WO2001008199A1 - Substrate and workpiece support for receiving a substrate - Google Patents
Substrate and workpiece support for receiving a substrate Download PDFInfo
- Publication number
- WO2001008199A1 WO2001008199A1 PCT/DE2000/002368 DE0002368W WO0108199A1 WO 2001008199 A1 WO2001008199 A1 WO 2001008199A1 DE 0002368 W DE0002368 W DE 0002368W WO 0108199 A1 WO0108199 A1 WO 0108199A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- workpiece carrier
- carrier according
- elements
- base element
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
Definitions
- Substrate and workpiece carrier for receiving the substrate
- the invention relates to a workpiece carrier for receiving the substrate, in particular a thin-film substrate, with the features mentioned in the preamble of claim 1 and a substrate with the features mentioned in the preamble of claim 20.
- stainless steel substrates with molded membranes are usually used, to which various functional layers are applied using thin-film technology.
- These functional layers include, for example, insulating layers, sensitive resistance layers, electrically conductive layers from which conductor tracks or contacts can be structured, or also a passivation.
- the substrate is usually received on a workpiece carrier, which is used, among other things, to position the substrate during the individual process steps.
- a substrate and a workpiece carrier for receiving the substrate, in particular a thin-film substrate, with the features mentioned in claims 1 and 10.
- the workpiece carrier comprises a base element for receiving the substrate, the base element is arranged on a handling element and process-dependent cover elements can be assigned to the base element on a side opposite the handling element, makes it possible to produce the sensor elements in a cost-effective manner.
- the substrate is characterized in that the substrate and the workpiece carrier each have at least one complementary positioning element, which for
- the positioning unit makes it possible to rule out an axial displacement or radial rotation of the substrate in the basic element during thin-layer production and thus reduces rejects caused by production, in particular when automating thin-film production.
- the substrate has, for example, a groove or a notch, which is arranged on the side wall of the substrate, and the base element has a complementary nose that engages in this groove when inserting the substrate into the base element.
- the base element has individual carrier elements on which the substrate is supported with a contact surface.
- this contact surface can be formed by a lower edge of a collar that runs around the substrate.
- the carrier elements can protrude into a receiving opening of the base element.
- the substrate can thus be positioned on the carrier elements of the base element such that at least one opening extends between an edge of the receiving opening of the base element and a lateral wall of the substrate. In this way, there is sufficient transparency for liquid media which are used in certain process steps, and the carryover of media can be effectively prevented.
- these means can include guide pins, twist locks, expansion pins or mechanical stops. In this way, a very exact positioning of the cover element on the handling element can be guaranteed.
- means for coding can also be assigned to the handling element and / or the cover elements, for example by indentations, Barcodes or holes are applied to the surfaces of the handling elements.
- indentations for example by indentations, Barcodes or holes are applied to the surfaces of the handling elements.
- the cover elements lie with individual support elements on a support surface of the substrate, for example an upper edge of the collar surrounding the substrate.
- the cover element has process areas which allow selective treatment of a surface of the substrate (mask).
- the cover element is positioned on the substrate in such a way that the process areas lie above the openings between the base elements and the substrates, and there is therefore a high level of transparency for the liquid medium.
- the cover element lies sealingly against a peripheral edge of the substrate surface. On the one hand, this enables an even more precise positioning and, on the other hand, the spread of media is further reduced.
- Figure 1 is a sectional view through a sensor element with different functional layers on a substrate
- FIG. 2 shows different views of a substrate for thin-film production
- FIG. 3 shows a plan view of a basic element for receiving the substrate
- FIG. 4 shows a top view of a handling element with an arrangement of a number of basic elements
- Figure 5 is a sectional view and a plan view of a workpiece carrier and the substrate in
- FIG. 6 shows a sectional view and a plan view of a workpiece carrier and the substrate in the region of a base element during treatment of the substrate surface by deposition, plasma etching or the like
- FIG. 7 shows a sectional view through a workpiece carrier and the substrate during passivation of the substrate surface and deposition of a contact using shadow mask technology
- Figure 8 is a perspective side view of a workbench for receiving the workpiece carrier
- FIG. 9 shows a perspective side view of an arrangement of the workbench for receiving the workpiece carrier during automated thin-film production.
- FIG. 1 shows a sectional view of a sensor element 10, on which — based on the known thin-film technology — various functional layers are applied to a substrate 12.
- Functional layers of this type comprise sensitive layers 14, a contact 16, a passivation 18 and an insulation layer 20, which are arranged on a substrate surface 22.
- a collar 24 encircling the substrate 12, which supports thin-film production, can be present.
- FIG. 2 shows the substrate 12 again in various detailed views.
