acetate. Magnesium sulfate was added to the obtained organic layer, dried and filtered, and then the solvent was distilled off under reduced pressure.
100 ml of methylene chloride was added to the resulting residue, and 15 ml of trifluoroacetic acid was added dropwise under ice cooling. After completion of dropping, the mixture was stirred at room temperature for 2 hours. The resulting liquid was poured into a saturated aqueous sodium hydrogen carbonate solution, and then extracted with methylene chloride. Magnesium sulfate was added to the resulting methylene chloride layer, dried and filtered, and then the solvent was distilled off under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; benzene: ethyl acetate = 5: 1) to give 2.19 g (recovery) of the target methyl N- (4-acetylpyridin-2-yloxy) carbamate. 44%).
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.44 (bs, 1H), 8.33 (d, 1H), 7.48 (d, 1H), 7.42 (bs, 1H) , 3.82 (s, 3H), 2.62 (s, 3H)
 c)N-{4-[1-(2-トリフルオロメチルベンジルオキシイミノ)エチル]ピリジン-2-イルオキシ}カルバミン酸メチルの製造(化合物番号1-b-4)
 N-(4-アセチルピリジン-2-イルオキシ)カルバミン酸メチル0.23gをメタノール10mlに溶解させた。これにO-(2-トリフルオロメチルベンジル)ヒドロキシルアミン塩酸塩0.21gを加え、50℃にて1時間攪拌した。これに、酢酸エチルを加え、次いで飽和炭酸水素ナトリウム水溶液で洗浄した。有機層を硫酸マグネシウムにて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ベンゼン:酢酸エチル=5:1)にて精製し、目的とするN-{4-[1-(2-トリフルオロメチルベンジルオキシイミノ)エチル]ピリジン-2-イルオキシ}カルバミン酸メチル0.29g(収率76%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.46(s,1H),8.12(d,1H),7.68(d,1H),7.60~7.53(m,2H),7.44~7.39(m,1H),7.32(d,1H),7.16(s,1H),5.47(s,2H),3.81(s,3H),2.26(s,3H)
c) Preparation of methyl N- {4- [1- (2-trifluoromethylbenzyloxyimino) ethyl] pyridin-2-yloxy} carbamate (Compound No. 1-b-4)
0.23 g of methyl N- (4-acetylpyridin-2-yloxy) carbamate was dissolved in 10 ml of methanol. To this, 0.21 g of O- (2-trifluoromethylbenzyl) hydroxylamine hydrochloride was added and stirred at 50 ° C. for 1 hour. To this was added ethyl acetate and then washed with saturated aqueous sodium bicarbonate. The organic layer was dried over magnesium sulfate, filtered, and then the solvent was removed under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; benzene: ethyl acetate = 5: 1), and the desired N- {4- [1- (2-trifluoromethylbenzyloxyimino) ethyl] 0.29 g (yield 76%) of methyl pyridin-2-yloxy} carbamate was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.46 (s, 1H), 8.12 (d, 1H), 7.68 (d, 1H), 7.60 to 7.53 ( m, 2H), 7.44-7.39 (m, 1H), 7.32 (d, 1H), 7.16 (s, 1H), 5.47 (s, 2H), 3.81 (s) , 3H), 2.26 (s, 3H)
(実施例14)
 N-{4-[1-(6-クロロピリジン-2-イルメトキシイミノ)エチル]ピリジン-2-イルオキシ}カルバミン酸メチルの製造(化合物番号1-b-11)
 N-(4-アセチルピリジン-2-イルオキシ)カルバミン酸メチル0.23gを1,2-ジクロロエタン10mlに溶解させた。これにO-(6-クロロピリジン-2-イルメチル)ヒドロキシルアミン塩酸塩0.25gとトリフルオロ酢酸1mlを加え、50℃にて1時間攪拌した。これに、酢酸エチルを加え、次いで飽和炭酸水素ナトリウム水溶液で洗浄した。有機層を硫酸マグネシウムにて乾燥させ、ろ過し、次いで溶媒を減圧留去した。得られた残渣をシリカゲルカラムクロマトグラフィー(展開溶媒;ベンゼン:酢酸エチル=5:1)にて精製し、目的とするN-{4-[1-(6-クロロピリジン-2-イルメトキシイミノ)エチル]ピリジン-2-イルオキシ}カルバミン酸メチル0.46g(収率82%)を得た。
 1H-NMR(CDCl3/TMS,δ(ppm)) 8.50(s,1H),8.13(d,1H),7.66(t,1H),7.32~7.24(m,3H),7.16(s,1H),5.34(s,2H),3.81(s,3H),2.29(s,3H)
(Example 14)
Production of methyl N- {4- [1- (6-chloropyridin-2-ylmethoxyimino) ethyl] pyridin-2-yloxy} carbamate (Compound No. 1-b-11)
0.23 g of methyl N- (4-acetylpyridin-2-yloxy) carbamate was dissolved in 10 ml of 1,2-dichloroethane. To this were added 0.25 g of O- (6-chloropyridin-2-ylmethyl) hydroxylamine hydrochloride and 1 ml of trifluoroacetic acid, and the mixture was stirred at 50 ° C. for 1 hour. To this was added ethyl acetate and then washed with saturated aqueous sodium bicarbonate. The organic layer was dried over magnesium sulfate, filtered, and then the solvent was removed under reduced pressure. The obtained residue was purified by silica gel column chromatography (developing solvent; benzene: ethyl acetate = 5: 1) to obtain the target N- {4- [1- (6-chloropyridin-2-ylmethoxyimino). 0.46 g (82% yield) of methyl] ethyl] pyridin-2-yloxy} carbamate was obtained.
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.50 (s, 1H), 8.13 (d, 1H), 7.66 (t, 1H), 7.32 to 7.24 ( m, 3H), 7.16 (s, 1H), 5.34 (s, 2H), 3.81 (s, 3H), 2.29 (s, 3H)
(化合物の例示)
 以上のような製造法と同様の方法にて得られる本発明の含窒素ヘテロアリール誘導体の他の例を、上記実施例で得られた化合物を含めて、第1表~第10表に示す。さらに、製造中間体を、第11表~第14表に示す。
 但し、表中、Meはメチル基を、Etはエチル基を、Prはイソプロピル基を、Buはターシャルブチル基を、Acはアセチル基を、Phはフェニル基を、Prはシクロプロピル基を、Penはシクロペンチル基を、Hexはシクロヘキシル基を、Py-2-ylはピリジン-2-イル基を、それぞれ表す。第1表は式(1-a)で表される化合物、第2表は式(1-b)で表される化合物、第3表は式(2-a)で表される化合物、第4表は式(2-b)で表される化合物、第5表は式(3-a)で表される化合物、第6表は式(3-b)で表される化合物、第7表は式(4-a)で表される化合物、第8表は式(4-b)で表される化合物をそれぞれ示している。第9表は式(5-a)で表される化合物、第10表は式(5-b)で表される化合物をそれぞれ示している。第11表は式(6-a)で表される製造中間体、第12表は式(6-b)で表される製造中間体をそれぞれ示している。第13表は式(7-a)で表される製造中間体、第14表は式(7-b)で表される製造中間体をそれぞれ示している。
(Examples of compounds)
Other examples of the nitrogen-containing heteroaryl derivative of the present invention obtained by a method similar to the above production method are shown in Tables 1 to 10 including the compounds obtained in the above Examples. Further, production intermediates are shown in Tables 11 to 14.
In the table, Me is a methyl group, Et is an ethyl group, i Pr is an isopropyl group, t Bu is a tertiary butyl group, Ac is an acetyl group, Ph is a phenyl group, and c Pr is cyclopropyl. C Pen represents a cyclopentyl group, c Hex represents a cyclohexyl group, and Py-2-yl represents a pyridin-2-yl group. Table 1 is a compound represented by formula (1-a), Table 2 is a compound represented by formula (1-b), Table 3 is a compound represented by formula (2-a), Table 4 Table is a compound represented by Formula (2-b), Table 5 is a compound represented by Formula (3-a), Table 6 is a compound represented by Formula (3-b), Table 7 is The compounds represented by formula (4-a) and Table 8 show the compounds represented by formula (4-b), respectively. Table 9 shows the compound represented by the formula (5-a), and Table 10 shows the compound represented by the formula (5-b). Table 11 shows production intermediates represented by formula (6-a), and Table 12 shows production intermediates represented by formula (6-b). Table 13 shows the production intermediate represented by the formula (7-a), and Table 14 shows the production intermediate represented by the formula (7-b).
