WO1997028669B1 - Model-based predictive control of thermal processing - Google Patents
Model-based predictive control of thermal processingInfo
- Publication number
- WO1997028669B1 WO1997028669B1 PCT/US1997/001318 US9701318W WO9728669B1 WO 1997028669 B1 WO1997028669 B1 WO 1997028669B1 US 9701318 W US9701318 W US 9701318W WO 9728669 B1 WO9728669 B1 WO 9728669B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- temperature
- output
- model
- thermal process
- future
- Prior art date
Links
- 238000000034 method Methods 0.000 claims abstract 77
- 230000001537 neural Effects 0.000 claims abstract 9
- 238000004364 calculation method Methods 0.000 claims 3
- 210000002569 neurons Anatomy 0.000 claims 3
- 238000005259 measurement Methods 0.000 claims 1
Abstract
A nonlinear model-based predictive temperature control system (100) is described for use in thermal process reactors. A multivariable temperature response is predicted using a nonlinear parameterized model of a thermal process reactor. The nonlinear parameterized model is implemented using a neural network. Predictions are made in an auto-regressive moving average fashion with a receding prediction horizon. Model predictions are incorporated into a control law for estimating the optimum future control strategy. The high-speed, predictive nature of the controller (62) renders it advantageous in multivariable rapid thermal processing reactors where fast response and high temperature uniformity are needed.
Claims
1. A temperature controlled thermal process reactor comprising; a reaction chamber enclosing an object to be heated; a source of thermal energy which heats said object; a thermal sensor which measures a temperature related to a temperature of said object and which provides an input signal representative of said temperature; and a model-based predictive temperature controller which receives said output signal representative of said temperature and which controls said source of thermal energy in response to said output signal.
2. The temperature controlled thermal process reactor of Claim 1, wherein the model-based predictive temperature controller comprises multivariable temperature control.
3. The temperature controlled rapid thermal process reactor of Claim 2, wherein the model-based predictive temperature cortroller comprises: a multivariable thermal process model which relates multivariable process input thermal energy to multivariable process output temperature; a prediction calculator which uses said thermal process model, to calculate a predicted nominal temperature output over a predetermined future time period; and a control calculator which uses said predicted nominal temperature output to calculate an optimum control strategy by which to control said source of thermal energy.
4. The temperature controlled thermal process reactor of Claim 3, wherein said prediction calculator calculates the predicted nominal temperature output using an auto-regressive moving average, having a predetermined prediction horizon.
5. The temperature controlled thermal process reactor of Claim 4, wherein the prediction calculator calculates an unoptimized initial estimate for a future control strategy.
6. The temperature controlled thermal process reactor of Claim 5, wherein said predicted nominal temperature output is calculated recursively over a
78 predetermined future time period using a recursive approximation strategy, said recursive approximation strategy beginning with said unoptimized initial estimate.
7. The temperature controlled thermal process reactor of Claim 6, wherein said thermal process model has parameters selected to substantially decouple the influence of system input variables from system input disturbance.
8. The temperature controlled thermal process reactor of Claim 3, wherein the control calculator compares said predicted nominal temperature output to a desired future temperature output and uses said comparison in a recursive algorithm to compute said optimum control strategy.
9. The temperature controlled thermal process reactor of Claim 3, wherein said thermal process model is a nonlinear model.
10. The temperature controlled thermal process reactor of Claim 3, wherein said thermal process model is based on a neural network.
11. The temperature controlled thermal process reactor of Claim 1, wherein the model-based predictive temperature controller comprises nonlinear multivariable temperature control.
12. The temperature controlled rapid thermal process reactor of Claim 11, wherein the nonlinear model-based predictive temperature controller comprises: a nonlinear multivariable thermal process model which relates multivariable process input thermal energy to multivariable process output temperature; a prediction calculator which uses said thermal process model, to calculate a predicted nominal temperature output over a predetermined future time period; and a control calculator which uses said predicted nominal temperature output to calculate an optimum control strategy by which to control said source of thermal energy.
13. The temperature controlled thermal process reactor of Claim 12, wherein said prediction calculator calculates the predicted nominal temperature output using a neural network.
14. The temperature controlled thermal process reactor of Claim 13, wherein the prediction calculator assumes a future control strategy.
79
15. The temperature controlled thermal process reactor of Claim 14, wherein said neural network is a feed forward network.
16. The temperature controlled thermal process reactor of Claim 15, wherein said neural network comprises a hidden layer of neurons.
17. The temperature controlled thermal process reactor of Claim 16, wherein said hidden layer of neurons comprises nonlinear sigmoid-type neurons.
18. The temperature controlled thermal process reactor of Claim 13, wherein said neural network is trained using a pseudo least squares method.
19. The temperature controlled thermal process reactor of Claim 12, wherein the control calculator compares said predicted nominal temperature output to a desired future temperature output to derive said optimum control strategy.
20. The temperature controlled thermal process reactor of Claim 1, further comprising a soflsensor model.
21. The temperature controlled thermal process reactor of Claim 20, wherein said soflsensor model is created from a dataset generated by using an instrumented wafer.
22. The temperature controlled thermal process reactor of Claim 1, further comprising a setpoint generator, said setpoint generator automatically generating a correction to said recipe inputs into said thermal process reactor, said correction facilitating control of actual wafer surface temperatures.
23. The temperature controlled thermal process reactor of Claim 22, said correction facihtating improved control of actual wafer surface temperatures based on measurement of susceptor temperatures.
24. A temperature control system for controlling a thermal process comprising; a controllable source of thermal energy which heats an object; a temperature sensor which measures a temperature related to a temperature of said object and which generates an output signal responsive to said temperature; and a model-based predictive temperature controller which receives said output signal representative of said temperature and which controls said source of thermal energy in response to said output signal, said controller comprising:
80 a thermal process model which relates process input thermal energy to a process output temperature; a prediction calculator which uses said thermal process model to calculate a predicted nominal temperature output over a predetermined future time period; and a control calculator which uses said predicted nominal temperature output to calculate an optimum strategy by which to control said source of thermal energy, said controller generating output signals to said source of thermal energy in response to said optimum strategy.
25. The temperature control system of Claim 24, wherein said thermal process model has parameters selected to substantially decouple the influence of system input variables from system input disturbances.
26. The temperature control system of Claim 24, wherein said prediction calculator includes a postulated future control strategy and a recursive algorithm to optimize said postulated future control strategy.
27. The temperature control system of Claim 24, wherein said thermal process model is a nonlinear model.
28. The temperature control system of Claim 27, wherein said thermal process model substantially decouples the influence of system input variables from system input disturbances.
29. The temperature control system of Claim 27, wherein said prediction calculator comprises a neural network.
30. The temperature control system of Claim 27, wherein said prediction calculator comprises a feed forward neural network, said prediction calculator having a receding calculation horizon.
31. A method of controlling a thermal process comprising the steps of: measuring a process output temperature; using a model to predict a future process output temperature; using said measured process output temperatures and said predicted future process temperature to calculate an optimum process input control strategy; and
81 controlling a process input thermal energy using the calculated optimum process input control strategy.
32. The method of Claim 31, wherein the step of predicting a future process output temperature comprises: identifying a thermal process model which relates process input thermal energy to process output temperature; and recursively predicting future process output temperatures using said thermal process model, said process output temperature predicted over a predetermined future time period.
33. The method of Claim 32, wherein the step of predicting future process output temperatures further comprises periodically updating said predictions in accordance with a receding horizon calculation.
34. The method of Claim 31, wherein the step of predicting a future process output temperature comprises postulating a stationary future control strategy.
35. The method of Claim 31 , wherein the step of calculating an optimum process input control strategy comprises comparing said predicted future process output temperatures to a desired future process output temperature.
36. The method of Claim 31 , wherein the step of predicting a future process output temperature comprises: identifying a nonlinear thermal process model which relates process input thermal energy to process output temperature; and training a neural network to predict future process output temperatures using said thermal process model, said process output temperature predicted over a predetermined future time period.
37. The method of Claim 36, wherein the step of predicting future process output temperatures further comprises periodically updating said predictions in accordance with a receding horizon calculation.
38. The method of Claim 36, wherein the step of predicting a future process output temperature comprises postulating a stationary future control strategy.
39. The method of Claim 36, wherein the step of calculating an optimum process input control strategy comprises comparing said predicted future process output temperatures to a desired future process output temperature.