- the radial structure of the substrate 12 is interrupted in the region of a groove 26 which is milled into a side wall 27.
- the groove 26 serves as a positioning element 29 in a manner explained in more detail.
- the individual substrates 12 are located in a base element 28, which in turn is part of a handling element 30, during the entire manufacturing process of the sensor element 10.
- FIG. 4 shows a top view of such a handling element 30
- FIG. 3 shows a top view of an individual base element 28 of the handling element 30.
- the substrate 12 is positioned with a contact surface 32 on individual carrier elements 34 of the base element 28.
- the base element 28 forms a receiving opening 36 into which the carrier elements 34 protrude.
- the contact surface 32 is formed by a lower edge 38 of the collar 24.
- a plurality of openings 40 extend between an edge 42 of the base element 28 and the substrate 12.
- Liquid media which can be used in one process step during thin-film production for the treatment or cleaning of the sensor surface 22, can optionally pass through the openings 40 used, drain off.
- the base element 28 has a rectangular nose 44 as a complementary positioning element 31, which also projects into the receiving opening 36.
- the substrate 12 is introduced into the receiving opening 36 of the base element 28 during the thin-layer production such that the nose 44 engages in the groove 26.
- a relative position of the substrate 12 is fixed and the two positioning elements 29, 31 thus serve as one positioning unit.
- the positioning unit can be adapted to the given geometry requirements on the substrate 12 in a variety of ways.
- a number of basic elements 28 corresponding to the given dimensions can be arranged on the handle 30.
- the hexagonal basic structure of the basic elements 28 according to the exemplary embodiment allows a particularly dense arrangement.
- the handling element 30 has openings 46, 48 which serve to position the handle 30 and a cover element 50 to be explained in more detail during the individual process steps and / or to position a workpiece carrier (handling element 30 and cover element 50) on a workbench 80 even closer allow explained way.
- the opening 46 can receive a twist lock
- the opening 48 can serve to receive guide pins, expansion pins or the like.
- means for coding can be assigned to the handling element 30 and / or the cover elements 50 in order to automate the thin-film to enable production.
- bores 52 on a surface 54 of the handling element 30 can contain information about process progress or the like.
- a relative position of the handling element 30 can be detected via notches 56 by means of suitable sensors.
- the substrate 12 is fixed to the base element 28 during the entire thin-film production.
- a process-dependent cover element 50 is then placed on the substrate 12 in each process step.
- the substrate 12 has a support surface 58, for example on an upper edge 60 of the collar 24, and the cover element 50 has corresponding support elements 62 (FIGS. 2 and 5).
- FIG. 5 shows a cover element 50, as is usually used when treating the substrate surface 22 with a liquid medium.
- a process area 64 which is provided by a recess in the area of the cover element 50.
- the process area 64 is selected such that it also extends over the openings 40 between the base element 28 and the substrate 12.
- the liquid medium can accordingly flow out or be flushed out through the openings 40 during or after completion of the process step and carryover of the medium is substantially reduced.
- the cover element 50 can be adapted accordingly (FIG. 6).
- the cover element 50 lies flush with a sealing edge 68 on a peripheral edge 66 of the substrate 12, so that only the substrate surface 22 is processed during the process step.
- the substrate 12 is positioned very precisely with the aid of the insertion bevels 69, on which the substrate 12 slides along while the cover element 50 is resting.
- FIG. 7 shows a sectional view of an arrangement of the individual elements of the workpiece carrier during the application of conductor tracks or passivation of the substrate surface 22.
- the cover element 50 consists of a positioning plate 70, a pressure plate 72 and one between these two. Sheets 70, 72 arranged shadow mask 74.
- a further pressure plate 76 and a spring plate 78 apply a force to the substrate 12, so that the substrate surface 22 lies flat against the shadow mask 74 during the process step.
- the substrate 12 is always in the base element 28 and only the cover elements 50 are exchanged.
- additional elements supporting the process step such as a pressure plate and spring plate 76, 78, can also be assigned to the base element 28.
- the workpiece carrier can be fixed in its position during the entire manufacturing process.
- means such as guide pins, rotary locks, expansion pins or mechanical stops are suitable for this.
- the workpiece carrier can be fixed on the workbench 80 during thin-film production, as is shown in perspective in a side view in FIG.
- the workbench 80 has guide pins 82, receiving openings 84 for positioning elements or spacers 86 on its surface 88. Furthermore, it makes sense to integrate drain openings 90 for fluid media in the workbench 80.
- FIG. 9 shows schematically how such a thin film production can be automated by means of a robot 92.