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000011
Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000012
Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000017
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000023
Figure JPOXMLDOC01-appb-T000023
 また、上記表に示した化合物について1H-NMR等の物性を測定した。その一部を下記に示す。
<化合物番号1-a-11>
 H-NMR(CDCl/TMS,δ(ppm)) 8.23(s,1H), 7.97(bs,1H),7.61(s,1H),7.57(t,1H),7.16(d,1H),7.02(d,1H),5.47(q,1H),3.81(s,3H),2.82(q,1H),2.39(s,3H),2.20(s,3H),1.63(d,3H),1.30(t,3H)
<化合物番号1-a-13>
 H-NMR(CDCl/TMS,δ(ppm)) 8.27(s,1H), 7.80(s,1H),7.76(s,1H),7.47(d,1H),7.25~7.12(m,3H),5.36(t,1H),3.86(s,3H),2.92~2.73(m,2H),2.28~2.17(m,1H),2.28(s,3H),2.23(s,3H),2.04~1.95(m,2H),1.85~1.74(m,1H) 
<化合物番号1-a-24>
 H-NMR(CDCl/TMS,δ(ppm)) 8.26(s,1H), 7.57(t,1H),7.44(s,1H),7.16(d,1H),7.03(d,1H),5.63(s,2H),5.47(q,1H),3.82(s,3H),2.82(q,2H),2.40(s,3H),2.25(s,3H),2.01(s,3H),1.64(d,3H),1.30(t,3H)
<化合物番号1-a-56>
 H-NMR(CDCl/TMS,δ(ppm)) 7.69(s,1H), 7.55(t,1H),7.48(s,1H),7.15(d,1H),7.02(d,1H),5.47(q,1H),3.80(s,3H),3.05(sep,1H),2.49(s,3H),2.40(s,3H),2.15(s,3H),1.63(d,3H),1.29(d,6H)
<化合物番号1-a-65>
 H-NMR(CDCl/TMS,δ(ppm)) 7.69(s,1H), 7.61(s,1H),7.49~7.46(m,1H),7.23~7.12(m,3H),5.35(t,1H),3.85(s,3H),2.91~2.70(m,2H),2.51(s,3H),2.28(s,3H),2.24~2.20(m, 1H),2.18(s,3H),2.06~1.94(m,2H),1.84~1.73(m,1H)
<化合物番号1-a-70>
 H-NMR(CDCl/TMS,δ(ppm)) 8.25(s,1H),7.87(s,1H),7.74(s,1H),7.51(d,1H),7.29~7.18(m,3H),5.82(dd,1H),3.86(s,3H),3.18~3.08(m,1H),2.93~2.83(m,1H),2.56~2.44(m,1H),2.33~2.24(m,1H),2.25(s,3H),2.23(s,3H)
Further, physical properties such as 1 H-NMR of the compounds shown in the above table were measured. Some of them are shown below.
<Compound No. 1-a-11>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.23 (s, 1H), 7.97 (bs, 1H), 7.61 (s, 1H), 7.57 (t, 1H) 7.16 (d, 1H), 7.02 (d, 1H), 5.47 (q, 1H), 3.81 (s, 3H), 2.82 (q, 1H), 2.39 ( s, 3H), 2.20 (s, 3H), 1.63 (d, 3H), 1.30 (t, 3H)
<Compound No. 1-a-13>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.27 (s, 1H), 7.80 (s, 1H), 7.76 (s, 1H), 7.47 (d, 1H) 7.25-7.12 (m, 3H), 5.36 (t, 1H), 3.86 (s, 3H), 2.92-2.73 (m, 2H), 2.28-2 .17 (m, 1H), 2.28 (s, 3H), 2.23 (s, 3H), 2.04 to 1.95 (m, 2H), 1.85 to 1.74 (m, 1H) )
<Compound No. 1-a-24>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.26 (s, 1H), 7.57 (t, 1H), 7.44 (s, 1H), 7.16 (d, 1H) 7.03 (d, 1H), 5.63 (s, 2H), 5.47 (q, 1H), 3.82 (s, 3H), 2.82 (q, 2H), 2.40 ( s, 3H), 2.25 (s, 3H), 2.01 (s, 3H), 1.64 (d, 3H), 1.30 (t, 3H)
<Compound No. 1-a-56>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 7.69 (s, 1H), 7.55 (t, 1H), 7.48 (s, 1H), 7.15 (d, 1H) 7.02 (d, 1H), 5.47 (q, 1H), 3.80 (s, 3H), 3.05 (sep, 1H), 2.49 (s, 3H), 2.40 ( s, 3H), 2.15 (s, 3H), 1.63 (d, 3H), 1.29 (d, 6H)
<Compound No. 1-a-65>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 7.69 (s, 1H), 7.61 (s, 1H), 7.49 to 7.46 (m, 1H), 7.23 to 7.12 (m, 3H), 5.35 (t, 1H), 3.85 (s, 3H), 2.91 to 2.70 (m, 2H), 2.51 (s, 3H), 2 .28 (s, 3H), 2.24 to 2.20 (m, 1H), 2.18 (s, 3H), 2.06 to 1.94 (m, 2H), 1.84 to 1.73 (M, 1H)
<Compound No. 1-a-70>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.25 (s, 1H), 7.87 (s, 1H), 7.74 (s, 1H), 7.51 (d, 1H) 7.29-7.18 (m, 3H), 5.82 (dd, 1H), 3.86 (s, 3H), 3.18-3.08 (m, 1H), 2.93-2 .83 (m, 1H), 2.56 to 2.44 (m, 1H), 2.33 to 2.24 (m, 1H), 2.25 (s, 3H), 2.23 (s, 3H )
<化合物番号1-a-75>
 H-NMR(CDCl/TMS,δ(ppm)) 8.24(s,1H), 7.89(s,1H),7.62(s,1H),7.57(t,1H),7.16(d,1H),7.03(d,1H),5.48(q,1H),3.81(s,3H),3.05(sep,1H),2.40(s,3H),2.20(s,3H),1.64(d, 3H),1.29(d,6H)
<化合物番号1-a-77>
 H-NMR(CDCl/TMS,δ(ppm)) 8.27(s,1H), 7.78(s,1H),7.75(s,1H),7.40(d,1H),7.34(dd,1H),7.12(t,1H),5.33(t,1H),3.86(s,3H),3.03(dt,1H),2.80~2.70(m,1H),2.27(s,3H),2.24(s,3H),2.23~2.17(m,1H),2.10(s,3H),2.02~1.95(m,2H),1.87~1.79(m,1H)
<化合物番号1-a-83>
 H-NMR(CDCl/TMS,δ(ppm)) 7.74(s,1H), 7.63(s,1H),7.48(d,1H),7.35~7.19(m,3H), 5.81(dd,1H),3.85(s,3H),2.51(s,3H),2.37(dd,1H),2.27(s,3H),2.18(s,3H),2.18~2.13(m,1H),1.34(s,3H),1.31(s,3H)
<化合物番号1-a-85>
 H-NMR(CDCl/TMS,δ(ppm)) 8.14(s,1H),7.73(s,1H),7.42(d,1H),6.20(d,1H),5.34(q,1H),3.95(d,2H),3.80(s,3H),2.49(s,3H),2.25(s,3H),2.18(s,3H),1.56(d,3H),1.29~1.24(m,1H),0.65~0.59(m,2H),0.37~0.31(m,2H)
<化合物番号1-a-87>
 H-NMR(CDCl/TMS,δ(ppm)) 7.91(s,1H), 7.55(s,1H),7.46(d,1H),6.42(d,1H),5.26(s,2H),4.95~4.81(m,1H),3.83(s,3H),2.49(s,3H),2.30(s,3H),2.15(s,3H),1.75(d,3H)
<Compound No. 1-a-75>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.24 (s, 1H), 7.89 (s, 1H), 7.62 (s, 1H), 7.57 (t, 1H) , 7.16 (d, 1H), 7.03 (d, 1H), 5.48 (q, 1H), 3.81 (s, 3H), 3.05 (sep, 1H), 2.40 ( s, 3H), 2.20 (s, 3H), 1.64 (d, 3H), 1.29 (d, 6H)
<Compound No. 1-a-77>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.27 (s, 1H), 7.78 (s, 1H), 7.75 (s, 1H), 7.40 (d, 1H) , 7.34 (dd, 1H), 7.12 (t, 1H), 5.33 (t, 1H), 3.86 (s, 3H), 3.03 (dt, 1H), 2.80- 2.70 (m, 1H), 2.27 (s, 3H), 2.24 (s, 3H), 2.23 to 2.17 (m, 1H), 2.10 (s, 3H), 2 .02 to 1.95 (m, 2H), 1.87 to 1.79 (m, 1H)
<Compound No. 1-a-83>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 7.74 (s, 1H), 7.63 (s, 1H), 7.48 (d, 1H), 7.35 to 7.19 ( m, 3H), 5.81 (dd, 1H), 3.85 (s, 3H), 2.51 (s, 3H), 2.37 (dd, 1H), 2.27 (s, 3H), 2.18 (s, 3H), 2.18 to 2.13 (m, 1H), 1.34 (s, 3H), 1.31 (s, 3H)
<Compound No. 1-a-85>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.14 (s, 1H), 7.73 (s, 1H), 7.42 (d, 1H), 6.20 (d, 1H) , 5.34 (q, 1H), 3.95 (d, 2H), 3.80 (s, 3H), 2.49 (s, 3H), 2.25 (s, 3H), 2.18 ( s, 3H), 1.56 (d, 3H), 1.29 to 1.24 (m, 1H), 0.65 to 0.59 (m, 2H), 0.37 to 0.31 (m, 2H)