82
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU18435/97A AU1843597A (en) | 1996-01-31 | 1997-01-30 | Model-based predictive control of thermal processing |
DE69728256T DE69728256T2 (en) | 1996-01-31 | 1997-01-30 | MODEL-BASED PREDICTIVE CONTROL FOR THERMAL TREATMENTS |
EP97904022A EP0879547B1 (en) | 1996-01-31 | 1997-01-30 | Model-based predictive control of thermal processing |
JP52776597A JP3956057B2 (en) | 1996-01-31 | 1997-01-30 | Model reference predictive control of heat treatment |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US59743896A | 1996-01-31 | 1996-01-31 | |
US08/597,438 | 1996-01-31 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO1997028669A1 WO1997028669A1 (en) | 1997-08-07 |
WO1997028669B1 true WO1997028669B1 (en) | 1997-09-12 |
WO1997028669A9 WO1997028669A9 (en) | 1997-10-30 |
Family
ID=24391498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1997/001318 WO1997028669A1 (en) | 1996-01-31 | 1997-01-30 | Model-based predictive control of thermal processing |
Country Status (7)
Country | Link |
---|---|
US (2) | US6207936B1 (en) |
EP (1) | EP0879547B1 (en) |
JP (1) | JP3956057B2 (en) |
KR (1) | KR100486158B1 (en) |
AU (1) | AU1843597A (en) |
DE (1) | DE69728256T2 (en) |
WO (1) | WO1997028669A1 (en) |
Families Citing this family (419)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6113702A (en) * | 1995-09-01 | 2000-09-05 | Asm America, Inc. | Wafer support system |
US20020046143A1 (en) * | 1995-10-03 | 2002-04-18 | Eder Jeffrey Scott | Method of and system for evaluating cash flow and elements of a business enterprise |
AU1843597A (en) | 1996-01-31 | 1997-08-22 | Asm America, Inc. | Model-based predictive control of thermal processing |
US6381504B1 (en) * | 1996-05-06 | 2002-04-30 | Pavilion Technologies, Inc. | Method for optimizing a plant with multiple inputs |
US8311673B2 (en) * | 1996-05-06 | 2012-11-13 | Rockwell Automation Technologies, Inc. | Method and apparatus for minimizing error in dynamic and steady-state processes for prediction, control, and optimization |
US7610108B2 (en) * | 1996-05-06 | 2009-10-27 | Rockwell Automation Technologies, Inc. | Method and apparatus for attenuating error in dynamic and steady-state processes for prediction, control, and optimization |
US6438430B1 (en) * | 1996-05-06 | 2002-08-20 | Pavilion Technologies, Inc. | Kiln thermal and combustion control |
US20080004922A1 (en) * | 1997-01-06 | 2008-01-03 | Jeff Scott Eder | Detailed method of and system for modeling and analyzing business improvement programs |
US20010034686A1 (en) * | 1997-12-10 | 2001-10-25 | Eder Jeff Scott | Method of and system for defining and measuring the real options of a commercial enterprise |
US10839321B2 (en) * | 1997-01-06 | 2020-11-17 | Jeffrey Eder | Automated data storage system |
EP0907117A1 (en) * | 1997-09-05 | 1999-04-07 | Communauté Européenne (CE) | Nonlinear neural predictive control system |
US6453308B1 (en) | 1997-10-01 | 2002-09-17 | Aspen Technology, Inc. | Non-linear dynamic predictive device |
US6401003B1 (en) * | 1997-12-30 | 2002-06-04 | Samsung Electronics Co., Ltd. | Alarm system for semiconductor device fabrication facility |
JP4551515B2 (en) * | 1998-10-07 | 2010-09-29 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus and temperature control method thereof |
DE19855637A1 (en) * | 1998-12-02 | 2000-06-15 | Aixtron Ag | Process and system for semiconductor crystal production with temperature management |
US20040215495A1 (en) * | 1999-04-16 | 2004-10-28 | Eder Jeff Scott | Method of and system for defining and measuring the elements of value and real options of a commercial enterprise |
US6694289B1 (en) * | 1999-07-01 | 2004-02-17 | International Business Machines Corporation | Fast simulation method for single and coupled lossy lines with frequency-dependent parameters based on triangle impulse responses |
US6560514B1 (en) | 1999-09-23 | 2003-05-06 | Kic Thermal Profiling | Method and apparatus for optimizing control of a part temperature in conveyorized thermal processor |
US6453219B1 (en) | 1999-09-23 | 2002-09-17 | Kic Thermal Profiling | Method and apparatus for controlling temperature response of a part in a conveyorized thermal processor |
JP3450240B2 (en) * | 1999-11-25 | 2003-09-22 | Necエレクトロニクス株式会社 | Lamp annealing apparatus and processing temperature control method for lamp annealing apparatus |
US6522990B1 (en) | 1999-12-03 | 2003-02-18 | General Electric Company | Methods and apparatus for reducing temperature overshoot |
JP2001210596A (en) * | 2000-01-28 | 2001-08-03 | Hitachi Kokusai Electric Inc | Temperature control method of semiconductor manufacturing apparatus, semiconductor manufacturing apparatus, and manufacturing method of semiconductor device |
US6191399B1 (en) | 2000-02-01 | 2001-02-20 | Asm America, Inc. | System of controlling the temperature of a processing chamber |
TW505770B (en) * | 2000-05-02 | 2002-10-11 | Nishiyama Corp | Temperature controller |
CA2414707C (en) * | 2000-06-29 | 2011-08-16 | Aspen Technology, Inc. | Computer method and apparatus for constraining a non-linear approximator of an empirical process |
DE10032465A1 (en) * | 2000-07-04 | 2002-01-31 | Steag Rtp Systems Gmbh | Method and device for the thermal treatment of objects |
US6465761B2 (en) * | 2000-07-24 | 2002-10-15 | Asm America, Inc. | Heat lamps for zone heating |
US20090018891A1 (en) * | 2003-12-30 | 2009-01-15 | Jeff Scott Eder | Market value matrix |
US20040236673A1 (en) * | 2000-10-17 | 2004-11-25 | Eder Jeff Scott | Collaborative risk transfer system |
US6819963B2 (en) * | 2000-12-06 | 2004-11-16 | Advanced Micro Devices, Inc. | Run-to-run control method for proportional-integral-derivative (PID) controller tuning for rapid thermal processing (RTP) |
US7092863B2 (en) * | 2000-12-26 | 2006-08-15 | Insyst Ltd. | Model predictive control (MPC) system using DOE based model |
US6911628B1 (en) * | 2001-01-25 | 2005-06-28 | Yamatake Corporation | Control system and control unit |
KR100423183B1 (en) * | 2001-03-21 | 2004-03-18 | 코닉 시스템 주식회사 | Apparatus and method for temperature control in RTP using an adaptive control |
US6606537B1 (en) * | 2001-04-19 | 2003-08-12 | Kic Thermal Profiling | Method for correcting process temperature profile in a multi-zone thermal processor |
NL1018086C2 (en) * | 2001-05-16 | 2002-11-26 | Asm Int | Method and device for the thermal treatment of substrates. |
JP4506030B2 (en) | 2001-05-18 | 2010-07-21 | 東京エレクトロン株式会社 | Heat treatment apparatus and film forming method |
WO2002097540A1 (en) * | 2001-05-25 | 2002-12-05 | Parametric Optimization Solutions Ltd. | Improved process control |
DE10129141A1 (en) * | 2001-06-16 | 2002-12-19 | Abb Research Ltd | Control and regulating methods and regulating device for starting or stopping a procedural component of a technical process |
US7158840B2 (en) * | 2001-06-29 | 2007-01-02 | Cymer, Inc. | Tuning control parameters of vibration reduction and motion control systems for fabrication equipment and robotic systems |
WO2003006215A2 (en) * | 2001-07-13 | 2003-01-23 | Fsi International | Robotic system control |
US6616759B2 (en) * | 2001-09-06 | 2003-09-09 | Hitachi, Ltd. | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor |
US6810291B2 (en) * | 2001-09-14 | 2004-10-26 | Ibex Process Technology, Inc. | Scalable, hierarchical control for complex processes |
FI115081B (en) * | 2001-10-19 | 2005-02-28 | Metso Automation Oy | Method and apparatus for controlling the operation of a pulp department of a paper machine |
EP1316866B1 (en) * | 2001-11-29 | 2006-05-31 | Abb Research Ltd. | Optimal operation of a power plant |
US7493470B1 (en) | 2001-12-07 | 2009-02-17 | Arc International, Plc | Processor apparatus and methods optimized for control applications |
US20040215522A1 (en) * | 2001-12-26 | 2004-10-28 | Eder Jeff Scott | Process optimization system |
US6785633B2 (en) * | 2001-12-28 | 2004-08-31 | General Electric Company | Method and apparatus for assessing performance of combined cycle power-plants |
US20030125906A1 (en) * | 2001-12-28 | 2003-07-03 | Guaglardi Paul A. | Method and apparatus for assessing the impact of individual parts of a gas turbine component on the overall thermal performance of a gas turbine |
US20080256069A1 (en) * | 2002-09-09 | 2008-10-16 | Jeffrey Scott Eder | Complete Context(tm) Query System |
US7730063B2 (en) * | 2002-12-10 | 2010-06-01 | Asset Trust, Inc. | Personalized medicine service |
US20110040631A1 (en) * | 2005-07-09 | 2011-02-17 | Jeffrey Scott Eder | Personalized commerce system |
US20080027769A1 (en) | 2002-09-09 | 2008-01-31 | Jeff Scott Eder | Knowledge based performance management system |
US6596973B1 (en) | 2002-03-07 | 2003-07-22 | Asm America, Inc. | Pyrometer calibrated wafer temperature estimator |
EP1343061A1 (en) * | 2002-03-08 | 2003-09-10 | Siemens Aktiengesellschaft | Method for simulating a technical system and simulator |
US7505877B2 (en) * | 2002-03-08 | 2009-03-17 | Johnson Controls Technology Company | System and method for characterizing a system |
US6864897B2 (en) * | 2002-04-12 | 2005-03-08 | Mitsubishi Electric Research Labs, Inc. | Analysis, synthesis and control of data signals with temporal textures using a linear dynamic system |