- a robot arm 94 removes a cover element 50 from one of the magazines 96 in accordance with an upcoming process step and places it on the handling element 30, which is arranged on the workbench 30.
- Suitable sensors can be used, for example, on the basis of the bores 52 and the notches 56 of the handling element 30, a relative position and an upcoming process step are determined.
- the cover element 50 is again placed in the magazine 96 and the next process step follows.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00954347A EP1203398A1 (en) | 1999-07-21 | 2000-07-19 | Substrate and workpiece support for receiving a substrate |
JP2001512619A JP2003505880A (en) | 1999-07-21 | 2000-07-19 | Substrate and workpiece support for receiving substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19934114.1 | 1999-07-21 | ||
DE1999134114 DE19934114A1 (en) | 1999-07-21 | 1999-07-21 | Substrate carrier used to holding thin layer substrates during the manufacture of high pressure sensor elements comprises a base element for receiving the substrate arranged on a handling element having covering elements |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001008199A1 true WO2001008199A1 (en) | 2001-02-01 |
Family
ID=7915493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2000/002368 WO2001008199A1 (en) | 1999-07-21 | 2000-07-19 | Substrate and workpiece support for receiving a substrate |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1203398A1 (en) |
JP (1) | JP2003505880A (en) |
DE (1) | DE19934114A1 (en) |
WO (1) | WO2001008199A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10144876B4 (en) | 2001-09-12 | 2004-03-04 | Robert Bosch Gmbh | Exposure mask device and method for aligning a plurality of substrates on an exposure mask |
DE10336745A1 (en) * | 2003-08-11 | 2005-03-10 | Bosch Gmbh Robert | Carrier device for magnetizable substrates |
DE102008002307A1 (en) | 2008-06-09 | 2009-12-10 | Robert Bosch Gmbh | Production method for a micromechanical component, corresponding component composite and corresponding micromechanical component |
DE102008042982A1 (en) | 2008-10-21 | 2010-04-22 | Robert Bosch Gmbh | Method for producing high-pressure sensors |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5304278A (en) * | 1988-10-19 | 1994-04-19 | International Business Machines Corporation | Apparatus for plasma or reactive ion etching and method of etching substrates having a low thermal conductivity |
US5421401A (en) * | 1994-01-25 | 1995-06-06 | Applied Materials, Inc. | Compound clamp ring for semiconductor wafers |
US5492223A (en) * | 1994-02-04 | 1996-02-20 | Motorola, Inc. | Interlocking and invertible semiconductor device tray and test contactor mating thereto |
EP0844645A1 (en) * | 1996-11-25 | 1998-05-27 | Schlumberger Technologies, Inc. | System, methods and apparatus for storing information during a semiconductor manufacturing process |
JPH10144824A (en) * | 1996-11-08 | 1998-05-29 | Sony Corp | Semiconductor package and semiconductor package containing tray |
US5794783A (en) * | 1996-12-31 | 1998-08-18 | Intel Corporation | Die-level burn-in and test flipping tray |
-
1999
- 1999-07-21 DE DE1999134114 patent/DE19934114A1/en not_active Ceased
-
2000
- 2000-07-19 EP EP00954347A patent/EP1203398A1/en not_active Withdrawn
- 2000-07-19 JP JP2001512619A patent/JP2003505880A/en active Pending
- 2000-07-19 WO PCT/DE2000/002368 patent/WO2001008199A1/en not_active Application Discontinuation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5304278A (en) * | 1988-10-19 | 1994-04-19 | International Business Machines Corporation | Apparatus for plasma or reactive ion etching and method of etching substrates having a low thermal conductivity |
US5421401A (en) * | 1994-01-25 | 1995-06-06 | Applied Materials, Inc. | Compound clamp ring for semiconductor wafers |
US5492223A (en) * | 1994-02-04 | 1996-02-20 | Motorola, Inc. | Interlocking and invertible semiconductor device tray and test contactor mating thereto |
JPH10144824A (en) * | 1996-11-08 | 1998-05-29 | Sony Corp | Semiconductor package and semiconductor package containing tray |
EP0844645A1 (en) * | 1996-11-25 | 1998-05-27 | Schlumberger Technologies, Inc. | System, methods and apparatus for storing information during a semiconductor manufacturing process |
US5794783A (en) * | 1996-12-31 | 1998-08-18 | Intel Corporation | Die-level burn-in and test flipping tray |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 1998, no. 10 31 August 1998 (1998-08-31) * |
Also Published As
Publication number | Publication date |
---|---|
EP1203398A1 (en) | 2002-05-08 |
DE19934114A1 (en) | 2001-01-25 |
JP2003505880A (en) | 2003-02-12 |
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