<Compound No. 1-a-87>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 7.91 (s, 1H), 7.55 (s, 1H), 7.46 (d, 1H), 6.42 (d, 1H) , 5.26 (s, 2H), 4.95 to 4.81 (m, 1H), 3.83 (s, 3H), 2.49 (s, 3H), 2.30 (s, 3H), 2.15 (s, 3H), 1.75 (d, 3H)
<化合物番号1-b-4>
 H-NMR(CDCl/TMS,δ(ppm)) 8.46(s,1H), 8.12(d,1H),7.68(d,1H),7.60-7.53(m,2H), 7.44~7.39(m,1H),7.32(d,1H),7.16(s,1H),5.47(s,2H),3.81(s,3H),2.26(s,3H)
<化合物番号1-b-11>
 H-NMR(CDCl/TMS,δ(ppm)) 8.50(s,1H),8.13(d,1H),7.66(t,1H),7.32~7.24(m,3H),7.16(s,1H),5.34(s,2H),3.81(s,3H),2.29(s,3H)
<化合物番号4-a-13>
 H-NMR(CDCl/TMS,δ(ppm)) 8.36(s,1H),7.87~7.82(m,2H),7.62(s,1H),7.53(s,1H),7.46(t,3H),7.26~7.24(m,1H),2.27(s,3H),1.53(s,9H)
<化合物番号6-a-1>
 H-NMR(CDCl/TMS,δ(ppm)) 8.35(s,1H), 8.07(s,1H),7.88(bs,1H),3.84(s,3H),2.69(s,3H),2.29(s,3H)
<化合物番号6-a-2>
 H-NMR(CDCl/TMS,δ(ppm)) 8.34(s,1H), 7.89(s,1H),7.70(bs,1H),2.69(s,3H),2.30(s,3H),1.51(s,9H)
<化合物番号6-a-4>
 H-NMR(CDCl/TMS,δ(ppm)) 8.53(s,1H), 7.99(bs,1H),7.98(s,1H),3.86(s,3H),2.70(s,3H)
<Compound No. 1-b-4>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.46 (s, 1H), 8.12 (d, 1H), 7.68 (d, 1H), 7.60-7.53 ( m, 2H), 7.44-7.39 (m, 1H), 7.32 (d, 1H), 7.16 (s, 1H), 5.47 (s, 2H), 3.81 (s) , 3H), 2.26 (s, 3H)
<Compound No. 1-b-11>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.50 (s, 1H), 8.13 (d, 1H), 7.66 (t, 1H), 7.32 to 7.24 ( m, 3H), 7.16 (s, 1H), 5.34 (s, 2H), 3.81 (s, 3H), 2.29 (s, 3H)
<Compound No. 4-a-13>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.36 (s, 1H), 7.87 to 7.82 (m, 2H), 7.62 (s, 1H), 7.53 ( s, 1H), 7.46 (t, 3H), 7.26-7.24 (m, 1H), 2.27 (s, 3H), 1.53 (s, 9H)
<Compound No. 6-a-1>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.35 (s, 1H), 8.07 (s, 1H), 7.88 (bs, 1H), 3.84 (s, 3H) , 2.69 (s, 3H), 2.29 (s, 3H)
<Compound No. 6-a-2>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.34 (s, 1H), 7.89 (s, 1H), 7.70 (bs, 1H), 2.69 (s, 3H) , 2.30 (s, 3H), 1.51 (s, 9H)
<Compound No. 6-a-4>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.53 (s, 1H), 7.99 (bs, 1H), 7.98 (s, 1H), 3.86 (s, 3H) , 2.70 (s, 3H)
<化合物番号6-b-1>
 H-NMR(CDCl/TMS,δ(ppm)) 8.44(bs,1H), 8.33(d,1H),7.48(d,1H),7.42(bs,1H),3.82(s,3H),2.62(s,3H)
<化合物番号6-b-2>
 H-NMR(CDCl/TMS,δ(ppm)) 8.33(d,1H), 8.25(bs,1H),7.46(dd,1H),7.41~7.40(m,1H),2.61(s,3H),1.49(s,9H)
<化合物番号6-b-5>
 H-NMR(CDCl/TMS,δ(ppm)) 8.73(d,1H), 8.01(d,1H),7.99(s,1H),3.85(s,3H),2.62(s,3H),2.58(s,3H)
<化合物番号6-b-7>
 H-NMR(CDCl/TMS,δ(ppm)) 8.33(bs,1H), 7.71(d,1H),7.62(d,1H),3.83(s,3H),2.61(s,3H),2.38(s,3H)
<化合物番号6-b-8>
 H-NMR(CDCl/TMS,δ(ppm)) 8.20(s,1H), 7.71(d,1H),7.61(d,1H),2.64(s,3H),2.38(s,3H),1.48(s,9H)
<Compound No. 6-b-1>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.44 (bs, 1H), 8.33 (d, 1H), 7.48 (d, 1H), 7.42 (bs, 1H) , 3.82 (s, 3H), 2.62 (s, 3H)
<Compound No. 6-b-2>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.33 (d, 1H), 8.25 (bs, 1H), 7.46 (dd, 1H), 7.41-7.40 ( m, 1H), 2.61 (s, 3H), 1.49 (s, 9H)
<Compound No. 6-b-5>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.73 (d, 1H), 8.01 (d, 1H), 7.99 (s, 1H), 3.85 (s, 3H) 2.62 (s, 3H), 2.58 (s, 3H)
<Compound No. 6-b-7>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.33 (bs, 1H), 7.71 (d, 1H), 7.62 (d, 1H), 3.83 (s, 3H) 2.61 (s, 3H), 2.38 (s, 3H)
<Compound No. 6-b-8>
1 H-NMR (CDCl 3 / TMS, δ (ppm)) 8.20 (s, 1H), 7.71 (d, 1H), 7.61 (d, 1H), 2.64 (s, 3H) , 2.38 (s, 3H), 1.48 (s, 9H)
 次に、本発明殺菌剤の製剤実施例を若干示すが、添加物および添加割合は、これら実施例に限定されるべきものではなく、広範囲に変化させることが可能である。また、製剤実施例中の部は重量部を示す。 Next, some preparation examples of the bactericidal agent of the present invention are shown. However, the additives and the addition ratio are not limited to these examples, and can be changed in a wide range. Moreover, the part in a formulation Example shows a weight part.
製剤実施例1    水和剤
  本発明化合物                 40部
  クレー                    48部
  ジオクチルスルホサクシネートナトリウム塩    4部
  リグニンスルホン酸ナトリウム塩         8部
 以上を均一に混合して微細に粉砕し、有効成分40%の水和剤を得る。
Formulation Example 1 wettable powder Compound of the present invention 40 parts Clay 48 parts Dioctylsulfosuccinate sodium salt 4 parts Lignin sulfonic acid sodium salt 8 parts The above is uniformly mixed and finely pulverized, and a wettable powder with 40% active ingredient. Get.
製剤実施例2    乳剤
  本発明化合物                 10部
  ソルベッソ200               53部
  シクロヘキサノン               26部
  ドデシルベンゼンスルホン酸カルシウム塩     1部
  ポリオキシエチレンアルキルアリルエーテル   10部
 以上を混合溶解し、有効成分10%の乳剤を得る。
Formulation Example 2 Emulsion Compound of the present invention 10 parts Solvesso 200 53 parts Cyclohexanone 26 parts Calcium dodecylbenzenesulfonate 1 part Polyoxyethylene alkylallyl ether 10 parts The above components are mixed and dissolved to obtain an emulsion containing 10% active ingredient.
製剤実施例3    粉剤
  本発明化合物                 10部
  クレー                    90部
 以上を均一に混合して微細に粉砕し、有効成分10%の粉剤を得る。
Formulation Example 3 Powder The present compound 10 parts Clay 90 parts The above is uniformly mixed and finely pulverized to obtain a powder of 10% active ingredient.
製剤実施例4    粒剤
  本発明化合物                  5部
  クレー                    73部
  ベントナイト                 20部
  ジオクチルスルホサクシネートナトリウム塩    1部
  リン酸カリウム                 1部
 以上をよく粉砕混合し、水を加えてよく練り合せた後、造粒乾燥して有効成分5%の粒剤を得る。
Formulation Example 4 Granules Compound of the present invention 5 parts Clay 73 parts Bentonite 20 parts Dioctylsulfosuccinate sodium salt 1 part Potassium phosphate 1 part After pulverizing and mixing well, adding water and kneading well, granulation drying As a result, granules containing 5% of the active ingredient are obtained.
製剤実施例5    懸濁剤
  本発明化合物                 10部
  ポリオキシエチレンアルキルアリルエーテル    4部
  ポリカルボン酸ナトリウム塩           2部
  グリセリン                  10部
  キサンタンガム               0.2部
  水                    73.8部
 以上を混合し、粒度が3ミクロン以下になるまで湿式粉砕し、有効成分10%の懸濁剤を得る。