US7427329B2 (en) | 2002-05-08 | 2008-09-23 | Asm International N.V. | Temperature control for single substrate semiconductor processing reactor |
US6843201B2 (en) * | 2002-05-08 | 2005-01-18 | Asm International Nv | Temperature control for single substrate semiconductor processing reactor |
US7668702B2 (en) * | 2002-07-19 | 2010-02-23 | Applied Materials, Inc. | Method, system and medium for controlling manufacturing process using adaptive models based on empirical data |
US20040019393A1 (en) * | 2002-07-25 | 2004-01-29 | Eileen Heider | System and method for model base control |
US6818864B2 (en) | 2002-08-09 | 2004-11-16 | Asm America, Inc. | LED heat lamp arrays for CVD heating |
US7050863B2 (en) * | 2002-09-11 | 2006-05-23 | Fisher-Rosemount Systems, Inc. | Integrated model predictive control and optimization within a process control system |
US6642486B1 (en) * | 2002-11-07 | 2003-11-04 | Illinois Tool Works, Inc. | Method and apparatus for replicating heat profile of infrared oven |
US7006900B2 (en) * | 2002-11-14 | 2006-02-28 | Asm International N.V. | Hybrid cascade model-based predictive control system |
AU2003290932A1 (en) * | 2002-11-15 | 2004-06-15 | Applied Materials, Inc. | Method, system and medium for controlling manufacture process having multivariate input parameters |
US8463441B2 (en) | 2002-12-09 | 2013-06-11 | Hudson Technologies, Inc. | Method and apparatus for optimizing refrigeration systems |
DE10329107B4 (en) * | 2002-12-23 | 2015-05-28 | Mattson Thermal Products Gmbh | Method for determining at least one state variable from a model of an RTP system |
JP4461097B2 (en) * | 2002-12-23 | 2010-05-12 | マットソン サーマル プロダクツ ゲゼルシャフト ミット ベシュレンクテル ハフツング | Method for determining the temperature of a semiconductor wafer in a high-speed heating device |
US7619184B2 (en) * | 2003-03-04 | 2009-11-17 | Micron Technology, Inc. | Multi-parameter process and control method |
US20040181498A1 (en) * | 2003-03-11 | 2004-09-16 | Kothare Simone L. | Constrained system identification for incorporation of a priori knowledge |
US20040181300A1 (en) * | 2003-03-11 | 2004-09-16 | Clark Robert L. | Methods, apparatus and computer program products for adaptively controlling a system by combining recursive system identification with generalized predictive control |
ES2348409T3 (en) * | 2003-03-21 | 2010-12-03 | Aspen Technology, Inc. | METHODS AND ARTICLES FOR DETECTION, VERIFICATION AND REPAIR OF COLLINALITIES. |
DE10324045B3 (en) * | 2003-05-27 | 2004-10-14 | Siemens Ag | System characteristics modelling method for dynamic system using similarity analysis for modification of known system characteristics supplied to neural network structure for causality analysis |
US7181296B2 (en) * | 2003-08-06 | 2007-02-20 | Asml Netherlands B.V. | Method of adaptive interactive learning control and a lithographic manufacturing process and apparatus employing such a method |
JP4223894B2 (en) * | 2003-08-21 | 2009-02-12 | 株式会社山武 | PID parameter adjustment device |
US20050044892A1 (en) * | 2003-08-28 | 2005-03-03 | George Stephan P. | Method and apparatus for heating glass sheets |
US7447664B2 (en) * | 2003-08-28 | 2008-11-04 | Boeing Co | Neural network predictive control cost function designer |
US7410355B2 (en) * | 2003-10-31 | 2008-08-12 | Asm International N.V. | Method for the heat treatment of substrates |
US7022627B2 (en) | 2003-10-31 | 2006-04-04 | Asm International N.V. | Method for the heat treatment of substrates |
US6940047B2 (en) * | 2003-11-14 | 2005-09-06 | Asm International N.V. | Heat treatment apparatus with temperature control system |
US7187989B2 (en) * | 2003-12-22 | 2007-03-06 | Fakhruddin T Attarwala | Use of core process models in model predictive controller |
US7101816B2 (en) * | 2003-12-29 | 2006-09-05 | Tokyo Electron Limited | Methods for adaptive real time control of a thermal processing system |
US6964238B2 (en) * | 2003-12-31 | 2005-11-15 | Kimberly-Clark Worldwide, Inc. | Process for making a garment having hanging legs |
ATE419567T1 (en) * | 2004-01-09 | 2009-01-15 | Abb Research Ltd | DEVICE FOR PROCESS CONTROL |
US7025280B2 (en) * | 2004-01-30 | 2006-04-11 | Tokyo Electron Limited | Adaptive real time control of a reticle/mask system |
US6943327B2 (en) * | 2004-02-04 | 2005-09-13 | Lear Corporation | Method for the progressive control of heating elements |
US7400933B2 (en) * | 2004-02-06 | 2008-07-15 | Wisconsin Alumni Research Foundation | SISO model predictive controller |
US7203554B2 (en) * | 2004-03-16 | 2007-04-10 | United Technologies Corporation | Model predictive controller with life extending control |
US7203555B2 (en) * | 2004-05-14 | 2007-04-10 | University Of Delaware | Predictive regulatory controller |
US7415312B2 (en) * | 2004-05-25 | 2008-08-19 | Barnett Jr James R | Process module tuning |
US20090043637A1 (en) * | 2004-06-01 | 2009-02-12 | Eder Jeffrey Scott | Extended value and risk management system |
US20060020563A1 (en) * | 2004-07-26 | 2006-01-26 | Coleman Christopher R | Supervised neural network for encoding continuous curves |
US20070036467A1 (en) * | 2004-07-26 | 2007-02-15 | Coleman Christopher R | System and method for creating a high resolution material image |
US20060017740A1 (en) * | 2004-07-26 | 2006-01-26 | Coleman Christopher R | Diurnal variation of geo-specific terrain temperatures in real-time infrared sensor simulation |
US20060018566A1 (en) * | 2004-07-26 | 2006-01-26 | Coleman Christopher R | System and method for adding spatial frequency into an image |
JP4925571B2 (en) | 2004-08-09 | 2012-04-25 | アプライド マテリアルズ インコーポレイテッド | Method for determining thermal properties of substrate and method for determining heat treatment conditions |
JP4428175B2 (en) * | 2004-09-14 | 2010-03-10 | 株式会社Sumco | Vapor phase epitaxial growth apparatus and semiconductor wafer manufacturing method |
US7502715B1 (en) * | 2004-09-21 | 2009-03-10 | Asml Netherlands B.V | Observability in metrology measurements |
US7217670B2 (en) * | 2004-11-22 | 2007-05-15 | Asm International N.V. | Dummy substrate for thermal reactor |
US7751908B2 (en) * | 2004-12-02 | 2010-07-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system for thermal process control |
US20060167591A1 (en) * | 2005-01-26 | 2006-07-27 | Mcnally James T | Energy and cost savings calculation system |
US8713025B2 (en) | 2005-03-31 | 2014-04-29 | Square Halt Solutions, Limited Liability Company | Complete context search system |
US7777197B2 (en) * | 2005-06-02 | 2010-08-17 | Applied Materials, Inc. | Vacuum reaction chamber with x-lamp heater |
US20060289795A1 (en) * | 2005-06-02 | 2006-12-28 | Dubois Dale R | Vacuum reaction chamber with x-lamp heater |
JP4839702B2 (en) * | 2005-07-04 | 2011-12-21 | オムロン株式会社 | Temperature control method, adjustment device, temperature controller, program, recording medium, and heat treatment device |
US7672739B2 (en) * | 2005-08-11 | 2010-03-02 | University Of South Florida | System for multiresolution analysis assisted reinforcement learning approach to run-by-run control |
GB2430764B (en) * | 2005-09-30 | 2011-03-09 | Fisher Rosemount Systems Inc | On-line adaptive model predictive control in a process control system |
US7451004B2 (en) * | 2005-09-30 | 2008-11-11 | Fisher-Rosemount Systems, Inc. | On-line adaptive model predictive control in a process control system |
US7957847B2 (en) * | 2005-09-30 | 2011-06-07 | Hitachi Global Storage Technologies Netherlands, B.V. | Voltage regulating systems responsive to feed-forward information from deterministic loads |
US8498915B2 (en) * | 2006-04-02 | 2013-07-30 | Asset Reliance, Inc. | Data processing framework for financial services |
US8527252B2 (en) * | 2006-07-28 | 2013-09-03 | Emerson Process Management Power & Water Solutions, Inc. | Real-time synchronized control and simulation within a process plant |
DE102006036585B4 (en) * | 2006-08-04 | 2008-04-17 | Mattson Thermal Products Gmbh | Method and device for determining measured values |
US7949417B2 (en) * | 2006-09-22 | 2011-05-24 | Exxonmobil Research And Engineering Company | Model predictive controller solution analysis process |
US7826909B2 (en) * | 2006-12-11 | 2010-11-02 | Fakhruddin T Attarwala | Dynamic model predictive control |
US7451054B2 (en) * | 2007-01-30 | 2008-11-11 | Tokyo Electron Limited | Method of using a wafer-temperature-dependent profile library |
JP5169046B2 (en) * | 2007-07-20 | 2013-03-27 | ウシオ電機株式会社 | Light irradiation type heat treatment equipment |
US8064151B2 (en) * | 2007-08-14 | 2011-11-22 | Asml Netherlands B.V. | Lithographic apparatus and thermal optical manipulator control method |
US20090076773A1 (en) * | 2007-09-14 | 2009-03-19 | Texas Tech University | Method for identifying unmeasured disturbances in process control test data |
US8047706B2 (en) * | 2007-12-07 | 2011-11-01 | Asm America, Inc. | Calibration of temperature control system for semiconductor processing chamber |
ES2337960T3 (en) * | 2008-02-15 | 2010-04-30 | Siemens Aktiengesellschaft | RELIABLE ASSESSMENT OF A TEMPERATURE MEASUREMENT SIGNAL THROUGH THE DYNAMIC ADAPTATION OF A MATHEMATICAL MODEL. |
US8332057B2 (en) * | 2008-03-20 | 2012-12-11 | University Of New Brunswick | Method of multi-dimensional nonlinear control |
