WO2008120785A1 - Exposure apparatus and exposure method - Google Patents

Exposure apparatus and exposure method Download PDF

Info

Publication number
WO2008120785A1
WO2008120785A1 PCT/JP2008/056413 JP2008056413W WO2008120785A1 WO 2008120785 A1 WO2008120785 A1 WO 2008120785A1 JP 2008056413 W JP2008056413 W JP 2008056413W WO 2008120785 A1 WO2008120785 A1 WO 2008120785A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
exposure
masks
prescribed direction
patterns
Prior art date
Application number
PCT/JP2008/056413
Other languages
French (fr)
Japanese (ja)
Inventor
Shusaku Karuishi
Shinichiro Hayashi
Tadashi Gotou
Toshiyuki Kondou
Takuya Miyaji
Nobuhito Saji
Yosuke Takagi
Masaaki Matsuzaka
Original Assignee
Nsk Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007097015A external-priority patent/JP5184808B2/en
Priority claimed from JP2007149340A external-priority patent/JP5099318B2/en
Priority claimed from JP2007154204A external-priority patent/JP5077655B2/en
Priority claimed from JP2007153967A external-priority patent/JP5279207B2/en
Priority claimed from JP2007154202A external-priority patent/JP5046157B2/en
Priority claimed from JP2007154203A external-priority patent/JP5089257B2/en
Priority claimed from JP2007154205A external-priority patent/JP5089258B2/en
Priority claimed from JP2007153966A external-priority patent/JP5084356B2/en
Priority claimed from JP2007153965A external-priority patent/JP5089255B2/en
Priority claimed from JP2007159196A external-priority patent/JP5105152B2/en
Priority claimed from JP2007160256A external-priority patent/JP5150949B2/en
Priority claimed from JP2007160255A external-priority patent/JP5068107B2/en
Priority claimed from JP2007166530A external-priority patent/JP2009003365A/en
Application filed by Nsk Ltd. filed Critical Nsk Ltd.
Priority to KR1020117014245A priority Critical patent/KR101111934B1/en
Priority to KR1020097020367A priority patent/KR101111933B1/en
Publication of WO2008120785A1 publication Critical patent/WO2008120785A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A proximity scanning exposure apparatus (1) is provided with a substrate transfer mechanism (20), which supports a substrate (W) at least in an exposure region by floating the substrate and transfers the substrate (W) in a prescribed direction; a plurality of mask holding sections (71), which respectively hold a plurality of masks (M) whereupon patterns (P) are formed, and are arranged in a staggered manner along a direction intersecting with a prescribed direction; and a plurality of irradiating sections (80), which are respectively arranged on upper portions of the mask holding sections (71), and irradiate light for exposure. Then, the substrate (W) being transferred in the prescribed direction is applied with exposure light (EL) through the masks (M), and patterns (P) of the masks (M) are exposed to the substrate (W).
PCT/JP2008/056413 2007-04-03 2008-03-31 Exposure apparatus and exposure method WO2008120785A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020117014245A KR101111934B1 (en) 2007-04-03 2008-03-31 Exposure apparatus and exposure method
KR1020097020367A KR101111933B1 (en) 2007-04-03 2008-03-31 Exposure apparatus and exposure method

Applications Claiming Priority (26)