Formulation Example 5 Suspension Compound of the present invention 10 parts Polyoxyethylene alkyl allyl ether 4 parts Polycarboxylic acid sodium salt 2 parts Glycerin 10 parts Xanthan gum 0.2 parts Water 73.8 parts The above is mixed and the particle size is 3 microns or less The suspension is wet-pulverized until a suspension of 10% active ingredient is obtained.
製剤実施例6    顆粒水和剤
  本発明化合物                 40部
  クレー                    36部
  塩化カリウム                 10部
  アルキルベンゼンスルホン酸ナトリウム塩     1部
  リグニンスルホン酸ナトリウム塩         8部
  アルキルベンゼンスルホン酸ナトリウム塩のホルムアルデヒド縮合物
                          5部
 以上を均一に混合して微細に粉砕後,適量の水を加えてから練り込んで粘土状にする。粘土状物を造粒した後乾燥し、有効成分40%の顆粒水和剤を得る。
Formulation Example 6 Granule wettable powder Compound of the present invention 40 parts Clay 36 parts Potassium chloride 10 parts Alkylbenzenesulfonic acid sodium salt 1 part Lignin sulfonic acid sodium salt 8 parts Formaldehyde condensate of alkylbenzenesulfonic acid sodium salt 5 parts After finely pulverizing, add an appropriate amount of water and knead to make clay. The clay-like product is granulated and then dried to obtain a granule wettable powder containing 40% of the active ingredient.
 以上のようにして得られた本発明殺菌剤の試験例を以下に示す。
(試験例1)リンゴ黒星病防除試験
 素焼きポットで栽培したリンゴ幼苗(品種「国光」、3~4葉期)に、本発明化合物の乳剤を有効成分100ppmの濃度で散布した。室温で自然乾燥した後、リンゴ黒星病菌(Venturia inaequalis)の分生胞子を接種し、明暗を12時間毎に繰り返す、20℃で高湿度の室内に2週間保持した。葉上の病斑出現状態を無処理と比較調査し、防除効果を求めた。
 化合物番号1-a-4、1-a-5、1-a-6、1-a-7、1-a-8、1-a-9、1-a-10、1-a-11、1-a-12、1-a-13、1-a-16、1-a-21、1-a-22、1-a-23、1-a-24、1-a-55、1-a-56、1-a-61、1-a-63、1-a-64、1-a-65、1-a-66、1-a-67、1-a-69、1-a-70、1-a-74、1-a-75、1-a-76、1-a-77、1-a-78、1-a-79、1-a-80、1-a-81、1-a-83、1-a-84、1-a-85、1-a-86、1-a-97、1-b-4、1-b-15、2-a-7、2-b-7、2-b-10、2-b-18、3-a-1、4-a-4、4-a-16、4-a-19、4-a-23、および5-a-14の化合物についてそれぞれ調べたところ、いずれも75%以上の防除価を示した。
Test examples of the fungicide of the present invention obtained as described above are shown below.
(Test Example 1) Apple black spot disease control test An emulsion of the compound of the present invention was sprayed at a concentration of 100 ppm of the active ingredient on apple seedlings (variety “Kokumitsu”, 3-4 leaf stage) cultivated in an unglazed pot. After natural drying at room temperature, conidia of Venturia inaequalis were inoculated, and the light and darkness was repeated every 12 hours, and kept in a room of high humidity at 20 ° C. for 2 weeks. The lesion appearance state on the leaf was compared with no treatment, and the control effect was obtained.
Compound Nos. 1-a-4, 1-a-5, 1-a-6, 1-a-7, 1-a-8, 1-a-9, 1-a-10, 1-a-11, 1-a-12, 1-a-13, 1-a-16, 1-a-21, 1-a-22, 1-a-23, 1-a-24, 1-a-55, 1- a-56, 1-a-61, 1-a-63, 1-a-64, 1-a-65, 1-a-66, 1-a-67, 1-a-69, 1-a- 70, 1-a-74, 1-a-75, 1-a-76, 1-a-77, 1-a-78, 1-a-79, 1-a-80, 1-a-81, 1-a-83, 1-a-84, 1-a-85, 1-a-86, 1-a-97, 1-b-4, 1-b-15, 2-a-7, 2- b-7, 2-b-10, 2-b-18, 3-a-1, 4-a-4, 4-a-16, 4-a-19, 4-a 23, and were examined respectively for compounds of 5-a-14, all showed more than 75% of control value.
(試験例2)コムギうどんこ病防除試験
 素焼きポットで栽培したコムギ幼苗(品種「チホク」、1.0~1.2葉期)に本発明化合物の水和剤を100ppmの濃度で散布した。葉を風乾させた後、コムギうどんこ病菌(Erysiphe graminis f.sp.tritici)の分生胞子を振り払い接種し、22~25℃の温室で7日間保持した。葉上の病斑出現状態を無処理と比較調査し、防除効果を求めた。
 化合物番号1-a-4、1-a-5、1-a-6、1-a-9、1-a-10、1-a-11、1-a-13、1-a-21、1-a-23、1-a-24、1-a-56、1-a-63、1-a-65、1-a-66、1-a-67、1-a-70、1-a-74、1-a-75、1-a-76、1-a-78、1-a-81、1-a-83、1-a-85、1-a-86、4-a-13、および4-a-16の化合物についてそれぞれ調べたところ、いずれも75%以上の防除価を示した。
(Test Example 2) Wheat powdery mildew control test A wet seedling of the compound of the present invention was sprayed at a concentration of 100 ppm on wheat seedlings (variety “Chihoku”, 1.0-1.2 leaf stage) cultivated in an unglazed pot. After the leaves were air-dried, conidia of wheat powdery mildew (Erysiphe graminis f.sp.tritici) were sprinkled off and inoculated in a greenhouse at 22-25 ° C. for 7 days. The lesion appearance state on the leaf was compared with no treatment, and the control effect was obtained.
Compound Nos. 1-a-4, 1-a-5, 1-a-6, 1-a-9, 1-a-10, 1-a-11, 1-a-13, 1-a-21, 1-a-23, 1-a-24, 1-a-56, 1-a-63, 1-a-65, 1-a-66, 1-a-67, 1-a-70, 1- a-74, 1-a-75, 1-a-76, 1-a-78, 1-a-81, 1-a-83, 1-a-85, 1-a-86, 4-a- When the compounds 13 and 4-a-16 were examined, both showed a control value of 75% or more.
(試験例3)コムギ赤さび病防除試験
 素焼きポットで栽培したコムギ幼苗(品種「農林61号」、1.0~1.2葉期)に本発明化合物の水和剤を100ppmの濃度で散布した。葉を風乾させた後、コムギ赤さび病菌(Puccinia recondita)の夏胞子を振り払い接種し、22~25℃の温室で10日間保持した。葉上の病斑出現状態を無処理と比較調査し、防除効果を求めた。
 化合物番号1-a-4、1-a-5、1-a-6、1-a-8、1-a-9、1-a-11、1-a-13、1-a-16、1-a-21、1-a-23、1-a-24、1-a-55、1-a-56、1-a-61、1-a-63、1-a-64、1-a-65、1-a-67、1-a-69、1-a-70、1-a-74、1-a-75、1-a-76、1-a-81、1-a-83、1-a-84、1-a-85、1-a-86、1-a-97、2-a-7、4-a-4、4-a-16、4-a-19、および5-a-14の化合物についてそれぞれ調べたところ、いずれも75%以上の防除価を示した。
(Test Example 3) Wheat red rust control test Wheat seedlings grown in an unglazed pot (variety “Noribayashi No. 61”, 1.0 to 1.2 leaves) were sprayed with a wettable powder of the compound of the present invention at a concentration of 100 ppm. . After the leaves were air-dried, they were inoculated with summer spores of wheat rust (Puccinia recondita) and kept in a greenhouse at 22-25 ° C. for 10 days. The lesion appearance state on the leaf was compared with no treatment, and the control effect was obtained.
Compound Nos. 1-a-4, 1-a-5, 1-a-6, 1-a-8, 1-a-9, 1-a-11, 1-a-13, 1-a-16, 1-a-21, 1-a-23, 1-a-24, 1-a-55, 1-a-56, 1-a-61, 1-a-63, 1-a-64, 1- a-65, 1-a-67, 1-a-69, 1-a-70, 1-a-74, 1-a-75, 1-a-76, 1-a-81, 1-a- 83, 1-a-84, 1-a-85, 1-a-86, 1-a-97, 2-a-7, 4-a-4, 4-a-16, 4-a-19, When the compounds of 5- and 14-a-14 were examined, both showed a control value of 75% or more.
 以上から、本発明の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドは、新規化合物であり、工業的に有利に製造でき、効果が確実で安全に使用できる農園芸用殺菌剤の活性成分として有用であることがわかる。 From the above, the nitrogen-containing heteroaryl derivative of the present invention, its salt, or N-oxide is a novel compound, which can be produced industrially advantageously, has an effect, and can be used safely and safely. It turns out that it is useful.