US8209045B2 (en) * | 2008-04-07 | 2012-06-26 | Honeywell International Inc. | System and method for discrete supply chain control and optimization using model predictive control |
JP5562529B2 (en) * | 2008-04-17 | 2014-07-30 | 大日本スクリーン製造株式会社 | Heat treatment equipment |
US20090287320A1 (en) * | 2008-05-13 | 2009-11-19 | Macgregor John | System and Method for the Model Predictive Control of Batch Processes using Latent Variable Dynamic Models |
US8315746B2 (en) * | 2008-05-30 | 2012-11-20 | Apple Inc. | Thermal management techniques in an electronic device |
JP5251267B2 (en) * | 2008-06-04 | 2013-07-31 | 富士電機株式会社 | Control device |
US8306772B2 (en) | 2008-10-13 | 2012-11-06 | Apple Inc. | Method for estimating temperature at a critical point |
CN102224380B (en) * | 2008-11-25 | 2013-12-18 | Utc消防及保安公司 | Oxygen trim controller tuning during combustion system commissioning |
US8260440B2 (en) * | 2008-12-05 | 2012-09-04 | The Regents Of The University Of Michigan | Adaptive control based on retrospective cost optimization |
US9758871B2 (en) * | 2008-12-10 | 2017-09-12 | Sumco Techxiv Corporation | Method and apparatus for manufacturing epitaxial silicon wafer |
DE102009016138A1 (en) * | 2009-04-03 | 2010-10-14 | Ipsen International Gmbh | Method and computer program for controlling the heat treatment of metallic workpieces |
US9394608B2 (en) | 2009-04-06 | 2016-07-19 | Asm America, Inc. | Semiconductor processing reactor and components thereof |
US20120284216A1 (en) * | 2009-08-12 | 2012-11-08 | International Business Machines Corporation | Knowledge-Based Models for Data Centers |
US8244502B2 (en) | 2009-08-12 | 2012-08-14 | International Business Machines Corporation | Knowledge-based models for data centers |
US8802201B2 (en) | 2009-08-14 | 2014-08-12 | Asm America, Inc. | Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species |
WO2011077702A1 (en) * | 2009-12-25 | 2011-06-30 | キヤノンアネルバ株式会社 | Temperature control method for substrate heat treatment apparatus, method for producing semiconductor device, temperature control program and recording medium for substrate heat treatment apparatus |
US20130023129A1 (en) | 2011-07-20 | 2013-01-24 | Asm America, Inc. | Pressure transmitter for a semiconductor processing environment |
US9017481B1 (en) | 2011-10-28 | 2015-04-28 | Asm America, Inc. | Process feed management for semiconductor substrate processing |
US20130130184A1 (en) * | 2011-11-21 | 2013-05-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and Method for Controlling Wafer Temperature |
US8809747B2 (en) * | 2012-04-13 | 2014-08-19 | Lam Research Corporation | Current peak spreading schemes for multiplexed heated array |
US9158313B2 (en) * | 2012-07-25 | 2015-10-13 | Broadcom Corporation | System and method for supervised thermal management |
SG11201501101PA (en) * | 2012-09-24 | 2015-04-29 | Nestec Sa | Methods and systems for coordination of aseptic sterilization and aseptic package filling rate |
US10714315B2 (en) | 2012-10-12 | 2020-07-14 | Asm Ip Holdings B.V. | Semiconductor reaction chamber showerhead |
US20160376700A1 (en) | 2013-02-01 | 2016-12-29 | Asm Ip Holding B.V. | System for treatment of deposition reactor |
US9189575B2 (en) | 2013-03-11 | 2015-11-17 | Toyota Motor Engineering & Manufacturing North America, Inc. | SVR dynamic system modeling with delayed output measurements |
US20140365413A1 (en) * | 2013-06-06 | 2014-12-11 | Qualcomm Incorporated | Efficient implementation of neural population diversity in neural system |
US20150148981A1 (en) * | 2013-11-24 | 2015-05-28 | Qualcomm Incorporated | System and method for multi-correlative learning thermal management of a system on a chip in a portable computing device |
US9476584B2 (en) | 2013-12-12 | 2016-10-25 | General Electric Company | Controlling boiler drum level |
JP2017034295A (en) * | 2013-12-13 | 2017-02-09 | シャープ株式会社 | Base station device, terminal device, transmission method, and reception method |
DE102014201567B4 (en) | 2014-01-29 | 2023-12-21 | Bayerische Motoren Werke Aktiengesellschaft | Model-based predictive starter control of an internal combustion engine |
US11015245B2 (en) | 2014-03-19 | 2021-05-25 | Asm Ip Holding B.V. | Gas-phase reactor and system having exhaust plenum and components thereof |
US20150300888A1 (en) * | 2014-04-21 | 2015-10-22 | National Taiwan University | Temperature prediction system and method thereof |
US9715221B2 (en) | 2014-05-01 | 2017-07-25 | Aspen Technology, Inc. | Online control calculation for models containing near colinearity and uncertainty |
TWI621001B (en) * | 2014-06-11 | 2018-04-11 | 蘇鴻德 | A controller achieving multi-variable control using a single-variable control unit |
US10858737B2 (en) | 2014-07-28 | 2020-12-08 | Asm Ip Holding B.V. | Showerhead assembly and components thereof |
US9890456B2 (en) | 2014-08-21 | 2018-02-13 | Asm Ip Holding B.V. | Method and system for in situ formation of gas-phase compounds |
US9541906B2 (en) * | 2014-09-11 | 2017-01-10 | Hong-Te SU | Controller capable of achieving multi-variable controls through single-variable control unit |
US10941490B2 (en) | 2014-10-07 | 2021-03-09 | Asm Ip Holding B.V. | Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same |
DE112015004092T5 (en) * | 2014-12-11 | 2017-07-06 | Fuji Electric Co., Ltd. | Control device, program for it and plant control procedures |
US10276355B2 (en) | 2015-03-12 | 2019-04-30 | Asm Ip Holding B.V. | Multi-zone reactor, system including the reactor, and method of using the same |
CN107615184B (en) * | 2015-06-05 | 2021-02-09 | 国际壳牌研究有限公司 | System and method for estimating and controlling background element switching of a model in an application for model prediction |
US10671131B2 (en) | 2015-06-05 | 2020-06-02 | Apple Inc. | Predictive control systems and methods |
US10496054B2 (en) | 2015-06-26 | 2019-12-03 | Bayer Cropscience Ag | Method for controlling technical processes with linearization |
US10458018B2 (en) | 2015-06-26 | 2019-10-29 | Asm Ip Holding B.V. | Structures including metal carbide material, devices including the structures, and methods of forming same |
US10211308B2 (en) | 2015-10-21 | 2019-02-19 | Asm Ip Holding B.V. | NbMC layers |
US11139308B2 (en) | 2015-12-29 | 2021-10-05 | Asm Ip Holding B.V. | Atomic layer deposition of III-V compounds to form V-NAND devices |
US10529554B2 (en) | 2016-02-19 | 2020-01-07 | Asm Ip Holding B.V. | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches |
EP4012164A1 (en) | 2016-03-02 | 2022-06-15 | Watlow Electric Manufacturing Company | Heating system |
JP6647931B2 (en) * | 2016-03-16 | 2020-02-14 | 株式会社Kelk | Semiconductor wafer temperature control device and semiconductor wafer temperature control method |
CN105751470B (en) * | 2016-03-23 | 2017-12-12 | 广西科技大学 | A kind of injection machine temperature real-time control method |
CA3019170C (en) * | 2016-04-08 | 2024-04-30 | Dan Warkander | Temperature-based estimation of scrubbing capacity of a gas scrubber |
US10865475B2 (en) | 2016-04-21 | 2020-12-15 | Asm Ip Holding B.V. | Deposition of metal borides and silicides |
US10190213B2 (en) | 2016-04-21 | 2019-01-29 | Asm Ip Holding B.V. | Deposition of metal borides |
US10367080B2 (en) | 2016-05-02 | 2019-07-30 | Asm Ip Holding B.V. | Method of forming a germanium oxynitride film |
US11453943B2 (en) | 2016-05-25 | 2022-09-27 | Asm Ip Holding B.V. | Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor |
US9859151B1 (en) | 2016-07-08 | 2018-01-02 | Asm Ip Holding B.V. | Selective film deposition method to form air gaps |
US10612137B2 (en) | 2016-07-08 | 2020-04-07 | Asm Ip Holdings B.V. | Organic reactants for atomic layer deposition |
US10714385B2 (en) | 2016-07-19 | 2020-07-14 | Asm Ip Holding B.V. | Selective deposition of tungsten |
US9887082B1 (en) | 2016-07-28 | 2018-02-06 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
US9812320B1 (en) | 2016-07-28 | 2017-11-07 | Asm Ip Holding B.V. | Method and apparatus for filling a gap |
KR102532607B1 (en) | 2016-07-28 | 2023-05-15 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus and method of operating the same |
US10157761B2 (en) * | 2016-08-17 | 2018-12-18 | Kelk Ltd. | Temperature controller of semiconductor wafer |
US10643826B2 (en) | 2016-10-26 | 2020-05-05 | Asm Ip Holdings B.V. | Methods for thermally calibrating reaction chambers |
US11532757B2 (en) | 2016-10-27 | 2022-12-20 | Asm Ip Holding B.V. | Deposition of charge trapping layers |
US10229833B2 (en) | 2016-11-01 | 2019-03-12 | Asm Ip Holding B.V. | Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures |
US10714350B2 (en) | 2016-11-01 | 2020-07-14 | ASM IP Holdings, B.V. | Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures |
KR102546317B1 (en) | 2016-11-15 | 2023-06-21 | 에이에스엠 아이피 홀딩 비.브이. | Gas supply unit and substrate processing apparatus including the same |
KR20180068582A (en) | 2016-12-14 | 2018-06-22 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus |
US11581186B2 (en) | 2016-12-15 | 2023-02-14 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus |
US11447861B2 (en) | 2016-12-15 | 2022-09-20 | Asm Ip Holding B.V. | Sequential infiltration synthesis apparatus and a method of forming a patterned structure |
