WO2008122626A3 - Optical element module with imaging error and position correction - Google Patents

Optical element module with imaging error and position correction Download PDF

Info

Publication number
WO2008122626A3
WO2008122626A3 PCT/EP2008/054154 EP2008054154W WO2008122626A3 WO 2008122626 A3 WO2008122626 A3 WO 2008122626A3 EP 2008054154 W EP2008054154 W EP 2008054154W WO 2008122626 A3 WO2008122626 A3 WO 2008122626A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
element module
holding
position correction
holding structure
Prior art date
Application number
PCT/EP2008/054154
Other languages
French (fr)
Other versions
WO2008122626A2 (en
Inventor
Bernhard Gellrich
Jens Kugler
Guido Limbach
Original Assignee
Zeiss Carl Smt Ag
Bernhard Gellrich
Jens Kugler
Guido Limbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Bernhard Gellrich, Jens Kugler, Guido Limbach filed Critical Zeiss Carl Smt Ag
Publication of WO2008122626A2 publication Critical patent/WO2008122626A2/en
Publication of WO2008122626A3 publication Critical patent/WO2008122626A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)

Abstract

There is provided an optical element module (106) comprising an optical element (107) and a support structure (108) supporting the optical element, the support structure comprising a first holding structure (109), an intermediate structure (110) and a second holding structure (111). The first holding structure (109) contacts the optical element (107) and is adapted to adjustably introduce defined deformations into the optical element. The intermediate structure (110) supports the first holding structure (109) while the second holding structure (111) supports the intermediate structure (110) and is adapted to adjust the -position of the intermediate structure. The optical element module is used 'in microlithography systems for compensating aberrations. The holding structures are arranged Kinematically in series. Also provided is an optical element module wherein the first holding structure is adapted to adjust the position and the second is adapted to adjustably introduce deformations. Further provided is an optical element module wherein one of the deformation or position adjustment is omitted.
PCT/EP2008/054154 2007-04-05 2008-04-07 Optical element module with imaging error and position correction WO2008122626A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EPPCT/EP2007/053382 2007-04-05
PCT/EP2007/053382 WO2008122313A1 (en) 2007-04-05 2007-04-05 Optical element module with imaging error and position correction

Publications (2)

Publication Number Publication Date
WO2008122626A2 WO2008122626A2 (en) 2008-10-16
WO2008122626A3 true WO2008122626A3 (en) 2009-01-15

Family

ID=38692044

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/EP2007/053382 WO2008122313A1 (en) 2007-04-05 2007-04-05 Optical element module with imaging error and position correction
PCT/EP2008/054154 WO2008122626A2 (en) 2007-04-05 2008-04-07 Optical element module with imaging error and position correction

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/053382 WO2008122313A1 (en) 2007-04-05 2007-04-05 Optical element module with imaging error and position correction

Country Status (2)

Country Link
TW (1) TW200901280A (en)
WO (2) WO2008122313A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009054549A1 (en) 2008-12-11 2010-06-17 Carl Zeiss Smt Ag Gravitation compensation for optical elements in projection exposure systems
CN103376662B (en) * 2012-04-22 2015-05-13 上海微电子装备有限公司 Asymmetric aberration compensation device
CN104459986B (en) * 2013-09-13 2017-02-15 上海微电子装备有限公司 Micro deformation aberration correction device
DE102013225694A1 (en) * 2013-12-12 2014-12-24 Carl Zeiss Smt Gmbh OPTICAL MODULE
JP6748482B2 (en) * 2016-05-25 2020-09-02 キヤノン株式会社 Exposure apparatus and method for manufacturing article
DE102018210996A1 (en) * 2018-07-04 2020-01-09 Carl Zeiss Smt Gmbh SUPPORT FOR AN OPTICAL UNIT
DE102018220565A1 (en) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Projection exposure system for semiconductor lithography with a semi-active spacer and method for using the semi-active spacer
FR3110713B1 (en) * 2020-05-20 2022-04-22 Airbus Defence & Space Sas FIXING A MIRROR ON A SUPPORT
DE102020212927A1 (en) * 2020-10-14 2022-04-14 Carl Zeiss Smt Gmbh SUPPORT OF AN OPTICAL ELEMENT

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4655563A (en) * 1985-11-25 1987-04-07 Itek Corporation Variable thickness deformable mirror
EP1376183A2 (en) * 2002-06-24 2004-01-02 Nikon Corporation Optical-element mountings exhibiting reduced deformation of optical elements held thereby
EP1378797A2 (en) * 2002-06-21 2004-01-07 Nikon Corporation Wavefront aberration correction system
US20040165287A1 (en) * 2003-02-17 2004-08-26 Naoki Murasato Retainer, exposure apparatus, and device fabrication method
WO2005091077A2 (en) * 2004-02-20 2005-09-29 Carl Zeiss Smt Ag Projection lens of a microlithographic projection exposure system
US20060245035A1 (en) * 2005-04-28 2006-11-02 Canon Kabushiki Kaisha Reflecting mirror and exposure apparatus using the same
WO2006119970A2 (en) * 2005-05-09 2006-11-16 Carl Zeiss Smt Ag Assembly for adjusting an optical element

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4655563A (en) * 1985-11-25 1987-04-07 Itek Corporation Variable thickness deformable mirror
EP1378797A2 (en) * 2002-06-21 2004-01-07 Nikon Corporation Wavefront aberration correction system
EP1376183A2 (en) * 2002-06-24 2004-01-02 Nikon Corporation Optical-element mountings exhibiting reduced deformation of optical elements held thereby
US20040165287A1 (en) * 2003-02-17 2004-08-26 Naoki Murasato Retainer, exposure apparatus, and device fabrication method
WO2005091077A2 (en) * 2004-02-20 2005-09-29 Carl Zeiss Smt Ag Projection lens of a microlithographic projection exposure system
US20060245035A1 (en) * 2005-04-28 2006-11-02 Canon Kabushiki Kaisha Reflecting mirror and exposure apparatus using the same
WO2006119970A2 (en) * 2005-05-09 2006-11-16 Carl Zeiss Smt Ag Assembly for adjusting an optical element

Also Published As

Publication number Publication date
TW200901280A (en) 2009-01-01
WO2008122313A1 (en) 2008-10-16
WO2008122626A2 (en) 2008-10-16

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