Claims (8)

  1.  式(1)で表される含窒素ヘテロアリール誘導体、その塩、またはN-オキサイド。
    Figure JPOXMLDOC01-appb-C000031

    〔式(1)中、R1は、無置換の若しくは置換基を有するC1~6アルキル基である。
     R2は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21(式中、R21は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、 式:CO222(式中、R22は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、または 式:CON(R212(式中、R21は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。
     A1は、酸素原子、硫黄原子、または 式:NR3(式中、R3は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基である。
     A2は、酸素原子、 式:NR4(式中、R4は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、または 式:CR56(式中、R5およびR6は、それぞれ独立して、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、またはハロゲン原子である。)で表される基である。
     Jは、酸素原子、または硫黄原子である。
     Xは、無置換の若しくは置換基を有するC1~6アルキル基、 式:OR23(式中、R23は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、 式:SR23、 式:N(R232(式中、R23は前記と同じ意味である。R23は同一または異なっていてもよい。)で表される基、 シアノ基、ニトロ基、またはハロゲン原子である。
     nは、Xの数を表し、0~3のいずれかの整数である。nが2以上のとき、Xは同一または異なっていてもよい。
     B1~B4は、それぞれ独立して、窒素原子、または炭素原子である。
     ただし、B1~B3は、全てが窒素原子であることはなく、B1~B4は、全てが炭素原子であることはない。
     Dは、式(2)~式(6)で表されるいずれかの基である。
    Figure JPOXMLDOC01-appb-C000032