Application Number Priority Date Filing Date Title
JP2007097015A JP5184808B2 (en) 2007-04-03 2007-04-03 Exposure method and exposure apparatus
JP2007-097015 2007-04-03
JP2007149340A JP5099318B2 (en) 2007-06-05 2007-06-05 Exposure apparatus and exposure method
JP2007-149340 2007-06-05
JP2007154205A JP5089258B2 (en) 2007-06-11 2007-06-11 Proximity scan exposure apparatus and exposure method therefor
JP2007153966A JP5084356B2 (en) 2007-06-11 2007-06-11 Substrate transport mechanism for exposure apparatus and substrate position adjusting method using the same
JP2007-153967 2007-06-11
JP2007-154203 2007-06-11
JP2007-154204 2007-06-11
JP2007-154202 2007-06-11
JP2007154204A JP5077655B2 (en) 2007-06-11 2007-06-11 Proximity scan exposure apparatus and air pad
JP2007-153966 2007-06-11
JP2007153967A JP5279207B2 (en) 2007-06-11 2007-06-11 Substrate transport mechanism for exposure equipment
JP2007153965A JP5089255B2 (en) 2007-06-11 2007-06-11 Exposure equipment
JP2007-154205 2007-06-11
JP2007154203A JP5089257B2 (en) 2007-06-11 2007-06-11 Proximity scan exposure system
JP2007-153965 2007-06-11
JP2007154202A JP5046157B2 (en) 2007-06-11 2007-06-11 Proximity scan exposure system
JP2007159196A JP5105152B2 (en) 2007-06-15 2007-06-15 Proximity scan exposure apparatus and control method thereof
JP2007-159196 2007-06-15
JP2007-160255 2007-06-18
JP2007-160256 2007-06-18
JP2007160256A JP5150949B2 (en) 2007-06-18 2007-06-18 Proximity scan exposure apparatus and control method thereof
JP2007160255A JP5068107B2 (en) 2007-06-18 2007-06-18 Substrate transport mechanism for exposure apparatus and control method thereof
JP2007-166530 2007-06-25
JP2007166530A JP2009003365A (en) 2007-06-25 2007-06-25 Proximity scanning exposure apparatus and method for controlling the same

Publications (1)

Publication Number Publication Date
WO2008120785A1 true WO2008120785A1 (en) 2008-10-09

Family

ID=39808365

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/056413 WO2008120785A1 (en) 2007-04-03 2008-03-31 Exposure apparatus and exposure method

Country Status (3)

Country Link
KR (2) KR101111934B1 (en)
TW (1) TW200907590A (en)
WO (1) WO2008120785A1 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011066136A (en) * 2009-09-16 2011-03-31 Yaskawa Electric Corp Board transfer apparatus equipped with fail-safe mechanism
JP2011090097A (en) * 2009-10-21 2011-05-06 Nsk Ltd Proximity scanning exposure apparatus and proximity scanning exposure method
JP2011134937A (en) * 2009-11-30 2011-07-07 Nsk Ltd Proximity-scanning exposure apparatus and method of controlling the same
JPWO2010044268A1 (en) * 2008-10-15 2012-03-15 株式会社ニコン Exposure apparatus, assembly method thereof, and device manufacturing method
CN102763209A (en) * 2010-02-17 2012-10-31 株式会社尼康 Transfer apparatus, transfer method, exposure apparatus, and device manufacturing method
CN103097959A (en) * 2010-09-13 2013-05-08 株式会社尼康 Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
JP2014167616A (en) * 2013-01-30 2014-09-11 Nsk Technology Co Ltd Apparatus and method for proximity exposure and illumination optical system
CN106444302A (en) * 2016-11-23 2017-02-22 南京华东电子信息科技股份有限公司 Movable mask carrying table

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5510299B2 (en) * 2010-12-13 2014-06-04 ウシオ電機株式会社 Exposure apparatus and exposure method
JP5533769B2 (en) * 2011-04-14 2014-06-25 ウシオ電機株式会社 Mask and workpiece alignment method
CN117420741B (en) * 2023-12-19 2024-03-12 深圳市欣光辉科技有限公司 Exposure positioning structure and exposure machine