KR20180070971A (en) | 2016-12-19 | 2018-06-27 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus |
US10269558B2 (en) | 2016-12-22 | 2019-04-23 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
US10867788B2 (en) | 2016-12-28 | 2020-12-15 | Asm Ip Holding B.V. | Method of forming a structure on a substrate |
US11390950B2 (en) | 2017-01-10 | 2022-07-19 | Asm Ip Holding B.V. | Reactor system and method to reduce residue buildup during a film deposition process |
US10468261B2 (en) | 2017-02-15 | 2019-11-05 | Asm Ip Holding B.V. | Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures |
US10529563B2 (en) | 2017-03-29 | 2020-01-07 | Asm Ip Holdings B.V. | Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures |
KR102457289B1 (en) | 2017-04-25 | 2022-10-21 | 에이에스엠 아이피 홀딩 비.브이. | Method for depositing a thin film and manufacturing a semiconductor device |
US10770286B2 (en) | 2017-05-08 | 2020-09-08 | Asm Ip Holdings B.V. | Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures |
US10892156B2 (en) | 2017-05-08 | 2021-01-12 | Asm Ip Holding B.V. | Methods for forming a silicon nitride film on a substrate and related semiconductor device structures |
US10886123B2 (en) | 2017-06-02 | 2021-01-05 | Asm Ip Holding B.V. | Methods for forming low temperature semiconductor layers and related semiconductor device structures |
US20180363139A1 (en) * | 2017-06-20 | 2018-12-20 | Asm Ip Holding B.V. | Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus |
JP7148944B2 (en) * | 2017-06-23 | 2022-10-06 | 国立大学法人広島大学 | Control device |
US11306395B2 (en) | 2017-06-28 | 2022-04-19 | Asm Ip Holding B.V. | Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus |
US10685834B2 (en) | 2017-07-05 | 2020-06-16 | Asm Ip Holdings B.V. | Methods for forming a silicon germanium tin layer and related semiconductor device structures |
KR20190009245A (en) | 2017-07-18 | 2019-01-28 | 에이에스엠 아이피 홀딩 비.브이. | Methods for forming a semiconductor device structure and related semiconductor device structures |
US11018002B2 (en) | 2017-07-19 | 2021-05-25 | Asm Ip Holding B.V. | Method for selectively depositing a Group IV semiconductor and related semiconductor device structures |
US11374112B2 (en) | 2017-07-19 | 2022-06-28 | Asm Ip Holding B.V. | Method for depositing a group IV semiconductor and related semiconductor device structures |
US10541333B2 (en) | 2017-07-19 | 2020-01-21 | Asm Ip Holding B.V. | Method for depositing a group IV semiconductor and related semiconductor device structures |
US10590535B2 (en) | 2017-07-26 | 2020-03-17 | Asm Ip Holdings B.V. | Chemical treatment, deposition and/or infiltration apparatus and method for using the same |
US10692741B2 (en) | 2017-08-08 | 2020-06-23 | Asm Ip Holdings B.V. | Radiation shield |
US10770336B2 (en) | 2017-08-08 | 2020-09-08 | Asm Ip Holding B.V. | Substrate lift mechanism and reactor including same |
US11139191B2 (en) | 2017-08-09 | 2021-10-05 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
US11769682B2 (en) | 2017-08-09 | 2023-09-26 | Asm Ip Holding B.V. | Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith |
US11830730B2 (en) | 2017-08-29 | 2023-11-28 | Asm Ip Holding B.V. | Layer forming method and apparatus |
US11056344B2 (en) | 2017-08-30 | 2021-07-06 | Asm Ip Holding B.V. | Layer forming method |
US11295980B2 (en) | 2017-08-30 | 2022-04-05 | Asm Ip Holding B.V. | Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures |
KR102491945B1 (en) | 2017-08-30 | 2023-01-26 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus |
KR102630301B1 (en) | 2017-09-21 | 2024-01-29 | 에이에스엠 아이피 홀딩 비.브이. | Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same |
US10844484B2 (en) | 2017-09-22 | 2020-11-24 | Asm Ip Holding B.V. | Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods |
US10658205B2 (en) | 2017-09-28 | 2020-05-19 | Asm Ip Holdings B.V. | Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber |
US10403504B2 (en) | 2017-10-05 | 2019-09-03 | Asm Ip Holding B.V. | Method for selectively depositing a metallic film on a substrate |
US10319588B2 (en) | 2017-10-10 | 2019-06-11 | Asm Ip Holding B.V. | Method for depositing a metal chalcogenide on a substrate by cyclical deposition |
US10923344B2 (en) | 2017-10-30 | 2021-02-16 | Asm Ip Holding B.V. | Methods for forming a semiconductor structure and related semiconductor structures |
US10910262B2 (en) | 2017-11-16 | 2021-02-02 | Asm Ip Holding B.V. | Method of selectively depositing a capping layer structure on a semiconductor device structure |
US11022879B2 (en) | 2017-11-24 | 2021-06-01 | Asm Ip Holding B.V. | Method of forming an enhanced unexposed photoresist layer |
WO2019103610A1 (en) | 2017-11-27 | 2019-05-31 | Asm Ip Holding B.V. | Apparatus including a clean mini environment |
US11127617B2 (en) | 2017-11-27 | 2021-09-21 | Asm Ip Holding B.V. | Storage device for storing wafer cassettes for use with a batch furnace |
US10872771B2 (en) | 2018-01-16 | 2020-12-22 | Asm Ip Holding B. V. | Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures |
TWI799494B (en) | 2018-01-19 | 2023-04-21 | 荷蘭商Asm 智慧財產控股公司 | Deposition method |
US11482412B2 (en) | 2018-01-19 | 2022-10-25 | Asm Ip Holding B.V. | Method for depositing a gap-fill layer by plasma-assisted deposition |
US11018047B2 (en) | 2018-01-25 | 2021-05-25 | Asm Ip Holding B.V. | Hybrid lift pin |
USD880437S1 (en) | 2018-02-01 | 2020-04-07 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
US11081345B2 (en) | 2018-02-06 | 2021-08-03 | Asm Ip Holding B.V. | Method of post-deposition treatment for silicon oxide film |
US10896820B2 (en) | 2018-02-14 | 2021-01-19 | Asm Ip Holding B.V. | Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process |
KR102657269B1 (en) | 2018-02-14 | 2024-04-16 | 에이에스엠 아이피 홀딩 비.브이. | Method for depositing a ruthenium-containing film on a substrate by a cyclic deposition process |
US10731249B2 (en) | 2018-02-15 | 2020-08-04 | Asm Ip Holding B.V. | Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus |
KR102636427B1 (en) | 2018-02-20 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing method and apparatus |
US10975470B2 (en) | 2018-02-23 | 2021-04-13 | Asm Ip Holding B.V. | Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment |
US11473195B2 (en) | 2018-03-01 | 2022-10-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus and a method for processing a substrate |
US11629406B2 (en) | 2018-03-09 | 2023-04-18 | Asm Ip Holding B.V. | Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate |
US11114283B2 (en) | 2018-03-16 | 2021-09-07 | Asm Ip Holding B.V. | Reactor, system including the reactor, and methods of manufacturing and using same |
KR102646467B1 (en) | 2018-03-27 | 2024-03-11 | 에이에스엠 아이피 홀딩 비.브이. | Method of forming an electrode on a substrate and a semiconductor device structure including an electrode |
US11230766B2 (en) | 2018-03-29 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
US11088002B2 (en) | 2018-03-29 | 2021-08-10 | Asm Ip Holding B.V. | Substrate rack and a substrate processing system and method |
KR102501472B1 (en) | 2018-03-30 | 2023-02-20 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing method |
TWI811348B (en) | 2018-05-08 | 2023-08-11 | 荷蘭商Asm 智慧財產控股公司 | Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures |
KR20190129718A (en) | 2018-05-11 | 2019-11-20 | 에이에스엠 아이피 홀딩 비.브이. | Methods for forming a doped metal carbide film on a substrate and related semiconductor device structures |
KR102596988B1 (en) | 2018-05-28 | 2023-10-31 | 에이에스엠 아이피 홀딩 비.브이. | Method of processing a substrate and a device manufactured by the same |
CN108694288B (en) * | 2018-05-29 | 2021-04-30 | 中南大学 | Method for rapidly acquiring set temperatures of walking beam type billet heating furnace under different yields |
US11718913B2 (en) | 2018-06-04 | 2023-08-08 | Asm Ip Holding B.V. | Gas distribution system and reactor system including same |
US11270899B2 (en) | 2018-06-04 | 2022-03-08 | Asm Ip Holding B.V. | Wafer handling chamber with moisture reduction |
CN108776432B (en) * | 2018-06-08 | 2021-10-01 | 哈尔滨工程大学 | Airport runway detection robot prediction control method based on network |
US11286562B2 (en) | 2018-06-08 | 2022-03-29 | Asm Ip Holding B.V. | Gas-phase chemical reactor and method of using same |
US10797133B2 (en) | 2018-06-21 | 2020-10-06 | Asm Ip Holding B.V. | Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures |
KR102568797B1 (en) | 2018-06-21 | 2023-08-21 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing system |
KR20210024462A (en) | 2018-06-27 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | Periodic deposition method for forming metal-containing material and films and structures comprising metal-containing material |
CN112292477A (en) | 2018-06-27 | 2021-01-29 | Asm Ip私人控股有限公司 | Cyclic deposition methods for forming metal-containing materials and films and structures containing metal-containing materials |
KR20200002519A (en) | 2018-06-29 | 2020-01-08 | 에이에스엠 아이피 홀딩 비.브이. | Method for depositing a thin film and manufacturing a semiconductor device |
US10612136B2 (en) | 2018-06-29 | 2020-04-07 | ASM IP Holding, B.V. | Temperature-controlled flange and reactor system including same |