    (式(2)~式(6)中、Q1は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、無置換の若しくは置換基を有するアラルキル基、無置換の若しくは置換基を有するヘテロアラルキル基、またはトリ置換シリル基である。
     式(2)、式(3)、および式(6)中、R7は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。
     式(3)、および式(6)中、R8は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。Rは、さらに、Q上の炭素原子、または窒素原子と結合してもよい。
     式(5)中、Q41は、C6~10アリール基、またはヘテロアリール基である。
     式(5)中、Q2は、 式:OR23、 式:SR23、 式:N(R232、 式:COR21、 式:CO222、 式:CON(R212、 式:SO222(式中、R21、R22、およびR23は、前記と同じ意味である。R21は同一または異なっていてもよい。R23は同一または異なっていてもよい。)で表される基、シアノ基、ニトロ基、またはハロゲン原子である。
     式(5)中、m1はQ1の数を表し、0~7のいずれかの整数である。
     式(5)中、m2はQ2の数を表し、0~7のいずれかの整数である。
     但し、m1とm2の和は7以下 である。
     m1が2以上であるとき、Q1は同一または異なっていてもよい。m2が2以上であるとき、Q2は同一または異なっていてもよい。さらにQ41上で隣り合って置換するQ1同士、Q2同士、またはQ1とQ2同士は互いに結合して5~8員環を形成してもよい。)〕
    A nitrogen-containing heteroaryl derivative represented by the formula (1), a salt thereof, or N-oxide.
    Figure JPOXMLDOC01-appb-C000031

    [In the formula (1), R 1 is an unsubstituted or substituted C1-6 alkyl group.
    R 2 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, a formula: COR 21 (wherein R 21 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, An unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted group; A C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group, a group represented by the formula: CO 2 R 22 (wherein, R 22 has the unsubstituted or C1 ~ 6 alkyl group having a substituent, C2 ~ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or substituted 2-6 alkynyl groups, unsubstituted or substituted C3-8 cycloalkyl groups, unsubstituted or substituted C4-8 cycloalkenyl groups, unsubstituted or substituted C6-10 aryl groups, Or an unsubstituted or substituted heteroaryl group.) Or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 has the same meaning as described above; R 21 is the same or They may be different.).
    A 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2˜ 6 alkenyl groups, unsubstituted or substituted C2-6 alkynyl groups, unsubstituted or substituted C3-8 cycloalkyl groups, unsubstituted or substituted C4-8 cycloalkenyl groups, unsubstituted Or a C6-10 aryl group having a substituent or a heteroaryl group having no substituent or a substituent.
    A 2 is an oxygen atom, Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or Formula : CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above. R 21 may be the same or different.) Or the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, or a halogen atom). Group.
    J is an oxygen atom or a sulfur atom.
    X is an unsubstituted or substituted C1-6 alkyl group, Formula: OR 23 (wherein R 23 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, formula: COR 21 , formula: CO 2 R 22 , or formula: CON (R 21 ) 2 wherein R 21 and R 22 have the same meanings as described above. R 21 may be the same or different. The group represented by the formula: SR 23 , Formula: N (R 2 3 ) 2 (wherein R 23 has the same meaning as described above. R 23 may be the same or different), a cyano group, a nitro group, or a halogen atom.
    n represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
    B 1 to B 4 are each independently a nitrogen atom or a carbon atom.
    However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
    D is any group represented by the formulas (2) to (6).
    Figure JPOXMLDOC01-appb-C000032

    (In the formulas (2) to (6), Q 1 represents an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted group. A C2-6 alkynyl group having, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl A group, an unsubstituted or substituted heteroaryl group, an unsubstituted or substituted aralkyl group, an unsubstituted or substituted heteroaralkyl group, or a trisubstituted silyl group.
    In formula (2), formula (3), and formula (6), R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl. Group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 cycloalkenyl group, unsubstituted or A C6-10 aryl group having a substituent, or an unsubstituted or substituted heteroaryl group.
    In formulas (3) and (6), R 8 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted group Or a substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6 ˜10 aryl group, or unsubstituted or substituted heteroaryl group. R 8 may further be bonded to a carbon atom on Q 1 or a nitrogen atom.
    In the formula (5), Q 41 is a C6-10 aryl group or a heteroaryl group.
    In formula (5), Q 2 is represented by formula: OR 23 , formula: SR 23 , formula: N (R 23 ) 2 , formula: COR 21 , formula: CO 2 R 22 , formula: CON (R 21 ) 2 , Formula: SO 2 R 22 (wherein R 21 , R 22 , and R 23 have the same meanings as described above. R 21 may be the same or different. R 23 may be the same or different. ) Group, a cyano group, a nitro group, or a halogen atom.
    In formula (5), m1 represents the number of Q 1 and is an integer of 0 to 7.
    In the formula (5), m2 represents the number of Q 2 and is an integer of 0 to 7.
    However, the sum of m1 and m2 is 7 or less.
    When m1 is 2 or more, Q 1 may be the same or different. When m2 is 2 or more, Q 2 may be the same or different. Further, Q 1 , Q 2 , or Q 1 and Q 2 that are adjacently substituted on Q 41 may be bonded to each other to form a 5- to 8-membered ring. )]
  2.  式(7)で表される請求項1に記載の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイド。
    Figure JPOXMLDOC01-appb-C000033

    (式(7)中、R1、R2、A1、A2、J、X、n、およびDは、前記式(1)と同じ意味である。)
    The nitrogen-containing heteroaryl derivative according to claim 1, represented by formula (7), a salt thereof, or N-oxide.
    Figure JPOXMLDOC01-appb-C000033

    (In formula (7), R 1 , R 2 , A 1 , A 2 , J, X, n, and D have the same meaning as in formula (1).)
  3.  式(8)で表される請求項1に記載の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイド。
    Figure JPOXMLDOC01-appb-C000034

    (式(8)中、R1、R2、A1、A2、J、X、n、R、およびQは、前記式(1)と同じ意味である。)
    The nitrogen-containing heteroaryl derivative according to claim 1, represented by formula (8), a salt thereof, or N-oxide.
    Figure JPOXMLDOC01-appb-C000034

    (In formula (8), R 1 , R 2 , A 1 , A 2 , J, X, n, R 7 , and Q 1 have the same meaning as in formula (1).)
  4.  請求項1~3に記載の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイドの少なくとも1種を有効成分として含有する農園芸用殺菌剤。 An agricultural and horticultural fungicide containing as an active ingredient at least one of the nitrogen-containing heteroaryl derivative according to claims 1 to 3, a salt thereof, or an N-oxide.
  5.  式(9)で表される含窒素ヘテロアリール誘導体。
    Figure JPOXMLDOC01-appb-C000035

    〔式(9)中、R1は、無置換の若しくは置換基を有するC1~6アルキル基である。
     R2は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21(式中、R21は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、 式:CO222(式中、R22は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、または 式:CON(R212(式中、R21は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。
     A1は、酸素原子、硫黄原子、または 式:NR3(式中、R3は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基である。
     A2は、酸素原子、 式:NR4(式中、R4は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、または 式:CR56(式中、R5およびR6は、それぞれ独立して、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、またはハロゲン原子である。)で表される基である。
     Jは、酸素原子、または硫黄原子である。
     Xは、無置換の若しくは置換基を有するC1~6アルキル基、 式:OR23(式中、R23は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、 式:SR23、 式:N(R232(式中、R23は前記と同じ意味である。R23は同一または異なっていてもよい。)で表される基、 シアノ基、ニトロ基、またはハロゲン原子である。
     nは、Xの数を表し、0~3のいずれかの整数である。nが2以上のとき、Xは同一または異なっていてもよい。
     B1~B4は、それぞれ独立して、窒素原子、または炭素原子である。
     ただし、B1~B3は、全てが窒素原子であることはなく、B1~B4は、全てが炭素原子であることはない。
     R7は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。〕
    The nitrogen-containing heteroaryl derivative represented by Formula (9).
    Figure JPOXMLDOC01-appb-C000035