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62102524A (en) * 1985-10-29 1987-05-13 Canon Inc Mask changer
JPH10223525A (en) * 1997-02-10 1998-08-21 Nikon Corp Focus control method for aligner
WO2000059012A1 (en) * 1999-03-26 2000-10-05 Nikon Corporation Exposure method and apparatus
JP2001166496A (en) * 1999-12-07 2001-06-22 Nikon Corp Method for aligning and aligner
JP2001215717A (en) * 2000-02-02 2001-08-10 Nikon Corp Scanning exposure method and scanning exposure system
JP2001319871A (en) * 2000-02-29 2001-11-16 Nikon Corp Exposing method, method of manufacturing gray filter and aligner
JP2004311896A (en) * 2003-04-10 2004-11-04 Nikon Corp Method and equipment for exposure, process for fabricating device, and mask
JP2006235533A (en) * 2005-02-28 2006-09-07 Nikon Corp Exposure device and method for manufacturing micro device
JP2007072267A (en) * 2005-09-08 2007-03-22 Sumitomo Chemical Co Ltd Exposure apparatus

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62102524A (en) * 1985-10-29 1987-05-13 Canon Inc Mask changer
JPH10223525A (en) * 1997-02-10 1998-08-21 Nikon Corp Focus control method for aligner
WO2000059012A1 (en) * 1999-03-26 2000-10-05 Nikon Corporation Exposure method and apparatus
JP2001166496A (en) * 1999-12-07 2001-06-22 Nikon Corp Method for aligning and aligner
JP2001215717A (en) * 2000-02-02 2001-08-10 Nikon Corp Scanning exposure method and scanning exposure system
JP2001319871A (en) * 2000-02-29 2001-11-16 Nikon Corp Exposing method, method of manufacturing gray filter and aligner
JP2004311896A (en) * 2003-04-10 2004-11-04 Nikon Corp Method and equipment for exposure, process for fabricating device, and mask
JP2006235533A (en) * 2005-02-28 2006-09-07 Nikon Corp Exposure device and method for manufacturing micro device
JP2007072267A (en) * 2005-09-08 2007-03-22 Sumitomo Chemical Co Ltd Exposure apparatus

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014160263A (en) * 2008-10-15 2014-09-04 Nikon Corp Exposure device and method for assembling the same as well as device manufacturing method
JP2015187752A (en) * 2008-10-15 2015-10-29 株式会社ニコン Exposure apparatus, method for assembling the same and device manufacturing method
TWI480706B (en) * 2008-10-15 2015-04-11 尼康股份有限公司 An exposure apparatus, a method of assembling the same, and a method of manufacturing the same
JPWO2010044268A1 (en) * 2008-10-15 2012-03-15 株式会社ニコン Exposure apparatus, assembly method thereof, and device manufacturing method
JP2011066136A (en) * 2009-09-16 2011-03-31 Yaskawa Electric Corp Board transfer apparatus equipped with fail-safe mechanism
JP2011090097A (en) * 2009-10-21 2011-05-06 Nsk Ltd Proximity scanning exposure apparatus and proximity scanning exposure method
JP2011134937A (en) * 2009-11-30 2011-07-07 Nsk Ltd Proximity-scanning exposure apparatus and method of controlling the same
CN102763209B (en) * 2010-02-17 2017-02-08 株式会社尼康 Transfer apparatus, transfer method, exposure apparatus, and device manufacturing method
CN102763209A (en) * 2010-02-17 2012-10-31 株式会社尼康 Transfer apparatus, transfer method, exposure apparatus, and device manufacturing method
CN107017191A (en) * 2010-02-17 2017-08-04 株式会社尼康 Carrying device, transport method, exposure device and manufacturing method
CN107017191B (en) * 2010-02-17 2020-08-14 株式会社尼康 Transfer apparatus, exposure apparatus, and device manufacturing method
CN103097959A (en) * 2010-09-13 2013-05-08 株式会社尼康 Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
JP2014167616A (en) * 2013-01-30 2014-09-11 Nsk Technology Co Ltd Apparatus and method for proximity exposure and illumination optical system
CN106444302A (en) * 2016-11-23 2017-02-22 南京华东电子信息科技股份有限公司 Movable mask carrying table

Also Published As

Publication number Publication date
KR20090128436A (en) 2009-12-15
KR20110091013A (en) 2011-08-10
TW200907590A (en) 2009-02-16
KR101111934B1 (en) 2012-04-06
KR101111933B1 (en) 2012-04-06

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