US10388513B1 (en) | 2018-07-03 | 2019-08-20 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US10755922B2 (en) | 2018-07-03 | 2020-08-25 | Asm Ip Holding B.V. | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition |
US10767789B2 (en) | 2018-07-16 | 2020-09-08 | Asm Ip Holding B.V. | Diaphragm valves, valve components, and methods for forming valve components |
US11053591B2 (en) | 2018-08-06 | 2021-07-06 | Asm Ip Holding B.V. | Multi-port gas injection system and reactor system including same |
US10883175B2 (en) | 2018-08-09 | 2021-01-05 | Asm Ip Holding B.V. | Vertical furnace for processing substrates and a liner for use therein |
US10829852B2 (en) | 2018-08-16 | 2020-11-10 | Asm Ip Holding B.V. | Gas distribution device for a wafer processing apparatus |
US11430674B2 (en) | 2018-08-22 | 2022-08-30 | Asm Ip Holding B.V. | Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods |
US11024523B2 (en) | 2018-09-11 | 2021-06-01 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR20200030162A (en) | 2018-09-11 | 2020-03-20 | 에이에스엠 아이피 홀딩 비.브이. | Method for deposition of a thin film |
US10998205B2 (en) * | 2018-09-14 | 2021-05-04 | Kokusai Electric Corporation | Substrate processing apparatus and manufacturing method of semiconductor device |
US11049751B2 (en) | 2018-09-14 | 2021-06-29 | Asm Ip Holding B.V. | Cassette supply system to store and handle cassettes and processing apparatus equipped therewith |
CN110970344A (en) | 2018-10-01 | 2020-04-07 | Asm Ip控股有限公司 | Substrate holding apparatus, system including the same, and method of using the same |
US11232963B2 (en) | 2018-10-03 | 2022-01-25 | Asm Ip Holding B.V. | Substrate processing apparatus and method |
KR102592699B1 (en) | 2018-10-08 | 2023-10-23 | 에이에스엠 아이피 홀딩 비.브이. | Substrate support unit and apparatuses for depositing thin film and processing the substrate including the same |
US10847365B2 (en) | 2018-10-11 | 2020-11-24 | Asm Ip Holding B.V. | Method of forming conformal silicon carbide film by cyclic CVD |
US10811256B2 (en) | 2018-10-16 | 2020-10-20 | Asm Ip Holding B.V. | Method for etching a carbon-containing feature |
KR102605121B1 (en) | 2018-10-19 | 2023-11-23 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus and substrate processing method |
KR102546322B1 (en) | 2018-10-19 | 2023-06-21 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus and substrate processing method |
USD948463S1 (en) | 2018-10-24 | 2022-04-12 | Asm Ip Holding B.V. | Susceptor for semiconductor substrate supporting apparatus |
US11087997B2 (en) | 2018-10-31 | 2021-08-10 | Asm Ip Holding B.V. | Substrate processing apparatus for processing substrates |
KR20200051105A (en) | 2018-11-02 | 2020-05-13 | 에이에스엠 아이피 홀딩 비.브이. | Substrate support unit and substrate processing apparatus including the same |
US11572620B2 (en) | 2018-11-06 | 2023-02-07 | Asm Ip Holding B.V. | Methods for selectively depositing an amorphous silicon film on a substrate |
US11031242B2 (en) | 2018-11-07 | 2021-06-08 | Asm Ip Holding B.V. | Methods for depositing a boron doped silicon germanium film |
US10818758B2 (en) | 2018-11-16 | 2020-10-27 | Asm Ip Holding B.V. | Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures |
US10847366B2 (en) | 2018-11-16 | 2020-11-24 | Asm Ip Holding B.V. | Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process |
CN109581870B (en) * | 2018-11-27 | 2022-01-25 | 中国工程物理研究院化工材料研究所 | Dynamic matrix control method for temperature in energetic material reaction kettle |
US11217444B2 (en) | 2018-11-30 | 2022-01-04 | Asm Ip Holding B.V. | Method for forming an ultraviolet radiation responsive metal oxide-containing film |
KR102636428B1 (en) | 2018-12-04 | 2024-02-13 | 에이에스엠 아이피 홀딩 비.브이. | A method for cleaning a substrate processing apparatus |
US11158513B2 (en) | 2018-12-13 | 2021-10-26 | Asm Ip Holding B.V. | Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures |
TW202037745A (en) | 2018-12-14 | 2020-10-16 | 荷蘭商Asm Ip私人控股有限公司 | Method of forming device structure, structure formed by the method and system for performing the method |
CN109855763A (en) * | 2018-12-29 | 2019-06-07 | 宏景科技股份有限公司 | A kind of temperature sensor correction method based on BP neural network and PLC |
TWI819180B (en) | 2019-01-17 | 2023-10-21 | 荷蘭商Asm 智慧財產控股公司 | Methods of forming a transition metal containing film on a substrate by a cyclical deposition process |
KR20200091543A (en) | 2019-01-22 | 2020-07-31 | 에이에스엠 아이피 홀딩 비.브이. | Semiconductor processing device |
CN111524788B (en) | 2019-02-01 | 2023-11-24 | Asm Ip私人控股有限公司 | Method for topologically selective film formation of silicon oxide |
KR102626263B1 (en) | 2019-02-20 | 2024-01-16 | 에이에스엠 아이피 홀딩 비.브이. | Cyclical deposition method including treatment step and apparatus for same |
KR20200102357A (en) | 2019-02-20 | 2020-08-31 | 에이에스엠 아이피 홀딩 비.브이. | Apparatus and methods for plug fill deposition in 3-d nand applications |
JP2020136677A (en) | 2019-02-20 | 2020-08-31 | エーエスエム・アイピー・ホールディング・ベー・フェー | Periodic accumulation method for filing concave part formed inside front surface of base material, and device |
TW202044325A (en) | 2019-02-20 | 2020-12-01 | 荷蘭商Asm Ip私人控股有限公司 | Method of filling a recess formed within a surface of a substrate, semiconductor structure formed according to the method, and semiconductor processing apparatus |
JP2020133004A (en) | 2019-02-22 | 2020-08-31 | エーエスエム・アイピー・ホールディング・ベー・フェー | Base material processing apparatus and method for processing base material |
US11742198B2 (en) | 2019-03-08 | 2023-08-29 | Asm Ip Holding B.V. | Structure including SiOCN layer and method of forming same |
KR20200108243A (en) | 2019-03-08 | 2020-09-17 | 에이에스엠 아이피 홀딩 비.브이. | Structure Including SiOC Layer and Method of Forming Same |
KR20200108242A (en) | 2019-03-08 | 2020-09-17 | 에이에스엠 아이피 홀딩 비.브이. | Method for Selective Deposition of Silicon Nitride Layer and Structure Including Selectively-Deposited Silicon Nitride Layer |
TWI689221B (en) * | 2019-03-14 | 2020-03-21 | 國家中山科學研究院 | Base station active intelligent cooling system |
KR20200116033A (en) | 2019-03-28 | 2020-10-08 | 에이에스엠 아이피 홀딩 비.브이. | Door opener and substrate processing apparatus provided therewith |
CN113874993A (en) * | 2019-03-29 | 2021-12-31 | 朗姆研究公司 | Model-based scheduling for substrate processing systems |
KR20200116855A (en) | 2019-04-01 | 2020-10-13 | 에이에스엠 아이피 홀딩 비.브이. | Method of manufacturing semiconductor device |
KR20200123380A (en) | 2019-04-19 | 2020-10-29 | 에이에스엠 아이피 홀딩 비.브이. | Layer forming method and apparatus |
KR20200125453A (en) | 2019-04-24 | 2020-11-04 | 에이에스엠 아이피 홀딩 비.브이. | Gas-phase reactor system and method of using same |
KR20200130118A (en) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | Method for Reforming Amorphous Carbon Polymer Film |
KR20200130121A (en) | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | Chemical source vessel with dip tube |
KR20200130652A (en) | 2019-05-10 | 2020-11-19 | 에이에스엠 아이피 홀딩 비.브이. | Method of depositing material onto a surface and structure formed according to the method |
JP2020188255A (en) | 2019-05-16 | 2020-11-19 | エーエスエム アイピー ホールディング ビー.ブイ. | Wafer boat handling device, vertical batch furnace, and method |
USD947913S1 (en) | 2019-05-17 | 2022-04-05 | Asm Ip Holding B.V. | Susceptor shaft |
USD975665S1 (en) | 2019-05-17 | 2023-01-17 | Asm Ip Holding B.V. | Susceptor shaft |
USD935572S1 (en) | 2019-05-24 | 2021-11-09 | Asm Ip Holding B.V. | Gas channel plate |
USD922229S1 (en) | 2019-06-05 | 2021-06-15 | Asm Ip Holding B.V. | Device for controlling a temperature of a gas supply unit |
KR20200141003A (en) | 2019-06-06 | 2020-12-17 | 에이에스엠 아이피 홀딩 비.브이. | Gas-phase reactor system including a gas detector |
KR20200143254A (en) | 2019-06-11 | 2020-12-23 | 에이에스엠 아이피 홀딩 비.브이. | Method of forming an electronic structure using an reforming gas, system for performing the method, and structure formed using the method |
USD944946S1 (en) | 2019-06-14 | 2022-03-01 | Asm Ip Holding B.V. | Shower plate |
US11092354B2 (en) * | 2019-06-20 | 2021-08-17 | Johnson Controls Tyco IP Holdings LLP | Systems and methods for flow control in an HVAC system |
US11149976B2 (en) | 2019-06-20 | 2021-10-19 | Johnson Controls Tyco IP Holdings LLP | Systems and methods for flow control in an HVAC system |
USD931978S1 (en) | 2019-06-27 | 2021-09-28 | Asm Ip Holding B.V. | Showerhead vacuum transport |
KR20210005515A (en) | 2019-07-03 | 2021-01-14 | 에이에스엠 아이피 홀딩 비.브이. | Temperature control assembly for substrate processing apparatus and method of using same |
JP2021015791A (en) | 2019-07-09 | 2021-02-12 | エーエスエム アイピー ホールディング ビー.ブイ. | Plasma device and substrate processing method using coaxial waveguide |
CN112216646A (en) | 2019-07-10 | 2021-01-12 | Asm Ip私人控股有限公司 | Substrate supporting assembly and substrate processing device comprising same |
US11604459B2 (en) | 2019-07-12 | 2023-03-14 | Emerson Process Management Power & Water Solutions, Inc. | Real-time control using directed predictive simulation within a control system of a process plant |
KR20210010307A (en) | 2019-07-16 | 2021-01-27 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus |
KR20210010820A (en) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | Methods of forming silicon germanium structures |