    [In Formula (9), R 1 represents an unsubstituted or substituted C1-6 alkyl group.
    R 2 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, a formula: COR 21 (wherein R 21 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, An unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted group; A C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group, a group represented by the formula: CO 2 R 22 (wherein, R 22 has the unsubstituted or C1 ~ 6 alkyl group having a substituent, C2 ~ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or substituted 2-6 alkynyl groups, unsubstituted or substituted C3-8 cycloalkyl groups, unsubstituted or substituted C4-8 cycloalkenyl groups, unsubstituted or substituted C6-10 aryl groups, Or an unsubstituted or substituted heteroaryl group.) Or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 has the same meaning as described above; R 21 is the same or They may be different.).
    A 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2˜ 6 alkenyl groups, unsubstituted or substituted C2-6 alkynyl groups, unsubstituted or substituted C3-8 cycloalkyl groups, unsubstituted or substituted C4-8 cycloalkenyl groups, unsubstituted Or a C6-10 aryl group having a substituent or a heteroaryl group having no substituent or a substituent.
    A 2 is an oxygen atom, Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or Formula : CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above. R 21 may be the same or different.) Or the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, or a halogen atom). Group.
    J is an oxygen atom or a sulfur atom.
    X is an unsubstituted or substituted C1-6 alkyl group, Formula: OR 23 (wherein R 23 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, formula: COR 21 , formula: CO 2 R 22 , or formula: CON (R 21 ) 2 wherein R 21 and R 22 have the same meanings as described above. R 21 may be the same or different. The group represented by the formula: SR 23 , Formula: N (R 2 3 ) 2 (wherein R 23 has the same meaning as described above. R 23 may be the same or different), a cyano group, a nitro group, or a halogen atom.
    n represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
    B 1 to B 4 are each independently a nitrogen atom or a carbon atom.
    However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
    R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group Is a heteroaryl group having ]
  6.  式(10)で表される請求項5に記載の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイド。
    Figure JPOXMLDOC01-appb-C000036

    (式(10)中、R1、R2、A1、A2、J、X、n、およびRは、前記式(9)と同じ意味である。)
    The nitrogen-containing heteroaryl derivative represented by the formula (10), a salt thereof, or an N-oxide according to claim 5.
    Figure JPOXMLDOC01-appb-C000036

    (In formula (10), R 1 , R 2 , A 1 , A 2 , J, X, n, and R 7 have the same meaning as in formula (9).)
  7.  式(11)で表される含窒素ヘテロアリール誘導体。
    Figure JPOXMLDOC01-appb-C000037

    〔式(11)中、R1は、無置換の若しくは置換基を有するC1~6アルキル基である。
     R2は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21(式中、R21は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、 式:CO222(式中、R22は、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基、または 式:CON(R212(式中、R21は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。
     A1は、酸素原子、硫黄原子、または 式:NR3(式中、R3は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。)で表される基である。
     A2は、酸素原子、 式:NR4(式中、R4は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、または 式:CR56(式中、R5およびR6は、それぞれ独立して、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、またはハロゲン原子である。)で表される基である。
     Jは、酸素原子、または硫黄原子である。
     Xは、無置換の若しくは置換基を有するC1~6アルキル基、 式:OR23(式中、R23は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、無置換の若しくは置換基を有するヘテロアリール基、 式:COR21、 式:CO222、または 式:CON(R212(式中、R21およびR22は前記と同じ意味である。R21は同一または異なっていてもよい。)で表される基である。)で表される基、 式:SR23、 式:N(R232(式中、R23は前記と同じ意味である。R23は同一または異なっていてもよい。)で表される基、 シアノ基、ニトロ基、またはハロゲン原子である。
     nは、Xの数を表し、0~3のいずれかの整数である。nが2以上のとき、Xは同一または異なっていてもよい。
     B1~B4は、それぞれ独立して、窒素原子、または炭素原子である。
     ただし、B1~B3は、全てが窒素原子であることはなく、B1~B4は、全てが炭素原子であることはない。
     R7は、水素原子、無置換の若しくは置換基を有するC1~6アルキル基、無置換の若しくは置換基を有するC2~6アルケニル基、無置換の若しくは置換基を有するC2~6アルキニル基、無置換の若しくは置換基を有するC3~8シクロアルキル基、無置換の若しくは置換基を有するC4~8シクロアルケニル基、無置換の若しくは置換基を有するC6~10アリール基、または無置換の若しくは置換基を有するヘテロアリール基である。
     Rは、それぞれ独立して、水素原子、または 式:COR21(式中、R21は前記と同じ意味である。)で表される基である。Rは同一または異なっていてもよい。Rは一緒になってもよい。〕
    The nitrogen-containing heteroaryl derivative represented by Formula (11).
    Figure JPOXMLDOC01-appb-C000037

    [In Formula (11), R 1 represents an unsubstituted or substituted C1-6 alkyl group.
    R 2 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, a formula: COR 21 (wherein R 21 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, An unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, an unsubstituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted group; A C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted heteroaryl group, a group represented by the formula: CO 2 R 22 (wherein, R 22 has the unsubstituted or C1 ~ 6 alkyl group having a substituent, C2 ~ 6 alkenyl groups having an unsubstituted or substituted, unsubstituted or substituted 2-6 alkynyl groups, unsubstituted or substituted C3-8 cycloalkyl groups, unsubstituted or substituted C4-8 cycloalkenyl groups, unsubstituted or substituted C6-10 aryl groups, Or an unsubstituted or substituted heteroaryl group.) Or a group represented by the formula: CON (R 21 ) 2 (wherein R 21 has the same meaning as described above; R 21 is the same or They may be different.).
    A 1 is an oxygen atom, a sulfur atom, or a formula: NR 3 (wherein R 3 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2˜ 6 alkenyl groups, unsubstituted or substituted C2-6 alkynyl groups, unsubstituted or substituted C3-8 cycloalkyl groups, unsubstituted or substituted C4-8 cycloalkenyl groups, unsubstituted Or a C6-10 aryl group having a substituent or a heteroaryl group having no substituent or a substituent.
    A 2 is an oxygen atom, Formula: NR 4 (wherein R 4 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, Formula: COR 21 , Formula: CO 2 R 22 , or Formula : CON (R 21 ) 2 (wherein R 21 and R 22 have the same meanings as described above. R 21 may be the same or different.) Or the formula: CR 5 R 6 (wherein R 5 and R 6 are each independently a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, or a halogen atom). Group.
    J is an oxygen atom or a sulfur atom.
    X is an unsubstituted or substituted C1-6 alkyl group, Formula: OR 23 (wherein R 23 is a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, unsubstituted or Substituted C2-6 alkenyl group, unsubstituted or substituted C2-6 alkynyl group, unsubstituted or substituted C3-8 cycloalkyl group, unsubstituted or substituted C4-8 A cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, an unsubstituted or substituted heteroaryl group, formula: COR 21 , formula: CO 2 R 22 , or formula: CON (R 21 ) 2 wherein R 21 and R 22 have the same meanings as described above. R 21 may be the same or different. The group represented by the formula: SR 23 , Formula: N (R 2 3 ) 2 (wherein R 23 has the same meaning as described above. R 23 may be the same or different), a cyano group, a nitro group, or a halogen atom.
    n represents the number of X and is an integer from 0 to 3. When n is 2 or more, Xs may be the same or different.
    B 1 to B 4 are each independently a nitrogen atom or a carbon atom.
    However, B 1 to B 3 are not all nitrogen atoms, and B 1 to B 4 are not all carbon atoms.
    R 7 represents a hydrogen atom, an unsubstituted or substituted C1-6 alkyl group, an unsubstituted or substituted C2-6 alkenyl group, an unsubstituted or substituted C2-6 alkynyl group, A substituted or substituted C3-8 cycloalkyl group, an unsubstituted or substituted C4-8 cycloalkenyl group, an unsubstituted or substituted C6-10 aryl group, or an unsubstituted or substituted group Is a heteroaryl group having
    R 9 is each independently a hydrogen atom or a group represented by the formula: COR 21 (wherein R 21 has the same meaning as described above). R 9 may be the same or different. R 9 may be together. ]
  8.  式(12)で表される請求項7に記載の含窒素ヘテロアリール誘導体、その塩、またはN-オキサイド。
    Figure JPOXMLDOC01-appb-C000038