KR20210010816A (en) | 2019-07-17 | 2021-01-28 | 에이에스엠 아이피 홀딩 비.브이. | Radical assist ignition plasma system and method |
US11643724B2 (en) | 2019-07-18 | 2023-05-09 | Asm Ip Holding B.V. | Method of forming structures using a neutral beam |
CN112242296A (en) | 2019-07-19 | 2021-01-19 | Asm Ip私人控股有限公司 | Method of forming topologically controlled amorphous carbon polymer films |
TW202113936A (en) | 2019-07-29 | 2021-04-01 | 荷蘭商Asm Ip私人控股有限公司 | Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation |
CN112309900A (en) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | Substrate processing apparatus |
CN112309899A (en) | 2019-07-30 | 2021-02-02 | Asm Ip私人控股有限公司 | Substrate processing apparatus |
US11587814B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11587815B2 (en) | 2019-07-31 | 2023-02-21 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
US11227782B2 (en) | 2019-07-31 | 2022-01-18 | Asm Ip Holding B.V. | Vertical batch furnace assembly |
CN112323048B (en) | 2019-08-05 | 2024-02-09 | Asm Ip私人控股有限公司 | Liquid level sensor for chemical source container |
CN110442991B (en) * | 2019-08-12 | 2021-05-04 | 江南大学 | Dynamic sulfur recovery soft measurement modeling method based on parameterized FIR (finite Impulse response) model |
USD965524S1 (en) | 2019-08-19 | 2022-10-04 | Asm Ip Holding B.V. | Susceptor support |
USD965044S1 (en) | 2019-08-19 | 2022-09-27 | Asm Ip Holding B.V. | Susceptor shaft |
JP2021031769A (en) | 2019-08-21 | 2021-03-01 | エーエスエム アイピー ホールディング ビー.ブイ. | Production apparatus of mixed gas of film deposition raw material and film deposition apparatus |
KR20210024423A (en) | 2019-08-22 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | Method for forming a structure with a hole |
USD940837S1 (en) | 2019-08-22 | 2022-01-11 | Asm Ip Holding B.V. | Electrode |
USD930782S1 (en) | 2019-08-22 | 2021-09-14 | Asm Ip Holding B.V. | Gas distributor |
USD949319S1 (en) | 2019-08-22 | 2022-04-19 | Asm Ip Holding B.V. | Exhaust duct |
USD979506S1 (en) | 2019-08-22 | 2023-02-28 | Asm Ip Holding B.V. | Insulator |
KR20210024420A (en) | 2019-08-23 | 2021-03-05 | 에이에스엠 아이피 홀딩 비.브이. | Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane |
US11286558B2 (en) | 2019-08-23 | 2022-03-29 | Asm Ip Holding B.V. | Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film |
KR20210029090A (en) | 2019-09-04 | 2021-03-15 | 에이에스엠 아이피 홀딩 비.브이. | Methods for selective deposition using a sacrificial capping layer |
KR20210029663A (en) | 2019-09-05 | 2021-03-16 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus |
US11562901B2 (en) | 2019-09-25 | 2023-01-24 | Asm Ip Holding B.V. | Substrate processing method |
CN112593212B (en) | 2019-10-02 | 2023-12-22 | Asm Ip私人控股有限公司 | Method for forming topologically selective silicon oxide film by cyclic plasma enhanced deposition process |
TW202129060A (en) | 2019-10-08 | 2021-08-01 | 荷蘭商Asm Ip控股公司 | Substrate processing device, and substrate processing method |
KR20210043460A (en) | 2019-10-10 | 2021-04-21 | 에이에스엠 아이피 홀딩 비.브이. | Method of forming a photoresist underlayer and structure including same |
KR20210045930A (en) | 2019-10-16 | 2021-04-27 | 에이에스엠 아이피 홀딩 비.브이. | Method of Topology-Selective Film Formation of Silicon Oxide |
US11637014B2 (en) | 2019-10-17 | 2023-04-25 | Asm Ip Holding B.V. | Methods for selective deposition of doped semiconductor material |
KR20210047808A (en) | 2019-10-21 | 2021-04-30 | 에이에스엠 아이피 홀딩 비.브이. | Apparatus and methods for selectively etching films |
US11646205B2 (en) | 2019-10-29 | 2023-05-09 | Asm Ip Holding B.V. | Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same |
KR20210054983A (en) | 2019-11-05 | 2021-05-14 | 에이에스엠 아이피 홀딩 비.브이. | Structures with doped semiconductor layers and methods and systems for forming same |
DE102019130383A1 (en) * | 2019-11-11 | 2021-05-12 | Rational Aktiengesellschaft | Method for controlling a preparation device, control unit and preparation device |
US11501968B2 (en) | 2019-11-15 | 2022-11-15 | Asm Ip Holding B.V. | Method for providing a semiconductor device with silicon filled gaps |
KR20210062561A (en) | 2019-11-20 | 2021-05-31 | 에이에스엠 아이피 홀딩 비.브이. | Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure |
CN112951697A (en) | 2019-11-26 | 2021-06-11 | Asm Ip私人控股有限公司 | Substrate processing apparatus |
KR20210065848A (en) | 2019-11-26 | 2021-06-04 | 에이에스엠 아이피 홀딩 비.브이. | Methods for selectivley forming a target film on a substrate comprising a first dielectric surface and a second metallic surface |
CN112885693A (en) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | Substrate processing apparatus |
CN112885692A (en) | 2019-11-29 | 2021-06-01 | Asm Ip私人控股有限公司 | Substrate processing apparatus |
JP2021090042A (en) | 2019-12-02 | 2021-06-10 | エーエスエム アイピー ホールディング ビー.ブイ. | Substrate processing apparatus and substrate processing method |
KR20210070898A (en) | 2019-12-04 | 2021-06-15 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus |
JP2021097227A (en) | 2019-12-17 | 2021-06-24 | エーエスエム・アイピー・ホールディング・ベー・フェー | Method of forming vanadium nitride layer and structure including vanadium nitride layer |
KR20210080214A (en) | 2019-12-19 | 2021-06-30 | 에이에스엠 아이피 홀딩 비.브이. | Methods for filling a gap feature on a substrate and related semiconductor structures |
JP2021109175A (en) | 2020-01-06 | 2021-08-02 | エーエスエム・アイピー・ホールディング・ベー・フェー | Gas supply assembly, components thereof, and reactor system including the same |
US11441800B2 (en) | 2020-01-07 | 2022-09-13 | FPL Smart Services, LLC | Autonomous machine learning diagonostic system with simplified sensors for home appliances |
KR20210095050A (en) | 2020-01-20 | 2021-07-30 | 에이에스엠 아이피 홀딩 비.브이. | Method of forming thin film and method of modifying surface of thin film |
TW202130846A (en) | 2020-02-03 | 2021-08-16 | 荷蘭商Asm Ip私人控股有限公司 | Method of forming structures including a vanadium or indium layer |
TW202146882A (en) | 2020-02-04 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | Method of verifying an article, apparatus for verifying an article, and system for verifying a reaction chamber |
US11776846B2 (en) | 2020-02-07 | 2023-10-03 | Asm Ip Holding B.V. | Methods for depositing gap filling fluids and related systems and devices |
TW202146715A (en) | 2020-02-17 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | Method for growing phosphorous-doped silicon layer and system of the same |
TW202203344A (en) | 2020-02-28 | 2022-01-16 | 荷蘭商Asm Ip控股公司 | System dedicated for parts cleaning |
KR20210116240A (en) | 2020-03-11 | 2021-09-27 | 에이에스엠 아이피 홀딩 비.브이. | Substrate handling device with adjustable joints |
US11876356B2 (en) | 2020-03-11 | 2024-01-16 | Asm Ip Holding B.V. | Lockout tagout assembly and system and method of using same |
CN113394086A (en) | 2020-03-12 | 2021-09-14 | Asm Ip私人控股有限公司 | Method for producing a layer structure having a target topological profile |
KR20210124042A (en) | 2020-04-02 | 2021-10-14 | 에이에스엠 아이피 홀딩 비.브이. | Thin film forming method |
TW202146689A (en) | 2020-04-03 | 2021-12-16 | 荷蘭商Asm Ip控股公司 | Method for forming barrier layer and method for manufacturing semiconductor device |
TW202145344A (en) | 2020-04-08 | 2021-12-01 | 荷蘭商Asm Ip私人控股有限公司 | Apparatus and methods for selectively etching silcon oxide films |
US11821078B2 (en) | 2020-04-15 | 2023-11-21 | Asm Ip Holding B.V. | Method for forming precoat film and method for forming silicon-containing film |
TW202146831A (en) | 2020-04-24 | 2021-12-16 | 荷蘭商Asm Ip私人控股有限公司 | Vertical batch furnace assembly, and method for cooling vertical batch furnace |
JP2021172884A (en) | 2020-04-24 | 2021-11-01 | エーエスエム・アイピー・ホールディング・ベー・フェー | Method of forming vanadium nitride-containing layer and structure comprising vanadium nitride-containing layer |
KR20210132600A (en) | 2020-04-24 | 2021-11-04 | 에이에스엠 아이피 홀딩 비.브이. | Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element |
KR20210134226A (en) | 2020-04-29 | 2021-11-09 | 에이에스엠 아이피 홀딩 비.브이. | Solid source precursor vessel |
KR20210134869A (en) | 2020-05-01 | 2021-11-11 | 에이에스엠 아이피 홀딩 비.브이. | Fast FOUP swapping with a FOUP handler |
KR20210141379A (en) | 2020-05-13 | 2021-11-23 | 에이에스엠 아이피 홀딩 비.브이. | Laser alignment fixture for a reactor system |
KR20210143653A (en) | 2020-05-19 | 2021-11-29 | 에이에스엠 아이피 홀딩 비.브이. | Substrate processing apparatus |
KR20210145078A (en) | 2020-05-21 | 2021-12-01 | 에이에스엠 아이피 홀딩 비.브이. | Structures including multiple carbon layers and methods of forming and using same |
TW202200837A (en) | 2020-05-22 | 2022-01-01 | 荷蘭商Asm Ip私人控股有限公司 | Reaction system for forming thin film on substrate |
TW202201602A (en) | 2020-05-29 | 2022-01-01 | 荷蘭商Asm Ip私人控股有限公司 | Substrate processing device |
TW202218133A (en) | 2020-06-24 | 2022-05-01 | 荷蘭商Asm Ip私人控股有限公司 | Method for forming a layer provided with silicon |
TW202217953A (en) | 2020-06-30 | 2022-05-01 | 荷蘭商Asm Ip私人控股有限公司 | Substrate processing method |
TW202219628A (en) | 2020-07-17 | 2022-05-16 | 荷蘭商Asm Ip私人控股有限公司 | Structures and methods for use in photolithography |
TW202204662A (en) | 2020-07-20 | 2022-02-01 | 荷蘭商Asm Ip私人控股有限公司 | Method and system for depositing molybdenum layers |
TW202212623A (en) | 2020-08-26 | 2022-04-01 | 荷蘭商Asm Ip私人控股有限公司 | Method of forming metal silicon oxide layer and metal silicon oxynitride layer, semiconductor structure, and system |
CN112181008B (en) * | 2020-09-02 | 2022-06-21 | 珠海泰坦新动力电子有限公司 | Intelligent control method, device and medium for heat source power of high-temperature formed cabinet |
USD990534S1 (en) | 2020-09-11 | 2023-06-27 | Asm Ip Holding B.V. | Weighted lift pin |
USD1012873S1 (en) | 2020-09-24 | 2024-01-30 | Asm Ip Holding B.V. | Electrode for semiconductor processing apparatus |
TW202229613A (en) | 2020-10-14 | 2022-08-01 | 荷蘭商Asm Ip私人控股有限公司 | Method of depositing material on stepped structure |
SE544494C2 (en) * | 2020-10-21 | 2022-06-21 | Senseair Ab | Temperature controller for a temperature control mechanism |
KR20220053482A (en) | 2020-10-22 | 2022-04-29 | 에이에스엠 아이피 홀딩 비.브이. | Method of depositing vanadium metal, structure, device and a deposition assembly |
TW202223136A (en) | 2020-10-28 | 2022-06-16 | 荷蘭商Asm Ip私人控股有限公司 | Method for forming layer on substrate, and semiconductor processing system |
CN114510863A (en) * | 2020-11-16 | 2022-05-17 | 鸿富锦精密电子(成都)有限公司 | Reflow furnace temperature adjusting method and device, electronic equipment and storage medium |
KR20220076343A (en) | 2020-11-30 | 2022-06-08 | 에이에스엠 아이피 홀딩 비.브이. | an injector configured for arrangement within a reaction chamber of a substrate processing apparatus |
US11946137B2 (en) | 2020-12-16 | 2024-04-02 | Asm Ip Holding B.V. | Runout and wobble measurement fixtures |
TW202231903A (en) | 2020-12-22 | 2022-08-16 | 荷蘭商Asm Ip私人控股有限公司 | Transition metal deposition method, transition metal layer, and deposition assembly for depositing transition metal on substrate |
CN113203499B (en) * | 2021-04-02 | 2022-03-18 | 华中科技大学 | Transient temperature measurement calibration method and system |
USD1023959S1 (en) | 2021-05-11 | 2024-04-23 | Asm Ip Holding B.V. | Electrode for substrate processing apparatus |
USD980813S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas flow control plate for substrate processing apparatus |
USD980814S1 (en) | 2021-05-11 | 2023-03-14 | Asm Ip Holding B.V. | Gas distributor for substrate processing apparatus |
USD981973S1 (en) | 2021-05-11 | 2023-03-28 | Asm Ip Holding B.V. | Reactor wall for substrate processing apparatus |
USD990441S1 (en) | 2021-09-07 | 2023-06-27 | Asm Ip Holding B.V. | Gas flow control plate |
JP2023141135A (en) * | 2022-03-23 | 2023-10-05 | 株式会社Screenホールディングス | Heat treatment device |
CN115268270A (en) * | 2022-07-29 | 2022-11-01 | 华能伊敏煤电有限责任公司 | Multi-source heat supply network heater optimized scheduling method, system, equipment and medium |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3836751A (en) | 1973-07-26 | 1974-09-17 | Applied Materials Inc | Temperature controlled profiling heater |
GB1583545A (en) | 1976-08-04 | 1981-01-28 | Martin Sanchez J | Control systems |
US4255133A (en) | 1978-04-10 | 1981-03-10 | Hitachi, Ltd. | Method for controlling furnace temperature of multi-zone heating furnace |
US4349869A (en) | 1979-10-01 | 1982-09-14 | Shell Oil Company | Dynamic matrix control method |
DE3175142D1 (en) | 1980-04-07 | 1986-09-25 | Juan Martin Sanchez | Adaptive-predictive control method and adaptive-predictive control system |
US4714988A (en) | 1982-03-26 | 1987-12-22 | Kabushiki Kaisha Toshiba | Feedforward feedback control having predictive disturbance compensation |
US4639853A (en) | 1983-06-03 | 1987-01-27 | Omron Tateisi Electronics Co. | Time-discrete adaptive switching on-off controller |
US4616308A (en) | 1983-11-15 | 1986-10-07 | Shell Oil Company | Dynamic process control |
JPS61145606A (en) | 1984-12-19 | 1986-07-03 | Ohkura Electric Co Ltd | Interference correspondence type pattern switching temperature controller |
US4720807A (en) | 1985-05-20 | 1988-01-19 | Vacuum General, Inc. | Adaptive pressure control system |
US4694390A (en) | 1985-06-28 | 1987-09-15 | Electric Power Research Institute, Inc. | Microprocessor-based control and diagnostic system for motor operated valves |
US4680451A (en) | 1985-07-29 | 1987-07-14 | A. G. Associates | Apparatus using high intensity CW lamps for improved heat treating of semiconductor wafers |
US4634946A (en) | 1985-10-02 | 1987-01-06 | Westinghouse Electric Corp. | Apparatus and method for predictive control of a dynamic system |
KR910002596B1 (en) * | 1985-11-21 | 1991-04-27 | 다이닛뽕 스크린 세이조오 가부시기가이샤 | Method and apparatus for controlling the temperature of a radiantly heated object |
JPS62192281U (en) | 1986-05-27 | 1987-12-07 | ||
US4736316A (en) | 1986-08-06 | 1988-04-05 | Chevron Research Company | Minimum time, optimizing and stabilizing multivariable control method and system using a constraint associated control code |
US4769766A (en) | 1986-09-11 | 1988-09-06 | Tung Hsien Hsin | Robust model reference controller |
US4975561A (en) | 1987-06-18 | 1990-12-04 | Epsilon Technology Inc. | Heating system for substrates |
JPH0196701A (en) | 1987-10-09 | 1989-04-14 | Nobuo Yamamoto | Control system using internal model cooperative type feedforward method |
US4959767A (en) | 1988-11-23 | 1990-09-25 | Elsag International B.V. | Parameter estimation technique for closed loop system |
US5032977A (en) | 1989-06-13 | 1991-07-16 | Elsag International B.V. | System for modeling and control for delignification of pulping |
JPH0786783B2 (en) | 1989-11-04 | 1995-09-20 | 勝久 古田 | Furnace temperature controller by adjusting input |
ATE143509T1 (en) | 1990-06-21 | 1996-10-15 | Honeywell Inc | VARIABLE HORIZON BASED ADAPTIVE CONTROL WITH MEANS OF MINIMIZING OPERATING COSTS |
US5291514A (en) | 1991-07-15 | 1994-03-01 | International Business Machines Corporation | Heater autotone control apparatus and method |
CA2054423C (en) * | 1991-08-09 | 1999-03-16 | Robert J. Schurko | Adaptive control for reheat furnace |
US5488561A (en) | 1992-08-19 | 1996-01-30 | Continental Controls, Inc. | Multivariable process control method and apparatus |
US5650082A (en) | 1993-10-29 | 1997-07-22 | Applied Materials, Inc. | Profiled substrate heating |
US5660472A (en) | 1994-12-19 | 1997-08-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
US5755511A (en) | 1994-12-19 | 1998-05-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
AU1843597A (en) | 1996-01-31 | 1997-08-22 | Asm America, Inc. | Model-based predictive control of thermal processing |
US5793022A (en) | 1996-09-12 | 1998-08-11 | Applied Materials, Inc. | Adaptive temperture controller and method of operation |
-
1997
- 1997-01-30 AU AU18435/97A patent/AU1843597A/en not_active Abandoned
- 1997-01-30 US US08/791,134 patent/US6207936B1/en not_active Expired - Lifetime
- 1997-01-30 DE DE69728256T patent/DE69728256T2/en not_active Expired - Fee Related
- 1997-01-30 JP JP52776597A patent/JP3956057B2/en not_active Expired - Lifetime
- 1997-01-30 KR KR10-1998-0705938A patent/KR100486158B1/en not_active IP Right Cessation
- 1997-01-30 EP EP97904022A patent/EP0879547B1/en not_active Expired - Lifetime
- 1997-01-30 WO PCT/US1997/001318 patent/WO1997028669A1/en active IP Right Grant
-
2000
- 2000-06-27 US US09/605,381 patent/US6373033B1/en not_active Expired - Fee Related
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO1997028669B1 (en) | Model-based predictive control of thermal processing | |
EP0879547B1 (en) | Model-based predictive control of thermal processing | |
KR100359734B1 (en) | Model based temperature controller for semiconductor thermal processors | |
WO1997028669A9 (en) | Model-based predictive control of thermal processing | |
US5369567A (en) | Furnace temperature cascade control apparatus using adjustment input | |
Wang et al. | A hybrid approach for supervisory control of furnace temperature | |
RU2691819C1 (en) | Steel sheet temperature control device and temperature control method | |
JP2000058466A (en) | Temperature control simulation method and device, and acquisition method of transmission function | |
CN110607435A (en) | Annealing furnace plate temperature control system and method | |
JP3291201B2 (en) | Apparatus and method for controlling plating amount | |
KR100356159B1 (en) | Apparatus for controlling combustion of furnace | |
Zanoli et al. | Model Predictive Control with horizons online adaptation: A steel industry case study | |
Czeczot | Model-based adaptive control of fed-batch fermentation process with the substrate consumption rate application | |
JPH07152404A (en) | Controller | |
JPH0560604B2 (en) | ||
CA2423281A1 (en) | Iterative learning update for batch mode processing | |
JPS62197140A (en) | Method for controlling internal temperature of reactor | |
JPH0560605B2 (en) | ||
JPH0791590B2 (en) | Velocity changing method in plate temperature control of continuous annealing furnace | |
US20220406631A1 (en) | Temperature correction information calculating device, semiconductor manufacturing apparatus, recording medium, and temperature correction information calculating method | |
JP5071057B2 (en) | PID control support device | |
Lewis et al. | The application of predictive control to steel annealing | |
JP4381628B2 (en) | Concentration control device and concentration control method for concentration equipment | |
JPS60197825A (en) | Method for controlling cooling | |
JP2000129319A (en) | Method for controlling furnace heat in blast furnace and device therefor |