    (式(12)中、R1、R2、A1、A2、J、X、n、R、およびRは、前記式(11)と同じ意味である。)
    The nitrogen-containing heteroaryl derivative according to claim 7, represented by formula (12), a salt thereof, or N-oxide.
    Figure JPOXMLDOC01-appb-C000038

    (In formula (12), R 1 , R 2 , A 1 , A 2 , J, X, n, R 7 , and R 9 have the same meaning as in formula (11).)
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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012028676A1 (en) * 2010-09-02 2012-03-08 Boehringer Ingelheim International Gmbh New compounds, pharmaceutical compositions and uses thereof
WO2012117021A3 (en) * 2011-03-03 2012-11-08 Syngenta Participations Ag Microbiocidal oxime ethers
JP2015096482A (en) * 2012-12-21 2015-05-21 石原産業株式会社 Pest control agent
WO2015119099A1 (en) * 2014-02-05 2015-08-13 日本曹達株式会社 Pyridine compound and application therefor
KR101728898B1 (en) * 2010-12-07 2017-04-21 광주과학기술원 Novel Hydrazine Derivatives and Uses Thereof
JP6585328B1 (en) * 2018-04-09 2019-10-02 日本曹達株式会社 Phenoxyurea compounds and pest control agents
CN110590763A (en) * 2019-09-30 2019-12-20 齐鲁工业大学 Structure, preparation and application of 2-thiazole formaldehyde-thiophene Schiff base
US11046658B2 (en) 2018-07-02 2021-06-29 Incyte Corporation Aminopyrazine derivatives as PI3K-γ inhibitors
US11926616B2 (en) 2018-03-08 2024-03-12 Incyte Corporation Aminopyrazine diol compounds as PI3K-γ inhibitors

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993020053A1 (en) * 1992-03-27 1993-10-14 Yamanouchi Pharmaceutical Co., Ltd. Pyridylserine derivative
WO1994008975A1 (en) * 1992-10-16 1994-04-28 Nippon Soda Co., Ltd. Pyrimidine derivative
WO2001025181A1 (en) * 1999-10-01 2001-04-12 Eisai Co., Ltd. Carboxylic acid derivatives and drugs containing the same
JP2001106666A (en) * 1999-08-05 2001-04-17 Kumiai Chem Ind Co Ltd Carbamate derivative and fungicide for agriculture and horticulture
WO2002024651A1 (en) * 2000-09-22 2002-03-28 Bayer Aktiengesellschaft A process for producing 2-amino-4,6-disubstituted nicotinic acid ester analogs
JP2002348278A (en) * 2001-05-23 2002-12-04 Kumiai Chem Ind Co Ltd Heterocyclic alkylcarbamate derivatives and germicides for agriculture and horticulture
WO2004037770A1 (en) * 2002-10-23 2004-05-06 Nippon Soda Co.,Ltd. Hydrazine derivative, intermediate for production, and bactericide and insecticide for agricultural or horticultural use
WO2005021507A1 (en) * 2003-09-01 2005-03-10 Hokko Chemical Industry Co., Ltd. Azine derivatives, agricultural or horticultural bactericide, and process for producing the same
WO2005042488A1 (en) * 2003-10-31 2005-05-12 Takeda Pharmaceutical Company Limited Pyridine compounds as inhibitors of dipeptidyl peptidase iv
WO2005051932A1 (en) * 2003-11-28 2005-06-09 Nippon Soda Co., Ltd. Arylheterocycle derivative and agricultural or horticulrual bactericide and insecticide
WO2006069716A1 (en) * 2004-12-23 2006-07-06 Basf Aktiengesellschaft Fungicidal mixtures
JP2007137852A (en) * 2005-11-22 2007-06-07 Hokko Chem Ind Co Ltd Azine derivative and agricultural/horticultural fungicide
WO2008003741A1 (en) * 2006-07-06 2008-01-10 Bayer Cropscience Sa N- [ (pyridin- 2 -yl) methoxy]heterocyclyl carboxamide derivatives and related compounds as fungicides
WO2008124092A2 (en) * 2007-04-03 2008-10-16 E. I. Du Pont De Nemours And Company Substituted benzene fungicides

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993020053A1 (en) * 1992-03-27 1993-10-14 Yamanouchi Pharmaceutical Co., Ltd. Pyridylserine derivative
WO1994008975A1 (en) * 1992-10-16 1994-04-28 Nippon Soda Co., Ltd. Pyrimidine derivative
JP2001106666A (en) * 1999-08-05 2001-04-17 Kumiai Chem Ind Co Ltd Carbamate derivative and fungicide for agriculture and horticulture
WO2001025181A1 (en) * 1999-10-01 2001-04-12 Eisai Co., Ltd. Carboxylic acid derivatives and drugs containing the same
WO2002024651A1 (en) * 2000-09-22 2002-03-28 Bayer Aktiengesellschaft A process for producing 2-amino-4,6-disubstituted nicotinic acid ester analogs
JP2002348278A (en) * 2001-05-23 2002-12-04 Kumiai Chem Ind Co Ltd Heterocyclic alkylcarbamate derivatives and germicides for agriculture and horticulture
WO2004037770A1 (en) * 2002-10-23 2004-05-06 Nippon Soda Co.,Ltd. Hydrazine derivative, intermediate for production, and bactericide and insecticide for agricultural or horticultural use
WO2005021507A1 (en) * 2003-09-01 2005-03-10 Hokko Chemical Industry Co., Ltd. Azine derivatives, agricultural or horticultural bactericide, and process for producing the same
WO2005042488A1 (en) * 2003-10-31 2005-05-12 Takeda Pharmaceutical Company Limited Pyridine compounds as inhibitors of dipeptidyl peptidase iv
WO2005051932A1 (en) * 2003-11-28 2005-06-09 Nippon Soda Co., Ltd. Arylheterocycle derivative and agricultural or horticulrual bactericide and insecticide
WO2006069716A1 (en) * 2004-12-23 2006-07-06 Basf Aktiengesellschaft Fungicidal mixtures
JP2007137852A (en) * 2005-11-22 2007-06-07 Hokko Chem Ind Co Ltd Azine derivative and agricultural/horticultural fungicide
WO2008003741A1 (en) * 2006-07-06 2008-01-10 Bayer Cropscience Sa N- [ (pyridin- 2 -yl) methoxy]heterocyclyl carboxamide derivatives and related compounds as fungicides
WO2008124092A2 (en) * 2007-04-03 2008-10-16 E. I. Du Pont De Nemours And Company Substituted benzene fungicides

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WO2012117021A3 (en) * 2011-03-03 2012-11-08 Syngenta Participations Ag Microbiocidal oxime ethers
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US11044911B2 (en) 2018-04-09 2021-06-29 Nippon Soda Co., Ltd. Phenoxyurea compound and pest control agent
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